JP4447801B2 - X-ray topograph apparatus and X-ray topograph method - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an X-ray topography apparatus and an X-ray topography method for observing crystal lattice defects, surface processing distortions, and the like of a single crystal material using an X-ray diffraction phenomenon.
[0002]
[Prior art]
In the X-ray topography method, the intensity of X-rays diffracted at each point of a sample crystal is recorded on a recording medium so as to have a 1: 1 geometric correspondence with the sample, and a local change mainly related to the crystal structure is recorded. Captured as change in diffraction intensity. Various methods such as the Lang method and the Berg-Barret method have been proposed as the X-ray topography method.
[0003]
In the Lang method, a sample is irradiated with white X-rays emitted from an X-ray source, the intensity of diffracted X-rays transmitted through the sample is recorded on a recording medium, and crystal lattice defects and the like are observed. . The Berg-Barrett method irradiates a sample with white X-rays emitted from an X-ray source, records the intensity of diffracted X-rays reflected from the sample surface on a recording medium, and observes lattice defects near the sample surface. To do.
[0004]
These methods make use of so-called extinction effect contrast in which the integrated intensity of X-rays diffracted in an incomplete crystal region with a disordered lattice is larger than the integrated intensity of X-rays diffracted in a complete crystal region. Lattice defects and the like can be observed.
[0005]
However, in the conventional method described above, white X-rays are directly irradiated on the sample and the diffracted X-ray intensity is recorded on the recording medium, so that the background is increased. For this reason, there is little difference in intensity between the integrated intensity of X-rays diffracted in an incomplete crystal region and the integrated intensity of X-rays diffracted in a complete crystal region, and as a result, lattice defects can be clearly observed. There was something I couldn't do.
[0006]
In order to solve such a problem, a topographic method called a surface reflection double crystal method in which white X-rays are monochromatic through a monochromator and the monochromatic X-rays are irradiated onto a sample has been developed. FIG. 7 is a schematic diagram showing an optical path of an X-ray optical system for carrying out this surface reflection double crystal method.
[0007]
An X-ray optical system 100 shown in the figure is configured to irradiate a sample 104 with white X-rays 102 emitted from an X-ray source 101 by monochromatizing via a monochromator 103. The X-ray scattering surface Sa of the monochromator 103 and the X-ray scattering surface Sb of the sample 104 are parallel, and the intensity of the X-ray diffracted by the sample 104 is recorded on the recording medium 105. According to this surface reflection two-crystal method, since the sample is irradiated with monochromatic X-rays with good parallelism, the background is suppressed, and an X-ray intensity difference corresponding to a diffraction angular position shift can be observed. It becomes possible.
[0008]
[Problems to be solved by the invention]
In recent years, there have been requests in various places for the purpose of observing lattice defects and the like of large samples by the X-ray topographic method. A typical example of a large sample is a silicon wafer used for manufacturing a semiconductor. In recent years, silicon wafers have been increased in diameter to have a diameter of, for example, 300 mm in order to increase the efficiency of semiconductor manufacturing and reduce costs.
[0009]
In order to obtain measurement data by the X-ray topography method for the entire surface area of such a large sample, it is necessary to change the X-ray irradiation area and repeat the measurement, and the measurement time for one sample is long. There was a time-consuming problem.
[0010]
Japanese Patent Application Laid-Open No. 8-159992 discloses a surface defect evaluation apparatus in which a line focus X-ray is monochromatized with a diffraction crystal and then irradiated onto a sample at a low angle to extract diffraction X-rays caused by asymmetric reflection and record it on a photographic plate. Is disclosed (FIG. 3 of the publication). According to this conventional apparatus, by irradiating the sample with line-focused X-rays at a low angle, the X-ray irradiation area is expanded, and as a result, a wide range of X-ray diffraction data can be acquired by one measurement. it can.
[0011]
However, in the above-described conventional apparatus, since the spread of the X-ray irradiation area is limited to one direction, the X-ray irradiation area is still set for a large sample having a disk shape or a rectangular shape. It was necessary to change and repeat the measurement. Moreover, the total length of the line focus X-rays radiated from the conventional X-ray source is at most about 10 mm, and even if the sample is irradiated with the line focus X-rays having such a full length at a low angle, the irradiation area is expanded. However, it was still narrow for a large-diameter sample having a diameter of 300 mm.
