JP4006019B2 - Chlorine dioxide production method - Google Patents
Chlorine dioxide production method Download PDFInfo
- Publication number
- JP4006019B2 JP4006019B2 JP2003506799A JP2003506799A JP4006019B2 JP 4006019 B2 JP4006019 B2 JP 4006019B2 JP 2003506799 A JP2003506799 A JP 2003506799A JP 2003506799 A JP2003506799 A JP 2003506799A JP 4006019 B2 JP4006019 B2 JP 4006019B2
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- chlorine dioxide
- eductor
- acid
- spiral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- OSVXSBDYLRYLIG-UHFFFAOYSA-N dioxidochlorine(.) Chemical compound O=Cl=O OSVXSBDYLRYLIG-UHFFFAOYSA-N 0.000 title claims abstract description 114
- 239000004155 Chlorine dioxide Substances 0.000 title claims abstract description 57
- 235000019398 chlorine dioxide Nutrition 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 44
- XTEGARKTQYYJKE-UHFFFAOYSA-M chlorate Inorganic materials [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 33
- 239000007864 aqueous solution Substances 0.000 claims abstract description 25
- 239000002253 acid Substances 0.000 claims abstract description 20
- -1 chlorate ions Chemical class 0.000 claims abstract description 20
- 230000008569 process Effects 0.000 claims abstract description 16
- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical class Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 claims abstract description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229910052783 alkali metal Inorganic materials 0.000 claims description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 7
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 7
- 239000011707 mineral Substances 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 6
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- 239000008139 complexing agent Substances 0.000 claims description 5
- 239000006260 foam Substances 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- 229940123457 Free radical scavenger Drugs 0.000 claims description 4
- 239000002516 radical scavenger Substances 0.000 claims description 4
- 239000000084 colloidal system Substances 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 229940005989 chlorate ion Drugs 0.000 claims 1
- 239000000047 product Substances 0.000 description 12
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000000376 reactant Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 4
- 229940005991 chloric acid Drugs 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 238000004061 bleaching Methods 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000012429 reaction media Substances 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000004801 Chlorinated PVC Substances 0.000 description 2
- 229920001780 ECTFE Polymers 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 229920000457 chlorinated polyvinyl chloride Polymers 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000004076 pulp bleaching Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- GPCTYPSWRBUGFH-UHFFFAOYSA-N (1-amino-1-phosphonoethyl)phosphonic acid Chemical compound OP(=O)(O)C(N)(C)P(O)(O)=O GPCTYPSWRBUGFH-UHFFFAOYSA-N 0.000 description 1
- RXLKNGUPUSHCLQ-UHFFFAOYSA-N (dimethylamino)methyl-[hydroxy(methyl)phosphoryl]oxyphosphinic acid Chemical compound CN(C)CP(=O)(O)OP(=O)(O)C RXLKNGUPUSHCLQ-UHFFFAOYSA-N 0.000 description 1
- CHJAYYWUZLWNSQ-UHFFFAOYSA-N 1-chloro-1,2,2-trifluoroethene;ethene Chemical group C=C.FC(F)=C(F)Cl CHJAYYWUZLWNSQ-UHFFFAOYSA-N 0.000 description 1
- 241000609240 Ambelania acida Species 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- 239000004812 Fluorinated ethylene propylene Substances 0.000 description 1
- RHZZEXPAZIBIPM-UHFFFAOYSA-N NCP(=O)(O)OP(=O)O Chemical compound NCP(=O)(O)OP(=O)O RHZZEXPAZIBIPM-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920001774 Perfluoroether Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 1
- KVUUQMDVROTSNI-UHFFFAOYSA-N [morpholin-4-yl(phosphono)methyl]phosphonic acid Chemical compound OP(O)(=O)C(P(O)(O)=O)N1CCOCC1 KVUUQMDVROTSNI-UHFFFAOYSA-N 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012431 aqueous reaction media Substances 0.000 description 1
- 239000010905 bagasse Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 description 1
- DUYCTCQXNHFCSJ-UHFFFAOYSA-N dtpmp Chemical compound OP(=O)(O)CN(CP(O)(O)=O)CCN(CP(O)(=O)O)CCN(CP(O)(O)=O)CP(O)(O)=O DUYCTCQXNHFCSJ-UHFFFAOYSA-N 0.000 description 1
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920009441 perflouroethylene propylene Polymers 0.000 description 1
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical class OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
- B01F23/23763—Chlorine or chlorine containing gases
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B11/00—Oxides or oxyacids of halogens; Salts thereof
- C01B11/02—Oxides of chlorine
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B11/00—Oxides or oxyacids of halogens; Salts thereof
- C01B11/02—Oxides of chlorine
- C01B11/022—Chlorine dioxide (ClO2)
- C01B11/023—Preparation from chlorites or chlorates
- C01B11/026—Preparation from chlorites or chlorates from chlorate ions in the presence of a peroxidic compound, e.g. hydrogen peroxide, ozone, peroxysulfates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
- B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
- B01F23/237612—Oxygen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
- B01F25/3121—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof with additional mixing means other than injector mixers, e.g. screens, baffles or rotating elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
- B01F25/3124—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characterised by the place of introduction of the main flow
- B01F25/31243—Eductor or eductor-type venturi, i.e. the main flow being injected through the venturi with high speed in the form of a jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/70—Spray-mixers, e.g. for mixing intersecting sheets of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00162—Controlling or regulating processes controlling the pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00164—Controlling or regulating processes controlling the flow
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Geology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Paper (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
- Food Preservation Except Freezing, Refrigeration, And Drying (AREA)
- Carbon And Carbon Compounds (AREA)
- Compounds Of Unknown Constitution (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
本発明は塩素酸イオン、酸及び過酸化水素からの二酸化塩素の製造方法に関する。 The present invention relates to a method for producing chlorine dioxide from chlorate ions, acid and hydrogen peroxide.
二酸化塩素は種々の用途、例えば、パルプ漂白、脂肪漂白、水精製及び工業廃棄物からの有機物質の除去に使用される。二酸化塩素は貯蔵安定ではないので、それは現場で生成される必要がある。 Chlorine dioxide is used in a variety of applications, such as pulp bleaching, fat bleaching, water purification and removal of organic materials from industrial waste. Since chlorine dioxide is not storage stable, it needs to be produced in situ.
二酸化塩素は通常アルカリ金属塩素酸塩又は塩素酸を水性反応媒体中で還元剤と反応させることにより生成される。二酸化塩素は、米国特許第5091166号、同第5091167号及びEP特許第612686号に記載された方法のように、ガスとして反応媒体から取り出されてもよい。通常、二酸化塩素ガスはその後に水に吸収されてその水溶液を生成する。 Chlorine dioxide is usually produced by reacting an alkali metal chlorate or chloric acid with a reducing agent in an aqueous reaction medium. Chlorine dioxide may be removed from the reaction medium as a gas, as in the methods described in US Pat. Nos. 5,091,166, 5,091,167 and EP Pat. No. 6,126,686. Normally, chlorine dioxide gas is then absorbed into water to produce its aqueous solution.
小規模ユニット、例えば、水精製用途又は小さい漂白プラントのための二酸化塩素の製造について、二酸化塩素ガスを反応媒体から分離しないが、必要により水による希釈後に、二酸化塩素含有溶液を反応器から直接回収することが有利である。このような方法が米国特許第2833624号、同第4534952号、同第5895638号及びWO 00/76916に記載されており、近年商用になりつつある。しかしながら、更なる改良についての要望が依然としてある。特に、リサイクル紙漂白、バガス漂白、又は小規模のパルプ漂白のような或る用途に必要とされるような充分に高い濃度の二酸化塩素を含む溶液を得ることは困難とわかった。また、高濃度の二酸化塩素は水流量を最小にすることが重要であるあらゆる用途に有益であり得る。 For the production of chlorine dioxide for small scale units, eg water purification applications or small bleach plants, chlorine dioxide gas is not separated from the reaction medium, but the chlorine dioxide-containing solution is recovered directly from the reactor, if necessary after dilution with water It is advantageous to do so. Such methods are described in U.S. Pat. Nos. 2,833,624, 4,534,952, 5,895,638 and WO 00/76916, which are becoming commercially available in recent years. However, there is still a need for further improvements. In particular, it has proved difficult to obtain solutions containing sufficiently high concentrations of chlorine dioxide as required for certain applications such as recycled paper bleaching, bagasse bleaching, or small scale pulp bleaching. Also, high concentrations of chlorine dioxide can be beneficial in any application where it is important to minimize water flow.
本発明の目的は高濃度の水溶液中の二酸化塩素の直接生成を可能にする方法を提供することである。 The object of the present invention is to provide a method which allows the direct production of chlorine dioxide in a highly concentrated aqueous solution.
本発明の別の目的は高い生産能力による水溶液中の二酸化塩素の直接生成方法を提供することである。 Another object of the present invention is to provide a method for the direct production of chlorine dioxide in aqueous solution with high production capacity.
本発明の更に別の目的はその方法を行なうための装置を提供することである。 Yet another object of the present invention is to provide an apparatus for performing the method.
驚くことに、
塩素酸イオン、酸及び過酸化水素を水溶液として反応器に供給する工程、
塩素酸イオンを反応器中で二酸化塩素に還元し、それにより二酸化塩素を含む生成物流を反応器中で生成する工程、
動機水をノズルを含むエダクターに供給する工程、
動機水をノズル中に流入させ、それを更に少なくとも部分的に、好ましくは実質的に、渦巻き又はらせん様式でエダクター中に流入させる工程、
生成物流を反応器からエダクターに移し、それを動機水と混合し、それにより二酸化塩素を含む希釈された水溶液を生成する工程、及び
二酸化塩素を含む希釈された水溶液をエダクターから取り出す工程
を含むことを特徴とする二酸化塩素の連続製造方法を提供することによりこれらの目的を満足することがわかった。
Surprisingly
Supplying chlorate ions, acid and hydrogen peroxide as an aqueous solution to the reactor;
Reducing chlorate ions to chlorine dioxide in the reactor, thereby producing a product stream containing chlorine dioxide in the reactor;
Supplying motive water to the eductor including the nozzle;
Allowing motive water to flow into the nozzle, which further flows at least partially, preferably substantially, into the eductor in a spiral or spiral manner;
Transferring the product stream from the reactor to an eductor, mixing it with motive water, thereby producing a diluted aqueous solution containing chlorine dioxide, and removing the diluted aqueous solution containing chlorine dioxide from the eductor. It was found that these objectives were satisfied by providing a continuous process for producing chlorine dioxide characterized by
塩素酸イオンは塩素酸及び/又は金属塩素酸塩、好ましくはアルカリ金属塩素酸塩を含む水溶液として反応器に供給し得る。アルカリ金属は、例えば、ナトリウム、カリウム又はこれらの混合物であってもよく、これらのうちでナトリウムが最も好ましい。塩素酸が使用されない限り、別の酸、好ましくは鉱酸、例えば、硫酸、塩酸又は硝酸が反応器に供給される必要があり、これらのうちで硫酸が最も好ましい。反応器に供給されるH2O2対ClO3 −のモル比は好適には約0.2:1〜約2:1、好ましくは約0.5:1〜約1.5:1、最も好ましくは約0.5:1〜約1:1である。金属塩素酸塩及び塩素酸は常に不純物として若干の塩化物を含むが、一層多い塩化物、例えば、金属塩化物又は塩酸を反応器に供給することがまた充分に可能である。しかしながら、塩素の生成を最小にするために、反応器に供給される塩化物イオンの量を低く、好適には約1モル%以下、好ましくは約0.1モル%以下、更に好ましくは約0.05モル%以下、最も好ましくは約0.02モル%以下のClO3 −のCl−に保つことが好ましい。 Chloric acid ions can be supplied to the reactor as an aqueous solution containing chloric acid and / or metal chlorate, preferably alkali metal chlorate. The alkali metal may be, for example, sodium, potassium or a mixture thereof, among which sodium is most preferred. Unless chloric acid is used, another acid, preferably a mineral acid, such as sulfuric acid, hydrochloric acid or nitric acid needs to be fed to the reactor, of which sulfuric acid is most preferred. The molar ratio of H 2 O 2 to ClO 3 — fed to the reactor is suitably about 0.2: 1 to about 2: 1, preferably about 0.5: 1 to about 1.5: 1, most Preferably from about 0.5: 1 to about 1: 1. Metal chlorates and chloric acids always contain some chloride as an impurity, but it is also possible to supply more chloride, for example metal chloride or hydrochloric acid, to the reactor. However, to minimize chlorine production, the amount of chloride ions fed to the reactor is low, suitably about 1 mol% or less, preferably about 0.1 mol% or less, more preferably about 0 mol%. It is preferred to keep the ClO 3 − Cl − at 0.05 mol% or less, most preferably at about 0.02 mol% or less.
