JP3518682B2 - Organic electroluminescence device - Google Patents

Organic electroluminescence device

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Publication number
JP3518682B2
JP3518682B2 JP2001272861A JP2001272861A JP3518682B2 JP 3518682 B2 JP3518682 B2 JP 3518682B2 JP 2001272861 A JP2001272861 A JP 2001272861A JP 2001272861 A JP2001272861 A JP 2001272861A JP 3518682 B2 JP3518682 B2 JP 3518682B2
Authority
JP
Japan
Prior art keywords
organic
anode
light emitting
transparent electrode
organic electroluminescence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001272861A
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Japanese (ja)
Other versions
JP2002083692A (en
Inventor
徹 並木
均 佐藤
健一 永山
輝一 渡辺
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Pioneer Corp
Original Assignee
Pioneer Corp
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Filing date
Publication date
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Priority to JP2001272861A priority Critical patent/JP3518682B2/en
Publication of JP2002083692A publication Critical patent/JP2002083692A/en
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Publication of JP3518682B2 publication Critical patent/JP3518682B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電流の注入によって発
光する物質のエレクトロルミネッセンスを利用して、か
かる物質を層状に形成した発光層を備えたエレクトロル
ミネッセンス素子に関し、特に発光層が有機化合物を発
光体として構成される有機エレクトロルミネッセンス素
子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroluminescence device having a light emitting layer formed by layering such a substance by utilizing the electroluminescence of a substance which emits light when an electric current is injected. The present invention relates to an organic electroluminescence device configured as a light emitting body.

【0002】[0002]

【従来の技術】この種の有機エレクトロルミネッセンス
素子として、図1に示すように、陰極である金属電極1
と、インジウムすず酸化物(以下、ITOともいう)か
らなる陽極の透明電極2との間に、互いに積層された有
機蛍光体薄膜(発光層)3及び有機正孔輸送層4が配さ
れた2層構造のものが知られている。また、図2に示す
ように、金属電極1と透明電極2との間に互いに積層さ
れた有機電子輸送層5、発光層3及び有機正孔輸送層4
が配された3層構造のものも知られている。ここで、有
機正孔輸送層4は陽極2から正孔を注入させ易くする機
能と電子をブロックする機能とを有し、有機電子輸送層
5は陰極1から電子を注入させ易くする機能を有してい
る。これら有機エレクトロルミネッセンス素子におい
て、陽極の透明電極2の外側にはガラス基板6が配され
ている。金属電極1から注入された電子と透明電極2か
ら注入された正孔との再結合によって、励起子が生じ、
この励起子が放射失活する過程で光を放ち、この光が透
明電極2及びガラス板6を通過して外部に放出される。
そして、透明電極には仕事関数の大きなものを、金属電
極には仕事関数の小さなものをそれぞれ用いることで、
電荷の注入効率が上がり、発光効率が向上することが知
られている。
2. Description of the Related Art As an organic electroluminescence device of this type, as shown in FIG.
2 and an organic phosphor thin film (light emitting layer) 3 and an organic hole transport layer 4 which are laminated on each other, are disposed between the transparent electrode 2 and an anode transparent electrode 2 made of indium tin oxide (hereinafter, also referred to as ITO). Layered structures are known. In addition, as shown in FIG. 2, an organic electron transport layer 5, a light emitting layer 3 and an organic hole transport layer 4 which are laminated on each other between the metal electrode 1 and the transparent electrode 2.
A three-layer structure in which is arranged is also known. Here, the organic hole transport layer 4 has a function of facilitating injection of holes from the anode 2 and a function of blocking electrons, and the organic electron transport layer 5 has a function of facilitating injection of electrons from the cathode 1. is doing. In these organic electroluminescence elements, a glass substrate 6 is arranged outside the transparent electrode 2 of the anode. The recombination of the electrons injected from the metal electrode 1 and the holes injected from the transparent electrode 2 produces excitons,
The excitons emit light in the process of radiation deactivation, and the light passes through the transparent electrode 2 and the glass plate 6 and is emitted to the outside.
By using a transparent electrode with a large work function and a metal electrode with a small work function,
It is known that the efficiency of injecting charges is increased and the emission efficiency is improved.

