JP3841600B2 - Rectifier for gas processing vessel - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention is for a gas processing container installed at an inlet portion in a gas processing container such as a gas temperature control tower, a gas cooler, a gas cooling device, or a cooling tower that needs to uniformly flow the gas introduced into the container. It relates to a rectifier.
[0002]
[Prior art]
For example, in a gas temperature control tower of a garbage incinerator, in order to adjust the temperature by injecting cooling water into gas (exhaust gas), it is necessary to uniformly feed the gas introduced from the upper part downward.
In the conventional gas temperature control tower, as shown in FIGS. 21 and 22, the exhaust gas discharged from the heat recovery boiler is first guided 45 degrees obliquely upward and then bent 45 through a bent duct 2 bent 90 degrees downward. It is connected to the gas inlet 1a at the top of the tower body 1 from above. At the entrance of the tower body 1, the introduced gas is guided in the horizontal direction and rectified by the plurality of vertical vanes 3 and the plurality of horizontal vanes 4, and further turned downward by the step portion 5 and the inclined guide plate 6. The And it was comprised so that it might rectify | straighten by the rectification | straightening grid 7 installed over the whole surface in the plane cross section in the upper part of the tower main body 1, and the flow of the gas in the cross section of the tower main body 1 might become uniform.
[0003]
[Problems to be solved by the invention]
However, in the above conventional configuration, since the gas is introduced using the bent duct 2, there is a problem that the bent duct 2 protrudes upward from the gas temperature control tower installed at the top of the facility building. It was. For this reason, the construction which raises the ceiling part of a building according to the bending duct 2 was performed.
[0004]
The present invention solves the above-mentioned problems, and even if the bent duct does not once make a detour upward, the gas sent from below can be sufficiently rectified at the inlet of the container to guide it downward in the container. An object of the present invention is to provide a rectifier for a vehicle.
[0005]
[Means for Solving the Problems]
In order to achieve the above object, the invention described in claim 1 introduces gas into a container in which a gas passage for flowing gas downward from the upper part of the container is formed, from a gas introduction port opened on the upper side surface of the container. A gas rectifier for rectifying a gas processing vessel, wherein a gas introduction duct for turning a gas supplied from an obliquely lower side in a horizontal direction and feeding the gas into a gas introduction port; In the detour space formed on the side, a step portion having a hanging wall that is hung from the top wall at a predetermined distance from the gas inlet, and an inclined guide portion that is inclined downward and downstream from the step portion to guide the gas downward And horizontal vanes arranged in a plurality of stages in the vertical direction on the opening surface of the gas introduction port, and a rectifying grid arranged in a gas passage lower than the gas introduction port. Inclined downward on the downstream side A.
[0006]
According to the above configuration, the exhaust gas flow that has been turned obliquely upward from the gas introduction duct and then turned horizontally and sent to the detour space from the gas introduction port is the center and outer periphery (upper part) of the cross section of the flow path. In the gas flow separated by the plurality of horizontal vanes, the uppermost gas flow that flows into the separation flow path portion at a high speed is greatly decelerated due to the resistance of the drooping wall. In the central separation channel, the gas flow is considerably accelerated and temporarily becomes high speed, but the frictional resistance due to contact with the horizontal vane, the gas flow merged from the uppermost divided flow channel, When the flow path area is rapidly expanded by the guide portion, the resistance is gradually reduced and introduced into the rectifying grid. In the lowermost separation flow path portion, the gas flow is not accelerated because it is largely turned downward by the lower horizontal vane. Further, the gas flow is a rectifying grid, and a relatively fast gas flow is averaged by the action of the rectifying grid and the contact between the gas flows in the central portion.
[0007]
Therefore, even if the gas flow supplied from below is turned horizontally from the lower side by the gas introduction duct and sent to the container, the gas flow is decelerated in the bypass space by the plurality of horizontal vanes and the step portions. The flow velocity is further uniformed by the rectifying grid, and a uniform gas flow can be sent into the gas passage that bends 90 °, eliminating the need to project the gas introduction duct upward and feeding it from above, making the container storage building high. The construction to do becomes unnecessary.
