JP4455030B2 - Method for producing transparent synthetic quartz glass - Google Patents

Method for producing transparent synthetic quartz glass Download PDF

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JP4455030B2
JP4455030B2 JP2003403903A JP2003403903A JP4455030B2 JP 4455030 B2 JP4455030 B2 JP 4455030B2 JP 2003403903 A JP2003403903 A JP 2003403903A JP 2003403903 A JP2003403903 A JP 2003403903A JP 4455030 B2 JP4455030 B2 JP 4455030B2
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synthetic quartz
quartz glass
transparent synthetic
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JP2005162535A (en
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龍弘 佐藤
宜正 吉田
護 遠藤
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Shin Etsu Quartz Products Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for

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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
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Description

本発明は、高純度合成石英粉を加熱焼成して得られる透明合成石英ガラスの製造方法及び合成石英ガラス体に関する。   The present invention relates to a method for producing transparent synthetic quartz glass obtained by heating and firing high-purity synthetic quartz powder, and a synthetic quartz glass body.

透明石英ガラスの製造法のひとつとして、石英ガラス粉をカーボン鋳型に詰めて、真空雰囲気中で、加熱溶融する方法が知られている。この方法は、通常、１００μｍ〜５００μｍの粒度分布をもつ、天然または合成石英ガラス粉を使用して、１６００℃以上の温度域に加熱溶融し、石英ガラス塊を製造する（例えば、特許文献１参照。）。製造された石英ガラス塊は、半導体製造工程の部材に使用され、特に近年、金属不純物が低減され高温処理に適した合成石英が素材として望まれている。
特開平９−１８３６２３号公報 As one method for producing transparent quartz glass, a method is known in which quartz glass powder is filled in a carbon mold and heated and melted in a vacuum atmosphere. In this method, natural or synthetic quartz glass powder having a particle size distribution of 100 μm to 500 μm is usually used and heated and melted in a temperature range of 1600 ° C. or higher to produce a quartz glass lump (for example, see Patent Document 1). .) The manufactured quartz glass block is used as a member in a semiconductor manufacturing process, and in recent years, synthetic quartz suitable for high temperature processing with reduced metal impurities has been desired as a material.
JP-A-9-183623

上記の方法によって得られる石英ガラス塊は、内部に微小な泡を含有し、使用可能な部分が少なく、高コストであった。また、加熱溶融時に粉を充填するカーボン鋳型と石英粉は高温で非常に反応し易いため、鋳型が激しく消耗し、また、飛散したカーボン粉は石英粉中に入り込み、泡の原因にもなった。一方、合成石英粉からの石英ガラス塊の製造方法は、適正粒度の合成石英粉体を製造する為の手間とコストが極めて大きいという問題があった。   The quartz glass lump obtained by the above method contained minute bubbles inside, had few usable parts, and was expensive. In addition, the carbon mold and quartz powder that fills the powder when heated and melted react very easily at high temperatures, so the mold was consumed violently, and the scattered carbon powder entered the quartz powder and caused bubbles. . On the other hand, the method for producing a quartz glass lump from synthetic quartz powder has a problem that labor and cost for producing a synthetic quartz powder having an appropriate particle size are extremely large.

本発明は、透明で内部に微少泡の無い石英ガラス体を容易且つ低コストに製造する方法、及び透明で内部に微少泡が無い石英ガラス体を提供することを目的とする。   It is an object of the present invention to provide a method for easily and inexpensively producing a quartz glass body that is transparent and has no microbubbles therein, and a quartz glass body that is transparent and has no microbubbles therein.