[0012]
The present invention has been made in view of such circumstances, and an object of the present invention is to enlarge the X-ray irradiation area in all directions and collectively record X-ray topographs over a wide area on the sample surface.
[0013]
[Means for Solving the Problems]
In order to achieve the above object, an X-ray topograph of the present invention includes a line focus X-ray source, a monochromator that irradiates a sample by monochromatic X-rays generated by the X-ray source, and diffraction from the sample. An X-ray topography apparatus comprising an X-ray recording means for recording X-rays, wherein the monochromator reflects the X-rays at an asymmetric angle with respect to the incident angle of the X-rays so that the longitudinal direction of the line focus is An asymmetric reflection monochromator that takes out expanded X-rays, and an asymmetric reflection monochromator so that the X-ray scattering surface of the asymmetric reflection monochromator intersects (preferably orthogonally) the X-ray scattering surface of the sample. They are arranged (claims 1 and 2).
[0014]
According to this invention, since the sample is irradiated with monochromatic X-rays whose longitudinal direction of the line focus is expanded by the asymmetric reflection monochromator, the X-ray irradiation region on the sample surface can be expanded in the longitudinal direction of the X-rays.
In addition, since the X-ray scattering surface of the asymmetric reflection monochromator is crossed (preferably orthogonal) to the X-ray scattering surface of the sample, the width on the sample surface is increased due to the spread in the width direction due to X-ray divergence. The X-ray irradiation area can be expanded.
Therefore, the X-ray irradiation area is expanded in all directions, and the topographic recording of diffracted X-rays over a wide area on the sample surface can be performed at once. In addition, it is possible to observe lattice defects using the extinction effect contrast by significantly reducing the background compared to the conventional Berg-Barrett method.
[0015]
In addition, the X-ray topography method of the present invention irradiates a sample with X-rays generated by a line focus X-ray source through asymmetric reflection monochromator, and records X-rays diffracted from the sample. This is a topographic method, in which X-rays are incident on an asymmetrical reflection monochromator at a low angle to extract X-rays whose longitudinal direction of the line focus is enlarged, and X-ray scattering of the sample with respect to the X-ray scattering surface of the asymmetrical reflection monochromator The sample is irradiated with X-rays from an asymmetric reflection monochromator so that the planes intersect (preferably orthogonal) (claims 3 and 4).
[0016]
Also according to the present invention, similarly to the first and second aspects of the invention, the X-ray irradiation area is expanded in all directions, and it becomes possible to collectively record the topography of diffracted X-rays over a wide area on the sample surface.
[0017]
Furthermore, if X-rays from the asymmetric reflection monochromator are made incident on the sample surface at a low angle and diffracted X-rays by asymmetric reflection are taken out (Claim 5), the X-ray irradiation region on the sample surface is X-rays. Can be further expanded in the direction along the optical axis.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a perspective view showing an outline of an X-ray topograph apparatus according to an embodiment of the present invention, and FIG. 2 is a front configuration diagram showing the X-ray topograph apparatus.
[0019]
As shown in these drawings, the X-ray topograph 1 includes an X-ray source 10, a solar slit 20, a monochromator 30, a goniometer 40, a sample mounting device 50, an X-ray detector 60, and a control system 70. . In this specification, the long side of the line focus is defined as the X-ray longitudinal direction, and the short side is defined as the X-ray width direction.
[0020]
The X-ray source 10 uses a rotating anti-cathode X-ray tube of a Cu target as a line focus, and X-rays 2 with a line focus are emitted from the X-ray source 10. The focal spot size of the X-ray source 10 is, for example, 0.1 mm wide and 10 mm long. In this case, X-ray 2 having a line focus of 10 mm in length is emitted from the X-ray source 10.
[0021]
Note that the LaB on the cathode side of the X-ray source 10 ₆ The non-winding type cathode using is used to ensure the uniformity of the intensity of the X-ray 2 emitted from the X-ray source 10. For example, a wound-type cathode using a W filament may be used on the cathode side. In this case, the X-ray tube is slightly reciprocated in the line direction and emitted from the X-ray source 10. It is preferable to make the X-ray 2 uniform.
The X-ray 2 emitted from the X-ray source 10 enters the solar slit 20 through the divergence limiting slit 11.
