JP4466708B2 - Liquid crystal device - Google Patents

Description

  The present invention relates to an FFS (Fringe Field Switching) mode liquid crystal device which is a horizontal electric field type liquid crystal operation mode.

  Currently, liquid crystal devices are widely used in electronic devices such as mobile phones, personal digital assistants, PDAs (Personal Digital Assistants), and the like. In the liquid crystal device, the first electrode and the second electrode are provided on one substrate so as to face each other with a dielectric film interposed therebetween, and the above-described liquid crystal device includes a plurality of linear electrode portions arranged in parallel with a gap. There is known an FFS mode liquid crystal device in which a second electrode is formed and a first electrode is formed by a planar electrode. Here, as the switching element, a TFT (Thin Film Transistor) element which is a three-terminal switching element is used (see, for example, Patent Document 1).

  In an active matrix type liquid crystal device, a TFD (Thin Film Diode), which is a two-terminal switching element, is used as a switching element for individually driving a plurality of pixels on (white display) / off (black display). A liquid crystal device using an element and a liquid crystal device using a TFT (Thin Film Transistor) element which is a three-terminal switching element as a switching element are known (see, for example, Patent Document 2).

The liquid crystal device disclosed in Patent Document 2 is a vertical electric field type liquid crystal device, in which a first electrode is provided on one of a pair of substrates bonded using a sealant, and a second electrode is provided on the other. . Wiring is conductively connected to the first electrode and the second electrode, respectively, and necessary signals are supplied. In the liquid crystal device of Patent Document 2, the second electrode and the wiring for supplying a signal to the second electrode are provided on different substrates, and the second electrode and the wiring are provided inside the sealing material. Conductive connection is made via a conducting member.
JP 2001-83540 A (pages 4-5, FIG. 3) Japanese Patent Laying-Open No. 2003-29289 (5th page, FIG. 1)

  Since the liquid crystal device disclosed in Patent Document 1 is an FFS mode, display characteristics with a wide viewing angle and high contrast are obtained as compared with a vertical electric field mode operation mode represented by a TN (Twisted Nematic) mode. realizable.

  However, since the liquid crystal device disclosed in Patent Document 1 uses a TFT element which is a three-terminal switching element as a switching element for controlling a voltage applied to a pixel, the configuration of elements formed on the substrate Are complicated, the manufacturing process is complicated, and the cost is high.

  Therefore, the inventor has considered simplifying the configuration of a lateral electric field type liquid crystal device by using a TFD element which is a two-terminal switching element disclosed in Patent Document 2. However, when an FFS mode liquid crystal device is configured using TFD elements, unlike the case of the vertical electric field method, a plurality of second electrodes and a plurality of wirings conductively connected to the second electrodes are the same. Since it will be arrange | positioned on a board | substrate, there exists a possibility that wiring and the 2nd electrode different from what is connected to the wiring may short-circuit depending on the structure of wiring.

  Such a problem is not limited to the case where a TFD element is used, and may similarly occur when a TFT element which is a three-terminal switching element is used.

  In order to eliminate this, it is necessary to have a structure that electrically insulates those wirings from the second electrode. However, if this insulation structure is specially provided only for the wiring and the second electrode, There is a possibility that the configuration of the liquid crystal device cannot be simplified sufficiently. In addition, when such a special insulating structure is adopted, the structure of the wiring and the electrode on the substrate is limited, which may hinder the simplification of the configuration of elements formed on the substrate.

  The present invention has been made in view of the above problems, and in a lateral electric field mode liquid crystal device, a structure capable of easily forming an insulating structure between a wiring and an electrode formed thereon. The purpose is to provide.

In order to solve the above problem, the present invention, have a first substrate and a second substrate facing each other across the liquid crystal layer, the liquid crystal device forming the display area by a plurality arranged sub-pixel, the first On the substrate, a signal line, a switching element conductively connected to the signal line, a first electrode conductively connected to the switching element, and a plurality formed in parallel in the same direction are formed in an outer area of the display area. An extended wiring; a dielectric film covering the first electrode , the switching element, and the wiring; and a plurality of linear shapes facing the first electrode on the dielectric film and parallel to each other with a gap A second electrode having an electrode portion , wherein the second electrode overlaps the plurality of first electrodes in plan view on the dielectric film and intersects with the extending direction of the signal line. Outside the display area extending in the direction A strip-shaped electrode led out toward the region, and the strip-shaped electrode is provided in parallel with a predetermined interval in the extending direction of the signal line, and the wiring of the dielectric film and A contact hole in which the dielectric film is removed in the thickness direction is provided at a position overlapping the second electrode in plan view, and the second electrode is conductively connected to the wiring via the contact hole . It is characterized by that.

  According to the first liquid crystal device of the present invention, it is possible to realize a lateral electric field mode operation mode such as an FFS mode. The FFS mode is a mode in which the optical properties of the liquid crystal are controlled by an electric field parallel to the substrate, that is, a so-called lateral electric field. Therefore, the FFS mode displays a wider viewing angle and higher contrast than the vertical electric field mode represented by the TN mode. realizable. In the liquid crystal device to which the present invention is applied, the second electrode is led out from the dielectric film toward the region where the dielectric film is not present, and the second electrode is formed in the region where the dielectric film is not present. The electrode and the wiring were electrically connected. Therefore, according to the present invention, the dielectric film that electrically insulates the first electrode and the second electrode is used to electrically connect the wiring and the second electrode different from the one connected to the wiring. Therefore, it is not necessary to provide a special structure for insulating the wiring. As a result, it is possible to easily form a configuration that electrically insulates the wiring and the second electrode. In addition, according to the present invention, the conductive connection between the wiring and the second electrode is dielectric because the dielectric film does not exist in the conductive connection between the wiring and the second electrode conductively connected to the wiring. Inhibition by the body membrane can be almost completely prevented, and good contact can be obtained.

  In the present invention, it is preferable that the second electrode is conductively connected to the wiring in a region where the dielectric film does not exist.

  In the present invention, it is possible to adopt a configuration in which the second electrode is directly conductively connected to the wiring, and a configuration in which the second electrode is conductively connected to the wiring through a relay electrode.

  In the present invention, the wiring has a portion exposed from an edge of the dielectric film in a plan view (a portion exposed in a region where no dielectric film is present), and the second electrode includes the second electrode A configuration in which conductive connection is made to the wiring in the portion exposed from the dielectric film can be employed.

  In the present invention, in the dielectric film, a contact hole (a region where no dielectric film is present) from which the dielectric film is removed in the thickness direction is provided at a position overlapping the wiring in a plan view. The second electrode may be configured to be conductively connected to the wiring via the contact hole. Even in the case of adopting such a configuration, a dielectric film that electrically insulates the first electrode and the second electrode is used to electrically connect the wiring and the second electrode different from that connected to the wiring. Therefore, it is not necessary to provide a special structure for insulating the wiring. As a result, it is possible to easily form a configuration that electrically insulates the wiring and the second electrode.

  In the present invention, a contact hole (a region where no dielectric film is present) in which the dielectric film is removed in the thickness direction is provided at a position overlapping the second electrode in plan view in the dielectric film. The second electrode can be conductively connected to the wiring via the contact hole.

  In the present invention, the switching element includes, for example, a first conductive film, an insulating film provided on the first conductive film, and a second terminal switching having a second conductive film provided on the insulating film. It is an element. If comprised in this way, compared with the case where 3 terminal type switching elements, such as a TFT element, are used, it can manufacture easily with few processes and can aim at cost reduction. In this case, it is preferable that the wiring is formed in the same layer as one of the first conductive film and the second conductive film. With such a configuration, it is not necessary to add a new conductive film to form the wiring, so that the manufacturing can be performed with a small number of steps, and the cost can be reduced.

  In the present invention, the switching element includes a semiconductor layer having a source region conductively connected to the signal line, a channel region, and a drain region conductively connected to the first electrode, and a gate insulating layer with respect to the channel region. A configuration that is a three-terminal switching element having a gate electrode opposed to each other may be adopted. In this case, it is preferable that the wiring is formed in the same layer as one of the gate electrode and the signal line. With such a configuration, it is not necessary to add a new conductive film to form the wiring, so that the manufacturing can be performed with a small number of steps, and the cost can be reduced.

  In the present invention, a plurality of the signal lines extend in parallel in the same direction on the first substrate, and the first electrode includes the extending direction of the signal lines and the signal lines on the first substrate. A plurality of second electrodes extending in a direction intersecting with the extending direction of the signal line and overlapping the plurality of first electrodes in plan view. It is a strip electrode, and the strip electrode can adopt a configuration in which a plurality of strip electrodes are arranged in parallel at a predetermined interval in the extending direction of the signal line. When such a configuration is adopted, the second electrode can function as a common electrode common to the plurality of first electrodes.

  In this case, a display region is formed by a region in which a plurality of subpixels in which the first electrode and the second electrode overlap in a plan view are arranged, and the wiring is formed in a region outside the display region in a plan view. It is preferable. By adopting such a configuration, the plurality of first electrodes and the plurality of second electrodes can be efficiently arranged in a narrow region on the substrate.

  In the present invention, it is preferable that the wiring is formed on both sides of the outer area of the display area with the display area interposed therebetween. When such a configuration is adopted, the plurality of first electrodes and the plurality of second electrodes can be more efficiently arranged in a narrow region on the substrate.

  In the present invention, the wiring includes a first portion extending in a direction intersecting with an extending direction of the second electrode, and a first portion connected to the first portion and extending in a direction parallel to the second electrode. Preferably, the second electrode is conductively connected to the second portion.

  In the present invention, it is preferable that the second portion extends from the first portion to a side opposite to the side where the display area is located. According to this configuration, the dielectric film is formed only in the display area and the vicinity of the periphery of the display area, and the dielectric film is not present on the outer side, so that the wiring can be reliably exposed on the outer side. In this portion, the wiring and the second electrode can be reliably conductively connected.

  In the present invention, the second portion may be configured to extend from the first portion to the same side as the side where the display area is located.

  In the present invention, in the second portion, the width W1 in the direction perpendicular to the extending direction of the second portion is larger than the width W0 in the direction perpendicular to the extending direction of the first portion in the first portion. And wide is preferable. By adopting such a configuration, an area where the second electrode and the first portion of the wiring come into contact can be increased, so that the second electrode and the wiring can be more reliably conductively connected.

  In the present invention, the second electrode preferably has a plurality of linear electrode portions arranged in parallel with a gap in a region facing the first electrode. If comprised in this way, a fringe field can be formed efficiently.

  In this case, in the second electrode, it is preferable that the gap and the linear electrode portion are formed for each of the plurality of sub-pixels. If comprised in this way, since the area of a 2nd electrode can be ensured large, wiring resistance can be maintained low.

  In the present invention, in the second electrode, a configuration in which the gap and the linear electrode portion are continuously formed across a plurality of the sub-pixels can be employed. When such a configuration is adopted. Patterning of the gap and the linear electrode portion can be facilitated.

  In the present invention, each of the linear electrode portions of the second electrode can employ a configuration in which a part or all of the linear electrode portions overlaps the first electrode in plan view.

  In the present invention, the first electrode may be a planar electrode having no gap. If comprised in this way, all the individual linear electrode parts of a 2nd electrode will overlap with a 1st electrode in planar view, and can implement | achieve FFS mode.

  Here, the first electrode may be formed not by a planar electrode but by a gap and a linear electrode portion in the same manner as the second electrode. In this case, not all of the individual linear electrode portions of the second electrode but a part thereof may overlap the first electrode in plan view.

In the present invention, the first alignment film and the first polarizing layer provided on the first substrate, and the second alignment film and the second polarizing layer provided on the second substrate are further included. When the alignment film and the second alignment film are rubbed, and the angle formed by the rubbing direction and the extending direction of the linear electrode portion is α,
5 ° ≦ α ≦ 20 °
The extending direction of the polarization transmission axis of the first polarizing layer is parallel to the rubbing direction applied to the first alignment film, and the rubbing direction applied to the second alignment film is the first direction. It is preferable that the direction of the polarization transmission axis of the second polarizing layer is orthogonal to the direction of the polarization transmission axis of the first polarizing layer, which is antiparallel to the rubbing direction on the substrate side. By adopting such a configuration, it is possible to stabilize the alignment change of liquid crystal molecules when an on-voltage is applied in the FFS mode, and to reduce the threshold voltage at which the alignment change occurs, and to display a high contrast in the FFS mode. Can be realized.

  In the present invention, the liquid crystal layer is preferably formed using a nematic liquid crystal having positive dielectric anisotropy. A liquid crystal device in which the angle range in the rubbing direction is set to an angle α within the above angle range can use a liquid crystal having positive dielectric anisotropy in the liquid crystal layer. In realizing the FFS mode, a liquid crystal having a negative dielectric anisotropy can be used instead of a liquid crystal having a positive dielectric anisotropy. When the dielectric anisotropy is different between positive and negative, the rubbing direction is selected as an appropriate direction for each. In general, the proper rubbing direction differs by 90 ° between the two.

  A liquid crystal device to which the present invention is applied is used in an electronic device such as a mobile phone or a mobile computer. According to the liquid crystal device according to the present invention, a lateral electric field mode operation mode such as an FFS mode can be realized, and thus a wide viewing angle and high contrast display can be realized. In addition, since the second electrode and the wiring are insulated using a dielectric film that electrically insulates the first electrode and the second electrode, the wiring and the second electrode are electrically insulated. Can be easily formed. Accordingly, even in the electronic apparatus according to the present invention using the liquid crystal device to which the present invention is applied, high-quality display can be easily realized at low cost.

  Hereinafter, a liquid crystal device according to the present invention will be described based on embodiments. Of course, the present invention is not limited to this embodiment. Further, in the following description, the drawings will be referred to as necessary. In this drawing, in order to show the important components of the structure composed of a plurality of components in an easy-to-understand manner, May be indicated by dimensions.

[First Embodiment of Liquid Crystal Device]
FIG. 1 shows a planar structure of a liquid crystal device according to an embodiment of the present invention. FIG. 2 shows a cross-sectional structure along the row direction X of the liquid crystal device according to the ZB-ZB line of FIG. In FIG. 1, the horizontal direction is the row direction X, and the vertical direction is the column direction Y. In FIG. 2, the horizontal direction is the row direction X, and the vertical direction on the paper is the column direction Y. The row direction X and the column direction Y are directions orthogonal to each other. In the present embodiment, the row direction X is a short direction of a sub-pixel described later or a scanning line extending direction described later. On the other hand, the column direction Y is the longitudinal direction of the sub-pixel or the extending direction of the data line described later.

  In FIG. 2, the liquid crystal device 1 includes a liquid crystal panel 2 and an illumination device 3. The side indicated by the arrow A is the observation side, and the illumination device 3 is arranged on the side opposite to the observation side and acts as a backlight. The liquid crystal panel 2 includes an element substrate 4 and a color filter substrate 5 that face each other. These substrates are bonded together by an annular or frame-shaped sealing material 7 as viewed from the direction of arrow A (sometimes referred to as a substrate normal direction). In the present embodiment, the color filter substrate 5 is disposed on the observation side, and the element substrate 4 is disposed on the back side.

  A cell gap which is a predetermined gap (for example, about 5 μm) is formed between the element substrate 4 and the color filter substrate 5, and liquid crystal is sealed in the cell gap to form a liquid crystal layer 6. The liquid crystal layer is made of nematic liquid crystal having positive dielectric anisotropy. The liquid crystal having positive dielectric anisotropy has a property of rotating so that the major axis direction of liquid crystal molecules is parallel to the electric field direction when an electric field is applied.

  The element substrate 4 includes a first substrate 11 made of a light-transmitting material such as quartz glass or plastic. The first substrate 11 is formed in a rectangular shape that is long in the column direction Y as shown in FIG. The first substrate 11 may be square. In FIG. 2, the first polarizing plate 12 is provided on the outer surface of the first substrate 11. A retardation film may be provided between the first polarizing plate 12 and the first substrate 11 as necessary.

  On the inner surface (liquid crystal layer side) of the first substrate 11, a TFD element 13 that is a two-terminal switching element, a segment line 14 as a signal line conductively connected to the TFD element 13, and a first electrode Insular pixel electrodes 15 are provided. The TFD element 13 is formed as a so-called back-to-back structure (described in detail later) in which two TFD elements are connected in series with opposite polarities. The segment line 14 is made of Cr (chromium) or a Cr alloy, and is formed by, for example, a photoetching process. A plurality of segment lines 14 are formed. As shown in FIG. 1, each segment line 14 is a thin line extending in the column direction Y, and a plurality of the segment lines 14 are formed in parallel in the row direction X at predetermined intervals. The segment line 14 transmits a data signal which is one signal for driving the liquid crystal, for example. A plurality of TFD elements 13 connected to one segment line 14 are provided at intervals along the segment line 14.

  In FIG. 2, a pixel electrode 15 is made of a light-transmitting metal oxide such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), etc. Is formed by. A plurality of pixel electrodes 15 are formed. As shown in FIG. 1, each pixel electrode 15 has a rectangular island shape that is long in the column direction Y as viewed from the substrate normal direction. Are arranged in a row (in a so-called dot matrix).

  In FIG. 2, a plurality of wirings 17 as common lines are provided in lateral regions on both sides of the first substrate 11. These wirings 17 are so-called lead wirings. These wirings 17 are formed by laminating the ITO wiring as the second layer on the Cr wiring as the first layer. These wirings 17 are formed by, for example, a photoetching process. For example, the wiring 17 transmits a scanning signal which is another signal for driving the liquid crystal. Note that the wiring 17 can also be formed of a single layer of Cr or other conductive metal.

  As shown in FIG. 1, the wiring 17 has a portion 17 a extending linearly with a different length in the column direction Y, and a portion 17 b extending linearly with a different length in the row direction X. Details of the wiring 17 will be described later.

  In FIG. 2, a dielectric film 16 is provided so as to cover the TFD element 13, the segment line 14, the pixel electrode 15, and the wiring 17. The dielectric film 16 is made of, for example, a nitride film such as SiNx (silicon nitride) or SiO2 (silicon oxide), an oxide film, or other organic transparent resin. The nitride film and the oxide film are inorganic films. As shown in FIG. 1, the dielectric film 16 is formed in a rectangular shape covering all the pixel electrodes 15 by photoetching.

  In FIG. 2, a common electrode 18 as a second electrode is formed on the dielectric film 16. The common electrode is a common electrode provided across a plurality of subpixels. The common electrode 18 is made of a light-transmitting metal oxide such as ITO or IZO, and is formed by, for example, a photoetching process. A plurality of common electrodes 18 are formed as shown in FIG. 1, and each of them has a strip shape extending in the row direction X. A plurality of the common electrodes 18 are formed in parallel to each other at intervals in the column direction Y. The plurality of common electrodes 18 are formed so as to protrude alternately left and right one by one. The end of the protruding common electrode 18 is conductively connected to the wiring 17. Details of the connection structure between the common electrode 18 and the wiring 17 will be described later.

  The plurality of pixel electrodes 15 each formed in an island shape are arranged side by side in the row direction X and the column direction Y, and are arranged in a so-called dot matrix shape. On the other hand, the strip-shaped common electrode 18 extending in the row direction X overlaps with the plurality of pixel electrodes 15 arranged in the row direction X in plan view. Similar to the plurality of pixel electrodes 15, dot-like regions, ie, island-like regions, in which the pixel electrodes 15 and the common electrode 18 overlap in a plan view are arranged in a dot matrix. These individual island-like regions constitute sub-pixels P which are liquid crystal driving control units. A display region V is constituted by a plurality of sub-pixels P arranged in a dot matrix.

  In order to realize the FFS mode, the common electrode 18 includes a plurality of slits 27 as gaps and a plurality of linear electrode portions 28 formed between the slits 27 corresponding to each subpixel P. Is formed. Details of the slits 27 and the linear electrode portions 28 will be described later.

  In the liquid crystal device of the present embodiment, for example, when color display is performed using three colors of R (red), G (green), and B (blue), each of the three colors is displayed on each sub-pixel P. Each color is assigned, and one display pixel is constituted by three sub-pixels P corresponding to R, G, and B, and the display pixels are gathered in a dot matrix to constitute a display region V. When color display is performed with four colors by adding another color (for example, blue-green) to the three colors R, G, and B, one display pixel is constituted by four sub-pixels P. Further, in the case of performing display with two colors of black and white or any other two colors, each sub pixel P becomes one display pixel as it is.

  In FIG. 2, a first alignment film 19 is provided on the first substrate 11 so as to cover the common electrode 18 and the dielectric film 16. In FIG. 1, the first alignment film 19 is not shown. The first alignment film 19 in FIG. 2 is made of polyimide, for example, and is formed in a predetermined shape by, for example, a printing method or a transfer method. The first alignment film 19 is subjected to a rubbing process for aligning the liquid crystal molecules in the liquid crystal layer 6 in a desired direction.

  Next, the color filter substrate 5 facing the element substrate 4 has a second substrate 22 formed of a light-transmitting material such as quartz glass or plastic. The second substrate 22 is formed in a rectangular shape that is long in the column direction Y as shown by a chain line in FIG. The second substrate 22 may be square. The length of the second substrate 22 along the column direction Y is shorter than that of the first substrate 11, and the first substrate 11 protrudes outside the second substrate 22 at one end portion. A driving IC 21 is mounted on the projecting portion of the first substrate 11 by a COG (Chip On Glass) technique using an ACF (Anisotropic Conductive Film). The segment line 14 and the wiring 17 provided on the first substrate 11 are conductively connected to the output terminal of the driving IC 21. For example, the driving IC 21 supplies a data signal to the segment line 14 and supplies a scanning signal to the wiring 17. In the present embodiment, three drive ICs 21 are provided, and signals are supplied to the segment lines 14 and the wirings 17 by separate drive ICs 21. Instead of this configuration, a single driving IC 21 can supply signals to both the segment line 14 and the wiring 17.

  Note that the three edges of the first substrate 11 and the second substrate 12 other than the overhanging portions are shown in FIG. 1 in a state where they are shifted from each other for easy understanding of the structure. The three side edges are substantially coincident and overlap in a plan view.

  In FIG. 2, a second polarizing plate 23 is provided on the outer surface of the second substrate 22. If necessary, a retardation film for viewing angle compensation or other purposes may be provided between the second polarizing plate 23 and the second substrate 22. A colored film 24 constituting a color filter is provided on the inner surface (liquid crystal layer side) of the second substrate 22, and a light shielding film 25 is provided around them. The R, G, and B symbols attached to the colored film 24 in parentheses indicate that the colored films have characteristics of transmitting R (red), G (green), and B (blue) colors. Yes. In this embodiment, a stripe arrangement is adopted as an arrangement form of the colored films, different colors of R, G, and B are alternately arranged along the row direction X, and the same colors of R, G, and B are arranged in the column direction Y. It is out. However, the color arrangement form of the colored film 24 may be any other arrangement, for example, a mosaic arrangement or a delta arrangement.

  The colored film 24 is made of, for example, a resin material obtained by mixing a pigment or a dye with a photosensitive resin, and is formed in a predetermined array pattern by, for example, photolithography. The light shielding film 25 is formed by overlapping two or three colors of a light shielding resin material, a light shielding metal material, or colored films 24 of different colors.

  An overcoat layer 29 is provided on the coloring film 24 and the light shielding film 25. The overcoat layer 29 is used for flattening the colored film 24 and protecting the liquid crystal layer 6. The overcoat layer 29 is formed by printing an inorganic film such as an acrylic organic resin film or a silicon oxide film. A second alignment film 30 is provided on the overcoat layer 29. The second alignment film 30 is made of, for example, polyimide, and is formed in a predetermined shape by, for example, a printing method or a transfer method. The second alignment film 30 is subjected to a rubbing process for aligning the liquid crystal molecules in the liquid crystal layer 6 in a desired direction.

  The direction of rubbing performed on the first alignment film 19 on the element substrate 4 and the direction of rubbing performed on the second alignment film 30 on the color filter substrate 5 are in an antiparallel relationship. The liquid crystal layer 6 is aligned in a homogeneous alignment by these alignment films having alignment by rubbing. As is well known, the homogeneous alignment is a substantially parallel alignment with a pretilt with respect to the substrate.

  Next, the configuration of one subpixel P and its periphery will be described with reference to FIGS. FIG. 3A shows a planar structure at a stage before the dielectric film 16 is formed on the first substrate 11 in the element substrate 4 of FIG. FIG. 3B shows a planar structure at the stage where the strip-shaped common electrode 18 is formed on the first substrate 11. FIG. 4A shows an enlarged view of the TFD element shown in FIG. FIG. 4B shows a cross-sectional structure according to the ZD-ZD line in FIG.

  In FIG. 3A, a TFD element 13 which is a thin film diode as a switching element is provided at the corner of each sub-pixel P. The TFD element 13 is formed in a so-called back-to-back structure in which two TFD elements 13a and 13b are connected in series as shown in FIG. Of course, the TFD element 13 can also be formed by one TFD element instead of a back-to-back structure. As shown in FIG. 4B, the individual TFD elements 13a and 13b include a first conductive film 32 formed on the first substrate 11, an insulating film 33 formed on the first conductive film 32, The second conductive films 34 a and 34 b are formed on the insulating film 33.

  The first conductive film 32 is made of, for example, Ta (tantalum) or a Ta alloy, and is formed in an island shape by, for example, a photoetching process. The insulating film 33 is formed as TaOx (tantalum oxide) by, for example, anodizing. The second conductive films 34a and 34b are formed at the same time when the segment line 14 is formed by, for example, Cr by photoetching. The first TFD element 13a and the second TFD element 13b are electrically reverse diode elements, and by connecting them in series, a stable voltage-current characteristic can be obtained. The second conductive film 34a that is an input terminal of the first TFD element 13a extends integrally from the segment line 14. The second conductive film 34b, which is the output terminal of the second TFD element 13b, is conductively connected to the pixel electrode 15. The pixel electrode 15 is formed in a planar shape within the region of the sub-pixel P.

In FIG. 3B, the strip-shaped common electrode 18 formed over the pixel electrode 15 is formed between a plurality of slits 27 as gaps corresponding to the individual subpixels P and between these slits 27. The plurality of linear electrode portions 28 are provided. The plurality of slits 27 and the plurality of linear electrode portions 28 are formed in parallel to each other. An angle β formed by the extending direction of the slit 27 (and hence the extending direction of the linear electrode portion 28) and the short direction (row direction X) of the sub-pixel P is, for example, 5 ° ≦ β ≦ 20 °
Can be set to an angle within the range.

  FIG. 5 shows a cross-sectional structure according to the ZE line in FIG. In FIG. 5, since the pixel electrode 15 is formed as a planar electrode, the entire width of the linear electrode portion 28 of the common electrode 18 overlaps the pixel electrode 15 in plan view. Capacitance is formed in the dielectric film 16 where the linear electrode portion 28 and the pixel electrode 15 overlap in plan view. When a voltage equal to or higher than the threshold voltage is applied between the pixel electrode 15 and the common electrode 18, the TFD element 13 is turned on, and an electric field is generated between the pixel electrode 15 and the linear electrode portion 28 of the common electrode 18. E is formed. When the electric field E is generated, the liquid crystal molecules 6a of the liquid crystal having positive dielectric anisotropy forming the liquid crystal layer 6 are swung in a plane parallel to the substrate so that the major axis is parallel to the electric field direction. Change. Due to the rotational movement of the liquid crystal molecules 6a, the polarized light passing through the liquid crystal layer 6 is modulated. Since the alignment control of the liquid crystal molecules 6a in the present embodiment is performed in a plane parallel to the substrate as described above, it has a wider viewing angle and higher contrast than the alignment control in the substrate vertical direction such as the TN mode. Display can be made.

  In addition to the FFS mode, an IPS (In-Plain Switching) mode is known as the transverse electric field mode. In the case of the IPS mode, in FIG. 5, the pixel electrode 15 is not a planar electrode but is formed as a linear electrode or a frame electrode similar to the common electrode 18. The linear electrode portion 28 of the common electrode 18 does not overlap with the pixel electrode 15 in plan view, and the linear electrode portion 28 of the common electrode 18 and the linear electrode portion or the frame electrode portion of the pixel electrode 15 are not overlapped. The structure is such that a large interval is formed in plan view. Due to this configuration, in the case of the IPS mode, a horizontal electric field can be generated between the pixel electrode and the common electrode, but an electric field having a sufficient strength cannot be formed in a region immediately above the common electrode. . On the other hand, in the case of the FFS mode, the linear electrode portion 28 of the common electrode 18 overlaps the pixel electrode 15 in plan view, so that an electric field having a sufficient strength is formed also in the region immediately above the linear electrode portion 28. This area can be fully utilized as a display area. For this reason, according to the FFS mode of the present embodiment, it is possible to obtain a wider viewing angle, a higher contrast, and a higher transmittance as compared with the case of the IPS mode.

  Next, the optical axis relationship between the first polarizing plate 12 and the first alignment film 19 on the element substrate 4 in FIG. 2 and the second polarizing plate 23 and the second alignment film 30 on the color filter substrate 5 is shown in FIG. This will be explained based on. In FIG. 6A, the arrow indicated by reference numeral R1 indicates the direction of rubbing performed on the first alignment film 19 (see FIG. 2) on the element substrate 4 side. The rubbing direction R1 is set in parallel to the short direction (row direction X) of the sub-pixel P.

The angle α formed between the extending direction of the slit 27 formed in the common electrode 18 on the element substrate 4 (therefore, the extending direction of the linear electrode portion 28) and the rubbing direction R1 is, for example, 5 ° ≦ α ≦ 20 °
Can be set to any angle within the range. In FIG. 3B, an angle β formed between the extending direction of the slit 27 and the short direction (row direction X) of the sub-pixel P is, for example, 5 ° ≦ β ≦ 20 °.
As described above, the angle β formed by the slit 27 with respect to the short direction (row direction X) of the sub-pixel P is equal to the angle α formed by the rubbing direction R1 with respect to the slit 27. The rubbing direction R1 is the same direction as the short direction of the sub-pixel P. If α ≠ β, the rubbing direction R1 is shifted from the short direction of the sub-pixel P.

  If the angle α formed by the rubbing direction R1 with respect to the slit 27 is set to 5 ° ≦ α ≦ 20 °, the alignment change of the liquid crystal molecules when the on-voltage is applied in the FFS mode can be stabilized. The generated threshold voltage can be reduced.

  FIG. 7 schematically shows the relationship between the transmission axis of the polarizing plate and the rubbing direction. As shown in FIG. 7, the rubbing direction performed on the second alignment film 30 (see FIG. 2) on the color filter substrate 5 facing the element substrate 4 is the element substrate 4 side as indicated by reference numeral R2. It is antiparallel to the rubbing direction R1. The polarization transmission axis 212 of the first polarizing plate 12 on the element substrate 4 side is parallel to the rubbing direction R1 on the element substrate 4 side, and the polarization transmission axis 223 of the second polarizing plate 23 on the color filter substrate 5 side is the element substrate. It is orthogonal to the polarization transmission axis 212 on the four side. By setting the optical axis relationship as described above, switching between white display and black display in the FFS mode can be realized stably.

  FIG. 6A shows a black display state in which an off voltage, which is a voltage equal to or lower than the threshold voltage of the TFD element, is applied between the pixel electrode 15 and the common electrode 18. When this off voltage is applied, the liquid crystal molecules 6a are in an initial alignment state in which the major axis is parallel to the rubbing direction R1. When an ON voltage that is equal to or higher than the threshold voltage of the TFD element is applied between the pixel electrode 15 and the common electrode 18 to achieve a white display state, the extending direction of the slit 27 ( Accordingly, an electric field parallel to the substrate, that is, a so-called lateral electric field is generated in a direction perpendicular to the extending direction of the linear electrode portion 28. In this embodiment, since the linear electrode portion 28 of the common electrode 18 and the pixel electrode 15 are in a positional relationship overlapping in plan view, the boundary portion between the slit 27 and the linear electrode portion 28 is relative to the substrate. Thus, a vertical electric field (a so-called lateral oblique electric field, a parabolic electric field or the like) is generated. Such a region where an electric field in the direction perpendicular to the substrate is generated is called a so-called fringe field. The orientation of the liquid crystal molecules 6a of the liquid crystal having positive dielectric anisotropy changes by rotating in a plane parallel to the substrate so that the major axis thereof is in the same direction as the electric field direction.

  According to the liquid crystal device of the present embodiment described above, the planar light supplied from the illumination device 3 to the liquid crystal panel 2 in FIG. 2 is supplied to the liquid crystal layer 6 while being polarized by the first polarizing plate 12. The Then, the liquid crystal molecules 6a in the liquid crystal layer 6 (see FIG. 6) are controlled by controlling the voltage applied to the liquid crystal layer 6 in FIG. 2 for each sub-pixel P by the scanning signal and the data signal from the driving IC 21 in FIG. ) Is controlled for each sub-pixel P, and the light from the illumination device 3 passing through the liquid crystal layer 6 is modulated for each sub-pixel P. The light thus modulated is supplied to the second polarizing plate 23, and an image is displayed in the display region V of FIG. 1 by the polarized light that has passed through the polarizing plate without being absorbed by the second polarizing plate 23. In this way, transmissive display is performed.

  As shown in FIG. 2, the liquid crystal device of the present embodiment configured as described above has a lateral electric field type in which both the pixel electrode 15 and the common electrode 18 are provided on the element substrate 4 which is a single substrate. Therefore, the orientation of liquid crystal molecules is controlled in a plane parallel to the substrate. Therefore, according to the liquid crystal device of the present embodiment, display with a wide viewing angle and high contrast can be realized as compared with a vertical electric field type liquid crystal device typified by a TN type.

  Further, as shown in FIGS. 3A and 3B, the liquid crystal device according to the present embodiment is an FFS mode liquid crystal having a structure in which the linear electrode portion 28 of the common electrode 18 overlaps the pixel electrode 15 in plan view. Since it is a device, a sufficient electric field can be formed also in the region immediately above the linear electrode portion 28. For this reason, compared with the IPS mode in which a sufficient electric field cannot be formed in the region immediately above the linear electrode portion 28, the liquid crystal device of this embodiment has a wider viewing angle and a higher transmittance. realizable.

  According to the liquid crystal device 1 of the present embodiment, an FFS mode operation mode can be realized using the TFD element 13 as a switching element. Conventionally, a liquid crystal device using a three-terminal switching element typified by a TFT element as a switching element is known. However, a liquid crystal device using a three-terminal switching element has a complicated configuration, and requires a lot of man-hours for manufacturing the liquid crystal device. Cost is inevitable. On the other hand, the liquid crystal device 1 of this embodiment using a TFD element as a switching element can be easily manufactured at a low cost with a small number of man-hours.

  As described above, although the liquid crystal device 1 of the present embodiment can be easily manufactured at low cost, the operation mode is the FFS mode (that is, the alignment of liquid crystal molecules is controlled by an electric field parallel to the substrate, that is, a so-called lateral electric field). Mode), display with a wider viewing angle and higher contrast can be realized as compared to the vertical electric field mode represented by the TN mode.

  Next, the configuration of the dielectric film 16, the wiring 17, and the common electrode 18 on the first substrate 11 shown in FIG. 1 will be described in detail.

  First, the configuration of the wiring 17 will be described. Each wiring 17 is provided with a linear portion 17a as a first portion extending linearly in a direction (column direction Y) intersecting with the common electrode 18 in plan view, and bent substantially at a right angle from the linear portion 17a. It has the common electrode 18 and the planar part 17b as a 2nd part extended in a parallel direction by planar view. The end of the linear portion 17a outside the sealing material 7 is conductively connected to an output terminal (not shown) of the driving IC 21 by an adhesive such as ACF. The linear portion 17 a is provided between the driving IC 21 and each common electrode 18. The linear portion 17a is disposed in a region outside the display region V (a so-called frame region). The linear portion 17 a is a lead wiring for connecting the driving IC 21 and the common electrode 18.

  On the other hand, the planar portion 17b is a portion that extends in the row direction X toward the opposite side of the display region V across the linear portion 17a. That is, it is a portion extending from the linear portion 17 a toward the end side 11 b or 11 c of the substrate 11. Each planar portion 17b is disposed at a position where it overlaps the common electrode 18 in plan view. The planar portion 17 b is a portion that is conductively connected to the common electrode 18. One or both of the linear portion 17a and the planar portion 17b can be formed in a single layer with Cr alone, Cr alloy, Al (aluminum) alone, Al alloy, or other conductive metal material. Further, ITO, IZO, or other metal oxide may be laminated thereon.

  In the present embodiment, the planar portion 17b of the wiring 17 is formed thicker than the linear portion 17a. That is, the width W1 of the planar portion 17b in the direction orthogonal to the extending direction of the planar portion 17b (column direction Y) is the line in the direction orthogonal to the extending direction of the linear portion 17a (row direction X). The portion 17a is formed larger than the width W0 (W0 <W1). The planar portion 17b is a portion that is conductively connected to the common electrode 18, and the contact area with the common electrode 18 can be increased by increasing the width W1 of the planar portion 17b. As a result, the wiring 17 and the common electrode 18 can be reliably brought into contact with each other. On the other hand, the linear portion 17a is a wiring routed to the outside area of the display area V. By reducing the width W0 of the linear portion 17a, the outer region can be narrowed, so that the liquid crystal panel 2 can be formed small and contribute to downsizing of the liquid crystal device. In addition, the display region V can be formed large, which can contribute to an increase in the screen of the liquid crystal device.