【0003】例えば図1に示された2層構造の有機エレ
クトロルミネッセンス素子には、図3に示すように、
X,Yマトリクス型がある。図3のAA’線に沿った断
面の一部を図1に示してある。該有機エレクトロルミネ
ッセンス素子は、ガラス透明基板6上に、ITO等の複
数の透明電極2、正孔輸送層4、発光層3、透明電極2
に交差する複数の金属陰極1を順に積層して形成され
る。正孔輸送層4及び発光層3を挾持して互いに対向し
対をなす透明陽極2及び金属陰極1とによって有機エレ
クトロルミネッセンス素子となる発光部が形成され、透
明陽極2及び金属陰極1の各々が互いに対向して交差す
る交差領域部の発光部を1単位として1画素が形成され
る。
For example, in the two-layered organic electroluminescent device shown in FIG. 1, as shown in FIG.
There are X and Y matrix types. A part of the cross section along the line AA 'in FIG. 3 is shown in FIG. The organic electroluminescence device comprises a plurality of transparent electrodes 2 such as ITO, a hole transport layer 4, a light emitting layer 3, and a transparent electrode 2 on a glass transparent substrate 6.
It is formed by sequentially stacking a plurality of metal cathodes 1 intersecting with each other. A light emitting portion to be an organic electroluminescence device is formed by the transparent anode 2 and the metal cathode 1 which sandwich the hole transport layer 4 and the light emitting layer 3 and face each other, and each of the transparent anode 2 and the metal cathode 1 is formed. One pixel is formed with the light emitting portions in the intersecting region portion that face each other and intersect each other as one unit.

【0004】このような有機エレクトロルミネッセンス
素子の複数個を画素数に応じ一枚の素子基板上に形成し
たパネルを、その周囲から突出する透明陽極2及び金属
陰極1を介して駆動することによって、平面ディスプレ
イ装置が構成される。
By driving a panel in which a plurality of such organic electroluminescent elements are formed on one element substrate according to the number of pixels through a transparent anode 2 and a metal cathode 1 protruding from the periphery thereof, A flat display device is constructed.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、比較的
高い輝度で発光が得られる有機エレクトロルミネッセン
ス素子であっても、発光効率が未だ十分とはいえない。
さらに、この有機エレクトロルミネッセンス素子を利用
したディスプレイ装置において、多数の透明電極が設け
られた基板が大型化、高精細化するに従い、透明電極ラ
インの抵抗値が非常に大きくなってしまうという問題が
ある。
However, even an organic electroluminescence device capable of emitting light with a relatively high luminance is still insufficient in light emission efficiency.
Further, in a display device using this organic electroluminescence element, there is a problem that the resistance value of the transparent electrode line becomes very large as the substrate provided with a large number of transparent electrodes becomes larger and finer. .

【0006】本発明は、上述した従来の要望を満たすべ
くなされたものであって、透明電極ラインの抵抗値の増
加を抑え有機蛍光体を発光効率良く発光させることがで
きる有機エレクトロルミネッセンス素子を提供すること
を目的とする。
The present invention has been made to meet the above-mentioned conventional demands, and provides an organic electroluminescence device capable of suppressing the increase in the resistance value of a transparent electrode line and allowing an organic phosphor to emit light with high luminous efficiency. The purpose is to do.

【0007】[0007]

【課題を解決するための手段】本発明の有機エレクトロ
ルミネッセンス素子は、陽極、有機化合物からなる正孔
輸送層、有機化合物からなる発光層及び陰極が順に積層
された有機エレクトロルミネッセンス素子であって、前
記発光層の一部に流れる電流を減少せしめる絶縁膜を有
することを特徴とする。
The organic electroluminescence device of the present invention is an organic electroluminescence device in which an anode, a hole transport layer made of an organic compound, a light emitting layer made of an organic compound and a cathode are laminated in this order, It is characterized by having an insulating film for reducing a current flowing through a part of the light emitting layer.

