JP3677585B2 - Open end felt with seam - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a press felt for a paper machine, a dry life felt, a dry canvas, and a felt for a pulp machine, and has a feature in the structure of a seam portion of the base fabric.
[0002]
[Prior art]
Some felts used in paper machines or pulp machines (hereinafter referred to as “machines”) are made endlessly. When this type of felt is mounted on a machine, the machine roll is cantilevered. It had to be hung from one side, and it was dangerous and time consuming. Therefore, an open-end felt with a seam that is easy to put into the machine and safe is desired.
[0003]
As shown in FIG. 1A, the open end felt with seam is a double or multiple woven fabric in which wefts Ca and Cb are driven between warp yarns during weaving, that is, warp yarns on a loom, to form a base fabric D and woven in an annular shape. After weaving, the ear yarn S is removed, and once it is made into a strip with a length in the direction of the weft Ca, Cb on the loom, it is drawn into the machine, and then both ends of the base fabric are joined together to form an annular shape. When mounted on a machine as an open-end felt, the warp G on the loom becomes the weft CROSS MACHINE DIRECTION yarn (hereinafter referred to as CMD yarn) on the machine, and the weft on the loom becomes the warp MACHINE on the machine. DIRECTION yarn (hereinafter referred to as MD yarn). Mounting on the machine is performed as follows. That is, after stopping the machine in operation and cutting the mounted felt to temporarily fix the new felt and the old felt, or instead of the old felt in advance along the travel of the felt through the rope etc. After temporarily fixing the rope etc. and the new felt, pull the old felt or rope etc. out of the machine, pull the new felt into the machine, remove the old felt or rope etc., and loops provided in advance at both ends of the new felt It is made endless by alternately butting and inserting a pin seam into the loop.
[0004]
However, press felts for paper machines are wide, and the yarns used for the base fabric are generally flexible, thin, and the MD yarns oriented in the machine longitudinal direction have a high yarn density and a small loop diameter. In addition, the above-described butting work at the seam portion becomes difficult. In the case of MD yarn such as nylon, it has water absorption, and gradually changes in flexibility of MD yarn, that is, the rigidity of the loop is lowered, and the difficulty of insertion increases with time.
[0005]
Further, depending on the structure of the base fabric, when the virtual surface (Ea-Fa surface) including the upper thread Ea and the lower thread Fa at the root of the loop of the seam portion is not perpendicular to the base fabric surface but twists obliquely. It becomes difficult to mesh the loops, and it becomes more difficult to insert the pin seam. Further, if the twisting angle and direction are irregular, the insertion becomes more difficult. In addition, when the CMD yarn is made of nylon or the like having water absorption, the degree of bending of the CMD yarn gradually changes, and the angle formed on the base fabric surface of the virtual surface where the loop is located is also determined by the loop duality (CMD The angle (verticality with respect to the direction) is changed to an angle at which the loop is broken, and the engagement of the loops is made more difficult.
[0006]
Furthermore, even if it is easy to insert a pin seam at the seam part, if there is a difference in papermaking performance between the seam part and the other base fabric part, paper breakage at the seam part, paper fiber disturbance, etc. This could lead to poor surface properties of the paper.
[0007]
The reason why the loop is twisted with respect to the base fabric D is considered as follows. As an example, let us take up a case of double weaving and creating a loop during weaving. As shown in FIG. 1, the seam felt is woven into a double weave consisting of a front side fabric A and a back fabric B, and the front fabric A and the back fabric B are made of weft Ca, Cb (MD yarn) on the loom. It has a configuration including a base fabric D connected in a cylindrical shape by ear threads S located in La and Lb. The front side fabric A of the cylindrical base fabric D includes an upper yarn layer Ea and a lower yarn layer Fa on the weft Ca (MD yarn) on the loom that is wound around the ear yarn S at the end of the fabric and constitutes the loop La. Are weaved into warp yarn Ga (CMD yarn) on the loom, and the back side fabric B is wound around the ear yarn S at the end of the fabric to form the loop Lb. The weft Cb (MD yarn) on the loom The upper yarn layer Eb and the lower yarn layer Fb are driven into warp Gb (CMD yarn) on the loom. Here, the term “layer” is used because the weft yarns (MD yarns) on the looms constituting each yarn layer Ea, Fa, Eb, Fb are driven in parallel in a plurality of close states. This is because a plurality of yarns appear to form a single layer at the bases of the loops La and Lb.
On the loop La by the end surface (weft yarn Ca (MD yarn) on the loom) along the warp Ga on the loom of the front side fabric A of the base fabric D (Gb is the warp yarn on the loom of the back side fabric B) (both are CMD yarns) FIG. 1B schematically shows the attached end face.
[0008]
FIG. 1B shows a cross section of the front side ground A. In FIG. 1B, the CMD yarn Ga passes between the MD yarns Ca constituting the loop La row. As shown in FIG. 1A, the MD yarn Ca winds the ear yarn S around the end of the base fabric D to form a loop La, and the MD yarn Cb (not shown in FIG. 1B) winds around the ear yarn S as shown in FIG. 1A. Loop Lb. In the MD yarns Ca and Cb, yarn rows positioned on the ear yarn S are upper yarn layers Ea and Eb, and the ear yarn S is wound and lower yarns of the ear yarn S are lower yarn layers Fa and Fb.
[0009]
Next, how the weft on the loom, that is, the MD yarn Ca, is received by the warp on the loom, that is, the CMD yarn Ga in one circulation of the base fabric D shown by the dotted line in FIG. 1B will be described. In the normal loop structure, as shown in FIG. 1B, the CMD yarn Ga crosses the upper yarn layer Ea and the lower yarn layer Fa at the root of the loop La. That is, the CMD yarn Ga restricts the degree of freedom of the MD yarns Ea and Fa at the base of the loop La. However, when the loop La row appearing at one end of the base fabric D and the loop Lb row appearing at the other end of the base fabric D are matched with each other, the inclination angle of the loop La body is not limited. This means that the inclination angle of the loop La body is greatly influenced by the root of the loop La. It is clear that the magnitude of the influence is larger as the distance from the loop La body is closer, that is, the CMD yarn Ga1 has a greater influence on the inclination angle of the loop La than the CMD yarn Ga2.
[0010]
The CMD yarn Ga1 is between the yarn Fa4 and Fa1 of the lower yarn layer Fa, between the yarn Fa1 and Fa2 of the lower yarn layer, between the yarn Fa2 of the lower yarn layer and the yarn Ea2 of the upper yarn layer, Passing between the yarns Ea2 and Ea3, between the yarns Ea3 and Ea4 of the upper yarn layer, between the yarn Ea4 of the upper yarn layer and the yarn Fa4 of the lower yarn layer, between the yarn Fa4 and Fa1 of the lower yarn layer, This is repeated. During this time, bending is performed between the threads Fa1 and Fa2 of the lower thread layer and between the upper thread layers Ea2 and Ea3 and between the threads Ea3 and Ea4 of the upper thread layer and between the threads Fa4 and Fa1 of the lower thread layer. However, it is not a right angle (90 ° or more) but passes more or less obliquely.
[0011]
For this reason, in the loop La2, the yarn Ea2 of the upper yarn layer is easily shifted to the Ea1 side, and the yarn Fa2 of the lower yarn layer is easily shifted to the Fa3 side. As a result, the loop La2 is as shown in FIG. For the same reason, the loop La4 is twisted for the same reason, and the direction of twist is indicated by an arrow in Fig. 1B, but the thread Fa1 of the lower thread layer Fa and the thread Ea3 of the upper thread layer Ea are The CMD yarn Ga1 passes through both sides, and the sides are pressed by the yarn so that they are not easily displaced.Also, the yarn Ea1 of the upper yarn layer and the yarn Fa3 of the lower yarn layer do not intersect with the CMD yarn Ga1, but CMD Since it intersects the yarn Ga2, it is affected by the CMD yarn Ga2.
In the example shown in FIGS. 1C, C ′, and C ″, the CMD yarns Ga1 and Ga2 are alternately shifted by one pitch, and the same structure is repeatedly formed in the base fabric D.
Therefore, the CMD yarn Ga1 is in a state of supporting the MD yarns Fa1, Ea3 and the CMD yarn Ga2 is supporting the MD yarns Ea1, Fa3 from both sides. It acts to push in the direction of the arrow shown.
The CMD yarn Ga2 acts to push the MD yarn, Ea4, Ea2, Fa2, Fa4 in the direction opposite to the arrow shown in FIG. 1C, but is smaller than Ga1. As a result, the loops La2 and La4 are tilted as shown in FIG. 1C ″.
[0012]
[Problems to be solved by the invention]
In view of the above points, the present invention aligns the loop direction to the seam portion by positioning the loop of the seam portion on a virtual plane that is perpendicular to the base fabric surface of the felt and coincides with the felt traveling direction. It is an object of the present invention to provide a felt that facilitates the insertion of the ear thread and can make the seam portion the same surface condition as the base fabric of other portions when seamed.
[0013]
A loop formed of MD yarn of a base fabric composed of an upper yarn layer and a lower yarn layer forming a seam portion of a front side fabric and a back side fabric of a double woven or multi-woven seam felt is adjacent to the loop. In order to prevent twisting to the other loop side, the loop-fixed CMD yarn is entangled only with the MD yarn of the upper yarn layer different from the base fabric CMD yarn on the loop side of the CMD yarn closest to the seam portion of the base fabric. And a loop-fixed CMD yarn that is entangled only with the MD yarn of the lower yarn layer different from the base fabric CMD yarn, and one MD yarn of the upper yarn layer or the lower yarn layer forming the loop is When the CMD yarn forming the fabric end is in contact with only one side, the loop fixing CMD yarn is arranged so that the MD yarn contacts the CMD yarn on the side surface opposite to the contact side surface, and the yarn twists the loop. Prevented.
Further, the loop-fixed CMD yarn can obtain more stable running by making its thickness equal to or thinner than that of the CMD yarn constituting the base fabric . Further, the amount of web adhering to the seam portion is increased by making the thickness of the loop fixing CMD yarn thinner than the CMD yarn constituting the base fabric .
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
FIGS. 2A to 2E are schematic views showing seam edge portions according to the first to fifth embodiments of the present invention. 2A ′ to E ′ are cross-sectional views taken along one-dot chain lines in FIGS. In the first to fifth embodiments shown in FIGS. 2A to E, the structure of the base fabric D is the same as that of the conventional product shown in FIG. 1, and the illustrated base fabric D is a double woven or multi-woven tubular shape with warp weft. After weaving, pulling out the ear thread and pulling it into a machine once as a band, the loops made at both ends of the fabric are attached to each other, and the ear thread is passed through the loop to make the base fabric annular. The yarn driven in between the warp yarns as wefts at the time of weaving will face the warp direction of the paper machine when it becomes an annular product. Therefore, in the following description, the weft yarn on the product that was weaving warp is called CMD (CROSS MACHINE DIRECTION) yarn, and the warp yarn on the product that was weaving weft is called MD (MACHINE DIRECTION) yarn. I will explain it.
[0015]
In the following, five embodiments will be described. The base fabric structures are the same (of course, different base fabric structures may be used), and each means for increasing the uprightness of the loop in the seam portion constituting the loop is provided. Different in the embodiment. An organization chart is shown in FIGS. 2A and 2A as the first embodiment. In this structure, the loop fixing is entangled only with the MD yarns Ea1, Ea2,... Of the upper yarn layer Ea different from the base fabric CMD yarn on the loop La side of the CMD yarn 10 closest to the seam portion of the base fabric D. A CMD yarn 20a and a loop-fixed CMD yarn 20b entangled only with the MD yarns Fa1, Fa2,... Of the lower yarn layer Fa different from the base fabric CMD yarn are arranged.
[0016]
The loop fixing CMD yarn 20a passes between the MD yarns Ea1 and Ea2 of the upper yarn layer Ea from the top to the bottom, between the Ea2 and Ea3 from the bottom to the top, and between the Ea3 and Ea4 from the top to the bottom. The loop-fixed CMD yarn 20a always exists between Ea1, Ea2, Ea3, and Ea4. In the lower thread layer Fa, similarly to the upper thread layer Ea, the thread Fa1 and Fa2 of the lower thread layer are from top to bottom, the space between Fa2 and Fa3 is from bottom to top, and the space between Fa3 and Fa4 is from top to bottom. Pass the loop fixed CMD yarns 20a and 20b between the yarn layers Ea and Fa so that the bases of the loops L1, L2... Made by the MD yarns Ea1, Ea2,. By fixing, the loop is always fixed so as to be positioned on a virtual plane that is perpendicular to the base cloth surface and coincides with the machine longitudinal direction. The loop fixing CMD yarn 20a intersects only the yarns Ea1, Ea2... Of the upper yarn layer Ea and the loop fixing CMD yarn 20b intersects only the yarns Fa1, Fa2... Of the lower yarn layer Fa, and the loop fixing CMD yarn 20a is the lower yarn. The loop-fixed CMD yarn 20b does not intersect with the yarn of the upper layer Ea.
[0017]
In the embodiment shown in B and B ′ of FIG. 2, the pitch of the loop fixing CMD yarn 20b entangled with the yarns Fa1, Fa2,... Of the lower yarn layer Fa of the embodiment shown in A and A ′ of FIG. It is something that is shifted. That is, the loop fixing CMD yarn 20a is wound on the upper portion of the yarn Ea1 of the upper yarn layer Ea, while the loop fixing CMD yarn 20b is wound on the lower portion of the yarn Fa1 of the lower yarn layer. The CMD yarn 10 (Ga1) closest to the seam part is next to the CMD yarn Ga2 farthest from the loop La1, but the loop-fixed CMD yarns 20a and 20b pass through both sides of the MD yarns Ea1 and Fa3, respectively. The loops La1 and La3 by the Ea1 and the MD yarn Fa3 are always fixed so as to be positioned on a virtual plane that is perpendicular to the base fabric D surface and coincides with the machine longitudinal direction.
[0018]
The embodiment shown in C and C ′ of FIG. 2 shows a form different from that described in the above two examples. That is, although the MD yarn Ea2 is shifted to the Ea1 side by the CMD yarn 10, the loop-fixed CMD yarn 20a is arranged at a position in contact with only the Ea1 side of the MD yarn Ea2 to suppress this deviation. Further, the MD yarn Ea1 of the upper yarn layer Ea and the MD yarn Fa3 of the lower yarn layer Fa are not affected by the CMD yarn 10 (Ga1), and the influence of the CMD yarn Ga2 which is the farthest from the loop La1 after the CMD yarn 10 (Ga1). The loop fixing CMD yarns 20a and 20b pass through both sides of the MD yarns Ea1 and Fa3, respectively, so that the loops La1 and La3 by the MD yarn Ea1 and the MD yarn Fa3 are always perpendicular to the base fabric D surface and machine It is fixed so that it lies on a virtual plane that coincides with the direction.
[0019]
In the embodiment shown in D and D 'of FIG. 2, the method of suppressing the deviation of the MD yarn Ea2 of the upper yarn layer Ea is the same as that of the loop fixing CMD yarn 20a shown in C and C' of FIG. On the contrary, the loop-fixed CMD yarn 20a is positioned below the MD yarn Ea2 from above the MD yarn Ea1. The CMD yarn 10 also prevents the MD yarn Ea3 from approaching the MD yarn Fa3 side of the lower yarn layer Fa. In this example, the loop fixing CMD yarn 20b of the lower yarn layer Fa is the same as the embodiment shown in C and C 'of FIG.
[0020]
The embodiment shown by E and E ′ in FIG. 2 is shown by means for fixing the MD yarns Fa1 to Fa4 of the lower yarn layer Fa of the embodiment shown by B and B ′ in FIG. 2 and D and D ′ in FIG. The embodiment is a combination of means for suppressing the deviation of the MD yarns Ea2 and Ea4 of the upper yarn layer Ea of the embodiment, and various other combinations are possible.
[0021]
In each of the above-described embodiments, the loop-fixed CMD yarns 20a and 20b are of the same thickness or thinner than the thickness of the CMD yarn 10 closest to the loop L of the base fabric D. In general, the felt has a smaller amount of web on the back side (back side) than the side in contact with the wet paper (paper side), and there may be almost no web. In the case where the back side of the felt is easily worn, the structure shown in FIG. 2B is used as an example, and the CMD yarns 20a and 20b for loop fixing thinner than the CMD yarns 10 (Ga1 and Ga2) close to the loop of the base fabric D are used. For example, the loop fixing CMD yarns 20a and 20b can be positioned on the inner side of the surface of the base fabric D with respect to the CMD yarn 10 (Ga1, Ga2). It has the effect of preventing the yarn from jumping out. As described above, the thicknesses of the CMD yarns passed through the upper yarn layer Ea and the lower yarn layer Fa may not be the same. However, it is necessary to consider not to become extremely thicker than other parts in the flow direction of the paper machine. There may be a plurality of CMD yarns passed through the upper yarn layer Ea and the lower yarn layer Fa, and it is not necessary to have the same number. At this time, as the loop L is approached, smooth running can be obtained by reducing the thickness of the passed CMD yarn. The type of yarn passed as CMD yarn is not particularly limited.
[0022]
The base fabric D is completed as a felt by integrating the base fabric D and the web by placing a web on the surface and performing needle punching. At this time, the web is naturally placed on the surface of the seam portion and needle punched, but if the loop-fixed CMD yarns 20a and 20b of the seam portion are sufficiently thin as compared to the yarn constituting the base fabric D, the web of the portion is used. The same result as that obtained by increasing the amount of yarn is obtained, the web is entangled with the yarn, and the web peels off at the portion.
[0023]
【The invention's effect】
A loop formed of MD yarn of a base fabric composed of an upper yarn layer and a lower yarn layer forming a seam portion of a front side fabric and a back side fabric of a double woven or multi-woven seam felt is adjacent to the loop. In order to prevent twisting to the other loop side, the loop-fixed CMD yarn is entangled only with the MD yarn of the upper yarn layer different from the base fabric CMD yarn on the loop side of the CMD yarn closest to the seam portion of the base fabric. And a loop-fixed CMD yarn that is entangled only with the MD yarn of the lower yarn layer different from the base fabric CMD yarn, and one MD yarn of the upper yarn layer or the lower yarn layer forming the loop is when in contact only with one side CMD yarns making textile edges, in order to the MD yarns are arranged a loop fixed CMD yarns so as to be in contact with CMD yarns on the opposite side of the side surface and the contact side, the base of the loop Only on one side of it is in contact with the CMD yarn closest to the loop of the base fabric D Rutoki, the other side of the loop by contacting the loop fixed CMD yarns, the loop La by MD yarns of the seam portion is fixed to its base by the loop fixed CMD yarns, the loop La becomes perpendicular to the base fabric surface, also its The direction is also aligned with the warp direction of the base fabric, and it is easy to pass the seam yarn S through the seam loop La.
[0024]
If the thickness of the loop-fixed CMD yarn is made thinner than the yarn constituting the base fabric, the amount of web gathered in the portion will increase, and the web will be better entangled in the seam portion. The web is less peeled off.
[Brief description of the drawings]
FIG. 1A is a schematic diagram for explaining a driving yarn direction during weaving of a base fabric.
B is a schematic diagram showing a loop row of a seam portion in a conventional base fabric and a CMD yarn (product weft) along it. B ′ is a longitudinal sectional view taken along a chain line of the B seam portion. B ″ is a schematic diagram showing the inclination of a virtual plane including adjacent loops.
C is a schematic diagram of a second example showing a loop row of seam portions and a CMD yarn (product weft) along the same in a conventional base fabric. C ′ is a longitudinal sectional view taken along a chain line of the B seam portion. C ″ is a schematic diagram showing the inclination of a virtual plane including adjacent loops.
FIG. 2A is a schematic diagram showing a loop row of a seam portion of the first embodiment and a CMD yarn (product weft) along it. A 'is sectional drawing in the dashed line of FIG. 2A.
B is a schematic diagram showing a loop row of the seam portion of the second embodiment and a CMD yarn (product weft) along it. B 'is a cross-sectional view taken along the chain line in FIG. 2B.
C is a schematic diagram showing a loop row of a seam portion of the third embodiment and a CMD yarn (product weft) along it. C ′ is a cross-sectional view taken along the chain line in FIG. 2C.
D is a schematic diagram showing a loop row of a seam portion of the fourth embodiment and a CMD yarn (product weft) along it. D 'is sectional drawing in the dashed line of FIG. 2D.
E is a schematic diagram showing a loop row of a seam portion of the fifth embodiment and a CMD yarn (product weft) along it. E 'is a cross-sectional view taken along the chain line in FIG. 2E.
FIG. 3 is a schematic diagram showing still another embodiment of the present invention, wherein A is a loop row of a seam portion and a CMD yarn (product weft) along the loop row. A 'is a cross-sectional view taken along the chain line in FIG. 3A.
[Explanation of symbols]
A Front side B B Back side Ca, Cb Weft on the loom (MD yarn)
D Base fabrics Ea, Eb Upper yarn layer Fa, Fb Lower yarn layer G Warp yarn on loom (CMD yarn)
La, Lb Loop S Ear thread H Seam 20a, 20b Loop fixing CMD thread

Claims (2)

A loop formed of MD yarn of a base fabric composed of an upper yarn layer and a lower yarn layer forming a seam portion of a front side fabric and a back side fabric of a double woven or multi-woven seam felt is adjacent to the loop. In order to prevent twisting to the other loop side, the loop-fixed CMD yarn is entangled only with the MD yarn of the upper yarn layer different from the base fabric CMD yarn on the loop side of the CMD yarn closest to the seam portion of the base fabric. And a loop-fixed CMD yarn that is entangled only with the MD yarn of the lower yarn layer different from the base fabric CMD yarn, and one MD yarn of the upper yarn layer or the lower yarn layer forming the loop is Opening with seam, characterized in that a loop-fixed CMD yarn is arranged so that the MD yarn is in contact with the CMD yarn on the side surface opposite to the contact side surface when contacting the CMD yarn forming the fabric end only on one side End felt. The open end felt with a seam according to claim 1 , wherein the thickness of the loop-fixed CMD yarn is equal to or thinner than that of the CMD yarn constituting the base fabric .

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