JP4441541B2 - Semiconductor device - Google Patents

Description

  The present invention relates to a semiconductor device technique, and more particularly to a technique effective when applied to a layout design technique of a semiconductor device.

  In the layout design of a semiconductor device, there are various layout design methods depending on the type of the semiconductor device. The layout design method examined by the present inventors is, for example, a macro cell (mega cell) method. This method is effective when, for example, a system such as a microprocessor, a memory, an I / O (Input / Output), and a custom circuit is made into one chip, and various large and small circuit blocks are arranged in a chip area. This is a method of wiring between them.

  However, the present inventors have found that the technique studied by the present inventors has the following problems.

  That is, there is a problem that the wiring area necessary for connecting the circuit blocks becomes a useless area on the semiconductor chip and the chip size increases. FIG. 20 shows an example of such a situation. Here, the signal terminal 50 and the power supply terminal 51 are arranged on the cell frame of the circuit block 52. When a plurality of circuit blocks 52 are arranged in the horizontal direction (X direction) in FIG. 20, second layer wiring 53 a and third layer wiring 53 b are arranged between adjacent circuit blocks 52 for signal connection between circuit blocks 52. It is necessary to provide a wiring region 54 for the purpose. This leads to an increase in chip size.

  An object of the present invention is to provide a technique capable of reducing the chip size.

  The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

  Of the inventions disclosed in the present application, the outline of typical ones will be briefly described as follows.

  That is, the present invention has a plurality of circuit blocks arranged along the first direction and a first wiring that extends along the first direction and electrically connects the plurality of circuit blocks. In each of the plurality of circuit blocks, a plurality of signal terminals are arranged along a second direction intersecting the first direction, and each of the plurality of signal terminals is arranged in the second direction. The plurality of signal terminals are electrically connected to each of the plurality of signal terminals, and the first wiring disposed in the upper wiring layer is electrically connected to each of the plurality of signal terminals. Is.

  The outline of other inventions disclosed in the present application will be briefly described as follows.

  That is, according to the present invention, the signal terminal of the circuit block has a structure capable of securing a plurality of channels in the second direction intersecting the first direction in which the plurality of circuit blocks are arranged. The lead-out is performed by a first wiring extending in the first direction, which is an upper layer wiring than the signal terminal.

  In the present invention, the signal terminal extends in the second direction.

  In the present invention, the signal terminals are also arranged in the first direction, and the signal terminals adjacent to each other in the first direction are arranged shifted in the second direction.

  According to the present invention, power supply terminals extending in the second direction are arranged in the circuit block.

  According to the present invention, the power supply terminal of the circuit block extends in a second direction intersecting the first direction in which the plurality of circuit blocks are arranged, and the lead-out of the power supply terminal is connected to the power supply terminal. The wiring is a layer above the terminal, and is performed by the first wiring extending in the first direction.

  In the present invention, a memory circuit is formed in the circuit block.

  Among the inventions disclosed in the present application, effects obtained by typical ones will be briefly described as follows.

  That is, since the circuit blocks adjacent in the first direction can be arranged without a gap, the chip size can be reduced.

  Before describing the present invention in detail, the meaning of terms in the present application will be described as follows.

  1. The term “semiconductor device” or “semiconductor integrated circuit device” refers to not only those manufactured on a semiconductor or insulator substrate such as a silicon wafer or a sapphire substrate, but also TFT (Thin-Film-) unless otherwise specified. Transistors and STN (Super-Twisted-Nematic) liquid crystal and the like made on other insulating substrates such as glass are also included.

  2. A macro cell refers to a large-scale circuit block or functional block having a higher function than a basic cell. The hard macro in which the mask pattern is determined and the library information are classified up to the netlist expression, and are classified into the soft macro that generates the mask pattern at every design. The macro cell is a standard cell (poly cell) that represents a small logic gate and has a constant height, RAM (Random Access Memory), ROM (Read) that has a regular layout structure and is automatically generated by the module generator according to the input parameters. There are module cells such as Only Memory (PLA), PLA (Programmable Logic Array), multiplier, adder or data path, CPU (Central Processing Unit), analog cell, I / O (Input / Output) cell, and the like. In addition to mask pattern information, information such as cell frames and terminal information for automatic placement and routing, function models for simulation, logic models, delay parameters, etc. are registered in the design system (computer etc.) as a cell library. It can be easily called from the cell library and used during simulation. RAM and ROM are memory circuits (memory modules), and examples of RAM include DRAM (Dynamic RAM), SRAM (Static RAM), and FRAM (Ferroelectric RAM). Examples of ROM include mask ROM (MROM), flash memory (EEPROM: Electric Erasable Programmable ROM), and the like.

  3. The in-cell wiring mainly refers to signal and power wiring for configuring a desired circuit (function) in the cell.

  4). The outside-cell wiring (outside circuit block wiring, first wiring) refers to signal wiring and power wiring for mainly connecting a plurality of cells to form an overall circuit.

  5. The inner terminal is a terminal arranged in the cell frame of the macro cell.

  6). IP (Intellectual Property) refers to a circuit block that can be reused as a design asset of a circuit function block that has already been designed and whose operation has been confirmed.

  7). The net list refers to design data representing the connection relationship of an integrated circuit or the like. The netlist is in a format that can be processed by a computer. In general, in order to make the data compact, the connection relationship is described hierarchically.

