JP4462421B2 - UV-absorbing group-containing organosilicon compound, method for producing the same, coating composition, and coated article - Google Patents
UV-absorbing group-containing organosilicon compound, method for producing the same, coating composition, and coated article Download PDFInfo
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- JP4462421B2 JP4462421B2 JP2004377097A JP2004377097A JP4462421B2 JP 4462421 B2 JP4462421 B2 JP 4462421B2 JP 2004377097 A JP2004377097 A JP 2004377097A JP 2004377097 A JP2004377097 A JP 2004377097A JP 4462421 B2 JP4462421 B2 JP 4462421B2
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- 239000008199 coating composition Substances 0.000 title claims description 41
- 238000004519 manufacturing process Methods 0.000 title claims description 32
- 150000003961 organosilicon compounds Chemical class 0.000 title claims description 25
- 125000004432 carbon atom Chemical group C* 0.000 claims description 133
- -1 γ-methacryloxypropyl group Chemical group 0.000 claims description 93
- 238000000576 coating method Methods 0.000 claims description 46
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 46
- 125000000217 alkyl group Chemical group 0.000 claims description 40
- 239000011248 coating agent Substances 0.000 claims description 40
- 239000000203 mixture Substances 0.000 claims description 34
- 125000003118 aryl group Chemical group 0.000 claims description 29
- 125000005843 halogen group Chemical group 0.000 claims description 26
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 23
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 21
- 125000000962 organic group Chemical group 0.000 claims description 19
- 229910000077 silane Inorganic materials 0.000 claims description 19
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 18
- 125000003545 alkoxy group Chemical group 0.000 claims description 17
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 17
- 125000004423 acyloxy group Chemical group 0.000 claims description 14
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- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical compound OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 claims description 11
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 claims description 11
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
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- 150000003377 silicon compounds Chemical class 0.000 claims description 4
- 238000006482 condensation reaction Methods 0.000 claims description 3
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- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 8
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- 238000000034 method Methods 0.000 description 13
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- 125000002947 alkylene group Chemical group 0.000 description 10
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 8
- 239000006096 absorbing agent Substances 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 8
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- 230000002829 reductive effect Effects 0.000 description 8
- 229940126062 Compound A Drugs 0.000 description 7
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 7
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- 150000004756 silanes Chemical class 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
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- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- 229910017604 nitric acid Inorganic materials 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 230000005856 abnormality Effects 0.000 description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 5
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 5
- 239000012964 benzotriazole Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 5
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- 229920001577 copolymer Polymers 0.000 description 5
- 239000004611 light stabiliser Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 5
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 5
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- 238000005481 NMR spectroscopy Methods 0.000 description 4
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- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
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- 230000035484 reaction time Effects 0.000 description 4
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- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
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- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
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- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- QHUNJMXHQHHWQP-UHFFFAOYSA-N trimethylsilyl acetate Chemical compound CC(=O)O[Si](C)(C)C QHUNJMXHQHHWQP-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Description
本発明は、新規な紫外線吸収性基含有有機ケイ素化合物及びその製造方法、並びにこの有機ケイ素化合物を用いたコーティング組成物、及び該組成物を用いた被覆物品に関する。 The present invention relates to a novel ultraviolet-absorbing group-containing organosilicon compound, a method for producing the same, a coating composition using the organosilicon compound, and a coated article using the composition.
従来より、有機紫外線吸収剤をアクリル樹脂等の各種バインダーに配合し、紫外線カット塗料や耐候性塗料として用いることが行われてきた。しかし、長期にわたる使用では、紫外線吸収剤のブリードアウトやバインダーとなる有機ポリマーの光劣化などによって性能が劣化してしまうという問題点があった。これらの問題点を克服するために、バインダー成分を改良したり、酸化防止剤を併用したり(特開昭63−43972号公報:特許文献1)することが行われてきた。また、メタクリロイル基を有する有機紫外線吸収剤を用いて共重合させブリードアウトをなくす(例えば、特開平6−88064号公報:特許文献2等)といった試みもなされてきた。しかし、これらも樹脂自体が主鎖に数多くのエステル結合を有するため、耐候性が十分でなく、Norrish型の反応を起こしたり、200℃を超える高温環境下では使用できないといった欠点を有していた。 Conventionally, organic ultraviolet absorbers have been blended in various binders such as acrylic resins and used as ultraviolet cut paints or weather resistant paints. However, when used for a long period of time, there has been a problem that the performance deteriorates due to bleeding out of the ultraviolet absorber or photodegradation of the organic polymer as a binder. In order to overcome these problems, the binder component has been improved or an antioxidant has been used in combination (Japanese Patent Laid-Open No. 63-43972: Patent Document 1). In addition, attempts have been made to eliminate bleed out by copolymerization using an organic ultraviolet absorber having a methacryloyl group (for example, JP-A-6-88064: Patent Document 2). However, since these resins themselves have a number of ester bonds in the main chain, the weather resistance is not sufficient, causing a Norrish type reaction, or having a drawback that they cannot be used in a high temperature environment exceeding 200 ° C. .
また、耐候性を改善するためにバインダーとしてシリコーン樹脂を用いることも行われているが、この場合も単に紫外線吸収剤を添加するだけでは、紫外線吸収剤のブリードアウトによる性能の劣化が起こってしまう。そこで、これまでに紫外線吸収剤にシリコーン樹脂と反応できる基を導入する試みが数多くなされている(例えば、特開平2−243695号公報:特許文献3等)。しかし、これらの反応性シリル化紫外線吸収剤は、多段階の合成が必要であったり、ヒドロシリル化触媒の除去など面倒な工程が必要であったりと、幾つかの問題点も残されていた。 In addition, in order to improve the weather resistance, a silicone resin is also used as a binder. In this case, however, simply adding an ultraviolet absorber causes deterioration in performance due to the bleeding out of the ultraviolet absorber. . Thus, many attempts have been made so far to introduce a group capable of reacting with a silicone resin into an ultraviolet absorber (for example, JP-A-2-243695: Patent Document 3). However, these reactive silylated UV absorbers still have some problems, such as the need for multi-step synthesis and troublesome processes such as removal of the hydrosilylation catalyst.
本発明は、上記事情に鑑みなされたもので、優れた紫外線吸収性を示し、かつアルコキシシリル基を有する新規な紫外線吸収性基含有有機ケイ素化合物及びその製造方法を提供する。また、この紫外線吸収性基含有有機ケイ素化合物を用いることにより、耐熱性及び耐水性などに優れ、ブリードアウトなどを生じさせることなく安定にコーティング膜中に保持することが可能なコーティング組成物、及びこの組成物の硬化皮膜にて被覆してなる被覆物品を提供することを目的とする。 The present invention has been made in view of the above circumstances, and provides a novel ultraviolet absorbing group-containing organosilicon compound having an excellent ultraviolet absorption and having an alkoxysilyl group, and a method for producing the same. Also, by using this ultraviolet absorbing group-containing organosilicon compound, a coating composition that is excellent in heat resistance and water resistance and can be stably held in the coating film without causing bleedout, and the like, and It aims at providing the coated article formed by coat | covering with the cured film of this composition.
本発明者は、上記目的を達成するために鋭意検討を行った結果、下記一般式(1)又は下記平均組成式(2)で表されるこれまで知られていなかった新規な紫外線吸収性基含有有機ケイ素化合物が、わずかな製造ステップからなり、かつ使用する反応触媒も一般的な中和反応で除去可能なものを用いるため、目的物を容易に製造できること、また、上記化合物を反応性シリル化紫外線吸収剤として、アクリル樹脂などの有機樹脂やシリコーン樹脂などの各種バインダーと組み合わせることにより、優れた紫外線カット性、耐熱性、耐水性、耐ブリードアウト性、及び保存安定性を有するコーティング組成物となり得ることを見出し、本発明をなすに至った。 As a result of intensive studies to achieve the above object, the present inventor has found a novel ultraviolet absorbing group that has not been known so far and is represented by the following general formula (1) or the following average composition formula (2). Since the organosilicon compound contains only a few production steps and the reaction catalyst used can be removed by a general neutralization reaction, the target product can be easily produced, and the above compound can be reacted with a reactive silylate. Coating composition having excellent UV protection, heat resistance, water resistance, bleed-out resistance, and storage stability by combining with various binders such as organic resins such as acrylic resins and silicone resins as a UV absorber As a result, the present invention has been made.
従って、本発明は、下記一般式(1)で表される紫外線吸収性基含有アルコキシシラン及び下記平均組成式(2)で表される紫外線吸収性基含有ポリオルガノシロキサンを提供する。 Accordingly, the present invention provides an ultraviolet absorbing group-containing alkoxysilane represented by the following general formula (1) and an ultraviolet absorbing group-containing polyorganosiloxane represented by the following average composition formula (2).
で表される二価有機基であり、R36は炭素数1〜8の二価炭化水素基であり、aは0〜2の整数である。}
In a divalent organic group represented, R 36 is a divalent hydrocarbon group having 1 to 8 carbon atoms, a is an integer of 0 to 2. }
で表される二価有機基であり、R36は炭素数1〜8の二価炭化水素基である。}
で表される有機基であり、Rは同一もしくは異種の水素原子又は炭素数1〜18の非置換もしくはハロゲン、γ−メタクリロキシプロピル基、γ−アクリロキシプロピル基、γ−グリシドキシプロピル基、3,4−エポキシシクロヘキシルエチル基、γ−メルカプトプロピル基もしくはγ−アミノプロピル基置換の一価炭化水素基であり、R2は同一又は異種の炭素数1〜8のアルキル基であり、m,n,p,qは、各々0<m≦1、0≦n≦2、0≦p<3、0≦q≦3、0<m+n+p+q<4を満たす数である。]
In a divalent organic group represented, R 36 is a divalent hydrocarbon group having 1 to 8 carbon atoms. }
R is the same or different hydrogen atom or unsubstituted or halogen having 1 to 18 carbon atoms , γ-methacryloxypropyl group, γ-acryloxypropyl group, γ-glycidoxypropyl group 3,4-epoxycyclohexylethyl group, γ-mercaptopropyl group or γ-aminopropyl group- substituted monovalent hydrocarbon group, R 2 is the same or different alkyl group having 1 to 8 carbon atoms, m , N, p, q are numbers satisfying 0 <m ≦ 1, 0 ≦ n ≦ 2, 0 ≦ p <3, 0 ≦ q ≦ 3, and 0 <m + n + p + q <4, respectively. ]
また、本発明は、これらの新規の紫外線吸収性基含有有機ケイ素化合物の製造方法として、下記の製造方法を提供する。 Moreover, this invention provides the following manufacturing method as a manufacturing method of these novel ultraviolet absorptive group containing organosilicon compounds.
〔製造方法(I)〕
下記一般式(4)で表される(メタ)アクリル基含有ヒドロキシベンゾトリアゾールと、下記一般式(5)で表されるメルカプト基含有アルコキシシランとを、塩基の存在下で反応させることにより、前記式(1)のアルコキシシランを製造する方法。
By reacting a (meth) acryl group-containing hydroxybenzotriazole represented by the following general formula (4) with a mercapto group-containing alkoxysilane represented by the following general formula (5) in the presence of a base, A method for producing an alkoxysilane of formula (1).
〔製造方法(II)〕
前記式(1)のアルコキシシラン、又はこれと少なくとも1種のその他の加水分解性シラン及び/又は加水分解性シロキサンとを(共)加水分解縮合させることにより、前記式(2)のポリオルガノシロキサンを製造する方法。
[Production Method (II)]
The polyorganosiloxane of the formula (2) is obtained by (co) hydrolytic condensation of the alkoxysilane of the formula (1) or at least one other hydrolyzable silane and / or hydrolyzable siloxane. How to manufacture.
〔製造方法(III)〕
前記式(1)のアルコキシシランと、少なくとも1種のその他のシラン及び/又はシロキサンとを酸あるいは塩基の存在下で平衡化反応させることにより、前記式(2)のポリオルガノシロキサンを製造する方法。
[Production Method (III)]
A process for producing a polyorganosiloxane of the formula (2) by equilibrating the alkoxysilane of the formula (1) and at least one other silane and / or siloxane in the presence of an acid or a base. .
〔製造方法(IV)〕
前記式(4)の(メタ)アクリル基含有ヒドロキシベンゾトリアゾールと、下記平均組成式(6)で表されるメルカプト基含有ポリオルガノシロキサンとを、塩基の存在下で反応させることにより、前記式(2)のポリオルガノシロキサンを製造する方法。
[Production Method (IV)]
By reacting the (meth) acrylic group-containing hydroxybenzotriazole of the formula (4) with the mercapto group-containing polyorganosiloxane represented by the following average composition formula (6) in the presence of a base, the formula (4) 2) A process for producing the polyorganosiloxane.
更に、本発明は、これらの新規の紫外線吸収性基含有有機ケイ素化合物を含有するコーティング組成物、及び基材に直接又は少なくとも1種の他の層を介してこの組成物の硬化皮膜を被覆してなる被覆物品を提供する。 Furthermore, the present invention provides a coating composition containing these novel UV-absorbing group-containing organosilicon compounds and a cured coating of this composition directly or via at least one other layer on a substrate. A coated article is provided.
本発明によれば、優れた紫外線吸収性を示し、かつアルコキシシリル基を有する新規な有機ケイ素化合物が容易に得られる。また、本発明の紫外線吸収性有機ケイ素化合物を用いたコーティング組成物は、耐熱性及び耐水性などに優れ、紫外線吸収剤をブリードアウトさせることなく、コーティング膜中に安定に保持することが可能となる。 According to the present invention, a novel organosilicon compound having excellent ultraviolet absorption and having an alkoxysilyl group can be easily obtained. In addition, the coating composition using the ultraviolet-absorbing organosilicon compound of the present invention is excellent in heat resistance and water resistance, and can be stably held in the coating film without bleeding out the ultraviolet absorber. Become.
本発明の第1の紫外線吸収性基含有有機ケイ素化合物は、下記一般式(1)で表されるアルコキシシランである。 The first ultraviolet absorbing group-containing organosilicon compound of the present invention is an alkoxysilane represented by the following general formula (1).
上記式(1)中、R1の炭素数1〜8のアルキル基又は炭素数6〜12のアリール基としては、例えば、アルキル基の場合、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、シクロペンチル基、n−ヘキシル基、シクロヘキシル基、n−ヘプチル基、n−オクチル基、2−エチルヘキシル基などを例示することができ、アリール基の場合、フェニル基、トリル基、キシリル基などを例示することができるが、特に耐候性及び入手し易さの観点から、メチル基が好ましい。 In the above formula (1), as the alkyl group having 1 to 8 carbon atoms or the aryl group having 6 to 12 carbon atoms of R 1 , for example, in the case of an alkyl group, a methyl group, an ethyl group, an n-propyl group, i- Propyl group, n-butyl group, sec-butyl group, t-butyl group, n-pentyl group, cyclopentyl group, n-hexyl group, cyclohexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, etc. In the case of an aryl group, a phenyl group, a tolyl group, a xylyl group and the like can be exemplified, and a methyl group is particularly preferable from the viewpoint of weather resistance and availability.
また、R2の炭素数1〜8のアルキル基として、具体的には、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、シクロペンチル基、n−ヘキシル基、シクロヘキシル基、n−ヘプチル基、n−オクチル基、2−エチルヘキシル基などを例示することができるが、入手のし易さ及び加水分解の制御のし易さを考慮すると、メチル基又はエチル基が好ましい。 Specific examples of the alkyl group having 1 to 8 carbon atoms of R 2 include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, sec-butyl group, and t-butyl group. , N-pentyl group, cyclopentyl group, n-hexyl group, cyclohexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, etc., but availability and control of hydrolysis In view of ease of treatment, a methyl group or an ethyl group is preferable.
R31は水素原子、ハロゲン原子、水酸基、炭素数1〜10のアルキル基、炭素数6〜12のアリール基又は炭素数1〜8のアシロキシ基であり、具体的には、水素原子、塩素原子、臭素原子、水酸基、メチル基、エチル基、n−プロピル基、t−ブチル基、フェニル基、トリル基、キシリル基、アセトキシ基、プロピオキシ基などを例示することができるが、入手の容易さの観点から、水素原子が好ましい。 R 31 is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms, or an acyloxy group having 1 to 8 carbon atoms, specifically, a hydrogen atom or a chlorine atom , Bromine atom, hydroxyl group, methyl group, ethyl group, n-propyl group, t-butyl group, phenyl group, tolyl group, xylyl group, acetoxy group, propoxy group, etc. From the viewpoint, a hydrogen atom is preferable.
R32,R33,R34は水素原子、ハロゲン原子、炭素数1〜8のアルキル基、炭素数6〜12のアリール基又は炭素数1〜8のアルコキシ基であり、具体的には、水素原子、塩素原子、臭素原子、メチル基、エチル基、n−プロピル基、t−ブチル基、フェニル基、トリル基、キシリル基、メトキシ基、エトキシ基、プロポキシ基などを例示することができるが、入手の容易さの観点から、水素原子が好ましい。 R 32 , R 33 , and R 34 are a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 12 carbon atoms, or an alkoxy group having 1 to 8 carbon atoms. Examples include atoms, chlorine atoms, bromine atoms, methyl groups, ethyl groups, n-propyl groups, t-butyl groups, phenyl groups, tolyl groups, xylyl groups, methoxy groups, ethoxy groups, and propoxy groups. From the viewpoint of availability, a hydrogen atom is preferable.
