JP3506180B2 - Cyclic organosilicon compound and method for producing the same - Google Patents
Cyclic organosilicon compound and method for producing the sameInfo
- Publication number
- JP3506180B2 JP3506180B2 JP03860093A JP3860093A JP3506180B2 JP 3506180 B2 JP3506180 B2 JP 3506180B2 JP 03860093 A JP03860093 A JP 03860093A JP 3860093 A JP3860093 A JP 3860093A JP 3506180 B2 JP3506180 B2 JP 3506180B2
- Authority
- JP
- Japan
- Prior art keywords
- compound
- chemical formula
- formula
- reaction
- ppm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 Cyclic organosilicon compound Chemical class 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000000126 substance Substances 0.000 claims description 38
- 150000001875 compounds Chemical class 0.000 claims description 31
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 16
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- 239000003054 catalyst Substances 0.000 claims description 12
- 125000003342 alkenyl group Chemical group 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 150000004681 metal hydrides Chemical class 0.000 claims description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- 229910052987 metal hydride Inorganic materials 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 39
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 150000001923 cyclic compounds Chemical class 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000003849 aromatic solvent Substances 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000000434 field desorption mass spectrometry Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- WLXDJYZDTGKMSI-UHFFFAOYSA-N fluoro-[2-[fluoro(dimethyl)silyl]ethynyl]-dimethylsilane Chemical group C[Si](C)(F)C#C[Si](C)(C)F WLXDJYZDTGKMSI-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- 238000001819 mass spectrum Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Substances C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- SWJXYIHLHXRZNT-UHFFFAOYSA-N 1,5-diphenylpenta-1,4-dien-3-one;platinum Chemical compound [Pt].C=1C=CC=CC=1C=CC(=O)C=CC1=CC=CC=C1.C=1C=CC=CC=1C=CC(=O)C=CC1=CC=CC=C1 SWJXYIHLHXRZNT-UHFFFAOYSA-N 0.000 description 1
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910002621 H2PtCl6 Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910010082 LiAlH Inorganic materials 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910019032 PtCl2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910008284 Si—F Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- 229910000102 alkali metal hydride Inorganic materials 0.000 description 1
- 150000008046 alkali metal hydrides Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- NQZFAUXPNWSLBI-UHFFFAOYSA-N carbon monoxide;ruthenium Chemical compound [Ru].[Ru].[Ru].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] NQZFAUXPNWSLBI-UHFFFAOYSA-N 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- WMKGGPCROCCUDY-PHEQNACWSA-N dibenzylideneacetone Chemical compound C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 WMKGGPCROCCUDY-PHEQNACWSA-N 0.000 description 1
- DHCWLIOIJZJFJE-UHFFFAOYSA-L dichlororuthenium Chemical compound Cl[Ru]Cl DHCWLIOIJZJFJE-UHFFFAOYSA-L 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910021482 group 13 metal Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- XAFJSPPHVXDRIE-UHFFFAOYSA-L platinum(2+);triphenylphosphane;dichloride Chemical compound [Cl-].[Cl-].[Pt+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 XAFJSPPHVXDRIE-UHFFFAOYSA-L 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、耐熱性及び耐燃焼性材
料の原料として有用な、従来になかった新しい環状有機
ケイ素化合物とその製造法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel cyclic organosilicon compound, which has never been used before, and is useful as a raw material for heat resistant and flammable materials, and a process for producing the same.
【0002】[0002]
【従来の技術】本化合物は有効な合成手段が知られてお
らず製造できなかった。2. Description of the Related Art This compound could not be produced because of no known effective synthetic means.
【0003】[0003]
【発明が解決しようとする課題】本発明は、新規な環状
有機ケイ素化合物を合成することを目的とする。SUMMARY OF THE INVENTION The present invention aims at synthesizing a novel cyclic organosilicon compound.
【0004】[0004]
【課題を解決するための手段】本発明の環状有機ケイ素
化合物は化学式(1)The cyclic organosilicon compound of the present invention has the chemical formula (1)
【0005】[0005]
【化6】
(上式中、mは2〜20の整数、R1 ,R2 は炭素数1
〜10のアルキル基、アルケニル基または低級アルキル
基、低級アルケニル基、低級アルコキシ基もしくはハロ
ゲンで置換されていてもよいフェニル基である。R1 ,
R2 は例えば−CH 3 ,−C2H5,−C3H7,−CH(CH3)2,−
C4H9,−CH=CH2 ,−CH2 −CH=CH2 ,−C6H13 ,−C8
H17 ,−C10H21,−C6H5,−C6H4(CH3) ,−C6H4(CH =
CH2),−C6H4(OCH3),−C6H4Brなどである。)で示され
る。[Chemical 6]
(In the above formula, m is an integer of 2 to 20, R1 , R2 Has 1 carbon
-10 alkyl group, alkenyl group or lower alkyl
Group, lower alkenyl group, lower alkoxy group or halo
It is a phenyl group which may be substituted with gen. R1 ,
R2 Is for example -CH 3 , -C2HFive, -C3H7, -CH (CH3)2,-
CFourH9, -CH = CH2 , -CH2 -CH = CH2 , -C6H13 , -C8
H17 , -CTenHtwenty one, -C6HFive, -C6HFour(CH3), −C6HFour(CH =
CH2), −C6HFour(OCH3), −C6HFourBr and so on. ) Indicated by
It
【0006】また本発明の環状有機ケイ素化合物は化学
式(2)The cyclic organosilicon compound of the present invention has the chemical formula (2)
【0007】[0007]
【化7】
(上式中、nは2〜20の整数、R1 ,R2 は炭素数1
〜10のアルキル基、アルケニル基または低級アルキル
基、低級アルケニル基、低級アルコキシ基もしくはハロ
ゲンで置換されていてもよいフェニル基である。R1 ,
R2 は例えば−CH 3 ,−C2H5,−C3H7,−CH(CH3)2,−
C4H9,−CH=CH2 ,−CH2 −CH=CH2 ,−C6H13 ,−C8
H17 ,−C10H21,−C6H5,−C6H4(CH3) ,−C6H4(CH =
CH2),−C6H4(OCH3),−C6H4Brなどである。)で示され
る。[Chemical 7]
(In the above formula, n is an integer of 2 to 20, R1 , R2 Has 1 carbon
-10 alkyl group, alkenyl group or lower alkyl
Group, lower alkenyl group, lower alkoxy group or halo
It is a phenyl group which may be substituted with gen. R1 ,
R2 Is for example -CH 3 , -C2HFive, -C3H7, -CH (CH3)2,-
CFourH9, -CH = CH2 , -CH2 -CH = CH2 , -C6H13 , -C8
H17 , -CTenHtwenty one, -C6HFive, -C6HFour(CH3), −C6HFour(CH =
CH2), −C6HFour(OCH3), −C6HFourBr and so on. ) Indicated by
It
【0008】また本発明は、化学式(2)の化合物と化
学式(3)The present invention also provides a compound of formula (2) and a compound of formula (3)
【0009】[0009]
【化8】
(上式中、R2 は炭素数1〜10のアルキル基、アルケ
ニル基または低級アルキル基、低級アルケニル基、低級
アルコキシ基もしくはハロゲンで置換されていてもよい
フェニル基である。)のビス(フロロシリル)アセチレ
ン化合物とを触媒の存在下に反応させて化学式(1)の
化合物を製造する方法、および化学式(1)の化合物を
金属水素化物で還元して化学式(2)の化合物を製造す
る方法である。それぞれの反応式を以下に示す(反応式
(a)および(b))。[Chemical 8] (In the above formula, R 2 is an alkyl group having 1 to 10 carbon atoms, an alkenyl group, a lower alkyl group, a lower alkenyl group, a lower alkoxy group or a phenyl group which may be substituted with halogen.) Bis (fluorosilyl) ) A method of producing a compound of formula (1) by reacting with an acetylene compound in the presence of a catalyst, and a method of producing a compound of formula (2) by reducing a compound of formula (1) with a metal hydride. is there. The respective reaction formulas are shown below (reaction formulas (a) and (b)).
【0010】[0010]
【化9】 [Chemical 9]
【0011】[0011]
【化10】
mが2である化学式(1)の化合物を製造するのに必要
な化学式(2)(ただしnは1)で示される化合物とそ
の製造法については本発明者らが別に出願中である。反
応式(a)と反応式(b)による反応を交互に逐次繰り
返すことによりそれぞれmおよびnが2〜20の化学式
(1)および(2)の化合物を製造することができる。[Chemical 10] The present inventors have separately filed a patent for the compound represented by the chemical formula (2) (where n is 1) necessary for producing the compound of the chemical formula (1) in which m is 2. The compounds of the chemical formulas (1) and (2) in which m and n are 2 to 20 can be produced by alternately and sequentially repeating the reactions according to the reaction formulas (a) and (b).
【0012】化学式(1)の化合物を製造する際に用い
る触媒は白金、パラジウムまたはルテニウムいずれかの
錯体である。具体例としてはPt触媒として、Pt(dba)2
(dba:ジベンジリデンアセトン),Pt(CH2=CH2)(P
Ph3)2 ,PtCl2(PPh3)2,PtCl 2(PO3C6H11)2,Pt(PPh3)
4 ,Pt(PO3C6H11)4 ,Pt(CO)2Pt(PPh3)2,Pt(PhCCPh)(P
Ph3)2 ,Pt(C8H12)2,H2PtCl6 、Pd触媒として、Pd(db
a)2,Pd(CH2=CH2)(PPh3) 2 ,Pd(PO3C6H11)2 ,Pd(CH2
=CH2)(PO3C6H11)2 ,Pd(PPh3)4 ,Pd(PO3C6H11)4,PdC
l2 ,Pd(CH3COO)2 ,Ru触媒として、RuCl2(PPh3)3,RuC
l2(PO3C6H11)3,RuCl2(CO)3,Ru3(CO)12 などが挙げら
れる。特に好ましくは、Pt(dba)2,Pt(CH2=CH2)(PPh3)
2 である。またこれらの触媒は助触媒として触媒の1〜
10等量のNEt3、PPh3等の配位子を加えてもよい。例を
挙げれば、PtCl2(PPh3)2にNEt3を2等量加えて用いる、
Pt(dba)2にPPh3を2等量加えて用いる等である。Used in the production of compounds of formula (1)
The catalyst is either platinum, palladium or ruthenium
It is a complex. As a specific example, as a Pt catalyst, Pt (dba)2
(Dba: dibenzylideneacetone), Pt (CH2= CH2) (P
Ph3)2 , PtCl2(PPh3)2, PtCl 2(PO3C6H11)2, Pt (PPh3)
Four , Pt (PO3C6H11)Four , Pt (CO)2Pt (PPh3)2, Pt (PhCCPh) (P
Ph3)2 , Pt (C8H12)2, H2PtCl6 , Pd as a catalyst, Pd (db
a)2, Pd (CH2= CH2) (PPh3) 2 , Pd (PO3C6H11)2 , Pd (CH2
= CH2) (PO3C6H11)2 , Pd (PPh3)Four , Pd (PO3C6H11)Four, PdC
l2 , Pd (CH3(COO)2 , RuCl as a Ru catalyst2(PPh3)3, RuC
l2(PO3C6H11)3, RuCl2(CO)3, Ru3(CO)12 Etc.
Be done. Particularly preferably, Pt (dba)2, Pt (CH2= CH2) (PPh3)
2 Is. In addition, these catalysts can be used as co-catalysts
10 equivalent NEt3, PPh3Ligands such as may be added. An example
PtCl2(PPh3)2To NEt3Is used by adding 2 equivalents of
Pt (dba)2To PPh3Is used by adding 2 equivalents thereof.
【0013】化学式(2)の化合物を製造する際に用い
る金属水素化物の具体例としては、アルカリ金属水素化
物としてはLiH、NaH、KH、RbH、CsH等、
アルカリ土類金属水素化物としてはMgH2 、CaH
2 、SrH2 、BaH2 等、13族金属水素化物として
はBH3 錯体、AlH3 錯体等、複合金属水素化物とし
てはLiAlH4 、NaAlH4 、KAlH4 、LiB
H4 、NaBH4 、KBH4 、Mg(BH4 )2 、Ca
(BH4 )2 、Ba(BH4 )2 、Sr(BH4)2 、
Al(BH4 )3 等が挙げられる。Specific examples of the metal hydride used for producing the compound of the chemical formula (2) include alkali metal hydrides such as LiH, NaH, KH, RbH and CsH.
As alkaline earth metal hydride, MgH 2 , CaH
2 , SrH 2 , BaH 2 and the like, BH 3 complex, AlH 3 complex and the like as group 13 metal hydride, and LiAlH 4 , NaAlH 4 , KAlH 4 and LiB as complex metal hydride.
H 4, NaBH 4, KBH 4 , Mg (BH 4) 2, Ca
(BH 4 ) 2 , Ba (BH 4 ) 2 , Sr (BH 4 ) 2 ,
Examples thereof include Al (BH 4 ) 3 .
【0014】製造法を説明する。化学式(1)に示す化
合物の製造方法は、反応容器内に化学式(2)で示され
た環状化合物、化学式(3)で示されたアセチレン化合
物、触媒を仕込む。必要に応じて溶媒も仕込む。これら
の反応容器への仕込みの順序は特に限定するものではな
い。これらを同時に混合してもよいし、原料の一方ない
し両方を反応中に連続してもしくは断続的に反応容器内
に供給してもよい。反応容器内は反応前に高純度窒素、
高純度アルゴン等の不活性ガスで置換することが好まし
い。反応容器を所定の反応温度に制御しつつ、攪拌しな
がら所定の時間反応させる。目的の化合物は反応液から
デカンテーション、濾過、溶媒による抽出、蒸留、クロ
マトグラフィーなど通常の方法で容易に分離精製するこ
とができる。The manufacturing method will be described. In the method for producing the compound represented by the chemical formula (1), a cyclic compound represented by the chemical formula (2), an acetylene compound represented by the chemical formula (3), and a catalyst are charged in a reaction vessel. A solvent is also added if necessary. The order of charging these reaction vessels is not particularly limited. These may be mixed simultaneously, or one or both of the raw materials may be continuously or intermittently fed into the reaction vessel during the reaction. High-purity nitrogen before the reaction in the reaction vessel,
It is preferable to replace with an inert gas such as high-purity argon. The reaction is performed for a predetermined time while stirring while controlling the reaction container to a predetermined reaction temperature. The desired compound can be easily separated and purified from the reaction solution by a usual method such as decantation, filtration, extraction with a solvent, distillation and chromatography.
【0015】化学式(2)の環状化合物に対する触媒の
量は化合物1molに対して0.0001〜0.5mo
l、より好ましくは0.001〜0.1molである。The amount of the catalyst for the cyclic compound represented by the chemical formula (2) is 0.0001 to 0.5 mo / mol of the compound.
1, more preferably 0.001 to 0.1 mol.
【0016】溶媒はベンゼンやトルエン等の芳香族系溶
剤やシクロヘキサンや正ヘプタン等の飽和炭化水素系溶
剤等が有効に用いられる。化学式(2)の環状化合物に
対する溶媒の量は、該化合物1mmolに対して0.2
〜200ml、より好ましくは2〜20mlが適当であ
る。As the solvent, aromatic solvents such as benzene and toluene and saturated hydrocarbon solvents such as cyclohexane and normal heptane are effectively used. The amount of the solvent for the cyclic compound of the chemical formula (2) is 0.2 per 1 mmol of the compound.
〜200 ml, more preferably 2-20 ml is suitable.
【0017】反応に用いるアセチレン化合物の量は化学
式(2)の環状化合物1molに対して0.02〜20
0mol、より好ましくは0.2〜20mol、更に好
ましくは2〜4molが適当である。The amount of the acetylene compound used in the reaction is 0.02 to 20 with respect to 1 mol of the cyclic compound of the chemical formula (2).
0 mol, more preferably 0.2 to 20 mol, still more preferably 2 to 4 mol is suitable.
【0018】反応温度は0℃〜200℃、より好ましく
は20〜150℃、更に好ましくは60〜100℃が適
当である。The reaction temperature is 0 ° C to 200 ° C, more preferably 20 to 150 ° C, still more preferably 60 to 100 ° C.
【0019】反応時間は仕込んだ化合物や触媒の量にも
よるが1〜100時間、より好ましくは5〜50時間が
適当である。原料が化学式(2)においてnが大きい化
合物ほど反応時間が長い傾向がある。The reaction time is 1 to 100 hours, preferably 5 to 50 hours, although it depends on the amount of the compound and the catalyst charged. A compound having a larger n in the chemical formula (2) as a raw material tends to have a longer reaction time.
【0020】化学式(2)に示す環状化合物の製造方法
は、まず反応容器内に化学式(1)で示された化合物と
金属水素化物および溶媒を仕込む。これらの反応容器へ
の仕込みの順序は特に限定するものではない。これらを
同時に混合してもよいし、原料の一方ないし両方を反応
中に連続してもしくは断続的に反応溶器内に供給しても
よい。反応容器を所定の反応温度に制御しつつ、所定の
時間攪拌し反応させる。目的の化合物は反応液からデカ
ンテーション、濾過、溶媒による抽出、蒸留、クロマト
グラフィーなど通常の方法で容易に分離精製することが
できる。In the method for producing the cyclic compound represented by the chemical formula (2), first, the compound represented by the chemical formula (1), a metal hydride and a solvent are charged into a reaction vessel. The order of charging these reaction vessels is not particularly limited. These may be mixed simultaneously, or one or both of the raw materials may be continuously or intermittently fed into the reaction vessel during the reaction. The reaction is performed by stirring for a predetermined time while controlling the reaction container to a predetermined reaction temperature. The desired compound can be easily separated and purified from the reaction solution by a usual method such as decantation, filtration, extraction with a solvent, distillation and chromatography.
【0021】金属水素化物の量は化学式(1)の化合物
1molに対して0.2〜200mol、より好ましく
は1.0〜20mol、更に好ましくは2〜20mol
である。The amount of metal hydride is 0.2 to 200 mol, more preferably 1.0 to 20 mol, still more preferably 2 to 20 mol, based on 1 mol of the compound of the chemical formula (1).
Is.
【0022】溶媒はジエチルエーテルやTHF等のエー
テル系溶剤、ベンゼンやトルエン等の芳香族系溶剤、シ
クロヘキサンや正ヘプタン等の飽和炭化水素系溶剤、お
よびそれらの混合溶媒等が有効に用いられる。溶媒の量
は化学式(1)の化合物1mmolに対して1〜500
ml、より好ましくは5〜100mlである。As the solvent, ether solvents such as diethyl ether and THF, aromatic solvents such as benzene and toluene, saturated hydrocarbon solvents such as cyclohexane and normal heptane, and mixed solvents thereof are effectively used. The amount of the solvent is 1 to 500 with respect to 1 mmol of the compound of the chemical formula (1).
ml, more preferably 5 to 100 ml.
【0023】反応温度は−30℃〜200℃、より好ま
しくは0〜100℃、更に好ましくは20〜60℃が適
当である。The reaction temperature is -30 ° C to 200 ° C, more preferably 0 to 100 ° C, still more preferably 20 to 60 ° C.
【0024】反応時間は反応温度や原料の化合物の量に
も依るが、10分〜40時間、より好ましくは1時間〜
20時間が適当である。The reaction time depends on the reaction temperature and the amount of the raw material compound, but is 10 minutes to 40 hours, more preferably 1 hour to
20 hours is appropriate.
【0025】[0025]
【実施例】以下に実施例に基づいて説明する。
実施例1
化学式(1)においてR1=CH3 ,R2=CH3,m=
2である多環式有機ケイ素化合物の製法を示す。EXAMPLES Examples will be described below. Example 1 In the chemical formula (1), R 1 = CH 3 , R 2 = CH 3 , m =
The production method of the polycyclic organosilicon compound of No. 2 is shown.
【0026】反応容器の上部にコンデンサーおよび滴下
ロートを付け、500mlのガラス製反応容器の内部に
磁気攪拌子を設置する。反応容器内を高純度窒素ガスで
置換した。続いて反応容器内に化学式(2)においてR
1=CH3 ,R2=CH3 ,n=1である化合物7.00
g(11.8mmol)とビス(ジベンジリデンアセト
ン)白金(O)触媒0.392g(0.59mmol)
とテトラリン溶媒200mlを仕込んだ。滴下ロートに
はビス(ジメチルフルオロシリル)アセチレン6.50
g(36.4mmol)を仕込んだ。A condenser and a dropping funnel are attached to the upper part of the reaction vessel, and a magnetic stirring bar is installed inside a 500 ml glass reaction vessel. The inside of the reaction vessel was replaced with high-purity nitrogen gas. Then, in the reaction formula, R in the chemical formula (2)
Compound 7.00 in which 1 = CH 3 , R 2 = CH 3 , and n = 1
g (11.8 mmol) and bis (dibenzylideneacetone) platinum (O) catalyst 0.392 g (0.59 mmol)
Then, 200 ml of tetralin solvent was charged. Bis (dimethylfluorosilyl) acetylene 6.50 was added to the dropping funnel.
g (36.4 mmol) was charged.
【0027】反応容器を100℃に制御した油浴に浸
し、磁気攪拌子で攪拌しながら滴下ロートからビス(ジ
メチルフルオロシリル)アセチレンを10分間かけて滴
下した。反応温度を100℃に保ちながら50時間攪拌
した。The reaction vessel was immersed in an oil bath controlled at 100 ° C., and bis (dimethylfluorosilyl) acetylene was dropped from the dropping funnel over 10 minutes while stirring with a magnetic stirrer. The mixture was stirred for 50 hours while maintaining the reaction temperature at 100 ° C.
【0028】液体クロマトグラフィーで原料である化学
式(2)の化合物がほぼ消失を確認後、反応容器を室温
に戻し反応液を取り出した。シリカゲルの分離カラムに
反応液を担持し、ベンゼン、ヘキサン混合溶剤で溶出さ
せた後、エタノールで析出させることにより目的の多環
式有機ケイ素化合物を収量0.85g(0.90mmo
l)を得た。ビスヒドロシリル化合物からの収率は7.
6%であった。After confirming almost disappearance of the compound of the chemical formula (2) as a raw material by liquid chromatography, the reaction vessel was returned to room temperature and the reaction solution was taken out. The reaction liquid was supported on a silica gel separation column, eluted with a mixed solvent of benzene and hexane, and then precipitated with ethanol to give the target polycyclic organosilicon compound in a yield of 0.85 g (0.90 mmo).
l) was obtained. The yield from the bishydrosilyl compound is 7.
It was 6%.
【0029】形態は無色の結晶で、昇華温度は345〜
360℃であった。The form is colorless crystals and the sublimation temperature is 345 to 345.
It was 360 ° C.
【0030】元素分析の測定値は、炭素48.06%
(理論値48.35%)、水素7.86%(理論値7.
90%)、フッ素7.68%(理論値8.05%)であ
り、測定値は、測定誤差の範囲で理論値とよく一致して
いる。The measured value of elemental analysis is as follows: carbon 48.06%
(Theoretical value 48.35%), hydrogen 7.86% (theoretical value 7.
90%) and fluorine 7.68% (theoretical value 8.05%), and the measured values are in good agreement with the theoretical values within the range of measurement error.
【0031】マススペクトル(FD−MS)よりM+ は
942であった。これは理論値と一致している。From the mass spectrum (FD-MS), M + was 942. This is in agreement with the theoretical value.
【0032】赤外吸収スペクトルをKBr錠剤法により
測定した。主な吸収ピーク波数(単位はcm-1)は29
50,2900,1400,1250,1140,10
90であった。The infrared absorption spectrum was measured by the KBr tablet method. The main absorption peak wave number (unit: cm -1 ) is 29
50, 2900, 1400, 1250, 1140, 10
It was 90.
【0033】1H−NMRを重クロロホルム溶液で測定
した。化学シフト(δ値)はTMSを基準として、0.
30ppm〜0.46ppm(72H,多重項)、7.
81ppm(2H,1重項)であった。0.30ppm
から0.46ppmの合計72個の水素は、ケイ素上の
24個のメチル基の合計72個の水素に、7.81pp
mの2個の水素は、ベンゼン環上の2個の水素に同定で
き、理論値と一致する。 1 H-NMR was measured with a heavy chloroform solution. The chemical shift (δ value) is 0.
30 ppm to 0.46 ppm (72H, multiplet), 7.
It was 81 ppm (2H, singlet). 0.30 ppm
From 0.46 ppm to a total of 72 hydrogens, a total of 72 hydrogens of 24 methyl groups on silicon is 7.81 pp.
The two hydrogens of m can be identified as the two hydrogens on the benzene ring, which is in agreement with the theoretical value.
【0034】13C−NMRを重クロロホルム溶液で測定
した。化学シフト(δ値)はTMSを基準として、0.
67ppm、1.32ppm、1.59ppm(JC-F
=16Hz)、136.34ppm、144.88pp
m、177.42ppm、185.10ppm、18
8.98ppm、194.38ppmであった。 13 C-NMR was measured with a heavy chloroform solution. The chemical shift (δ value) is 0.
67 ppm, 1.32 ppm, 1.59 ppm (J CF
= 16 Hz), 136.34 ppm, 144.88 pp
m, 177.42 ppm, 185.10 ppm, 18
The values were 8.98 ppm and 194.38 ppm.
【0035】29Si−NMRを重クロロホルム溶液で測
定した。化学シフト(δ値)はTMSを基準として、−
28.10ppm、−1.22ppm、17.3ppm
(J Si-F=278Hz)であった。
実施例2
化学式(2)においてR1=CH3 ,R2=CH3 ,n=
2である多環式有機ケイ素化合物の製法を示す。まず5
0mlのガラス製反応容器にコンデンサーを付け、反応
容器の内部に磁気攪拌子を設置する。反応容器内を高純
度窒素ガスで置換した。続いて反応容器内に実施例1で
合成された化学式(1)の化合物0.15g(0.15
9mmol)とLiAlH4 0.045g(1.19m
mol)とテトラヒドロフラン10mlを仕込んだ。温
度を40℃に設定した油浴に反応容器を浸し、磁気攪拌
子で攪拌しながら5時間反応させた。液体クロマトグラ
フィーで原料がほぼ消失を確認後、反応容器を油浴から
はずし、反応液に飽和塩化アンモニウム水溶液10ml
を加えて未反応のLiAlH4 を分解し、分液ロートで
テトラヒドロフラン層と水層を分離した。水層をベンゼ
ン100mlで抽出した。分液ロートでベンゼン層を分
離した。テトラヒドロフラン層とベンゼン層は無水硫酸
ナトリウムで乾燥した。この有機層を合わせてロータリ
ーエバポレータで濃縮し、液体クロマトグラフィーを用
いて分取することにより目的物を得た。収量は0.01
0g(0.0115mmol)、収率は7.2%であっ
た。[0035]29Si-NMR measurement with deuterated chloroform solution
Decided Chemical shift (δ value) is based on TMS,
28.10ppm, -1.22ppm, 17.3ppm
(J Si-F= 278 Hz).
Example 2
R in the chemical formula (2)1= CH3 , R2= CH3 , N =
The production method of the polycyclic organosilicon compound of No. 2 is shown. First 5
Attach a condenser to a 0 ml glass reaction vessel and react
Install a magnetic stir bar inside the container. High purity inside the reaction vessel
The atmosphere was replaced with nitrogen gas. Then in Example 1 in a reaction vessel
0.15 g (0.15 g) of the compound of formula (1) synthesized
9 mmol) and LiAlHFour 0.045g (1.19m
(mol) and 10 ml of tetrahydrofuran were charged. Warm
Immerse the reaction vessel in an oil bath set to 40 ° C and magnetically stir
The mixture was reacted for 5 hours with stirring. Liquid chromatograph
After confirming that the raw materials have almost disappeared with a fee, remove the reaction vessel from the oil bath.
Remove and add 10 ml of saturated ammonium chloride solution to the reaction mixture.
Unreacted LiAlHFour Disassemble and use a separating funnel.
The tetrahydrofuran layer and the aqueous layer were separated. Water layer benz
It was extracted with 100 ml of water. Separate the benzene layer with a separating funnel.
Released. Tetrahydrofuran layer and benzene layer are anhydrous sulfuric acid
Dry with sodium. Combine this organic layer into a rotary
ー Concentrate with evaporator and use for liquid chromatography
Then, the desired product was obtained. Yield 0.01
0 g (0.0115 mmol), the yield was 7.2%
It was
【0036】化合物の形態は無色の結晶である。The compound form is colorless crystals.
【0037】マススペクトル(FD−MS)よりM+ は
870であった。これは理論値と一致している。From the mass spectrum (FD-MS), M + was 870. This is in agreement with the theoretical value.
【0038】赤外吸収スペクトルをKBr錠剤法により
測定した。主な吸収ピーク波数(単位はcm-1)は29
50,2900,2150,1400,1245,11
40,1120,1090であった。2150はSiH
結合の吸収を示す。The infrared absorption spectrum was measured by the KBr tablet method. The main absorption peak wave number (unit: cm -1 ) is 29
50, 2900, 2150, 1400, 1245, 11
It was 40,1120,1090. 2150 is SiH
Shows absorption of binding.
【0039】1H−NMRを重クロロホルム溶液で測定
した。化学シフト(δ値)はTMSを基準として、0.
25ppm(24H,2重項)、0.34ppm(24
H,1重項)、0.42ppm(24H,1重項)、
4.46ppm(2H,多重項)7.81ppm(2
H,1重項)であった。0.25ppmから0.42p
pmの合計72個の水素は、ケイ素上の24個のメチル
基の合計72個の水素に、4.46ppmの2個の水素
は、SiHの水素に、7.81ppmの合計2個の水素
は、ベンゼン環上の 個の水素に同定できる。 1 H-NMR was measured with a heavy chloroform solution. The chemical shift (δ value) is 0.
25ppm (24H, doublet), 0.34ppm (24
H, singlet), 0.42 ppm (24H, singlet),
4.46 ppm (2H, multiplet) 7.81 ppm (2
H, singlet). 0.25ppm to 0.42p
The total 72 hydrogen of pm is 72 hydrogen of 24 methyl groups on silicon, the total hydrogen of 4.46 ppm is the hydrogen of SiH, and the total hydrogen of 7.81 ppm is 2 hydrogen. , Can be identified as a hydrogen on the benzene ring.
【0040】13C−NMRを重クロロホルム溶液で測定
した。化学シフト(δ値)はTMSを基準として、−
1.60ppm、0.75ppm、2.54ppm、1
36.4ppm、144.9ppm、181.0pp
m、189.7ppm、191.0ppmであった。 13 C-NMR was measured with a heavy chloroform solution. Chemical shift (δ value) is based on TMS,
1.60ppm, 0.75ppm, 2.54ppm, 1
36.4ppm, 144.9ppm, 181.0pp
m was 189.7 ppm and 191.0 ppm.
【0041】29Si−NMRを重クロロホルム溶液で測
定した。化学シフト(δ値)はTMSを基準として、−
28.2ppm、−18.4ppm、−5.1ppmで
あった。 29 Si-NMR was measured with a heavy chloroform solution. Chemical shift (δ value) is based on TMS,
It was 28.2 ppm, -18.4 ppm, and -5.1 ppm.
【0042】[0042]
【発明の効果】本発明は、新しい環状有機ケイ素化合物
を提供するものである。この化合物は耐熱性、耐燃焼性
材料の構成成分として利用できる。The present invention provides a new cyclic organosilicon compound. This compound can be used as a constituent component of a heat resistant and flame resistant material.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 内海 哲良 神奈川県横浜市栄区笠間町1190番地 三 井東圧化学株式会社内 (72)発明者 井上 浩二 神奈川県横浜市栄区笠間町1190番地 三 井東圧化学株式会社内 (72)発明者 田中 正人 茨城県つくば市東1丁目1番地 工業技 術院物質工学工業技術研究所内 (72)発明者 内丸 祐子 茨城県つくば市東1丁目1番地 工業技 術院物質工学工業技術研究所内 (56)参考文献 特開 平5−310752(JP,A) 特開 平6−247986(JP,A) 特開 平6−247983(JP,A) (58)調査した分野(Int.Cl.7,DB名) CA(STN) REGISTRY(STN)─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tetsuyoshi Utsumi 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa Mitsui Toatsu Chemical Co., Ltd. (72) Koji Inoue 1190 Kasama-cho, Sakae-ku, Yokohama, Kanagawa Mitsui Toatsu Chemical Incorporated (72) Inventor Masato Tanaka, 1-1, Higashi, Tsukuba, Ibaraki, Institute of Industrial Science and Technology, Institute of Materials Engineering (72) Inventor, Yuko Uchimaru, 1-1, Higashi, Tsukuba, Ibaraki (56) References JP-A-5-310752 (JP, A) JP-A-6-247986 (JP, A) JP-A-6-247983 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) CA (STN) REGISTRY (STN)
Claims (5)
〜10のアルキル基、アルケニル基または低級アルキル
基、低級アルケニル基、低級アルコキシ基もしくはハロ
ゲンで置換されていてもよいフェニル基である。)で示
される環状有機ケイ素化合物。1. A chemical formula (1): (In the above formula, m is an integer of 2 to 20, R 1 and R 2 are carbon atoms 1
-10 is an alkyl group, an alkenyl group or a lower alkyl group, a lower alkenyl group, a lower alkoxy group or a phenyl group which may be substituted with halogen. ) A cyclic organosilicon compound represented by
〜10のアルキル基、アルケニル基または低級アルキル
基、低級アルケニル基、低級アルコキシ基もしくはハロ
ゲンで置換されていてもよいフェニル基である。)で示
される環状有機ケイ素化合物。2. A chemical formula (2): (In the above formula, n is an integer of 2 to 20, R 1 and R 2 are carbon atoms 1
-10 is an alkyl group, an alkenyl group or a lower alkyl group, a lower alkenyl group, a lower alkoxy group or a phenyl group which may be substituted with halogen. ) A cyclic organosilicon compound represented by
請求項2におけると同じ意味を表わす。)で示される環
状有機ケイ素化合物と化学式(3) 【化4】 (上式中、R2は請求項2におけると同じ意味を表わ
す。)で示されるビス(フロロシリル)アセチレン化合
物とを触媒の存在下に反応させることを特徴とする請求
項1記載の環状有機ケイ素化合物の製造方法。3. A chemical formula (2): (In the above formula, n represents an integer of 1 to 19, and R 1 and R 2 are
It has the same meaning as in claim 2. ) And a cyclic organosilicon compound represented by the chemical formula (3): The cyclic organosilicon according to claim 1, wherein the bis (fluorosilyl) acetylene compound represented by the formula (wherein R 2 has the same meaning as in claim 2) is reacted in the presence of a catalyst. Method for producing compound.
ウムいずれかの錯体であることを特徴とする請求項3記
載の製造方法。4. The method according to claim 3, wherein the catalyst is a complex of platinum, palladium or ruthenium.
意味を表わす。)で示される化合物と金属水素化物とを
反応させることを特徴とする請求項2記載の環状有機ケ
イ素化合物の製造方法。5. The chemical formula (1): (In the above formula, m, R 1 and R 2 have the same meaning as in claim 1.) The compound represented by the formula (1) is reacted with a metal hydride. Method for producing compound.
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JP03860093A Expired - Lifetime JP3506180B2 (en) | 1993-02-26 | 1993-02-26 | Cyclic organosilicon compound and method for producing the same |
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JP (1) | JP3506180B2 (en) |
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1993
- 1993-02-26 JP JP03860093A patent/JP3506180B2/en not_active Expired - Lifetime
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JPH06247984A (en) | 1994-09-06 |
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