上記問題を解決するため、本発明者らは鋭意開発を行い、本発明を完成させた。即ち、本発明の透明合成石英ガラスの製造方法は、ＢＥＴ比表面積が４０〜８０ｍ2／ｇ、平均粒度が６０〜９０ｎｍ、粒度分布範囲が３０〜４００ｎｍ、見かけ比重が１１０〜１７０ｇ／Ｌ、ＨＣｌ含有率が５０〜１４０ｐｐｍ、含有される金属不純物の総量が２ｐｐｍ以下である高純度合成石英粉を使用して、少なくとも１方向から、０．１〜１００ｋｇｆ／ｃｍ2のプレスをかけて、石英成形体を形成した後、減圧下、又は０2、Ｈ2、Ｈｅ及びＡｒの少なくとも１種を含む雰囲気中で、１３００〜１５００℃の温度域において、加熱焼成処理を行うことを特徴とする。 In order to solve the above problems, the present inventors have intensively developed and completed the present invention. That is, the method for producing the transparent synthetic quartz glass of the present invention has a BET specific surface area of 40 to 80 m 2 / g, an average particle size of 60 to 90 nm, a particle size distribution range of 30 to 400 nm, an apparent specific gravity of 110 to 170 g / L, HCl Using high-purity synthetic quartz powder having a content of 50 to 140 ppm and a total amount of metal impurities of 2 ppm or less, applying a press of 0.1 to 100 kgf / cm 2 from at least one direction, quartz molding After the body is formed, heat firing treatment is performed in a temperature range of 1300 to 1500 ° C. under reduced pressure or in an atmosphere containing at least one of 0 2 , H 2 , He and Ar.

前記加熱焼成処理を、加熱溶融中に０．１〜１００ｋｇｆ／ｃｍ2のプレスをかけながら行うことが好ましい。 It is preferable to perform the heat-firing treatment while applying a press of 0.1 to 100 kgf / cm 2 during heat melting.

また、前記高純度合成石英粉が、四塩化珪素の火炎加水分解反応によって製造されたものであることが好適である。   The high-purity synthetic quartz powder is preferably produced by flame hydrolysis reaction of silicon tetrachloride.

本合成石英ガラス体は、本発明の方法により製造される透明合成石英ガラス体である。   The synthetic quartz glass body is a transparent synthetic quartz glass body produced by the method of the present invention.

本発明方法は、火炎加水分解後の合成石英粉を直接使用でき、焼成温度が低温であり、カーボン鋳型と反応しない為、コスト的にも非常に優れている。本発明方法により、透明で内部に微少泡の無い石英ガラス体を容易且つ低コストで製造することができる。本発明の合成石英ガラス体は、本発明の製造方法により容易且つ安価に製造することができ、透明で内部に微少泡が無いという甚大な効果を奏する。   The method of the present invention can be used directly with the synthetic quartz powder after flame hydrolysis, the firing temperature is low, and it does not react with the carbon mold, so it is very excellent in terms of cost. By the method of the present invention, it is possible to easily and inexpensively produce a quartz glass body that is transparent and does not have microbubbles inside. The synthetic quartz glass body of the present invention can be produced easily and inexpensively by the production method of the present invention, and has the enormous effect of being transparent and free of microbubbles inside.

以下に本発明の実施の形態を添付図面に基づいて説明するが、図示例は例示的に示されるもので、本発明の技術思想から逸脱しない限り種々の変形が可能なことはいうまでもない。   DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the accompanying drawings. However, the illustrated examples are illustrative only, and various modifications can be made without departing from the technical idea of the present invention. .

図１は、本発明の透明合成石英ガラスの製造方法における第１の実施の形態の大略手順を示すフローチャートである。図２は、本発明の透明合成石英ガラスの製造方法における第２の実施の形態の大略手順を示すフローチャートである。   FIG. 1 is a flowchart showing a schematic procedure of a first embodiment in a method for producing a transparent synthetic quartz glass of the present invention. FIG. 2 is a flowchart showing a schematic procedure of the second embodiment in the method for producing the transparent synthetic quartz glass of the present invention.

図１に示した如く、ＢＥＴ比表面積が４０〜８０ｍ2／ｇ、平均粒度が６０〜９０ｎｍ、粒度分布範囲が３０〜４００ｎｍ、見かけ比重が１１０〜１７０ｇ／Ｌ、ＨＣｌ含有率が５０〜１４０ｐｐｍ、含有される金属不純物の総量が２ｐｐｍ以下である高純度合成石英粉を準備し（ステップ１００）、少なくとも１方向から、０．１〜１００ｋｇｆ／ｃｍ2のプレスをかけて、石英成形体を形成した後（ステップ１０２）、減圧下、又は０2、Ｈ2、Ｈｅ及びＡｒの少なくとも１種を含む雰囲気中で、１３００〜１５００℃の温度域において、加熱焼成することによって（ステップ１０４）、内部に微少泡が無い透明合成石英ガラス体を得ることができる。 As shown in FIG. 1, the BET specific surface area is 40 to 80 m 2 / g, the average particle size is 60 to 90 nm, the particle size distribution range is 30 to 400 nm, the apparent specific gravity is 110 to 170 g / L, the HCl content is 50 to 140 ppm, A high-purity synthetic quartz powder having a total amount of contained metal impurities of 2 ppm or less was prepared (step 100), and a quartz compact was formed by applying a press of 0.1 to 100 kgf / cm 2 from at least one direction. After (step 102), by heating and baking in a temperature range of 1300 to 1500 ° C. under reduced pressure or in an atmosphere containing at least one of 0 2 , H 2 , He and Ar (step 104), the inside A transparent synthetic quartz glass body having no microbubbles can be obtained.

上記高純度合成石英粉は、上記特性を有するものであれば特に限定されないが、四塩化珪素を火炎加水分解して得られた、合成石英微粒子が好適である。   The high-purity synthetic quartz powder is not particularly limited as long as it has the above properties, but synthetic quartz fine particles obtained by flame hydrolysis of silicon tetrachloride are suitable.

上記ステップ１０２は、一般的なプレス機を用いて加圧成形することができる。加圧条件は、０．１ｋｇｆ／ｃｍ2〜１００ｋｇｆ／ｃｍ2の範囲であればよいが、０．３ｋｇｆ／ｃｍ2〜１０ｋｇｆ／ｃｍ2の範囲が好ましく、１ｋｇｆ／ｃｍ2〜１０ｋｇｆ／ｃｍ2の範囲がより好ましい。 The step 102 can be pressure-molded using a general press machine. Pressure conditions, may be in the range of 0.1kgf / cm 2 ~100kgf / cm 2 , preferably in the range of 0.3kgf / cm 2 ~10kgf / cm 2 , of 1kgf / cm 2 ~10kgf / cm 2 A range is more preferred.

上記ステップ１０４は、公知の加熱溶融炉中で、１３００℃〜１５００℃で焼成される。加熱温度が１３００℃未満では燒結が不十分となり、１５００℃を超えると、石英粉とカーボン鋳型との反応性が高まる。本発明は焼成温度が低温であるため、カーボン鋳型と反応せず、高い経済的効果を奏するものである。焼成温度までの昇温速度は、１２００℃〜焼成温度までの範囲で、０．１℃／分〜５℃／分の範囲が好ましい。０．１℃／分未満では、遅すぎて工業的ではなく、５℃／分を超えると、燒結後のガラス体内部に泡が残る。   The step 104 is baked at 1300 ° C. to 1500 ° C. in a known heating and melting furnace. If the heating temperature is less than 1300 ° C., sintering is insufficient, and if it exceeds 1500 ° C., the reactivity between the quartz powder and the carbon mold increases. In the present invention, since the firing temperature is low, it does not react with the carbon mold and has a high economic effect. The temperature rising rate up to the firing temperature is in the range from 1200 ° C. to the firing temperature, and preferably in the range of 0.1 ° C./min to 5 ° C./min. If it is less than 0.1 ° C./minute, it is too slow to be industrial, and if it exceeds 5 ° C./minute, bubbles remain inside the glass body after sintering.

上記ステップ１０４は、０2、Ｈ2、Ｈｅ及びＡｒの少なくとも１種を含む雰囲気中で行うか、又は減圧下で行うものである。上記雰囲気中であれば圧力の限定はなく、また、減圧下であればいかなる雰囲気でもよい。また、上記ステップ１０４を、０2、Ｈ2、Ｈｅ及びＡｒの少なくとも１種を含む雰囲気中で、減圧下で行ってもよい。 Step 104 is performed in an atmosphere containing at least one of 0 2 , H 2 , He, and Ar, or under reduced pressure. The pressure is not limited as long as it is in the above atmosphere, and any atmosphere may be used as long as it is under reduced pressure. Further, step 104 may be performed under reduced pressure in an atmosphere containing at least one of 0 2 , H 2 , He, and Ar.

また、図２に示した如く、ステップ１００及びステップ１０２を上記と同様に行った後、加熱溶融中に０．１〜１００ｋｇｆ／ｃｍ2のプレスをかけながら、加熱焼成することにより（ステップ１０５）、内部に微少泡が無い透明合成石英ガラス体を得ることができる。 Further, as shown in FIG. 2, after performing Step 100 and Step 102 in the same manner as described above, heating and firing while applying a press of 0.1 to 100 kgf / cm 2 during heating and melting (Step 105). A transparent synthetic quartz glass body having no microbubbles inside can be obtained.

上記ステップ１０５は、例えば、ホットプレス等により、０．１〜１００ｋｇｆ／ｃｍ2のプレスをかけながら、１３００℃〜１５００℃で加熱焼成処理を行うものであり、該プレスを加熱溶融中に同時に行うことが透明化にはより効果的である。加圧条件は、０．１〜１００ｋｇｆ／ｃｍ2の範囲であればよいが、０．３ｋｇｆ／ｃｍ2〜１０ｋｇｆ／ｃｍ2の範囲が好ましく、１ｋｇｆ／ｃｍ2〜１０ｋｇｆ／ｃｍ2の範囲がより好ましい。焼成温度までの昇温速度は、１２００℃〜焼成温度までの範囲で、０．１℃／分〜５℃／分の範囲が好ましい。０．１℃／分未満では、遅すぎて工業的ではなく、５℃／分を超えると、燒結後のガラス体内部に泡が残る。 In step 105, for example, a heating and baking process is performed at 1300 ° C. to 1500 ° C. while applying a press of 0.1 to 100 kgf / cm 2 by a hot press or the like, and the press is simultaneously performed during heating and melting. This is more effective for transparency. Pressure conditions, 0.1~100kgf / cm 2 of may be in a range, but preferably in the range of 0.3kgf / cm 2 ~10kgf / cm 2 , more in the range of 1kgf / cm 2 ~10kgf / cm 2 preferable. The temperature rising rate up to the firing temperature is in the range from 1200 ° C. to the firing temperature, and preferably in the range of 0.1 ° C./min to 5 ° C./min. If it is less than 0.1 ° C./minute, it is too slow to be industrial, and if it exceeds 5 ° C./minute, bubbles remain inside the glass body after sintering.

以下に実施例をあげて本発明をさらに具体的に説明するが、これらの実施例は例示的に示されるもので限定的に解釈されるべきでないことはいうまでもない。   The present invention will be described more specifically with reference to the following examples. However, it is needless to say that these examples are shown by way of illustration and should not be construed in a limited manner.

（実施例１）
四塩化珪素を火炎加水分解で得られた合成石英ガラス微粒子（スート微粒子）を採集し、内径６００ｍｍ×高さ５００ｍｍのカーボン鋳型中に、６５ｋｇ充填し、カーボン製の上下移動可能な蓋をして、プレス機（TOYO HYDRAULIC EQIPMENT CO.LTD製、商品名：ENERPAC HYDRAULIC PRESS）にセットして、上方から１ｋｇｆ／ｃｍ2の圧力を加えてプレスし石英成形体を作成した。 Example 1
Synthetic quartz glass fine particles (soot fine particles) obtained by flame hydrolysis of silicon tetrachloride are collected, filled into a carbon mold with an inner diameter of 600 mm and a height of 500 mm, and covered with a carbon movable lid. Then, it was set in a press machine (manufactured by TOYO HYDRAULIC EQIPMENT CO.LTD, trade name: ENERPAC HYDRAULIC PRESS), and pressed by applying a pressure of 1 kgf / cm 2 from above to produce a quartz molded body.