特に好ましい実施態様において、アルカリ金属塩素酸塩及び過酸化水素が予備混合された水溶液、例えば、WO 00/76916(これは参考として本明細書に含まれる)に記載されたような組成物の形態で反応器に供給される。このような組成物は約1〜約6.5モル/リットル、好ましくは約3〜約6モル/リットルのアルカリ金属塩素酸塩、約1〜約7モル/リットル、好ましくは約3〜約5モル/リットルの過酸化水素及び保護コロイド、遊離基脱除剤又はホスホン酸をベースとする錯生成剤の少なくとも一種を含む水溶液であってもよく、その水溶液のpHは好適には約0.5から約4まで、好ましくは約1から約3.5まで、最も好ましくは約1.5から約3までである。好ましくは、少なくとも一種のホスホン酸をベースとする錯生成剤が約0.1〜約5ミリモル/リットル、最も好ましくは約0.5〜約3ミリモル/リットルの量で存在する。保護コロイドが存在する場合、その濃度は好ましくは約0.001〜約0.5モル/リットル、最も好ましくは約0.02〜約0.05モル/リットルである。遊離基脱除剤が存在する場合、その濃度は好ましくは約0.01〜約1モル/リットル、最も好ましくは約0.02〜約0.2モル/リットルである。特に好ましい組成物は1−ヒドロキシエチリデン−1,1−ジホスホン酸、1−アミノエタン−1,1−ジホスホン酸、アミノトリ(メチレンホスホン酸)、エチレンジアミンテトラ(メチレンホスホン酸)、ヘキサメチレンジアミンテトラ(メチレンホスホン酸)、ジエチレントリアミンペンタ(メチレンホスホン酸)、ジエチレントリアミンヘキサ(メチレンホスホン酸)、及び1−アミノアルカン−1,1−ジホスホン酸、例えば、モルホリノメタンジホスホン酸、N,N−ジメチルアミノジメチルジホスホン酸、アミノメチルジホスホン酸、又はこれらの塩、好ましくはナトリウム塩からなる群から選ばれた少なくとも一種のホスホン酸をベースとする錯生成剤を含む。有益な保護コロイドとして、スズ化合物、例えば、アルカリ金属スタネート、特にナトリウムスタネート(Na2(Sn(OH)6)が挙げられる。有益な遊離基脱除剤として、ピリジンカルボン酸、例えば、2,6−ピリジンジカルボン酸が挙げられる。好適には、塩化物イオンの量は約50ミリモル/リットル以下、好ましくは約5ミリモル/リットル以下、最も好ましくは約0.5ミリモル/リットル以下である。 In a particularly preferred embodiment, an aqueous solution premixed with alkali metal chlorate and hydrogen peroxide, for example in the form of a composition as described in WO 00/76916, which is hereby incorporated by reference. Is fed to the reactor. Such compositions have from about 1 to about 6.5 mol / liter, preferably from about 3 to about 6 mol / liter of alkali metal chlorate, from about 1 to about 7 mol / liter, preferably from about 3 to about 5 It may be an aqueous solution containing at least one mole / liter of hydrogen peroxide and a protective colloid, a free radical scavenger or a complexing agent based on phosphonic acid, and the pH of the aqueous solution is preferably about 0.5. To about 4, preferably from about 1 to about 3.5, and most preferably from about 1.5 to about 3. Preferably, at least one phosphonic acid based complexing agent is present in an amount of about 0.1 to about 5 mmol / liter, most preferably about 0.5 to about 3 mmol / liter. When present, the concentration is preferably from about 0.001 to about 0.5 mole / liter, most preferably from about 0.02 to about 0.05 mole / liter. When a free radical scavenger is present, its concentration is preferably from about 0.01 to about 1 mole / liter, most preferably from about 0.02 to about 0.2 mole / liter. Particularly preferred compositions are 1-hydroxyethylidene-1,1-diphosphonic acid, 1-aminoethane-1,1-diphosphonic acid, aminotri (methylenephosphonic acid), ethylenediaminetetra (methylenephosphonic acid), hexamethylenediaminetetra (methylenephosphonic). Acid), diethylenetriaminepenta (methylenephosphonic acid), diethylenetriaminehexa (methylenephosphonic acid), and 1-aminoalkane-1,1-diphosphonic acid, such as morpholinomethane diphosphonic acid, N, N-dimethylaminodimethyldiphosphonic acid A complexing agent based on at least one phosphonic acid selected from the group consisting of, aminomethyldiphosphonic acid, or salts thereof, preferably sodium salts. Useful protective colloids include tin compounds such as alkali metal stannates, particularly sodium stannate (Na 2 (Sn (OH) 6 ). Useful free radical scavengers include pyridine carboxylic acids such as 2, Preferably, the amount of chloride ions is about 50 millimoles / liter or less, preferably about 5 millimoles / liter or less, and most preferably about 0.5 millimoles / liter or less.
