JP4471783B2 - Hot isostatic pressing method and hot isostatic pressing device - Google Patents

Hot isostatic pressing method and hot isostatic pressing device Download PDF

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JP4471783B2
JP4471783B2 JP2004249002A JP2004249002A JP4471783B2 JP 4471783 B2 JP4471783 B2 JP 4471783B2 JP 2004249002 A JP2004249002 A JP 2004249002A JP 2004249002 A JP2004249002 A JP 2004249002A JP 4471783 B2 JP4471783 B2 JP 4471783B2
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JP2006061961A (en
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伯享 仲井
一也 鈴木
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Kobe Steel Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B11/00Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses
    • B30B11/001Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses using a flexible element, e.g. diaphragm, urged by fluid pressure; Isostatic presses
    • B30B11/002Isostatic press chambers; Press stands therefor

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Description

本発明は、高温・高圧の圧力媒体を充填した高圧容器内にて被処理品を高温高圧処理する熱間等方圧加圧方法及び熱間等方圧加圧装置に関するものである。   The present invention relates to a hot isostatic pressing method and a hot isostatic pressurizing apparatus for subjecting a workpiece to a high temperature and high pressure treatment in a high pressure vessel filled with a high temperature and high pressure medium.

従来、熱間等方圧加圧装置においては、圧力媒体としてAr等の不活性ガスを採用するものが知られており、この種の不活性ガスを例えば98MPa(1000Kgf/cm2)以上の高圧、且つ、1000℃以上の高温に維持した高温・高圧のガス雰囲気下で、粉末成型体の焼結や、同種・異種材料の拡散接合等の高温高圧処理(熱間等方圧加圧処理)が行われる。 Conventionally, in a hot isostatic pressing apparatus, an apparatus using an inert gas such as Ar as a pressure medium is known, and this kind of inert gas is, for example, a high pressure of 98 MPa (1000 Kgf / cm 2 ) or more. In addition, high-temperature and high-pressure treatment (hot isostatic pressure treatment) such as sintering of powder moldings and diffusion bonding of the same or different materials in a high-temperature and high-pressure gas atmosphere maintained at a high temperature of 1000 ° C. or higher. Is done.

例えばArガスを上述の如く高温・高圧に維持した場合、その密度は水の約30%、粘性係数は水の約15%程度まで上昇する。また、Arは熱膨張係数が大きい。従って、Arガスを熱間等方圧加圧装置の圧力媒体ガス(以下、圧媒ガス)として高圧容器内に充填した場合、該高圧容器内には圧媒ガスによる激しい自然対流が発生する(詳細は文献:日本工業新聞社「等方加圧技術〜HIP・CIP技術と素材開発への応用〜」小泉光恵、西原正夫編著、94頁〜113頁を参照)。   For example, when Ar gas is maintained at a high temperature and high pressure as described above, its density increases to about 30% of water and the viscosity coefficient increases to about 15% of water. Ar has a large coefficient of thermal expansion. Therefore, when Ar gas is filled in a high pressure vessel as a pressure medium gas (hereinafter referred to as a pressure medium gas) of a hot isostatic pressurizer, intense natural convection due to the pressure medium gas is generated in the high pressure vessel ( For details, see: Nihon Kogyo Shimbun, “Isotropic Pressing Technology-HIP / CIP Technology and Application to Material Development”, Mitsue Koizumi, edited by Masao Nishihara, pages 94-113).

この様な現象によって、高圧容器の内部にて上下方向に数百度(100℃〜1000℃)の温度勾配が発生する場合もあることが確認されている。このため、多数の被処理品を一度に処理すべく高圧容器内の処理部に上下方向多段状に複数の被処理品を収容して高温高圧処理を行った場合、上述の如き温度勾配の発生によって処理後の被処理品の品質にばらつきが生じる虞がある。   Due to such a phenomenon, it has been confirmed that a temperature gradient of several hundred degrees (100 ° C. to 1000 ° C.) may occur in the vertical direction inside the high pressure vessel. For this reason, when a plurality of products to be processed are accommodated in a multistage shape in the vertical direction in a processing section in a high-pressure vessel in order to process a large number of products to be processed at a time, a temperature gradient as described above occurs. As a result, the quality of the processed product after processing may vary.

そこで、この種の熱間等方圧加圧装置においては、処理後の被処理品の品質を処理部内での上下方向の処理位置に拘わらず一定のものとするために、処理部内の上下方向の均熱性を如何に維持するかが大きな問題となっている。
かかる問題を解決すべく、特許文献1(特開2004−085134号公報)には、圧媒ガスを充填可能な高圧容器内に、処理品を収容すべき処理室を上下方向多段状に備えた処理部を備え、該処理部の下方に、圧媒ガス攪拌用のファンが配備された熱間等方圧加圧装置が提案されている。
Therefore, in this type of hot isostatic pressing device, in order to keep the quality of the processed product constant regardless of the vertical processing position in the processing unit, the vertical direction in the processing unit It is a big problem how to maintain the soaking property of.
In order to solve such a problem, Patent Document 1 (Japanese Patent Application Laid-Open No. 2004-085134) includes a processing chamber in which a processing product is to be accommodated in a multistage shape in a high-pressure container that can be filled with a pressure medium gas. There has been proposed a hot isostatic pressing device provided with a processing unit and provided with a fan for stirring a pressure medium gas below the processing unit.

該熱間等方圧加圧装置においては、ファンを高速回転させることにより、例えば処理部の内部を下降して該処理部の外部側方を上昇する圧媒ガス循環路がケーシング内に形成され、これによって、処理部内の温度勾配の発生が抑制されるとされている。
特開2004−085134号公報
In the hot isostatic pressurization device, a pressure medium gas circulation path is formed in the casing, for example, by lowering the inside of the processing section and moving up the outside side of the processing section by rotating the fan at a high speed. As a result, the occurrence of a temperature gradient in the processing section is suppressed.
JP 2004-085134 A

ところで、該熱間等方圧加圧装置においては、各段の処理室が各処理室の上下を仕切る仕切り板に開設された複数のガス挿通孔によって直列に連結されている。従って、ファンによって処理部の上方から下方に向けて圧媒ガスを流動させた場合、圧媒ガスは、最上段の処理室から順に下方の処理室に流入し、各処理室にて被処理品と圧媒ガスとの間で熱交換が行われる。このため、最上段と最下段の処理室では、流入する圧媒ガスの有する熱量に大きな差が生じることとなり、これによって、処理部内の上下方向の均熱性を維持することが困難である問題があった。   By the way, in the hot isostatic pressing apparatus, the processing chambers of each stage are connected in series by a plurality of gas insertion holes provided in a partition plate that partitions the upper and lower sides of each processing chamber. Therefore, when the pressure medium gas is flowed from the upper side to the lower side of the processing section by the fan, the pressure medium gas flows into the lower processing chambers in order from the uppermost processing chamber, and is processed in each processing chamber. Heat exchange between the gas and the pressure medium gas. For this reason, there is a large difference in the amount of heat of the inflowing pressure medium gas between the uppermost and lowermost processing chambers, which makes it difficult to maintain the heat uniformity in the vertical direction in the processing section. there were.

そこで、本発明は、上記問題点に鑑み、容易な構成で多段状に配備された各段の処理室の均熱性を維持することが可能である熱間等方圧加圧方法を提供するようにしたものである。
また、本発明は、上記問題点に鑑み、容易な構成で多段状に配備された各段の処理室の均熱性を維持することが可能である熱間等方圧加圧装置を提供するようにしたものである。
Therefore, in view of the above problems, the present invention provides a hot isostatic pressing method capable of maintaining the thermal uniformity of each stage of processing chambers arranged in multiple stages with an easy configuration. It is a thing.
In addition, in view of the above problems, the present invention provides a hot isostatic pressurizing device capable of maintaining the thermal uniformity of each stage of processing chambers arranged in multiple stages with an easy configuration. It is a thing.

本発明は、前記目的を達成するために、次の手段を講じた。即ち、高温高圧の圧媒を充填可能な高圧容器と、該高圧容器内の圧媒を所定の方向に流動させるための強制流動手段とを備え、前記高圧容器の内部には、被処理品を収容すべき処理室を多段状に備えた処理部が配備され、前記圧媒により各処理室に収容された被処理品を高温高圧処理する熱間等方圧加圧方法において、前記強制流動手段によって流動する圧媒を一時的に貯留し、貯留した圧媒を各段の処理室に供給する工程を有している。   In order to achieve the above object, the present invention has taken the following measures. That is, a high-pressure container capable of being filled with a high-temperature and high-pressure pressure medium and a forced flow means for causing the pressure medium in the high-pressure container to flow in a predetermined direction are provided. In the hot isostatic pressurizing method, in which a processing section having multi-stage processing chambers to be stored is provided, and a processed product stored in each processing chamber is processed at a high temperature and high pressure by the pressure medium, the forced flow means The step of temporarily storing the pressure medium flowing by the step of supplying the stored pressure medium to the processing chamber of each stage is provided.

