JP4521257B2 - Heat treatment method and heat treatment apparatus - Google Patents

Heat treatment method and heat treatment apparatus Download PDF

Info

Publication number
JP4521257B2
JP4521257B2 JP2004348488A JP2004348488A JP4521257B2 JP 4521257 B2 JP4521257 B2 JP 4521257B2 JP 2004348488 A JP2004348488 A JP 2004348488A JP 2004348488 A JP2004348488 A JP 2004348488A JP 4521257 B2 JP4521257 B2 JP 4521257B2
Authority
JP
Japan
Prior art keywords
furnace
chamber
heat treatment
carry
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2004348488A
Other languages
Japanese (ja)
Other versions
JP2006152417A (en
Inventor
広良 鈴木
慎一 武本
浩次 阿部
俊明 大橋
崇 櫻井
智彦 西山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Toyota Motor Corp
Original Assignee
Dowa Holdings Co Ltd
Toyota Motor Corp
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Holdings Co Ltd, Toyota Motor Corp, Dowa Mining Co Ltd filed Critical Dowa Holdings Co Ltd
Priority to JP2004348488A priority Critical patent/JP4521257B2/en
Publication of JP2006152417A publication Critical patent/JP2006152417A/en
Application granted granted Critical
Publication of JP4521257B2 publication Critical patent/JP4521257B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Description

本発明は,鋼材の熱処理方法及び熱処理装置に関する。   The present invention relates to a heat treatment method and a heat treatment apparatus for steel.

鋼材の熱処理では雰囲気制御が重要であり,かかる雰囲気制御は,熱処理雰囲気のCP(カーボンポテンシャル)を制御することによって行われる。   Atmosphere control is important in heat treatment of steel materials, and such atmosphere control is performed by controlling the CP (carbon potential) of the heat treatment atmosphere.

従来,鋼材の浸炭熱処理において,CPに基づいてエンリッチガス(CmHnガス)の供給量を制御することによりCPを一定の値に安定させる方法が開示されている(例えば,特許文献1参照)。また,比例制御,PID制御などのフィードバック制御によってCPを安定させる方法が開示されている(例えば,特許文献2参照)。   Conventionally, in carburizing heat treatment of steel materials, a method has been disclosed in which CP is stabilized at a constant value by controlling the supply amount of enriched gas (CmHn gas) based on CP (see, for example, Patent Document 1). Further, a method for stabilizing CP by feedback control such as proportional control and PID control is disclosed (for example, see Patent Document 2).

特公平5−15782号公報Japanese Patent Publication No. 5-15782 特開2003−013136号公報JP 2003-013136 A

しかしながら,従来の熱処理炉にあっては,被処理体を搬入出するときに,炉の開口を開くと,炉内に空気が侵入して,CPが大きく減少するため,制御応答(CP)がオーバーシュートする問題があった。さらに,制御応答が不安定になってハンチングが起こったり,目標値になるまでに時間がかかったりすることがあった。   However, in the conventional heat treatment furnace, when the workpiece is loaded and unloaded, if the opening of the furnace is opened, air enters the furnace and CP is greatly reduced. There was a problem of overshoot. In addition, the control response may become unstable, causing hunting, and it may take some time to reach the target value.

本発明の目的は,CPが大きく減少しても,CPを目標値に安定して回復させることができる熱処理方法及び熱処理装置を提供することにある。   An object of the present invention is to provide a heat treatment method and a heat treatment apparatus capable of stably recovering CP to a target value even when CP is greatly reduced.

上記課題を解決するために,本発明によれば,炉内にエンリッチガスを供給し,前記炉内で被処理体を熱処理する熱処理方法であって,炉内のカーボンポテンシャルに基づいて前記エンリッチガスの供給流量を操作することにより,カーボンポテンシャルをフィードバック制御し,炉の開口を開いているとき,及び,炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になるまでまたは所定時間の間は,前記フィードバック制御を停止させ,前記フィードバック制御を停止させる直前におけるエンリッチガスの供給流量を維持し,炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になったらまたは所定時間経過したら,前記フィードバック制御を行うことを特徴とする,熱処理方法が提供される。   In order to solve the above-mentioned problems, according to the present invention, there is provided a heat treatment method for supplying an enriched gas into a furnace and heat-treating an object to be treated in the furnace, wherein the enriched gas is based on a carbon potential in the furnace. By controlling the supply flow rate, the carbon potential is feedback-controlled, and when the furnace opening is open, and after the furnace opening is closed until the carbon potential in the furnace reaches the target value or for a predetermined time. Stops the feedback control, maintains the supply flow rate of the enriched gas immediately before stopping the feedback control, and when the carbon potential in the furnace reaches the target value after closing the furnace opening or when a predetermined time has elapsed, There is provided a heat treatment method characterized by performing the feedback control.

前記開口は,被処理体を炉内に搬入するための搬入口であって,前記炉の搬入口を閉じた状態で,前記炉の搬入口の外側に設けた搬入室の入口を開き,被処理体を搬入室に搬入し,前記搬入室の入口を閉じた後,前記炉の搬入口を開いて被処理体を炉内に搬入することとしても良い。   The opening is a carry-in port for carrying the object to be processed into the furnace, and with the carry-in port of the furnace closed, the entrance of the carry-in chamber provided outside the carry-in port of the furnace is opened, It is good also as carrying in a to-be-processed object into a furnace by opening a carrying-in entrance of the said furnace after opening a to-be-processed body into a carrying-in chamber and closing the entrance of the said carrying-in chamber.

前記開口は,被処理体を炉内から搬出するための搬出口であって,前記炉の搬出口の外側に設けた油槽室の出口を閉じた状態で,前記炉の搬出口を開き,被処理体を前記油槽室に搬入し,前記炉の搬出口を閉じた後,前記油槽室の出口を開いて被処理体を前記油槽室から搬出することとしても良い。   The opening is a carry-out port for carrying out the object to be processed out of the furnace, and with the oil tank chamber outlet provided outside the furnace carry-out port closed, the carry-out port of the furnace is opened, It is good also as carrying out a to-be-processed object from the said oil tank chamber by opening the exit of the said oil tank chamber after opening a process body in the said oil tank chamber and closing the carrying-out port of the said furnace.

前記フィードバック制御は,PID制御であっても良い。また,炉内に存在する被処理体の表面積が多いほど,前記エンリッチガスの最大供給流量を多くするようにしても良い。   The feedback control may be PID control. Further, the maximum supply flow rate of the enriched gas may be increased as the surface area of the object to be processed existing in the furnace increases.

また,本発明によれば,炉内にエンリッチガスを供給し,前記炉内で被処理体を熱処理する熱処理装置であって,炉内のカーボンポテンシャルに基づいて前記エンリッチガスの供給路に設けられた流量調整弁の開度を調節する調節器を備えるとともに,前記カーボンポテンシャルをフィードバック制御するフィードバック制御系が構成され,前記調節器は,炉の開口を開いているとき,及び,炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になるまでまたは所定時間の間は,前記調節器の調節を停止させ,炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になったらまたは所定時間経過したら,前記調節器の調節を行い,前記流量調整弁は,前記調節器の調節を停止している間,前記調節器の調節を停止させる直前における開度を維持することを特徴とする,熱処理装置が提供される。   According to the present invention, there is also provided a heat treatment apparatus for supplying an enriched gas into a furnace and heat-treating an object to be treated in the furnace, wherein the enriched gas is provided in the enriched gas supply path based on a carbon potential in the furnace. And a feedback control system for feedback control of the carbon potential is configured, and the regulator controls the opening of the furnace and the opening of the furnace. The adjustment of the regulator is stopped until the carbon potential in the furnace reaches the target value after the closing or for a predetermined time, and the carbon potential in the furnace reaches the target value after the furnace opening is closed or the predetermined value. When the time has elapsed, the controller is adjusted, and the flow control valve is in a state immediately before the controller is stopped while the controller is stopped. It takes and maintains the opening degree, the heat treatment apparatus is provided.

前記開口は,被処理体を炉内に搬入するための搬入口であって,前記炉の搬入口の外側に,搬入室を設けても良い。前記開口は,被処理体を炉内から搬出するための搬出口であって,前記炉の搬出口の外側に,油槽室を設けても良い。前記フィードバック制御は,PID制御であっても良い。   The opening is a carry-in port for carrying the workpiece into the furnace, and a carry-in chamber may be provided outside the carry-in port of the furnace. The opening is a carry-out port for carrying out the object to be processed out of the furnace, and an oil tank chamber may be provided outside the carry-out port of the furnace. The feedback control may be PID control.

本発明によれば,炉の開口を開いたときはフィードバック制御を停止して,エンリッチガスの供給流量を一定にすることにより,CPが不安定になることを防止でき,また,CPの目標値に迅速に回復させることができる。複雑な制御の設定を行うことなく,簡単にCPの安定を図ることができる。炉内に存在する被処理体の表面積に応じてエンリッチガスの最大供給流量を変化させることにより,浸炭深さを適切にすることができる。   According to the present invention, when the furnace opening is opened, the feedback control is stopped and the supply flow rate of the enriched gas is made constant to prevent the CP from becoming unstable. Can be quickly recovered. CP can be easily stabilized without complicated control settings. The carburization depth can be made appropriate by changing the maximum supply flow rate of the rich gas in accordance with the surface area of the object to be processed existing in the furnace.

以下,本発明の好ましい実施の形態を図面を参照にして説明する。図1に示すように,本発明にかかる熱処理方法としての浸炭処理方法を実施する熱処理装置としての浸炭処理装置1は,鋼材品である被処理体2の熱処理を行う熱処理炉3を備えている。熱処理炉3の前方(図1において左方)には,搬入室5が設けられている。熱処理炉3の後方(図1において右方)には,油槽室6が設けられている。熱処理炉3内には,予熱室11,浸炭室12,拡散室13,降温室14,均熱室15が,後方に向かってこの順に設けられている。予熱室11,浸炭室12,拡散室13,降温室14,均熱室15内の雰囲気は,互いに連通した状態になっている。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. As shown in FIG. 1, a carburizing apparatus 1 as a heat treating apparatus for carrying out a carburizing process method as a heat treatment method according to the present invention includes a heat treatment furnace 3 for performing a heat treatment of an object 2 to be treated. . A carry-in chamber 5 is provided in front of the heat treatment furnace 3 (left side in FIG. 1). An oil tank chamber 6 is provided behind the heat treatment furnace 3 (right side in FIG. 1). In the heat treatment furnace 3, a preheating chamber 11, a carburizing chamber 12, a diffusion chamber 13, a descending chamber 14, and a soaking chamber 15 are provided in this order toward the rear. The atmospheres in the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the descending room 14, and the soaking chamber 15 are in communication with each other.

搬入室5には,被処理体2を搬入室5内に搬入するための入口21が形成されており,入口21を開閉する扉22が設けられている。また,搬入室5の上部には,エキセス23が備えられている。   In the carry-in chamber 5, an inlet 21 for carrying the workpiece 2 into the carry-in chamber 5 is formed, and a door 22 for opening and closing the inlet 21 is provided. An excess 23 is provided in the upper part of the carry-in chamber 5.

熱処理炉3の前部には,被処理体2を搬入室5から熱処理炉3に搬入するための開口としての搬入口31が形成され,搬入口31を開閉する扉32が設けられている。前述した搬入室5は,搬入口31の外側に設けられており,搬入口31を介して熱処理炉3と連通するようになっている。扉32には,孔32aが設けられている。熱処理炉3の後部には,被処理体2を熱処理炉3から搬出して油槽室6に搬入するための開口としての搬出口33が形成され,搬出口33を開閉する扉34が設けられている。前述した油槽室6は,搬出口33の外側に設けられており,搬出口33を介して熱処理炉3と連通するようになっている。扉34には,孔34aが設けられている。   At the front part of the heat treatment furnace 3, a carry-in entrance 31 is formed as an opening for carrying the workpiece 2 from the carry-in chamber 5 into the heat treatment furnace 3, and a door 32 for opening and closing the carry-in entrance 31 is provided. The carry-in chamber 5 described above is provided outside the carry-in port 31 and communicates with the heat treatment furnace 3 through the carry-in port 31. The door 32 is provided with a hole 32a. At the rear part of the heat treatment furnace 3, a carry-out port 33 is formed as an opening for carrying out the object 2 from the heat treatment furnace 3 and carrying it into the oil tank chamber 6, and a door 34 for opening and closing the carry-out port 33 is provided. Yes. The oil tank chamber 6 described above is provided outside the carry-out port 33 and communicates with the heat treatment furnace 3 through the carry-out port 33. The door 34 is provided with a hole 34a.

熱処理炉3内の下部には,被処理体2を搬入口31から搬出口33に向かって搬送するローラコンベア35が設けられている。被処理体2は,ローラコンベア35によって予熱室11,浸炭室12,拡散室13,降温室14,均熱室15を順に通過するように搬送される。   A roller conveyor 35 that conveys the workpiece 2 from the carry-in port 31 toward the carry-out port 33 is provided in the lower part of the heat treatment furnace 3. The workpiece 2 is transported by the roller conveyor 35 so as to pass through the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the cooling chamber 14, and the soaking chamber 15 in this order.

また,熱処理炉3には,エンリッチガスとして例えば都市ガスなどを供給するエンリッチガス供給回路41,RXガス(COガス)供給回路42,空気を供給する空気供給回路43,及び,窒素(N)ガス供給回路44が接続されている。 Further, the heat treatment furnace 3 includes an enrich gas supply circuit 41 that supplies, for example, city gas as an enrich gas, an RX gas (CO gas) supply circuit 42, an air supply circuit 43 that supplies air, and nitrogen (N 2 ). A gas supply circuit 44 is connected.

エンリッチガス供給回路41は,浸炭室12にエンリッチガスを供給する供給路52,拡散室13にエンリッチガスを供給する供給路53,及び,均熱室15にエンリッチガスを供給する供給路55を備えている。供給路52,53,55には,流量調整弁62,63,65がそれぞれ介設されている。流量調整弁62,63,65は,調節器68の出力信号によって開度が調節されるようになっている。   The enrich gas supply circuit 41 includes a supply path 52 for supplying the enrich gas to the carburizing chamber 12, a supply path 53 for supplying the enrich gas to the diffusion chamber 13, and a supply path 55 for supplying the enrich gas to the soaking chamber 15. ing. Flow rate adjustment valves 62, 63, and 65 are interposed in the supply paths 52, 53, and 55, respectively. The flow rate adjusting valves 62, 63, 65 are adjusted in opening degree by the output signal of the adjuster 68.

RXガス供給回路42は,予熱室11にRXガスを供給する供給路71,浸炭室12にRXガスを供給する供給路72,拡散室13にRXガスを供給する供給路73,及び,均熱室15にRXガスを供給する供給路75を備えている。空気供給回路43は,予熱室11に空気を供給する供給路81,浸炭室12に空気を供給する供給路82,及び,降温室14に空気を供給する供給路84を備えている。窒素ガス供給回路44は,予熱室11に窒素ガスを供給する供給路91,浸炭室12に窒素ガスを供給する供給路92,及び,降温室14に窒素ガスを供給する供給路94を備えている。   The RX gas supply circuit 42 includes a supply path 71 that supplies RX gas to the preheating chamber 11, a supply path 72 that supplies RX gas to the carburizing chamber 12, a supply path 73 that supplies RX gas to the diffusion chamber 13, and a soaking A supply path 75 for supplying RX gas to the chamber 15 is provided. The air supply circuit 43 includes a supply path 81 that supplies air to the preheating chamber 11, a supply path 82 that supplies air to the carburizing chamber 12, and a supply path 84 that supplies air to the greenhouse 14. The nitrogen gas supply circuit 44 includes a supply path 91 for supplying nitrogen gas to the preheating chamber 11, a supply path 92 for supplying nitrogen gas to the carburizing chamber 12, and a supply path 94 for supplying nitrogen gas to the descending chamber 14. Yes.

予熱室11,浸炭室12,拡散室13,降温室14,均熱室15の上部には,炉内雰囲気を攪拌するファン100がそれぞれ備えられている。また,図示はしないが,予熱室11,浸炭室12,拡散室13,降温室14,均熱室15において,ローラコンベア35の両側には,ヒータが設けられている。浸炭室12,拡散室13,及び,均熱室15には,酸素(O)センサ101,102,103がそれぞれ設けられている。酸素センサ101,102,103の検出値は,調節器68に送信されるようになっている。 Above the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the descending chamber 14, and the soaking chamber 15, fans 100 for stirring the furnace atmosphere are provided. Although not shown, heaters are provided on both sides of the roller conveyor 35 in the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the descending chamber 14, and the soaking chamber 15. The carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 are provided with oxygen (O 2 ) sensors 101, 102, and 103, respectively. The detection values of the oxygen sensors 101, 102, 103 are transmitted to the controller 68.

調節器68は,酸素センサ101,102,103の検出値に基づいて,浸炭室12,拡散室13,均熱室15における各CPを計算する機能を有し,また,浸炭室12,拡散室13,均熱室15内の各CPに基づいて流量調整弁62,63,65の各開度をそれぞれ調節するPID(比例・積分・微分)調節計の機能を有する。即ち,調節器68は,計算により求めた浸炭室12,拡散室13,均熱室15内の各CPをそれぞれの目標値と比較し,各CPがそれぞれ目標値になるように,流量調整弁62,63,65の各操作量を求め,流量調整弁62,63,65に対して操作信号を送信する。そして,調節器68の操作信号に応じて流量調整弁62,63,65の開度がそれぞれ調節され,これにより,供給路52,53,55からの各エンリッチガス供給流量がそれぞれ調節される。即ち,酸素センサ101,調節器68及び流量調整弁62を備えたフィードバック制御系としてのPID制御系105と,酸素センサ102,調節器68及び流量調整弁63を備えたフィードバック制御系としてのPID制御系106と,酸素センサ103,調節器68及び流量調整弁65を備えたフィードバック制御系としてのPID制御系107とが構成されており,浸炭室12におけるCPはPID制御系105によって制御され,拡散室13におけるCPはPID制御系106によって制御され,均熱室15におけるCPはPID制御系107によって制御されるようになっている。   The controller 68 has a function of calculating each CP in the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 based on the detection values of the oxygen sensors 101, 102, 103, and the carburizing chamber 12, the diffusion chamber. 13. It has a function of a PID (proportional / integral / derivative) controller that adjusts the opening degree of each of the flow rate adjusting valves 62, 63, 65 based on each CP in the soaking chamber 15. That is, the controller 68 compares each CP in the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 obtained by calculation with each target value, and adjusts the flow rate adjusting valve so that each CP becomes a target value. The operation amounts 62, 63, 65 are obtained, and operation signals are transmitted to the flow rate adjusting valves 62, 63, 65. Then, the opening degree of the flow rate adjusting valves 62, 63, 65 is adjusted in accordance with the operation signal of the adjuster 68, whereby the rich gas supply flow rates from the supply paths 52, 53, 55 are adjusted. That is, a PID control system 105 as a feedback control system including the oxygen sensor 101, the regulator 68 and the flow rate adjustment valve 62, and a PID control as a feedback control system including the oxygen sensor 102, the regulator 68 and the flow rate adjustment valve 63. A system 106 and a PID control system 107 as a feedback control system including an oxygen sensor 103, a regulator 68, and a flow rate adjustment valve 65 are configured, and the CP in the carburizing chamber 12 is controlled by the PID control system 105 and diffused. The CP in the chamber 13 is controlled by the PID control system 106, and the CP in the soaking chamber 15 is controlled by the PID control system 107.

