JP4669745B2 - Photosensitive composition and pattern forming method using the same - Google Patents

Description

  The present invention relates to a photosensitive composition used in a semiconductor manufacturing process such as an IC, a circuit board such as a liquid crystal or a thermal head, and other photofabrication processes, and a pattern forming method using the same. More particularly, the present invention relates to a photosensitive composition suitable for use as an exposure light source such as far ultraviolet rays of 220 nm or less and an irradiation source using an electron beam, and a pattern forming method using the same.

  The chemically amplified photosensitive composition generates an acid in the exposed area by irradiation with radiation such as far ultraviolet light, and the acid-catalyzed reaction causes the solubility of the active radiation irradiated area and non-irradiated area in the developer. This is a pattern forming material for changing the pattern to form a pattern on the substrate.

  When a KrF excimer laser is used as an exposure light source, a resin having a basic skeleton of poly (hydroxystyrene) having a small absorption mainly in the 248 nm region is used as a main component. A pattern is formed, which is a better system than the conventional naphthoquinone diazide / novolak resin system.

On the other hand, when a further short wavelength light source, for example, an ArF excimer laser (193 nm) is used as an exposure light source, the compound having an aromatic group exhibits a large absorption in the 193 nm region. It wasn't.
For this reason, an ArF excimer laser resist containing a resin having an alicyclic hydrocarbon structure has been developed.
Furthermore, it has been found that the performance can be improved by adding a repeating unit having a lactone structure to the resin having the alicyclic hydrocarbon structure. Patent Document 1 (JP-A-9-73173) and Patent Document 2 (US Pat. No. 6,388,101B) describe resist compositions using a resin containing a repeating unit having a mevalonic lactone structure or a γ lactone structure. Patent Document 3 (Japanese Patent Laid-Open No. 2000-159758), Patent Document 4 (Japanese Patent Laid-Open No. 2001-109154), and Patent Document 5 (US Patent No. 2001-26901A) disclose alicyclic rings. A resist composition using a resin containing a repeating unit having a lactone structure is described.
However, from the viewpoint of overall performance as a resist, it is actually difficult to find an appropriate combination of resin, photoacid generator, additive, solvent, etc. to be used, and the line width is 100 nm or less. When forming such a fine pattern, improvement of the line edge roughness performance of the line pattern as well as the resolving power has been demanded.
Here, the line edge roughness means that the resist line pattern and the edge of the substrate interface exhibit irregular shapes in a direction perpendicular to the line direction due to the characteristics of the resist. When this pattern is observed from directly above, the edges appear to be uneven (± several nm to several tens of nm). Since the unevenness is transferred to the substrate by an etching process, if the unevenness is large, an electrical characteristic defect is caused and the yield is lowered.

JP-A-9-73173 US Pat. No. 6,388,101B JP 2000-159758 A JP 2001-109154 A US Patent No. 2001-26901A

  Accordingly, an object of the present invention is to provide a photosensitive composition that is excellent in resolving power and improved in line edge roughness even in the formation of a fine pattern of 100 nm or less, and a pattern forming method using the same.

一般式（Ｉ）〜（ＩＩＩ）に於いて、
Ｘは、−ＣＨ₂−、酸素原子、硫黄原子又は−Ｃ（＝Ｏ）−を表す。
Ｌｃは、ラクトンを形成する基を表す。
Ｒａ₁’及びＲａ₂’は、それぞれ独立に、水素原子、アルキル基、シクロアルキル基又は酸分解性基を表す。
Ｒａ₃は、カルボキシル基、アルキル基、アルコキシ基、アシルオキシ基、アルコキシカルボニル基又は酸分解性基を有する基を表す。
Ｒａ ₁ ’、Ｒａ ₂ ’及びＲａ₃のいずれか２つが結合して環を形成してもよい。
Ｘ _1１ は、−ＣＨ₂−、−ＣＨ₂ＣＨ₂−、−Ｏ−、−Ｓ−又は−ＣＨ₂Ｓ−を表す。
Ｘ ₁ は、−ＣＨ ₂ −、−ＣＨ ₂ ＣＨ ₂ −、−ＣＨ ₂ Ｏ−、−Ｏ−、−Ｓ−又は−ＣＨ ₂ Ｓ−を表す。
ｎは、１又は２の整数を表す。
ｎ₁及びｎ₂は、０〜２の整数を表す。但し、ｎ₁＋ｎ₂は、２である。
ｎ₃は、０〜３の整数を表す。
２．
（Ａ）同一繰り返し単位中に水酸基及び／又は水酸基の水素原子がアシル基、アルキル基、シクロアルキル基及び酸分解性基から選ばれる基によって置換された基と、ラクトン構造を有する基とを有する繰り返し単位、並びに、５又は６員環が縮環したラクトン構造を有する基を有する繰り返し単位から選ばれる少なくとも１種類の繰り返し単位を有し、酸の作用によりアルカリ現像液に対する溶解度が増大する樹脂を含有する感光性組成物であって、該（Ａ）成分の樹脂が、下記一般式（Ｉ'）〜（ＩＩＩ'）のいずれかで表される構造から選ばれる少なくとも１種類の構造を有する繰り返し単位を有することを特徴とする感光性組成物。

一般式（Ｉ’）〜（ＩＩＩ’）に於いて、
Ｒａ₁及びＲａ₂は、それぞれ独立に、水素原子、アルキル基、シクロアルキル基、アシル基又は酸分解性基を表す。
Ｒａ₁及びＲａ₂は、結合して環を形成してもよい。
Ｘ₁は、−ＣＨ₂−、−ＣＨ₂ＣＨ₂−、−ＣＨ₂Ｏ−、−Ｏ−、−Ｓ−又は−ＣＨ₂Ｓ−を表す。
３．
（Ａ）同一繰り返し単位中に水酸基及び／又は水酸基の水素原子がアシル基、アルキル基、シクロアルキル基及び酸分解性基から選ばれる基によって置換された基と、ラクトン構造を有する基とを有する繰り返し単位、並びに、５又は６員環が縮環したラクトン構造を有する基を有する繰り返し単位から選ばれる少なくとも１種類の繰り返し単位を有し、酸の作用によりアルカリ現像液に対する溶解度が増大する樹脂を含有する感光性組成物であって、該（Ａ）成分の樹脂が、下記一般式（Ｉａ）〜（ＩＩＩａ）のいずれかで表される繰り返し単位から選ばれる少なくとも１種類の繰り返し単位を有することを特徴とする感光性組成物。

一般式（Ｉａ）〜（ＩＩＩａ）に於いて、
Ｒｂ₁は、水素原子、アルキル基又は−ＣＨ₂−Ｏ−Ｒｂ_2aを表す。式中、Ｒｂ_2aは、水素原子、アルキル基、シクロアルキル基、アシル基又はラクトン構造を有する基を表す。
Ｒｃは、単結合又は２価の連結基を表す。
Ｘは、−ＣＨ₂−、酸素原子、硫黄原子又は−Ｃ（＝Ｏ）−を表す。
Ｌｃは、ラクトンを形成する基を表す。
Ｒａ₁’及びＲａ₂’は、それぞれ独立に、水素原子、アルキル基、シクロアルキル基又は酸分解性基を表す。
Ｒａ₃は、カルボキシル基、アルキル基、アルコキシ基、アシルオキシ基、アルコキシカルボニル基又は酸分解性基を有する基を表す。
Ｒａ ₁ ’、Ｒａ ₂ ’及びＲａ₃のいずれか２つが結合して環を形成してもよい。
Ｘ _1１ は、−ＣＨ₂−、−ＣＨ₂ＣＨ₂−、−Ｏ−、−Ｓ−又は−ＣＨ₂Ｓ−を表す。
Ｘ ₁ は、−ＣＨ ₂ −、−ＣＨ ₂ ＣＨ ₂ −、−ＣＨ ₂ Ｏ−、−Ｏ−、−Ｓ−又は−ＣＨ ₂ Ｓ−を表す。
ｎは、１又は２の整数を表す。
ｎ₁及びｎ₂は、０〜２の整数を表す。但し、ｎ₁＋ｎ₂は、２である。
ｎ₃は、０〜３の整数を表す。
４．
（Ａ）成分の樹脂が、下記一般式（Ｉａ''）、（ＩＩａ'）、（ＩＩａ''）、（ＩＩＩａ'）及び（ＩＩＩａ''）のいずれかで表される繰り返し単位から選ばれる少なくとも１種類の繰り返し単位を有することを特徴とする上記１〜３のいずれか１項に記載の感光性組成物。

一般式（Ｉａ''）、（ＩＩａ'）、（ＩＩａ''）、（ＩＩＩａ'）及び（ＩＩＩａ''）に於いて、
Ｒｂ₁は、水素原子、アルキル基又は−ＣＨ₂−Ｏ−Ｒｂ_2aを表す。式中、Ｒｂ_2aは、水素原子、アルキル基、シクロアルキル基、アシル基又はラクトン構造を有する基を表す。
Ｒｃは、単結合又は２価の連結基を表す。
Ｒａ₁及びＲａ₂は、それぞれ独立に、水素原子、アルキル基、シクロアルキル基、アシル基又は酸分解性基を表す。
Ｒａ₁及びＲａ₂は、結合して環を形成してもよい。
Ｘ₁は、−ＣＨ₂−、−ＣＨ₂ＣＨ₂−、−ＣＨ₂Ｏ−、−Ｏ−、−Ｓ−又は−ＣＨ₂Ｓ−を表す。
Ｙ₂及びＹ₃は、各々独立に、−ＣＨ₂−、−ＣＨ₂ＣＨ₂−、−Ｏ−又は−Ｓ−を表す。
Ｒｂ₂、Ｒｂ₃及びＲｂ₄は、各々独立に、水素原子、アルキル基、水酸基、カルボキシル基又はアルコキシカルボニル基を表す。
ｎ₄は、０又は１を表す。
５．
（Ａ）同一繰り返し単位中に水酸基及び／又は水酸基の水素原子がアシル基、アルキル基、シクロアルキル基及び酸分解性基から選ばれる基によって置換された基と、ラクトン構造を有する基とを有する繰り返し単位、並びに、５又は６員環が縮環したラクトン構造を有する基を有する繰り返し単位から選ばれる少なくとも１種類の繰り返し単位を有し、酸の作用によりアルカリ現像液に対する溶解度が増大する樹脂を含有する感光性組成物であって、該（Ａ）成分の樹脂が、下記一般式（Ｉａ−１）〜（ＩＩＩａ−１）のいずれかで表される繰り返し単位から選ばれる少なくとも１種類の繰り返し単位を有することを特徴とする感光性組成物。

一般式（Ｉａ−１）〜（ＩＩＩａ−１）に於いて、
Ｒｂ₁は、水素原子、アルキル基又は−ＣＨ₂−Ｏ−Ｒｂ_2aを表す。式中、Ｒｂ_2aは、水素原子、アルキル基、シクロアルキル基、アシル基又はラクトン構造を有する基を表す。
Ｒｃは、単結合又は２価の連結基を表す。
Ｒａ₁及びＲａ₂は、それぞれ独立に、水素原子、アルキル基、シクロアルキル基、アシル基又は酸分解性基を表す。
Ｒａ₃は、カルボキシル基、アルキル基、アルコキシ基、アシルオキシ基、アルコキシカルボニル基又は酸分解性基を有する基を表す。
Ｒａ₁〜Ｒａ₃のいずれか２つが結合して環を形成してもよい。
Ｘ₂は、単結合又は−ＣＨ₂−を表す。
Ｘ₃は、単結合又は−ＣＨ₂−を表す。
Ｘ₄は、単結合、−ＣＨ₂−、−ＣＨ₂ＣＨ₂−、−ＣＨ₂Ｏ−、−Ｏ−、−Ｓ−又は−ＣＨ₂Ｓ−を表す。
Ｘ₅は、単結合、−ＣＨ₂−、−ＣＨ₂ＣＨ₂−、−ＣＨ₂Ｏ−、−Ｏ−、−Ｓ−又は−ＣＨ₂Ｓ−を表す。
Ｘ₄とＸ₅の水素原子を除いた原子数の和は、１又は２である。
ｎ₃は、０〜３の整数を表す。
６．
（Ａ）成分の樹脂が、下記一般式（VII）で表される基を有する繰り返し単位を含有する酸分解性樹脂であることを特徴とする上記１〜５のいずれか１項に記載の感光性組成物。

一般式（VII）中、
Ｒ₂c〜Ｒ₄cは、各々独立に水素原子又は水酸基を表す。ただし、Ｒ₂c〜Ｒ₄cのうち少なくとも１つは水酸基を表す。
７．
上記１〜６のいずれか１項に記載の感光性組成物により形成した感光性膜。
８．
上記７に記載の膜を露光、現像する工程を含むことを特徴とするパターン形成方法。
９．
前記露光が、液浸露光であることを特徴とする上記８に記載のパターン形成方法。
尚、本発明は上記１〜９に記載した構成を有するものであるが、以下その他についても参考のため記載した。 This invention is the photosensitive composition of the following structure, and the pattern formation method using the same, By this, the said objective of this invention is achieved.
1.
(A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid a photosensitive composition containing, the (a) component of the resin, or one group obtained by removing any hydrogen atom from structure represented by any one of the following general formula (I) ~ (III) A photosensitive composition comprising a repeating unit having at least one group selected from the group consisting of:

In the general formulas (I) to (III),
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ 'and Ra _2' are each independently a hydrogen atom, an alkyl group, a cycloalkyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any _{two of} Ra ₁ ′, Ra ₂ ′ and Ra ₃ may be bonded to form a ring.
X _{11 is, -CH 2 -, - CH 2} CH 2 -, - O -, - S- or represents the -CH ₂ S-.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0-2. However, n ₁ + n ₂ is 2.
n ₃ represents an integer of 0 to 3.
2.
(A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid A photosensitive composition containing, wherein the resin of component ( A) has at least one structure selected from structures represented by any of the following general formulas (I ′) to (III ′) to that sense light composition characterized by having a unit.

In the general formulas (I ′) to (III ′),
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
3.
(A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid A photosensitive composition containing, wherein the resin of component ( A) has at least one repeating unit selected from repeating units represented by any one of the following general formulas (Ia) to (IIIa): It characterized feeling light composition.

In general formulas (Ia) to (IIIa),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ 'and Ra _2' are each independently a hydrogen atom, an alkyl group, a cycloalkyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any _{two of} Ra ₁ ′, Ra ₂ ′ and Ra ₃ may be bonded to form a ring.
X _{11 is, -CH 2 -, - CH 2} CH 2 -, - O -, - S- or represents the -CH ₂ S-.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0-2. However, n ₁ + n ₂ is 2.
n ₃ represents an integer of 0 to 3.
4).
The resin of component (A) is selected from the repeating units represented by any of the following general formulas (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″) The photosensitive composition according to any one of the above items 1 to 3, which has at least one type of repeating unit.

In the general formulas (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
Y ₂ and Y ₃ each independently represent —CH ₂ —, —CH ₂ CH ₂ —, —O— or —S—.
Rb _2, Rb ₃ and Rb ₄ each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group or an alkoxycarbonyl group.
n ₄ represents 0 or 1.
5.
(A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid A photosensitive composition containing, wherein the resin of component (A) is at least one type selected from repeating units represented by any one of the following general formulas (Ia-1) to (IIIa-1) A photosensitive composition comprising units.

