JP4008672B2

JP4008672B2 - Film peeling and conveying device

Info

Publication number: JP4008672B2
Application number: JP2001140928A
Authority: JP
Inventors: 康明森
Original assignee: Tokuyama Corp
Current assignee: Tokuyama Corp
Priority date: 2001-05-11
Filing date: 2001-05-11
Publication date: 2007-11-14
Anticipated expiration: 2021-05-11
Also published as: JP2002338134A

Description

【０００１】
【発明が属する技術分野】
本発明は、少なくとも基板の片面に貼着されたフィルムの一端部が部分的に剥離された該フィルムを基板から完全に剥離させる剥離手段を備え、剥離手段は、部分的に剥離された該フィルムを基板から上方に強制的に搬送する上部フィルム剥離搬送手段を含み、上部フィルム剥離搬送手段は、基板の搬送経路の上方に配置された上側ベルト機構を含んでいる形態の、フィルム剥離搬送装置に関する。
【０００２】
【従来の技術】
プリント配線基板の製造においては、ガラス繊維強化エポキシ樹脂等から形成されたコア板の両面に銅はくを貼着して銅張積層板を形成し、銅張積層板の両面にフォトレジスト層及び保護フィルムを積層したプリント配線基板素材を使用している。そしてこのプリント配線基板素材の両面に回路パターンを照射してフォトレジスト層を露光し、その後において両表面に存在する保護フィルム（以下単に「フィルム」と略称する）を剥離している。
【０００３】
平面から見て矩形をなすプリント配線基板素材のような基板の、少なくとも片面（上面）からフィルムを剥離することができるフィルム剥離搬送装置は、例えば特開平１０−１２０２９２号公報に開示されている。該公報に開示されたフィルム剥離搬送装置は、少なくとも基板の片面に貼着されたフィルムの一端部が部分的に剥離された該フィルムを基板から完全に剥離させる剥離手段を備え、剥離手段は、基板の片面に貼着されたフィルムの一端部が部分的に剥離されたフィルムを、基板から上方に強制的に搬送する上部フィルム剥離搬送手段を含んでいる。上部フィルム剥離搬送手段は、基板の搬送経路の上方に配置された上側ベルト機構を含んでいる。上側ベルト機構には、フィルムを上方に向けて搬送し次いで基板の搬送方向に向けて搬出する上側搬送搬出経路が形成されている。
【０００４】
上部フィルム剥離搬送手段の上側ベルト機構は、搬送経路に接近して配置された上流側下部ベルト車と、上流側下部ベルト車の上方に間隔をおいて配置された上流側上部ベルト車と、上流側上部ベルト車の下流側に間隔をおいて配置された上部搬出ベルト車と、上流側下部ベルト車の下流側に配置された下流側下部ベルト車と、下流側下部ベルト車の上方に間隔をおいて配置された下流側上部ベルト車と、下流側上部ベルト車の下流側に間隔をおいて配置された下部搬出ベルト車と、上流側下部ベルト車、上流側上部ベルト車及び上部搬出ベルト車間に巻き掛けられた上流側無端ベルトと、下流側下部ベルト車、下流側上部ベルト車及び下部搬出ベルト車間に巻き掛けられた下流側無端ベルトとを含んでいる。下流側下部ベルト車は上流側下部ベルト車よりも高い位置に配置されている。上流側無端ベルトの、上端部であって上流側上部搬出ベルト車と上流側下部ベルト車との間の外周面の一部は、下流側上部ベルト車の外周面の一部領域に下流側無端ベルトを介して巻き掛けられている。上流側無端ベルトと下流側無端ベルトとの間には、基板の搬送経路を側方に見てほぼ逆Ｌ形状をなす上側搬送搬出経路が形成される。
【０００５】
上記剥離手段は、上部フィルム剥離搬送手段の他に、エア噴射手段を含んでいる。エア噴射手段は、基板の搬送経路よりも上方位置であって、上部フィルム剥離搬送手段よりも下流側の位置に配置され、幅方向に延在する円筒部材の軸方向に間隔をおいて形成された複数のエア噴射孔から圧縮エアが、基板の搬送経路の上流方向に向けて噴射されるよう構成されている。なお、基板の搬送経路の、上部フィルム剥離搬送手段よりも上流側の位置には、基板の片面に貼着されたフィルムの一端部を部分的に剥離するための端部剥離手段が配置されている。
【０００６】
端部剥離手段によって片面のフィルムの一端部である前端部が部分的に剥離された基板が、搬送経路に沿って上側ベルト機構の下方に搬送されると、エア噴射手段から圧縮エアが、基板と、前端部から部分的に剥離されたフィルムとの間に吹き付けられる。これによりフィルムの剥離が促進され、その前端部が上方に偏向させられる。上方に偏向させられたフィルムは、上側ベルト機構の上流側無端ベルトと下流側無端ベルトとの間に挟まれ、上側搬送搬出経路に沿って上方に、次いで基板の搬送方向に向かって搬送され、下流端から搬出される。
【０００７】
【発明が解決しようとする課題】
上記フィルム剥離搬送装置において、基板の搬送面に上方から最も接近して配置された、上側ベルト機構の上流側下部ベルト車の回転軸は、所定の位置から実質的に動かないように支持されている。したがって、上流側下部ベルト車に巻き掛けられた上流側無端ベルトの最下面と基板の搬送面との間の隙間は、一定に設定されている。該隙間は、最大厚さの基板の通過が許容されるよう、該基板の厚さよりも大きく設定されている。例えば、基板の厚さが０．１ｍｍ〜３．２ｍｍ、フィルムの厚さが０．０２ｍｍの場合、該隙間は、５．０ｍｍ程度に設定される。このため、基板が該隙間を通過するに際しては、基板の上面と、上流側無端ベルトの最下面との間には、常に、４．８８ｍｍ〜１．７８ｍｍの隙間が存在することになる。該隙間の存在に起因して、上記したように、エア噴射手段から圧縮エアが、基板と、前端部から部分的に剥離されたフィルムとの間に吹き付けられたときの衝撃によって、基板が比較的大きく振動させられるおそれがある。基板が比較的大きく振動させられると、基板の円滑な搬送が妨げられ、基板が損傷するおそれもある。このような不具合の発生の可能性は、基板の厚さが薄くなるほど高くなる。
【０００８】
本発明の目的は、基板と、一端部から部分的に剥離されたフィルムとの間に、エア噴射手段から圧縮エアが吹き付けられても、基板の振動を抑制ないし実質的に防止して、基板の円滑な搬送を保証しかつ基板の品質を確保することを可能にする、新規なフィルム剥離搬送装置を提供することである。
【０００９】
本発明の他の目的は、上記目的に加えて更に、フィルムの剥離作用をより円滑かつ迅速にしかもより効果的に促進する、新規なフィルム剥離搬送装置を提供することである。
【００１０】
【課題を解決するための手段】
本発明によれば、少なくとも基板の片面に貼着されたフィルムの一端部が部分的に剥離された該フィルムを基板から完全に剥離させる剥離手段を備え、剥離手段は、部分的に剥離された該フィルムを基板から上方に強制的に搬送する上部フィルム剥離搬送手段を含み、上部フィルム剥離搬送手段は、基板の搬送経路の上方に配置された上側ベルト機構を含み、上側ベルト機構は、基板の搬送面に上方から最も接近して配置された上流側下部ベルト車と、下端が上流側下部ベルト車に巻き掛けられて上方に向かって延在する上流側無端ベルトと、上流側下部ベルト車の下流側に配置された下流側下部ベルト車と、下端が下流側下部ベルト車に巻き掛けられて上方に向かって延在する下流側無端ベルトとを含み、該ベルトの各々の協働によって少なくとも下端部が上方に延びるフィルム搬送経路が形成されるフィルム剥離搬送装置において、
上流側下部ベルト車は、変位自在に支持されると共にばね手段によって、上流側無端ベルトの最下面と基板の搬送面との間の隙間が最少となる基準位置に位置付けられ、基板の搬送経路に該隙間を越える厚さを有する基板が搬送されると、上流側下部ベルト車は、該基板の押上作用により、ばね手段に抗して該隙間が拡大される下流方向上方に変位させられて該基板の搬送が許容される、
ことを特徴とするフィルム剥離搬送装置、が提供される。
【００１１】
上流側下部ベルト車は、静止枠手段に可動支持手段を介して変位自在に支持され、ばね手段は、静止枠手段と可動支持手段との間に配設されている、ことが好ましい。
上流側下部ベルト車は、基板の搬送経路の幅方向に延在する回転軸に配設され、静止枠手段は、基板の搬送経路を幅方向に挟んだ両側に設置された側枠を含み、可動支持手段は、側枠の各々に設けられた案内支持手段と、案内支持手段の各々に移動自在に支持された可動支持部材とを備え、上流側下部ベルト車の回転軸の両端部は、対応する可動支持部材に軸受を介して回転自在に支持され、案内支持手段の各々には、対応する可動支持部材の移動を規制する移動規制部が設けられ、ばね手段は、側枠の各々と、対応する可動支持部材との間に配置され、ばね手段が、対応する可動支持部材を移動規制部に押圧することにより上流側下部ベルト車は基準位置に位置付けられ、基板の搬送経路に該隙間を越える厚さを有する基板が搬送されると、上流側下部ベルト車は、該基板の押上作用により、可動支持部材の各々が、対応するばね手段に抗して移動規制部から離れるよう案内支持手段に沿って下流方向上方に移動させられることにより同方向に変位させられる、ことが好ましい。
上流側下部ベルト車が下流方向上方に変位させられると、上流側無端ベルトの張力が増加させられる、ことが好ましい。
下流側下部ベルト車は、上流側下部ベルト車よりも高い位置に配置され、上流側下部ベルト車が下流方向上方に変位させられると、上流側無端ベルトの、下流側の下端部であって上流側下部ベルト車の外周面に巻き掛けられている領域よりも上方の領域における外周面が、対向する下流側下部ベルト車の外周面の一部領域に、下流側下部ベルト車に巻き掛けられた下流側無端ベルトを介して圧接される、ことが好ましい。
剥離手段は、部分的に剥離された該フィルムを基板から下方に強制的に搬送する下部フィルム剥離搬送手段を含み、下部フィルム剥離搬送手段は、基板の搬送経路の下方に配置された下側ベルト機構を含み、下側ベルト機構は、基板の搬送面に下方から最も接近して配置された上流側上部ベルト車と、上流側上部ベルト車の下方に間隔をおいて配置された上流側下部ベルト車と、上流側上部ベルト車の下流側に配置された下流側上部ベルト車と、下流側上部ベルト車の下方に間隔をおいて配置された下流側下部ベルト車と、該上流側ベルト車間に巻き掛けられた上流側無端ベルトと、該下流側ベルト車間に巻き掛けられた下流側無端ベルトとを含み、該ベルトの各々の協働によって下方に延びるフィルム搬送経路が形成され、上流側上部ベルト車に巻き掛けられた上流側無端ベルトの最上面は、基板の搬送面と実質的に同一面上に配置され、該隙間は、上側ベルト機構の上流側無端ベルトの最下面と、下側ベルト機構の上流側無端ベルトの最上面との間に形成される、ことが好ましい。
【００１２】
【発明の実施の形態】
以下、添付図面を参照して、本発明に従って構成されたフィルム剥離搬送装置の実施形態を詳細に説明する。
【００１３】
図１を参照して、本発明によるフィルム剥離搬送装置１００は、全体を図示しないフィルム剥離装置の一部として備えられている。フィルム剥離搬送装置１００を説明する前に、先ず、フィルム剥離装置についてその概要を説明する。
【００１４】
フィルム剥離装置は、図１において右方である入口側に配置された、全体を図示しない基板搬送手段を備えている。基板搬送手段は、基板Ｐの搬送方向Ｆに間隔を置いて実質上水平に配列された複数個の搬送ローラ２を備えている。これらの搬送ローラ２は電動モータによって回転駆動され、基板Ｐを基板Ｐの搬送面ＰＬに沿って搬送方向Ｆに移動させることができる。なお、この実施形態においては、基板Ｐは、片面である上面及び他面である下面の両面にフィルムが貼着されたプリント配線基板から構成されている。
【００１５】
基板搬送手段の下流端部には、図示しないクランプ手段及び位置決め手段、そして端部剥離手段４が配設されている。クランプ手段は基板Ｐの搬送経路を挟んで上下に間隔を置いて配置された一対のクランプ部材を備え、基板Ｐを搬送経路上に解除自在にクランプできるよう構成されている。位置決め手段は、反射型光学式センサによって搬送ローラ２により搬送されてくる基板Ｐの前端を検出し、基板Ｐを所定の位置に停止させるよう構成されている。
【００１６】
端部剥離手段４は、基板Ｐの搬送経路の幅方向に往復移動させられるよう構成された図示しない移動体と、基板Ｐの搬送経路を挟んで上下に間隔を置いて配置された一対の圧接ローラ６を備えている。一対の圧接ローラ６は、搬送経路上の基板Ｐを解除自在に圧接できるよう構成されている。基板Ｐがクランプ手段により所定の位置にクランプされた状態で、圧接ローラ６の各対は、基板Ｐの一端部（搬送方向前端部）における各フィルムの両面に所定の圧力で圧接される。この状態で圧接ローラ６の各対は、移動体によって幅方向に往復移動させられ、基板Ｐの各フィルムの一端部が部分的に剥離される。
【００１７】
端部剥離手段４の下流側には後に詳述するフィルム剥離搬送装置１００が配置されている。フィルム剥離搬送装置１００の下流側には、図示しない他の基板搬送手段が配置されている。この基板搬送手段は、基板Ｐの搬送方向Ｆに間隔を置いて実質上水平に配列された複数個の搬送ローラ８を備えている。これらの搬送ローラ８は電動モータによって回転駆動され、基板Ｐを下流端に向けて移動させることができる。端部剥離手段４により一端部が部分的に剥離された基板Ｐの両面のフィルムは、それぞれフィルム剥離搬送装置１００によって完全に剥離され、後述するようにして図示しないフィルム収容容器内に搬送される。フィルム剥離装置の出口側に配置された基板搬送手段は、フィルムが完全に剥離されて存在しない基板Ｐを更に下流に向けて搬送する。
【００１８】
次に図１〜図３を参照して、本発明によるフィルム剥離搬送装置１００について説明する。フィルム剥離搬送装置１００は、基板Ｐの両面に貼着されたフィルムの一端部が部分的に剥離された該フィルムを基板Ｐから完全に剥離させる剥離手段を備えている。この剥離手段は、基板Ｐの上面に貼着されたフィルムの一端部が部分的に剥離された該フィルムを基板Ｐから上方に強制的に搬送する上部フィルム剥離搬送手段１０と、基板Ｐの下面に貼着されたフィルムの一端部が部分的に剥離された該フィルムを基板Ｐから下方に強制的に搬送する下部フィルム剥離搬送手段１２と、上部エア噴射手段１４と、下部エア噴射手段１６とを含んでいる。上部エア噴射手段１４は、基板Ｐの搬送経路よりも上方位置であって、上部フィルム剥離搬送手段１０よりも下流側の位置に配置され、幅方向に延在する円筒部材１４ａの軸方向に間隔をおいて形成された複数のエア噴射孔から圧縮エアが、基板Ｐの搬送経路の上流方向に向けて噴射されるよう構成されている。また下部エア噴射手段１６は、基板Ｐの搬送経路よりも下方位置であって、下部フィルム剥離搬送手段１２よりも下流側の位置に配置され、幅方向に延在する円筒部材１６ａの軸方向に間隔をおいて形成された複数のエア噴射孔から圧縮エアが、基板Ｐの搬送経路の上流方向に向けて噴射されるよう構成されている。
【００１９】
上部フィルム剥離搬送手段１０は、基板Ｐの搬送経路の上方に配置された上側ベルト機構２０を含んでいる。上側ベルト機構２０は、基板Ｐの搬送面ＰＬに上方から最も接近して配置された上流側下部ベルト車２１と、上流側下部ベルト車２１の上方に間隔をおいて配置された上流側上部ベルト車２２と、上流側下部ベルト車２１と上流側上部ベルト車２２との間に巻き掛けられた上流側無端ベルト２３と、上流側下部ベルト車２１の下流側に配置された下流側下部ベルト車２４と、下流側下部ベルト車２４の上方に間隔をおいて配置された下流側上部ベルト車２５と、下流側下部ベルト車２４と下流側上部ベルト車２５との間に巻き掛けられた下流側無端ベルト２６とを備えている。下流側下部ベルト車２４は、上流側下部ベルト車２１よりも高い位置に配置され、また下流側上部ベルト車２５は、上流側上部ベルト車２２の直上方に間隔をおいて配置されている。下流側無端ベルト２６の上流側の面及び上流側無端ベルト２３の下流側の面の大部分の領域は相互に対向しかつ実質的に密着するよう配置され、下流側無端ベルト２６の上流側の面における上端部の一部領域は、上流側上部ベルト車２２の外周面の下流側における一部領域に、上流側無端ベルト２３を介して圧接されている。各ベルト車２１、２２、２４及び２５は、それぞれの回転軸２１ａ、２２ａ、２４ａ及び２５ａに、軸方向に間隔をおいてかつ軸方向位置が相互に整合させられて、複数個配設されている。回転軸２１ａ、２２ａ、２４ａ及び２５ａの各々は、基板Ｐの搬送経路の幅方向に延在するよう配置されている。上記のように構成された上側ベルト機構２０において、上流側無端ベルト２３及び下流側無端ベルト２６の各々の協働によって、基板Ｐの搬送面ＰＬ側から上流側に斜め上方に向かって延在するフィルム搬送経路２７が形成されている。
【００２０】
下部フィルム剥離搬送手段１２は、基板Ｐの搬送経路の下方に配置された下側ベルト機構３０を含んでいる。下側ベルト機構３０は、基板Ｐの搬送面ＰＬに下方から最も接近して配置された上流側上部ベルト車３１と、上流側上部ベルト車３１の下方に間隔をおいて配置された上流側下部ベルト車３２と、上流側上部ベルト車３１と上流側下部ベルト車３２との間に巻き掛けられた上流側無端ベルト３３と、上流側上部ベルト車３１の下流側に配置された下流側上部ベルト車３４と、下流側上部ベルト車３４の下方に間隔をおいて配置された下流側下部ベルト車３５と、下流側上部ベルト車３４と下流側下部ベルト車３５との間に巻き掛けられた下流側無端ベルト３６とを備えている。下流側上部ベルト車３４は、上流側上部ベルト車３１よりも低い位置に配置され、また下流側下部ベルト車３５は、上流側下部ベルト車３２よりも低い位置に配置されている。下流側無端ベルト３６の上流側の面及び上流側無端ベルト３３の下流側の面の大部分の領域は相互に対向しかつ実質的に密着するよう配置され、上流側無端ベルト３３の下流側の面における上端部の一部領域は、下流側上部ベルト車３４の外周面の上流側における一部領域に、下流側無端ベルト３６を介して圧接されている。各ベルト車３１、３２、３４及び３５は、それぞれの回転軸３１ａ、３２ａ、３４ａ及び３５ａに、軸方向に間隔をおいてかつ軸方向位置が相互に整合させられて、複数個配設されている。回転軸３１ａ、３２ａ、３４ａ及び３５ａの各々は、基板Ｐの搬送経路の幅方向に延在するよう配置されている。上記のように構成された下側ベルト機構３０において、上流側無端ベルト３３及び下流側無端ベルト３６の各々の協働によって、基板Ｐの搬送面ＰＬ側からほぼ鉛直下方に延在するフィルム搬送経路３７が形成されている。上流側上部ベルト車３１に巻き掛けられた上流側無端ベルト３３の最上面は、基板Ｐの搬送面ＰＬと実質的に同一面上に配置されている。
【００２１】
上側ベルト機構２０の上流側下部ベルト車２１は、変位自在に支持されると共にばね手段によって、上流側無端ベルト２３の最下面と基板Ｐの搬送面ＰＬとの間の隙間Ｓが最少となる基準位置に位置付けられ、基板Ｐの搬送経路に隙間Ｓを越える厚さを有する基板Ｐが搬送されると、上流側下部ベルト車２１は、基板Ｐの押上作用により、ばね手段に抗して隙間Ｓが拡大される下流方向上方に変位させられて基板Ｐの搬送が許容される。上流側下部ベルト車２１は、静止枠手段に可動支持手段を介して変位自在に支持され、ばね手段は、静止枠手段と可動支持手段との間に配設されている。以上の構成及び作用について更に具体的に説明する。
【００２２】
静止枠手段は、基板Ｐの搬送経路を幅方向に挟んだ両側に、相互に対向しかつ鉛直方向に延在するよう設置された一対の側枠４０を含んでいる。側枠４０の各々は適宜の平鋼板により形成することができる。なお、図２及び図３においては片側の側枠４０のみが示されている。可動支持手段は、側枠４０の各々に設けられた案内支持手段を構成する案内支持ロッド４２と、案内支持ロッド４２の各々に移動自在に支持された可動支持部材４４とを備えている。上側ベルト機構２０における上流側下部ベルト車２１の回転軸２１ａの両端部は、対応する可動支持部材４４に軸受４５を介して回転自在に支持されている。上流側下部ベルト車２１の回転軸２１ａの両端部を移動可能に支持する可動支持機構、すなわち可動支持手段を構成する案内支持ロッド４２、可動支持部材４４等の構成は、相互に実質的に同じ構成を有するので、以下、片方の側枠４０に配設された片方の可動支持機構について説明する。