油槽室6の下部には,油槽115が備えられている。また,被処理体2を油槽室6内から搬出するための出口116が形成されており,出口116を開閉する扉117が設けられている。また,油槽室6の上部には,エキセス118が備えられている。   An oil tank 115 is provided below the oil tank chamber 6. Further, an outlet 116 for carrying out the workpiece 2 from the oil tank chamber 6 is formed, and a door 117 for opening and closing the outlet 116 is provided. An excision 118 is provided in the upper part of the oil tank chamber 6.

なお,熱処理炉3内の雰囲気は,扉32の孔32a,扉34の孔34aを介して搬入室5及び油槽室6に流入して,エキセス23,118から排気されるようになっている。熱処理炉3内の炉圧は,エキセス23,118の開度を制御することにより制御されるようになっている。   The atmosphere in the heat treatment furnace 3 flows into the carry-in chamber 5 and the oil tank chamber 6 through the hole 32a of the door 32 and the hole 34a of the door 34, and is exhausted from the exhausts 23 and 118. The furnace pressure in the heat treatment furnace 3 is controlled by controlling the openings of the executions 23 and 118.

また,浸炭処理装置1には,浸炭処理装置1における工程を制御するシーケンサ120が備えられている。前述した調節器68は,シーケンサ120にネットワーク等を介して接続されている。シーケンサ120は,浸炭処理装置1の状態に応じて,調節器68に対してPID調節を中止させたり,再開させたりする命令を送信することができる。例えば,熱処理炉3の搬入口31や搬出口33を開いたとき,シーケンサ120は,調節器68に対してPID調節を停止させる命令を与える。これにより,PID制御系105,106,107の各PID制御が停止されるようになっている。   In addition, the carburizing apparatus 1 is provided with a sequencer 120 that controls processes in the carburizing apparatus 1. The controller 68 described above is connected to the sequencer 120 via a network or the like. The sequencer 120 can transmit an instruction to stop or restart the PID adjustment to the adjuster 68 according to the state of the carburizing apparatus 1. For example, when the carry-in port 31 and the carry-out port 33 of the heat treatment furnace 3 are opened, the sequencer 120 gives a command for stopping the PID adjustment to the adjuster 68. Thereby, each PID control of the PID control systems 105, 106, and 107 is stopped.

図2は,搬入室5の入口21及び油槽室6の出口116を閉じた状態で搬入口31及び搬出口33を開いたときの,熱処理炉3内の圧力の変化を示している。図3及び図4は,そのときの浸炭室12におけるCPの変化,供給路52からのエンリッチガスの供給流量の変化をそれぞれ示している。搬入室5の入口21及び油槽室6の出口116を閉じた状態で,熱処理炉3の搬入口31又は搬出口33が開きはじめると(図2においてS1),搬入室5内又は油槽室6内の低温の雰囲気が熱処理炉3内からの輻射熱によって加熱されて急激に膨張し,図2に示すように,熱処理炉3内の圧力が上昇する。その後,搬入口31又は搬出口33が閉まりはじめると(図2においてS2),熱処理炉3内の圧力が急激に下降する。搬入口31又は搬出口33が閉じられると(図2においてS3),熱処理炉3内の圧力が下降し続けた後,熱処理炉3の外部から空気が吸い込まれる。そのため,図3に示すように,浸炭室12内のCPが急激に下降する。このようにCPが急激に減少するときに,PID制御系105のPID制御をそのまま継続すると,図4において一点鎖線で示すように,供給路52からのエンリッチガスの供給流量を急激に増加させるように制御され,図3において一点鎖線で示すように,浸炭室12のCPがオーバーシュートする。そして,CPが不安定になってハンチングが起こったり,目標値になるまでに時間がかかったりするなどの問題が生じて,制御が良好に行われなくなる。これに対し,浸炭室12のCPが急激に減少するときに,PID制御系105のPID制御を停止させると,CPが不安定に変化することはない。図4において実線で示すように,エンリッチガス供給流量を一定の値に維持して供給すると,図3において実線で示すように,CPが徐々に上昇して,CPの目標値に近づく。そして,浸炭室12のCPがほぼ目標値に達した後に,PID制御系105のPID制御を再開させれば,CPが不安定になるおそれはない。また,PID制御を継続させた場合と比較して,CPを目標値に早く回復させることができる。以上のような理由により,シーケンサ120は,熱処理炉3の搬入口31や搬出口33を開く命令を与えると同時に,調節器68に対してPID調節を停止させる命令を与え,PID制御系105のPID制御を停止させ,浸炭室12のCPが不安定に変化することを防止するようになっている。同様に,搬入口31や搬出口33を開くとき,PID制御系106,107のPID制御を停止させ,拡散室13,均熱室15の各CPが不安定に変化することを防止して,目標値に早く回復できるようにしている。   FIG. 2 shows changes in pressure in the heat treatment furnace 3 when the inlet 31 and the outlet 33 are opened with the inlet 21 of the inlet chamber 5 and the outlet 116 of the oil tank chamber 6 closed. 3 and 4 show the change in the CP in the carburizing chamber 12 and the change in the supply flow rate of the rich gas from the supply path 52, respectively. When the inlet 21 or the outlet 33 of the heat treatment furnace 3 starts to open with the inlet 21 of the inlet chamber 5 and the outlet 116 of the oil tank chamber 6 closed (S1 in FIG. 2), the inside of the inlet chamber 5 or the oil tank chamber 6 The low temperature atmosphere is heated by the radiant heat from the heat treatment furnace 3 and rapidly expands, and the pressure in the heat treatment furnace 3 rises as shown in FIG. After that, when the carry-in port 31 or the carry-out port 33 starts to close (S2 in FIG. 2), the pressure in the heat treatment furnace 3 rapidly decreases. When the carry-in port 31 or the carry-out port 33 is closed (S3 in FIG. 2), after the pressure in the heat treatment furnace 3 continues to drop, air is sucked from the outside of the heat treatment furnace 3. Therefore, as shown in FIG. 3, the CP in the carburizing chamber 12 is rapidly lowered. Thus, when the PID control of the PID control system 105 is continued as it is when the CP sharply decreases, the supply flow rate of the enriched gas from the supply path 52 is rapidly increased as shown by the one-dot chain line in FIG. The CP of the carburizing chamber 12 overshoots as indicated by the alternate long and short dash line in FIG. Then, problems such as CP becoming unstable and hunting occurs, or it takes time to reach the target value, and control is not performed satisfactorily. On the other hand, if the PID control of the PID control system 105 is stopped when the CP of the carburizing chamber 12 rapidly decreases, the CP does not change in an unstable manner. As shown by the solid line in FIG. 4, when the enrich gas supply flow rate is maintained at a constant value, the CP gradually increases and approaches the target value of CP, as shown by the solid line in FIG. Then, if the PID control of the PID control system 105 is resumed after the CP of the carburizing chamber 12 has almost reached the target value, there is no possibility that the CP will become unstable. In addition, the CP can be quickly recovered to the target value as compared with the case where the PID control is continued. For the above reasons, the sequencer 120 gives a command for opening the carry-in port 31 and the carry-out port 33 of the heat treatment furnace 3 and at the same time gives a command for stopping the PID adjustment to the adjuster 68, so that the PID control system 105 The PID control is stopped to prevent the CP of the carburizing chamber 12 from changing in an unstable manner. Similarly, when opening the carry-in port 31 and the carry-out port 33, the PID control of the PID control systems 106 and 107 is stopped, and each CP of the diffusion chamber 13 and the soaking chamber 15 is prevented from changing unstablely. The target value can be recovered quickly.

なお,シーケンサ120の命令に従って調節器68がPID調節を停止させると,流量調整弁62,63,65では,PID調節を停止させる直前における流量調整弁62,63,65の開度がそのまま維持されるようになっている。即ち,供給路52,53,55からの各エンリッチガス供給流量が,PID制御系105,106,107によるPID制御を停止させる直前の値にそれぞれ維持されるようになっている。   When the controller 68 stops the PID adjustment according to a command from the sequencer 120, the flow rate adjustment valves 62, 63, 65 maintain the opening degree of the flow rate adjustment valves 62, 63, 65 just before the PID adjustment is stopped. It has become so. That is, the rich gas supply flow rates from the supply paths 52, 53, and 55 are respectively maintained at values immediately before the PID control by the PID control systems 105, 106, and 107 is stopped.