【0008】[0008]

【発明の作用】本発明によれば、有機エレクトロルミネ
ッセンス素子において、陽極の上に絶縁膜を設けること
によって、部分的に正孔電荷の注入効率を下げて、外部
に放出される発光に関与しない電流を減少させると共に
該金属膜及び陽極の一体となった全陽極の抵抗値を軽減
するので、高発光効率の有機エレクトロルミネッセンス
素子を得ることができる。
According to the present invention, in the organic electroluminescence device, by providing an insulating film on the anode, the efficiency of injecting hole charges is partially reduced, and the device does not participate in light emission emitted to the outside. Since the current value is reduced and the resistance value of all the anodes in which the metal film and the anode are integrated is reduced, it is possible to obtain an organic electroluminescence device having high luminous efficiency.

【0009】[0009]

【実施例】以下、本発明による有機エレクトロルミネッ
センス素子の実施例を図面を参照しつつ説明する。本実
施例の有機エレクトロルミネッセンス素子は、図4に示
すように、ガラス透明基板6上に、透明陽極2、該陽極
より仕事関数の低い金属膜7、有機正孔輸送層4、有機
化合物からなる発光層3及び金属陰極1が順に積層され
た2層構造において、金属膜7が陽極2及び正孔輸送層
4間の一部に積層されている。または、本実施例の有機
エレクトロルミネッセンス素子は、図5に示すように、
ガラス透明基板6上に、透明陽極2、陽極2より仕事関
数の低い金属膜7、有機正孔輸送層4、有機化合物から
なる発光層3、電子輸送層5及び金属陰極1が順に積層
された3層構造において、金属膜7が陽極2及び正孔輸
送層4間の一部に積層されてもよい。
Embodiments of the organic electroluminescent device according to the present invention will be described below with reference to the drawings. As shown in FIG. 4, the organic electroluminescent element of this example comprises a transparent anode 2, a transparent anode 2, a metal film 7 having a work function lower than that of the anode, an organic hole transport layer 4, and an organic compound, as shown in FIG. In the two-layer structure in which the light emitting layer 3 and the metal cathode 1 are sequentially stacked, the metal film 7 is stacked in a part between the anode 2 and the hole transport layer 4. Alternatively, as shown in FIG. 5, the organic electroluminescent element of the present embodiment is
A transparent anode 2, a metal film 7 having a work function lower than that of the anode 2, an organic hole transport layer 4, a light emitting layer 3 made of an organic compound, an electron transport layer 5, and a metal cathode 1 were sequentially laminated on a glass transparent substrate 6. In the three-layer structure, the metal film 7 may be laminated on a part between the anode 2 and the hole transport layer 4.

【0010】陰極1には、アルミニウム、マグネシウ
ム、インジウム、銀又は各々の合金等の仕事関数が小さ
な金属(例えば、Al−Li合金の仕事関数=約3.0
eV)からなり厚さが約 100〜5000Å程度のも
のを用い得る。また、陽極2には、ITO等の仕事関数
の大きな導電性材料(ITOの仕事関数=約5.0e
V)からなり厚さが1000〜3000Å程度で、又は
金(Auの仕事関数=約5.1eV)で厚さが800〜
1500Å程度のものを用い得る。なお、金を電極材料
として用いた場合には、電極は半透明の状態となる。
For the cathode 1, a metal having a small work function such as aluminum, magnesium, indium, silver, or an alloy of each (for example, the work function of an Al--Li alloy = about 3.0).
eV) having a thickness of about 100 to 5000 Å can be used. For the anode 2, a conductive material having a large work function such as ITO (ITO work function = about 5.0e
V) and has a thickness of about 1000 to 3000 Å, or gold (work function of Au = about 5.1 eV) and a thickness of 800 to
About 1500Å can be used. When gold is used as the electrode material, the electrode becomes semitransparent.