  8). The wiring grid is a line indicating a path (wiring channel) for arranging wiring, and is constituted by a plurality of wiring grid lines orthogonal to each other. There is a type in which the wiring grid and the boundary of the macro cell coincide with each other and a type in which the boundary does not coincide. In the former, since wiring can be arranged at the boundary of the macro cell, wiring easiness can be improved. The latter can reduce the cell size, so that the size of the semiconductor chip can be reduced.

  In the following embodiments, when it is necessary for the sake of convenience, the description will be divided into a plurality of sections or embodiments. However, unless otherwise specified, they are not irrelevant to each other. There are some or all of the modifications, details, supplementary explanations, and the like.

  Further, in the following embodiments, when referring to the number of elements (including the number, numerical value, quantity, range, etc.), especially when clearly indicated and when clearly limited to a specific number in principle, etc. Except, it is not limited to the specific number, and may be more or less than the specific number.

  Further, in the following embodiments, the constituent elements (including element steps and the like) are not necessarily indispensable unless otherwise specified and apparently essential in principle. Needless to say.

  Similarly, in the following embodiments, when referring to the shapes, positional relationships, etc. of the components, etc., the shapes are substantially the same unless otherwise specified, or otherwise apparent in principle. And the like are included. The same applies to the above numerical values and ranges.

  Also, components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiments, and the repetitive description thereof is omitted.

  In the present embodiment, a MIS • FET (Metal Insulator Semiconductor Field Effect Transistor) representing a field effect transistor is abbreviated as MIS, a p-channel type MIS • FET is abbreviated as pMIS, and an n-channel type MIS • FET. Is abbreviated as nMIS.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

(Embodiment 1)
FIG. 1 is a plan view of a macro cell MC1, which is a circuit block constituting a semiconductor device according to an embodiment of the present invention. FIG. 2 is a layout plan view in which a wiring grid (broken line) and an out-cell wiring L are added to FIG. On the semiconductor device, the interval between adjacent wiring grid lines is, for example, about 0.5 μm.

  In the macro cell MC1, for example, a predetermined circuit function is configured by electrically connecting a plurality of integrated circuit elements arranged in a cell frame by intra-cell wiring. The intra-cell wiring is composed of, for example, first and second layer wirings. FIG. 1 illustrates an input circuit A and an output circuit B of the macro cell MC1. The input circuit A is composed of, for example, a CMIS (Complementary MIS) inverter circuit, and has pMISQp1 and nMISQn1. The output circuit B has pMISQp2 and nMISQn2. FIG. 2 illustrates a method in which the cell frame of the macro cell MC1 is arranged on the wiring grid line. The arrangement method of the cell frames is not limited to this, and for example, the cell frames may be arranged so as to be shifted by a half pitch between adjacent wiring grid lines.

  The macro cell MC1 has a plurality of signal terminals Ts. The terminal Ts is a conductor portion for transmitting and receiving signals between a circuit formed in the macro cell MC1 and a circuit outside the macro cell MC1, and is formed by wiring of the uppermost wiring layer in the macro cell MC1. Here, the terminal Ts is composed of, for example, a second layer wiring. Further, here, a state in which the input of the input circuit A and the output of the output circuit B in the macro cell MC1 are electrically connected to the terminal Ts is illustrated. The gate electrodes of pMISQp1 and nMISQn1 of the input circuit A are electrically connected to the terminal Ts, and the drain regions of pMISQp2 and nMISQn2 of the output circuit B are electrically connected to the terminal Ts. A power supply voltage Vdd is supplied to the source regions of pMISQp1 and pMISQp2, and a power supply voltage Vss having a potential lower than the power supply voltage Vdd is supplied to the source regions of nMISQn1 and nMISQn2. The power supply voltages Vdd and Vss will be described later. Further, the terminal Ts is electrically connected to the input circuit A and the output circuit B using the second layer wiring, the first layer wiring which is a lower wiring layer than the second layer wiring, or both of them.

  Further, the terminals Ts are arranged in a line along the side in the vicinity of the side along the vertical direction (Y direction (second direction)) in FIGS. 1 and 2 in the cell frame of the macro cell MC1. ing. Between the terminals Ts adjacent in the Y direction, for example, an interval is provided so that only one wiring grid line extending in the horizontal direction (X direction (first direction)) in FIGS. 1 and 2 can be arranged. ing. Thus, by arranging the terminal Ts in the cell frame (that is, by using the inner terminal), the area of the macro cell MC1 can be reduced. In addition, a plurality of terminals Ts can be arranged without increasing the area of the macro cell MC1. However, this invention is not limited to this, For example, it can apply also to the thing of the structure where the terminal Ts is arrange | positioned on a cell frame. In addition, here, a case where the terminals (inner terminals) Ts are arranged in a row is illustrated, but a plurality of rows may be provided. This will be described later.