[0008]
According to a second aspect of the present invention, there is provided a gas processing container for introducing a gas into a container having a gas passage for flowing gas downward from the upper part of the container, and rectifying by introducing the gas from a gas inlet opening on an upper side surface of the container. A gas rectifier for turning a gas supplied from obliquely below in a horizontal direction and feeding the gas into a gas inlet, and the gas inlet at the upper end of the gas passage is opened sideways. A rectangular parallelepiped detour space, a rectifying grid disposed below the gas introduction port of the gas passage, and the detour space disposed in parallel to the opening surface of the gas introduction port at a predetermined interval from the opening surface to the back side. A plurality of vertical rectifying plates that form a plurality of rectifying spaces, and the height of the inlet formed between the vertical rectifying plates and the ceiling wall of the bypass space decreases from the gas inlet to the back side. It is formed as follows.
[0009]
According to the above configuration, the gas flow that is turned in the horizontal direction from the upper side by the gas introduction duct and flows into the gas introduction port has a faster velocity distribution toward the outer peripheral side (upper part). Flows into the upper part of the step-like first to fourth vertical rectifying plates, and flows into the respective rectifying spaces from the upper inlets thereof. At this time, in each rectifying space, a high-speed gas flow is generated along the surfaces of the first to fourth rectifying plates and the back wall of the bypass space. The gas flow is decelerated by the frictional resistance, and the vortex generated at the back of the upper end of the vertical rectifying plate causes resistance to decelerate the gas flow. Is made uniform.
[0010]
Therefore, even if the gas flow supplied from the lower side by the gas introduction duct is turned from the lower side to the horizontal direction and flows into the container, the gas flow can be rectified to a uniform flow rate by the gas passage bent 90 °. As a result, uniform gas treatment is possible, and it is not necessary to project the gas introduction duct upward, and construction for raising the storage building becomes unnecessary.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Here, a first embodiment of a gas rectifier according to the present invention will be described with reference to FIGS.
This rectifier 10 is provided in the temperature control tower 11 installed in the exhaust gas path of a waste incinerator facility, for example, and in the container 12 of the temperature control tower 11, the gas of the rectangular cross section sent from the upper part toward the lower part In the passage 13, cooling water is injected into the exhaust gas to obtain exhaust gas having a predetermined temperature. Therefore, unless the flow velocity of the gas passage 13 is uniform, the cooling cannot be performed efficiently.
[0012]
In this rectifier 10, a gas introduction duct 16 is connected to a gas introduction port 15 that communicates from a gas duct 14 in the vertical direction to a gas passage 13 on the upper side wall of the temperature control tower 11. The gas introduction duct 16 is formed in a rectangular channel cross section having a width: w and a height: h at an outlet thereof, and a cross-sectional area ratio with respect to the gas passage 13 having a rectangular cross section is formed, for example, 1: 2. The vertical connecting portion 16a connected to the gas duct 14, the inclined portion 16b bent obliquely upward from the vertical connecting portion 16a at a bending angle θ (40 to 50 °), and further horizontally from the upper end of the inclined portion 16b. It is comprised with the horizontal inflow part 16c bent and connected to the gas inlet 15. FIG.
[0013]
The gas passage 13 is formed in a rectangular cross section having a flow passage width: W (= w) and height (depth): H, and gas blown horizontally from the gas inlet 15 into the upper end of the gas passage 13. A detour space 17 that detours the flow downward is formed. In the ceiling wall 18 continuing to the upper side of the gas introduction port 15 of the bypass space 17, there are a plane portion 18 a extending along the horizontal plane from the horizontal portion 16 c through the gas introduction port 15, and a step portion 18 b protruding downward. An inclined guide portion 18c that is inclined downward on the back side is formed.
[0014]
That is, the height of the flat wall 18d that is suspended from the gas inlet 15 by a predetermined distance Lo and is opposed to the gas inlet 15 is a length that follows the hanging wall 18d of Ho and the lower end of the hanging wall 18d. A step portion 18b made of an Lp horizontal wall 18e is provided to give a large resistance to the gas flow. Further, an inclined guide portion 18c is provided to detour downward from the rear end portion of the horizontal wall 18e in a state where the gas flow spreads, and the inclined guide portion 18c is inclined from the horizontal to the downward angle: α = 30˜ Mounted at 40 °.
[0015]
Further, for example, three, upper, middle and lower horizontal vanes 21 </ b> A to 21 </ b> C extending rearward from the opening surface of the gas inlet 15 are disposed in the bypass space 17. These horizontal vanes 21 </ b> A to 21 </ b> C are arranged with separation channel portions 20 </ b> A to 20 </ b> D having predetermined heights HA to HD in the vertical direction, and are attached between the side walls over the entire width direction of the bypass space 17.
[0016]
These details will be described with reference to FIG. 2. The upper horizontal vane 21A has an overall length LA, is formed in a flat plate shape extending rearward in the horizontal direction, an introduction angle βA (not shown) = 0 °, and a discharge angle γA. (Not shown) = 0 °. The middle horizontal vane 21B has an overall length of LB, and is inclined at an introduction angle βB from the front end to the intermediate folding position PB, and is further inclined at a discharge angle γB from the folding position PB to the rear end. Further, the lower horizontal vane 21C has an overall length of LC, and is installed with an inclination at an introduction angle βC from the front end to the intermediate folding position PC, and is further installed with an inclination at the discharge angle γC from the folding position PC to the rear end. . The bent portions PB and PC may have an arc shape having a radius.
[0017]
Here, in order to increase the resistance of the uppermost separation flow path portion 20A, the height HA is set to be the same as or smaller than the height Ho of the hanging wall 18d (HA ≦ Ho). Of course, the length LA of the upper horizontal vane 21A is set to be smaller than the length Lo of the flat surface portion 18a (LA <Lo), and a space 20a for discharging the gas in the separation channel portion 20A is provided. The lengths of the horizontal vanes 21A to 21C are in a relationship of LA> LB (LBf + LBr)> LC (LCf + LCr), and further in a relationship of introduction angle βA <βB <βC and discharge angle γA <γB <γC. This is because when the gas is introduced into the gas introduction port 15 from the horizontal direction and swirled downward in the bypass space 17, the flow rate tends to increase as the distance from the swivel center increases. The contact resistance can be made to act on a gas flow by -21C, and can be decelerated. Further, since the turning radius becomes smaller toward the turning center side, the gas flow can be smoothly turned by setting the introduction angle α and the discharge angle γ larger.
[0018]
Further, a plurality of vertical fins 22a along the flow direction of the introduced gas and a plurality of horizontal fins 22b along the transverse direction of the introduced gas are combined at regular intervals at a position below the lower side of the gas inlet 15 by a predetermined distance Δh. A rectifying grid 22 is provided.
In the above-described configuration, the exhaust gas introduced from the gas duct 14 into the gas introduction duct 16 is turned obliquely upward at the inclined portion 16b, and is further turned horizontally to be sent from the horizontal inlet portion 16c to the gas inlet port 15. Entered. At this time, a high-speed gas flow is formed at the center and outer periphery of the flow path cross section.
[0019]
Of the separation flow paths 20A to 20D separated into the horizontal vanes 21A to 21C at the gas inlet 15, the gas flow in the uppermost separation flow path portion 20A is originally introduced at a considerably high speed. The drooping wall 18d and the horizontal vane 21A arranged to face the gas inlet 15 are not significantly decelerated and accelerated. In the separation flow path portions 20B and 20C in the central portion, the gas flow is considerably accelerated and temporarily becomes high speed, but the frictional resistance due to contact with the horizontal vanes 21A to 21C and the gas flow flowing in from the space 20a Then, it is decelerated by the flow passage area rapidly expanded by the inclined guide portion 18 c and is introduced into the rectifying grid 22. In the lowermost guide space 20D, the gas flow is not accelerated because it is largely turned downward by the lower horizontal vane 21C. In the rectifying grid 22, a somewhat high-speed gas flow appears due to the relatively fast flow rate in the central portion, but is averaged by the action of the rectifying grid and the contact between the gas flows.
[0020]
Here, simulation results of the rectifier 10 having the above-described configuration will be described with reference to FIGS. The height of the gas introduction duct 16 (gas introduction port 15) set here: h = 1000, width: w (= W) = 2000, and the arrangement of the horizontal vanes 21A to 21C are HA = HB = HC = HD = 250, length: LA = 600, LBf = 300, LBR = 300, LCf = 200, LCr = 250, introduction angle and discharge angle are βA = 0, βB = 7 °, γB = 45 ° βC = 12 °, γC = 67 ° (each angle is ± 2.5 °), the height Hm of the rectifying grid 22 is 300, the pitch is 150, and the height of the gas passage 13 is h = 20000 (the unit of length is mm). Here, the gas flow rate corresponds to 10,000 to 30,000 Nm ³ / h, and the gas temperature at the inlet corresponds to 240 ° C.
[0021]
It can be seen from the flow velocity distribution shown in FIG. 4 and the flow velocity distributions at the respective cross-sectional positions shown in FIGS. 5 to 11 that the flow velocity distribution of the gas sent downward from the rectifying grid 22 is made uniform.
According to the above-described embodiment, the high-speed upper gas flow droops in the detour space 17 from the exhaust gas flow that is turned from the lower side to the upper side by the gas introduction duct 16 in the horizontal direction and sent to the gas introduction port 15. Since this flow is introduced into the separation flow path portion 20A blocked by the wall 18d and separated by the upper horizontal vane 21A and sent out from the space 20a between the upper horizontal vane 21A and the hanging wall 18d, the detour side outside On the other hand, it is possible to greatly decelerate the gas flow that is extremely accelerated. Further, the gas flow introduced into the separation spaces 20B and 20C in the central portion is effectively decelerated by the frictional resistance caused by the contact with the horizontal vanes 21A to 21C and the flow passage area that is rapidly expanded. Furthermore, the gas flow that has flowed into the lower guide space 20D is not accelerated by the large turning angle of the lower horizontal vane 21C. As a result, a high-speed gas flow is not partially generated in the gas passage 13 by the rectifying grid 22, a gas flow having a uniform flow rate can be obtained, and uniform and efficient exhaust gas temperature adjustment can be performed. it can.
[0022]
Next, a second embodiment of the gas rectifier will be described with reference to FIGS. Note that the same members as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted.
As shown in FIGS. 12 and 13, the rectifying device 30 is configured such that the top wall 31 a of the bypass space 31 is formed in a horizontal rectangular parallelepiped continuous with the upper side of the gas inlet 15, and the gas inlet is formed inside the bypass space 31. The first to fourth vertical baffles 32A to 32D, which are a plurality of vertical rectifying plates arranged parallel to the 15 opening surfaces and spaced apart at predetermined intervals W1 to W5, are attached between the sidewalls over the entire width, and a plurality of Rectifying spaces 33A to 33E are formed.
[0023]
These first to fourth vertical baffles 32A to 32D are formed so as to approach the top wall 31a toward the rear side, and the heights H1 to H4 of the inlets 34a to 34d to the rectifying spaces 33A to 33E are reduced. (H1>H2>H3> H4). In this embodiment, the first to fourth vertical baffles 32 </ b> A to 32 </ b> D are integrally formed by extending from a part of the lateral fins 22 b constituting the rectifying grid 22. Alternatively, a predetermined gap may be provided. The intervals W1 to W5 are set at the outlets of the rectifying spaces 33A to 33E so that at least one horizontal fin 22b is disposed.
[0024]
In the above configuration, the gas flow flowing into the gas introduction port 15 from the gas introduction duct 16 has a faster velocity distribution toward the outer peripheral side (upper part) due to the bending. When this gas flow flows into the bypass space 31, it collides with the upper portions of the step-like first to fourth vertical baffles 32 </ b> A to 32 </ b> D and flows into the rectifying spaces 33 </ b> A to 33 </ b> E separately from the inlets 34 a to 34 d. At this time, a high-speed gas flow is generated along the surfaces of the first to fourth vertical baffles 32A to 32D and the back wall 31b, but a vortex flow is generated on the upper rear side of the first to fourth vertical baffles 32A to 32D to cause a gas flow. Since the length of the contact surface of the gas flow becomes longer toward the back side, which becomes a flow resistance and gradually increases in speed, it is gradually decelerated and made uniform and flows into the rectifying grid 22. The gas flow is made uniform by the action of the rectifying grid 22 and introduced into the gas passage 13.
[0025]
Simulation results of the rectifier having the above-described configuration will be described with reference to FIGS.
Here, the height of the gas introduction duct 16 (gas introduction port 15): h = 1000, and the width: w = 2000. Further, the height of the bypass space 31 is H = 1000, the width is W = 2000, the heights H1 = 756, H2 = 531, H3 = 306, H4 = 81 (each dimension unit is mm) of the inflow ports 34a to 34e. The aperture ratio is h1: h2: h3: h4: h5 = 1.5: 1: 1: 1: 0.5. The vertical baffles 32A to 32D are raised integrally with the third, sixth, ninth and twelfth horizontal fins 22b from the gas inlet 15 side, and the front and rear widths W1: W2: W3: W4 of the rectifying spaces 33A to 33E: The ratio is W5 = 1: 1: 1: 1: 0.6.
[0026]
When a high-speed gas flow at the inlet of the bypass space 31 flows into the rectifying spaces 33A to 33E from the inlet, a high-speed gas flow is generated along the surfaces of the first to fourth vertical baffles 32A to 32D and the back wall 31b. It can be seen that the rectification grid 22 at the exit is gradually decelerated and is made uniform substantially at the exit, and when the rectification grid 22 is over a predetermined distance, it is almost uniformized to ± 60% of the average speed.
[0027]
According to the above-described embodiment, the first to fourth vertical baffles 32A to 32D facing the gas inlet 15 are arranged in the rectangular parallelepiped detour portion 31 with the front and rear widths W1 to W5 being spaced apart, and the plurality of rectifying spaces 33A to 33A are arranged. 33E is divided into front and rear, and the heights H1 to H4 of the inlets 34a to 34e between the first to fourth vertical baffles 32A to 32D and the top wall are made smaller toward the back side (back side) ( H1>H2>H3> H4), and the rectifying grid 22 is disposed at the outlet of the rectifying space, so that the gas flow that is turned from below and flows in the horizontal direction is separated from the inlets 34a to 34d. The gas is introduced into the rectifying spaces 33 </ b> A to 33 </ b> E, decelerated by friction and vortex flow with the first to fourth vertical baffles 32 </ b> A to 32 </ b> D, and the flow velocity of the gas can be made uniform by the rectifying grid 22.
[0028]
【The invention's effect】
As described above, according to the first aspect of the present invention, the exhaust gas flow that is turned obliquely upward from the gas introduction duct and then turned horizontally and fed into the gas introduction port is High-speed flow at the center and outer periphery. At the gas inlet, the uppermost gas flow among the gas flows separated into the plurality of horizontal vanes is introduced at a high speed, but is greatly decelerated by being surrounded by the drooping wall and the horizontal vanes. In the central part, the gas flow is considerably accelerated and temporarily becomes high speed, but it is decelerated by the frictional resistance due to contact with the horizontal vane and the inclined guide part where the flow path area is suddenly expanded, and the rectifying grid be introduced. At the lowest stage, the gas flow is not accelerated because it is largely turned downward by the lower horizontal vane. The relatively fast gas flow at the center of the rectifying grid is averaged by the action of the rectifying grid and the contact between the gas flows.
[0029]
Therefore, even if the gas flow supplied from below by the gas introduction duct is turned diagonally from below to flow into the container, it can be rectified to a uniform flow rate by the gas passage sent downward, and uniform gas treatment This eliminates the need for the gas introduction duct to protrude upward, and eliminates the need for work to raise the storage building.
According to the second aspect of the present invention, the gas flow that is turned in the horizontal direction from the diagonally upward direction by the gas introduction duct and flows into the gas introduction port has a faster velocity distribution toward the upper part, and this gas flow is bypassed. If it flows into space, it will collide with the upper part of the 1st-4th vertical rectifying plate of step shape, and it will be separated into each rectification space from the upper part, and will flow in. At this time, in each rectifying space, a high-speed gas flow is generated along the surfaces of the first to fourth rectifying plates and the back wall of the bypass space. The gas flow is decelerated by the frictional resistance for a long time, and resistance is generated by the vortex generated in the upper back surface of the vertical rectifying plate, thereby decelerating the gas flow, and then flowing into the rectifying grid 22 to equalize the flow velocity of the gas flow. .
[0030]
Therefore, even if the gas flow supplied from the lower side by the gas introduction duct is turned from the lower side to the horizontal direction and flows into the container, it can be rectified to a uniform flow rate by the gas passage sent downward, and the uniform gas treatment This eliminates the need for the gas introduction duct to protrude upward, and eliminates the need for work to raise the storage building.
[Brief description of the drawings]
FIG. 1 is a configuration diagram showing a first embodiment of a rectifier according to the present invention.
FIG. 2 is a partial enlarged cross-sectional view showing a main part of the rectifier.
FIG. 3 is an enlarged perspective view of a main part showing the rectifier.
FIG. 4 is a longitudinal sectional view showing a gas flow simulation result of the rectifier.
5 is a velocity distribution diagram showing the flow velocity at the position aa ′ shown in FIG. 4;
6 is a velocity distribution diagram showing the flow velocity at the position bb ′ shown in FIG. 4;
7 is a velocity distribution diagram showing the flow velocity at the position cc ′ shown in FIG. 4;
8 is a velocity distribution diagram showing a flow velocity at a position dd ′ shown in FIG. 4; FIG.
9 is a velocity distribution diagram showing the flow velocity at the position ee ′ shown in FIG. 4. FIG.
10 is a velocity distribution diagram showing the flow velocity at the position ff ′ shown in FIG. 4;
11 is an enlarged velocity distribution diagram showing the flow velocity at the position gg ′ shown in FIG. 4;
FIG. 12 is a configuration diagram showing a second embodiment of a rectifier according to the present invention.
FIG. 13 is an enlarged perspective view of a main part showing the rectifier.
FIG. 14 is a longitudinal sectional view showing a simulation result of the gas flow of the rectifier.
15 is a velocity distribution diagram showing the flow velocity at the position AA ′ shown in FIG. 14;
16 is a velocity distribution diagram showing the flow velocity at the position BB ′ shown in FIG. 14;
17 is a velocity distribution diagram showing the flow velocity at the position CC ′ shown in FIG. 14;
18 is a velocity distribution diagram showing the flow velocity at the position DD ′ shown in FIG. 14;
FIG. 19 is a velocity distribution diagram showing the flow velocity at the position EE ′ shown in FIG. 14;
20 is an enlarged velocity distribution diagram showing the flow velocity at the position FF ′ shown in FIG. 14;
FIG. 21 is a configuration diagram showing a conventional rectifier.
FIG. 22 is an enlarged perspective view of a main part showing the rectifier.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 Rectifier 11 Temperature control tower 12 Container 13 Gas passage 15 Gas introduction port 16 Gas introduction duct 16a Vertical connection part 16b Inclination part 16c Horizontal inflow part 17 Detour space 18 Top wall 18a Horizontal part 18b Step part 18c Inclination guide part 18d Drooping Walls 20A to 20D Separation channel portions 21A to 21C Horizontal vanes 22 Horizontal lattices 22b Horizontal fins 30 Rectifier 31 Detour spaces 32A to 32D Vertical baffles 33a to 33e Inlet

Claims (3)

A rectifier for a gas processing container that rectifies by introducing a gas from a gas introduction port opened in an upper side surface of the container into a container in which a gas passage for flowing gas downward from the upper part of the container is formed,
A gas introduction duct for turning the gas supplied from diagonally below in a horizontal direction and feeding it to the gas introduction port;
A detour space in which a gas introduction port is formed laterally at the upper end of the gas passage, and a step portion having a hanging wall that hangs down from the top wall at a predetermined distance from the gas introduction port, and a lower downstream side from the step portion. An inclined guide portion that is inclined and guides gas downward;
Horizontal vanes arranged in multiple stages in the vertical direction on the opening surface of the gas inlet,
A rectifying grid disposed in the gas passage below the gas inlet,
The gas vane rectifier according to claim 1, wherein the lower horizontal vane is inclined downward and downstream. A rectifier for a gas processing container that rectifies by introducing a gas from a gas introduction port opened in an upper side surface of the container into a container in which a gas passage for flowing gas downward from the upper part of the container is formed,
A gas introduction duct for turning the gas supplied from diagonally below in a horizontal direction and feeding it to the gas introduction port;
A rectangular parallelepiped detour space in which the gas inlet is opened laterally at the upper end of the gas passage;
A rectifying grid disposed below the gas inlet of the gas passage;
A plurality of vertical rectifying plates that are arranged in the bypass space in parallel to the opening surface of the gas introduction port and spaced apart from the opening surface to form a plurality of rectifying spaces;
A rectifier for a gas processing container, wherein the height of an inflow port formed between the vertical rectifying plate and the ceiling wall of the bypass space is formed so as to decrease from the gas introduction port to the back side. The rectifying grid is configured by arranging a plurality of vertical fins along the flow direction of the introduced gas and a plurality of horizontal fins along the transverse direction of the introduced gas at regular intervals.
The gas processing vessel rectifier according to claim 2, wherein the vertical rectifying plate is integrally extended upward from the lateral fins of the rectifying grid.

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