JP4362245B2

JP4362245B2 - Coating edge processing equipment

Info

Publication number: JP4362245B2
Application number: JP2001152477A
Authority: JP
Inventors: 豪江川; 政幸寺山; 照璽立嶋; 芳広山口; 久義後藤; 泰史林
Original assignee: Ricoh Co Ltd
Current assignee: Ricoh Co Ltd
Priority date: 2001-05-22
Filing date: 2001-05-22
Publication date: 2009-11-11
Anticipated expiration: 2021-05-22
Also published as: JP2002346449A

Description

【０００１】
【発明の属する技術分野】
本発明は塗膜端部処理装置に関し、特に浸漬塗布方法にて塗膜を形成された円筒状被塗布体の端部塗膜厚肉部及び端面における各余剰塗膜を処理する装置に関する。
【０００２】
【従来の技術】
電子写真感光体の製造方法として円筒状基体を基体保持装置にて保持し、感光塗料に浸漬しその後引き上げることにより塗膜を形成する浸漬塗工方法が広く用いられている。その浸漬塗工方法の内、溶剤浸漬方法として、塗膜を溶解する溶剤中に基体を特定の条件で浸漬し塗膜を除去する方法が特開平６−２０２３５２号公報に提案されている。また、実公平７−４２５３３号公報には位置決め機構を持つ除去装置を用い溶剤に基体を浸漬し塗膜を除去する方法が提案され、特開平１１−３２７１６７号公報には支持体下端部に保持部材を保持し処理溶剤中に浸積して、厚肉部に流動性を与え保持部材へ移動させることにより厚肉部の過剰の塗膜を除去する方法が提案されている。更に、実開昭６４−５６８７０号公報には溶剤槽内に網目状部材を弾性的に固着し、網目状部材がドラムと共に溶剤槽に投入露出を行うことによりドラム端部の塗膜除去を行う方法が提案され、実開昭６４−５６８７２号公報には溶剤槽のドラム下端に対向する位置、多孔質性柔軟性部材を上面が溶剤液面より露出するように設け、ドラムを液面上方で、多孔質性柔軟部材と当接し、次いでドラムは部材を押圧しながら溶剤内に侵入し一定時間浸積した後、ドラムを溶剤から退出させる方法が提案されている。
【０００３】
また、上記浸漬塗工方法の内、溶剤洗浄方法として、特開平４−７３７７８号公報には、ノズルにて溶剤を散布し塗膜を溶解洗浄する方法が提案されている。
【０００４】
更に、掻き取り除去方法として、特開昭６１−２２３８４４号公報にはブレードを接触させて塗膜を除去する方法が提案されている。また、特開平９−１５２７２４号公報には内面塗膜をブラシで除去および端面除去を行う方法が提案されている。
【０００５】
【発明が解決しようとする課題】
しかし、上記いずれの従来の方法でも、塗膜厚肉部及び余剰塗膜により種々の問題が生じてしまう。例えば、塗膜厚肉部は膜厚が平坦部に比べ厚くなっているためクリーニングブレードの接触が悪くなりクリーニング不良が生じたりそのブレードを破損したりする。また、基体下端内面に塗膜が形成される塗膜厚肉部及び余剰塗膜と、電子写真装置に組み込むために装着されるフランジの挿入及び接着時に、基体の変形、寸法、精度、接着強度などに問題が生じてしまう。更に、画像品質向上のため、基体端部面に各種突き当て部材を接触させ精度を持たせる場合があるが、その場合端部面に塗膜が存在することによりその精度は著しく低下してしまう。
【０００６】
以上のような問題解決のため、種々の端部塗膜処理装置及び方法がこれまで開発されてきて上記溶剤浸漬法では、溶剤に塗膜を溶解させ除去する方法であるが、完全に除去することはできず、また溶剤中に円筒状基体に浸積するため液面のゆれにより塗膜にむらが生じたり、余分な塗膜までも除去される恐れがある。また、上記の実開昭６４−５６８７２号公報では、多孔質性柔軟部材の上面が液面から出た状態にあるため、該部材の上面にドラムより処理され移動付着した塗膜が蓄積し繰り返し処理を行うと拭き取り精度が悪くなる。また、上記の溶剤洗浄方法でも、完全なる洗浄ができず、溶剤量も大量必要となる。また、外面塗膜の除去が、別途必要となる。更に、上記の掻き取洗浄方法では、除去部材としてブレードやブラシで除去を行うが、その密着性により洗浄度が左右されるがその再現性が乏しいため、完全なる除去ができないし、余分なる塗膜や、基体を傷つけるおそれがある。また、除去部材を円筒状基体内面に侵入させる時に、除去部材を円筒状基体の内径に対して小さくすると密着性が悪く完全なる除去ができないし、大きくすると除去部材を円筒状基体内面に侵入させる時に円筒状基体内面の塗膜厚肉部を除去部材にて押し上げ完全なる除去ができず、かつ円筒状基体内面から除去部材を引き上げるとき液ハネを起こす恐れがある。
【０００７】
本発明はこれらの問題点を解決するためのものであり、円筒状被塗布体、例えば電子写真感光体を感光塗工液に浸漬した後引き上げることにより塗膜を形成する際に生じる円筒状基体の端面及び内面の塗膜厚肉部の各余剰塗膜を精度よく再現性を持ち除去することを一つの処理装置で容易にした塗膜端部処理装置を提供することを目的とする。
【０００８】
【課題を解決するための手段】
前記問題点を解決するために、円筒状被塗布体を塗布液中に浸漬させて円筒状被塗布体の表面に塗膜を形成した円筒状被塗布体の端部における余剰塗膜を処理する塗膜端部処理装置であって、円筒状被塗布体の内面塗膜厚肉部における余剰塗膜を処理する内面塗膜厚肉部拭取り部材及び円筒状被塗布体の端面における余剰塗膜を処理する端面拭取り部材を有する桶と、内面塗膜厚肉部拭取り部材及び端面拭取り部材に余剰塗膜を溶解し得る溶剤を供給する液供給機構と、桶内に溜まった汚液を回収する汚液回収機構と、桶を回転させる回転機構と、内面塗膜厚肉部拭取り部材を円筒状被塗布体に密着又は離間させるために桶と円筒状被塗布体を相対的に前進後退動作させる前進後退押し付け機構と、円筒状被塗布体を保持する円筒状被塗布体保持装置と、円筒状被塗布体を桶内で位置決めするために桶と円筒状被塗布体保持装置を相対的に昇降させる昇降機構とを有する本発明の塗膜端部処理装置は、端面拭取り部材の下面と桶内底面との間に設けられた隙間に少なくとも１ｍｍ以上１０ｍｍ以下の隙間を設け、該隙間に端面拭取り部材を搭載する多孔質状の外端面拭取り部材置き板材を設けることに特徴がある。よって、桶内に溜まった汚液の流れを良くし、桶内に汚液を残さず回収でき、そして繰り返し拭取り精度を維持することができる。
【０００９】
また、内面塗膜厚肉部拭取り部材及び端面拭取り部材は柔軟性多孔質材料で形成することにより、円筒状被塗布体への密着性にすぐれ、溶剤を吸収することにより洗浄度が良く、かつ円筒状被塗布体を傷つける恐れがない。
【００１０】
更に、内面塗膜厚肉部拭取り部材及び端面拭取り部材は桶に着脱自在に取り付けられていることにより、多数品種の円筒状被塗布体又は塗布液に対応可能となる。
【００１２】
更に、液供給機構から供給される溶剤を内面塗膜厚肉部拭取り部材に供給する溶剤供給穴を内面拭取り部材押えに設けることにより、内面の余剰塗膜を処理中でも溶剤を補給することができ、十分なる余剰塗膜処理が可能となる。
【００１３】
また、液供給機構は、溶剤を収容する溶剤タンクから溶剤供給穴を連通する溶剤液流路を形成する回動自在の供給管を有することにより、内面の余剰塗膜を処理中に溶剤漏れなく溶剤を供給でき、内面塗膜厚肉部拭取り部材に効率良く溶剤を供給できる。
【００１４】
更に、汚液回収機構は、液供給機構により供給された溶剤を桶内に溜め抜きする溶剤溜め抜き機構を有することにより、溶剤を桶内に端面拭取り部材を溶剤中に浸積させた状態、もしくは溶剤を抜き端面拭取り部材を保湿した状態におくことが可能であり、かつ溶剤を溜め抜きすることにより桶内の汚れた溶剤の汚液を確実に抜き、桶内をきれいな状態を保つことが可能となり、繰り返し拭き取り精度を良くすることが可能となる。
【００１５】
また、端面拭取り部材は、溶剤が保湿された状態で厚みを持ったフランジ形状であり、円筒状被塗布体保持装置の昇降方向に対しての厚さが３ｍｍ〜１０ｍｍの板状であって、外径が円筒状被塗布体の外径より大きく、内径が円筒状被塗布体の内径より小さいことにより、例えば本発明の塗膜端部処理装置を複数設け各塗膜端部処理装置毎に円筒状被塗布体に対する余剰塗膜処理を同時に行う場合各円筒状被塗布体において微妙な個々の押し付けのバラツキがあっても、当該押し付けのバラツキを吸収することが可能である。
【００１６】
更に、内面塗膜厚肉部拭取り部材は、内面拭取り部材押えに固定されかつ溶剤が保湿された状態で円筒状被塗布体保持装置の昇降方向に対しての厚さが３ｍｍ〜２０ｍｍで、前進後退押し付け機構の進行方向に対しての厚さが３ｍｍ以上円筒状被塗布体の内径以下で、前進後退押し付け機構の進行方向に対して垂直方向の厚さが３ｍｍ以上のブロック形状であることにより、内面塗膜厚肉部拭取り部材及び端面拭取り部材、並びに内面拭き取り部材押えに接触せずに円筒状被塗布体に侵入することが可能なり、また内面塗膜厚肉部拭取り部材と円筒状被塗布体の内面とがテンションをかけ密着するのに十分な押し当てが可能となる。
【００１７】
また、回転機構により回転する桶の回転速度は、１０ｒｐｍ〜１００ｒｐｍであって、好ましくは２０ｒｐｍ〜６０ｒｐｍであることにより、効率良い処理時間で拭き残しなく、かつ繰り返し精度良く処理することができる。
【００１８】