この構成によれば、一定量の圧媒が各処理室に供給される前に一時的に貯留されることにより、貯留された圧媒は一定の熱量(温度)及び流速に維持され、該圧媒の一部が各処理室に供給されることにより、各処理室には、一定の熱量を有する圧媒が略同一の流速で流入することとなる。従って、圧媒の性状に拘わらず各処理室に流入する熱量は略一定となり、これによって、各処理室の均熱性が維持されるのである。   According to this configuration, a constant amount of the pressure medium is temporarily stored before being supplied to each processing chamber, so that the stored pressure medium is maintained at a constant heat amount (temperature) and a flow rate. By supplying a part of the medium to each processing chamber, the pressure medium having a certain amount of heat flows into each processing chamber at substantially the same flow rate. Therefore, regardless of the nature of the pressure medium, the amount of heat flowing into each processing chamber is substantially constant, so that the thermal uniformity of each processing chamber is maintained.

また、本発明は、前記目的を達成するために、次の手段を講じた。即ち、高温高圧の圧媒を充填可能な高圧容器と、該高圧容器内の圧媒を所定の方向に流動させるための強制流動手段とを備え、前記高圧容器の内部には、被処理品を収容すべき処理室を多段状に備えた処理部が配備され、前記圧媒により各処理室に収容された被処理品を高温高圧処理する熱間等方圧加圧装置において、前記強制流動手段によって流動する圧媒を一時的に貯留し、貯留した圧媒を各段の処理室に供給する圧媒供給ヘッダ部を有している。   In order to achieve the above object, the present invention has taken the following measures. That is, a high-pressure container capable of being filled with a high-temperature and high-pressure pressure medium and a forced flow means for causing the pressure medium in the high-pressure container to flow in a predetermined direction are provided. In the hot isostatic pressurizing apparatus, in which a processing unit having multi-stage processing chambers to be stored is disposed, and a processing object stored in each processing chamber is processed at a high temperature and high pressure by the pressure medium, the forced flow means The pressure medium supply header part which stores the pressure medium which flows by temporarily and supplies the stored pressure medium to the processing chamber of each stage is provided.

この構成によれば、一定量の圧媒が各処理室に供給される前に圧媒供給ヘッダ部に一時的に貯留されることにより、貯留された圧媒は該圧媒供給ヘッダ部にて一定の熱量(温度)及び流速に維持され、該圧媒の一部が各処理室に供給されることにより、各処理室には、一定の熱量を有する圧媒が略同一の流速で流入することとなる。従って、圧媒の性状に拘わらず各処理室に流入する熱量は略一定となり、これによって、各処理室の均熱性が維持されるのである。   According to this configuration, a predetermined amount of the pressure medium is temporarily stored in the pressure medium supply header section before being supplied to each processing chamber, so that the stored pressure medium is stored in the pressure medium supply header section. A constant amount of heat (temperature) and a flow rate are maintained, and a part of the pressure medium is supplied to each processing chamber, so that a pressure medium having a constant amount of heat flows into each processing chamber at substantially the same flow rate. It will be. Therefore, regardless of the nature of the pressure medium, the amount of heat flowing into each processing chamber is substantially constant, so that the thermal uniformity of each processing chamber is maintained.

また、前記圧媒供給ヘッダ部は、圧媒を貯留するための圧媒貯留室と、該圧媒貯留室に圧媒を流入させるための流入部と、該圧媒貯留室を各段の処理室に並列に連通する連通手段とを備えていることが好ましい。
この構成によれば、流入部を通じて圧媒貯留室に流入する圧媒が直ちに連通手段を通じて各処理室に供給されることはなく、先ず、該圧媒貯留室に蓄えられる。これによって、各処理室に供給されるべき圧媒は一定量の熱量及び流速に保たれる。また、圧媒貯留室と各処理室とを並列に連通する連通手段を通じて各処理室に圧媒貯留室の圧媒が供給されることにより、各処理室には略同量の圧媒が供給されるのである。
The pressure medium supply header section includes a pressure medium storage chamber for storing the pressure medium, an inflow section for allowing the pressure medium to flow into the pressure medium storage chamber, and processing of the pressure medium storage chamber at each stage. It is preferable to provide communication means communicating in parallel with the chamber.
According to this configuration, the pressure medium flowing into the pressure medium storage chamber through the inflow portion is not immediately supplied to each processing chamber through the communication means, but is first stored in the pressure medium storage chamber. As a result, the pressure medium to be supplied to each processing chamber is maintained at a certain amount of heat and flow rate. In addition, the pressure medium in the pressure medium storage chamber is supplied to each processing chamber through the communication means that connects the pressure medium storage chamber and each processing chamber in parallel, so that substantially the same amount of pressure medium is supplied to each processing chamber. It is done.

また、前記連通手段は、前記圧媒貯留室の圧媒を各処理室に供給するための供給孔を備え、各供給孔は、それぞれ同一の大きさに形成されていることが好ましい。
この構成によれば、各供給孔を通じて処理室に供給される圧媒の流速は、圧媒貯留室に貯留される圧媒の性状に拘わらず略同一となる。
また、前記処理部には、前記圧媒供給ヘッダ部が設けられると共に、各処理室に供給された圧媒を回収する圧媒回収部が設けられ、該圧媒回収部は、回収した圧媒を前記処理部の外方に排出する排出部を備えていることが好ましい。
Moreover, it is preferable that the said communication means is provided with the supply hole for supplying the pressure medium of the said pressure medium storage chamber to each process chamber, and each supply hole is each formed in the same magnitude | size.
According to this configuration, the flow rate of the pressure medium supplied to the processing chamber through each supply hole is substantially the same regardless of the properties of the pressure medium stored in the pressure medium storage chamber.
In addition, the processing unit is provided with the pressure medium supply header unit and a pressure medium recovery unit that recovers the pressure medium supplied to each processing chamber, and the pressure medium recovery unit includes the recovered pressure medium. It is preferable to provide a discharge unit that discharges the liquid to the outside of the processing unit.

この構成によれば、処理部内には、圧媒を圧媒供給ヘッダ部から圧媒回収部に向けて一方向に向けて流動させる流路が形成され、圧媒は、かかる流路を通過してスムーズに処理部内を流動する。従って、各処理室での圧媒の滞留や、処理部内での圧媒の逆流等によって処理部内の圧媒の流れに偏りが生じることはなく、処理部内は、各処理室内の圧媒の均質な流動によって均熱状態に保たれるのである。   According to this configuration, a flow path is formed in the processing section to flow the pressure medium in one direction from the pressure medium supply header section to the pressure medium recovery section, and the pressure medium passes through the flow path. Flow smoothly in the processing section. Therefore, there is no bias in the flow of the pressure medium in the processing section due to the retention of the pressure medium in each processing chamber or the backflow of the pressure medium in the processing section. It is kept in a soaking state by a smooth flow.

また、前記処理部は、前記複数の処理室を上下方向多段状に形成する処理棚と、該処理棚の外周部及び底部を包囲する有底状の処理筒とから構成され、前記圧媒供給ヘッダ部と前記圧媒回収部の内、何れか一方は前記処理棚の中央部に上下方向に延伸して設けられ、他方は前記処理筒の内周面に沿って設けられていることが好ましい。
この構成によれば、各処理室の中央部と外方の内、一方に圧媒供給ヘッダ部が、他方に圧媒回収部がそれぞれ隣接して配備されており、装置全体の小型化が図られる。また、圧媒供給ヘッダ部から各処理室に流入した圧媒は、圧媒回収部に向けて各処理室内を中央部から外方に向けて流動し、各処理室内にて圧媒の滞留や逆流が生じることはなく、処理室内の温度状態に偏りが生じることはない。
The processing unit includes a processing shelf that forms the plurality of processing chambers in a multistage shape in the vertical direction, and a bottomed processing cylinder that surrounds an outer peripheral portion and a bottom of the processing shelf, and the pressure medium supply One of the header part and the pressure medium recovery part is preferably provided by extending in the vertical direction at the center part of the processing shelf, and the other is provided along the inner peripheral surface of the processing cylinder. .
According to this configuration, the pressure medium supply header portion is disposed adjacent to one of the central portion and the outer portion of each processing chamber, and the pressure medium recovery portion is disposed adjacent to the other, thereby reducing the size of the entire apparatus. It is done. In addition, the pressure medium flowing into each processing chamber from the pressure medium supply header portion flows from the central portion toward the outside toward the pressure medium recovery portion, and the retention of pressure medium in each processing chamber Backflow does not occur, and the temperature state in the processing chamber is not biased.

また、前記高圧容器内には、前記処理部と、前記圧媒強制流動手段と、圧媒を加熱する圧媒加熱手段とが配備され、前記圧媒強制流動手段は、前記圧媒回収部から排出された圧媒を前記圧媒供給ヘッダ部に向けて流動させるものであり、前記圧媒加熱手段は、前記圧媒回収部から前記圧媒供給ヘッダ部に向けて流動する圧媒を加熱するものであることが好ましい。   In the high-pressure vessel, the processing unit, the pressure medium forced flow means, and a pressure medium heating means for heating the pressure medium are arranged, and the pressure medium forced flow means is connected to the pressure medium recovery part. The discharged pressure medium is made to flow toward the pressure medium supply header section, and the pressure medium heating means heats the pressure medium flowing from the pressure medium recovery section toward the pressure medium supply header section. It is preferable.