In the general formulas (Ia-1) to (IIIa-1),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring.
X ₂ represents a single bond or —CH ₂ —.
X ₃ represents a single bond or —CH ₂ —.
X ₄ represents a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
X ₅ is a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
The sum of the number of atoms excluding the hydrogen atoms of X ₄ and X ₅ is 1 or 2.
n ₃ represents an integer of 0 to 3.
6).
The photosensitive resin as described in any one of 1 to 5 above, wherein the resin of component (A) is an acid-decomposable resin containing a repeating unit having a group represented by the following general formula (VII): Sex composition.

In general formula (VII),
R ₂ c to R ₄ c each independently represents a hydrogen atom or a hydroxyl group. However, at least one of R ₂ c to R ₄ c represents a hydroxyl group.
7).
The photosensitive film | membrane formed with the photosensitive composition of any one of said 1-6.
8).
8. A pattern forming method comprising the steps of exposing and developing the film according to 7 above.
9.
9. The pattern forming method as described in 8 above, wherein the exposure is immersion exposure.
In addition, although this invention has the structure described in said 1-9, below was also described for reference below.

  (1) (A) a group having a lactone structure and a group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group is substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group in the same repeating unit. And at least one type of repeating unit selected from repeating units having a group having a lactone structure fused with a 5- or 6-membered ring, and the solubility in an alkali developer is increased by the action of an acid. A photosensitive composition containing a resin to be used.

  (2) The resin of component (A) has a repeating unit having at least one type of structure selected from the structures represented by the following general formulas (I) to (III). Photosensitive composition.

In the general formulas (I) to (III),
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0 to 3. However, n ₁ + n ₂ is an integer of from 1 to 6.
n ₃ represents an integer of 0 to 3.

  (3) The resin of component (A) has a repeating unit having at least one type of structure selected from the structures represented by the following general formulas (I ′) to (III ′) (1) The photosensitive composition as described in any one of.

In the general formulas (I ′) to (III ′),
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.

  (4) The photosensitive resin as described in (1), wherein the resin of component (A) has at least one repeating unit selected from repeating units represented by the following general formulas (Ia) to (IIIa): Sex composition.

In general formulas (Ia) to (IIIa),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0 to 3. However, n ₁ + n ₂ is an integer of from 1 to 6.
n ₃ represents an integer of 0 to 3.

(5) The resin of component (A) has at least one repeating unit selected from repeating units represented by the following general formulas (Ia-1) to (IIIa-1) (1) The photosensitive composition as described in any one of.

In the general formulas (Ia-1) to (IIIa-1),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring.
X ₂ represents a single bond or —CH ₂ —.
X ₃ represents a single bond or —CH ₂ —.
X ₄ represents a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
X ₅ is a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
The sum of the number of atoms excluding the hydrogen atoms of X ₄ and X ₅ is 1 or 2.
n ₃ represents an integer of 0 to 3.

  (6) The resin of component (A) is selected from repeating units represented by the following general formulas (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″) It has at least 1 type of repeating unit, The photosensitive composition as described in (1) characterized by the above-mentioned.

In the general formulas (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
Y ₂ and Y ₃ each independently represent —CH ₂ —, —CH ₂ CH ₂ —, —O— or —S—.
Rb _2, Rb ₃ and Rb ₄ each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group or an alkoxycarbonyl group.
n ₄ represents 0 or 1.

  (7) A resin having at least one type of repeating unit selected from repeating units having a structure represented by the following general formulas (I ′) to (III ′).

In the general formulas (I ′) to (III ′),
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.

  (8) A resin having at least one repeating unit selected from repeating units represented by the following general formulas (Ia) to (IIIa).

In general formulas (Ia) to (IIIa),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0 to 3. However, n ₁ + n ₂ is an integer of from 1 to 6.
n ₃ represents an integer of 0 to 3.

  (9) At least one selected from repeating units represented by the following general formulas (Ia ′), (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″) A resin having a repeating unit of

In the general formulas (Ia ′), (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
Y ₂ and Y ₃ each independently represent —CH ₂ —, —CH ₂ CH ₂ —, —O— or —S—.
Rb _2, Rb ₃ and Rb ₄ each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group or an alkoxycarbonyl group.
n ₄ represents 0 or 1.

  (10) A polymerizable compound having a structure represented by any one of the following general formulas (I ′) to (III ′).

In the general formulas (I ′) to (III ′),
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.

  (11) A polymerizable compound represented by any one of the following general formulas (Ib) to (IIIb).

In the general formulas (Ib) to (IIIb),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
X is, CH _2, oxygen atom, sulfur atom or -C (= O) - represents a.
Lc represents a group that forms a lactone.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0 to 3. However, n ₁ + n ₂ is an integer of from 1 to 6.
n ₃ represents an integer of 0 to 3.

(12) In any one of the following general formulas (Ib ′), (Ib ″), (IIb′-1), (IIb ″ -1), (IIIb′-1) and (IIIb ″ -1) A polymerizable compound characterized by being represented.

In the general formulas (Ib ′), (Ib ″), (IIb′-1), (IIb ″ -1), (IIIb′-1) and (IIIb ″ -1)
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
Y ₂ and Y ₃ each independently represent —CH ₂ —, —CH ₂ CH ₂ —, —O— or —S—.
Rb _2, Rb ₃ and Rb ₄ each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group or an alkoxycarbonyl group.
n ₄ represents 0 or 1.

  (13) A pattern forming method comprising a step of forming a film from the photosensitive composition according to any one of (1) to (6), and exposing and developing the film.

  According to the present invention, it is possible to provide a positive photosensitive composition having excellent resolving power and improved line edge roughness even in the formation of a fine pattern of 100 nm or less, and a pattern forming method using the same.

In addition, in the description of the group (atomic group) in this specification, the description which does not describe substitution and non-substitution includes what does not have a substituent and what has a substituent. . For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
Hereinafter, the present invention will be described in detail.

[1] (A) a group having a lactone structure, a group in which a hydroxyl group and / or a hydrogen atom of a hydroxyl group is substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group in the same repeating unit And at least one type of repeating unit selected from repeating units having a group having a lactone structure fused with a 5- or 6-membered ring, and the solubility in an alkali developer is increased by the action of an acid. The photosensitive composition of the present invention includes a group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group is substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group in the same repeating unit; A repeating unit having a group having a lactone structure (hereinafter also referred to as “repeating unit (a)”), and a lathe in which a 5- or 6-membered ring is condensed. Contains a resin having at least one type of repeating unit selected from repeating units having a group having a kuton structure (hereinafter also referred to as “repeating unit (b)”), and having increased solubility in an alkali developer by the action of an acid To do.

  Examples of the acyl group as the substituent of the hydroxyl group in the repeating unit (a) include an acyl group having 2 to 20 carbon atoms, an acyl group having a chain hydrocarbon group such as an acetyl group and a propionyl group, and cyclohexane. Examples include acyl groups having a monocyclic or polycyclic hydrocarbon group such as a carbonyl group and an adamantanecarbonyl group.

Examples of the alkyl group as the substituent for the hydroxyl group include alkyl groups having 1 to 20 carbon atoms, and linear or branched chain alkyl such as methyl group, ethyl group, propyl group, butyl group, octyl group, and dodecyl group. Groups.
Examples of the cycloalkyl group as the substituent for the hydroxyl group include a cycloalkyl group having 3 to 20 carbon atoms, a monocyclic cycloalkyl group such as a cyclopentyl group and a cyclohexyl group, an adamantyl group, a norbornyl group, and a tetracyclodecanyl group. And a polycyclic cycloalkyl group.

Examples of the acid-decomposable group as a hydroxyl group substituent include groups having a structure in which a hydroxyl group is protected with an acid-decomposable protecting group, such as an acetal group, a ketal group, a silyl ether group, and a tertiary alkyloxycarbonyl group. Or an acid-decomposable group may substitute a hydrogen atom of the hydroxyl group via a linking group.
A preferred acid-decomposable group is a group in which hydrogen atoms of two adjacent hydroxyl groups (that is, Ra ₁ and Ra ₂ described later) are combined to form a cyclic acetal or cyclic ketal structure, more preferably It is a 5-membered ring ketal structure, and more preferably, a hydrogen atom of two adjacent hydroxyl groups are combined to form a 2,2-dialkyl 1,3-dioxolane structure. Dialkyl groups on oxolane may combine to form a monocyclic or polycyclic structure.

  In the present invention, hydrogen atoms of two adjacent hydroxyl groups may be substituted with a common alkyl group, cycloalkyl group or the like.

As the lactone structure, any structure having a lactone structure can be used, but a 5-membered ring or 6-membered ring lactone structure is preferable. The lactone structure portion may or may not have a substituent. Preferred substituents include alkyl groups having 1 to 8 carbon atoms, cycloalkyl groups having 4 to 7 carbon atoms, alkoxy groups having 1 to 8 carbon atoms, alkoxycarbonyl groups having 1 to 8 carbon atoms, carboxyl groups, cyano groups, and the like. Is mentioned.
Preferable lactone structures include lactone structures represented by (LC1-1) to (LC1-12) shown below. These may have the above-mentioned substituent.

  As a structure having a lactone structure and a group having a hydroxyl group and / or a hydrogen atom of the hydroxyl group substituted by a group selected from an acyl group, an alkyl group, a cycloalkyl group and an acid-decomposable group, A structure represented by the formula (I) can be given. More preferable examples include a structure represented by the general formula (I ′), and a structure having a three-dimensional structure represented by the general formula (I′-1) is particularly preferable.

In the general formulas (I), (I ′), (I′-1),
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring or an acid-decomposable group.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0 to 3. However, n ₁ + n ₂ is an integer of from 1 to 6.
n ₃ represents an integer of 0 to 3.

The lactone in Lc is the same as the above lactone structure.
The alkyl group, cycloalkyl group, acyl group and acid-decomposable group in Ra ₁ and Ra ₂ are the same as the alkyl group, cycloalkyl group, acyl group and acid-decomposable group mentioned above as the substituent of the hydroxyl group. belongs to.
The alkyl group in Ra _{3 and} the alkyl group in Ra ₃ alkoxy group and alkoxycarbonyl group are the same as the above alkyl group.
The acyl group in the acyloxy group of Ra ₃ is the same as the above acyl group.
The any two of the group formed by bonding of ra ₁ to Ra _3, for example, can be mentioned hydrocarbon group having 3 to 20 carbon atoms, which may have an oxygen atom.
It is preferable that Ra ₁ and Ra ₂ are bonded to form a cyclic acetal structure or a cyclic ketal structure. The group formed by combining Ra ₁ and Ra ₂ is preferably an isopropylidene group, a cyclopentylidene group, a cyclohexylidene group, or an adamantylidene group.

  Examples of the repeating unit having the structure of the general formula (I) include (meth) acrylic acid ester derivatives, (meth) acrylamide derivatives, vinyl ether derivatives, olefin derivatives, and styrene derivatives having the structure of the general formula (I). Preferably it is a (meth) acrylic acid ester derivative, More preferably, it is a repeating unit represented by the following general formula (Ia), More preferably, it is a repeating unit represented by the following general (Ia '). A cycloolefin derivative represented by the following general formula (Ia ″) is also preferable.

In the general formulas (Ia), (Ia ′), (Ia ″),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring or an acid-decomposable group.
Y ₂ and Y ₃ each independently represent —CH ₂ —, —CH ₂ CH ₂ —, —O— or —S—.
Rb _2, Rb ₃ and Rb ₄ each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group or an alkoxycarbonyl group.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0 to 3. However, n ₁ + n ₂ is an integer of from 1 to 6.
n ₃ represents an integer of 0 to 3.
n ₄ represents 0 or 1.

The alkyl group of Rb ₁ and Rb _{2 to} Rb ₄ is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an n-butyl group, or a sec-butyl group. , T-butyl group and the like. Alkyl group Rb _1, Rb ₂ ~Rb ₄ may have a substituent. Examples of the substituent of the alkyl group of Rb ₁ and Rb _{2 to} Rb ₄ include a fluorine atom, a chlorine atom, and a hydroxyl group.
Examples of the alkyl group, cycloalkyl group, and acyl group in Rb _2a are the same as the alkyl group, cycloalkyl group, and acyl group previously mentioned as the substituent of the hydroxyl group.
Examples of the lactone structure in the group having the lactone structure of Rb _2a include those similar to the lactone structure described above.
Examples of the divalent linking group for Rc include an alkylene group, a cycloalkylene group, —CO ₂ —, or a group in which a plurality of these are linking groups.
Alkyl group Rb _2a, a cycloalkyl group, a divalent linking group of an acyl group, a group having a lactone structure Rb _2a, Rc may have a substituent. Alkyl group Rb _2a, the cycloalkyl group, an acyl group, a group having a lactone structure Rb _2a, substituents divalent linking group of Rc, fluorine atom, chlorine atom, and a hydroxyl group or the like.
Examples of the divalent linking group of Rc, an alkylene group or a cycloalkylene group and -CO ₂ - preferably an alkyl carboxyl linking group or a cycloalkyl carboxyl linking group and is linked group, and more preferably polycyclic cycloalkyl carboxyl linking group It is. Specific examples include an adamantyl carboxyl linking group and a norbornane carboxyl linking group.
Rc is particularly preferably a single bond. By making Rc a single bond, the glass transition temperature of the resin can be adjusted to an appropriate temperature, and the exposure latitude is improved.

  In the repeating unit having the structure of the general formula (I), a lactone structure having a specific three-dimensional structure represented by the following general formula (Ia′-1) or (Ia ″ -1) is particularly preferable as a repeating unit. The repeating unit which has can be mentioned. The resolution and line edge roughness are improved by using a lactone having a specific steric structure.

Formula (Ia'-1) in at, Rb _1, Rc, Ra ₁ and Ra ₂ are in the general formula _{(Ia), Rb 1, Rc} , and Ra ₁ and Ra ₂ synonymous.
Y ₂ , Y ₃ , Rb ₂ , Rb ₃ , Rb ₄ , Rc, Ra ₁ , Ra ₂ and n ₄ in the general formula (Ia ″ _-1 ) are the same in the general formula (Ia ″). , Y ₂ , Y ₃ , Rb ₂ , Rb ₃ , Rb ₄ , Rc, Ra ₁ , Ra ₂ and n ₄ .

Preferred specific examples of the repeating unit (a) are shown below.
In the following specific examples, it is possible to have a plurality of optical isomers, and a single optical isomer may be used, or a mixture of a plurality of optical isomers may be used. It is preferable to use the optical isomer of

  The monomer corresponding to the repeating unit (a) is preferably a monomer represented by the following general formula (Ib), more preferably a monomer represented by the following general formula (Ib ′) or (Ib ″), Even more preferably, it is a monomer having a lactone structure having a specific steric structure represented by the following general formula (Ib′-1) or (Ib ″ -1).