硫酸が供給原料として使用される場合には、それは好ましくは約70〜約96重量%、最も好ましくは約75〜約85重量%の濃度及び好ましくは約0〜約80℃、最も好ましくは約20〜約60℃の温度を有する。何とならば、その方法を実質的に断熱的に操作することが可能であり得るからである。好ましくは約2〜約6kgのH2SO4、最も好ましくは約3〜約5kgのH2SO4が生成されるClO21kg当りに供給される。また、当量の別の鉱酸が使用されてもよい。 When sulfuric acid is used as the feed, it preferably has a concentration of about 70 to about 96% by weight, most preferably about 75 to about 85% by weight and preferably about 0 to about 80 ° C., most preferably about 20 It has a temperature of ~ 60 ° C. This is because it may be possible to operate the process substantially adiabatically. Preferably about 2 to about 6 kg of H 2 SO 4 , most preferably about 3 to about 5 kg of H 2 SO 4 are fed per kg of ClO 2 produced. An equivalent amount of another mineral acid may also be used.
二酸化塩素生成をもたらす正味の反応は下記の式により記載し得る。
2ClO3 −+2H++H2O2→2ClO2+2H2O+O2
The net reaction leading to chlorine dioxide production can be described by the following equation:
2ClO 3 − + 2H + + H 2 O 2 → 2ClO 2 + 2H 2 O + O 2
その正確なメカニズムは複雑であり、二酸化塩素及び塩素を生じるための塩素酸塩と塩化物(たとえ別々に添加されないとしても、塩素酸塩中に不純物として充分な量で常に存在する)の間の最初の反応、続いて塩化物に戻る過酸化水素との塩素の反応を伴うと考えられる。しかしながら、正味の反応を考慮して、過酸化水素は通常塩素酸イオンと反応する還元剤と見なされる。 Its exact mechanism is complex, between chlorate and chloride to yield chlorine dioxide and chlorine (although always present in chlorate as a sufficient amount of impurities, even if not added separately) It is believed to involve an initial reaction followed by a reaction of chlorine with hydrogen peroxide back to chloride. However, in view of the net reaction, hydrogen peroxide is usually regarded as a reducing agent that reacts with chlorate ions.
二酸化塩素への塩素酸イオンの還元は、通常液体と泡の両方を含み、また二酸化塩素、酸素及び殆どの場合には或る種の残存する未反応の供給薬品を含む、反応器中の生成物流の生成をもたらす。二酸化塩素及び酸素は液体中に溶解されたもの及び気泡の両方として存在し得る。金属塩素酸塩及び鉱酸が供給薬品として使用される場合、生成物流は、二酸化塩素及び酸素の他に、鉱酸の金属塩そして通常また残存金属塩素酸塩及び鉱酸を含むであろう。約75%〜100%、好ましくは約80〜100%、最も好ましくは約95〜100%の塩素酸イオンから二酸化塩素への転化率を得ることが可能とわかった。 Reduction of chlorate ions to chlorine dioxide usually involves both liquid and foam, and production in the reactor containing chlorine dioxide, oxygen and in some cases some remaining unreacted feed chemical. Bring about the generation of logistics. Chlorine dioxide and oxygen can exist both as dissolved in the liquid and as bubbles. When metal chlorates and mineral acids are used as feed chemicals, the product stream will contain metal salts of mineral acids and usually also residual metal chlorates and mineral acids in addition to chlorine dioxide and oxygen. It has been found possible to obtain a conversion of chlorate ions to chlorine dioxide of about 75% to 100%, preferably about 80 to 100%, most preferably about 95 to 100%.
反応器中の温度は行き渡っている圧力で反応体及び生成物流の沸点以下、好ましくは約20〜約80℃、最も好ましくは約30〜約60℃に維持されることが好適である。反応器内で維持される圧力は好適にはわずかに大気圧以下、好ましくは約30〜約100kPa(絶対圧)、最も好ましくは約65〜約95kPa(絶対圧)である。 It is preferred that the temperature in the reactor be maintained below the boiling point of the reactants and product stream at prevailing pressure, preferably from about 20 to about 80 ° C, and most preferably from about 30 to about 60 ° C. The pressure maintained in the reactor is suitably slightly below atmospheric pressure, preferably about 30 to about 100 kPa (absolute pressure), most preferably about 65 to about 95 kPa (absolute pressure).
反応器は、例えば、垂直、水平又は傾斜して配置された1個又は数個の容器を含んでもよい。反応体は反応器に直接に、又は別個の混合装置を介して供給されてもよい。好適には、反応器は好ましくは実質的に管状のスルーフロー容器又はパイプであり、最も好ましくは反応体を実質的に一様な様式で混合するための装置を含む。このような装置はアパーチャを備え、かつ反応器内に配置されたディスク等を含んでもよく、金属塩素酸塩及び過酸化水素がそのディスクの下流に供給され、一方、酸がディスクの上流に供給され、アパーチャを通って流入させられ、次いで金属塩素酸塩及び過酸化水素と混合させられる。このような配置は一様な混合及びその方法の安定な操作だけでなく、特に上向きの主たる流れ方向と実質的に垂直に配置された反応器中で、維持された高い薬品効率でもって生産速度を変える能力を与えることがわかった。しかしながら、反応体の一種、例えば、酸を別の反応体又は反応体の混合物、例えば、金属塩素酸塩と過酸化水素の混合物用の供給配管に単に供給することがまた可能である。 The reactor may comprise, for example, one or several containers arranged vertically, horizontally or inclined. The reactants may be fed directly to the reactor or via a separate mixing device. Suitably, the reactor is preferably a substantially tubular through-flow vessel or pipe and most preferably includes an apparatus for mixing the reactants in a substantially uniform manner. Such an apparatus may include a disk or the like with an aperture and disposed in the reactor, where metal chlorate and hydrogen peroxide are fed downstream of the disk, while acid is fed upstream of the disk. And flowed through the aperture and then mixed with the metal chlorate and hydrogen peroxide. Such an arrangement provides not only uniform mixing and stable operation of the process, but also a production rate with a high chemical efficiency maintained, especially in a reactor arranged substantially perpendicular to the upward main flow direction. It was found to give the ability to change. However, it is also possible to simply supply one type of reactant, for example an acid, to a supply line for another reactant or mixture of reactants, for example a mixture of metal chlorate and hydrogen peroxide.