【0011】陽極2及び正孔輸送層4間の一部に積層さ
れる金属膜7には、陰極1に用いられたアルミニウム、
マグネシウム、インジウム、銀又は各々の合金等の仕事
関数が小さな金属を用いる。陽極2に仕事関数の大きな
ITOを用いる場合、金属膜7には仕事関数が小さな例
えば、Al−Li,In−Li,Mg−Sr,Al−S
rの合金を用い得る。金属等の表面から1個の電子を真
空外部に取り出すに必要なエネルギー(eV)を示す仕
事関数は、同じ金属でも不純物や吸着等のその表面状態
により敏感に変化するが、これら金属膜合金の成分の仕
事関数は、In=約4.12eV,Li=約2.9e
V,Mg=約3.66eV,Sr=約2.59eV,A
l=約4.28eV,Ag=約4.26eVである。
The metal film 7 laminated on a part between the anode 2 and the hole transport layer 4 includes aluminum used for the cathode 1,
A metal having a small work function such as magnesium, indium, silver, or an alloy of each is used. When ITO having a large work function is used for the anode 2, the metal film 7 has a small work function, for example, Al-Li, In-Li, Mg-Sr, Al-S.
r alloys may be used. The work function showing the energy (eV) required to extract one electron from the surface of a metal or the like to the outside of the vacuum is sensitively changed depending on the surface state such as impurities or adsorption even with the same metal. The work functions of the components are In = about 4.12 eV and Li = about 2.9 e.
V, Mg = about 3.66 eV, Sr = about 2.59 eV, A
1 = about 4.28 eV and Ag = about 4.26 eV.

【0012】図6に、陽極2及び正孔輸送層4間の一部
に積層される金属膜7の例示的態様を示す。図6(a)
は図4及び5に示すごとき、金属膜7が陽極2の縁部に
沿って部分的に陽極2の表面上を覆うように積層される
場合を示す。図6(b)は、金属膜7が陽極2の縁部及
び透明基板6に渡って部分的に陽極2の表面上を覆うよ
うに積層される場合を示す。図6(c)は、金属膜7が
陽極2上の中央部にて部分的に陽極2の表面上を覆うよ
うに積層される場合を示す。また、部分的に形成される
金属膜7は、陽極2上においてその伸長方向に沿って連
続的に又は間歇的に積層され得る。図6(a)〜(c)
に示すように陽極2の側面は異方性エッチング等により
透明基板6上略直角に形成されても良いが、さらに、図
6(d)に示すように陽極2の側面が等方性エッチング
等により傾斜面として形成される場合、金属膜7は傾斜
側面の表面上を覆い隣接するように積層される。なお、
この金属膜7は単一金属でも複数の金属からなる合金で
も良く、できるだけ仕事関数の低いものの方が効果が大
きい。
FIG. 6 shows an exemplary embodiment of the metal film 7 laminated on a part between the anode 2 and the hole transport layer 4. Figure 6 (a)
4 shows the case where the metal film 7 is laminated along the edge of the anode 2 so as to partially cover the surface of the anode 2 as shown in FIGS. FIG. 6B shows a case where the metal film 7 is laminated so as to partially cover the surface of the anode 2 over the edge of the anode 2 and the transparent substrate 6. FIG. 6C shows a case where the metal film 7 is laminated so as to partially cover the surface of the anode 2 at the central portion on the anode 2. Further, the partially formed metal film 7 may be laminated continuously or intermittently on the anode 2 along the extension direction thereof. 6 (a) to 6 (c)
As shown in FIG. 6, the side surface of the anode 2 may be formed on the transparent substrate 6 at a substantially right angle by anisotropic etching or the like. Further, as shown in FIG. When formed as an inclined surface, the metal film 7 is laminated so as to cover the surface of the inclined side surface and be adjacent to each other. In addition,
The metal film 7 may be a single metal or an alloy composed of a plurality of metals, and one having a work function as low as possible is more effective.

【0013】金属膜7によって、例えば図5に示すQ部
では、透明電極2側からの正孔輸送層4及び発光層3へ
の正孔の注入が抑制されるため、このQ部分の発光及び
流れる電流を減少させることができるとともに、陽極2
及び金属膜7の伸長方向の抵抗値は減少する。ところ
で、一般の例えば液晶ディスプレイや無機エレクトロル
ミネッセンスディスプレイ等の平面ディスプレイ装置に
おいても透明電極付基板が用いられ、基板の大型化、高
精細化にともなう透明電極ライン抵抗値の増大の問題が
ある。これを解消するために、図7に示すように透明基
板11及びITO透明電極12間に金属膜15を部分的
に挿入する方法が考えられる。
The metal film 7 suppresses the injection of holes from the transparent electrode 2 side into the hole transport layer 4 and the light emitting layer 3 in the Q portion shown in FIG. The flowing current can be reduced and the anode 2
Also, the resistance value of the metal film 7 in the extending direction decreases. By the way, a substrate with a transparent electrode is also used in a general flat display device such as a liquid crystal display or an inorganic electroluminescence display, and there is a problem that the resistance value of the transparent electrode line increases with the increase in size and definition of the substrate. In order to solve this, a method of partially inserting the metal film 15 between the transparent substrate 11 and the ITO transparent electrode 12 as shown in FIG. 7 can be considered.

【0014】かかる技術を基にして、図8に示すように
ガラス透明基板11上に、金属膜15、透明陽極12、
有機正孔輸送層4、発光層3及び金属陰極1が順に積層
された有機エレクトロルミネッセンス素子を作ると、図
8のP部の発光が、金属膜15に遮られてしまうのでこ
のP部分を流れる電流が無駄になり効率が悪い。そこ
で、図9に示すように透明電極12上の一部に絶縁膜1
6を積層することにより、P部の発光を防ぎこの部分を
流れる電流をなくす方法が考えられる。ところがこの方
法は、フォトリソグラフィの工程数が増えマスク位置合
わせが複雑になり、その製造が煩雑になる。
Based on this technique, as shown in FIG. 8, a metal film 15, a transparent anode 12,
When an organic electroluminescence device in which the organic hole transport layer 4, the light emitting layer 3 and the metal cathode 1 are laminated in this order is made, the light emission of the P portion in FIG. 8 is blocked by the metal film 15 and flows through this P portion. Current is wasted and efficiency is poor. Therefore, as shown in FIG. 9, the insulating film 1 is partially formed on the transparent electrode 12.
A method of preventing light emission from the P section and eliminating the current flowing through this section by stacking 6 is considered. However, in this method, the number of steps of photolithography increases, mask alignment becomes complicated, and its manufacturing becomes complicated.

【0015】本発明では、図4〜6に示すように透明電
極上の一部に少なくとも透明電極2より仕事関数の低い
金属膜7を積層することによって、かかる煩雑性を解消
している。すなわち、本発明によれば、図9に示す様な
複雑な構造を用いずに単純な構造で同様な効果を奏する
ことができる。 (実施例1)まず、ガラス基板上にITO(仕事関数=
約5.0eV)を約1000Å膜厚で2mm幅で形成し
透明陽極とした後、Al−Li合金(仕事関数=約3.
0eV)を10-5Torr以下の真空蒸着法で約500
Å膜厚で成膜し、ITO伸長方向に沿って透明電極の縁
部上に0.5mm幅となるようにフォトリソグラフィ法
によりパターニングし金属膜を積層した。この透明電極
及び金属膜を積層した基板上にN,N´−ジフェニル−
N,N´−ビス(3メチルフェニル)−1,1´−ビフ
ェニル−4,4´−ジアミン(TPD)からなる有機正
孔輸送層と、トリス(8−キノリノール)アルミニウム
(Alq3)からなる有機発光層をそれぞれ約500Å
膜厚で形成した後、ITO透明電極ラインと直交する方
向にAl−Li合金を約1000Åの膜厚で2mm幅で
形成し金属陰極とし、2mm×2mmの面積の有機エレ
クトロルミネッセンス素子を作製した。
In the present invention, as shown in FIGS. 4 to 6, by laminating the metal film 7 having a work function lower than that of the transparent electrode 2 on a part of the transparent electrode, the complexity is eliminated. That is, according to the present invention, the same effect can be achieved with a simple structure without using the complicated structure shown in FIG. Example 1 First, ITO (work function =
After forming about 5.0 eV) with a thickness of about 1000 Å to a width of 2 mm to form a transparent anode, an Al-Li alloy (work function = about 3.
0 eV) to about 500 by a vacuum deposition method of 10 −5 Torr or less.
A film having a thickness of Å was formed, and a metal film was formed by patterning by photolithography on the edge of the transparent electrode so as to have a width of 0.5 mm along the ITO extension direction. N, N'-diphenyl- was formed on the substrate on which the transparent electrode and the metal film were laminated.
Organic hole-transporting layer made of N, N'-bis (3methylphenyl) -1,1'-biphenyl-4,4'-diamine (TPD) and organic layer made of tris (8-quinolinol) aluminum (Alq3) About 500Å for each light emitting layer
After being formed with a film thickness, an Al-Li alloy having a film thickness of about 1000 Å was formed with a width of 2 mm in a direction orthogonal to the ITO transparent electrode line to serve as a metal cathode, and an organic electroluminescence device having an area of 2 mm x 2 mm was produced.

【0016】作製した素子の電流−輝度特性のグラフを
図10の実線Aに示す。また、このグラフに示す破線B
はITOより仕事関数の高い金属、例えばPt(仕事関
数=約5.65eV)を金属膜に用いた以外は実施例1
と同様に作成した比較例の有機エレクトロルミネッセン
ス素子の電流−輝度特性を示す。グラフに示すように、
実施例1は、仕事関数がITOより高い金属膜に用いた
比較例の素子に比べ効率が良くなった。 (実施例2)以下に本発明を二重マトリクス構造の透明
電極に応用した実施例を示す。
A solid line A in FIG. 10 shows a graph of current-luminance characteristics of the manufactured device. Also, the broken line B shown in this graph
Example 1 except that a metal having a work function higher than that of ITO, for example, Pt (work function = about 5.65 eV) was used for the metal film.
The current-luminance characteristic of the organic electroluminescent element of the comparative example produced similarly to is shown. As shown in the graph,
The efficiency of Example 1 was higher than that of the device of Comparative Example using a metal film having a work function higher than that of ITO. (Embodiment 2) The following is an embodiment in which the present invention is applied to a transparent electrode having a double matrix structure.

【0017】図11(a)に示すようにガラス基板6上
にITO透明電極2を形成し、フォトリソグラフィ法で
パターニングした後、Al−Li合金金属膜7をITO
透明電極2の島状発光部用電極領域R間の中間部分Sに
約500Å膜厚で、10-5Torr以下の真空蒸着及び
フォトリソグラフィ法で間歇的に形成した。この基板に
TPDの有機正孔輸送層及びAlq3の有機発光層をそ
れぞれ約500Åの膜厚で全面に渡って形成した後、I
TO透明電極ライン2と直交する方向に、図11(b)
に示すように、Al−Li合金金属陰極1(二点鎖線)
を1000Å膜厚で形成し、有機エレクトロルミネッセ
ンス素子を作製した。図12は、図11のBB’線に沿
った断面の一部を図1に示す。
As shown in FIG. 11A, the ITO transparent electrode 2 is formed on the glass substrate 6 and patterned by photolithography, and then the Al--Li alloy metal film 7 is ITO.
The transparent electrode 2 was intermittently formed in an intermediate portion S between the island-shaped light emitting portion electrode regions R with a film thickness of about 500 Å by vacuum deposition of 10 -5 Torr or less and photolithography. After forming an organic hole transport layer of TPD and an organic light emitting layer of Alq3 on this substrate with a film thickness of about 500Å over the entire surface, I
11B in a direction orthogonal to the TO transparent electrode line 2.
As shown in, Al-Li alloy metal cathode 1 (two-dot chain line)
Was formed with a thickness of 1000Å to prepare an organic electroluminescence device. FIG. 12 shows a part of the cross section taken along line BB ′ of FIG. 11.