【００２３】
側枠４０には、相互に実質的に同じ形状及び大きさを有する一対の案内支持枠４６が取り付けられている。比較的細長い矩形状をなす適宜の鋼板を折り曲げることにより形成することができる案内支持枠４６の各々は、平坦な基部４６ａと、基部４６ａの両端縁から相互に間隔をおいて平行に対向するよう直立する一対の側壁４６ｂ及び４６ｃとを有し、横断面がチャンネル形状をなしている。案内支持枠４６の各々は、相互に斜め上下方向に間隔をおいて側枠４０に取り付けられている。案内支持枠４６の各々の基部４６ａは側枠４０に固定され、案内支持枠４６の各々の側壁４６ｂ及び４６ｃは、それぞれ、図１に示すように、基板Ｐの搬送方向下流側の側壁４６ｂが高く、上流側の側壁４６ｃが低くなるように相互に斜め上下方向に対向するよう位置付けられている。案内支持枠４６の各々の側壁４６ｂ及び４６ｃの相互に対向する内側面は、基板Ｐの搬送経路を幅方向に見て、相互に間隔をおいて斜め上下方向（下流側が低く上流側が高い斜め上下方向）に平行に延在する一対の仮想平面上に位置付けられるよう配置される。したがって、案内支持枠４６の各々のチャンネル溝は上記斜め上下方向に間隔をおいて直線状に整合するよう配置される。案内支持枠４６の各々の側壁４６ｂ及び４６ｃ間には、案内支持ロッド４２が固定されている。丸棒部材から形成されている案内支持ロッド４２の各々の軸線は、前記幅方向に見て、該斜め上下方向に相互に平行に延在するよう位置付けられる。なお、案内支持ロッド４２の各々の軸線は、鉛直方向上方から見て、基板Ｐの搬送方向に延びる仮想直線上に位置付けられる。
【００２４】
可動支持部材４４は、本体部４４ａと、本体部４４ａの平坦な上面から直角に上方に延び出す受け部４４ｂとを備えている。本体部４４ａは、本体部４４ａの上面から見て一定の幅で比較的細長く延在する矩形状をなすよう形成され、相互に平行に延在する平坦な両側面と、両側面及び上面に対し直交する平坦面からなる両端面とを有するブロック体から構成されている。本体部４４ａの両端部における上面及び下面は、相互に平行に対向しかつ両側面及び両端面に直交する平坦面から構成されている。したがって、本体部４４ａの両端部の横断面は、相互に実質的に同じ大きさの矩形状をなすよう形成されている。受け部４４ｂは、本体部４４ａの長手方向中央よりも一端寄りの位置から突出するよう形成され、本体部４４ａと同じ幅の側面と矩形状の横断面を有し、その先端は平坦面をなしている。本体部４４ａの長手方向両端部を除く中央部は、下面から下方に突出するよう形成されている。本体部４４ａの該中央部には、支持孔４４ｃが両側面を貫通するよう形成されている。支持孔４４ｃには軸受４５が圧入・支持されている。本体部４４ａの両端部には、それぞれ、上面及び下面を貫通する被支持孔４４ｄが形成されている。被支持孔４４ｄの各々の軸線は、本体部４４ａを側面から見て相互に平行に延在し、被支持孔４４ｄの各々の軸心は、本体部４４ａを上面から見て幅方向中央に位置付けられている。以上のように構成された可動支持部材４４は、被支持孔４４ｄの各々が、対応する案内支持枠４６の案内支持ロッド４２に移動自在に嵌合されることにより、側枠４０に移動自在に支持される。可動支持部材４４の本体部４４ａの長手方向両端部の上面及び下面は、対応する案内支持枠４６の側壁４６ｂ及び４６ｃの相互に対向する内側面の間に所定量だけ移動しうるよう位置付けられる。
【００２５】
他方の側枠４０にも、上記したと実質的に同じとおりにして、案内支持ロッド４２を含む一対の案内支持枠４６が取り付けられ、可動支持部材４４が、案内支持枠４６の各々の案内支持ロッド４２に移動自在に支持される。
【００２６】
片方の側枠４０の案内支持枠４６の各々に移動自在に支持された可動支持部材４４に支持された軸受４５には、上側ベルト機構２０における上流側下部ベルト車２１の回転軸２１ａの一端部が回転自在に支持される。また、他方の側枠４０の案内支持枠４６の各々に移動自在に支持された可動支持部材４４に支持された軸受４５には、上記上流側下部ベルト車２１の回転軸２１ａの他端部が回転自在に支持される。以上の結果、上記上流側下部ベルト車２１は、側枠４０の各々に配設した案内支持枠４６の各々の案内支持ロッド４２に、可動支持部材４４を介して移動自在に支持される。
【００２７】
片方の側枠４０には、リテーナ部材５０が取り付けられている。リテーナ部材５０は、一端壁５１と、一端壁５１から直角に延び出す筒状壁５２とを備え、全体としてキャップ形状をなしている。筒状壁５２の外周面は横断面が矩形状をなすよう形成され、筒状壁５２の内側に形成されている孔５３の内周面は横断面が円形状をなすよう形成されている。リテーナ部材５０は、案内支持枠４６の各々に移動自在に支持された可動支持部材４４の受け部４４ｂの延長上に配置されている。すなわち、リテーナ部材５０の孔５３の軸線は、可動支持部材４４の受け部４４ｂの移動方向の軸線（案内支持枠４６の各々の案内支持ロッド４２の軸線と平行である）と共通の軸線上に配置され、リテーナ部材５０の開放端は、可動支持部材４４の受け部４４ｂの先端面に対し間隔をおいて対向するよう位置付けられている。リテーナ部材５０の一端壁５１には、孔５３と同軸上にねじ孔５１ａが形成され、ねじ孔５１ａにはばね力調整用のねじ部材５４がねじ係合されている。ねじ部材５４の一端面には回転操作用の溝が形成されている。ねじ部材５４にはロックナット５５がねじ係合されている。リテーナ部材５０の孔５３内には、可動受け部材５６が軸方向に移動可能に挿入されている。可動受け部材５６は、円板部５６ａと、円板部５６ａの軸方向片面の中央から延び出すピン部５６ｂとから構成されている。可動受け部材５６の円板部５６ａの外径は、リテーナ部材５０の孔５３の内径よりも若干小さく形成されている。可動受け部材５６の円板部５６ａの軸方向他面と可動支持部材４４の受け部４４ｂの先端面との間には、ばね手段である圧縮コイルばね６０が配設されている。
【００２８】
圧縮コイルばね６０のばね力により、可動受け部材５６のピン部５６ｂの先端面はねじ部材５４の他端面に圧接させられる。また、可動支持部材４４の本体部４４ａの両端部の下面が、案内支持枠４６の各々における側壁４６ｂ及び４６ｃのうち斜め下方に位置する側壁４６ｃの内側面に、シム７０を介して圧接させられる（図２参照）。したがって、側壁４６ｃの各々の内側面は、可動支持部材４４の移動を規制する移動規制部を構成する。この状態で、可動支持部材４４の本体部４４ａの両端部の上面は、案内支持枠４６の各々における側壁４６ｂ及び４６ｃのうち、斜め上方に位置する側壁４６ｂの内側面に対し、所定の移動ストロークを可能にする間隔が形成される。
【００２９】
他方の側枠４０にも、上記したと実質的に同じとおりにして、リテーナ部材５０、ねじ部材５４、ロックナット５５、可動受け部材５６及び圧縮コイルばね６０等が取り付けられ、可動支持部材４４との間に、上記したと実質的に同じ関係が形成されている。
【００３０】
上記圧縮コイルばね６０の各々が、対応する可動支持部材４４を案内支持枠４６の上記移動規制部に押圧することにより、上側ベルト機構２０の上流側下部ベルト車２１は、上流側無端ベルト２３の最下面と基板Ｐの搬送面ＰＬとの間の隙間Ｓ（図２及び図３参照）が最少となる基準位置に位置付けられる。実施形態において、上記下側ベルト機構３０の上流側上部ベルト車３１に巻き掛けられた上流側無端ベルト３３の最上面は、基板Ｐの搬送面ＰＬと実質的に同一面上に配置される。そして上記隙間Ｓは、上側ベルト機構２０の上流側下部ベルト車２１に巻き掛けられた上流側無端ベルト２３の最下面と、下側ベルト機構３０の上流側上部ベルト車３１に巻き掛けられた上流側無端ベルト３３の最上面との間に形成される。この隙間Ｓは、搬送経路を搬送される基板Ｐのうち、最少の厚さを有する基板Ｐの厚さに設定されることが好ましい。この隙間Ｓはまた、上記シム７０の厚さを変更することにより、適宜調整することが可能である。
【００３１】
次に、以上のように構成されたフィルム剥離搬送装置１００の作用について説明する。図１〜図３を参照して、端部剥離手段４によって上面及び下面のフィルムの一端部が部分的に剥離され基板Ｐが、上側ベルト機構２０及び下側ベルト機構３０が存在する領域に搬送されると、上部エア噴射手段１４から圧縮エアが、基板Ｐの上面と該上面の一端部（前端部）から部分的に剥離されたフィルムとの間に吹き付けられる。これにより該フィルムの剥離が促進され、その一端部が上方に偏向させられる。上方に偏向させられた該フィルムは、上側ベルト機構２０の無端ベルト２３と２６との間に挟まれ、上側搬送搬出経路２７に沿って上方に搬送される。上側搬送搬出経路２７に沿って上方に搬送された該フィルムは、基板Ｐの搬送方向Ｆとは反対方向である上流方向に搬出され、図示しないフィルム収容容器内に収容される。他方、上側ベルト機構２０及び下側ベルト機構３０が存在する領域に搬送された基板Ｐの下面と該下面の一端部（前端部）から部分的に剥離されたフィルムとの間に、下部エア噴射手段１６から圧縮エアが吹き付けられる。これにより該フィルムの剥離が促進され、その一端部が下方に偏向させられる。下方に偏向させられた該フィルムは、下側ベルト機構３０の無端ベルト３３と３６との間に挟まれ、下側搬送搬出経路３７に沿って下方に搬送され、図示しないフィルム収容容器内に収容される。上面及び下面から完全にフィルムが剥離された基板Ｐは搬送ローラ８により下流側の図示しない装置に向けて搬送される。
【００３２】
