JP3767815B2 - Medal polishing equipment - Google Patents

Medal polishing equipment Download PDF

Info

Publication number
JP3767815B2
JP3767815B2 JP2002245418A JP2002245418A JP3767815B2 JP 3767815 B2 JP3767815 B2 JP 3767815B2 JP 2002245418 A JP2002245418 A JP 2002245418A JP 2002245418 A JP2002245418 A JP 2002245418A JP 3767815 B2 JP3767815 B2 JP 3767815B2
Authority
JP
Japan
Prior art keywords
medal
polishing cloth
polishing
surface polishing
medals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002245418A
Other languages
Japanese (ja)
Other versions
JP2004086470A (en
Inventor
宏 榎本
Original Assignee
京楽産業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京楽産業株式会社 filed Critical 京楽産業株式会社
Priority to JP2002245418A priority Critical patent/JP3767815B2/en
Publication of JP2004086470A publication Critical patent/JP2004086470A/en
Application granted granted Critical
Publication of JP3767815B2 publication Critical patent/JP3767815B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Pinball Game Machines (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、スロットマシン等の遊技機で使用されるメダルを研磨洗浄するメダル研磨装置に関するものである。
【0002】
【従来の技術】
スロットマシン等の遊技機で使用されるメダルは、人手に触れるので汚れ易い。このため遊技者が不快感を感じたり、装置内におけるメダルの循環が妨げられたりしないように、遊技機や計数装置から回収されたときに研磨洗浄する必要がある。メダルの研磨洗浄には水よりも湯を用いる方が好ましく、例えば特開平6−243324号公報に示されるように、湯槽にメダルを浸漬して洗浄した後、メダルを乾燥させる装置が知られている。
【0003】
しかしこのような従来のメダル研磨装置では、メダルを浸漬する湯槽のほかにメダルの乾燥装置のためのスペースが必要となり、装置が大型化して設置面積が大きくなるうえに、製作費用も高くなるという問題があった。
【0004】
【発明が解決しようとする課題】
本発明は上記した従来の問題点を解決し、メダルを短時間できれいに洗浄できるうえ、メダルを乾燥させるためのスペースを必要とせず、装置の小型化を図ることができるメダル研磨洗浄装置を提供するためになされたものである。
【0005】
【課題を解決するための手段】
上記の課題を解決するためになされた本発明は、湿潤させた研磨布を相対向させて配置し、これらの研磨布間にメダルを通過させることによりメダルの両面を研磨するメダル研磨装置において、各研磨布の裏面側に研磨布の湿潤状態を適温で保つヒーター装置を配置したことを特徴とするものである。なお、ヒーター装置の近傍に、発生する蒸気を処理する蒸気処理装置を設けることが好ましい。
【0006】
【発明の実施の形態】
次に、本発明の好ましい実施の形態を詳細に説明する。
本発明のメダル研磨装置は遊技機より回収されてくるメダルや計数装置から回収されるメダルを研磨洗浄するための装置であり、図4に示されるように、メダル搬送手段2と研磨洗浄手段3とからなる。
【0007】
メダル搬送手段2はベルト駆動機構4と該ベルト駆動機構4に取り付けられて連繋される多数のコ字形のメダル搬送部材5とよりなる。ベルト駆動機構4は図4に示されるようにベース1aと上面を傾斜させた支持側板1bとからなるフレーム1に取り付けられるもので、モータ6と、該モータ6の出力軸6aに固定される駆動プーリ7と、該駆動プーリ7と歯付きベルト7aを介して連繋される従動プーリ8と、該従動プーリ8と同軸に設けられる従動プーリ9を含めて左右の支持側板1bの各4隅に枢着される4対の従動プーリ9と、該各従動プーリ9対に巻き掛けられる歯付きベルト10、10とからなる。
【0008】
メダル搬送部材5は、図2に示されるように対向する両側辺を歯付きベルト10、10にボルト止めして歯付きベルト10、10間に張架したもので、連繋されたメダル搬送部材5の中央にはメダル保持枠部11が形成されている。またメダル搬送部材5はメダルの厚みより薄い薄板からなるものである。メダル搬送部材5のメダル保持枠部11は、進行方向側には一枚のメダルが余裕をもって格納できる寸法としているが、進行方向と直交する横方向には複数枚のメダルが余裕をもって格納できる寸法としている。
【0009】
研磨洗浄手段3は、メダル搬送部材5を表裏から挟み込むように設けられた上面研磨布13と下面研磨布14を備えている。これらの上面研磨布13と下面研磨布14は、メダルの厚み以下の厚さのメダル搬送部材5を挟み込むように配置され、相互に直接接触することはない。上面研磨布13と下面研磨布14は厚手で芯が強い材質のもので、メダル搬送部材5に保持されて搬送されるメダルの表裏全体に均一な接触圧を加えることができる。また、上面研磨布13と下面研磨布14は、両側縁を抑え板15、15により押圧されている。
【0010】
なお、図4に示される16は上面研磨布13と下面研磨布14の間歇送り出し機構である。間歇送り出し機構16は、上面研磨布13や下面研磨布14がメダルの研磨洗浄により汚損されたとき一定量送り出されて新しい研磨洗浄面に置き換えるためのものである。間歇送り出し機構16は、後側支持板1bの上下に払出し軸17a、17bと巻取り軸18a、18bとを設けたもので、払出し軸17a、17bには未使用のロール状の研磨布が装着され、巻取り軸18a、18bに使用済みの研磨布が巻き取られるようになっている。巻取り軸18a、18bは駆動モータと歯付きベルトを介して連繋されて回転駆動される。間歇送り出し機構16はタイマーにより間歇駆動される。
【0011】
19は上面研磨布13と下面研磨布14のガイド機構であり、該ガイド機構19は図1に示されるように研磨洗浄手段3の前後端にメダル搬送部材5を表裏から挟み込むよう配置させた小径ガイドローラ19a、19aと前記した抑え板15、15を支持する押圧部材20の両端に枢着されるガイドローラ20a、20aと、該ガイドローラ20a、20aより内側に配置された研磨布送出量検出機構22、22とからなる。21は使用済み研磨布ロールに当接して弛みを防止する押えローラであり、該押えローラ21は支持板1bにばねを介してスライド自在に取り付けられ、ロール径の変動に対応できるようになっている。前記研磨布送出量検出機構22、22は研磨布を巻き掛けるピッチローラ23、23と、ピッチローラ23、23に設けられた4個のピッチ板23a、23aとピッチ板23a、23aをカウントするフォトセンサ24からなり、送出される研磨布により回転されるピッチローラ23、23のピッチ板23a、23aをフォトセンサ24によりカウントすることにより研磨布の送り出し量を規制する。
【0012】
上面研磨布13と下面研磨布14の入口側には、研磨布と同幅のノズル26aを備えた洗浄液含浸機構26が設けられている。ノズル26aには図示しない洗浄液供給パイプを接続し、メダルの表裏両面および上面研磨布13、下面研磨布14を洗浄液で含浸湿潤させる。洗浄液は、界面活性剤を含有させた水性のものが使用される。この洗浄液含浸機構26によって、上面研磨布13と下面研磨布14との入口部分は湿潤状態に保たれる。
【0013】
更に本発明では、上面研磨布13と下面研磨布14の裏面側に研磨布の湿潤状態を適温で保つヒーター装置25を配置してある。ヒーター装置25は図1に示されるように、上面研磨布13の上方に近接配置させた平板状ヒーター25aと、下面研磨布14の下方に近接配置させた平板状ヒーター25bとよりなるものである。これらのヒーター装置25は研磨洗浄手段3のほぼ全長にわたり設けられており、洗浄液含浸機構26により洗浄液が含浸された上面・下面研磨布13、14の湿潤状態を適温で保つことにより、洗浄効果を高める。適温とは、40℃から70℃であり、この間が最も洗浄性能を高めることができる。
【0014】
このようにメダルは入口側では洗浄液により濡れた状態となるが、濡れたメダルはヒーター装置25により出口側に向かうに従い水分が減少している上面・下面研磨布13、14により洗浄液を吸い取られ、乾燥状態で排出される。このため、研磨洗浄後のメダルは直ちに遊技機に配給できることとなる。なお、湿潤された上面・下面研磨布13、14がヒーター装置25により加熱されると洗浄液中の水分が水蒸気となるので、ヒーター装置25の近傍に、発生する蒸気を排気処理するダクト等の蒸気処理装置を設けておくことが好ましい。
【0015】
30は研磨洗浄が完了したメダルを排出する排出機構であり、該排出機構30は図1に示されるように研磨洗浄手段3の終端に続かせたメダル搬送部材5の裏側に上部開口を臨ませた排出シュート31からなるもので、排出シュート31の上部開口はメダル保持枠部11より若干大きいものとして、研磨洗浄手段3のメダル保持枠部11をメダルが速やかに排出されるようにしている。
【0016】
図6、図7に示されるように、本発明のメダル研磨装置により研磨されたメダルは、メダル揚送装置40のリフト機構42により設置島上部の貯留タンク43に揚送される。そして貯留タンク43に設けられたメダル補給機構44を介してメダル配給車Mへメダルを供給したうえ、各遊技機に配送される。
【0017】
このように構成された本発明のメダル研磨装置は、メダル保持枠部11内にメダルを格納し、入口側を洗浄液含浸機構26により湿潤された上面研磨布13と下面研磨布14との間を進行させながら表裏両面を研磨洗浄する。このように洗浄液が含浸された上面研磨布13と下面研磨布14を通過させることにより、メダルは汚れや手脂、タバコのヤニを分解されたうえ拭い取られることとなる。しかもヒーター装置25によって上面研磨布13と下面研磨布14は加熱されているので、研磨布の湿潤状態を適温で保つことができ、優れた洗浄効果を得ることができる。しかもメダルも加熱されるうえ、上面研磨布13と下面研磨布14は出口側に向かうほど加熱されて乾燥されているので、研磨洗浄が完了したメダルは水分を十分に除去され、乾燥された状態で排出機構30から排出されることとなる。従って従来のように、乾燥装置を設置する必要がない。
【0018】
【発明の効果】
以上の説明により明らかなように、本発明のメダル研磨装置によれば、各研磨布の裏面側に研磨布の湿潤状態を適温で保つヒーター装置を配置したことによって、メダルを短時間できれいに洗浄できるうえ、従来のようにメダルを乾燥させるためのスペースを必要とせず、装置の小型化を図ることができる利点がある。
【図面の簡単な説明】
【図1】本発明の好ましい実施の形態の要部を示す正面図である。
【図2】図1の平面図である。
【図3】メダル保持枠部の拡大断面図である。
【図4】メダル研磨装置の正面図である。
【図5】メダル研磨装置の側面図である。
【図6】使用状態を示す正面図である。
【図7】図6の側面図である。
【符号の説明】
1 フレーム
1a ベース
1b 支持側板
2 メダル搬送手段
3 研磨洗浄手段
4 ベルト駆動機構
5 メダル搬送部材
6 モータ
6a 出力軸
7 駆動プーリ
7a 歯付きベルト
8 従動プーリ
9 従動プーリ
10 歯付きベルト
11 メダル保持枠部
13 上面研磨布
14 下面研磨布
15 抑え板
16 間歇送り出し機構
17a払出し軸
17b払出し軸
18a巻取り軸
18b巻取り軸
19 ガイド機構
19a小径ガイドローラ
20 押圧部材
20aガイドローラ
21 押えローラ
22 研磨布送出量検出機構
23 ピッチローラ
23aピッチ板
24 フォトセンサ
25 ヒーター装置
25a平板状ヒーター
25b平板状ヒーター
26 洗浄液含浸機構
26aノズル
30 排出機構
31 排出シュート
40 メダル揚送装置
42 リフト機構
43 貯留タンク
44 メダル補給機構
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a medal polishing apparatus for polishing and cleaning medals used in gaming machines such as slot machines.
[0002]
[Prior art]
Medals used in gaming machines such as slot machines are easily soiled because they touch human hands. For this reason, it is necessary to polish and clean the player when it is recovered from the gaming machine or the counting device so that the player does not feel uncomfortable or prevents the circulation of medals within the device. It is preferable to use hot water rather than water for polishing and cleaning the medal. For example, as disclosed in Japanese Patent Laid-Open No. 6-243324, a device for drying a medal after immersing and cleaning the medal in a hot water bath is known. Yes.
[0003]
However, in such a conventional medal polishing apparatus, a space for a medal drying apparatus is required in addition to a water bath in which the medal is immersed, and the apparatus becomes larger and the installation area increases, and the manufacturing cost also increases. There was a problem.
[0004]
[Problems to be solved by the invention]
The present invention solves the above-described conventional problems, and provides a medal polishing and cleaning apparatus that can clean a medal in a short time and can reduce the size of the apparatus without requiring a space for drying the medal. It was made to do.
[0005]
[Means for Solving the Problems]
The present invention made in order to solve the above problems, in a medal polishing apparatus that arranges wet polishing cloths facing each other, and polishes both sides of the medal by passing medals between these polishing cloths, A heater device for keeping the wet state of the polishing cloth at an appropriate temperature is disposed on the back side of each polishing cloth. In addition, it is preferable to provide the steam processing apparatus which processes the vapor | steam which generate | occur | produces in the vicinity of a heater apparatus.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
Next, a preferred embodiment of the present invention will be described in detail.
The medal polishing apparatus of the present invention is an apparatus for polishing and cleaning medals recovered from gaming machines and medals recovered from a counting device. As shown in FIG. 4, the medal conveying means 2 and the polishing cleaning means 3 It consists of.
[0007]
The medal transport means 2 includes a belt drive mechanism 4 and a number of U-shaped medal transport members 5 attached to and connected to the belt drive mechanism 4. As shown in FIG. 4, the belt drive mechanism 4 is attached to a frame 1 including a base 1 a and a support side plate 1 b whose upper surface is inclined, and a drive fixed to a motor 6 and an output shaft 6 a of the motor 6. A pivot 7 is provided at each of the four corners of the left and right support side plates 1b including a pulley 7, a driven pulley 8 connected to the drive pulley 7 via a toothed belt 7a, and a driven pulley 9 provided coaxially with the driven pulley 8. It consists of four pairs of driven pulleys 9 to be worn and toothed belts 10 and 10 wound around each pair of driven pulleys 9.
[0008]
As shown in FIG. 2, the medal transport member 5 is formed by bolting the opposite side sides to the toothed belts 10 and 10 and stretching them between the toothed belts 10 and 10. A medal holding frame portion 11 is formed at the center of. The medal transport member 5 is made of a thin plate that is thinner than the thickness of the medal. The medal holding frame portion 11 of the medal transport member 5 has a dimension that allows a single medal to be stored with a margin on the advancing direction side, but a dimension that allows a plurality of medals to be stored with a margin in the lateral direction orthogonal to the advancing direction. It is said.
[0009]
The polishing and cleaning means 3 includes an upper surface polishing cloth 13 and a lower surface polishing cloth 14 provided so as to sandwich the medal transport member 5 from the front and back sides. The upper surface polishing cloth 13 and the lower surface polishing cloth 14 are arranged so as to sandwich the medal transport member 5 having a thickness equal to or less than the thickness of the medal, and do not directly contact each other. The upper surface polishing cloth 13 and the lower surface polishing cloth 14 are made of a thick and strong core material, and can apply a uniform contact pressure to the entire front and back of the medal held and transported by the medal transport member 5. Further, the upper surface polishing cloth 13 and the lower surface polishing cloth 14 are pressed by pressing plates 15 and 15 at both side edges.
[0010]
In addition, 16 shown in FIG. 4 is an intermittent feed mechanism of the upper surface polishing cloth 13 and the lower surface polishing cloth 14. The intermittent feed mechanism 16 is used to feed a predetermined amount when the upper surface polishing cloth 13 or the lower surface polishing cloth 14 is soiled by the medal polishing cleaning and replace it with a new polishing cleaning surface. The intermittent delivery mechanism 16 is provided with delivery shafts 17a, 17b and take-up shafts 18a, 18b on the upper and lower sides of the rear support plate 1b, and an unused roll-like polishing cloth is attached to the delivery shafts 17a, 17b. The used polishing cloth is wound around the winding shafts 18a and 18b. The winding shafts 18a and 18b are connected to each other via a drive motor and a toothed belt and are driven to rotate. The intermittent feeding mechanism 16 is intermittently driven by a timer.
[0011]
Reference numeral 19 denotes a guide mechanism for the upper surface polishing cloth 13 and the lower surface polishing cloth 14, and the guide mechanism 19 has a small diameter arranged so that the medal conveying member 5 is sandwiched from the front and back of the front and rear ends of the polishing cleaning means 3 as shown in FIG. Guide rollers 20a, 20a pivotally attached to both ends of the guide rollers 19a, 19a and the pressing member 20 that supports the above-described holding plates 15, 15, and a polishing cloth feed amount detection disposed inside the guide rollers 20a, 20a It consists of mechanisms 22 and 22. Reference numeral 21 denotes a presser roller that comes into contact with the used abrasive cloth roll to prevent loosening. The presser roller 21 is slidably attached to the support plate 1b via a spring so that it can cope with fluctuations in the roll diameter. Yes. The polishing cloth feed amount detection mechanisms 22 and 22 are pitch rollers 23 and 23 for winding the polishing cloth, and four pitch plates 23a and 23a provided on the pitch rollers 23 and 23, and a photo for counting the pitch plates 23a and 23a. The photosensor 24 counts the pitch plates 23a and 23a of the pitch rollers 23 and 23 that are constituted by the sensor 24 and are rotated by the sent polishing cloth, thereby regulating the amount of the polishing cloth sent out.
[0012]
A cleaning liquid impregnation mechanism 26 having a nozzle 26 a having the same width as the polishing cloth is provided on the inlet side of the upper polishing cloth 13 and the lower polishing cloth 14. A cleaning liquid supply pipe (not shown) is connected to the nozzle 26a to impregnate and wet the front and back surfaces of the medal and the upper surface polishing cloth 13 and the lower surface polishing cloth 14 with the cleaning liquid. As the cleaning liquid, an aqueous solution containing a surfactant is used. By this cleaning liquid impregnation mechanism 26, the entrance portions of the upper surface polishing cloth 13 and the lower surface polishing cloth 14 are kept in a wet state.
[0013]
Furthermore, in the present invention, the heater device 25 that keeps the wet state of the polishing cloth at an appropriate temperature is disposed on the back surfaces of the upper surface polishing cloth 13 and the lower surface polishing cloth 14. As shown in FIG. 1, the heater device 25 includes a flat plate heater 25 a disposed close to the upper surface polishing cloth 13 and a flat plate heater 25 b disposed close to the lower surface polishing cloth 14. . These heater devices 25 are provided over almost the entire length of the polishing cleaning means 3, and the cleaning effect is obtained by maintaining the wet state of the upper and lower polishing cloths 13, 14 impregnated with the cleaning liquid by the cleaning liquid impregnation mechanism 26 at an appropriate temperature. Increase. The appropriate temperature is 40 ° C. to 70 ° C., and the cleaning performance can be enhanced most during this time.
[0014]
In this way, the medal becomes wet with the cleaning liquid on the entrance side, but the wet medal is sucked out by the upper and lower surface polishing cloths 13 and 14 whose moisture decreases as it goes to the outlet side by the heater device 25, It is discharged in a dry state. For this reason, medals after polishing and cleaning can be immediately distributed to gaming machines. Note that when the wet upper and lower polishing cloths 13 and 14 are heated by the heater device 25, the moisture in the cleaning liquid becomes water vapor, so that steam such as a duct for exhausting the generated vapor is disposed in the vicinity of the heater device 25. It is preferable to provide a processing apparatus.
[0015]
Reference numeral 30 denotes a discharge mechanism that discharges medals that have been polished and cleaned. The discharge mechanism 30 has an upper opening facing the back side of the medal transport member 5 that is connected to the end of the polishing and cleaning means 3 as shown in FIG. Further, the upper opening of the discharge chute 31 is slightly larger than the medal holding frame part 11, so that the medal is quickly discharged from the medal holding frame part 11 of the polishing cleaning means 3.
[0016]
As shown in FIGS. 6 and 7, the medals polished by the medal polishing apparatus of the present invention are transported to the storage tank 43 on the installation island by the lift mechanism 42 of the medal lifting apparatus 40. Then, medals are supplied to the medal distribution vehicle M via the medal supply mechanism 44 provided in the storage tank 43 and then delivered to each gaming machine.
[0017]
In the medal polishing apparatus of the present invention configured as described above, the medal is stored in the medal holding frame portion 11, and the entrance side is interposed between the upper surface polishing cloth 13 and the lower surface polishing cloth 14 wetted by the cleaning liquid impregnation mechanism 26. Polish and clean both front and back surfaces while advancing. By passing the upper surface polishing cloth 13 and the lower surface polishing cloth 14 impregnated with the cleaning liquid in this way, the medal is wiped off after the dirt, hand grease, and tobacco dust are decomposed. Moreover, since the upper surface polishing cloth 13 and the lower surface polishing cloth 14 are heated by the heater device 25, the wet state of the polishing cloth can be maintained at an appropriate temperature, and an excellent cleaning effect can be obtained. In addition, the medals are heated, and the upper surface polishing cloth 13 and the lower surface polishing cloth 14 are heated and dried toward the exit side, so that the medals that have been subjected to the polishing cleaning are sufficiently removed of moisture and dried. Thus, the discharge mechanism 30 is discharged. Therefore, it is not necessary to install a drying device as in the prior art.
[0018]
【The invention's effect】
As apparent from the above description, according to the medal polishing apparatus of the present invention, the medal can be cleaned cleanly in a short time by arranging the heater device that keeps the wet state of the polishing cloth at an appropriate temperature on the back side of each polishing cloth. In addition, there is an advantage that it is possible to reduce the size of the apparatus without requiring a space for drying medals as in the prior art.
[Brief description of the drawings]
FIG. 1 is a front view showing a main part of a preferred embodiment of the present invention.
2 is a plan view of FIG. 1. FIG.
FIG. 3 is an enlarged cross-sectional view of a medal holding frame portion.
FIG. 4 is a front view of the medal polishing apparatus.
FIG. 5 is a side view of the medal polishing apparatus.
FIG. 6 is a front view showing a use state.
7 is a side view of FIG. 6. FIG.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Frame 1a Base 1b Support side plate 2 Medal conveyance means 3 Polishing washing means 4 Belt drive mechanism 5 Medal conveyance member 6 Motor 6a Output shaft 7 Drive pulley 7a Toothed belt 8 Followed pulley 9 Followed pulley 10 Toothed belt 11 Medal holding frame portion 13 upper surface polishing cloth 14 lower surface polishing cloth 15 holding plate 16 intermittent feed mechanism 17a delivery shaft 17b delivery shaft 18a take-up shaft 18b take-up shaft 19 guide mechanism 19a small-diameter guide roller 20 pressing member 20a guide roller 21 presser roller 22 polishing cloth delivery amount Detection mechanism 23 Pitch roller 23a Pitch plate 24 Photo sensor 25 Heater device 25a Flat plate heater 25b Flat plate heater 26 Cleaning liquid impregnation mechanism 26a Nozzle 30 Discharge mechanism 31 Discharge chute 40 Medal lifting device 42 Lift mechanism 43 Storage tank 44 Medal replenishment mechanism

Claims (2)

湿潤させた研磨布を相対向させて配置し、これらの研磨布間にメダルを通過させることによりメダルの両面を研磨するメダル研磨装置において、各研磨布の裏面側に研磨布の湿潤状態を適温で保つヒーター装置を配置したことを特徴とするメダル研磨装置。In a medal polishing apparatus that arranges wet polishing cloths facing each other and passes medals between these polishing cloths to polish both sides of the medals, the wet state of the polishing cloths on the back side of each polishing cloth is kept at an appropriate temperature. A medal polishing device characterized in that a heater device that keeps in place is arranged. ヒーター装置の近傍に、発生する蒸気を処理する蒸気処理装置を設けた請求項1記載のメダル研磨装置。The medal polishing apparatus according to claim 1, wherein a steam processing device for processing generated steam is provided in the vicinity of the heater device.
JP2002245418A 2002-08-26 2002-08-26 Medal polishing equipment Expired - Fee Related JP3767815B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002245418A JP3767815B2 (en) 2002-08-26 2002-08-26 Medal polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002245418A JP3767815B2 (en) 2002-08-26 2002-08-26 Medal polishing equipment

Publications (2)

Publication Number Publication Date
JP2004086470A JP2004086470A (en) 2004-03-18
JP3767815B2 true JP3767815B2 (en) 2006-04-19

Family

ID=32053609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002245418A Expired - Fee Related JP3767815B2 (en) 2002-08-26 2002-08-26 Medal polishing equipment

Country Status (1)

Country Link
JP (1) JP3767815B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7304715B2 (en) * 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) * 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JP2004086470A (en) 2004-03-18

Similar Documents

Publication Publication Date Title
JP4755848B2 (en) Medal cleaning device
JP3767815B2 (en) Medal polishing equipment
JP4150100B2 (en) Cleaning method and apparatus for coins, etc., and cleaning system
GB2031305A (en) Treatment liquid supplying apparatus for a textile product
JP3767813B2 (en) Medal polishing equipment
EP0273699B1 (en) Developing device for photosensitive material
IL33230A (en) Fabric dampener
JPH06186751A (en) Brush roller and planographic printing plate processor
JP2597534B2 (en) Automatic cleaning and wiping device for continuous transport of various recording cards
JP2838660B2 (en) Cleaning device for printing blanket sheet surface
JP2007296179A (en) Token cleaning device
JPH01224067A (en) Drug coater for foot wiping mat
US2632197A (en) Mirror cleaning machine
US3739486A (en) Dryer for photographic prints and the like
JP7199336B2 (en) Coin washing unit and coin washing device incorporating it
JP2905796B2 (en) Coin polishing machine
JP2018199100A (en) Glass washing device
CN219637547U (en) Weft straightening machine
US582952A (en) Machine for cleaning sheet metal
JP2000079266A (en) Medal polishing machine
JP2784376B2 (en) Coin polishing machine
JP3196398U (en) Medal coin polishing equipment
JP2577697B2 (en) Coin continuous polishing counter
JP2000024293A (en) Game coin cleaning device
JP2676203B2 (en) Card pattern eraser

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20050926

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060124

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060126

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120210

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120210

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150210

Year of fee payment: 9

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees