JP3935305B2 - Substrate for liquid crystal device and liquid crystal device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a liquid crystal device substrate and a liquid crystal device, and more particularly to an active matrix type liquid crystal device substrate and a liquid crystal device.
[0002]
[Prior art]
A liquid crystal device is formed by arranging liquid crystal between a pair of substrates facing each other, and performs display by modulating light passing through the liquid crystal according to the alignment state of the liquid crystal. In particular, an active matrix liquid crystal device that does not cause crosstalk and has excellent image quality is widely used in displays of various electronic devices and the like.
[0003]
Taking a TFT liquid crystal device as an example of such an active matrix liquid crystal device, as shown in FIG. 8, a TFT array substrate 120 which is one substrate of the liquid crystal device has the following configuration.
In this figure, a plurality of pixel electrodes 101 are formed in a matrix on a predetermined substrate, scanning lines 104 are extended along the horizontal sides of each pixel electrode 101, and along the vertical sides of the pixel electrode 101. A data line 103 is extended. An auxiliary capacitance line 106 extends in the lateral direction near the lower peripheral edge of the pixel electrode 101, and a part of the auxiliary capacitance line 106 extends in the vertical direction of the pixel electrode 101 by forming a branch portion 106a. Yes. Further, a semiconductor layer 108 is formed at a predetermined position below the data line 103 and the scanning line 104, and constitutes a switching element (thin film transistor) 111 that controls the pixel electrode 101 together with the scanning line 104 and the like.
[0004]
The semiconductor layer 108 is connected to the data line 103 through the contact hole 114, and this portion of the semiconductor layer forms a source region. The semiconductor layer 108 is connected to one end of the drain electrode 112 through the contact hole 116, and this portion of the semiconductor layer forms a drain region. On the other hand, the other end of the drain electrode 112 is connected to the pixel electrode 101 through a contact hole 118. Note that a portion of the semiconductor layer 108 between the contact hole 114 and the contact hole 116 forms a U-shaped portion 108a, and the U-shaped portion 108a intersects the scanning line 104 twice. This TFT 111 is a dual gate type. It is TFT.
A part of the semiconductor layer 108 also extends under the branch portion 106 a of the auxiliary capacitance line 106, and the storage capacitance portion 105 is formed by the semiconductor layer 108 and the auxiliary capacitance line 106.
[0005]
By the way, the auxiliary capacitance line 106 and the scanning line 104 are usually formed by patterning the same layer, and when they come into contact with each other, a line defect occurs due to a short circuit between the lines.
[0006]
[Problems to be solved by the invention]
However, in this case, the following problem occurs. That is, as shown in FIG. 9, there is a region 210 where the substrate is exposed without forming the scanning line 104 in the portion between the auxiliary capacitance line 106 and the scanning line 104, and light leakage occurs in this portion. There is a problem. For example, when the alignment film is rubbed in the direction 200 of the pixel electrode 101, the lower peripheral edge (region 220) of the pixel electrode 101 is liquid crystal due to the influence of a lateral electric field from the adjacent pixel electrode. The orientation abnormality occurs, so-called disclination lines appear, and the image quality deteriorates.
[0007]
For this reason, a light shielding layer (black matrix) is usually provided on the substrate side facing the TFT array substrate 120 to prevent light leakage from the region 210 and to conceal the image quality defective portion in the region 220. Are formed in a lattice pattern.
However, in order to form the light-shielding layer, it is necessary to increase the number of manufacturing steps by one, and the production efficiency is reduced accordingly. In consideration of the positional deviation when the TFT array substrate 120 and the counter substrate are bonded, the light shielding layer is usually formed so as to overlap the peripheral edge of each pixel electrode 101. There is also a problem that the aperture ratio (the ratio of the area of the image display unit to the area of the substrate) decreases.
[0008]
On the other hand, it is ideal to increase the width of the data line 103 and the scanning line 104 and overlap them on the peripheral edge of the pixel electrode 101 to form a light shielding layer. However, in this case, the aperture ratio decreases, This is not preferable because the capacity of the data line 103 and the scanning line 104 increases and wiring delay occurs.
An object of the present invention is to provide a liquid crystal device substrate and a liquid crystal device that solve the above-mentioned problems in a liquid crystal device substrate, eliminate the need for a step of forming a light shielding layer, and improve production efficiency and aperture ratio.