この構成によれば、処理部内の被処理品との熱交換により低温となって処理部外に排出された圧媒は、強制流動手段によって処理部外を圧媒回収部から圧媒供給ヘッダ部に向けて流動し、また、処理部外を流動中に圧媒加熱手段で加熱されることとなり、これによって、高圧容器内にて圧媒を循環させることができる。
なお、本発明の目的を達成するための最も好ましい手段として、高温高圧の圧媒を充填可能な高圧容器と、該高圧容器内の圧媒を所定の方向に流動させるための強制流動手段とを備え、前記高圧容器の内部には、被処理品を収容すべき複数の処理室を備えた処理部が配備され、前記処理部は、前記複数の処理室を上下方向多段状に形成する処理棚と該処理棚の外周部及び底部を包囲する有底状の処理筒とから構成され、前記圧媒により各処理室に収容された被処理品を高温高圧処理する熱間等方圧加圧装置において、前記強制流動手段によって流動する圧媒を各段の処理室に供給する圧媒供給ヘッダ部を有し、前記圧媒供給ヘッダ部は、中央部に開口が開設された複数の載置板を壁体によって連接すると共に最下段の載置板の開口を閉塞することで、処理棚の中央部に上下方向へ延伸して設けられており、前記圧媒供給ヘッダ部は、圧媒を当該圧媒供給ヘッダ部内に流入させるべく最上段の載置板に設けられた流入部と、各処理室に連通する連通手段とを備えている熱間等方圧加圧装置を採用することができる。
According to this configuration, the pressure medium discharged to the outside of the processing unit due to heat exchange with the workpiece in the processing unit is discharged outside the processing unit by the forced flow means from the pressure medium recovery unit to the pressure medium supply header unit. In addition, the pressure medium is heated by the pressure medium heating means while flowing outside the processing section, and thus the pressure medium can be circulated in the high pressure vessel.
As the most preferable means for achieving the object of the present invention, a high-pressure container capable of being filled with a high-temperature and high-pressure medium, and a forced flow means for causing the pressure medium in the high-pressure container to flow in a predetermined direction. A processing unit including a plurality of processing chambers in which the article to be processed is to be accommodated is disposed inside the high-pressure vessel, and the processing unit is a processing shelf that forms the plurality of processing chambers in a multi-stage shape in the vertical direction. And an isostatic pressurizing apparatus for hot isostatic pressurization of a product to be processed contained in each processing chamber by the pressure medium at a high temperature and a high pressure, and a bottomed processing cylinder surrounding the outer periphery and bottom of the processing shelf A pressure medium supply header portion for supplying the pressure medium flowing by the forced flow means to the processing chamber of each stage, and the pressure medium supply header portion includes a plurality of mounting plates having an opening at a central portion. Are connected by a wall and the opening of the lowermost mounting plate is closed. The pressure medium supply header portion is provided on the uppermost mounting plate so as to allow the pressure medium to flow into the pressure medium supply header portion. It is possible to employ a hot isostatic pressure pressurizing device provided with the inflow portion and communication means communicating with each processing chamber.

好ましくは、前記連通手段は、圧媒を各処理室に供給するための供給孔を備え、各供給孔は、それぞれ同一の大きさに形成されているとよい。Preferably, the communication means includes a supply hole for supplying the pressure medium to each processing chamber, and each supply hole is formed to have the same size.
また、前記処理部には、前記圧媒供給ヘッダ部が設けられると共に、各処理室に供給された圧媒を回収する圧媒回収部が設けられ、該圧媒回収部は、回収した圧媒を前記処理部の外方に排出する排出部を備えているとよい。In addition, the processing unit is provided with the pressure medium supply header unit and a pressure medium recovery unit that recovers the pressure medium supplied to each processing chamber, and the pressure medium recovery unit includes the recovered pressure medium. It is good to provide the discharge part which discharges to the outside of the processing part.

さらに、前記圧媒供給ヘッダ部及び前記圧媒回収部に関し、何れか一方は前記処理棚の中央部に上下方向に延伸して設けられ、他方は前記処理筒の内周面に沿って設けられているとよい。Further, with respect to the pressure medium supply header part and the pressure medium recovery part, either one is provided by extending vertically in the central part of the processing shelf, and the other is provided along the inner peripheral surface of the processing cylinder. It is good to have.
加えて、前記高圧容器内には、前記処理部と、前記強制流動手段と、圧媒を加熱する加熱手段とが配備され、前記強制流動手段は、前記圧媒回収部から排出された圧媒を前記圧In addition, the processing section, the forced flow means, and a heating means for heating the pressure medium are provided in the high-pressure vessel, and the forced flow means is the pressure medium discharged from the pressure medium recovery section. The pressure
媒供給ヘッダ部に向けて流動させるものであり、前記加熱手段は、前記圧媒回収部から前記圧媒供給ヘッダ部に向けて流動する圧媒を加熱するものであるとよい。It is good to make it flow toward the medium supply header part, and the heating means heats the pressure medium which flows toward the pressure medium supply header part from the pressure medium recovery part.

本発明の目的を達成するための最も好ましい手段として、上記した熱間等方圧加圧装置を用い、収容された被処理品を高温高圧処理するに際して、前記強制流動手段によって流動する圧媒を圧媒供給ヘッダ部へ流入させた上で、圧媒を処理室内へ一方向に流動させるとよい。As the most preferable means for achieving the object of the present invention, the above-mentioned hot isostatic pressurizing apparatus is used, and when the stored article to be processed is subjected to high-temperature and high-pressure treatment, the pressure medium flowing by the forced flow means is used. After flowing into the pressure medium supply header, the pressure medium may flow in one direction into the processing chamber.

本発明の熱間等方圧加圧方法によれば、容易な構成で多段状に配備された各段の処理室の均熱性を維持することが可能である。
また、本発明の熱間等方圧加圧装置によれば、容易な構成で多段状に配備された各段の処理室の均熱性を維持することが可能である。
According to the hot isostatic pressing method of the present invention, it is possible to maintain the thermal uniformity of the processing chambers of each stage arranged in a multistage shape with an easy configuration.
Moreover, according to the hot isostatic pressure pressurization apparatus of this invention, it is possible to maintain the soaking | uniform-heating property of the process chamber of each step | stage arrange | positioned by multi-stage with easy structure.

以下、本発明の実施の形態を図面に基づき説明する。
図1〜図6は本発明に係る第1の実施の形態を示しており、図1は、本発明に係る熱間等方圧加圧装置1の本体部分を示している。
なお、本発明においては、圧媒として不活性ガスからなる圧媒ガスを用いている。
図1に示す如く、本発明の熱間等方圧加圧装置1は、高温高圧の圧媒を充填可能な高圧容器2と、該高圧容器2内の圧媒を所定の方向に流動させるための強制流動手段3とを備え、高圧容器2の内部には、被処理品Tを収容すべき処理室4を多段状に備えた処理部5が配備されており、前記圧媒により各処理室4に収容された被処理品Tが高温高圧処理(熱間等方圧加圧処理)される。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
1 to 6 show a first embodiment according to the present invention, and FIG. 1 shows a main body portion of a hot isostatic pressing apparatus 1 according to the present invention.
In the present invention, a pressure medium gas made of an inert gas is used as the pressure medium.
As shown in FIG. 1, a hot isostatic pressurizing device 1 of the present invention is configured to flow a high-pressure vessel 2 that can be filled with a high-temperature and high-pressure pressure medium and a pressure medium in the high-pressure vessel 2 in a predetermined direction. The forced flow means 3 is provided, and inside the high-pressure vessel 2, a processing section 5 having a plurality of processing chambers 4 in which the articles to be processed T are to be accommodated is arranged, and each processing chamber is provided by the pressure medium. The article to be processed T accommodated in 4 is subjected to a high-temperature and high-pressure process (hot isostatic pressing process).

高圧容器2内には、処理部5と、強制流動手段3と、圧媒を加熱する加熱手段6が配備され、強制流動手段3は、後述する圧媒回収部41から排出された圧媒を後述の圧媒供給ヘッダ部40に向けて流動させるものであり、加熱手段6は、圧媒回収部41から圧媒供給ヘッダ部40に向けて流動する圧媒を加熱するものである。また、高圧容器内2には、処理部5の外周部及び上方を覆う断熱構造体7が配備されている。   In the high-pressure vessel 2, a processing unit 5, a forced flow unit 3, and a heating unit 6 for heating the pressure medium are provided. The forced flow unit 3 stores the pressure medium discharged from the pressure medium recovery unit 41 described later. The heating means 6 heats the pressure medium flowing from the pressure medium recovery part 41 toward the pressure medium supply header part 40. Further, in the high-pressure vessel 2, a heat insulating structure 7 that covers the outer peripheral portion and the upper portion of the processing unit 5 is provided.

高圧容器2は、上下方向の軸心を有し且つ上下開口状の高圧円筒10と、該高圧円筒10の上端開口を閉塞する上蓋11と、高圧円筒10の下端開口を閉塞する下蓋12とから構成され、高圧容器2の圧媒の圧力によって上蓋11及び下蓋12に作用する荷重は窓枠状のプレスフレーム(図示省略)によって支持される。
下蓋12には、高圧容器2の内部に複数種の圧媒を供給するための複数本(本実施の形態においては2本)の圧媒供給管13が配備され、上蓋11には、高圧容器2の内部の圧媒を高圧容器2の外部に排出するための圧媒排出管14が配備されている。
The high-pressure vessel 2 includes a high-pressure cylinder 10 having a vertical axis and having an upper and lower opening shape, an upper lid 11 that closes an upper end opening of the high-pressure cylinder 10, and a lower lid 12 that closes a lower end opening of the high-pressure cylinder 10. The load acting on the upper lid 11 and the lower lid 12 by the pressure of the pressure medium in the high-pressure vessel 2 is supported by a window frame-shaped press frame (not shown).
The lower lid 12 is provided with a plurality of (two in the present embodiment) pressure medium supply pipes 13 for supplying a plurality of types of pressure medium into the high pressure vessel 2. A pressure medium discharge pipe 14 for discharging the pressure medium inside the container 2 to the outside of the high pressure container 2 is provided.

また、下蓋12は昇降自在に支持され、高圧容器2の下端開口を開閉自在に閉塞している。
前記強制流動手段3及び加熱手段6は下蓋12に取付固定されている。
強制流動手段3は、圧媒を強制的に循環させるべく高速回転可能なファン16と、該ファン16の回転中心から下方に伸びる軸部材17と、該軸部材17の下端部に連接されたモータ18とから構成されており、該強制流動手段3は、軸部材17を高圧容器2の軸心に一致させて配備されている。
The lower lid 12 is supported so as to be movable up and down, and closes the lower end opening of the high-pressure vessel 2 so as to be freely opened and closed.
The forced flow means 3 and the heating means 6 are fixedly attached to the lower lid 12.
The forced flow means 3 includes a fan 16 that can rotate at a high speed to forcibly circulate the pressure medium, a shaft member 17 that extends downward from the rotation center of the fan 16, and a motor that is connected to the lower end of the shaft member 17. The forced flow means 3 is arranged with the shaft member 17 aligned with the axis of the high-pressure vessel 2.

また、モータ18は、下蓋12の上面から下方に形成された凹部12aに収容されている。該凹部12aから突出するモータ18の部分は、下蓋12の上面に配備された断熱部材19によって周囲を包囲されており、該断熱部材19の上面には、圧媒が下蓋12のモータ収容空間に流入するのを防止すると共に断熱部材19への伝熱を防止する隔壁20が配備されている。   The motor 18 is accommodated in a recess 12 a formed downward from the upper surface of the lower lid 12. The portion of the motor 18 protruding from the recess 12 a is surrounded by a heat insulating member 19 provided on the upper surface of the lower lid 12, and a pressure medium is accommodated in the motor of the lower lid 12 on the upper surface of the heat insulating member 19. A partition wall 20 is provided for preventing the heat from flowing into the space and preventing heat transfer to the heat insulating member 19.

また、ファン16は、該ファン16の上方から圧媒を吸い込み、ファン16の回転軌跡の径外方向(水平方向)に圧媒を送り出すように構成されている。
前記隔壁20の上面には、複数本の支持脚21がファン16の軸心に対して放射状に突設されると共に、処理部5の外周部を包囲する筒部材22が配備されている。
図1、図3及び図4に示す如く、該支持脚21及び筒部材22に前記加熱手段6となる
ヒータ6aがそれぞれ取り付けられており、これによって加熱手段6は、処理部5の外周部及び底部を包囲すると共にファン16の径外方向の周囲を覆って配備されることとなる。
The fan 16 is configured to suck in the pressure medium from above the fan 16 and send out the pressure medium in the radially outward direction (horizontal direction) of the rotation locus of the fan 16.
On the upper surface of the partition wall 20, a plurality of support legs 21 project radially from the axis of the fan 16, and a cylindrical member 22 surrounding the outer periphery of the processing unit 5 is provided.
As shown in FIGS. 1, 3, and 4, heaters 6 a that serve as the heating means 6 are attached to the support legs 21 and the cylindrical member 22, respectively. The bottom portion is surrounded and the outer periphery of the fan 16 is covered.

断熱構造体7は、前記筒部材22及び処理部5を覆う円筒状の胴部23と、該胴部23の上端開口を閉塞して処理部5の上方を覆う上壁24とによって下端開口状に形成され、該処理部5、ファン16及びヒータ6aを覆って配備されている。
図1に示す如く、前記処理部5は、前記複数の処理室4を上下方向多段状に形成する処理棚25と、該処理棚25の外周部及び底部を包囲する有底状の処理筒26とから構成されている。
The heat insulating structure 7 has a cylindrical body part 23 covering the cylindrical member 22 and the processing part 5, and a lower end opening shape by an upper wall 24 that closes the upper end opening of the body part 23 and covers the upper part of the processing part 5. Formed so as to cover the processing unit 5, the fan 16, and the heater 6a.
As shown in FIG. 1, the processing unit 5 includes a processing shelf 25 in which the plurality of processing chambers 4 are formed in a multistage shape in the vertical direction, and a bottomed processing cylinder 26 that surrounds the outer periphery and the bottom of the processing shelf 25. It consists of and.

処理棚25は、被処理品Tを載置すべき複数の載置板27と、該複数の載置板27を上下方向多段状(本実施の形態においては5段)に支持する壁体28とを備えており、載置板27は、中央部に開口27aが開設された環状に形成されている。
壁体28は、載置板27の内周部を支持する内周壁29と、載置板27の外周部を支持する外周壁30とを有している。該内周壁29及び外周壁30によって載置板27を上下方向多段状に連接することにより、上下方向を載置板27、27に包囲されると共に径方向を内周壁29及び外周壁30に包囲された処理室4が多段状に形成されるのである。
The processing shelf 25 includes a plurality of mounting plates 27 on which the article to be processed T is to be mounted, and a wall body 28 that supports the plurality of mounting plates 27 in a multistage shape in the vertical direction (five levels in the present embodiment). The mounting plate 27 is formed in an annular shape having an opening 27a in the center.
The wall body 28 has an inner peripheral wall 29 that supports the inner peripheral portion of the mounting plate 27 and an outer peripheral wall 30 that supports the outer peripheral portion of the mounting plate 27. The mounting plate 27 is connected to the mounting plate 27 in the vertical direction by the inner peripheral wall 29 and the outer peripheral wall 30 so that the vertical direction is surrounded by the mounting plates 27 and 27 and the radial direction is surrounded by the inner peripheral wall 29 and the outer peripheral wall 30. The processed chamber 4 is formed in a multistage shape.

前記処理筒26は、前記複数本の支持脚21に支持された円板状の底板31と、上下端を開口した円筒状の整流筒32とから形成されており、底板31には、前記ファン16との対向位置となる中央部に挿通孔31aが開設されている。
図5に示す如く、本実施の形態においては、該整流筒32の下端部は溶接部32aを介して底板31の外周部に固着されているが、図6に示す如く、ボルト締結等の締結手段32bを介して底板31に連結されていても良い。
The processing cylinder 26 is formed of a disk-shaped bottom plate 31 supported by the plurality of support legs 21 and a cylindrical rectifying cylinder 32 having upper and lower ends opened. An insertion hole 31 a is formed in the central portion that is at a position opposite to 16.
As shown in FIG. 5, in the present embodiment, the lower end portion of the flow straightening cylinder 32 is fixed to the outer peripheral portion of the bottom plate 31 via the welded portion 32a. However, as shown in FIG. It may be connected to the bottom plate 31 via the means 32b.

図3及び図4に示す如く、整流筒32の外周面と該外周面を包囲して配備される前記筒部材22との間には、圧媒を流通させるための流通路Rが設けられている。
また、前記処理棚25は、その外周部と処理筒26(整流筒32)の内周面との間に一定の隙間Sを有して該処理筒26内に収容されている。
図1に示す如く、処理部5には、強制流動手段3によって流動する圧媒を一時的に貯留し、貯留した圧媒を各段の処理室4に供給する圧媒供給ヘッダ部40が設けられると共に、各処理室4に供給された圧媒を回収する圧媒回収部41が設けられている。
As shown in FIGS. 3 and 4, a flow passage R for circulating a pressure medium is provided between the outer peripheral surface of the rectifying cylinder 32 and the cylindrical member 22 disposed so as to surround the outer peripheral surface. Yes.
Further, the processing shelf 25 is accommodated in the processing cylinder 26 with a certain clearance S between the outer peripheral portion thereof and the inner peripheral surface of the processing cylinder 26 (rectifying cylinder 32).
As shown in FIG. 1, the processing section 5 is provided with a pressure medium supply header section 40 that temporarily stores the pressure medium flowing by the forced flow means 3 and supplies the stored pressure medium to the processing chambers 4 of each stage. In addition, a pressure medium recovery unit 41 that recovers the pressure medium supplied to each processing chamber 4 is provided.

本実施の形態においては、圧媒供給ヘッダ部40が処理棚25の中央部に上下方向に延伸して設けられ、圧媒回収部41が処理筒26の内周面及び底面(底板31の上面)に沿って設けられている。
圧媒供給ヘッダ部40は、処理棚25の最下段の載置板27の開口27aを閉塞し、各載置板27の内周部を内周壁29によって連接することにより、処理棚25の中央部に上下方向に延伸して設けられている。
In the present embodiment, the pressure medium supply header portion 40 is provided extending vertically in the central portion of the processing shelf 25, and the pressure medium recovery portion 41 is provided on the inner peripheral surface and the bottom surface (the upper surface of the bottom plate 31) of the processing tube 26. ).
The pressure medium supply header section 40 closes the opening 27 a of the lowermost mounting plate 27 of the processing shelf 25, and connects the inner peripheral portions of the mounting plates 27 with the inner peripheral wall 29. The part is provided by extending vertically.

また、該圧媒供給ヘッダ部40は、圧媒を貯留するための圧媒貯留室42と、該圧媒貯留室42に圧媒を流入させるための流入部43と、該圧媒貯留室42を各段の処理室4に並列に連通する連通手段44とを備えている。
圧媒貯留室42は、処理棚25の内周壁29、載置板27の内周縁及び最下段の載置板27に包囲されて処理棚25の中央部に上下方向に延伸して設けられており、流入部43は、最上段の載置板27の開口27aによって形成されている。
The pressure medium supply header section 40 includes a pressure medium storage chamber 42 for storing the pressure medium, an inflow section 43 for allowing the pressure medium to flow into the pressure medium storage chamber 42, and the pressure medium storage chamber 42. Are connected to the processing chambers 4 of each stage in parallel.
The pressure medium storage chamber 42 is surrounded by the inner peripheral wall 29 of the processing shelf 25, the inner peripheral edge of the mounting plate 27, and the lowermost mounting plate 27, and is provided extending vertically in the center of the processing shelf 25. The inflow portion 43 is formed by the opening 27 a of the uppermost mounting plate 27.

また、連通手段44は、圧媒貯留室42の圧媒を各処理室4に供給するための供給孔45を備えている。各供給孔45は、処理棚25の各段の内周壁29に同数ずつ複数個形成されている。また、各供給孔45は、それぞれ略同一の大きさに形成されている。
圧媒回収部41は、処理棚25の最上段の載置板27の外周縁を処理筒26の内周面に隙間無く連接し、各載置板27の外周部を外周壁30によって連接することにより、処理筒26の内周面及び底面(底板31の上面)に沿って設けられている。
In addition, the communication means 44 includes a supply hole 45 for supplying the pressure medium in the pressure medium storage chamber 42 to each processing chamber 4. A plurality of supply holes 45 are formed in the same number on the inner peripheral wall 29 of each stage of the processing shelf 25. Each supply hole 45 is formed in substantially the same size.
The pressure medium recovery unit 41 connects the outer peripheral edge of the uppermost mounting plate 27 of the processing shelf 25 to the inner peripheral surface of the processing cylinder 26 without a gap, and connects the outer peripheral portion of each mounting plate 27 by the outer peripheral wall 30. Thus, the processing tube 26 is provided along the inner peripheral surface and the bottom surface (the upper surface of the bottom plate 31).

圧媒回収部41は、各処理室4からの圧媒を回収する圧媒回収室46と、各処理室4と圧媒回収室46とを並列に連接する連通手段47とを備えている。
圧媒回収室46は、処理筒26の内周面、外周壁30、載置板27の外周縁及び最上段
の載置板27に包囲されて処理棚25の外周を包囲して上下方向に延伸して設けられている。
The pressure medium recovery unit 41 includes a pressure medium recovery chamber 46 that recovers the pressure medium from each processing chamber 4, and a communication unit 47 that connects each processing chamber 4 and the pressure medium recovery chamber 46 in parallel.
The pressure medium recovery chamber 46 is surrounded by the inner peripheral surface of the processing cylinder 26, the outer peripheral wall 30, the outer peripheral edge of the mounting plate 27, and the uppermost mounting plate 27, and surrounds the outer periphery of the processing shelf 25 in the vertical direction. Stretched and provided.

また、連通手段47は、各処理室4に供給された圧媒を圧媒回収室46に排出するための排出孔48を備えている。各排出孔48は、処理棚25の各段の外周壁30に同数ずつ複数個形成されている。また、各排出孔48は、それぞれ略同一の大きさに形成されている。
また、該圧媒回収部41は、回収した圧媒を処理部5の外方に排出する排出部49を備え、本実施の形態において該排出部49は、底板31の挿通孔31aによって形成されている。
In addition, the communication means 47 includes a discharge hole 48 for discharging the pressure medium supplied to each processing chamber 4 to the pressure medium recovery chamber 46. A plurality of discharge holes 48 are formed in the same number on the outer peripheral wall 30 of each stage of the processing shelf 25. Moreover, each discharge hole 48 is formed in substantially the same size.
Further, the pressure medium recovery part 41 includes a discharge part 49 for discharging the recovered pressure medium to the outside of the processing part 5. In the present embodiment, the discharge part 49 is formed by the insertion hole 31 a of the bottom plate 31. ing.

本発明の実施の形態は以上の構成からなるもので、処理部5の各処理室4内に被処理品Tを載置することにより、多数の被処理品Tが一度に処理部5内にて上下方向多段状に収容され、この状態で圧媒を高圧容器2内に充填して高温高圧処理が行われる。
また、本実施の形態において、最下段の載置台27は、処理筒26の底板31上面との間に被処理品Tを収容可能な間隔を有して内周壁29及び外周壁30に支持され、これによって底板31上面に処理品Tを載置することが可能となっているが、最下段の載置台27と底板31との間に上述の如き間隔を設けず、底板31上面に被処理品Tを載置しない構成であっても良い。
The embodiment of the present invention has the above-described configuration. By placing the products to be processed T in the processing chambers 4 of the processing unit 5, a large number of products to be processed T are placed in the processing unit 5 at a time. In this state, the high-pressure vessel 2 is filled with a pressure medium and high-temperature and high-pressure treatment is performed.
In the present embodiment, the lowermost mounting table 27 is supported by the inner peripheral wall 29 and the outer peripheral wall 30 with a space that can accommodate the workpiece T between the upper surface of the bottom plate 31 of the processing cylinder 26. As a result, the processed product T can be placed on the upper surface of the bottom plate 31, but the above-described interval is not provided between the lowermost stage mounting table 27 and the bottom plate 31, and the upper surface of the bottom plate 31 is processed. The structure which does not mount the goods T may be sufficient.

図2に矢印で示す如く、ファン16を高速回転させることにより、高圧容器2の内部には、処理部5の処理筒26の外周面と筒部材22の内周面との間の流路Rを上昇して処理部5の上方の空間(断熱構造体7の上壁24の下部空間)に流れ込み、処理部5内を下降して底板31の開口部31aから処理室5の下方に排出される圧媒循環路が形成される。
ここで、ファン16の側方に位置する支持脚21及び処理筒26の外周面を覆う筒部材22にヒータ6aが配備されているため、処理部5から排出された低温の圧媒は、ファン16によって処理部5の下方から側方に回り込み、前記流路Rを上昇している間にヒータ6aによって加温されることとなり、これによって圧媒は、再び高温に維持されて処理部5の上方の空間に流れ込む。
As indicated by arrows in FIG. 2, by rotating the fan 16 at a high speed, a flow path R between the outer peripheral surface of the processing cylinder 26 of the processing unit 5 and the inner peripheral surface of the cylindrical member 22 is provided inside the high-pressure vessel 2. And flows into the space above the processing unit 5 (the lower space of the upper wall 24 of the heat insulating structure 7), descends inside the processing unit 5 and is discharged from the opening 31a of the bottom plate 31 to the lower side of the processing chamber 5. A pressure medium circulation path is formed.
Here, since the heater 6a is provided in the cylindrical member 22 which covers the outer peripheral surface of the support leg 21 and the processing cylinder 26 located on the side of the fan 16, the low-temperature pressure medium discharged from the processing unit 5 is the fan. 16 wraps around from the lower side of the processing unit 5 to the side and is heated by the heater 6a while ascending the flow path R, whereby the pressure medium is again maintained at a high temperature and the processing unit 5 It flows into the space above.

そして、該空間に充満した圧媒は、圧媒供給ヘッダ部40の流入部43(最上段の載置板27の開口27a)を通じて圧媒貯留室42に流入する。該圧媒貯留室42に流入した圧媒は、直ちに連通手段44の供給孔45を通じて各処理室に流入することはなく、一時的に圧媒貯留室42に貯留される。
また、圧媒貯留室42の下端部は最下段の載置板27によって塞がれているので、圧媒貯留室42に流入した圧媒が各処理室4を経由することなく処理部5の外部に排出されることはない。
Then, the pressure medium filled in the space flows into the pressure medium storage chamber 42 through the inflow portion 43 (the opening 27 a of the uppermost mounting plate 27) of the pressure medium supply header 40. The pressure medium that has flowed into the pressure medium storage chamber 42 does not immediately flow into each processing chamber through the supply hole 45 of the communication means 44, but is temporarily stored in the pressure medium storage chamber 42.
In addition, since the lower end portion of the pressure medium storage chamber 42 is blocked by the lowermost mounting plate 27, the pressure medium that has flowed into the pressure medium storage chamber 42 does not pass through each processing chamber 4. It is not discharged to the outside.

ここで、圧媒が該圧媒貯留室42に一時的に貯留されることにより、圧媒貯留室42内は上下位置に拘わらず一定の温度に保たれる。即ち、圧媒貯留室42内の圧媒全体が一定の熱量に維持されるのである。
その後、圧媒貯留室42内の圧媒は、連通手段44の供給孔45を通じて各処理室4に供給される。このとき、各供給孔45は略同一の大きさに形成されているため、各処理室4には供給孔45を通じて略同じ流量の圧媒が供給されることとなり、これによって、各処理室4内には同量の熱量が供給されるのである。しかも、圧媒供給ヘッダ部40が各処理室4の中央部に形成され、圧媒回収部41が各処理室5の径外方向にて各処理室4を包囲して配備されているため、供給孔45を通じて各処理室4に供給される圧媒は、処理室4内を径外方向に向けて一方向に流動することとなり、これによって、各処理室4内での圧媒の滞留や逆流が発生することはない。
Here, when the pressure medium is temporarily stored in the pressure medium storage chamber 42, the inside of the pressure medium storage chamber 42 is maintained at a constant temperature regardless of the vertical position. That is, the entire pressure medium in the pressure medium storage chamber 42 is maintained at a constant amount of heat.
Thereafter, the pressure medium in the pressure medium storage chamber 42 is supplied to each processing chamber 4 through the supply hole 45 of the communication means 44. At this time, since each supply hole 45 is formed to have substantially the same size, the pressure medium having substantially the same flow rate is supplied to each processing chamber 4 through the supply hole 45, and thereby, each processing chamber 4. The same amount of heat is supplied inside. Moreover, since the pressure medium supply header 40 is formed at the center of each processing chamber 4 and the pressure medium recovery portion 41 is disposed surrounding each processing chamber 4 in the radially outward direction of each processing chamber 5, The pressure medium supplied to each processing chamber 4 through the supply hole 45 flows in one direction in the processing chamber 4 in the radially outward direction. No backflow will occur.