また,調節器68は,シーケンサ120の命令に従ってPID調節を停止させた後,搬入口31又は搬出口33が開閉されてから暫く時間が経過したら,PID調節を行うようになっている。即ち,調節器68は,搬入口31と搬出口33を開いているとき,及び,搬入口31と搬出口33を閉じてから浸炭室12,拡散室13,均熱室15の各CPが目標値になるまでまたは所定時間の間は,PID調節を停止させ,搬入口31と搬出口33を閉じてから浸炭室12,拡散室13,均熱室15の各CPが目標値になったら,PID調節を再開するようになっている。これにより,PID調節を再開したとき,各CPを安定して制御することができる。なお,PID調節を再開させるタイミングについては,例えば搬入口31及び搬出口33を閉じて浸炭室12,拡散室13,均熱室15の各CPが下がった後にそれぞれの目標値に近づくまでの平均的な時間を例えば所定時間として,実験により予め確認しておき,浸炭室12,拡散室13,均熱室15の各CPが回復したらPID調節が開始されるように設定すれば良い。例えば,PID調節を停止させてから所定時間が経過したら自動的にPID調節を再開させるように,調節器68の設定を行っても良い。また,搬入口31及び搬出口33が閉じられたら,シーケンサ120から調節器68に対して,PID調節を再開させる信号が送信され,その信号を受信してから所定時間が経過したら,調節器68がPID調節を自動的に再開させるように設定しても良い。なお,所定時間とは,前述したCPが目標値に近づくまでの平均的な時間には限定されない。各CPの目標値は,CPの目標値そのものでもよいが,CP目標値に近い値でも良い。例えば具体的には,CPの目標値より±0.25%程度の値,±0.1%程度の値,±0.05%程度の値等である。また,PID制御を再開させるタイミングは,前述のように予め所定時間を設定することにより決めておいても良いが,その他,例えば,調節器68で検出した各CPの計測値が目標値又は目標値に近い値に達したときに,調節器68が自動的にPID調節を再開させるように設定しても良い。   The controller 68 stops the PID adjustment in accordance with a command from the sequencer 120, and then performs the PID adjustment after a while has passed since the loading / unloading port 31 or the loading / unloading port 33 is opened / closed. That is, the adjuster 68 sets each CP of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 when the carry-in port 31 and the carry-out port 33 are opened and after the carry-in port 31 and the carry-out port 33 are closed. PID adjustment is stopped until it reaches the value, or when the CPs of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 reach the target values after closing the carry-in port 31 and the carry-out port 33, PID adjustment is resumed. Thereby, when PID adjustment is restarted, each CP can be stably controlled. The timing at which the PID adjustment is resumed is, for example, an average until the respective CPs of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 approach each target value after the carry-in port 31 and the carry-out port 33 are closed. For example, a specific time may be set as a predetermined time, and may be set beforehand so that PID adjustment is started when each CP of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 recovers. For example, the controller 68 may be set so that the PID adjustment is automatically restarted after a predetermined time has elapsed since the PID adjustment was stopped. When the carry-in port 31 and the carry-out port 33 are closed, a signal for resuming PID adjustment is transmitted from the sequencer 120 to the adjuster 68, and when a predetermined time has elapsed after receiving the signal, the adjuster 68. May be set to automatically resume PID adjustment. The predetermined time is not limited to the average time until the CP approaches the target value. The target value of each CP may be the CP target value itself, but may be a value close to the CP target value. For example, specifically, a value of about ± 0.25%, a value of about ± 0.1%, a value of about ± 0.05%, etc. from the target value of CP. The timing for resuming the PID control may be determined by setting a predetermined time in advance as described above. However, for example, the measured value of each CP detected by the controller 68 is a target value or a target value. It may be set so that the controller 68 automatically resumes PID adjustment when a value close to the value is reached.

次に,以上のように構成された浸炭処理装置1を用いた被処理体2の浸炭処理工程について説明する。   Next, the carburizing process of the to-be-processed object 2 using the carburizing apparatus 1 comprised as mentioned above is demonstrated.

先ず,未だ処理されていない被処理体2を搬入する前の浸炭処理装置1では,熱処理炉3内で先に搬入された複数の被処理体2が処理されている。予熱室11,浸炭室12,拡散室13,降温室14,均熱室15での炉内雰囲気の組成,温度,圧力等は,それぞれ所望の値に調節された状態になっている。RXガスは,RXガス供給回路42の供給路72,73,75から,それぞれ一定の供給流量で供給されている。エンリッチガスは,PID制御系105,106,107によって供給流量が調節されながら,エンリッチガス供給回路41の供給路52,53,55から熱処理炉3内に供給されている。調節器68は,酸素センサ101,102,103の検出値に基づいて浸炭室12,拡散室13,均熱室15の各CPを計算し,流量調整弁62,63,65の各開度を操作している。こうしてエンリッチガス供給流量が調節されることにより,浸炭室12,拡散室13,均熱室15の各CPが,ほぼ所定の目標値に維持されている。なお,浸炭室12のCPの目標値は,例えば約1.0%程度であり,拡散室13のCPの目標値は,例えば約0.8%程度であり,均熱室15のCPの目標値は,例えば約1.0%程度である。また,熱処理炉3内の雰囲気は,扉32の孔32a,扉34の孔34aを介して搬入室5及び油槽室6に流入して,エキセス23,118から排気されており,熱処理炉3内の炉圧は,例えば約8mmAq程度に調節されている。さらに,熱処理炉3内の雰囲気は,図示しないヒータによって加熱されており,例えば,予熱室11の温度は約930℃程度,浸炭室12の温度は約930℃〜950℃程度,拡散室13の温度は約930℃〜950℃程度,降温室14の温度は約930℃〜850℃程度,均熱室15の温度は約850℃程度に調節されている。   First, in the carburizing apparatus 1 before carrying in the to-be-processed object 2 which has not yet been processed, the several to-be-processed objects 2 carried in the heat treatment furnace 3 previously are processed. The composition, temperature, pressure, and the like of the furnace atmosphere in the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the descending chamber 14, and the soaking chamber 15 are adjusted to desired values, respectively. RX gas is supplied from supply paths 72, 73, and 75 of the RX gas supply circuit 42 at a constant supply flow rate. The enriched gas is supplied into the heat treatment furnace 3 from the supply paths 52, 53, and 55 of the enriched gas supply circuit 41 while the supply flow rate is adjusted by the PID control systems 105, 106, and 107. The controller 68 calculates the CPs of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 based on the detection values of the oxygen sensors 101, 102, and 103, and sets the respective opening amounts of the flow control valves 62, 63, and 65. It is operating. By adjusting the rich gas supply flow rate in this way, the CPs of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 are maintained at substantially predetermined target values. In addition, the target value of CP of the carburizing chamber 12 is about 1.0%, for example, and the target value of CP of the diffusion chamber 13 is about 0.8%, for example, and the target value of CP of the soaking chamber 15 is about The value is about 1.0%, for example. The atmosphere in the heat treatment furnace 3 flows into the carry-in chamber 5 and the oil tank chamber 6 through the hole 32 a of the door 32 and the hole 34 a of the door 34, and is exhausted from the exhausts 23 and 118. For example, the furnace pressure is adjusted to about 8 mmAq. Further, the atmosphere in the heat treatment furnace 3 is heated by a heater (not shown). For example, the temperature of the preheating chamber 11 is about 930 ° C., the temperature of the carburizing chamber 12 is about 930 ° C. to 950 ° C. The temperature is adjusted to about 930 ° C. to 950 ° C., the temperature of the descending chamber 14 is adjusted to about 930 ° C. to 850 ° C., and the temperature of the soaking chamber 15 is adjusted to about 850 ° C.

このように熱処理炉3内の雰囲気が調整されている状態において,搬入室5の入口21を開いて,被処理体2を搬入室5に搬入する。搬入室5の入口21を開くときは,熱処理炉3の搬入口31は閉じたままにしておく。搬入室5に被処理体2を搬入したら,搬入室5の入口21を閉じる。   Thus, in the state where the atmosphere in the heat treatment furnace 3 is adjusted, the inlet 21 of the carry-in chamber 5 is opened, and the workpiece 2 is carried into the carry-in chamber 5. When the entrance 21 of the carry-in chamber 5 is opened, the carry-in port 31 of the heat treatment furnace 3 is kept closed. When the workpiece 2 is loaded into the loading chamber 5, the inlet 21 of the loading chamber 5 is closed.

次に,熱処理炉3の搬入口31を開いて被処理体2を搬入室5から熱処理炉3内へ移動させると同時に,搬出口33を開いて均熱室15での処理が終了した被処理体2を熱処理炉3内から油槽室6に移動させるが,搬入口31及び搬出口33を開きはじめる直前に,シーケンサ120から調節器68に対して,PID調節を停止させる命令が送信される。これにより,調節器68がPID調節を停止させ,PID制御系105,106,107の各PID制御が停止する。調節器68がPID調節を停止させると,流量調整弁62,63,65では,PID調節を停止させる直前における開度がそのまま維持される。即ち,エンリッチガス供給回路41の供給路52,53,55からの各エンリッチガス供給流量が,PID調節を停止させる直前の,一定の値にそれぞれ維持される。   Next, the inlet 31 of the heat treatment furnace 3 is opened to move the workpiece 2 from the carry-in chamber 5 into the heat treatment furnace 3, and at the same time, the outlet 33 is opened to finish the treatment in the soaking chamber 15. The body 2 is moved from the heat treatment furnace 3 to the oil tank chamber 6, but immediately before starting to open the carry-in port 31 and the carry-out port 33, a command to stop the PID adjustment is transmitted from the sequencer 120 to the adjuster 68. As a result, the controller 68 stops the PID adjustment, and the PID control of the PID control systems 105, 106, 107 is stopped. When the controller 68 stops the PID adjustment, the flow rate adjusting valves 62, 63, 65 maintain the opening degree immediately before stopping the PID adjustment. That is, the enrich gas supply flow rates from the supply paths 52, 53, and 55 of the enrich gas supply circuit 41 are respectively maintained at constant values immediately before the PID adjustment is stopped.