R35は炭素数2〜20、特に3〜10のエステル結合含有二価有機基であり、下記式
−R''−OC(=O)−R'''−
(R''は炭素数0〜17、特に1〜7の二価炭化水素基、特にアルキレン基である。R'''は炭素数2〜9の二価炭化水素基であり、特に−CH2−CH2−又は−CH(CH3)−CH2−が好ましい。)
で表される基が好ましい。
具体的には、−CH2−OC(=O)−(CH2)2−、−CH2−OC(=O)−CH(CH3)CH2−、−CH2−OC(=O)−C(CH3)2−、−(CH2)2−OC(=O)−(CH2)2−、−(CH2)2−OC(=O)−CH(CH3)CH2−、−(CH3)CH−OC(=O)−(CH2)2−、−(CH3)CH−OC(=O)−CH(CH3)CH2−、−(CH2)3−OC(=O)−(CH2)2−、−(CH2)3−OC(=O)−CH(CH3)CH2−、−(CH3)CH−OC(=O)−(CH2)2−、−(CH3)2C−OC(=O)−(CH2)2−、−(CH3)CH−OC(=O)−CH(CH3)CH2−、−(CH3)2C−OC(=O)−CH(CH3)CH2−、−(CH2)4−OC(=O)−(CH2)2−、−(CH2)4−OC(=O)−CH(CH3)CH2−、−(CH2)5−OC(=O)−(CH2)2−、−(CH2)5−OC(=O)−CH(CH3)CH2−、−(CH2)6−OC(=O)−CH(CH3)CH2−、−(CH2)8−OC(=O)−CH(CH3)CH2−、−(CH2)2−C6H10−(CH2)2−OC(=O)−CH(CH3)CH2−などを挙げることができる。入手のし易さ、経済性の観点から、−(CH2)2−OC(=O)−CH(CH3)CH2−、又は−(CH2)2−OC(=O)−CH2CH2−が好ましい。
R 35 is an ester bond-containing divalent organic group having 2 to 20 carbon atoms, particularly 3 to 10 carbon atoms, and has the following formula: —R ″ —OC (═O) —R ′ ″ —
(R ″ is a divalent hydrocarbon group having 0 to 17 carbon atoms, particularly 1 to 7 carbon atoms, especially an alkylene group. R ′ ″ is a divalent hydrocarbon group having 2 to 9 carbon atoms, particularly —CH 2 -CH 2 - or -CH (CH 3) -CH 2 - are preferred).
The group represented by these is preferable.
Specifically, —CH 2 —OC (═O) — (CH 2 ) 2 —, —CH 2 —OC (═O) —CH (CH 3 ) CH 2 —, —CH 2 —OC (═O) -C (CH 3) 2 -, - (CH 2) 2 -OC (= O) - (CH 2) 2 -, - (CH 2) 2 -OC (= O) -CH (CH 3) CH 2 - , - (CH 3) CH- OC (= O) - (CH 2) 2 -, - (CH 3) CH-OC (= O) -CH (CH 3) CH 2 -, - (CH 2) 3 - OC (= O) - (CH 2) 2 -, - (CH 2) 3 -OC (= O) -CH (CH 3) CH 2 -, - (CH 3) CH-OC (= O) - (CH 2) 2 -, - (CH 3) 2 C-OC (= O) - (CH 2) 2 -, - (CH 3) CH-OC (= O) -CH (CH 3) CH 2 -, - ( CH 3) 2 C-OC ( = O) -CH (CH 3) CH 2 -, - (CH 2) 4 -OC (= O) - ( CH 2) 2 -, - (CH 2) 4 -OC (= O) -CH (CH 3) CH 2 -, - (CH 2) 5 -OC (= O) - (CH 2 ) 2 —, — (CH 2 ) 5 —OC (═O) —CH (CH 3 ) CH 2 —, — (CH 2 ) 6 —OC (═O) —CH (CH 3 ) CH 2 — , — (CH 2 ) 8 —OC (═O) —CH (CH 3 ) CH 2 —, — (CH 2 ) 2 —C 6 H 10 — (CH 2 ) 2 —OC (═O) —CH (CH 3 ) CH 2 — and the like can be mentioned. From the viewpoint of easy availability and economy, — (CH 2 ) 2 —OC (═O) —CH (CH 3 ) CH 2 —, or — (CH 2 ) 2 —OC (═O) —CH 2 CH 2 — is preferred.
R36は炭素数1〜8の二価炭化水素基であり、好ましくはアルキレン基である。具体的には、−CH2−、−(CH2)2−、−(CH3)2C−、−(CH2)3−、−(CH3)CH−、−(CH2)4−、−(CH2)5−、−(CH2)6−、−C6H10−、−(CH2)8−、−(CH2)2−C6H10−などを挙げることができる。入手のし易さ、経済性の観点から、−(CH2)3−が好ましい。 R 36 is a divalent hydrocarbon group having 1 to 8 carbon atoms, preferably an alkylene group. Specifically, —CH 2 —, — (CH 2 ) 2 —, — (CH 3 ) 2 C—, — (CH 2 ) 3 —, — (CH 3 ) CH—, — (CH 2 ) 4 — , — (CH 2 ) 5 —, — (CH 2 ) 6 —, —C 6 H 10 —, — (CH 2 ) 8 —, — (CH 2 ) 2 —C 6 H 10 — and the like. . From the viewpoint of easy availability and economy, — (CH 2 ) 3 — is preferable.
aは0〜2の整数であり、好ましくは0又は1である。aが2より大きい場合、得られる紫外線吸収性基含有アルコキシシラン1分子中の加水分解性基の数が少なくなり、その結果、コーティング組成物とした場合、バインダーネットワークに組み込まれず、ブリードアウトしやすくなったり、バインダーの架橋密度を低下させ、耐摩耗性が得られにくくなったり、硬化が十分に進行しにくくなったりするおそれがある。 a is an integer of 0 to 2, preferably 0 or 1. When a is larger than 2, the number of hydrolyzable groups in one molecule of the resulting UV-absorbing group-containing alkoxysilane is reduced, and as a result, when a coating composition is formed, it is not incorporated into the binder network and easily bleeds out. Or the crosslinking density of the binder may be reduced, and it may be difficult to obtain wear resistance, or curing may be difficult to proceed sufficiently.
式(1)で表されるアルコキシシランのいくつかの具体例を以下に示す。
前記式(1)で表されるアルコキシシランは、以下の製造方法(I)により製造することができる。 The alkoxysilane represented by the formula (1) can be produced by the following production method (I).
製造方法(I)
下記一般式(4)で表される(メタ)アクリル基含有ヒドロキシベンゾトリアゾールと、下記一般式(5)で表されるメルカプト基含有アルコキシシランとを、塩基の存在下で反応させる方法。
Manufacturing method (I)
A method in which a (meth) acryl group-containing hydroxybenzotriazole represented by the following general formula (4) is reacted with a mercapto group-containing alkoxysilane represented by the following general formula (5) in the presence of a base.
式中、R1,R2,R31,R32,R33,R34,R36は各々前記と同じであり、R35'は炭素数3〜20の−R’’−OC(=O)−CR’=CH2で示される一価有機基(R’’は上記の通り、R’は水素原子又はメチル基である)で示されるものであり、具体的には、
−CH2−OC(=O)−CH=CH2、−CH2−OC(=O)−C(CH3)=CH2、−CH2CH2−OC(=O)−CH=CH2、−CH2CH2−OC(=O)−C(CH3)=CH2、−(CH2)3−OC(=O)−CH=CH2、−(CH2)3−OC(=O)−C(CH3)=CH2、−(CH2)4−OC(=O)−CH=CH2などを挙げることができる。
In the formula, R 1 , R 2 , R 31 , R 32 , R 33 , R 34 , and R 36 are the same as described above, and R 35 ′ represents —R ″ —OC (═O having 3 to 20 carbon atoms). ) —CR′═CH 2 is a monovalent organic group (R ″ is as described above, R ′ is a hydrogen atom or a methyl group), specifically,
-CH 2 -OC (= O) -CH = CH 2, -CH 2 -OC (= O) -C (CH 3) = CH 2, -CH 2 CH 2 -OC (= O) -CH = CH 2 , —CH 2 CH 2 —OC (═O) —C (CH 3 ) ═CH 2 , — (CH 2 ) 3 —OC (═O) —CH═CH 2 , — (CH 2 ) 3 —OC (= O) -C (CH 3) = CH 2, - (CH 2) 4 -OC (= O) such as -CH = CH 2 can be mentioned.
この反応は、塩基の存在下、前記式(5)で表されるメルカプト基含有アルコキシシラン中に、前記式(4)で表される(メタ)アクリル基含有ヒドロキシベンゾトリアゾールを滴下すればよく、また、(メタ)アクリル基含有ヒドロキシベンゾトリアゾール中に、メルカプト基含有アルコキシシランを滴下してもよい。この場合、式(4)のベンゾトリアゾール1モルに対し、式(5)のアルコキシシランは0.5〜3.0モル、特に0.8〜2.0モルの反応モル比とすることが好ましい。 In this reaction, in the presence of a base, the (meth) acryl group-containing hydroxybenzotriazole represented by the formula (4) may be dropped into the mercapto group-containing alkoxysilane represented by the formula (5). Further, a mercapto group-containing alkoxysilane may be dropped into the (meth) acryl group-containing hydroxybenzotriazole. In this case, the alkoxysilane of the formula (5) is preferably 0.5 to 3.0 mol, particularly preferably a reaction molar ratio of 0.8 to 2.0 mol with respect to 1 mol of the benzotriazole of the formula (4). .
塩基としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、水酸化カルシウムなどのアルカリ金属やアルカリ土類金属の水酸化物;リチウムメトキシド、ナトリウムメトキシド、カリウムメトキシドなどのアルカリ金属やアルカリ土類金属のアルコキシド;炭酸カリウム、炭酸カルシウムなどのアルカリ金属やアルカリ土類金属の炭酸塩;ギ酸カリウム、酢酸ナトリウム、プロピオン酸カリウムなどのアルカリ金属やアルカリ土類金属のカルボン酸塩;ナトリウムシリコネート、カリウムシリコネートなどのアルカリ金属やアルカリ土類金属のシリコネート;アンモニウムヒドロキシド、テトラメチルアンモニウムヒドロキシド、テトラプロピルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、トリメチルベンジルアンモニウムヒドロキシドなどの4級アンモニウムのヒドロキシド;酢酸アンモニウム、酢酸ジメチルアミン、酢酸エタノールアミン、ジメチルアニリン蟻酸塩などのアミンカルボン酸塩;トリエチルアミン、トリエチレンジアミン、ベンジルトリメチルアミン、ピリジン、γ−アミノプロピルトリメトキシシランなどのアミン;母体がスチレン−ジビニルベンゼン共重合体などからなり、官能基としてアンモニウム塩やアミンなどの塩基性官能基が結合した陰イオン交換樹脂などを挙げることができる。塩基の使用量は適宜選定されるが、式(5)のアルコキシシラン1モルに対し、0.0001〜2.0モル比、特に0.001〜0.5モル比であることが好ましい。 Examples of the base include hydroxides of alkali metals and alkaline earth metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, and calcium hydroxide; lithium methoxide, sodium methoxide, potassium methoxide Alkali metal and alkaline earth metal alkoxides such as potassium carbonate and calcium carbonate alkaline metal and alkaline earth metal carbonates; alkaline metal and alkaline earth metal carboxylates such as potassium formate, sodium acetate and potassium propionate Acid salts; alkali metal and alkaline earth metal siliconate such as sodium siliconate and potassium siliconate; ammonium hydroxide, tetramethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium Quaternary ammonium hydroxides such as hydroxide and trimethylbenzylammonium hydroxide; Ammonium carboxylates such as ammonium acetate, dimethylamine acetate, ethanolamine acetate, dimethylaniline formate; Triethylamine, triethylenediamine, benzyltrimethylamine, pyridine, γ An amine such as aminopropyltrimethoxysilane; an anion exchange resin in which the base is made of a styrene-divinylbenzene copolymer and the like, and a basic functional group such as ammonium salt or amine is bonded as a functional group. Although the usage-amount of a base is selected suitably, it is preferable that it is 0.0001-2.0 molar ratio with respect to 1 mol of alkoxysilanes of Formula (5), especially 0.001-0.5 molar ratio.
反応時には、一般的な溶剤を使用してもよく、例えば、メタノール、エタノール、イソプロパノールなどのアルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、ジアセトンアルコールなどのケトン類;ジエチルエーテル、テトラヒドロフラン、エチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテートなどのエーテル類などの極性溶剤が好ましい。 In the reaction, a general solvent may be used, for example, alcohols such as methanol, ethanol, isopropanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diacetone alcohol; diethyl ether, tetrahydrofuran, ethylene Polar solvents such as ethers such as glycol monoethyl ether, propylene glycol monomethyl ether, and propylene glycol monomethyl ether acetate are preferred.
反応温度は、0〜150℃の範囲であればよく、好ましくは10〜100℃の範囲である。反応温度が150℃より高いと式(4)のベンゾトリアゾールや目的物である式(1)のエステル結合が切断され、収率が低下する場合がある。また、反応時間は、反応温度にもよるが30分〜24時間の範囲であればよい。好ましくは1〜6時間の範囲である。 The reaction temperature should just be the range of 0-150 degreeC, Preferably it is the range of 10-100 degreeC. If the reaction temperature is higher than 150 ° C., the benzotriazole of formula (4) and the ester bond of formula (1) which is the target product may be cleaved, resulting in a decrease in yield. The reaction time may be in the range of 30 minutes to 24 hours, although it depends on the reaction temperature. Preferably it is the range of 1 to 6 hours.
また、本発明の第2の紫外線吸収性基含有有機ケイ素化合物は、下記平均組成式(2)で表されるポリオルガノシロキサンである。 The second ultraviolet absorbing group-containing organosilicon compound of the present invention is a polyorganosiloxane represented by the following average composition formula (2).
で表される有機基であり、Rは同一もしくは異種の水素原子又は炭素数1〜18の非置換もしくは置換の一価炭化水素基であり、R2は同一又は異種の炭素数1〜8のアルキル基であり、m,n,p,qは、各々0<m≦1、0≦n≦2、0≦p<3、0≦q≦3、0<m+n+p+q<4を満たす数である。]
R is the same or different hydrogen atom or an unsubstituted or substituted monovalent hydrocarbon group having 1 to 18 carbon atoms, and R 2 is the same or different carbon number 1 to 8 M, n, p, q are numbers satisfying 0 <m ≦ 1, 0 ≦ n ≦ 2, 0 ≦ p <3, 0 ≦ q ≦ 3, and 0 <m + n + p + q <4, respectively. ]
上記式(2)中、Rは水素原子又は炭素数1〜18の非置換もしくは置換の一価炭化水素基であり、具体的には、水素原子;メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等のアルキル基;シクロペンチル基、シクロヘキシル基等のシクロアルキル基;ビニル基、アリル基等のアルケニル基;フェニル基、トリル基、キシリル基等のアリール基;クロロメチル基、γ−クロロプロピル基、3,3,3−トリフルオロプロピル基等のハロゲン置換炭化水素基;γ−メタクリロキシプロピル基、γ−アクリロキシプロピル基、γ−グリシドキシプロピル基、3,4−エポキシシクロヘキシルエチル基、γ−メルカプトプロピル基、γ−アミノプロピル基等の置換炭化水素基などを例示することができる。特に耐候性を考慮する場合、メチル基、エチル基、トリフロロプロピル基が好ましく、特にメチル基が好ましく、また有機樹脂バインダーとの相溶性、反応性などを考慮すると、フェニル基、ビニル基、γ−メタクリロキシプロピル基、γ−アクリロキシプロピル基、γ−グリシドキシプロピル基、3,4−エポキシシクロヘキシルエチル基、γ−メルカプトプロピル基、γ−アミノプロピル基などの置換炭化水素基が好ましい。 In the above formula (2), R is a hydrogen atom or an unsubstituted or substituted monovalent hydrocarbon group having 1 to 18 carbon atoms, specifically a hydrogen atom; a methyl group, an ethyl group, a propyl group, or a butyl group. Alkyl groups such as pentyl group, hexyl group, heptyl group and octyl group; cycloalkyl groups such as cyclopentyl group and cyclohexyl group; alkenyl groups such as vinyl group and allyl group; aryl groups such as phenyl group, tolyl group and xylyl group Halogen-substituted hydrocarbon groups such as chloromethyl group, γ-chloropropyl group, 3,3,3-trifluoropropyl group; γ-methacryloxypropyl group, γ-acryloxypropyl group, γ-glycidoxypropyl group And substituted hydrocarbon groups such as 3,4-epoxycyclohexylethyl group, γ-mercaptopropyl group, γ-aminopropyl group, etc. . In particular, when considering weather resistance, a methyl group, an ethyl group, and a trifluoropropyl group are preferable, and a methyl group is particularly preferable. In consideration of compatibility with an organic resin binder, reactivity, and the like, a phenyl group, a vinyl group, γ -Substituted hydrocarbon groups such as methacryloxypropyl group, γ-acryloxypropyl group, γ-glycidoxypropyl group, 3,4-epoxycyclohexylethyl group, γ-mercaptopropyl group, γ-aminopropyl group and the like are preferable.