更に、上記記載の塗膜端部処理装置を複数設けて複数の円筒状被塗布体の余剰塗布処理を行う際、各塗膜端部処理装置における桶を各々隔離するための遮蔽板を各桶の間に設けることにより、複数の円筒状被塗布体を同時に処理ができ、端面処理中の他の塗膜端部処理装置からの液ハネを防止でき、塗膜欠陥の発生を防ぐことができる。
【００１９】
また、前進後退押し付け機構は、内面塗膜厚肉部拭取り部材を円筒状被塗布体の内面塗膜厚肉部に押し当てる押し当て量を調整する調整手段を有することにより、また当該押し当て量は前進後退押し付け機構による前進又は後退の移動値が０ｍｍより多く、かつ内面拭取り用の柔軟性多孔質部材が溶剤で保湿された状態での幅より少ない範囲に相当することにより、内面塗膜厚肉部の拭取り量を調整でき、多数品種の円筒状被塗布体又は塗布液の処理に対応可能となる。
【００２０】
本発明に係る塗膜端部処理装置は、円筒状被塗布体の内面塗膜厚肉部における余剰塗膜を処理する内面塗膜厚肉部拭取り部材及び円筒状被塗布体の端面における余剰塗膜を処理する端面拭取り部材を有する桶と、内面塗膜厚肉部拭取り部材及び端面拭取り部材に余剰塗膜を溶解し得る溶剤を供給する液供給機構と、桶内に溜まった汚液を回収する汚液回収機構と、桶を回転させる回転機構と、内面塗膜厚肉部拭取り部材を円筒状被塗布体に密着又は離間させるために桶と円筒状被塗布体を相対的に前進後退動作させる前進後退押し付け機構と、円筒状被塗布体を保持する円筒状被塗布体保持装置と、円筒状被塗布体を桶内で位置決めするために桶と円筒状被塗布体保持装置を相対的に昇降させる昇降機構とを有する本発明の塗膜端部処理装置は、端面拭取り部材の下面と桶内底面との間に設けられた隙間に少なくとも１ｍｍ以上１０ｍｍ以下の隙間を設け、該隙間に端面拭取り部材を搭載する多孔質状の外端面拭取り部材置き板材を設けている。
【００２１】
【実施例】
図１は本発明の一実施例に係る塗膜端部処理装置の構成を示す概略断面図である。同図において、本実施例の塗膜端部処理装置１は、円筒状基体１１を保持する円筒状基体保持装置１２と、後述するモータ１４によって回動し、円筒状基体保持装置１２と連結したネジ溝の螺旋に沿って円筒状基体保持装置１２を昇降させる昇降用ボールネジ１３と、桶１５と、該桶１５及び後述する汚液回収槽２５を前進後退動作させて後述する円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７を円筒状基体の内面上に密着又は離脱をさせる前進後退押し付け機構１６と、円筒状基体１１の内面上に密着して内面塗膜厚肉部の拭取り処理を行う円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７と、内面拭取り部材押え部１８と、円筒状基体１１の端面を拭取る円筒状基体端面拭取り用の柔軟性多孔質部材１９と、柔軟性多孔質部材１７に溶剤を供給する溶剤供給穴２０と、多孔質状の外端面拭取り部材置き板材２１と、桶１５を回動させるためにモータ２３の回転を伝達する、例えばチェーン、タイミングベルト、ギアなどの回転機構用駆動伝達部材２２と、桶１５内に溶剤を溜めたり桶１５内の汚液を後述する汚液回収槽２５へ排出するために開閉する溶剤溜め抜き機構用バルブ２４と、桶１５内の汚液を回収する汚液回収槽２５と、該汚液回収槽２５に溜まった汚液を外部に回収するために一時溜めて置く汚液回収タンク２６と、新規な溶剤を溜めておく液供給機構用溶剤タンク２７と、該タンク内の溶剤を回動自在の配管部２９を介して柔軟性多孔質部材１７，１９に供給する液供給機構用ポンプ２８と、溶剤が漏れないように固定の配管と回動自在の配管部２９とを連結するためのロータリージョイント部３０とを含んで構成されている。なお、本実施例の塗膜端部処理装置１では、円筒状基体保持装置１２を昇降させているが、桶１５を円筒状基体１１に対して昇降させてもよい。また、桶１５を前進後退押し付け機構１６によって前進後進させているが円筒状基体保持装置１２を桶１５に対して前進後進させてもよい。
【００２２】
次に、図１の本実施例の塗膜端部処理装置を用いた各処理工程について各工程図である図２及び図３に従って以下に説明する。先ず、図２の（ａ）において、モータ１４の回転によって回動する昇降用ボールネジ１３のネジ溝に沿って下降し、そして下降する円筒状基体保持装置１２により保持された塗工後の円筒状基体１１が桶１５内に入る際、この桶１５が前進後退押し付け機構１６により円筒状基体１１と円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７及び内面拭取り部材押え１８とに触れないよう移動させた状態で、円筒状基体１１は鉛直方向に下降する。よって、円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７及び内面拭取り部材押え１８を円筒状基体１１の内面に侵入させる。そして、図２の（ｂ）に示すように、円筒状基体１１の端面は円筒状基体１１を垂直に０ｍｍより多く端面拭取り用の柔軟性多孔質部材１９が溶剤で保湿された状態での厚さより少ない範囲（以下この範囲を寸法Ｅと称す）で外端面拭取り用の柔軟性多孔質部材１９に押し当てられ、円筒状基体１１の外端面塗膜厚肉部及び端面の処理を行うのである。
【００２３】
次に、円筒状基体１１の外端面塗膜厚肉部及び端面の処理が終了した後桶１５が前進後退押し付け機構１６により円筒状基体１１と円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７及び内面拭取り部材押え１８とに触れないよう移動させた状態で、図３の（ａ）に示すように、モータ１４の回転によって図２のときとは逆方向に回動する昇降用ボールネジ１３のネジ溝に沿って上昇し、そして上昇する円筒状基体保持装置１２により保持された塗工後の円筒状基体１１が上昇する。そして、図３の（ｂ）に示すように、円筒状基体１１の内面に対して円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７は０ｍｍより多く円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７が溶剤で保湿された状態での幅より少ない範囲（以下この範囲を寸法Ｊと称す）で垂直に押し当て密着するように桶１５を前進後退押し付け機構１６により移動させ、円筒状基体１１の内面と円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７とが密着しテンションのかかった状態にする。そして、液供給機構用ポンプ２８、回転自在配管部２９及びロータリージョイント部３０により供給されてくる溶剤を溶剤供給穴２０から円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７に供給しながら桶１５と共に内面拭取り用の柔軟性多孔質部材１７を回転機構用駆動伝達部材２２及びモータ２３により１０ｒｐｍ〜１００ｒｐｍで回転させ、円筒状基体１１の内面塗膜厚肉部処理を行う。
【００２４】
その後、円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７、円筒状基体端面拭取り用の柔軟性多孔質部材１９及び内面拭取り部材押え１８を円筒状基体１１の内面に触れないよう桶１５を前進後退押し付け機構１６により移動させた後、円筒状基体保持装置１２により保持された端部処理後の円筒状基体１１を引き上げる。
【００２５】
最後に、溶剤溜め抜き機構用バルブ２４を閉にし桶１５内に溶剤を溜めて、円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７及び円筒状基体端面拭取り用の柔軟性多孔質部材１９、もしくは円筒状基体端面拭取り用の柔軟性多孔質部材１９のみを溶剤中に浸積させ、円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７及び円筒状基体端面拭取り用の柔軟性多孔質部材１９に付着した塗膜を溶解してきれいな状態に戻す。そして、溶剤溜め抜き機構用バルブ２４を開にして汚液を汚液回収槽２５に排出し、汚液回収槽２５を流れ汚液回収タンク２６に回収する。なお、汚液排出後、再度きれいな溶剤を液供給機構により流し、円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７及び円筒状基体端面拭取り用の柔軟性多孔質部材１９を保湿させると、より一層効果的である。以上の拭き取り工程及び拭き取りの柔軟性多孔質部材の洗浄を連続して繰り返し実施する。上記一連の処理工程を図４に示す。
【００２６】
ここで、上記円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７及び円筒状基体端面拭取り用の柔軟性多孔質部材１９における孔の大きさの違う柔軟性多孔質部材を何種類か重ねたり、また柔軟性多孔質部材の上に網目状板材（例えばメッシュ）を重ねたり、或いは柔軟性多孔質部材の変わりに網目状板材（例えばメッシュ）をバネなどで固定し柔軟性多孔質部材と同じ効果を持たせても良い。また、液供給機構は、上記実施例の液供給機構に限らず桶の上方から供給したり、下方の中心からずれた位置から供給しても良い。更に、桶１５と回転機構用駆動伝達部材２２の回転台を固定する時溶剤が漏れないようにＯリングなどのシール部材挟んだり、もしくは一体物でも良い。また、図５に示すように、外端面拭取り部材置き板材２１の下面と桶１５の内底面との間に隙間（寸法Ａ）を設けなくても良い。また、図５に示すように、円筒状基体端面拭取り用の柔軟性多孔質部材１９の円筒状基体保持装置の昇降方向に対しての厚さは３ｍｍ〜１０ｍｍ（寸法Ｂ）の板状で、外径（寸法Ｃ）は円筒状基体の外径より大きく、内径（寸法Ｄ）は円筒状基体の内径より小さく、この内径に内面拭取り部材押え１８を通して外端面拭取り部材置き板材２１の上に置かれたことにより複数の円筒状基体を同時に処理を行っても微妙な個々の押し付けのバラツキを柔軟性多孔質部材の柔軟性で吸収することが可能である。
