JP3527731B2 - LCD panel - Google Patents

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transmission type, a reflection type,
Or to a liquid crystal display panel that can be used as a combined type
It is about. 2. Description of the Related Art Liquid crystal display panels are thin and have low power consumption.
Taking advantage of this feature, word processors and par
OA equipment such as Sonal Computer and electronic organizer
Portable information equipment or camera with LCD monitor
Widely used for integrated VTRs and the like. A liquid crystal mounted on the liquid crystal display panel
The display panel is a CRT (CRT) or EL (electro
Luminescence) Unlike the display, it does not emit light
Therefore, a lighting device consisting of a fluorescent tube called a backlight
Installed on the back or side of it to transmit backlight light
So-called transparent display of an image by controlling the amount by a liquid crystal display panel.
Oversized liquid crystal display panels are often used. However, in a transmission type liquid crystal display panel,
Is usually the backlight of the total power consumption of the LCD panel
A backlight should be provided to account for more than 50% of this.
This increases power consumption. The transmission type liquid crystal display panel is a reflection type liquid crystal.
Contrary to the display panel, if the ambient light is very bright,
The display light appears darker than the surrounding light, and the display can be recognized.
It was difficult. [0006] Therefore, different from the above-mentioned transmissive liquid crystal display panel,
Portable information devices that are often used outdoors or constantly
A reflector is installed on one substrate instead of the backlight
Display by reflecting ambient light on the surface of the reflector.
A reflection type liquid crystal display panel is used. However, the reflected light of ambient light is used.
Reflective LCD panel provides visibility in low light conditions
Has a drawback that it is extremely reduced. Further, in such a reflection type liquid crystal display panel,
Displays using ambient light for low power consumption.
Ambient light even in an environment where sufficient power can be supplied.
If it is darker than a certain limit, the display can be recognized.
Will not be able to. This is the maximum of the reflective LCD panel.
Was a drawback. Further, in the manufacture thereof, the reflection characteristic of the reflection electrode is used.
Variations in ambient light use result in variations in ambient light use efficiency
Therefore, the ambient light intensity at which the display cannot be
It will vary between panels. Therefore, during manufacturing
Is the variation in aperture ratio in conventional transmissive LCD panels
Unless the dispersion of the reflection characteristics is controlled more than
Can't get a liquid crystal display panel with display characteristics
Was. The reflection type liquid crystal display panel and the transparent
In order to solve the problem of the oversized liquid crystal display panel,
Is disclosed in Japanese Unexamined Patent Publication No. 7-333598.
Part of the backlight light and part of the ambient light
By using a semi-transmissive reflective film that reflects
Both transmissive display and reflective display can be
A configuration realized by a channel is disclosed. FIG. 16 shows a liquid crystal display using the transflective film.
FIG. The liquid crystal display panel includes a polarizing plate 30, a retardation plate
31, transparent substrate 32, black mask 33, counter electrode 3
4, alignment film 35, liquid crystal layer 36, MIM 37, pixel electrode 3
8, a light source 39, and a reflection film 40. The pixel electrode 38 which is a transflective film is made of metal.
Either deposit the particles very thinly on one surface within the pixel, or
It is formed so that minute hole defects, dent defects, etc.
The light from the light source 39 is transmitted through the pixel electrode 38.
As well as external light such as natural light or indoor illumination light.
Transparent display function and reflection by reflecting at pole 38
The type display function can be realized at the same time. [0014] However, FIG.
The following problems occur in the display device shown in FIG. First, metal particles are used as the above-mentioned transflective film.
When a very thin layer is used, the absorption coefficient is large.
Large internal absorption of incident light
And there is absorbed or scattered light that is not used for display.
The light use efficiency is poor (for example, 55
% Light is not used for display)
Was. On the other hand, a minute hole is formed in the plane as the pixel electrode 38.
Defects, dent defects, etc. (hereinafter referred to as openings) are scattered
When a film is used, the structure of the film is too complicated,
Control of film quality is difficult due to precise design conditions
And it is difficult to produce a film with uniform characteristics.
Had the problem of In other words, electrical characteristics and optical
Poor reproducibility of characteristics, improving display quality as a liquid crystal display panel
It was extremely difficult to control. The present invention has been made to solve the above problems.
The transmission type display and the reflection type display are performed simultaneously.
Liquid crystal display panel is more peripheral than the conventional liquid crystal display panel.
Improved use efficiency of ambient light and illumination light (backlight light)
Liquid crystal display that stabilizes quality and simplifies manufacturing
It is intended to provide a display panel. A liquid crystal display panel according to the present invention.
Means a plurality of gate wirings on a substrate,
Surrounded by multiple source traces arranged to
A plurality of pixels, and the gate arrangement is provided in the pixels.
Switch provided near the intersection of a line and the source line
Element and a pixel electrode connected to the switching element
Are formed, and transmissive display and reflective display are performed simultaneously.
In the liquid crystal display panel, the pixel electrodes are
Electrically connected first conductive layer with high light transmission efficiency and light
Having a second conductive layer with high reflection efficiency in the same pixel area
Which solves the above problems.
Is done. The first conductive layer and the second conductive layer are mutually
It is preferable that they are provided on another layer via an insulating layer.
No. The first conductive layer and the second conductive layer are
It is even more preferable that they are connected through three conductive layers.
No. Preferably, the first conductive layer and the second conductive layer
The conductive layer or the third conductive layer, the gate wiring or
From the same material as some of the materials that make up the source wiring
Become. More preferably, of the insulating layers,
The surface corresponding to the second conductive layer has a plurality of irregularities.
You. Hereinafter, the operation of the above configuration will be described. According to the present invention, the pixel electrodes are electrically connected to each other.
Connected first conductive layer with high light transmission efficiency and light reflection
A highly efficient second conductive layer in the same pixel area.
Therefore, a liquid crystal display panel using a conventional half mirror
In comparison, ambient light and illumination light can be used without loss,
Light use efficiency can be remarkably improved. First
As the conductive layer, for example, ITO or Sn which is a transparent conductive film is used.
O _Two Al, W, Cr and the like as the second conductive layer
Alloy, etc., all of which are common reflective liquid crystal display panels and transmissive
The materials used for liquid crystal display panels can be used.
Easy to manufacture, very low display characteristics and reliability
A fixed liquid crystal display panel can be realized. The conventional transmission type liquid crystal display panel has
Visibility due to surface reflection in bright ambient light environment
And the conventional reflective LCD panel
Had lower panel brightness in dark environment
The problem of more difficult display observation, but both at the same time
Can be eliminated and has the advantages of both features.
It was a thing that was. That is, the liquid crystal display panel of the present invention
Is a conventional transmissive liquid crystal in an environment where sufficient power can be supplied.
Since the backlight light is used like the display panel,
The display can be recognized regardless of the intensity of the surrounding light.