  Next, the mutual structure of the dielectric film 16, the wiring 17, and the common electrode 18 will be described. A dielectric film 16 is provided on the plurality of wirings 17 as shown in FIG. That is, the wiring 17 is covered with the dielectric film 16. The dielectric film 16 is a film provided between the pixel electrode 15 and the common electrode 18 to electrically insulate the electrodes 15 and 18 from each other. By extending the dielectric film 16 over the wiring 17, the wiring 17 is covered. Since the dielectric film 16 extends to the middle of the planar portion 17b in the row direction X, there is a region where the dielectric film 16 does not exist. Therefore, in the region where the dielectric film 16 does not exist, a part of the planar portion 17 b is exposed from the end side of the dielectric film 16.

  As shown in FIG. 1, the dielectric film 16 is formed in a region inside the sealing material 7, and a portion of the linear portion 17 a that extends outside the sealing material 7 (that is, the first substrate 11). The portion extending on the overhanging portion) is exposed from the dielectric film 16.

  The common electrode 18 formed in a strip shape in the row direction X on the dielectric film 16 extends outward from the end side of the dielectric film 16 in a portion that overlaps the planar portion 17b in plan view. That is, the common electrode 18 is led out from the dielectric film 16 toward a region where the dielectric film 16 is not formed. As shown in FIG. 2, the extended portion of the common electrode 18 is formed on the planar portion 17b of the wiring 17 exposed from the edge of the dielectric film 16 in the region where the dielectric film 16 is not formed. On and touch. Thereby, the common electrode 18 and the wiring 17 are conductively connected.

  In an FFS mode liquid crystal device using a TFD element, as shown in FIG. 1, a plurality of common electrodes 18 and a plurality of wirings 17 conductively connected to the common electrodes 18 are disposed on the same substrate 11. Yes. In this configuration, there is a portion (for example, a portion indicated by hatching in FIG. 1) where the linear portion 17a extending in the column direction Y and the common electrode 18 extending in the row direction X overlap in plan view. This portion is a portion where a plurality of wirings 17 and a plurality of common electrodes 18 that are not conductively connected to each other intersect each other, and need to be electrically insulated.

  In the present embodiment, as shown in FIG. 2, the wiring 17 is covered with a dielectric film 16 that electrically insulates the pixel electrode 15 and the common electrode 18. Accordingly, since the dielectric film 16 can be used to electrically insulate the wiring 17 from the common electrode 18 different from that connected to the wiring 17, the structure for insulating the wiring 17 is special. There is no need to provide it. As a result, a configuration that electrically insulates the wiring 17 from the common electrode 18 can be easily formed.

  In addition, a part of the planar portion 17b of the wiring 17 is exposed from the end side of the dielectric film 16, and the common electrode 18 is placed on and contacts the exposed portion. In this way, the planar portion 17b and the common electrode 18 can be reliably in contact with each other outside the dielectric film 16, so that the wiring 17 and the common electrode 18 can be securely connected without any dielectric film interposed therebetween. Conductive connection is possible.

[Second Embodiment of Liquid Crystal Device]
Next, a second embodiment of the liquid crystal device according to the present invention will be described. FIG. 8 is a diagram showing a second embodiment of the liquid crystal device according to the present invention, and is a plan view seen from the observation side of the liquid crystal device. FIG. 9 is a diagram showing a cross-sectional structure according to the ZI-ZI line of FIG. 8 and 9, the same components as those of the liquid crystal device 1 shown in FIGS. 1 and 2 are denoted by the same reference numerals, and description thereof is omitted.

  In the liquid crystal device 1 according to the first embodiment shown in FIG. 1, on the first substrate 11 that is a component of the element substrate 4, the wiring 17 that is a wiring is covered with the dielectric film 16, and a part of the wiring 17 is covered. The dielectric film 16 is exposed from the end side and is electrically connected to the strip-shaped common electrode 18 as the second electrode in the exposed portion. In contrast, in this embodiment, the connection structure between the common electrode and the common line is modified.

  In FIG. 8, the dielectric film 16 covers all the pixel electrodes 15 and all the wirings 17 as in the embodiment shown in FIG. The embodiment of FIG. 8 differs from the embodiment of FIG. 1 in that part of the planar portion 17b is exposed from the edge of the dielectric film 16 in FIG. That is, the entire portion 17 b is covered with the dielectric film 16.

  Contact holes 46 (regions where no dielectric film is present) are formed in portions that overlap each planar portion 17a of the dielectric film 16 in plan view. As shown in FIG. 9, the contact hole 46 is a hole penetrating in the thickness direction of the dielectric film 16 (vertical direction in the figure). Accordingly, the surface of the planar portion 17 b is exposed from the dielectric film 16 in the contact hole 46. The contact hole 46 shown in FIG. 8 has a rectangular planar shape, but may be a circular shape instead.

  Thus, the common electrode 18 is formed on the dielectric film 16 in which the contact hole 46 is formed. The common electrode 18 is formed in a strip shape in the row direction X, and an end thereof overlaps the planar portion 17b in plan view. As shown in FIG. 9, the common electrode 18 is also formed inside the contact hole 46, and is placed on and contacted with the planar portion 17 b of the wiring 17 at the bottom of the contact hole 46. It is connected.

  Also in the present embodiment, as shown in FIG. 8, the wiring film 17 is covered with the dielectric film 16 that electrically insulates the pixel electrode 15 and the common electrode 18, so that the dielectric film 16 is used. The wiring 17 and the common electrode 18 different from that connected to the wiring 17 can be electrically insulated. Specifically, the dielectric film 16 can insulate the portion where the linear portion 17 a of the wiring 17 and the common electrode 18 overlap in a plane (shaded portion in the drawing). Therefore, it is not necessary to provide a special structure for insulating the wiring 17. As a result, a configuration that electrically insulates the wiring 17 from the common electrode 18 can be easily formed.

  Further, a contact hole 46 is formed in the portion of the dielectric film 16 that overlaps the planar portion 17 b of the wiring 17 in plan view, and the common electrode 18 and the planar portion 17 b of the wiring 17 are conductively connected through the contact hole 46. It was set as the structure to do. By doing so, the planar portion 17b and the common electrode 18 can be in contact with each other in the contact hole 46 while insulating the portion where the linear portion 17a of the wiring 17 and the common electrode 18 overlap in a plane (shaded portion in the figure). The wiring 17 and the common electrode 18 can be reliably conductively connected.

  A contact hole provided for conducting a conductive connection in a liquid crystal device is generally formed with a width smaller than the width of the planar portion. However, in the present embodiment, the contact hole 46 is formed to be as large as possible so as to be as close to the width W1 as possible, which is substantially the same as the width W1 in the direction orthogonal to the extending direction of the planar portion 17b (column direction Y). ing. Further, the width of the contact hole 46 can be exactly the same as the width W1 of the planar portion 17b, or in some cases, can be wider than the width W1. In any case, since the area where the common electrode 18 and the planar portion 17b come into contact with each other can be increased, the contactability between them can be improved. The contact hole 46 can also be formed with a width smaller than the width W1 of the planar portion 17b to the extent that the contact between the common electrode 18 and the planar portion 17b is not hindered.

[Third Embodiment of Liquid Crystal Device]
In the first and second embodiments described above, a two-terminal element is used as a switching element. In the third embodiment described below, an example in which a thin film transistor (three-terminal element) is used as a switching element will be described. . In addition, since the basic structure of this form is the same as that of 1st Embodiment, it attaches | subjects and demonstrates the same code | symbol to a common part as much as possible. In addition, when the direction of the current flowing through the thin film transistor is reversed, the source and the drain are interchanged. In the following description, for convenience, the side to which the pixel electrode is connected is referred to as the drain, and the side to which the data line is connected is the source. Will be described.

(overall structure)
FIG. 10 is an equivalent circuit diagram showing an electrical configuration of the display region V of the element substrate 4 used in the liquid crystal device 1 to which the present invention is applied. As shown in FIG. 10, a plurality of subpixels P are formed in a matrix in the display region V of the liquid crystal device 1. In each of the plurality of subpixels P, a pixel electrode 15 as a first electrode and a pixel switching thin film transistor 80 for controlling the pixel electrode 15 are formed, and data signals (image signals) are line-sequentially transmitted. The supplied data line 8 a is conductively connected to the source of the thin film transistor 80. A scanning line 9 a is conductively connected to the gate of the thin film transistor 80. The pixel electrode 15 is conductively connected to the drain of the thin film transistor 80, and the data signal supplied from the data line 8a is written to each subpixel P at a predetermined timing by turning on the thin film transistor 80 for a certain period. . Thus, the pixel signal of a predetermined level written in the liquid crystal 6 through the pixel electrode 15 is held for a certain period with the common electrode 18 as the second electrode formed on the element substrate 4. Here, a storage capacitor 60 is formed between the pixel electrode 15 and the common electrode 18, and the voltage of the pixel electrode 15 is held for a time that is, for example, three orders of magnitude longer than the time when the source voltage is applied. The Thereby, the charge retention characteristic is improved, and the liquid crystal device 1 capable of performing display with a high contrast ratio can be realized.

(Detailed configuration of each pixel)
FIG. 11 is a plan view showing a plurality of sub-pixels extracted from the element substrate used in the liquid crystal device 1 to which the present invention is applied. 12A and 12B are a cross-sectional view of one subpixel of the liquid crystal device of the present embodiment and a cross-sectional view illustrating a structure of a connection portion between the common electrode and the wiring. 12A corresponds to a cross-sectional view when the liquid crystal device is cut at a position corresponding to the line AA ′ in FIG. 11, and FIG. 12B corresponds to the line BB ′ in FIG. This corresponds to a cross-sectional view when the liquid crystal device is cut at a position where the liquid crystal device is cut.

