JP3767897B2 - Gas supply integrated unit - Google Patents

Gas supply integrated unit Download PDF

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Publication number
JP3767897B2
JP3767897B2 JP2004056286A JP2004056286A JP3767897B2 JP 3767897 B2 JP3767897 B2 JP 3767897B2 JP 2004056286 A JP2004056286 A JP 2004056286A JP 2004056286 A JP2004056286 A JP 2004056286A JP 3767897 B2 JP3767897 B2 JP 3767897B2
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flow path
manual valve
process gas
common flow
gas common
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JP2005251790A (en
JP2005251790A5 (en
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修 川久保
昭宏 武市
貴史 井上
敏一 三輪
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CKD Corp
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CKD Corp
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Priority to JP2004056286A priority Critical patent/JP3767897B2/en
Priority to CN2005800067744A priority patent/CN101073141B/en
Priority to PCT/JP2005/000656 priority patent/WO2005083754A1/en
Priority to KR1020067020398A priority patent/KR100825050B1/en
Priority to TW094102114A priority patent/TWI411742B/en
Priority to TW100130883A priority patent/TWI416029B/en
Priority to TW099130142A priority patent/TWI486535B/en
Publication of JP2005251790A publication Critical patent/JP2005251790A/en
Publication of JP2005251790A5 publication Critical patent/JP2005251790A5/ja
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C7/00—Methods or apparatus for discharging liquefied, solidified, or compressed gases from pressure vessels, not covered by another subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/04—Arrangement or mounting of valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17D—PIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00—Pipe-line systems
    • F17D1/02—Pipe-line systems for gases or vapours
    • F17D1/04—Pipe-line systems for gases or vapours for distribution of gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/01—Mounting arrangements
    • F17C2205/0123—Mounting arrangements characterised by number of vessels
    • F17C2205/013—Two or more vessels
    • F17C2205/0134—Two or more vessels characterised by the presence of fluid connection between vessels
    • F17C2205/0146—Two or more vessels characterised by the presence of fluid connection between vessels with details of the manifold
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323—Valves
    • F17C2205/0329—Valves manually actuated
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0382—Constructional details of valves, regulators
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
    • F17C2223/0107—Single phase
    • F17C2223/0123—Single phase gaseous, e.g. CNG, GNC
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/04—Methods for emptying or filling
    • F17C2227/044—Methods for emptying or filling by purging
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/043—Pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/06—Controlling or regulating of parameters as output values
    • F17C2250/0605—Parameters
    • F17C2250/0636—Flow or movement of content
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2260/00—Purposes of gas storage and gas handling
    • F17C2260/02—Improving properties related to fluid or fluid transfer
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2270/00—Applications
    • F17C2270/05—Applications for industrial use
    • F17C2270/0518—Semiconductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Valve Housings (AREA)
  • Pipeline Systems (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Description

本発明は、半導体工程にプロセスガスを供給するため、プロセスガスを分岐して供給するガス供給集積ユニットに関するものである。   The present invention relates to a gas supply integrated unit that branches and supplies a process gas to supply a process gas to a semiconductor process.

半導体製造工場においては、プロセスガスはタンクに収納されクリーンルームの外に配置されている。そして、タンクから同じプロセスガスをクリーンルーム内の複数箇所に供給するために、プロセスガスを分岐して供給するガス供給装置が使用されている。その様なガス供給装置においては、プロセスガスを新たに必要とする箇所が生じた場合には、１ライン増設する作業を行う必要がある。
図１６に、３ラインの供給を行っているプロセスガス供給装置の回路図を示し、図１７に、その回路を具体化した空圧機器の設置状態を平面図で示す。プロセスガスエアオペレート弁１０７が、プロセスガス供給口１０８を介して図示しないプロセスガスタンクと接続している。プロセスガスエアオペレート弁１０７は、プロセスガス共通流路１０５を介して、第２手動弁１０３Ａ，１０３Ｂ，１０３Ｃに接続している。 In a semiconductor manufacturing factory, process gas is stored in a tank and disposed outside a clean room. In order to supply the same process gas from the tank to a plurality of locations in the clean room, a gas supply device that branches and supplies the process gas is used. In such a gas supply apparatus, when a location where a process gas is newly required arises, it is necessary to perform an operation of adding one line.
FIG. 16 shows a circuit diagram of a process gas supply apparatus that supplies three lines, and FIG. 17 shows a plan view of an installation state of pneumatic equipment embodying the circuit. A process gas air operated valve 107 is connected to a process gas tank (not shown) via a process gas supply port 108. The process gas air operated valve 107 is connected to the second manual valves 103A, 103B, and 103C via the process gas common flow path 105.

第２手動弁１０３Ａ，１０３Ｂ，１０３Ｃは、第１手動弁１０１Ａ，１０１Ｂ，１０１Ｃに接続している。第１手動弁１０１Ａ，１０１Ｂ，１０１Ｃの出口は、プロセスガス出口１００Ａ，１００Ｂ，１００Ｃと連通されている。第２手動弁１０３Ａ，１０３Ｂ，１０３Ｃと、第１手動弁１０１Ａ，１０１Ｂ，１０１Ｃとの間の流路には、圧力計１０２Ａ，１０２Ｂ，１０２Ｃが連通されている。
また、パージガス手動弁１１０が、パージガス供給口１１１を介して図示しないパージガスタンクと接続している。パージガス手動弁１１１は、逆止弁１０９、パージガス共通流路１０６を介して、第３手動弁１０４Ａ，１０４Ｂ，１０４Ｃに接続している。第３手動弁１０４Ａ，１０４Ｂ，１０４Ｃは、第１手動弁１０１Ａ，１０１Ｂ，１０１Ｃに接続している。
プロセスガス共通流路１０５の端部１０５ａは止め栓により封止されている。パージガス共通流路１０６の端部１０６ａは、止め栓により封止されている。 The second manual valves 103A, 103B, 103C are connected to the first manual valves 101A, 101B, 101C. The outlets of the first manual valves 101A, 101B, and 101C are communicated with the process gas outlets 100A, 100B, and 100C. Pressure gauges 102A, 102B, and 102C are communicated with a flow path between the second manual valves 103A, 103B, and 103C and the first manual valves 101A, 101B, and 101C.
A purge gas manual valve 110 is connected to a purge gas tank (not shown) via a purge gas supply port 111. The purge gas manual valve 111 is connected to the third manual valves 104A, 104B, and 104C through the check valve 109 and the purge gas common flow path 106. The third manual valves 104A, 104B, 104C are connected to the first manual valves 101A, 101B, 101C.
An end portion 105a of the process gas common flow path 105 is sealed with a stopper plug. The end portion 106a of the purge gas common flow path 106 is sealed with a stopper plug.

次に、図１６の３ラインの回路に１ライン増設する場合について説明する。図１６には、第４ラインＤを右側に記載している。図１８に、増設後の回路図を示し、図１９に、その回路を具体化した空圧機器の配置状態を平面図で示す。
第４ラインを増設する工事手順を説明する。この工事中は、プロセスガスは供給できず、半導体製造工程も停止している必要がある。
始めに、プロセスガスエアオペレート弁１０７を閉弁状態とし、第３手動弁１０４Ａ，１０４Ｂ，１０４Ｃを開弁状態とし、第１手動弁１０１Ａ，１０１Ｂ，１０１Ｃを開弁状態とする。その状態で、パージガス手動弁１１１を開弁する。これにより、プロセスガスエアオペレート弁１０７から第１手動弁１０１Ａ，１０１Ｂ，１０１Ｃ内に残っているプロセスガスを窒素ガスであるパージガスと置換する。十分な時間をかけてガス置換を行った後、パージガス手動弁１１０を閉弁する。 Next, a case where one line is added to the three-line circuit of FIG. 16 will be described. In FIG. 16, the fourth line D is shown on the right side. FIG. 18 shows a circuit diagram after expansion, and FIG. 19 shows a plan view of the arrangement state of pneumatic equipment embodying the circuit.
The construction procedure for adding the fourth line will be explained. During this construction, process gas cannot be supplied and the semiconductor manufacturing process must be stopped.
First, the process gas air operated valve 107 is closed, the third manual valves 104A, 104B, 104C are opened, and the first manual valves 101A, 101B, 101C are opened. In this state, the purge gas manual valve 111 is opened. As a result, the process gas remaining in the first manual valves 101A, 101B, and 101C from the process gas air operated valve 107 is replaced with a purge gas that is a nitrogen gas. After the gas replacement is performed for a sufficient time, the purge gas manual valve 110 is closed.

次に、パージガス共通流路１０６の端部１０６ａを封止している止め栓を外して、第４ラインのパージガス共通流路の入口端部１０６ｂと、配管１１２により接続する。また、プロセスガス共通流路１０５の端部１０５ａを封止している止め栓を外して、第４ラインのプロセスガス共通流路の入口端部１０５ｂと、配管１１３により接続する。
第４ラインの機器の構成は第１から第３ラインの構成と同じなので説明を省略する。第４ラインのパージガス共通流路１０６の新たな端部１０６ｃは、止め栓により封止されて
いる。また、プロセスガス共通流路１０５の新たな端部１０５ｃは止め栓により封止されている。
次に、プロセスガス出口１００Ｄを図示しない必要な箇所と接続する。
これにより、第４ラインの増設が終了する。 Next, the stopper plug that seals the end portion 106 a of the purge gas common channel 106 is removed, and the pipe 112 is connected to the inlet end portion 106 b of the purge gas common channel of the fourth line. Further, the stopper plug that seals the end portion 105 a of the process gas common flow path 105 is removed, and the pipe 113 is connected to the inlet end portion 105 b of the process gas common flow path of the fourth line.
Since the configuration of the equipment on the fourth line is the same as the configuration of the first to third lines, description thereof is omitted. The new end portion 106c of the purge gas common flow path 106 in the fourth line is sealed with a stopper plug. Further, the new end portion 105c of the process gas common flow path 105 is sealed with a stopper plug.
Next, the process gas outlet 100D is connected to a necessary portion (not shown).
Thereby, the expansion of the fourth line is completed.

しかしながら、従来のガス供給集積ユニットには、以下の問題があった。
（１）新たなガスラインの増設工事を行う場合、既存のガスラインを停止しなければならないため、半導体製造工程が停止するときにしか増設工事を行うことができなかった。
また、増設工事を終了した後においても、プロセスガス共通流路１０５、及びパージガス共通流路１０６の図１８に大気暴露部として斜線で示す部分が、大気に暴露されるため、大気中の水分が流路の内壁に付着する問題があった。即ち、プロセスガスに水分が混入すると、プロセスガスの機能が不完全となる場合があり、第４ラインを増設した後、パージガス共通流路よりパージガスを長時間流して、空気暴露した流路の水分を除去する必要があったからである。実際に、数時間から数十時間のパージが行われていた。 However, the conventional gas supply integrated unit has the following problems.
(1) When an expansion work for a new gas line is performed, the existing gas line must be stopped. Therefore, the expansion work can only be performed when the semiconductor manufacturing process is stopped.
In addition, even after the completion of the expansion work, the portions indicated by hatching in FIG. 18 of the process gas common flow path 105 and the purge gas common flow path 106 as the atmospheric exposure section are exposed to the atmosphere, so that moisture in the atmosphere is There was a problem of adhering to the inner wall of the flow path. That is, if moisture is mixed into the process gas, the function of the process gas may be incomplete. After adding the fourth line, the purge gas is allowed to flow from the purge gas common flow path for a long time, and the moisture in the flow path exposed to air It was because it was necessary to remove. Actually, purging for several hours to several tens of hours has been performed.

（２）余分な配管１１２，１１３を必要とするため、ガス供給集積ユニットが横方向に大きくなり、集積化による小型化の要請に反していた。また、第４ラインは、ボルトにより、ベースプレート１２０に取り付けられているが、その位置あわせを配管１１２，１１３により調整する必要があり、配管工事に無駄な時間がかかる問題があった。 (2) Since extra pipes 112 and 113 are required, the gas supply integrated unit becomes larger in the lateral direction, which is against the demand for miniaturization by integration. In addition, the fourth line is attached to the base plate 120 by bolts, but the alignment needs to be adjusted by the pipes 112 and 113, and there is a problem that it takes time to perform the piping work.

上記課題を解決するために特願２００３―３８２１３９を提案した。しかしながら、本特願発明には、以下の問題があった。
増設工事を終了した後のガスラインにおいて、大気暴露された部分は回路４３、回路４４であり、図１１に斜線で示す。この大気暴露された部分の水分を除去するため、パージガス共通流路１６より、第３ガスユニット内にパージガスを流し、第３ガスユニット内の水分の除去を行う。このパージにおけるパージガスの流れとパージガスから遮断された大気残留部を図１２の構成を示す平面図、図１３の機器を取り除いた下部の流路ブロックを示す平面図、及び図１４のプロセスガス共通流路端部手動弁２２、２４と下部の流路ブロックの断面図、及び図１５の機器を取り除いた下部の流路ブロックを示す斜視図で示す。これらの図からわかるように、回路４４にはパージガスが流れるが、回路４３はパージガスから遮断され、大気が残留するという問題があった。そのため、パージが不完全となり、プロセスガスに水分が混入し、プロセスガスの機能が不完全となる場合があった。
そこで、本発明は、上記課題を解決するためになされたものであり、ラインを増設してパージを行う際、パージが確実にできるガス供給集積ユニットを提供することを目的とする。 In order to solve the above problems, Japanese Patent Application No. 2003-382139 has been proposed. However, the present invention has the following problems.
In the gas line after the completion of the expansion work, the portions exposed to the atmosphere are the circuit 43 and the circuit 44, which are indicated by hatching in FIG. In order to remove the moisture in the portion exposed to the atmosphere, the purge gas is caused to flow into the third gas unit from the purge gas common flow path 16 to remove the moisture in the third gas unit. FIG. 12 is a plan view showing the purge gas flow in the purge and the atmospheric residual portion cut off from the purge gas. FIG. 14 is a plan view showing the lower flow path block after removing the equipment shown in FIG. 13, and the process gas common flow shown in FIG. FIG. 16 is a cross-sectional view of the road end manual valves 22 and 24 and the lower flow path block, and a perspective view showing the lower flow path block with the device of FIG. 15 removed. As can be seen from these figures, the purge gas flows through the circuit 44, but the circuit 43 is cut off from the purge gas, and the atmosphere remains. Therefore, purging is incomplete, moisture is mixed into the process gas, and the function of the process gas may be incomplete.
Accordingly, the present invention has been made to solve the above-described problems, and an object of the present invention is to provide a gas supply integrated unit capable of reliably purging when a line is added and purging is performed.

本発明に係るガス供給集積ユニットは、次のような構成を有している。
（１）出口流路に設けられた第１手動弁と、該第１手動弁とプロセスガス共通流路とを連通する位置に設けられた第２手動弁と、前記第１手動弁とパージガス共通流路とを連通する位置に設けられた第３手動弁とが流路ブロックにより一体に連結されているガスユニットを複数備えるガス供給集積ユニットにおいて、前記プロセスガス共通流路の端部と連通するプロセスガス共通流路端部手動弁と、前記パージガス共通流路の端部と連通するパージガス共通流路端部手動弁と、前記プロセスガス共通流路端部手動弁と連通する別のプロセスガス共通流路端部手動弁と前記パージガス共通流路端部手動弁と連通する別のパージガス共通流路端部手動弁と前記プロセスガス共通流路端部手動弁と連通する別の第２手動弁を備える増設するガスユニットと、前記別のパージガス共通流路端部手動弁の出口流路と前記別のプロセスガス共通流路端部手動弁の出口流路とを連通させる第１連通路と、前記別のプロセスガス共通流路端部手動弁の入口流路と前記プロセスガス共通流路端部手動弁の出口流路とを連通させる第２連通路と、前記プロセスガス共通流路端部手動弁の出口流路と前記別の第２手動弁の入口流路とを連通させる第３連通路とを有することを特徴とする The gas supply integrated unit according to the present invention has the following configuration.
(1) A first manual valve provided in the outlet channel, a second manual valve provided in a position where the first manual valve and the process gas common channel communicate with each other, and the first manual valve and the purge gas in common In a gas supply integrated unit including a plurality of gas units integrally connected by a flow path block to a third manual valve provided at a position communicating with the flow path, the gas supply integrated unit communicates with an end of the process gas common flow path. Common process gas common flow path end manual valve, purge gas common flow path end manual valve communicating with the end of the purge gas common flow path, and another process gas common communicating with the process gas common flow path end manual valve Another purge gas common flow path end manual valve communicating with the flow path end manual valve and the purge gas common flow path end manual valve and another second manual valve communicating with the process gas common flow path end manual valve Additional gas uni A first communication passage that communicates the outlet flow path of the other purge gas common flow path end manual valve with the outlet flow path of the another process gas common flow path end manual valve, and the different process gas A second communication path for communicating an inlet flow path of the common flow path end manual valve and an outlet flow path of the process gas common flow path end manual valve; and an outlet flow path of the process gas common flow path end manual valve And a third communication passage that communicates with the inlet flow path of the other second manual valve.

（２）（１）に記載するガス供給集積ユニットにおいて、前記プロセスガス共通流路端部手動弁の内部に弁座に連通するように形成された出口流路を二つに分岐させ、前記増設するガスユニットの前記別のプロセスガス共通流路端部手動弁の内部に弁座に連通するように形成された出口流路を二つに分岐させていることを特徴とする。
（３）（２）に記載するガス供給集積ユニットにおいて、前記第１連通路を前記別のパージガス共通流路端部手動弁の出口流路と前記別のプロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の両方に連通させ、前記第２連通路を前記別のプロセスガス共通流路端部手動弁の入口流路と前記プロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の一方に連通させ、前期第３連通路を前記プロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の他方と前記別の第２手動弁の入口流路に連通させるように設けられていることを特徴とする。
（４）（１）に記載するガス供給集積ユニットにおいて、前記第３流路が、前記プロセスガス共通流路端部手動弁の出口流路と前記別の第２手動弁の入口流路とを連通させるように流路ブロックに形成されたＵ字流路であり、前記Ｕ字流路が前記第２連通路につながれていることを特徴とする。 (2) In the gas supply integrated unit described in (1), an outlet flow channel formed to communicate with a valve seat is branched into two inside the process gas common flow channel end manual valve, and the extension An outlet channel formed to communicate with the valve seat is branched into two inside the other process gas common channel end manual valve of the gas unit.
(3) In the gas supply integrated unit described in (2), the first communication path is connected to an outlet flow path of the other purge gas common flow path end manual valve and the other process gas common flow path end manual valve. The second branch passage is communicated with both of the two branched outlet passages, and the second communication passage is connected to the inlet passage of the other process gas common passage end manual valve and the process gas common passage end manual valve. One of the outlet channels branched into two is communicated, and the other third manual valve is connected to the other of the two branched outlet channels of the process gas common channel end manual valve in the previous third communication channel. It is provided so that it may be connected to the inlet flow path.
(4) In the gas supply integrated unit described in (1), the third flow path includes an outlet flow path of the process gas common flow path end manual valve and an inlet flow path of the second second manual valve. A U-shaped flow path formed in the flow path block so as to communicate with each other, wherein the U-shaped flow path is connected to the second communication path.

続いて、上記構成を有する発明の作用効果について説明する。
通常、プロセスガス共通流路の端部と連通するプロセスガス共通流路端部手動弁、及びパージガス共通流路の端部と連通するパージガス共通流路端部手動弁とは、閉弁状態にある。新しいラインを増設する場合、増設するガスユニットを、ガスの流れと直角方向に交差して複数配置されたレールに取付け、レール上を移動させて、次のように回路を接続する。
まず、既設ラインのプロセスガス共通流路端部手動弁の出口流路と増設ラインの第２手動弁の入口流路とを流路ブロック内の連通路により連通させ、第３連通路を設ける。既設ラインのパージガス共通流路端部手動弁の出口流路と増設ラインの第３手動弁の入口流路とを流路ブロック内の連通路により連通させる。既設ラインのプロセスガス共通流路端部手動弁の出口流路と増設ラインのプロセスガス共通流路端部手動弁の入口流路とをパイプにより接続し、第２連通路を設ける。尚、増設工事の前に増設ラインのプロセスガス共通流路端部手動弁の出口流路と増設ラインのパージガス共通流路端部手動弁の出口流路とは、パイプの第１連通路で接続されている。以上のように回路を接続した後、接続ボルト、増設するガスユニットの固定ボルトを締める。 Subsequently, functions and effects of the invention having the above-described configuration will be described.
Normally, the process gas common flow path end manual valve communicating with the end of the process gas common flow path and the purge gas common flow path end manual valve communicating with the end of the purge gas common flow path are in a closed state. . When a new line is added, the gas unit to be added is attached to a plurality of rails that intersect perpendicularly to the gas flow and moved on the rails, and the circuit is connected as follows.
First, the outlet flow path of the existing process gas common flow path end manual valve in the existing line and the inlet flow path of the second manual valve in the extension line are communicated by a communication path in the flow path block to provide a third communication path. The outlet flow path of the purge gas common flow path end manual valve in the existing line and the inlet flow path of the third manual valve in the extension line are communicated with each other through a communication path in the flow path block. The outlet flow path of the process gas common flow path end manual valve in the existing line and the inlet flow path of the process gas common flow path end manual valve in the extension line are connected by a pipe to provide a second communication path. Before the expansion work, connect the outlet flow path of the process gas common flow path end manual valve on the expansion line and the outlet flow path of the purge gas common flow path end manual valve on the expansion line through the first communication path of the pipe. Has been. After connecting the circuit as above, tighten the connection bolt and the fixing bolt of the gas unit to be added.

このように、増設ラインを既設ラインに接続した後、増設ラインのプロセスガス共通流路端部手動弁、パージガス共通流路端部手動弁、第１手動弁、第２手動弁及び第３手動弁を開弁状態として、既設ラインのパージガス共通流路端部手動弁を開弁する。
次に既設ラインのパージガス手動弁を開弁して、増設ライン内にパージガスが一方は第３手動弁、第１手動弁からプロセスガス出口へと流される。また、パージガスの他方はパージガス共通流路端部手動弁、プロセスガス共通流路端部手動弁、第２手動弁、第１手動弁からプロセスガス出口へと流される。こうして、特願２００３―３８２１３９の発明で、パージガスが流れない回路にもパージガスを満たすことができる。パージガスが滞留する部分が一部発生するが、必要な時間パージをすれば、増設ライン内の水分の除去をほぼ完全に行うことができる。水分が除去でき、半導体製造装置側の準備が整ったら、増設ラインのプロセスガス共通流路端部手動弁、パージガス共通流路端部手動弁、及び第３手動弁を閉じ、既設ラインのプロセスガス共通流路端部手動弁を開くことにより、増設ラインにプロセスガスを供給することができる。 Thus, after connecting the extension line to the existing line, the process gas common flow path end manual valve, the purge gas common flow path end manual valve, the first manual valve, the second manual valve, and the third manual valve of the extension line Is opened, and the purge gas common flow path end manual valve of the existing line is opened.
Next, the purge gas manual valve on the existing line is opened, and one of the purge gas flows in the extension line from the third manual valve and the first manual valve to the process gas outlet. The other of the purge gas flows from the purge gas common flow path end manual valve, the process gas common flow path end manual valve, the second manual valve, and the first manual valve to the process gas outlet. Thus, according to the invention of Japanese Patent Application No. 2003-382139, the purge gas can be filled in the circuit in which the purge gas does not flow. A portion where the purge gas stays is partially generated, but if the purge is performed for a necessary time, the moisture in the extension line can be removed almost completely. When the moisture can be removed and the semiconductor manufacturing equipment is ready, close the process gas common flow path end manual valve, purge gas common flow path end manual valve, and third manual valve of the extension line, and process gas in the existing line The process gas can be supplied to the extension line by opening the common flow path end manual valve.

また、既設ラインのプロセスガス共通流路端部手動弁、及び増設ラインのプロセスガス共通流路端部手動弁にそれぞれ内部で二つに分岐した出口流路を形成することにより、パージガスを既設ラインのプロセスガス共通流路端部手動弁、及び増設ラインのプロセスガス共通流路端部手動弁のそれぞれ内部にも流すことができ、パージガスの滞留部が僅かになる。従って、増設ライン内の水分の除去をほぼ完全に行うことができる。
以上説明したように、本発明のガス供給集積ユニットは、出口流路に設けられた第１手動弁と、該第１手動弁とプロセスガス共通流路とを連通する位置に設けられた第２手動弁と、該第１手動弁とパージガス共通流路とを連通する位置に設けられた第３手動弁とが流路ブロックにより一体に連結されているガスユニットを複数備えるガス供給集積ユニットにおいて、前記プロセスガス共通流路の端部と連通するプロセスガス共通流路端部手動弁と、前記パージガス共通流路の端部と連通するパージガス共通流路端部手動弁と、前記プロセスガス共通流路端部手動弁と連通する別のプロセスガス共通流路端部手動弁と、前記パージガス共通流路端部手動弁と連通する別のパージガス共通流路端部手動弁と、前記プロセスガス共通流路端部手動弁と連通する別の第２手動弁を備える増設するガスユニットと、前記別のパージガス共通流路端部手動弁の出口流路と前記別のプロセスガス共通流路端部手動弁の出口流路とを連通させる第１連通路と、前記別のプロセスガス共通流路端部手動弁の入口流路と前記プロセスガス共通流路端部手動弁の出口流路とを連通させる第２連通路と、前記プロセスガス共通流路端部手動弁の出口流路と前記別の第２手動弁の入口流路とを連通させる第３連通路とを有するので、ラインを増設して増設ラインのパージを行う際、すべての回路にパージガスを満たすことができ、必要な時間パージを行って、増設するガスユニット内の水分をほぼ完全に除去できる。 In addition, the purge gas can be supplied to the existing line by forming an outlet flow passage that is branched into two in the process gas common flow path end manual valve in the existing line and the process gas common flow path end manual valve in the extension line. The process gas common flow path end manual valve and the process gas common flow path end manual valve of the extension line can also be flown inside, respectively, and the purge gas retention portion becomes small. Therefore, the water in the extension line can be removed almost completely.
As described above, the gas supply integrated unit according to the present invention includes the first manual valve provided in the outlet flow path, and the second manual valve provided in a position where the first manual valve and the process gas common flow path communicate with each other. In a gas supply integrated unit comprising a plurality of gas units in which a manual valve and a third manual valve provided at a position communicating with the first manual valve and the purge gas common flow path are integrally connected by a flow path block, Process gas common flow path end manual valve communicating with the end of the process gas common flow path, Purge gas common flow path end manual valve communicating with the end of the purge gas common flow path, and the process gas common flow path Another process gas common flow path end manual valve communicating with the end manual valve, another purge gas common flow path end manual valve communicating with the purge gas common flow path end manual valve, and the process gas common flow path End manual valve An additional gas unit including another second manual valve in communication; an outlet channel of the other purge gas common channel end manual valve; and an outlet channel of the other process gas common channel end manual valve A first communication path that communicates; a second communication path that communicates an inlet flow path of the other process gas common flow path end manual valve and an outlet flow path of the process gas common flow path end manual valve; Since the process gas common flow path end manual valve outlet flow path and the third flow path for communicating the second second manual valve flow path are communicated, when the line is expanded and the additional line is purged All the circuits can be filled with the purge gas, and the purge can be performed for a necessary time, so that the moisture in the additional gas unit can be removed almost completely.

さらに、本発明のガス供給集積ユニットは、前記プロセスガス共通流路端部手動弁の内部で二つに分岐した出口流路が形成され、前記増設するガスユニットの前記別のプロセスガス共通流路端部手動弁の内部で二つに分岐した出口流路が形成されているので、ラインを増設して増設ラインのパージを行う際、既存ラインのプロセスガス共通流路端部手動弁及び増設ラインのプロセスガス共通流路端部手動弁のそれぞれ内部までパージガスを流すことができ、時間をかけることなく、増設するガスユニット内の水分をほぼ完全に除去できる。   Further, in the gas supply integrated unit of the present invention, the process gas common flow path end manual valve has a bifurcated outlet flow path formed therein, and the additional process gas common flow path of the additional gas unit is formed. Since the outlet flow path branched into two inside the end manual valve is formed, when expanding the line and purging the extension line, the process gas common flow path end manual valve and the extension line of the existing line The purge gas can flow to the inside of each of the process gas common flow path end manual valves, and moisture in the added gas unit can be almost completely removed without taking time.

さらに、本発明のガス供給集積ユニットは、前記第１連通路を前記別のパージガス共通流路端部手動弁の出口流路と前記別のプロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の両方に連通させ、前記第２連通路を前記別のプロセスガス共通流路端部手動弁の入口流路と前記プロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の一方に連通させ、前期第３連通路を前記プロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の他方と前記別の第２手動弁の入口流路に連通させるように設けられているので、既存ラインのプロセスガス共通流路端部手動弁及び増設ラインのプロセスガス共通流路端部手動弁のそれぞれの内部まで、且つすべての流路にパージガスを流すことができる。従って、パージに時間をかけることなく、増設するガスユニット内の水分をほぼ完全に除去できる。   Furthermore, the gas supply integrated unit of the present invention is configured such that the first communication path is connected to the two outlets of the other purge gas common flow path end manual valve and the other process gas common flow path end manual valve. The second communication path is branched into the two of the other process gas common flow path end manual valve and the process gas common flow path end manual valve. The other end of the outlet flow path branched into the two of the process gas common flow path end manual valves and the second flow path of the second manual valve are communicated with one of the outlet flow paths. The purge gas is supplied to the interior of each process gas common flow path end manual valve of the existing line and the process gas common flow path end manual valve of the extension line, and to all the flow paths. It can flow. Therefore, it is possible to almost completely remove the moisture in the additional gas unit without spending time for purging.

次に、本発明に係るガス供給集積ユニットの第１実施例について、図面を参照して説明する。図１に、既設のラインへプロセスガスの供給を行っているガスユニットＡからなるガス供給集積ユニットの回路図、及びそれに増設するための第２ガスユニットＢの回路図を示す。
プロセスガスエアオペレート弁１７は、プロセスガス供給口１８を介して図示しないプ
ロセスガスタンクと接続している。プロセスガスエアオペレート弁１７は、プロセスガス共通流路１５を介して、第２手動弁１３Ａの一方のポートに接続している。 第２手動弁１３Ａの他ポートは、第１手動弁１１Ａに接続している。第１手動弁１１Ａの出口ポートは、プロセスガス出口１０Ａと連通している。第２手動弁１３Ａと、第１手動弁１１Ａとを連通させている流路に、圧力計１２Ａが連通されている。
また、パージガス手動弁２０が、パージガス供給口２１を介して図示しないパージガスタンクと接続している。パージガス手動弁２０は、逆止弁１９、パージガス共通流路１６を介して、第３手動弁１４Ａの一方のポートに接続している。第３手動弁１４Ａの他のポートは、第１手動弁１１Ａに接続している。 プロセスガス共通流路１５の端部は、プロセスガス共通流路端部手動弁２２により封止されている。また、パージガス共通流路１６の端部は、パージガス共通流路端部手動弁２３により封止されている。 Next, a first embodiment of the gas supply integrated unit according to the present invention will be described with reference to the drawings. FIG. 1 shows a circuit diagram of a gas supply integrated unit composed of a gas unit A that supplies process gas to an existing line, and a circuit diagram of a second gas unit B to be added thereto.
The process gas air operated valve 17 is connected to a process gas tank (not shown) via a process gas supply port 18. The process gas air operated valve 17 is connected to one port of the second manual valve 13A via the process gas common flow path 15. The other port of the second manual valve 13A is connected to the first manual valve 11A. The outlet port of the first manual valve 11A communicates with the process gas outlet 10A. A pressure gauge 12A is communicated with a flow path that communicates the second manual valve 13A and the first manual valve 11A.
The purge gas manual valve 20 is connected to a purge gas tank (not shown) via a purge gas supply port 21. The purge gas manual valve 20 is connected to one port of the third manual valve 14A via the check valve 19 and the purge gas common flow path 16. The other port of the third manual valve 14A is connected to the first manual valve 11A. The end of the process gas common flow path 15 is sealed with a process gas common flow path end manual valve 22. Further, the end of the purge gas common channel 16 is sealed with a purge gas common channel end manual valve 23.

図２に、その回路を具体化した空圧機器の設置状態を平面図で示す。２本のレール２６，２７が、両端をレール固定棒４１，４５により平行に固定されている。レール２６，２７に沿って、ユニット固定板２８，２９，３０Ａが横方向に平行移動可能に取り付けられている。プロセスガス用ユニット固定板２８には、プロセスガスエアオペレート弁１７が固定されている。パージガス用ユニット固定板２９には、パージガス手動弁２０と逆止弁１９が固定されている。   FIG. 2 is a plan view showing an installation state of a pneumatic device that embodies the circuit. Two rails 26 and 27 are fixed in parallel by rail fixing rods 41 and 45 at both ends. Along the rails 26, 27, unit fixing plates 28, 29, 30A are attached so as to be movable in the horizontal direction. A process gas air operated valve 17 is fixed to the process gas unit fixing plate 28. A purge gas manual valve 20 and a check valve 19 are fixed to the purge gas unit fixing plate 29.

第１ガスユニット固定板３０Ａには、上から第１手動弁１１Ａ、圧力計１２Ａ、そしてパイプ３８Ａにつながれて、第３手動弁１４Ａ、第２手動弁１３Ａ、そして少し右側にずれた位置に既設プロセスガス共通流路端部手動弁２２が固定されている。また、パイプ３８Ａを避けて少し右側にずれた位置に既設のパージガス共通流路端部手動弁２３が固定されている。
既設ガスユニットから少し離れて、増設する第２ガスユニットが第２ガスユニット固定板３０Ｂ上に固定されている。即ち、第２ガスユニット固定板３０Ｂには、上から第１手動弁１１Ｂ、圧力計１２Ｂ、パイプ３８Ｂにつながれて、第３手動弁１４Ｂ、第２手動弁１３Ｂ、そして少し右側にずれた位置に増設のプロセスガス共通流路端部手動弁２４が固定されている。また、パイプ３８Ｂを避けて少し右側にずれた位置にパージガス共通流路端部手動弁２５が固定され、プロセスガス共通流路端部手動弁２４とパージガス共通流路端部手動弁２５とがパイプの第１連通路５２でつながれる。 The first gas unit fixing plate 30A is connected to the first manual valve 11A, the pressure gauge 12A, and the pipe 38A from above, and is already installed at a position shifted slightly to the right by the third manual valve 14A, the second manual valve 13A. A process gas common flow path end manual valve 22 is fixed. Further, the existing purge gas common flow path end manual valve 23 is fixed at a position slightly shifted to the right side while avoiding the pipe 38A.
The second gas unit to be added is fixed on the second gas unit fixing plate 30B at a distance from the existing gas unit. That is, the second gas unit fixing plate 30B is connected to the first manual valve 11B, the pressure gauge 12B, and the pipe 38B from above, and is shifted to the right side by the third manual valve 14B, the second manual valve 13B, and the right side. An additional process gas common flow path end manual valve 24 is fixed. Further, the purge gas common flow path end manual valve 25 is fixed at a position slightly shifted to the right side while avoiding the pipe 38B, and the process gas common flow path end manual valve 24 and the purge gas common flow path end manual valve 25 are connected to the pipe. The first communication passage 52 is connected.

以上のように、既設ガスユニットから少し離れて、増設する第２ガスユニットが配置されている状態から、次のように第２ガスユニットの取付け工事を行う。まず、第２ガスユニットの固定板３０Ｂを第１ガスユニットの固定板３０Ａに近づけて、図５及び図６で示すように、プロセスガス共通流路端部手動弁２２の出口流路２２ｂと第２ガスユニットの第２手動弁１３Ｂの入口流路５１（図３参照）とを流路ブロック３７Ａで連通させる。即ち、プロセスガス共通流路端部手動弁２２の出口流路２２ｂは、流路ブロック３７Ａ内で、Ｕ字流路の流路３７１Ａ、流路３７３Ａから流路３７２Ａに連通させ、流路３７２Ａは第２手動弁１３Ｂの入口流路５１と連通させる。同様に、図３及び図４で示すように、パージガス共通流路端部手動弁２３の図示しない出口流路と第２ガスユニットの第３手動弁１４Ｂの図示しない入口流路とを流路ブロック５８の流路５６、流路５５及び流路５７で連通させる。次に、図５及び図６で示すように、プロセスガス共通流路端部手動弁２２の出口流路２２ｂと連通する流路３７１Ａと第２ガスユニットのプロセスガス共通流路端部手動弁２４の入口流路２４ａと連通する流路３６１Ｂとがパイプの第２連通路５９でつながれる。なお、第２ガスユニットの取付け工事の前に、プロセスガス共通流路端部手動弁２４の出口流路２４ｂは、流路ブロック３７Ｂ内で出口流路２４ｂと連通する流路３７１Ｂ、水平方向の流路３７３Ｂと連通し、流路３７３Ｂからパイプの第１連通路５２につながれている。同様に、図３及び図４で示すパージガス共通流路端部手動弁２５の出口流路５４は、流路ブロック４７内の流路５３からパイプ５２につながれている。   As described above, the installation of the second gas unit is performed as follows from the state where the second gas unit to be added is disposed a little away from the existing gas unit. First, the fixing plate 30B of the second gas unit is brought close to the fixing plate 30A of the first gas unit, and as shown in FIGS. 5 and 6, the outlet flow path 22b of the process gas common flow path end manual valve 22 and the second flow path An inlet channel 51 (see FIG. 3) of the second manual valve 13B of the two gas unit is communicated with a channel block 37A. That is, the outlet flow path 22b of the process gas common flow path end manual valve 22 is connected to the flow path 372A from the flow path 371A and the flow path 373A of the U-shaped flow path in the flow path block 37A. The second manual valve 13B is communicated with the inlet channel 51. Similarly, as shown in FIGS. 3 and 4, a passage block is provided between an outlet passage (not shown) of the purge gas common passage end manual valve 23 and an inlet passage (not shown) of the third manual valve 14B of the second gas unit. The flow path 56, the flow path 55, and the flow path 57 of 58 are connected. Next, as shown in FIG. 5 and FIG. 6, the flow path 371 </ b> A communicating with the outlet flow path 22 b of the process gas common flow path end manual valve 22 and the process gas common flow path end manual valve 24 of the second gas unit. A flow path 361B communicating with the inlet flow path 24a is connected by a second communication path 59 of the pipe. Prior to the installation work of the second gas unit, the outlet flow path 24b of the process gas common flow path end manual valve 24 is connected to the flow path 371B communicating with the outlet flow path 24b in the flow path block 37B. It communicates with the flow path 373B and is connected to the first communication path 52 of the pipe from the flow path 373B. Similarly, the outlet flow path 54 of the purge gas common flow path end manual valve 25 shown in FIGS. 3 and 4 is connected to the pipe 52 from the flow path 53 in the flow path block 47.

以上により第２ガスユニットの取付け工事は終了する。次に、第２ガスユニットの新たなプロセスガス共通流路端部手動弁２４、パージガス共通流路端部手動弁２５、第２手動弁１３Ｂ、第１手動弁１１Ｂ及び第３手動弁１４Ｂを開弁状態として、既設ガスユニットのパージガス共通流路端部手動弁２３及びパージガス手動弁２０を開弁する。
これにより、第２ガスユニット内にパージガスを流して、第２ガスユニット内の水分の除去を行う。パージガスの流れとパージガスの滞留部を次の図面で示す。即ち、図３の構成を示す平面図、図４の機器を取り除いた下部の流路ブロックを示す平面図、図５のプロセスガス共通流路端部手動弁２２、２４と流路ブロック３６，３７の断面図及び図６の機器を取り除いた下部の流路ブロックを示す斜視図で示す。 This completes the installation work of the second gas unit. Next, the new process gas common flow path end manual valve 24, the purge gas common flow path end manual valve 25, the second manual valve 13B, the first manual valve 11B, and the third manual valve 14B of the second gas unit are opened. As the valve state, the purge gas common flow path end manual valve 23 and the purge gas manual valve 20 of the existing gas unit are opened.
As a result, purge gas is caused to flow into the second gas unit to remove moisture in the second gas unit. The flow of purge gas and purge gas retention are shown in the following drawings. That is, a plan view showing the configuration of FIG. 3, a plan view showing the lower flow path block with the equipment of FIG. 4 removed, the process gas common flow path end manual valves 22, 24 and the flow path blocks 36, 37 of FIG. 5. FIG. 7 is a cross-sectional view of FIG. 6 and a perspective view showing a lower flow path block from which the device of FIG.

以下にパージガスの流れを説明する。パージガス手動弁２０を開弁して、第２ガスユニット内にパージガスを流すと、図示しないパージガスタンクからパージガス供給口２１、パージガス手動弁２０、逆止弁１９、パージガス共通流路１６を介して、パージガス共通流路端部手動弁２３から、第３手動弁１４Ｂとパージガス共通流路端部手動弁２５とに分岐して流れる。第３手動弁１４Ｂに流れたパージガスは、第１手動弁１１Ｂから、プロセスガス出口１０Ｂに流れる。
また、パージガス共通流路端部手動弁２５に流れたパージガスは、パイプの第１連通路５２、プロセスガス共通流路端部手動弁２４、パイプの第２連通路５９、流路ブロック３７Ａ内のＵ字流路の水平方向の第３連通路３７３Ａ、及び垂直方向の流路３７２Ａに流れる。流路３７２Ａに流れたパージガスは、第２手動弁１３Ｂの入口流路５１、第２手動弁１３Ｂ、第１手動弁１１Bを介して、プロセスガス出口１０Ｂに流れる。 The purge gas flow will be described below. When the purge gas manual valve 20 is opened and the purge gas is allowed to flow into the second gas unit, a purge gas tank (not shown), the purge gas manual valve 20, the check valve 19, and the purge gas common flow path 16 are passed through. The purge gas common flow path end manual valve 23 branches and flows to the third manual valve 14B and the purge gas common flow path end manual valve 25. The purge gas that has flowed to the third manual valve 14B flows from the first manual valve 11B to the process gas outlet 10B.
Further, the purge gas that has flowed to the purge gas common flow path end manual valve 25 flows into the first communication path 52 of the pipe, the process gas common flow path end manual valve 24, the second communication path 59 of the pipe, and the flow path block 37A. It flows through the third communication passage 373A in the horizontal direction of the U-shaped flow path and the flow path 372A in the vertical direction. The purge gas that has flowed to the flow path 372A flows to the process gas outlet 10B through the inlet flow path 51, the second manual valve 13B, and the first manual valve 11B of the second manual valve 13B.

このように第２ガスユニット内にパージガスを流すと、図５及び図６で示すように、一部の流路にパージガスの滞留部が発生する。しかし、パージガスが滞留しても、パージガスの流れと連通しているので、必要な時間パージガスを流せば、第２ガスユニット内の水分の除去を行うことが出来る。水分が十分除去でき、半導体製造装置側の準備が整ったら、プロセスガス共通流路端部手動弁２４、パージガス共通流路端部手動弁２５及び第３手動弁１４Ｂを閉じ、プロセスガス共通流路端部手動弁２２を開くことにより、第２ガスラインにプロセスガスを供給することができる。   When the purge gas is caused to flow into the second gas unit in this way, as shown in FIGS. 5 and 6, a purge gas retention portion is generated in a part of the flow paths. However, even if the purge gas stays, it is in communication with the flow of the purge gas, so that the moisture in the second gas unit can be removed if the purge gas is allowed to flow for a necessary time. When the moisture can be sufficiently removed and the semiconductor manufacturing apparatus is ready, the process gas common flow path end manual valve 24, the purge gas common flow path end manual valve 25 and the third manual valve 14B are closed, and the process gas common flow path is closed. The process gas can be supplied to the second gas line by opening the end manual valve 22.

以上、詳細に説明したように第１実施例のガス供給集積ユニットによれば、出口流路に設けられた第１手動弁１１と、第１手動弁１１とプロセスガス共通流路１５とを連通する位置に設けられた第２手動弁１３と、第１手動弁１１とパージガス共通流路１６とを連通する位置に設けられた第３手動弁１４とが流路ブロックにより一体に連結されているガスユニットを複数備えるガス供給集積ユニットにおいて、プロセスガス共通流路１５の端部と連通するプロセスガス共通流路端部手動弁２２と、パージガス共通流路１６の端部と連通するパージガス共通流路端部手動弁２３と、プロセスガス共通流路端部手動弁２２と連通する別のプロセスガス共通流路端部手動弁２４とパージガス共通流路端部手動弁２３と連通する別のパージガス共通流路端部手動弁２５とプロセスガス共通流路端部手動弁２２と連通する別の第２手動弁１３Ｂを備える増設するガスユニットと、別のパージガス共通流路端部手動弁２５の出口流路５４と別のプロセスガス共通流路端部手動弁２４の出口流路２４ｂとを連通させる第１連通路５２と、別のプロセスガス共通流路端部手動弁２４の入口流路２４ａとプロセスガス共通流路端部手動弁２２の出口流路２２ｂとを連通させる第２連通路５９と、プロセスガス共通流路端部手動弁２２の出口流路２２ｂと別の第２手動弁１３Ｂの入口流路５１とを連通させる第３連通路３７３Ａとを有するので、ラインを増設して増設ラインのパージを行う際、増設するガスユニット内のすべての流路にパージガスを満たすことができる。パージガスの流れのない滞留部が一部発生するが、滞留部はパージガスの流れと連通しているので、必要な時間パージガスを流せば、第２ガスユニット内の水分をほぼ完全に除去することができる。   As described above in detail, according to the gas supply integrated unit of the first embodiment, the first manual valve 11 provided in the outlet flow path, the first manual valve 11 and the process gas common flow path 15 communicate with each other. The second manual valve 13 provided at a position where the first manual valve 11 is provided and the third manual valve 14 provided at a position where the first manual valve 11 and the purge gas common flow path 16 communicate with each other are integrally connected by a flow path block. In a gas supply integrated unit including a plurality of gas units, a process gas common flow path end manual valve 22 communicating with the end of the process gas common flow path 15 and a purge gas common flow path communicating with the end of the purge gas common flow path 16 Another purge gas common flow communicating with the end manual valve 23 and another process gas common flow channel end manual valve 24 communicating with the process gas common flow channel end manual valve 22 and the purge gas common flow channel end manual valve 23 An additional gas unit including another second manual valve 13B communicating with the end manual valve 25 and the process gas common flow path end manual valve 22, and an outlet flow path 54 of another purge gas common flow path end manual valve 25 A first communication passage 52 that communicates with an outlet flow passage 24b of another process gas common flow path end manual valve 24, and a common process gas with an inlet flow passage 24a of another process gas common flow passage end manual valve 24. A second communication path 59 that communicates with the outlet flow path 22b of the flow path end manual valve 22, and an outlet flow path 22b of the process gas common flow path end manual valve 22 and an inlet flow path of another second manual valve 13B. Since the third communication path 373A that communicates with 51 is provided, when the line is expanded to purge the expansion line, the purge gas can be filled in all the flow paths in the additional gas unit. Part of the stagnant portion without the purge gas flow is generated, but the stagnant portion communicates with the purge gas flow, so that if the purge gas is allowed to flow for the necessary time, the moisture in the second gas unit can be almost completely removed. it can.

次に、本発明の第２の実施例を説明する。第２実施例のガス供給集積ユニットの構成及び作用効果は、第１実施例とほぼ同じなので、相違する点のみ説明して、他を割愛する。相違点は既設ラインのプロセスガス共通流路端部手動弁から、増設ラインの第２連通路、プロセスガス共通流路端部手動弁、及び第１連通路につなぐ間の流路構造である。
第２ガスユニットを既設ガスユニットに取付ける工事は、第１実施例と同様に実施される。第２ガスユニットが取付けられたガス供給集積ユニットを次の図面で示す。図３に対応する図面を図７、図４に対応する図面を図８、図５に対応する図面を図９及び図６に対応する図面を図１０にそれぞれ示す。図９及び図１０で示すように、プロセスガス共通流路端部手動弁２２’の出口流路を下方に向かって二つに分岐させ、一方の流路２２２ｂと第２ガスユニットの第２手動弁１３Ｂの入口流路５１とを流路ブロック３７Ａ’のＵ字形の流路で連通させる。即ち、プロセスガス共通流路端部手動弁２２’の出口流路２２２ｂを、流路ブロック３７Ａ’内で、垂直方向の流路３７１Ａ’、水平方向の第３連通路３７３Ａ’、及び垂直方向の流路３７２Ａ’と連通させ、流路３７２Ａ’を第２手動弁１３Ｂの入口流路５１と連通させる。 Next, a second embodiment of the present invention will be described. Since the configuration and operational effects of the gas supply integrated unit of the second embodiment are almost the same as those of the first embodiment, only the differences will be described and the others will be omitted. The difference is the flow path structure between the process gas common flow path end manual valve of the existing line and the second communication path, the process gas common flow path end manual valve of the extension line, and the first communication path.
The work for attaching the second gas unit to the existing gas unit is performed in the same manner as in the first embodiment. The gas supply integrated unit with the second gas unit attached is shown in the following drawing. FIG. 7 shows a drawing corresponding to FIG. 3, FIG. 8 shows a drawing corresponding to FIG. 4, FIG. 10 shows a drawing corresponding to FIG. 9 and FIG. As shown in FIGS. 9 and 10, the outlet flow path of the process gas common flow path end manual valve 22 ′ is branched into two downwards, and one flow path 222 b and the second manual operation of the second gas unit. The inlet channel 51 of the valve 13B is communicated with the U-shaped channel of the channel block 37A ′. That is, the outlet flow path 222b of the process gas common flow path end manual valve 22 ′ is connected to the vertical flow path 371A ′, the horizontal third communication path 373A ′, and the vertical flow path in the flow path block 37A ′. The flow path 372A ′ is communicated, and the flow path 372A ′ is communicated with the inlet flow path 51 of the second manual valve 13B.

次に、プロセスガス共通流路端部手動弁２２’の出口流路の他方の流路２２１ｂと第２ガスユニットのプロセスガス共通流路端部手動弁２４’の入口流路２４ａ’を流路ブロック３６Ｂ’のＶ字流路の第２連通路３６１Ｂ’により連通させる。プロセスガス共通流路端部手動弁２４’の出口流路をプロセスガス共通流路端部手動弁２２’と同様に、下方に向かって二つに分岐させ、一方の流路２４１ｂ及び他方の流路２４２ｂを流路ブロック３７Ｂ’のＶ字流路３７１Ｂ’の左のポート３７５及び右のポート３７６とそれぞれ連通させる。流路ブロック３７Ｂ’内のＶ字流路３７１Ｂ’をＶ字の最下点で流路３７３Ｂ’と連通させ、流路３７３Ｂ’をパイプの第１連通路５２’と連通させる。
このように設けられた第２実施例の作動及びその作用効果について説明する。第２ガスユニット内にパージガスを流して、第２ガスユニット内の水分の除去を行う。パージガスの流れとパージガスの滞留部を図７、図８、図９及び図１０で示す。 Next, the other flow path 221b of the outlet flow path of the process gas common flow path end manual valve 22 ′ and the inlet flow path 24a ′ of the process gas common flow path end manual valve 24 ′ of the second gas unit are flow paths. The second communication passage 361B ′ of the V-shaped flow path of the block 36B ′ is connected. Similar to the process gas common flow path end manual valve 22 ', the outlet flow path of the process gas common flow path end manual valve 24' is branched into two downwards, so that one flow path 241b and the other flow path The path 242b is communicated with the left port 375 and the right port 376 of the V-shaped flow path 371B ′ of the flow path block 37B ′. The V-shaped flow path 371B ′ in the flow path block 37B ′ is communicated with the flow path 373B ′ at the V-shaped lowest point, and the flow path 373B ′ is communicated with the first communication path 52 ′ of the pipe.
The operation and effects of the second embodiment thus provided will be described. Purge gas is allowed to flow through the second gas unit to remove moisture in the second gas unit. The purge gas flow and the purge gas retention portion are shown in FIGS. 7, 8, 9, and 10. FIG.

以下にパージガスの流れを説明する。第１実施例とは、パージガス共通流路端部手動弁２５からパイプの第１連通路５２’に流れるところまでは同様で、第１連通路５２’から第３連通路３７３Ａ’までの流れが異なり、この間の流れを説明する。パイプの第１連通路５２’ に流れたパージガスは、流路ブロック３７Ｂ’の流路３７３Ｂ’から、Ｖ字流路３７１Ｂ’のＶ字の最下点に流れ、Ｖ字の一方の流路から左のポート３７５を介して、プロセスガス共通流路端部手動弁２４’の出口流路の一方の流路２４１ｂに、またV字の他方の流路から右のポート３７６を介して、プロセスガス共通流路端部手動弁２４’の出口流路の他方の流路２４２ｂに流れる。流路２４１ｂおよび流路２４２ｂからプロセスガス共通流路端部手動弁２４’に流れたパージガスは、入口流路２４ａ’、 流路ブロック３６Ｂ’のＶ字流路の第２連通路３６１Ｂ’、プロセスガス共通流路端部手動弁２２’ の出口流路の他方の流路２２１ｂから一方の出口流路２２２ｂに流れる。プロセスガス共通流路端部手動弁２２’ の一方の出口流路２２２ｂに流れたパージガスは、流路ブロック３７Ａ’内のＵ字流路の流路３７１Ａ’、第３連通路の流路３７３Ａ’から流路３７２Ａ’に流れる。流路３７２Ａ’に流れたパージガスは、第２手動弁１３Ｂの入口流路５１に流れ、それ以降は第１実施例と同様である。   The purge gas flow will be described below. The first embodiment is the same as the flow from the purge gas common flow path end manual valve 25 to the first communication path 52 ′ of the pipe, and the flow from the first communication path 52 ′ to the third communication path 373A ′. Differently, the flow during this will be explained. The purge gas that has flowed into the first communication path 52 ′ of the pipe flows from the flow path 373B ′ of the flow path block 37B ′ to the lowest V-shaped point of the V-shaped flow path 371B ′, and from one of the V-shaped flow paths. Through the left port 375, the process gas common flow path end manual valve 24 'is connected to one flow path 241b of the outlet flow path and from the other V-shaped flow path to the right port 376, the process gas. It flows to the other flow path 242b of the outlet flow path of the common flow path end manual valve 24 ′. The purge gas that has flowed from the flow path 241b and the flow path 242b to the process gas common flow path end manual valve 24 ′ is the inlet flow path 24a ′, the second communication path 361B ′ of the V-shaped flow path of the flow path block 36B ′, and the process. The gas common flow path end manual valve 22 ′ flows from the other flow path 221b to the one flow path 222b. The purge gas that has flowed into one outlet flow path 222b of the process gas common flow path end manual valve 22 ′ is a U-shaped flow path 371A ′ and a third communication path 373A ′ in the flow path block 37A ′. Flow to the flow path 372A ′. The purge gas that has flowed into the flow path 372A 'flows into the inlet flow path 51 of the second manual valve 13B, and the subsequent steps are the same as in the first embodiment.

このように第２ガスユニット内にパージガスを流すと、図９及び図１０で示すように、プロセスガス共通流路端部手動弁２２’ の出口流路の一部にパージガスの流れのない滞留部が発生する。しかし、滞留部はパージガスの流れが鋭角に変化する変曲点近傍にあるので、見かけ上のみであり、実際は流れに巻き込まれてほとんど滞留せず、且つ体積も極めて少ないので、時間をかけることなく、第２ガスユニット内の水分の除去をほぼ完全に行うことが出来る。
水分が十分除去でき、半導体製造装置側の準備が整ったら、プロセスガス共通流路端部手動弁２４’、パージガス共通流路端部手動弁２５及び第３手動弁１４Ｂを閉じ、プロセスガス共通流路端部手動弁２２’を開くことにより、第２ガスラインにプロセスガスを供給することができる。 When the purge gas is caused to flow into the second gas unit in this way, as shown in FIGS. 9 and 10, as shown in FIG. 9 and FIG. Will occur. However, the staying part is in the vicinity of the inflection point where the flow of the purge gas changes at an acute angle, so it is only apparent. In fact, the staying part is almost trapped in the flow and the volume is very small. The moisture in the second gas unit can be removed almost completely.
When the moisture can be sufficiently removed and the semiconductor manufacturing apparatus is ready, the process gas common flow path end manual valve 24 ′, the purge gas common flow path end manual valve 25 and the third manual valve 14B are closed, and the process gas common flow is closed. The process gas can be supplied to the second gas line by opening the road end manual valve 22 '.

以上、詳細に説明したように第２実施例のガス供給集積ユニットによれば、プロセスガス共通流路端部手動弁２２’の内部で二つに分岐した出口流路２２１ｂ、出口流路２２２ｂが形成され、増設するガスユニットの別のプロセスガス共通流路端部手動弁２４’の内部で二つに分岐した出口流路２４１ｂ、出口流路２４２ｂが形成されているので、ラインを増設して増設ラインのパージを行う際、プロセスガス共通流路端部手動弁２２’、 別のプロセスガス共通流路端部手動弁２４’のそれぞれ内部までパージガスを流すことができ、時間をかけることなく、増設するガスユニット内の水分をほぼ完全に除去できる。   As described above in detail, according to the gas supply integrated unit of the second embodiment, the outlet flow path 221b and the outlet flow path 222b branched into two inside the process gas common flow path end manual valve 22 ′ are provided. The outlet channel 241b and the outlet channel 242b branched into two inside the other process gas common channel end manual valve 24 ′ of the gas unit to be formed are formed. When purging the extension line, the purge gas can flow to the inside of each of the process gas common flow path end manual valve 22 ′ and another process gas common flow path end manual valve 24 ′, without taking time, The moisture in the additional gas unit can be removed almost completely.

また、第２実施例のガス供給集積ユニットによれば、第１連通路５２’を別のパージガス共通流路端部手動弁２５の出口流路５４と別のプロセスガス共通流路端部手動弁２４’の二つに分岐した出口流路２４１ｂ及び２４２ｂの両方に連通させ、第２連通路３６１Ｂ’を別のプロセスガス共通流路端部手動弁２４’の入口流路２４ａ’とプロセスガス共通流路端部手動弁２２’の二つに分岐した出口流路の一方２２１ｂに連通させ、第３連通路３７３Ａ’をプロセスガス共通流路端部手動弁２２’の二つに分岐した出口流路の他方２２２ｂと別の第２手動弁の入口流路５１に連通させるように設けられているので、ラインを増設して増設ラインのパージを行う際、プロセスガス共通流路端部手動弁２２’、 別のプロセスガス共通流路端部手動弁２４’のそれぞれ内部まで、且つすべての流路にパージガスを流すことができる。従って、パージに時間をかけることなく、増設するガスユニット内の水分をほぼ完全に除去できる。
なお、本発明の実施の形態について説明したが、本発明は、上記実施の形態に限定されることなく、色々な応用が可能である。 Further, according to the gas supply integrated unit of the second embodiment, the first communication passage 52 ′ is connected to the outlet flow path 54 of another purge gas common flow path end manual valve 25 and another process gas common flow path end manual valve. 24 'is connected to both of the outlet channels 241b and 242b branched into two, and the second communication channel 361B' is shared with the inlet channel 24a 'of another process gas common channel end manual valve 24'. One of the outlet flow paths 221b branched into two of the flow path end manual valve 22 ′ is communicated, and the third communication path 373A ′ is branched into two of the process gas common flow path end manual valves 22 ′. Since it is provided so as to communicate with the inlet passage 51 of the second manual valve different from the other 222b of the passage, when the line is expanded and the additional line is purged, the process gas common passage end manual valve 22 is provided. ', Another process gas common flow path end manual valve 24' The inside, respectively, can flow a purge gas and to all of the channel. Therefore, it is possible to almost completely remove the moisture in the additional gas unit without spending time for purging.
Although the embodiments of the present invention have been described, the present invention is not limited to the above-described embodiments, and various applications are possible.

本発明の第１実施例であるガス供給集積ユニットの構成を示す回路図である。It is a circuit diagram which shows the structure of the gas supply integrated unit which is 1st Example of this invention. 図１の構成を示す平面図である。It is a top view which shows the structure of FIG. 第１実施例の構成を示す平面図で、図２における第２ガスユニット固定板３０Ｂを移動させた後を示す。It is a top view which shows the structure of 1st Example, and shows after moving the 2nd gas unit fixing plate 30B in FIG. 図３の機器を取り除いた下部の流路ブロックを示す平面図である。It is a top view which shows the channel block of the lower part which removed the apparatus of FIG. 図３のＡ−Ａ断面図を示す。AA sectional drawing of FIG. 3 is shown. 図５の機器を取り除いた下部の流路ブロックを示す斜視図である。FIG. 6 is a perspective view showing a lower flow path block from which the device of FIG. 5 is removed. 第２実施例の構成を示す平面図である。It is a top view which shows the structure of 2nd Example. 図７の機器を取り除いた下部の流路ブロックを示す平面図である。It is a top view which shows the channel block of the lower part which removed the apparatus of FIG. 図７のＢ−Ｂ断面図を示す。The BB sectional drawing of FIG. 7 is shown. 図９の機器を取り除いた下部の流路ブロックを示す斜視図である。It is a perspective view which shows the flow path block of the lower part which removed the apparatus of FIG. 特願２００３―３８２１３９の一実施例であるガス供給集積ユニットの構成を示す回路図である。It is a circuit diagram which shows the structure of the gas supply integrated unit which is one Example of Japanese Patent Application No. 2003-382139. 図１１の構成を示す平面図である。It is a top view which shows the structure of FIG. 図１２の機器を取り除いた下部の流路ブロックを示す平面図である。It is a top view which shows the flow path block of the lower part which removed the apparatus of FIG. 図１２のＣ−Ｃ断面図を示す。FIG. 13 is a sectional view taken along the line CC in FIG. 12. 図１４の機器を取り除いた下部の流路ブロックを示す斜視図である。It is a perspective view which shows the flow path block of the lower part which removed the apparatus of FIG. 従来のガス供給ユニットの構成を示す回路図である。It is a circuit diagram which shows the structure of the conventional gas supply unit. 図１６を具体化した構成を示す平面図である。It is a top view which shows the structure which actualized FIG. 従来の増設後のガス供給ユニットを示す回路図である。It is a circuit diagram which shows the gas supply unit after the conventional expansion. 図１８を具体化した構成を示す平面図である。It is a top view which shows the structure which materialized FIG.

符号の説明Explanation of symbols

１１ 第１手動弁
１３ 第２手動弁
１４ 第３手動弁
１５ プロセスガス共通流路
１６ パージガス共通流路
１７ プロセスガスエアオペレート弁
２０ パージガス手動弁
２２，２４ プロセスガス共通流路端部手動弁
２３，２５ パージガス共通流路端部手動弁
２２ｂ 出口流路
２４ａ 入口流路
２４ｂ 出口流路
５１ 入口流路
５２ 第１連通路
５４ 出口流路
５９ 第２連通路
３７３Ａ 第３連通路
２２１ｂ、２２２ｂ 出口流路
２４１ｂ、２４２ｂ 出口流路
３６１Ｂ’ 第２連通路 11 First manual valve 13 Second manual valve 14 Third manual valve 15 Process gas common flow path 16 Purge gas common flow path 17 Process gas air operated valve 20 Purge gas manual valves 22, 24 Process gas common flow path end manual valve 23, 25 Purge gas common channel end manual valve 22b Outlet channel 24a Inlet channel 24b Outlet channel 51 Inlet channel 52 First communication channel 54 Outlet channel 59 Second communication channel 373A Third communication channel 221b, 222b Outlet channel 241b, 242b Outlet flow path 361B ′ second communication path

Claims (4)

出口流路に設けられた第１手動弁と、前記第１手動弁とプロセスガス共通流路とを連通する位置に設けられた第２手動弁と、前記第１手動弁とパージガス共通流路とを連通する位置に設けられた第３手動弁とが流路ブロックにより一体に連結されているガスユニットを複数備えるガス供給集積ユニットにおいて、
前記プロセスガス共通流路の端部と連通するプロセスガス共通流路端部手動弁と、
前記パージガス共通流路の端部と連通するパージガス共通流路端部手動弁と、
前記プロセスガス共通流路端部手動弁と連通する別のプロセスガス共通流路端部手動弁と前記パージガス共通流路端部手動弁と連通する別のパージガス共通流路端部手動弁と前記プロセスガス共通流路端部手動弁と連通する別の第２手動弁を備える増設するガスユニットと、
前記別のパージガス共通流路端部手動弁の出口流路と前記別のプロセスガス共通流路端部手動弁の出口流路とを連通させる第１連通路と、
前記別のプロセスガス共通流路端部手動弁の入口流路と前記プロセスガス共通流路端部手動弁の出口流路とを連通させる第２連通路と、
前記プロセスガス共通流路端部手動弁の出口流路と前記別の第２手動弁の入口流路とを連通させる第３連通路とを有することを特徴とするガス供給集積ユニット。 A first manual valve provided in the outlet flow path; a second manual valve provided at a position communicating the first manual valve and the process gas common flow path; the first manual valve and the purge gas common flow path; In a gas supply integrated unit comprising a plurality of gas units integrally connected by a flow path block with a third manual valve provided at a position communicating with
A process gas common flow path end manual valve communicating with an end of the process gas common flow path;
A purge gas common flow path end manual valve communicating with an end of the purge gas common flow path;
Another process gas common flow path end manual valve communicating with the process gas common flow path end manual valve, another purge gas common flow path end manual valve communicating with the purge gas common flow path end manual valve, and the process An additional gas unit with another second manual valve communicating with the gas common flow path end manual valve;
A first communication path that communicates an outlet flow path of the other purge gas common flow path end manual valve and an outlet flow path of the another process gas common flow path end manual valve;
A second communication path that communicates an inlet flow path of the another process gas common flow path end manual valve and an outlet flow path of the process gas common flow path end manual valve;
A gas supply integrated unit, comprising: a third communication passage that communicates an outlet flow path of the process gas common flow path end manual valve and an inlet flow path of the second manual valve. 請求項１に記載するガス供給集積ユニットにおいて、
前記プロセスガス共通流路端部手動弁の内部に弁座に連通するように形成された出口流路を二つに分岐させ、前記増設するガスユニットの前記別のプロセスガス共通流路端部手動弁の内部に弁座に連通するように形成された出口流路を二つに分岐させていることを特徴とするガス供給集積ユニット。 In the gas supply integrated unit according to claim 1,
The process gas common flow path end manual valve is branched into two outlet flow paths formed so as to communicate with the valve seat, and the additional process gas common flow path end manual operation of the additional gas unit A gas supply integrated unit characterized in that an outlet flow passage formed to communicate with a valve seat is branched into two inside the valve . 請求項２に記載するガス供給集積ユニットにおいて、
前記第１連通路を前記別のパージガス共通流路端部手動弁の出口流路と前記別のプロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の両方に連通させ、
前記第２連通路を前記別のプロセスガス共通流路端部手動弁の入口流路と前記プロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の一方に連通させ、
前記第３連通路を前記プロセスガス共通流路端部手動弁の前記二つに分岐した出口流路の他方と前記別の第２手動弁の入口流路に連通させるように設けられることを特徴とするガス供給集積ユニット。 In the gas supply integrated unit according to claim 2,
The first communication path is connected to both the outlet flow path of the other purge gas common flow path end manual valve and the two branched flow paths of the other process gas common flow path end manual valve;
The second communication path communicates with one of an inlet flow path of the other process gas common flow path end manual valve and one of the two branched flow paths of the process gas common flow path end manual valve;
In that it is provided with a pre-Symbol third communication passage so as to communicate with the inlet passage of the other and the further second manual valve of the outlet flow path which is branched into the two of the process gas common flow passage end part manual valve Characteristic gas supply integrated unit. 請求項１に記載するガス供給集積ユニットにおいて、In the gas supply integrated unit according to claim 1,
前記第３流路が、前記プロセスガス共通流路端部手動弁の出口流路と前記別の第２手動弁の入口流路とを連通させるように流路ブロックに形成されたＵ字流路であり、前記Ｕ字流路が前記第２連通路につながれていることを特徴とするガス供給集積ユニット。A U-shaped channel formed in the channel block so that the third channel communicates the outlet channel of the process gas common channel end manual valve and the inlet channel of the second second manual valve. And the U-shaped flow path is connected to the second communication path.
JP2004056286A 2004-03-01 2004-03-01 Gas supply integrated unit Expired - Fee Related JP3767897B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
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* Cited by examiner, † Cited by third party
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US10982782B2 (en) 2018-11-09 2021-04-20 Samsung Electronics Co., Ltd. Valve apparatus

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