使用される反応器の長さ(主たる流れ方向の)は好ましくは約50〜約800mm、最も好ましくは約350〜約650mmである。約25〜約300mm、好ましくは約70〜約200mmの内径を有する実質的に管状の反応器を使用することが有利とわかった。約12:1〜約1:1、最も好ましくは約8:1〜約4:1の長さ対内径の好ましい比を有する実質的に管状の反応器を使用することが特に有利である。反応器中の好適な平均滞留時間は殆どの場合に約1〜約1000秒、好ましくは約2〜約40秒である。 The length of the reactor used (in the main flow direction) is preferably from about 50 to about 800 mm, most preferably from about 350 to about 650 mm. It has been found advantageous to use a substantially tubular reactor having an inner diameter of about 25 to about 300 mm, preferably about 70 to about 200 mm. It is particularly advantageous to use a substantially tubular reactor having a preferred length to inner diameter ratio of about 12: 1 to about 1: 1, most preferably about 8: 1 to about 4: 1. A suitable average residence time in the reactor is in most cases from about 1 to about 1000 seconds, preferably from about 2 to about 40 seconds.
エダクターはあらゆる液体、泡及びガスをその中に含む、生成物流をエダクターに流入させ、動機水と混合させて二酸化塩素を含む希釈された溶液を生成する吸引力を生じる。動機水はあらゆる好適な装置、例えば、捻り羽根、内部旋条等(これらは一体であってもよく、又はノズルから分離してもよく、その内部又は上流に配置されてもよい)により少なくとも部分的に渦巻き又はらせん様式で流入させられる。ノズルはあらゆる好適な型のものであってもよく、1個又は数個の穴を含んでもよい。 The eductor, which contains any liquid, foam and gas, flows the product stream into the eductor and creates a suction force that mixes with the motive water to produce a diluted solution containing chlorine dioxide. The motive water is at least partly provided by any suitable device, such as twisted blades, internal slews, etc. (which may be integral or separated from the nozzle and located in or upstream thereof) In a spiral or spiral fashion. The nozzle may be of any suitable type and may include one or several holes.
エダクターは好適には、ノズルからの流れ方向に、吸引チャンバー(その中に、生成物流が反応器から移される)、及びベンチュリ部分(それを通って、このような場合に二酸化塩素を含む希釈された水溶液が取り出される)を更に含む。 The eductor is preferably diluted in the direction of flow from the nozzle, into which a suction chamber (in which the product stream is transferred from the reactor) and a venturi section (through which in this case chlorine dioxide is contained). The aqueous solution is removed).
動機水の少なくとも部分的に渦巻き又はらせんの流れは所定の動機水の流れについて二酸化塩素の生産能力を増大し、こうして従来二酸化塩素ガスを反応媒体から分離し、次いでそれを水に吸収すること(本発明では行なう必要のない工程)のみにより可能であったことよりも高い二酸化塩素濃度を有する生成物溶液の製造を可能にすることがわかった。こうして、約1〜約4g/リットルの二酸化塩素、好ましくは約1.5〜約3.5g/リットルの二酸化塩素を含む水溶液を生成することが可能である。 The at least partially swirl or spiral flow of motive water increases the chlorine dioxide production capacity for a given motive water flow, thus separating conventional chlorine dioxide gas from the reaction medium and then absorbing it into the water ( It has been found that the present invention makes it possible to produce a product solution having a higher chlorine dioxide concentration than was possible only by a process that does not need to be carried out. Thus, it is possible to produce an aqueous solution containing about 1 to about 4 g / liter of chlorine dioxide, preferably about 1.5 to about 3.5 g / liter of chlorine dioxide.
本発明の方法は小規模、例えば、一つの反応器中で約0.1〜約100kg/時間、好ましくは約0.1〜約50kg/時間の二酸化塩素の製造に特に適している。多くの用途について、好ましい二酸化塩素生成速度は一つの反応器中で約0.1〜約25kg/時間、最も好ましくは約0.5〜約10kg/時間である。典型的な小規模製造ユニットは通常唯一の反応器を含むが、数個、例えば、約15個以上までの反応器を、例えば、管の束のように、平行に配置することが可能である。 The process of the invention is particularly suitable for the production of chlorine dioxide on a small scale, for example about 0.1 to about 100 kg / hour, preferably about 0.1 to about 50 kg / hour in one reactor. For many applications, the preferred chlorine dioxide production rate is about 0.1 to about 25 kg / hour, most preferably about 0.5 to about 10 kg / hour in one reactor. A typical small-scale production unit usually contains only one reactor, but it is possible to arrange several reactors, for example up to about 15 or more, in parallel, for example like a bundle of tubes. .