  As shown in FIGS. 11 and 12A, a plurality of transparent pixel electrodes 15 (first electrodes) made of an ITO film in a matrix are formed on the element substrate 4 for each sub-pixel P. Data lines 8a and scanning lines 9a are formed along the vertical and horizontal boundary regions of the electrodes 15. The pixel electrode 15 is a planar electrode having no gap.

A strip-shaped common electrode 18 made of an ITO film extending in the extending direction of the scanning line 9a is formed in the display region V of the element substrate 4, and the data line 8a extends in the common electrode 18. Multiple parallel in the direction. A plurality of slits 27 (gap) are formed in the common electrode 18, and a linear electrode portion 28 is formed between each of the plurality of slits 27. In this embodiment, the plurality of slits 27 and the linear electrode portions 28 extend obliquely with respect to the extending direction of the scanning line 9a, and the plurality of slits 27 and the linear electrode portions 28 extend in parallel to each other. ing. An angle β formed by the extending direction of the slit 27 (extending direction of the linear electrode portion 28) and the short direction of the sub-pixel P (row direction X) is, for example, 5 ° ≦ β ≦ 20 °.
Can be set to an angle within the range. The rubbing direction performed on the second alignment film 30 on the color filter substrate 5 facing the element substrate 4 is opposite to the rubbing direction performed on the first alignment film 19 on the element substrate 4 side. Parallel. Although not shown, the polarization transmission axis of the first polarizing plate on the element substrate 4 side is parallel to the rubbing direction with respect to the first alignment film 19 on the element substrate 4 side, and the second polarizing plate on the color filter substrate 5 side. Is perpendicular to the polarization transmission axis on the element substrate 4 side.

  The substrate of the element substrate 4 shown in FIG. 12A is composed of a first substrate 11 such as a quartz substrate or a heat resistant glass substrate, and the substrate of the color filter substrate 5 is a first substrate such as a quartz substrate or a heat resistant glass substrate. It consists of two substrates 22. In this embodiment, a glass substrate is used for both the first substrate 11 and the second substrate 22. In the color filter substrate 5, the color filter 24 and the overcoat layer 29 are formed on the second substrate 22.

  In the element substrate 4, a base protective film 11 a made of a silicon oxide film or the like is formed on the surface of the first substrate 11, and a thin film transistor 80 having a top gate structure is formed on the surface side so as to overlap with each pixel electrode 15. Is formed. As shown in FIGS. 11 and 12A, the thin film transistor 80 has a structure in which a channel region 84a, a source region 84b, and a drain region 84c are formed on an island-shaped semiconductor film 84. It may be formed to have an LDD (Lightly Doped Drain) structure with low concentration regions on both sides of 84a. In this embodiment, the semiconductor film 84 is a polysilicon film that is polycrystallized by laser annealing or lamp annealing after an amorphous silicon film is formed.

  A gate insulating film 81 made of a silicon oxide film, a silicon nitride film, or a laminated film thereof is formed on the semiconductor film 84, and the upper layer of the gate insulating film 81 is scanned so as to face the channel region 84a. A part of the line 9a overlaps as a gate electrode. In this embodiment, the gate electrode may have a twin gate structure formed in two places in the channel direction.

  Over the gate electrode (scanning line 9a), an interlayer insulating film 82 made of a silicon oxide film, a silicon nitride film, or a laminated film thereof is formed. A data line 8 a is formed on the surface of the interlayer insulating film 82, and the data line 8 a is conductively connected to the source region 84 b through a contact hole 47 a formed in the interlayer insulating film 82. A drain electrode 8b is formed on the surface of the interlayer insulating film 82, and the drain electrode 8b is a conductive film formed simultaneously with the data line 8a.

  An interlayer insulating film 83 is formed on the upper side of the data line 8a and the drain electrode 8b. In this embodiment, the interlayer insulating film 83 is formed as a planarizing film made of a thick photosensitive resin having a thickness of 1.5 to 2.0 μm.

  Pixel electrodes 15 made of an ITO film are formed in an island shape on the surface of the interlayer insulating film 83. The pixel electrode 15 is conductively connected to the drain electrode 8b through a contact hole 48 formed in the interlayer insulating film 83. The drain electrode 8b connects the contact hole 47b formed in the interlayer insulating film 82 and the gate insulating film 81. Through the drain region 84c.

  A dielectric film 16 is formed on the surface of the pixel electrode 15. In this embodiment, the dielectric film 16 is made of a silicon oxide film or a silicon nitride film having a thickness of 400 nm or less.

  A common electrode 18 made of an ITO film is formed on the dielectric film 16. The common electrode 18 functions as a counter electrode with respect to the pixel electrode 15, and can drive the liquid crystal layer 6 by an electric field formed between the pixel electrode 15 and the common electrode 18. The common electrode 18 faces the pixel electrode 15 with the dielectric film 16 therebetween, and a storage capacitor 60 is formed.

(Conductive connection structure between common electrode 18 and wiring)
In the liquid crystal device 1 of the present embodiment, the plurality of scanning lines 9 a are routed to the scanning line driving circuit (not shown) in the outer region of the display region V. In the outer region W, a plurality of wirings 17 that are conductively connected to the common electrode 18 are routed. In the example shown in FIG. 11 and FIG. 12B, the plurality of wirings 17 for the common electrode 18 are routed further outside in the outer region W of the display region V than the routing wire 9 e of the scanning line 9 a.

  The wiring 17 extends in a direction in which the common electrode 18 extends by being connected to the linear portion 17a and a linear portion 17a as a first portion extending in a direction intersecting the extending direction of the common electrode 18. It has a planar portion 17b as a second portion. In this embodiment, the planar portion 17b extends from the linear portion 17a on the same side as the side where the display region V is located. In the planar portion 17b, the width W1 in the direction orthogonal to the extending direction of the planar portion 17b is wider in the linear portion 17a than the width W0 in the direction orthogonal to the extending direction of the linear portion 17a. It has become.

  Here, the wiring 17 is a conductive film formed simultaneously with the scanning line 9 a and is formed between the gate insulating layer 81 and the interlayer insulating film 82.

  In the liquid crystal device 1 configured as described above, when the common electrode 18 and the wiring 17 are conductively connected, in this embodiment, in the interlayer insulating films 82 and 83 and the dielectric film 16, the contact hole 49 ( A region where no dielectric film is present is formed, and the wiring 17 is exposed at the bottom of the contact hole 49. Therefore, in this embodiment, the common electrode 18 is led out to a position overlapping the contact hole 49, and the common electrode 18 and the wiring 17 are conductively connected via the contact hole 49. At this time, the routing wiring 9e of the common electrode 18 and the scanning line 9a intersects, but between the common electrode 18 and the routing wiring 9e of the scanning line 9a, the interlayer insulating films 82 and 83 and the dielectric film 16 are provided. Will not cause a short circuit.

  Further, the common electrode 18 intersects the wiring 17 that is conductively connected to the other common electrode 18, but the interlayer insulating films 82 and 83 and the dielectric film 16 are interposed between the common electrode 18 and the wiring 17. No short circuit.

  As described above, according to this embodiment, since the dielectric film 19 is used for the insulation separation of the common electrode 18, it is not necessary to add an insulating film. In this embodiment, since the wiring 17 is connected to each of the plurality of common electrodes 18, a driving method for supplying different signals to the plurality of common electrodes 18 can be employed.

  Further, a structure in which a plurality of common electrodes 18 are conductively connected to the common wiring 17 can also be adopted. In this case as well, the conductive connection between the common electrode 18 and the wiring 17 is shown in FIG. 11 and FIG. The structure shown may be adopted.

  In the above description, for the sake of convenience, the example in which the conductive connection between the common electrode 18 and the wiring 17 is performed in only one of the outer regions W of the display region V has been described. Conductive connection between the common electrode 18 and the wiring 17 may be performed using both sides of the region V.

[Fourth Embodiment of Liquid Crystal Device]
FIGS. 13A and 13B are plan views showing a plurality of subpixels extracted from the element substrate used in the liquid crystal device 1 according to the fourth embodiment of the present invention, and a connection portion between the common electrode and the wiring. It is sectional drawing which shows this structure. Since the basic configuration of the present embodiment is the same as that of the third embodiment, common portions are denoted by the same reference numerals, and the configuration of the subpixel P is illustrated in FIG. Will be described with reference to FIG.

  As shown in FIGS. 13A and 13B, also in the liquid crystal device 1 of this embodiment, a plurality of wirings 17 that are conductively connected to the common electrode 18 are drawn in the outer region W, as in the third embodiment. It has been turned. In the example shown here, the plurality of wirings 17 for the common electrode 18 are routed further outside the lead-out wiring 9e of the scanning line 9a in the outer region W of the display region V. The wiring 17 extends in a direction in which the common electrode 18 extends by being connected to the linear portion 17a and a linear portion 17a as a first portion extending in a direction intersecting the extending direction of the common electrode 18. It has a planar portion 17b as a second portion. In this embodiment, the planar portion 17b extends from the linear portion 17a on the same side as the side where the display region V is located.

  Here, the wiring 17 is a conductive film formed simultaneously with the data 8 a described with reference to FIG. 12A, and is formed between the interlayer insulating film 82 and the interlayer insulating film 83.

