JP4566973B2 - Mixed gas supply device - Google Patents
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本願発明は、低蒸気圧物質をキャリアガスと混合した混合ガスを供給する混合ガス供給装置に関する。 The present invention relates to a mixed gas supply apparatus that supplies a mixed gas obtained by mixing a low vapor pressure substance with a carrier gas.
従来の典型的な化学酸素ヨウ素レーザ発生方法においては、塩素と窒素との混合ガスである反応ガスを、ＢＨＰ（Basic Hydrogen Peroxide）と呼ばれる過酸化水素と水酸化カリウムの混合水溶液と混合し、式（１）で示される化学反応によって励起酸素O2*（1Δ）を生成し、この励起酸素O2*（1Δ）を含む第１ガス流中にヨウ素I2を含む第２ガス流を噴射し、式（２）、（３）および（４）の化学反応を発生させて光を取り出す。そして、共振器内での誘導放出によって光が増幅され、レーザ光が出力される（たとえば、特許文献１参照）。 In a conventional chemical oxygen iodine laser generation method, a reaction gas, which is a mixed gas of chlorine and nitrogen, is mixed with a mixed aqueous solution of hydrogen peroxide and potassium hydroxide called BHP (Basic Hydrogen Peroxide). Excited oxygen O 2 * ( 1 Δ) is generated by the chemical reaction shown in (1), and a second gas stream containing iodine I 2 is contained in the first gas stream containing the excited oxygen O 2 * ( 1 Δ). The light is extracted by generating a chemical reaction of the formulas (2), (3), and (4). Then, light is amplified by stimulated emission in the resonator, and laser light is output (for example, see Patent Document 1).
H2O2＋2KOH＋Cl2→O2*（1Δ）＋2KCl＋2H2O …（１）
I2＋2O2*（1Δ）→2I＋2O2（3Σ） …（２）
I（2P3/2）＋O2*（1Δ）→I*（2P1/2）＋O2（3Σ） …（３）
I*（2P1/2）→I（2P3/2）＋hν（1.315μm） …（４）
I 2 + 2O 2 * ( 1 Δ) → 2I + 2O 2 ( 3 Σ) (2)
I (2 P 3/2) + O 2 * (1 Δ) → I * (2 P 1/2) + O 2 (3 Σ) ... (3)
I * (2 P 1/2) → I (2 P 3/2) + hν (1.315μm) ... (4)
前述したように化学酸素ヨウ素レーザは、その燃料となるヨウ素ガスの量に応じた出力を得られることから、大出力のレーザを得るためには、大容量のヨウ素ガスを瞬時に安定して発生し、高濃度でキャリアガスと均一に混合して供給できる混合ガス供給装置を必要とする。 As described above, the chemical oxygen iodine laser can obtain an output according to the amount of iodine gas used as its fuel, so in order to obtain a large output laser, a large volume of iodine gas is instantaneously and stably generated. In addition, a mixed gas supply device that can be uniformly mixed and supplied with the carrier gas at a high concentration is required.
ヨウ素は、常温では固体であるが、昇華性があるので、たとえば、図４に示すように、６０℃から１００℃程度に加熱して、数１０Ｔｏｒｒのヨウ素ガスを得る。この固体と気体のヨウ素が共存する容器にキャリアガスと呼ばれる不活性ガスを流して、バルブなどで流量を制限しながら、ヨウ素ガスと共にレーザ発生装置に供給するように構成していた。 Iodine is solid at room temperature, but has sublimation properties. For example, as shown in FIG. 4, it is heated to about 60 to 100 ° C. to obtain iodine gas of several tens of Torr. An inert gas called carrier gas is allowed to flow in a container in which solid and gaseous iodine coexist, and the flow rate is limited by a valve or the like, and the gas is supplied to the laser generator together with iodine gas.
しかしながら、図５のグラフに示すように、この構成では、容器の加熱を開始してから（図５中「ＯＮ」）、容器内で昇華して溜まっていくヨウ素ガスがキャリアガスと共に安定した量でレーザ発生装置に供給されるまでには数分程度（図５中では１分程度）掛かっており、瞬時安定性が必要となる短時間照射の高出力レーザ照射システムには構造的に不向きであった。 However, as shown in the graph of FIG. 5, in this configuration, after the heating of the container is started (“ON” in FIG. 5), a stable amount of iodine gas sublimated and accumulated in the container together with the carrier gas. It takes about a few minutes (about 1 minute in FIG. 5) to be supplied to the laser generator, and it is structurally unsuitable for a short-time high-power laser irradiation system that requires instantaneous stability. there were.