【００２７】
更に、円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７は、内面拭取り部材押え１８に固定されかつ溶剤が保湿された状態で円筒状基体保持装置の昇降方向に対しての厚さは、図６に示すように、３ｍｍ〜２０ｍｍ（寸法Ｆ）で、前進後退押し付け機構の進行方向に対しての厚さは３ｍｍ〜円筒状基体内面直径以下（寸法Ｇ）で、図７に示すように、前進後退押し付け機構の進行方向に対して垂直方向の厚さは３ｍｍ〜円筒状基体内面直径以下（寸法Ｈ）のブロック状である。円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７が、内面拭き取り部材押え１８に固定された状態で円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７、及び内面拭き取り部材押え１８の外径（寸法Ｉ）が円筒状基体内面直径以下であり、円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材１７、及び内面拭き取り部材押え１８に接触せずに円筒状基体内面に侵入することが可能なり、また円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材と円筒状基体内面とがテンションをかけ密着するのに十分な押し当てが可能となる。
【００２８】
なお、上記実施例の塗膜端部処理装置に使用する拭取り部材の材質、形態は、例えばポリウレタン、ポリエチレン、ポリセルロース、ゴム等の耐溶剤性のスポンジがあげられ、形状は使用する溶剤により膨潤し基体に適度に接触する用加工すればよい。また、使用する溶剤は、塗膜を溶解し得るものであり、特に感光塗工液に使用している溶剤であることが望ましい。
【００２９】
以下、本発明に係る具体例、及び比較例を挙げて説明するが、以下に示す具体例に限定されるものではない。
【００３０】
本発明に係る具体例の拭き取り部材としてポリウレタンフォームを使用し下引き層、電荷発生層、電荷輸送層の端部塗膜除去を実施した。
【００３１】
（具体例１）
下記成分の下引き層塗工液を浸漬塗工法により円筒状基体に塗膜を形成した後本発明の装置にて塗膜除去用溶剤としてメチルエチルケトンを用い端部塗膜除去を実施した。
【００３２】
下引き層塗工液成分
ＴｉＯ２９０重量部
熱硬化樹脂１５０重量部
メチルエチルケトン６００重量部
下引き層膜厚５μｍ
【００３３】
除去度合いは良好で目視にて内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。繰り返し精度に優れ複数回の塗膜除去においても除去度合いは変わることなく良好であった。
【００３４】
（具体例２）
具体例１と同じ成分の下引き層塗工液を浸漬塗工法により円筒状基体に塗膜を形成した後本発明の装置にて塗膜除去用溶剤として塩化メチレンを用い端部塗膜除去を実施した。除去度合いは良好で目視にて内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。
【００３５】
（比較例１）
実施例１の下引き層を従来技術である溶剤浸漬法にて除去を行った。溶剤はメチルエチルケトンを使用し浸漬時間を３０ＳＥＣ、浸漬回数を３回行った。塗膜を完全に除去することができず、相当量の塗膜が内面及び外面に付着していた。また、液面のゆれにより拭き取り際は乱れていた。
【００３６】
（比較例２）
実施例１の下引き層を従来技術であるブラシによる掻き取法にて除去を行った。溶剤は、塩化メチレンを使用した。内面及び外面の塗膜はほとんど目視では確認できなかったが、外面の拭き取り際がブラシにより乱されていた。また、繰り返し精度が乏しく洗浄度にばらつきがあった。
【００３７】
（具体例３）
下記成分の電荷発生層塗工液を浸漬塗工法により円筒状基体に塗膜を形成した後本発明の装置にて塗膜除去用溶剤としてメチルエチルケトンを用い端部塗膜除去を実施した。
【００３８】
電荷発生層塗工液成分
アゾ顔料（Ａ）４５重量部
ポリビニルブチラ−ル４．５重量部
メチルエチルケトン２４００重量部
【００３９】
除去度合いは良好で目視にて内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。繰り返し精度に優れ複数回の塗膜除去においても除去度合いは変わることなく良好であった。
【００４０】
（具体例４）
下記成分の電荷発生層塗工液を浸漬塗工法により円筒状基体に塗膜を形成した後本発明の装置にて塗膜除去用溶剤としてＴＨＦを用い端部塗膜除去を実施した。
【００４１】
電荷発生層塗工液成分
τ型無金属フタロシアニン３０重量部
ポリビニルブチラ−ル２０重量部
ＴＨＦ１２００重量部
【００４２】
塗膜除去度合いは良好で目視にて内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。繰り返し精度に優れ複数回の塗膜除去においても除去度合いは変わることなく良好であった。
【００４３】
（比較例３）
具体例３の電荷発生層を従来技術である溶剤浸漬法にて除去を行った。溶剤はメチルエチルケトンを使用し浸漬時間を３０ＳＥＣ、浸漬回数を３回行った。塗膜を完全に除去することができず、相当量の塗膜が内面及び外面に付着していた。
【００４４】
（比較例４）
具体例４の電荷発生層を従来技術であるブラシによる掻き取法にて除去を行った。溶剤はＴＨＦを使用した。塗膜除去度合いは、具体例４に比べ劣りわずかに残査が残っていた。また、繰り返し精度に乏しく複数回の塗膜除去における除去度合いはばらついていた。
【００４５】
（具体例５）
下記成分の電荷輸送層塗工液を浸漬塗工法により円筒状基体に塗膜を形成した後本発明の装置にて塗膜除去用溶剤としてＴＨＦを用い端部塗膜除去を実施した。
【００４６】
電荷発生層塗工液成分
電荷発生材料（Ｂ）１８０重量部
ポリカ−ボネ−ト樹脂２５０重量部
ＴＨＦ１５２０重量部
シリコンオイル０．０４重量部
電荷発生層膜厚３０μｍ
【００４７】
塗膜除去度合いは良好で目視にて内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。繰り返し精度に優れ複数回の塗膜除去においても除去度合いは変わることなく良好であった。
【００４８】
（具体例６）
具体例５の電荷輸送層塗工液を浸漬塗工法により円筒状基体に塗膜を形成した後本発明の装置にて塗膜除去用溶剤として塩化メチレンを用い端部塗膜除去を実施した。塗膜除去度合いは良好で目視にて内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。繰り返し精度に優れ複数回の塗膜除去においても除去度合いは変わることなく良好であった。
【００４９】
（比較例５）
具体例５の電荷発生層を従来技術である溶剤浸漬法にて除去を行った。溶剤はＴＨＦを使用し浸漬時間を３０ＳＥＣ、浸漬回数を３回行った。塗膜を完全に除去することができず、相当量の塗膜が内面及び外面に付着していた。
【００５０】
（比較例６）
具体例４の電荷発生層を従来技術であるブラシによる掻き取法にて除去を行った。溶剤はＴＨＦを使用した。塗膜除去度合いは、具体例４に比べ劣りわずかに残査が残っていた。
【００５１】
（具体例７）
具体例１の下引き層において、図８に示すように、所定のピッチで配置された基体保持装置毎に設けられた本塗膜端部処理装置を複数基、本具体例では１２基備え、各塗膜端部処理装置は遮蔽板３１で隔離された塗膜端部処理装置で同時に端部塗膜除去を行った。塗膜除去度合いは良好であり１２本全て目視上内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。
【００５２】
（具体例８）
具体例３の電荷発生層において基体保持装置と基体保持装置のピッチで配置された本塗膜端部処理装置を各々１２基備え、各塗膜端部処理装置は遮蔽板３１で隔離された塗膜端部処理装置で同時に端部塗膜除去を行った。塗膜除去度合いは良好であり１２本全て目視上内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。
【００５３】
（具体例９）
具体例５の電荷輸送層において基体保持装置と基体保持装置のピッチで配置された本塗膜端部処理装置を各々１２基備え各塗膜端部処理装置は遮蔽板３１で隔離された塗膜端部処理装置で同時に端部塗膜除去を行った。塗膜除去度合いは良好であり１２本全て目視上内面及び外面に拭き残しは確認できず、外面の拭き取り際は乱れることなく均一に塗膜を除去することができた。
【００５４】
（具体例１０）
具体例３の電荷輸送層において桶の回転速度を５，１０，２０，３０，４０，６０，８０，１００，１２０，１４０ｒｐｍと変えて、端部塗膜除去を行った。塗膜除去度合いは１０〜１００ｒｐｍの範囲で良好であるが、回転速度が速いほど処理にかかる時間が短く済むことが確認できた。また、１０ｒｐｍより遅いと拭き残しが起こり、及び１００ｒｐｍより速いと円筒状基体内面拭き取り用柔軟性多孔質部材にテンションがかかりすぎ繰り返し処理を行うと切れ目が入った。処理に要する時間と柔軟性多孔質部材の耐久性とを考慮し、２０ｒｐｍ〜６０ｒｐｍ程度がもっとも良好と確認できた。この具体例１０の結果を下記の表１に示す。
【００５５】
【表１】