[0022]
The solar slit 20 has a function of suppressing the divergence in the longitudinal direction of the X-ray 2 emitted from the X-ray source 10 and separating the CuΚα tablet. As shown in FIG. 3, the solar slit 20 has a configuration in which a plurality of unit units 22 formed by arranging a plurality of slit members 21 in the longitudinal direction are arranged in the optical axis direction of the X-ray 2.
[0023]
In this embodiment, a plurality of slit members 21 having a length (a) of 24 mm and a thickness (h) of 0.08 mm are disposed in the longitudinal direction at intervals of a pitch (d) of 0.16 mm, and thus a unit unit. 22 is constituted. Then, four unit units 22 are arranged side by side in the optical axis direction of the X-ray 2, and the interval (I ₁ ~ I ₃ ) From the upstream side in the optical axis direction of the X-ray 2 to 12 mm (I ₁ ), 30 mm (I ₂ ), 57 mm (I ₃ ). By making the X-ray 2 parallel to the longitudinal direction and entering the monochromator 30 by the solar slit 20 having such a configuration, the monochromator 30 can extract only CuKα1. The solar slit 20 may have a single unit configuration in which a plurality of slit materials 21 that are long in the optical axis direction of the X-ray 2 are arranged in the longitudinal direction.
[0024]
The solar slit 20 is provided with a scanning mechanism (not shown) so that the solar slit 20 is scanned in the longitudinal direction of the X-ray 2 so that the X-ray 2 is uniformly incident on the surface of the monochromator 30. I have to. The X-ray 2 emitted from the solar slit 20 is incident on the monochromator 30 via the divergence limiting slit 23.
[0025]
The monochromator 30 has a function of making the X-ray 2 incident from the X-ray source 10 monochromatic. That is, when the X-ray 2 is incident on the monochromator 30 via the solar slit 20, the characteristic X-ray 2a corresponding to the material constituting the counter cathode of the X-ray source 10 (for example, CuKα1 if the material is Cu) ) Is taken out.
[0026]
In addition, the monochromator 30 uses an asymmetric reflection monochromator having a function of taking out the X-ray 2 incident from the solar slit 20 by enlarging it in the longitudinal direction.
That is, as shown in FIG. 4, the monochromator 30 is formed by inclining the lattice plane 32 of the crystal constituting the monochromator 30 with respect to the surface 31 on which the X-ray 2 is incident. When the X-ray 2 is incident on the surface 31 of the monochromator 30 at an angle α, Bragg reflection with a Bragg angle (α + β) is generated on the crystal lattice plane 32, and the angle (α + 2β) with respect to the surface 31 of the monochromator 30. Reflects, that is, reflects asymmetrically.
[0027]
In the present embodiment, the monochromator 30 is formed so that the reflection angle of the X-ray 2 a with respect to the surface 31 of the monochromator 30 is larger than the incident angle of the X-ray 2. The X-ray 2a can be extracted by making the length B of the X-ray 2a on the emission side larger than the length A.
In the present embodiment, a silicon single crystal plate having a length of about 300 mm, a width of 30 mm, and a thickness of about 10 mm is obtained by cutting an FZ method silicon single crystal ingot grown in the [001] direction at an angle of 10.6 ° from the growth axis. The monochromator 30 is used, and the entire surface of the crystal plate is subjected to a strain-free mechanical and chemical polish finish.
[0028]
The monochromator 30 is attached to a driving device 35 including an incident angle adjusting mechanism 33 and a crystal tilt / position adjusting mechanism 34. FIG. 5 is a perspective view showing the driving direction of the monochromator by this driving device.
The incident angle adjusting mechanism 33 has a function of adjusting the incident angle of the X-ray 2 with respect to the surface of the monochromator 30 by rotating the monochromator 30 around the rotation axis O in the direction of arrow I. By adjusting the incident angle of the X-ray 2 by the incident angle adjusting mechanism 33, it is possible to set an appropriate incident angle for taking out the X-ray expanded in parallel with the longitudinal direction from the monochromator 30.
[0029]
The crystal tilt / position adjustment mechanism 34 includes a tilt angle adjusting means for adjusting the tilt angle of the monochromator 30, an in-plane angle adjusting means for rotating the monochromator 30 in the plane, and the monochromator 30 along the optical axis of the incident X-ray 2. Each function as X-ray irradiation position adjusting means for parallel movement is provided.