その後、蓋をはずし、底と側面のカーボン鋳型と一緒に、得られた石英成形体を加熱溶融炉の中にセットして、１×１０-2ｍｍＨｇ以下に減圧後、加熱を開始し、１２００℃までは、１時間で昇温させ、１２００℃から１４００℃までは、２℃／分で昇温させ、１４００℃で１時間保持し、降温させた。室温に冷却後、鋳型とともに石英ガラス塊を取り出した。 Thereafter, the lid is removed, and the resulting quartz molded body is set in a heating and melting furnace together with the carbon molds on the bottom and side surfaces. After reducing the pressure to 1 × 10 −2 mmHg or less, heating is started, and 1200 The temperature was raised to 1 ° C. in 1 hour, the temperature was raised from 1200 ° C. to 1400 ° C. at 2 ° C./min, held at 1400 ° C. for 1 hour, and the temperature was lowered. After cooling to room temperature, the quartz glass block was taken out together with the mold.

得られた石英ガラス塊は、５００φ×１５０ｍｍで、１ｍｍ以上の微小泡の無い、高純度な透明合成石英ガラス体が得られた。ガラス体の純度は、金属不純物の総含有量が１ｐｐｍ以下あり、ＯＨ基濃度が１００ｐｐｍ、Ｃｌ濃度は３０ｐｐｍ未満であった。   The obtained quartz glass block was 500φ × 150 mm, and a high-purity transparent synthetic quartz glass body having no fine bubbles of 1 mm or more was obtained. As for the purity of the glass body, the total content of metal impurities was 1 ppm or less, the OH group concentration was 100 ppm, and the Cl concentration was less than 30 ppm.

なお、使用した合成石英ガラス微粒子の特性は、ＢＥＴ比表面積が６０ｍ2／ｇ、平均粒度が７０ｎｍ、粒度分布範囲が４０〜３００ｎｍ、見かけ比重が１４０ｇ／Ｌ、ＨＣｌ含有率が１００ｐｐｍ、含有される金属不純物の総量が０．８ｐｐｍであった。 The characteristics of the synthetic quartz glass fine particles used include a BET specific surface area of 60 m 2 / g, an average particle size of 70 nm, a particle size distribution range of 40 to 300 nm, an apparent specific gravity of 140 g / L, and an HCl content of 100 ppm. The total amount of metal impurities was 0.8 ppm.

（実施例２）
実施例１と同様の合成石英ガラス微粒子を用いて、実施例１と同様、該石英ガラス微粒子をカーボン鋳型中に充填し、上下移動可能な蓋をして、プレス機にセットした後、上方から１ｋｇｆ／ｃｍ2の圧力を加えて石英成形体を形成した。その後、プレスした状態のまま、加熱溶融炉の中にセットして、１×１０-2ｍｍＨｇ以下に減圧後、実施例１と同様の温度条件で加熱焼成を行い、石英ガラス塊を得た。 (Example 2)
Using the same synthetic silica glass fine particles as in Example 1, the silica glass fine particles are filled in a carbon mold, covered with a vertically movable lid, set in a press machine, and then from above. A quartz compact was formed by applying a pressure of 1 kgf / cm 2 . Then, in the pressed state, it was set in a heating and melting furnace, reduced in pressure to 1 × 10 −2 mmHg or less, and then heated and fired under the same temperature conditions as in Example 1 to obtain a quartz glass lump.

得られた石英ガラス塊は、５００φ×１５０ｍｍで、１ｍｍ以上の微小泡の無い、高純度な透明合成石英ガラス体が得られた。ガラス体の純度も実施例１と同様の結果であった。   The obtained quartz glass block was 500φ × 150 mm, and a high-purity transparent synthetic quartz glass body having no fine bubbles of 1 mm or more was obtained. The purity of the glass body was the same as in Example 1.