【００５６】
【発明の効果】
以上説明したように、円筒状被塗布体を塗布液中に浸漬させて円筒状被塗布体の表面に塗膜を形成した円筒状被塗布体の端部における余剰塗膜を処理する塗膜端部処理装置であって、円筒状被塗布体の内面塗膜厚肉部における余剰塗膜を処理する内面塗膜厚肉部拭取り部材及び円筒状被塗布体の端面における余剰塗膜を処理する端面拭取り部材を有する桶と、内面塗膜厚肉部拭取り部材及び端面拭取り部材に余剰塗膜を溶解し得る溶剤を供給する液供給機構と、桶内に溜まった汚液を回収する汚液回収機構と、桶を回転させる回転機構と、内面塗膜厚肉部拭取り部材を円筒状被塗布体に密着又は離間させるために桶と円筒状被塗布体を相対的に前進後退動作させる前進後退押し付け機構と、円筒状被塗布体を保持する円筒状被塗布体保持装置と、円筒状被塗布体を桶内で位置決めするために桶と円筒状被塗布体保持装置を相対的に昇降させる昇降機構とを有する本発明の塗膜端部処理装置は、端面拭取り部材の下面と桶内底面との間に設けられた隙間に少なくとも１ｍｍ以上１０ｍｍ以下の隙間を設け、該隙間に端面拭取り部材を搭載する多孔質状の外端面拭取り部材置き板材を設けることに特徴がある。よって、桶内に溜まった汚液の流れを良くし、桶内に汚液を残さず回収でき、そして繰り返し拭取り精度を維持することができる。
【００５７】
また、内面塗膜厚肉部拭取り部材及び端面拭取り部材は柔軟性多孔質材料で形成することにより、円筒状被塗布体への密着性にすぐれ、溶剤を吸収することにより洗浄度が良く、かつ円筒状被塗布体を傷つける恐れがない。
【００５８】
更に、内面塗膜厚肉部拭取り部材及び端面拭取り部材は桶に着脱自在に取り付けられていることにより、多数品種の円筒状被塗布体又は塗布液に対応可能となる。
【００６０】
更に、液供給機構から供給される溶剤を内面塗膜厚肉部拭取り部材に供給する溶剤供給穴を内面拭取り部材押えに設けることにより、内面の余剰塗膜を処理中でも溶剤を補給することができ、十分なる余剰塗膜処理が可能となる。
【００６１】
また、液供給機構は、溶剤を収容する溶剤タンクから溶剤供給穴を連通する溶剤液流路を形成する回動自在の供給管を有することにより、内面の余剰塗膜を処理中に溶剤漏れなく溶剤を供給でき、内面塗膜厚肉部拭取り部材に効率良く溶剤を供給できる。
【００６２】
更に、汚液回収機構は、液供給機構により供給された溶剤を桶内に溜め抜きする溶剤溜め抜き機構を有することにより、溶剤を桶内に端面拭取り部材を溶剤中に浸積させた状態、もしくは溶剤を抜き端面拭取り部材を保湿した状態におくことが可能であり、かつ溶剤を溜め抜きすることにより桶内の汚れた溶剤の汚液を確実に抜き、桶内をきれいな状態を保つことが可能となり、繰り返し拭き取り精度を良くすることが可能となる。
【００６３】
また、端面拭取り部材は、溶剤が保湿された状態で厚みを持ったフランジ形状であり、円筒状被塗布体保持装置の昇降方向に対しての厚さが３ｍｍ〜１０ｍｍの板状であって、外径が円筒状被塗布体の外径より大きく、内径が円筒状被塗布体の内径より小さいことにより、例えば本発明の塗膜端部処理装置を複数設け各塗膜端部処理装置毎に円筒状被塗布体に対する余剰塗膜処理を同時に行う場合各円筒状被塗布体において微妙な個々の押し付けのバラツキがあっても、当該押し付けのバラツキを吸収することが可能である。
【００６４】
更に、内面塗膜厚肉部拭取り部材は、内面拭取り部材押えに固定されかつ溶剤が保湿された状態で円筒状被塗布体保持装置の昇降方向に対しての厚さが３ｍｍ〜２０ｍｍで、前進後退押し付け機構の進行方向に対しての厚さが３ｍｍ以上円筒状被塗布体の内径以下で、前進後退押し付け機構の進行方向に対して垂直方向の厚さが３ｍｍ以上のブロック形状であることにより、内面塗膜厚肉部拭取り部材及び端面拭取り部材、並びに内面拭き取り部材押えに接触せずに円筒状被塗布体に侵入することが可能なり、また内面塗膜厚肉部拭取り部材と円筒状被塗布体の内面とがテンションをかけ密着するのに十分な押し当てが可能となる。
【００６５】
また、回転機構により回転する桶の回転速度は、１０ｒｐｍ〜１００ｒｐｍであって、好ましくは２０ｒｐｍ〜６０ｒｐｍであることにより、効率良い処理時間で拭き残しなく、かつ繰り返し精度良く処理することができる。
【００６６】
更に、上記記載の塗膜端部処理装置を複数設け、各塗膜端部処理装置における桶を各々隔離するための遮蔽板を各桶の間に設けることにより、複数の円筒状被塗布体を同時に処理ができ、端面処理中の他の塗膜端部処理装置からの液ハネを防止でき、塗膜欠陥の発生を防ぐことができる。
【００６７】
また、前進後退押し付け機構は、内面塗膜厚肉部拭取り部材を円筒状被塗布体の内面塗膜厚肉部に押し当てる押し当て量を調整する調整手段を有することにより、また当該押し当て量は前進後退押し付け機構による前進又は後退の移動値が０ｍｍより多く、かつ内面拭取り用の柔軟性多孔質部材が溶剤で保湿された状態での幅より少ない範囲に相当することにより、内面塗膜厚肉部の拭取り量を調整でき、多数品種の円筒状被塗布体又は塗布液の処理に対応可能となる。
【図面の簡単な説明】
【図１】本発明の一実施例に係る塗膜端部処理装置の構成を示す概略断面図である。
【図２】本実施例の塗膜端部処理装置を用いた各処理工程の様子を示す概略断面図である。
【図３】本実施例の塗膜端部処理装置を用いた各処理工程の様子を示す概略断面図である。
【図４】本実施例の塗膜端部処理装置を用いた一連の処理工程を示す図である。
【図５】本実施例における円筒状基体端面拭取り用の柔軟性多孔質部材のサイズを示す図である。
【図６】本実施例における円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材のサイズを示す図である。
【図７】本実施例における円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材のサイズを示す図である。
【図８】本実施例の塗膜端部処理装置を複数設けた一例を示す概略断面図である。
【符号の説明】
１；塗膜端部処理装置、１１；円筒状基体、１２；円筒状基体保持装置、
１３；昇降用ボールネジ、１４，２３；モータ、１５；桶、
１６；前進後退押し付け機構、
１７；円筒状基体内面塗膜厚肉部拭取り用の柔軟性多孔質部材、
１８；内面拭取り部材押え部、
１９；円筒状基体端面拭取り用の柔軟性多孔質部材、
２０；溶剤供給穴、２１；外端面拭取り部材置き板材、
２２；回転機構用駆動伝達部材、２４；溶剤溜め抜き機構用バルブ、
２５；汚液回収槽、２６；汚液回収タンク、
２７；液供給機構用溶剤タンク、２８；液供給機構用ポンプ、
２９；配管部、３０；ロータリージョイント部、３１；遮蔽板。[0001]
BACKGROUND OF THE INVENTION
TECHNICAL FIELD The present invention relates to a coating film end processing apparatus, and more particularly to an apparatus for processing each excessive coating film on an end coating thick part and an end face of a cylindrical coated body on which a coating film is formed by a dip coating method.
[0002]
[Prior art]
As a method for producing an electrophotographic photoreceptor, a dip coating method is widely used in which a cylindrical substrate is held by a substrate holding device, dipped in a photosensitive paint, and then pulled up to form a coating film. Among the dip coating methods, as a solvent immersing method, a method of immersing a substrate in a solvent that dissolves a coating film under specific conditions and removing the coating film is proposed in JP-A-6-202352. Japanese Utility Model Publication No. 7-42533 proposes a method of removing a coating film by immersing a substrate in a solvent using a removing device having a positioning mechanism, and Japanese Patent Application Laid-Open No. 11-327167 holds it at the lower end of a support. There has been proposed a method of removing an excessive coating on a thick part by holding the member and immersing it in a processing solvent to impart fluidity to the thick part and moving it to the holding member. Further, Japanese Utility Model Laid-Open No. 64-56870 discloses that a mesh member is elastically fixed in a solvent tank, and the mesh member is introduced into the solvent tank together with the drum so as to remove the coating film from the drum end. In Japanese Utility Model Laid-Open No. 64-56872, a porous flexible member is provided at a position facing the lower end of the drum of the solvent tank so that the upper surface is exposed from the solvent liquid level. A method has been proposed in which the drum comes into contact with the porous flexible member, and then the drum enters the solvent while pressing the member and is immersed for a certain time, and then the drum is withdrawn from the solvent.
[0003]
Among the dip coating methods, as a solvent cleaning method, Japanese Patent Application Laid-Open No. 4-73778 proposes a method of spraying a solvent with a nozzle and dissolving and cleaning the coating film.
[0004]
Further, as a scraping removal method, Japanese Patent Application Laid-Open No. 61-223844 proposes a method of removing a coating film by contacting a blade. Japanese Patent Laid-Open No. 9-152724 proposes a method of removing an inner coating film with a brush and removing an end face.
[0005]
[Problems to be solved by the invention]
However, any of the above conventional methods causes various problems due to the thick part of the coating film and the excess coating film. For example, since the thick part of the coating film is thicker than the flat part, the contact of the cleaning blade is deteriorated, resulting in poor cleaning or damage to the blade. In addition, the deformation, dimensions, accuracy, and bonding strength of the substrate during insertion and bonding of the thick film portion and surplus coating film on which the coating film is formed on the lower inner surface of the substrate and the flange mounted for incorporation into the electrophotographic apparatus Will cause problems. Furthermore, in order to improve the image quality, there are cases where various abutting members are brought into contact with the end surface of the substrate to give accuracy, but in that case, the accuracy is significantly reduced due to the presence of the coating film on the end surface. .
[0006]
In order to solve the above problems, various end coating film processing apparatuses and methods have been developed so far, and the solvent immersion method is a method of dissolving and removing a coating film in a solvent, but completely removing it. In addition, since the film is immersed in a cylindrical substrate in a solvent, the coating film may become uneven due to the fluctuation of the liquid level, and even an excessive coating film may be removed. Further, in the above-mentioned Japanese Utility Model Publication No. 64-56872, the upper surface of the porous flexible member is in the state of coming out of the liquid surface. When processing is performed, the wiping accuracy is deteriorated. Further, even with the above-described solvent cleaning method, complete cleaning cannot be performed, and a large amount of solvent is required. Further, it is necessary to remove the outer coating film. Further, in the above-described scraping and cleaning method, removal is performed with a blade or a brush as a removing member. However, the degree of cleaning is affected by the adhesion, but the reproducibility is poor, so that complete removal cannot be performed, and extra coating is applied. There is a risk of damaging the membrane and the substrate. Further, when the removal member enters the inner surface of the cylindrical substrate, if the removal member is made smaller than the inner diameter of the cylindrical substrate, the adhesion is poor and complete removal cannot be performed. If the removal member is made larger, the removal member enters the inner surface of the cylindrical substrate. Sometimes, the thick part of the coating on the inner surface of the cylindrical substrate cannot be completely removed by being pushed up by the removing member, and there is a risk of liquid splashing when the removing member is pulled up from the inner surface of the cylindrical substrate.
[0007]
The present invention is intended to solve these problems, and a cylindrical substrate formed when a coated body is formed by dipping a cylindrical coated body, for example, an electrophotographic photosensitive body in a photosensitive coating solution and then pulling it up. It is an object of the present invention to provide a coating film end processing apparatus that can easily and accurately remove each excess coating film on the coating thick-walled portion on the end surface and the inner surface with a single processing apparatus.
[0008]
[Means for Solving the Problems]
In order to solve the above-described problems, the excessive coating film at the end of the cylindrical coated body is formed by immersing the cylindrical coated body in a coating solution to form a coating film on the surface of the cylindrical coated body. Paint Membrane edge processing equipment Because , An inner surface coating thick part wiping member for processing an excess coating film on the inner surface coating thick part of the cylindrical coated body, and an end surface wiping member for processing an excess coating film on the end surface of the cylindrical coated body桶, a liquid supply mechanism for supplying a solvent capable of dissolving the surplus coating film to the inner surface coating film thick part wiping member and the end surface wiping member, and a sewage recovery mechanism for recovering the sewage accumulated in the tub, A rotation mechanism that rotates the heel, and a forward and backward pressing mechanism that relatively moves the heel and the cylindrical coated body forward and backward to closely contact or separate the inner surface thick film wiping member from the cylindrical coated body; A cylindrical coated body holding device for holding the cylindrical coated body, and a lifting mechanism for moving the cylindrical coated body holding device relatively up and down in order to position the cylindrical coated body in the basket. Have The coating film edge processing apparatus of the present invention provides a gap of at least 1 mm and not more than 10 mm in the gap provided between the lower surface of the end surface wiping member and the bottom surface of the basket, and mounts the end surface wiping member in the gap. A porous outer edge surface wiping member mounting plate is provided. There is a special feature. Therefore, Improves the flow of sewage collected in the tub, allows it to be collected without leaving sewage in the tub, and maintains repeated wiping accuracy. .
