JP4433456B2 - Optical stereolithography and equipment - Google Patents

Description

  The present invention relates to an optical three-dimensional modeling method and an optical three-dimensional modeling apparatus using a photocurable resin composition. More specifically, the present invention uses a photocurable resin composition to produce a high-quality three-dimensional structure that is excellent in dimensional accuracy, appearance, strength, and the like with high modeling accuracy and high modeling speed with high productivity. The present invention relates to an optical three-dimensional modeling method and an optical three-dimensional modeling apparatus, and according to the present invention, various three-dimensional models ranging from small to large can be manufactured smoothly.

  In recent years, an optical modeling method and apparatus for manufacturing a three-dimensional model by curing a photocurable resin based on data input to a three-dimensional CAD has been put into practical use. This stereolithography technology includes a model for verifying the appearance design in the middle of design, a model for checking the functionality of parts, a resin mold for manufacturing a mold, a base model for manufacturing a mold, etc. It attracts attention because it can easily form such complex three-dimensional objects.

  In producing a modeled object by the optical modeling method, a method using a modeling bath is widely used, and as a procedure, a liquid photocurable resin is put into the modeling bath so that a desired pattern can be obtained on the liquid surface. A spot-shaped ultraviolet laser beam controlled by a computer is selectively irradiated to be photocured to a predetermined thickness to form a cured resin layer, and the cured resin layer is moved downward in the modeling bath to form a modeling bath. The photocurable resin liquid is flowed onto the cured resin layer to form a layer of the photocurable resin liquid, and the cured resin layer is formed by irradiating the photocurable resin liquid layer with a spot-like ultraviolet laser beam. A method of forming and repeating the above steps until a three-dimensional object having a predetermined shape and size is obtained is widely adopted.

  However, in the case of the above-described conventional method using spot-shaped ultraviolet laser light, a so-called planar photocured pattern is formed by moving one spot-shaped laser light while irradiating the surface of the photocurable resin. Since it is a stippling method, it takes a long time for modeling, and there is a problem that productivity is low. Moreover, since the ultraviolet laser device used as the light source is extremely expensive, this type of optical three-dimensional modeling apparatus is made expensive.

  For the purpose of eliminating the drawbacks of the prior art described above, a line-shaped exposure mask in which optical shutters capable of controlling light shielding in a minute dot area are continuously arranged in a row is used, and the exposure mask is arranged in a direction orthogonal to the arrangement direction of the optical shutters There has been proposed an optical three-dimensional modeling method for sequentially forming a photo-cured resin layer for one layer by controlling an optical shutter according to predetermined horizontal sectional shape data while scanning (see Patent Document 1). . In the case of this method, it is not always necessary to use an expensive ultraviolet laser device as the light source, an inexpensive light source such as a normal ultraviolet lamp can be used, and the conventional method using spot-like ultraviolet laser light. The modeling speed can be increased compared to However, according to this method, a linear photocured portion is formed in a line in the scanning direction of the exposure mask one by one, and this is repeated many times to form a cross-sectional pattern for one layer. Thus, if the scanning speed of the exposure mask is increased, it is not possible to form a photocured portion for each row that is sufficiently photocured, and therefore it is necessary to scan the exposure mask slowly. In addition, it takes time for modeling because of the method of forming the photo-curing portion for each row one after another to form a planar photo-curing layer. For this reason, it cannot be said that the modeling speed is sufficiently high, and it is not satisfactory in terms of productivity.

  Further, as a method different from the above, between the light source and the surface of the photocurable resin composition, a planar drawing mask composed of a liquid crystal shutter capable of shielding and transmitting light in a minute dot area is fixedly arranged, In the stopped state of the planar drawing mask, a predetermined mask pattern is formed on the planar drawing mask according to the cross-sectional shape pattern for one layer to be formed, and the surface of the photocurable resin composition is passed through the mask pattern. Is irradiated with light to cure the photocurable resin composition to form a cross-sectional shape pattern for one layer, and then the photocurable resin composition for the next layer on the photocured cross-sectional shape pattern. In the stopped state of the planar drawing mask, the next predetermined mask pattern is formed on the planar drawing mask according to the cross-sectional shape pattern for one layer to be formed, and photocuring is performed through the mask pattern. Resin composition Surface is irradiated with light to cure the photocurable resin composition of known method for producing a three-dimensional object by repeating the operation of forming the next one layer of sectional shape pattern.

In the case of this method, the above-described conventional method using a spot-shaped ultraviolet laser is used to form a cross-sectional shape pattern of light irradiation on the surface of the photocurable resin composition and a single layer of the photocured cross-sectional shape at a time. Compared with the method described in Patent Document 1 described above using a method and a line-shaped exposure mask in which one row of light shutters capable of controlling light shielding in a minute dot area is continuously arranged, the optical modeling speed can be increased. it can.
When manufacturing a three-dimensional molded article by this method, from the point of modeling accuracy (resolution), the distance between adjacent minute dot areas on the surface of the photocurable resin composition projected from the planar drawing mask is 0.1 mm. Therefore, the number of pixels is, for example, a small size with a modeling area size of 250 mm × 250 mm and at least about 2500 × 2500 dots, and the modeling area size is 600 mm × The medium size of 600 mm requires at least about 6000 × 6000 dots. However, existing liquid crystal masks (liquid crystal shutters) and digital micromirror shutters do not have resolutions that realize this, or even if they exist, they are extremely expensive.

In addition, in the case of this method in which light irradiation is performed in a state where the fixedly arranged planar drawing mask is stopped, the definition of the exposure shape pattern is determined by the definition (roughness) of the planar drawing mask and the planar drawing mask. The distance between the light dots on the surface of the photocurable resin composition is determined by the enlargement / reduction ratio with the pattern projected on the surface of the photocurable resin composition, and the smaller the enlargement ratio (the higher the reduction ratio). The fineness of the cross-sectional shape pattern formed is improved by increasing the fineness of the cross-sectional shape pattern formed on the surface of the photocurable resin composition. The degree decreases.
Therefore, in the case of this method in which the planar drawing mask is fixedly arranged, it is difficult to produce a large three-dimensional modeled object having excellent definition (modeling accuracy), and a small three-dimensional model is required in terms of definition (modeling accuracy). The current situation is that it can only be applied to the production of shaped objects.

  For the purpose of eliminating the disadvantages of the above-described method using a fixedly arranged planar drawing mask and enabling the production of a large three-dimensional object using a small liquid crystal shutter, or selectively transmitting light. A liquid crystal shutter (liquid crystal mask) that shields light is arranged so that it can run parallel to the liquid surface of the photocurable resin, and the liquid crystal shutter travel range is divided into a plurality of parts, and the liquid crystal shutter is divided into travel ranges. The light source provided on the back of the liquid crystal shutter in a state where the liquid crystal shutter is stopped in a state where the liquid crystal shutter is stopped is transferred to the surface of the photocurable resin through the liquid crystal shutter while the liquid crystal shutter is stopped. The cured portion corresponding to the divided first range is formed by irradiating light, and then the liquid crystal shutter is moved to the second divided traveling range and stopped. The second range divided by irradiating light onto the surface of the photocurable resin through the liquid crystal shutter while the light source provided on the back of the liquid crystal shutter is transported in the range of the liquid crystal shutter in a state where the shutter is stopped The cured portion corresponding to is formed, and the same operation is performed until a predetermined cross-sectional shape pattern for one layer is formed on the surface of the photocurable resin composition, and the above-described process is performed to form a predetermined three-dimensional model. A method for manufacturing a three-dimensional structure is repeatedly proposed (see Patent Document 2).

  However, in the case of the method described in Patent Document 2, the movement of the liquid crystal shutter to the divided first traveling range—light irradiation with the liquid crystal shutter stopped (photocuring on the surface of the photocurable resin) Formation of a part)-Movement of the liquid crystal shutter to the divided second traveling range-Light irradiation with the liquid crystal shutter stopped (formation of a photocuring part on the surface of the photocurable resin)... A solid cross-sectional shape pattern for one layer is formed, and a three-dimensional structure is manufactured by repeating the pattern over multiple layers. When the liquid crystal shutter is moved to each traveling range position divided into a plurality of light, Irradiation is not performed. Therefore, in the case of this method, since the exposure is not continuously performed and is performed intermittently, the modeling speed becomes slow. In addition, when this method is used, the traveling range of the liquid crystal shutter is divided into a plurality of portions, and in order to cure the photocurable resin composition in a state where the liquid crystal shutter is stopped in each section, The cured state tends to be discontinuous or non-uniform at the boundary portion, and accordingly, uneven strength, insufficient strength, poor appearance, and reduced dimensional accuracy of the entire three-dimensional structure are likely to occur.

JP-A-4-305438 JP-A-8-112863

The purpose of the present invention is not limited to small-sized and medium-sized three-dimensional objects, but even large-sized three-dimensional objects, high-quality three-dimensional objects that are excellent in dimensional accuracy, appearance, strength, etc. An object of the present invention is to provide an optical three-dimensional modeling method and an optical three-dimensional modeling apparatus that can be manufactured with high productivity at high speed.
Further, the object of the present invention is to have high modeling accuracy and no unevenness in curing and strength even when an inexpensive light source such as a normal ultraviolet lamp is used without using an expensive ultraviolet laser device. It is to provide an optical three-dimensional modeling method and an optical three-dimensional modeling apparatus that can smoothly manufacture a high-quality three-dimensional modeled object at a high modeling speed.

  In order to achieve the above object, the present inventor has intensively studied. As a result, a modeling surface made of the photocurable resin composition is irradiated with light through a planar drawing mask to sequentially form a photocured resin layer having a predetermined cross-sectional shape pattern to manufacture a three-dimensional modeled object. In this case, instead of the above-described conventional technique in which light irradiation is performed in a state where the planar drawing mask is fixed or stopped, in at least a part of the optical modeling process, the planar drawing mask is continuously moved during light irradiation, and the surface In synchronization with the continuous movement of the shape drawing mask, the mask image (mask pattern) by the surface drawing mask is irradiated with light while continuously changing according to the predetermined cross-sectional shape pattern to be formed (modeling is performed) ( The mask image of the planar drawing mask is shaped by irradiating light while continuously changing the mask image like a movie or a TV screen, for example), and is not limited to small and medium-sized three-dimensional objects. Even if it is a three-dimensional model, a high-quality three-dimensional model that has excellent dimensional accuracy, appearance, strength, etc. can be manufactured with high modeling accuracy and modeling speed with high productivity, and the mask image is continuously changed in a moving image. It has been found that when the optical modeling is performed using a plurality of the above-described planar drawing masks, the modeling speed is further improved while maintaining a high modeling accuracy.

In addition, when the above-described method is used, the present inventor has high modeling accuracy and uneven curing even when an inexpensive ultraviolet light source such as an ordinary ultraviolet lamp is used without using an expensive ultraviolet laser device. It has been found that a high-quality three-dimensional model can be manufactured smoothly at a high modeling speed.
Furthermore, the present inventor has proposed a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in a minute dot area are arranged as a planar drawing mask, particularly a liquid crystal shutter or a digital micromirror shutter. Is preferably used, and a light collecting lens that can be moved continuously in synchronization with the planar drawing mask is disposed between the light source and the planar drawing mask. It has been found that it is preferable to dispose a projection lens that can be moved continuously in synchronization with the planar drawing mask between the planar drawing mask and the surface of the photocurable resin composition. The present invention has been completed based on the findings.

That is, the present invention
(1) A photocured resin layer having a predetermined cross-sectional shape pattern is formed by irradiating light on a modeling surface made of a photocurable resin composition under control through a planar drawing mask, and then photocured. A photocurable resin composition for one layer is applied on the resin layer to form a modeling surface made of the photocurable resin composition, and the modeling surface is irradiated with light through a planar drawing mask. A method of manufacturing a three-dimensional object by sequentially repeating an optical modeling step of further forming a photocured resin layer having a predetermined cross-sectional shape pattern until a predetermined three-dimensional object is formed;
Stereolithography is performed using a plurality of planar drawing masks arranged side by side in the scanning direction during stereolithography and capable of continuously changing the mask image ;
A plurality of sensors for detecting the position of the planar drawing mask are arranged, the positions of the plurality of planar drawing masks are measured at two or more points, and the position correction of each planar drawing mask is performed based on the measured values. The state in which the plurality of planar drawing masks are arranged side by side in the scanning direction in at least a part of the optical modeling process while eliminating the positional deviation between the plurality of planar drawing masks. Then, while continuously moving in the scanning direction with respect to the modeling surface made of the photocurable resin composition, the mask image of each planar drawing mask is formed into a cross-sectional shape pattern of the photocured resin layer to be formed Photocuring having a predetermined cross-sectional shape pattern by irradiating light through the planar drawing mask to the modeling surface made of the photocurable resin composition while continuously changing in synchronization with the movement of the planar drawing mask. did Performing shaping operation to form an alicyclic layer;
This is an optical three-dimensional modeling method.

And this invention,
( 2 ) Light-cured resin for a single layer having a predetermined cross-sectional shape pattern as a whole by irradiating light through each mask image of a plurality of planar drawing masks to share photocuring of each drawing region (3) the optical three-dimensional modeling method of manufacturing a three-dimensional model by repeating the operation of forming a layer;
( 3 ) As a planar drawing mask, use a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in a minute dot area are arranged in a planar shape. The optical solid according to (1) or (2) above, wherein the surface of the photocurable resin composition is irradiated with light while the mask image is continuously changed by the plurality of minute light shutters corresponding to the cross-sectional shape pattern. Modeling method; and
( 4 )
The optical three-dimensional modeling method according to any one of (1) to (3), wherein the planar drawing mask is a planar drawing mask in which a liquid crystal shutter or a digital micromirror shutter is arranged in a plane;
It is.
This is an optical three-dimensional modeling method.

Furthermore, the present invention provides
( 5 ) Photocurable resin composition supply means for sequentially supplying one layer of the photocurable resin composition on the mounting table or the photocured resin layer;
light source;
A plurality of planar drawing masks arranged side by side with respect to the scanning direction during stereolithography and capable of continuously changing the mask image;
A moving means for continuously moving each of the plurality of planar drawing masks with respect to the modeling surface made of the photocurable resin composition, wherein the plurality of planar drawing masks are at least part of the optical modeling process. Moving means for continuously moving in the scanning direction with respect to the modeling surface made of the photocurable resin composition in a state of being arranged side by side in the scanning direction ;
Means for continuously changing the mask image of each planar drawing mask in synchronization with the movement of the planar drawing mask;
A plurality of sensors for detecting and measuring the position of the planar drawing mask; and
Means for correcting the position of each of the plurality of planar drawing masks based on the detection / measurement value of the sensor and eliminating positional deviation between the plurality of planar drawing masks;
Is an optical three-dimensional modeling apparatus.

And this invention,
( 6 ) Irradiate light through each mask image of a plurality of planar drawing masks to share and perform photocuring of each drawing region, and photocuring for one layer having a predetermined cross-sectional shape pattern as a whole The optical three-dimensional modeling apparatus according to (5) , having means for forming a resin layer that has been formed;
( 7 ) The optical three-dimensional image according to (5) or (6) , wherein the planar drawing mask is a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in a minute dot area are arranged in a planar shape. Modeling equipment;
( 8 ) The optical three-dimensional modeling apparatus according to any one of (5) to (7) , wherein the planar drawing mask is a planar drawing mask in which a liquid crystal shutter or a digital micromirror shutter is arranged in a plane;
( 9 ) a light collecting lens that can be moved continuously in synchronization with the planar drawing mask between the light source and the planar drawing mask, and the surface of the planar drawing mask and the photocurable resin composition; The optical three-dimensional modeling apparatus according to any one of ( 5) to (8) , further including a projection lens that can be moved continuously in synchronization with the planar drawing mask between the two;
It is.

In the case of the present invention, as at least a part of the optical modeling process, the planar drawing mask is continuously moved with respect to the modeling surface made of the photocurable resin composition, and a mask image of the planar drawing mask is formed. Employs continuous modeling technology that irradiates light while continuously changing in synchronization with the movement of the planar drawing mask corresponding to the cross-sectional shape pattern of the photocured resin layer to be processed, and a plurality of such continuous modeling The high-quality 3D object with excellent dimensional accuracy, appearance, and strength can be manufactured at a very high modeling speed and with high productivity in a short time while maintaining high modeling accuracy. be able to.
And according to this invention, even if it is not only a small-sized and medium-sized three-dimensional molded item but a large three-dimensional molded item, it can manufacture smoothly with high dimensional accuracy and fast modeling speed.
Furthermore, according to the present invention, even when an inexpensive light source such as a normal ultraviolet lamp is used without using an expensive ultraviolet laser device, the above-described high-quality three-dimensional object can be smoothly produced at a high modeling speed. Can be manufactured.

The present invention is described in detail below.
In the present invention, a photocured resin layer having a predetermined cross-sectional shape pattern is formed by irradiating light under control through a planar drawing mask on a modeling surface made of a photocurable resin composition, and then the photocuring A molded surface is formed by applying a photocurable resin composition for one layer on the formed resin layer, and a predetermined cross-sectional shape pattern is formed by irradiating the shaped surface with light through a planar drawing mask. A three-dimensional object is manufactured by sequentially repeating the operation of further forming the photocured resin layer having the predetermined three-dimensional object until the predetermined three-dimensional object is formed, and at that time, the modeling operation is performed using a plurality of planar drawing masks. .

  In the above-described modeling operation of the present invention, generally, a modeling table is placed in a modeling bath filled with a liquid photocurable resin composition, and the modeling table is lowered to lower the modeling table surface for one layer of liquid light. A curable resin composition layer (modeled surface) is formed, and the modeled surface is irradiated with light through each planar drawing mask under control to form a photocured resin layer having a predetermined pattern and thickness (hereinafter “ After the formation table is further lowered, a liquid photocurable resin composition layer (modeling surface) for one layer is formed on the surface of the photocuring layer to form each surface. It is possible to adopt a modeling bath method in which light is irradiated under control through a shape drawing mask to repeat the step of integrally laminating and forming a photocured layer having a predetermined pattern and thickness.

  In addition, the above-described modeling operation of the present invention includes, for example, a modeling table placed in a gas atmosphere, and a liquid, paste, powder, or thin film photocurable resin composition for one layer on the modeling table surface. After applying a light under control through each of the planar drawing masks to form a photocured layer having a predetermined pattern and thickness, one layer of liquid, paste or powder is formed on the photocured layer surface. Alternatively, a process of applying a thin-film photocurable resin composition and irradiating light under control through the respective planar drawing masks to integrally form a photocurable layer having a predetermined pattern and thickness is repeated. It can also be done by adopting the method of doing. When using this method, the modeling table or photocuring layer is left facing upward, the photocurable resin composition is applied to the top surface, and light is irradiated through each planar drawing mask to sequentially form the photocuring layer. It is possible to adopt a method that does this, or place a modeling table or photocuring layer vertically or diagonally, apply a photocurable resin layer on the modeling table surface or photocuring layer surface, and draw each planar shape You may adopt the method of irradiating light through a mask and sequentially laminating and forming a photocuring layer, or placing a modeling table or a photocuring layer downwards on the modeling table surface or the photocuring layer surface. You may employ | adopt the system which gives a photocurable resin composition, irradiates light through each planar drawing mask, and laminates | stacks and forms a photocuring layer below one by one. In applying the photocurable resin composition to the modeling table surface or the photocured layer surface, for example, an appropriate method such as blade coating, cast coating, roller coating, transfer coating, brush coating, spray coating, or the like can be employed. .

In the present invention, in performing the above-described modeling operation, using a plurality of planar drawing masks that can continuously change the mask image as the planar drawing mask, at least a part of the modeling process, that is, a photocured predetermined In all or part of the process for forming the cross-sectional shape pattern, at least one of the plurality of planar drawing masks is continuously moved with respect to the modeling surface made of the photocurable resin composition. At the same time, it is continuously changed in synchronization with the movement of the surface drawing mask in correspondence with the cross-sectional shape pattern of the photocured resin layer to form a mask image of the surface drawing mask (that is, changing in a moving image). Then, light is irradiated onto a modeling surface made of the photocurable resin composition through a planar drawing mask to form a photocured resin layer having a predetermined cross-sectional shape pattern.
At that time, the continuous movement of the planar drawing mask is preferably performed in a state parallel to the modeling surface, but may be moved in a non-parallel state in some cases.

  For example, in manufacturing a three-dimensional structure by repeating the above-described modeling operation over multiple stages (multilayers), the predetermined cross-sectional shape pattern to be formed in all the photocured layers is based on the dimension (area) of the planar drawing mask. In the manufacture of a three-dimensional structure having a shape and structure that will be a large drawing area, each planar drawing mask is continuously moved with respect to the modeling surface made of the photocurable resin composition, and each From the photo-curable resin composition, the mask image of the planar drawing mask is continuously changed in synchronization with the movement of the planar drawing mask in correspondence with the cross-sectional shape pattern to be formed (moving like a moving image). The operation of forming a photocured resin layer having a predetermined cross-sectional shape pattern by irradiating light through each planar drawing mask to the shaped surface to be formed over multiple layers By returning Ri, it is possible to produce a three-dimensional object of interest.

  On the other hand, depending on the shape and structure of the three-dimensional modeled object, a predetermined cross-sectional shape pattern larger than the area of the planar drawing mask is formed and a sectional shape pattern smaller than the area of the planar drawing mask is formed during the modeling operation. [For example, but not limited to, a cone-shaped structure is coupled to the top of a spherical body, and the cross-sectional area (cross-sectional shape) of the body and the lower part of the cone is The pattern) is larger than the area of each planar drawing mask, while a three-dimensional modeled object or the like having a cross-sectional area (cross-sectional shape pattern) smaller than the area of the planar drawing mask is manufactured by the method of the present invention. If]. In such a case, the main body portion having a large cross-sectional shape pattern and the lower portion of the cone are formed by repeating the above-described modeling operation for continuously changing the mask image of each planar drawing mask in multiple layers. On the other hand, the upper part of the cone having a small cross-sectional shape pattern is set to a still image state without changing the mask image of the planar drawing mask in a moving image, and the operation of irradiating the modeling surface with light through the mask image is performed. By repeating over multiple layers until the formation of the upper part of the cone is completed, the target three-dimensional object can be manufactured.

  In the present invention, any of the above-described methods is included. Therefore, in the present invention, the mask image of the planar drawing mask does not always change continuously in a moving manner from the beginning to the end of the modeling process. Alternatively, the mask image may be continuously changed in a moving manner in a part of the modeling process, and may be in a still image state corresponding to the cross-sectional shape pattern to be formed in the other modeling process.

  In the present invention, the number of planar drawing masks that can change the mask image continuously (moving image) may be any number as long as it is two or more, and the upper limit number is not particularly limited. Considering the size, shape, and structure of the 3D object to be manufactured, the manufacturing cost of the optical 3D modeling apparatus, the modeling speed when performing the optical modeling, the cost, etc. A drawing mask may be used.

In the optical three-dimensional modeling method and apparatus of the present invention, means and a method for continuously moving the planar drawing mask with respect to the surface of the photocurable resin composition are not particularly limited. For example, linear guides, shafts, flat bars, etc. are used as guides, and the drive is transmitted using ball screws, trapezoidal screws, timing belts, racks and pinions, chains, etc., and the drive source is an AC servo motor, DC servo motor, stepping motor, A pulse motor or the like can be used. Also, a linear motor system that serves both as a guide and a drive, and an arm tip of an articulated robot can also be used. In this way, any means or method can be adopted for moving the system. Among them, a pulse motor is preferably used as a drive source because the surface drawing mask can be continuously moved precisely at a micro pitch and can be synchronized with the continuous change of the mask image of the surface drawing mask with high accuracy. It is done.
The movement of the planar drawing mask relative to the modeling surface may be performed only in one direction (one of the X-axis direction and the Y-axis direction), but it should be movable in both the X-axis direction and the Y-axis direction. However, it is preferable because photocured cross-sectional shape patterns of various shapes can be formed with good modeling accuracy.

  In forming a photocured resin layer having a predetermined cross-sectional shape pattern on a modeling surface made of a photocurable resin composition, the number of surface drawing masks, the size of the surface drawing mask, and the cross-sectional shape pattern to be formed The number, size, shape, and position of the drawing areas that each of the planar drawing masks share so that modeling can be performed at a higher modeling speed and higher modeling accuracy according to the shape and size of Are determined by a computer or the like and stored as information, and the mask image of each planar drawing mask is continuously changed based on such information, and each planar drawing mask is assigned through the mask image. A method of curing the resin by irradiating the modeling surface of the drawing region with light is preferably employed.

As a sharing method of a drawing area and a moving method of a planar drawing mask when performing optical modeling using two planar drawing masks, for example,
(I) As illustrated in FIG. 1A, two planar drawing masks 3 and 3 ′ are arranged in parallel with each other at a distance from each other, and the mask images of the respective planar drawing masks are continuously displayed. A light-cured resin layer having a predetermined cross-sectional pattern by irradiating light through each mask image while continuously moving in parallel in the same direction while changing to
(Ii) As illustrated in FIG. 1B, the two planar drawing masks 3 and 3 ′ are arranged at positions away from each other, and the mask images of the respective planar drawing masks are continuously changed. A method of forming a photocured resin layer having a predetermined cross-sectional shape pattern by irradiating light through each mask image while continuously moving in opposite directions;
(Iii) As illustrated in FIG. 1C, two planar drawing masks 3 and 3 ′ are arranged at positions separated from each other at the start of the optical modeling operation, and the respective planar drawing masks are directed in the same direction. A method of forming a photocured resin layer having a predetermined cross-sectional shape pattern by performing optical modeling while continuously moving and irradiating light through a mask image of each planar drawing mask that continuously changes;
(Iv) As illustrated in FIG. 1 (d), one planar drawing mask 3 is continuously moved along the peripheral edge of a predetermined cross-sectional shape pattern, and light is continuously changed while the mask image is continuously changed. Irradiation is performed to cure the periphery, and the other planar drawing mask 3 ′ is continuously moved within a predetermined cross-sectional shape pattern, and the mask image is continuously changed to irradiate with light. A method of photocuring;
(V) As illustrated in FIG. 1 (e), a drawing area corresponding to a predetermined cross-sectional shape pattern is divided into two, and within each section, each planar drawing mask 3, 3 ′ is A method of performing photocuring by adopting an appropriate movement locus and continuously moving the mask image and changing the mask images continuously;
(Vi) As illustrated in FIG. 1 (f), each of the planar drawing masks 3 and 3 ′ is formed when two photocured resin layer portions positioned apart from each other are formed on one modeling surface. And continuously changing the mask image and continuously changing the mask image to form a photo-cured resin layer portion at each location;
And so on.
In the present invention, the optical production method (i) shown in FIG. 1 (a) is preferably employed in at least a part of the optical modeling process.

The direction and speed of continuous movement of each planar drawing mask when performing optical modeling are the type of light source, the irradiation intensity of the light irradiated to the modeling surface made of the photocurable resin composition, and through the planar drawing mask. The exposure area (exposure area) on the modeling surface made of the photocurable resin composition, the shape of the cross-sectional pattern to be formed, the type of the photocurable resin composition, the photocuring characteristics and light of the photocurable resin composition It is controlled and adjusted using a computer or the like according to the exposure time necessary for forming the cured layer. When the planar drawing mask is continuously moved linearly at a constant speed in a state parallel to the modeling surface made of the photocurable resin composition, the amount of light irradiation to the modeling surface made of the photocurable resin composition Although uniform control is easy, of course, it is not limited to it.
The moving speed of the plurality of planar drawing masks may be determined according to the content of the photocured cross-sectional shape pattern to be formed, the movement trajectory of the planar drawing mask when forming the pattern, and so on. It may be a moving speed or a different moving speed, and a speed suitable for each may be adopted.

In the present invention, in order to further improve the modeling accuracy, a plurality of sensors for detecting the position of the planar drawing mask are arranged in the optical modeling apparatus, and the position of each planar drawing mask is measured at two or more points, performing position correction of the respective planar image drawing mask based on the measured values, so as to eliminate the positional deviation between the plurality of planar image drawing mask.
Furthermore, the planar drawing mask is generally plate-shaped, and the shape of light irradiated on the modeling surface through the mask image of the planar drawing mask when the angle during continuous movement of the planar drawing mask deviates from a predetermined angle Unlike regular ones, the dimensional accuracy of the three-dimensional model to be obtained decreases. For this reason, in the present invention, it is desirable that the positional deviation between the plurality of planar drawing masks is eliminated and the inclination angle of each planar drawing mask is also detected by the sensor and adjusted.

  The number and position of sensors for detecting the position and tilt angle of the planar drawing mask are the shape, structure, size, number of planar drawing masks, planar drawing masks for the purpose of manufacturing. Depending on the moving direction, moving range, moving speed, etc., it is necessary to arrange two or more predetermined numbers at positions that do not interfere with optical modeling. In general, it is preferable that the sensors are arranged at intervals in the outer peripheral portion surrounding the maximum movement range (maximum movement surface) of the plurality of planar drawing masks. The plurality of sensors may be fixedly disposed at predetermined positions, or may be disposed so as to be movable in conjunction with the progress or situation of the optical modeling. The type of the sensor is not particularly limited, and any sensor can be used as long as it can accurately detect the position and angle (tilt angle) of the planar drawing mask, and examples thereof include a CCD sensor and a PSD sensor.

In addition, the planar drawing mask used in the present invention is generally plate-shaped (planar), and it may be difficult to detect the position and angle as it is, so that one or more corners of the planar drawing mask may be used. Attach a mark that can be easily recognized by the sensor so that it does not interfere with stereolithography in the part (corner part) and detect the mark with the sensor to detect the position and angle of each planar drawing mask. This is convenient.
Based on the values measured by multiple sensors, the position of each planar drawing mask is corrected to eliminate positional deviation between each planar drawing mask, and the angle of each planar drawing mask is adjusted. Go and do stereolithography.
The elimination of misalignment between the respective planar drawing masks based on the values measured by the sensors and the adjustment of the angle of the planar drawing mask can be performed at an appropriate time. In the middle, it can be performed at the final stage of the optical modeling, but at least immediately before the start of the optical modeling is preferable because a three-dimensional model having excellent dimensional accuracy can be obtained with certainty.

  When changing the mask image of each planar drawing mask continuously (moving image) in synchronization with the continuous movement of the planar drawing mask, the contents of the cross-sectional shape pattern to be formed and the continuous movement of the planar drawing mask Information related to the mask image to be formed by the planar drawing mask is stored in advance in a computer or the like in accordance with the speed, and the planar drawing mask is continuously moved based on the information. The mask image is preferably changed continuously.

As the planar drawing mask used in the present invention, it is preferable to use a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in minute dot areas are arranged in a planar shape. Specific examples of such a planar drawing mask include a liquid crystal shutter or a digital micromirror shutter. Liquid crystal shutters and digital micromirror shutters preferably used as a planar drawing mask in the present invention can be used in other fields (for example, televisions, personal computers, projectors, car navigation systems, mobile phones) as means capable of continuous (moving image) image formation. Already used in telephones).
These planar drawing masks are square or rectangular planar drawing masks in which a plurality of minute light shutters capable of shielding and transmitting light in minute dot areas are arranged in parallel in a planar shape (XY direction). It is preferable. The number of minute light shutters (image elements) arranged on the planar drawing mask is not particularly limited, and conventionally known ones can be used. As a liquid crystal shutter (liquid crystal display element), for example, QVGA (number of pixels = 320 dots × 240 dots), VGA (number of pixels = 640 × 480 dots), SVGA (number of pixels = 800 × 600 dots), UXGA (number of pixels) = 1024 × 768 dots), QSXGA (number of pixels = 2560 × 2648 dots), and the like, and these liquid crystal shutters have been widely sold.
As the digital micromirror shutter, for example, a DMD (registered trademark) device of “DLP Technology” (registered trademark) manufactured by Texas Instruments Inc. can be used.

  The planar drawing mask comprising the above-described liquid crystal shutter and digital micromirror shutter preferably used in the present invention is formed by the plurality of micro light shutters corresponding to the cross-sectional shape pattern to be formed during continuous movement of the planar drawing mask. By performing light shielding and / or translucency, the mask image can be continuously changed like a moving image such as a television or a movie. Therefore, light corresponding to such a mask image (moving mask image) that continuously changes while continuously moving is continuously applied to the surface of the photocurable resin composition while continuously moving the irradiation position. The surface of the photocurable resin composition in the portion irradiated with light is continuously cured to form a predetermined cross-sectional pattern for one layer.

Using the liquid crystal shutter exemplified above, one pixel pitch (distance between adjacent pixels) on the modeling surface made of the photocurable resin composition is 0.1 mm (modeling accuracy required for optical modeling). Thus, in the case of the conventional technique in which light irradiation is performed with the liquid crystal shutter stopped, the exposure surface size is 32 mm × 24 mm for QVGA, 64 mm × 48 mm for VGA, 80 mm × 60 mm for SVGA, and 102.times. For UXGA. It was 4 mm × 76.8 mm, QSXGA was 256 mm × 264.8 mm, and it was difficult to produce a large three-dimensional object having a size of one side of the exposure surface (cross-sectional shape pattern) exceeding 300 mm. On the other hand, in the case of the present invention, the above-described conventional commercially available liquid crystal shutter is used as a planar drawing mask, and it is continuously moved with respect to the surface of the photocurable resin composition, and at the same time, a mask image by the liquid crystal shutter. In order to irradiate light while continuously changing it to a moving image in synchronization with the movement of the liquid crystal shutter, the size of the exposed surface (cross-sectional shape pattern) is not limited, and the photocured cross-sectional shape pattern of any size Can be formed. Therefore, in the case of the present invention, even a large three-dimensional model having a side size exceeding 300 mm can be easily manufactured with high modeling accuracy and at a high modeling speed with high productivity.
The plurality of planar drawing masks used in the present invention may have the same type, size, number of dots, or the like, or may be different from each other.

The light source is disposed on the back side of the planar drawing mask, and light from the light source is irradiated to the modeling surface made of the photocurable resin composition through the planar drawing mask. The type of the light source is not particularly limited and may be any light source that can be used in optical three-dimensional modeling. For example, xenon lamp, metal halide lamp, mercury lamp, fluorescent lamp, halogen lamp, incandescent lamp, Ar laser, He-Cd A laser, LD laser (semiconductor excitation solid state laser), LED, etc. can be mentioned. In particular, in the case of the present invention, a xenon lamp, a metal halide lamp, a mercury lamp, a fluorescent lamp, a halogen lamp, an incandescent lamp can be used without using an expensive light source such as a laser beam apparatus conventionally used in optical stereolithography. An inexpensive general-purpose light source such as the above can be used, and therefore, the optical three-dimensional modeling apparatus can be made inexpensive and easy to use.
The same type of light source may be used for a plurality of planar drawing masks, or different types of light sources may be used in some cases.

The shape, size, and number of the light source are not particularly limited, and can be appropriately selected according to the shape and size of the planar drawing mask, the shape and size of the photocuring cross-sectional shape pattern to be formed, and the light source is For example, it may be dot-shaped, spherical, rod-shaped, or planar, and a dot-shaped or spherical light source may be directly arranged in one or more rows on the back side of the planar drawing mask.
Further, the light source may be provided on the back side of the planar drawing mask so as to be continuously movable together with the planar drawing mask, or the improvement of modeling accuracy, the modeling speed, the weight of the apparatus, the improvement of maintainability, etc. For this purpose, the light source is provided so as not to move to a fixed position, and the light from the light source is guided to the back of the planar drawing mask through an optical fiber, a light guide or other light transmission means, and the optical fiber, the light guide or other light transmission means is provided. You may provide so that a continuous movement is possible with a planar drawing mask.
Moreover, you may employ | adopt the system which condenses and raises light energy using a some light source for the improvement of modeling speed. In particular, when an optical fiber or a light guide is used, there is an advantage that a plurality of light sources can be easily condensed.

  In the present invention, the type, shape, and number of light sources arranged on the back side of the planar drawing mask for the purpose of improving modeling accuracy, improving modeling speed, reducing the weight of the apparatus, improving maintainability, and reducing the cost of the apparatus. Depending on the shape and size of the planar drawing mask, means for satisfactorily guiding light from the light source to the planar drawing mask (for example, a condensing lens, a Fresnel lens, etc.), and formed by the planar drawing mask It is preferable to arrange means (for example, a projection lens, a projector lens, etc.) for irradiating a mask image (light image that has passed through a planar drawing mask) to a predetermined position on the surface of the photocurable resin composition with high modeling accuracy. . It is preferable that these means continuously move in synchronization with the continuous movement of the planar drawing mask.

The kind of the photocurable resin composition used in the present invention is not particularly limited, and any of photocurable resin compositions such as liquid, paste, powder, and thin film that can be used for optical modeling can be used.
In the present invention, as a photocurable resin composition, conventionally used in stereolithography, for example, urethane acrylate oligomer, epoxy acrylate oligomer, ester acrylate oligomer, various oligomers such as polyfunctional epoxy resin; isobornyl acrylate, Isobornyl methacrylate, dicyclopentenyl acrylate, dicyclopentenyl methacrylate, dicyclopentenyloxyethyl acrylate, dicyclopentenyloxyethyl methacrylate, dicyclopetanyl acrylate, dicyclopetanyl methacrylate, bornyl acrylate, bornyl methacrylate , 2-hydroxyethyl acrylate, cyclohexyl acrylate, 2-hydroxypropyl acrylate, phenoxyethyl acrylate, mole Acrylic compounds such as phosphorus acrylamide, morpholine methacrylamide and acrylamide, and various monofunctional vinyl compounds such as N-vinyl pyrrolidone, N-vinyl caprolactam, vinyl acetate and styrene; trimethylolpropane triacrylate, ethylene oxide modified trimethylolpropane Triacrylate, ethylene glycol diacrylate, tetraethylene glycol diacrylate, polyethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, dicyclopentanyl diacrylate, Polyester diacrylate, ethylene oxide modified bisphenol A diacrylate, pentaerythritol triacryl , Pentaerythritol tetraacrylate, propylene oxide modified trimethylolpropane triacrylate, propylene oxide modified bisphenol A diacrylate, tris (acryloxyethyl) isocyanurate, etc .; hydrogenated bisphenol A diglycidyl ether, 3, 4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexane-meta-dioxane, bis (3,4-epoxy It is possible to use a photocurable resin composition containing one or more of various epoxy compounds such as (cyclohexylmethyl) adipate, a photopolymerization initiator, and a sensitizer if necessary. wear.

  In addition to the components described above, the photocurable resin composition used in the present invention, if necessary, a leveling agent, a surfactant other than the phosphate ester surfactant, an organic polymer modifier, It may contain an organic plasticizer.

The photocurable resin composition used in the present invention may contain a filler such as solid fine particles and whiskers, as necessary. When a photocurable resin composition containing a filler is used, it is possible to improve dimensional accuracy by reducing volume shrinkage at the time of curing, improve mechanical properties and heat resistance, and the like.
Examples of the solid fine particles used as the filler include inorganic fine particles such as carbon black fine particles, and organic polymer fine particles such as polystyrene fine particles, polyethylene fine particles, polypropylene fine particles, acrylic resin fine particles, and synthetic rubber fine particles. 1 type (s) or 2 or more types can be used. The particle size of the solid fine particles is not particularly limited, but generally those having an average particle size of 200 μm or less, particularly 100 μm or less are preferably used.

  The whisker preferably has a diameter of 0.3 to 1 μm, particularly 0.3 to 0.7 μm, a length of 10 to 70 μm, particularly 20 to 50 μm, and an aspect ratio of 10 to 100, particularly 20 to 70 μm. Used. In addition, the dimension and aspect ratio of a whisker here are the dimension and aspect ratio measured using the laser diffraction / scattering type particle size distribution measuring apparatus. The type of whisker is not particularly limited, and examples thereof include aluminum borate whisker, aluminum oxide whisker, aluminum nitride whisker water, magnesium oxide whisker, titanium oxide whisker, and the like. Species or two or more can be used.

  When using a photocurable resin composition containing solid fine particles and / or whiskers, it is preferable to contain solid fine particles in a proportion of 5 to 70% by volume based on the total volume of the photocurable resin composition. The whisker content is preferably 5 to 30% by volume. When both solid fine particles and whiskers are contained, the total content of both is preferably 10 to 75% by volume based on the total volume of the photocured layer.

  The solid fine particles and / or whiskers may or may not be surface-treated with a silane coupling agent, but are preferably surface-treated. When the solid fine particles and / or whiskers are surface-treated with a silane coupling agent, a photocured product with higher heat deformation temperature, flexural modulus, and mechanical strength can be obtained. In this case, as the silane coupling agent, any of silane coupling agents conventionally used for filler surface treatment and the like can be used. Preferred silane coupling agents include aminosilane, epoxy silane, vinyl silane, and ( Mention may be made of (meth) acrylic silanes.

The present invention will be specifically described below with reference to the drawings, but the present invention is not limited to those shown in the drawings.
2 to 5 show examples of the main part (apparatus part in each planar drawing mask unit) of the optical modeling apparatus used in the optical modeling method of the present invention. Further, FIG. 6 shows a stereolithography system having two planar drawing masks by combining two device parts as shown in FIG. It shows an example when performing.
2 to 6, 1 is a light source, 2 is a condenser lens, 3 (3a, 3b) is a planar drawing mask, 3a of which is a planar drawing mask in which liquid crystal shutters are arranged in a plane (hereinafter "" 3b denotes a planar drawing mask (hereinafter also referred to as “DMD type planar drawing mask”) in which digital micromirror shutters are arranged in a plane.
Further, 4 is a projection lens, 5 is a modeling surface (a modeling surface for one layer) made of the surface of the photocurable resin composition, 5a is one end of the modeling surface, 5b is the other end of the modeling surface, 6 is an exposure image (photocured resin layer) formed on the modeling surface, 7 is a light transmission means such as an optical fiber or a light guide, 8 is a rod lens, 9 is an imaging lens, and 10 is a reflecting mirror.

As shown in FIGS. 2 to 6, the light from the light source 1 passes through the rod lens 8, the imaging lens 9, and the reflecting mirror 10, and then the planar drawing mask 3 (3 a, 3 b, etc.) using the condenser lens 2. Is irradiated so as to cover the entire surface (the apparatus shown in FIGS. 2 and 6), or the entire surface is covered with a planar drawing mask 3 (3a, 3b, etc.) using the condenser lens 2 as it is. Is irradiated (apparatus of FIGS. 3 to 5).
At that time, as shown in FIGS. 2 and 6, the light from the light source 1 may be guided to the condensing lens 2 via the rod lens 8, the imaging lens 9, and the reflecting mirror 10, or FIG. As shown in FIG. 4, the light source 1 may be arranged directly on the back side of the condenser lens 2 so that the light from the light source 1 is directly guided to the condenser lens 2, or as shown in FIG. 1 may be disposed at a location away from the condenser lens 2 and light from the light source 1 may be guided to the condenser lens 2 via a light transmission means 7 such as an optical fiber or a light guide.

2 to 4 and 6, the light source 1 includes a rod lens 8, an imaging lens 9, a reflecting mirror 10, a condensing lens 2, a planar drawing mask 3 (3a, 3b, etc.). ), Along with the projection lens 4 and the like, continuously move in the scanning direction during optical modeling. Further, as shown in FIG. 6, when the light from the light source 1 is guided to the back surface of the condenser lens 2 through the light transmission means 7 such as an optical fiber or a light guide, the light source 1 is fixed at a predetermined position. It is arranged so that the flexible light transmission means 7 such as an optical fiber or a light guide is continuously moved in the scanning direction at the time of optical modeling together with the condensing lens 2, the planar drawing mask 3 (3a, 3b, etc.) and the projection lens 4. Can be.
The type and shape of the light source 1 are not particularly limited. For example, as shown in FIGS. 2 to 6, the light emission part may be a round light source, and although not shown, the light emission part is horizontally long. It may be a (or vertically long) rod-shaped light source, or a light source of another shape.
As shown in FIGS. 2, 4, and 6, the light source 1 is preferably arranged in a horizontal direction.

  During the optical modeling operation, each of the plurality of planar drawing masks 3 (3a, 3b, etc.) is continuously synchronized with the movement of the planar drawing mask corresponding to the cross-sectional shape pattern of the photocured resin layer to be formed. A predetermined mask image that changes with time is formed as a moving image. Therefore, the light irradiated on the entire surface of the planar drawing mask 3 (3a, 3b, etc.) through the condenser lens 2 is formed by the planar drawing mask 3 (3a, 3b, etc.) continuously and changing every moment. A light-curable resin composition that passes or is shielded (reflected; in the case of a DMD type planar drawing mask) through a predetermined mask image, and only light in a portion not masked (shielded) passes through the projection lens 4 The modeling surface 5 is irradiated, and an exposure image (photocuring portion) 6 having a predetermined shape pattern is formed on the modeling surface 5.

The shape of the planar drawing mask 3 (3a, 3b, etc.) is not particularly limited, and an appropriate shape is adopted according to the shape and dimensions (particularly the cross-sectional shape and dimensions) of the optically shaped object to be manufactured. be able to. The planar drawing mask 3 (3a, 3b, etc.) may have, for example, a square shape or a substantially square shape as shown in FIGS. 2 to 6, or a rectangular shape (not shown). Or other shapes.
Furthermore, the dimensions of the planar drawing mask 3 (3a, 3b, etc.) may be appropriately sized according to the shape and dimensions (particularly the cross-sectional shape and dimensions thereof) of the optical modeling object to be manufactured. it can. The planar drawing mask 3 (3a, 3b, etc.) is, for example, as shown in FIGS. 2 to 6, its width dimension rather than the full width of the predetermined photocured cross-sectional shape pattern to be formed (full width of the modeling surface). May be small, or may have a width dimension that can cover the full width of the predetermined photocured shape pattern to be formed (the full width of the modeling surface) although not shown. .

When the liquid crystal surface drawing mask 3a is used as the surface drawing mask 3, information stored in advance in a computer or the like in correspondence with the predetermined sectional shape to be formed and the continuous movement of the liquid crystal surface drawing mask 3a. Accordingly, among the plurality of minute liquid crystal shutters arranged on the liquid crystal surface drawing mask 3a, the liquid crystal shutter located at a position where light should pass is opened so as to allow light to pass therethrough, while the light should be shielded. The liquid crystal shutter located at is closed to prevent the passage of light, and such an operation is designed to repeat continuously (moving image) until a photocured resin layer having a predetermined cross-sectional shape is formed. Yes.
Further, when the DMD type surface drawing mask 3b is used as the surface drawing mask 3, it is stored in advance in a computer or the like in correspondence with the predetermined cross-sectional shape to be formed and the continuous movement of the DMD type surface drawing mask 3b. Depending on the information made, a specific mirror shutter among a plurality of minute mirror shutters arranged in a plane is directed in a direction in which light is reflected (guided) in the direction of the projection lens 4 and the translucent surface 5, On the other hand, the mirror shutter located at a position where light should be shielded is directed in a direction in which the light is not reflected (not guided) in the direction of the projection lens 4 and the modeling surface 5, and such an operation is performed by photocuring having a predetermined cross-sectional shape. It is designed to repeat continuously (moving image) until the formed resin layer is formed.

2 to 6, the light source 1 or the light transmission means 7, the rod lens 8, the imaging lens 9, the reflecting mirror 10, the condenser lens 2, the planar drawing mask 3 a or 3 b, and the projection lens 4. Are formed integrally by a moving means (not shown) at the time of an optical modeling operation for forming a photocured resin layer by irradiating light on a modeling surface made of a photocurable resin composition. It is designed to continuously move in parallel with the surface of the photocurable resin composition (in FIG. 2 to FIG. 6, it continuously moves in the direction of the arrow).
Then, as described above, the mask image (mask pattern) in the planar drawing mask 3 (3a, 3b, etc.) is photocured to be formed based on the information about the mask image stored in advance in a computer or the like. Corresponding to the predetermined cross-sectional shape pattern of the resin layer, the modeling surface 5 (photo-curing resin) changes continuously in a moving manner in synchronization with the continuous movement of the planar drawing mask 3 (3a, 3b, etc.). Light irradiation is performed on the surface of the composition, and a photocured resin layer (exposure image 6) having a predetermined cross-sectional shape is continuously formed.

FIG. 6 is a schematic diagram of the present invention using two planar drawing masks 3a having a width dimension smaller than the full width of the predetermined photocured cross-sectional shape pattern (exposure image 6) to be formed (or the full width of the modeling surface 5). It illustrates about the case where the optical modeling of invention is performed.
In performing the optical shaping operation illustrated in FIG. 6, the light in each part of the cross-sectional shape pattern (exposure image 6) is formed when the photocured resin layer (exposure image 6) for one layer is formed (at the time of continuous shaping operation). In order to equalize the irradiation amount, the light source 1 (or light transmission means 7), rod lens 8, imaging lens 9, reflecting mirror 10, condensing lens 2, planar drawing mask 3 (3a, 3b), projection lens 4 It is preferable that the speed at the time of continuous movement is constant, and the intensity of light reaching the modeling surface 5 through the planar drawing mask 3a and the projection lens 4 is not changed during the optical modeling operation.

Using a plurality of planar drawing masks, the mask image of each planar drawing mask is continuously moved in correspondence with the cross-sectional shape pattern of the photocured resin layer (exposure image 6) to be formed. In the case of the optical modeling method of the present invention in which optical modeling is performed while continuously changing in synchronization and moving images, as shown in FIG. 6, a planar drawing mask 3 smaller than a predetermined sectional shape pattern (exposure image 6). Using (3a), a photo-molded article of various sizes ranging from small to large while keeping the distance between adjacent minute dot areas on the surface of the photocurable resin composition projected from the planar drawing mask small Can be manufactured smoothly at high modeling speed and with high modeling accuracy.
In addition, each part of the exposure image 6 (photocured resin layer) formed by light irradiation is not cured by only one light irradiation but is irradiated to the modeling surface 5 through the projection lens 4. A light-cured resin layer is formed by continuously irradiating light of a predetermined moving image pattern that continuously changes until it has completely passed through each part. Therefore, in the case of the present invention, sufficient photocuring can be performed even if the moving speed of irradiation light at the time of optical modeling is increased, and the target optically modeled object can be manufactured with high productivity in a short time. . Moreover, in the case of the present invention, since the light irradiation amount in each part of the formed exposure image 6 (photocured resin having a predetermined cross-sectional shape pattern) is uniformized by the continuous light irradiation described above, the surface shape Irradiate light with the drawing mask stopped. There is no discontinuity between adjacent irradiation parts and non-uniformity of light irradiation as in the prior art described above. As a result, the dimensional accuracy and modeling accuracy of the optically shaped object are improved, and further, the unevenness of the strength is eliminated, and the appearance is improved.

Furthermore, according to the present invention, it is possible to reduce the projected drawing surface and perform stereolithography, thereby increasing the drawing resolution. Further, by reducing the projected drawing surface, the light intensity per unit area in the drawing unit is increased, and the irradiation time in the irradiation unit can be shortened. For example, using a photocurable resin composition having a curing sensitivity of 5 mJ, and using a planar drawing mask with the photocurable resin composition stopped (fixed), an image that was collectively irradiated to a size of 250 mm × 250 mm If there is 1 mW / cm ² , the necessary light irradiation time at this time is 5 sec. This image (light irradiation area) is reduced to ¼ size (125 mm × 125 mm), and the method of the present invention (the surface drawing mask is continuously moved and the mask image is synchronized with the continuous movement and continuously in a moving image). In the case where an exposure layer having the same area size as 250 mm × 250 mm is finally formed by a method of performing photocuring while changing to a case where the planar drawing mask is stopped (fixed state), it is compared with the case of batch irradiation. The drawing resolution is quadrupled. Also, the light intensity per unit area is 4 mW / cm ² , which is four times that during batch irradiation. At this time, the time required to continuously move and expose an area of 250 mm × 250 mm is the same 5 seconds as in the batch exposure. That is, by implementing the method of the present invention using the reduction optical system, the modeling accuracy can be significantly improved while the modeling time is the same as that in the case of batch exposure using the stopped planar drawing mask.

Example 1
(1) The apparatus unit shown in FIG. 2 is provided with a 120 W ultra-high pressure mercury lamp as the light source 1 and a Casio TFT VGA (640 × 480 pixels) liquid crystal as the planar drawing mask 3a. In this way, two sets are arranged in parallel in the horizontal direction, and each planar drawing mask 3a is continuously moved in the same direction at the same speed to perform optical modeling, and a three-dimensional modeled object having the cross-sectional shape pattern of FIG. (Length × width × thickness = 220 mm × 220 mm × 15 mm).
In the stereolithography operation, the drawing area by each planar drawing mask 3a is divided into two in the middle in the moving direction, and “CPX-1000” (curing sensitivity) manufactured by Ciemet Co., Ltd. is used as a photocurable resin composition. 2.5 mJ), projection size onto the modeling surface 5 (photocurable resin composition surface) with one planar drawing mask = 28.8 mm (apparatus traveling direction) × 38.4 mm (perpendicular to the traveling direction) Direction) (square), light energy intensity 2.5 mW / cm ^{2 on} the modeling surface 5, light source 1, rod lens 8, imaging lens 9, reflecting mirror 10, condenser lens 2, planar drawing mask 3 a, and projection The condition of continuous movement speed = 28.8 mm / sec at the time of light irradiation of the apparatus integrated with the lens 4 was adopted.
(2) The total modeling time required in this Example 1 was 58 minutes, and it took about 1/2 the modeling time when the same three-dimensional model was manufactured using one planar drawing mask, and light It takes about 1/20 of the modeling time when modeling with the beam (energy intensity of the light beam = 120 mW, moving speed = 5 m / sec) to produce the same three-dimensional modeled object. Could be done. The obtained three-dimensional model was excellent in appearance and strength.

INDUSTRIAL APPLICABILITY The optical three-dimensional modeling method and apparatus of the present invention are effective for producing a high-quality three-dimensional modeled object having excellent dimensional accuracy and appearance and high strength with high modeling speed and high modeling accuracy with high productivity. Can be used.
And the optical three-dimensional model | molding method and apparatus of this invention can be used effectively for manufacture of the various three-dimensional model | molding thing ranging from small size to large sized.
In the case of the optical three-dimensional modeling method and apparatus of the present invention, models and processing for precision parts, electrical / electronic parts, furniture, building structures, automotive parts, various containers, castings, molds, mother dies, etc. High modeling speed and dimensional accuracy for various models, complex heat medium circuit design parts, complex structure heat medium behavior analysis planning parts, and other 3D objects with complex shapes and structures Can be manufactured smoothly.

It is a figure which shows the example of the movement method of the planar drawing mask at the time of performing an optical three-dimensional modeling using several planar drawing mask. It is a figure which shows the example of the apparatus part provided with the planar drawing mask used by the optical shaping of this invention. It is a figure which shows another example of the apparatus part provided with the planar drawing mask used by the optical shaping of this invention. It is a figure which shows another example of the apparatus part provided with the planar drawing mask used by the optical shaping of this invention. It is a figure which shows another example of the apparatus part provided with the planar drawing mask used by the optical shaping of this invention. It is a figure which shows an example in the case of performing the optical modeling of this invention using the several planar drawing mask which moves continuously. 3 is a diagram showing a cross-sectional shape pattern of a three-dimensional structure manufactured in Example 1. FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Light source 2 Condensing lens 3 Planar drawing mask 3 'Planar drawing mask 3a Planar drawing mask which arranged liquid crystal shutter in plane 3b Planar drawing mask which arranged digital micromirror shutter in plane 4 Projection lens 5 Modeling Surface 6 Exposure image 7 Light transmission means 8 Rod lens 9 Imaging lens 10 Reflective mirror

Claims (9)

After forming a photocured resin layer having a predetermined cross-sectional shape pattern by irradiating light under control through a planar drawing mask to a modeling surface made of a photocurable resin composition, the photocured resin layer A photocurable resin composition for one layer is applied on top to form a modeling surface made of the photocurable resin composition, and the modeling surface is irradiated with light under control through a planar drawing mask to give a predetermined surface. A method for producing a three-dimensional object by sequentially repeating an optical modeling process for further forming a photocured resin layer having a cross-sectional shape pattern until a predetermined three-dimensional object is formed;
Stereolithography is performed using a plurality of planar drawing masks arranged side by side in the scanning direction during stereolithography and capable of continuously changing the mask image ;
A plurality of sensors for detecting the position of the planar drawing mask are arranged, the positions of the plurality of planar drawing masks are measured at two or more points, and the position correction of each planar drawing mask is performed based on the measured values. The state in which the plurality of planar drawing masks are arranged side by side in the scanning direction in at least a part of the optical modeling process while eliminating the positional deviation between the plurality of planar drawing masks. Then, while continuously moving in the scanning direction with respect to the modeling surface made of the photocurable resin composition, the mask image of each planar drawing mask is formed into a cross-sectional shape pattern of the photocured resin layer to be formed Photocuring having a predetermined cross-sectional shape pattern by irradiating light through the planar drawing mask to the modeling surface made of the photocurable resin composition while continuously changing in synchronization with the movement of the planar drawing mask. did Performing shaping operation to form an alicyclic layer;
An optical three-dimensional modeling method characterized by that. Irradiate light through each mask image of a plurality of planar drawing masks to share the photocuring of each drawing region, and form one photocured resin layer having a predetermined cross-sectional shape pattern as a whole The optical three-dimensional model | molding method of Claim 1 which manufactures a three-dimensional molded item by repeating operation to perform. A cross-section to be formed during continuous movement of a planar drawing mask using a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in a minute dot area are arranged in a planar shape. 3. The optical three-dimensional modeling method according to claim 1 , wherein the surface of the photocurable resin composition is irradiated with light while the mask image is continuously changed by the plurality of minute light shutters corresponding to the shape pattern. The optical three-dimensional modeling method according to any one of claims 1 to 3, wherein the planar drawing mask is a planar drawing mask in which a liquid crystal shutter or a digital micromirror shutter is arranged in a plane. A photocurable resin composition supply means for sequentially supplying one layer of the photocurable resin composition onto the mounting table or the photocured resin layer;
light source;
A plurality of planar drawing masks arranged side by side with respect to the scanning direction during stereolithography and capable of continuously changing the mask image;
A moving means for continuously moving each of the plurality of planar drawing masks with respect to the modeling surface made of the photocurable resin composition, wherein the plurality of planar drawing masks are at least part of the optical modeling process. Moving means for continuously moving in the scanning direction with respect to the modeling surface made of the photocurable resin composition in a state of being arranged side by side in the scanning direction ;
Means for continuously changing the mask image of each planar drawing mask in synchronization with the movement of the planar drawing mask;
A plurality of sensors for detecting and measuring the position of the planar drawing mask; and
Means for correcting the position of each of the plurality of planar drawing masks based on the detection / measurement value of the sensor and eliminating positional deviation between the plurality of planar drawing masks;
An optical three-dimensional modeling apparatus comprising: A photo-cured resin layer for a single layer having a predetermined cross-sectional shape pattern as a whole while irradiating light through each mask image of a plurality of planar drawing masks to share the photo-curing of each drawing region The optical three-dimensional model | molding apparatus of Claim 5 which has a means for forming. The optical three-dimensional modeling apparatus according to claim 5 or 6 , wherein the planar drawing mask is a planar drawing mask in which a plurality of minute light shutters capable of shielding and transmitting light in minute dot areas are arranged in a planar shape. The optical three-dimensional modeling apparatus according to any one of claims 5 to 7 , wherein the planar drawing mask is a planar drawing mask in which a liquid crystal shutter or a digital micromirror shutter is arranged in a plane. A light collecting lens that can be moved continuously in synchronization with the planar drawing mask between the light source and the planar drawing mask, and between the planar drawing mask and the surface of the photocurable resin composition The optical three-dimensional model | molding apparatus of any one of Claims 5-8 which has a projection lens which can be continuously moved synchronizing with a planar drawing mask.

Images