JP3623886B2 - Spherical material transfer atmosphere conversion device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a spherical object transport atmosphere conversion device used when, for example, a spherical object such as spherical single crystal silicon is transported through different atmospheres.
[0002]
[Prior art]
Conventionally, a semiconductor device is usually formed by forming a semiconductor chip by forming a circuit pattern on a silicon wafer and dicing it as necessary. Under such circumstances, a technique for forming a circuit pattern on a spherical semiconductor (Ball Semiconductor) such as single crystal silicon has been proposed in recent years.
[0003]
In order to form discrete elements such as solar cells and optical sensors or semiconductor integrated circuits using this spherical single crystal silicon, the mirror polishing process, cleaning process, thin film forming process, resist coating, photo processing Various processing steps such as a lithography step and an etching step are required. And in order to manufacture this spherical semiconductor element efficiently, it is necessary to connect each process and line it.
[0004]
However, in each process, processing is performed in various atmospheres including not only gases such as active gas and inert gas but also liquids such as water and various solutions. When linking such processing steps, the atmosphere for transporting the workpiece from the previous step must not be brought into the subsequent step, so the atmosphere of the previous step is removed from the workpiece between the steps, and It is necessary to convert the atmosphere to suit the process and transport the workpiece. Moreover, this work requires high speed and high reliability in terms of productivity and quality.
[0005]
Therefore, in the Japanese Patent Application No. Hei 9-162711, the applicant of the present invention is an apparatus that can convey and process a spherical object at a high speed while preventing leakage of the atmosphere between successive processes. A spherical object transport atmosphere conversion device has been proposed in which a spherical object is accommodated in a surface storage chamber and rotated and transported while the atmosphere in the storage chamber is sequentially replaced.
[0006]
[Problems to be solved by the invention]
However, in the atmosphere conversion device having a rotor such as the rotation successor, when the spherical object is introduced into or discharged from the storage chamber of the rotor, the introduction or discharge timing of the spherical object and the rotation of the rotor must be synchronized. It is necessary to check the position of the spherical object with a sensor and control its operation. For this reason, there was a problem that a complicated control mechanism had to be attached.
[0007]
Further, a sealing material provided to completely shut off the atmosphere at the entrance / exit of the storage chamber becomes a source of fine particles.
[0008]
Furthermore, in such a storage chamber, in order to prevent damage to the surface of the spherical object due to friction and efficiently convey it, a purge for floating the spherical object is required, and the shape of the rotor becomes complicated.
[0009]
The problem to be solved in the present invention is that a spherical object transport atmosphere conversion device that prevents the leakage of the atmosphere between successive processing steps while transporting the spherical object at a high speed without requiring a complicated mechanism, in particular, a spherical single unit. An object of the present invention is to provide a spherical object transport atmosphere conversion device capable of performing semiconductor processing such as film formation processing or etching processing of a spherical semiconductor such as crystalline silicon at high speed and with certainty.
[0010]
[Means for Solving the Problems]
A spherical object transfer atmosphere conversion device according to the present invention includes a recovery chamber through which a recovery pipe penetrates, a decompression device that places the recovery chamber inside in a negative pressure state, a delivery chamber through which a delivery pipe penetrates, and a delivery chamber inside A pressurizing device for making a positive pressure state, the recovery pipe and the delivery pipe are connected, and a through hole is formed in a side wall of each pipe.
[0011]
In the present invention, the recovery pipe and the delivery pipe are connected so that the inside of the recovery pipe is in a negative pressure state and the inside of the delivery pipe is in a positive pressure state, so that the atmosphere in the processing of spherical objects such as spherical single crystal silicon can be reduced. The conversion can be performed without requiring a complicated mechanism.
[0012]
As the “atmosphere” in the present invention, not only gases such as active gas and inert gas, but also liquids such as water and various solutions can be applied. In addition, spherical materials of various materials that require treatment in various atmospheres can be applied.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below based on the embodiments of the present invention shown in the accompanying drawings. Example 1
FIG. 1 is a diagram showing a first embodiment of a transport atmosphere conversion apparatus according to the present invention. In the figure, a transfer atmosphere conversion device 1 includes a recovery chamber 2 and a delivery chamber 6, and a space inside the recovery chamber 2 is connected to a recovery pump 4 as a decompression device and a recovery tank cooled to a predetermined temperature via a pipe. The space inside the delivery chamber 6 is connected to a delivery pump 8 as a pressurizing device via a pipe. A recovery pipe 3 made of a porous material is provided in the recovery chamber 2, and the recovery chamber 4 is depressurized by the recovery pump 4 so that the recovery chamber has a negative pressure with respect to the recovery pipe 3. Thus, the gas in the recovery pipe 3 is guided to the recovery tank 5 through the hole of the porous material. Here, as the porous material, a material obtained by a method such as sintering ceramic, resin, or metal powder is used. One end of the recovery pipe 3 is connected to a pre-processing device (not shown) such as a low-pressure CVD device, and a spherical object such as a spherical single crystal silicon having a CVD oxide film formed on the surface is processed in the previous process. On the other hand, the other end of the recovery pipe 3 is connected to a delivery pipe 7 to be described later, and the spherical material is delivered in a state where the atmosphere of monosilane (SiH ₄ ) and N ₂ O gas used in the previous process is removed. Send to pipe 7.
[0014]
In addition, you may make it provide many through-holes in the side wall of the collection | recovery pipe 3 located in the collection | recovery chamber 2 inside. The material of the recovery pipe 3 may be ceramic, resin, metal, or a material obtained by coating the various materials with resin according to a transport atmosphere, for example, an inert gas or water. The number and the diameter of the through holes formed in the side wall of the recovery pipe 3 can be arbitrarily set within a range that does not hinder the smooth conveyance of the spherical object. Further, the recovery pipe 3 can be made of a porous material. In this case, since it is not necessary to separately process a through hole in the side wall of the recovery pipe 3, the manufacturing cost of the recovery pipe 3 can be reduced. Further, the gas or the like in the recovery pipe 3 is guided to the recovery tank 5 through the recovery chamber 2 over a wide area by the differential pressure due to the operation of the recovery pump 4 in the recovery chamber 2, but the entire inner peripheral surface thereof. Since the atmosphere such as gas is removed from the atmosphere, the atmosphere is unlikely to remain in the recovery pipe 3. As the material of the recovery pipe 3, a resin can be used. In this case, a fluororesin is preferable from the viewpoint of heat resistance, chemical resistance, and a surface capable of being sintered.
[0015]
On the other hand, in the same manner as in the case of the recovery chamber 2, the delivery pipe 6 is provided in the delivery chamber 6, and one end of the delivery pipe 7 is connected to the recovery pipe 3 and receives a spherical object from the recovery pipe 3. The other end extends to the outside of the delivery chamber 6 and is connected to a next processing device (not shown). By sending an inert gas by the delivery pump 8, the spherical object is sent to the next process. As the delivery pipe 7, the same form as the recovery pipe 3 disposed in the recovery chamber 2 can be adopted.
[0016]
FIG. 2 shows an example in which a large number of through holes 7a having a small diameter are provided on the side wall of the delivery pipe 7 located in the space inside the delivery chamber 6, and the direction of the through hole 7a is such that a spherical object is the delivery pipe 7. It inclines from the outer peripheral surface of the delivery pipe 7 toward the inner peripheral surface of the pipe toward the direction of flowing through the inside. Although it is necessary to set the number of through-holes 7a, the arrangement location, and the inclination angle so as to ensure smooth conveyance of the spherical object, it is not particularly limited to the shape of the illustrated embodiment.
[0017]
Below, operation | movement of the conveyance atmosphere conversion apparatus 1 is demonstrated.
[0018]
The space inside the collection chamber 2 is brought into a negative pressure state with respect to the space inside the collection pipe by the action of the collection pump 4, and the inside of the collection pipe 3 is passed through a plurality of through holes provided in the side wall of the collection pipe 3 Is also in a negative pressure state. Since the inside of the collection pipe 3 has a negative pressure, the spherical object is sucked from a pretreatment device (not shown) and is carried into the collection chamber 2 without staying.
[0019]
When the spherical object processed in the previous process reaches the position inside the recovery chamber 2, the atmosphere such as gas used in the previous process conveyed along with the spherical object passes through the through hole in the side wall of the recovery pipe 3. Then, the air is sucked from the inside of the recovery pipe 3 into the space inside the recovery chamber 2, and finally recovered to the recovery tank 5 cooled to a predetermined temperature via the pipe. The space inside the collection chamber 2 is preferably controlled at a predetermined temperature in order to efficiently collect the atmosphere.
[0020]
The space inside the delivery chamber 6 is brought into a positive pressure state by the operation of the delivery pump 8, and an inert gas or an atmospheric gas used in the next processing step is introduced into the delivery pipe 7.
[0021]
FIG. 2 shows a form of a through hole 7 a for introducing gas into the delivery pipe 7. Through hole 7a is smaller the diameter, also for spherical object is inclined toward the inner peripheral surface from the outer peripheral surface of the delivery pipe 7 toward a direction of flow through the delivery pipe 7 are bored, delivered Inside the pipe 7, the atmospheric gas used in the next process is jetted toward the inside of the delivery pipe 7 at a high speed. Inside the delivery pipe 7, the portion upstream of the through hole 7a is in a reduced pressure state due to the action of the atmospheric gas flow.
[0022]
Accordingly, the spherical object existing in the recovery pipe 3 in the state where the atmosphere used in the previous process is completed is sucked from the recovery pipe 3 toward the delivery pipe 7 in a state close to evacuation and further penetrated. The air flows smoothly from the hole 7a to the next process.
[0023]
As described above, in the present invention, the atmosphere used in the previous process is sucked and removed from the recovery pipe 3 through the space inside the recovery chamber 2, and the atmosphere used in the next process is transmitted via the delivery chamber 6. Since they are introduced into the delivery pipe 7, these atmospheres do not mix with each other. And in the said process, the flow of spherical object itself can be continuously conveyed without being disturbed, and said atmosphere can be replaced at high speed on the conveyance path.
[0024]
Example 2
As shown in FIG. 3, this embodiment is a transfer atmosphere conversion device example 20 in which a replacement processing mechanism using an inert gas is added to the device of FIG. In FIG. 3, the same members as those shown in FIG. 1 are denoted by the same reference numerals, and description thereof is omitted.
[0025]
In FIG. 3, the inert gas replacement processing mechanism includes an inert gas supply chamber 16 and an inert gas recovery chamber 12 disposed between the recovery chamber 2 and the delivery chamber 6. Here, the recovery pipe and the supply pipe indicated by 13 and 17 are made of a porous material. According to this configuration, the gas used in the previous process can be satisfactorily replaced with the inert gas, and the gas from the previous process can be prevented from remaining in the next process. In addition, this replacement processing apparatus may be formed in multiple stages by forming not only one stage but also a plurality of sets of the inert gas supply chamber 16 and the inert gas recovery chamber 12.
[0026]
Alternatively, a plurality of collection chambers 2 or delivery chambers 6 may be provided in series, and the suction of the atmosphere in the collection chamber 2 or the introduction of the atmosphere in the delivery chamber 6 may be repeated a predetermined number of times. In this way, the atmosphere used in the previous process and the atmosphere used in the next process can be more reliably converted, and spherical single crystal silicon can be delivered at a higher speed.
[0027]
Example 3
In this embodiment, as shown in FIG. 4, in addition to the first embodiment shown in FIG. 1, an intermittent drive mechanism capable of intermittently sending spherical single crystal silicon whose atmosphere has been changed to the next process. It is an example of the conveyance atmosphere conversion apparatus 30 which has arrange | positioned. The same members as those described in FIGS. 1 and 2 are denoted by the same reference numerals, and description thereof is omitted.
[0028]
In FIG. 4, 9a and 9b are a first piezoelectric element and a second piezoelectric element respectively attached to the extended portion of the delivery pipe 7, and 10a and 10b are the first piezoelectric element 9a and the second piezoelectric element, respectively. A first ultrasonic transmitter and a second ultrasonic transmitter respectively attached to the piezoelectric element 9b.
[0029]
FIGS. 5A to 5C are diagrams for explaining the operation of the transport atmosphere conversion device 30. FIG. When the second ultrasonic transmitter 10b shown in FIG. 4 is actuated to vibrate the second piezoelectric element 9b, pressure is applied to the delivery pipe 7, and as shown in FIG. The diameter is reduced and the spherical object S stops at the position of the second piezoelectric element 9b. Next, as shown in FIG. 5B, the first ultrasonic transmitter 10a is operated to vibrate the first piezoelectric element 9a, and the pressure of the delivery pipe 7 is reduced by applying pressure in the same manner. Here, a force F toward the downstream side of the delivery pipe 7 acts on the spherical object S. Then, when the operation of the second ultrasonic transmitter 10b is stopped and the delivery pipe 7 is opened from the pressure applied by the second piezoelectric element 9b, the spherical object S has an atmosphere flow from the delivery chamber 6 shown in FIG. By the action of the force F, the inside of the delivery pipe 7 is sent out for the next process as shown in FIG. Thereby, it becomes possible to send the spherical object S to the next process at a constant interval, and the interval can be arbitrarily set by setting the operation intervals of the first and second ultrasonic transmitters 10a and 10b. It can be easily adjusted.
[0030]
The material of the delivery pipe 7 in this embodiment is not particularly limited as long as it has a rigidity that can be deformed by the action of the first and second piezoelectric elements 9a and 9b.
[0031]
Alternatively, the first and second piezoelectric elements 9a and 9b may be embedded in the inner peripheral surface of the delivery pipe 7 so that these piezoelectric elements are in direct contact with the spherical object S. By doing in this way, a spherical thing can be stopped and sent out reliably without going through the delivery pipe 7. In this case, in order to protect the piezoelectric element from the atmosphere in the delivery pipe 7, it is preferable to cover the piezoelectric element with a deformable material such as a fluororesin.
[0032]
Example 4
This embodiment shows an example in which the delivery pipe 7 arranged in the delivery chamber 6 can be rotated at high speed in the transfer atmosphere conversion apparatus shown in FIG. The delivery pipe 27 that can be rotated at a high speed shown in FIG. 6 can be rotated at a high speed via a rotary drive device and a rotary joint 18 (not shown). As a result, the inert gas ejected from the through hole 27 a provided in the delivery pipe 27 forms a swirling flow inside the delivery pipe 27, and the spherical single crystal silicon is not in contact with the inner wall of the delivery pipe 27, and the next step. Is sent to. In this example, it is also possible to intermittently send spherical single crystal silicon by intermittently supplying gas to the delivery pipe 27.
[0033]
【The invention's effect】
The present invention has the following effects.
[0034]
(1) The processed spherical object can be smoothly conveyed not only simply but also at a predetermined interval, and the object to be processed such as spherical single crystal silicon is guided to a desired temperature at high speed. This makes it easy to perform processing such as annealing at a high temperature.
[0035]
(2) The atmosphere conversion in the process of processing spherical objects such as spherical single crystal silicon can be easily performed without requiring a complicated mechanism and control.
[0036]
(3) The maintenance of the positive and negative pressure states for conveying the processed spherical object can be easily and inexpensively realized.
[0037]
(4) It is possible to perform uniform film formation or etching process efficiently with a small amount of gas on a spherical object to be processed such as spherical single crystal silicon in the supply pipe.
(5) The surface of an object to be processed such as spherical single crystal silicon can be processed in multiple stages to form a plurality of films having different compositions.
[0038]
(6) Workability is extremely good, and spherical objects can be easily processed.
[0039]
(7) It is also possible to easily form a so-called superlattice structure in which a plurality of very thin thin films of about one atomic layer, so-called ultrathin films, are stacked.
[0040]
(8) The spherical object can be conveyed in a non-contact state, and the surface of the processed spherical object can be prevented from being damaged.
[Brief description of the drawings]
FIG. 1 is a sectional view showing a first embodiment of a transport atmosphere conversion apparatus according to the present invention.
FIG. 2 shows a state of a through hole provided in a side wall of a delivery pipe 7 arranged in a space inside the delivery chamber.
FIG. 3 shows a second embodiment of the transfer atmosphere conversion apparatus of the present invention to which a replacement processing mechanism using an inert gas is added.
FIG. 4 shows an example of a transfer atmosphere conversion device provided with an intermittent drive mechanism capable of intermittently sending spherical single crystal silicon having undergone atmosphere conversion to the next process.
5 shows an operating state of the transport atmosphere conversion device provided with the intermittent drive mechanism shown in FIG.
FIG. 6 shows an example of a delivery pipe capable of high-speed rotation.
[Explanation of symbols]
1, 20, 30 Transfer atmosphere conversion device 2 Collection chamber 3 Collection pipe 4 Collection pump 5 Collection tank 6 Delivery chamber 7, 27 Delivery pipe 7a, 27a Through hole 8 Delivery pump 9a First piezoelectric element 9b Second piezoelectric element 10a First ultrasonic transmitter 10b Second ultrasonic transmitter 12 Inert gas recovery chamber 13 Recovery pipe 16 Inert gas supply chamber 17 Supply pipe 18 Rotating joint S Sphere F Force toward downstream

Claims (15)

A recovery chamber having a recovery pipe penetrated, a decompression device for bringing the inside of the recovery chamber into a negative pressure state, a delivery chamber having a delivery pipe penetrated therein, and a pressurizing device for bringing the inside of the delivery chamber into a positive pressure state. And
An apparatus for converting the atmosphere of spherical objects, wherein the recovery pipe and the delivery pipe are connected, and through holes are formed in the side walls of the pipes. 2. The spherical object conveying atmosphere conversion device according to claim 1, wherein the recovery pipe is made of a porous material. 2. The spherical object according to claim 1, wherein the through hole formed in the side wall of the delivery pipe is inclined from the outer peripheral surface to the inner peripheral surface of the delivery pipe in a flow-down direction of the workpiece. Transport atmosphere conversion device. 2. The spherical object carrying atmosphere conversion device according to claim 1, wherein the delivery pipe is provided with a plurality of piezoelectric elements at intervals, and the inside diameter of the delivery pipe is locally reduced. The plurality of piezoelectric elements have a distance such that the first piezoelectric element located on the downstream side and the second piezoelectric element located on the upstream side substantially correspond to the outer diameter of the workpiece along the delivery pipe. Spaced apart,
The first piezoelectric element than the second piezoelectric element is configured to operate slightly above, reduced by the first reducing radius portion and a second piezoelectric element thus has a reduced diameter to the first piezoelectric element After the workpiece is momentarily held between the second reduced diameter portion, the first reduced diameter portion returns to the original state and is instantaneously formed by the second reduced diameter portion. 5. The spherical object conveying atmosphere conversion device according to claim 4, wherein the spherical material conveying atmosphere conversion device is sent by a force directed toward the downstream side. 2. The apparatus for converting a spherical object atmosphere according to claim 1, comprising a plurality of recovery chambers or delivery chambers. Between the recovery chamber and the delivery chamber, at least one set of gas supply chamber and gas recovery chamber is disposed,
The gas supply chamber includes a gas supply pipe connected to the recovery pipe, a gas supply chamber main body through which the gas supply pipe is provided, and a supply device for supplying gas into the gas supply chamber main body to bring it into a positive pressure state.
The gas recovery chamber includes a gas recovery pipe connected to the gas supply pipe, a gas recovery chamber main body through which the gas recovery pipe is penetrated, and a decompression device that places the gas recovery chamber main body in a negative pressure state.
and,
7. The spherical object transfer atmosphere conversion device according to claim 1, wherein the gas recovery pipe is connected to the delivery pipe. 8. The spherical object carrying atmosphere conversion device according to claim 1, wherein the carrying atmosphere gas is an inert gas. 8. The spherical object transfer according to claim 7 , wherein the transfer atmosphere gas is an inert gas, and the inert gas supplied to the gas supply chamber is controlled to a desired temperature. Atmosphere conversion device. The carrier atmosphere gas is a reactive gas, the reactive gas supplied to the gas supply chamber is controlled to a desired temperature, and the gas supply chamber constitutes a reaction chamber for film formation or etching. conveying atmosphere converter of spheroids according to 請 Motomeko 7 that. There are two or more gas supply chambers and gas recovery chambers arranged between the recovery chamber and the delivery chamber,
8. The spherical object transport atmosphere conversion device according to claim 7, wherein the gas supplied to each gas supply chamber is controlled to a different temperature. The sphere is a spherical single crystal silicon,
The gas supply chamber comprises a first gas supply chamber located on the upstream side and a second gas supply chamber located on the downstream side,
The first gas supply chamber is a nitriding chamber that performs nitrogen annealing,
The spherical gas transport atmosphere conversion device according to claim 11, wherein the second gas supply chamber is a temperature adjustment chamber using a gas at room temperature. There are two or more gas supply chambers and gas recovery chambers arranged between the recovery chamber and the delivery chamber,
8. The spherical object transport atmosphere conversion device according to claim 7, wherein gas having different composition is supplied to each gas supply chamber. The sphere is single crystal silicon,
The gas supply chamber comprises a first gas supply chamber located on the upstream side and a second gas supply chamber located on the downstream side,
The first gas supply chamber is a first film formation chamber for supplying a first reactive gas having a controlled temperature to form a first film,
The spherical shape according to claim 13, wherein the second gas supply chamber is a second film formation chamber that supplies a second reactive gas having a controlled temperature to form a second film. Conveyor atmosphere conversion device. 2. The spherical object transfer according to claim 1, further comprising a rotating means for rotating the delivery pipe at a high speed with respect to the delivery chamber, wherein the gas supplied into the delivery pipe forms a swirling flow. Atmosphere conversion device.

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