更に、本発明は上記方法に従って二酸化塩素を製造するための装置に関する。その装置は塩素酸イオン、過酸化水素及び酸用の供給配管を備えた反応器を含み、その反応器が動機水用のノズル及び動機水を少なくとも部分的に渦巻き又はらせん様式でエダクター中に更に流入させるための装置を備えたエダクターに連結される。 Furthermore, the invention relates to an apparatus for producing chlorine dioxide according to the above method. The apparatus includes a reactor with supply piping for chlorate ions, hydrogen peroxide and acid, the reactor further including a nozzle for motive water and motive water at least partially in an eductor in a spiral or spiral fashion. Connected to an eductor with a device for inflow.
装置の好ましい実施態様は方法の先の記載及び図面を参照する以下の記載から明らかである。しかしながら、本発明は図面に示された実施態様に限定されるべきではなく、特許請求の範囲内の多くのその他の変化を含む。 Preferred embodiments of the device are evident from the previous description of the method and the following description with reference to the drawings. However, the invention should not be limited to the embodiments shown in the drawings, but includes many other variations within the scope of the claims.
図1を参照して、垂直のスルーフロー管状反応器3に供給配管1を通って硫酸そして配管2を通って塩素酸ナトリウム及び過酸化水素の予備混合された水溶液が供給される。反応器3中で、供給原料流が混合され、反応させられて二酸化塩素、酸素、硫酸ナトリウム及び若干の残存硫酸及び塩素酸ナトリウムを含む液体、泡及びガスの生成物流を生成する。エダクター6に、供給配管5を通って動機水が供給され、生成物流を反応器3から配管4を通ってエダクター6に押しやるわずかに大気圧以下の圧力を生じ、そこでそれが動機水と混合されて希釈された生成物水溶液を生成する。この希釈された溶液は反応器3からの二酸化塩素及びその他の成分を含み、配管8を通って最終生成物として取り出される。プログラム可能な論理制御装置(PLC)、二酸化塩素分析装置9、圧力トランスミッター(PT)及び流量トランスミッター(FT)を含むプロセス制御システムが、反応器3への薬品及びエダクター6への動機水用の供給ポンプ10を制御する。
Referring to FIG. 1, a vertical through-flow
図2を参照して、アパーチャを備えた分配ディスク21が反応器3の下部に配置されるが、硫酸用の供給配管1からの入口の上に配置される。予備混合された塩素酸ナトリウム及び過酸化水素溶液用の供給配管2は分配ディスクの丁度上の反応器の断面の中央に配置された分配ノズル20中で終端する。次いで塩素酸ナトリウム及び過酸化水素溶液が反応器3内の断面にわたって噴霧され、一方、硫酸が分配ディスク中のアパーチャを通って上向きに流れ、分配ディスク21の上で塩素酸ナトリウム及び過酸化水素と混合される。混合後に、二酸化塩素を生じる反応が開始し、液体、泡及びガスの生成物流を生じ、その流れが反応器3の上部で出口22を通って取り出される。
Referring to FIG. 2, a
図3a及び3bを参照して、エダクター6は吸引チャンバー25、捻り羽根28を含むインサート27(ノズルを通して見た図3bに示される)を有する一つの穴ノズル26、及びベンチュリ部分29を含む。動機水が供給配管5からノズル26及びインサート27を通って供給される。インサート27の捻り羽根28は水を更に吸引チャンバー25中に少なくとも部分的に渦巻き又はらせん様式で流入させ、そこでそれが反応器3(図1を参照のこと)から配管4中を流れている生成物流と混合されてベンチュリ部分29を通ってエダクター6から排出される希釈された二酸化塩素含有溶液を生成する。エダクター中の流れは生成物流を反応器からエダクターに流入するように強制するのに充分な大気圧以下の圧力を生じる。
Referring to FIGS. 3 a and 3 b, the eductor 6 includes a
反応器3及びエダクター6を含む、プロセス装置は、過酸化水素、塩素酸ナトリウム、硫酸及び二酸化塩素に耐性の材料からつくられることが好適である。このような材料として、例えば、ガラス、タンタル、チタン、ガラス繊維強化プラスチック、PVDF(ポリフッ化ビニリデン)、CPVC(塩素化ポリ塩化ビニル)、PTFE(ポリテトラフルオロエチレン)、PFA(ペルフルオロアルコキシポリマー)、ECTFE(エチレンクロロトリフルオロエチレン)もしくはFEP(フッ素化エチレンプロピレン)のようなフルオロプラスチックが挙げられ、又は鋼もしくはステンレス鋼のような構造材料へのライナー材料としてのこれらの材料の使用が挙げられる。好適なフルオロプラスチックがトレードマークキナール(登録商標)、テフロン(登録商標)又はハラー(登録商標)として販売されている。
本発明が以下の実施例により更に説明される。
The process equipment, including the
The invention is further illustrated by the following examples.
二酸化塩素を図に示された装置中で本発明に従って製造した。75mmの内径及び610mmの長さを有する垂直の管状反応器3に、78重量%の硫酸並びにホスホン酸をベースとする錯生成剤で安定化された40重量%の塩素酸ナトリウム及び10重量%の過酸化水素の水溶液を連続的に供給した。反応器を約40−50℃の温度及び約84kPa(大気圧の約17kPa下)の絶対圧に維持し、エダクター6に790kPaの絶対圧で動機水を供給することにより大気圧以下の圧力を生じた。
Chlorine dioxide was produced according to the present invention in the apparatus shown in the figure. In a vertical
比較として、使用したエダクターが動機水を少なくとも部分的に渦巻き又はらせん様式で流入させるノズルへのインサートを含まなかった以外は、同じ様式で二酸化塩素を製造した。
結果を下記の表に示す。
For comparison, chlorine dioxide was produced in the same manner, except that the eductor used did not include an insert into the nozzle that allowed the motive water to flow in at least partially in a spiral or spiral manner.
The results are shown in the table below.