そして、各処理室4に流入した圧媒は、被処理品Tとの間の熱交換によって高温状態から低温状態に変化し、各処理室4から圧媒回収部41の連通手段47の排出孔48を通じて圧媒回収室46に流れ込む。その後、圧媒は、ファン16による圧媒循環路に従って圧媒回収室46内を下降し、処理筒26の底板31に沿って該底板31上を径内方向に流動した後、圧媒回収部41の排出部49(底板31の挿通孔31a)から排出されて再びファン16に吸い込まれることとなるのである。   Then, the pressure medium flowing into each processing chamber 4 changes from a high temperature state to a low temperature state by heat exchange with the workpiece T, and the discharge hole of the communication means 47 of the pressure medium recovery unit 41 from each processing chamber 4. It flows into the pressure medium recovery chamber 46 through 48. Thereafter, the pressure medium descends in the pressure medium recovery chamber 46 in accordance with the pressure medium circulation path by the fan 16 and flows on the bottom plate 31 along the bottom plate 31 of the processing cylinder 26 in the radially inward direction. 41 is discharged from the discharge portion 49 (the insertion hole 31a of the bottom plate 31) and sucked into the fan 16 again.

ここで、圧媒回収室46の上端部は、最上段の載置板27の外周部によって閉塞されているので、圧媒回収室46に流れ込んだ低温の圧媒が上昇して処理部5上方の空間に流れ込むことはない。
本実施の形態によれば、処理部5の各処理室4には、同じ熱量を有する圧媒が略同じ流量で供給されるため、各処理室4は一定の熱量に維持されることとなり、これによって、各処理室4の互いの均熱状態は維持され、この結果、従来において数百度の温度差を有していた処理部5の上下方向の温度勾配が数度差に収められるのである。
Here, since the upper end portion of the pressure medium recovery chamber 46 is closed by the outer peripheral portion of the uppermost mounting plate 27, the low-temperature pressure medium flowing into the pressure medium recovery chamber 46 rises and is above the processing unit 5. Never flow into the space.
According to this embodiment, since the pressure medium having the same amount of heat is supplied to each processing chamber 4 of the processing unit 5 at substantially the same flow rate, each processing chamber 4 is maintained at a constant amount of heat. As a result, the soaking state of the processing chambers 4 is maintained, and as a result, the temperature gradient in the vertical direction of the processing unit 5 that conventionally has a temperature difference of several hundred degrees is contained in the difference of several degrees. .

また、処理部5は高圧容器2の内部から着脱自在であるので、処理部5を高圧容器2から取り出した状態で処理筒26内に載置板27及び壁体28を一段ずつ組み込んで処理棚25を形成すると同時に各処理室4に被処理品Tを収容することができ、被処理品Tを収容する作業が高圧容器2の外部にて容易に行われるのである。ここで、最下段の壁体28の内周壁29及び外周壁30の下端を底板31に連結すると、処理筒26と処理棚25とが一体となった製品搬送用のバケットが形成されることとなり、高温高圧処理過程の前後での処理部5の搬送が容易となる。   Since the processing unit 5 is detachable from the inside of the high-pressure vessel 2, the mounting plate 27 and the wall body 28 are assembled into the processing cylinder 26 one by one in a state where the processing unit 5 is taken out from the high-pressure vessel 2. At the same time as 25 is formed, the products to be processed T can be stored in the respective processing chambers 4, and the operation of storing the products to be processed T is easily performed outside the high-pressure vessel 2. Here, when the lower ends of the inner peripheral wall 29 and the outer peripheral wall 30 of the lowermost wall body 28 are connected to the bottom plate 31, a product transport bucket in which the processing cylinder 26 and the processing shelf 25 are integrated is formed. In addition, the processing unit 5 can be easily transported before and after the high-temperature and high-pressure treatment process.

図7に示すものは、本発明の第2の実施の形態である。
この実施の形態において、第1の実施の形態を示す図1と同じ図番を付したものは、基本的には図1と同じものであるので、ここでは説明を省略する。
この実施の形態においては、最上段の載置台27上に配備された環状の整流板50を介して最上段の載置台27の外周縁が処理筒26の内周面に隙間無く連設されている。
FIG. 7 shows a second embodiment of the present invention.
In this embodiment, the components having the same reference numerals as those in FIG. 1 showing the first embodiment are basically the same as those in FIG.
In this embodiment, the outer peripheral edge of the uppermost mounting table 27 is connected to the inner peripheral surface of the processing tube 26 without a gap via an annular rectifying plate 50 arranged on the uppermost mounting table 27. Yes.

この実施の形態によれば、最上段の載置板27として最下段の載置板27を除く他段と同仕様の載置板27を採用することができ、処理棚25の低コスト化が図られるのである。また、処理筒26が圧媒の加圧によって変形した場合にも、該変形に対応した整流板50を取り付けることにより最上段の載置台27の外周縁と処理筒26の内周面とを隙間無く連結して圧媒回収部41を形成することができ、上述の如き処理筒26の変形に容易に対応することが可能となる。   According to this embodiment, the mounting plate 27 having the same specifications as the other stages excluding the lowermost mounting plate 27 can be adopted as the uppermost mounting plate 27, and the cost of the processing shelf 25 can be reduced. It is planned. Further, even when the processing cylinder 26 is deformed by the pressurization of the pressure medium, a gap between the outer peripheral edge of the uppermost mounting table 27 and the inner peripheral surface of the processing cylinder 26 is attached by attaching a current plate 50 corresponding to the deformation. The pressure medium recovery unit 41 can be formed without being connected, and can easily cope with the deformation of the processing cylinder 26 as described above.

図8に示すものは、参考例として示す形態である。
この実施の形態において、第1の実施の形態を示す図1と同じ図番を付したものは、基本的には図1と同じものであるので、ここでは説明を省略する。
この実施の形態においては、圧媒供給ヘッダ部140が前記処理筒26の内周面に沿って設けられており、圧媒回収部141が処理棚25の中央部に上下方向に延伸して設けられている。
What is shown in FIG. 8 is a form shown as a reference example .
In this embodiment, the components having the same reference numerals as those in FIG. 1 showing the first embodiment are basically the same as those in FIG.
In this embodiment, the pressure medium supply header portion 140 is provided along the inner peripheral surface of the processing cylinder 26, and the pressure medium recovery portion 141 is provided extending vertically in the center portion of the processing shelf 25. It has been.

圧媒供給ヘッダ部140は、処理棚25の最下段の載置板27の外縁を処理筒26の内周面に隙間無く連接し、各載置板27の外周部を外周壁30によって連接することにより、処理筒26の内周面に沿って上下方向に延伸して設けられている。
また、該圧媒供給ヘッダ部140は、圧媒を貯留するための圧媒貯留室142と、該圧媒貯留室142に圧媒を流入させるための流入部143と、該圧媒貯留室142を各段の処理室4に並列に連通する連通手段144とを備えている。
The pressure medium supply header 140 connects the outer edge of the lowermost mounting plate 27 of the processing shelf 25 to the inner peripheral surface of the processing cylinder 26 without a gap, and connects the outer peripheral portion of each mounting plate 27 by the outer peripheral wall 30. As a result, it is provided to extend in the vertical direction along the inner peripheral surface of the processing cylinder 26.
The pressure medium supply header section 140 includes a pressure medium storage chamber 142 for storing the pressure medium, an inflow section 143 for allowing the pressure medium to flow into the pressure medium storage chamber 142, and the pressure medium storage chamber 142. Is connected to the processing chamber 4 of each stage in parallel.

圧媒貯留室142は、最下段の載置板27の外縁を延伸して処理筒26の内周面に隙間無く連接し、各載置板27の外周部を外周壁30によって連接することにより、処理筒26の内周面と処理棚25の外周壁30及び載置板27の外周縁との間に設けられており、流入部143は、最上段の載置板27の外縁と処理筒26の内周面との間の隙間によって形成されている。   The pressure medium storage chamber 142 is formed by extending the outer edge of the lowermost mounting plate 27 to be connected to the inner peripheral surface of the processing cylinder 26 without a gap, and by connecting the outer peripheral portion of each mounting plate 27 by the outer peripheral wall 30. The processing tube 26 is provided between the inner peripheral surface of the processing tube 26 and the outer peripheral wall 30 of the processing shelf 25 and the outer peripheral edge of the mounting plate 27, and the inflow portion 143 is connected to the outer edge of the uppermost mounting plate 27 and the processing tube. It is formed by the clearance gap between 26 inner peripheral surfaces.

また、連通手段144は、圧媒貯留室142に貯留された圧媒を各処理室4に供給するための供給孔145を備えている。各供給孔145は、処理棚25の各段の外周壁30に同数ずつ複数個形成されている。また、各供給孔145は、それぞれ略同一の大きさに形成されている。
圧媒回収部141は、処理棚25の最上段の載置板27の開口27aを閉塞し、各載置板27の内周部を内周壁29によって連接することにより、処理棚25の中央部に上下方向に延伸して設けられている。
In addition, the communication means 144 includes a supply hole 145 for supplying the pressure medium stored in the pressure medium storage chamber 142 to each processing chamber 4. The same number of each supply hole 145 is formed in the outer peripheral wall 30 of each step of the processing shelf 25. Each supply hole 145 is formed in substantially the same size.
The pressure medium recovery unit 141 closes the opening 27 a of the uppermost mounting plate 27 of the processing shelf 25, and connects the inner peripheral portion of each mounting plate 27 with the inner peripheral wall 29, so that the central portion of the processing shelf 25 is connected. Are extended in the vertical direction.

また、圧媒回収部141は、各処理室4からの圧媒を回収する圧媒回収室146と、各
処理室4と圧媒回収室146とを連接する連通手段147と、圧媒回収室146に回収した圧媒を処理部5の外方に排出する排出部149とを備えている。
圧媒回収室141は、処理棚25の内周壁29、載置板27の内周縁及び最上段の載置板27に包囲されて処理棚25の中央部に上下方向に延伸して設けられており、排出部149は、最下段の載置板27の開口27aと処理筒26の底板31の挿通孔31aを内周壁29を介して連接して形成されている。
The pressure medium recovery unit 141 includes a pressure medium recovery chamber 146 that recovers the pressure medium from each processing chamber 4, a communication unit 147 that connects each processing chamber 4 and the pressure medium recovery chamber 146, and a pressure medium recovery chamber. 146 includes a discharge unit 149 that discharges the recovered pressure medium to the outside of the processing unit 5.
The pressure medium recovery chamber 141 is surrounded by the inner peripheral wall 29 of the processing shelf 25, the inner peripheral edge of the mounting plate 27, and the uppermost mounting plate 27, and is provided extending vertically in the center of the processing shelf 25. The discharge portion 149 is formed by connecting the opening 27 a of the lowermost mounting plate 27 and the insertion hole 31 a of the bottom plate 31 of the processing cylinder 26 via the inner peripheral wall 29.

また、連通手段147は、各処理室4に供給された圧媒を圧媒回収室146に排出するための排出孔148を備えている。各排出孔148は、処理棚25の各段の内周壁29に同数ずつ複数個形成されている。また、各排出孔148は、それぞれ略同一の大きさに形成されている。
本実施の形態においては、圧媒供給ヘッダ部140が各処理室4の径外方向にて各処理室4を包囲して配備され、圧媒回収部141が各処理室4の中央部に配備されているため、供給孔145を通じて各処理室4に供給される圧媒は、図中に矢印で示す如く、処理室4内を径内方向に向けて一方向に流動することとなり、これによって、各処理室4内での圧媒の滞留や逆流が発生することはないのである。
The communication unit 147 includes a discharge hole 148 for discharging the pressure medium supplied to each processing chamber 4 to the pressure medium recovery chamber 146. The same number of each discharge hole 148 is formed in the inner peripheral wall 29 of each step of the processing shelf 25. Moreover, each discharge hole 148 is formed in substantially the same size.
In the present embodiment, the pressure medium supply header portion 140 is provided surrounding each processing chamber 4 in the radially outward direction of each processing chamber 4, and the pressure medium recovery portion 141 is provided in the central portion of each processing chamber 4. Therefore, the pressure medium supplied to each processing chamber 4 through the supply hole 145 flows in one direction in the radial direction in the processing chamber 4 as indicated by an arrow in the figure, and thereby In this way, no stagnation or backflow of the pressure medium in each processing chamber 4 occurs.

なお、本発明は、上記実施の形態に示したものに限定されるものではない。
例えば、圧媒貯留室42を形成すべく載置板27の開口27aを閉塞する場合、該開口27aを覆う蓋部材によって閉塞しても良い。
また、載置板27の形状は、多角形状や楕円形状等、処理筒26の内周面との間に所定の空隙を設けて配備できるものであれば、如何なる形状のものであってもよい。また、載置板27の強度を確保するために、各載置板27の裏面にリブ等の補強部材を取り付けてもよい。
The present invention is not limited to that shown in the above embodiment.
For example, when the opening 27a of the mounting plate 27 is closed to form the pressure medium storage chamber 42, it may be closed by a lid member that covers the opening 27a.
The mounting plate 27 may have any shape as long as it can be provided with a predetermined gap between the inner peripheral surface of the processing tube 26 such as a polygonal shape or an elliptical shape. . Further, in order to secure the strength of the mounting plates 27, reinforcing members such as ribs may be attached to the back surfaces of the mounting plates 27.

また、載置板27の開口27aを下段に向かうに連れて小さくすることも可能である。同様に、載置台27の外周縁と処理筒26の内周面との間の隙間の大きさを下段に向かうに連れて小さくすることも可能である。
また、載置板27の段数及び載置板27間の間隔は、被処理品Tの大きさに対応させて設定可能であり、5段以上の段数を設定することも可能である。
Moreover, it is also possible to make the opening 27a of the mounting plate 27 smaller as it goes downward. Similarly, the size of the gap between the outer peripheral edge of the mounting table 27 and the inner peripheral surface of the processing cylinder 26 can be reduced as it goes downward.
Further, the number of stages of the mounting plate 27 and the interval between the mounting plates 27 can be set in accordance with the size of the product T to be processed, and the number of stages of 5 or more can be set.

また、圧媒が処理部5内を下方から上方に上昇し、処理部5の外側方を下降する圧媒循環路を高圧容器2内に形成した場合にも、本実施の形態と同様の効果が得られる。
また、別の観点からみれば、本発明は、各処理室4内に圧媒を略均等に流動させるための圧媒流路を処理部5を構成する処理棚25と処理筒26とによって形成することにある。
The same effect as the present embodiment can also be obtained when a pressure medium circulation path is formed in the high-pressure vessel 2 in which the pressure medium rises from the lower side to the upper side in the processing unit 5 and descends to the outside of the processing unit 5. Is obtained.
From another point of view, in the present invention, the pressure medium flow path for causing the pressure medium to flow substantially uniformly in each processing chamber 4 is formed by the processing shelf 25 and the processing cylinder 26 constituting the processing unit 5. There is to do.

即ち、上記第1の実施の形態においては、処理棚25の最上段の載置板27の外縁を処理筒26に隙間無く連接すると共に、最下段の載置板27の開口27aを閉塞することによって、処理部5内に、最上段の載置板27の開口27aから処理筒26の底板31の挿通孔31aに向けて圧媒を一方向に流動させる圧媒流路が形成されるのである。これによって、圧媒は最上段の載置板27の開口27aのみから流入することとなり、処理部5に流入した圧媒が処理部5上方に漏れることはないのである。また、処理部5内に流入した圧媒が処理室4を経由することなく挿通孔31aから流出することはないのである。   That is, in the first embodiment, the outer edge of the uppermost mounting plate 27 of the processing shelf 25 is connected to the processing cylinder 26 without a gap, and the opening 27a of the lowermost mounting plate 27 is closed. As a result, a pressure medium flow path is formed in the processing section 5 for allowing the pressure medium to flow in one direction from the opening 27a of the uppermost mounting plate 27 toward the insertion hole 31a of the bottom plate 31 of the processing cylinder 26. . As a result, the pressure medium flows only from the opening 27 a of the uppermost mounting plate 27, and the pressure medium flowing into the processing unit 5 does not leak upward from the processing unit 5. Further, the pressure medium flowing into the processing unit 5 does not flow out of the insertion hole 31a without passing through the processing chamber 4.

そして、処理部5内にて各処理室4が該圧媒流路に並列に連結されているので、処理部5に流入した圧媒は、各処理室4内を略同量の流量で径内方向から径外方向に向けて一方向に流動し、処理筒26の底板31上を径外方向から径内方向に向けて流動した後に、挿通孔31aから処理部5外に排出されるのである。
このように、処理部5内に各処理室4を並列に連結する圧媒流路が形成されることにより、各処理室4には、同じ熱量を有する圧媒が略同じ流量で供給されるため、各処理室4は一定の熱量に維持されることとなる。これによって各処理室4の互いの均熱状態は維持され、この結果、従来において数百度の温度差を有していた処理部5の上下方向の温度勾配が数度差に納められるのである。
Since each processing chamber 4 is connected in parallel to the pressure medium flow path in the processing unit 5, the pressure medium flowing into the processing unit 5 has a diameter of approximately the same amount in each processing chamber 4. Since it flows in one direction from the inner direction to the outer diameter direction and flows on the bottom plate 31 of the processing cylinder 26 from the outer diameter direction to the inner diameter direction, it is discharged out of the processing section 5 from the insertion hole 31a. is there.
Thus, the pressure medium flow path that connects the processing chambers 4 in parallel in the processing unit 5 is formed, so that the pressure medium having the same amount of heat is supplied to each processing chamber 4 at substantially the same flow rate. Therefore, each processing chamber 4 is maintained at a constant amount of heat. As a result, the soaking state of each processing chamber 4 is maintained, and as a result, the temperature gradient in the vertical direction of the processing unit 5 that conventionally has a temperature difference of several hundred degrees is included in the difference of several degrees.

本発明に係る第1の実施の形態の熱間等方圧加圧装置の本体部分を正面から見た断面図である。It is sectional drawing which looked at the main-body part of the hot isostatic pressurization apparatus of 1st Embodiment which concerns on this invention from the front. 高圧容器内の圧媒循環路を示した断面図である。It is sectional drawing which showed the pressure medium circulation path in a high pressure container. 図1のA−A線に沿う断面図である。It is sectional drawing which follows the AA line of FIG. 図1のB−B線に沿う断面図である。It is sectional drawing which follows the BB line of FIG. 整流筒の底板への取付状態を示す要部拡大断面図である。It is a principal part expanded sectional view which shows the attachment state to the baseplate of a rectification | straightening cylinder. 整流筒の底板への他の取付状態を示す要部拡大断面図である。It is a principal part expanded sectional view which shows the other attachment state to the baseplate of a rectification | straightening cylinder. 本発明に係る第2の実施の形態の熱間等方圧加圧装置の本体部分を正面から見た断面図である。It is sectional drawing which looked at the main-body part of the hot isostatic pressing apparatus of 2nd Embodiment which concerns on this invention from the front. 参考例として示す熱間等方圧加圧装置の本体部分を正面から見た断面図である。It is sectional drawing which looked at the main-body part of the hot isostatic pressing apparatus shown as a reference example from the front.

1 熱間等方圧加圧装置
2 高圧容器
3 強制流動手段
4 処理室
5 処理部
6 加熱手段
16 ファン
20 隔壁
21 支持脚
22 筒部材
25 処理棚
26 処理筒
27 載置板
27a開口
28 壁体
29 内周壁
30 外周壁
31 底板
32 整流筒
40 圧媒供給ヘッダ部
41 圧媒回収部
42 圧媒貯留室
43 流入部
44 連通手段
45 供給孔
46 圧媒回収室
47 連通手段
48 排出孔
49 排出部
50 整流板
140 圧媒供給ヘッダ部
141 圧媒回収部
142 圧媒貯留室
143 流入部
144 連通手段
145 供給孔
146 圧媒回収室
147 連通手段
148 排出孔
149 排出部
DESCRIPTION OF SYMBOLS 1 Hot isostatic press 2 High pressure vessel 3 Forced flow means 4 Processing chamber 5 Processing part 6 Heating means 16 Fan 20 Bulkhead 21 Support leg 22 Cylindrical member 25 Processing shelf 26 Processing cylinder 27 Mounting plate 27a opening 28 Wall body DESCRIPTION OF SYMBOLS 29 Inner peripheral wall 30 Outer peripheral wall 31 Bottom plate 32 Rectification cylinder 40 Pressure medium supply header part 41 Pressure medium collection | recovery part 42 Pressure medium storage chamber 43 Inflow part 44 Communication means 45 Supply hole 46 Pressure medium recovery chamber 47 Communication means 48 Exhaust hole 49 Exhaust part DESCRIPTION OF SYMBOLS 50 Current plate 140 Pressure medium supply header part 141 Pressure medium collection | recovery part 142 Pressure medium storage chamber 143 Inflow part 144 Communication means 145 Supply hole 146 Pressure medium recovery chamber 147 Communication means 148 Exhaust hole 149 Exhaust part

Claims (6)

高温高圧の圧媒を充填可能な高圧容器(2)と、該高圧容器(2)内の圧媒を所定の方向に流動させるための強制流動手段(3)とを備え、前記高圧容器(2)の内部には、被処理品(T)を収容すべき複数の処理室(4)を備えた処理部(5)が配備され、前記処理部(5)は、前記複数の処理室(4)を上下方向多段状に形成する処理棚(25)と該処理棚(25)の外周部及び底部を包囲する有底状の処理筒(26)とから構成され、前記圧媒により各処理室(4)に収容された被処理品(T)を高温高圧処理する熱間等方圧加圧装置において、
前記強制流動手段(3)によって流動する圧媒を各段の処理室(4)に供給する圧媒供給ヘッダ部(40)を有し、
前記圧媒供給ヘッダ部(40)は、中央部に開口(27a)が開設された複数の載置板(27)を壁体(28)によって連接すると共に最下段の載置板(27)の開口(27a)を閉塞することで、処理棚(25)の中央部に上下方向へ延伸して設けられており、
前記圧媒供給ヘッダ部(40)は、圧媒を当該圧媒供給ヘッダ部(40)内に流入させるべく最上段の載置板(27)に設けられた流入部(43)と、各処理室(4)に連通する連通手段(44)とを備えていることを特徴とする熱間等方圧加圧装置。
A high-pressure vessel (2) capable of being filled with a high-temperature and high-pressure pressure medium; and a forced flow means (3) for causing the pressure medium in the high-pressure vessel (2) to flow in a predetermined direction. inside the) processor which example Bei plurality of processing chambers to be accommodated to a workpiece (T) to (4) (5) is deployed, wherein the processing unit (5), said plurality of processing chambers (4 ) In a multistage shape in the vertical direction and a bottomed processing cylinder (26) surrounding the outer periphery and bottom of the processing shelf (25). In the hot isostatic pressurizing apparatus for high-temperature and high-pressure treatment of the article to be treated (T) accommodated in (4),
The pressure medium flowing the by forced flow means (3) have a pressure medium supply header (40) to the treatment chamber (4) in each stage,
The pressure medium supply header section (40) connects a plurality of mounting plates (27) having openings (27a) in the central portion thereof by wall bodies (28) and is provided on the lowermost mounting plate (27). By closing the opening (27a), it is provided extending in the vertical direction at the center of the processing shelf (25),
The pressure medium supply header section (40) includes an inflow section (43) provided in the uppermost mounting plate (27) to allow the pressure medium to flow into the pressure medium supply header section (40), and each process. A hot isostatic pressurizing device comprising communication means (44) communicating with the chamber (4).
前記連通手段(44)は、圧媒を各処理室(4)に供給するための供給孔(45)を備え、各供給孔(45)は、それぞれ同一の大きさに形成されていることを特徴とする請求項に記載の熱間等方圧加圧装置。 Said communicating means (44) is provided with a supply hole (45) for supplying pressure medium to the processing chamber (4), each supply hole (45) is formed in each the same size The hot isostatic pressing device according to claim 1 , wherein the device is a hot isostatic pressing device. 前記処理部(5)には、前記圧媒供給ヘッダ部(40)が設けられると共に、各処理室(4)に供給された圧媒を回収する圧媒回収部(41)が設けられ、該圧媒回収部(41)は、回収した圧媒を前記処理部(5)の外方に排出する排出部(49)を備えていることを特徴とする請求項1又は2に記載の熱間等方圧加圧装置。 The processing section (5) is provided with the pressure medium supply header section (40) and a pressure medium recovery section (41) for recovering the pressure medium supplied to each processing chamber (4). The hot medium according to claim 1 or 2, wherein the pressure medium recovery part (41) includes a discharge part (49) for discharging the recovered pressure medium to the outside of the processing part (5). Isostatic pressure press. 記圧媒供給ヘッダ部(40)及び前記圧媒回収部(41)に関し、何れか一方は前記処理棚(25)の中央部に上下方向に延伸して設けられ、他方は前記処理筒(26)の内周面に沿って設けられていることを特徴とする請求項に記載の熱間等方圧加圧装置。 Before SL medium supply header section (40) and the medium recovery section relates (41), one is provided to extend in the vertical direction in the central portion of the processing rack (25) and the other said processing tube ( 26) The hot isostatic pressurizing device according to claim 3 , wherein the hot isostatic pressurizing device is provided along the inner peripheral surface of No. 26). 前記高圧容器(2)内には、前記処理部(5)と、前記強制流動手段(3)と、圧媒を加熱する加熱手段(6)とが配備され、前記強制流動手段(3)は、前記圧媒回収部(41)から排出された圧媒を前記圧媒供給ヘッダ部(40)に向けて流動させるものであり、前記加熱手段(6)は、前記圧媒回収部(41)から前記圧媒供給ヘッダ部(40)に向けて流動する圧媒を加熱するものであることを特徴とする請求項3又は4に記載の熱間等方圧加圧装置。 In the high-pressure vessel (2), the processing section (5), the forced flow means (3), and a heating means (6) for heating the pressure medium are provided, and the forced flow means (3) The pressure medium discharged from the pressure medium recovery part (41) is caused to flow toward the pressure medium supply header part (40), and the heating means (6) includes the pressure medium recovery part (41). The hot isostatic pressurizing device according to claim 3 or 4 , wherein the pressure medium flowing toward the pressure medium supply header section (40) is heated. 請求項1〜請求項5のいずれか1項に記載された熱間等方圧加圧装置を用い、収容された被処理品(T)を高温高圧処理するに際して、Using the hot isotropic pressure pressurization device according to any one of claims 1 to 5, when the stored article to be processed (T) is subjected to high-temperature and high-pressure treatment,
前記強制流動手段(3)によって流動する圧媒を圧媒供給ヘッダ部(40)へ流入させた上で、圧媒を処理室(3)内へ一方向に流動させることを特徴とする熱間等方圧加圧方法。A hot medium characterized by causing the pressure medium flowing by the forced flow means (3) to flow into the pressure medium supply header (40) and then flowing the pressure medium in one direction into the processing chamber (3). Isotropic pressure method.
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Publication number Priority date Publication date Assignee Title
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