扉32,34を上昇させ始め,搬入口31及び搬出口33を開きはじめると(図2においてS1),熱処理炉3内からの輻射熱によって,搬入室5内の雰囲気と油槽室6内の雰囲気が昇温される。搬入口31及び搬出口33を開くとき,搬入室5の入口21,油槽室6の出口116は閉じられており,搬入室5内の雰囲気と油槽室6内の雰囲気が急激に膨張するので,熱処理炉3内の雰囲気が加圧される。   When the doors 32 and 34 start to rise and the carry-in port 31 and the carry-out port 33 begin to open (S1 in FIG. 2), the atmosphere in the carry-in chamber 5 and the atmosphere in the oil tank chamber 6 are caused by the radiant heat from the heat treatment furnace 3. The temperature is raised. When the carry-in port 31 and the carry-out port 33 are opened, the inlet 21 of the carry-in chamber 5 and the outlet 116 of the oil tank chamber 6 are closed, and the atmosphere in the carry-in chamber 5 and the atmosphere in the oil tank chamber 6 rapidly expand. The atmosphere in the heat treatment furnace 3 is pressurized.

熱処理炉3の搬入口31,搬出口33を開いたら,搬入口31を介して被処理体2を搬入室5から熱処理炉3へ搬入させ,また,均熱室15での処理が終了した被処理体2を,搬出口33を介して熱処理炉3から油槽室6へ搬出させる。その後,扉32,34を下降させて搬入口31及び搬出口33を閉じる。扉32,34を降ろし始め,搬入口31又は搬出口33が閉まりはじめると(図2においてS2),熱処理炉3内の圧力が急激に下降する。搬入口31又は搬出口33が閉じられ(図2においてS3),その後も,熱処理炉3内の圧力が下降し続ける。そして,搬入口31及び搬出口33を開く前の圧力よりも低下し,熱処理炉3の外部よりも負圧になる。すると,扉32の孔32a,扉34の孔34a等を介して,外部から熱処理炉3内に空気が吸い込まれはじめ,熱処理炉3内の圧力が上昇し始める。熱処理炉3内に空気が侵入することにより,図3に示すように,浸炭室12内のCPが,目標値に対して大幅に下降する。同様に,拡散室13,均熱室15の各CPも,それぞれの目標値に対して大幅に下降する。このように熱処理炉3内のCPが減少する間,PID制御系105によるPID制御は停止されており,図4に示すように,供給路52からエンリッチガスがそれぞれ一定の流量で供給されている。そして,熱処理炉3内の圧力が回復して空気が吸い込まれなくなると,図3において実線で示すように,浸炭室12のCPが,オーバーシュートすることなく安定的に目標値に近づく。同様に,熱処理炉3内のCPが減少する間,PID制御系106,107によるPID制御が停止され,供給路53,55からエンリッチガスがそれぞれ一定の流量で供給されることにより,拡散室13,均熱室15の各CPが安定的にそれぞれの目標値に近づく。この場合,PID制御系105,106,107のPID制御を継続させた場合と比較して,浸炭室12,拡散室13,均熱室15の各CPを目標値に早く回復させることができる。また,各CPが不安定になってハンチングが起こるおそれがなく,各CPを安定した状態で回復させることができる。   When the carry-in port 31 and the carry-out port 33 of the heat treatment furnace 3 are opened, the workpiece 2 is carried into the heat treatment furnace 3 from the carry-in chamber 5 through the carry-in port 31 and the treatment in the soaking chamber 15 is completed. The processing body 2 is unloaded from the heat treatment furnace 3 to the oil tank chamber 6 through the unloading port 33. Thereafter, the doors 32 and 34 are lowered to close the carry-in port 31 and the carry-out port 33. When the doors 32 and 34 begin to be lowered and the carry-in port 31 or the carry-out port 33 begins to close (S2 in FIG. 2), the pressure in the heat treatment furnace 3 drops rapidly. The carry-in port 31 or the carry-out port 33 is closed (S3 in FIG. 2), and the pressure in the heat treatment furnace 3 continues to decrease thereafter. The pressure is lower than the pressure before opening the carry-in port 31 and the carry-out port 33, and becomes a negative pressure from the outside of the heat treatment furnace 3. Then, air begins to be sucked into the heat treatment furnace 3 from the outside through the hole 32a of the door 32, the hole 34a of the door 34, and the like, and the pressure in the heat treatment furnace 3 starts to rise. As air enters the heat treatment furnace 3, the CP in the carburizing chamber 12 is significantly lowered from the target value as shown in FIG. 3. Similarly, the CPs of the diffusion chamber 13 and the soaking chamber 15 also drop significantly with respect to their target values. Thus, while the CP in the heat treatment furnace 3 decreases, the PID control by the PID control system 105 is stopped, and the enriched gas is supplied from the supply path 52 at a constant flow rate as shown in FIG. . When the pressure in the heat treatment furnace 3 recovers and air is not sucked, the CP of the carburizing chamber 12 stably approaches the target value without overshooting, as shown by the solid line in FIG. Similarly, while the CP in the heat treatment furnace 3 decreases, the PID control by the PID control systems 106 and 107 is stopped, and the enriched gas is supplied from the supply paths 53 and 55 at a constant flow rate, so that the diffusion chamber 13 Each CP of the soaking chamber 15 approaches the target value stably. In this case, compared with the case where the PID control of the PID control systems 105, 106, 107 is continued, each CP of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 can be quickly recovered to the target value. Further, there is no possibility that hunting occurs due to instability of each CP, and each CP can be recovered in a stable state.

調節器68は,PID調節を停止させてから暫く時間が経過したら,再びPID調節を開始する。調節器68がPID調節を開始するとき,酸素センサ101,102,103の検出値に基づいて計算された各CPは,ほぼ目標値に近い値になっているので,PID制御系105,106,107による制御応答が不安定になったりハンチングが起こったりするおそれはなく,浸炭室12,拡散室13,均熱室15の各CPを,それぞれの目標値に安定させることができる。   The controller 68 starts the PID adjustment again after a while after the PID adjustment is stopped. When the controller 68 starts PID adjustment, each CP calculated based on the detected values of the oxygen sensors 101, 102, 103 is almost the target value, so that the PID control systems 105, 106, There is no possibility that the control response by 107 becomes unstable or hunting occurs, and the CPs of the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 can be stabilized at their respective target values.

こうして,熱処理炉3内の圧力やCP等が調節されながら,被処理体2が順次処理される。熱処理炉3内に搬入された被処理体2は,ローラコンベア35に載せられ,ローラコンベア35の駆動によって予熱室11,浸炭室12,拡散室13,降温室14,均熱室15に順次通過させられ,予備加熱,浸炭処理,拡散処理,降温,均熱処理が順次行われる。   In this way, the object to be processed 2 is sequentially processed while adjusting the pressure in the heat treatment furnace 3, the CP, and the like. The object to be processed 2 carried into the heat treatment furnace 3 is placed on a roller conveyor 35, and sequentially passes through the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the cooling chamber 14, and the soaking chamber 15 by driving the roller conveyor 35. Preheating, carburizing, diffusion, cooling, and soaking are sequentially performed.

なお,被処理体2を予熱室11から浸炭室12に移動させるとき,浸炭室12から拡散室13に移動させるとき,拡散室13から降温室14に移動させるとき,及び,降温室14から均熱室15に移動させるときには,熱処理炉3の搬入口31,搬出口33がその都度開かれ,新たな被処理体2が搬入室5から予熱室11に搬入されると同時に,均熱室15での処理が終了した被処理体2が油槽室6に搬出されて,搬入口31,搬出口33が閉じられる。こうして,予熱室11,浸炭室12,拡散室13,降温室14,均熱室15に被処理体2が連続して供給され,連続して処理されるようになっている。これらのときも,搬入口31及び搬出口33を開く直前に,その都度シーケンサ120から調節器68に対して,PID調節を停止させる命令が送信され,PID制御系105,106,107の各PID制御が一時停止させられるようになっている。そして,供給路52,53,55からエンリッチガスがそれぞれ一定の流量で供給され,熱処理炉3内のCPが目標値になったらまたは所定時間が経過すると,PID制御系105,106,107によるPID制御が再び開始される。従って,CPを安定した状態で早く回復させることができるので,予熱室11,浸炭室12,拡散室13,降温室14,均熱室15における各処理が良好に行われる。   It should be noted that the workpiece 2 is moved from the preheating chamber 11 to the carburizing chamber 12, moved from the carburizing chamber 12 to the diffusion chamber 13, moved from the diffusion chamber 13 to the descending chamber 14, and leveled from the descending chamber 14. When moving to the heat chamber 15, the carry-in port 31 and the carry-out port 33 of the heat treatment furnace 3 are opened each time, and a new workpiece 2 is carried from the carry-in chamber 5 into the preheating chamber 11 and at the same time the soaking chamber 15. The to-be-processed object 2 which completed the process in is carried out to the oil tank chamber 6, and the carrying-in port 31 and the carrying-out port 33 are closed. In this way, the workpiece 2 is continuously supplied to the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the descending chamber 14, and the soaking chamber 15, and is continuously processed. Also in these cases, immediately before opening the carry-in port 31 and the carry-out port 33, a command for stopping PID adjustment is transmitted from the sequencer 120 to the controller 68 each time, and each PID of the PID control systems 105, 106, 107 is sent. Control can be paused. Then, the enriched gas is supplied from the supply paths 52, 53, 55 at a constant flow rate, and when the CP in the heat treatment furnace 3 reaches the target value or when a predetermined time elapses, the PID by the PID control systems 105, 106, 107 is obtained. Control begins again. Therefore, since CP can be recovered quickly in a stable state, each treatment in the preheating chamber 11, the carburizing chamber 12, the diffusion chamber 13, the descending chamber 14, and the soaking chamber 15 is performed satisfactorily.