[0009]
[Means for Solving the Problems]
In order to achieve the above-described object, the substrate for a liquid crystal device according to the present invention has pixel electrodes controlled by switching elements formed in a matrix on the surface of the substrate, and each pixel electrode between adjacent pixel electrodes. Gap portions extending in parallel to the intersecting sides of each other are formed,
In the gap extending in at least one direction, an auxiliary capacitance line serving as a light shielding layer is disposed so as to overlap with the peripheral edge of the pixel electrode adjacent thereto,
The auxiliary capacitance line is provided with a contact hole for electrically connecting the pixel electrode and the switching element.
According to such a configuration, the gap and the peripheral edge of the pixel electrode are reliably shielded from light by the storage capacitor line, so that the contrast of the image is improved. Further, since the auxiliary capacitance line also serves as the light shielding layer, it is possible to omit the step of separately forming the light shielding layer. Further, since the storage capacitor line serving as the light shielding layer is formed on the same substrate side as the pixel electrode, the aperture ratio can be improved by minimizing the amount of overlap between the light shielding layer and the pixel electrode. In addition to these, since the contact hole for lowering the aperture ratio is formed in the auxiliary capacitance line which is a non-display portion, the aperture ratio can be improved accordingly.
[0010]
In the substrate for a liquid crystal device of the present invention, it is preferable that the auxiliary capacitance line is disposed at least in a portion where an alignment abnormality of liquid crystal molecules occurs.
In this way, the image quality can be improved by concealing the image quality-decreasing portion due to the abnormal alignment of the liquid crystal molecules.
[0011]
When viewed from a direction orthogonal to the one direction, the length of the overlapping portion between the auxiliary capacitance line and the peripheral portion of one pixel electrode adjacent to the auxiliary capacitance line is equal to the length of the auxiliary capacitance line and the other adjacent to the auxiliary capacitance line. Preferably, the contact hole is longer than the length of the overlapping portion with the peripheral edge portion of the pixel electrode, and the contact hole is formed in the auxiliary capacitance line in the overlapping portion with the one pixel electrode.
Further, it is preferable that the one direction is not parallel to the rubbing direction of the alignment film formed on the surface of the pixel electrode.
Then, when viewed from each pixel electrode, the contact hole is formed on the side of the auxiliary capacitance line located on the starting point side in the rubbing direction among the auxiliary capacitance lines respectively superimposed on the opposing peripheral edge portions of the pixel electrodes. It is preferable that
[0012]
The liquid crystal device according to the present invention includes the liquid crystal device substrate and a counter substrate disposed to face the liquid crystal device substrate via liquid crystal.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a substrate for a liquid crystal device according to the present invention will be described with reference to FIGS. The “substrate for a liquid crystal device” in the present invention is one substrate constituting a liquid crystal device, and includes at least a plurality of pixel electrodes, a switching element for controlling each pixel electrode, and an auxiliary capacitance line. However, there are no particular restrictions on the others, and color filters and the like may be provided as appropriate. Note that a thin film transistor (hereinafter referred to as “TFT”) is preferably used as the switching element. In this case, scanning lines and data lines are formed on the liquid crystal device substrate side.
[0014]
The liquid crystal device substrate 20 is configured as shown in FIG. That is, a plurality of vertically elongated pixel electrodes 1 made of a transparent conductive thin film such as indium tin oxide (hereinafter abbreviated as ITO) are provided in a matrix on a predetermined substrate made of glass or the like. In the vicinity of each pixel electrode 1, a TFT (switching element) 11 to be described later is provided. Between the adjacent pixel electrodes 1, a gap 7A extending in parallel with one direction (lateral side) of the pixel electrode 1 and the vertical direction of the pixel electrode 1 intersecting the gap 7A. A gap 7B extending in parallel with the sides is formed. Further, a wide auxiliary capacitance line 6 is disposed in the gap portion 7A, and a data line 3 is disposed in the gap portion 7B. Further, the scanning line 4 is extended so as to be parallel to the lateral side of the pixel electrode 1 and cross the pixel electrode 1. The auxiliary capacitance line 6 prevents leakage of an image signal held for a certain period between the pixel electrode 1 and the counter electrode, and is in parallel with a liquid crystal capacitor formed between the pixel electrode and the counter electrode. Has a storage capacity. In this case, the storage capacitor is configured as a whole by arranging the auxiliary capacitance line 6 and the semiconductor layer 8 so as to face each other via the gate insulating layer serving as a dielectric film. A part of the storage capacitor line 6 includes a branch part 6 a extending in the vertical direction, and the branch part 6 a covers a part of the data line 3. That is, when one pixel is taken, the storage capacitor line 6 is formed in a substantially H shape.