R2は前記と同じである。また、m,n,p,qは、各々0<m≦1、0≦n≦2、0≦p<3、0≦q≦3、0<m+n+p+q<4を満たす数であり、好ましくは0.001≦m≦1、0.01≦n≦1.99、0≦p<2.99、0≦q≦2.99、0.001≦m+n+p+q<3を満たす数である。mが0であると紫外線吸収能が発現せず、1より大きいと他のシロキサン樹脂や有機樹脂に対する溶解性が低下し、白化しやすくなるためである。また、nが2より大きいと分子量が高くなりにくくなり、ブリードや飛散しやすくなり、pが3以上であると保存安定性が低下しやすくなるためである。 R 2 is the same as described above. M, n, p, and q are numbers satisfying 0 <m ≦ 1, 0 ≦ n ≦ 2, 0 ≦ p <3, 0 ≦ q ≦ 3, and 0 <m + n + p + q <4, preferably 0 .001 ≦ m ≦ 1, 0.01 ≦ n ≦ 1.99, 0 ≦ p <2.99, 0 ≦ q ≦ 2.99, 0.001 ≦ m + n + p + q <3. This is because when m is 0, the ultraviolet absorbing ability is not exhibited, and when it is larger than 1, the solubility in other siloxane resins and organic resins is lowered and whitening is likely to occur. Further, when n is larger than 2, the molecular weight is difficult to increase, and bleeding and scattering are likely to occur, and when p is 3 or more, the storage stability is likely to be lowered.
Zは前記一般式(3)で表される有機基であり、式中R31,R32,R33,R34,R35,R36は前記と同じである。 Z is an organic group represented by the general formula (3), in which R 31 , R 32 , R 33 , R 34 , R 35 and R 36 are the same as described above.
本発明の前記式(2)で表されるポリオルガノシロキサンは、以下の製造方法(II)〜(IV)により製造することができる。 The polyorganosiloxane represented by the formula (2) of the present invention can be produced by the following production methods (II) to (IV).
製造方法(II)
本発明の前記式(1)のアルコキシシラン、又はこれと少なくとも1種のその他の加水分解性シラン及び/又は加水分解性シロキサンとを(共)加水分解縮合反応させる方法。
Manufacturing method (II)
The method of (co) hydrolytic condensation reaction of the alkoxysilane of the said Formula (1) of this invention, or this and at least 1 type of other hydrolysable silane and / or hydrolysable siloxane.
製造方法(III)
本発明の前記式(1)のアルコキシシランと、少なくとも1種のその他のシラン及び/又はシロキサンとを、酸あるいは塩基の存在下で平衡化反応させる方法。
Manufacturing method (III)
The method of carrying out the equilibration reaction of the alkoxysilane of the said Formula (1) of this invention, and an at least 1 sort (s) of other silane and / or siloxane in presence of an acid or a base.
製造方法(IV)
前記式(4)の(メタ)アクリル基含有ヒドロキシベンゾトリアゾールと、下記平均組成式(6)で表されるメルカプト基含有ポリオルガノシロキサンとを、塩基の存在下で反応させる方法。
Manufacturing method (IV)
A method in which the (meth) acrylic group-containing hydroxybenzotriazole of the formula (4) is reacted with a mercapto group-containing polyorganosiloxane represented by the following average composition formula (6) in the presence of a base.
前記製造方法(II)の(共)加水分解縮合反応、及び製造方法(III)、(IV)の平衡化反応は、公知の反応形態であり、一般的な条件及び手順で行うことができる。 The (co) hydrolytic condensation reaction of the production method (II) and the equilibration reaction of the production methods (III) and (IV) are known reaction forms and can be performed under general conditions and procedures.
ここで、製造方法(II)の(共)加水分解縮合における他の加水分解性シラン及び加水分解性シロキサンとしては、下記一般式:
(R41)xSi(A)4-x
{式中R41は前記Rと同じであり、Aは同一又は異種のハロゲン原子、炭素数1〜3のアルコキシ基、炭素数1〜6のアシロキシ基、炭素数1〜6のアルケノキシ基、又はイソシアネート基である。xは0〜3の整数である。}
で表される加水分解性シラン、及びその部分加水分解縮合物が挙げられる。
Here, as other hydrolyzable silane and hydrolyzable siloxane in the (co) hydrolysis condensation of the production method (II), the following general formula:
(R 41 ) x Si (A) 4-x
{In the formula, R 41 is the same as R, and A is the same or different halogen atom, an alkoxy group having 1 to 3 carbon atoms, an acyloxy group having 1 to 6 carbon atoms, an alkenoxy group having 1 to 6 carbon atoms, or Isocyanate group. x is an integer of 0-3. }
And a partially hydrolyzed condensate thereof.
上記一般式の化合物の例としては、x=0の場合、テトラクロロシラン、テトラメトキシシラン、テトラエトキシシラン、テトライソプロポキシシラン、テトラアセトキシシラン、テトライソシアネートシラン、テトラメトキシシランの部分加水分解縮合物(商品名「Mシリケート51」多摩化学製、商品名「MSI51」コルコート製、商品名「MS51」、「MS56」三菱化学製)、テトエトキシシランの部分加水分解縮合物(商品名「シリケート35」、「シリケート45」多摩化学製、商品名「ESI40」、「ESI48」コルコート製)、テトラメトキシシランとテトラエトキシシランとの部分共加水分解縮合物(商品名「FR−3」多摩化学製、商品名「EMSi48」コルコート製)などを挙げることができる。 As an example of the compound of the above general formula, when x = 0, tetrahydrosilane, tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, tetraacetoxysilane, tetraisocyanatesilane, and a partial hydrolysis condensate of tetramethoxysilane ( Trade name “M silicate 51” manufactured by Tama Chemicals, trade name “MSI 51” manufactured by Colcoat, trade names “MS 51” and “MS 56” manufactured by Mitsubishi Chemical), partial hydrolysis condensate of tetoethoxysilane (trade name “silicate 35”, "Silicate 45" manufactured by Tama Chemicals, trade names "ESI40", "ESI48" manufactured by Colcoat), partial co-hydrolysis condensate of tetramethoxysilane and tetraethoxysilane (trade name "FR-3" manufactured by Tama Chemicals, trade name “EMSi48” manufactured by Colcoat).
x=1の場合の具体例として、ハイドロジェントリクロロシラン、ハイドロジェントリメトキシシラン、ハイドロジェントリエトキシシラン、メチルトリクロロシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリアセトキシシラン、メチルトリイソプロペノキシシラン、メチルトリイソシアネートシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、エチルトリイソプロポキシシラン、プロピルトリメトキシシラン、プロピルトリエトキシシラン、プロピルトリイソプロポキシシラン、フェニルトリメトキシシラン、ビニルトリメトキシシラン、アリルトリメトキシシラン、γ−メタクリロキシプロピルトリメトキシシラン、γ−メタクリロキシプロピルトリエトキシシラン、γ−アクリロキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、γ−クロロプロピルトリメトキシシラン、3,3,3−トリフルオロプロピルトリメトキシシラン、3,3,3−トリフルオロプロピルトリエトキシシラン、パーフルオロオクチルエチルトリメトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、N−(2−アミノエチル)アミノプロピルトリメトキシシラン、メチルトリメトキシシランの部分加水分解縮合物(商品名「KC−89S」、「X−40−9220」信越化学工業製)、メチルトリメトキシシランとγ−グリシドキシプロピルトリメトキシシランとの部分共加水分解縮合物(商品名「X−41−1056」信越化学工業製)などを挙げることができる。 Specific examples in the case of x = 1 include hydrogentrichlorosilane, hydrogentrimethoxysilane, hydrogentriethoxysilane, methyltrichlorosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriacetoxysilane, methyltriisopropenoxysilane, Methyltriisocyanate silane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, propyltrimethoxysilane, propyltriethoxysilane, propyltriisopropoxysilane, phenyltrimethoxysilane, vinyltrimethoxysilane, allyltrimethoxy Silane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-acryloxypropyl Limethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-chloropropyltrimethoxysilane, 3,3 , 3-trifluoropropyltrimethoxysilane, 3,3,3-trifluoropropyltriethoxysilane, perfluorooctylethyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-aminopropyltrimethoxysilane, γ-amino Partial hydrolysis-condensation product of propyltriethoxysilane, N- (2-aminoethyl) aminopropyltrimethoxysilane, and methyltrimethoxysilane (trade names “KC-89S” and “X-40-9220” manufactured by Shin-Etsu Chemical Co., Ltd.) Methyltrimethoxysilane and and a partial cohydrolysis condensate with γ-glycidoxypropyltrimethoxysilane (trade name “X-41-1056” manufactured by Shin-Etsu Chemical Co., Ltd.).
x=2の場合には、メチルハイドロジェンジクロロシラン、メチルハイドロジェンジメトキシシラン、メチルハイドロジェンジエトキシシラン、ジメチルジクロロシラン、ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジメチルジアセトキシシラン、ジメチルジイソシアネートシラン、メチルエチルジメトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、メチルプロピルジメトキシシラン、メチルプロピルジエトキシシラン、ジイソプロピルジメトキシシラン、フェニルメチルジメトキシシラン、ビニルメチルジメトキシシラン、γ−グリシドキシプロピルメチルジメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルメチルジメトキシシラン、γ−メタクリロキシプロピルメチルジメトキシシラン、γ−メタクリロキシプロピルメチルジエトキシシラン、γ−メルカプトプロピルメチルジメトキシシラン、γ−アミノプロピルメチルジエトキシシラン、N−(2−アミノエチル)アミノプロピルメチルジメトキシシランなどを例として挙げることができる。 In the case of x = 2, methyl hydrogen dichlorosilane, methyl hydrogen dimethoxy silane, methyl hydrogen diethoxy silane, dimethyl dichloro silane, dimethyl dimethoxy silane, dimethyl diethoxy silane, dimethyl diacetoxy silane, dimethyl diisocyanate silane, methyl Ethyldimethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, methylpropyldimethoxysilane, methylpropyldiethoxysilane, diisopropyldimethoxysilane, phenylmethyldimethoxysilane, vinylmethyldimethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ- Glycidoxypropylmethyldiethoxysilane, β- (3,4-epoxycyclohexyl) ethylmethyldimethoxysilane γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-mercaptopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane, N- (2-aminoethyl) aminopropylmethyldimethoxysilane, etc. As an example.
x=3の場合の例としては、ハイドロジェンジメチルメトキシシラン、トリメチルクロロシラン、トリメチルメトキシシラン、トリメチルアセトキシシラン、トリメチルイソシアネートシラン、ビニルジメチルメトキシシラン、フェニルジメチルメトキシシラン、γ−グリシドキシプロピルジメチルメトキシシラン、γ−グリシドキシプロピルジメチルエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルジメチルメトキシシラン、γ−メタクリロキシプロピルジメチルメトキシシラン、γ−メタクリロキシプロピルジメチルエトキシシラン、γ−メルカプトプロピルジメチルメトキシシラン、γ−アミノプロピルジメチルエトキシシラン、N−(2−アミノエチル)アミノプロピルジメチルメトキシシランなどを挙げることができる。 Examples of x = 3 include hydrogen dimethyl methoxy silane, trimethyl chloro silane, trimethyl methoxy silane, trimethyl acetoxy silane, trimethyl isocyanate silane, vinyl dimethyl methoxy silane, phenyl dimethyl methoxy silane, γ-glycidoxy propyl dimethyl methoxy silane , Γ-glycidoxypropyldimethylethoxysilane, β- (3,4-epoxycyclohexyl) ethyldimethylmethoxysilane, γ-methacryloxypropyldimethylmethoxysilane, γ-methacryloxypropyldimethylethoxysilane, γ-mercaptopropyldimethylmethoxy Examples include silane, γ-aminopropyldimethylethoxysilane, N- (2-aminoethyl) aminopropyldimethylmethoxysilane, and the like. .
前記の中でも、特に耐擦傷性や耐候性が要求される用途に使用する場合には、R41がメチル基などのアルキル基であるものが好ましく、靭性や染色性が要求される場合は、フェニル基や、エポキシ基あるいは(メタ)アクリロキシ置換炭化水素基であるものが好ましい。 Among them, particularly when used for applications requiring scratch resistance and weather resistance, those in which R 41 is an alkyl group such as a methyl group are preferred, and when toughness and dyeability are required, phenyl Group, an epoxy group or a (meth) acryloxy-substituted hydrocarbon group is preferable.
また、加水分解性シラン及び加水分解性シロキサンの他の例としては、下記一般式:
(A)y(R42)3-ySi−B−Si(R43)3-z(A)z
{式中R42,R43は前記Rと同じであり、Aは前記と同じであり、Bは炭素数1以上の二価有機基であり、y、zは各々独立に0〜3の整数である。}
で表される加水分解性シラン、及びその部分加水分解縮合物も挙げることができる。
Other examples of hydrolyzable silane and hydrolyzable siloxane include the following general formula:
(A) y ( R42 ) 3-y Si-B-Si ( R43 ) 3-z (A) z
{Wherein R 42 and R 43 are the same as R, A is the same as above, B is a divalent organic group having 1 or more carbon atoms, and y and z are each independently an integer of 0 to 3. It is. }
The hydrolyzable silane represented by these, and its partial hydrolysis-condensation product can also be mentioned.
上記式中、Bは炭素数1以上、特に1〜30、とりわけ1〜20の二価有機基であれば如何なるものでも使用可能であるが、アルキレン基、アルキレン基とアリーレン基やシクロアルキレン基とが結合したもの、これらの水素原子の一部又は全部がフッ素原子に置換したもの、アルキレン基やフッ素化アルキレン基中に−O−が介在したもの等が挙げられ、以下のものが好ましい。
−(CH2)d−(但し、d=1〜20)、
−CH2CH2−(CF2)e−CH2CH2−(但し、e=2〜20)、
−CH2CH2−CF(CF3)−(CF2)e−CF(CF3)−CH2CH2−、
−CH2CH2−CF(C2F5)−(CF2)e−CF(C2F5)−CH2CH2−、
−CH2CH2−CF(CF3)CF2−O−(CF2)e−O−CF2CF(CF3)−CH2CH2−、
−CH2CH2−C6H4−CH2CH2−、
−CH2CH2−C6F4−CH2CH2−、
−CH2CH2−C6H10−CH2CH2−、
−CH2CH2−C6F10−CH2CH2−
In the above formula, B can be any divalent organic group having 1 or more carbon atoms, particularly 1 to 30, especially 1 to 20, but an alkylene group, an alkylene group and an arylene group or a cycloalkylene group can be used. , Those in which some or all of these hydrogen atoms are substituted with fluorine atoms, those in which —O— is interposed in an alkylene group or a fluorinated alkylene group, and the like are preferred.
- (CH 2) d - (where, d = 1~20),
—CH 2 CH 2 — (CF 2 ) e —CH 2 CH 2 — (where e = 2 to 20),
-CH 2 CH 2 -CF (CF 3 ) - (CF 2) e -CF (CF 3) -CH 2 CH 2 -,
-CH 2 CH 2 -CF (C 2 F 5) - (CF 2) e -CF (C 2 F 5) -CH 2 CH 2 -,
-CH 2 CH 2 -CF (CF 3 ) CF 2 -O- (CF 2) e -O-CF 2 CF (CF 3) -CH 2 CH 2 -,
-CH 2 CH 2 -C 6 H 4 -CH 2 CH 2 -,
-CH 2 CH 2 -C 6 F 4 -CH 2 CH 2 -,
-CH 2 CH 2 -C 6 H 10 -CH 2 CH 2 -,
—CH 2 CH 2 —C 6 F 10 —CH 2 CH 2 —
特に、塗膜硬度や耐候性を目的とする場合には、−(CH2)d−や−CH2CH2−(CF2)e−CH2CH2−が好ましく、可撓性や耐クラック性を重視する場合には、−CH2CH2−C6H4−CH2CH2−が好ましく、耐薬品性、防汚性又は反射防止性を目的とする場合には、−CH2CH2−(CF2)e−CH2CH2−が好ましい。 In particular, for the purpose of coating film hardness and weather resistance, — (CH 2 ) d — and —CH 2 CH 2 — (CF 2 ) e —CH 2 CH 2 — are preferable, and flexibility and crack resistance are preferred. -CH 2 CH 2 -C 6 H 4 -CH 2 CH 2 -is preferable when importance is placed on the property, and when the purpose is chemical resistance, antifouling property or antireflection property, -CH 2 CH 2 - (CF 2) e -CH 2 CH 2 - is preferred.