In the general formulas (Ib), (Ib ′), (Ib ″), (Ib′-1) and (Ib ″ -1),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring or an acid-decomposable group.
Y ₂ and Y ₃ each independently represent —CH ₂ —, —CH ₂ CH ₂ —, —O— or —S—.
Rb _2, Rb ₃ and Rb ₄ each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group or an alkoxycarbonyl group.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0 to 3. However, n ₁ + n ₂ is an integer of from 1 to 6.
n ₃ represents an integer of 0 to 3.
n ₄ represents 0 or 1.

  Preferred specific examples of the monomer corresponding to the repeating unit (a) are shown below.

The 5- or 6-membered ring formed by condensed ring in the repeating unit (b) may contain a hetero atom such as an oxygen atom or a sulfur atom in the atom forming the ring, or a double bond. Specifically, cyclohexane ring, cyclopentane ring, tetrahydrofuran ring, tetrahydropyran ring, cyclohexene ring, cyclopentene ring, dihydrofuran ring, dihydropyran ring, tetrahydrothiophene ring, dihydrothiophene ring, etc. Is mentioned.

  Examples of the lactone structure in which a 5- or 6-membered ring is condensed include structures represented by the following general formula (II) or (III).

In general formulas (II) and (III),
Lc represents a group that forms a lactone.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
When Ra ₃ is in plurality, any two of the plurality of Ra ₃ may be bonded to each other to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n ₃ represents an integer of 0 to 3.

Formula (II), (III) in at Lc, Ra _3, n ₃ are the same as the general formula in the _{(I) Lc, Ra 3,} n 3.
As the lactone structure formed by Lc, a 5- or 6-membered ring lactone is preferable.
The lactones represented by the general formulas (II) and (III) are more preferably lactones represented by the following general formula (II ′) or (III ′), and more preferably the following general formula (II′-1) or A lactone having a specific steric structure represented by (III′-1), more preferably a lactone in which X ₁ is —CH ₂ — in the general formulas (II′-1) and (III′-1) It is.

Formula (II '), (III' ), (II'-1) and (III'-1) in at, X ₁ has the same meaning as X ₁ in the general formula (II).

  Preferred examples of the repeating unit having the structure represented by the general formula (II) or (III) include the repeating units represented by the following general formula (IIa) or (IIIa). A repeating unit in which the α-position is bonded is more preferable.

In general formulas (IIa) and (IIIa),
Rb ₁ represents a hydrogen atom, an alkyl group, or —CH ₂ —O—Rb ₂ . In the formula, Rb ₂ represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Lc represents a group that forms a lactone.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
When Ra ₃ is in plurality, any two of the plurality of Ra ₃ may be bonded to each other to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n ₃ represents an integer of 0 to 3.

Formula (IIa), in Lc, Ra _3, n ₃ in (IIIa) is the same as the general formula in the _{(I) Lc, Ra 3,} n 3.
Formula (IIa), in Rb _1, Rc in (IIIa) are those formula similar to the in Rb _1, Rc in (Ia).

  More preferred examples of the repeating unit having the structure represented by the general formula (II) or (III) include the repeating unit represented by the following general formula (IIa-1) or (IIIa-1).

In general formulas (IIa-1) and (IIIa-1),
Rb ₁ represents a hydrogen atom, an alkyl group, or —CH ₂ —O—Rb ₂ . In the formula, Rb ₂ represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
When Ra ₃ is in plurality, any two of the plurality of Ra ₃ may be bonded to each other to form a ring.
X ₂ represents a single bond or —CH ₂ —.
X ₃ represents a single bond or —CH ₂ —.
X ₄ represents a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
X ₅ is a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
The sum of the number of atoms excluding the hydrogen atoms of X ₄ and X ₅ is 1 or 2.
n ₃ represents an integer of 0 to 3.
As a combination of X _{2 to} X ₅ , X _{2 to} X ₄ are single bonds, X ₅ is —CH ₂ —, and X _{2 to} X ₄ are single bonds, and X ₅ is —CH ₂ —CH _2. A combination that is-is preferred.

Formula (IIa-1), in Ra _3, n ₃ in (IIIa-1) is the same as the general formula in the _{(I) Ra 3, n 3} .
Formula (IIa-1), in the _{(IIIa-1) Rb 1,} Rc is the general formula similar to the in Rb _1, Rc in (Ia).

  The repeating unit having a structure represented by the general formula (II) or (III) is more preferably a repeating unit represented by the following general formula (IIa ′) or (IIIa ′). Moreover, the cycloolefin derivative represented by the following general formula (IIa '') or (IIIa '') is also preferable.

In the general formula (IIa ') and _{(IIIa'), Rb 1,} Rc, X 1 is in the general formula _{(IIa), Rb 1, Rc} , and X ₁ synonymous.
In the general formulas (IIa ″) and (IIIa ″), Y ₂ , Y ₃ , Rb ₂ , Rb ₃ , Rb ₄ , Rc and n ₄ are the same as Y in the general formula (Ia ″). ₂ , Y ₃ , Rb ₂ , Rb ₃ , Rb ₄ , Rc and n _4, and X ₁ in the general formulas (IIa ″) and (IIIa ″) is the same as that in the general formula (IIa). in the same meaning as X _1.

  The repeating unit having a structure represented by the general formula (II) or (III) is particularly preferably the following general formula (IIa′-1), (IIa ″ -1), (IIIa′-1) or ( It is a repeating unit having a lactone structure having a specific three-dimensional structure represented by IIIa ″ -1). The resolution and line edge roughness are improved by using a lactone having a specific steric structure.

Formula (IIa'-1) and (IIIa'-1) in at, Rb _1, Rc, X ₁ is in the general formula _{(IIa), Rb 1, Rc} , and X ₁ synonymous.
Y ₂ , Y ₃ , Rb ₂ , Rb ₃ , Rb ₄ , Rc and n ₄ in the general formulas (IIa ″ -1) and (IIIa ″ -1) are the same as those in the general formula (Ia ″). Are the same as Y ₂ , Y ₃ , Rb ₂ , Rb ₃ , Rb ₄ , Rc and n _4, and X _{1 in the} general formulas (IIa ″ -1) and (IIIa ″ -1) Is synonymous with X _{1 in} formula (IIa).

Preferred examples of the repeating unit having a lactone structure represented by the general formula (II) are shown below.

  Preferred examples of the repeating unit having a lactone structure represented by the general formula (III) are shown below.

  As the monomer corresponding to the repeating unit (b), monomers represented by the following general formulas (IIb) and (IIIb) are preferable, and monomers represented by the following general formulas (IIb ′) and (IIIb ′) are more preferable. It is.

In the general formula (IIb), (IIIb) Rb 1, Rc, Lc, X 1, Ra 3, n 3 is the general formula (IIa), in Rb ₁ to (IIIa), Rc, Lc, X 1 , Ra ₃ and n ₃ are the same.

In the general formulas (IIb ′) and (IIIb ′), Rb ₁ , Rc, Ra ₃ , n ₃ , X ₂ , X ₃ , X ₄ and X ₅ represent the general formulas (IIa-1) and (IIIa-1) Rb ₁ , Rc, Ra ₃ , n ₃ , X ₂ , X ₃ , X ₄ , X ₅ are the same as those in FIG.

  The monomer corresponding to the repeating unit (b) is more preferably represented by the following general formula (IIb′-1), (IIb ″ -1), (IIIb′-1) or (IIIb ″ -1). The following general formula (IIb′-2), (IIb ″ -2), (IIIb′-2) or (IIIb ″ -2) having a lactone structure having a specific steric structure is particularly preferable. It is a monomer represented by.

In the general formulas (IIb′-1), (IIIb′-1), (IIb′-2) and (IIIb′-2), Rb ₁ , Rc and X ₁ in the general formula (IIa) , Rb ₁ , Rc, and X ₁ .
Y ₂ , Y ₃ , Rb ₂ , Rb ₃ , Rb in the general formulas (IIb ″ -1), (IIIb ″ -1), (IIb ″ -2) and (IIIb ″ -2) _4, Rc and n ₄ have the general formula (Ia '') to at a same meaning as _{Y 2, Y 3, Rb 2} , Rb 3, Rb 4, Rc and n _4, the general formula (IIb '' - 1), X ₁ in (IIIb ″ -1), (IIb ″ -2) and (IIIb ″ -2) has the same meaning as X _{1 in} formula (IIa).

  Hereinafter, although the specific example of a monomer represented by general formula (IIb) is given, this invention is not limited to this.

  Hereinafter, although the specific example of a monomer represented by general formula (IIIb) is given, this invention is not limited to this.

The lactone structure of the resin of the present invention includes a 5- or 6-membered ring at the β and γ positions of a 5-membered lactone as represented by the following general formula (I ′), (II ′) or (III ′). When one having a condensed structure is used, it is particularly excellent in resolving power and line edge roughness, and is represented by the following general formulas (I′-1), (II′-1), and (III′-1). Thus, by having a specific three-dimensional structure, a higher effect can be obtained.

  Monomers corresponding to the repeating units (a) and (b) are obtained by reacting the corresponding hydroxylactone with, for example, (meth) acrylic anhydride, (meth) acrylic chloride, etc. under basic conditions. be able to. Hydroxylactone is described in, for example, the method described in Tetrahedron, (1987), p415; Chem. Soc. PERKIN Trans. 1. (1993), method described in p313, Tetrahedron, (1994), method described in p10265, Org. Chem, (1952), p600, and the like.

The resin used in the photosensitive composition of the present invention has an acid-decomposable group (hereinafter also referred to as “acid-decomposable group”) in the main chain or side chain of the resin, or in both the main chain and side chain. Resin.
A preferred group that can be decomposed with an acid is a group in which the hydrogen atom of the —COOH group is substituted with a group capable of leaving with an acid.
The acid-decomposable group is preferably a cumyl ester group, an enol ester group, an acetal ester group, a tertiary alkyl ester group or the like. More preferably, it is a tertiary alkyl ester group.

  Resins whose solubility in an alkaline developer is increased by the action of an acid include repeating units having a partial structure containing an alicyclic hydrocarbon represented by the following general formulas (pI) to (pVI) and the following general formula (II- A resin containing at least one selected from the group of repeating units represented by AB) is preferred.

(Wherein R ₁₁ represents a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group or a sec-butyl group, and Z represents an alicyclic hydrocarbon group together with a carbon atom. Represents the atomic group necessary to form.
R _{12 to} R ₁₆ each independently represents a linear or branched alkyl group or alicyclic hydrocarbon group having 1 to 4 carbon atoms, provided that at least one of R _{12 to} R ₁₄ , or Either R ₁₅ or R ₁₆ represents an alicyclic hydrocarbon group.
R _{17 to} R ₂₁ each independently represents a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, or an alicyclic hydrocarbon group, provided that at least one of R _{17 to} R ₂₁ Represents an alicyclic hydrocarbon group. Further, either R ₁₉ or R ₂₁ represents a linear or branched alkyl group or alicyclic hydrocarbon group having 1 to 4 carbon atoms.
R _{22 to} R ₂₅ each independently represents a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, or an alicyclic hydrocarbon group, provided that at least one of R _{22 to} R ₂₅ Represents an alicyclic hydrocarbon group. R ₂₃ and R ₂₄ may be bonded to each other to form a ring. )

In formula (II-AB):
R ₁₁ ′ and R ₁₂ ′ each independently represents a hydrogen atom, a cyano group, a halogen atom, or an alkyl group.
Z ′ represents an atomic group for forming an alicyclic structure containing two bonded carbon atoms (C—C).

  The general formula (II-AB) is more preferably the following general formula (II-A) or general formula (II-B).

In formulas (II-A) and (II-B):
R ₁₃ ′ to R ₁₆ ′ each independently represents a hydrogen atom, a halogen atom, a cyano group, —COOH, —C
OOR _{5 represents} a group decomposable by the action of an acid, —C (═O) —XA′—R ₁₇ ′, an alkyl group or a cyclic hydrocarbon group. At least two of R ₁₃ ′ to R ₁₆ ′ may combine to form a ring.
Wherein, R ₅ represents an alkyl group, cyclic hydrocarbon group, or -Y group shown below.
X represents an oxygen atom, a sulfur atom, -NH -, - NHSO ₂ - or an -NHSO ₂ NH-.
A ′ represents a single bond or a divalent linking group.
R ₁₇ ′ represents —COOH, —COOR ₅ , —CN, a hydroxyl group, an alkoxy group, —CO—NH—R ₆ , —CO—NH—SO ₂ —R ₆ or the following —Y group.
R ₆ represents an alkyl group or a cyclic hydrocarbon group.
n represents 0 or 1.
The -Y group;

(In the —Y group, R ₂₁ ′ to R ₃₀ ′ each independently represents a hydrogen atom or an alkyl group. A and b represent 1 or 2.)

In the general formulas (pI) to (pVI), the alkyl group in R _{12 to} R ₂₅ may be substituted or unsubstituted, and is a linear or branched alkyl group having 1 to 4 carbon atoms. Represents. Examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group.
Further, the further substituent of the alkyl group includes an alkoxy group having 1 to 4 carbon atoms, a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an acyl group, an acyloxy group, a cyano group, a hydroxyl group, A carboxy group, an alkoxycarbonyl group, a nitro group, etc. can be mentioned.

The alicyclic hydrocarbon group in R _{11 to} R _{25 or} the alicyclic hydrocarbon group formed by Z and a carbon atom may be monocyclic or polycyclic. Specific examples include groups having a monocyclo, bicyclo, tricyclo, tetracyclo structure or the like having 5 or more carbon atoms. The carbon number is preferably 6-30, and particularly preferably 7-25. These alicyclic hydrocarbon groups may have a substituent.

  Preferred examples of the alicyclic hydrocarbon group include an adamantyl group, a noradamantyl group, a decalin residue, a tricyclodecanyl group, a tetracyclododecanyl group, a norbornyl group, a cedrol group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Group, cyclodecanyl group, and cyclododecanyl group. More preferred are an adamantyl group, a decalin residue, a norbornyl group, a cedrol group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a cyclodecanyl group, and a cyclododecanyl group.

Examples of the substituent for these alicyclic hydrocarbon groups include an alkyl group, a halogen atom, a hydroxyl group, an alkoxy group, a carboxyl group, and an alkoxycarbonyl group. The alkyl group is preferably a lower alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group or a butyl group, more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group. Examples of the alkoxy group include those having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group. The alkyl group and alkoxy group may further have a substituent. Examples of further substituents on the alkyl group and alkoxy group include a hydroxyl group, a halogen atom, and an alkoxy group.

The structures represented by the general formulas (pI) to (pVI) in the resin can be used for protecting alkali-soluble groups. Examples of the alkali-soluble group include various groups known in this technical field.
Specific examples include a carboxylic acid group, a sulfonic acid group, a phenol group, and a thiol group, and a carboxylic acid group and a sulfonic acid group are preferable.
As the alkali-soluble group protected by the structure represented by the general formulas (pI) to (pVI) in the above resin, the hydrogen atom of the carboxyl group is preferably substituted with the structure represented by the general formula (pI) to (PVI). Structure.

  As the repeating unit having an alkali-soluble group protected by the structure represented by the general formulas (pI) to (pVI), a repeating unit represented by the following general formula (pA) is preferable.