[0015]
An inverted L-shaped semiconductor layer 8 is formed at a predetermined position below the data line 3, the scanning line 4, and the auxiliary capacitance line 6, and constitutes a TFT 11 that controls the pixel electrode 1. One end of the semiconductor layer 8 is connected to the data line 3 through the contact hole 14, extends laterally therefrom, and then bends at a right angle so as to intersect the scanning line 4, and the other end forms a piece-like portion. . This piece-like portion is located under the storage capacitor line 6, and the drain electrode 12 is formed on the piece-like portion. One end of the drain electrode 12 is connected to the semiconductor layer 8 through the contact hole 16, and the other end is connected to the pixel electrode 1 through the contact hole 18. That is, the pixel electrode 1 is electrically connected to the TFT 11 through the contact hole 18.
[0016]
The scanning line 4 includes a tongue piece extending in the vertical direction. The scanning line 4 intersects with the main body portion of the scanning line 4 and the inverted L-shaped portion of the semiconductor layer 8 at two locations of the tongue piece portion. Constitute channel regions 10a and 10b, respectively, to form a dual gate type TFT. Based on a signal applied to the scanning line 4, the current flowing between the data line 3 and the pixel electrode 1 is controlled via the drain electrode 12.
[0017]
A cross-sectional structure of the liquid crystal device substrate 20 is as shown in FIG.
In this figure, a semiconductor layer 8 made of, for example, a polysilicon film is formed on the surface of a substrate 2, and a gate insulating layer 22 is formed so as to cover the semiconductor layer 8 and the substrate 2. Then, the scanning line 4 and the auxiliary capacitance line 6 that form a gate electrode are disposed as a same layer at a predetermined position on the semiconductor layer 8 via the gate insulating layer 22, and further, the scanning line 4, the auxiliary capacitance line 6, and A first interlayer insulating layer 24 is formed so as to cover the gate insulating layer 22. On the first interlayer insulating layer 24, the data line 3 and the drain electrode 12 are formed, which are connected to the contact holes 14 and 16, respectively. The contact holes 14 and 16 are respectively connected to the first interlayer insulating layer 24 and the gate. It penetrates the insulating layer 22 and is connected to the semiconductor layer 8. A second interlayer insulating layer 26 is formed on the data line 3, the drain electrode 12, and the first interlayer insulating layer 24, and the pixel electrode 1 is formed on the second interlayer insulating layer 26. The pixel electrode 1 is connected to the contact hole 18, and the contact hole 18 passes through the second interlayer insulating layer 26 and is connected to the drain electrode 12. Further, an alignment film 28 is formed on the surface of the pixel electrode 1 in a rubbing direction to be described later. In this figure, a counter substrate 50 is disposed opposite to the liquid crystal device substrate 20 to constitute a liquid crystal device 60 as a whole. The description of the counter substrate 50 and the liquid crystal device 60 will be given later.
[0018]
In the liquid crystal device substrate 20, the image display unit is configured as follows. First, the storage capacitor line 6 disposed so as to overlap the peripheral edge of the pixel electrode 1 forms a light shielding layer (black matrix) 32 in the extending direction of the gap 7A (lateral direction in FIG. 1). Further, a portion of the pixel electrode 1 that does not overlap the auxiliary capacitance line 6 (more specifically, the scanning line 4 and the drain electrode 12) is an image display unit 34. On the other hand, in the direction in which the gap 7B extends (vertical direction in FIG. 1), the data line 3 (not shown) and the auxiliary capacitance line 6 (the branching portion 6a thereof) overlapping the peripheral edge of the pixel electrode 1 form the light shielding layer 32. The light shielding layer described above is effective mainly when transmissive display is performed on the liquid crystal device, and the edge of the light shielding layer defines the size (aperture ratio) of the image display portion.
[0019]
The arrangement state of the light shielding layer 32 when the liquid crystal device substrate 20 is viewed from above is as shown in FIG. 3, and the gap portion 7A is shielded by the auxiliary capacitance line 6 (cross hatched portion in the figure). The gap portion 7B is shielded from light by the branch portion 6a of the data line 3 and the auxiliary capacitance line 6. Further, a part of the pixel electrode is shielded by the scanning line 4.
[0020]
As described above, since the gaps 7A and 7B and the peripheral edge of the pixel electrode are reliably shielded from light by the storage capacitor line (and the data line), the contrast of the image can be further improved. Since the auxiliary capacitance line (and the data line) also serves as the light shielding layer, the step of forming the light shielding layer can be omitted. Further, since the storage capacitor line serving as the light shielding layer is formed on the same substrate side as the pixel electrode, it is not necessary to consider the positional deviation when the substrates are bonded as in the case where the light shielding layer is formed on the counter substrate side. The aperture ratio can be improved by minimizing the amount of overlap between the light shielding layer and the pixel electrode.
[0021]
In addition to these, the present invention is characterized in that a contact hole 18 (for electrically connecting the pixel electrode 1 and the TFT 11) is formed in the auxiliary capacitance line 6. In this case, the contact hole 18 does not contribute to the screen display, which causes a decrease in the aperture ratio. Therefore, by opening the contact hole 18 in the auxiliary capacity line 6 which is a non-display portion, the aperture ratio can be improved accordingly. Since the auxiliary capacitance line 6 does not need to consider the problem of wiring delay unlike the data line 3 or the scanning line 4, the degree of freedom in designing the dimensions is large. For example, by making the auxiliary capacitance line 6 wider. The contact hole 18 can be easily formed. The position at which the contact hole 18 is formed in the storage capacitor line 6 is not particularly limited. However, if the contact hole is too close to the end of the storage capacitor line 6, the contact hole may be removed due to an accuracy error when the contact hole is formed. May be conducted to the side wall of the data line 3. For this reason, it is preferable to form a contact hole near the center of the auxiliary capacitance line 6.
[0022]
In particular, when the contact hole is formed, it is necessary to cut the insulating film formed on the auxiliary capacitance line 6. However, when this insulating film is made of acrylic resin or the like, the cutting accuracy is lowered. It is necessary to increase the diameter of the contact hole by about the same amount (about 7 to 8 μm). Usually, the auxiliary capacitor line 6 is wider than the scanning line 4 because of the necessity of shortening the charging time for the auxiliary capacitor, and a contact hole can be easily (large diameter) formed in the auxiliary capacitor line 6. . For example, when the contact hole is rectangular, the length of the side (long side) is referred to as “the diameter of the contact hole”.
[0023]
Next, a preferable relationship between the rubbing direction of the alignment film formed on the surface of the pixel electrode and the formation position of the auxiliary capacitance line 6 will be described with reference to FIGS. In addition, after applying an alignment film on the surface of the pixel electrode, the liquid crystal molecules can be aligned in this direction by rubbing in a predetermined direction. 5 is a cross-sectional view taken along the line BB ′ of FIG. 4 (viewed from a direction orthogonal to the direction in which the gap 7A extends), and FIG. 6 is a partially enlarged view of FIG. FIG.
[0024]
In FIG. 4, the rubbing direction L of the alignment film is a direction from the lower right to the upper left in the drawing, and the lower end side of each pixel electrode 1a, 1b is located on the starting point side during rubbing. In this case, for example, when the pixel inversion driving method is employed in order to reduce the flicker of the liquid crystal screen, a potential difference (lateral electric field) in the vertical direction in the figure is generated between the pixel electrodes 1a and 1b. Then, the alignment state of the liquid crystal molecules is disturbed in that portion, and the alignment state of the liquid crystal molecules is greatly changed as compared with the portion where the transverse electric field is not generated, and the boundary portion appears as the disclination D, resulting in the deterioration of the image quality. It will be. In particular, since the disclination D appears on the inner side of the pixel electrode on the rubbing start point side, the image quality degradation becomes more prominent.