均熱室15での均熱処理が終了したら,熱処理炉3の搬出口33を開いて被処理体2を熱処理炉3から油槽室6へ移動させる。前述したように,搬出口33を開くときは,油槽室6の出口116は閉じておく。被処理体2を熱処理炉3から油槽室6へ搬入したら,搬出口33を閉じる。そして,油槽室6において,油槽115に浸漬させて油焼き入れを行い,油槽115から引き上げた後,出口116を開いて搬出させる。なお,出口116を開くときは,熱処理炉3の搬出口33は閉じた状態にしておく。以上のようにして,浸炭処理装置1における一連の処理が終了する。   When the soaking process in the soaking chamber 15 is completed, the unloading port 33 of the heat treatment furnace 3 is opened and the workpiece 2 is moved from the heat treatment furnace 3 to the oil tank chamber 6. As described above, when the carry-out port 33 is opened, the outlet 116 of the oil tank chamber 6 is closed. When the workpiece 2 is carried into the oil tank chamber 6 from the heat treatment furnace 3, the carry-out port 33 is closed. Then, in the oil tank chamber 6, the oil tank 115 is immersed and oil-quenched, pulled up from the oil tank 115, and then opened and discharged. When the outlet 116 is opened, the carry-out port 33 of the heat treatment furnace 3 is kept closed. As described above, a series of processes in the carburizing apparatus 1 is completed.

かかる浸炭処理方法及び浸炭処理装置1によれば,熱処理炉3の搬入口31又は搬出口33を開いているとき,及び,熱処理炉3の搬入口31又は搬出口33を閉じてから熱処理炉3内のCPが目標値になるまでまたは所定時間の間は,PID制御系105,106,107による各PID制御を停止させ,各PID制御を停止させる直前における供給路52,53,55からのエンリッチガスの供給流量を維持することにより,熱処理炉3内のCPが不安定に変化せず,CPを目標値に早く回復させることができる。そして,搬入口31又は搬出口33を閉じてから,熱処理炉3内のCPが目標値になったらまたは所定時間経過が経過したら,PID制御系105,106,107による各PID制御を行うことにより,CPの制御を安定した状態で行うことができる。従って,熱処理炉3における被処理体2の処理が良好に行われ,処理の信頼性を向上させることができる。複雑な制御の設定を行うことなく,簡単にCPの制御の安定化を図ることができる。   According to the carburizing treatment method and the carburizing treatment apparatus 1, when the carry-in port 31 or the carry-out port 33 of the heat treatment furnace 3 is opened and after the carry-in port 31 or the carry-out port 33 of the heat treatment furnace 3 is closed, the heat treatment furnace 3. Until each of the CPs reaches the target value or for a predetermined time, each PID control by the PID control systems 105, 106, 107 is stopped, and the enrichment from the supply paths 52, 53, 55 immediately before each PID control is stopped. By maintaining the gas supply flow rate, the CP in the heat treatment furnace 3 does not change in an unstable manner, and the CP can be quickly recovered to the target value. When the CP in the heat treatment furnace 3 reaches the target value after the carry-in port 31 or the carry-out port 33 is closed or when a predetermined time has elapsed, each PID control by the PID control systems 105, 106, 107 is performed. , CP can be controlled in a stable state. Therefore, the process of the to-be-processed object 2 in the heat processing furnace 3 is performed favorably, and the reliability of the process can be improved. CP control can be easily stabilized without complicated control settings.

以上,本発明の好適な実施の形態の一例を示したが,本発明はここで説明した形態に限定されない。例えば,本実施の形態においては,PID制御系105,106,107によってPID制御が行われることとしたが,その他のフィードバック制御によってCPを制御することとしても良い。例えば,調節器68はPI(比例・積分)調節計の機能を有することとし,浸炭室12,拡散室13,均熱室15における各CPは,酸素センサ101,102又は103,調節器68,流量調整弁62,63又は65によって構成されたフィードバック制御系としてのPI制御系によってそれぞれ制御されることとしても良い。   Although an example of a preferred embodiment of the present invention has been described above, the present invention is not limited to the embodiment described here. For example, in this embodiment, the PID control is performed by the PID control systems 105, 106, and 107, but the CP may be controlled by other feedback control. For example, the controller 68 has a function of a PI (proportional / integral) controller, and each CP in the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15 includes the oxygen sensor 101, 102 or 103, the controller 68, It is good also as controlling by the PI control system as a feedback control system comprised by the flow regulating valve 62, 63, or 65, respectively.

エンリッチガスの最大供給流量は,通常,熱処理炉3内に収納可能な最大個数の被処理体2が存在している状態に基づいて設定されているが,この場合,熱処理炉3内に存在する被処理体2の個数が少ないときなど,被処理体2の表面積の合計が少ないときに,炭素が過剰に供給されて浸炭深さが深くなりすぎる問題がある。また,本実施の形態では,酸素センサ101,102,103の検出値に基づいてCPを求めるようにしたが,この場合,エンリッチガスの供給流量が浸炭される炭素の量と比較して多いと,酸素センサ101,102,103の検出値に基づいて計算されたCPの信頼性が低下する問題がある。そこで,図5に示すように,熱処理炉3内に存在する被処理体2の表面積の合計が多いほど,エンリッチガスの最大供給流量を多くするようにしても良い。この場合,被処理体2の表面積が少ないときに,浸炭深さが深くなりすぎることを防止できる。また,酸素センサ101,102,103の検出値に基づくCPの信頼性を向上させることができるので,CPを確実に制御することができるようになる。また,エンリッチガスの消費量を低減でき,省コストを図ることができる。   The maximum supply flow rate of the enriched gas is normally set based on the state in which the maximum number of objects 2 that can be accommodated in the heat treatment furnace 3 exists. When the total surface area of the objects to be processed 2 is small, such as when the number of objects to be processed 2 is small, there is a problem that carbon is excessively supplied and the carburization depth becomes too deep. Further, in the present embodiment, the CP is obtained based on the detection values of the oxygen sensors 101, 102, 103. In this case, however, if the supply flow rate of the enrich gas is larger than the amount of carbon to be carburized. There is a problem in that the reliability of the CP calculated based on the detection values of the oxygen sensors 101, 102, 103 is lowered. Therefore, as shown in FIG. 5, the maximum supply flow rate of the enriched gas may be increased as the total surface area of the workpiece 2 existing in the heat treatment furnace 3 is increased. In this case, when the surface area of the workpiece 2 is small, the carburization depth can be prevented from becoming too deep. Further, since the reliability of the CP based on the detection values of the oxygen sensors 101, 102, 103 can be improved, the CP can be reliably controlled. In addition, the consumption of enriched gas can be reduced, and costs can be saved.

図5に示す例では,熱処理炉3内に被処理体2が1個しか存在しないときは,供給路52,53,55からのエンリッチガスの最大供給流量をそれぞれ1L/minにし,熱処理炉3内に存在する被処理体2の個数に比例して,エンリッチガスの最大供給流量を増加させ,熱処理炉3内に被処理体2が13個存在しているとき,即ち,熱処理炉3内に収納できる最大個数の被処理体2が存在しているときは,供給路52,53,55からのエンリッチガスの最大供給流量をそれぞれ4L/minにするようになっている。なお,エンリッチガスの供給流量は,流量調整弁62,63,65の開度に比例し,流量調整弁62,63,65の開度が100%であるとき,エンリッチガスの供給流量が4L/minであり,例えば流量調整弁62,63,65の開度が25%のときは,エンリッチガスの供給流量が25%(1L/min)になるように構成されている。   In the example shown in FIG. 5, when there is only one target object 2 in the heat treatment furnace 3, the maximum supply flow rate of the rich gas from the supply paths 52, 53, and 55 is set to 1 L / min, respectively. When the maximum supply flow rate of the enriched gas is increased in proportion to the number of the objects to be processed 2 present in the interior, and there are 13 objects to be processed 2 in the heat treatment furnace 3, that is, in the heat treatment furnace 3. When there are the maximum number of objects 2 that can be stored, the maximum supply flow rate of the enriched gas from the supply paths 52, 53, and 55 is set to 4 L / min. The supply flow rate of the enrich gas is proportional to the opening degree of the flow rate adjustment valves 62, 63, 65. When the opening degree of the flow rate adjustment valves 62, 63, 65 is 100%, the supply flow rate of the enrich gas is 4L / For example, when the opening degree of the flow rate adjusting valves 62, 63, 65 is 25%, the enrich gas supply flow rate is 25% (1 L / min).

また,シーケンサ120は,熱処理炉3に対して搬入出した被処理体2の数から,熱処理炉3内に存在している被処理体2の個数を把握しており,その個数に応じて,流量調整弁62,63,65の開度を調整するための調節器68の出力信号に対して,出力リミットを設定する機能を有する。そして,シーケンサ120から調節器68に対して,該出力リミットが送信されるようになっている。   In addition, the sequencer 120 grasps the number of the objects to be processed 2 existing in the heat treatment furnace 3 from the number of the objects to be processed 2 carried into and out of the heat treatment furnace 3, and according to the number, It has a function of setting an output limit for the output signal of the regulator 68 for adjusting the opening degree of the flow rate regulating valves 62, 63, 65. The output limit is transmitted from the sequencer 120 to the controller 68.

調節器68の出力リミットが設定されていない状態では,流量調整弁62,63,65の開度は,調節器68からの出力に比例して増加し,調節器68の出力が100%のとき,流量調整弁62,63,65の開度が100%になるように設定されている。調節器68の出力リミットが例えば50%に設定されると,調節器68で計算された出力が50%以下のときは,計算されたとおりの出力が送信されるが,調節器68で計算された出力が50%を超えるときは,50%の出力が送信されるようになっている。従って,流量調整弁62,63,65の開度が50%以下の範囲に抑えられるようになっている。同様に,調節器68の出力リミットが例えば25%に設定された場合は,調節器68の出力が25%以下に設定され,流量調整弁62,63,65の開度が25%以下に設定されるようになっている。   When the output limit of the regulator 68 is not set, the opening degree of the flow rate regulating valves 62, 63, 65 increases in proportion to the output from the regulator 68, and the output of the regulator 68 is 100%. , The opening degree of the flow regulating valves 62, 63, 65 is set to be 100%. When the output limit of the regulator 68 is set to 50%, for example, when the output calculated by the regulator 68 is 50% or less, the output as calculated is transmitted. When the output exceeds 50%, 50% output is transmitted. Therefore, the opening degree of the flow rate adjusting valves 62, 63, 65 is suppressed to a range of 50% or less. Similarly, when the output limit of the regulator 68 is set to, for example, 25%, the output of the regulator 68 is set to 25% or less, and the opening degree of the flow rate adjusting valves 62, 63, 65 is set to 25% or less. It has come to be.

かかる構成において,例えば,浸炭処理装置1の稼動を開始させた直後など,未だ被処理体2が搬入されていないときは,シーケンサ120から調節器68に対して,出力リミットを25%にする命令が送信され,流量調整弁62,63,65の開度が25%より上昇しないようにする。即ち,エンリッチガスの最大供給流量が約1L/minに設定される。この状態でPID制御系105,106,107によるPID制御が行われ,CPが目標値(例えば浸炭室12,拡散室13,均熱室15においてそれぞれ約1.0%,0.8%,1.0%程度)になるように制御され,また,熱処理室3内の圧力が例えば約8mmAq程度に調節される。   In such a configuration, for example, immediately after the operation of the carburizing apparatus 1 is started, when the workpiece 2 has not yet been loaded, the sequencer 120 instructs the controller 68 to set the output limit to 25%. Is transmitted so that the opening degree of the flow rate adjusting valves 62, 63, 65 does not rise above 25%. That is, the maximum supply flow rate of the enrich gas is set to about 1 L / min. In this state, PID control is performed by the PID control systems 105, 106, and 107, and CPs are set to target values (for example, about 1.0%, 0.8%, 1 in the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15, respectively). The pressure in the heat treatment chamber 3 is adjusted to about 8 mmAq, for example.

このように雰囲気が調整された熱処理炉3に最初の被処理体2が搬入され,処理が開始される。次に,2個目の被処理体2を熱処理炉3に搬入したら,出力リミットを上昇させ,エンリッチガスの最大供給流量を上昇させる。この状態でPID制御系105,106,107によるPID制御が行われ,CPが目標値(例えば浸炭室12,拡散室13,均熱室15においてそれぞれ約1.0%,0.8%,1.0%程度)になるように制御される。また,熱処理室3内の圧力は排気量の調節により,例えば約8mmAq程度に維持される。このように,熱処理炉3内に被処理体2が2個存在しているときは,エンリッチガスの最大供給流量を増加させることにより,供給可能な炭素の量を増加させることができる。従って,各被処理体2に十分に浸炭させることができる。   In this way, the first object to be processed 2 is carried into the heat treatment furnace 3 whose atmosphere is adjusted, and the processing is started. Next, when the second object to be processed 2 is carried into the heat treatment furnace 3, the output limit is increased and the maximum supply flow rate of the enriched gas is increased. In this state, PID control is performed by the PID control systems 105, 106, and 107, and CPs are set to target values (for example, about 1.0%, 0.8%, 1 in the carburizing chamber 12, the diffusion chamber 13, and the soaking chamber 15, respectively). (About 0.0%). The pressure in the heat treatment chamber 3 is maintained at, for example, about 8 mmAq by adjusting the displacement. Thus, when there are two workpieces 2 in the heat treatment furnace 3, the amount of carbon that can be supplied can be increased by increasing the maximum supply flow rate of the enrich gas. Therefore, each workpiece 2 can be sufficiently carburized.

こうして,熱処理炉3内に搬入した被処理体2の数が増加するたびに,調節器68の出力リミットを上昇させ,エンリッチガスの最大供給流量を多くしていく。そして,熱処理炉3内の被処理体2の個数が最大(13個)になったら,調節器68の出力リミットが解除されるようになっている。また,例えば浸炭処理装置1の稼動を終了させるときなど,新たな被処理体2の搬入を停止させ,熱処理炉3から被処理体2の個数が減少していくときは,被処理体2の個数に応じてエンリッチガスの最大供給流量を減少させていく。このように,エンリッチガスの最大供給流量を,熱処理炉3内に存在する被処理体2の個数,即ち,熱処理炉3内に存在する被処理体2の表面積に応じて変化させることにより,雰囲気中の炭素の量を多すぎない量に調節することができるので,浸炭深さを適切にすることができる。また,酸素センサ101,102,103の検出値に基づくCPの信頼性,及び,CPの制御の信頼性を向上させることができる。   Thus, every time the number of objects to be processed 2 carried into the heat treatment furnace 3 increases, the output limit of the regulator 68 is increased to increase the maximum supply flow rate of the enriched gas. When the number of objects to be processed 2 in the heat treatment furnace 3 reaches the maximum (13), the output limit of the adjuster 68 is released. Further, when the carrying-in of a new object to be processed 2 is stopped and the number of objects to be processed 2 decreases from the heat treatment furnace 3, for example, when the operation of the carburizing apparatus 1 is ended, The maximum supply flow of enriched gas is reduced according to the number. As described above, the maximum supply flow rate of the enriched gas is changed according to the number of the objects to be processed 2 existing in the heat treatment furnace 3, that is, the surface area of the objects to be processed 2 existing in the heat treatment furnace 3. Since the amount of carbon inside can be adjusted to not too much, the carburization depth can be made appropriate. In addition, the reliability of the CP based on the detection values of the oxygen sensors 101, 102, and 103 and the reliability of the control of the CP can be improved.

なお,上記の実施形態では,熱処理炉3内の被処理体2の個数に応じてエンリッチガスの最大供給流量を多くするようにしたが,例えば被処理体2の大きさが大きいほど,即ち,熱処理炉3内に存在する被処理体2の表面積に応じて,エンリッチガスの最大供給流量を多くするようにしても良い。   In the above embodiment, the maximum supply flow rate of the enriched gas is increased according to the number of the objects to be processed 2 in the heat treatment furnace 3, but for example, the larger the size of the object to be processed 2, that is, The maximum supply flow rate of the enriched gas may be increased according to the surface area of the workpiece 2 existing in the heat treatment furnace 3.

浸炭処理装置の構成を説明する概略断面図である。It is a schematic sectional drawing explaining the structure of a carburizing processing apparatus. 熱処理炉内の圧力の変化を説明するグラフである。It is a graph explaining the change of the pressure in a heat processing furnace. 浸炭炉内のCPの変化を説明するグラフである。It is a graph explaining the change of CP in a carburizing furnace. 浸炭炉へのエンリッチガスの供給流量の変化を説明するグラフである。It is a graph explaining the change of the supply flow rate of the rich gas to a carburizing furnace. 別の実施形態において,被処理体の個数とエンリッチガスの最大供給流量の関係を説明するグラフである。In another embodiment, it is a graph explaining the relationship between the number of to-be-processed objects, and the maximum supply flow volume of rich gas.

符号の説明Explanation of symbols

1 浸炭処理装置
2 被処理体
3 熱処理炉
5 搬入室
6 油槽室
21 搬入室の入口
31 熱処理炉の搬入口
33 熱処理炉の搬出口
68 調節器
105,106,107 PID制御系
116 油槽室の出口
DESCRIPTION OF SYMBOLS 1 Carburizing process apparatus 2 To-be-processed object 3 Heat treatment furnace 5 Carrying-in room 6 Oil tank room 21 Inlet of carrying-in room 31 Carry-in inlet of heat-treating furnace 33 Outlet of heat-treating furnace 68 Controller 105,106,107 PID control system 116 Outlet of oil-tank room

Claims (9)

炉内にエンリッチガスを供給し,前記炉内で被処理体を熱処理する熱処理方法であって,
炉内のカーボンポテンシャルに基づいて前記エンリッチガスの供給流量を操作することにより,カーボンポテンシャルをフィードバック制御し,
炉の開口を開いているとき,及び,炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になるまでまたは所定時間の間は,前記フィードバック制御を停止させ,前記フィードバック制御を停止させる直前におけるエンリッチガスの供給流量を維持し,
炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になったらまたは所定時間が経過したら,前記フィードバック制御を行うことを特徴とする,熱処理方法。
A heat treatment method of supplying an enriched gas into a furnace and heat-treating an object to be treated in the furnace,
By controlling the supply flow of the enriched gas based on the carbon potential in the furnace, the carbon potential is feedback controlled,
When the furnace opening is open and until the carbon potential in the furnace reaches the target value after closing the furnace opening or for a predetermined time, immediately before stopping the feedback control. Maintain the supply flow of enriched gas at
A heat treatment method, wherein the feedback control is performed when the carbon potential in the furnace reaches a target value after a furnace opening is closed or when a predetermined time elapses.
前記開口は,被処理体を炉内に搬入するための搬入口であって,
前記炉の搬入口を閉じた状態で,前記炉の搬入口の外側に設けた搬入室の入口を開き,被処理体を搬入室に搬入し,
前記搬入室の入口を閉じた後,前記炉の搬入口を開いて被処理体を炉内に搬入することを特徴とする,請求項1に記載の熱処理方法。
The opening is a carry-in port for carrying the workpiece into the furnace,
With the furnace entrance closed, the entrance of the carry-in chamber provided outside the furnace entrance is opened, and the object to be processed is carried into the carry-in chamber.
2. The heat treatment method according to claim 1, wherein after the entrance of the carry-in chamber is closed, the carry-in entrance of the furnace is opened and the object to be treated is carried into the furnace.
前記開口は,被処理体を炉内から搬出するための搬出口であって,
前記炉の搬出口の外側に設けた油槽室の出口を閉じた状態で,前記炉の搬出口を開き,被処理体を前記油槽室に搬入し,
前記炉の搬出口を閉じた後,前記油槽室の出口を開いて被処理体を前記油槽室から搬出することを特徴とする,請求項1又は2に記載の熱処理方法。
The opening is a carry-out port for carrying out the workpiece from the furnace,
With the outlet of the oil tank chamber provided outside the furnace outlet being closed, the furnace outlet is opened, and the object to be processed is carried into the oil tank chamber,
3. The heat treatment method according to claim 1, wherein after closing the outlet of the furnace, the outlet of the oil tank chamber is opened and the object to be processed is carried out of the oil tank chamber.
前記フィードバック制御は,PID制御であることを特徴とする,請求項1,2又は3に記載の熱処理方法。 The heat treatment method according to claim 1, wherein the feedback control is PID control. 炉内に存在する被処理体の表面積が多いほど,前記エンリッチガスの最大供給流量を多くすることを特徴とする,請求項1,2,3又は4に記載の熱処理方法。 5. The heat treatment method according to claim 1, wherein the maximum supply flow rate of the enriched gas is increased as the surface area of the object to be processed existing in the furnace increases. 炉内にエンリッチガスを供給し,前記炉内で被処理体を熱処理する熱処理装置であって,
炉内のカーボンポテンシャルに基づいて前記エンリッチガスの供給路に設けられた流量調整弁の開度を調節する調節器を備えるとともに,前記カーボンポテンシャルをフィードバック制御するフィードバック制御系が構成され,
前記調節器は,炉の開口を開いているとき,及び,炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になるまでまたは所定時間の間は,前記調節器の調節を停止させ,炉の開口を閉じてから炉内のカーボンポテンシャルが目標値になったらまたは所定時間が経過したら,前記調節器の調節を行い,
前記流量調整弁は,前記調節器の調節を停止している間,前記調節器の調節を停止させる直前における開度を維持することを特徴とする,熱処理装置。
A heat treatment apparatus for supplying an enriched gas into a furnace and heat-treating an object to be treated in the furnace,
A controller for adjusting the opening of a flow rate adjustment valve provided in the supply path of the enriched gas based on the carbon potential in the furnace, and a feedback control system for feedback control of the carbon potential is configured;
The regulator stops the regulation of the regulator when the furnace opening is open and until the carbon potential in the furnace reaches a target value or after a predetermined time after the furnace opening is closed, When the carbon potential in the furnace reaches the target value after closing the furnace opening or when a predetermined time has elapsed, the controller is adjusted,
The flow rate adjusting valve maintains an opening degree immediately before stopping the adjustment of the regulator while the adjustment of the regulator is stopped.
前記開口は,被処理体を炉内に搬入するための搬入口であって,
前記炉の搬入口の外側に,搬入室を設けたことを特徴とする,請求項6に記載の熱処理装置。
The opening is a carry-in port for carrying the workpiece into the furnace,
The heat treatment apparatus according to claim 6, wherein a carry-in chamber is provided outside the carry-in port of the furnace.
前記開口は,被処理体を炉内から搬出するための搬出口であって,
前記炉の搬出口の外側に,油槽室を設けたことを特徴とする,請求項6又は7に記載の熱処理装置。
The opening is a carry-out port for carrying out the workpiece from the furnace,
The heat treatment apparatus according to claim 6 or 7, wherein an oil tank chamber is provided outside the carry-out port of the furnace.
前記フィードバック制御は,PID制御であることを特徴とする,請求項6,7又は8に記載の熱処理装置。 The heat treatment apparatus according to claim 6, wherein the feedback control is PID control.
JP2004348488A 2004-12-01 2004-12-01 Heat treatment method and heat treatment apparatus Active JP4521257B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004348488A JP4521257B2 (en) 2004-12-01 2004-12-01 Heat treatment method and heat treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004348488A JP4521257B2 (en) 2004-12-01 2004-12-01 Heat treatment method and heat treatment apparatus

Publications (2)

Publication Number Publication Date
JP2006152417A JP2006152417A (en) 2006-06-15
JP4521257B2 true JP4521257B2 (en) 2010-08-11

Family

ID=36631049

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004348488A Active JP4521257B2 (en) 2004-12-01 2004-12-01 Heat treatment method and heat treatment apparatus

Country Status (1)

Country Link
JP (1) JP4521257B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011042878A (en) * 2010-10-06 2011-03-03 Dowa Holdings Co Ltd Method and device for heat treatment
WO2013146520A1 (en) 2012-03-27 2013-10-03 関東冶金工業株式会社 Method for heat treatment and heat treatment apparatus, and heat treatment system

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4876280B2 (en) * 2005-03-31 2012-02-15 Dowaサーモテック株式会社 Heat treatment method and heat treatment apparatus
JP5410652B2 (en) * 2007-02-26 2014-02-05 Dowaサーモテック株式会社 Heat treatment furnace
KR101930445B1 (en) 2018-10-31 2018-12-18 주식회사 율촌 Minimum decarbonization-heat treatment system of tube pipe for interm shaft

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003073798A (en) * 2001-09-07 2003-03-12 Toho Gas Co Ltd Method for controlling carburization atmosphere

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62227074A (en) * 1986-03-28 1987-10-06 Osaka Gas Co Ltd Method for controlling flow rate of enriching gas in gas carburizing process
JPH04259323A (en) * 1991-02-08 1992-09-14 Sumitomo Metal Ind Ltd Method for controlling charge and ejection for continuous non-oxidizing heat treatment furnace
JP3571181B2 (en) * 1997-06-06 2004-09-29 同和鉱業株式会社 Gas carburizing method and apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003073798A (en) * 2001-09-07 2003-03-12 Toho Gas Co Ltd Method for controlling carburization atmosphere

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011042878A (en) * 2010-10-06 2011-03-03 Dowa Holdings Co Ltd Method and device for heat treatment
WO2013146520A1 (en) 2012-03-27 2013-10-03 関東冶金工業株式会社 Method for heat treatment and heat treatment apparatus, and heat treatment system
US9581389B2 (en) 2012-03-27 2017-02-28 Kanto Yakin Kogyo Co., Ltd. Method for heat treatment, heat treatment apparatus, and heat treatment system

Also Published As

Publication number Publication date
JP2006152417A (en) 2006-06-15

Similar Documents

Publication Publication Date Title
US7722728B2 (en) Heat treatment method and heat treatment apparatus
US7357843B2 (en) Vacuum heat treating method and apparatus therefor
WO2018100826A1 (en) Substrate processing device, method of manufacturing semiconductor device, and program
JP5209921B2 (en) Heat treatment method and heat treatment equipment
JP4521257B2 (en) Heat treatment method and heat treatment apparatus
JP3839615B2 (en) Vacuum carburizing method
US8893402B2 (en) Method for controlling a protective gas atmosphere in a protective gas chamber for the treatment of a metal strip
JP4807660B2 (en) Vacuum carburizing equipment
JP2007142237A5 (en)
JP2003129125A (en) Continuous heat treatment furnace for strip
JPWO2006082891A1 (en) Atmospheric heat treatment apparatus and operation method thereof
JP4876291B2 (en) Heat treatment method and heat treatment apparatus
JP5225634B2 (en) Heat treatment method and heat treatment equipment
JP4574051B2 (en) Heat treatment method and heat treatment apparatus used therefor
JP2009091638A (en) Heat-treatment method and heat-treatment apparatus
JP5144963B2 (en) Temperature control method for steel strip continuous heat treatment furnace
JP6812494B2 (en) Metal spring manufacturing method and manufacturing equipment
JPH111759A (en) Gas carburizing method and its device
JPH04107256A (en) Carburizing furnace
JP2009092328A (en) Furnace atmosphere control method for heating furnace
JP4443667B2 (en) Continuous sintering furnace and operation method thereof
JP6031313B2 (en) Carburizing method
RU2429435C1 (en) Procedure for gas-dynamic pressurisation of loading and unloading windows of draw furnace (versions)
JP2003073798A (en) Method for controlling carburization atmosphere
JP2023137789A (en) Heat treatment furnace and heat treatment method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071101

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080303

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100427

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100524

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130528

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4521257

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130528

Year of fee payment: 3

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130528

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130528

Year of fee payment: 3

R370 Written measure of declining of transfer procedure

Free format text: JAPANESE INTERMEDIATE CODE: R370

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130528

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140528

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250