[0009]
In addition, the inner surface coating thick part wiping member and the end surface wiping member are made of a flexible porous material, so that the adhesion to the cylindrical coated body is excellent, and the degree of cleaning is good by absorbing the solvent. And there is no fear of damaging the cylindrical coated body.
[0010]
Furthermore, since the inner surface coating film thick part wiping member and the end surface wiping member are detachably attached to the bag, it is possible to cope with a large number of types of cylindrical coated bodies or coating liquids.
[0012]
Furthermore, by providing the inner surface wiping member presser with a solvent supply hole for supplying the solvent supplied from the liquid supply mechanism to the inner surface coating thick wall wiping member, the solvent can be replenished even during processing of the excess coating on the inner surface. And sufficient surplus coating can be processed.
[0013]
In addition, the liquid supply mechanism has a rotatable supply pipe that forms a solvent liquid flow path that communicates the solvent supply hole from the solvent tank that contains the solvent, so that the excess coating film on the inner surface can be prevented from leaking during processing. The solvent can be supplied, and the solvent can be efficiently supplied to the inner surface coating film thick portion wiping member.
[0014]
Furthermore, the dirty liquid recovery mechanism has a solvent reservoir mechanism that pools and removes the solvent supplied by the liquid supply mechanism, so that the end surface wiping member is immersed in the solvent in the basket. Or, it is possible to leave the end surface wiping member moisturized by removing the solvent, and by removing the solvent, the dirty solvent in the bowl is surely removed to keep the inside of the bowl clean. It becomes possible to improve the wiping accuracy repeatedly.
[0015]
Further, the end surface wiping member has a flange shape having a thickness in a state where the solvent is moisturized, and has a plate shape with a thickness of 3 mm to 10 mm in the ascending / descending direction of the cylindrical coated body holding device. The outer diameter is larger than the outer diameter of the cylindrical coated body and the inner diameter is smaller than the inner diameter of the cylindrical coated body, so that, for example, a plurality of coating film end processing apparatuses of the present invention are provided for each coating film end processing apparatus. In the case where the surplus coating process is simultaneously performed on the cylindrical coated body, even if there is a subtle variation in individual pressing in each cylindrical coated body, it is possible to absorb the pressing variation.
[0016]
Further, the inner surface coating film thick part wiping member is fixed to the inner surface wiping member holder and the thickness of the cylindrical coated body holding device in the ascending / descending direction is 3 mm to 20 mm in a state where the solvent is kept moist. The forward and backward pressing mechanism has a block shape in which the thickness in the traveling direction is 3 mm or more and not more than the inner diameter of the cylindrical coated body, and the thickness in the direction perpendicular to the traveling direction of the forward and backward pressing mechanism is 3 mm or more. By this, it is possible to enter the cylindrical coated body without contacting the inner surface coating thick part wiping member and the end surface wiping member, and the inner surface wiping member presser, and the inner surface coating thick part wiping Sufficient pressing is possible for the member and the inner surface of the cylindrical coated body to be in close contact with each other under tension.
[0017]
Moreover, the rotational speed of the reed rotated by the rotation mechanism is 10 rpm to 100 rpm, and preferably 20 rpm to 60 rpm, so that it can be processed repeatedly with high accuracy without wiping in an efficient processing time.
[0018]
Furthermore, when the coating film edge processing apparatus described above is provided in a plural number to perform surplus coating processing of a plurality of cylindrical coated objects, a shielding plate for isolating the wrinkles in each coating film edge processing apparatus is provided. It is possible to process a plurality of cylindrical coated objects at the same time, prevent liquid splashes from other coating film edge processing devices during end surface processing, and prevent the occurrence of coating film defects. .
[0019]
Further, the forward / backward pressing mechanism has an adjusting means for adjusting a pressing amount for pressing the inner surface coating film thick part wiping member against the inner surface coating film thick part of the cylindrical coated body, and the pressing The amount of the forward or backward movement by the forward / backward pressing mechanism is greater than 0 mm and corresponds to a range smaller than the width when the flexible porous member for wiping the inner surface is moisturized with a solvent. The amount of wiping of the film thickness portion can be adjusted, and it becomes possible to deal with processing of a large number of types of cylindrical coated bodies or coating liquids.
[0020]
The coating film edge processing apparatus according to the present invention includes an inner surface coating film thick part wiping member for processing an excess coating film on an inner surface coating film thick part of a cylindrical coated body and a surplus on an end surface of the cylindrical coated body. A tub having an end surface wiping member for treating the coating film, a liquid supply mechanism for supplying a solvent capable of dissolving the surplus coating film to the inner surface coating film thick part wiping member and the end surface wiping member, and accumulated in the basket A sewage collecting mechanism that collects sewage, a rotating mechanism that rotates the heel, and a heel and a cylindrical object to be coated in order to closely contact or separate the inner surface thick film wiping member from the cylindrical object. Forward / backward pushing mechanism for moving forward and backward, a cylindrical coated body holding device for holding a cylindrical coated body, and a heel and a cylindrical coated body holding for positioning the cylindrical coated body in the basket A lifting mechanism for relatively moving the device up and down The coating film edge processing apparatus of the present invention provides a gap of at least 1 mm and not more than 10 mm in the gap provided between the lower surface of the end surface wiping member and the bottom surface of the basket, and mounts the end surface wiping member in the gap. Porous outer end surface wiping member placing plate material is provided .
[0021]
【Example】
FIG. 1 is a schematic cross-sectional view showing a configuration of a coating film edge processing apparatus according to an embodiment of the present invention. In the figure, the coating film edge processing apparatus 1 of the present embodiment is connected to a cylindrical substrate holding device 12 by being rotated by a cylindrical substrate holding device 12 holding a cylindrical substrate 11 and a motor 14 described later. Ascending / descending ball screw 13 for raising / lowering cylindrical substrate holding device 12 along the spiral of the thread groove, rod 15, and rod 15 and a filth collection tank 25 described later are moved forward and backward to apply cylindrical substrate inner surface coating described later. The flexible porous member 17 for wiping the thick film portion adheres to or disengages from the inner surface of the cylindrical substrate, and the inner surface of the cylindrical substrate 11 adheres to the inner surface of the cylindrical substrate 11. Cylindrical base member inner surface coating film thick portion wiping flexible porous member 17, inner surface wiping member pressing portion 18, and cylindrical base member end face for wiping the end face of cylindrical base member 11 Flexible porous member 19 for wiping and flexible A solvent supply hole 20 for supplying a solvent to the porous member 17, a porous outer end surface wiping member placing plate member 21, and the rotation of the motor 23 for rotating the rod 15 are transmitted, for example, a chain, a timing belt, etc. , A drive transmission member 22 for a rotating mechanism such as a gear, and a solvent reservoir mechanism valve 24 that opens and closes in order to store the solvent in the cage 15 or to discharge the sewage in the cage 15 to a spill collecting tank 25 described later. , A sewage collecting tank 25 for collecting the sewage in the tub 15, a sewage collecting tank 26 for temporarily collecting the sewage collected in the sewage collecting tank 25, and a new solvent The liquid supply mechanism solvent tank 27 to be stored, the liquid supply mechanism pump 28 for supplying the solvent in the tank to the flexible