That is, the tilt angle of the monochromator 30 can be adjusted by rotationally driving the monochromator 30 in the direction of the arrow II in the figure by the crystal tilt / position adjusting mechanism 34. By adjusting the tilt angle, the irradiation position of the X-ray 2a on the sample surface 3a can be roughly adjusted.
[0030]
Further, the irradiation position of the X-ray 2a on the sample surface 3a can be finely adjusted by rotating the monochromator 30 in the direction of the arrow III by the crystal tilt / position adjusting mechanism 34. If the longitudinal direction of the X-ray 2a irradiated to the sample surface 3a is matched with the θ-2θ rotation axis of the goniometer 40 described later by this rotation operation, the X-ray incident angle is constant at any irradiation point in the same direction. It becomes.
[0031]
Further, the X-ray 2a extracted from the monochromator 30 is translated in the longitudinal direction by moving the monochromator 30 in the direction of arrow IV (the optical axis direction of the incident X-ray 2) by the crystal tilt / position adjusting mechanism 34. Can be made. This makes it possible to arbitrarily move and adjust the X-ray irradiation position in the θ-2θ rotation axis direction on the sample surface 3a.
[0032]
The X-ray 2a extracted in the longitudinal direction by the monochromator 30 is irradiated to the sample surface 3a through the entrance slit 36. The entrance slit 36 is configured to be capable of adjusting the slit interval in the width direction. The X-ray 2a taken out by the monochromator 30 diverges in the width direction, and the X-ray 2a is irradiated to the sample surface 3a while maintaining this divergence.
[0033]
The goniometer 40 has a sample angle scanning mechanism 41 and a detector arm angle scanning mechanism 42, and these scanning mechanisms 41, 42 are rotatable about the same rotation axis (hereinafter referred to as a θ-2θ rotation axis). It has become. Further, the goniometer 40 is provided with a width direction position adjusting mechanism 43, and the mechanism 43 can adjust the position of the goniometer 40 in the width direction.
[0034]
A sample mounting device 50 holding a sample 3 for recording an X-ray topograph is attached to the sample angle scanning mechanism 41, and the mechanism 41 rotates the sample mounting device 50 around the θ-2θ rotation axis (θ And the incident angle θ of the X-ray 2a incident from the monochromator 30 with respect to the sample surface 3a can be adjusted.
[0035]
Further, the sample mounting device 50 has a sample support base 51, and the sample 3 is held horizontally by the sample support base 51. The sample support base 51 is provided with an in-plane rotation mechanism 52, and the mechanism 52 enables in-plane rotation of the sample 3.
[0036]
The sample support 51 and the in-plane rotation mechanism 52 are mounted on a stage 53, and the stage 53 includes a horizontal direction drive mechanism 54 and a width direction drive mechanism 55. That is, the stage 53 can be translated in the direction along the optical axis of the X-ray 2a while the sample 3 is held horizontally by the horizontal driving mechanism 54. Therefore, the irradiation position of the X-ray 2a on the sample surface 3a can be appropriately changed by the horizontal driving mechanism 54.
[0037]
Further, the stage 53 can be moved in the width direction by the width direction drive mechanism 55, and the position of the sample 3 in the width direction can be adjusted. The position of the stage 53 in the width direction is such that the θ-2θ rotation axis of the goniometer 40 is placed on the surface 3a of the sample 3 when a sample having a standard thickness is held on the sample support base 51. , Have been set in advance.
[0038]
Here, the monochromator 30 and the sample 3 are arranged in such a posture that their X-ray scattering surfaces are substantially orthogonal to each other.
FIG. 6 is a schematic diagram showing the arrangement relationship between the monochromator and the sample.
As shown in FIG. 2A, the surface including the optical axis of the X-ray 2 incident on the monochromator 30 and the optical axis of the X-ray 2a reflected from the monochromator 30 is the X-ray scattering of the monochromator 30. Surface Sa. Further, the surface including the optical axis of the X-ray 2 a incident on the sample 3 and the optical axis of the X-ray 2 b reflected from the sample 3 is the X-ray scattering surface Sb of the sample 3. In the present embodiment, the X-ray scattering surfaces Sa and Sb are arranged so as to be orthogonal to each other. With this arrangement, the longitudinal direction H of the X-ray 2a incident on the sample surface 3a is a goniometer as shown in FIG. 40 is parallel to the θ-2θ rotation axis 40a, and the width direction D of the incident X-ray 2a to the sample surface 3a is perpendicular to the θ-2θ rotation axis 40a.