R42,R43は前記Rと同じであり、Aは前記と同じであり、y、zは各々独立に0〜3の整数、特に2又は3である。 R 42 and R 43 are the same as R, A is the same as above, and y and z are each independently an integer of 0 to 3, particularly 2 or 3.
これらの条件を満たすシラン化合物の具体例としては、
(CH3O)3Si−CH2CH2−Si(OCH3)3、
(CH3O)2CH3Si−CH2CH2−SiCH3(OCH3)2、
(CH3O)3Si−CH2CH2CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−C6H4−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−C6H10−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−(CF2)4−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−(CF2)6−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−(CF2)10−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−(CF2)16−CH2CH2−Si(OCH3)3、
(C2H5O)3Si−CH2CH2−(CF2)4−CH2CH2−Si(OC2H5)3、
(C2H5O)3Si−CH2CH2−(CF2)6−CH2CH2−Si(OC2H5)3、
(CH3O)2CH3Si−CH2CH2−(CF2)4−CH2CH2−SiCH3(OCH3)2、
(CH3O)2CH3Si−CH2CH2−(CF2)6−CH2CH2−SiCH3(OCH3)2、
(CH3O)(CH3)2Si−CH2CH2−(CF2)4−CH2CH2−Si(CH3)2(OCH3)、
(CH3O)(CH3)2Si−CH2CH2−(CF2)6−CH2CH2−Si(CH3)2(OCH3)、
(CH3O)3Si−CH2CH2−CF(CF3)(CF2)4CF(CF3)−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−CF(CF3)(CF2)6CF(CF3)−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−CF(CF3)(CF2)12CF(CF3)−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−C6F10−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−C6F4−CH2CH2−Si(OCH3)3
を挙げることができ、これらの中でも、好ましくは、
(CH3O)3Si−CH2CH2−Si(OCH3)3、
(CH3O)2CH3Si−CH2CH2−SiCH3(OCH3)2、
(CH3O)3Si−CH2CH2CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−C6H4−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−C6H10−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−(CF2)4−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−(CF2)6−CH2CH2−Si(OCH3)3、
(CH3O)3Si−CH2CH2−(CF2)8−CH2CH2−Si(OCH3)3、
(C2H5O)3Si−CH2CH2−(CF2)4−CH2CH2−Si(OC2H5)3、
(C2H5O)3Si−CH2CH2−(CF2)6−CH2CH2−Si(OC2H5)3
などのシラン化合物を使用するのがよい。
Specific examples of silane compounds that satisfy these conditions include:
(CH 3 O) 3 Si- CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 2 CH 3 Si-CH 2 CH 2 -SiCH 3 (OCH 3) 2,
(CH 3 O) 3 Si- CH 2 CH 2 CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -C 6 H 4 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -C 6 H 10 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 - (CF 2) 4 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 - (CF 2) 6 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 - (CF 2) 10 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 - (CF 2) 16 -CH 2 CH 2 -Si (OCH 3) 3,
(C 2 H 5 O) 3 Si-CH 2 CH 2 - (CF 2) 4 -CH 2 CH 2 -Si (OC 2 H 5) 3,
(C 2 H 5 O) 3 Si-CH 2 CH 2 - (CF 2) 6 -CH 2 CH 2 -Si (OC 2 H 5) 3,
(CH 3 O) 2 CH 3 Si-CH 2 CH 2 - (CF 2) 4 -CH 2 CH 2 -SiCH 3 (OCH 3) 2,
(CH 3 O) 2 CH 3 Si-CH 2 CH 2 - (CF 2) 6 -CH 2 CH 2 -SiCH 3 (OCH 3) 2,
(CH 3 O) (CH 3 ) 2 Si-CH 2 CH 2 - (CF 2) 4 -CH 2 CH 2 -Si (CH 3) 2 (OCH 3),
(CH 3 O) (CH 3 ) 2 Si-CH 2 CH 2 - (CF 2) 6 -CH 2 CH 2 -Si (CH 3) 2 (OCH 3),
(CH 3 O) 3 Si- CH 2 CH 2 -CF (CF 3) (CF 2) 4 CF (CF 3) -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -CF (CF 3) (CF 2) 6 CF (CF 3) -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -CF (CF 3) (CF 2) 12 CF (CF 3) -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -C 6 F 10 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -C 6 F 4 -CH 2 CH 2 -Si (OCH 3) 3
Among these, preferably,
(CH 3 O) 3 Si- CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 2 CH 3 Si-CH 2 CH 2 -SiCH 3 (OCH 3) 2,
(CH 3 O) 3 Si- CH 2 CH 2 CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -C 6 H 4 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 -C 6 H 10 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 - (CF 2) 4 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 - (CF 2) 6 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- CH 2 CH 2 - (CF 2) 8 -CH 2 CH 2 -Si (OCH 3) 3,
(C 2 H 5 O) 3 Si-CH 2 CH 2 - (CF 2) 4 -CH 2 CH 2 -Si (OC 2 H 5) 3,
(C 2 H 5 O) 3 Si-CH 2 CH 2 - (CF 2) 6 -CH 2 CH 2 -Si (OC 2 H 5) 3
A silane compound such as
更に、加水分解性シラン及び加水分解性シロキサンの他の例としては、下記一般式:
で表される加水分解性シロキサン、及びその部分加水分解縮合物も挙げることができる。
Furthermore, other examples of hydrolyzable silanes and hydrolyzable siloxanes include the following general formula:
The hydrolyzable siloxane represented by these, and its partial hydrolysis-condensation product can also be mentioned.
D、Eは各々独立に、ハロゲン原子、炭素数1〜3のアルコキシ基、炭素数1〜6のアシロキシ基、炭素数1〜6のアルケノキシ基、又はイソシアネート基であり、具体的には、塩素原子、臭素原子等のハロゲン原子、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基等のアルコキシ基、アセトキシ基、オクタノイルオキシ基、ベンゾイルオキシ基等のアシロキシ基、ビニロキシ基、イソプロペノキシ基等のアルケノキシ基、イソシアネート基などを例示することができる。 D and E are each independently a halogen atom, an alkoxy group having 1 to 3 carbon atoms, an acyloxy group having 1 to 6 carbon atoms, an alkenoxy group having 1 to 6 carbon atoms, or an isocyanate group. Alkenoxy such as halogen atoms such as atoms and bromine atoms, alkoxy groups such as methoxy group, ethoxy group, propoxy group and isopropoxy group, acyloxy groups such as acetoxy group, octanoyloxy group and benzoyloxy group, vinyloxy group and isopropenoxy group A group, an isocyanate group, etc. can be illustrated.
Gは酸素原子又は炭素数2〜10のアルキレン基であり、具体的には、酸素原子、エチレン基、プロピレン基、n−ブチレン基、i−ブチレン基、ヘキシレン基、デシレン基、フェニレン基、メチルフェニルエチレン基などが例示される。 G is an oxygen atom or an alkylene group having 2 to 10 carbon atoms, specifically, an oxygen atom, ethylene group, propylene group, n-butylene group, i-butylene group, hexylene group, decylene group, phenylene group, methyl group. Examples thereof include a phenylethylene group.
b,cは各々独立に0〜3の整数、特に2又は3であり、dは1〜30、特に1〜20の整数である。 b and c are each independently an integer of 0 to 3, particularly 2 or 3, and d is an integer of 1 to 30, particularly 1 to 20.
上記一般式で表されるシロキサンの具体例としては、下記に示すものが挙げられる。
(CH3O)3Si−CH2CH2−(CH3)2SiO−Si(CH3)2−CH2CH2−Si(OCH3)3、
(CH3O)3Si−O−(CH3)2SiO−Si(CH3)2−O−Si(OCH3)3、
(CH3CH2O)3Si−CH2CH2−〔(CH3)2SiO〕4−Si(CH3)2−CH2CH2−Si(OCH2CH3)3、
(CH3O)2(CH3)Si−O−〔(CH3)2SiO〕9−Si(CH3)2−O−Si(CH3)(OCH3)2、
(CH3O)3Si−CH2CH2−〔(CH3)2SiO〕20−Si(CH3)2−CH2CH2−Si(OCH3)3
Specific examples of the siloxane represented by the above general formula include those shown below.
(CH 3 O) 3 Si- CH 2 CH 2 - (CH 3) 2 SiO-Si (CH 3) 2 -CH 2 CH 2 -Si (OCH 3) 3,
(CH 3 O) 3 Si- O- (CH 3) 2 SiO-Si (CH 3) 2 -O-Si (OCH 3) 3,
(CH 3 CH 2 O) 3 Si-CH 2 CH 2 - [(CH 3) 2 SiO] 4 -Si (CH 3) 2 -CH 2 CH 2 -Si (OCH 2 CH 3) 3,
(CH 3 O) 2 (CH 3) SiO - [(CH 3) 2 SiO] 9 -Si (CH 3) 2 -O -Si (CH 3) (OCH 3) 2,
(CH 3 O) 3 Si- CH 2 CH 2 - [(CH 3) 2 SiO] 20 -Si (CH 3) 2 -CH 2 CH 2 -Si (OCH 3) 3
また、前記製造方法(II)の反応は、式(1)のアルコキシシラン1モルに対し、他のシラン又はシロキサンを0〜1,000モル、特に0.1〜100モル使用して行うことが好ましい。また、水の使用量は、全ての加水分解性基の合計1モルに対し、0.01〜100モル比、特に0.1〜10モル比が好ましい。この場合、メタノール、エタノール、イソプロパノールなどのアルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、ジアセトンアルコールなどのケトン類;ジエチルエーテル、テトラヒドロフラン、エチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテートなどのエーテル類などの極性溶剤等の有機溶剤を各種シラン又はシロキサンの合計である有効成分の濃度が10〜100%になる量で使用することもできる。反応に際しては、酸触媒又はアルカリ触媒、例えば、塩酸、硝酸、硫酸、メタンスルホン酸などの無機酸;酢酸、しゅう酸、クエン酸などの有機酸;4級アンモニウムヒドロキシド、アミンなどの有機アルカリ;水酸化ナトリウム、水酸化カリウム、ナトリウムメトキシドなどの無機アルカリ等を触媒量、特に塩酸、硝酸、酢酸、しゅう酸、クエン酸を用いて常法に従って行うことができる。 In addition, the reaction of the production method (II) is performed using 0 to 1,000 mol, particularly 0.1 to 100 mol of another silane or siloxane with respect to 1 mol of the alkoxysilane of the formula (1). preferable. Moreover, the usage-amount of water is 0.01-100 molar ratio with respect to the total 1 mol of all the hydrolysable groups, Especially 0.1-10 molar ratio is preferable. In this case, alcohols such as methanol, ethanol and isopropanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and diacetone alcohol; diethyl ether, tetrahydrofuran, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl An organic solvent such as a polar solvent such as ethers such as ether acetate can be used in such an amount that the concentration of the active ingredient, which is the sum of various silanes or siloxanes, becomes 10 to 100%. In the reaction, an acid catalyst or an alkali catalyst, for example, an inorganic acid such as hydrochloric acid, nitric acid, sulfuric acid or methanesulfonic acid; an organic acid such as acetic acid, oxalic acid or citric acid; an organic alkali such as quaternary ammonium hydroxide or amine; An inorganic alkali such as sodium hydroxide, potassium hydroxide or sodium methoxide can be used in a conventional manner using a catalytic amount, particularly hydrochloric acid, nitric acid, acetic acid, oxalic acid or citric acid.
反応温度は、0〜150℃の範囲であればよく、好ましくは10〜100℃の範囲である。反応温度が150℃より高いと反応の制御がしにくくなり、ゲル化する場合がある。また反応時間は反応温度にもよるが、30分〜24時間の範囲であればよい。好ましくは1〜6時間の範囲である。 The reaction temperature should just be the range of 0-150 degreeC, Preferably it is the range of 10-100 degreeC. When the reaction temperature is higher than 150 ° C., it is difficult to control the reaction, and gelation may occur. The reaction time depends on the reaction temperature, but may be in the range of 30 minutes to 24 hours. Preferably it is the range of 1 to 6 hours.
前記製造方法(III)において、本発明の前記式(1)のアルコキシシランは、そのまま使用してもよいし、予め(部分)加水分解縮合してから使用してもよい。 In the production method (III), the alkoxysilane of the formula (1) of the present invention may be used as it is or after (partially) hydrolytic condensation.
製造方法(III)における、他のシラン及びシロキサンとしては、上記製造方法(II)で例示したもののほか、ヘキサメチルジシロキサン、α,ω−ジヒドロテトラメチルジシロキサン、α,ω−ジビニルテトラメチルジシロキサン、α,ω−ジフェニルテトラメチルジシロキサン、ポリジメチルシロキサン、ポリメチルフェニルシロキサン、α,ω−ジヒドロキシポリジメチルシロキサンなどの直鎖シロキサン;ヘキサメチルシクロトリシロキサン、オクタメチルシクロテトラシロキサン、1,3,5−トリス(3,3,3−フロロプロピル)トリメチルシクロトリシロキサン、1,3,5,7−テトラヒドロテトラメチルシクロテトラシロキサン、1,3,5,7−テトラビニルテトラメチルシクロテトラシロキサン、1,3,5,7−テトラフェニルテトラメチルシクロテトラシロキサン、デカメチルシクロペンタシロキサンなどの環状シロキサン;3−(トリメチルシロキシ)ヘプタメチルトリシロキサン、テトラキス(トリメチルシロキシ)シランなどの分岐シロキサンなどを例として挙げることができる。前記の中でも、耐候性が要求される用途には、アルキル置換基が好ましく、樹脂相溶性、靭性及び染色性などが要求される場合は、フェニル、エポキシもしくは(メタ)アクリロキシ置換炭化水素基が好ましい。 In the production method (III), other silanes and siloxanes include those exemplified in the production method (II), hexamethyldisiloxane, α, ω-dihydrotetramethyldisiloxane, α, ω-divinyltetramethyldisiloxane. Linear siloxanes such as siloxane, α, ω-diphenyltetramethyldisiloxane, polydimethylsiloxane, polymethylphenylsiloxane, α, ω-dihydroxypolydimethylsiloxane; hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, 1,3 , 5-tris (3,3,3-fluoropropyl) trimethylcyclotrisiloxane, 1,3,5,7-tetrahydrotetramethylcyclotetrasiloxane, 1,3,5,7-tetravinyltetramethylcyclotetrasiloxane, 1,3,5,7-te Examples include cyclic siloxanes such as traphenyltetramethylcyclotetrasiloxane and decamethylcyclopentasiloxane; branched siloxanes such as 3- (trimethylsiloxy) heptamethyltrisiloxane and tetrakis (trimethylsiloxy) silane. Among these, alkyl substituents are preferred for applications requiring weather resistance, and phenyl, epoxy, or (meth) acryloxy-substituted hydrocarbon groups are preferred when resin compatibility, toughness, dyeability, and the like are required. .
また、前記製造方法(III)の反応は、式(1)のアルコキシシラン1モルに対し、他のシラン又はシロキサンを0.001〜1,000モル、特に0.1〜100モル用いることが好ましく、酸あるいは塩基の存在下、前記式(1)のアルコキシシラン中に、少なくとも1種のその他のシラン及び/又はシロキサンを滴下すればよく、また少なくとも1種のその他のシラン及び/又はシロキサン中に、前記式(1)のアルコキシシランを滴下してもよい。 In the reaction of the production method (III), 0.001 to 1,000 mol, particularly 0.1 to 100 mol of another silane or siloxane is preferably used with respect to 1 mol of the alkoxysilane of the formula (1). In the presence of an acid or a base, at least one other silane and / or siloxane may be added dropwise to the alkoxysilane of the formula (1), and the at least one other silane and / or siloxane may be added. The alkoxysilane of the formula (1) may be dropped.
酸又は塩基としては、前記に示した通りである。塩基又は酸の使用量は触媒量であり、特に式(1)のアルコキシシラン及びその他のシラン及び/又はシロキサンの合計量に対して0.001〜10質量%であることが好ましい。
また、反応時には、一般的な溶剤を使用してもよく、中でも前記に示した極性溶剤が好ましい。
The acid or base is as described above. The amount of the base or acid used is a catalytic amount, and is particularly preferably 0.001 to 10% by mass based on the total amount of the alkoxysilane of formula (1) and other silanes and / or siloxanes.
Moreover, a general solvent may be used at the time of reaction, and the polar solvent shown above is especially preferable.
反応温度は、0〜150℃の範囲であればよく、好ましくは10〜100℃の範囲である。反応温度が150℃より高いと不均化反応などの副反応により、所望の生成物の収率が低下する場合がある。また反応時間は反応温度にもよるが、30分〜24時間の範囲であればよい。好ましくは1〜10時間の範囲である。 The reaction temperature should just be the range of 0-150 degreeC, Preferably it is the range of 10-100 degreeC. If the reaction temperature is higher than 150 ° C., the yield of the desired product may decrease due to side reactions such as disproportionation. The reaction time depends on the reaction temperature, but may be in the range of 30 minutes to 24 hours. Preferably it is the range of 1 to 10 hours.