本発明の方法はClO2生産速度及びエダクターから取り出された最終生成物溶液中のClO2濃度の両方の有意な増大を生じることが明らかである。
It is clear that the process of the present invention results in a significant increase in both the ClO 2 production rate and the ClO 2 concentration in the final product solution removed from the eductor.
Claims (18)
該塩素酸イオンを反応器中で二酸化塩素に還元し、それにより二酸化塩素を含む生成物流を反応器中で生成する工程、
動機水をノズルを含むエダクターに供給する工程、
該動機水をノズル中に流入させ、それを更に少なくとも部分的に渦巻き又はらせん様式でエダクター中に流入させる工程、
前記生成物流を反応器からエダクターに移し、それを前記動機水と混合し、それにより二酸化塩素を含む希釈された水溶液を生成する工程、及び
該二酸化塩素を含む希釈された水溶液をエダクターから取り出す工程
を含むことを特徴とする二酸化塩素の連続製造方法。Supplying chlorate ions, acid and hydrogen peroxide as an aqueous solution to the reactor;
Reducing the chlorate ions to chlorine dioxide in the reactor, thereby producing a product stream containing chlorine dioxide in the reactor;
Supplying motive water to the eductor including the nozzle;
Allowing the motive water to flow into the nozzle, which further flows into the eductor at least partially in a spiral or spiral manner;
Transferring the product stream from a reactor to an eductor, mixing it with the motive water, thereby producing a diluted aqueous solution containing chlorine dioxide, and removing the diluted aqueous solution containing chlorine dioxide from the eductor A method for continuously producing chlorine dioxide, comprising:
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/887,264 US6790427B2 (en) | 2001-06-25 | 2001-06-25 | Process for producing chlorine dioxide |
EP01850116 | 2001-07-02 | ||
PCT/SE2002/001068 WO2003000586A1 (en) | 2001-06-25 | 2002-06-03 | Process for producing chlorine dioxide |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004530626A JP2004530626A (en) | 2004-10-07 |
JP4006019B2 true JP4006019B2 (en) | 2007-11-14 |
Family
ID=26077511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003506799A Expired - Lifetime JP4006019B2 (en) | 2001-06-25 | 2002-06-03 | Chlorine dioxide production method |
Country Status (14)
Country | Link |
---|---|
EP (1) | EP1399383B1 (en) |
JP (1) | JP4006019B2 (en) |
KR (1) | KR100590345B1 (en) |
CN (1) | CN1221469C (en) |
AT (1) | ATE465972T1 (en) |
BR (1) | BR0210340B1 (en) |
DE (1) | DE60236154D1 (en) |
ES (1) | ES2345185T3 (en) |
MX (1) | MXPA03010884A (en) |
MY (1) | MY130748A (en) |
PL (1) | PL200136B1 (en) |
PT (1) | PT1399383E (en) |
RU (1) | RU2268241C2 (en) |
WO (1) | WO2003000586A1 (en) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6770257B1 (en) * | 1999-02-04 | 2004-08-03 | Kawasaki Jukogyo Kabushiki Kaisha | Processes for producing anatase titanium oxide and titanium oxide coating material |
US20040175322A1 (en) * | 2003-03-03 | 2004-09-09 | Woodruff Thomas E. | Process for producing chlorine dioxide |
GB0317155D0 (en) * | 2003-07-23 | 2003-08-27 | Tristel Company The Ltd | Chlorine dioxide generation |
GB2415693B (en) * | 2003-07-23 | 2007-04-11 | Tristel Company Ltd | Chlorine Dioxide Generation |
US8642054B2 (en) | 2004-09-07 | 2014-02-04 | Tristel Plc | Sterilant system |
US7807118B2 (en) | 2004-09-07 | 2010-10-05 | Tristel Plc | Decontamination system |
CA2589721C (en) * | 2004-12-06 | 2010-05-04 | Akzo Nobel N.V. | Chemical process and production unit |
BRPI0518358B1 (en) * | 2004-12-06 | 2016-09-13 | Akzo Nobel Nv | process and apparatus for the production of chlorine dioxide |
RU2404118C2 (en) * | 2005-11-10 | 2010-11-20 | Акцо Нобель Н.В. | Chlorine dioxide synthesis method |
WO2007117205A1 (en) * | 2006-04-10 | 2007-10-18 | Akzo Nobel N.V. | Process for the production of chlorine dioxide |
HUP0600735A2 (en) | 2006-09-21 | 2009-04-28 | Zoltan Dr Noszticzius | Permeation method and apparatus for preparing fluids containing high-purity chlorine dioxide |
TWI447065B (en) * | 2007-07-13 | 2014-08-01 | Akzo Nobel Nv | Process for the production of chlorine dioxide |
ITMI20072388A1 (en) | 2007-12-19 | 2009-06-20 | Caffaro Chimica S R L | EQUIPMENT AND METHOD FOR DISINFECTION OF WATER |
KR101034747B1 (en) | 2009-05-29 | 2011-05-17 | 삼성에스디아이 주식회사 | Mixing device |
KR101162536B1 (en) | 2009-10-23 | 2012-07-05 | 주식회사 에코시아 | Generator and process for aqueous solution of chlorine dioxide |
DE202010017479U1 (en) | 2010-04-16 | 2012-02-16 | Infracor Gmbh | diving reactor |
JP5712371B2 (en) * | 2010-07-08 | 2015-05-07 | ナルコ ユーエス ワン エルエルシー | Chlorine dioxide production process |
GB2495309B (en) | 2011-10-05 | 2014-02-19 | Paradigm Flow Services Ltd | Fire main cleaning apparatus and method |
GB201612077D0 (en) * | 2016-07-12 | 2016-08-24 | Gaffey Technical Services Ltd | A chlorine dioxide solution generating apparatus |
TWI750330B (en) * | 2017-02-27 | 2021-12-21 | 美商藝康美國公司 | Method for onsite production of chlorine dioxide |
UY37637A (en) | 2017-03-24 | 2018-09-28 | Ecolab Usa Inc | IN SITU GENERATION SYSTEM FOR LOW RISK CHLORINE DIOXIDE |
WO2019036065A1 (en) | 2017-08-17 | 2019-02-21 | Ecolab USA, Inc. | Low risk chlorine dioxide onsite generation system |