[0039]
The longitudinal direction H of the X-ray 2a is enlarged by the monochromator 30 as described above. Further, the X-ray 2a spreads in the width direction D due to divergence. Therefore, when the X-ray 2a is incident on the sample surface 3a with a certain inclination angle, the irradiation region is expanded in the width direction D of the X-ray 2a. In particular, as the X-ray 2a is irradiated onto the sample surface 3a at a lower angle, the irradiation area on the sample surface 3a is expanded.
[0040]
A detector arm 44 is attached to the detector arm angle scanning mechanism 42, and an X-ray detector 60 is attached to the detector arm 44. By this mechanism 42, the X-ray detector 60 can be rotated (2θ rotation).
The X-ray detector 60 includes an X-ray detector 61 that detects the intensity of the X-ray 2b diffracted from the sample surface 3a by Bragg reflection, and a recording medium (X-ray recording means) that records the intensity of the X-ray 2b. 63.
The X-ray detector 61 is attached to the detector arm 44 via a detector support base 62, and a scintillation counter tube is used for the X-ray detector 61.
[0041]
The recording medium 63 is detachably attached to a recording medium holder 64 attached to the detector arm 44. In this recording medium 63, for example, the intensity of the X-ray 2b diffracted by the sample 3 is recorded using an imaging plate or an X-ray film. This recording medium 63 is formed in such a size that the intensity of diffracted X-rays over the entire surface of the sample 3 can be recorded in one shot.
[0042]
The control system 70 of the X-ray topography apparatus 1 includes a control device 71, a storage device 72, and a display device 73.
The control device 71 has a function as a central control unit (CPU) that controls each unit of the X-ray topograph device 1. The storage device 72 has a function of recording intensity data of the X-ray 2b detected by the X-ray detector 61. Further, the display device 73 has a function of displaying a diffraction intensity curve created based on the intensity data of the X-ray 2b.
[0043]
[Position adjustment of each component]
Next, a method for adjusting the position of each component in the X-ray topography apparatus 1 will be described with reference to FIGS. 1 and 2.
First, the sample 3 is held on the sample support base 51 of the sample mounting device 50. The sample 3 is a 300 mm diameter silicon wafer containing local crystal lattice defects and having a surface of (001).
Then, the control device 71 outputs an operation command to the in-plane rotation mechanism 52 of the sample mounting device 50 to operate the mechanism 52, and the optical axis direction of the X-ray irradiated with the in-plane orientation <110> of the sample 3 is irradiated. The in-plane rotation of the sample 3 is performed so as to be orthogonal to.
[0044]
When the thickness of the sample 3 is different from the standard sample thickness, the control device 71 outputs an operation command to the width direction driving mechanism 55 of the sample mounting device 50 via the goniometer 40 to move the stage 53. The θ-2θ rotation axis of the goniometer 40 is placed on the sample surface 3a.
[0045]
Next, the control device 71 outputs an operation command to the driving device 35 of the monochromator 30 to operate the driving device 35, and the crystal tilt / position adjustment mechanism 34 adjusts the tilt angle and in-plane angle adjustment of the monochromator 30. In addition, the position adjustment along the optical axis of the X-ray 2 is performed, and the angle adjustment between the surface 31 of the monochromator 30 and the X-ray 2 incident on the monochromator 20 is performed by the incident angle adjusting mechanism 33.
[0046]
In this embodiment, when the incident angle of the X-ray 2 from the solar slit 20 is set to 1.6 ° with respect to the surface 31 of the monochromator 30, and the X-ray 2 is incident on the surface 31. Asymmetric 333 reflection is made to occur. By this operation, the X-ray 2a expanded to a length of about 300 mm, which is substantially the same as the diameter of the sample 3, is obtained.
Subsequently, a 300 mm slit having the same length as the X-ray 2a is installed as the entrance slit 36 in the longitudinal direction. Then, the slit interval in the width direction of the entrance slit 36 is adjusted to 16 mm so that an X-ray 2a having a width of 16 mm can be obtained.
[0047]
Further, the control device 71 outputs an operation command to the width direction position adjusting mechanism 43 of the goniometer 40, operates the mechanism 43, and the line focus X-ray 2a is irradiated in parallel to the entire sample surface 3a, and The position of the goniometer 40 in the width direction is adjusted so that the X-ray 2a is halved in the width direction on the sample surface 3a.
[0048]
Then, the control device 71 operates the detector arm angle scanning mechanism 42 to rotate the X-ray detection unit 60 by 2θ, so that the X-ray is positioned at a position 56.12 ° with respect to the optical path of the X-ray 2a irradiated on the sample surface 3a. The line detection unit 60 is moved.
Subsequently, the control device 71 operates the sample angle scanning mechanism 41 to rotate the sample 3 by θ, sets the angle of the sample surface 3a to the sheet surface of the X-ray 2a to 2.86 °, and the sample 3 is asymmetrical 113. Keep reflections taking place. At this stage, the recording medium 63 is not attached to the recording medium holder 64, and the X-ray 2b diffracted from the sample surface 3a is set in a state that can be detected by the X-ray detector 61.
[0049]
[Recording method of X-ray topograph]
Next, an X-ray topograph recording method (X-ray topograph method) using the above-described X-ray topograph apparatus 1 will be described with reference mainly to FIG. 1 and FIG.
An X-ray 2 having a line focus of 10 mm in length is emitted from the X-ray source 10, and the X-ray 2 is monochromated by the monochromator 30, enlarged to a length of 300 mm, and irradiated to the sample surface 3 a, The detector 61 confirms that Bragg reflection occurs in the sample 3.
When Bragg reflection occurs, the recording medium 63 is attached to the recording medium holder 64, and an X-ray topographic image showing the local distribution of the intensity of the X-ray 2b diffracted by the sample 3 is recorded. The recorded recording medium 63 is removed from the recording medium holder 64. For example, when an imaging plate is used as the recording medium 63, a topographic image is observed offline using a known or well-known imaging plate reader. To do.
[0050]
In the present embodiment, since the X-ray 2a shaped to have a length of 300 mm and a width of 16 mm is irradiated at a low angle of 2.86 ° with respect to the sample surface 3a, the entire surface of the sample 3 having a diameter of 300 mm is irradiated. X-ray 2a can be irradiated, and an X-ray topographic image over the entire surface of the sample 3 can be recorded in one shot. If an interference image due to simultaneous reflection occurs in the recorded X-ray topographic image, fine adjustment of the in-plane rotation of the sample 3 is performed.
[0051]
Subsequently, the X-ray detector 61 can detect the intensity of the X-ray 2 a diffracted by the sample 3 with the recording medium 63 removed from the recording medium holder 64. Then, the control device 71 outputs an operation command to the sample angle scanning mechanism 41 of the goniometer 40 to operate the mechanism 41, rotate the sample 3 by θ, and diffract the sample 3 by the X-ray detector 61. The intensity of 2 is detected.
[0052]
The control device 71 performs predetermined data analysis based on the intensity data of the X-ray 2 detected by the X-ray detector 61, stores the analysis result in the storage device 72, and displays the diffraction intensity curve on the display device 73. Is displayed. Finally, based on this diffraction intensity curve, a plurality of angular positions of the sample 3 on which X-ray topography is recorded are selected, and the X-ray topographic image is recorded by sequentially fixing the sample 3 at the angular positions. Then, the X-ray topographic image recorded in this way is imaged offline using an imaging plate reader or the like, and crystal lattice defects and the like in the vicinity of the sample surface 3a are observed.
[0053]
In the present embodiment, since the sample is irradiated with X-rays 2a diverging in the width direction, even if a part of the sample 3 is slightly warped, diffraction X-rays at that part can be obtained. it can. Note that the opening angle of the X-ray 2a is small, and the Bragg reflection of the X-ray 2a over the entire surface of the sample 3 is not hindered.
[0054]
As mentioned above, although embodiment of this invention was described, this invention is not limited to this embodiment, If it is the range which does not deviate from the technical idea which concerns on this invention described in the claim, for example, Of course, various modifications are possible depending on the design and the like.
[0055]
For example, the above-described sample support 51 of the sample mounting apparatus 50 is formed in a ring shape, and the center portion of the stage 53 is hollowed out to irradiate the X-ray 2a from the back side of the sample 3 to transmit the diffraction X transmitted through the sample 3 An X-ray topographic image by lines may be recorded on the recording medium 63. In this way, crystal lattice defects and the like inside the sample 3 can be observed.
[0056]
In such a configuration, a short wavelength monochromatic X-ray such as MoKα having transparency is used, and the solar slit 20 and the monochromator 30 adopt a design capable of separating the MoKα doublet. The monochromator 30 has a length of 380 mm. Then, the incident angle of the X-ray 2 is set to 1.5 ° with respect to the surface 31 of the monochromator 30 so that asymmetric 444 reflection occurs. By this operation, the X-ray 2a enlarged to a length of about 300 mm can be obtained as in the above-described embodiment.
[0057]
In the above-described embodiment, the diffracted X-ray intensity over the entire surface of the sample 3 is recorded in one shot. However, when the entire surface of the sample 3 cannot be irradiated with the X-ray 2a, The X-ray topograph may be recorded in multiple steps by translating the sample support base 51 in the direction along the optical axis of the X-ray 2a by the horizontal driving mechanism 54 provided in the sample mounting device 50. Of course.
[0058]
【The invention's effect】
As described above, according to the present invention, the X-ray of the line focus is expanded in the longitudinal direction by the asymmetric reflection monochromator, and the X-ray scattering surface of the monochromator and the X-ray scattering surface of the sample are crossed. Since the sample surface is irradiated with the beam, the X-ray irradiation region on the sample surface can be expanded in all directions, and X-ray topography recording over a wide region on the sample surface can be performed collectively.
[0059]
[Brief description of the drawings]
FIG. 1 is a perspective view showing a configuration of an X-ray topograph apparatus according to an embodiment of the present invention.
FIG. 2 is a front view showing the same X-ray topograph device.
FIG. 3 is a plan sectional view showing a configuration of a solar slit.
FIG. 4 is a schematic diagram for explaining the principle of asymmetric reflection by a monochromator.
FIG. 5 is a perspective view showing a driving direction of a monochromator by a driving device.
FIG. 6 is a schematic diagram showing the arrangement relationship between a monochromator and a sample.
FIG. 7 is a schematic diagram showing an optical path of an X-ray optical system for carrying out a conventional surface reflection double crystal method.
[Explanation of symbols]
1: X-ray topograph device
2: X-ray
3: Sample
3a: sample surface
10: X-ray source
11: Divergence restriction slit
20: Solar slit
21: Slit material
22: Unit unit
23: Divergence restriction slit
30: Monochromator
31: Surface
32: Crystal lattice plane
33: Incident angle adjustment mechanism
34: Crystal tilt and position adjustment mechanism
35: Drive device
36: Entrance slit
40: Goniometer
41: Sample angle scanning mechanism
42: Detector arm angle scanning mechanism
43: Position adjustment mechanism in the width direction
44: Detector arm
50: Sample mounting device
51: Sample support table
52: In-plane rotation mechanism
53: Stage
54: Horizontal driving mechanism
55: Width direction drive mechanism
60: X-ray detector
61: X-ray detector
62: Detector support
63: Recording medium
70: Control system
71: Control device
72: Storage device
73: Display device
100: X-ray optical system
101: X-ray source
102: X-ray
103: Monochromator
104: Sample
105: Recording medium

Claims (3)

A line focus X-ray source, a sample support table for holding the sample, and X-rays generated by the X-ray source are monochromatized to take out short wavelength monochromatic X-rays and irradiate the sample held on the sample support table An X-ray topograph device comprising: a monochromator that performs X-ray recording, and X-ray recording means that records diffracted X-rays from a sample held on the sample support ,
The monochromator is an asymmetric reflection monochromator that takes out X-rays in which the longitudinal direction of the line focus is enlarged by Bragg-reflecting the X-rays at an asymmetric angle with respect to the incident angle of the X-rays,
And the asymmetric reflection monochromator is disposed so that the X-ray scattering surface of the asymmetric reflection monochromator intersects the X-ray scattering surface of the sample held on the sample support ,
The X-ray topograph is characterized in that the sample support is configured to irradiate X-rays from the monochromator from the back side of the sample and guide the diffracted X-rays transmitted through the sample to the X-ray recording means. apparatus. The X-ray topograph device according to claim 1,
The monochromator is configured to take out MoKα X-rays. The X-ray topograph device according to claim 1 or 2 ,
An X-ray topograph apparatus, wherein the asymmetric reflection monochromator is arranged so that an X-ray scattering surface of the asymmetric reflection monochromator is substantially orthogonal to an X-ray scattering surface of a sample.

Images