Variation in ambient light utilization efficiency due to variations in reflection characteristics
It is not necessary to control as precisely as the reflective LCD panel.
No. In use, the first in the same pixel
A region having a high light transmission efficiency having a conductive layer and a second conductive layer
Region with high light reflection efficiency contributes complementarily to display
Therefore, the image is clearly displayed regardless of the brightness of the ambient light.
Is shown. Further, the liquid crystal display panel of the present invention is
Viewfinder of digital camera and video camera of re-drive system
When adopted as a viewfinder (monitor screen),
No matter how bright the ambient light is, the brightness of the backlight
By adjusting the degree, the brightness is always kept easy to observe.
I was able to In particular, when the camera is used outdoors in fine weather,
In the conventional transmissive liquid crystal display, the brightness of the backlight
Even if the height is increased, the display becomes faint and difficult to see. This
Turn off the backlight and turn on the display for reflection.
Is a transmissive display and a reflective
By using the display together, the image quality in observation is improved and power consumption is reduced.
Expenses can be reduced. On the other hand, bright sunlight
Depending on the direction of the subject,
Switching between reflective display and transmissive display, or
These can be used together to make the display easier to see.
Wear. If the sun shines on the monitor screen,
It may be used in the same way as when used outside. Also the room
Backlight when shooting subjects from dim corners of
May be used in combination with the transmissive display. Further, the liquid crystal display panel of the present invention is
Used as a monitor screen for in-vehicle use such as navigation
Always observe, no matter how bright the ambient light is
It is possible to perform a display that is easy to perform. Conventional transmission type
In-vehicle monitors using liquid crystal display devices are
Backlight with higher brightness than the backlight used for
Is used. The reason is that the weather
This is to cope with the case where light enters the screen. However
However, the display is still faint and difficult to see
Sometimes. On the other hand, drive in the tunnel at night or suddenly
If the backlight is the same as in the daytime or outside the tunnel,
There is a problem that it is too bright to see if the brightness remains
I was Even in such a case, the liquid crystal display panel of the present invention
According to, it is always possible to use the reflective display together
This allows you to set a bright environment without setting the backlight brightness high.
Good display can be realized under the environment. Also, a dark environment
A little brightness even underneath (about 50-100 cd / m ^Two )
Easy to see display can be realized just by turning on
You. Further, the first conductive layer constituting the pixel electrode
The second conductive layer and the second conductive layer are provided on another layer through an insulating layer.
If insulated in the area of the first and second conductive layers
Control the thickness of the liquid crystal layer by changing the layer thickness
Can be This allows the optical
Characteristics can be matched. On the other hand, in the manufacturing process
Even with two layers having different electrode potentials through the insulating layer
Each exists. Therefore, the pattern of the pixel electrode
The developing solution at the time of etching and the stripping solution at the time of removing the resist
, Which does not cause an electrolytic corrosion reaction.
A crystal display panel can be obtained. For example, without interposing an insulating layer as in the present invention,
Two layers of pixel electrodes (for example, ITO for lower layer and Al for upper layer)
When forming continuously, electrode potential difference between Al layer and ITO layer
Is extremely large, and many defects (fine openings)
Part) is present, the patterning of the pixel electrode
Electrodeposition using a developing solution or a stripping solution at the time of resist stripping as an electrolyte
A reaction occurs and the elution of the ITO layer proceeds, causing pixel defects and wiring.
Disconnection and contamination of the liquid crystal layer. In contrast,
By forming an insulating layer in between as shown,
The layer serves as a protective film to prevent the intrusion of liquid that may cause an electrolytic corrosion reaction.
Can be prevented. Further, two layers constituting the pixel electrode generate electrolytic corrosion.
Even if the relationship is easy to produce, relax the nature of both
If it is connected via a third conductive layer such as
To suppress poor contact and decrease in reliability due to electrolytic corrosion reaction
Becomes possible. Further, any one of the first, second and third conductive layers
Is the same as some of the material of the gate wiring or source wiring.
If so, the manufacturing process can be simplified. The surface on which the second conductive layer is formed has multiple surfaces.
Because it has a number of irregularities, it only reflects ambient light
And can be scattered outside to obtain a wide viewing angle
By using the paper white without using a separate scattering plate
Can be displayed. In manufacturing the liquid crystal display panel of the present invention,
Is like a liquid crystal display panel using a conventional half mirror.
Complicated manufacturing conditions are not required and conventional transmissive liquid crystal displays
General electrode materials used for panels and reflective liquid crystal display panels
Materials, wiring materials and manufacturing conditions can be used.
It can be easily manufactured and has good reproducibility. Ma
In addition, the first conductive layer and the second conductive layer are likely to cause electrolytic corrosion.
The insulating layer or the third conductive layer
Contact between them and the electrolyte
Can be manufactured without any. Therefore, anti-corrosion
Liquid crystal display panel with high reliability
Can be provided efficiently. In addition, the contact between the first conductive layer and the second conductive layer
Removing a portion of the insulating layer corresponding to the connection region;
Removing a part of the insulating layer present on the conductive layer of
If done simultaneously, high reliability without increasing the number of processes
The liquid crystal display panel having the above can be obtained. (Embodiment 1) Embodiment of the present invention
The liquid crystal display panel 1 is described below with reference to the drawings.
Do. FIG. 1 shows a liquid crystal display panel according to this embodiment.
FIG. 2 is a partial plan view of the active matrix substrate shown in FIG.
FIG. 2 is a sectional view taken along line AA of FIG. In FIG. 1, glass or plastic
On a transparent insulating substrate 1 (not shown) made of
Gate wiring 3 and a plurality of source wirings 9a are orthogonal to each other.
And a TFT 7 is provided near the intersection of the wires.
Have been. The drain electrode 9c of the TFT 7 has a pixel electrode
The reflection electrode 11 and the transmission electrode 8a are connected.
Observe the area where these pixel electrodes are formed from above the substrate
Then, the region A with high light transmission efficiency and the region with high light reflection efficiency
B consists of two regions. Although not shown, the active manager shown in FIG.
An alignment film having a liquid crystal alignment function is provided on the surface of the trix substrate.
Is provided. The liquid crystal according to this embodiment and the following embodiments
The display panel is an active matrix substrate as described above.
Is bonded to a counter substrate having a transparent electrode and an alignment film.
The liquid crystal is sealed between the substrates. still,
Separate color filters, retarders, polarizers, etc. as necessary
It may be provided halfway. In this embodiment, the area A is located at the center of the picture element.
The cross-sectional structure is high in light transmission efficiency
The material is laminated and the drain electrode 9 of the TFT 7 is formed.
c as a pixel electrode.
You. On the other hand, the area B is shaped so as to surround the area A.
And the upper surface thereof is in contact with the drain electrode 9c of the TFT 7.
Al or Al-based alloy with high light reflection efficiency
Reflective electrode 11 is provided as a pixel electrode. This
Region B can efficiently reflect the incident light to the outside.
Wear. Further, the reflective electrode 11 is further smooth on its surface.
Scatters incident light to an appropriate range
The structure is such that it can be disturbed. As the liquid crystal, a black pigment-mixed layer was used.
Sthost liquid crystal ZLI2327 (manufactured by Merck)
Active substance S-811 (manufactured by Merck) was mixed at 0.5%.
Was used. In FIG. 2, the TFT 7 has a gate wiring
3 (shown in FIG. 1), above the gate electrode 2 branching from
Gate insulating film 4, semiconductor layer 5, semiconductor contact layer 6
a, 6b, the source electrode 9b and the drain electrode 9c
It is laminated. The drain electrode 9c of the TFT 7 has a transmission electrode
8a is connected, and the transmission electrode 8a is connected to the pixel electrode.
Has a role. The portion corresponding to the area B is transmitted.
An interlayer insulating film 10 and a reflective electrode 11 are provided above the electrode 8a.
The reflective electrode 11 is formed on the interlayer insulating film 10.
Lower transmission electrode through the formed contact hole 13
8a, and is electrically connected to the liquid crystal like the transmission electrode 8a.
And a pixel electrode for applying a voltage to the pixel electrode. This and
In this case, the transmission electrode 8a and the reflection electrode 11 are not directly connected,
The conductive metal layer 12 is interposed between them to provide electrical connection.
I have continued. In the process of manufacturing this, reflection
When the pattern of the electrode 11 is formed, the insulating layer 1 is formed on the transmission electrode 8a.
0 (see below for details)
Akira), ITO and Al cause an electrolytic corrosion reaction, and the wiring is disconnected.
This can effectively prevent such troubles as occurring. Ma
In addition, the insulating layer 10 is left thin to some extent on the transmission electrode 8a,
By completely covering the transmission electrode 8a, even after manufacturing,
It is possible to prevent an electrolytic corrosion reaction between ITO and Al.
You. In this embodiment, the metal layer 12 is
Ti is used, but not limited to this
If the material is Cr, Mo, Ta, W, etc.
Similar effects can be obtained. Alternatively, metal layer 1
2 instead of forming the reflective electrode 11
Electrode potential, such as W, Ni, Pd, V, Zr, etc.
Use of Al-based alloy material to which high metallic material is added
Also suppresses the electrolytic corrosion reaction between ITO and Al
It is possible to do. For example, W is added to Al at 5.0 at.
% More effective in the above-mentioned electrolytic corrosion reaction
Can be deterred. Hereinafter, the active matrix of this embodiment will be described.
A method for manufacturing a substrate will be described with reference to FIG. First, as shown in FIG.
A conductive thin film is formed on the plate 1 and a photolithography technique is used.
The gate electrode is patterned into the desired shape using
2. Form a gate wiring (not shown). In this embodiment
Means that the insulating substrate 1 is made of glass, the gate electrode 2 and the gate electrode.
As a material of the gate wiring 3 (hereinafter, referred to as a gate material)
Ta was used. However, the insulating substrate 1 is not made of glass.
Alternatively, a material such as plastic may be used. Also,
Al, Cr, Mo, W, Cu, Ti
Other materials having conductivity such as the above may be used. Next, as shown in FIG.
The edge film 4, the semiconductor layer 5, and the semiconductor contact layers 6a and 6b
Form a film. In this embodiment, the gate insulating film 4 is made of SiN.
x, a-Si as semiconductor layer 5, semiconductor contact layer 6
CVD of n + type a-Si doped with P as a and 6b
A continuous film was formed by the method. And, using photolithography technology
Is patterned into a predetermined shape by using the semiconductor layer 5 and
The semiconductor contact layers 6a and 6b are formed. Next, a conductive film is formed and photolithography is performed.
Patterning into a predetermined shape using technology, source wiring
9a, a source electrode 9b, and a drain electrode 9c are formed.
In this embodiment, a Cr-based material is used as the conductive film. However
As this material, Al, Mo, Ta, W, Cu, Ti, etc.
Other materials having conductivity may be used. Next, as shown in FIG.
A conductive film with
Then, a transmission electrode 8a is formed. In this embodiment, this transmission
ITO was used as the electrode 8a. Next, a metal film is formed and photolithography is performed.
The metal layer 12 is formed using a technique. This metal layer 12
Is a reflective electrode formed in the subsequent step with the transmissive electrode 8a.
In this embodiment, the connection is made through both when connecting to
Used Ti as a material. However, materials other than Al-based
Then, other materials such as Cr, Mo, Ta, and W may be used.
No. Next, the source electrode 9b and the drain electrode 9c are
Etching the semiconductor contact layer as a mask
Source side 6a and drain side 6b as body contact layers
Thus, the TFT 7 is formed. At this time, the source and drain electrode layers 9a, 9
b and 9c may be formed in the upper layer of the transmission electrode 8a.
I don't know. Next, as shown in FIG.
The film 10 is formed, and is later formed using photolithography technology.
Portion to be contact hole 13, transmission area (area A), etc.
The part is removed from the interlayer insulating film 10. At the same time,
Region B, that is, interlayer insulation of a portion where the reflective electrode 11 is formed
A gentle uneven portion 15 is formed on the edge film 10. The portion of the interlayer insulating film 1 corresponding to the region A
By removing 0, the transmittance of the region A is improved.
be able to. However, as in this embodiment,
May not be present, may be left to some extent, or
It does not have to be removed. For example, remove
By controlling the film thickness, the voltage applied to the liquid crystal can be controlled in the region A.
And the region B can be made equal to each other. Sandals
That is, the alignment state of the liquid crystal can be made substantially uniform within the pixel. The connection of the wiring provided at the end of the substrate is
If an insulating layer is also formed on the connection terminal,
The layer may be removed at the same time as this step. That is, saw
IC driver in the wiring terminal part and gate wiring terminal part
The connection electrode for connecting with etc. is formed of ITO
In many cases, an Al electrode is formed directly on this connection electrode.
The same electrolytic corrosion reaction as in the pixel area may occur.
You. Therefore, providing an insulating layer between ITO and Al
Solves the problem, but finally the insulating layer on the connection electrode
Since this must be removed, this removal must be
If performed simultaneously with the step of removing the interlayer insulating film 10 on A
It is suitable without increasing the number of steps. In the present embodiment, the shape of the uneven portion 15 is
When observed from above (shown in FIGS. 1 and 3)
Its cross section has a smooth shape that changes continuously.
You. As described above, the interlayer insulating film having the irregularities 15 on the surface
The reflective electrode 11 formed in the next step is provided on
Incident light is efficiently reflected on the surface of the reflective electrode 11.