  In the liquid crystal device 1 configured as described above, when the common electrode 18 and the wiring 17 are conductively connected, in this embodiment, a contact hole 49 is formed at a position overlapping the wiring 17 in the interlayer insulating film 83 and the dielectric film 16. The wiring 17 is exposed at the bottom of the contact hole 49. Therefore, in this embodiment, the common electrode 18 is led out to a position overlapping the contact hole 49, and the common electrode 18 and the wiring 17 are conductively connected via the contact hole 49. At this time, the routing wiring 9e of the common electrode 18 and the scanning line 9a intersects, but between the common electrode 18 and the routing wiring 9e of the scanning line 9a, the interlayer insulating films 82 and 83 and the dielectric film 16 are provided. Will not cause a short circuit. Further, the common electrode 18 intersects the wiring 17 that is conductively connected to the other common electrode 18, but the interlayer insulating films 82 and 83 and the dielectric film 16 are interposed between the common electrode 18 and the wiring 17. No short circuit. Therefore, according to this embodiment, since the dielectric film 19 is used for the insulation separation of the common electrode 18, it is not necessary to add an insulating film. In this embodiment, since the wiring 17 is connected to each of the plurality of common electrodes 18, a driving method for supplying different signals to the plurality of common electrodes 18 can be employed.

  Further, a structure in which a plurality of common electrodes 18 are conductively connected to the common wiring 17 can also be adopted. In this case as well, the conductive connection between the common electrode 18 and the wiring 17 is shown in FIG. 11 and FIG. The structure shown may be adopted. In the above description, for the sake of convenience, the example in which the conductive connection between the common electrode 18 and the wiring 17 is performed in only one of the outer regions W of the display region V has been described. Conductive connection between the common electrode 18 and the wiring 17 may be performed using both sides of the region V.

[Fifth Embodiment of Liquid Crystal Device]
14A and 14B are plan views showing a plurality of sub-pixels extracted from the element substrate used in the liquid crystal device 1 according to the fifth embodiment of the present invention, and a connection portion between the common electrode and the wiring. It is sectional drawing which shows this structure. Since the basic configuration of the present embodiment is the same as that of the third embodiment, common portions are denoted by the same reference numerals, and the configuration of the subpixel P is illustrated in FIG. Will be described with reference to FIG.

  As shown in FIGS. 14A and 14B, also in the liquid crystal device 1 of this embodiment, a plurality of wirings 17 conductively connected to the common electrode 18 are drawn in the outer region W, as in the third embodiment. It has been turned. However, in the example shown here, unlike the third embodiment, the plurality of wirings 17 for the common electrode 18 are routed on the inner side of the lead-out wiring 9e of the scanning line 9a in the outer region W of the display region V. . The wiring 17 extends in a direction in which the common electrode 18 extends by being connected to the linear portion 17a and a linear portion 17a as a first portion extending in a direction intersecting the extending direction of the common electrode 18. It has a planar portion 17b as a second portion. In this embodiment, the planar portion 17b extends from the linear portion 17a on the same side as the side where the display region V is located.

  Here, as in the fourth embodiment, the wiring 17 is a conductive film formed simultaneously with the data line 8a described with reference to FIG. 12A, and is an interlayer between the interlayer insulating film 82 and the interlayer insulating film 83. Is formed. Therefore, a contact hole 49 is formed in the interlayer insulating film 83 and the dielectric film 16 so as to overlap with the wiring 17, and the common electrode 18 and the wiring 17 are conductively connected via the contact hole 49. Yes. At this time, the routing wiring 9e of the common electrode 18 and the scanning line 9a intersects, but between the common electrode 18 and the routing wiring 9e of the scanning line 9a, the interlayer insulating films 82 and 83 and the dielectric film 16 are provided. Will not cause a short circuit. Further, the common electrode 18 intersects the wiring 17 that is conductively connected to the other common electrode 18, but the interlayer insulating films 82 and 83 and the dielectric film 16 are interposed between the common electrode 18 and the wiring 17. No short circuit. Therefore, according to this embodiment, since the dielectric film 19 is used for the insulation separation of the common electrode 18, it is not necessary to add an insulating film.

[Sixth Embodiment of Liquid Crystal Device]
FIG. 15 is a plan view showing a plurality of subpixels extracted from the element substrate used in the liquid crystal device 1 according to the sixth embodiment of the present invention. Since the basic configuration of this embodiment is the same as that of the third embodiment, common portions will be described with the same reference numerals.

  In the third embodiment and the like, the common electrode 18 and the wiring 17 are conductively connected using one rectangular contact hole 49 in plan view. However, for example, as shown in FIG. The common electrode 18 and the wiring 17 may be conductively connected by using a plurality of them.

[Seventh Embodiment of Liquid Crystal Device]
FIG. 16 is a cross-sectional view of the thin film transistor formed on the element substrate used in the liquid crystal device 1 according to the seventh embodiment of the present invention. In the third embodiment and the like, a polysilicon film is used as the semiconductor film 84, but an amorphous silicon film may be used as shown in FIG. In this case, a base protective film (not shown) made of a silicon oxide film or the like is formed on the surface of the first substrate 11 on the element substrate 4, and the scanning line 9 a and the gate insulating layer are formed on the surface side. 81, a semiconductor film 84 made of amorphous silicon, and a data line 8a are formed in this order. Further, the drain electrode 8b in the same layer as the data line 8a is partially overlapped with the semiconductor film 84, thereby forming a bottom gate thin film transistor 80. Over the data line 8a and the drain electrode 8b, an interlayer insulating film 82 made of a silicon nitride film and an interlayer insulating film 83 made of a photosensitive resin are formed. Pixel electrodes 15 made of an ITO film are formed in an island shape on the surface of the interlayer insulating film 83. The pixel electrode 15 is conductively connected to the drain electrode 8 b through a contact hole 48 formed in the interlayer insulating films 82 and 83. A dielectric film 16 is formed on the surface of the pixel electrode 15. In this embodiment, the dielectric film 16 is made of a silicon oxide film or a silicon nitride film having a thickness of 400 nm or less. A common electrode 18 made of an ITO film is formed on the dielectric film 16. The common electrode 18 functions as a counter electrode with respect to the pixel electrode 15, and can drive the liquid crystal layer 6 by an electric field formed between the pixel electrode 15 and the common electrode 18. The common electrode 18 is formed with slits 27 and linear electrode portions 28.

  Even in the liquid crystal device 1 having such a configuration, the common electrode 18 is conductively connected to the wiring in the outer region of the display region. As the wiring, a conductive film in the same layer as the scanning line 9a or the data line 8a can be used. In any case, a contact hole (dielectric layer 16 exists) that penetrates the dielectric layer 16 and the gate insulating layer 81. The common electrode 18 and the wiring can be conductively connected via a non-existing region.

[Eighth Embodiment of Liquid Crystal Device]
In the above embodiment, the common electrode 18 and the wiring 17 are directly conductively connected. However, a configuration in which the common electrode 18 is conductively connected to the wiring 17 via the relay electrode may be adopted. For example, in the structure shown in FIG. 12B, the relay electrode formed simultaneously with the data line and the common electrode 18 are conductively connected through a contact hole penetrating the interlayer insulating film 83 and the dielectric film 18, and scanned. The wiring 17 formed simultaneously with the line and the relay electrode may be conductively connected through a contact hole penetrating the interlayer insulating film 82 and the gate insulating layer 81. In this case, the contact hole for conductively connecting the relay electrode and the common electrode 18 (region where the dielectric layer 16 does not exist) and the contact hole for conductively connecting the relay electrode and the wiring overlap in plan view. Not limited to the configuration, it may be formed at a position shifted in plan view.

  In such a configuration, a contact hole in which the dielectric film is removed in the thickness direction is not formed at a position overlapping the wiring in plan view, but in the dielectric film, a position overlapping the common electrode in plan view is A contact hole from which the dielectric film is removed in the thickness direction is provided, and the common electrode is conductively connected to the wiring via the contact hole.

[Other Embodiments]
The present invention has been described with reference to the preferred embodiments. However, the present invention is not limited to the embodiments, and various modifications can be made within the scope of the invention described in the claims. For example, in each of the above embodiments, as shown in FIG. 1 or FIG. 8 and the like, the slit 27 and the linear electrode portion 28 are formed in the common electrode 18 that is a strip electrode, and the slit 27 and the linear electrode portion. 28 and the opposing pixel electrode 15 form an electric field parallel to the substrate and an oblique electric field formed in the fringe field region. Then, the slit 27 and the linear electrode portion 28 are formed for each region corresponding to each pixel electrode 15 (accordingly, a region corresponding to each sub-pixel P). However, instead of this configuration, the slit 27 and the linear electrode portion 28 can be formed continuously over the plurality of sub-pixels P.

  When the slit 27 and the linear electrode portion 28 are formed for each sub-pixel P, a large area of the common electrode 18 can be secured, so that the wiring resistance of the common electrode 18 can be kept low. On the other hand, when the slit 27 and the linear electrode portion 28 are continuously formed over the plurality of subpixels P, the patterning of the slit 27 and the linear electrode portion 28 can be facilitated.

  In the present embodiment, nematic liquid crystal having positive dielectric anisotropy is used as the liquid crystal forming the liquid crystal layer 6 shown in FIG. Instead of the nematic liquid crystal having positive dielectric anisotropy, nematic liquid crystal having negative dielectric anisotropy may be used. Regardless of which liquid crystal is used, appropriate initial alignment of liquid crystal molecules for the FFS mode can be obtained by appropriately selecting the rubbing direction. In general, the proper rubbing direction differs by 90 ° between the two.