Here, R represents a hydrogen atom, a halogen atom, or a linear or branched alkyl group having 1 to 4 carbon atoms. A plurality of R may be the same or different.
A is a single bond, a group selected from the group consisting of an alkylene group, an ether group, a thioether group, a carbonyl group, an ester group, an amide group, a sulfonamide group, a urethane group, or a urea group, or a combination of two or more groups. Represents. The alkylene group may further have a substituent.
Ra represents any group of the above formulas (pI) to (pVI).

  The repeating unit represented by the general formula (pA) is most preferably a repeating unit of 2-alkyl-2-adamantyl (meth) acrylate and dialkyl (1-adamantyl) methyl (meth) acrylate.

  Specific examples of the repeating unit represented by the general formula (pA) are shown below.

In the general formula (II-AB), R ₁₁ ′ and R ₁₂ ′ each independently represent a hydrogen atom, a cyano group, a halogen atom, or an alkyl group.
Z ′ represents an atomic group for forming an alicyclic structure containing two bonded carbon atoms (C—C).

Examples of the halogen atom in R ₁₁ ′ and R ₁₂ ′ include a chlorine atom, a bromine atom, a fluorine atom, and an iodine atom.
The alkyl group for R ₁₁ ′ and R ₁₂ ′ is preferably a linear or branched alkyl group having 1 to 10 carbon atoms, more preferably a linear or branched alkyl group having 1 to 6 carbon atoms. More preferred are a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group.

  The alkyl group may further have a substituent. Examples of the further substituent of the alkyl group include a hydroxyl group, a halogen atom, a carboxyl group, an alkoxy group, an acyl group, a cyano group, and an acyloxy group. Examples of the halogen atom include a chlorine atom, a bromine atom, a fluorine atom, and an iodine atom. Examples of the alkoxy group include those having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group. Examples of the acyl group include a formyl group and an acetyl group, and examples of the acyloxy group include an acetoxy group.

The atomic group for forming the alicyclic structure of Z ′ is an atomic group that forms a repeating unit of an alicyclic hydrocarbon in a resin, and in particular, forms a repeating unit of a bridged alicyclic hydrocarbon. An atomic group for forming a bridged alicyclic structure is preferred.
Examples of the skeleton of the alicyclic hydrocarbon formed include the same alicyclic hydrocarbon groups as R _{11 to} R _{25 in} the general formulas (pI) to (pVI).

The alicyclic hydrocarbon skeleton may have a substituent. Examples of such a substituent include R ₁₃ ′ to R ₁₆ ′ in the general formula (II-A) or (II-B).
Among the repeating units having the bridged alicyclic hydrocarbon, the repeating unit represented by the general formula (II-A) or (II-B) is more preferable.

In the acid-decomposable resin according to the present invention, the acid-decomposable group may be contained in the aforementioned —C (═O) —XA′—R ₁₇ ′ or Z ′ in the general formula (II-AB). May be included as a substituent.
The structure of the acid-decomposable group is represented by —C (═O) —X ₁ —R ₀ .
In the formula, R ₀ is a tertiary alkyl group such as t-butyl group or t-amyl group, isobornyl group, 1-ethoxyethyl group, 1-butoxyethyl group, 1-isobutoxyethyl group, 1-cyclohexyloxy. 1-alkoxyethyl group such as ethyl group, 1-methoxymethyl group, alkoxymethyl group such as 1-ethoxymethyl group, 3-oxoalkyl group, tetrahydropyranyl group, tetrahydrofuranyl group, trialkylsilyl ester group, 3- An oxocyclohexyl ester group, a 2-methyl-2-adamantyl group, a mevalonic lactone residue and the like can be mentioned. X ₁ has the same meaning as X above.

Examples of the halogen atom in R ₁₃ ′ to R ₁₆ ′ include a chlorine atom, a bromine atom, a fluorine atom, and an iodine atom.

The alkyl group in R ₅ , R ₆ , R ₁₃ ′ to R ₁₆ ′, R ₂₁ ′ to R ₃₀ ′ is preferably a linear or branched alkyl group having 1 to 10 carbon atoms, more preferably carbon. A linear or branched alkyl group of several to six, more preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, or a t-butyl group. is there.

Examples of the cyclic hydrocarbon group in R ₅ , R ₆ and R ₁₃ ′ to R ₁₆ ′ include a cyclic alkyl group and a bridged hydrocarbon group, such as a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, an adamantyl group, 2- List methyl-2-adamantyl group, norbornyl group, boronyl group, isobornyl group, tricyclodecanyl group, dicyclopentenyl group, nobornane epoxy group, menthyl group, isomenthyl group, neomenthyl group, tetracyclododecanyl group, etc. Can do.
Examples of the ring formed by combining at least two of R ₁₃ ′ to R ₁₆ ′ include rings having 5 to 12 carbon atoms such as cyclopentene, cyclohexene, cycloheptane, and cyclooctane.

Examples of the alkoxy group for R ₁₇ ′ include those having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group.

The alkyl group, cyclic hydrocarbon group, and alkoxy group may further have a substituent. Examples of further substituents on the alkyl group, cyclic hydrocarbon group, and alkoxy group include a hydroxyl group, a halogen atom, a carboxyl group, an alkoxy group, an acyl group, a cyano group, an acyloxy group, an alkyl group, and a cyclic hydrocarbon group. it can. Examples of the halogen atom include a chlorine atom, a bromine atom, a fluorine atom, and an iodine atom. Examples of the alkoxy group include those having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group and a butoxy group. Examples of the acyl group include a formyl group and an acetyl group. Examples thereof include an acetoxy group.
Examples of the alkyl group and cyclic hydrocarbon group include those listed above.

  The divalent linking group for A ′ is one or two selected from the group consisting of an alkylene group, an ether group, a thioether group, a carbonyl group, an ester group, an amide group, a sulfonamide group, a urethane group, and a urea group. Combinations of the above groups can be mentioned. The alkylene group may have a substituent.

  In the acid-decomposable resin according to the present invention, the group capable of decomposing by the action of an acid is a repeating unit having a partial structure containing an alicyclic hydrocarbon represented by the general formula (pI) to general formula (pVI), It can be contained in at least one repeating unit among the repeating unit represented by the formula (II-AB) and the repeating unit of the copolymerization component described later.

Various substituents of R ₁₃ ′ to R ₁₆ ′ in the general formula (II-A) or the general formula (II-B) are atomic groups for forming an alicyclic structure in the general formula (II-AB). Or it becomes a substituent of atomic group Z for forming a bridged alicyclic structure.

  Specific examples of the repeating unit represented by the general formula (II-A) or the general formula (II-B) include the following, but the present invention is not limited to these specific examples.

  The acid-decomposable resin of the present invention can have a repeating unit having a lactone group in addition to the repeating unit having a group represented by the general formula (I). Preferably, it is a repeating unit having a group having a lactone structure represented by any of the following general formula (Lc) or the following general formulas (V-1) to (V-5), and the group having a lactone structure is a main chain. It may be directly bonded to.

In general formula (Lc), Ra ₁ , Rb ₁ , Rc ₁ , Rd ₁ , and Re ₁ each independently represent a hydrogen atom or an alkyl group. m and n each independently represents an integer of 0 to 3, and m + n is 2 or more and 6 or less.

In the general formulas (V-1) to (V-5), R _{1b to} R _5b each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an alkylsulfonylimino group, or an alkenyl group. Represents. Two of R _{1b to} R _5b may combine to form a ring.

R _{1 to} Re ₁ alkyl groups in general formula (Lc) and R _{1b to} R _5b alkyl groups, alkoxy groups, alkoxycarbonyl groups, alkyl groups in general formulas (V-1) to (V-5) Examples of the alkyl group in the sulfonylimino group include linear and branched alkyl groups, which may have a substituent.

As the repeating unit having a group having a lactone structure represented by general formula (Lc) or any one of general formulas (V-1) to (V-5), the above general formula (II-A) or (II- B) wherein at least one of R ₁₃ ′ to R ₁₆ ′ has a group represented by general formula (Lc) or general formula (V-1) to (V-5) (for example, R in —COOR ₅ ) ₅ represents a group represented by general formula (Lc) or general formulas (V-1) to (V-5)), or a repeating unit represented by the following general formula (AI).

In general formula (AI), R _b0 represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.
Examples of the halogen atom for R _b0 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. R _b0 is preferably a hydrogen atom.
A ′ represents a single bond, an ether group, an ester group, a carbonyl group, an alkylene group, or a divalent group obtained by combining these.
B ₂ represents a group represented by any one of general formula (Lc) and general formulas (V-1) to (V-5).

  Specific examples of the repeating unit having a group having a lactone structure are shown below, but the present invention is not limited thereto.

  The acid-decomposable resin of the present invention may contain a repeating unit having a group represented by the following general formula (VII).

In general formula (VII), R ₂ c to R ₄ c each independently represents a hydrogen atom or a hydroxyl group. However, at least one of R ₂ c to R ₄ c represents a hydroxyl group.

  The group represented by the general formula (VII) is preferably a dihydroxy form or a monohydroxy form, and more preferably a dihydroxy form.

As the repeating unit having a group represented by the general formula (VII), at least one of R ₁₃ ′ to R ₁₆ ′ in the general formula (II-A) or (II-B) is the above general formula (VII ) (For example, R _{5 in} —COOR ₅ represents a group represented by the general formula (VII)), or a repeating unit represented by the following general formula (AII). it can.

In general formula (AII), R ₁ c represents a hydrogen atom or a methyl group.
R ₂ c to R ₄ c each independently represents a hydrogen atom or a hydroxyl group. However, at least one of R ₂ c to R ₄ c represents a hydroxyl group. _{Two of} R ₂ c to R ₄ c are preferably hydroxyl groups.

  Although the specific example of the repeating unit which has a structure represented by general formula (AII) below is given, it is not limited to these.

The acid-decomposable resin of the present invention may have a repeating unit having an alkali-soluble group.
The alkali-soluble group is preferably a carboxyl group, specifically, a repeating unit in which a carboxyl group is directly bonded to the main chain of methacrylic acid, acrylic acid, etc., and a carboxyl by adamantane-3-carboxylic acid-1- (meth) acrylate, etc. Examples include a repeating unit in which a group is bonded to the main chain via an alicyclic linking group.

  The acid-decomposable resin of the present invention may have a repeating unit represented by the following general formula (VIII).

In the general formula (VIII), Z ₂ represents —O— or —N (R ₄₁ ) —. Here, R ₄₁ represents a hydrogen atom, a hydroxyl group, an alkyl group, or —OSO ₂ —R ₄₂ . R ₄₂ represents an alkyl group, a cycloalkyl group or a camphor residue. The alkyl group may be substituted with a halogen atom or the like.

  Specific examples of the repeating unit represented by the general formula (VIII) include the following [I′-1] to [I′-7], but the present invention is not limited to these specific examples. .

  In addition to the above repeating structural units, the acid-decomposable resin of the present invention has dry etching resistance, standard developer suitability, substrate adhesion, resist profile, and general required properties of resist, resolving power, heat resistance, sensitivity. Various repeating structural units can be contained for the purpose of adjusting the above.

Examples of such repeating structural units include, but are not limited to, repeating structural units corresponding to the following monomers.
Thereby, the performance required for the acid-decomposable resin, in particular,
(1) Solubility in coating solvent,
(2) Film formability (glass transition point),
(3) Alkali developability,
(4) Membrane slip (hydrophobic, alkali-soluble group selection),
(5) Adhesion of unexposed part to substrate,
(6) Dry etching resistance,
Etc. can be finely adjusted.
As such a monomer, for example, a compound having one addition polymerizable unsaturated bond selected from acrylic acid esters, methacrylic acid esters, acrylamides, methacrylamides, allyl compounds, vinyl ethers, vinyl esters, etc. Etc.

  In addition, any addition-polymerizable unsaturated compound that can be copolymerized with monomers corresponding to the above various repeating structural units may be copolymerized.

  In acid-decomposable resins, the molar ratio of each repeating structural unit is the resist dry etch resistance, standard developer suitability, substrate adhesion, resist profile, and general resist performance required for resolving power, heat resistance, and sensitivity. It is set appropriately in order to adjust etc.

The following are mentioned as a preferable aspect of the acid-decomposable resin of the present invention.
(1) Containing a repeating unit having a partial structure containing an alicyclic hydrocarbon represented by the general formulas (pI) to (pVI) (side chain type)
(2) Containing repeating units represented by general formula (II-AB) (main chain type)
However, in (2), for example, the following can be further mentioned.
(3) A repeating unit represented by the general formula (II-AB), a maleic anhydride derivative and a (meth) acrylate structure (hybrid type)

In the acid-decomposable resin, the content of the repeating unit (a) or the repeating unit (b) is preferably 10 to 70 mol%, more preferably 20 to 65 mol%, still more preferably 25 to 50 mol in all repeating units. %.
In the acid-decomposable resin, the content of the repeating unit having an acid-decomposable group is preferably 10 to 70 mol%, more preferably 20 to 65 mol%, still more preferably 25 to 60 mol% in all repeating structural units. is there.
In the acid-decomposable resin, the content of the repeating unit having a partial structure containing an alicyclic hydrocarbon represented by general formulas (pI) to (pVI) is preferably 20 to 70 mol% in all repeating structural units, More preferably, it is 24-65 mol%, More preferably, it is 28-60 mol%.
In the acid-decomposable resin, the content of the repeating unit represented by the general formula (II-AB) is preferably 10 to 60 mol%, more preferably 15 to 55 mol%, still more preferably 20 in all repeating structural units. ˜50 mol%.

In addition, the content of the repeating structural unit based on the monomer of the further copolymer component in the resin can also be appropriately set according to the performance of the desired resist. 99 mol% with respect to the total number of moles of the repeating structural unit having a partial structure containing the alicyclic hydrocarbon represented by (pVI) and the repeating unit represented by the above general formula (II-AB) The following is preferable, more preferably 90 mol% or less, still more preferably 80 mol% or less.
When the composition of the present invention is for ArF exposure, the resin preferably has no aromatic group from the viewpoint of transparency to ArF light.

The acid-decomposable resin used in the present invention can be synthesized according to a conventional method (for example, radical polymerization). For example, as a general synthesis method, monomer species are charged into a reaction vessel in a batch or in the course of reaction, and this is added to a reaction solvent, for example, cyclic ethers such as tetrahydrofuran and 1,4-dioxane, methyl ethyl ketone, methyl isobutyl. Ketones, ketones such as cyclohexanone, and the composition of the present invention such as propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether, which will be described later, are uniformly dissolved in a solvent, and then inert gas such as nitrogen or argon. Polymerization is started using a commercially available radical initiator (azo initiator, peroxide, etc.) as necessary under an atmosphere. If desired, an initiator is added or added in portions, and after completion of the reaction, it is put into a solvent and a desired polymer is recovered by a method such as powder or solid recovery. The concentration of the reaction is 10% by mass or more, preferably 15% by mass or more, and more preferably 20% by mass or more. The reaction temperature is 10 ° C to 150 ° C, preferably 30 ° C to 120 ° C, more preferably 50-100 ° C.

The repeating structural units represented by the above specific examples may be used singly or in combination.
In the present invention, the resins may be used alone or in combination.