porous members

17 and 19 through the rotatable piping portion 29, and the solvent leaks. Fixed piping and rotation so that there is no It is configured to include a rotary joint portion 30 for connecting the pipe section 29. In the coating film edge processing apparatus 1 of the present embodiment, the cylindrical substrate holding device 12 is raised and lowered, but the ridge 15 may be raised and lowered with respect to the cylindrical substrate 11. Further, although the rod 15 is moved forward and backward by the forward / backward pressing mechanism 16, the cylindrical substrate holding device 12 may be moved forward and backward relative to the rod 15.
[0022]
Next, each processing step using the coating film edge processing apparatus of the present embodiment in FIG. 1 will be described with reference to FIGS. First, in FIG. 2A, the cylindrical shape after coating held by the cylindrical substrate holding device 12 descends along the thread groove of the lifting ball screw 13 rotated by the rotation of the motor 14 and descends. When the base body 11 enters the flange 15, the flange 15 is moved forward and backward by the pressing mechanism 16 to press the cylindrical base body 11, the flexible porous member 17 for wiping the thick coating on the inner surface of the cylindrical base body, and the inner surface wiping member presser. The cylindrical base body 11 is lowered in the vertical direction in a state where it is moved so as not to touch it. Therefore, the flexible porous member 17 and the inner surface wiping member presser 18 for wiping the thick portion on the inner surface of the cylindrical substrate are made to enter the inner surface of the cylindrical substrate 11. As shown in FIG. 2B, the end surface of the cylindrical substrate 11 is in a state where the flexible porous member 19 for wiping the end surface is more than 0 mm perpendicular to the cylindrical substrate 11 and is moisturized with a solvent. It is pressed against the flexible porous member 19 for wiping the outer end face in a range less than the thickness (hereinafter, this range is referred to as dimension E), and the outer end coating film thick part and the end face of the cylindrical base body 11 are processed. It is.
[0023]
Next, after the processing of the outer end face coating film thick part and the end face of the cylindrical base body 11 is completed, the scissors 15 are used for wiping the cylindrical base body 11 and the cylindrical base body inner coating film thick part by the forward / backward pressing mechanism 16. In a state where the flexible porous member 17 and the inner surface wiping member presser 18 are moved so as not to touch, as shown in FIG. 3A, the motor 14 rotates to rotate in the direction opposite to that in FIG. The cylindrical base 11 after coating is lifted along the screw groove of the moving ball screw 13 for raising and lowering, and the cylindrical base 11 after coating held by the rising cylindrical base holding device 12 is raised. Then, as shown in FIG. 3 (b), the flexible porous member 17 for wiping the thick portion of the cylindrical substrate inner surface coating film with respect to the inner surface of the cylindrical substrate 11 is more than 0 mm. Advance the ridge 15 so that the flexible porous member 17 for wiping the film thickness part is pressed and stuck vertically in a range smaller than the width in the state moistened with the solvent (hereinafter this range is referred to as dimension J). It is moved by the backward pressing mechanism 16 so that the inner surface of the cylindrical substrate 11 and the flexible porous member 17 for wiping the thick coating on the inner surface of the cylindrical substrate are brought into close contact with each other. Then, the flexible porous member 17 for wiping off the solvent supplied from the liquid supply mechanism pump 28, the rotatable pipe portion 29 and the rotary joint portion 30 from the solvent supply hole 20 to the thick portion on the inner surface of the cylindrical substrate. The flexible porous member 17 for wiping the inner surface together with the ridge 15 is rotated at 10 rpm to 100 rpm by the drive transmission member 22 and the motor 23 for rotating the inner surface coating of the cylindrical substrate 11. Do.
[0024]
Thereafter, the flexible porous member 17 for wiping the thick-walled portion of the inner surface of the cylindrical substrate, the flexible porous member 19 for wiping the cylindrical substrate end surface, and the inner surface wiping member presser 18 are attached to the inner surface of the cylindrical substrate 11. After the scissors 15 are moved by the forward / backward pressing mechanism 16 so as not to touch, the cylindrical base body 11 after end treatment held by the cylindrical base body holding device 12 is pulled up.
[0025]
Finally, the solvent reservoir mechanism valve 24 is closed and the solvent is accumulated in the bowl 15, and the flexible porous member 17 for wiping the thick portion of the coating on the inner surface of the cylindrical substrate and the end surface for wiping the cylindrical substrate are wiped. Only the flexible porous member 19 or the flexible porous member 19 for wiping the end face of the cylindrical substrate is immersed in a solvent, and the flexible porous member 17 for wiping the thick portion on the inner surface of the cylindrical substrate is wiped. And the coating film adhering to the flexible porous member 19 for wiping the end surface of the cylindrical substrate is dissolved and returned to a clean state. Then, the solvent reservoir mechanism valve 24 is opened to discharge the sewage to the sewage recovery tank 25, flow through the sewage recovery tank 25 and recover to the sewage recovery tank 26. After discharging the dirty liquid, a clean solvent is again flowed by the liquid supply mechanism, and the flexible porous member 17 for wiping the thick part of the cylindrical substrate inner surface coating and the flexible porous member for wiping the cylindrical substrate end surface It is even more effective to moisturize 19. The above-described wiping process and wiping of the flexible porous member are continuously and repeatedly performed. FIG. 4 shows the above series of processing steps.
[0026]
Here, the flexible porous member 17 for wiping a thick portion on the inner surface of the cylindrical substrate and the flexible porous member 19 having different pore sizes in the flexible porous member 19 for wiping the end surface of the cylindrical substrate Several types of materials are stacked, or a mesh plate (for example, mesh) is layered on a flexible porous member, or a mesh plate (for example, mesh) is fixed by a spring instead of a flexible porous member. The same effect as the porous porous member may be given. Further, the liquid supply mechanism is not limited to the liquid supply mechanism of the above-described embodiment, and may be supplied from the upper side of the bag or supplied from a position shifted from the lower center. Furthermore, a seal member such as an O-ring may be sandwiched or integrated so that the solvent does not leak when the turntable of the flange 15 and the rotation mechanism drive transmission member 22 is fixed. Further, as shown in FIG. 5, it is not necessary to provide a gap (dimension A) between the lower surface of the outer end surface wiping member placing plate member 21 and the inner bottom surface of the flange 15. Moreover, as shown in FIG. 5, the thickness with respect to the raising / lowering direction of the cylindrical base | substrate holding | maintenance apparatus of the flexible porous member 19 for cylindrical base | substrate end surface wiping is a plate shape of 3 mm-10 mm (dimension B). The outer diameter (dimension C) is larger than the outer diameter of the cylindrical base body, and the inner diameter (dimension D) is smaller than the inner diameter of the cylindrical base body. Even if a plurality of cylindrical substrates are processed simultaneously, it is possible to absorb subtle variations in pressing with the flexibility of the flexible porous member.
[0027]
Further, the flexible porous member 17 for wiping the thick portion on the inner surface of the cylindrical substrate is fixed to the inner surface wiping member retainer 18 and the solvent is moisturized with respect to the ascending / descending direction of the cylindrical substrate holding device. As shown in FIG. 6, the thickness is 3 mm to 20 mm (dimension F), and the thickness of the forward and backward pressing mechanism in the traveling direction is 3 mm to the inner diameter of the cylindrical substrate (dimension G). As shown in FIG. 7, the thickness in the direction perpendicular to the advancing direction of the forward / backward pressing mechanism is a block shape having a diameter of 3 mm to the inner diameter of the cylindrical substrate (dimension H). The flexible porous member 17 for wiping the cylindrical substrate inner surface coating film thick portion is fixed to the inner surface wiping member presser 18 with the flexible porous member 17 for wiping the thick coating portion on the inner surface coating of the cylindrical substrate. 17 and the inner surface wiping member presser 18 have an outer diameter (dimension I) that is equal to or smaller than the inner diameter of the cylindrical substrate inner surface, and the flexible porous member 17 and the inner surface wiping member presser for wiping the thick portion of the cylindrical substrate inner surface coating film. It is possible to enter the inner surface of the cylindrical substrate without contacting the inner surface of the cylindrical substrate, and the flexible porous member for wiping the thick coating on the inner surface of the cylindrical substrate and the inner surface of the cylindrical substrate are in close contact with each other by applying tension. Sufficient pressing is possible.
[0028]
In addition, the material and form of the wiping member used in the coating film edge processing apparatus of the above-mentioned examples include, for example, solvent-resistant sponges such as polyurethane, polyethylene, polycellulose, rubber, and the shape depends on the solvent used. What is necessary is just to process for swelling and contacting a base material moderately. The solvent to be used is one that can dissolve the coating film, and is particularly preferably a solvent used in the photosensitive coating solution.
[0029]
Hereinafter, although the specific example which concerns on this invention, and a comparative example are given and demonstrated, it is not limited to the specific example shown below.
[0030]
Polyurethane foam was used as a wiping member of a specific example according to the present invention, and the end coating film removal of the undercoat layer, the charge generation layer, and the charge transport layer was performed.
[0031]
(Specific example 1)
After forming a coating film on the cylindrical substrate by the dip coating method using the undercoat layer coating solution of the following components, the edge coating film was removed using methyl ethyl ketone as the solvent for removing the coating film in the apparatus of the present invention.
[0032]
Undercoat layer coating component
90 parts by weight of TiO2
150 parts by weight of thermosetting resin
600 parts by weight of methyl ethyl ketone
Undercoat layer thickness 5μm
[0033]
The degree of removal was good, and no wiping residue was visually confirmed on the inner and outer surfaces, and the coating film could be uniformly removed without being disturbed when wiping the outer surface. The repeatability was excellent, and the degree of removal was good without change even after multiple coating film removals.
[0034]
(Specific example 2)
After forming a coating film on the cylindrical substrate by the dip coating method using the undercoat layer coating solution having the same components as in Example 1, the end coating film was removed using methylene chloride as the coating film removal solvent in the apparatus of the present invention. Carried out. The degree of removal was good, and no wiping residue was visually confirmed on the inner and outer surfaces, and the coating film could be uniformly removed without being disturbed when wiping the outer surface.
[0035]
(Comparative Example 1)
The undercoat layer of Example 1 was removed by a conventional solvent immersion method. As the solvent, methyl ethyl ketone was used, the immersion time was 30 SEC, and the number of immersions was 3 times. The coating film could not be completely removed, and a considerable amount of the coating film adhered to the inner surface and the outer surface. Moreover, the wiping off was disturbed by the fluctuation of the liquid level.
[0036]
(Comparative Example 2)
The undercoat layer of Example 1 was removed by a conventional scraping method using a brush. As the solvent, methylene chloride was used. Although the coating films on the inner and outer surfaces could hardly be confirmed by visual observation, the wiping off of the outer surface was disturbed by the brush. In addition, the repeatability was poor and the cleanliness varied.
[0037]
(Specific example 3)
After forming a coating film on the cylindrical substrate by the dip coating method using the charge generation layer coating liquid having the following components, the edge coating film was removed using methyl ethyl ketone as a coating film removing solvent in the apparatus of the present invention.
[0038]
Charge generation layer coating solution components
Azo pigment (A) 45 parts by weight
Polyvinyl butyral 4.5 parts by weight
Methyl ethyl ketone 2400 parts by weight
[0039]
The degree of removal was good, and no wiping residue was visually confirmed on the inner and outer surfaces, and the coating film could be uniformly removed without being disturbed when wiping the outer surface. The repeatability was excellent, and the degree of removal was good without change even after multiple coating film removals.
[0040]
(Specific example 4)
After forming a coating film on the cylindrical substrate by the dip coating method using the charge generation layer coating liquid having the following components, the end coating film was removed using THF as a coating film removing solvent in the apparatus of the present invention.
[0041]
Charge generation layer coating solution components
τ-type metal-free phthalocyanine 30 parts by weight
20 parts by weight of polyvinyl butyral
1200 parts by weight of THF
[0042]
The degree of coating film removal was good, and no wiping residue was visually confirmed on the inner and outer surfaces, and the coating film could be removed uniformly without being disturbed when wiping the outer surface. The repeatability was excellent, and the degree of removal was good without change even after multiple coating film removals.
[0043]
(Comparative Example 3)
The charge generation layer of Example 3 was removed by a conventional solvent immersion method. As the solvent, methyl ethyl ketone was used, the immersion time was 30 SEC, and the number of immersions was 3 times. The coating film could not be completely removed, and a considerable amount of the coating film adhered to the inner surface and the outer surface.
[0044]
(Comparative Example 4)
The charge generation layer of Example 4 was removed by a conventional scraping method using a brush. The solvent was THF. The degree of removal of the coating film was inferior to that of Example 4, and a slight residue remained. Further, the degree of removal was not uniform and the degree of removal after multiple coating removals varied.
[0045]
(Specific example 5)
After forming a coating film on the cylindrical substrate by the dip coating method using the charge transport layer coating liquid having the following components, end coating film removal was performed using THF as a coating film removal solvent in the apparatus of the present invention.
[0046]
Charge generation layer coating solution components
Charge generation material (B) 180 parts by weight
250 parts by weight of polycarbonate resin
1520 parts by weight of THF
Silicon oil 0.04 parts by weight
Charge generation layer thickness 30μm
[0047]
The degree of coating film removal was good, and no wiping residue was visually confirmed on the inner and outer surfaces, and the coating film could be removed uniformly without being disturbed when wiping the outer surface. The repeatability was excellent, and the degree of removal was good without change even after multiple coating film removals.
[0048]
(Specific example 6)
A coating film was formed on the cylindrical substrate by the dip coating method using the charge transport layer coating liquid of Example 5, and then the end coating film was removed using methylene chloride as the coating film removal solvent in the apparatus of the present invention. The degree of coating film removal was good, and no wiping residue was visually confirmed on the inner and outer surfaces, and the coating film could be removed uniformly without being disturbed when wiping the outer surface. The repeatability was excellent, and the degree of removal was good without change even after multiple coating film removals.
[0049]
(Comparative Example 5)
The charge generation layer of Example 5 was removed by a conventional solvent immersion method. The solvent used was THF, the immersion time was 30 SEC, and the number of immersions was 3 times. The coating film could not be completely removed, and a considerable amount of the coating film adhered to the inner surface and the outer surface.
[0050]
(Comparative Example 6)
The charge generation layer of Example 4 was removed by a conventional scraping method using a brush. The solvent was THF. The degree of removal of the coating film was inferior to that of Example 4, and a slight residue remained.
[0051]
(Specific example 7)
In the undercoat layer of specific example 1, as shown in FIG. 8, a plurality of coating film edge processing devices provided for each substrate holding device arranged at a predetermined pitch, 12 in this specific example, Each coating film edge processing apparatus simultaneously removed the edge coating film with the coating film edge processing apparatus isolated by the shielding plate 31. The degree of removal of the coating film was good, and no wiping residue was visually confirmed on all 12 inner surfaces and the outer surface, and the coating film could be uniformly removed without being disturbed when wiping the outer surface.
[0052]
(Specific example 8)
In the charge generation layer of Example 3, each of the coating film edge processing devices is disposed at a pitch of the substrate holding device and the substrate holding device, and each coating film edge processing device is separated by a shielding plate 31. The edge coating film was removed simultaneously with the film edge processing apparatus. The degree of removal of the coating film was good, and no wiping residue was visually confirmed on all 12 inner surfaces and the outer surface, and the coating film could be uniformly removed without being disturbed when wiping the outer surface.
[0053]
(Specific example 9)
In the charge transport layer of Example 5, each of the coating film edge processing devices disposed at a pitch of the substrate holding device and the substrate holding device is provided in 12 units, and each coating film edge processing device is separated by the shielding plate 31. The edge coating film was removed at the same time by the edge processing apparatus. The degree of removal of the coating film was good, and no wiping residue was visually confirmed on all 12 inner surfaces and the outer surface, and the coating film could be uniformly removed without being disturbed when wiping the outer surface.
[0054]
(Specific Example 10)
In the charge transport layer of Example 3, the edge coating film was removed by changing the rotation speed of the soot to 5, 10, 20, 30, 40, 60, 80, 100, 120, and 140 rpm. The degree of coating removal was good in the range of 10 to 100 rpm, but it was confirmed that the faster the rotation speed, the shorter the time required for the treatment. Further, if it was slower than 10 rpm, wiping was left, and if it was faster than 100 rpm, the flexible porous member for wiping the inner surface of the cylindrical substrate was too tensioned, and a cut was formed when repeated treatment was performed. Considering the time required for the treatment and the durability of the flexible porous member, it was confirmed that 20 rpm to 60 rpm was the best. The results of Example 10 are shown in Table 1 below.
[0055]
[Table 1]