基板Ｐの搬送経路に上記隙間Ｓと実質的に同じ厚さを有する基板Ｐ、すなわち最少の厚さを有する基板Ｐが搬送されて、上側ベルト機構２０の上流側下部ベルト車２１に巻き掛けられた上流側無端ベルト２３の最下面と、下側ベルト機構３０の上流側上部ベルト車３１に巻き掛けられた上流側無端ベルト３３の最上面との間（該隙間Ｓが形成されている部位）に搬入させられると、基板Ｐの上面と上流側無端ベルト２３の最下面との間の隙間は実質的にゼロとなり、上側ベルト機構２０の上流側下部ベルト車２１には、基板Ｐによる押上作用は実質的に発生しない。したがって、上流側下部ベルト車２１は基準位置に位置付けられた状態で変位することはなく、フィルムの剥離及び搬送が行なわれる。基板Ｐの上面と上流側無端ベルト２３の最下面との間の隙間が実質的にゼロであることに起因して、上部エア噴射手段１４及び下部エア噴射手段１６から圧縮エアが、基板Ｐの両面と該両面の一端部から部分的に剥離されたフィルムとの間にそれぞれ吹き付けられたときの衝撃による基板Ｐの振動は最少に抑制され、あるいは実質的に防止される。その結果、基板Ｐの円滑な搬送が保証され、基板Ｐが損傷するおそれもなくなって、基板Ｐの品質が確保される。
【００３３】
他方、基板Ｐの搬送経路に上記隙間Ｓを越える厚さを有する基板Ｐが搬送されると、上流側下部ベルト車２１は、基板Ｐの押上作用により、圧縮コイルばね６０のばね力に抗して隙間Ｓが拡大される下流方向上方に変位させられて基板Ｐの搬送が許容される。更に具体的には、基板Ｐの搬送経路に上記隙間Ｓを越える厚さを有する基板Ｐが搬送されると、上流側下部ベルト車２１は、基板Ｐの押上作用により、可動支持部材４４の各々が、対応する圧縮コイルばね６０に抗して上記移動規制部（案内支持枠４６の側壁４６ｃの内側面上記実施形態においてはシム７０の内側面）から離れるよう案内支持ロッド４２に沿って下流方向上方に移動させられることにより、同じ方向に変位させられる。基板Ｐの上面と上側ベルト機構２０の上流側無端ベルト２３の最下面との間の隙間は実質的にゼロに保持されるのみならず、上記隙間Ｓを越える厚さの量が増加するにつれて圧縮コイルばね６０によるばね力が増加するので、上側ベルト機構２０の上流側無端ベルト２３の最下面と、下側ベルト機構３０の上流側無端ベルト３３の最上面との間の基板Ｐに対するニップ力が増加し、フィルムの剥離及び搬送が一層しっかりと行なわれる。また上部エア噴射手段１４及び下部エア噴射手段１６から圧縮エアが、基板Ｐの両面と該両面の一端部から部分的に剥離されたフィルムとの間にそれぞれ吹き付けられたときの衝撃による基板Ｐの振動は最少に抑制され、あるいは実質的に防止される。その結果、基板Ｐの円滑な搬送が保証され、基板Ｐが損傷するおそれもなくなって、基板Ｐの品質が確保される。なお、上記したように、基板Ｐの、上記隙間Ｓを越える厚さの量が増加するにつれて圧縮コイルばね６０によるばね力が増加して、上側ベルト機構２０の上流側無端ベルト２３の最下面と、下側ベルト機構３０の上流側無端ベルト３３の最上面との間の基板Ｐに対するニップ力が増加するが、基板Ｐの厚さも増加しているので、基板Ｐの強度もアップし、基板Ｐの剛性を損なうことはない。
【００３４】
本発明においては、上記したとおりにして、上側ベルト機構２０の上流側下部ベルト車２１が下流方向上方に変位させられると、上流側無端ベルト２３の張力が増加させられるよう構成されている。すなわち、図１に示されている実施形態においては、上側ベルト機構２０の下流側下部ベルト車２４は、上流側下部ベルト車２１よりも高い位置に配置され、上流側下部ベルト車２１が上記したとおりにして下流方向上方に変位させられると、上流側無端ベルト２３の、下流側の下端部であって上流側下部ベルト車２１の外周面に巻き掛けられている領域よりも上方の領域における外周面が、対向する下流側下部ベルト車２４の外周面の一部領域に、下流側下部ベルト車２４に巻き掛けられた下流側無端ベルト２６を介して圧接される。このような作用によって、フィルム搬送経路２７を形成する上流側無端ベルト２３と下流側無端ベルト２６の下端部であるフィルムの入口部において、特に該ベルト２３及び２６間のニップ力が増加するので、フィルムの剥離作用をより円滑かつ迅速にしかもより効果的に促進する。
【００３５】
以上、本発明によるフィルム剥離搬送装置の実施の形態について説明したが、本発明は前記実施の形態に限定されるものではなく、本発明の範囲を逸脱することなく種々の変形あるいは修正が可能である。例えば、特開平１０−１２０２９２号公報に開示されているように、上側ベルト機構には、フィルムを上方に向けて搬送し次いで基板の搬送方向に向けて搬出する上側搬送搬出経路が形成される形態のものがある。この上側ベルト機構において、上流側無端ベルトと下流側無端ベルトとの間には、基板の搬送経路を側方に見てほぼ逆Ｌ形状をなす上側搬送搬出経路が形成される。本発明は、このような形態の上側ベルト機構を備えたフィルム剥離搬送装置にも適用されるものである。したがって、上側ベルト機構は、上記実施形態に限定されるものではなく、基板の搬送面に上方から最も接近して配置された上流側下部ベルト車と、下端が上流側下部ベルト車に巻き掛けられて上方に向かって延在する上流側無端ベルトと、上流側下部ベルト車の下流側に配置された下流側下部ベルト車と、下端が下流側下部ベルト車に巻き掛けられて上方に向かって延在する下流側無端ベルトとを含み、該ベルトの各々の協働によって少なくとも下端部が上方に延びるフィルム搬送経路が形成されるよう構成されているものであればよい。
【００３６】
また上記実施形態において、上記隙間Ｓは、搬送経路を搬送される基板Ｐの最少の厚さに設定されており、したがって、最少の厚さの基板Ｐが搬送される場合には、上側ベルト機構２０の上流側下部ベルト車２１を変位させることなく、本発明の目的を達成できるので、作動に無駄がなく効率的であるので実用的には好ましい。しかしながら、上記隙間Ｓを当初から実質的にゼロに設定する他の実施形態もあり得る。基板Ｐの最少の厚さが比較的厚い場合には、剛性が損なわれることはないので、この実施形態が成立する場合もあり得るのである。したがって、隙間Ｓの最少とは実質的にゼロの場合も含むものである。なお、基板Ｐの厚さとは、貼着されたフィルムをも含むことはいうまでもない。また、上記実施形態において、上記隙間Ｓの調整は、可動支持部材４４の本体部４４ａの両端部の下面と、案内支持枠４６の各々における側壁４６ｂ及び４６ｃのうち斜め下方に位置する側壁４６ｃの内側面との間に挿入されたシム７０の厚さを変えることにより自由に調整可能であるが、もちろん、上記隙間Ｓの調整手段は上記実施形態に限定されるものではない。例えば、シム７０に代えて、適宜のねじ部材を案内支持ロッド４２の各々に設け、ねじ部材の端面を移動規制部とする他の実施形態、あるいは案内支持ロッド４２の各々の下端部を、可動支持部材４４の本体部４４ａの両端部の下面に当接して下方への移動を阻止する移動規制部とする他の実施形態等が考えられる。更にはまた、上記実施形態においては、基板Ｐの両面にフィルムが貼着されているが、少なくとも片面にフィルムが貼着されている基板Ｐであれば、本発明を適用することが可能である。仮に、片面にフィルムが貼着されている基板Ｐのみが搬送されるフィルム剥離装置においては、下側ベルト機構３０、下部エア噴射手段１６等が不要となるが、この場合、下側ベルト機構３０の上流側上部ベルト車３１に代えて適宜の搬送ローラが、上側ベルト機構２０の上流側下部ベルト車２１に対向して配置されることになる。
【００３７】
【発明の効果】
本発明に従って構成されたフィルム剥離搬送装置によれば、基板と、一端部から部分的に剥離されたフィルムとの間に、エア噴射手段から圧縮エアが吹き付けられても、基板の振動を抑制ないし防止して、基板の円滑な搬送を保証しかつ基板の品質を確保することを可能にする。また、フィルムの剥離作用をより円滑かつ迅速にしかもより効果的に促進する。
【図面の簡単な説明】
【図１】本発明に従って構成されたフィルム剥離搬送装置の実施形態の構成を概略的に示す側面図であって、一部を断面にして示す側面図。
【図２】主として図１に示す上側ベルト機構の上流側下部ベルト車の支持部の構成を示す概略図であって、その一部を上流側下部ベルト車の移動方向に沿った断面で示し、上側ベルト機構の上流側無端ベルトと下側ベルト機構の上流側無端ベルトとのニップ部を鉛直方向の断面で示す概略図。
【図３】主として図１に示す上側ベルト機構の上流側下部ベルト車の支持部の構成を示す概略図であって、その一部を上流側下部ベルト車の移動方向に沿った他の断面で示し、上側ベルト機構の上流側無端ベルトと下側ベルト機構の上流側無端ベルトとのニップ部を鉛直方向の断面で示す概略図。
【符号の説明】
１０上部フィルム剥離搬送手段
１２下部フィルム剥離搬送手段
１４上部エア噴射手段
１６下部エア噴射手段
２０上側ベルト機構
２１上流側下部ベルト車
２１ａ回転軸
２３上流側無端ベルト
２４下流側下部ベルト車
２６下流側無端ベルト
２７フィルム搬送経路
３０下側ベルト機構
３１上流側上部ベルト車
３３上流側無端ベルト
３７フィルム搬送経路
４０側枠
４２案内支持ロッド
４４可動支持部材
５０リテーナ部材
６０圧縮コイルばね
１００フィルム剥離搬送装置
Ｆ基板Ｐの搬送方向
Ｐ基板
ＰＬ基板の搬送面[0001]
[Technical field to which the invention belongs]
The present invention is provided with a peeling means for completely peeling the film from which one end of the film attached to at least one surface of the substrate is partially peeled from the substrate, and the peeling means is the partially peeled film. An upper film peeling / conveying means for forcibly conveying the film upward from the substrate, the upper film peeling / conveying means including an upper belt mechanism disposed above the substrate conveying path .
[0002]
[Prior art]
In the production of printed wiring boards, copper foil is pasted on both sides of a core plate made of glass fiber reinforced epoxy resin or the like to form a copper clad laminate, and a photoresist layer and both sides of the copper clad laminate are formed. The printed wiring board material which laminated the protective film is used. Then, both sides of the printed wiring board material are irradiated with a circuit pattern to expose the photoresist layer, and thereafter a protective film (hereinafter simply referred to as “film”) present on both surfaces is peeled off.
[0003]
A film peeling and conveying apparatus capable of peeling a film from at least one surface (upper surface) of a substrate such as a printed wiring board material having a rectangular shape when viewed from a plane is disclosed in, for example, Japanese Patent Application Laid-Open No. 10-120292. The film peeling and conveying apparatus disclosed in the publication includes a peeling means for completely peeling the film from which the one end of the film attached to at least one surface of the substrate is partially peeled from the substrate, It includes an upper film peeling / conveying means for forcibly conveying the film partially peeled from one end of the film attached to one side of the substrate upward from the substrate. The upper film peeling / conveying means includes an upper belt mechanism arranged above the substrate conveying path. The upper belt mechanism is formed with an upper conveyance carry-out path for conveying the film upward and then carrying it out in the substrate conveyance direction.
[0004]
The upper belt mechanism of the upper film peeling / conveying means includes an upstream lower belt wheel disposed close to the conveying path, an upstream upper belt wheel disposed above the upstream lower belt wheel, and an upstream An upper carry-out belt wheel disposed at a downstream side of the upper side belt wheel, a downstream lower belt wheel disposed at a downstream side of the upstream lower belt wheel, and a space above the downstream lower belt wheel. Between the downstream upper belt wheel disposed at the downstream side, the lower carrying belt wheel arranged at a distance downstream of the downstream upper belt wheel, and the upstream lower belt wheel, the upstream upper belt wheel and the upper carrying belt vehicle. And an upstream endless belt, and a downstream lower belt wheel, a downstream upper belt wheel, and a downstream endless belt wound between the lower carrying belt wheel. The downstream lower belt wheel is disposed at a higher position than the upstream lower belt wheel. A part of the outer peripheral surface of the upstream endless belt, which is the upper end portion between the upstream upper carry-out belt wheel and the upstream lower belt wheel, is downstream endless in a partial region of the outer peripheral surface of the downstream upper belt wheel. It is wound around a belt. Between the upstream endless belt and the downstream endless belt, there is formed an upper transporting / unloading path having a substantially inverted L shape when the substrate transporting path is viewed laterally.
[0005]
The peeling means includes air jetting means in addition to the upper film peeling / conveying means. The air ejecting means is disposed at a position above the substrate transport path and downstream of the upper film peeling transport means, and is formed with an interval in the axial direction of the cylindrical member extending in the width direction. Further, the compressed air is ejected from the plurality of air ejection holes in the upstream direction of the substrate conveyance path. In addition, the edge part peeling means for partly peeling the one end part of the film stuck on the single side | surface of the board | substrate is arrange | positioned in the position upstream of the upper film peeling conveyance means in the conveyance path | route of a board | substrate. Yes.
[0006]
When the substrate from which the front end, which is one end of the single-sided film is partially peeled by the edge peeling means, is transported below the upper belt mechanism along the transport path, the compressed air is supplied from the air ejection means to the substrate And a film partially peeled from the front end. Thereby, peeling of a film is accelerated | stimulated and the front-end part is deflected upwards. The film deflected upward is sandwiched between the upstream endless belt and the downstream endless belt of the upper belt mechanism, and is transported upward along the upper transport carry-out path and then toward the substrate transport direction, Unloaded from the downstream end.
[0007]
[Problems to be solved by the invention]
In the film peeling / conveying device, the rotation shaft of the upper lower belt wheel of the upper belt mechanism, which is disposed closest to the substrate conveying surface from above, is supported so as not to move substantially from a predetermined position. Yes. Therefore, the gap between the lowermost surface of the upstream endless belt wound around the upstream lower belt wheel and the transport surface of the substrate is set to be constant. The gap is set larger than the thickness of the substrate so that the substrate having the maximum thickness is allowed to pass through. For example, when the thickness of the substrate is 0.1 mm to 3.2 mm and the thickness of the film is 0.02 mm, the gap is set to about 5.0 mm. For this reason, when the substrate passes through the gap, there is always a gap of 4.88 mm to 1.78 mm between the upper surface of the substrate and the lowermost surface of the upstream endless belt. Due to the existence of the gap, as described above, the substrate is compared by the impact when compressed air is blown between the substrate and the film partially peeled from the front end portion from the air injection means. There is a risk of being vibrated significantly. When the substrate is vibrated relatively large, smooth conveyance of the substrate is hindered, and the substrate may be damaged. The possibility of occurrence of such a problem increases as the thickness of the substrate decreases.
[0008]
An object of the present invention is to suppress or substantially prevent vibration of a substrate even when compressed air is blown from an air jetting unit between the substrate and a film partially peeled from one end. It is an object of the present invention to provide a novel film peeling / conveying apparatus that ensures smooth conveyance of the film and ensures the quality of the substrate.
[0009]
Another object of the present invention is to provide a novel film peeling / conveying apparatus which further facilitates the film peeling action more smoothly and quickly in addition to the above object.
[0010]
[Means for Solving the Problems]
According to the present invention, at least one end of the film attached to one side of the substrate is provided with a peeling means for completely peeling the film from the substrate, and the peeling means is partially peeled off. The upper film peeling and conveying means forcibly conveying the film upward from the substrate includes an upper belt mechanism disposed above the substrate conveying path, and the upper belt mechanism An upstream lower belt wheel disposed closest to the conveying surface from above, an upstream endless belt having a lower end wound around the upstream lower belt wheel and extending upward, and an upstream lower belt wheel A downstream lower belt wheel disposed on the downstream side, and a downstream endless belt having a lower end wound around the downstream lower belt wheel and extending upwardly. In film peeling feeder Kutomo lower end film transport path extending upward is formed,
The upstream lower belt wheel is supported in a freely displaceable manner and is positioned by a spring means at a reference position where the gap between the lowermost surface of the upstream endless belt and the substrate transport surface is minimized. When the substrate having a thickness exceeding the gap is transported, the upstream lower belt wheel is displaced upward in the downstream direction where the gap is enlarged against the spring means by the pushing-up action of the substrate. Substrate transport is allowed,
A film peeling / conveying device is provided.
[0011]
It is preferable that the upstream lower belt wheel is movably supported by the stationary frame means via the movable support means, and the spring means is disposed between the stationary frame means and the movable support means.
The upstream lower belt wheel is disposed on a rotating shaft extending in the width direction of the substrate conveyance path, and the stationary frame means includes side frames installed on both sides sandwiching the substrate conveyance path in the width direction, The movable support means includes a guide support means provided on each of the side frames, and a movable support member supported movably on each of the guide support means, and both ends of the rotation shaft of the upstream lower belt wheel are Each of the guide support means is provided with a movement restricting portion for restricting the movement of the corresponding movable support member, and the spring means is connected to each of the side frames. The upstream lower belt wheel is positioned at the reference position by the spring means pressing the corresponding movable support member against the movement restricting portion, and the gap is placed in the transport path of the substrate. When a substrate with a thickness exceeding The upstream lower belt wheel is moved upward in the downstream direction along the guide support means so that each of the movable support members is separated from the movement restricting portion against the corresponding spring means by the push-up action of the substrate. It is preferable to be displaced in the same direction.
It is preferable that the tension of the upstream endless belt is increased when the upstream lower belt wheel is displaced upward in the downstream direction.
The downstream lower belt wheel is arranged at a position higher than the upstream lower belt wheel, and when the upstream lower belt wheel is displaced upward in the downstream direction, it is the downstream lower end of the upstream endless belt and The outer peripheral surface in the region above the outer peripheral surface of the side lower belt wheel is wound on the downstream lower belt wheel in a partial region of the outer peripheral surface of the opposed downstream lower belt wheel. It is preferable to press-contact through a downstream endless belt.
The peeling means includes a lower film peeling / conveying means for forcibly conveying the partially peeled film downward from the substrate, and the lower film peeling / conveying means is a lower belt disposed below the conveyance path of the substrate. The lower belt mechanism includes an upstream upper belt wheel disposed closest to the substrate transport surface from below and an upstream lower belt disposed below the upstream upper belt wheel. A vehicle, a downstream upper belt vehicle disposed downstream of the upstream upper belt vehicle, a downstream lower belt vehicle spaced below the downstream upper belt vehicle, and the upstream belt vehicle An upstream endless belt including a wound upstream endless belt and a downstream endless belt wound between the downstream belt wheels, and each of the belts cooperates to form a film transport path extending downward, and the upstream upper bell The uppermost surface of the upstream endless belt wound around the vehicle is disposed on substantially the same plane as the substrate conveying surface, and the gap is formed between the lowermost surface of the upstream endless belt of the upper belt mechanism and the lower belt. Preferably, it is formed between the uppermost surface of the upstream endless belt of the mechanism.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, with reference to an accompanying drawing, an embodiment of a film exfoliation conveyance device constituted according to the present invention is described in detail.
[0013]
With reference to FIG. 1, the film peeling conveyance apparatus 100 by this invention is provided as a part of film peeling apparatus which the whole does not show in figure. Before describing the film peeling / conveying apparatus 100, first, an outline of the film peeling apparatus will be described.
[0014]
The film peeling apparatus includes a substrate transfer means (not shown) arranged on the right side in FIG. The substrate transport means includes a plurality of transport rollers 2 arranged substantially horizontally at intervals in the transport direction F of the substrate P. These transport rollers 2 are rotationally driven by an electric motor and can move the substrate P in the transport direction F along the transport surface PL of the substrate P. In this embodiment, the substrate P is composed of a printed wiring board in which films are attached to both the upper surface as one surface and the lower surface as the other surface.
