JP3958853B2 - Plasma polymerization film forming method and plasma polymerization film forming apparatus - Google Patents

Description

【表２】

【００６２】
【発明の効果】
上記の結果より本発明の効果は明らかである。すなわち、本発明においては、プラズマ重合を行うための電極として、プラズマ重合膜を形成する面と対向する側の電極を、高分子材料で被覆率５０〜１００％の割合で被覆し、動作圧力１．３３３×１０ ^-1 〜１３３．３Ｐａの範囲の条件で、長尺基材の上にプラズマ重合膜を形成させているので、プラズマ重合膜の形成時に異常放電の発生が極めて少なく、プラズマ重合膜を長時間安定に成膜することができ、製品歩留の向上が図れるという極めて優れた効果が発現する。また、プラズマ重合膜の膜特性も極めて優れたものとなる。
【図面の簡単な説明】
【図１】 本発明に用いられるプラズマ重合膜形成装置の一例を示す概略正面図である。
【図２】 プラズマ重合膜を形成させる媒体表面と対向する側のプラズマ電極であって、その電極表面を被覆する被覆形態を模式的に示す図である。
【図３】 プラズマ重合膜を形成させる媒体表面と対向する側のプラズマ電極であって、その電極表面を被覆する被覆形態を模式的に示す図である。
【図４】 積層体原反の積層構造を示す断面図である。
【図５】 磁気記録媒体の積層構造を示す断面図である。
【符号の説明】
９…プラズマ電極
２５…回転ドラム
４０…積層体原反
４１…非磁性支持体
４２…強磁性金属薄膜
４３…プラズマ重合膜
５０…磁気記録媒体[0001]
[Industrial application fields]
The present invention relates to a method for forming a plasma polymerized film and a plasma polymerized film forming apparatus. For example, the surface of a magnetic recording medium comprising a ferromagnetic metal thin film formed by oblique vapor deposition, vertical vapor deposition, etc. The present invention relates to a method for forming a plasma polymerized film and a plasma polymerized film forming apparatus suitable for forming a plasma polymerized film as a protective film. In particular, a method for forming a plasma polymerized film and a plasma polymerized film that can be stably produced over a long period of time without the occurrence of abnormal discharge during the formation of the plasma polymerized film, and that the film characteristics of the formed film are excellent The present invention relates to a forming apparatus.
[0002]
[Prior art]
A so-called metal thin film type magnetic recording medium in which a ferromagnetic metal thin film made of a metal or an alloy such as Co-Cr is formed on a support by a vacuum thin film forming method such as vacuum deposition, sputtering, or ion plating is a magnetic powder. Compared with a so-called coating-type magnetic recording medium using a binder, it has many advantages as follows.
[0003]
That is, the metal thin film type magnetic recording medium is excellent in coercive force and the like, and since the packing density of the magnetic material is high, high density recording is possible, and it is very advantageous in terms of electromagnetic conversion characteristics. Various advantages are provided such that the thickness can be made very thin and the thickness loss during reproduction can be significantly reduced.
[0004]
However, such a metal thin film type magnetic recording medium generally has the disadvantage that the magnetic layer (ferromagnetic metal thin film) is easily corroded, and further has the disadvantage of poor running performance and durability.
[0005]
In order to solve such a problem, various attempts have been made to form a protective film on a ferromagnetic metal thin film, and a suitable example of the protective film is a plasma polymerized protective film. In forming this plasma polymerized film, it is necessary to appropriately control the introduced gas, power, electrode area, etc., in order to ensure the required film quality. A proposal to control the value of W / (F × S) to 5-10, where F is the flow rate of F (cc / sec), the applied power is W (watts), and the electrode area is S (cm ² ). (Japanese Patent Laid-Open No. 61-5435).
[0006]
[Problems to be solved by the invention]
However, as a result of intensive studies on the film formation conditions for plasma polymerization by the inventors of the present application, the applied voltage is smaller than the value of (electrode area × introduced monomer gas amount) within the range of the plasma polymerization conditions proposed above. It was found that it was difficult to operate on an actual production line because it was too large, causing abnormal discharges frequently and causing problems such as a decrease in production yield.