[0056]
【The invention's effect】
As described above, the surplus coating film at the end of the cylindrical coating object in which the cylindrical coating object is immersed in the coating solution to form a coating film on the surface of the cylindrical coating object is processed. Paint Membrane edge processing equipment Because , An inner surface coating thick part wiping member for processing an excess coating film on the inner surface coating thick part of the cylindrical coated body, and an end surface wiping member for processing an excess coating film on the end surface of the cylindrical coated body桶, a liquid supply mechanism for supplying a solvent capable of dissolving the surplus coating film to the inner surface coating film thick part wiping member and the end surface wiping member, and a sewage recovery mechanism for recovering the sewage accumulated in the tub, A rotation mechanism that rotates the heel, and a forward and backward pressing mechanism that relatively moves the heel and the cylindrical coated body forward and backward to closely contact or separate the inner surface thick film wiping member from the cylindrical coated body; A cylindrical coated body holding device for holding the cylindrical coated body, and a lifting mechanism for moving the cylindrical coated body holding device relatively up and down in order to position the cylindrical coated body in the basket. Have The coating film edge processing apparatus of the present invention provides a gap of at least 1 mm and not more than 10 mm in the gap provided between the lower surface of the end surface wiping member and the bottom surface of the basket, and mounts the end surface wiping member in the gap. A porous outer edge surface wiping member mounting plate is provided. There is a special feature. Therefore, Improves the flow of sewage collected in the tub, allows it to be collected without leaving sewage in the tub, and maintains repeated wiping accuracy. .
[0057]
In addition, the inner surface coating thick part wiping member and the end surface wiping member are made of a flexible porous material, so that the adhesion to the cylindrical coated body is excellent, and the degree of cleaning is good by absorbing the solvent. And there is no fear of damaging the cylindrical coated body.
[0058]
Furthermore, since the inner surface coating film thick part wiping member and the end surface wiping member are detachably attached to the bag, it is possible to cope with a large number of types of cylindrical coated bodies or coating liquids.
[0060]
Furthermore, by providing the inner surface wiping member presser with a solvent supply hole for supplying the solvent supplied from the liquid supply mechanism to the inner surface coating thick wall wiping member, the solvent can be replenished even during processing of the excess coating on the inner surface. And sufficient surplus coating can be processed.
[0061]
In addition, the liquid supply mechanism has a rotatable supply pipe that forms a solvent liquid flow path that communicates the solvent supply hole from the solvent tank that contains the solvent, so that the excess coating film on the inner surface can be prevented from leaking during processing. The solvent can be supplied, and the solvent can be efficiently supplied to the inner surface coating film thick portion wiping member.
[0062]
Furthermore, the dirty liquid recovery mechanism has a solvent reservoir mechanism that pools and removes the solvent supplied by the liquid supply mechanism, so that the end surface wiping member is immersed in the solvent in the basket. Or, it is possible to leave the end surface wiping member moisturized by removing the solvent, and by removing the solvent, the dirty solvent in the bowl is surely removed to keep the inside of the bowl clean. It becomes possible to improve the wiping accuracy repeatedly.
[0063]
Further, the end surface wiping member has a flange shape having a thickness in a state where the solvent is moisturized, and has a plate shape with a thickness of 3 mm to 10 mm in the ascending / descending direction of the cylindrical coated body holding device. The outer diameter is larger than the outer diameter of the cylindrical coated body and the inner diameter is smaller than the inner diameter of the cylindrical coated body, so that, for example, a plurality of coating film end processing apparatuses of the present invention are provided for each coating film end processing apparatus. In the case where the surplus coating process is simultaneously performed on the cylindrical coated body, even if there is a subtle variation in individual pressing in each cylindrical coated body, it is possible to absorb the pressing variation.
[0064]
Further, the inner surface coating film thick part wiping member is fixed to the inner surface wiping member holder and the thickness of the cylindrical coated body holding device in the ascending / descending direction is 3 mm to 20 mm in a state where the solvent is kept moist. The forward and backward pressing mechanism has a block shape in which the thickness in the traveling direction is 3 mm or more and not more than the inner diameter of the cylindrical coated body, and the thickness in the direction perpendicular to the traveling direction of the forward and backward pressing mechanism is 3 mm or more. By this, it is possible to enter the cylindrical coated body without contacting the inner surface coating thick part wiping member and the end surface wiping member, and the inner surface wiping member presser, and the inner surface coating thick part wiping Sufficient pressing is possible for the member and the inner surface of the cylindrical coated body to be in close contact with each other under tension.
[0065]
Moreover, the rotational speed of the reed rotated by the rotation mechanism is 10 rpm to 100 rpm, and preferably 20 rpm to 60 rpm, so that it can be processed repeatedly with high accuracy without wiping in an efficient processing time.
[0066]
Furthermore, by providing a plurality of coating film edge processing devices as described above, and providing a shielding plate between each of the coating film edge processing devices, the plurality of cylindrical coated objects are provided. It can process simultaneously, can prevent the liquid splash from the other coating-film edge part processing apparatus during end surface processing, and can prevent generation | occurrence | production of a coating-film defect.
[0067]
Further, the forward / backward pressing mechanism has an adjusting means for adjusting a pressing amount for pressing the inner surface coating film thick part wiping member against the inner surface coating film thick part of the cylindrical coated body, and the pressing The amount of the forward or backward movement by the forward / backward pressing mechanism is greater than 0 mm and corresponds to a range smaller than the width when the flexible porous member for wiping the inner surface is moisturized with a solvent. The amount of wiping of the film thickness portion can be adjusted, and it becomes possible to deal with processing of a large number of types of cylindrical coated bodies or coating liquids.
[Brief description of the drawings]
FIG. 1 is a schematic cross-sectional view showing the configuration of a coating film edge processing apparatus according to an embodiment of the present invention.
FIG. 2 is a schematic cross-sectional view showing the state of each processing step using the coating film edge processing apparatus of this example.
FIG. 3 is a schematic cross-sectional view showing the state of each processing step using the coating film edge processing apparatus of the present example.
FIG. 4 is a diagram showing a series of processing steps using the coating film edge processing apparatus of this example.
FIG. 5 is a diagram showing the size of a flexible porous member for wiping the end face of a cylindrical substrate in the present example.
FIG. 6 is a diagram showing the size of a flexible porous member for wiping a thick part of a coating on an inner surface of a cylindrical substrate in the present example.
FIG. 7 is a view showing the size of a flexible porous member for wiping a thick portion of the coating film on the inner surface of a cylindrical substrate in this example.
FIG. 8 is a schematic cross-sectional view showing an example in which a plurality of coating film edge processing apparatuses according to the present embodiment are provided.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1; Coating-film edge processing apparatus, 11: Cylindrical base | substrate, 12: Cylindrical base | substrate holding | maintenance apparatus,
13; Ball screw for lifting, 14, 23; Motor, 15;
16; forward and backward pressing mechanism,
17; a flexible porous member for wiping the thick part of the coating on the inner surface of the cylindrical substrate;
18; inner surface wiping member pressing part,
19: a flexible porous member for wiping the end face of the cylindrical substrate;
20; solvent supply hole, 21; outer end surface wiping member placing plate material,
22: Rotation mechanism drive transmission member, 24: Solvent reservoir valve,
25; Soil collection tank, 26; Soil collection tank,
27; solvent tank for liquid supply mechanism, 28; pump for liquid supply mechanism,
29; piping part, 30; rotary joint part, 31; shielding plate.

