JP4131523B2 - Heatable swivel device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention includes a pivot arm to be laminated in a vacuum, a turning device for particular positioning a large planar substrate Alternating comprises a rotatably mounted shaft portion body, the substrate has a receiving device, wherein the pivot arm is lockable by clamping device, and I pivotable der between the loading or unloading position and a stacking position, the orbiting device has a heating device Tei In addition , the present invention relates to a type in which the substrate can be heated using the heating device.
[0002]
[Prior art]
Devices for laminating substrates under vacuum conditions, such as those used in the case of cathode sputtering, are known. In the case of this device, the substrate to be laminated is held by a device adapted to the substrate dimensions, and in particular in the case of a laminating method carried out statically, the lamination source is defined by its surface to be laminated. It is positioned at a fixed position on the opposite side. On this side, the substrate is loaded into the stacking chamber by a suitable transport device and placed in front of the stack cathode and stacked and subsequently fed to another stacking station using the transport device, or Extruded into the atmospheric environment. In order to transport the stacked substrates, in particular between individual stacking stations, the substrates are mainly supported in the horizontal direction. The advantage of this type of transport is that the surface of the laminated substrate is held in a non-contact manner by a transport protection device, for example, so that the mounted layer is not damaged. If the substrate is oriented only in the horizontal direction, it has two main drawbacks during and after the sputter lamination process. In other words, by the laminated cathode disposed above the substrate, particles dissociated from or around the laminated cathode fall down on the substrate, and a contaminated part is formed in the layer surface. is there. In the case of stacking with a cathode disposed below the substrate, there is a disadvantage that the substrate holding device supports the substrate on the stacking side. That is, it is impossible to perform lamination that extends uniformly over the entire substrate surface.
[0003]
The general disadvantage of horizontal stacking position is that the large planar thin substrate will bend, which will increase the material stress in the mounted layer and the substrate will be heated evenly during the stacking process. It is a point that cannot be obtained.
[0004]
[Problems to be solved by the invention]
An object of the present invention is to improve an apparatus for laminating thin substrates having a particularly large planar shape so that the above-mentioned drawbacks can be avoided.
[0005]
[Means for Solving the Problems]
According to the present invention, the substrate receiving device has a base plate and a support plate, the heating device is disposed in the inner chamber formed by the base plate and the support plate, and the heating device is at least one quartz. It consists of a heater , and the substrate receiving device is detachably coupled to the swivel arm, thereby solving the above-mentioned problem.
[0006]
【The invention's effect】
In the vertical position of the substrate receiving device, the substrate surface to be laminated is arranged substantially parallel to the lamination source, ie the sputter cathode, so that a uniform layer can be mounted over the entire substrate surface. In this vertical position, the substrate is supported on the edge region on the back side of the stack by a support member fixed to the substrate receiving device. The vertical placement of the substrate can prevent accumulation of particles dissociated from the stacking source, particularly the sputter cathode. This is because the emitted particles fall between the sputter cathode and the substrate to the bottom of the chamber and are not deposited as impurities on the substrate surface. Furthermore, the vertical stacking position has the advantage that the mounted layer is not exposed to material stresses, especially in the case of large planar substrates, since bending can be prevented. Further, since the substrate is only supported and held, the entire substrate surface can be laminated. After laminating, the substrate receiving device can be swiveled to a horizontal position with the substrate, and further transport of the substrate, for example, into another laminating chabber, in a horizontal orientation exclusively from the horizontal position. In that case, the substrate is supported and transported exclusively on the support member, which advantageously prevents the laminated surfaces from contacting the holding device.
[0007]
In order to influence the characteristic lamination parameters, the substrate can be heated using a heating device incorporated in the substrate receiving device while being laminated. The heating device is preferably arranged adjacent to the back side of the substrate and extends over almost the entire area of the substrate. A quartz heater is provided as a heating device. In order to achieve a uniform temperature distribution across the entire substrate plane, the heating device is divided into individual heating segments, for example individual quartz heaters or individual resistance heating elements, which can be controlled independently of each other with respect to their heat output. Yes. Particularly in the edge region of the substrate, heat loss is controlled by supplying relatively high power to the heating segment.
[0008]
Further, a temperature uniformizing plate is provided between the heating device and the substrate. This plate is advantageously made of a material having a small heat capacity and a high emissivity, which can be used to compensate for local temperature differences caused by the heating segment, and thereby the substrate surface. The above temperature difference can be minimized.
[0009]
Based on the present configuration of the temperature homogenizing plate, the temperature homogenizing plate is composed of two layers. In that case, the first layer is made of a material with high thermal conductivity, and the second layer in thermal contact with the first layer is made of a material with high emissivity. This combination of layers allows the material parameters defining emissivity and heat conduction to be selected independently of each other. As a combination of materials, the present invention proposes a first layer made of copper and a second layer made of glass ceramic.
[0010]
When a quartz heater is used as a heating device, a plate that functions as a wavelength converter has been proposed as a temperature uniformizing plate. The plate functioning in this way is a material, preferably nickel, in which the radiant energy emitted from the quartz heater , preferably in the spectral region from 1 μm to 3 μm, is emitted in the long wave spectral region greater than 3.5 μm. -Made of chromium-iron-alloy. This has the advantage that the substrate can be more effectively absorbed long wave radiation energy, especially when the substrate to be laminated is glass.
[0011]
In order to reduce the radiation loss, the heating device has its back side covered with at least one radiant back lamina, so that the heating beam radiated from the heater is emitted almost in the direction of the substrate.
[0012]
The substrate receiving device is mounted on a turning arm so that the substrate receiving device can be turned between a horizontal position and a vertical position, and the turning arm is rotatably supported on the end surface side. Connected to the body, preferably to the hollow shaft. The hollow shaft protruding from the stacking chamber under vacuum into the ambient atmosphere can be rotated over an angular range from 0 ° to 85 °, preferably by means of a drive device arranged outside the stacking chamber. An electric lead is provided as a supply device to the electric heating device, and the electric lead is led to the ambient atmosphere by a vacuum conduction device inserted in the hollow shaft.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
The invention will now be described in detail on the basis of an advantageous embodiment illustrated in the drawing.
[0014]
The apparatus 1 arranged in the stacking chamber 30 is mainly composed of a substrate receiving device 6 and a swiveling device comprising a swiveling arm 12 and a hollow shaft 10. The swivel arm 12 is detachably screwed to a tightening device 13 surrounding the hollow shaft 10 at the end side portion. By rotating the hollow shaft 10, the swivel arm 12 is moved from the horizontal loading position A to the substantially vertical stacking position B, or from the stacking position B to the horizontal loading or unloading position A. The swivel angle region scraped by the substrate receiving device 6 is suggested by the swirl region represented by the chain line and is between about 0 ° -85 °.
[0015]
The substrate receiving device 6 includes a base plate 14, and the base plate 14 is fixed to the swivel arm 12 by a holding device 20 penetrating the base plate 14 at the center of the plane. The edge region surrounding the outside of the rectangular base plate 14 is bent at the end face 11 attached to the corner region. One end of the guide member 15 that is horizontally oriented is fixedly inserted into the end face 11. In each guide member 15, the support plate 16 is supported on the one hand by a notch in the edge region, and on the other hand is supported on the substrate receiving device 6 at the center of the plane. The room within which is formed by the base plate 14 and the support plate 16, the heating device 8 is arranged which consists of a resistance heating device or quartz heater if example embodiment. The heat output radiated from the resistance heating device 8 or the quartz heater 8 is predominately radiated in the direction facing the support plate 16 by the reflection thin plate 22 disposed between the heating device 8 and the base plate 14. The The substrates 4 to be laminated are individually mounted on the support plate 16 and supported and supported on the support members 26 and 26a. In the horizontal position, the entire weight of the substrate 4 is supported by the support member 26. On the other hand, in the substantially vertical stacking position, the support member 26a takes over the main load. The support members 26 and 26a are made of a material having a small thermal conductivity, thereby preventing a heat flow between the support plate 16 and the substrate 4 placed thereon.
[0016]
In order to achieve as uniform a temperature distribution as possible over the entire substrate surface, in the embodiment illustrated in FIG. 1, a temperature equalizing plate 28 is provided between the support plate 16 and the heating device 8. . High emissivity and small heat capacity and the temperature equalizing plate 28 is made of a material having a can Tatoeba heating device 8 can be prevented local temperature differences occurring on the substrate 4 because it is divided into segments form Can do. In order to be able to supply power to the heating device 8, the heating device 8 is illustrated in the drawing via an electrical lead 32 which is led to the atmosphere by a vacuum conduction device 34 inserted in the hollow shaft 10. Not connected to current supply device.
[0017]
The substrate receiving device 6 is loaded together with the substrate 4 through a closeable loading / unloading opening 36 provided in the chamber wall 37 of the stacking chamber 30. In this case, the substrate 4 is advantageously accommodated on the substrate receiving device 6 in the stacking chamber 30 by means of an automatic conveying device in a horizontal position (not shown). Lamination work is performed as follows. In other words, the substrate receiving device 6 is moved to the vertical position B together with the substrate 4 supported on the receiving device 6, and in this direction, for example, a sputter cathode device not shown in FIG. Stacking is performed in the suggested stacking direction af. In order to take out the laminated substrate 4, the swivel arm 12 is swung to its horizontal position A. Thereafter, the substrate 4 is taken out from the stacking chamber 30 through the loading / unloading opening 36.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a heatable swivel device of the present invention configured as a swivel table in a horizontal charging position and a vertical stacking position.
FIG. 2 is an enlarged sectional view of the substrate receiving apparatus shown in FIG.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 apparatus 4 board | substrate 6 board | substrate receiving apparatus 8 heating apparatus, resistance heating apparatus, quartz heater 10 shaft body, hollow shaft 11 end face 12 turning arm 13 tightening apparatus 14 base plate 15 guide member 16 support plate 18 rectangular edge 20 holding apparatus 22 reflection Thin plate 24 Support plate thin plate 26, 26a Support member 28 Plate, temperature equalizing plate 30 Lamination chamber 32 Electrical conductor 34 Vacuum conduction device 36 Loading / extraction opening 37 Chamber wall A Loading position, extraction position B Lamination position af Lamination direction

Claims (11)

A swivel device (1) for alternately positioning large planar substrates (4) to be stacked in a vacuum, and a swivel arm (12) having a shaft body (10) rotatably supported ) And a substrate receiving device (6), the swivel arm (12) can be locked by the tightening device (13), and the loading / unloading position (A) and the stacking position (B) In which the swivel device (1) has a heating device (8) and the substrate (4) can be heated using the heating device (8),
The substrate receiving device (6) has a base plate (14) and a support plate (16), and the heating device (8) is disposed in the inner chamber formed by the base plate (14) and the support plate (16). Wherein the heating device (8) comprises at least one quartz heater , and the substrate receiving device (6) is releasably coupled to the swivel arm (12). Swivel device. The base plate (14) of the substrate receiving device (6) is bent in an annular shape on the edge side, the support plate (16) is placed on the bent edge (18) of the base plate (14), and the base plate ( 14) and the support plate (16) are detachably coupled to each other by a holding device (20) that penetrates the central portion of the plane and is coupled to the swivel arm (12) on the end side. plate (16), the base plate (14) and pivot arm (12) and a are respectively fixed claim 1 Symbol placement of the turning device. At least one reflective thin plate (22) is provided between the heating device (8) and the base plate (14), so that the heat output emitted from the heating device (8) is transferred to the substrate receiving device (6). 3. A swivel device according to claim 1 or 2 , wherein the swivel device is adapted to be directed substantially in the direction of the substrate (4) supported thereon. Support members (26, 26a) are fixed to the surface (24) of the support plate (16) opposite to the swivel arm (12), and are laminated on the support members (26, 26a). The swivel device according to any one of claims 1 to 3 , wherein the power substrate (4) can be supported by the substrate receiving device (6) in a state in which the power substrate (4) is oriented in a direction substantially perpendicular to the horizontal direction. Between the support plate (16) and a quartz heater (8), temperature equalizing plate (28) is arranged, whereby, transmitted from the quartz heater (8) on the temperature-equalizing plate (28) The swiveling device according to any one of claims 1 to 4 , wherein the heat output is uniformly distributed over the entire surface of the substrate as heat energy conveyed on the substrate (4). . The temperature equalizing plate (28) placed between the quartz heater and the substrate (4) can convert the radiant energy absorbed in the short wave spectral region from 1 μm to 3 μm into the long wave spectral region larger than 3.5 μm. The nickel-chromium-iron-alloy , which, on the one hand, allows an even transfer of thermal energy from the heating device (8) onto the substrate (4) and on the other hand from the cathode. laminated to the heating device according sputtered material (8), the possible blocking by the blocking by the temperature equalizing plate (28), the turning device according to any one of claims 1 to 5. The heating device (8) consists of individual heating segments that can be controlled independently of each other with respect to their thermal radiation output, whereby an even temperature distribution of the substrate can be achieved up to the edge region of the substrate (4). The turning device according to any one of claims 1 to 6 . And it made from the support member (26, 26a) Gaga Las ceramic, whereby the temperature distribution on the substrate (4) is uniform, the turning device according to claim 4, wherein. Shank member (10) is configured as a hollow shaft (10), the hollow shaft (10) can be driven by the outwardly arranged motor lamination chamber (30), Claims 1 to 8 The turning device according to any one of the above. An electrical conductor (32) connected to the heating device (8) at one end and to the current supply device at the other end is provided, and the electrical conductor (32) passes through the hollow shaft (10). guided, and vacuum conducting device inserted into the hollow shaft (10) through (34) is guided in the inner chamber of the laminate chamber (30), according to any one of claims 1 to 9 Swivel device. Consists of two layers temperature-equalizing plate (28) is subjected to thermal conduction contact with each other, the layer of the heating device (8) side is made of copper, and a layer of the substrate (4) side from a glass ceramic The swivel device according to any one of claims 5 to 10 , which is configured.

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