前記製造方法(IV)は、前記式(4)の(メタ)アクリル基含有ヒドロキシベンゾトリアゾールと、下記平均組成式(6)で表されるメルカプト基含有ポリオルガノシロキサンとを、塩基の存在下で反応させるものである。 In the production method (IV), the (meth) acryl group-containing hydroxybenzotriazole of the formula (4) and the mercapto group-containing polyorganosiloxane represented by the following average composition formula (6) are added in the presence of a base. It is what makes it react.
上記式(6)中、YはHS−R36−で表されるメルカプト基含有基である。R36は炭素数1〜8の二価炭化水素基であり、具体的には、メチレン基、エチレン基、プロピレン基、メチルエチレン基、ブチレン基、ヘキサメチレン基等のアルキレン基、シクロへキシレン基等のシクロアルキレン基、フェニレン基、トリレン基、キシリレン基等のアリーレン基、これらの基の水素原子の一部をハロゲン原子で置換した基、及び上記アルキレン基とアリーレン基とを組み合わせた基から選ばれる二価炭化水素基などが挙げられる。
また、R,R2,m,n,p,qは、上記と同様である。
In the above formula (6), Y is a mercapto group-containing group represented by HS—R 36 —. R 36 is a divalent hydrocarbon group having 1 to 8 carbon atoms, specifically, an alkylene group such as a methylene group, an ethylene group, a propylene group, a methylethylene group, a butylene group or a hexamethylene group, or a cyclohexylene group. Selected from arylene groups such as cycloalkylene groups such as phenylene groups, tolylene groups, and xylylene groups, groups in which some of the hydrogen atoms of these groups are substituted with halogen atoms, and groups in which the above alkylene groups and arylene groups are combined. And divalent hydrocarbon groups.
R, R 2 , m, n, p, and q are the same as described above.
前記一般式(6)で表されるメルカプト基含有ポリオルガノシロキサンは、公知の反応により得ることができる。例えば、(a)各種加水分解性シラン及び/又はその(部分)加水分解縮合物とメルカプト基を含有する加水分解性シラン及び/又はその(部分)加水分解縮合物との共加水分解縮合反応、(b)各種ポリオルガノシロキサンとメルカプト基を含有するオルガノシラン及び/又はその加水分解縮合物との酸触媒存在下における平衡化反応を挙げることができる。前記反応に用いられる原料としては、前記で示した例と同じである。 The mercapto group-containing polyorganosiloxane represented by the general formula (6) can be obtained by a known reaction. For example, (a) various hydrolyzable silanes and / or their (partial) hydrolysis condensates and mercapto group-containing hydrolyzable silanes and / or their (partial) hydrolysis condensates, (B) An equilibration reaction in the presence of an acid catalyst between various polyorganosiloxanes and an organosilane containing a mercapto group and / or a hydrolysis condensate thereof can be mentioned. The raw material used for the reaction is the same as the example shown above.
また、前記製造方法(IV)は、式(4)のベンゾトリアゾール1モルに対し、式(6)のポリオルガノシロキサンを0.01〜3.0モル、特に0.1〜1.0モル用いることが好ましく、塩基の存在下、前記式(6)のメルカプト基含有ポリオルガノシロキサン中に、前記式(4)の(メタ)アクリル基含有ヒドロキシベンゾトリアゾールを滴下すればよく、また(メタ)アクリル基含有ヒドロキシベンゾトリアゾール中に、メルカプト基含有ポリオルガノシロキサンを滴下してもよい。 Moreover, the said manufacturing method (IV) uses 0.01-3.0 mol, especially 0.1-1.0 mol of polyorganosiloxane of Formula (6) with respect to 1 mol of benzotriazole of Formula (4). In the presence of a base, the (meth) acrylic group-containing hydroxybenzotriazole of the above formula (4) may be dropped into the mercapto group-containing polyorganosiloxane of the above formula (6). A mercapto group-containing polyorganosiloxane may be dropped into the group-containing hydroxybenzotriazole.
塩基としては、前記に示した通りであり、その使用量は適宜選定されるが、式(6)のポリオルガノシロキサン1モルに対し、0.001〜0.5モル比が好ましく、反応時には、一般的な溶剤を使用してもよく、中でも前記に示した極性溶剤が好ましい。 The base is as described above, and the amount used is appropriately selected, but a molar ratio of 0.001 to 0.5 is preferable with respect to 1 mol of the polyorganosiloxane of formula (6). Common solvents may be used, and the polar solvents shown above are particularly preferable.
反応温度は、0〜150℃の範囲であればよく、好ましくは10〜100℃の範囲である。反応温度が150℃より高いと式(4)のベンゾトリアゾールや目的物である式(2)のポリオルガノシロキサンのエステル結合が切断され、収率が低下する場合がある。また反応時間は反応温度にもよるが、30分〜24時間の範囲であればよく、好ましくは1〜6時間の範囲である。 The reaction temperature should just be the range of 0-150 degreeC, Preferably it is the range of 10-100 degreeC. When the reaction temperature is higher than 150 ° C., the ester bond of the benzotriazole of the formula (4) or the polyorganosiloxane of the formula (2) which is the target product may be cleaved and the yield may be lowered. The reaction time depends on the reaction temperature, but may be in the range of 30 minutes to 24 hours, preferably in the range of 1 to 6 hours.
本発明のコーティング組成物は、上記一般式(1)で表されるアルコキシシラン及び/又は上記平均組成式(2)で表されるポリオルガノシロキサンを含有してなるものであり、好ましくは上記有機ケイ素化合物と、硬化触媒と、その他のポリオルガノシロキサンやアクリル樹脂などの合成樹脂とを含有してなるものである。 The coating composition of the present invention comprises an alkoxysilane represented by the above general formula (1) and / or a polyorganosiloxane represented by the above average composition formula (2), preferably the above organic It contains a silicon compound, a curing catalyst, and other synthetic resins such as polyorganosiloxane and acrylic resin.
ここで、硬化触媒としては、アルコキシシラン又はシラノールを加水分解・縮合させる公知の触媒である。例えば、テトラメチルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、トリメチルベンジルアンモニウムヒドロキシド、テトラブチルホスホニウムヒドロキシドなどの4級オニウムヒドロキシド;これらのヒドロキシド類とハロゲン酸との塩、及び炭素数1〜4のカルボン酸との塩;蟻酸カリウム、酢酸ナトリウム、プロピオン酸カリウムなどのカルボン酸のアルカリ金属塩;酢酸アンモニウム、酢酸ジメチルアミン、酢酸エタノールアミン、ジメチルアニリン蟻酸塩などのアミンカルボキシレート;トリエチルアミン、トリエチレンジアミン、ベンジルトリメチルアミン、ピリジン、γ−アミノプロピルトリメトキシシランなどのアミン;水酸化ナトリウム、ナトリウムメトキシドなどのアルカリ金属の水酸化物あるいはアルコキシド;ジシアンジアミド、2−メチルイミダゾール、2−フェニルイミダゾールなどの変性(潜在性)アミン;酢酸、クエン酸、マレイン酸、フタル酸、テレフタル酸、ピロメリット酸などの有機酸又はこれらの酸無水物、塩酸、硝酸、硫酸、メタンスルホン酸、トルエンスルホン酸、リン化タングステン酸、リン化モリブデン酸などの無機酸;アルミニウムトリイソプロポキシド、チタンテトラブトキシド、トリアセチルアセトンアルミニウム、ジオクチル錫ジラウレート、オクチル酸亜鉛などの金属化合物などを挙げることができる。 Here, the curing catalyst is a known catalyst that hydrolyzes and condenses alkoxysilane or silanol. For example, quaternary onium hydroxides such as tetramethylammonium hydroxide, tetrabutylammonium hydroxide, trimethylbenzylammonium hydroxide, tetrabutylphosphonium hydroxide; salts of these hydroxides with halogen acids, and carbon number 1 to 4 salt with carboxylic acid; alkali metal salt of carboxylic acid such as potassium formate, sodium acetate, potassium propionate; amine carboxylate such as ammonium acetate, dimethylamine acetate, ethanolamine acetate, dimethylaniline formate; Amines such as ethylenediamine, benzyltrimethylamine, pyridine, and γ-aminopropyltrimethoxysilane; alkali metal hydroxides such as sodium hydroxide and sodium methoxide Is an alkoxide; a modified (latent) amine such as dicyandiamide, 2-methylimidazole, 2-phenylimidazole; an organic acid such as acetic acid, citric acid, maleic acid, phthalic acid, terephthalic acid, pyromellitic acid, or an acid anhydride thereof , Hydrochloric acid, nitric acid, sulfuric acid, methanesulfonic acid, toluenesulfonic acid, phosphotungstic acid, phosphomolybdic acid, etc .; aluminum triisopropoxide, titanium tetrabutoxide, triacetylacetone aluminum, dioctyltin dilaurate, zinc octylate And metal compounds such as
硬化触媒の配合量は、本発明のコーティング組成物中の全シラン及び/又はシロキサン成分を硬化させるのに有効な量であればよく、特に限定されるものではないが、具体的には、シリコーンレジンの固形分に対し、0.0001〜30質量%であることが好ましく、より好ましくは0.001〜10質量%である。0.0001質量%未満であると硬化が不十分となり、硬度が低下する場合があり、30質量%より多いと塗膜にクラックが発生しやすくなったり、耐水性が低下する場合がある。 The blending amount of the curing catalyst is not particularly limited as long as it is an amount effective for curing all silane and / or siloxane components in the coating composition of the present invention. It is preferable that it is 0.0001-30 mass% with respect to solid content of a resin, More preferably, it is 0.001-10 mass%. If it is less than 0.0001% by mass, curing may be insufficient and the hardness may be reduced, and if it is more than 30% by mass, cracks may easily occur in the coating film, and water resistance may be reduced.
本発明のコーティング組成物には、必要に応じて、溶剤、pH調整剤、レベリング剤、増粘剤、顔料、染料、金属酸化物微粒子、金属粉、酸化防止剤、紫外線吸収剤、紫外線安定剤、熱線反射・吸収性付与剤、可撓性付与剤、帯電防止剤、防汚性付与剤、撥水性付与剤等を本発明の効果に悪影響を与えない範囲内で添加することができる。 The coating composition of the present invention includes a solvent, a pH adjuster, a leveling agent, a thickener, a pigment, a dye, a metal oxide fine particle, a metal powder, an antioxidant, an ultraviolet absorber, and an ultraviolet stabilizer as necessary. Further, a heat ray reflection / absorption imparting agent, a flexibility imparting agent, an antistatic agent, an antifouling property imparting agent, a water repellency imparting agent and the like can be added within a range that does not adversely affect the effects of the present invention.
本発明のコーティング組成物には、塗工性、保存安定性を向上させる目的で、溶剤を添加してもよい。溶剤としては、本発明のシリコーンコーティング組成物中の固形分を溶解するものであれば特に限定されるものではないが、水及び比較的極性の高い有機溶剤が好ましい。有機溶剤の具体例としては、イソプロピルアルコール、n−ブタノール、イソブタノール、t−ブタノール、ジアセトンアルコールなどのアルコール類;メチルエチルケトン、ジエチルケトン、メチルイソブチルケトン、シクロヘキサノンなどのケトン類;ジプロピルエーテル、ジブチルエーテル、アニソール、テトラヒドロフラン、ジオキサン、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノメチルエーテルなどのエーテル類;酢酸プロピル、酢酸ブチル、酢酸シクロヘキシル、γ−ブチロラクトンなどのエステル類;ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドンなどのアミド類;アセチルアセトン、アセト酢酸エチルなどのβ−ジケトン、β−ケトエステルなどを挙げることができ、これらからなる群より選ばれた1種もしくは2種以上の混合物を使用することができる。 A solvent may be added to the coating composition of the present invention for the purpose of improving coatability and storage stability. The solvent is not particularly limited as long as it dissolves the solid content in the silicone coating composition of the present invention, but water and a relatively polar organic solvent are preferred. Specific examples of the organic solvent include alcohols such as isopropyl alcohol, n-butanol, isobutanol, t-butanol and diacetone alcohol; ketones such as methyl ethyl ketone, diethyl ketone, methyl isobutyl ketone and cyclohexanone; Ethers such as butyl ether, anisole, tetrahydrofuran, dioxane, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monopropyl ether, dipropylene glycol monomethyl ether; propyl acetate, acetic acid Esters such as butyl, cyclohexyl acetate and γ-butyrolactone; dimethyl Amides such as formamide, dimethylacetamide and N-methylpyrrolidone; β-diketones such as acetylacetone and ethyl acetoacetate; β-ketoesters and the like can be mentioned, and one or more selected from the group consisting of these Mixtures can be used.
本発明のコーティング組成物は、溶剤によりその固形分濃度を1〜30質量%、特に5〜25質量%に調整することが好ましい。この範囲外では該組成物を塗布、硬化した塗膜に不具合が生じることがある。例えば、上記範囲未満では塗膜にタレ、ヨリ、マダラが発生し易くなり、所望の硬度、耐擦傷性が得られない場合がある。また上記範囲を超えると、塗膜のブラッシング、白化、クラックが生じ易くなる場合がある。 The coating composition of the present invention is preferably adjusted to a solid content concentration of 1 to 30% by mass, particularly 5 to 25% by mass with a solvent. Outside this range, defects may occur in the coating film coated and cured with the composition. For example, when the amount is less than the above range, sagging, twisting, and spotting are likely to occur in the coating film, and desired hardness and scratch resistance may not be obtained. On the other hand, when the above range is exceeded, brushing, whitening and cracking of the coating film may easily occur.
本発明のコーティング組成物の更なる保存安定性を得るために、液のpHを、好ましくは2〜7、より好ましくは3〜6にするとよい。pHがこの範囲外であると、貯蔵性が低下することがあるため、pH調整剤を添加し、上記範囲に調整することもできる。コーティング組成物のpHが上記範囲外にあるときは、この範囲より酸性側であれば、アンモニア、エチレンジアミン等の塩基性化合物を添加してpHを調整すればよく、塩基性側であれば、塩酸、硝酸、酢酸、クエン酸等の酸性化合物を用いてpHを調整すればよい。しかし、その調整方法は特に限定されるものではない。 In order to obtain further storage stability of the coating composition of the present invention, the pH of the solution is preferably 2 to 7, more preferably 3 to 6. If the pH is outside this range, the storage stability may be lowered. Therefore, a pH adjuster may be added to adjust the pH to the above range. When the pH of the coating composition is outside the above range, the pH may be adjusted by adding a basic compound such as ammonia or ethylenediamine if it is more acidic than this range. PH may be adjusted using an acidic compound such as nitric acid, acetic acid and citric acid. However, the adjustment method is not particularly limited.
本発明のコーティング組成物には、塗工して得られる硬化塗膜の硬度や耐擦傷性の向上、低屈折率化、高屈折率化、紫外線カット性、帯電防止性、熱線反射・吸収性などの機能を更に付与する目的で、金属酸化物微粒子やその中空微粒子、チタン、亜鉛、ジルコニウムなどの金属キレート化合物、及びこれらの(部分)加水分解物、縮合物などを適宜添加することもできる。金属酸化物微粒子としては、その粒子形、粒子の粒径は特に問わないが、塗膜化した際の透明性を高めるために、粒子径は小さい方が好ましい。 The coating composition of the present invention has improved hardness and scratch resistance of a cured coating film obtained by coating, lower refractive index, higher refractive index, ultraviolet cut property, antistatic property, heat ray reflection / absorption For the purpose of further providing functions such as metal oxide fine particles, hollow fine particles thereof, metal chelate compounds such as titanium, zinc and zirconium, and (partial) hydrolysates and condensates thereof may be added as appropriate. . As the metal oxide fine particles, the particle shape and the particle size of the particles are not particularly limited, but in order to increase the transparency when formed into a coating film, it is preferable that the particle size is small.
金属酸化物微粒子の具体例としては、シリカ、アルミナ、酸化チタン、酸化セリウム、酸化スズ、酸化ジルコニウム、酸化アンチモン、酸化インジウム、酸化鉄、酸化鉄及び/又は酸化ジルコニウムをドープした酸化チタン、希土類酸化物の微粒子、これらの混合物、あるいはこれらの複合酸化物微粒子などが挙げられるが、特に限定されるものではない。これら金属酸化物微粒子はコロイド分散液となっているものを使用してもよいし、粉末状のものをコーティング組成物に分散させてもよく、更にこれらを、シラン系、チタン系、アルミニウム系、あるいはジルコニウム系カップリング剤等の有機金属化合物、カルボン酸含有有機化合物、含窒素有機化合物などで表面処理したものを使用してもよい。
これら金属酸化物微粒子の添加量は、コーティング組成物の全樹脂成分に対し、0.1〜300質量%、特に1〜100質量%であることが好ましい。
Specific examples of the metal oxide fine particles include silica, alumina, titanium oxide, cerium oxide, tin oxide, zirconium oxide, antimony oxide, indium oxide, iron oxide, iron oxide and / or titanium oxide doped with zirconium oxide, rare earth oxidation. There may be mentioned, but not limited to, fine particles of a product, a mixture thereof, or a composite oxide fine particle thereof. These metal oxide fine particles may be used in the form of a colloidal dispersion, or may be dispersed in the form of a powder in a coating composition, and further, these may be silane-based, titanium-based, aluminum-based, Or you may use what surface-treated with organometallic compounds, such as a zirconium type coupling agent, a carboxylic acid containing organic compound, a nitrogen-containing organic compound.