【0018】まず、この基板のITO透明電極ライン2
の抵抗値を測定したところ約0.5KΩとなった。IT
O透明電極ライン2上にAl−Li合金金属膜7を積層
しない比較例のITO透明電極ライン2の抵抗値は、約
4.4KΩとなり、実施例2は、大幅にライン抵抗値を
小さくすることができた。実施例2の素子を約10Vで
駆動したところ、図11(b)に示す島状発光部用電極
領域R部は明るく緑色に発光した。また、図11(b)
に示す中間部分S部は発光せず、S部を膜厚方向に流れ
る電流はR部の1/1000程度とごくわずかであっ
た。
First, the ITO transparent electrode line 2 of this substrate
The resistance value of was measured to be about 0.5 KΩ. IT
The resistance value of the ITO transparent electrode line 2 of the comparative example in which the Al—Li alloy metal film 7 is not laminated on the O transparent electrode line 2 is about 4.4 KΩ, and the line resistance value is significantly reduced in Example 2. I was able to. When the element of Example 2 was driven at about 10 V, the island-shaped light emitting portion electrode region R portion shown in FIG. 11B emitted bright green light. Also, FIG. 11 (b)
The intermediate portion S portion shown in (1) did not emit light, and the current flowing through the portion S in the film thickness direction was about 1/1000 of that of the R portion, which was very small.

【0019】[0019]

【発明の効果】以上説明したように、本発明によれば、
陽極、有機化合物からなる正孔輸送層、有機化合物から
なる発光層及び陰極が順に積層された有機エレクトロル
ミネッセンス素子であって、陽極及び正孔輸送層間の一
部に積層された陽極より仕事関数の低い金属膜を有する
ので、製造工程が容易で低抵抗値である透明電極基板を
備えた高発光効率の有機エレクトロルミネッセンス素子
を得ることができる。
As described above, according to the present invention,
An organic electroluminescence device in which an anode, a hole transport layer made of an organic compound, a light emitting layer made of an organic compound, and a cathode are sequentially laminated, and the work function of the anode and the hole transport layer is partially laminated between the anode and the anode. Since it has a low metal film, it is possible to obtain an organic electroluminescence element having a high luminous efficiency, which is easy to manufacture and has a transparent electrode substrate having a low resistance value.

【図面の簡単な説明】[Brief description of drawings]

【図1】有機エレクトロルミネッセンス素子の概略部分
断面図である。
FIG. 1 is a schematic partial cross-sectional view of an organic electroluminescence element.

【図2】有機エレクトロルミネッセンス素子の概略部分
断面図である。
FIG. 2 is a schematic partial sectional view of an organic electroluminescence element.

【図3】図1に示す有機エレクトロルミネッセンス素子
の概略部分切欠斜視図である。
FIG. 3 is a schematic partially cutaway perspective view of the organic electroluminescent element shown in FIG.

【図4】本発明による実施例の有機エレクトロルミネッ
センス素子の概略部分切欠斜視図である。
FIG. 4 is a schematic partial cutaway perspective view of an organic electroluminescence device of an example according to the present invention.

【図5】本発明による実施例の有機エレクトロルミネッ
センス素子の概略部分断面図である。
FIG. 5 is a schematic partial cross-sectional view of an organic electroluminescent element of an example according to the present invention.

【図6】本発明の有機エレクトロルミネッセンス素子に
おける金属膜が陽極及び正孔輸送層間の一部に積層され
る例示的態様を示す概略部分断面図である。
FIG. 6 is a schematic partial cross-sectional view showing an exemplary embodiment in which the metal film in the organic electroluminescence element of the present invention is laminated on a part of the anode and the hole transport layer.

【図7】平面ディスプレイ装置における透明電極付基板
の概略部分断面図である。
FIG. 7 is a schematic partial cross-sectional view of a substrate with a transparent electrode in a flat display device.

【図8】有機エレクトロルミネッセンス素子の概略部分
断面図である。
FIG. 8 is a schematic partial cross-sectional view of an organic electroluminescence element.

【図9】有機エレクトロルミネッセンス素子の概略部分
断面図である。
FIG. 9 is a schematic partial cross-sectional view of an organic electroluminescence element.

【図10】本発明による実施例及び比較例の有機エレク
トロルミネッセンス素子の電流−輝度特性を示すグラフ
である。
FIG. 10 is a graph showing current-luminance characteristics of organic electroluminescent elements of Examples and Comparative Examples according to the present invention.

【図11】本発明による実施例の二重マトリクス構造の
透明電極を有する有機エレクトロルミネッセンス素子の
製造工程中における構成部材を示す概略平面図である。
FIG. 11 is a schematic plan view showing constituent members during a manufacturing process of an organic electroluminescent element having a transparent electrode having a double matrix structure according to an example of the present invention.

【図12】図11のBB’線に沿った断面の一部を示す
概略部分断面図である。
FIG. 12 is a schematic partial cross-sectional view showing a part of the cross section taken along the line BB ′ of FIG. 11.

【主要部分の符号の説明】[Explanation of symbols for main parts]

1 陰極、金属電極 2 陽極、透明電極 3 有機発光層 4 有機正孔輸送層 5 有機電子輸送層 6 基板 7 陽極より仕事関数の低い金属膜 1 Cathode, metal electrode 2 Anode, transparent electrode 3 Organic light emitting layer 4 Organic hole transport layer 5 Organic electron transport layer 6 substrate 7 Metal film with a lower work function than the anode

───────────────────────────────────────────────────── フロントページの続き (72)発明者 渡辺 輝一 埼玉県鶴ヶ島市富士見6丁目1番1号 パイオニア株式会社 総合研究所内 (56)参考文献 特開 平5−307997(JP,A) 特開 平4−82197(JP,A) 特開 平4−67596(JP,A) 特開 平4−51494(JP,A) 特開 平3−274694(JP,A) 特開 平3−250583(JP,A) 特開 平1−134895(JP,A) (58)調査した分野(Int.Cl.7,DB名) H05B 33/00 - 33/28 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Teruichi Watanabe 6-1, 1-1 Fujimi, Tsurugashima City, Saitama Pioneer Co., Ltd. Research Institute (56) Reference JP-A-5-307997 (JP, A) Japanese Patent Application Laid-Open No. 4-82197 (JP, A) Japanese Patent Application Laid-Open No. 4-67596 (JP, A) Japanese Patent Application Laid-Open No. 4-51494 (JP, A) Japanese Patent Application Laid-Open No. 3-274694 (JP, A) Japanese Patent Application Laid-Open No. 3-250583 (JP , A) JP-A-1-134895 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) H05B 33/00-33/28

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 陽極、有機化合物からなる正孔輸送層、
有機化合物からなる発光層及び陰極が順に積層された有
機エレクトロルミネッセンス素子であって、補助電極上
陽極上の一部に積層されかつ前記発光層の一部に流れ
る電流を減少せしめる絶縁膜を有することを特徴とする
有機エレクトロルミネッセンス素子。
1. A positive electrode, a hole transport layer comprising an organic compound,
An organic electroluminescence device in which a light emitting layer made of an organic compound and a cathode are sequentially stacked, and having an insulating film laminated on a part of an anode on an auxiliary electrode and reducing a current flowing through a part of the light emitting layer. An organic electroluminescence device characterized by the above.
【請求項2】 前記陰極及び前記発光層間に有機電子輸
送層が配されたことを特徴とする請求項1記載の有機エ
レクトロルミネッセンス素子。
2. The organic electroluminescent device according to claim 1, further comprising an organic electron transport layer disposed between the cathode and the light emitting layer.
JP2001272861A 2001-09-10 2001-09-10 Organic electroluminescence device Expired - Fee Related JP3518682B2 (en)

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Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP4111455A Division JPH05307997A (en) 1992-04-30 1992-04-30 Organic electroluminescent element

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US6717358B1 (en) * 2002-10-09 2004-04-06 Eastman Kodak Company Cascaded organic electroluminescent devices with improved voltage stability
WO2006098420A1 (en) * 2005-03-17 2006-09-21 Pioneer Corporation Light-emitting device and display
JPWO2011016086A1 (en) 2009-08-05 2013-01-10 株式会社東芝 Organic electroluminescent device and manufacturing method thereof
DE102014112204A1 (en) * 2014-08-26 2016-03-03 Osram Oled Gmbh Optoelectronic device

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