[0007]
The present invention was devised under such circumstances, and its purpose is not only to produce a plasma polymerized film with excellent film properties such as durability, but also extremely low occurrence of abnormal discharge, It is an object of the present invention to provide a method for forming a plasma polymerized film and an apparatus for forming a plasma polymerized film, which can form a plasma polymerized film stably for a long time and can improve the product yield.
[0008]
[Means for Solving the Problems]
In order to solve such an object, the inventors of the present application have made extensive studies on the film formation conditions for plasma polymerization and the structure of the plasma electrode for performing plasma polymerization. It is found that a plasma-polymerized film can be stably produced for a long time with less abnormal discharge (and the formed film is excellent in film properties such as durability). It has come.
[0009]
That is, the present invention is to a film-like long substrate is continuously conveyed, a method of forming a plasma-polymerized film to form the plasma polymerization film on the elongate base material, the method comprising a plasma As the electrode for performing the polymerization, the electrode on the side facing the surface on which the plasma polymerized film is formed is coated with a polymer material at a coverage of 50 to 100%, and the discharge that is the other electrode is generated. The ground-side electrode that is not covered is a material that is not coated with a polymer material, and is continuously transported in a state where the surface opposite to the surface on which the plasma polymerized film of the long substrate is formed is in contact with the ground-side electrode. While introducing the gas, a voltage was applied to the coated electrode side, and a plasma polymerization film was formed on the long base material under the condition of an operating pressure of 0.1333 Pa to 133.3 Pa ( 10 ^{−3 to 1} Torr ). Configured to form .
[0010]
Further, as a preferred embodiment, the long base material is a laminate raw material in which a ferromagnetic metal thin film is provided on a nonmagnetic support, and a plasma polymerization film is formed on the ferromagnetic metal thin film. Constitute.
[0011]
Further, as a preferred embodiment, while the non-magnetic support is continuously transported, the laminate raw material provided with the ferromagnetic metal thin film on the non-magnetic support is in contact with at least a part of the rotating drum. The plasma polymerization film is formed on the ferromagnetic metal thin film.
[0012]
In a preferred embodiment, the source gas is configured to use a hydrocarbon monomer gas.
[0013]
Moreover, as a suitable aspect, it is comprised so that the plasma voltage at the time of plasma film-forming may be 300-1000V.
[0014]
The present invention also provides a plasma polymerized film forming apparatus for forming a plasma polymerized film on a long base material while continuously conveying the film-like long base material. As an electrode for performing the above, a plasma electrode on the side opposite to the surface on which the plasma polymerized film is formed, and a ground side electrode that does not generate discharge, which is the other electrode, the plasma electrode forms a plasma polymerized film. The surface facing the surface to be coated is coated with a polymer material at a coverage ratio of 50 to 100%, and the ground side electrode is not coated with the polymer material, and plasma polymerization of a long base material The surface opposite to the surface on which the film is formed is configured to be continuously conveyed in contact with the ground electrode.
[0015]
Further, as a preferred embodiment, the plasma processing object is an apparatus that is a laminate raw material in which a ferromagnetic metal thin film is provided on a nonmagnetic support, and the apparatus is in contact with the back surface of the nonmagnetic support. A rotating drum for continuous conveyance is provided, and an electrode covered with a polymer material is arranged so as to face the rotating drum.
[0016]
According to the present invention, the plasma voltage (effective voltage applied to the plasma electrode) generated between the electrodes can be increased without changing the power supply voltage by coating the plasma electrode with a predetermined material and a predetermined ratio. Thus, the plasma voltage can be increased without forcibly increasing the power supply voltage, thereby suppressing the occurrence of abnormal discharge during the manufacturing process.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail.
[0018]
In the present invention, a method for producing a magnetic recording medium will be described below as an example of a plasma polymerization film forming method. First, an example of a suitable plasma polymerization film forming apparatus used in the method for manufacturing a magnetic recording medium will be described with reference to FIG.
[0019]
FIG. 1 is a front view showing an outline of a plasma polymerized film forming apparatus 1. A feeding roll 21 installed in an outer vacuum chamber 7 is a laminate in which a ferromagnetic metal thin film is previously provided on a nonmagnetic support. An original fabric 40 is wound. FIG. 4 shows a state of the laminated cross section of the laminated original fabric 40. In FIG. 4, reference numeral 41 denotes a nonmagnetic support, and reference numeral 42 denotes a ferromagnetic metal thin film. Then, as shown in FIG. 1, the laminate original fabric 40 fed out from the feed roll 21 is guided into the reaction chamber 3, and is rotated through the guide roll 22 installed in the reaction chamber 3 ( (Also referred to as a cooling drum), and further passes through the guide roll 26 and out of the reaction chamber 3 and is taken up by the take-up roll 28. In this case, the rotating drum 25 is in contact with the back side (the side on which the ferromagnetic metal thin film is not formed) of the nonmagnetic support.
[0020]
In the reaction chamber 3, a plasma electrode 9 for generating a discharge for forming a plasma polymerized film is disposed concentrically around the rotating drum 25 (downward in the drawing). The plasma electrode 9 is connected to, for example, a high-frequency power source 2 for generating plasma, so that a voltage is applied. In the case of the apparatus shown in FIG. 1, the rotating drum 25 constitutes one plasma electrode (ground side) that does not generate discharge.
[0021]
The outer vacuum tank 7 is provided with an exhaust pipe 5, and the inside of the outer vacuum tank 7 (and the reaction chamber 3) is depressurized from the exhaust pipe 5 (usually connected to a vacuum pump). ing. On the other hand, a monomer gas or a mixed gas of a monomer gas and a carrier gas is introduced into the reaction chamber 3 as a raw material gas via a gas introduction pipe 6.
[0022]
The plasma electrode 9 is an electrode for performing plasma polymerization, and is an electrode on the side facing the medium surface on which the plasma polymerization film is formed. The plasma electrode 9 has a curved plate shape as shown, and is disposed so as to concentrically surround the lower half of the rotating drum 25. The surface 9a of the plasma electrode 9 is coated with a polymer material at a coverage of 50 to 100%, preferably 60 to 100%, more preferably 70 to 100%. If the coverage is less than 50%, a large amount of abnormal discharge occurs in the reaction vessel 3, and the plasma polymerization film cannot be stably formed for a long time. Product yield will also decrease.
[0023]
The surface 9a of the plasma electrode 9 should be covered in an almost uniform and finely dispersed state except for the case where the coverage is 100% (in other words, the electrode cover is covered in a different way). The undisclosed parts should be finely dispersed). Specifically, as shown in FIG. 2, circular ones arranged in a staggered manner (one obtained by punching circular shapes into a staggered arrangement from a single plate), or square ones as shown in FIG. Are arranged in a zigzag arrangement (one square plate is punched into a zigzag arrangement), or an inverted arrangement thereof. Of course, it is not limited to these shapes.
[0024]
Specific examples of the polymer material to be coated include fluorine-containing resin, polyamide, polycarbonate, polyacetal, polyimide, polyether ether ketone, polyphenylene sulfide, polybenzimidazole, polyethylene, polyvinyl chloride, polystyrene, polypropylene, and methacrylic resin. , Petroleum resin, polyvinylidene chloride, polycycloolefin, phenol resin, urea resin, (un) saturated polyester, polyurethane, alkyd resin, melamine resin, epoxy resin, ABS resin, BS resin, AS resin, and organic compounds And the like. Among these, fluorine-containing resins, methacrylic resins, polyesters, polyurethanes, epoxy resins, plasma compounds of organic compounds, and the like are particularly mentioned.
[0025]
As a method of coating such a coating substance on the surface 9a of the plasma electrode 9, for example, if a resin is used as the polymer material, the resin plate is used as it is or as shown in FIGS. Bonded with adhesive or adhesive tape, or coated with resin adhesive tape on the electrode surface, or coated, electrodeposition, baking, dipping method And a method of masking the entire surface or a predetermined distribution by a spraying method or the like.
[0026]
In the present invention, by covering the surface 9a of the plasma electrode 9 with the polymer material in this way, the plasma voltage (effective voltage applied to the plasma electrode) from the plasma electrode 9 without changing the voltage of the power source 2 is obtained. The knowledge that can be raised. Therefore, the plasma voltage can be increased without forcibly increasing the voltage of the power source 2, and the occurrence of abnormal discharge can be prevented. Furthermore, the speed of ions in the reaction chamber 3 can be increased within a range in which abnormal discharge does not occur, so that film quality and film formation rate can be improved.