  Further, in the present embodiment, the terminal (inner terminal) Ts has a planar rectangular pattern that is long in the Y direction as shown in FIG. 2 on the line along the wiring grid line extending in the Y direction. It is formed with. That is, the terminal Ts is formed extending in the Y direction so that a plurality of wiring grid lines extending in the X direction can pass therethrough. Here, the dimension in the Y direction of the terminal Ts is set so that, for example, two or more wiring grid lines in the X direction can pass therethrough. The direct connection to the terminal Ts from the outside of the macro cell MC1 is performed by the outside-cell wiring L serving as an overhead wiring of the macro cell MC1. The outside-cell wiring L is composed of wiring in a wiring layer above the terminal (inner terminal) Ts, for example, third-layer wiring, and is arranged on the wiring grid line extending in the X direction. Yes. The cell outside wiring L is electrically connected to the terminal Ts through the through hole TH (see FIG. 2). The through hole TH is mainly arranged at the intersection of the wiring grid line extending in the X direction and the wiring grid line extending in the Y direction. By adopting such a macro cell MC1 structure, a plurality of macro cells MC1 can be arranged without a gap (even if no wiring region is provided between the cells). In addition, since the terminal Ts has a rectangular shape, the wiring channel efficiency in the placement and routing process can be improved, and the degree of freedom of wiring can be improved. As a result, the size of the semiconductor chip (chip size) can be reduced.

  3 and 4 show an example of a memory circuit (module) such as a RAM or ROM configured by arranging m macrocells MC1 in the X direction and n in the Y direction. FIG. 3 illustrates a case where data input is common (address space expansion), and FIG. 4 illustrates a case where address is common (bit width expansion). 3 and 4, LC is a cell signal wiring for the clock signal, LA is a cell wiring for the address signal, LDIN is a cell wiring for the data input signal, and LDOUT is a cell for the data output signal. External wiring is shown. All of them illustrate the outside-cell wiring L.

  3 and 4, the configuration of each macro cell MC1 is the same. For example, a RAM having a predetermined memory capacity is formed in each macro cell MC1. In FIG. 3, the macro cell MC1 sharing the data input is arranged without a gap along the extending direction (X direction) of the out-cell wiring LC. In FIG. 4, the macro cells MC1 having a common address are arranged without a gap along the extending direction (X direction) of the outside-cell wiring LA. The out-cell wiring LA for address signals, the out-cell wiring LDIN for data input signals, and the out-cell wiring LDOUT for data output are arranged so as to extend in the X direction on each macro cell MC.

  That is, as shown in FIG. 3, the out-cell wiring LA for address signals and the out-cell wiring LDOUT for data output signals are electrically connected to different macrocells MC1, respectively, and the out-cell wiring LDIN for data input signals is Each is electrically connected in common to these macro cells MC1.

  Further, as shown in FIG. 4, the out-cell wiring LA for address signals is electrically connected in common to these macrocells MC1, and the out-cell wiring LDIN for data input signals and the out-cell wiring for data output signals The wiring LDOUT is electrically connected to each different macro cell MC1.

  According to the present embodiment as described above, as shown in FIGS. 3 and 4, the terminal Ts of each macro cell MC1 can be drawn out by the out-cell wiring L of the third wiring layer above it, so that It is not necessary to provide a wiring region for arranging the wirings between the macro cells MC1. For this reason, the plurality of macro cells MC1 can be arranged without gaps in both the X direction and the Y direction. Therefore, the chip size can be reduced.

  In FIGS. 3 and 4, the cell signal wiring LC for the clock signal is divided for each macro cell MC1. That is, the clock signal external cell lines LC are electrically connected to different macro cells MC1. As a result, only the necessary macro cell MC1 can be operated to reduce the power consumption of the entire semiconductor device. Further, a different clock signal can be input for each macro cell MC1.

  FIG. 5 is an explanatory diagram for explaining the relationship between the arrangement of the macro cell MC1 and the longitudinal dimension of the signal terminal Ts. Here, the case where the longitudinal dimension of the terminal Ts is set to a dimension capable of arranging four wiring grid lines extending in the X direction is illustrated. In this case, up to four macrocells MC1 can be arranged without gaps in the X direction. If it exceeds this, the outside-cell wiring cannot be arranged. Therefore, in this case, the case where the macro cell MC1 is expanded in the Y direction is illustrated.

(Embodiment 2)
In this embodiment, an example in which a plurality of signal terminals are arranged in a row is described. 6 and 7 show an example. FIG. 6 shows a plan view of a macro cell MC2 which is a circuit block constituting the semiconductor device of the present embodiment. FIG. 7 shows a diagram in which a wiring grid (broken line) and an out-cell wiring L are added to FIG.

  In the macro cell MC2, the configuration other than the arrangement of the terminal Ts is the same as that described in the macro cell MC1 of the first embodiment. In the present embodiment, a plurality of rows of terminals Ts are arranged in the X direction. And the position of the terminal Ts of the terminal row | line | column which adjoins mutually is arrange | positioned and shifted | deviated to the Y direction. Thereby, the wiring channel can be effectively used. For example, as shown in FIG. 7, the uppermost cell outside line L1 (L) is a line electrically connected to the uppermost terminal Ts1 (Ts) of the leftmost terminal row through the through hole TH. Since this out-cell wiring L1 extends not only on the terminal Ts1 but also in the X direction, if the position of the terminal Ts is not shifted in the Y direction as described above, the arrangement of the uppermost out-cell wiring L1 As a result, the connection portion (part of the wiring channel) of the terminals Ts2a and Ta2b in the second terminal row from the left is also crushed. In the present embodiment, since the position of the terminal Ts in the second terminal row from the left is shifted in the Y direction with respect to the position of the terminal Ts in the leftmost terminal row, in the second terminal row from the left In FIG. 8, the out-cell wiring L1 can be passed over the wiring grid line between the terminals Ts2a (Ts) and Ts2b (Ts) adjacent in the Y direction. For this reason, in the second terminal row from the left, the connection portions on the terminals Ts2a and Ts2b are not crushed by the outside-cell wiring L1. Accordingly, since a portion where the terminals Ts2a and Ta2b can be connected can be secured, the wiring channel can be effectively used. For this reason, it is possible to secure the degree of freedom of connection of the outside-cell wiring L, and it is possible to promote the reduction of the chip size.