[0025]
This will be described with reference to FIG. 5. When rubbing is performed from B ′ to B in FIG. 5, the liquid crystal molecules have a pretilt angle α that is parallel to the rubbing direction L and widens in this direction. And become oriented. However, when a horizontal electric field is generated between the adjacent pixel electrodes 1a and 1b, liquid crystal molecules are aligned along the horizontal electric field in this portion, and the alignment angle of the liquid crystal molecules changes from the initial α, resulting in an abnormal alignment (alignment). Unevenness occurs (region R). In particular, the range where the lateral electric field extends is wide on the rubbing start point side (near 1 s in the figure), and the region where the alignment abnormality occurs is wider than that on the rubbing end point side (near 1 t in the figure). Therefore, in the present invention, it is preferable to make the region Y for forming the storage capacitor line 6 wider than the orientation abnormal region R so as to reliably hide the orientation abnormal region.
[0026]
That is, as shown in FIG. 6, at the lower peripheral edge of the pixel electrode 1a where the disclination D appears on the inner side of the screen, the extended portion of the auxiliary capacitance line 6 is enlarged and overlapped with the pixel electrode 1a. Increase the length 1s of the portion. On the other hand, in the upper peripheral portion of the pixel electrode 1b where the disclination D appears relatively outside the screen, the extension portion of the auxiliary capacitance line 6 may be reduced to shorten the overlap portion length 1t. In this case, since the overlapping portion 1s is wider than the overlapping portion 1t, it is preferable to form the contact hole 18 on the auxiliary capacitance line 6 side in the overlapping portion 1s.
[0027]
The direction in which the storage capacitor line 6 is arranged is preferably not parallel to the rubbing direction L of the alignment film, that is, the direction in which the gap 7A extends has a predetermined angle θ with the rubbing direction L. When the angle θ = 0, the rubbing start point is on the right side of the pixel electrode 1a in FIG. 6, and accordingly, the disclination D also appears on the right side of the pixel electrode 1a, that is, in a direction orthogonal to the direction 7A. . However, in principle, the auxiliary capacitance line 6 is not formed in this direction, or even if it is formed, the overlapping portion with the pixel electrode 1a is small, so that the disclination D cannot be effectively concealed. Because there is.
[0028]
Next, a liquid crystal device 60 using the above-described liquid crystal device substrate 20 will be described with reference to FIG.
In this figure, a liquid crystal device 60 is manufactured by disposing a counter substrate 50 opposite to a liquid crystal device substrate 20. In this counter substrate 50, color filters 54 a, 54 b, 54 c each forming one of the three primary colors are appropriately formed on the surface of a substrate 52 such as glass, and the counter substrate 50 is made of ITO or the like via a protective layer 58 thereon. An electrode 58 is formed on the entire surface of the substrate 52. Each color filter 54 a, 54 b, 54 c is disposed at a position corresponding to each pixel electrode 1, and an alignment film 59 is formed on the surface of the counter electrode 58. The liquid crystal device 60 is configured by interposing the liquid crystal 40 between the substrates 20 and 50 using a predetermined sealing material.
[0029]
The liquid crystal device 60 has an equivalent circuit as shown in FIG. 7 and operates as follows.
First, the data line 3 (signal line) for supplying an image signal is connected to the source region of the TFT 11, and the pixel electrode 1 is connected to the drain region of the TFT 11. The scanning line 4 is connected to the gate of the TFT 11, and the TFT 11 as a switching element is closed for a certain period, so that the image signals S 1, S 2,. Write in. The image signals S1, S2,..., Sn may be supplied line-sequentially in this order, or may be supplied for each group of a plurality of adjacent data lines 3. Further, the scanning signals G1, G2,..., Gm are applied to the scanning line 4 in a pulse-sequential manner in this order in a pulse manner at a predetermined timing.
[0030]
Image signals S1, S2,..., Sn written to the liquid crystal via the pixel electrode 1 are held for a certain period with the counter electrode 58 (not shown) formed on the counter substrate 50. In order to prevent the held image signal from leaking, the storage capacitor 5 constituted by the auxiliary capacitance line 6 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 1 and the counter electrode. . In this way, for example, the voltage of the pixel electrode 1 is held for a time that is three orders of magnitude longer than the time when the source voltage is applied by the storage capacitor 5, the holding characteristics are further improved, and the contrast ratio of the liquid crystal device is improved. .