  The acid-decomposable resin can have a plurality of optical isomers in the repeating unit (a) or the repeating unit (b), and a single optical isomer may be used, or a plurality of optical isomers may be used. A mixture of isomers may be used, but a single optical isomer is preferably used.

The weight average molecular weight of the resin according to the present invention is preferably 1,000 to 200,000, more preferably 3,000 to 20,000, as a polystyrene converted value by the GPC method. By setting the weight average molecular weight to 1,000 to 200,000, deterioration of heat resistance and dry etching resistance can be prevented, developability is deteriorated, and viscosity is increased, resulting in deterioration of film forming property. Can be prevented.
The molecular weight distribution is usually 1 to 5, preferably 1 to 4, more preferably 1 to 3. The smaller the molecular weight distribution, the better the resolution and the resist shape, and the smoother the side wall of the resist pattern, the better the roughness.

  In the photosensitive composition of the present invention, the blending amount of all the resins according to the present invention in the entire composition is preferably 40 to 99.99% by mass, more preferably 50 to 99.97% by mass in the total solid content. It is.

[2] Compound that generates acid upon irradiation with actinic rays or radiation (component B)
The photosensitive composition of the present invention preferably contains a compound that generates an acid upon irradiation with actinic rays or radiation.
Examples of such photoacid generators include photoinitiators for photocationic polymerization, photoinitiators for photoradical polymerization, photodecolorants for dyes, photochromic agents, actinic rays used in microresists, etc. Known compounds that generate an acid upon irradiation with radiation and mixtures thereof can be appropriately selected and used.

  Examples thereof include diazonium salts, phosphonium salts, sulfonium salts, iodonium salts, imide sulfonates, oxime sulfonates, diazodisulfones, disulfones, and o-nitrobenzyl sulfonates.

Further, a group that generates an acid upon irradiation with these actinic rays or radiation, or a compound in which a compound is introduced into the main chain or side chain of the polymer, for example, US Pat. No. 3,849,137, German Patent No. 3914407. JP, 63-26653, JP, 55-164824, JP, 62-69263, JP, 63-146038, JP, 63-163452, JP, 62-153853, The compounds described in JP-A 63-146029 can be used.

  Furthermore, compounds capable of generating an acid by light described in US Pat. No. 3,779,778, European Patent 126,712 and the like can also be used.

  Among the compounds that can be used and decomposed by irradiation with actinic rays or radiation, preferred compounds include compounds represented by the following general formulas (ZI), (ZII), and (ZIII). it can.

In the above general formula (ZI),
R ₂₀₁ , R ₂₀₂ and R ₂₀₃ each independently represents an organic group.
X ⁻ represents a non-nucleophilic anion, preferably sulfonate anion, carboxylate anion, bis (alkylsulfonyl) amide anion, tris (alkylsulfonyl) methide anion, BF ₄ —, PF ₆ —, SbF ₆ — and the like. Preferably, it is an organic anion containing a carbon atom.

  Preferable organic anions include organic anions represented by the following formula.

Rc ₁ represents an organic group.

Examples of the organic group for Rc ₁ include those having 1 to 30 carbon atoms, and preferably an alkyl group, a cycloalkyl group, an aryl group, or a plurality thereof is a single bond, —O—, —CO ₂ —, —S—. , —SO ₃ —, —SO ₂ N (Rd ₁ ) — and the like.
Rd ₁ represents a hydrogen atom or an alkyl group.
Rc ₃ , Rc ₄ and Rc ₅ each independently represents an organic group.
Examples of the organic group of Rc ₃ , Rc ₄ , and Rc ₅ are preferably the same as the preferable organic group in Rc ₁ , and most preferably a perfluoroalkyl group having 1 to 4 carbon atoms.
Rc ₃ and Rc ₄ may combine to form a ring.
Examples of the group formed by combining Rc ₃ and Rc ₄ include an alkylene group and an arylene group. A perfluoroalkylene group having 2 to 4 carbon atoms is preferred.
The organic group of Rc _1, Rc ₃ -Rc _5, most preferably 1-position fluorine atom or an alkyl group substituted with a fluoroalkyl group, a phenyl group substituted with a fluorine atom or a fluoroalkyl group. By having a fluorine atom or a fluoroalkyl group, the acidity of the acid generated by light irradiation is increased and the sensitivity is improved.

The carbon number of the organic group as R ₂₀₁ , R ₂₀₂ and R ₂₀₃ is generally 1-30, preferably 1-20.
Two of R _{201 to} R ₂₀₃ may be bonded to form a ring structure, and the ring may contain an oxygen atom, a sulfur atom, an ester bond, an amide bond, or a carbonyl group.
The two of the group formed by bonding of the R ₂₀₁ to R _203, there can be mentioned an alkylene group (e.g., butylene, pentylene).
Specific examples of the organic group as R ₂₀₁ , R ₂₀₂ and R ₂₀₃ include corresponding groups in the compounds (Z1-1), (Z1-2) and (Z1-3) described later.

In addition, the compound which has two or more structures represented by general formula (Z1) may be sufficient. For example, the general formula at least one of R ₂₀₁ to R ₂₀₃ of a compound represented by (Z1) is at least one bond with structure of R ₂₀₁ to R ₂₀₃ of another compound represented by formula (Z1) It may be a compound.

  As more preferred (Z1) component, compounds (Z1-1), (Z1-2), and (Z1-3) described below can be exemplified.

Compound (Z1-1) is at least one of the aryl groups R ₂₀₁ to R ₂₀₃ in formula (Z1), arylsulfonium compound, i.e., a compound having arylsulfonium as a cation.
Arylsulfonium compound, all of R ₂₀₁ to R ₂₀₃ may be an aryl group or a part of R ₂₀₁ to R ₂₀₃ is an aryl group and the remainder may be an alkyl group or a cycloalkyl group.
Examples of the arylsulfonium compound include triarylsulfonium compounds, diarylalkylsulfonium compounds, aryldialkylsulfonium compounds, diarylcycloalkylsulfonium compounds, and aryldicycloalkylsulfonium compounds.
The aryl group of the arylsulfonium compound is preferably a phenyl group, a naphthyl group, or an indole residue, more preferably a phenyl group or an indole residue. When the arylsulfonium compound has two or more aryl groups, the two or more aryl groups may be the same or different.
The alkyl group that the arylsulfonium compound has as necessary is preferably a linear or branched alkyl group having 1 to 15 carbon atoms, such as a methyl group, an ethyl group, a propyl group, an n-butyl group, sec- Examples thereof include a butyl group and a t-butyl group.
The cycloalkyl group that the arylsulfonium compound has as necessary is preferably a cycloalkyl group having 3 to 15 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, and a cyclohexyl group.
Aryl group, alkyl group of R ₂₀₁ to R _203, cycloalkyl group, an alkyl group (for example, 1 to 15 carbon atoms), a cycloalkyl group (for example, 3 to 15 carbon atoms), an aryl group (for example, 6 to 14 carbon atoms) , An alkoxy group (for example, having 1 to 15 carbon atoms), a halogen atom, a hydroxyl group, or a phenylthio group may be substituted. Preferred substituents are straight chain, branched alkyl groups having 1 to 12 carbon atoms, cycloalkyl groups having 3 to 12 carbon atoms, straight chain, branched or cyclic alkoxy groups having 1 to 12 carbon atoms, and most preferably They are a C1-C4 alkyl group and a C1-C4 alkoxy group. The substituent may be substituted with any one of the three R _{201 to} R ₂₀₃ , or may be substituted with all three. When R _{201 to} R ₂₀₃ are an aryl group, the substituent is preferably substituted at the p-position of the aryl group.

Next, the compound (Z1-2) will be described.
Compound (Z1-2) is a compound in the case where R _{201 to} R ₂₀₃ in formula (Z1) each independently represents an organic group not containing an aromatic ring. Here, the aromatic ring includes an aromatic ring containing a hetero atom.
The organic group having no aromatic ring as R ₂₀₁ to R ₂₀₃ generally has 1 to 30 carbon atoms, preferably 1 to 20 carbon atoms.
R _{201 to} R ₂₀₃ are each independently preferably an alkyl group, a cycloalkyl group, a linear, branched, or cyclic 2-oxoalkyl group, an alkoxycarbonylmethyl group, an allyl group, or a vinyl group, and more preferably a straight group. A chain, branched, cyclic 2-oxoalkyl group, alkoxycarbonylmethyl group, most preferably a linear, branched 2-oxoalkyl group.

The alkyl group as R ₂₀₁ to R ₂₀₃ may be linear, it may be either branched, preferably a straight-chain or branched alkyl group having 1 to 10 carbon atoms, e.g., methyl group, ethyl group, propyl group Butyl group and pentyl group.
The cycloalkyl group as R ₂₀₁ to R ₂₀₃ is preferably a cycloalkyl group having 3 to 10 carbon atoms, e.g., cyclopentyl, cyclohexyl group and a norbornyl group.
The 2-oxoalkyl group as R _{201 to} R ₂₀₃ may be linear, branched or cyclic, and is preferably a group having> C═O at the 2-position of the above alkyl group or cycloalkyl group Can be mentioned.
The alkoxy group in the alkoxycarbonylmethyl group as R ₂₀₁ to R _203, preferably may be mentioned alkoxy groups having 1 to 5 carbon atoms (a methoxy group, an ethoxy group, a propoxy group, a butoxy group, pentyloxy group).
R _{201 to} R ₂₀₃ may be further substituted with a halogen atom, an alkoxy group (for example, having 1 to 5 carbon atoms), a hydroxyl group, a cyano group, or a nitro group.

  The compound (Z1-3) is a compound represented by the following general formula (Z1-3), and is a compound having a phenacylsulfonium salt structure.

In general formula (ZI-3),
R _{1c to} R _5c each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or a halogen atom.
R _6c and R _7c each independently represents a hydrogen atom, an alkyl group or a cycloalkyl group.
Rx and Ry each independently represents an alkyl group, a cycloalkyl group, a 2-oxoalkyl group, an alkoxycarbonylmethyl group, an allyl group, or a vinyl group.
Any two or more of R _{1c to} R _5c , R _6c and R _7c, and R _x and R _y may be bonded to each other to form a ring structure, and this ring structure includes an oxygen atom, a sulfur atom, An ester bond or an amide bond may be included. Examples of the group formed by combining any two or more of R _{1c to} R _5c , R _6c and R _7c, and R _x and R _y include a butylene group and a pentylene group.
Zc ⁻ represents a non-nucleophilic anion, and examples thereof include the same non-nucleophilic anion as X ^{− in} the general formula (Z1).

The alkyl group as R _{1c to} R _7c may be either linear or branched, preferably a linear or branched alkyl group having 1 to 20 carbon atoms, more preferably 1 to 12 carbon atoms. And a straight chain or branched alkyl group, for example, a methyl group, an ethyl group, a straight chain or a branched propyl group, a straight chain or a branched butyl group, or a straight chain or a branched pentyl group.
The cycloalkyl group as R _{1c to} R _7c is preferably a cycloalkyl group having 3 to 8 carbon atoms, and examples thereof include a cyclopentyl group and a cyclohexyl group.
The alkoxy group as R _{1c to} R _{5c may} be linear, branched or cyclic, for example, an alkoxy group having 1 to 10 carbon atoms, preferably a linear or branched alkoxy group having 1 to 5 carbon atoms. (For example, methoxy group, ethoxy group, linear or branched propoxy group, linear or branched butoxy group, linear or branched pentoxy group), C3-C8 cyclic alkoxy group (for example, cyclopentyloxy group, cyclohexyloxy group) ).
Preferably, any one of R _{1c to} R _5c is a linear or branched alkyl group, a cycloalkyl group, or a linear, branched or cyclic alkoxy group, and more preferably the sum of the carbon number of R _1c to R _5c is 2 ~ 15. Thereby, solvent solubility improves more and generation | occurrence | production of a particle is suppressed at the time of a preservation | save.

_Examples of the alkyl group and cycloalkyl group as R _x and R _y include the same alkyl groups and cycloalkyl groups as R _{1c to} R _7c .
Examples of the 2-oxoalkyl group include a group having> C═O at the 2-position of the alkyl group or cycloalkyl group as R _{1c to} R _7c .
Examples of the alkoxy group in the alkoxycarbonylmethyl group include the same alkoxy groups as R _{1c to} R _5c .

R _x and R _y are preferably an alkyl group having 4 or more carbon atoms, more preferably 6 or more, and still more preferably 8 or more.

In formula (ZII), (ZIII), R 204 ~R 207 each independently represents an aryl group, an alkyl group or a cycloalkyl group.
Phenyl group and a naphthyl group are preferred as the aryl group of R ₂₀₄ to R _207, more preferably a phenyl group.
The alkyl group as R ₂₀₄ to R ₂₀₇ may be linear, it may be either branched, preferably a straight-chain or branched alkyl group having 1 to 10 carbon atoms, e.g., methyl group, ethyl group, propyl group Butyl group and pentyl group.
The cycloalkyl group as R ₂₀₄ to R ₂₀₇ is preferably a cycloalkyl group having 3 to 10 carbon atoms. For example, a cyclopentyl group, a cyclohexyl group, and a norbornyl group can be mentioned.
R ₂₀₄ to R ₂₀₇ may have a substituent. The R ₂₀₄ to R ₂₀₇ are substituents which may have, for example, an alkyl group (for example, 1 to 15 carbon atoms), a cycloalkyl group (for example, 3 to 15 carbon atoms), an aryl group (e.g., 6 carbon atoms 15), alkoxy groups (for example, having 1 to 15 carbon atoms), halogen atoms, hydroxyl groups, phenylthio groups and the like.
X ⁻ represents a non-nucleophilic anion, and examples thereof include the same as the non-nucleophilic anion of X ^{− in} formula (I).

  Examples of the compound that generates an acid upon irradiation with actinic rays or radiation that can be used further include compounds represented by the following general formulas (ZIV), (ZV), and (ZVI).

In general formulas (ZIV) to (ZVI), Ar ₃ and Ar ₄ each independently represents an aryl group.
R ₂₀₆ , R ₂₀₇ and R ₂₀₈ each independently represents an alkyl group or an aryl group.
A represents an alkylene group, an alkenylene group or an arylene group.

  Of the compounds that generate an acid upon irradiation with actinic rays or radiation, compounds represented by general formulas (ZI) to (ZIII) are more preferable.

  Among the compounds that decompose upon irradiation with actinic rays or radiation to generate an acid, examples of particularly preferable compounds are listed below.

  (B) The addition amount of the compound of a component is 0.1-20 mass% normally with respect to the total solid of a composition, Preferably it is 0.5-20 mass%, More preferably, it is 1-10 mass%.

[3] (C) Basic compound The photosensitive composition of the present invention preferably further contains a basic compound.
As the basic compound, an organic amine, a basic ammonium salt, a basic sulfonium salt, a basic iodonium salt, or the like is used as long as it does not deteriorate sublimation or resist performance. The basic compound is a component having an action of controlling a diffusion phenomenon in a resist film of an acid generated from an acid generator by exposure and suppressing an undesirable chemical reaction in a non-exposed region. By blending such a basic compound, the storage stability of the photosensitive composition obtained by controlling the diffusion phenomenon of the acid generated from the acid generator upon exposure in the resist film is improved, and the resolution as a resist is improved. In addition to further improvement, it is possible to suppress changes in the line width of the resist pattern due to fluctuations in the holding time (PED) from exposure to development processing, and a composition having excellent process stability can be obtained.