[0027]
The thickness of the polymer material coated in this way may be determined as appropriate within a range in which abnormal discharge can be prevented and a high-quality film can be obtained in consideration of the material used. A suitable film thickness range is 80 μm to 5 mm, more preferably 120 μm to 3 mm.
[0028]
In the present invention, the plasma polymerized film forming apparatus 1 including the plasma electrode coated with a predetermined material and at a predetermined ratio as described above is used to appropriately control the plasma electrode, the monomer gas flow rate, the applied voltage, etc. A magnetic recording medium may be manufactured by forming a plasma polymerization film on a metal thin film.
[0029]
Hereinafter, a specific method for manufacturing a magnetic recording medium will be described.
[0030]
A method for manufacturing a magnetic recording medium performed using the apparatus illustrated in FIG. 1 is a method of manufacturing a stack of raw materials in which a ferromagnetic metal thin film is provided on a nonmagnetic support, and the back side of the nonmagnetic support is a rotating drum. It is carried out by forming a plasma polymerized film on the ferromagnetic metal thin film while continuously conveying at least a part of the film.
[0031]
FIG. 5 shows a cross-sectional view in which a plasma recording film 43 is formed on the laminate original fabric 40 (on the ferromagnetic metal thin film 42) to form the magnetic recording medium 50.
[0032]
Formation of the plasma polymerized film 43 is performed by forming a monomer gas of an organic compound, for example, a hydrocarbon compound into plasma by high frequency in a vacuum chamber and forming it on the surface of the ferromagnetic metal thin film 42. Usually, the inside of the vacuum chamber (inside the outer vacuum chamber 7 and the reaction chamber 3) in which the laminate original fabric 40 is conveyed is 1.333 × 10 ^{−4 to} 13.33 Pa , more preferably 1.333 × 10 ⁻³ to After exhausting to 1.333 × 10 ⁻² Pa (changed according to desired film quality) (attainment pressure), a monomer gas as a raw material gas or a mixed gas of monomer gas and carrier gas is introduced into the reaction chamber 3 at a predetermined flow rate. The power source 2 is operated while being introduced, and electric power of a predetermined frequency (which may be direct current) is applied to the plasma electrode 9 at a predetermined applied voltage to cause discharge, and plasma polymerization is performed as shown in FIG. A plasma polymerization film 43 is formed on the ferromagnetic metal thin film 42 by the reaction. The operating pressure at the time of plasma is set to 1.333 × 10 ^{−1 to} 133.3 Pa , more preferably 13.33 to 26.66 Pa . When the operating pressure is less than 1.333 × 10 ⁻¹ Pa , plasma is not stably generated, and the reaction gas is reduced, resulting in an inconvenience that the film formation rate is extremely lowered. Further, when the operating pressure exceeds 133.3 Pa , the plasma does not strike uniformly. Moreover, a high voltage is required, and a disadvantage arises that a large current flows and a hole is locally formed in the film. Furthermore, since it becomes excessive with respect to the electric power supplied with the reaction gas, the hardness of the obtained plasma polymerized film is lowered, and the tape characteristics such as still are deteriorated.
[0033]
During plasma film formation, the plasma electrode 9 is coated as described above. Without this coating, abnormal discharge occurs during film formation, production is not stable, and the product yield is lowered. Note that the electrode area of the plasma electrode 9 may be appropriately selected depending on the scale of the equipment.
[0034]
In the present invention (the plasma electrode 9 has a predetermined coating), the plasma voltage at the time of plasma film formation is preferably 300 to 1000V.
[0035]
The monomer gas as a raw material gas introduced to form the plasma polymerized film is not particularly limited as long as it is normally used, and in particular, forms a highly durable protective film. For this purpose, it is preferable to use hydrocarbon gas.
[0036]
As the hydrocarbon gas, methane, ethane, propane, butane, ethylene, propylene, acetylene, methylacetylene, toluene and the like are used alone or in combination. Among these, ethane, propane, and propylene are used as particularly preferable hydrocarbon gases.
[0037]
Furthermore, the quality of the film can be controlled by mixing a certain amount of inert gas such as argon or oxygen into the raw material gas.
[0038]
In the case of a magnetic recording medium, the thickness of the plasma polymerized film formed in this manner is appropriately selected within a range that has a sufficient protective film function and does not increase the spacing loss.
[0039]
The non-magnetic support 41 constituting the magnetic recording medium 50 may be any heat-resistant material that can withstand the formation of the ferromagnetic metal thin film 42. For example, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyimide, polyamide, polyether ether ketone (PEEK), polysulfone and the like. The thickness of the nonmagnetic support 41 may be selected, for example, in consideration of the recording time of the magnetic recording medium, and is usually about 4 to 40 μm. The form of the nonmagnetic support 41 may be any of a film, a tape, a sheet, a disk, a card, a drum, etc., but the longest nonmagnetic support is the most effective in the present invention. Such a long time treatment is required.
[0040]
The ferromagnetic metal thin film 42 formed on the nonmagnetic support 41 is preferably made of cobalt or a cobalt alloy. Examples of the cobalt alloy include Co—Ni, Co—Fe, Co—Ni—Cr, Co—Ni—B, Co—Cu, and Co—Pt—Cr. When the ferromagnetic metal thin film 42 is formed by vapor deposition, a metal close to the melting point of Co is vapor-deposited using the same crucible, so-called single vapor deposition is used. Do.
[0041]
In the vapor deposition step, after the inside of the vapor deposition chamber is evacuated to, for example, about 10 ⁻⁶ Torr, the metal is melted to be deposited by an electron gun, and the vapor deposition is started when the entire metal is melted. Furthermore, in order to control the magnetic properties of the ferromagnetic metal thin film 42 formed by vapor deposition, it is usually preferable to introduce an oxidizing gas such as oxygen, ozone, or nitrous oxide. The thickness of the ferromagnetic metal thin film 42 thus formed is about 0.1 to 0.3 μm. Further, the ferromagnetic metal thin film 42 may be formed by an ion plating method, a sputtering method or the like other than the vapor deposition method.
[0042]
In the embodiment of the present invention, in order to make the explanation of the formation of the plasma polymerized film 43 simple and easy to understand, the laminated original fabric 40 in which the ferromagnetic metal thin film 42 is provided on the nonmagnetic support 41 is used as the feeding roll 21. However, the present invention is not limited thereto, and only the non-magnetic support is installed on the feeding roll, and the ferromagnetic metal thin film and the plasma polymerized film are formed in the same vacuum chamber. May be formed sequentially.
[0043]
In manufacturing the magnetic recording medium, various known liquid lubrication layers may be applied on the protective film made of the plasma polymerized film 43. In this case, durability characteristics are improved. Also, various known backcoat layers may be provided on the back surface of the nonmagnetic support 41 (the surface opposite to the surface on which the ferromagnetic metal thin film 42 is formed), or the nonmagnetic support 41 and the ferromagnetic metal thin film 42 may be provided. Various intermediate layers may be provided therebetween.
[0044]
Further, the plasma polymerized film forming apparatus 1 is not limited to the type shown in FIG. 1, and various types of commonly used types can be used. However, in order to manufacture a film-like magnetic recording medium, a type using a rotating drum 25 as shown in FIG. 1 is suitable.
[0045]
In the above embodiment, the case where the plasma polymerized film 43 is formed on the ferromagnetic metal thin film 42 has been described as a preferred example. However, the plasma polymerized film 43 is generally formed in a film-like form that is continuously conveyed. What is necessary is just to be performed on a long base material, and there is no restriction | limiting in particular in the structure and material of a long base material.
[0046]
【Example】
Hereinafter, specific examples relating to the present invention will be shown to describe the present invention in more detail.
[0047]
(Production of Example Samples 1 to 6 and Comparative Example Samples 1 to 5)
First, in the reaction tank 3 (exhaust up to 1.333 × 10 ⁻⁴ Pa ), a nonmagnetic support 41 made of polyethylene terephthalate (PET) having a thickness of 6 μm is continuously conveyed, and then a strong Co material is formed thereon. A magnetic metal thin film 42 was formed (preparation of a laminate original fabric). That is, oblique deposition was performed using Co as a deposition source to form a Co ferromagnetic metal thin film 42 having a thickness of 0.20 μm.