And scatter the reflected light in an appropriate direction
Can be. In addition, the shape of the uneven portion 15 to be formed is desired.
It may be determined appropriately according to the display characteristics, or the reflected light
When it is not necessary to scatter the
It does not have to be done. In this embodiment, the interlayer insulating film 10 is used.
Single layer (about 2.5μm) of organic resin was used
It is not specified, but a laminated film composed of different materials
It does not matter. However, as in this embodiment,
When the interlayer insulating film 10 made of resin is formed relatively thick,
A part of the reflective electrode 11 is also superimposed on the TFT 7
No parasitic capacitance is generated, and display quality is good.
The liquid crystal display panel has a high aperture ratio. Also like this
If the organic resin layer is very thick, the formation of the uneven portions 15 is also performed.
Easy. Alternatively, instead of this interlayer insulating film, Si
Using a general inorganic film such as Nx as an insulating layer
No problem. However, generally high insulation even if relatively thin
Can be obtained instead of the uneven shape by etching
Configuration is likely to be difficult. However, the desired liquid crystal display
When it is not necessary to form uneven parts due to the display characteristics of the
In this case, it is preferable. Subsequently, as shown in FIG.
Deposited, equivalent to area B by photolithography technology
The reflective electrode 11 is formed by patterning the portion to be formed.
The reflection electrode 11 is provided with a contact hole 13 and a metal layer 1.
2, the lower transmission electrode 8a and the drain electrode of the TFT7.
It is electrically connected to the pole 9c. In this embodiment, the reflective electrode
Al was used as 11 but is not limited to this.
It may be an alloy material or a conductive material with high light reflectance.
I don't know. By the above steps, the active matrix
The board is completed. Although not shown, the active
An alignment film is formed on the surface of
An electrode and an opposing substrate provided with an alignment film are bonded together, and the substrate is
The liquid crystal display panel of this embodiment is filled with liquid crystal between them.
The flannel is completed. If necessary, color filter and phase difference
A plate or the like may be separately provided. As a liquid crystal, a gel mixed with a black dye was used.
Sthost liquid crystal ZLI2327 (manufactured by Merck)
Active substance S-811 (manufactured by Merck) was mixed at 0.5%.
Was used. In this embodiment, the planes of the area A and the area B
Good display characteristics by setting the product ratio to 40:60
Was obtained. In addition, area
The ratio is not limited to this value.
Appropriately changed according to over-efficiency or reflection efficiency and purpose of use
May be. In the present embodiment, the area A is located at the center of the picture element.
Is provided only in one place, but is not limited to this.
It may be divided into several places, and its shape is also square
Not limited to shape. The liquid crystal display panel of the present embodiment described above
In the liquid crystal display panel of the embodiment described below,
Region A having high light transmission efficiency is located at the center of the pixel as pole 6.
In addition to this, a region B having high light reflection efficiency is provided,
Compared to a conventional liquid crystal display panel using a half mirror,
Surrounding light and illumination light can be used without loss. Ma
The liquid crystal display panel is the same as the conventional transmissive liquid crystal display panel.
And low visibility due to surface reflection in bright ambient light
And the conventional reflective LCD panel
Display in low ambient light environment due to reduced panel brightness
To solve both the difficulties of understanding
And an excellent one with all the features
became. In other words, the liquid crystal display panel of the present invention
Regardless of the intensity, display recognition becomes possible,
Reflects variations in ambient light usage efficiency due to variations in lightness
It is not necessary to control as precisely as the liquid crystal display panel. Further, the manufacture of the liquid crystal display panel of the present embodiment
As for the method, the liquid crystal display using the conventional half mirror
It does not require complicated manufacturing conditions like panels, and
One type used for oversized LCD panels and reflective LCD panels
If general electrode materials, wiring materials and manufacturing conditions are used,
Good, relatively easy to manufacture and reproduce
The properties are also good. In addition, liquid using a conventional half mirror
Control of display characteristics, etc., which was difficult with
It can be done relatively easily. (Embodiment 2) The liquid crystal of Embodiment 2 of the present invention
The display panel will be described below with reference to the drawings. FIG. 4 shows a liquid crystal display panel according to this embodiment.
FIG. 5 is a partial plan view of the active matrix substrate shown in FIG.
FIG. 6 is a sectional view taken along line BB of FIG. 4. The liquid crystal display panel of the present embodiment and its manufacture
The method uses the reflection electrode 11 as a pixel electrode and the TFT 7.
The electrical connection structure and the manufacturing method related to the configuration are described above.
This is different from the first embodiment. 4 and 5, the drain voltage of the TFT 7 is
The transmission electrode 8a is connected to the pole.
a is a pixel electrode for applying a voltage to the liquid crystal in the region A;
Function. A transmission electrode 8 is provided in a portion corresponding to the region B.
a, an interlayer insulating film 10 and a reflective electrode 11 are provided on
The reflection electrode 11 is formed on the interlayer insulating film 10.
The lower drain electrode 9 through the contact hole 13
c, and directly connected to the pixel electrode in the same manner as the transmission electrode 8a.
Function as Also in the present embodiment, the first embodiment
Similarly to the above, ITO which is the material of the transmission electrode 8a and the reflection electrode
No direct connection with Al which is the material No. 11
In the region B, high ambient light reflection by Al
Efficiency, backlight light by ITO in the other area A
TFT and these materials with high transmission efficiency
Electrical connection without any fear of electrolytic corrosion
It becomes possible. In this embodiment, the electrolytic corrosion of ITO and Al
Although described with respect to the reaction, the present invention relates to this combination.
It does not mean that it only applies to
Easy combination of different materials with different electrode potentials
It is effective if used for squatting. The active matrix of this embodiment will be described below.
A method for manufacturing a substrate will be described. Semiconductor layer 5 of TFT 7 and semiconductor contact
Up to the point where one island of layers 6a and 6b is patterned
This is the same as the first embodiment. Next, a conductive film is formed, and photolithography is performed.
Source wiring by patterning it into the desired shape using technology
9a, source electrode 9b, drain electrode 9c, connection metal
The layer 9d is formed. In the present embodiment, a Cr-based conductive film is used.
Materials were used. However, as this material, Al, Mo, T
Other conductive materials such as a, W, Cu, and Ti may be used.
I don't know. Subsequently, the same transmission electrode as in the first embodiment is used.
8a is formed. At this time, the transmission electrode 8a is connected to a connecting metal.
It was structured to partially overlap the upper part of the layer 9d. Not this structure
In both cases, a part of the connection metal layer 9d is formed on a part of the transmission electrode 8a.
The parts may be overlapped. In this embodiment, the transmission electrode 8a is
Then, ITO was used. At this time, the source wiring 9a and the source electrode 9
b, the drain electrode 9c, and the connection metal layer 9d
It may be formed in the upper layer of 8a. Next, the layers are formed in the same manner as in the first embodiment.
An insulating film 10 is formed, and a contact hole 13
After opening the interlayer insulating film 10 in the region (region A),
The reflection electrode 11 is formed. Also in the present embodiment, the reflection electrode 11
Al was used as a material for. As described above, in the present embodiment,
Is also used as the reflection electrode 11 and the transmission electrode 8a as ITO.
Is not directly connected to the
The occurrence of defects due to electrolytic corrosion between Al and ITO
Can be. This connection metal layer serves as the source electrode of the TFT.
It can be made of materials, simplifying its manufacture.
Can be (Embodiment 3) In the present embodiment,
Drawing about another manufacturing method of the liquid crystal display panel of form 2
An explanation will be given based on. FIGS. 6A to 6C show the liquid crystal of this embodiment.
FIG. 9 is a cross-sectional view for explaining the method for manufacturing the display panel.
5 corresponds to the BB section in FIG. The description is omitted.
However, in the present embodiment, the process before forming the interlayer insulating film is performed.
The procedure is performed according to the method described in the second embodiment.
It shall be assumed. The details will be described below. First, a method similar to that of the second embodiment is used.
After forming the interlayer insulating film 10, as shown in FIG.
And contact holes using photolithography technology
Thirteen regions of the interlayer insulating film 10 are removed. At this time, the same
Interlayer insulating film in the portion where the reflective electrode 11 is formed in the step
An uneven portion 15 for scattering incident light is provided on the surface 10.
It is formed in the same manner as in the first embodiment. In addition, the above embodiment is
In contrast, the portion of the interlayer insulating film 10 which will be the region A is not deleted.
No. Then, an A layer for the reflective electrode 11 is
1 or an Al-based alloy film is formed. In this embodiment,
As the interlayer insulating film 10, a single-layer organic resin was used. However,
The interlayer insulating film 10 is a laminated film made of a plurality of different materials.
It does not matter. Also, if it is not necessary,
You don't have to. Next, as shown in FIG.
Is patterned by photolithography technology.
The injection electrode 11 is formed. Thereafter, as shown in FIG.
All or part of the interlayer insulating film 10 covering (region A)
Is removed. As described above, the transmission type display and the reflection type display are the same.
In the liquid crystal display panel of the present embodiment,
Al as the electrode 11 and ITO as the transmission electrode 8a
With a structure that does not directly connect,
Of defects caused by electrolytic corrosion between Al and ITO
Electrode material in the manufacturing process
Of the transmission electrode 8a is exposed during the Al processing process
By doing so, the electrolytic corrosion reaction between Al and ITO during production
, And a liquid crystal display panel can be manufactured. (Embodiment 4) The liquid crystal of Embodiment 4 of the present invention
The method for manufacturing the display panel is described below with reference to the drawings.
Perform The liquid crystal display panel of this embodiment has a pixel electrode
Electrode 8a as a drain and the drain electrode 9 of the TFT 7
The order of forming c and the step of opening the interlayer insulating film 10 are as described above.
This is different from the second and third embodiments. FIGS. 7A to 7C show the liquid crystal of this embodiment.
FIG. 9 is a cross-sectional view for explaining the method for manufacturing the display panel.
5 corresponds to the BB section in FIG. The description is omitted.
Forms a semiconductor contact layer in the present embodiment
The previous steps are the same as those described in the first and second embodiments.
It shall be performed in accordance with it. The details will be described below. As shown in FIG. 7A, the semiconductor contact
After forming a light-transmitting layer, a light-transmitting conductive film is formed,
By patterning using lithography technology,
An over electrode 8a is formed. In the present embodiment, the transmission electrode 8a and
Then, ITO was used. Next, a conductive film is formed, and photolithography is performed.
The source wiring 9a, the source electrode 9b, the drain
Electrode 9c, connection metal layer 9d, and transmission area metal layer
9e is patterned. Source wiring 9c and source wiring
9a is electrically connected. Also, the drain electrode
9c, the connection metal layer 9d, and the transmission area metal layer 9e
They are electrically connected to each other. In the present embodiment,
A Ta-based material was used as the electroconductive film. However, this material is A
1, other conductive materials such as Cr, Mo, W, Cu, Ti
Material may be used. Next, the source electrode 9b and the drain electrode 9c are
Etch the semiconductor contact layer as a mask,
The TFT 7 by dividing it into the drain side 6a and the drain side 6b.
Form. Thereafter, an interlayer insulating film 10 is formed,
A portion corresponding to the transmission region A using a lithography technique;
And the interlayer insulating film 10 at the contact hole 13 is opened.
I do. At this time, interlayer insulation of the portion where the reflective electrode 11 is formed is performed.
An uneven portion 15 for scattering incident light is provided on the surface of the edge film 10.
To form A layer for the reflective electrode 11 is formed on the upper layer.
1 or an Al-based alloy film is formed. This embodiment
In this example, a single-layer organic resin was used as the interlayer insulating film 10. However
However, the interlayer insulating film may be a laminated film of different materials.
No. Alternatively, unevenness may not be formed on the surface. [0096] As shown in FIG.
Reflective electrode 1 patterned by photolithography
Form one. Thereafter, as shown in FIG.
All of the metal layer 9e covering the region (region A)
Removes part. At this time, the metal layer 9e is removed
By using photolithography technology,
Can be removed by etching using the reflective electrode 11 as a mask.
I do not care. Or, when the reflective electrode 11 is formed by etching.
It may be formed continuously by etching. The liquid crystal display panel of the present embodiment and the
The manufacturing method includes a method of forming a reflective electrode made of Al and a transparent electrode 8a made of ITO.
No direct connection, so contact for reliability
Of defects caused by electrolytic corrosion of Al and ITO in the area
And the manufacturing process
During the processing of Al, ITO of the transmission electrode 8a is exposed.
Because of this, the electrolytic corrosion reaction between Al and ITO during production can be suppressed.
It has the advantage that it can be cut. (Embodiment 5) The liquid crystal of Embodiment 5 of the present invention
The method for manufacturing the display panel is described below with reference to the drawings.
Perform The liquid crystal display panel of the present embodiment and its manufacture
The method includes the structure of the transmission electrode 8a and the TFT 7, the interlayer insulating film.
The process is characterized by the step of providing an opening in
This is different from the second and third embodiments. FIGS. 8A to 8C show the liquid crystal of this embodiment.
FIG. 9 is a cross-sectional view for explaining the method for manufacturing the display panel.
5 corresponds to the BB section in FIG. The description is omitted.
Forms a semiconductor contact layer in the present embodiment
The previous steps are based on the method described in the first and second embodiments.
It is assumed that it was performed in the first place. This will be described in detail below. As shown in FIG. 8A, the semiconductor contact
After the light-transmitting conductive film and the metal film are
Source wiring 9a, source electrode 9b, drain
An electrode 9c, a reflective electrode-transmitting electrode connecting metal layer 9d, and
The photolithography technology is used for the transmission region metal layer 9e.
Is used to pattern the metal film. Next, light transmission through the lower layer
The conductive film is formed by using the source wiring 9a, the source electrode 9b,
Rain electrode 9c, reflective electrode-transmission electrode connection metal layer 9
d, and processed into the same pattern as the transmission area metal layer 9e.
The transmission electrode 8a, the source electrode 8b, and the drain electrode 8c
Etc. are formed. That is, the source electrode, source wiring, drain
By making the in-electrode a two-layer structure, a part of one layer
Even if some kind of disconnection failure occurs in the
Propagation to the other layer enables normal display
You. In this embodiment, the light-transmitting conductive film is made of IT.
O, a Ta-based material was used as the metal film. At this time, light transmission
Regarding the processing of the conductive film, etch the
The metal used to process the metal film
After removing the block, use the metal film pattern to
The electrolytic film may be etched. Next, the source electrodes 9b and 8b and the drain electrode
Etching the semiconductor contact layer using 9c and 8c as masks
The source side 6a and the drain side 6b.
The TFT 7 is formed. Subsequently, an interlayer insulating film 10 is formed, and
Using a lithography technique, a transparent region is formed in the interlayer insulating film 10.
(Area A) and the contact hole 13 are opened.
At this time, the portion of the interlayer insulating film 1 where the reflective electrode 11 is to be formed
On the 0 surface, an uneven portion 15 for scattering incident light is formed.
I do. Then, Al as a reflective electrode 11 is formed on the
Alternatively, an Al-based alloy film is formed. In this embodiment, a single-layer organic film is used for the interlayer insulating film.
Resin was used. However, the interlayer insulating film is a product of multiple different materials.
It may be a layer film. Also, without forming irregularities on the surface
It does not matter. Next, as shown in FIG.
Or Al-based alloy film by photolithography technology.
Then, the reflection electrode 11 is formed. Thereafter, as shown in FIG.
All or part of the metal layer 9e covering the
You. At this time, the removal of the metal layer 9e is performed by photolithography.
Technology or the reflective electrode 1
1 by using the mask as a mask
Good. In addition, when the reflective electrode 11 is formed by etching,
It may be formed by etching. The liquid crystal display panel of the present embodiment and the
The manufacturing method includes a method of forming a reflective electrode made of Al and a transparent electrode 8a made of ITO.
No direct connection, so contact for reliability
Of defects caused by electrolytic corrosion of Al and ITO in the area
And the manufacturing process
During the processing of Al, ITO of the transmission electrode 8a is exposed.
Because of this, the electrolytic corrosion reaction between Al and ITO during production can be suppressed.
It has the advantage that it can be cut. Furthermore, the formation of the pixel electrode
Simplifies the manufacturing process because it is performed in the same process as other wiring
Can be In the present embodiment, the formation of the pixel electrode is performed by software.
In the same process as source wiring, source electrode and drain electrode
However, the present invention is not limited to this.
Or in the same step as the gate electrode,
Use a reflective electrode instead of a transmissive electrode as the other wiring.
It may be formed in one step. (Embodiment 6) The liquid crystal of Embodiment 6 of the present invention
Regarding the display panel and its manufacturing method, based on the drawings,
A description is given below. In this embodiment, the above embodiment
Regarding the liquid crystal display panel of the embodiment 6, the structure of the terminal portion and its manufacture
The fabrication method will also be described. The liquid crystal display panel of the present embodiment and its manufacture
The method is to place the transparent electrode on the same layer as the gate electrode and gate wiring
It differs from the above-described first to fifth embodiments in that it is provided. FIGS. 9A to 9C show the liquid crystal of this embodiment.
Pixel part of active matrix substrate used for display panel
Sectional view for explaining the structure of a liquid crystal panel terminal part
It is. FIG. 9A shows the active state according to the present embodiment.
FIG. 3 is a diagram showing a cross-sectional structure of a pixel portion of a matrix substrate,
4 corresponds to the BB section. FIG. 9B shows a gate.
It is a figure which shows a side terminal structure, and is equivalent to CC section of FIG.
FIG. 9C is a diagram showing a source-side terminal structure.
10 corresponds to the DD section. Here, FIG.
It is a schematic top view of the liquid crystal panel of this invention. Hereinafter, the liquid crystal display panel of this embodiment will be described.
The configuration will be described in detail. In FIG. 9A, on an insulating substrate 1,
Is provided with the same TFT 7 as in the above embodiment.
Further, the gate electrode 2 and the gate wiring of this TFT 7 (FIG.
(Not shown), a transmission electrode 8a is provided in the same layer. Sa
In addition, the drain electrode 9c of the TFT 7 is
Through the contact hole 13 formed therein, the upper layer
Connected to the injection electrode 11 and, on the other hand,
Through a contact hole 16 formed in the film 4,
It is connected to the transmission electrode 8a. With this configuration, as in the present embodiment, the image
Transparent electrode made of dissimilar metals and reflective electrode
For example, if the electrode is built in the same pixel,
For example, after the processing step of the transmission electrode 8a, the application of the reflection electrode 11 is started.
By the time the construction process is completed, at least the transmission electrode 8a
Is covered with at least a gate insulating film 4.
By continuing, electrolytic corrosion is caused by the electrode potential difference between each metal.
Problems that occur can be prevented. Further, the terminal structure shown in FIGS.
Similarly, the structure is formed simultaneously with the transmission electrode 8a.
Insulating film (gate insulating film 4 and interlayer insulation)
Because of the structure provided with the edge film 10), interlayer insulation is provided.
The processing step of the reflective electrode 11 formed after the formation of the edge film is completed.
Until the process is completed, at least
Because it is possible to cover with a gate insulating film,
Prevents galvanic corrosion between the dissimilar metal reflective electrode and the terminal
Can be stopped. The active matrix shown in FIG.
Referring to FIGS. 11 and 12, a method of manufacturing a substrate will be described.
Give an explanation. FIGS. 11 and 12 show the active state shown in FIG.
FIG. 2 is a cross-sectional view for explaining a method of manufacturing a matrix substrate.
is there. In FIG. 11A, on an insulating substrate 1,
Form a transparent conductive film and use photolithography technology
The transmission electrode 8a is formed by a technique. In the present embodiment,
A glass substrate is used as the rim substrate 1, and I is used as the transmission electrode 8 a.
TO was used. Also, by photolithography technology,
The gate electrode 2 and the gate wiring 3 are patterned. This implementation
In the embodiment, a Ta-based material was used as a gate material. However,
Al, Cr, Mo, W, Cu, Ti
Other materials having conductivity such as the above may be used. In the above steps, the transmission electrode 8a
For forming the gate electrode 2 and the gate wiring 3
The order of the steps can be changed. Next, referring to FIG.
Film 4, semiconductor layer 5, and semiconductor contact layers 6a and 6b
And SiNx, amorphous silicon, and P, respectively.
N + type amorphous silicon removed by CVD
Continuous film formation and semiconductor layer by photolithography technology
5. Pattern the semiconductor contact layers 6a and 6b
You. Further, the transmission electrode 8a is formed on the gate insulating film 4.
And a drain electrode to be formed later.
A contact hole 15 is formed. At this time, FIGS. 9 (b) and 9 (c) show
Gate disconnection on gate side terminal 20 or source side terminal 21
The edge film 4 may be removed at the same time. Subsequently, as shown in FIG.
Film is formed and source wiring is formed by photolithography technology.
9a, the source electrode 9b and the drain electrode 9c
To run. In this embodiment, a Cr-based material is used as the conductive film.
Was used. However, besides, Al, Mo, Ta, W, Cu,
A conductive material such as Ti may be used. Next, the source electrode 9b and the drain electrode 9c
Center portions of semiconductor contact layers 6a and 6b using masks as masks
The source side 6a and the drain
Side 6b. Through the above steps, the TFT 7 is completed.
You. Subsequently, as shown in FIG.
An insulating film 10 is formed and is formed using photolithography technology.
A contact hole 13 is formed in the interlayer insulating film 10. However
And an interlayer insulating film 10 corresponding to the transmission region (region A).
In this step, the reflective electrode was not formed and the reflective electrode was formed later.
Will be removed later. Next, as shown in FIG.
Uneven portions 15 are formed on the surface of the interlayer insulating film 10 corresponding to
It is formed by photolithography in the same manner as described above. In this embodiment, the interlayer insulating film 10 is used.
Used an organic insulating film, but this is not a limitation.
It may be a laminated film. In addition, the surface of the interlayer insulating film 10
Need not necessarily be formed with irregularities. Next, as shown in FIG.
A conductive film having high reflection efficiency is formed as a material of the pole 11. Further, as shown in FIG.
Pattern the reflective electrode 11 by lithography technology
You. In the pixel, at least the portion that becomes the region A
The reflection electrode 11 is to be removed. Finally, as shown in FIG.
The interlayer insulating film 10 on the transmission electrode 8a corresponding to A is removed.
You. Further, the gate insulating film 4 also corresponds to the region A.
Remove the part you want. At this time, the gate insulating film 4 or the interlayer
When the insulating film 10 is left, a voltage drop occurs, and a voltage is applied to the liquid crystal.
May not be applied sufficiently.
It is preferable that the edge film is also removed. In particular, the present invention
As described above, the transmission electrode 8a and the reflection electrode
When a voltage is applied to the liquid crystal by the pole 11,
There is a difference between the voltages applied to the liquid crystals corresponding to A and B.
Therefore, it is not preferable. By the above method, the active matrix
The substrate is completed. Further, the active matrix substrate
After applying an alignment film, perform an alignment treatment if necessary.
Laminate with the above-mentioned counter substrate and enclose liquid crystal between the substrates
Thus, the liquid crystal display panel of the present invention is completed. Hereinafter, the shape of the terminal portion provided on the peripheral portion of the substrate will be described.
The formation method will be described with reference to FIG. FIG. 13 shows a liquid crystal display panel of this embodiment.
FIG. 9 is a diagram for explaining a method of manufacturing the gate-side terminal portion.
You. In addition, regarding this terminal portion, the formation of the pixel portion described above is performed.
It can be formed simultaneously with the process. In FIG. 13A, on the insulating substrate 1
Next, a transparent conductive film is formed as the gate terminal 20.
At the same time as this step, a transmission electrode is formed in the pixel portion.
To achieve. Thereafter, the gate wiring 3 is formed on the terminal 20.
As a result, the terminal 20 and the gate wiring 3 are electrically connected.
The connection is made (corresponding to the step of FIG. 11A). Next, referring to FIG.
3 and a gate insulating film 4 is formed on the gate side terminal portion 20.
You. The removal of the gate insulating film 4 on the terminal 20 is performed in this step.
Is performed in a later step (step of FIG. 11B).
Corresponding to). Thereafter, the TFT is completed in the pixel portion.
(Corresponding to the step of FIG. 11C). In FIG. 13C, on the gate insulating film 4
Next, an interlayer insulating film 10 is formed (for the step of FIG. 11D).
Yes. In FIG. 13D, on the interlayer insulating film 10
A conductive film to be the reflective electrode 11 is formed on the substrate (FIG. 12A)
Corresponding to the process). In FIG. 13E, a film is formed near the terminal portion.
The reflection electrode 11 that has been used is removed. In addition, the same as this process
Sometimes, within the pixel, the reflection formed in the region A
The electrode 11 is removed (corresponding to the step of FIG. 12B). In FIG. 13 (f), the game
The insulating film 4 and the interlayer insulating film 10 are removed. In addition, this construction
At the same time, the gate insulating film 4 in the region A in the pixel is
The interlayer insulating film 10 is removed (for the step of FIG.
Yes. As described above, not only the pixel area but also the terminal
Also, until the processing step of the reflective electrode 11 is completed,
The terminal 20 and the gate wiring 3 are formed of an insulating layer (gate insulating film 4,
Since they are covered with the interlayer insulating film 10),
The terminal 20 and the gate wiring 3 made of metal, and the reflection electrode 11
It is possible to prevent electric erosion from occurring between them. Although detailed explanation is omitted, FIG.
The source terminal section shown in FIG.
And can be formed at the same time as the gate terminal.
It is possible to prevent the occurrence of food. In the pixel portion, the transmission electrode 8a is formed.
(Step shown in FIG. 11A) and the gate electrode 2
And a step of forming the gate wiring 3 (shown in FIG.
Even if the order of the process) is reversed, the occurrence of electrolytic corrosion
It is possible to block. The gate-side terminal structure at this time is shown in FIG.
FIG. 14A shows the source-side terminal structure in FIG.
In each terminal section, the terminal is a gate electrode and a gate.
The gate material forming the gate wiring and the transmission electrode 8 are formed.
It has a two-layer structure made of a transparent conductive film. Also in this case, the processing step of the reflective electrode is completed.
Until that time, cover the terminals with at least the gate insulating film.
Can be kept overturned, effectively preventing the occurrence of electrolytic corrosion
It is possible to block. (Embodiment 7) A description will be given in Embodiment 6 above.
As a process following FIG. 11C, FIGS.
Even using the method shown in (c), effectively prevents electrolytic corrosion
It is possible to do. In the present embodiment, the method according to the sixth embodiment is described.
Other manufacturing methods for active matrix substrates are described below.
Give an explanation. In FIG. 15A, an interlayer insulating film 10 is formed.
Film is formed and contact hole 1 is formed by photolithography.