  As the basic compound, organic amines can be used, for example, primary, secondary, and tertiary aliphatic amines, aromatic amines, heterocyclic amines, and nitrogen-containing compounds having a carboxy group. And nitrogen-containing compounds having a sulfonyl group, nitrogen-containing compounds having a hydroxyl group, nitrogen-containing compounds having a hydroxyphenyl group, alcoholic nitrogen-containing compounds, amide derivatives, imide derivatives, nitrogen-containing compounds having a cyano group, and the like.

  As aliphatic amines, methylamine, ethylamine, n-propylamine, isopropylamine, n-butylamine, isobutylamine, sec-butylamine, tert-butylamine, pentylamine, tert-amylamine, cyclopentylamine, hexylamine, cyclohexylamine, Heptylamine, octylamine, nonylamine, decylamine, dodecylamine, cetylamine, methylenediamine, ethylenediamine, tetraethylenepentamine, dimethylamine, diethylamine, di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutylamine, di -Sec-butylamine, dipentylamine, dicyclopentylamine, dihexylamine, dicyclohexylamine, diheptylamine , Dioctylamine, dinonylamine, didecylamine, didodecylamine, dicetylamine, N, N-dimethylmethylenediamine, N, N-dimethylethylenediamine, N, N-dimethyltetraethylenepentamine, trimethylamine, triethylamine, tri-n-propylamine , Triisopropylamine, tri-n-butylamine, triisobutylamine, tri-sec-butylamine, tripentylamine, tricyclopentylamine, trihexylamine, tricyclohexylamine, triheptylamine, trioctylamine, trinonylamine, tri Decylamine, tridodecylamine, tricetylamine, N, N, N ′, N′-tetramethylmethylenediamine, N, N, N ′, N′-tetramethylethylenediamine, N, N N ', N'-tetramethyl-tetraethylenepentamine, dimethylethylamine, methylethylpropylamine, benzylamine, phenethylamine, benzyldimethylamine, and the like.

Aromatic amines and heterocyclic amines include aniline derivatives such as aniline, N-methylaniline, N-ethylaniline, N-propylaniline, N, N-dimethylaniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, ethylaniline, propylaniline, trimethylaniline, 2-nitroaniline, 3-nitroaniline, 4-nitroaniline, 2,4-dinitroaniline, 2,6-dinitroaniline, 3,5-dinitroaniline, N, N-dimethyltoluidine, etc.), diphenyl (p-tolyl) amine, methyldiphenylamine, triphenylamine, phenylenediamine, naphthylamine, diaminonaphthalene, pyrrole derivatives (eg pyrrole, 2H-pyrrole, 1-methylpyrrole, 2,4 -Dimethylpyro , 2,5-dimethylpyrrole, N-methylpyrrole, etc.), oxazole derivatives (eg oxazole, isoxazole etc.), thiazole derivatives (eg thiazole, isothiazole etc.), imidazole derivatives (eg imidazole, 4-methylimidazole, 4 -Methyl-2-phenylimidazole, etc.), pyrazole derivatives, furazane derivatives, pyrroline derivatives (eg pyrroline, 2-methyl-1-pyrroline etc.), pyrrolidine derivatives (eg pyrrolidine, N-methylpyrrolidine, pyrrolidinone, N-methylpyrrolidone etc.) ), Imidazoline derivatives, imidazolidine derivatives, pyridine derivatives (eg pyridine, methylpyridine, ethylpyridine, propylpyridine, butylpyridine, 4- (1-butylpentyl) pyridine, dimethylpyridine) Trimethylpyridine, triethylpyridine, phenylpyridine, 3-methyl-2-phenylpyridine, 4-tert-butylpyridine, diphenylpyridine, benzylpyridine, methoxypyridine, butoxypyridine, dimethoxypyridine, 1-methyl-2-pyridone, 4- Pyrrolidinopyridine, 1-methyl-4-phenylpyridine, 2- (1-ethylpropyl) pyridine, aminopyridine, dimethylaminopyridine, etc.), pyridazine derivatives, pyrimidine derivatives, pyrazine derivatives, pyrazoline derivatives, pyrazolidine derivatives, piperidine derivatives, Piperazine derivatives, morpholine derivatives, indole derivatives, isoindole derivatives, 1H-indazole derivatives, indoline derivatives, quinoline derivatives (eg quinoline, 3-quinolinecarbonitrile) Etc.), isoquinoline derivatives, cinnoline derivatives, quinazoline derivatives, quinoxaline derivatives, phthalazine derivatives, purine derivatives, pteridine derivatives, carbazole derivatives, phenanthridine derivatives, acridine derivatives, phenazine derivatives, 1,10-phenanthroline derivatives, adenine derivatives, adenosine derivatives Guanine derivatives, guanosine derivatives, uracil derivatives, uridine derivatives and the like.

  Examples of the nitrogen-containing compound having a carboxy group include aminobenzoic acid, indolecarboxylic acid, amino acid derivatives (for example, nicotinic acid, alanine, arginine, aspartic acid, glutamic acid, glycine, histidine, isoleucine, glycylleucine, leucine, methionine, phenylalanine. , Threonine, lysine, 3-aminopyrazine-2-carboxylic acid, methoxyalanine) and the like.

  Examples of the nitrogen-containing compound having a sulfonyl group include 3-pyridinesulfonic acid and pyridinium p-toluenesulfonate.

  Examples of the nitrogen-containing compound having a hydroxyl group include 2-hydroxypyridine, aminocresol, 2,4-quinolinediol, 3-indolemethanol hydrate, monoethanolamine, diethanolamine, triethanolamine, N-ethyldiethanolamine, N, N- Diethylethanolamine, triisopropanolamine, 2,2′-iminodiethanol, 2-aminoethanol, 3-amino-1-propanol, 4-amino-1-butanol, 4- (2-hydroxyethyl) morpholine, 2- (2-hydroxyethyl) pyridine, 1- (2-hydroxyethyl) piperazine, 1- [2- (2-hydroxyethoxy) ethyl] piperazine, piperidine ethanol, 1- (2-hydroxyethyl) pyrrolidine, 1- (2 -Hydroxyethyl ) -2-pyrrolidinone, 3-piperidino-1,2-propanediol, 3-pyrrolidino-1,2-propanediol, 8-hydroxyeurolidine, 3-quinuclidinol, 3-tropanol, 1-methyl-2 -Pyrrolidine ethanol, 1-aziridine ethanol, N- (2-hydroxyethyl) phthalimide, N- (2-hydroxyethyl) isonicotinamide and the like are exemplified.

  Examples of amide derivatives include formamide, N-methylformamide, N, N-dimethylformamide, acetamide, N-methylacetamide, N, N-dimethylacetamide, propionamide, benzamide and the like.

  Examples of imide derivatives include phthalimide, succinimide, maleimide and the like.

Specific examples of the nitrogen-containing compound having a cyano group include 3- (diethylamino) propiononitrile, N, N-bis (2-hydroxyethyl) -3-aminopropiononitrile, N, N-bis (2- Acetoxyethyl) -3-aminopropiononitrile, N, N-bis (2-formyloxyethyl) -3-aminopropiononitrile, N, N-bis (2-methoxyethyl) -3-aminopropiononitrile, N, N-bis [2- (methoxymethoxy) ethyl] -3-aminopropiononitrile, methyl N- (2-cyanoethyl) -N- (2-methoxyethyl) -3-aminopropionate, N- (2 -Cyanoethyl) -N- (2-hydroxyethyl) -3-aminopropionic acid methyl, N- (2-acetoxyethyl) -N- (2-cyanoethyl) Methyl 3-aminopropionate, N- (2-cyanoethyl) -N-ethyl-3-aminopropiononitrile, N- (2-cyanoethyl) -N- (2-hydroxyethyl) -3-aminopropiononitrile, N- (2-acetoxyethyl) -N- (2-cyanoethyl) -3-aminopropiononitrile, N- (2-cyanoethyl) -N- (2-formyloxyethyl) -3-aminopropiononitrile, N -(2-cyanoethyl) -N- (2-methoxyethyl) -3-aminopropiononitrile, N- (2-cyanoethyl) -N- [2- (methoxymethoxy) ethyl] -3-aminopropiononitrile, N- (2-cyanoethyl) -N- (3-hydroxy-1-propyl) -3-aminopropiononitrile, N- (3-acetoxy-1-pro ) -N- (2-cyanoethyl) -3-aminopropiononitrile, N- (2-cyanoethyl) -N- (3-formyloxy-1-propyl) -3-aminopropiononitrile, N- (2 -Cyanoethyl) -N-tetrahydrofurfuryl-3-aminopropiononitrile, N, N-bis (2-cyanoethyl) -3-aminopropiononitrile, diethylaminoacetonitrile, N, N-bis (2-hydroxyethyl) amino Acetonitrile, N, N-bis (2-acetoxyethyl) aminoacetonitrile, N, N-bis (2-formyloxyethyl) aminoacetonitrile, N, N-bis (2-methoxyethyl) aminoacetonitrile, N, N-bis [2- (Methoxymethoxy) ethyl] aminoacetonitrile, N-cyanomethyl-N- (2 -Methoxyethyl) -3-aminopropionic acid methyl, N-cyanomethyl-N- (2-hydroxyethyl) -3-aminopropionic acid methyl, N- (2-acetoxyethyl) -N-cyanomethyl-3-aminopropionic acid Methyl, N-cyanomethyl-N- (2-hydroxyethyl) aminoacetonitrile, N- (2-acetoxyethyl) -N- (cyanomethyl) aminoacetonitrile, N-cyanomethyl-N- (2-formyloxyethyl) aminoacetonitrile, N-cyanomethyl-N- (2-methoxyethyl) aminoacetonitrile, N-cyanomethyl-N- [2- (methoxymethoxy) ethyl] aminoacetonitrile, N- (cyanomethyl) -N- (3-hydroxy-1-propyl) Aminoacetonitrile, N- (3-acetoxy-1 Propyl) -N- (cyanomethyl) aminoacetonitrile, N-cyanomethyl-N- (3-formyloxy-1-propyl) aminoacetonitrile, N, N-bis (cyanomethyl) aminoacetonitrile, 1-pyrrolidinepropiononitrile, 1- Piperidine propiononitrile, 4-morpholine propiononitrile, 1-pyrrolidine acetonitrile, 1-piperidine acetonitrile, 4-morpholine acetonitrile, cyanomethyl 3-diethylaminopropionate, N, N-bis (2-hydroxyethyl) -3-aminopropion Cyanomethyl acid, cyanomethyl N, N-bis (2-acetoxyethyl) -3-aminopropionate, cyanomethyl N, N-bis (2-formyloxyethyl) -3-aminopropionate, N, N-bis (2- Toxiethyl) -3-aminopropionate cyanomethyl, N, N-bis [2- (methoxymethoxy) ethyl] -3-aminopropionate cyanomethyl, 3-diethylaminopropionic acid (2-cyanoethyl), N, N-bis (2 -Hydroxyethyl) -3-aminopropionic acid (2-cyanoethyl), N, N-bis (2-acetoxyethyl) -3-aminopropionic acid (2-cyanoethyl), N, N-bis (2-formyloxyethyl) ) -3-Aminopropionic acid (2-cyanoethyl), N, N-bis (2-methoxyethyl) -3-aminopropionic acid (2-cyanoethyl), N, N-bis [2- (methoxymethoxy) ethyl] -3-aminopropionic acid (2-cyanoethyl), cyanomethyl 1-pyrrolidinepropionate, 1-piperidine Examples include cyanomethyl lopionate, cyanomethyl 4-morpholine propionate, 1-pyrrolidine propionic acid (2-cyanoethyl), 1-piperidine propionic acid (2-cyanoethyl), 4-morpholine propionic acid (2-cyanoethyl).

As the nitrogen-containing basic compound, 1,5-diazabicyclo [4.3.0] -5-nonene, 1,8-diazabicyclo [5.4.0] -7-undecene, 1,4-diazabicyclo [ 2.2.2] Octane, 4-dimethylaminopyridine, 1-naphthylamine, piperidines, hexamethylenetetramine, imidazoles, hydroxypyridines, pyridines, anilines, hydroxyalkylanilines, 4,4′-diaminodiphenyl ether , Pyridinium p-toluenesulfonate, 2,4,6-trimethylpyridinium p-toluenesulfonate, tetramethylammonium p-toluenesulfonate, and tetrabutylammonium lactate, triethylamine, tributylamine, tripentylamine, tri-n- Octyl Amine, tri-i-octylamine, tris (ethylhexyl) amine, tridecylamine, tridodecylamine, tri-n-propylamine, tri-n-butylamine, tri-n-pentylamine, tri-n-hexylamine, Tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decylamine, cyclohexyldimethylamine, methyldicyclohexylamine, ethylenediamine, N, N, N ′, N′-tetramethylethylenediamine, Tetramethylenediamine, hexamethylenediamine, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 4,4'-diaminobenzophenone, 4,4'-diaminodiphenylamine, 2,2-bis (4-aminophenyl) ) Propane, 2- ( 3-aminophenyl) -2- (4-aminophenyl) propane, 2- (4-aminophenyl) -2- (3-hydroxyphenyl) propane, 2- (4-aminophenyl) -2- (4-hydroxy Phenyl) propane, 1,4-bis [1- (4-aminophenyl) -1-methylethyl] benzene, 1,3-bis [1- (4-aminophenyl) -1-methylethyl] benzene, bis ( 2- (dimethylaminoethyl) ether, bis (2-diethylaminoethyl) ether, N, N, N ′, N′-tetrakis (2-hydroxypropyl) ethylenediamine, tricyclohexylamine such as tricyclohexylamine; aniline N-methylaniline, N, N-dimethylaniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4 Aromatic amines such as nitroaniline, diphenylamine, triphenylamine, naphthylamine, 2,6-diisopropylaniline, polyethyleneimine, polyallylamine, 2-dimethylaminoethylacrylamide polymer, Nt-butoxycarbonyldi-n- Octylamine, Nt-butoxycarbonyldi-n-nonylamine, Nt-butoxycarbonyldi-n-decylamine, Nt-butoxycarbonyldicyclohexylamine, Nt-butoxycarbonyl-1-adamantylamine, N- t-butoxycarbonyl-N-methyl-1-adamantylamine, N, N-di-t-butoxycarbonyl-1-adamantylamine, N, N-di-t-butoxycarbonyl-N-methyl-1-adamantylamine, Nt-Butoki Carbonyl-4,4′-diaminodiphenylmethane, N, N′-di-t-butoxycarbonylhexamethylenediamine, N, N, N′N′-tetra-t-butoxycarbonylhexamethylenediamine, N, N′-di -T-butoxycarbonyl-1,7-diaminoheptane, N, N'-di-t-butoxycarbonyl-1,8-diaminooctane, N, N'-di-t-butoxycarbonyl-1,9-diaminononane, N, N′-di-t-butoxycarbonyl-1,10-diaminodecane, N, N′-di-t-butoxycarbonyl-1,12-diaminododecane, N, N′-di-t-butoxycarbonyl- 4,4′-diaminodiphenylmethane, Nt-butoxycarbonylbenzimidazole, Nt-butoxycarbonyl-2-methylbenzimidazole, N t-butoxycarbonyl-2-phenylbenzimidazole, formamide, N-methylformamide, N, N-dimethylformamide, acetamide, N-methylacetamide, N, N-dimethylacetamide, propionamide, benzamide, pyrrolidone, N-methylpyrrolidone , Urea, methylurea, 1,1-dimethylurea, 1,3-dimethylurea, 1,1,3,3-tetramethylurea, 1,3-diphenylurea, tri-n-butylthiourea, imidazole, 4-methyl Imidazoles such as imidazole, 4-methyl-2-phenylimidazole, benzimidazole, 2-phenylbenzimidazole; pyridine, 2-methylpyridine, 4-methylpyridine, 2-ethylpyridine, 4-ethylpyridine, 2-phenyl Pyridines such as lysine, 4-phenylpyridine, 2-methyl-4-phenylpyridine, nicotine, nicotinic acid, nicotinamide, quinoline, 4-hydroxyquinoline, 8-oxyquinoline, acridine; piperazine, 1- (2- In addition to piperazines such as hydroxyethyl) piperazine, pyrazine, pyrazole, pyridazine, quinosaline, purine, pyrrolidine, piperidine, 3-piperidino-1,2-propanediol, morpholine, 4-methylmorpholine, 1,4-dimethylpiperazine, 1,4-diazabicyclo [2.2.2] octane.