The addition amount of these metal oxide fine particles is preferably 0.1 to 300% by mass, particularly 1 to 100% by mass, based on all resin components of the coating composition.
また、本発明のコーティング組成物には、接着性向上及び更なる可撓性の付与を目的として、該組成物と反応しうる官能基を有するビニル重合体を含んでもよい。該組成物と反応しうる官能基としては、トリメトキシシリル基、トリエトキシシリル基、ジメトキシメチルシリル基、メトキシジメチルシリル基などの加水分解性シリル基、これらの(部分)加水分解したヒドロキシシリル基を挙げることができ、更に該組成物の有効成分中にエポキシ基が含まれていれば、アミノ基、カルボン酸基などを含有する有機基、また該組成物の有効成分中にアミノ基が含まれていれば、エポキシ基、カルボン酸基、(メタ)アクリル基などを含有する有機基を挙げることができる。なかでも保存安定性の面から、加水分解性シリル基、これらの(部分)加水分解したヒドロキシシリル基が好ましい。特に、(メタ)アクリル酸メチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸2−エチルヘキシル、(メタ)アクリル酸シクロヘキシルメチル、(メタ)アクリル酸グリシジル、(メタ)アクリル酸アミド、(メタ)アクリル酸、ベンゾトリアゾール基やヒドロキシベンゾフェノン基等を有する紫外線吸収性(メタ)アクリル酸エステルモノマー、ヒンダードアミン基を有する紫外線安定性(メタ)アクリル酸エステルモノマーなどの各種(メタ)アクリル酸、及びその誘導体、あるいは酢酸ビニル等の各種ビニル重合性モノマーと、(メタ)アクリロキシ基を有するアルコキシシラン、あるいはビニル基及び/又はスチリル基含有アルコキシシランを共重合させたものが好ましい。
その添加量は、コーティング組成物の全樹脂成分に対し、0.1〜100質量%、特に1〜50質量%であることが好ましい。
In addition, the coating composition of the present invention may contain a vinyl polymer having a functional group capable of reacting with the composition for the purpose of improving adhesion and imparting further flexibility. Examples of functional groups capable of reacting with the composition include hydrolyzable silyl groups such as trimethoxysilyl group, triethoxysilyl group, dimethoxymethylsilyl group, methoxydimethylsilyl group, and (partially) hydrolyzed hydroxysilyl groups thereof. In addition, if an epoxy group is contained in the active ingredient of the composition, an organic group containing an amino group, a carboxylic acid group, etc., or an amino group is contained in the active ingredient of the composition Examples of the organic group include an epoxy group, a carboxylic acid group, and a (meth) acryl group. Of these, hydrolyzable silyl groups, and (partially) hydrolyzed hydroxysilyl groups are preferred from the standpoint of storage stability. In particular, methyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, cyclohexylmethyl (meth) acrylate, glycidyl (meth) acrylate, (meth) acrylic amide, (meth) Various (meth) acrylic acids such as acrylic acid, UV-absorbing (meth) acrylic acid ester monomer having benzotriazole group or hydroxybenzophenone group, and UV-stable (meth) acrylic acid ester monomer having hindered amine group, and derivatives thereof Alternatively, a copolymer obtained by copolymerizing various vinyl polymerizable monomers such as vinyl acetate and an alkoxysilane having a (meth) acryloxy group or a vinyl group and / or a styryl group-containing alkoxysilane is preferable.
The amount of addition is preferably 0.1 to 100% by mass, particularly 1 to 50% by mass, based on the total resin components of the coating composition.
本発明のコーティング組成物を塗布する基材が有機樹脂や木材製品である場合、基材の黄変、表面劣化を防ぐ目的で、更にその他の紫外線吸収剤及び/又は紫外線安定剤を添加することもでき、この場合、本発明のコーティング組成物と相溶性が良好で、かつ揮発性の低い紫外線吸収剤及び/又は紫外線安定剤を用いることが好ましい。 When the substrate on which the coating composition of the present invention is applied is an organic resin or wood product, other ultraviolet absorbers and / or ultraviolet stabilizers are added for the purpose of preventing yellowing of the substrate and surface deterioration. In this case, it is preferable to use an ultraviolet absorber and / or an ultraviolet stabilizer having good compatibility with the coating composition of the present invention and low volatility.
紫外線吸収剤としては、酸化チタン、酸化セリウム、酸化ジルコニウムなど上述したある種の酸化物微粒子やチタン、亜鉛、ジルコニウムなどの金属キレート化合物、及びこれらの(部分)加水分解物、縮合物の無機系のものと有機系のものを用いることができる。有機系の例として、主骨格がヒドロキシベンゾフェノン系、ベンゾトリアゾール系、シアノアクリレート系、トリアジン系である化合物誘導体が好ましい。更に側鎖にこれら紫外線吸収剤を含有するビニルポリマーなどの重合体、及び他のビニルモノマーとの共重合体、又は本発明のアルコキシシラン及び/又はポリオルガノシロキサン以外のシリル化変性された紫外線吸収剤、その(部分)加水分解縮合物でもよい。 Examples of ultraviolet absorbers include the above-described oxide fine particles such as titanium oxide, cerium oxide, and zirconium oxide, and metal chelate compounds such as titanium, zinc, and zirconium, and (partial) hydrolysates and condensate inorganic systems. And organic ones can be used. As organic examples, compound derivatives whose main skeleton is hydroxybenzophenone, benzotriazole, cyanoacrylate, or triazine are preferable. Further, polymers such as vinyl polymers containing these UV absorbers in the side chain, copolymers with other vinyl monomers, or silylated and modified UV absorbers other than the alkoxysilane and / or polyorganosiloxane of the present invention. It may be an agent or its (partial) hydrolysis condensate.
具体的には、2,4−ジヒドロキシベンゾフェノン、2,2’,4,4’−テトラヒドロキシベンゾフェノン、2−ヒドロキシ−4−メトキシベンゾフェノン、2−ヒドロキシ−4−メトキシベンゾフェノン−5−スルホン酸、2−ヒドロキシ−4−n−オクトキシベンゾフェノン、2−ヒドロキシ−4−n−ドデシロキシベンゾフェノン、2−ヒドロキシ−4−n−ベンジロキシベンゾフェノン、2,2’−ジヒドロキシ−4,4’−ジメトキシベンゾフェノン、2,2’−ジヒドロキシ−4,4’−ジエトキシベンゾフェノン、2,2’−ジヒドロキシ−4,4’−ジプロポキシベンゾフェノン、2,2’−ジヒドロキシ−4,4’−ジブトキシベンゾフェノン、2,2’−ジヒドロキシ−4−メトキシ−4’−プロポキシベンゾフェノン、2,2’−ジヒドロキシ−4−メトキシ−4’−ブトキシベンゾフェノン、2,3,4−トリヒドロキシベンゾフェノン、2−(2−ヒドロキシ−5−メチルフェニル)ベンゾトリアゾール、2−(2−ヒドロキシ−5−オクチルフェニル)ベンゾトリアゾール、2−(2−ヒドロキシ−3,5−ジ−t−ブチルフェニル)ベンゾトリアゾール、エチル−2−シアノ−3,3−ジフェニルアクリレート、2−エチルヘキシル−2−シアノ−3,3−ジフェニルアクリレート、2−(2−ヒドロキシ−4−ヘキシルオキシフェニル)−4,6−ジフェニルトリアジン、2−ヒドロキシ−4−(2−アクリロキシエトキシ)ベンゾフェノンの(共)重合体、2−(2’−ヒドロキシ−5’−メタクリロキシエチルフェニル)−2H−ベンゾトリアゾールの(共)重合体、2,4−ジヒドロキシベンゾフェノンとγ−グリシドキシプロピルトリメトキシシランとの反応物、2,2’,4,4’−テトラヒドロキシベンゾフェノンとγ−グリシドキシプロピルトリメトキシシランとの反応物、これらの(部分)加水分解物などが挙げられる。これらの有機系紫外線吸収剤は2種以上を併用してもよい。 Specifically, 2,4-dihydroxybenzophenone, 2,2 ′, 4,4′-tetrahydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, 2 -Hydroxy-4-n-octoxybenzophenone, 2-hydroxy-4-n-dodecyloxybenzophenone, 2-hydroxy-4-n-benzyloxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone 2,2′-dihydroxy-4,4′-diethoxybenzophenone, 2,2′-dihydroxy-4,4′-dipropoxybenzophenone, 2,2′-dihydroxy-4,4′-dibutoxybenzophenone, 2, , 2'-Dihydroxy-4-methoxy-4'-propoxybenzopheno 2,2′-dihydroxy-4-methoxy-4′-butoxybenzophenone, 2,3,4-trihydroxybenzophenone, 2- (2-hydroxy-5-methylphenyl) benzotriazole, 2- (2-hydroxy- 5-octylphenyl) benzotriazole, 2- (2-hydroxy-3,5-di-t-butylphenyl) benzotriazole, ethyl-2-cyano-3,3-diphenyl acrylate, 2-ethylhexyl-2-cyano- (Co) polymer of 3,3-diphenyl acrylate, 2- (2-hydroxy-4-hexyloxyphenyl) -4,6-diphenyltriazine, 2-hydroxy-4- (2-acryloxyethoxy) benzophenone, 2 -(2'-hydroxy-5'-methacryloxyethylphenyl) -2H-benzoto (Co) polymer of azole, reaction product of 2,4-dihydroxybenzophenone and γ-glycidoxypropyltrimethoxysilane, 2,2 ′, 4,4′-tetrahydroxybenzophenone and γ-glycidoxypropyltri A reaction product with methoxysilane, a (partial) hydrolyzate thereof, and the like. Two or more of these organic ultraviolet absorbers may be used in combination.
紫外線安定剤としては、分子内に1個以上の環状ヒンダードアミン構造を有し、本発明のコーティング組成物との相溶性がよく、また低揮発性のものが好ましい。紫外線光安定剤の具体例としては、3−ドデシル−1−(2,2,6,6−テトラメチル−4−ピペリジニル)ピロリジン−2,5−ジオン、N−メチル−3−ドデシル−1−(2,2,6,6−テトラメチル−4−ピペリジニル)ピロリジン−2,5−ジオン、N−アセチル−3−ドデシル−1−(2,2,6,6−テトラメチル−4−ピペリジニル)ピロリジン−2,5−ジオン、セバシン酸ビス(2,2,6,6−テトラメチル−4−ピペリジル)、セバシン酸ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)、テトラキス(2,2,6,6−テトラメチル−4−ピペリジル)−1,2,3,4−ブタンテトラカルボキシレート、テトラキス(1,2,2,6,6−ペンタメチル−4−ピペリジル)−1,2,3,4−ブタンテトラカルボキシレート、1,2,3,4−ブタンテトラカルボン酸と2,2,6,6−テトラメチル−ピペリジノールとトリデカノールとの縮合物、8−アセチル−3−ドデシル−7,7,9,9−テトラメチル−1,3,8−トリアザスピロ[4,5]デカン−2,4−ジオン、1,2,3,4−ブタンテトラカルボン酸と1,2,2,6,6−ペンタメチル−4−ピペリジノールとβ,β,β,β’−テトラメチル−3,9−(2,4,8,10−テトラオキサスピロ[5,5]ウンデカン)ジエタノールとの縮合物、1,2,3,4−ブタンテトラカルボン酸と1,2,2,6,6−ペンタメチル−4−ピペリジノールとβ,β,β,β’−テトラメチル−3,9−(2,4,8,10−テトラオキサスピロ[5,5]ウンデカン)ジエタノールとの縮合物、また、光安定剤を固定化させる目的で、特公昭61−56187号公報にあるようなシリル化変性の光安定剤、例えば、2,2,6,6−テトラメチルピペリジノ−4−プロピルトリメトキシシラン、2,2,6,6−テトラメチルピペリジノ−4−プロピルメチルジメトキシシラン、2,2,6,6−テトラメチルピペリジノ−4−プロピルトリエトキシシラン、2,2,6,6−テトラメチルピペリジノ−4−プロピルメチルジエトキシシラン、更にこれらの(部分)加水分解物等が挙げられ、これらの光安定剤は2種以上併用してもよい。 As the UV stabilizer, one having at least one cyclic hindered amine structure in the molecule, good compatibility with the coating composition of the present invention, and low volatility is preferable. Specific examples of the ultraviolet light stabilizer include 3-dodecyl-1- (2,2,6,6-tetramethyl-4-piperidinyl) pyrrolidine-2,5-dione, N-methyl-3-dodecyl-1- (2,2,6,6-tetramethyl-4-piperidinyl) pyrrolidine-2,5-dione, N-acetyl-3-dodecyl-1- (2,2,6,6-tetramethyl-4-piperidinyl) Pyrrolidine-2,5-dione, bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, tetrakis (2,2,6,6-tetramethyl-4-piperidyl) -1,2,3,4-butanetetracarboxylate, tetrakis (1,2,2,6,6-pentamethyl-4-piperidyl) -1 , 2,3,4-bu Tetracarboxylate, condensate of 1,2,3,4-butanetetracarboxylic acid with 2,2,6,6-tetramethyl-piperidinol and tridecanol, 8-acetyl-3-dodecyl-7,7,9 , 9-Tetramethyl-1,3,8-triazaspiro [4,5] decane-2,4-dione, 1,2,3,4-butanetetracarboxylic acid and 1,2,2,6,6-pentamethyl A condensate of -4-piperidinol and β, β, β, β′-tetramethyl-3,9- (2,4,8,10-tetraoxaspiro [5,5] undecane) diethanol, 1,2, 3,4-butanetetracarboxylic acid, 1,2,2,6,6-pentamethyl-4-piperidinol and β, β, β, β′-tetramethyl-3,9- (2,4,8,10- Tetraoxaspiro [5,5] undecane) di For the purpose of immobilizing a condensate with tanol or a light stabilizer, a silylated modified light stabilizer such as disclosed in JP-B-61-56187, for example, 2,2,6,6-tetramethylpi Peridino-4-propyltrimethoxysilane, 2,2,6,6-tetramethylpiperidino-4-propylmethyldimethoxysilane, 2,2,6,6-tetramethylpiperidino-4-propyltriethoxy Silane, 2,2,6,6-tetramethylpiperidino-4-propylmethyldiethoxysilane, (partial) hydrolyzate thereof, and the like. These light stabilizers are used in combination of two or more. Also good.
本発明のコーティング組成物は、通常の塗布方法で基材にコーティングすることができ、例えば、刷毛塗り、スプレー、浸漬、フロー、ロール、カーテン、スピン、ナイフコート等の各種塗布方法を選択することができる。 The coating composition of the present invention can be coated on a substrate by a usual application method, for example, selecting various application methods such as brush coating, spraying, dipping, flow, roll, curtain, spin, knife coating, etc. Can do.
コーティング組成物の塗膜の厚みは特に制限はないが、0.1〜50μmであることが好ましく、塗膜の硬さ、耐擦傷性、長期的に安定な密着性及びクラックが発生しにくいことを満たすためには、1〜20μmであることがより好ましい。厚みが0.1μm未満であると塗膜に欠損が生じやすくなったり、十分な紫外線吸収能を付与できない場合があり、50μmを超えると塗膜にクラックが発生しやすくなる場合がある。 Although there is no restriction | limiting in particular in the thickness of the coating film of a coating composition, it is preferable that it is 0.1-50 micrometers, and the hardness of a coating film, scratch resistance, long-term stable adhesiveness, and a crack are hard to generate | occur | produce. In order to satisfy | fill, it is more preferable that it is 1-20 micrometers. If the thickness is less than 0.1 μm, the coating film may be easily damaged or may not be provided with sufficient ultraviolet absorbing ability, and if it exceeds 50 μm, the coating film may be easily cracked.
本発明のコーティング組成物を塗布した後の硬化は、空気中に放置して風乾させてもよいし、加熱してもよい。硬化温度、硬化時間は限定されるものではないが、基材の耐熱温度以下で2分〜2時間加熱するのが好ましい。具体的には80〜150℃で5分〜2時間加熱するのがより好ましい。加熱硬化時間が2分未満であると硬化不十分となり、満足する塗膜硬度が得られにくい場合があり、2時間を超えると実用的ではない。 Curing after applying the coating composition of the present invention may be left in the air and air-dried, or may be heated. Although the curing temperature and the curing time are not limited, it is preferable to heat at a temperature lower than the heat resistant temperature of the substrate for 2 minutes to 2 hours. Specifically, heating at 80 to 150 ° C. for 5 minutes to 2 hours is more preferable. If the heat curing time is less than 2 minutes, curing is insufficient, and satisfactory coating film hardness may be difficult to obtain, and if it exceeds 2 hours, it is not practical.