[0048]
Next, a protective film made of a plasma polymerized film 43 was formed on the ferromagnetic metal thin film 42 using the apparatus shown in FIG. As the plasma electrode 9, a polytetrafluoroethylene (PTFE) plate (thickness 3 mm) having a punched metal shape as shown in FIG. 2 was attached to the surface 9 a with a PTFE adhesive tape. A thing was used.
[0049]
While introducing ethylene from the source gas introduction pipe 6 at a rate of 2 cc / sec, a voltage is applied to the plasma electrode 9 (power supply voltage: 410 V) to generate plasma, thereby forming a protective film made of the plasma polymerized film 43 did.
[0050]
When the plasma polymerized film 43 is formed, the coverage of the polytetrafluoroethylene (PTFE) coated on the surface of the plasma electrode 9 is variously changed as shown in Table 1 below to supply the film (laminated product). A plasma reaction was continuously carried out for 1 hour while winding up to form a 10 nm thick plasma polymerized film on the Co ferromagnetic metal thin film 42. The pressure in the apparatus, 6.665 × 10 ^-3 Pa to ultimate pressure before the start of film formation, the operating pressure during plasma was 13.33 Pa. Thereafter, a back coat layer having a film thickness of 0.5 μm was provided on the back surface side of the nonmagnetic support to produce various magnetic recording medium samples shown in Table 1 below (Examples 1 to 6 and Comparative Sample 1). ~ 5). The voltage of the power source 2 was constant in all cases.
[0051]
(Production of Example Samples 7 and 8)
In the production of Example Sample 1, the material coated on the surface of the plasma electrode 9 was changed to polyamide (Example Sample 7) and polyether ether ketone (Example Sample 8). Except that, Example Samples 7 and 8 were prepared in the same manner as in the above Example Sample 1.
[0052]
(Production of Example Samples 9 and 10)
In the manufacture of Example Sample 1, the material coated on the surface of the plasma electrode 9 was changed to polyester (Example Sample 9) and methacrylic resin (Example Sample 10), respectively. The coating thickness was 140 μm each and was formed by painting. Except that, Example Samples 9 and 10 were prepared in the same manner as in the above Example Sample 1.
[0053]
(Preparation of Comparative Samples 6 and 7)
In the production of the comparative sample 2 (coverage 30%) and the comparative sample 3 (coverage 20%), the voltage of the power source 2 was increased. Otherwise, Comparative Samples 6 and 7 were prepared in the same manner as Comparative Sample 2 and Comparative Sample 3.
[0054]
(Preparation of Example Samples 11 to 18)
In the manufacture of Example Sample 1, Example Samples 11 to 18 were produced by changing the ultimate pressure and the operating pressure as shown in Table 1 below. In Example Sample 16, the source gas is changed to acetylene.
[0055]
(Preparation of Comparative Samples 8 and 9)
In the manufacture of Example Sample 1, Comparative Examples Samples 8 and 9 were prepared by changing the ultimate pressure and the operating pressure as shown in Table 1 below.
[0056]
(Preparation of Comparative Example Sample 10)
In the manufacture of Example Sample 1 above, the surface of the rotating drum 25 (also called a cooling drum) was covered with PTFE having a thickness of 3 m, and the ultimate pressure and the operating pressure were changed as shown in Table 1 below. Was made.
[0057]
The following evaluations were performed on each of the production samples of Example Samples 1 to 18 and Comparative Samples 1 to 10 produced as described above and the media samples after production.
[0058]
Abnormal discharge count (times)
During the one-hour plasma polymerization, while the current and voltage are monitored between the plasma electrode and the rotating drum using the Lecroy digital oscilloscope 9400, the number of times the current and voltage show abnormal values instantaneously is counted as the number of abnormal discharges. did.
[0059]
Still life A media sample was cut into a 6.35 mm width, and a 7 MHz signal was recorded using a DVC-VTR (SONY VX-700 modified) in an environment of 20 ° C. and 60% RH. When reproducing, the time (min) until the output dropped 1 dB from the initial value was measured in the still mode. It should be noted that the medium sample to be measured is not coated with a lubricant and is measured under extremely severe conditions.
[0060]
These results are shown in Table 1 below. The plasma voltage Vp shown in Table 1 is an effective voltage applied to the plasma electrode, and is a value actually measured during the manufacturing process.