  Among these, 1,5-diazabicyclo [4.3.0] -5-nonene, 1,8-diazabicyclo [5.4.0] -7-undecene, 1,4-diazabicyclo [2.2.2] Octane, 4-dimethylaminopyridine, 1-naphthylamine, piperidine, 4-hydroxypiperidine, 2,2,6,6-tetramethyl-4-hydroxypiperidine, hexamethylenetetramine, imidazoles, hydroxypyridines, pyridines, 4 , 4'-diaminodiphenyl ether, triethylamine, tributylamine, tripentylamine, tri-n-octylamine, tris (ethylhexyl) amine, tridodecylamine, N, N-di-hydroxyethylaniline, N-hydroxyethyl-N- Organic amines such as ethylaniline are particularly preferred.

  The nitrogen-containing basic compounds can be used alone or in combination of two or more, more preferably in combination of two or more.

The photosensitive composition of the present invention preferably further contains an ammonium salt compound. Specific examples of the ammonium salt include the following compounds, but are not limited thereto.
Specifically, ammonium hydroxide, ammonium triflate, ammonium pentaflate, ammonium heptaflate, ammonium nonaflate, ammonium undecaflate, ammonium tridecaflate, ammonium pentadecaflate, ammonium methylcarboxylate, ammonium ethylcarboxylate, Ammonium propyl carboxylate, ammonium butyl carboxylate, ammonium heptyl carboxylate, ammonium hexyl carboxylate, ammonium octyl carboxylate, ammonium nonyl carboxylate, ammonium decyl carboxylate, ammonium undecyl carboxylate, ammonium dodecadecyl carboxylate, ammonium salt Decyl carboxylate, ammonium tetradecyl carboxylate, ammonium pentadecyl carboxylate, ammonium hexadecyl carboxylate, ammonium heptadecyl carboxylate, ammonium octadecyl carboxylate and the like.

That is, as the ammonium hydroxide, specifically, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, tetrapentylammonium hydroxide, tetrahexylammonium hydroxide, Tetraheptyl ammonium hydroxide, methyl trioctyl ammonium hydroxide, tetraoctyl ammonium hydroxide, didecyl dimethyl ammonium hydroxide, tetrakisdecyl ammonium hydroxide, dodecyl trimethyl ammonium hydroxide, dodecyl ethyl dimethyl ammonium hydroxide, didodecyl dimethyl ammonium hydroxy And tridodecylmethylammonium Dorokishido, myristyl trimethyl ammonium hydroxide, dimethyl tetradecyl ammonium hydroxide, hexadecyltrimethylammonium hydroxide, octadecyltrimethylammonium hydroxide, dimethyldioctadecylammonium hydroxide, tetraoctadecylammonium hydroxide,
Diallyldimethylammonium hydroxide, (2-chloroethyl) -trimethylammonium hydroxide, (2-bromoethyl) trimethylammonium hydroxide, (3-bromopropyl) -trimethylammonium hydroxide, (3-bromopropyl) triethylammonium hydroxide, Glycidyltrimethylammonium hydroxide, choline hydroxide, (R)-(+)-(3-chloro-2-hydroxypropyl) trimethylammonium hydroxide, (S)-(−)-(3-chloro-2-hydroxypropyl) ) -Trimethylammonium hydroxide, (3-chloro-2-hydroxypropyl) -trimethylammonium hydroxide, (2-aminoethyl) -trimethylammonium hydroxide, hexamethoni Muhydroxide, decamethonium hydroxide, 1-azoniapropellan hydroxide, petronium hydroxide, 2-chloro-1,3-dimethyl-2-imidazolinium hydroxide, 3-ethyl-2-methyl-2-thia Mention may be made of zolinium hydroxide.

  The total amount of the organic amine and basic ammonium salt is usually 0.001 to 10% by mass, preferably 0.01 to 5% by mass, based on the solid content of the photosensitive composition. By setting it as 0.001-10 mass%, the effect of addition of the said component is acquired and the tendency for the fall of a sensitivity and the developability of a non-exposed part to deteriorate can be prevented.

[4] (D) A dissolution inhibiting compound having a molecular weight of 3000 or less (hereinafter also referred to as a “dissolution inhibiting compound”) that is decomposed by the action of an acid to increase the solubility in an alkaline developer.
As a dissolution inhibiting compound having a molecular weight of 3000 or less, which is decomposed by the action of an acid to increase the solubility in an alkaline developer, it does not decrease the transmittance of 220 nm or less, and is described in Proceeding of SPIE, 2724,355 (1996). An alicyclic or aliphatic compound containing an acid-decomposable group is preferred, such as a cholic acid derivative containing an acid-decomposable group. Examples of the acid-decomposable group and alicyclic structure are the same as those described for the acid-decomposable resin.
The molecular weight of the dissolution inhibiting compound in the present invention is 3000 or less, preferably 300 to 3000, and more preferably 500 to 2500.

  The addition amount of the dissolution inhibiting compound is preferably 1 to 30% by mass and more preferably 2 to 20% by mass with respect to the solid content of the photosensitive composition.

  Specific examples of the dissolution inhibiting compound are shown below, but are not limited thereto.

[5] Fluorine-based and / or silicon-based surfactant The photosensitive composition of the present invention further comprises a fluorine-based and / or silicon-based surfactant (fluorine-based surfactant and silicon-based surfactant, fluorine atom and It is preferable that one or two or more surfactants containing both silicon atoms are contained.
When the photosensitive composition of the present invention contains fluorine and / or a silicon-based surfactant, adhesion and development defects can be obtained with good sensitivity and resolution when using an exposure light source of 250 nm or less, particularly 220 nm or less. A small resist pattern can be provided.
Examples of these fluorine and / or silicon surfactants include, for example, JP-A No. 62-36663, JP-A No. 61-226746, JP-A No. 61-226745, JP-A No. 62-170950, JP 63-34540 A, JP 7-230165 A, JP 8-62834 A, JP 9-54432 A, JP 9-5988 A, JP 2002-277862 A, US Patent Nos. 5,405,720, 5,360,692, 5,529,881, 5,296,330, 5,436,098, 5,576,143, 5,294,511, 5,824,451 Surfactant can be mentioned, The following commercially available surfactant can also be used as it is.
Examples of commercially available surfactants that can be used include F-top EF301, EF303 (manufactured by Shin-Akita Kasei Co., Ltd.), Florard FC430, 431 (manufactured by Sumitomo 3M Co., Ltd.), MegaFuck F171, F173, F176, F189, R08 (Dainippon Ink Chemical Co., Ltd.), Surflon S-382, SC101, 102, 103, 104, 105, 106 (Asahi Glass Co., Ltd.), Troisol S-366 (Troy Chemical Co., Ltd.), etc. Fluorine type surfactant or silicon type surfactant can be mentioned. Polysiloxane polymer KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.) can also be used as a silicon-based surfactant.

In addition to the known surfactants described above, the surfactant is derived from a fluoroaliphatic compound produced by a telomerization method (also called telomer method) or an oligomerization method (also called oligomer method). A surfactant using a polymer having a fluoroaliphatic group can be used. The fluoroaliphatic compound can be synthesized by the method described in JP-A-2002-90991.
As the polymer having a fluoroaliphatic group, a copolymer of a monomer having a fluoroaliphatic group and (poly (oxyalkylene)) acrylate and / or (poly (oxyalkylene)) methacrylate is preferable and distributed irregularly. Or may be block copolymerized. Examples of the poly (oxyalkylene) group include a poly (oxyethylene) group, a poly (oxypropylene) group, a poly (oxybutylene) group, and the like, and a poly (oxyethylene, oxypropylene, and oxyethylene group). A unit having different chain lengths in the same chain length, such as a block link) or poly (block link of oxyethylene and oxypropylene) may be used. Furthermore, a copolymer of a monomer having a fluoroaliphatic group and (poly (oxyalkylene)) acrylate (or methacrylate) is not only a binary copolymer but also a monomer having two or more different fluoroaliphatic groups, Further, it may be a ternary or higher copolymer obtained by simultaneously copolymerizing two or more different (poly (oxyalkylene)) acrylates (or methacrylates).
Examples of commercially available surfactants include Megafac F178, F-470, F-473, F-475, F-476, and F-472 (Dainippon Ink Chemical Co., Ltd.). Further, a copolymer of an acrylate (or methacrylate) having a C ₆ F ₁₃ group and (poly (oxyalkylene)) acrylate (or methacrylate), an acrylate (or methacrylate) having a C ₆ F ₁₃ group and (poly (oxy) (Ethylene)) acrylate (or methacrylate) and (poly (oxypropylene)) acrylate (or methacrylate) copolymer, acrylate (or methacrylate) and (poly (oxyalkylene)) acrylate having C ₈ F ₁₇ groups (or Copolymer of acrylate (or methacrylate), (poly (oxyethylene)) acrylate (or methacrylate), and (poly (oxypropylene)) acrylate (or methacrylate) having a C ₈ F ₁₇ group List union It can be.

  The amount of fluorine and / or silicon surfactant used is preferably 0.0001 to 2% by mass, more preferably 0.001 to 1% by mass, based on the total amount of the photosensitive composition (excluding the solvent). .

[6] Organic solvent The photosensitive composition of the present invention is used by dissolving each component in a predetermined organic solvent.
Examples of the organic solvent that can be used include ethylene dichloride, cyclohexanone, cyclopentanone, 2-heptanone, γ-butyrolactone, methyl ethyl ketone, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, ethylene glycol monoethyl. Ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, toluene, ethyl acetate, methyl lactate, ethyl lactate, methyl methoxypropionate, ethyl ethoxypropionate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, N, N -Dimethylformamide, dimethyl sulfoxide, N-methylpyrrolidone, tetrahydrofuran, etc.

In the present invention, the organic solvent may be used alone or in combination, but a solvent having a hydroxyl group in the structure, a solvent having an ester or lactone structure in the structure, and a solvent having a ketone structure in the structure It is preferable to use a mixed solvent in which two or more selected from the above are mixed. Thereby, the generation of particles during storage of the resist solution can be reduced.
Examples of the solvent having a hydroxyl group include ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monoethyl ether, ethyl lactate, and the like. Propylene glycol monomethyl ether and ethyl lactate are particularly preferred.
Examples of the solvent having an ester or lactone structure include propylene glycol monomethyl ether acetate, ethyl ethoxypropionate, γ-butyrolactone, butyl acetate, and the like. Among these, propylene glycol monomethyl ether acetate, ethyl ethoxy Propionate is particularly preferred, and propylene glycol monomethyl ether acetate is most preferred.
Examples of the solvent having a ketone structure include 2-heptanone and cyclohexanone, with cyclohexanone being preferred.
A preferable combination of the mixed solvent is a combination of a solvent having a hydroxyl group and a solvent having an ester structure, or a combination of a solvent having a ketone structure and a solvent having an ester structure.

The mixing ratio (mass) of the solvent having a hydroxyl group and the solvent having an ester structure is usually 1/99 to 99/1, preferably 5/95 to 95/5, more preferably 20/80 to 80/20, particularly. Preferably it is 20 / 80-60 / 40.
The mixing ratio (mass) of the solvent having a ketone structure and the solvent having an ester structure is usually 1/99 to 99/1, preferably 5/95 to 95/5, more preferably 20/80 to 80/20, Particularly preferred is 20/80 to 60/40.

<Other additives>
If necessary, the photosensitive composition of the present invention may further contain a dye, a plasticizer, a surfactant other than the above components, a photosensitizer, a compound that promotes solubility in a developer, and the like. .
The dissolution accelerating compound for the developer that can be used in the present invention is a low molecular weight compound having a molecular weight of 1,000 or less and having two or more phenolic OH groups or one or more carboxy groups. When it has a carboxy group, an alicyclic or aliphatic compound is preferable.
A preferable addition amount of these dissolution promoting compounds is preferably 2 to 50% by mass, more preferably 5 to 30% by mass with respect to the resin of the component (B). By making the addition amount 2 to 50% by mass, it is possible to prevent development residue from deteriorating and deformation of the pattern during development.

Such a phenol compound having a molecular weight of 1000 or less can be easily synthesized by those skilled in the art with reference to the methods described in, for example, JP-A-4-1222938, JP-A-2-28531, US Pat. No. 4,916,210, European Patent 219294, and the like. can do.
Specific examples of alicyclic or aliphatic compounds having a carboxyl group include carboxylic acid derivatives having a steroid structure such as cholic acid, deoxycholic acid, lithocholic acid, adamantane carboxylic acid derivatives, adamantane dicarboxylic acid, cyclohexane carboxylic acid, cyclohexane Examples thereof include, but are not limited to, dicarboxylic acids.

In the present invention, a surfactant other than the fluorine-based and / or silicon-based surfactant may be added. Specifically, nonionic interfaces such as polyoxyethylene alkyl ethers, polyoxyethylene alkyl allyl ethers, polyoxyethylene / polyoxypropylene block copolymers, sorbitan aliphatic esters, polyoxyethylene sorbitan aliphatic esters, etc. Mention may be made of activators.
These surfactants may be added alone or in some combination.