[0031]
【The invention's effect】
As apparent from the above description, according to the present invention, the gap and the peripheral edge of the pixel electrode are reliably shielded from light by the storage capacitor line, so that the contrast of the image is improved. Further, since the auxiliary capacitance line also serves as the light shielding layer, it is possible to omit the step of separately forming the light shielding layer. Further, since the storage capacitor line serving as the light shielding layer is formed on the same substrate side as the pixel electrode, the aperture ratio can be improved by minimizing the amount of overlap between the light shielding layer and the pixel electrode. In addition to these, since the contact hole for lowering the aperture ratio is formed in the auxiliary capacitance line which is a non-display portion, the aperture ratio can be improved accordingly.
[Brief description of the drawings]
FIG. 1 is a top view showing a substrate for a liquid crystal device of the present invention.
FIG. 2 is a cross-sectional view taken along the line AA ′ of FIG.
FIG. 3 is a top view illustrating an arrangement state of an image display portion and a light shielding layer in a liquid crystal device substrate.
FIG. 4 is a diagram illustrating a rubbing direction of an alignment film in a pixel electrode.
FIG. 5 is a cross-sectional view taken along line BB ′ of FIG.
6 is a partially enlarged view of FIG. 1 in the vicinity of the auxiliary capacitance line.
FIG. 7 is an equivalent circuit of various elements and wirings in a plurality of pixels constituting an image display area of the liquid crystal device.
FIG. 8 is a top view illustrating a conventional substrate for a liquid crystal device.
FIG. 9 is a top view showing a non-light-shielding portion and a region where disclination occurs in a conventional substrate for a liquid crystal device.
[Explanation of symbols]
1 pixel electrode 1s, 1t length of overlapping portion of pixel electrode and auxiliary capacitance line 2 substrate 3 data line 4 scanning line 6 auxiliary capacitance line 6a auxiliary capacitance line branching portion 7A gap portion 7B extending in one direction and one direction Gap 11 extending in the intersecting direction Switching element (TFT)
18 Contact hole 20 Liquid crystal device substrate 32 Light shielding layer 50 Opposite substrate 60 Liquid crystal device L Rubbing direction

Claims (8)

Pixel electrodes controlled by the switching elements are formed in a matrix on the surface of the substrate, and gap portions extending in parallel to sides intersecting with each other are formed between adjacent pixel electrodes.
In the gap extending in at least one direction, an auxiliary capacitance line serving as a light shielding layer is disposed so as to overlap with the peripheral edge of the pixel electrode adjacent thereto,
The auxiliary capacitance line is provided with a contact hole for electrically connecting the pixel electrode and the switching element,
The auxiliary capacitance line includes a branch portion in a direction orthogonal to the one direction,
A scanning line extends in parallel to the one side of the pixel electrode so as to cross the pixel electrode, and the scanning line includes a tongue piece extending in a direction perpendicular to the one direction. The substrate for a liquid crystal device, wherein the semiconductor layer included in the switching element intersects with the scanning line main body portion and the tongue piece portion at two locations.   The substrate for a liquid crystal device according to claim 1, wherein the storage capacitor line is formed in a substantially H shape when one pixel is taken.   The liquid crystal device substrate according to claim 1, wherein the branch portion covers a part of the data line and is thicker than a part of the data line.   4. The substrate for a liquid crystal device according to claim 1, wherein the auxiliary capacitance line is disposed at least in a portion where an alignment abnormality of liquid crystal molecules occurs. The auxiliary capacitance line is provided along a scanning line;
When viewed from a direction orthogonal to the one direction, the length of the overlapping portion between the auxiliary capacitance line and the peripheral edge of one pixel electrode adjacent thereto is the length of the auxiliary capacitance line and the other pixel electrode adjacent thereto. Longer than the length of the overlap with the peripheral edge of
5. The substrate for a liquid crystal device according to claim 1, wherein the contact hole is formed in an auxiliary capacitance line at an overlapping portion with the one pixel electrode.   6. The substrate for a liquid crystal device according to claim 1, wherein the one direction is not parallel to a rubbing direction of an alignment film formed on the surface of the pixel electrode.   When viewed from each pixel electrode, the contact hole is formed on the side of the auxiliary capacitance line located on the starting point side in the rubbing direction among the auxiliary capacitance lines respectively superimposed on the opposing peripheral portions of the pixel electrodes. The liquid crystal device substrate according to claim 6, wherein the substrate is a liquid crystal device substrate.   A liquid crystal device comprising: the substrate for a liquid crystal device according to claim 1; and a counter substrate disposed so as to face the liquid crystal device substrate with a liquid crystal interposed therebetween.

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