JP3516062B2 - Low friction material and its manufacturing method - Google Patents

Low friction material and its manufacturing method

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Publication number
JP3516062B2
JP3516062B2 JP2001316973A JP2001316973A JP3516062B2 JP 3516062 B2 JP3516062 B2 JP 3516062B2 JP 2001316973 A JP2001316973 A JP 2001316973A JP 2001316973 A JP2001316973 A JP 2001316973A JP 3516062 B2 JP3516062 B2 JP 3516062B2
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JP
Japan
Prior art keywords
atmosphere
copper oxide
thin film
low
low friction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2001316973A
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Japanese (ja)
Other versions
JP2003119578A (en
Inventor
真宏 後藤
章 笠原
正弘 土佐
一紘 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute for Materials Science
Original Assignee
National Institute for Materials Science
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Publication date
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Publication of JP2003119578A publication Critical patent/JP2003119578A/en
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  • Other Surface Treatments For Metallic Materials (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この出願の発明は、低摩擦材
料とその作製方法に関するものである。さらに詳しく
は、この出願の発明は、大気から超高真空雰囲気まで優
れた低摩擦特性を安定して示し、高湿度から乾燥状態ま
での繰り返し使用を可能とする高い耐久性、長寿命化が
期待される、新しい低摩擦材料とその作製方法に関する
ものである。
TECHNICAL FIELD The invention of this application relates to a low friction material and a method for producing the same. More specifically, the invention of this application stably exhibits excellent low-friction characteristics from the atmosphere to the ultra-high vacuum atmosphere, and is expected to have high durability and a long life, which enables repeated use from high humidity to dry conditions. The present invention relates to a new low friction material and a manufacturing method thereof.

【0002】[0002]

【従来の技術とその課題】宇宙ステーションの駆動部な
どの真空中で使用される低摩擦材料には、MoS2、WS2
どの硫化物系薄膜の使用が主流となっている。しかしな
がら、宇宙空間では、原子状酸素の衝突による材料の表
面酸化が起こりやすく、このため、駆動部材の寿命には
限りがあった。また、上記硫化物系薄膜は層状物質であ
るため、摩擦により摩擦粉が生じ、その結果、周辺機器
に影響を及ぼすという問題もあった。
2. Description of the Related Art The use of sulfide-based thin films such as MoS 2 and WS 2 has become the mainstream for low friction materials used in a vacuum such as the drive part of a space station. However, in outer space, the surface oxidation of the material is likely to occur due to the collision of atomic oxygen, which limits the life of the driving member. Further, since the sulfide-based thin film is a layered substance, there is a problem that friction powder is generated due to friction, and as a result, it affects peripheral devices.

【0003】以上の問題を解消するために、真空中で使
用される駆動部材、特に摺動部材、の表面をあらかじめ
酸化しておき、表面硬度を大きくした材料を使用するな
どの対応が検討されたが、従来、候補に上がった酸化物
の中で前記MoS2、WS2などの硫化物系薄膜に匹敵する低
摩擦特性を示すものは見出されていない。
In order to solve the above problems, measures such as previously oxidizing the surface of the driving member used in vacuum, especially the sliding member, and using a material having a large surface hardness have been studied. However, conventionally, none of the oxides that have been selected as candidates has a low friction characteristic comparable to that of sulfide-based thin films such as MoS 2 and WS 2 .

【0004】他方、地上と上空を繰り返し行き来する航
空機用の駆動部材については、大気から減圧雰囲気まで
十分な低摩擦特性を示すばかりでなく、高湿度から乾燥
状態までの繰り返し使用を可能とする高い耐久性、長寿
命の材料であることが望まれる。ところが、前述のMo
S2、WS2など硫化物は高湿度に弱いという問題もあっ
た。
On the other hand, a driving member for an aircraft, which repeatedly travels between the ground and the sky, not only exhibits sufficiently low friction characteristics from the atmosphere to a depressurized atmosphere, but also has a high level that enables repeated use from high humidity to dry conditions. A durable and long-life material is desired. However, the above-mentioned Mo
There is also a problem that sulfides such as S 2 and WS 2 are weak in high humidity.

【0005】さらに、航空宇宙分野に限らず、他の分
野、たとえば電力分野などにおいても、真空中で低摩擦
特性を示す長寿命でクリーンな材料への要求が潜在的に
ある。たとえば真空遮断器材料などがそれに該当する。
Furthermore, not only in the aerospace field, but also in other fields such as the power field, there is a potential demand for a long-life and clean material exhibiting low friction characteristics in vacuum. For example, vacuum circuit breaker material corresponds to this.

【0006】この出願の発明は、このような事情に鑑み
てなされたものであり、大気から超高真空雰囲気まで優
れた低摩擦特性を安定して示し、高湿度から乾燥状態ま
での繰り返し使用を可能とする高い耐久性、長寿命化が
期待される、新しい低摩擦材料とその作製方法を提供す
ることを解決すべき課題としている。
The invention of this application has been made in view of such circumstances, and stably exhibits excellent low-friction characteristics from the atmosphere to the ultra-high vacuum atmosphere, and can be repeatedly used from high humidity to dry conditions. It is an issue to be solved to provide a new low friction material and a method for producing the same, which are expected to have high durability and long life.

【0007】[0007]

【課題を解決するための手段】この出願の発明の発明者
らは、CuBN薄膜の表面にエキシマレーザを照射すると、
摩擦力が低下する現象を発見した。この現象の原因を調
べると、薄膜の表面付近の層に大量の酸素原子が打ち込
まれていることが確認された。1800回のレーザ照射によ
り酸化される薄膜の厚さは、約400nmであった。
Means for Solving the Problems The inventors of the invention of this application, when the surface of a CuBN thin film is irradiated with an excimer laser,
We have found a phenomenon that the frictional force decreases. When the cause of this phenomenon was investigated, it was confirmed that a large amount of oxygen atoms were implanted in the layer near the surface of the thin film. The thickness of the thin film oxidized by 1800 laser irradiations was about 400 nm.

【0008】そこで、Cu, B, N, 及びO原子を組み合わ
せ、各種の化合物からなる薄膜を作製し、その摩擦測定
を行った結果、銅酸化物が特に低い摩擦特性を示すこと
が明らかとなった。そして、CuOをターゲットとし、銅
酸化物のみからなる薄膜を作製したところ、大気から超
高真空雰囲気まで、また、高湿度から乾燥状態まで、後
述する実施例に示すような低い摩擦力となることが見出
された。この出願の発明は、以上の技術知見に基づいて
完成されたものである。
Then, thin films made of various compounds were prepared by combining Cu, B, N, and O atoms, and the friction was measured. As a result, it became clear that copper oxide shows particularly low friction characteristics. It was Then, targeting CuO, when a thin film made of only copper oxide was produced, from the atmosphere to the ultra-high vacuum atmosphere, and from high humidity to the dry state, a low frictional force as shown in Examples to be described later is obtained. Was found. The invention of this application has been completed based on the above technical findings.

【0009】すなわち、この出願の発明は、前述の課題
を解決するものとして、基材表面に銅酸化物の薄膜が形
成され、大気から超高真空雰囲気まで低摩擦特性を示す
ことを特徴とする低摩擦材料(請求項1)を提供する。
That is, the invention of this application is characterized in that a thin film of a copper oxide is formed on the surface of a base material and has a low friction property from the atmosphere to the ultra-high vacuum atmosphere in order to solve the above-mentioned problems. A low friction material (claim 1) is provided.

【0010】また、この出願の発明は、請求項1に係る
発明に関し、銅酸化物の薄膜は、その組成がCuOであ
り、微結晶若しくはアモルファス状態にあること(請求
項2)を一実施形態として提供する。
The invention of this application relates to the invention according to claim 1, wherein the copper oxide thin film has a composition of CuO and is in a microcrystalline or amorphous state (claim 2). To serve as.

【0011】さらに、この出願の発明は、銅酸化物をタ
ーゲットとし、マグネトロンスパッタ蒸着法により基材
表面に銅酸化物の薄膜を形成し、大気から超高真空雰囲
気まで低摩擦特性を示す低摩擦材料を作製することを特
徴とする低摩擦材料の作製方法(請求項3)を提供す
る。
Further, according to the invention of this application, a copper oxide thin film is formed on the surface of a base material by a magnetron sputter deposition method using copper oxide as a target, and a low friction property showing low friction characteristics from the atmosphere to an ultra-high vacuum atmosphere. A method for producing a low-friction material (claim 3), characterized in that the material is produced.

【0012】そして、銅酸化物の薄膜は、その組成がCu
Oであり、微結晶若しくはアモルファス状態にあること
(請求項4)を一実施形態として提供する。
The composition of the copper oxide thin film is Cu.
It is provided as an embodiment that it is O and is in a microcrystalline or amorphous state (claim 4).

【0013】[0013]

【発明の実施の形態】以下、実施例を示しつつ、この出
願の発明の低摩擦材料とその作製方法についてさらに詳
しく説明する。
BEST MODE FOR CARRYING OUT THE INVENTION The low friction material of the invention of this application and the method for producing the same will be described in more detail below with reference to Examples.

【0014】[0014]

【実施例】銅酸化物(CuO)をターゲットとし、基板との
距離を3cmとして100Wのパワーで高周波マグネトロンス
パッタ蒸着法により、真空中で使用される駆動材料とし
て汎用的な、SUS304ステンレス鋼製圧子材の表面に銅酸
化物の薄膜を成膜した。その膜厚は、約3μmであった。
そして、大気から超高真空領域まで雰囲気を変化させて
この圧子材間での摩擦係数を測定した。その結果を示し
たのが表1である。
[Example] An indenter made of SUS304 stainless steel, which is a general-purpose driving material used in a vacuum by a high frequency magnetron sputter deposition method with a power of 100 W, a target of copper oxide (CuO) and a distance of 3 cm from the substrate. A thin film of copper oxide was formed on the surface of the material. The film thickness was about 3 μm.
Then, the friction coefficient between the indenter materials was measured by changing the atmosphere from the atmosphere to the ultra-high vacuum region. Table 1 shows the result.

【0015】[0015]

【表1】 [Table 1]

【0016】表1に示した通り、SUS304ステンレス鋼圧
子材の摩擦係数は、大気、超高真空雰囲気ともにほとん
ど変わらず、非常に良好な極低摩擦特性を示すことが確
認される。
As shown in Table 1, it is confirmed that the friction coefficient of the SUS304 stainless steel indenter material hardly changes in the atmosphere and the ultra-high vacuum atmosphere, and that it shows very good extremely low friction characteristics.

【0017】また、このSUS304ステンレス鋼製圧子材の
摩擦係数は、雰囲気を高湿度から乾燥状態へ、逆に乾燥
状態から高湿度状態に戻しても、その極低摩擦特性を保
持した。
The friction coefficient of the indenter material made of SUS304 stainless steel maintained its extremely low friction characteristic even when the atmosphere was changed from high humidity to dry condition and vice versa.

【0018】圧子材を構成する材料による摩擦特性の依
存性を調べるために、SUS304ステンレス鋼とは全く性質
の異なるアルミナセラミックス製圧子材の表面に、同様
に、銅酸化物をターゲットとし、高周波マグネトロンス
パッタ蒸着法により、銅酸化物の薄膜を成膜した。そし
て、大気から超高真空領域まで雰囲気を変化させてこの
圧子材間での摩擦係数を測定した。その結果を表1に合
わせて示した。
In order to investigate the dependence of frictional characteristics on the material forming the indenter material, a copper oxide target was similarly used on the surface of an alumina ceramic indenter material having completely different properties from SUS304 stainless steel, and a high frequency magnetron was used. A thin film of copper oxide was formed by the sputter deposition method. Then, the friction coefficient between the indenter materials was measured by changing the atmosphere from the atmosphere to the ultra-high vacuum region. The results are also shown in Table 1.

【0019】圧子材を構成する材料にかかわらず、大
気、超真空雰囲気とも変わらない非常に良好な極低摩擦
特性を示すことが確認される。
It is confirmed that regardless of the material forming the indenter material, it exhibits very good extremely low friction characteristics which are the same as those in the atmosphere and the ultra-vacuum atmosphere.

【0020】以上の結果から、この出願の発明の低摩擦
材料は、大気から超高真空雰囲気まで優れた低摩擦特性
を安定して示すものであり、しかも、表面はすでに酸化
物が形成されているため、酸化の影響は小さいと考えら
れ、したがって、宇宙ステーションや航空機などの過酷
な環境下で使用される駆動部材用材料として適用可能で
あり、その長寿命化が図られると考えられる。また、表
面の銅酸化物薄膜により、高湿度から乾燥状態までの繰
り返し使用を可能とする高い耐久性、長寿命化が期待さ
れる。このことから、上記駆動部材に従来必要であった
非常に高額なメンテナンスコストの削減が図られ、経済
的にも有利となる。
From the above results, the low-friction material of the invention of this application stably exhibits excellent low-friction characteristics from the atmosphere to the ultra-high vacuum atmosphere, and moreover, the surface thereof already has an oxide formed thereon. Therefore, it is considered that the influence of oxidation is small, and therefore, it can be applied as a material for a driving member used in a harsh environment such as a space station or an aircraft, and it is considered that its life can be extended. In addition, the copper oxide thin film on the surface is expected to have high durability and long life, which enables repeated use from high humidity to dry conditions. For this reason, it is possible to reduce a very expensive maintenance cost which has been conventionally required for the drive member, which is economically advantageous.

【0021】なお、実施例において作製した圧子材表面
の銅酸化物の薄膜については、XRD(X線回折法)の結
果、回折スペクトルが観察されなかった。したがって、
銅酸化物の薄膜は、CuOの微結晶若しくはアモルファス
状態にあると考えられる。このことは、オージェ電子ス
ペクトルの結果と一致しており、オージェ電子スペクト
ルの結果からは、150Å以上の分解能では、CuとOとが偏
りなく一面に分布していることが確認された。したがっ
て、実施例において作製した圧子材表面の銅酸化物の薄
膜は、CuOの微結晶若しくはアモルファス状態にあると
考えられる。CuOの結晶ピークが現れる薄膜は、摩擦力
が結晶ピークの現れない薄膜よりも非常に大きな、これ
までに酸化銅材料について確認されている摩擦力に相当
する摩擦力を示す。
As for the copper oxide thin film on the surface of the indenter produced in the example, no diffraction spectrum was observed as a result of XRD (X-ray diffraction method). Therefore,
The copper oxide thin film is considered to be in the fine crystal or amorphous state of CuO. This is in agreement with the result of Auger electron spectrum, and it was confirmed from the result of Auger electron spectrum that Cu and O were uniformly distributed over one surface at a resolution of 150 Å or higher. Therefore, it is considered that the copper oxide thin film on the surface of the indenter produced in the example is in the fine crystal or amorphous state of CuO. The thin film in which the CuO crystal peak appears exhibits a frictional force which is much larger than that of the thin film in which no crystal peak appears, and which is equivalent to the frictional force confirmed for copper oxide materials so far.

【0022】もちろん、この出願の発明は、以上の実施
例により限定されるものではない。基材の材質、マグネ
トロンスパッタ蒸着法の条件などの細部については様々
な態様が可能であることはいうまでもない。
Of course, the invention of this application is not limited to the above embodiments. It goes without saying that various aspects are possible in terms of details such as the material of the base material and the conditions of the magnetron sputter deposition method.

【0023】[0023]

【発明の効果】以上詳しく説明した通り、この出願の発
明によって、大気から超高真空雰囲気まで優れた低摩擦
特性を安定して示し、高湿度から乾燥状態までの繰り返
し使用を可能とする高い耐久性、長寿命化が期待され
る、新しい低摩擦材料が提供される。
As described in detail above, according to the invention of this application, excellent low friction characteristics are stably exhibited from the atmosphere to the ultra-high vacuum atmosphere, and high durability which enables repeated use from high humidity to dry state. A new low-friction material, which is expected to have long life and longevity, is provided.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平3−44483(JP,A) 特開2000−199080(JP,A) (58)調査した分野(Int.Cl.7,DB名) C23C 30/00 C23C 14/34 F16C 33/12 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-3-44483 (JP, A) JP-A 2000-199080 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) C23C 30/00 C23C 14/34 F16C 33/12

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基材表面に銅酸化物の薄膜が形成され、
大気から超高真空雰囲気まで低摩擦特性を示すことを特
徴とする低摩擦材料。
1. A copper oxide thin film is formed on the surface of a substrate,
A low-friction material characterized by exhibiting low-friction properties from the atmosphere to the ultra-high vacuum atmosphere.
【請求項2】 銅酸化物の薄膜は、その組成がCuOであ
り、微結晶若しくはアモルファス状態にある請求項1記
載の低摩擦材料。
2. The low friction material according to claim 1, wherein the copper oxide thin film has a composition of CuO and is in a microcrystalline or amorphous state.
【請求項3】 銅酸化物をターゲットとし、マグネトロ
ンスパッタ蒸着法により基材表面に銅酸化物の薄膜を形
成し、大気から超高真空雰囲気まで低摩擦特性を示す低
摩擦材料を作製することを特徴とする低摩擦材料の作製
方法。
3. A low-friction material that exhibits low-friction properties from the atmosphere to an ultra-high vacuum atmosphere is formed by forming a thin film of copper oxide on the surface of a base material by a magnetron sputter deposition method using copper oxide as a target. A method for producing a characteristic low friction material.
【請求項4】 銅酸化物の薄膜は、その組成がCuOであ
り、微結晶若しくはアモルファス状態にある請求項3記
載の低摩擦材料の作製方法。
4. The method for producing a low friction material according to claim 3, wherein the copper oxide thin film has a composition of CuO and is in a microcrystalline or amorphous state.
JP2001316973A 2001-10-15 2001-10-15 Low friction material and its manufacturing method Expired - Lifetime JP3516062B2 (en)

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JP3516062B2 true JP3516062B2 (en) 2004-04-05

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004094687A1 (en) * 2003-04-24 2004-11-04 National Institute For Materials Science Copper oxide thin film low-friction material and film-forming method therefor

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