≪How to use≫
The photosensitive composition of the present invention is used by dissolving each component in a predetermined organic solvent, preferably the mixed solvent, and applying the solution on a predetermined support as follows.
For example, the photosensitive composition is coated on a substrate (eg, silicon / silicon dioxide coating) used for manufacturing a precision integrated circuit device by an appropriate coating method such as a spinner or a coater.
After the application, actinic rays and radiation are irradiated through a predetermined mask, followed by baking and development. In this way, a good pattern can be obtained. Examples of the actinic ray include infrared light, visible light, ultraviolet light, far ultraviolet light, X-ray, electron beam, etc., but preferably far ultraviolet light having a wavelength of 250 nm or less, more preferably 220 nm or less, specifically Specifically, KrF excimer laser (248 nm), ArF excimer laser (193 nm), F2 excimer laser (157 nm), X-ray, electron beam, etc., ArF excimer laser and F2 excimer laser are most preferable. In the present invention, X-rays and electron beams are also included in the actinic rays.
Exposure (immersion exposure) may be performed by filling a liquid (immersion medium) having a higher refractive index than air between the photosensitive film and the lens during irradiation with actinic rays or radiation. Thereby, resolution can be improved. As the immersion medium to be used, any liquid can be used as long as it has a higher refractive index than air, but pure water is preferred. Further, an overcoat layer may be further provided on the photosensitive film so that the immersion medium and the photosensitive film do not come into direct contact with each other during the immersion exposure. Thereby, the elution of the composition from the photosensitive film to the immersion medium is suppressed, and development defects are reduced.

In the development step, an alkaline developer is used as follows. As an alkaline developer of the resist composition, inorganic hydroxides such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, and aqueous ammonia, primary amines such as ethylamine and n-propylamine, Secondary amines such as diethylamine and di-n-butylamine, tertiary amines such as triethylamine and methyldiethylamine, alcohol amines such as dimethylethanolamine and triethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide and the like Alkaline aqueous solutions such as quaternary ammonium salts, cyclic amines such as pyrrole and piperidine can be used.
Furthermore, alcohols and surfactants can be added in appropriate amounts to the alkaline developer.
The alkali concentration of the alkali developer is usually from 0.1 to 20% by mass.
The pH of the alkali developer is usually from 10.0 to 15.0.

  EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to this.

Synthesis Example 1 (Synthesis of monomer (Ib-1))
36 g of D-glucurono-6,3-lactone (manufactured by Tokyo Chemical Industry Co., Ltd.) was dissolved in 800 ml of acetone, and 5 ml of concentrated sulfuric acid was gradually added dropwise thereto. This was reacted at room temperature for 5 hours, and then neutralized by adding sodium hydrogen carbonate. Excess sodium bicarbonate was removed by filtration, and the filtrate was concentrated to 200 ml. Ethyl acetate was added thereto, and the organic layer was washed with water, dried over anhydrous sodium sulfate and concentrated. The obtained crude product was recrystallized from toluene to obtain 9.8 g of ketal.
9 g of the obtained ketal was dissolved in 100 ml of tetrahydrofuran, and 8.4 g of triethylamine was added thereto. Under ice cooling, 9.6 g of methacrylic anhydride was added dropwise over 30 minutes.
The mixture was reacted at room temperature for 10 hours, and 500 ml of ethyl acetate was added thereto. The organic layer was washed with water, dried and concentrated to obtain a crude product. This was purified by column chromatography to obtain 8.3 g of monomer (Ib-1).
¹ H-NMR (CDCl 3)
δ 1.35 (s, 3H), δ 1.51 (s, 3H), δ 2.00 (s, 3H), δ 4.85 (d, 1H), δ 4.90 (d, 1H), δ 5.09 (dd 1H), δ5.55 (d, 1H), δ5.73 (s, 1H), δ6.02 (d, 1H), δ6.31 (s, 1H)

  The monomer (Ib-1) contained 99% or more of the component having the following three-dimensional structure.

Synthesis Example 2 (Synthesis of monomer (IIIb-1))
J. et al. Chem. Soc. PERKIN Trans. 1 (1993) According to the method described in p313, the following hydroxylactone (HL1) was obtained. The obtained hydroxylactone (HL1) was converted into a methacrylic ester by the same method as in Synthesis Example 1 to obtain a monomer (IIIb-1).

Synthesis Example 3 (Synthesis of monomer (IIb-1))
5 g of the following hydroxylactone (HL1) was dissolved in 50 ml of ethanol, 0.25 g of 5% palladium / carbon was added thereto, and the mixture was stirred for 6 hours under a hydrogen stream. The reaction mixture was filtered through Celite and concentrated to give a white solid. When this was purified by column chromatography, 4.3 g of the following hydroxylactone (HL2) was obtained. The obtained hydroxylactone (HL2) was methacrylic esterified in the same manner as in Synthesis Example 1 to obtain monomer (IIb-1).

  The monomers (IIIb-1) and (IIb-1) contained 98% or more of components having the following three-dimensional structure.

Synthesis Example 4 (Synthesis of Resin (1))
Under a nitrogen stream, 13.8 g of propylene glycol monomethyl ether acetate and 9.2 g of propylene glycol monomethyl ether were placed in a three-necked flask and heated to 80 ° C. To this, 22.8 g of monomer (Ib-1), 10.1 g of dihydroxyadamantane methacrylate, 15.7 g of isoadamantyl methacrylate, 1.8 g of methacrylic acid, 124.2 g of propylene glycol monomethyl ether acetate, initiator V-601 (Wako Pure) A product obtained by dissolving 8 mol% of a drug product in 82.8 g of propylene glycol monomethyl ether with respect to the monomer was dropped over 6 hours. After completion of dropping, the reaction was further carried out at 80 ° C. for 2 hours. The reaction solution was allowed to cool and then poured into 2,700 ml of hexane / 300 ml of ethyl acetate, and the precipitated powder was collected by filtration and dried to obtain 46 g of Resin (1). The obtained resin had a weight average molecular weight of 8,400 and a dispersity (Mw / Mn) of 1.89.
Similarly, Resins (2) to (21) and Comparative Resin (Q1) were synthesized.

  Hereinafter, the structures, weight average molecular weights, and dispersities of the resins (1) to (21) and the comparative resin (Q1) are shown.

Examples 1 to 29 and Comparative Example 1
<Resist preparation>
The components shown in Tables 1 to 3 below were dissolved in a solvent to prepare a solution having a solid content concentration of 8% by mass, and this was filtered through a 0.03 μm polyethylene filter to prepare a positive resist solution. The prepared positive resist solution was evaluated by the following method, and the results are shown in Tables 1 to 3.

  Abbreviations in Tables 1 to 3 are as follows.

N-1: Trioctylamine N-2: 2,6-diisopropylaniline N-3: N-phenyldiethanolamine N-4: Diazabicyclo [4.3.0] nonene N-5: Dicyclohexylmethylamine N-6: 2 , 4,5-Triphenylimidazole N-7: 4-dimethylaminopyridine

W-1: MegaFuck F176 (Dainippon Ink Chemical Co., Ltd.) (Fluorine)
W-2: Megafuck R08 (Dainippon Ink Chemical Co., Ltd.)
(Fluorine and silicon)
W-3: Polysiloxane polymer KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.)
(Silicon)
W-4: Troisol S-366 (manufactured by Troy Chemical Co., Ltd.)

SL-1: Cyclohexanone SL-2: Propylene glycol monomethyl ether acetate SL-3: Ethyl lactate SL-4: Propylene glycol monomethyl ether SL-5: γ-butyrolactone Ratio in the case of using a plurality of solvents in Tables 1 to 3 Is the mass ratio.

  D-1; t-butyl lithocholic acid

<Resist evaluation>
ARC29A manufactured by Brewer Science Co., Ltd. was uniformly applied to a silicon wafer with a spin coater at 78 nm, and heat-dried at 205 ° C. for 60 seconds to form an antireflection film. Thereafter, each positive resist composition immediately after preparation was applied by a spin coater and dried (PB) at 115 ° C. for 90 seconds to form a 170 nm resist film.
This resist film is exposed with an ArF excimer laser stepper (PAS5500 / 1100 NA = 0.75 (2/3 annular illumination) manufactured by ASML) through a mask, and immediately after exposure, heated on a hot plate at 120 ° C. for 90 seconds. (PEB). Further, the resist film was developed with an aqueous 2.38 mass% tetramethylammonium hydroxide solution at 23 ° C. for 60 seconds, rinsed with pure water for 30 seconds, and then dried to obtain a resist pattern.

(Resolution)
When the exposure amount that reproduces the 80 nm line and space 1/1 mask pattern is the optimum exposure amount, and the exposure amount is further increased from the optimum exposure amount to reduce the line width, the pattern is resolved without falling down. Defined with line width.

(Line edge roughness)
The line edge edge roughness is measured by using a length-measuring scanning electron microscope (SEM) to observe a line-and-space 1/1 pattern of 80 nm, and the edge of the line pattern in the longitudinal direction should have an edge of 5 μm. The distance from the reference line was measured by 50 points using a length measurement SEM (Hitachi, Ltd. S-8840), the standard deviation was obtained, and 3σ was calculated.
Smaller values indicate better performance

  From the results of Tables 1 to 3, it is clear that the photosensitive composition of the present invention is excellent in resolving power and good in line edge roughness.

Immersion exposure <Resist preparation>
The components of Examples 1 to 29 were dissolved in a solvent to prepare a solution having a solid content concentration of 7% by mass, and this was filtered through a 0.03 μm polyethylene filter to prepare a photosensitive composition. The adjusted positive resist solution was evaluated by the following method.

<Resolution evaluation>
An organic antireflection film ARC29A (Nissan Chemical Co., Ltd.) was applied onto a silicon wafer and baked at 205 ° C. for 60 seconds to form a 78 nm antireflection film. The prepared positive resist composition was applied thereon and baked at 115 ° C. for 60 seconds to form a 150 nm resist film. The wafer thus obtained was subjected to two-beam interference exposure (wet exposure) using pure water as the immersion liquid. In the two-beam interference exposure (wet), as shown in FIG. 1, a laser 1, an aperture 2, a shutter 3, three reflecting mirrors 4, 5, 6 and a condenser lens 7 are used, and a prism 8, liquid The wafer 10 having an antireflection film and a resist film was exposed through an immersion liquid (pure water) 9. The wavelength of the laser 1 was 193 nm, and the prism 8 forming a 65 nm line and space pattern was used. Immediately after the exposure, the resist pattern obtained by heating at 115 ° C. for 90 seconds, developing with an aqueous tetramethylammonium hydroxide solution (2.38%) for 60 seconds, rinsing with pure water, and spin drying is then applied to a scanning electron microscope. When observed using Hitachi S-9260, a 65 nm line and space pattern was resolved.
It is clear that the positive photosensitive composition of the present invention has a good image forming ability even in an exposure method using an immersion liquid.

It is the schematic of a two-beam interference exposure experiment apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Laser 2 Aperture 3 Shutter 4, 5, 6 Reflection mirror 7 Condensing lens 8 Prism 9 Immersion liquid 10 Wafer having antireflection film and resist film 11 Wafer stage

Claims (9)

(A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid a photosensitive composition containing, the (a) component of the resin, or one group obtained by removing any hydrogen atom from structure represented by any one of the following general formula (I) ~ (III) A photosensitive composition comprising a repeating unit having at least one group selected from the group consisting of:

In the general formulas (I) to (III),
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ 'and Ra _2' are each independently a hydrogen atom, an alkyl group, a cycloalkyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any _{two of} Ra ₁ ′, Ra ₂ ′ and Ra ₃ may be bonded to form a ring.
X _{11 is, -CH 2 -, - CH 2} CH 2 -, - O -, - S- or represents the -CH ₂ S-.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0-2. However, n ₁ + n ₂ is 2.
n ₃ represents an integer of 0 to 3. (A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid A photosensitive composition containing, wherein the resin of component ( A) has at least one structure selected from structures represented by any of the following general formulas (I ′) to (III ′) to that sense light composition characterized by having a unit.

In the general formulas (I ′) to (III ′),
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-. (A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid A photosensitive composition containing, wherein the resin of component ( A) has at least one repeating unit selected from repeating units represented by any one of the following general formulas (Ia) to (IIIa): It characterized feeling light composition.

In general formulas (Ia) to (IIIa),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
X represents —CH ₂ —, an oxygen atom, a sulfur atom, or —C (═O) —.
Lc represents a group that forms a lactone.
Ra ₁ 'and Ra _2' are each independently a hydrogen atom, an alkyl group, a cycloalkyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any _{two of} Ra ₁ ′, Ra ₂ ′ and Ra ₃ may be bonded to form a ring.
X _{11 is, -CH 2 -, - CH 2} CH 2 -, - O -, - S- or represents the -CH ₂ S-.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
n represents an integer of 1 or 2.
n ₁ and n ₂ represents an integer of 0-2. However, n ₁ + n ₂ is 2.
n ₃ represents an integer of 0 to 3. The resin of component (A) is selected from the repeating units represented by any of the following general formulas (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″) It has at least 1 type of repeating unit, The photosensitive composition of any one of Claims 1-3 characterized by the above-mentioned.

In the general formulas (Ia ″), (IIa ′), (IIa ″), (IIIa ′) and (IIIa ″),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₁ and Ra ₂ may combine to form a ring.
X _{1 is, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
Y ₂ and Y ₃ each independently represent —CH ₂ —, —CH ₂ CH ₂ —, —O— or —S—.
Rb _2, Rb ₃ and Rb ₄ each independently represents a hydrogen atom, an alkyl group, a hydroxyl group, a carboxyl group or an alkoxycarbonyl group.
n ₄ represents 0 or 1. (A) A group in which the hydroxyl group and / or the hydrogen atom of the hydroxyl group are substituted with a group selected from an acyl group, an alkyl group, a cycloalkyl group, and an acid-decomposable group and a group having a lactone structure in the same repeating unit. A resin having at least one repeating unit selected from repeating units and a repeating unit having a group having a lactone structure condensed with a 5- or 6-membered ring, and having increased solubility in an alkali developer by the action of an acid A photosensitive composition containing, wherein the resin of component (A) is at least one repeating unit selected from repeating units represented by any one of the general formulas (Ia-1) to (IIIa-1) A photosensitive composition comprising:

In the general formulas (Ia-1) to (IIIa-1),
Rb ₁ represents a hydrogen atom, an alkyl group or -CH ₂ -O-Rb _2a. In the formula, Rb _2a represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or a group having a lactone structure.
Rc represents a single bond or a divalent linking group.
Ra ₁ and Ra ₂ each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an acyl group, or an acid-decomposable group.
Ra ₃ represents a group having a carboxyl group, an alkyl group, an alkoxy group, an acyloxy group, an alkoxycarbonyl group or an acid-decomposable group.
Any two of Ra _{1 to} Ra ₃ may be bonded to form a ring.
X ₂ represents a single bond or —CH ₂ —.
X ₃ represents a single bond or —CH ₂ —.
X ₄ represents a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
X ₅ is a single _{bond, -CH 2 -, - CH 2} CH 2 -, - CH 2 O -, - O -, - S- or represents the -CH ₂ S-.
The sum of the number of atoms excluding the hydrogen atoms of X ₄ and X ₅ is 1 or 2.
n ₃ represents an integer of 0 to 3. The resin of component (A) is an acid-decomposable resin containing a repeating unit having a group represented by the following general formula (VII). Photosensitive composition.

In general formula (VII),
R ₂ c to R ₄ c each independently represents a hydrogen atom or a hydroxyl group. However, at least one of R ₂ c to R ₄ c represents a hydroxyl group.   The photosensitive film | membrane formed with the photosensitive composition of any one of Claims 1-6.   A pattern forming method comprising: exposing and developing the film according to claim 7.   The pattern forming method according to claim 8, wherein the exposure is immersion exposure.

Images