CN108328578B (en) * | 2018-01-29 | 2020-03-10 | 荣成海奥斯生物科技有限公司 | Filling device for gaseous available chlorine aqueous solution |
US11970393B2 (en) | 2018-07-05 | 2024-04-30 | Ecolab Usa Inc. | Decomposition mediation in chlorine dioxide generation systems through sound detection and control |
CN109133008B (en) * | 2018-08-23 | 2020-05-19 | 四川齐力绿源水处理科技有限公司 | Preparation equipment of high-purity chlorine dioxide |
US10881111B1 (en) | 2019-11-26 | 2021-01-05 | NEOCL Co., Ltd. | Composition for providing room temperature long-term constant-concentration chlorine dioxide solution in aqueous medium and preparation method thereof |
CN112999993B (en) * | 2021-02-08 | 2023-04-07 | 乌兰浩特市圣益商砼有限公司 | Vortex-spraying two-stage strengthening reactor for preparing polycarboxylate superplasticizer and preparation method |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1015665B (en) * | 1974-07-04 | 1977-05-20 | Snam Progetti | METHOD FOR THE PREPARATION IN WITH TINUE OF WATER OIL EMULSIONS AND EQUIPMENT SUITABLE FOR THE PURPOSE |
US4247531A (en) * | 1979-08-13 | 1981-01-27 | Rio Linda Chemical | Chlorine dioxide generation apparatus and process |
CA1163420A (en) * | 1982-09-09 | 1984-03-13 | Gerald Cowley | Production of chlorine dioxide on a small scale |
US5204081A (en) * | 1991-05-03 | 1993-04-20 | Rio Linda Chemical Co., Ltd. | Process for the generation of chlorine dioxide |
GB2294646B (en) * | 1994-10-29 | 1999-03-17 | Transvac Systems Ltd | Material treatment |
US5968454A (en) * | 1998-04-02 | 1999-10-19 | Vulcan Chemical Technologies, Inc. | Chlorine dioxide generator |
US7070710B1 (en) * | 1999-06-11 | 2006-07-04 | Eka Chemicals Inc. | Chemical composition and method |
-
2002
- 2002-06-03 PL PL364357A patent/PL200136B1/en unknown
- 2002-06-03 CN CNB028126734A patent/CN1221469C/en not_active Expired - Lifetime
- 2002-06-03 JP JP2003506799A patent/JP4006019B2/en not_active Expired - Lifetime
- 2002-06-03 DE DE60236154T patent/DE60236154D1/en not_active Expired - Lifetime
- 2002-06-03 BR BRPI0210340-0A patent/BR0210340B1/en not_active IP Right Cessation
- 2002-06-03 AT AT02736388T patent/ATE465972T1/en active
- 2002-06-03 PT PT02736388T patent/PT1399383E/en unknown
- 2002-06-03 KR KR1020037015802A patent/KR100590345B1/en active IP Right Grant
- 2002-06-03 RU RU2004101962/15A patent/RU2268241C2/en active
- 2002-06-03 EP EP02736388A patent/EP1399383B1/en not_active Expired - Lifetime
- 2002-06-03 ES ES02736388T patent/ES2345185T3/en not_active Expired - Lifetime
- 2002-06-03 WO PCT/SE2002/001068 patent/WO2003000586A1/en active Application Filing
- 2002-06-03 MX MXPA03010884A patent/MXPA03010884A/en active IP Right Grant
- 2002-06-19 MY MYPI20022299A patent/MY130748A/en unknown
Also Published As
Publication number | Publication date |
---|---|
MXPA03010884A (en) | 2004-02-17 |
KR100590345B1 (en) | 2006-06-15 |
BR0210340A (en) | 2004-07-13 |
JP2004530626A (en) | 2004-10-07 |
MY130748A (en) | 2007-07-31 |
ES2345185T3 (en) | 2010-09-17 |
EP1399383A1 (en) | 2004-03-24 |
WO2003000586A1 (en) | 2003-01-03 |
RU2268241C2 (en) | 2006-01-20 |
PL364357A1 (en) | 2004-12-13 |
CN1221469C (en) | 2005-10-05 |
PT1399383E (en) | 2010-07-19 |
EP1399383B1 (en) | 2010-04-28 |
RU2004101962A (en) | 2005-04-10 |
PL200136B1 (en) | 2008-12-31 |
CN1520378A (en) | 2004-08-11 |
BR0210340B1 (en) | 2010-12-14 |
KR20040012889A (en) | 2004-02-11 |
DE60236154D1 (en) | 2010-06-10 |
ATE465972T1 (en) | 2010-05-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4006019B2 (en) | Chlorine dioxide production method | |
US6790427B2 (en) | Process for producing chlorine dioxide | |
JP4297910B2 (en) | Chlorine dioxide production method | |
US7682592B2 (en) | Chemical process and production unit | |
US20070116637A1 (en) | Process for production of chlorine dioxide | |
US20050186131A1 (en) | Process for production of chlorine dioxide | |
US20070237708A1 (en) | Process for the production of chlorine dioxide | |
AU2005312379B2 (en) | Chemical process and production unit | |
JP4457114B2 (en) | Chlorine dioxide production method | |
EP2004545B1 (en) | Process for the production of chlorine dioxide | |
EP1945566B1 (en) | Process for production of chlorine dioxide |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070808 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070826 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4006019 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100831 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110831 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110831 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120831 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120831 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130831 Year of fee payment: 6 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |