JP3719880B2 - Beam position measurement system - Google Patents

Beam position measurement system Download PDF

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Publication number
JP3719880B2
JP3719880B2 JP19632899A JP19632899A JP3719880B2 JP 3719880 B2 JP3719880 B2 JP 3719880B2 JP 19632899 A JP19632899 A JP 19632899A JP 19632899 A JP19632899 A JP 19632899A JP 3719880 B2 JP3719880 B2 JP 3719880B2
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Prior art keywords
beam position
electrode
signal
circuit
electrostatic
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JP19632899A
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JP2001021698A (en
Inventor
雄一 山本
禎浩 石
重明 松井
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Description

【０００１】
【発明の属する技術分野】
この発明は、医療用、工業用、および、研究の各分野に用いられる荷電粒子ビーム加速装置のビーム位置測定システムに関するものである。
【０００２】
【従来の技術】
図１０は、例えばＴｈｅ ８ｔｈ Ｓｙｍｐ．Ｏｎ Ａｃｃｅｌｅｒａｔｏｒ Ｓｃｉｅｎｃｅ ａｎｄ Ｔｅｃｈｎｏｌｏｇｙ、１９９１．Ｓａｉｔａｍａ Ｊａｐａｎの「ＢＥＡＭ ＭＯＮＩＴＯＲ ＯＦ ＨＩＭＡＣ ＨＥＡＶＹ−ＩＯＮ ＳＹＮＣＨＲＯＴＲＯＮ」ｐ．３２２ Ｆｉｇ．７に開示されているような従来のビーム位置測定システムの構成を示すもので、図中、１は右側電極２と左側電極３とを有する静電型ビーム位置モニタであり、図１０は２個の静電型ビーム位置モニタ１が用いられる場合を示している。４ａと４ｃは各静電型ビーム位置モニタ１の右側電極２の出力であるＲＦ信号を増幅するヘッドアンプ、４ｂと４ｄは左側電極３の出力であるＲＦ信号を増幅するヘッドアンプ、５ａは右側信号用のヘッドアンプ４ａと４ｃとからの出力信号を切り換える切換器、５ｂは左側信号用のヘッドアンプ４ｂと４ｄとからの出力信号を切り換える切換器、６は切換器５ａおよび５ｂで切り換えられた信号を入力して検波とビーム位置演算とを行うビーム位置信号処理回路であり、切換器５ａおよび５ｂは同一静電型ビーム位置モニタ１の出力であるヘッドアンプ４ａと４ｂ、または、４ｃと４ｄとを選択してビーム位置信号処理回路６に供給するように構成されている。
【０００３】
【発明が解決しようとする課題】
従来のビーム位置測定システムでは以上のようにして荷電粒子ビームの通過位置を測定するが、測定上に様々な課題を有している。まずその第一は、ヘッドアンプ４ａないし４ｄは内容的には同一構成であるのでそれぞれが一つの製品として個別の筐体に収納されており、温度により増幅度が変化しやすい電界効果トランジスタ１５を使用しているため、例えばヘッドアンプ４ａと４ｂとの各筐体の内部温度に温度差が生じた場合にはそれぞれの増幅率の比が変化し、荷電粒子ビーム通過位置の測定に誤差が発生して高い精度が得られない。
【０００４】
この発明は、このような課題を解決するためになされたものであり、右側電極の信号を増幅するヘッドアンプと左側電極の信号を増幅するヘッドアンプとに温度差を生じさせず、均等な増幅率が得られるようにしたビーム位置測定システムを得ることを目的とするものである。
【０００５】
【課題を解決するための手段】
この発明に係わるビーム位置測定システムは、少なくとも右側電極と左側電極との二つの電極が真空容器内に設けられた静電型ビーム位置モニタと、この静電型ビーム位置モニタの右側電極からの出力電圧と左側電極からの出力電圧とを個別に増幅する複数の増幅回路と、この複数の増幅回路からの出力を受けてビーム位置を演算するビーム位置信号処理回路とを備え、静電型ビーム位置モニタの右側電極からの出力電圧を増幅する増幅回路と左側電極からの出力電圧を増幅する増幅回路とを、温度差が生じないよう、一つの筐体内に収納したものである。
【０００６】
【発明の実施の形態】
実施の形態１．
図１は、この発明の実施の形態１のビーム位置測定システムの構成を示すもので、上記従来例の図１０との同一部分には同一符号が付与されている。図において、１は右側電極２と左側電極３を持つ静電型ビーム位置モニタであり、図は２個の静電型ビーム位置モニタ１が用いられる場合を示し、また、図１には図示しないが、従来例の図１１にて説明したように各電極２および３はそれぞれ電極板とアース板とにより構成され、この電極板とアース板とで静電容量を形成している。１８はそれぞれの静電型ビーム位置モニタ１に対応して設けられるヘッドアンプで、それぞれ右側電極２の出力信号を増幅する増幅回路１８ａと左側電極３の出力信号を増幅する増幅回路１８ｂとが同一筐体内に収納されている。５ａはこれらの複数のヘッドアンプ１８の右側電極２用の増幅回路１８ａからの出力信号を切り換える切換器、５ｂは複数のヘッドアンプ１８の左側信号用の増幅回路１８ｂからの出力信号を切り換える切換器、６は切換器５ａおよび５ｂで切り換えられた信号を入力し、検波とビーム位置演算とを行うビーム位置信号処理回路である。
【０００７】
それぞれの静電型ビーム位置モニタ１の右側電極２の信号は各ヘッドアンプ１８の増幅回路１８ａに入力され、また、左側電極３の信号は各ヘッドアンプ１８の増幅回路１８ｂに入力される。各増幅回路１８ａにて増幅された右側電極２の信号は切換器５ａに、また、各増幅回路１８ｂにて増幅された左側電極３の信号は切換器５ｂに出力され、切換器５ａと５ｂとは同一静電型ビーム位置モニタ１の右側電極２の信号と左側電極３の信号とを選択してビーム位置信号処理回路６に出力し、ビーム位置が演算される。
【０００８】
この発明の実施の形態１のビーム位置測定システムにおいては、上記のように、同一静電型ビーム位置モニタ１の信号を増幅する右側信号用の増幅回路１８ａと左側信号用の増幅回路１８ｂとが一つのヘッドアンプ１８として同一筐体内に収納されるようにしたので、ビーム位置をモニタ中に雰囲気温度の変動があっても両増幅回路１８ａおよび１８ｂには温度差が生じず、増幅率の比を一定に保つことができ、ビーム位置測定時に温度差により生じる測定誤差を回避することができる。なお、温度により増幅度が変化しやすい電界効果トランジスタを同一筐体内で接近、または、接着して設けるようにすればさらに効果的である。
【０００９】
【発明の効果】
以上に説明したように、この発明のビーム位置測定システムによれば次のような効果を得ることができる。すなわち、実施の形態１の構成によれば、静電型ビーム位置モニタの右側電極の信号を増幅する増幅回路と左側電極の信号を増幅する増幅回路とを同一筐体内に収納するようにしたので、ビーム位置をモニタ中に雰囲気温度の変動があっても両増幅回路には温度差が生じず、増幅率の比を一定に保つことができてビーム位置測定に誤差を生じることがない。
【図面の簡単な説明】
【図１】 この発明の実施の形態１のビーム位置測定システムの構成を示す構成図である。
【図２】従来のビーム位置測定システムの構成を示す構成図である。
【符号の説明】
１ 静電型ビーム位置モニタ、２ 右側電極、３ 左側電極、
２ａ、３ａ 静電容量、５ａ、５ｂ 切換器、
６ ビーム位置信号処理回路、 ７ 電極板、８ アース板、
９ 真空容器、１０ サポート、 １１ 絶縁サポート、
１２、１３ 信号端子、１４ａ、１４ｂ 入力抵抗、
１５ａ、１５ｂ 電界効果トランジスタ、１８ ヘッドアンプ、
１８ａ、１８ｂ 増幅回路。 [0001]
BACKGROUND OF THE INVENTION
The present invention relates to a beam position measurement system for a charged particle beam accelerator used in medical, industrial, and research fields.
[0002]
[Prior art]
FIG. 10 shows, for example, The 8th Symp. On Accelerator Science and Technology , 1991. Saitama Japan's “BEAM MONITOR OF HIMAC HEAVY-ION SYNCHROTRON” p. 322 FIG. 7 shows the configuration of a conventional beam position measuring system as disclosed in FIG. 7, in which 1 is an electrostatic beam position monitor having a right electrode 2 and a left electrode 3, and FIG. This shows a case where the electrostatic beam position monitor 1 is used. 4a and 4c are head amplifiers that amplify the RF signal that is the output of the right electrode 2 of each electrostatic beam position monitor 1, 4b and 4d are head amplifiers that amplify the RF signal that is the output of the left electrode 3, and 5a is the right side. A switcher for switching output signals from the signal head amplifiers 4a and 4c, 5b is a switcher for switching output signals from the head amplifiers 4b and 4d for the left signal, and 6 is switched by the switches 5a and 5b. This is a beam position signal processing circuit that inputs a signal and performs detection and beam position calculation. The switches 5a and 5b are head amplifiers 4a and 4b or 4c and 4d that are outputs of the same electrostatic beam position monitor 1. preparative selected that is configured to provide a beam position signal processing circuit 6.
[0003]
[Problems to be solved by the invention]
In traditional beam position measurement system as described above to measure a passing position of a charged particle beam, but have various problems on the measurement. First of all, since the head amplifiers 4a to 4d have the same configuration in terms of content, each is housed in a separate housing as a single product, and the field effect transistor 15 whose amplification degree is likely to change with temperature is provided. For example, if there is a temperature difference between the internal temperatures of the housings of the head amplifiers 4a and 4b, the ratio of the respective amplification factors changes and an error occurs in the measurement of the charged particle beam passage position. and high accuracy is such not obtained.
[0004]
The present invention has been made to solve such a problem, and does not cause a temperature difference between the head amplifier that amplifies the signal of the right electrode and the head amplifier that amplifies the signal of the left electrode, and performs equal amplification. It is an object of the present invention to obtain a beam position measurement system capable of obtaining a rate.
[0005]
[Means for Solving the Problems]
A beam position measurement system according to the present invention includes an electrostatic beam position monitor in which at least two electrodes, a right electrode and a left electrode, are provided in a vacuum vessel, and an output from the right electrode of the electrostatic beam position monitor. A plurality of amplifier circuits for individually amplifying the voltage and the output voltage from the left electrode, and a beam position signal processing circuit for calculating a beam position in response to outputs from the plurality of amplifier circuits. and an amplifying circuit for amplifying the output voltage from the amplifier circuit and the left electrode for amplifying the output voltage from the right electrode of the monitor, so that the temperature difference does not occur, Ru der those retract and the one housing.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
Embodiment 1 FIG.
FIG. 1 shows the configuration of the beam position measuring system according to the first embodiment of the present invention. The same reference numerals are given to the same portions as those in FIG. 10 of the conventional example. In the figure, 1 is an electrostatic beam position monitor having a right electrode 2 and a left electrode 3, and the figure shows a case where two electrostatic beam position monitors 1 are used, and is not shown in FIG. However, as described with reference to FIG. 11 of the conventional example, each of the electrodes 2 and 3 is composed of an electrode plate and a ground plate, and the electrode plate and the ground plate form a capacitance. Reference numeral 18 denotes a head amplifier provided corresponding to each electrostatic beam position monitor 1. The amplifier circuit 18 a that amplifies the output signal of the right electrode 2 and the amplifier circuit 18 b that amplifies the output signal of the left electrode 3 are the same. It is stored in the housing. 5a is a switch for switching the output signal from the amplifier circuit 18a for the right electrode 2 of the plurality of head amplifiers 18, and 5b is a switch for switching the output signal from the amplifier circuit 18b for the left signal of the plurality of head amplifiers 18. , 6 is a beam position signal processing circuit for inputting signals switched by the switchers 5a and 5b and performing detection and beam position calculation.
[0007]
The signal of the right electrode 2 of each electrostatic beam position monitor 1 is input to the amplifier circuit 18 a of each head amplifier 18, and the signal of the left electrode 3 is input to the amplifier circuit 18 b of each head amplifier 18. The signal of the right electrode 2 amplified by each amplifier circuit 18a is output to the switch 5a, and the signal of the left electrode 3 amplified by each amplifier circuit 18b is output to the switch 5b, and the switches 5a and 5b Selects the signal of the right electrode 2 and the signal of the left electrode 3 of the same electrostatic beam position monitor 1 and outputs them to the beam position signal processing circuit 6 to calculate the beam position.
[0008]
In the beam position measurement system according to the first embodiment of the present invention, as described above, the right signal amplification circuit 18a and the left signal amplification circuit 18b that amplify the signal of the same electrostatic beam position monitor 1 are provided. Since the head amplifier 18 is housed in the same housing, even if the ambient temperature fluctuates while the beam position is monitored, there is no temperature difference between the two amplifier circuits 18a and 18b, and the amplification factor ratio Can be kept constant, and measurement errors caused by temperature differences during beam position measurement can be avoided. Incidentally, approaching the easy field effect transistor amplification degree varies with temperature in the same enclosure, or Ru more effective der if so provided with adhesive.
[0009]
【The invention's effect】
As described on the following, it is possible to obtain the following effects according to the beam position measurement system of the present invention. That is, according to the configuration of the first embodiment, the amplification circuit that amplifies the signal of the right electrode of the electrostatic beam position monitor and the amplification circuit that amplifies the signal of the left electrode are housed in the same casing. no temperature difference occurs the beam position on both the amplifier circuit even when variations in the ambient temperature during monitoring, that it can keep the ratio of the amplification factor constant cause errors in beam position measurement is not Na.
[Brief description of the drawings]
FIG. 1 is a configuration diagram showing a configuration of a beam position measurement system according to a first embodiment of the present invention.
FIG. 2 is a configuration diagram showing a configuration of a conventional beam position measurement system.
[Explanation of symbols]
1 Electrostatic beam position monitor, 2 right electrode, 3 left electrode,
2a, 3a capacitance, 5a, 5b switch,
6 beam position signal processing circuit, 7 electrode plate, 8 ground plate,
9 Vacuum vessel, 10 support, 11 Insulation support,
12, 13 Signal terminal, 14a, 14b Input resistance,
15a, 15b field effect transistor, 18 head amplifier,
18a, 18b amplification circuits.

Claims (1)

少なくとも右側電極と左側電極との二つの電極が真空容器内に設けられた静電型ビーム位置モニタ、この静電型ビーム位置モニタの右側電極からの出力電圧と左側電極からの出力電圧とを個別に増幅する複数の増幅回路、この複数の増幅回路からの出力を受けてビーム位置を演算するビーム位置信号処理回路を備え、前記静電型ビーム位置モニタの右側電極からの出力電圧を増幅する増幅回路と左側電極からの出力電圧を増幅する増幅回路とを、温度差が生じないよう、一つの筐体内に収納したことを特徴とするビーム位置測定システム。An electrostatic beam position monitor in which at least two electrodes, a right electrode and a left electrode, are provided in a vacuum vessel, and an output voltage from the right electrode and an output voltage from the left electrode of the electrostatic beam position monitor are individually set. Amplifying circuit for amplifying the output voltage from the right electrode of the electrostatic beam position monitor, comprising a plurality of amplifier circuits for amplifying, and a beam position signal processing circuit for calculating a beam position in response to outputs from the plurality of amplifier circuits A beam position measuring system , wherein a circuit and an amplifier circuit for amplifying an output voltage from a left electrode are housed in one casing so as not to cause a temperature difference .
JP19632899A 1999-07-09 1999-07-09 Beam position measurement system Expired - Lifetime JP3719880B2 (en)

Priority Applications (1)

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JP19632899A JP3719880B2 (en) 1999-07-09 1999-07-09 Beam position measurement system

Related Child Applications (4)

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JP2004206806A Division JP3819401B2 (en) 2004-07-14 2004-07-14 Beam position measurement system
JP2004206807A Division JP3819402B2 (en) 2004-07-14 2004-07-14 Beam position measurement system
JP2004206804A Division JP3860183B2 (en) 2004-07-14 2004-07-14 Beam position measurement system
JP2004206805A Division JP3860184B2 (en) 2004-07-14 2004-07-14 Beam position measurement system

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JP5930628B2 (en) * 2011-08-22 2016-06-08 株式会社日立製作所 Radiation irradiation apparatus and radiation measurement method
US9269536B2 (en) * 2012-04-17 2016-02-23 Varian Semiconductor Equipment Associates, Inc. Double ended electrode manipulator
JP2024110364A (en) * 2023-02-02 2024-08-15 株式会社日立製作所 Circular accelerator and particle beam therapy system equipped with the circular accelerator

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