ここで、用いる基材としては、プラスチック成形体等の有機樹脂、木材系製品、繊維、セラミックス、ガラス、金属、あるいはそれらの複合物等が挙げられ、特に限定されることはないが、各種プラスチック材料に好適に使用され、特にポリカーボネート樹脂、ポリスチレン樹脂、アクリル樹脂、変性アクリル樹脂、ウレタン樹脂、チオウレタン樹脂、ハロゲン化ビスフェノールAとエチレングリコールの重縮合物、アクリルウレタン樹脂、ハロゲン化アリール基含有アクリル樹脂、含硫黄樹脂、ポリアルキレンテレフタレート樹脂、セルロース樹脂、非晶質ポリオレフィン樹脂等、及びこれらの複合化樹脂が好ましい。更にこれらの樹脂基材の表面が処理されたもの、具体的には、化成処理、コロナ放電処理、プラズマ処理、酸やアルカリ液での処理、及び基材本体と表層が異なる種類の樹脂で形成されている積層体を用いることもできる。積層体の例としては、共押し出し法やラミネート法により製造されたポリカーボネート樹脂基材の表層にアクリル樹脂層もしくはウレタン樹脂層が存在する積層体、又はポリエステル樹脂基材の表層にアクリル樹脂層が存在する積層体等が挙げられる。 Here, examples of the substrate to be used include organic resins such as plastic moldings, wood products, fibers, ceramics, glass, metals, and composites thereof. Suitable for use in materials, especially polycarbonate resin, polystyrene resin, acrylic resin, modified acrylic resin, urethane resin, thiourethane resin, polycondensate of halogenated bisphenol A and ethylene glycol, acrylic urethane resin, halogenated aryl group-containing acrylic Resins, sulfur-containing resins, polyalkylene terephthalate resins, cellulose resins, amorphous polyolefin resins, and the like, and composite resins thereof are preferable. Further, the surface of these resin base materials is treated, specifically, chemical conversion treatment, corona discharge treatment, plasma treatment, treatment with acid or alkaline liquid, and the base material body and the surface layer are formed of different types of resins. The laminated body currently used can also be used. Examples of laminates include laminates in which an acrylic resin layer or urethane resin layer is present on the surface layer of a polycarbonate resin substrate manufactured by a coextrusion method or a laminate method, or an acrylic resin layer is present in the surface layer of a polyester resin substrate. And the like.
なお、コーティングの際、基材表面に、直接又は必要に応じてプライマー層や紫外線吸収層、印刷層、記録層、熱線遮蔽層、粘着層、無機蒸着膜層等を介して形成することもできる。 In addition, it can also be formed on the surface of the substrate directly or as necessary via a primer layer, an ultraviolet absorbing layer, a printing layer, a recording layer, a heat ray shielding layer, an adhesive layer, an inorganic vapor deposition film layer, etc. during coating. .
更に必要に応じて、本発明のコーティング組成物の硬化塗膜の表面上に、紫外線吸収層、印刷層、記録層、熱線遮蔽層、粘着層、無機蒸着膜層、撥水撥油層、親水防汚層などの他の被覆層を塗工してもよい。 Further, if necessary, on the surface of the cured coating film of the coating composition of the present invention, an ultraviolet absorbing layer, a printing layer, a recording layer, a heat ray shielding layer, an adhesive layer, an inorganic vapor-deposited film layer, a water- and oil-repellent layer, and a hydrophilic layer. Other coating layers such as a dirty layer may be applied.
このようにして得られた本発明のコーティング組成物の硬化物にて被覆された被覆物品は、紫外線カット性、耐熱性、耐水性、耐ブリードアウト性に優れたものとなり得る。 The coated article coated with the cured product of the coating composition of the present invention thus obtained can be excellent in ultraviolet cut property, heat resistance, water resistance and bleed out resistance.
以下、実施例及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。なお、下記の例において、特に断らない限り、「部」及び「%」はそれぞれ「質量部」及び「質量%」を意味する。また、重量平均分子量は、GPCによるポリスチレン換算の重量平均分子量である。 EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example. In the following examples, “part” and “%” mean “part by mass” and “% by mass”, respectively, unless otherwise specified. Moreover, a weight average molecular weight is a weight average molecular weight of polystyrene conversion by GPC.
<有機ケイ素化合物の調製>
[実施例1]
2Lのフラスコに、KBM−803(信越化学工業製;3−メルカプトプロピルトリメトキシシラン)196g(1.0モル)を仕込み、攪拌下、SM−28(川研ファインケミカル製;ナトリウムメトキシドの28%メタノール溶液)25gを滴下した。次いで、RUVA−93{大塚化学製;2−(2’−ヒドロキシ−5’−メタクリロキシエチルフェニル)−2H−ベンゾトリアゾール}323gをテトラヒドロフラン969gに予め溶解した溶液を、内温が40℃を超えないよう、冷却しながら滴下した。滴下終了後、60℃で4時間反応させた。次いで、メタンスルホン酸12.5gを投入、室温にて攪拌し、系を中和した。更に減圧濃縮後、シリカゲルを充填したカラムに通し、黄褐色透明溶液を得た。この溶液の溶剤を減圧にて除去したところ、黄褐色の粘ちょう液体を得た。この液体は、プロトン核磁気共鳴スペクトル(1H−NMR;図1)及び赤外吸収スペクトル(IR;図2)の結果から、下記式で示される化合物(純度89%)(化合物A)であった。
<Preparation of organosilicon compound>
[Example 1]
Into a 2 L flask, 196 g (1.0 mol) of KBM-803 (manufactured by Shin-Etsu Chemical; 3-mercaptopropyltrimethoxysilane) was charged, and under stirring, SM-28 (manufactured by Kawaken Fine Chemicals; 28% of sodium methoxide) 25 g of methanol solution was added dropwise. Next, a solution in which 323 g of RUVA-93 {manufactured by Otsuka Chemical; 2- (2′-hydroxy-5′-methacryloxyethylphenyl) -2H-benzotriazole} is dissolved in 969 g of tetrahydrofuran in advance has an internal temperature exceeding 40 ° C. The solution was added dropwise while cooling. After completion of dropping, the reaction was carried out at 60 ° C. for 4 hours. Next, 12.5 g of methanesulfonic acid was added and stirred at room temperature to neutralize the system. After further concentration under reduced pressure, the solution was passed through a column filled with silica gel to obtain a yellowish brown transparent solution. When the solvent of this solution was removed under reduced pressure, a tan viscous liquid was obtained. From the results of proton nuclear magnetic resonance spectrum (1H-NMR; FIG. 1) and infrared absorption spectrum (IR; FIG. 2), this liquid was a compound represented by the following formula (purity 89%) (compound A). .
[実施例2]
2Lのフラスコに、化合物A22g(0.04モル)、メチルトリメトキシシラン338g(2.24モル)、シリケート35(多摩化学工業製;テトラエトキシシランの部分加水分解縮合物、平均2量体)56g(0.16モル、0.33Siモル)、及びテトラヒドロフラン40gを仕込み、よく混合させた。次いで0.25Nの酢酸水溶液308gを滴下し、内温が40℃を超えないように冷却しながら加水分解を行った。滴下終了後、40℃以下で1時間、次いで60℃で3時間撹拌し、加水分解を完結させた。
[Example 2]
In a 2 L flask, compound A 22 g (0.04 mol), methyltrimethoxysilane 338 g (2.24 mol), silicate 35 (manufactured by Tama Chemical Industry; partial hydrolysis condensate of tetraethoxysilane, average dimer) 56 g (0.16 mol, 0.33 Si mol) and 40 g of tetrahydrofuran were charged and mixed well. Then, 308 g of a 0.25N acetic acid aqueous solution was dropped, and hydrolysis was performed while cooling so that the internal temperature did not exceed 40 ° C. After completion of dropping, the mixture was stirred at 40 ° C. or lower for 1 hour and then at 60 ° C. for 3 hours to complete the hydrolysis.
その後、シクロヘキサノン300gを投入し、加水分解で生成したメタノール及びエタノールを、常圧にて液温が95℃になるまで留去しながら縮合させた後、不揮発分濃度が20%になるようイソプロパノールで希釈し、濾紙濾過を行い、淡黄色透明のポリオルガノシロキサンBの溶液を得た。 Thereafter, 300 g of cyclohexanone was added, and the methanol and ethanol produced by hydrolysis were condensed while distilling off at normal pressure until the liquid temperature reached 95 ° C., and then with isopropanol so that the nonvolatile content concentration became 20%. Dilution and filtration with filter paper were performed to obtain a pale yellow transparent polyorganosiloxane B solution.
このものは、ケイ素核磁気共鳴スペクトル(29Si−NMR)の結果から、下記の平均組成式で表されるポリオルガノシロキサンであり、ゲルパーミエーションクロマトグラフ(GPC)による重量平均分子量Mwは7,800であった。 This is a polyorganosiloxane represented by the following average composition formula from the result of silicon nuclear magnetic resonance spectrum ( 29 Si-NMR), and the weight average molecular weight Mw by gel permeation chromatography (GPC) is 7, 800.
[実施例3]
2Lのフラスコに、一般式
(CH3O)3Si−CH2CH2−[(CH3)2SiO]d'(CH3)2Si−CH2CH2−Si(OCH3)3
{d’は平均で5である。}
30g(0.04モル)、化合物A33g(0.06モル)、及びテトラヒドロフラン38gを仕込み、よく混合させた。次いで0.05Nの硝酸水溶液50gを滴下し、内温が40℃を超えないように冷却しながら加水分解を行った。滴下終了後、40℃以下で2時間攪拌、次いで0.05Nの硝酸水溶液260gと、予め調製したメチルトリメトキシシラン330g(2.43モル)とテトラエトキシシラン104g(0.5モル)の混合物を順に投入し、40℃以下で1時間、次いで60℃で3時間撹拌し、加水分解を完結させた。
[Example 3]
In a 2 L flask, the general formula (CH 3 O) 3 Si—CH 2 CH 2 — [(CH 3 ) 2 SiO] d ′ (CH 3 ) 2 Si—CH 2 CH 2 —Si (OCH 3 ) 3
{D ′ is 5 on average. }
30 g (0.04 mol), 33 g (0.06 mol) of Compound A, and 38 g of tetrahydrofuran were charged and mixed well. Subsequently, 50 g of 0.05N nitric acid aqueous solution was dropped, and hydrolysis was performed while cooling so that the internal temperature did not exceed 40 ° C. After completion of the dropping, the mixture was stirred at 40 ° C. or lower for 2 hours, and then a mixture of 260 g of 0.05N nitric acid aqueous solution, 330 g (2.43 mol) of methyltrimethoxysilane and 104 g (0.5 mol) of tetraethoxysilane prepared in advance. Stirring was carried out in order, and the mixture was stirred at 40 ° C. or lower for 1 hour and then at 60 ° C. for 3 hours to complete the hydrolysis.
その後、プロピレングリコールモノメチルエーテルアセテート300gを投入し、加水分解で生成したメタノール及びエタノールを、常圧にて液温が95℃になるまで留去しながら縮合させた後、不揮発分濃度が20%になるようイソプロパノールで希釈し、濾紙濾過を行い、淡黄色透明のポリオルガノシロキサンCの溶液を得た。 Thereafter, 300 g of propylene glycol monomethyl ether acetate was added, and the methanol and ethanol produced by hydrolysis were condensed while being distilled off at normal pressure until the liquid temperature reached 95 ° C., and then the nonvolatile content concentration was reduced to 20%. The solution was diluted with isopropanol and filtered through filter paper to obtain a pale yellow transparent polyorganosiloxane C solution.
このものは、29Si−NMR及び炭素核磁気共鳴スペクトル(13C−NMR)の結果から、下記の平均組成式で表されるポリオルガノシロキサンであり、GPCによる重量平均分子量Mwは6,400であった。 This is a polyorganosiloxane represented by the following average composition formula from the results of 29 Si-NMR and carbon nuclear magnetic resonance spectrum ( 13 C-NMR), and the weight average molecular weight Mw by GPC is 6,400. there were.
[実施例4]
2Lのフラスコに、オクタメチルシクロテトラシロキサン716g(2.42モル)、ヘキサメチルジシロキサン36g(0.22モル)、及びメルカプトプロピルメチルジクロロシランの加水分解縮合物118g(0.88Siモル)を仕込み、よく混合させた。次いで110℃にて2時間攪拌し、脱水留去を行った。その後、室温まで冷却し、活性白土(和光純薬工業製)48gを投入し、80℃にて7時間攪拌し、重合を行った。室温まで冷却後、濾過により活性白土を取り除き、無色透明のメルカプト基含有ポリオルガノシロキサン(メルカプト当量980)を得た。
[Example 4]
A 2 L flask is charged with 716 g (2.42 mol) of octamethylcyclotetrasiloxane, 36 g (0.22 mol) of hexamethyldisiloxane, and 118 g (0.88 Si mol) of a hydrolytic condensate of mercaptopropylmethyldichlorosilane. And mixed well. Subsequently, it stirred at 110 degreeC for 2 hours, and dehydration distillation was performed. Thereafter, the mixture was cooled to room temperature, 48 g of activated clay (manufactured by Wako Pure Chemical Industries, Ltd.) was added, and the mixture was stirred at 80 ° C. for 7 hours for polymerization. After cooling to room temperature, the activated clay was removed by filtration to obtain a colorless and transparent mercapto group-containing polyorganosiloxane (mercapto equivalent 980).
2Lのフラスコに、得られたメルカプト基含有ポリオルガノシロキサン700g及び陰イオン交換樹脂IRA−900(OH)−HG(オルガノ製)25gを仕込み、よく攪拌した。次いで、RUVA−93{大塚化学製;2−(2’−ヒドロキシ−5’−メタクリロキシエチルフェニル)−2H−ベンゾトリアゾール}183g(0.567モル)をテトラヒドロフラン800gに予め溶解した溶液を、室温にて滴下した。滴下終了後、60℃で24時間反応させ、陰イオン交換樹脂を濾別した濾液の溶剤を減圧にて除去後、黄色透明のポリオルガノシロキサンDを得た。このものは、29Si−NMR及び1H−NMRの結果から、下記の平均組成式で表されるポリオルガノシロキサンであり、GPCによる重量平均分子量Mwは5,500であった。 Into a 2 L flask, 700 g of the obtained mercapto group-containing polyorganosiloxane and 25 g of anion exchange resin IRA-900 (OH) -HG (manufactured by Organo) were charged and stirred well. Next, a solution in which 183 g (0.567 mol) of RUVA-93 {manufactured by Otsuka Chemical; 2- (2′-hydroxy-5′-methacryloxyethylphenyl) -2H-benzotriazole} in 800 g of tetrahydrofuran was dissolved in room temperature. It was dripped at. After completion of the dropwise addition, the mixture was reacted at 60 ° C. for 24 hours, and the solvent of the filtrate obtained by filtering off the anion exchange resin was removed under reduced pressure to obtain yellow transparent polyorganosiloxane D. This was a polyorganosiloxane represented by the following average composition formula from the results of 29 Si-NMR and 1H-NMR, and the weight average molecular weight Mw by GPC was 5,500.
[実施例5]
2Lのフラスコに、化合物A52g(0.10モル)、メチルトリエトキシシラン100g(0.56モル)、γ−グリシドキシプロピルトリメトキシシラン99g(0.42モル)、及び(CH3O)3SiCH2CH2−C4F8−CH2CH2Si(OCH3)3100g(0.20モル)を仕込み、よく混合した。次いで0.25N酢酸水溶液508gを滴下し、内温が40℃を超えないように冷却しながら加水分解を行った。滴下終了後、40℃以下で12時間攪拌し、メタノールシリカゾル(日産化学工業製;メタノール分散品、固形分30%)600gを投入し、室温で1時間攪拌した。その後、不揮発分濃度が20%になるようイソブタノールで希釈、濾紙濾過を行い、淡黄色殆ど透明のポリオルガノシロキサンEの溶液を得た。
[Example 5]
In a 2 L flask, 52 g (0.10 mol) of compound A, 100 g (0.56 mol) of methyltriethoxysilane, 99 g (0.42 mol) of γ-glycidoxypropyltrimethoxysilane, and (CH 3 O) 3 SiCH 2 CH 2 —C 4 F 8 —CH 2 CH 2 Si (OCH 3 ) 3 100 g (0.20 mol) was charged and mixed well. Subsequently, 508 g of 0.25N acetic acid aqueous solution was dropped, and hydrolysis was performed while cooling so that the internal temperature did not exceed 40 ° C. After completion of dropping, the mixture was stirred at 40 ° C. or lower for 12 hours, and 600 g of methanol silica sol (manufactured by Nissan Chemical Industries; methanol dispersion, solid content 30%) was added and stirred at room temperature for 1 hour. Thereafter, the solution was diluted with isobutanol so as to have a nonvolatile content concentration of 20% and filtered with a filter paper to obtain a pale yellow almost transparent polyorganosiloxane E solution.