[0061]
[Table 1]

[Table 2]

[0062]
【The invention's effect】
The effects of the present invention are clear from the above results. That is, in the present invention, as an electrode for performing plasma polymerization, an electrode on the side opposite to the surface on which the plasma polymerization film is formed is covered with a polymer material at a coverage of 50 to 100%, and an operating pressure of 1 Since the plasma polymerized film is formed on the long base material under the condition in the range of 333 × 10 ^{−1 to} 133.3 Pa , the occurrence of abnormal discharge is extremely small when the plasma polymerized film is formed. Can be formed stably for a long period of time, and an extremely excellent effect of improving the product yield is exhibited. In addition, the film characteristics of the plasma polymerized film are extremely excellent.
[Brief description of the drawings]
FIG. 1 is a schematic front view showing an example of a plasma polymerization film forming apparatus used in the present invention.
FIG. 2 is a diagram schematically illustrating a plasma electrode on the side facing a medium surface on which a plasma polymerized film is formed, and covering the electrode surface.
FIG. 3 is a diagram schematically showing a coating form of a plasma electrode on the side facing a medium surface on which a plasma polymerized film is formed, and covering the electrode surface.
FIG. 4 is a cross-sectional view showing a laminate structure of a laminate original fabric.
FIG. 5 is a cross-sectional view showing a laminated structure of a magnetic recording medium.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 9 ... Plasma electrode 25 ... Rotary drum 40 ... Raw material of laminated body 41 ... Nonmagnetic support body 42 ... Ferromagnetic metal thin film 43 ... Plasma polymerized film 50 ... Magnetic recording medium

Claims (7)

A method for forming a plasma polymerized film in which a plasma polymerized film is formed on the long base material while continuously conveying the film-shaped long base material,
The method
As an electrode for performing plasma polymerization, an electrode on the side facing the surface on which the plasma polymerization film is formed is coated with a polymer material at a coverage of 50 to 100%,
The other electrode, the ground electrode that does not generate discharge, is not covered with a polymer material, and the surface opposite the surface on which the plasma polymerized film of the long base is formed is in contact with the ground electrode To continuously convey
While introducing the raw material gas, a voltage is applied to the coated electrode side, and a plasma polymerization film is formed on the long base material under the condition of an operating pressure of 0.1333 Pa to 133.3 Pa ( 10 ^{−3 to 1} Torr ). A method for forming a plasma polymerized film, comprising: forming a film.   2. The plasma polymerization according to claim 1, wherein the long base material is a laminate raw material in which a ferromagnetic metal thin film is provided on a nonmagnetic support, and a plasma polymerization film is formed on the ferromagnetic metal thin film. Method for forming a film.   While the non-magnetic support is continuously transported with the non-magnetic support on which the ferromagnetic metal thin film is provided, with the back surface of the non-magnetic support in contact with at least a part of the rotating drum, The method for forming a plasma polymerized film according to claim 1 or 2, wherein a plasma polymerized film is formed on the film.   4. The method for forming a plasma polymerized film according to claim 1, wherein the source gas is a hydrocarbon monomer gas.   The method for forming a plasma polymerized film according to any one of claims 1 to 4, wherein a plasma voltage during plasma film formation is 300 to 1000V. A plasma polymerized film forming apparatus for forming a plasma polymerized film on the long base material while continuously conveying the film-like long base material,
The apparatus includes, as an electrode for performing plasma polymerization, a plasma electrode on the side facing the surface on which the plasma polymerization film is formed, and an earth side electrode that does not generate discharge, which is the other electrode ,
In the plasma electrode, the surface facing the surface on which the plasma polymerized film is formed is coated with a polymer material at a coverage of 50 to 100%, and the ground side electrode is coated with the polymer material. The plasma polymerized film formation is characterized in that the surface opposite to the surface on which the plasma polymerized film of the long substrate is formed is continuously conveyed in contact with the ground electrode. apparatus.   An apparatus for forming a plasma processing object as a laminate raw material in which a ferromagnetic metal thin film is provided on a nonmagnetic support, the apparatus for continuously transporting the plasma processing object in contact with the back surface of the nonmagnetic support The plasma polymerized film forming apparatus according to claim 6, comprising a rotating drum, and an electrode coated with a polymer material is disposed so as to face the rotating drum.

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