Claims

In the coating film end processing apparatus for processing a surplus coating film at the end portions of the cylindrical member to be coated to a cylindrical member to be coated is immersed in the coating liquid to form a coating film on the surface of the cylindrical member to be coated there are, end face wipe to handle the surplus coating film at the end face of the inner surface coating film thickness portion wiping member and said cylindrical member to be coated to handle excess coating on the inner surface coating film thickness portion of the cylindrical member to be coated A tub having a removing member, a liquid supply mechanism for supplying a solvent capable of dissolving an excess coating film to the inner surface coating film thick part wiping member and the end surface wiping member, and collecting sewage accumulated in the tub A sewage collecting mechanism, a rotating mechanism for rotating the heel, and the heel and the cylindrical coated body in order to closely contact or separate the inner surface thick film wiping member from the cylindrical coated body. A forward and backward pressing mechanism for relatively forward and backward movement, and the cylindrical coated body A cylindrical member to be coated holding device for holding a coating film having a lifting mechanism that relatively lifting the trough and the cylindrical member to be coated holding device said cylindrical member to be coated for positioning within said tub In the end processing device,
Porous outer end surface wiping in which a clearance of at least 1 mm and not more than 10 mm is provided in a clearance provided between the lower surface of the end surface wiping member and the bottom surface of the basket, and the end surface wiping member is mounted in the clearance. A coating film edge processing apparatus, comprising a member placing plate material .

The coating film edge processing apparatus according to claim 1, wherein the inner surface coating film thick part wiping member and the end surface wiping member are formed of a flexible porous material.

The coating film edge part processing apparatus of Claim 1 or 2 with which the said inner surface coating-film thick part wiping member and the said end surface wiping member are attached to the said collar | hook detachably.

The coating film edge part processing apparatus in any one of Claims 1-3 which provide the inner surface wiping member presser for fixing the said inner surface coating film thick part wiping member .

The coating film edge processing apparatus of Claim 4 which provides the solvent supply hole which supplies the solvent supplied from the said liquid supply mechanism to the said inner surface coating film thick part wiping member in the said inner surface wiping member press .

The liquid supply mechanism, the coating film end treatment device according to claim 1 or 5 having a feed tube movably forming the solvent liquid flow passage communicating the solvent supply hole from a solvent tank containing the solvent.

The dirty liquid recovery mechanism, the liquid coating film end treatment device according to claim 1, further comprising a solvent reservoir punching mechanism for punching pooled solvent supplied to said tub by supplying mechanism.

The coating film edge processing apparatus according to any one of claims 1 to 3, wherein the end surface wiping member has a flange shape having a thickness in a state where the solvent is moisturized .

The coating film edge part in any one of Claims 1-3 , 8 with which the said end surface wiping member is plate shape whose thickness with respect to the raising / lowering direction of the said cylindrical to-be-coated body holding | maintenance apparatus is 3 mm-10 mm. Processing equipment.

The end face wiping member is larger outer diameter than the outer diameter of the cylindrical member to be coated, inner diameter of any one of an inner diameter smaller claim 1～3,8,9 of said cylindrical member to be coated a coating Membrane edge processing equipment.

The inner surface coating film thick portion wiping member is fixed to the inner surface wiping member presser and has a thickness of 3 mm to 20 mm with respect to the ascending / descending direction of the cylindrical coated body holding device in a state where the solvent is moisturized. The thickness of the forward / backward pressing mechanism in the traveling direction is 3 mm or more and the inner diameter of the cylindrical workpiece, and the thickness in the perpendicular direction to the traveling direction of the forward / backward pressing mechanism is 3 mm or more. It is a block shape , The coating-film edge part processing apparatus in any one of Claims 1-5 .

The rotational speed of the tub rotated by the rotation mechanism, the coating end portion processing apparatus according to claim 1 wherein the 10Rpm～100rpm.

The coating film edge processing apparatus according to claim 12 , wherein a rotation speed of the reed rotated by the rotation mechanism is preferably 20 to 60 rpm .

A plurality of coating film edge treatment apparatuses according to any one of claims 1 to 13, and a coating film edge provided between each of the ridges with a shielding plate for isolating each of the ridges in each coating film edge processing apparatus Processing unit.

The forward and backward pressing mechanism according to claim 1, further comprising adjusting means for adjusting a pressing amount for pressing the inner surface coating film thickness portion wiping member on said inner surface coating film thickness portion of the cylindrical member to be coated Coating edge processing equipment.

The amount of pressing corresponds to a range in which the forward or backward movement value by the forward / backward pressing mechanism is greater than 0 mm and less than the width when the flexible porous member for wiping the inner surface is moisturized with a solvent. The coating film edge processing apparatus of Claim 15 .

The coating film edge processing apparatus according to any one of claims 1 to 16, wherein the cylindrical coated body is a cylindrical substrate of an electrophotographic photosensitive member .