  FIG. 8 shows an example of a memory circuit (module) such as a RAM or ROM configured by arranging a plurality of the macro cells MC1 and MC2. Here, a configuration in which the sizes of the macro cells MC1 and MC2 are different is illustrated. In addition, here, a case where the cell external wiring LC for clock signals of a plurality of macro cells MC1 and MC2 having different sizes is shared is illustrated. Of course, a plurality of macro cells having the same size but different types can be arranged.

(Embodiment 3)
9 is a plan view of a macro cell MC3 constituting a semiconductor device according to another embodiment of the present invention, FIG. 10 is a layout plan view in which a wiring grid (broken line) is added to FIG. 9, and FIG. FIG. 12 is a cross-sectional view taken along the line X1-X1 of FIG.

  In the macro cell MC3, a memory circuit (module) such as the RAM or the ROM is formed. In the cell frame of the macro cell MC3, a memory cell array MA, an X decoder area XDA, a Y decoder YDA, and an input / output circuit area I / OA are arranged. In the memory cell array MA, for example, a memory circuit such as a DRAM, SRAM, or FRAM is formed. That is, memory cells, word lines, and data lines are formed in the memory cell array MA. An X decoder circuit is formed in the X decoder area XDA, and a Y decoder circuit is formed in the Y decoder area YDA. Memory cells are arranged at the intersections of the word lines and the data lines, the word lines are electrically connected to the X decoder circuit, and the data lines are electrically connected to the Y decoder circuit. In the input / output circuit area I / OA, an input / output bidirectional circuit is arranged in addition to the input circuit and the output circuit described above.

  The arrangement of the signal terminals Ts is the same as that described in the second embodiment. Here, the terminal (inner terminal) Ts is arranged in the input / output circuit area I / OA. That is, the wiring delay can be reduced by arranging the terminal Ts (inner terminal) and the input / output circuit area I / OA. In the present embodiment, the power supply terminals Tvdd and Tvss are arranged at positions adjacent to the signal terminal Ts group in the input / output circuit area I / OA in the cell frame of the macro cell MC3. The power supply terminals Tvdd and Tvss are terminals for supplying a power supply voltage to the macro cell MC3, and extend from the upper and lower ends of the cell frame along the longitudinal direction (Y direction) of the signal terminal Ts. It is formed in a strip pattern. Thereby, the power source of the macro cell MC3 can be taken anywhere within the dimension in the Y direction. For this reason, it is possible to improve the degree of freedom of routing of the power source outside cell wiring. In addition, since the power can be taken at the most effective place or number according to the macro cell MC3, the stability of the power supply potential can be improved. The power supply terminal Tvdd is a terminal for supplying a relatively high potential power supply voltage Vdd, and is set to about 1.8V or 3.3V, for example. The power supply terminal Tvss is a terminal for supplying a reference potential (relatively low power supply voltage Vss) of the semiconductor device, and is set to about 0 V, for example.

  FIG. 11 shows a connection state between the power supply terminals Tvdd and Tvss, the power supply in-cell wirings LIvdd1 and LIvss1, and the power supply out-of-cell wirings Lvdd and Lvss. The power supply terminals Tvdd and Tvss are composed of, for example, a second layer wiring. The terminals Tvdd and Tvss are electrically connected to the power supply in-cell wirings LIvdd1 and LIvss1 configured by the first layer wirings through the through holes TH1, respectively. Further, the terminals Tvdd and Tvss are electrically connected to the power supply outside-cell wirings Lvdd and Lvss constituted by the third layer wirings through the through holes TH2. It should be noted that some of the out-cell wirings L formed of the third layer wiring simply pass above the power supply terminals Tvdd and Tvss. Further, the power terminals Tvdd and Tvss are arranged on wiring grid lines extending in the Y direction as shown in FIGS.

  In this way, the power supply outside-cell wirings Lvdd and Lvss extending in the X direction on the macro cell MC3 and the outside thereof are configured with a wiring layer higher than the power supply terminals Tvdd and Tvss, and Via the terminals Tvdd and Tvss, the power supply terminals Tvdd and Tvss are configured to be electrically connected to the power supply internal cell lines LIvdd and LIvss below the power supply terminals Tvdd and Tvss. The power supply terminals Tvdd and Tvss are formed in a band-like pattern extending from the upper end to the lower end of the cell frame of the macro cell MC3, so that the power supply external cells Lvdd and Lvss and the power supply terminals Tvdd and Tvss In addition, the degree of freedom of connection can be increased, and the degree of freedom of arrangement of the signal outside-cell wiring extending on the macro cell MC3 can be increased. That is, as a result, it is possible to increase the arrangement density of the power source out-of-cell wirings Lvdd and Lvss and the signal out-of-cell wiring passing over the macro cell MC3, thereby achieving high integration. Further, it is possible to improve the degree of freedom of connection between the power supply terminals Tvdd and Tvss and the power supply in-cell wirings LIvdd and LIvss configured by the first layer wiring. Note that the first layer wirings LIvdd and LIvss are electrically connected to integrated circuit elements constituting each circuit in the macro cell MC3, for example.

  Next, a part of the vertical structure of the macro cell MC3 will be described with reference to FIG. FIG. 12 illustrates, for example, a cross section of the output circuit nMISQn2 as the integrated circuit element. However, the integrated circuit element is not limited to this, and there are various types, for example, pMIS, diode, bipolar transistor, resistor, or capacitor.

A semiconductor substrate (hereinafter simply referred to as a substrate) 1S constituting a semiconductor chip is made of, for example, p-type single crystal silicon. In the separation region of the main surface of the substrate 1S, for example, a groove-type separation portion 2 (trench isolation) is formed. Separation unit 2, in a groove dug from the main surface of the substrate 1S to a predetermined depth, for example, an insulating film such as silicon oxide (SiO ₂₎ is formed by being embedded. The isolation | separation part 2 is not limited to a groove | channel type | mold, It can change variously, For example, it is good also as a field insulating film which consists of a silicon oxide etc. formed by the LOCOS (LOCOS; Local Oxidization of Silicon) method.

  In the active region surrounded by the isolation portion 2, semiconductor regions called p wells PWL1, PWL2 and n well NWL1 are formed from the main surface (device surface) of the substrate 1S to a predetermined depth. . Among these, the p-well PWL2 is surrounded by a semiconductor region called an n-type buried region NISO. That is, the p well PWL2 is electrically isolated from the substrate 1S. Thereby, it is possible to suppress or prevent noise and the like from propagating through the substrate 1S to the p well PWL2. Further, the potential of the p-well PLW2 can be set to a potential different from that of the substrate 1S.

  Impurities for forming a p-type region such as boron (B) are introduced into the p wells PWL1 and PWL2, and phosphorus (P) or arsenic (As) is introduced into the n well NWL1 and the n type buried well NISO, for example. Impurities that form n-type regions such as) are introduced. Here, nMISQn2 is formed in the p-well PWL2. nMISQn2 has a pair of semiconductor regions 3 for source and drain, a gate insulating film 4, and a gate electrode 5A. The channel of this nMISQn2 is formed in the interface portion between the gate insulating film 4 and the substrate 1S under the gate electrode 5A in the substrate 1S between the pair of semiconductor regions 3, for example (surface channel).

The semiconductor region 3 for the source and drain of nMISQn2 is set to n-type by introducing, for example, phosphorus or arsenic. The gate insulating film 4 is made of, for example, a silicon oxide film. The gate insulating film 4 may be an oxynitride film. Thereby, hot carrier tolerance can be improved. The gate electrode 5A is made of, for example, n-type low resistance polysilicon. For example, phosphorus or arsenic is introduced into the gate electrode 5A. The gate electrode 5A is not limited to a single film of low resistance polysilicon, and can be variously changed. For example, a so-called polycide gate structure in which cobalt silicide (CoSi _x ) is formed on an n-type low-resistance polysilicon film may be used. Titanium silicide (TiSi _x ) or tungsten silicide (WSi _x ) can be employed instead of cobalt silicide, but the resistance of cobalt silicide can be reduced. Further, a so-called polymetal gate structure in which a tungsten (W) film is deposited on an n-type low-resistance polysilicon film through a barrier film such as titanium nitride (WN) may be used. In this case, the resistance of the gate electrode 5A and the contact resistance between the gate electrode 5A and the wiring can be greatly reduced.

  On the main surface of the substrate 1S, interlayer insulating films 6a and 6b made of, for example, silicon oxide are sequentially deposited from the lower layer. A first wiring layer is formed on the interlayer insulating film 6a, and a second wiring layer is formed on the interlayer insulating film 6b. The signal terminal Ts and the power supply terminals Tvdd and Tvss are formed on the interlayer insulating film 6b. These terminals Ts, Tvdd, and Tvss are made of, for example, aluminum (Al) or aluminum-Si-copper alloy, and are patterned at the same patterning time.

  The terminal Ts is electrically connected to the in-cell wiring LIs1 formed of the first layer wiring through the through hole TH drilled in the interlayer insulating film 6b. The in-cell wiring LIs1 is electrically connected to one semiconductor region 3 of the nMISQn2 through a contact hole CNT1 drilled in the interlayer insulating film 6a. The in-cell wiring LIs1 is made of the same material as the terminal Ts.

The terminal Tvss is electrically connected to the in-cell wiring LIvss1 formed of the first layer wiring through the through hole TH1 drilled in the interlayer insulating film 6b. The in-cell wiring LIvss1 is electrically connected to the p ⁺ type semiconductor region 7 of the p well PWL1 through a contact hole CNT2 drilled in the interlayer insulating film 6a. The intra-cell line LIvss1 is made of the same material as the intra-cell line LIs1, and is patterned in the same patterning as the intra-cell line LIs1.

  Next, FIGS. 13 and 14 are plan views of a semiconductor chip (hereinafter simply referred to as a chip) created using the technical concept of this embodiment. FIG. 14 is a plan view of the chip 1C at the stage where the macro cell is arranged and before performing the wiring process.

  The chip 1C is composed of a small piece of a planar quadrangular substrate 1S, and for example, a computer system is formed in the chip 1C (SoC; System On Chip). However, the present invention itself is not limited to SoC and can be applied in various ways.

  In the vicinity of the outer periphery of the chip 1C, a plurality of external terminals 8 are arranged along the outer periphery. Of course, the arrangement of the external terminals 8 is not limited to this, and for example, a configuration in which the external terminals 8 are arranged in the center of the chip 1C may be used. The peripheral area of the chip 1C including the area where the external terminals 8 are arranged is an input / output circuit area of the chip 1C, that is, an area where I / O cells are arranged. In general, the external terminal 8 is electrically connected to a package lead through a bonding wire, a bump electrode (projection electrode), or the like that is connected in direct contact with the external terminal 8, and further, a wiring board on which the package is mounted. It is electrically connected to the output of an external device (or external circuit) outside the chip 1C through the upper wiring.

  A plurality of macro cells MC3, MC4, MC5 are arranged in the internal circuit area of the chip 1C. The macro cell MC3 in which the RAM is formed as described above is arranged without causing a gap between adjacent ones. Further, for example, a ROM is formed in the macro cell MC4. The macro cell MC4 is also arranged without causing a gap between adjacent ones. Therefore, the waste area can be reduced or eliminated, and the chip size can be reduced. The power terminals Tvdd and Tvss of the macro cell MC3 adjacent in the Y direction are electrically connected to each other. Further, the power terminals Tvdd and Tvss of the macro cell MC4 adjacent in the Y direction are also electrically connected to each other.

  The area excluding the arrangement area of the macro cells MC3 and MC4 is a core cell area or a custom area. For example, a desired logic circuit is formed in the macro cell MC5 arranged in the core cell region or the custom region. The macro cell MC5 also incorporates the technical idea of the present invention. Between the adjacent macro cells MC3 to MC5, a wiring region for connecting them is prepared. In this wiring region, an out-cell wiring for electrically connecting the macro cells MC3 to MC5 is arranged. The structure of the in-cell wiring and the out-cell wiring is the same as described above. In the layout design, as shown in FIG. 14, a plurality of macrocells MC3 to MC5 are arranged, and then an outside-cell wiring connecting these macrocells MC3 to MC5 is arranged, so that a semiconductor having a desired circuit function as a whole. Design the equipment.

(Embodiment 4)
FIG. 15 shows an example of a macro cell that is a circuit block in the semiconductor device of this embodiment. In the macro cell MC6, the signal terminal Ts has a planar square shape, and a wiring channel for connecting the signal terminal Ts and the outside-cell wiring around the signal terminal Ts (particularly in the Y direction). Area C is arranged. The wiring channel region C itself is a virtual region provided on the data at the time of placement and routing in the design stage of the semiconductor device. Whether or not the wiring is arranged in the wiring channel region C depends on the connection state with the outside-cell wiring.

  According to the present embodiment, since the signal terminal Ts can be shortened, the wiring capacitance by the terminal Ts can be reduced as compared with the first to third embodiments. In particular, when the signal speed of the wiring is severe, application of this technical idea is effective in reducing the wiring delay. Such a structure of the present embodiment and the structures of the first to third embodiments may be realized in the same macro cell. For example, in a place where a particularly critical path is arranged, the signal terminal is formed in a planar square shape as in the present embodiment, and in other places, the signal terminal Ts is set as in the first to third embodiments. A flat rectangular shape may be used. As a result, both reduction in chip size and improvement in characteristics (signal speed) can be achieved. The first row of terminal rows can be changed variously, such as in the first embodiment, and the second row of terminal rows can be as in the present embodiment, or vice versa. In this case, the same effects as those of the second embodiment can be obtained, and characteristics (signal speed) can be improved.

  FIG. 16 shows an example of a method for connecting the outside-cell wirings LC, LA and the signal terminal Ts when a plurality of the macro cells MC6 are arranged. Here, in the macro cell MC6 in the second column and thereafter, the out-cell wirings LC and LA are once connected to the in-cell wiring LIs2 in the wiring channel region C through the through-hole TH, and electrically connected to the terminal Ts through the in-cell wiring LIs2. Connect.

  FIG. 17 is a plan view of the main part of the semiconductor device configured as described above. In the macro cell MC6 in the first column, the signal terminal Ts is a normal planar square terminal. The external cell lines LC and LA are directly electrically connected to the first row of terminals Ts through the through holes TH. In the macro cell MC6 in the second and subsequent columns, the out-cell wirings LC and LA are electrically connected to the in-cell wiring LIs2 that is the second layer wiring through the through hole TH. The intra-cell line LIs2 extends in the Y direction in FIG. 17 and is connected to the terminal Ts. That is, the outside cell lines LC and LA are electrically connected to the terminal Ts formed integrally therewith through the inside cell line LIs2. In the macro cell MC6 in the third column, the dimension in the Y direction of the in-cell wiring LIs2 is longer than the in-cell wiring LIs2 in the macro cell MC6 in the second column. This is because if the lengths are the same, the external cell lines LC and LA cannot be connected to the terminal Ts of the macro cell MC6 in the third column. In this example, the chip size can be reduced. In addition, since the wiring capacity can be reduced, characteristics (signal speed, etc.) can be improved.

(Embodiment 5)
The macro cells MC1, MC2, MC3, MC6 (hereinafter represented by the macro cell MC), which are the circuit blocks described in the first to fourth embodiments, can be used as IP components that constitute a part of the integrated circuit. Data for specifying the macrocell MC (hereinafter referred to as IP module data) is stored in a storage medium such as a magnetic disk, a floppy (registered trademark) disk, a hard disk, a CD-ROM, or an MO (magnet-optical disk). , And stored in a state readable by a computer.

  This IP module data is data for designing an integrated circuit to be formed on one chip 1C using a computer. The IP module data includes graphic pattern data that defines a graphic pattern to be formed on the chip 1C and functional data that defines the function of the macro cell.

  The graphic pattern data is, for example, data for forming a mask pattern used when manufacturing a semiconductor device, and is, for example, drawing data for forming a mask pattern. The mask pattern data is generated for each circuit formation layer such as a semiconductor region (active region), element isolation region, gate electrode, wiring layer, insulating film, connection hole (contact hole or through hole) on the chip 1C. It is data that defines a pattern, and is data that can generate a photomask pattern in lithography technology. The function data is data in which the function of the macro cell is described in a computer language such as HDL (Hardware Description Language).

  FIG. 18 shows an example of a computer 10 such as an engineering workstation, a personal computer, or a design apparatus used for designing an integrated circuit. The computer 10 includes a processor board on which a processor and a memory are mounted, and a main body 10a on which various interface boards are mounted. Peripheral devices such as a display 10b, a keyboard 10c, and a disk drive 10d are typically connected. ing. IP module data including the graphic pattern data and function data is stored in the storage medium 11. Although not particularly limited, the IP module data stored in the storage medium 11 is read into the main body 10a of the computer 10 by attaching the storage medium 11 to the disk drive 10d. For example, when the read IP module data is description data described in HDL, the computer 10 decodes the data and performs processing. In order to decrypt and perform processing, the computer 10 executes a specific program. The computer 10 may be a distributed processing system. For example, each of disk access, layout calculation, and man-machine interface may be processed using individual computers, and the processing results may be used in cooperation. When the capacity of the IP module data increases and it becomes impossible to store the data in one storage medium 11, the IP module data is stored across a plurality of storage media 11. Also good. Of course, the IP module data may be divided in advance so as to be stored in a plurality of storage media 11 and stored in a plurality of storage media 11.

  The design process employing the macro cell MC reads the IP module data from the storage medium 11 into the computer 10 and designs a semiconductor device such as a microcomputer including the macro cell MC corresponding to the read IP module data as one built-in module. It can be positioned as a process included in a part of the process.

  FIG. 19 generally shows an example of a process for designing a semiconductor device using the IP module data. Since the semiconductor device is manufactured using the mask pattern formed by this method, the design processing method can be regarded as a method for manufacturing a semiconductor device.

  First, in logic synthesis, processing such as connection between macro cells is performed (step 100). Here, a logic circuit (logic diagram, netlist, etc.) is automatically generated from high-level design data (hardware description language, logical expression, truth table, etc.). In the logic synthesis process until the final netlist is generated, logic optimization is performed by repeating scanning such as logic compression (LogicMinimization), factoring (Factoring), and flattening (Flatten).

  In the subsequent logic verification, the logic synthesis is logically verified (step 101). Here, it is verified whether or not the logic circuit operates as intended by the designer. For example, input the logic list of each logic gate, rise / fall time, and netlist, apply test vectors (a series of input signal patterns for testing logic circuit functions), and expect output signal knowledge Verify by comparing the values.

  After this logic verification, the layout design of the entire integrated circuit is performed (step 102). Here, a mask pattern layout serving as an original picture of the photomask is created according to the logical design. Based on the logic circuit (net list) of the semiconductor device, the integrated circuit elements such as transistors and resistors are arranged while determining the dimensions so as to satisfy the specification function, and the integrated circuit elements are wired. Here, you must also follow the design rules from the process side. Optimize placement and routing while taking into account electrical characteristics, and reduce the chip size as much as possible.

  As mentioned above, the invention made by the present inventor has been specifically described based on the embodiment. However, the present invention is not limited to the embodiment, and various modifications can be made without departing from the scope of the invention. Needless to say.

  For example, in the first and second embodiments, the case where all the signal terminals in the macro cell are planar rectangular has been described. However, the present invention is not limited to this. For example, the planar rectangular terminal and the planar square shape are not limited thereto. It is also possible to adopt a macro cell structure in which normal terminals are arranged. The planar square terminal can be used as a signal terminal common to a plurality of macro cells, for example. As a result, the area occupied by the entire terminal group can be reduced.

  Further, in place of the wiring structures of the first to fifth embodiments, a so-called damascene wiring is formed by forming a wiring by burying a conductor film (for example, copper (Cu) wiring) in a groove or hole in the interlayer insulating film. A structure may be adopted.