このものは、29Si−NMR及び13C−NMRの結果から、下記の平均組成式で表されるポリオルガノシロキサンであり、GPCによる重量平均分子量Mwは1,100であった。 This was a polyorganosiloxane represented by the following average composition formula from the results of 29 Si-NMR and 13 C-NMR, and the weight average molecular weight Mw by GPC was 1,100.
[比較例1]
実施例2において、化合物Aを使用しないこと以外は、同様にして紫外線吸収性を有さないポリオルガノシロキサンFの溶液を得た。
[Comparative Example 1]
In Example 2, a solution of polyorganosiloxane F having no ultraviolet absorptivity was obtained in the same manner except that compound A was not used.
[比較例2]
実施例5において、化合物Aを使用しないこと以外は、同様にして紫外線吸収性を有さないポリオルガノシロキサンGの溶液を得た。
[Comparative Example 2]
In Example 5, a solution of polyorganosiloxane G having no ultraviolet absorptivity was obtained in the same manner except that compound A was not used.
<コーティング組成物の調製及び硬化被膜の評価>
[実施例6]
実施例2で得られたポリオルガノシロキサンBの溶液に、各種添加剤を表1に示した量で配合し、よく混合後、濾紙濾過を行い、コーティング組成物1を得た。これを石英ガラス板(厚さ1mm×長さ4cm×幅1cm)に流し塗り法により塗布し、130℃で1時間硬化させた。得られた塗膜に関して、透過スペクトルを測定したところ、図3に示したとおり、波長390nm以下の領域の紫外線を吸収していることが判明した。
<Preparation of coating composition and evaluation of cured film>
[Example 6]
Various additives were added to the polyorganosiloxane B solution obtained in Example 2 in the amounts shown in Table 1 and mixed well, followed by filtration with filter paper to obtain a coating composition 1. This was applied to a quartz glass plate (thickness 1 mm × length 4 cm × width 1 cm) by a flow coating method and cured at 130 ° C. for 1 hour. When the transmission spectrum was measured about the obtained coating film, as shown in FIG. 3, it turned out that the ultraviolet-ray of the area | region of a wavelength of 390 nm or less is absorbed.
[比較例3]
実施例6において、ポリオルガノシロキサンBの溶液の代わりに、比較例1で得られたポリオルガノシロキサンFの溶液を用いて、同様にコーティング組成物2を得た。更に実施例6と同様、塗膜を得、その透過スペクトルを測定したところ、図4に示したとおり、紫外線をほとんど吸収しないことが判明した。
[Comparative Example 3]
In Example 6, the coating composition 2 was similarly obtained using the polyorganosiloxane F solution obtained in Comparative Example 1 instead of the polyorganosiloxane B solution. Further, as in Example 6, when a coating film was obtained and its transmission spectrum was measured, it was found that it hardly absorbs ultraviolet rays as shown in FIG.
[実施例7〜9、比較例4〜6]
実施例2、3及び5、比較例2で得られたポリオルガノシロキサン溶液と、各種添加剤とを表1に示す量で配合し、コーティング組成物3〜8とした。これらコーティング組成物をポリカーボネート/アクリル樹脂共押し出し板(厚さ0.5mm×長さ30cm×幅20cm)のアクリル樹脂面に流し塗り法により塗布し、130℃で1時間硬化させた。
[Examples 7 to 9, Comparative Examples 4 to 6]
The polyorganosiloxane solutions obtained in Examples 2, 3 and 5 and Comparative Example 2 and various additives were blended in the amounts shown in Table 1 to obtain coating compositions 3-8. These coating compositions were applied to the acrylic resin surface of a polycarbonate / acrylic resin coextruded plate (thickness 0.5 mm × length 30 cm × width 20 cm) by a flow coating method and cured at 130 ° C. for 1 hour.
上記実施例6〜9、比較例3〜6で得られた塗膜に関して、下記の評価を行い、その結果を表2に示した。 The coating films obtained in Examples 6 to 9 and Comparative Examples 3 to 6 were evaluated as follows, and the results are shown in Table 2.
<硬化触媒>
TBAH:テトラブチルアンモニウムヒドロキシドの0.25%水溶液
酢酸Na:酢酸ナトリウムの10%水溶液
AlAA:アルミニウムアセチルアセトナート
<Curing catalyst>
TBAH: 0.25% aqueous solution of tetrabutylammonium hydroxide Na acetate: 10% aqueous solution of sodium acetate AlAA: aluminum acetylacetonate
<レベリング剤>
LV−I:フロラードFC−4430(住友スリーエム製)の10%イソプロパノール溶液
<Leveling agent>
LV-I: 10% isopropanol solution of Florard FC-4430 (manufactured by Sumitomo 3M)
<紫外線吸収剤>
UVA−I:2−[4−[(2−ヒドロキシ−3−ドデシル/トリデシル−オキシプロピル)オキシ]−2−ヒドロキシフェニル]−4,6−ビス(2,4−ジメチルフェニル)−1,3,5−トリアジン(チヌビン400、チバ・スペシャリティ・ケミカルズ製)
UVA−II:2−(2’−ヒドロキシ−5’−メタクリロキシエチルフェニル)−2H−ベンゾトリアゾール(RUVA−93、大塚化学製)
UVA−III:2,4−ジヒドロキシベンゾフェノン(SEESORB 100、シプロ化成製)
<Ultraviolet absorber>
UVA-I: 2- [4-[(2-hydroxy-3-dodecyl / tridecyl-oxypropyl) oxy] -2-hydroxyphenyl] -4,6-bis (2,4-dimethylphenyl) -1,3 , 5-Triazine (Tinubin 400, manufactured by Ciba Specialty Chemicals)
UVA-II: 2- (2′-hydroxy-5′-methacryloxyethylphenyl) -2H-benzotriazole (RUVA-93, manufactured by Otsuka Chemical)
UVA-III: 2,4-dihydroxybenzophenone (SEESORB 100, manufactured by Cypro Kasei)
<ヒンダードアミン系光安定剤>
HALS−I:N−アセチル−3−ドデシル−1−(2,2,6,6−テトラメチル−4−ピペリジニル)ピロリジン−2,5−ジオン(サンドバー3058Liq.、クラリアント・ジャパン製)
<Hindered amine light stabilizer>
HALS-I: N-acetyl-3-dodecyl-1- (2,2,6,6-tetramethyl-4-piperidinyl) pyrrolidine-2,5-dione (Sandbar 3058Liq., Manufactured by Clariant Japan)
<金属酸化物微粒子>
微粒子−I:酸化チタン含有複合金属酸化物ゾルの20%メタノール分散品(オプトレイク1120Z、触媒化成工業製)
<Metal oxide fine particles>
Fine particle-I: 20% methanol dispersion product of titanium oxide-containing composite metal oxide sol (Optlake 1120Z, manufactured by Catalyst Chemical Industries)
硬化被膜の評価方法
<塗膜外観>
塗膜を目視で観察し、異常の有無を判定した。
Evaluation method of cured film <Appearance of coated film>
The coating film was visually observed to determine the presence or absence of abnormality.
<耐擦傷性>
ASTM1044に準じ、テーバー摩耗試験機にて摩耗輪CS−10Fを装着、荷重500g下での500回転後の曇価を測定し、試験後と試験前の曇価差を耐擦傷性とした。
<Abrasion resistance>
In accordance with ASTM 1044, a wear wheel CS-10F was attached with a Taber abrasion tester, and the haze after 500 rotations under a load of 500 g was measured, and the difference in haze after the test and before the test was defined as scratch resistance.
<密着性>
JIS K5400に準じ、カミソリ刃を用いて、塗膜に2mm間隔で縦、横6本ずつ切れ目を入れて25個の碁盤目を作製し、セロテープ(ニチバン社製)をよく付着させた後、90°手前方向に急激に剥がした時、塗膜が剥離せずに残存したマス目数(X)を、X/25で表示した。
<Adhesion>
In accordance with JIS K5400, using a razor blade, cut 6 vertical and horizontal cuts at 2 mm intervals into the coating film to prepare 25 grids, and after attaching cello tape (manufactured by Nichiban) well, 90 The number of squares (X) remaining without peeling off of the coating film when peeled off rapidly in the front direction was expressed as X / 25.
<耐水性>
評価サンプルを、沸騰水に2時間浸漬した後の外観変化及び密着性を評価した。
<Water resistance>
The appearance change and adhesion after the evaluation sample was immersed in boiling water for 2 hours were evaluated.
<耐熱性>
評価サンプルを、130℃の熱風循環乾燥機中で1時間加熱した後のクラックの有無を目視で観察した。
<Heat resistance>
The evaluation sample was visually observed for cracks after heating for 1 hour in a hot air circulating dryer at 130 ° C.
[実施例10〜13、比較例7〜9]
アクリル系プライマーであるプライマーPC−7A(信越化学工業製)を、ポリカーボネート樹脂板(厚さ0.5mm×長さ30cm×幅20cm)に、流し塗り法により塗布、130℃で30分硬化した後、室温下、1時間冷却した。その後、前記組成物の被膜上に実施例6〜9及び比較例3,4,6で調製したコーティング組成物1〜6及び8を各々流し塗り法により塗布し、130℃で1時間硬化させた。得られた塗膜に関して、下記の耐候性評価を行った結果を表3に示す。本発明の紫外線吸収性基含有有機ケイ素化合物を含むコーティング組成物からなる塗膜は、基材であるポリカーボネート樹脂が劣化する紫外線波長領域を効果的に吸収しているため、耐候性試験後の黄変度は初期値と同等もしくはわずかな上昇のみであり、塗膜異常も認められなかった。一方、本発明の紫外線吸収性基含有有機ケイ素化合物を含まないコーティング組成物の塗膜では耐候性試験後の黄変度は上昇し、塗膜異常も発生した。
[Examples 10 to 13, Comparative Examples 7 to 9]
After applying primer PC-7A (manufactured by Shin-Etsu Chemical Co., Ltd.), an acrylic primer, to a polycarbonate resin plate (thickness 0.5 mm × length 30 cm × width 20 cm) by a flow coating method and curing at 130 ° C. for 30 minutes. The mixture was cooled at room temperature for 1 hour. Thereafter, coating compositions 1 to 6 and 8 prepared in Examples 6 to 9 and Comparative Examples 3, 4 and 6 were each applied by a flow coating method and cured at 130 ° C. for 1 hour. . Table 3 shows the results of the following weather resistance evaluation for the obtained coating film. The coating film comprising the coating composition containing the organic silicon compound containing the ultraviolet absorbing group of the present invention effectively absorbs the ultraviolet wavelength region in which the polycarbonate resin as the base material deteriorates. The degree of change was equal to or slightly increased from the initial value, and no coating film abnormality was observed. On the other hand, in the coating film of the coating composition containing no ultraviolet absorbing group-containing organosilicon compound of the present invention, the yellowing degree after the weather resistance test was increased, and the coating film was abnormal.
[実施例14]
アクリル系プライマーであるプライマーPC−7A(信越化学工業製)に、実施例1の化合物Aを、PC−7Aの固形分量に対して固形分として8%配合した組成物、ポリカーボネート樹脂板(厚さ0.5mm×長さ30cm×幅20cm)に、流し塗り法により塗布、130℃で30分硬化した後、室温下、1時間冷却した。その後、前記組成物の被膜上に実施例6で調製したコーティング組成物1を流し塗り法により塗布し、130℃で1時間硬化させた。得られた塗膜に関して、下記の耐候性評価を行った結果を表3に示す。
[Example 14]
A composition obtained by mixing 8% of the compound A of Example 1 as a solid content with respect to the solid content of PC-7A in a primer PC-7A (manufactured by Shin-Etsu Chemical Co., Ltd.) which is an acrylic primer, a polycarbonate resin plate (thickness) 0.5 mm × length 30 cm × width 20 cm) was applied by a flow coating method, cured at 130 ° C. for 30 minutes, and then cooled at room temperature for 1 hour. Thereafter, the coating composition 1 prepared in Example 6 was applied on the coating film of the composition by a flow coating method and cured at 130 ° C. for 1 hour. Table 3 shows the results of the following weather resistance evaluation for the obtained coating film.
本発明の紫外線吸収性基含有有機ケイ素化合物を含むコーティング組成物を上塗り及び下塗りとした場合、その紫外線吸収性は大幅に増大するため、基材であるポリカーボネート樹脂の劣化は大幅に抑制され、耐候性試験後の黄変度は初期値とほぼ同等となり、塗膜異常も認められなかった。 When the coating composition containing the UV-absorbing group-containing organosilicon compound of the present invention is used as an overcoat or undercoat, the UV-absorbing property is greatly increased, so that the deterioration of the polycarbonate resin as the substrate is greatly suppressed, and the weather resistance The yellowing after the property test was almost the same as the initial value, and no coating film abnormality was observed.
<耐候性評価>
岩崎電気(株)製アイスーパーUVテスターW−151を使用し、[ブラックパネル温度63℃、湿度50%RH、照度50mW/cm2、降雨10秒/1時間で5時間]→[ブラックパネル温度30℃、湿度95%RHで1時間]を1サイクルとして、このサイクルを繰り返す条件で100時間、250時間の試験を行った。耐候性試験前後に、JIS K7103に準拠し、黄変度を、また耐候塗膜クラック、耐候塗膜剥離の状態を目視又は顕微鏡(倍率250倍)にて観察した。
<Weather resistance evaluation>
Using I-Super UV Tester W-151 manufactured by Iwasaki Electric Co., Ltd., [Black panel temperature 63 ° C, humidity 50% RH, illuminance 50 mW / cm 2 , rain 10 seconds / 1 hour 5 hours] → [Black panel temperature The test was conducted for 100 hours and 250 hours under the conditions of repeating this cycle, with 1 cycle at 30 ° C. and 95% RH as one cycle. Before and after the weather resistance test, in accordance with JIS K7103, the degree of yellowing and the state of weather coating cracking and weather coating peeling were observed visually or with a microscope (250 times magnification).
〈耐候塗膜クラック性〉
耐候性試験後の塗膜外観を下記の基準で評価した。
○:異常なし
△:僅かにクラックあり
×:塗膜全体にクラックあり
<Weather-resistant coating cracking properties>
The appearance of the coating film after the weather resistance test was evaluated according to the following criteria.
○: No abnormality △: There is a slight crack ×: There is a crack in the entire coating film
〈耐候塗膜剥離〉
耐候性試験後の塗膜の状態を下記の基準で評価した。
○:異常なし
△:コーティング組成物の硬化塗膜層とプライマー硬化塗膜層との間で一部剥離
×:コーティング組成物の硬化塗膜層とプライマー硬化塗膜層との間で全剥離
<Weather-resistant film peeling>
The state of the coating film after the weather resistance test was evaluated according to the following criteria.
○: No abnormality Δ: Partial peeling between the cured coating layer and the primer cured coating layer of the coating composition ×: Total peeling between the cured coating layer and the primer cured coating layer of the coating composition
Claims (11)
で表される二価有機基であり、R36は炭素数1〜8の二価炭化水素基であり、aは0〜2の整数である。} An ultraviolet-absorbing group-containing organosilicon compound represented by the following general formula (1).
In a divalent organic group represented, R 36 is a divalent hydrocarbon group having 1 to 8 carbon atoms, a is an integer of 0 to 2. }
で表される二価有機基であり、R36は炭素数1〜8の二価炭化水素基である。}
で表される有機基であり、Rは同一もしくは異種の水素原子又は炭素数1〜18の非置換もしくはハロゲン、γ−メタクリロキシプロピル基、γ−アクリロキシプロピル基、γ−グリシドキシプロピル基、3,4−エポキシシクロヘキシルエチル基、γ−メルカプトプロピル基もしくはγ−アミノプロピル基置換の一価炭化水素基であり、R2は同一又は異種の炭素数1〜8のアルキル基であり、m,n,p,qは、各々0<m≦1、0≦n≦2、0≦p<3、0≦q≦3、0<m+n+p+q<4を満たす数である。] An ultraviolet absorbing group-containing organosilicon compound represented by the following average composition formula (2).
In a divalent organic group represented, R 36 is a divalent hydrocarbon group having 1 to 8 carbon atoms. }
R is the same or different hydrogen atom or unsubstituted or halogen having 1 to 18 carbon atoms , γ-methacryloxypropyl group, γ-acryloxypropyl group, γ-glycidoxypropyl group 3,4-epoxycyclohexylethyl group, γ-mercaptopropyl group or γ-aminopropyl group- substituted monovalent hydrocarbon group, R 2 is the same or different alkyl group having 1 to 8 carbon atoms, m , N, p, q are numbers satisfying 0 <m ≦ 1, 0 ≦ n ≦ 2, 0 ≦ p <3, 0 ≦ q ≦ 3, and 0 <m + n + p + q <4, respectively. ]
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JP7401977B2 (en) * | 2019-03-28 | 2023-12-20 | 株式会社カネカ | Polyorganosiloxane and its manufacturing method, and coating composition |
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