[First Embodiment of Electronic Apparatus]
Next, an embodiment of an electronic device according to the present invention will be described. In addition, this embodiment shows an example of this invention and this invention is not limited to this embodiment. FIG. 17 shows an embodiment of an electronic apparatus according to the invention. The electronic device shown here includes a liquid crystal device 101 and a control circuit 102 that controls the liquid crystal device 101. The liquid crystal device 101 includes a liquid crystal panel 103 and a drive circuit 104. The control circuit 102 includes a display information output source 105, a display information processing circuit 106, a power supply circuit 107, and a timing generator 108.

  The display information output source 105 includes a memory such as a RAM (Random Access Memory), a storage unit such as various disks, a tuning circuit that tunes and outputs a digital image signal, and various clock signals generated by the timing generator 108. The display information processing circuit 106 is supplied with display information such as a predetermined format image signal.

  The display information processing circuit 106 includes a number of well-known circuits such as an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, a clamp circuit, and the like, executes processing of input display information, and converts an image signal into a clock signal CLK. At the same time, it is supplied to the drive circuit 104. Here, the drive circuit 104 is a generic term for an inspection circuit and the like together with a scanning line drive circuit and a data line drive circuit. The power supply circuit 107 supplies a predetermined power supply voltage to each of the above components.

  The liquid crystal device 101 can be configured using the liquid crystal device 1 described with reference to FIGS. According to the liquid crystal device 1, the FFS mode operation mode can be realized by using the TFD element 13 and the thin film transistor 80 as a switching element. If a TFD element is used as the switching element, the liquid crystal device 1 can be easily manufactured at a low cost with a small number of man-hours. In addition, since the common electrode 18 and the wiring 17 are insulated by using the dielectric film 16 between the pixel electrode 15 and the common electrode 18, the wiring 17 and the common electrode 18 are electrically insulated. Can be easily formed. Nevertheless, since the liquid crystal device 1 is an FFS mode liquid crystal device, it is possible to realize display with a wide viewing angle and high contrast that is suitable as a display device for electronic devices.

[Second Embodiment of Electronic Apparatus]
FIG. 18 shows a mobile phone which is another embodiment of the electronic apparatus according to the invention. A cellular phone 110 shown here includes a main body 111 and a display body 112 that can be opened and closed with respect to the main body 111. The display unit 112 is provided with a display device 113 and a receiver 114. Various displays relating to telephone communication are displayed on the display screen 115 of the display device 113. A control unit for controlling the operation of the display device 113 is stored inside the main body unit 111 or the display body unit 112 as a part of the control unit that controls the entire mobile phone or separately from the control unit. The The main body 111 is provided with an operation button 116 and a transmitter 117.

  The display device 113 can be configured using, for example, the liquid crystal device 1 described with reference to FIGS. According to the liquid crystal device 1, the FFS mode operation mode can be realized by using the TFD element 13 and the thin film transistor 80 as a switching element. If a TFD element is used as the switching element, the liquid crystal device 1 can be easily manufactured at a low cost with a small number of man-hours. In addition, since the common electrode 18 and the wiring 17 are insulated by using the dielectric film 16 between the pixel electrode 15 and the common electrode 18, the wiring 17 and the common electrode 18 are electrically insulated. Can be easily formed. Nevertheless, since the liquid crystal device 1 is an FFS mode liquid crystal device, it is possible to realize a display with a wide viewing angle and high contrast that is suitable as a display device for electronic devices.

  The electronic device of the present invention has been described with reference to the preferred embodiment. However, the present invention is not limited to the embodiment, and various modifications can be made within the scope of the invention described in the claims. For example, the present invention is not limited to a mobile phone, but a personal computer, a liquid crystal television, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, a pager, an electronic notebook, a calculator, a word processor, a workstation, a videophone device, The present invention can be applied to various electronic devices such as a POS terminal, a digital still camera, and an electronic book.

1 is a plan sectional view showing an embodiment of a liquid crystal device according to the present invention. FIG. 3 is a cross-sectional view along the row direction X of the liquid crystal device according to the ZB-ZB line of FIG. 1. 2A and 2B are plan views of a sub-pixel of the liquid crystal device of FIG. 1 and its vicinity, in which FIG. 1A shows a state before formation of a common electrode, and FIG. It is a figure which shows one Embodiment of a TFD element, (a) is a top view, (b) is sectional drawing. It is sectional drawing according to the ZE line | wire in FIG.3 (b). It is a top view which shows the orientation state of a liquid crystal molecule, (a) shows the initial orientation state at the time of off voltage application, (b) has shown the state at the time of on voltage application. It is a figure which shows typically the optical axis relationship of a rubbing direction and a polarization transmission axis. It is a plane sectional view showing other embodiments of a liquid crystal device concerning the present invention. It is sectional drawing along the row direction X of the liquid crystal device according to the ZI-ZI line of FIG. It is an equivalent circuit diagram which shows the electrical constitution of the display area of the element substrate used for the liquid crystal device which concerns on 3rd Embodiment of this invention. It is a top view which extracts and shows the several sub pixel of the element substrate used for the liquid crystal device which concerns on 3rd Embodiment of this invention. (A), (b) is sectional drawing for one sub pixel of the liquid crystal device of this form, and sectional drawing which shows the structure of the connection part of a common electrode and wiring. (A), (b) is the top view which extracts and shows several sub pixel of the element substrate used for the liquid crystal device based on 4th Embodiment of this invention, respectively, and the structure of the connection part of a common electrode and wiring It is sectional drawing shown. (A), (b) is the top view which extracts and shows several sub pixel of the element substrate used for the liquid crystal device which concerns on 5th Embodiment of this invention, respectively, and the structure of the connection part of a common electrode and wiring It is sectional drawing shown. It is a top view which extracts and shows the several sub pixel of the element substrate used for the liquid crystal device which concerns on 6th Embodiment of this invention. It is sectional drawing of the thin-film transistor formed in the element substrate used for the liquid crystal device which concerns on 7th Embodiment of this invention. It is a circuit block diagram which shows one Embodiment of the electronic device which concerns on this invention. It is a perspective view which shows the mobile telephone which is other Embodiment of the electronic device which concerns on this invention.

Explanation of symbols

1, 41, 51. 1. liquid crystal device 2. Liquid crystal panel 3. lighting device; 4. an element substrate; 5. Color filter substrate Liquid crystal layer, 6a. 6. liquid crystal molecules, Sealing material, 8a. Data line, 9a. 10. scanning line; First substrate, 12. 12. first polarizing plate; TFD element (switching element), 13a. First TFD element, 13b. Second TFD element; 14. 14. Segment line (signal line) 15. pixel electrode (first electrode); 17. dielectric film; Wiring, 17a. Linear part (first part), 17b. 18. Planar part (second part), 18. Common electrode (second electrode), First alignment film, 21. Driving IC, 22. Second substrate, 23. Second polarizing plate, 24. Colored film, 25. Light shielding film, 27. Slit (gap), 28. Linear electrode portion, 29. Overcoat layer, 30. Second alignment film, 32. First conductive film, 33. Insulating films, 34a, 34b. Second conductive film 46, 49. 80. contact hole (region where no dielectric film is present); 101 thin film transistor; Liquid crystal device, 110. Mobile phones (electronic devices), 212, 223. Polarization transmission axis; Electric field, P.I. Sub-pixels, V. Display area, W0. The width of the linear portion, W1. Width of planar area

Claims (8)

Have a first substrate and a second substrate facing each other across the liquid crystal layer, the liquid crystal device forming the display area by a plurality arranged sub-pixel,
On the first substrate, a signal line, a switching element conductively connected to the signal line, a first electrode conductively connected to the switching element, and a plurality of electrodes formed in an outer region of the display area in the same direction. A wiring extending in parallel , a dielectric film covering the first electrode , the switching element, and the wiring, and a plurality of parallel electrodes facing the first electrode on the dielectric film and having a gap A second electrode provided with a linear electrode portion of
The second electrode overlaps the plurality of first electrodes in a plan view on the dielectric film, extends in a direction intersecting with the extending direction of the signal lines, and faces the outer region of the display region. A plurality of strip electrodes arranged in parallel at a predetermined interval in the extending direction of the signal line,
A contact hole in which the dielectric film is removed in the thickness direction is provided at a position overlapping the wiring and the second electrode in a plan view of the dielectric film, and the second electrode passes through the contact hole. A liquid crystal device, wherein the wiring is conductively connected.   The switching element opposes a semiconductor layer including a source region to which the signal line is conductively connected, a channel region, and a drain region to which the first electrode is conductively connected to the channel region via a gate insulating layer. The liquid crystal device according to claim 1, wherein the liquid crystal device is a three-terminal switching element having a gate electrode. The liquid crystal device according to claim 2 , wherein the wiring is formed in the same layer as one of the gate electrode and the signal line. The liquid crystal device according to claim 1 , wherein the wiring is formed on both sides of the display area between the display areas. The wiring includes a first portion extending in a direction intersecting with an extending direction of the second electrode, and a second portion connected to the first portion and extending in a direction parallel to the second electrode. Have
The liquid crystal device according to claim 1 , wherein the second electrode is conductively connected to the second portion. The liquid crystal device according to claim 5 , wherein the second portion extends from the first portion to a side opposite to a side where the display region is located. The liquid crystal device according to claim 5 , wherein the second portion extends from the first portion to the same side as the side where the display area is located. In the second portion, the width W1 in the direction orthogonal to the extending direction of the second portion is wider in the first portion than the width W0 in the direction orthogonal to the extending direction of the first portion. The liquid crystal device according to claim 5 .

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