At the same time as opening the hole 3, the interlayer insulation of the portion corresponding to the area A
The rim is removed. In addition, interlayer insulation of a portion corresponding to the region B is performed.
An uneven portion 15 is formed on the surface of the edge film 10. Next, as shown in FIG.
A conductive film is formed as a reflective electrode 11 on the edge film 10. Finally, as shown in FIG.
Remove the reflective electrode 11 formed in the portion corresponding to A
I do. The process of applying the reflection electrode 11 is also performed by this process.
The gate of the lower transmission electrode 8a is disconnected until the process is completed.
Since it is covered with the edge film 4, the reflection electrode 11 and the transmission electrode
Generation of electrolytic corrosion which is likely to occur when the pole 8a is formed of a dissimilar metal
Life is stopped. However, in this process, the transmission electrode 8
a of the gate insulating film 4
11 and 12, the process shown in FIGS.
The electrolytic corrosion reaction can be effectively prevented. According to this process, FIG.
As shown in (a), simultaneously with the formation of the contact hole 13
Since the interlayer insulating film corresponding to the region A is removed in FIG.
The number of steps is reduced as compared with the processes shown in FIGS.
It is possible. As described in detail above, the liquid of the present invention
According to the liquid crystal display panel and the method of manufacturing the same, the pixel electrodes are
Layer with high light transmission efficiency and light reflection effect
Since the same pixel area has a layer with a high efficiency,
Around the LCD panel using a half-mirror
Light and illumination light can be used without any loss, and
Usage efficiency can be improved. Layer with high light transmission efficiency
For example, ITO or SnO which is a transparent conductive film
_Two The layers with high light reflection efficiency, such as Al, W, Cr,
All of these alloys, etc., are common reflective liquid crystal display panels and
Use the materials used for transmissive liquid crystal display panels
Is easy to manufacture because of the display characteristics and reliability.
Very stable liquid crystal display panel can be realized
You. The conventional transmission type liquid crystal display panel has
Visibility due to surface reflection in bright ambient light environment
And the conventional reflective LCD panel
Caused by reduced panel brightness in an environment where the ambient light
Simultaneously solves the problem of display observation
And has all the features
It became something. That is, the liquid crystal display panel of the present invention is
In an environment where a large amount of power can be supplied, the conventional transmissive LCD
Because the backlight is used in the same way as the
Regardless of the intensity, display recognition becomes possible,
Reflects variations in ambient light usage efficiency due to variations in lightness
It is not necessary to control as precisely as the liquid crystal display panel. use
In doing so, a layer with high light transmission efficiency within the same pixel
And the layer with high light reflection efficiency contribute to the display complementarily.
No matter how bright the ambient light is, the image is clearly displayed
Is done.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a plan view for explaining a liquid crystal display panel according to Embodiment 1 of the present invention. FIG. 2 is a cross-sectional view for explaining the liquid crystal display panel of Embodiment 1 of the present invention. FIG. 3 is a cross-sectional view for explaining the method for manufacturing the liquid crystal display panel of Embodiment 1 of the present invention. FIG. 4 is a plan view illustrating a liquid crystal display panel according to Embodiment 2 of the present invention. FIG. 5 is a cross-sectional view for explaining a liquid crystal display panel of Embodiment 2 of the present invention. FIG. 6 is a sectional view illustrating a liquid crystal display panel according to Embodiment 3 of the present invention. FIG. 7 is a cross-sectional view for explaining a liquid crystal display panel of Embodiment 4 of the present invention. FIG. 8 is a sectional view illustrating a liquid crystal display panel according to Embodiment 5 of the present invention. FIG. 9 is a sectional view illustrating a liquid crystal display panel according to Embodiment 6 of the present invention. FIG. 10 is a schematic plan view of the liquid crystal display panel of the present invention. FIG. 11 is a cross-sectional view for explaining the method for manufacturing the liquid crystal display panel of Embodiment 6 of the present invention. FIG. 12 is a cross-sectional view for explaining the method for manufacturing the liquid crystal display panel of Embodiment 6 of the present invention. FIG. 13 is a cross-sectional view for explaining the method for manufacturing the gate-side terminal portion of the liquid crystal display panel according to the sixth embodiment of the present invention. FIG. 14 is a cross-sectional view for explaining another terminal structure of the liquid crystal display panel according to Embodiment 6 of the present invention. FIG. 15 is a cross-sectional view for explaining the method for manufacturing the liquid crystal display panel of Embodiment 7 of the present invention. FIG. 16 is a cross-sectional view illustrating a conventional liquid crystal display panel. [Description of Signs] 1 Insulating substrate 2 Gate electrode 3 Gate wiring 4 Gate insulating film 5 Semiconductor layer 6a Semiconductor contact layer (source electrode side) 6b Semiconductor contact layer (drain electrode side) 7 TFT 8a Transmission electrode 8b Source electrode (transmission) 8c Drain electrode (transmission electrode material) 9a Source wiring 9b Source electrode 9c Drain electrode 9d (for connection of reflection electrode-transmission electrode) Metal layer 9e (for transmission region) Metal layer 10 Interlayer insulating film 11 Reflection electrode 12 Metal layer 13 (drain) contact hole 15 uneven portion 20 terminal (gate wiring side) 21 terminal (source wiring side)

──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yozo Narutaki 22-22, Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Inside Sharp Corporation (72) Inventor Naoyuki Shimada 22-22, Nagaike-cho, Abeno-ku, Osaka-shi, Osaka In-company (72) Inventor Mikio Katayama 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Sharp Corporation (72) Inventor Yoji Yoshimura 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Sharp Corporation (72) Invention Person Hiroshi Ishii 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Inside Sharp Corporation (56) References JP-A-7-218923 (JP, A) JP-A-6-75237 (JP, A) JP-A 7- 175126 (JP, A) JP-A-8-184846 (JP, A) JP-A-11-281972 (JP, A) JP-A 7-152023 (JP, A) (58) Fields investigated (Int. Cl. ^7, B name) G02F 1/1343 G02F 1/1362 G02F 1/1333 G02F 1/1335 G02F 1/13357 G02F 1/13 505

Claims (1)

(57) [Claim 1] A plurality of gate wirings and the gate wirings
A plurality of source wirings arranged orthogonally;
A space provided near the intersection of the source wiring and the source wiring.
A switching element, connected to the switching element
In a liquid crystal display panel in which pixel electrodes are formed, the pixel electrodes are opposite to the transmission electrodes that are electrically connected to each other.
And the transmission electrode and the transmission electrode in the same pixel region.
The reflective electrode and the reflective electrode are provided on separate layers with an insulating layer therebetween.
The transmission electrode and the reflection electrode are formed on the insulating layer.
Electrically connected through the contact hole
The over-type display and the reflective display are performed simultaneously.
Liquid crystal display panel.