本願発明は、斯かる事情に鑑みてなされたものであり、短時間で十分な量の低蒸気圧物質ガス（たとえば、ヨウ素ガス）を安定して発生し、高濃度でキャリアガスと均一に混合して供給できる混合ガス供給装置を提供することを目的とする。 The present invention has been made in view of such circumstances, stably generates a sufficient amount of a low vapor pressure substance gas (for example, iodine gas) in a short time, and is uniformly mixed with a carrier gas at a high concentration. It is an object of the present invention to provide a mixed gas supply device that can be supplied.
本願発明に係る混合ガス供給装置は、低蒸気圧物質ガスをキャリアガスと混合した混合ガスを供給する混合ガス供給装置であって、固体の低蒸気圧物質を貯蔵し、加熱することによって貯蔵している固体の低蒸気圧物質を液化させる低蒸気圧物質貯槽部と、該低蒸気圧物質貯槽部で液化し、その後、気化した低蒸気圧物質のガスの流量を制限する超音速ノズルと、該超音速ノズルで流量を制限された低蒸気圧物質ガスをキャリアガスと混合する混合ノズルとを備え、前記混合ノズルは、前記超音速ノズルから流出した低蒸気圧物質ガスが流れる第１流路と、キャリアガスが供給されて前記第１流路に合流する第２流路とを有し、前記混合ノズルでは、キャリアガスの圧力が低蒸気圧物質ガスの圧力よりも大きい状態でキャリアガスが低蒸気圧物質ガスに混合されることを特徴とする。 A mixed gas supply apparatus according to the present invention is a mixed gas supply apparatus that supplies a mixed gas obtained by mixing a low vapor pressure substance gas with a carrier gas, and stores the solid low vapor pressure substance by heating and storing it. A low vapor pressure substance storage tank that liquefies the solid low vapor pressure substance, and a supersonic nozzle that liquefies in the low vapor pressure substance storage tank and then limits the gas flow rate of the vaporized low vapor pressure substance, A mixing nozzle for mixing a low vapor pressure substance gas whose flow rate is limited by the supersonic nozzle with a carrier gas , wherein the mixing nozzle is a first flow path through which the low vapor pressure substance gas flowing out of the supersonic nozzle flows. And a second flow path that is supplied with the carrier gas and merges with the first flow path. In the mixing nozzle, the carrier gas is in a state where the pressure of the carrier gas is higher than the pressure of the low vapor pressure substance gas. Low vapor pressure Characterized in that it is mixed in quality gas.
かかる構成によれば、固体の低蒸気圧物質が加熱によって液化され、対流を起こし、したがって、短時間で十分な量のヨウ素ガスを安定して発生し、高濃度でキャリアガスと均一に混合して供給でき、全体として装置を小型軽量化することが可能である。 According to such a configuration, the solid low vapor pressure substance is liquefied by heating and causes convection, so that a sufficient amount of iodine gas is stably generated in a short time, and is uniformly mixed with the carrier gas at a high concentration. As a whole, the apparatus can be reduced in size and weight.
前記第１流路と前記第２流路との合流部分において前記第２流路は前記第１流路よりも小さい流路断面を有していることが可能である。The second channel may have a smaller channel cross section than the first channel at the junction of the first channel and the second channel.
上記混合ガス供給装置は、ヨウ素ガスからなる低蒸気圧物質ガスを不活性ガスからなるキャリアガスと混合した混合ガスに励起酸素を反応させる化学酸素ヨウ素レーザ発生装置に前記混合ガスを供給する装置であることが可能である。なお、化学酸素ヨウ素レーザにおいては、キャリアガスと混合した混合ガスは、励起酸素O2*（1Δ）を含む第１ガスと反応させて、励起ヨウ素原子I*（2P1/2）の生成に使用される。 The mixed gas supply device is a device that supplies the mixed gas to a chemical oxygen iodine laser generator that reacts excited oxygen with a mixed gas in which a low vapor pressure substance gas made of iodine gas is mixed with a carrier gas made of an inert gas. It is possible that there is. In the chemical oxygen iodine laser, the mixed gas mixed with the carrier gas reacts with the first gas containing excited oxygen O 2 * ( 1 Δ) to generate excited iodine atoms I * ( 2 P 1/2 ). Used for generation.
上記低蒸気圧物質貯槽部は、ヨウ素を貯蔵することが可能であり、この場合には、効率的な液化を促すために、１１０℃以上まで加熱することが可能である。 The low vapor pressure materials storage tank unit is capable of storing the iodine, in this case, in order to promote efficient liquefaction can be heated up to 1 10 ° C. or more.
上記混合ノズルは、前記第２流路の前記第１流路への合流部分の下流側にコアンダ効果を利用する曲面が設けられていることが可能である。 The mixing nozzle may be provided with a curved surface that utilizes the Coanda effect on the downstream side of the joining portion of the second flow path to the first flow path .
上記発明によれば、短時間で十分な量の低蒸気圧物質（たとえば、ヨウ素）を安定して発生し、高濃度でキャリアガスと均一に混合して供給できる混合ガス供給装置を提供することが可能である。 According to the above invention, there is provided a mixed gas supply device that can stably generate a sufficient amount of a low vapor pressure substance (for example, iodine) in a short period of time and can be uniformly mixed and supplied with a carrier gas at a high concentration. Is possible.
以下、本願発明に係る混合ガス供給装置について添付の図面を参照しながら具体的に説明する。 Hereinafter, the mixed gas supply device according to the present invention will be described in detail with reference to the accompanying drawings.
図１に示すように、本実施の形態にかかる混合ガス供給装置200は、一例として化学酸素ヨウ素レーザ発生装置に混合ガスを供給するものとして示してあり、低蒸気圧物質の一例としてヨウ素を取り扱う。混合ガス供給装置200は、容器あるいは低蒸気圧貯槽部としてのヨウ素貯槽部26、および混合ノズル22のほか、超音速ノズル部28を備えている。 As shown in FIG. 1, the mixed gas supply apparatus 200 according to the present embodiment is illustrated as supplying a mixed gas to a chemical oxygen iodine laser generator as an example, and handles iodine as an example of a low vapor pressure substance. . The mixed gas supply apparatus 200 includes a supersonic nozzle unit 28 in addition to an iodine storage unit 26 as a container or a low vapor pressure storage unit and the mixing nozzle 22.
ヨウ素貯槽部26は、加熱装置を具備しており、内部に貯蔵した固体ヨウ素を１１０℃以上（好ましくは、１１３℃以上）に加熱し、液化させる。液化させるとヨウ素は、ヨウ素貯槽部26内で対流を生じ、伝熱効率が高まり、より短時間で圧力が上昇する。このように、ヨウ素貯槽部26は、ヨウ素を固体で貯蔵し、使用する際に液化させるので、従来と同様のサイズの容器であっても、より短時間で圧力を上昇させることができる。 The iodine storage tank unit 26 includes a heating device, and heats solid iodine stored therein to 110 ° C. or higher (preferably 113 ° C. or higher) to be liquefied. When liquefied, iodine causes convection in the iodine reservoir 26, increasing the heat transfer efficiency and increasing the pressure in a shorter time. Thus, since the iodine storage tank part 26 stores iodine as a solid and liquefies it when used, it can raise the pressure in a shorter time even if it is a container of the same size as the conventional one.
上記加熱装置としては、取り扱う低蒸気圧物質の気化熱以上の熱源を持つことが好ましく、低蒸気圧物質としてヨウ素を取り扱う場合、ヨウ素の気化熱が46.7kJ/mol（184kJ/kg）であるので、ヨウ素貯槽部26からのヨウ素ガス供給量を0.01kg/secとすれば、1.84kWの加熱量が必要となる。これによって、ヨウ素の供給量と蒸発量（気化量）とがつり合うので長時間の安定供給が可能である。 The heating device preferably has a heat source higher than the heat of vaporization of the low vapor pressure material to be handled. When iodine is handled as the low vapor pressure material, the heat of vaporization of iodine is 46.7 kJ / mol (184 kJ / kg). If the supply amount of iodine gas from the iodine storage tank unit is 0.01 kg / sec, a heating amount of 1.84 kW is required. Thereby, since the supply amount of iodine and the evaporation amount (vaporization amount) are balanced, stable supply for a long time is possible.
本実施の形態にかかるヨウ素貯槽部26によれば、図２の試験結果に示すように、加熱を開始してから（図２中「ＯＮ」）から１秒程度でヨウ素ガス発生量を安定化させることが判る。 According to the iodine storage tank section 26 according to the present embodiment, as shown in the test result of FIG. 2, the iodine gas generation amount is stabilized in about 1 second after starting heating (“ON” in FIG. 2). You can see that.
ヨウ素貯槽部26内で液化し、その後、気化したヨウ素ガスは、所定のガス経路を通じて超音速ノズル部28に送られる。超音速ノズル部28は、ラバールノズルなどのＩＳＯ９３００に準拠したトレーサビリティ用のノズルあるいは臨界ノズルであって、ヨウ素貯槽部26から送られてきたヨウ素ガスの流量を制限し、早期に流量を安定化させるためのものである。 The iodine gas liquefied in the iodine storage tank 26 and then vaporized is sent to the supersonic nozzle part 28 through a predetermined gas path. The supersonic nozzle section 28 is a traceability nozzle or a critical nozzle conforming to ISO 9300, such as a Laval nozzle, for limiting the flow rate of iodine gas sent from the iodine storage tank section 26 and stabilizing the flow rate at an early stage. belongs to.
この超音速ノズル部28を通過して、一定の流量でヨウ素ガスを流すためには、その入口にて所定圧力以上のヨウ素ガス圧力が必要である。上記したヨウ素貯槽部26では、この必要圧力に極めて短時間で到達させることができ、したがって、極めて短時間で超音速ノズル部28から一定流量のヨウ素ガスを出力することができる。 In order to flow iodine gas at a constant flow rate through the supersonic nozzle portion 28, an iodine gas pressure equal to or higher than a predetermined pressure is required at the inlet. In the above-described iodine storage tank portion 26, this necessary pressure can be reached in a very short time, and therefore, a constant flow of iodine gas can be output from the supersonic nozzle portion 28 in a very short time.
この流量制限手段としての超音速ノズル部28は、オリフィスなどでも代用することが可能であるが、オリフィスでは圧力損失が比較的大きいため、このような用途においては超音速ノズルの方が適している。 The supersonic nozzle portion 28 as the flow restricting means can be replaced by an orifice or the like. However, since the pressure loss is relatively large in the orifice, the supersonic nozzle is more suitable for such an application. .
流量一定とされたヨウ素ガスは、所定のガス経路を通じて混合ノズル22に送られる。混合ノズル22は、キャリアガス（不活性ガス）とヨウ素ガスI2とを混合させるものである。本実施の形態においては、混合ノズル22は、コアンダ効果を利用したノズル（「コアンダノズル」とも呼ばれる）真空発生器であり、「キャリアガス圧力P2＞＞ヨウ素ガス圧力P1」の状態を生成し、より多くのヨウ素ガスをキャリアガスと混合させるように構成されている。 The iodine gas having a constant flow rate is sent to the mixing nozzle 22 through a predetermined gas path. Mixing nozzle 22, a carrier gas (inert gas) and the iodine gas I 2 are those engaged mixed. In the present embodiment, the mixing nozzle 22 is a nozzle using the Coanda effect (also referred to as “Coanda nozzle”) vacuum generator, and generates a state of “carrier gas pressure P2 >> iodine gas pressure P1”. It is configured to mix more iodine gas with the carrier gas.
混合されて生じた混合ガス、つまり、ここでは、励起ヨウ素原子I*（2P1/2）は、所定のガス経路を通じて化学酸素ヨウ素レーザ発生装置に送られる。化学酸素ヨウ素レーザにおいては、混合ガス供給装置200から供給された混合ガスを、励起酸素O 2 *（ 1 Δ）を含む第１ガスと反応させて、励起ヨウ素原子I*（ 2 P 1/2 ）の生成に使用される。
The mixed gas generated by mixing, that is, the excited iodine atom I * ( 2 P 1/2 ) here is sent to the chemical oxygen iodine laser generator through a predetermined gas path. In the chemical oxygen iodine laser, the mixed gas supplied from the mixed gas supply apparatus 200 is reacted with a first gas containing excited oxygen O 2 * ( 1 Δ) to generate excited iodine atoms I * ( 2 P 1/2 ) To generate.
図３は、混合ノズル22の構成およびその試験結果を示す図である。図３に示すように、高速なキャリアガスに対して、超音速ノズル28から送られてくるヨウ素ガスが効率良く大量に、しかも均一に混合し、極めてヨウ素濃度の高い混合ガスが生成されて、化学酸素ヨウ素レーザ発生装置に送られることが判る。また、キャリアガスとの混合によりヨウ素の再結合が抑制されることになる。 FIG. 3 is a diagram showing the configuration of the mixing nozzle 22 and the test results thereof. As shown in FIG. 3, iodine gas sent from the supersonic nozzle 28 is efficiently and uniformly mixed with a high-speed carrier gas, and a mixed gas having an extremely high iodine concentration is generated. It can be seen that it is sent to a chemical oxygen iodine laser generator. Moreover, the recombination of iodine is suppressed by mixing with the carrier gas.
なお、以上の実施の形態においては、低蒸気圧物質の一例としてヨウ素を示したが、これに限定されず、任意の他の適切な低蒸気圧物質に適用可能である。 In the above embodiment, iodine is shown as an example of the low vapor pressure substance. However, the present invention is not limited to this, and can be applied to any other appropriate low vapor pressure substance.
以上のように、本願発明に係る混合ガス供給装置によれば、短時間で十分な量の低蒸気圧物質ガス（たとえば、ヨウ素ガス）を安定して発生し、高濃度でキャリアガスと均一に混合して供給できる混合ガス供給装置を提供することが要求される用途に利用可能である。 As described above, according to the mixed gas supply device of the present invention, a sufficient amount of low vapor pressure material gas (for example, iodine gas) can be stably generated in a short time, and uniformly with the carrier gas at a high concentration. The present invention can be used for applications that require provision of a mixed gas supply device that can be mixed and supplied.
22 混合ノズル
26 ヨウ素貯槽部
28 超音速ノズル
200 混合ガス供給装置
22 Mixing nozzle
26 Iodine tank
28 Supersonic nozzle
200 Mixed gas supply device
Claims (5)
固体の低蒸気圧物質を貯蔵し、加熱することによって貯蔵している固体の低蒸気圧物質を液化させる低蒸気圧物質貯槽部と、
該低蒸気圧物質貯槽部で液化し、その後、気化した低蒸気圧物質のガスの流量を制限する超音速ノズルと、
該超音速ノズルで流量を制限された低蒸気圧物質ガスをキャリアガスと混合する混合ノズルとを備え、
前記混合ノズルは、前記超音速ノズルから流出した低蒸気圧物質ガスが流れる第１流路と、キャリアガスが供給されて前記第１流路に合流する第２流路とを有し、前記混合ノズルでは、キャリアガスの圧力が低蒸気圧物質ガスの圧力よりも大きい状態でキャリアガスが低蒸気圧物質ガスに混合されることを特徴とする混合ガス供給装置。 A mixed gas supply device for supplying a mixed gas obtained by mixing a low vapor pressure substance gas with a carrier gas,
A low vapor pressure substance storage unit for liquefying the solid low vapor pressure substance stored by storing and heating the solid low vapor pressure substance;
A supersonic nozzle that liquefies in the low vapor pressure substance storage tank and then limits the gas flow rate of the vaporized low vapor pressure substance;
A mixing nozzle for mixing a low vapor pressure substance gas whose flow rate is limited by the supersonic nozzle with a carrier gas ,
The mixing nozzle includes a first flow path through which a low vapor pressure material gas flowing out from the supersonic nozzle flows, and a second flow path that is supplied with a carrier gas and merges with the first flow path, In the nozzle, the carrier gas is mixed with the low vapor pressure material gas in a state where the pressure of the carrier gas is larger than the pressure of the low vapor pressure material gas .
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| JPH09186377A (en) * | 1995-12-30 | 1997-07-15 | Kawasaki Heavy Ind Ltd | Method and device for emitting iodine laser beam |
| JPH11103107A (en) * | 1997-09-26 | 1999-04-13 | Kawasaki Heavy Ind Ltd | Iodine laser generation device |
| JP2001358390A (en) * | 2000-06-13 | 2001-12-26 | Tokai Univ | Iodine laser device and oscillation method of iodine laser |
| JP2006156790A (en) * | 2004-11-30 | 2006-06-15 | Kawasaki Heavy Ind Ltd | Gas laser generator |
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| JP2008112947A (en) | 2008-05-15 |
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