  In the above description, the case where the invention made by the present inventor is mainly applied to the SoC which is the field of use behind the present invention has been described. However, the present invention is not limited to this, and is represented by, for example, a gate array or a standard cell. The present invention can also be applied to other semiconductor devices such as ASIC (Application Specific IC).

  The present invention can be applied to the semiconductor device manufacturing industry.

It is a top view of the macrocell which comprises the semiconductor device which is one embodiment of this invention. FIG. 2 is a plan view of a layout plane in which a wiring grid and out-cell wiring are added to FIG. 1. It is explanatory drawing of an example of the principal part plane of the semiconductor device comprised by arrange | positioning multiple macrocells of FIG. It is explanatory drawing of an example of the principal part plane of the semiconductor device comprised by arrange | positioning multiple macrocells of FIG. FIG. 2 is an explanatory diagram for explaining a relationship between the arrangement of the macro cell in FIG. 1 and the longitudinal dimension of a signal terminal. It is a top view of the macrocell which comprises the semiconductor device which is other embodiment of this invention. FIG. 7 is a plan view of a layout plane in which a wiring grid and out-cell wiring are added to FIG. 6. FIG. 7 is an explanatory diagram of an example of a principal plane of a semiconductor device configured by arranging a plurality of macro cells of FIGS. 1 and 6. It is a top view of an example of the macro cell which constitutes the semiconductor device which is other embodiments of the present invention. It is a top view of the layout plane which added the wiring grid to FIG. FIG. 10 is an enlarged plan view of a main part showing a connection state between a power supply terminal of the macro cell of FIG. It is sectional drawing of the X1-X1 line | wire of FIG. It is a top view of an example of the semiconductor chip which comprises the semiconductor device using the macrocell of FIG. It is a top view of the semiconductor chip before arrange | positioning the wiring of FIG. It is a top view of an example of the macro cell which is further another embodiment of this invention. FIG. 16 is a plan view of a principal part of the semiconductor device for describing a wiring connection method when the macro cell of FIG. 15 is used. FIG. 17 is a plan view of main parts of a semiconductor device manufactured by the wiring connection method described in FIG. 16. It is explanatory drawing of the computer used with the manufacturing method of the semiconductor device which is other embodiment of this invention. FIG. 19 is a flowchart for designing a semiconductor device using the computer of FIG. 18. It is explanatory drawing of the layout design of the semiconductor device which the present inventors examined.

Explanation of symbols

1C Semiconductor chip 1S Semiconductor substrate 2 Separating part 3 Semiconductor region 4 Gate insulating film 5A Gate electrodes 6a, 6b Interlayer insulating film 7 Semiconductor region 8 External terminal 10 Computer 10a Main body 10b Display 10c Keyboard 10d Disk drive 11 Storage media MC1 to MC6 Macrocell L , L1 Cell outside wiring LC Cell outside wiring LA Cell outside wiring LDIN Cell outside wiring LDOUT Cell outside wiring Lvdd, Lvss Cell outside wiring LIs1, LIs2 Cell wiring LIvdd1, LIvss1 Cell wiring Ts, Ts1, Ts2a, Ts2b terminal Tvdd terminal Tvss Terminal TH, TH1, TH2 Through hole CNT1, CNT2 Contact hole A Input circuit B Output circuit C Wiring channel region Qp1, Qp2 p channel type MIS • FET
Qn1, Qn2 n-channel type MIS • FET
NISO buried region PWL1, PWL2 p well NWL1 n well MA memory cell array I / OA input / output circuit region XDA X decoder region YDA Y decoder region

Claims (10)

A plurality of circuit blocks arranged along a first direction; and a first wiring extending along the first direction and electrically connecting the plurality of circuit blocks;
Each of the plurality of circuit blocks is provided with a plurality of signal terminals along a second direction intersecting the first direction,
Each of the plurality of signal terminals has a structure in which spaces for a plurality of channels are secured in the second direction,
The semiconductor device, wherein each of the plurality of signal terminals is electrically connected to the first wiring arranged in an upper wiring layer.   2. The semiconductor device according to claim 1, wherein each of the plurality of signal terminals extends in the second direction.   3. The semiconductor device according to claim 1, wherein a plurality of each of the plurality of signal terminals are arranged along the first direction, and the positions of the signal terminals adjacent to each other in the first direction are A semiconductor device characterized by being shifted in the second direction.   4. The semiconductor device according to claim 1, wherein each of the plurality of signal terminals is disposed within a frame of the circuit block.   5. The semiconductor device according to claim 1, wherein each of the plurality of signal terminals is configured by an uppermost wiring layer in the circuit block. 6.   6. The semiconductor device according to claim 1, wherein a power supply terminal extending in the second direction is provided in a frame of the circuit block.   7. The semiconductor device according to claim 6, wherein the power supply terminal is constituted by an uppermost wiring layer in the circuit block.   8. The semiconductor device according to claim 1, wherein the circuit block is a memory circuit, the first wiring constitutes an address signal wiring, and the first wiring is common to the circuit block. A semiconductor device connected to the semiconductor device.   8. The semiconductor device according to claim 1, wherein the circuit block is a memory circuit, the first wiring is a data input wiring, and the first wiring is common to the circuit block. A semiconductor device which is connected.   10. The semiconductor device according to claim 1, wherein the circuit block is connected to a different clock signal wiring.

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