[0015]
Clamping means and positioning means (not shown), and end peeling means 4 are arranged at the downstream end of the substrate transport means. The clamp means includes a pair of clamp members that are spaced apart from each other across the transport path of the substrate P, and is configured to be able to releasably clamp the substrate P on the transport path. The positioning means is configured to detect the front end of the substrate P transported by the transport roller 2 by a reflective optical sensor and stop the substrate P at a predetermined position.
[0016]
The end peeling means 4 includes a moving body (not shown) configured to reciprocate in the width direction of the transport path of the substrate P, and a pair of press contacts arranged with a space in the vertical direction across the transport path of the substrate P A roller 6 is provided. The pair of pressing rollers 6 is configured to be able to press the substrate P on the transport path in a releasable manner. In a state where the substrate P is clamped at a predetermined position by the clamping means, each pair of the pressure rollers 6 is pressed against both surfaces of each film at one end portion (front end portion in the transport direction) of the substrate P with a predetermined pressure. In this state, each pair of the pressure rollers 6 is reciprocated in the width direction by the moving body, and one end of each film on the substrate P is partially peeled off.
[0017]
A film peeling / conveying device 100, which will be described in detail later, is disposed downstream of the end peeling means 4. On the downstream side of the film peeling / conveying apparatus 100, other substrate conveying means (not shown) is arranged. The substrate transport means includes a plurality of transport rollers 8 arranged substantially horizontally at intervals in the transport direction F of the substrate P. These transport rollers 8 are rotationally driven by an electric motor, and can move the substrate P toward the downstream end. The films on both sides of the substrate P, one end of which has been partially peeled off by the edge peeling means 4, are completely peeled off by the film peeling / conveying device 100 and conveyed into a film container (not shown) as will be described later. . The board | substrate conveyance means arrange | positioned at the exit side of a film peeling apparatus conveys the board | substrate P which the film has peeled completely and does not exist further downstream.
[0018]
Next, with reference to FIGS. 1-3, the film peeling conveyance apparatus 100 by this invention is demonstrated. The film peeling / conveying apparatus 100 includes peeling means for completely peeling the film, which is partially peeled at one end of the film attached to both surfaces of the substrate P, from the substrate P. The peeling means includes an upper film peeling / conveying means 10 for forcibly conveying the film, which is partially peeled at one end of the film attached to the upper surface of the substrate P, from the substrate P, and a lower surface of the substrate P. A lower film peeling / conveying means 12 for forcibly conveying the film, which is partially peeled from one end of the film attached to the substrate P, downward from the substrate P, an upper air ejecting means 14, and a lower air ejecting means 16; Is included. The upper air ejecting means 14 is positioned above the transport path of the substrate P and is located downstream of the upper film peeling / transporting means 10, and is spaced in the axial direction of the cylindrical member 14a extending in the width direction. The compressed air is jetted in the upstream direction of the transport path of the substrate P from the plurality of air jet holes formed at the same time. The lower air ejecting means 16 is positioned below the transport path of the substrate P and downstream of the lower film peeling / transporting means 12, and extends in the axial direction of the cylindrical member 16a extending in the width direction. The compressed air is configured to be ejected in the upstream direction of the transport path of the substrate P from a plurality of air ejection holes formed at intervals.
[0019]
The upper film peeling / conveying means 10 includes an upper belt mechanism 20 disposed above the conveying path of the substrate P. The upper belt mechanism 20 includes an upstream lower belt wheel 21 that is disposed closest to the transport surface PL of the substrate P from above, and an upstream upper belt that is disposed above the upstream lower belt wheel 21 with a space therebetween. An upstream endless belt 23 that is wound between the vehicle 22, the upstream lower belt wheel 21, and the upstream upper belt wheel 22, and a downstream lower belt vehicle disposed downstream of the upstream lower belt wheel 21. 24, a downstream upper belt wheel 25 arranged at an interval above the downstream lower belt wheel 24, and a downstream side wound between the downstream lower belt wheel 24 and the downstream upper belt wheel 25 And an endless belt 26. The downstream lower belt wheel 24 is disposed at a position higher than the upstream lower belt wheel 21, and the downstream upper belt wheel 25 is disposed immediately above the upstream upper belt wheel 22 with a space therebetween. Most areas of the upstream surface of the downstream endless belt 26 and the downstream surface of the upstream endless belt 23 are arranged so as to oppose each other and substantially in close contact with each other. A partial region at the upper end of the surface is in pressure contact with a partial region on the downstream side of the outer peripheral surface of the upstream upper belt wheel 22 via the upstream endless belt 23. A plurality of belt wheels 21, 22, 24, and 25 are arranged on the respective rotation shafts 21a, 22a, 24a, and 25a with axial intervals and axial positions aligned with each other. Yes. Each of the rotation shafts 21a, 22a, 24a, and 25a is disposed so as to extend in the width direction of the transport path of the substrate P. In the upper belt mechanism 20 configured as described above, the upstream endless belt 23 and the downstream endless belt 26 cooperate with each other to extend obliquely upward from the transport surface PL side to the upstream side of the substrate P. A film transport path 27 is formed.
[0020]
The lower film peeling / conveying means 12 includes a lower belt mechanism 30 disposed below the conveying path of the substrate P. The lower belt mechanism 30 includes an upstream upper belt wheel 31 disposed closest to the transport surface PL of the substrate P from below and an upstream lower belt wheel disposed below the upstream upper belt wheel 31 at an interval. A belt wheel 32, an upstream endless belt 33 wound between the upstream upper belt wheel 31 and the upstream lower belt wheel 32, and a downstream upper belt disposed on the downstream side of the upstream upper belt wheel 31 A downstream belt belt 35, a downstream lower belt wheel 35 disposed at a distance below the downstream upper belt wheel 34, and a downstream upper belt wheel 34 and a downstream lower belt wheel 35. And a side endless belt 36. The downstream upper belt wheel 34 is disposed at a position lower than the upstream upper belt wheel 31, and the downstream lower belt wheel 35 is disposed at a position lower than the upstream lower belt wheel 32. Most areas of the upstream surface of the downstream endless belt 36 and the downstream surface of the upstream endless belt 33 are arranged so as to face each other and substantially closely contact each other. A partial region of the upper end of the surface is in pressure contact with a partial region on the upstream side of the outer peripheral surface of the downstream upper belt wheel 34 via the downstream endless belt 36. A plurality of belt wheels 31, 32, 34 and 35 are arranged on the respective rotary shafts 31 a, 32 a, 34 a and 35 a so as to be spaced apart in the axial direction and aligned with each other in the axial direction. Yes. Each of the rotation shafts 31a, 32a, 34a, and 35a is arranged to extend in the width direction of the transport path of the substrate P. In the lower belt mechanism 30 configured as described above, the film transport path extending substantially vertically downward from the transport surface PL side of the substrate P by the cooperation of the upstream endless belt 33 and the downstream endless belt 36. 37 is formed. The uppermost surface of the upstream endless belt 33 wound around the upstream upper belt wheel 31 is disposed on substantially the same plane as the transport surface PL of the substrate P.
[0021]
The upstream lower belt wheel 21 of the upper belt mechanism 20 is supported so as to be displaceable, and a reference that minimizes the gap S between the lowermost surface of the upstream endless belt 23 and the transport surface PL of the substrate P by the spring means. When the substrate P positioned at the position and having a thickness exceeding the gap S is transferred to the transfer path of the substrate P, the upstream lower belt wheel 21 resists the spring means by the pushing-up action of the substrate P. The substrate P is allowed to be conveyed by being displaced upward in the downstream direction in which the substrate P is enlarged. The upstream lower belt wheel 21 is supported by the stationary frame means via a movable support means so as to be displaceable, and the spring means is disposed between the stationary frame means and the movable support means. The above configuration and operation will be described more specifically.
[0022]
The stationary frame means includes a pair of side frames 40 disposed on both sides of the conveyance path of the substrate P in the width direction so as to face each other and extend in the vertical direction. Each of the side frames 40 can be formed of an appropriate flat steel plate. 2 and 3, only one side frame 40 is shown. The movable support means includes a guide support rod 42 that constitutes a guide support means provided in each of the side frames 40, and a movable support member 44 that is movably supported by each of the guide support rods 42. Both ends of the rotation shaft 21 a of the upstream lower belt wheel 21 in the upper belt mechanism 20 are rotatably supported by corresponding movable support members 44 via bearings 45. The configuration of the movable support mechanism that movably supports both ends of the rotating shaft 21a of the upstream lower belt wheel 21, that is, the guide support rod 42, the movable support member 44, and the like constituting the movable support means are substantially the same. Since it has a configuration, one movable support mechanism disposed on one side frame 40 will be described below.
[0023]
A pair of guide support frames 46 having substantially the same shape and size are attached to the side frame 40. Each of the guide support frames 46 that can be formed by bending an appropriate steel plate having a relatively long and narrow rectangular shape is opposed to the flat base portion 46a and the both ends of the base portion 46a in parallel with a distance from each other. It has a pair of upstanding side walls 46b and 46c, and its cross section has a channel shape. Each of the guide support frames 46 is attached to the side frame 40 at an interval in the diagonally up and down direction. Each base portion 46a of the guide support frame 46 is fixed to the side frame 40, and each side wall 46b and 46c of the guide support frame 46 has a side wall 46b on the downstream side in the transport direction of the substrate P as shown in FIG. The upstream side wall 46c is positioned so as to be opposed to each other obliquely in the vertical direction so as to be low. The inner side surfaces of the side walls 46b and 46c of the guide support frame 46 that face each other are diagonally up and down (the downstream side is low and the upstream side is high, spaced apart from each other when the transport path of the substrate P is viewed in the width direction). Are arranged so as to be positioned on a pair of virtual planes extending parallel to (direction). Therefore, each channel groove of the guide support frame 46 is arranged so as to be linearly aligned with an interval in the oblique vertical direction. A guide support rod 42 is fixed between the side walls 46 b and 46 c of the guide support frame 46. The axes of the guide support rods 42 formed from round bar members are positioned so as to extend in parallel with each other in the oblique vertical direction when viewed in the width direction. Each axis of the guide support rod 42 is positioned on an imaginary straight line extending in the transport direction of the substrate P when viewed from above in the vertical direction.