（比較例１）
粒径分布範囲が１００μｍ〜５００μｍの天然石英ガラス粉を、内径６００ｍｍ×高さ５００ｍｍのカーボン鋳型中に充填し、加熱溶融炉の中にセットして、１２００℃までは、１時間で昇温させ、１２００℃から１７５０℃までは、２℃／分で昇温させ、１７５０℃で１時間保持し、降温させた。室温に冷却後、鋳型とともに石英ガラス塊を取り出した。 (Comparative Example 1)
Natural quartz glass powder having a particle size distribution range of 100 μm to 500 μm is filled in a carbon mold having an inner diameter of 600 mm and a height of 500 mm, set in a heating and melting furnace, and heated up to 1200 ° C. in one hour. The temperature was raised from 1200 ° C. to 1750 ° C. at 2 ° C./min, held at 1750 ° C. for 1 hour, and lowered. After cooling to room temperature, the quartz glass block was taken out together with the mold.

得られた石英ガラス塊は、６００φ×３５０ｍｍであった。塊中央付近に１〜４ｍｍφの微小な泡を含む部分が、３００φ×３００ｍｍの範囲に存在し、使用可能な部分は、全体の４０％程度であった。使用後のカーボン鋳型は、石英粉との接触部分が激しく消耗していた。ガラス体の純度は実施例１と同様であった。   The obtained quartz glass block was 600φ × 350 mm. A portion including 1 to 4 mmφ fine bubbles was present in the vicinity of the center of the lump in a range of 300φ × 300 mm, and the usable portion was about 40% of the whole. After use, the carbon mold was heavily consumed in contact with the quartz powder. The purity of the glass body was the same as in Example 1.

本発明の透明合成石英ガラスの製造方法における第１の実施の形態の大略手順を示すフローチャートである。It is a flowchart which shows the general procedure of 1st Embodiment in the manufacturing method of the transparent synthetic quartz glass of this invention. 本発明の透明合成石英ガラスの製造方法における第２の実施の形態の大略手順を示すフローチャートである。It is a flowchart which shows the general procedure of 2nd Embodiment in the manufacturing method of the transparent synthetic quartz glass of this invention.

Claims (3)

ＢＥＴ比表面積が４０〜８０ｍ2／ｇ、平均粒度が６０〜９０ｎｍ、粒度分布範囲が３０〜４００ｎｍ、見かけ比重が１１０〜１７０ｇ／Ｌ、ＨＣｌ含有率が５０〜１４０ｐｐｍ、含有される金属不純物の総量が２ｐｐｍ以下である高純度合成石英粉を使用して、少なくとも１方向から、０．１〜１００ｋｇｆ／ｃｍ2のプレスをかけて、石英成形体を形成した後、減圧下、又は０2、Ｈ2、Ｈｅ及びＡｒの少なくとも１種を含む雰囲気中で、１３００〜１５００℃の温度域において、加熱焼成処理を行うことを特徴とする透明合成石英ガラスの製造方法。 BET specific surface area of 40 to 80 m 2 / g, average particle size of 60 to 90 nm, particle size distribution range of 30 to 400 nm, apparent specific gravity of 110 to 170 g / L, HCl content of 50 to 140 ppm, total amount of metal impurities contained After using a high-purity synthetic quartz powder having a content of 2 ppm or less and applying a press of 0.1 to 100 kgf / cm 2 from at least one direction to form a quartz compact, under reduced pressure or 0 2 , H 2. A method for producing a transparent synthetic quartz glass, characterized in that a heat-firing treatment is performed in a temperature range of 1300 to 1500 ° C. in an atmosphere containing at least one of He and Ar. 前記加熱焼成処理を、加熱溶融中に０．１〜１００ｋｇｆ／ｃｍ2のプレスをかけながら行うことを特徴とする請求項１記載の透明合成石英ガラスの製造方法。 2. The method for producing transparent synthetic quartz glass according to claim 1, wherein the heat-firing treatment is performed while applying a press of 0.1 to 100 kgf / cm < 2 > during heat-melting. 前記高純度合成石英粉が、四塩化珪素の火炎加水分解反応によって製造されたものであることを特徴とする請求項１又は２記載の透明合成石英ガラスの製造方法。   The method for producing transparent synthetic quartz glass according to claim 1 or 2, wherein the high-purity synthetic quartz powder is produced by a flame hydrolysis reaction of silicon tetrachloride.
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US11492282B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies with dew point monitoring in the melting oven
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