[0024]
The movable support member 44 includes a main body portion 44a and a receiving portion 44b extending upward at a right angle from the flat upper surface of the main body portion 44a. The main body portion 44a is formed to have a rectangular shape extending relatively long and with a certain width when viewed from the upper surface of the main body portion 44a, and to both flat side surfaces extending in parallel to each other, both the side surfaces and the upper surface. It is comprised from the block body which has the both end surfaces which consist of an orthogonal flat surface. The upper surface and the lower surface at both end portions of the main body 44a are formed of flat surfaces that face each other in parallel and are orthogonal to both side surfaces and both end surfaces. Accordingly, the cross-sections at both ends of the main body 44a are formed to have a rectangular shape with substantially the same size. The receiving portion 44b is formed so as to protrude from a position closer to one end than the center in the longitudinal direction of the main body portion 44a, has a side surface with the same width as the main body portion 44a and a rectangular cross section, and has a flat surface at the tip. ing. A central portion excluding both longitudinal ends of the main body 44a is formed so as to protrude downward from the lower surface. A support hole 44c is formed in the central portion of the main body 44a so as to penetrate both side surfaces. A bearing 45 is press-fitted and supported in the support hole 44c. At both ends of the main body portion 44a, supported holes 44d penetrating the upper surface and the lower surface are formed. The axes of the supported holes 44d extend in parallel with each other when the body 44a is viewed from the side, and the axes of the supported holes 44d are positioned at the center in the width direction when the body 44a is viewed from the top. It has been. The movable support member 44 configured as described above can be moved to the side frame 40 by each of the supported holes 44d being movably fitted to the guide support rods 42 of the corresponding guide support frame 46. Supported. The upper surface and the lower surface of both ends in the longitudinal direction of the main body 44a of the movable support member 44 are positioned so as to move by a predetermined amount between the mutually opposing inner surfaces of the side walls 46b and 46c of the corresponding guide support frame 46.
[0025]
A pair of guide support frames 46 including guide support rods 42 are attached to the other side frame 40 in substantially the same manner as described above, and the movable support member 44 supports each of the guide support frames 46. The rod 42 is supported so as to be movable.
[0026]
A bearing 45 supported by a movable support member 44 movably supported on each of the guide support frames 46 of one side frame 40 has one end portion of the rotating shaft 21 a of the upstream lower belt wheel 21 in the upper belt mechanism 20. Is supported rotatably. Further, the bearing 45 supported by the movable support member 44 movably supported by each of the guide support frames 46 of the other side frame 40 has the other end portion of the rotating shaft 21a of the upstream lower belt wheel 21. It is supported rotatably. As a result, the upstream lower belt wheel 21 is supported by the guide support rods 42 of the guide support frames 46 disposed on the side frames 40 via the movable support member 44 so as to be movable.
[0027]
A retainer member 50 is attached to one side frame 40. The retainer member 50 includes one end wall 51 and a cylindrical wall 52 extending perpendicularly from the one end wall 51, and has a cap shape as a whole. The outer peripheral surface of the cylindrical wall 52 is formed so that the cross section is rectangular, and the inner peripheral surface of the hole 53 formed inside the cylindrical wall 52 is formed so that the cross section is circular. The retainer member 50 is disposed on an extension of the receiving portion 44b of the movable support member 44 that is movably supported by each of the guide support frames 46. That is, the axis line of the hole 53 of the retainer member 50 is on the same axis line as the axis line in the moving direction of the receiving portion 44b of the movable support member 44 (parallel to the axis line of each guide support rod 42 of the guide support frame 46). The open end of the retainer member 50 is positioned so as to face the front end surface of the receiving portion 44b of the movable support member 44 with a space therebetween. One end wall 51 of the retainer member 50 is formed with a screw hole 51a coaxially with the hole 53, and a screw member 54 for adjusting the spring force is screwed into the screw hole 51a. A groove for rotational operation is formed on one end surface of the screw member 54. A lock nut 55 is threadedly engaged with the screw member 54. A movable receiving member 56 is inserted into the hole 53 of the retainer member 50 so as to be movable in the axial direction. The movable receiving member 56 includes a disc portion 56a and a pin portion 56b extending from the center of one axial surface of the disc portion 56a. The outer diameter of the disc portion 56 a of the movable receiving member 56 is formed slightly smaller than the inner diameter of the hole 53 of the retainer member 50. A compression coil spring 60, which is a spring means, is disposed between the other axial surface of the disk portion 56a of the movable receiving member 56 and the distal end surface of the receiving portion 44b of the movable support member 44.
[0028]
Due to the spring force of the compression coil spring 60, the tip end surface of the pin portion 56 b of the movable receiving member 56 is brought into pressure contact with the other end surface of the screw member 54. Further, the lower surfaces of both end portions of the main body portion 44 a of the movable support member 44 are brought into pressure contact with the inner side surface of the side wall 46 c positioned obliquely below the side walls 46 b and 46 c of each of the guide support frames 46 via shims 70. (See FIG. 2). Accordingly, each inner side surface of the side wall 46 c constitutes a movement restricting portion that restricts the movement of the movable support member 44. In this state, the upper surfaces of both end portions of the main body 44a of the movable support member 44 have a predetermined movement stroke with respect to the inner surface of the side wall 46b located obliquely above, of the side walls 46b and 46c of each of the guide support frames 46. An interval is formed that allows
[0029]
A retainer member 50, a screw member 54, a lock nut 55, a movable receiving member 56, a compression coil spring 60, and the like are attached to the other side frame 40 in substantially the same manner as described above. Between these, substantially the same relationship as described above is formed.
[0030]
Each of the compression coil springs 60 presses the corresponding movable support member 44 against the movement restricting portion of the guide support frame 46, whereby the upstream lower belt wheel 21 of the upper belt mechanism 20 is connected to the upstream endless belt 23. The gap S (see FIGS. 2 and 3) between the lowermost surface and the transfer surface PL of the substrate P is positioned at a reference position where the gap is minimized. In the embodiment, the uppermost surface of the upstream endless belt 33 wound around the upstream upper belt wheel 31 of the lower belt mechanism 30 is disposed substantially on the same plane as the transport surface PL of the substrate P. The gap S is formed between the lowermost surface of the upstream endless belt 23 wound around the upstream lower belt wheel 21 of the upper belt mechanism 20 and the upstream wound around the upstream upper belt wheel 31 of the lower belt mechanism 30. It is formed between the uppermost surface of the side endless belt 33. The gap S is preferably set to the thickness of the substrate P having the smallest thickness among the substrates P transported along the transport path. The gap S can also be adjusted as appropriate by changing the thickness of the shim 70.
[0031]
Next, the effect | action of the film peeling conveyance apparatus 100 comprised as mentioned above is demonstrated. Referring to FIGS. 1 to 3, one end of the upper and lower film is partially peeled off by the edge peeling means 4, and the substrate P is transported to an area where the upper belt mechanism 20 and the lower belt mechanism 30 exist. Then, the compressed air is blown from the upper air injection means 14 between the upper surface of the substrate P and the film partially peeled from one end portion (front end portion) of the upper surface. Thereby, peeling of the film is promoted and one end thereof is deflected upward. The film deflected upward is sandwiched between the endless belts 23 and 26 of the upper belt mechanism 20, and conveyed upward along the upper conveyance / conveying path 27. The film transported upward along the upper transport transport path 27 is transported upstream in the direction opposite to the transport direction F of the substrate P, and stored in a film container (not shown). On the other hand, the lower air injection is performed between the lower surface of the substrate P transported to the region where the upper belt mechanism 20 and the lower belt mechanism 30 exist and the film partially peeled from one end portion (front end portion) of the lower surface. Compressed air is blown from the means 16. Thereby, peeling of the film is promoted and one end thereof is deflected downward. The film deflected downward is sandwiched between the endless belts 33 and 36 of the lower belt mechanism 30, conveyed downward along the lower conveyance / unloading path 37, and accommodated in a film container (not shown). Is done. The substrate P from which the film has been completely peeled off from the upper surface and the lower surface is conveyed by a conveying roller 8 toward an apparatus (not shown) on the downstream side.
[0032]
A substrate P having substantially the same thickness as the gap S, that is, the substrate P having the minimum thickness, is transported to the transport path of the substrate P, and is wound around the upstream lower belt wheel 21 of the upper belt mechanism 20. Between the lowermost surface of the upstream endless belt 23 and the uppermost surface of the upstream endless belt 33 wound around the upstream upper belt wheel 31 of the lower belt mechanism 30 (part where the gap S is formed). , The gap between the upper surface of the substrate P and the lowermost surface of the upstream endless belt 23 becomes substantially zero, and the upstream lower belt wheel 21 of the upper belt mechanism 20 is pushed up by the substrate P. Does not occur substantially. Therefore, the upstream lower belt wheel 21 is not displaced while being positioned at the reference position, and the film is peeled and conveyed. Due to the fact that the gap between the upper surface of the substrate P and the lowermost surface of the upstream endless belt 23 is substantially zero, compressed air is transferred from the upper air injection means 14 and the lower air injection means 16 to the substrate P. The vibration of the substrate P due to an impact when sprayed between both surfaces and a film partially peeled from one end of the both surfaces is minimized or substantially prevented. As a result, smooth conveyance of the substrate P is guaranteed, and there is no possibility that the substrate P is damaged, and the quality of the substrate P is ensured.
[0033]
On the other hand, when the substrate P having a thickness exceeding the gap S is transported to the transport path of the substrate P, the upstream lower belt wheel 21 resists the spring force of the compression coil spring 60 by the pushing-up action of the substrate P. Then, the gap S is displaced upward in the downstream direction where the gap S is enlarged, and the conveyance of the substrate P is allowed. More specifically, when the substrate P having a thickness exceeding the gap S is transported to the transport path of the substrate P, the upstream lower belt wheel 21 causes each of the movable support members 44 to move up by the push-up action of the substrate P. However, it opposes the corresponding compression coil spring 60 and moves away from the movement restricting portion (inner side surface of the side wall 46c of the guide support frame 46 in the above embodiment) along the guide support rod 42 in the downstream direction. By being moved upward, it is displaced in the same direction. The gap between the upper surface of the substrate P and the lowermost surface of the upstream endless belt 23 of the upper belt mechanism 20 is not only maintained at zero, but is compressed as the amount of thickness exceeding the gap S increases. Since the spring force by the coil spring 60 increases, the nip force on the substrate P between the lowermost surface of the upstream endless belt 23 of the upper belt mechanism 20 and the uppermost surface of the upstream endless belt 33 of the lower belt mechanism 30 is increased. The film is peeled off and conveyed more firmly. Further, the compressed air from the upper air ejecting means 14 and the lower air ejecting means 16 is blown between the both surfaces of the substrate P and the film partially peeled off from one end of the both surfaces of the substrate P due to the impact. Vibration is minimized or substantially prevented. As a result, smooth conveyance of the substrate P is guaranteed, and there is no possibility that the substrate P is damaged, and the quality of the substrate P is ensured. As described above, the spring force by the compression coil spring 60 increases as the amount of the thickness of the substrate P exceeding the gap S increases, and the lowermost surface of the upstream endless belt 23 of the upper belt mechanism 20 and The nip force with respect to the substrate P between the uppermost endless belt 33 of the lower belt mechanism 30 and the substrate P increases, but the thickness of the substrate P also increases, so that the strength of the substrate P increases and the substrate P increases. There is no loss of rigidity.
[0034]
In the present invention, as described above, when the upstream lower belt wheel 21 of the upper belt mechanism 20 is displaced upward in the downstream direction, the tension of the upstream endless belt 23 is increased. That is, in the embodiment shown in FIG. 1, the downstream lower belt wheel 24 of the upper belt mechanism 20 is disposed at a position higher than the upstream lower belt wheel 21, and the upstream lower belt wheel 21 is described above. If the upper endless belt 23 is displaced upward in the downstream direction as described above, the outer periphery of the upstream endless belt 23 is the lower end portion on the downstream side and is higher than the region wound around the outer peripheral surface of the upstream lower belt wheel 21. The surface is brought into pressure contact with a partial region of the outer peripheral surface of the opposed downstream lower belt wheel 24 via a downstream endless belt 26 wound around the downstream lower belt wheel 24. By such an action, the nip force between the belts 23 and 26 increases particularly at the entrance portion of the film which is the lower end portion of the upstream endless belt 23 and the downstream endless belt 26 forming the film transport path 27. The film peeling action is promoted more smoothly and quickly and more effectively.
[0035]
As mentioned above, although the embodiment of the film peeling and conveying apparatus according to the present invention has been described, the present invention is not limited to the above embodiment, and various modifications or corrections can be made without departing from the scope of the present invention. is there. For example, as disclosed in Japanese Patent Application Laid-Open No. 10-120292, the upper belt mechanism is formed with an upper conveyance / unloading path that conveys the film upward and then unloads it in the substrate conveyance direction. There are things. In this upper belt mechanism, an upper conveyance / unloading path having a substantially inverted L shape is formed between the upstream endless belt and the downstream endless belt when the substrate conveyance path is viewed laterally. The present invention is also applied to a film peeling / conveying apparatus provided with such an upper belt mechanism. Therefore, the upper belt mechanism is not limited to the above-described embodiment, and the upstream lower belt wheel and the lower end are wound around the upstream lower belt wheel disposed closest to the substrate transport surface from above. An upstream endless belt extending upward, a downstream lower belt wheel disposed downstream of the upstream lower belt wheel, and a lower end wound around the downstream lower belt wheel and extending upward. And a downstream endless belt, and a film transport path is formed so that at least a lower end portion extends upward by cooperation of the belts.
[0036]
In the above embodiment, the gap S is set to the minimum thickness of the substrate P that is transported along the transport path. Therefore, when the substrate P having the minimum thickness is transported, the upper belt mechanism is used. Since the object of the present invention can be achieved without displacing the 20 upstream-side lower belt wheels 21, it is practically preferable because the operation is efficient and efficient. However, there may be other embodiments in which the gap S is set to substantially zero from the beginning. If the minimum thickness of the substrate P is relatively thick, the rigidity is not impaired, so this embodiment may be established. Therefore, the minimum gap S includes the case where it is substantially zero. In addition, it cannot be overemphasized that the thickness of the board | substrate P includes the stuck film. In the above embodiment, the clearance S is adjusted by adjusting the lower surface of both ends of the main body 44 a of the movable support member 44 and the side wall 46 c located obliquely below the side walls 46 b and 46 c of each of the guide support frames 46. Although it can be freely adjusted by changing the thickness of the shim 70 inserted between the inner surface and the inner surface, of course, the adjusting means for the gap S is not limited to the above embodiment. For example, instead of the shim 70, an appropriate screw member is provided on each of the guide support rods 42, and the end surface of the screw member is used as a movement restricting portion, or the lower end portion of each of the guide support rods 42 is movable. Other embodiments may be considered in which the movement restricting portion is in contact with the lower surface of both end portions of the main body portion 44a of the support member 44 to prevent downward movement. Furthermore, in the said embodiment, although the film is stuck on both surfaces of the board | substrate P, if it is the board | substrate P by which the film is stuck on at least one side, this invention is applicable. . Temporarily, in the film peeling apparatus in which only the substrate P on which the film is stuck on one side is transported, the lower belt mechanism 30, the lower air ejecting means 16, and the like are unnecessary. Instead of the upstream upper belt pulley 31, an appropriate conveying roller is disposed to face the upstream lower belt pulley 21 of the upper belt mechanism 20.
[0037]
【The invention's effect】
According to the film peeling and conveying apparatus configured according to the present invention, even if compressed air is blown from the air jetting unit between the substrate and the film partially peeled from one end, the vibration of the substrate is suppressed. Preventing, ensuring smooth transfer of the substrate and ensuring the quality of the substrate. Moreover, the peeling action of the film is promoted more smoothly and rapidly and more effectively.
[Brief description of the drawings]
FIG. 1 is a side view schematically showing a configuration of an embodiment of a film peeling / conveying apparatus configured according to the present invention, and a side view showing a part thereof in cross section.
FIG. 2 is a schematic view mainly showing a structure of a support portion of an upstream lower belt wheel of the upper belt mechanism shown in FIG. 1, and a part thereof is shown in a cross section along the moving direction of the upstream lower belt wheel; Schematic which shows the nip part of the upstream endless belt of an upper side belt mechanism, and the upstream endless belt of a lower side belt mechanism in the cross section of a perpendicular direction.
3 is a schematic view mainly showing the structure of the support portion of the upstream lower belt pulley of the upper belt mechanism shown in FIG. 1, and a part of it is another cross-section along the moving direction of the upstream lower belt pulley. The schematic diagram which shows and shows the nip part of the upstream endless belt of an upper side belt mechanism and the upstream endless belt of a lower side belt mechanism in the cross section of a perpendicular direction.
[Explanation of symbols]
10 Upper film peeling conveyance means
12 Lower film peeling and conveying means
14 Upper air injection means
16 Lower air injection means
20 Upper belt mechanism
21 Upper side lower belt car
21a Rotating shaft
23 Upstream endless belt
24 Downstream lower belt car
26 Endless belt on the downstream side
27 Film transport path
30 Lower belt mechanism
31 Upstream upper belt car
33 Upstream endless belt
37 Film transport path
40 side frame
42 Guide support rod
44 Movable support member
50 Retainer member
60 compression coil spring
100 Film peeling and conveying device
F Transport direction of substrate P
P substrate
Transfer surface of PL substrate

Claims

At least one end of the film adhered to one side of the substrate is provided with peeling means for completely peeling the film from the substrate, and the peeling means moves the partially peeled film upward from the substrate. The upper film peeling / conveying means includes an upper belt mechanism disposed above the substrate conveying path, and the upper belt mechanism is the An upstream lower belt wheel disposed close to the upstream lower belt wheel with its lower end wound around the upstream lower belt wheel and extending upward, and disposed downstream of the upstream lower belt wheel A downstream lower belt wheel, and a downstream endless belt having a lower end wound around the downstream lower belt wheel and extending upward. In film peeling feeder film transport path is formed to extend towards,
The upstream lower belt wheel is supported in a freely displaceable manner and is positioned by a spring means at a reference position where the gap between the lowermost surface of the upstream endless belt and the substrate transport surface is minimized. When the substrate having a thickness exceeding the gap is transported, the upstream lower belt wheel is displaced upward in the downstream direction where the gap is enlarged against the spring means by the pushing-up action of the substrate. Substrate transport is allowed,
A film peeling and conveying apparatus characterized by that.

2. The film according to claim 1, wherein the upstream lower belt wheel is movably supported by the stationary frame means via the movable support means, and the spring means is disposed between the stationary frame means and the movable support means. Peeling and conveying device.

The upstream lower belt wheel is disposed on a rotating shaft extending in the width direction of the substrate conveyance path, and the stationary frame means includes side frames installed on both sides sandwiching the substrate conveyance path in the width direction, The movable support means includes a guide support means provided on each of the side frames, and a movable support member supported movably on each of the guide support means, and both ends of the rotation shaft of the upstream lower belt wheel are Each of the guide support means is provided with a movement restricting portion for restricting the movement of the corresponding movable support member, and the spring means is connected to each of the side frames. The upstream lower belt wheel is positioned at the reference position by the spring means pressing the corresponding movable support member against the movement restricting portion, and the gap is placed in the transport path of the substrate. When a substrate having a thickness exceeding The upstream lower belt wheel is moved upward in the downstream direction along the guide support means so that each of the movable support members is separated from the movement restricting portion against the corresponding spring means by the push-up action of the substrate. The film peeling conveyance apparatus of Claim 2 displaced by the same direction.

The film peeling conveyance apparatus of any one of Claims 1-3 with which the tension | tensile_strength of an upstream endless belt is made to increase, if an upstream lower belt wheel is displaced to upper direction downstream.

The downstream lower belt wheel is arranged at a position higher than the upstream lower belt wheel, and when the upstream lower belt wheel is displaced upward in the downstream direction, it is the downstream lower end of the upstream endless belt and The outer peripheral surface in the region above the outer peripheral surface of the side lower belt wheel is wound on the downstream lower belt wheel in a partial region of the outer peripheral surface of the opposed downstream lower belt wheel. The film peeling / conveying device according to claim 4, wherein the film peeling / conveying device is pressed through a downstream endless belt.

The peeling means includes a lower film peeling / conveying means for forcibly conveying the partially peeled film downward from the substrate, and the lower film peeling / conveying means is a lower belt disposed below the conveyance path of the substrate. The lower belt mechanism includes an upstream upper belt wheel disposed closest to the substrate conveyance surface from below, and an upstream lower belt disposed below the upstream upper belt wheel. A vehicle, a downstream upper belt wheel disposed downstream of the upstream upper belt wheel, a downstream lower belt wheel spaced below the downstream upper belt wheel, and the upstream belt wheel An upstream endless belt including a wound upstream endless belt and a downstream endless belt wound between the downstream belt wheels, and a film transport path extending downward by the cooperation of each of the belts is formed. The uppermost surface of the upstream endless belt wound around the vehicle is disposed substantially on the same plane as the substrate conveying surface, and the gap is formed between the lowermost surface of the upstream endless belt of the upper belt mechanism and the lower belt. The film peeling conveyance apparatus of any one of Claims 1-5 formed between the uppermost surfaces of the upstream endless belt of a mechanism.