JP3462315B2 - Manufacturing method of sensor element - Google Patents

Manufacturing method of sensor element

Info

Publication number
JP3462315B2
JP3462315B2 JP23551195A JP23551195A JP3462315B2 JP 3462315 B2 JP3462315 B2 JP 3462315B2 JP 23551195 A JP23551195 A JP 23551195A JP 23551195 A JP23551195 A JP 23551195A JP 3462315 B2 JP3462315 B2 JP 3462315B2
Authority
JP
Japan
Prior art keywords
polishing
holding plate
manufacturing
sensor element
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP23551195A
Other languages
Japanese (ja)
Other versions
JPH08132344A (en
Inventor
山下和雄
杉山靖
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nok Corp
Original Assignee
Nok Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nok Corp filed Critical Nok Corp
Priority to JP23551195A priority Critical patent/JP3462315B2/en
Publication of JPH08132344A publication Critical patent/JPH08132344A/en
Priority to US08/713,425 priority patent/US5791035A/en
Application granted granted Critical
Publication of JP3462315B2 publication Critical patent/JP3462315B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は圧力センサ、荷重
センサ等に用いられるセンサ素子の製造方法に関し、特
に、一度に複数個の被製造物を各工程に送り込んで処理
することにより、複数個のセンサ素子を同時に製造する
ことのできるセンサ素子の製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a sensor element used for a pressure sensor, a load sensor, etc., and more particularly to a method for manufacturing a plurality of objects to be processed by feeding a plurality of objects to be processed at one time. The present invention relates to a method for manufacturing a sensor element, which enables simultaneous manufacture of the sensor element.

【0002】[0002]

【従来技術およびその問題点】一般に、圧力センサ、荷
重センサ等に用いられるセンサ素子にあっては、図6
(a)に示すように構成されている。
2. Description of the Related Art Generally, sensor elements used for pressure sensors, load sensors, etc.
It is configured as shown in FIG.

【0003】すなわち、このセンサ素子5は、一端が閉
塞された筒状をなすとともに、周面が大径部5aと小径
部5bの2段に形成されていて、大径部5aの上面側
(閉塞されている部分)に歪みゲージ(図示せず)が蒸
着、スパッタリング等の成膜法により所定のパターンで
形成されるようになっている。
That is, the sensor element 5 has a cylindrical shape with one end closed, and has a peripheral surface formed in two steps of a large diameter portion 5a and a small diameter portion 5b, and the upper surface side of the large diameter portion 5a ( A strain gauge (not shown) is formed in a predetermined pattern on the closed portion by a film forming method such as vapor deposition and sputtering.

【0004】このようなセンサ素子は、図19に示すよ
うに、「切削加工又は鍛造等の工程」、「洗浄工程」、
「表面研磨工程」、「洗浄工程」、「成膜(蒸着又はス
パッタリング等で機能膜形成)工程」、「パターニング
(スピンコート、露光、エッチング等)工程」、「洗浄
工程」の7つの工程を経て製造されるものであるが、従
来は、一度に複数個の被製造物を各工程に送り込んで処
理する有効な手段がなかったため、被製造物を1個づつ
各工程に送り込んで処理しなければならず、複数個のセ
ンサ素子5を製造するのに長時間を要し、生産性が非常
に悪かった。
As shown in FIG. 19, such a sensor element has a "process of cutting or forging", a "cleaning process",
There are seven processes: "surface polishing process", "cleaning process", "film formation (functional film formation by vapor deposition or sputtering)", "patterning (spin coating, exposure, etching, etc.) process", and "cleaning process". However, in the past, there was no effective means to send a plurality of products to each process at one time for processing, so the products must be sent to each process one by one. Therefore, it took a long time to manufacture the plurality of sensor elements 5, and the productivity was very poor.

【0005】例えば、「表面研磨工程」について説明す
ると、図20に示すように、被製造物6を挿入し得る穴
61を複数箇所に設けたホルダ60を研磨盤65上に位
置してガイド64で保持するとともに、ホルダ60の各
穴61に被製造物6を挿入し、被製造物6の上部に弾性
材66を介して錘67を位置して各被製造物6を研磨盤
65の方向に押圧し、この状態で研磨盤65を作動させ
ることにより複数個の被製造物6の研磨が同時に行われ
る。
For example, the "surface polishing step" will be explained. As shown in FIG. 20, a holder 60 having holes 61 into which the workpiece 6 can be inserted is provided at a plurality of positions, and a holder 64 is positioned on a polishing plate 65. The workpiece 6 is inserted into each hole 61 of the holder 60, and the weight 67 is positioned above the workpiece 6 via the elastic material 66 so that each workpiece 6 can be moved toward the polishing plate 65. Then, the polishing plate 65 is operated in this state, so that a plurality of workpieces 6 are polished at the same time.

【0006】この場合、複数個の被製造物6の高さ方向
の寸法のばらつきは、弾性材66の弾性変形によって吸
収されるようになっているので、高いものから先に研磨
されて徐々に全体の高さが揃って行き、最後には全体の
高さが均一に仕上げられるようになっている。
In this case, since the variation in the dimension of the plurality of workpieces 6 in the height direction is absorbed by the elastic deformation of the elastic material 66, the higher ones are polished first and gradually polished. The height of the whole goes evenly, and at the end the height is made uniform.

【0007】しかしながら、被製造物6を1個づつホル
ダ60の穴61に装着しなければならないため、その作
業に手間がかかり、また、高さ方向の寸法のばらつきが
大きい場合には、弾性材66の変形によってもばらつき
を完全に吸収することができず、低いもののハンドリン
グが不十分となってしまい、その研磨面にだれが生じて
しまう。なお、センサ素子5は、図6(b)に示すよう
な円筒状のものであっても、前記したものと同様な問題
が生じるものである。
However, since the workpieces 6 must be mounted in the holes 61 of the holder 60 one by one, the work is troublesome, and when the dimensional variation in the height direction is large, the elastic material is used. Even if the deformation of 66 does not occur, the variation cannot be completely absorbed, and although it is low, the handling becomes insufficient, and the sagging occurs on the polished surface. Even if the sensor element 5 has a cylindrical shape as shown in FIG. 6B, the same problem as described above occurs.

【0008】一方、特開昭58−149168号公報に
は、ウエハーの研磨方法が記載されており、この研磨方
法は、被加工物保持用の穴を複数箇所に設けたホルダの
各穴に被加工物を保持して、これを上下研磨盤間に位置
することにより複数個の被加工物の両面を同時に研磨す
るようにしたものである。
On the other hand, Japanese Unexamined Patent Publication (Kokai) No. 58-149168 discloses a method for polishing a wafer. In this polishing method, each hole of a holder provided with a plurality of holes for holding an object to be processed is covered. A work piece is held and positioned between the upper and lower polishing plates so that both surfaces of a plurality of work pieces are polished at the same time.

【0009】しかしながら、このようなものにあって
も、被加工物を1個づつホルダの穴に装着しなければな
らないため、その作業に手間がかかり、また、各被加工
物は各穴内に完全に固定されていないので、研磨面にだ
れが生じる虞がある。
However, even in such a case, since the workpieces must be mounted in the holes of the holder one by one, the work is troublesome, and each workpiece is completely inserted in each hole. Since it is not fixed on the polishing surface, there is a possibility that the polishing surface may be drooped.

【0010】この発明は前記のような従来のもののもつ
問題点を解決したものであって、一度に複数個の被製造
物を各工程に送り込んで処理することができ、生産性を
大幅に高めることのできるセンサ素子の製造方法を提供
することを目的とするものである。
The present invention solves the above-mentioned problems of the conventional ones, and a plurality of products to be manufactured can be sent to each process at a time to be processed, thereby significantly improving the productivity. It is an object of the present invention to provide a method of manufacturing a sensor element that can be manufactured.

【0011】[0011]

【問題点を解決するための手段】上記の問題点を解決す
るためにこの発明は、一端が閉塞された略筒状のセンサ
素子の製造方法であって、厚み方向に可撓性を有する
枚の保持板に複数の被製造物を、その処理面前記保持
の撓む方向を向くように固着し、この保持板と複数の
被製造物とを一体としたものを一単位として、最初に研
磨工程に送り込んで、複数の被製造物の処理面が研磨盤
の方向を向くように研磨盤上に位置し、複数の被製造物
を直接に、又は保持板を介して研磨盤の方向に押圧しな
がら複数の被製造物の処理面の研磨を同時に行い、研磨
終了後に前記一単位を成膜等の工程に送り込んで、各工
程を経ることにより複数個のセンサ素子を同時に製造す
手段を採用したものである。また、一端が閉塞された
略筒状のセンサ素子の製造方法であって、厚み方向に
撓性を有する一枚の保持板に複数の穴を設け、該穴の内
面に径方向内方に突出する少なくとも二つの片持梁を設
け、各穴の位置に被製造物を各々の処理面が前記保持板
の撓む方向を向くように位置して、各被製造物と各穴の
片持梁とを固着し、この保持板と複数の被製造物とを一
体としたものを一単位として、最初に研磨工程に送り込
んで、複数の被製造物の処理面が研磨盤の方向を向くよ
うに研磨盤上に位置し、複数の被製造物を直接に、又は
保持板を介して研磨盤の方向に押圧しながら複数の被製
造物の処理面の研磨を同時に行い、研磨終了後に前記一
単位を成膜等の工程に送り込んで、各工程を経ることに
より複数個のセンサ素子を同時に製造する手段を採用し
たものである。
In order to solve the above problems, the present invention is a method for manufacturing a substantially cylindrical sensor element having one end closed, which is flexible in the thickness direction.
Sheets of a plurality of the product in the holding plate, the holding its treated surface
Fixed so as to face the direction of flexing of the plate, the holding plate and a plurality of
And the product as one unit that is integrated, first Ken
It is sent to the polishing process, and the processed surfaces of multiple products are polished.
Is located on the polishing machine so that
Be pressed in the direction of the polishing plate directly or through the holding plate.
And polishing the processed surfaces of multiple workpieces simultaneously.
After the completion, send the above unit to the process such as film formation,
Manufacturing multiple sensor elements at the same time
It adopts the means. Further, a method for producing a substantially tubular sensor element having one end closed, a plurality of holes on one holding plate having flexibility in the thickness direction, of the hole
At least two cantilever beams protruding inward in the radial direction are provided on the surface, and the processed surface of each of the workpieces is located at the position of each hole.
It is positioned so as to face the bending direction of the
By fixing the cantilever to this holding plate and a plurality of products to be manufactured,
Send the body as a unit to the polishing process first
Therefore, the treated surfaces of multiple workpieces face the polishing machine.
Located on the polishing plate, directly
Multiple products can be manufactured by pressing in the direction of the polishing plate through the holding plate.
The treated surface of the structure is polished at the same time, and after the polishing is completed, the above
Sending the unit to the process such as film formation and going through each process
It employs a means for simultaneously manufacturing a plurality of sensor elements .

【0012】[0012]

【作用】この発明は前記のような手段を採用したことに
より、厚み方向に変位可能な可撓性を有する保持板に複
数の被製造物を固着したものを一単位として、これを最
初に研磨工程に送り込んで、複数の被製造物の処理面が
研磨盤の方向を向くように研磨盤上に位置し、複数の被
製造物を直接に研磨盤の方向に押圧しながら、又は保持
板を介して研磨盤の方向に押圧しながら複数の被製造物
の処理面の研磨が同時に行われる。この場合、複数の被
製造物の高さ方向の寸法にばらつきがあっても、そのば
らつきは保持板が厚み方向に変位することにより、又は
片持梁が変位することにより吸収されることになる。そ
して、研磨終了後に一単位を成膜等の工程に送り込み、
各工程を経ることにより複数個のセンサ素子が同時に製
造されることになる。
By adopting the above-mentioned means, the present invention provides a flexible holding plate that can be displaced in the thickness direction.
This is the maximum with one unit consisting of several products to be fixed.
First, send it to the polishing process,
It is located on the polishing disc so that it faces the polishing disc and
Holding or pressing the product directly toward the polishing machine
Multiple products to be pressed while pressing in the direction of the polishing plate through the plate
The polishing of the treated surface is simultaneously performed. In this case,
Even if there are variations in the height of the product,
Rippling is caused by displacement of the holding plate in the thickness direction, or
It is absorbed by the displacement of the cantilever. So
Then, after polishing, send one unit to the process such as film formation,
Multiple sensor elements can be manufactured simultaneously by going through each process.
Will be built.

【0013】[0013]

【発明の実施の形態】以下、図面に示すこの発明による
センサ素子の製造方法の実施の形態について説明する。
図1〜図5には、この発明によるセンサ素子の製造方法
の第1の実施の形態が示されていて、図1は被製造物を
保持する保持板を示す平面図、図2は図1に示すものの
部分拡大図、図3(a)は図1に示すものに被製造物を
保持した状態を示した部分拡大図、図4(a)は図3
(a)に示すものの側面図、図5は図1に示すものに被
製造物を保持して表面研磨工程に送り込んだ状態を示す
説明図である。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a method for manufacturing a sensor element according to the present invention shown in the drawings will be described below.
1 to 5 show a first embodiment of a method for manufacturing a sensor element according to the present invention, FIG. 1 is a plan view showing a holding plate for holding an object to be manufactured, and FIG. 3A is a partially enlarged view of FIG. 3A, FIG. 3A is a partially enlarged view of the state shown in FIG. 1 in which a product is held, and FIG. 4A is FIG.
FIG. 5A is a side view of what is shown in FIG. 5A, and FIG. 5 is an explanatory view showing a state in which the object to be manufactured is held and sent to the surface polishing step in what is shown in FIG.

【0014】すなわち、この実施の形態に示すセンサ素
子の製造方法は、一端が閉塞された筒状をなすととも
に、周面が大径部5aと小径部5bの2段に形成される
センサ素子5(図6(a)参照)の製造方法であって、
一端が閉塞された筒状をなすものの周面を大径部6aと
小径部6bの2段に加工した被製造物6(図3(a)、
図4(a)および図5参照)を複数個保持板1に保持
し、これを一単位として各工程に送り込んで処理するこ
とにより、複数個のセンサ素子5を同時に製造するよう
にしたものである。
That is, in the method of manufacturing the sensor element according to this embodiment, the sensor element 5 has a cylindrical shape with one end closed and the peripheral surface is formed in two stages of the large diameter portion 5a and the small diameter portion 5b. (See FIG. 6A)
A product 6 having a cylindrical shape whose one end is closed is processed into two stages of a large diameter portion 6a and a small diameter portion 6b (FIG. 3 (a),
A plurality of sensor elements 5 are simultaneously manufactured by holding a plurality of holding plates 1 (see FIGS. 4 (a) and 5) and sending them to each process as one unit for processing. is there.

【0015】ここで保持板1は、100μm程度の厚み
の金属製、例えば耐蝕性に優れるステンレス等からなる
可撓性を有する薄板であって、被製造物6の小径部6b
が挿入し得る穴2をエッチング、打抜き等により複数箇
所に穿設し、各穴2の内周面の対向する部位にそれぞれ
一対の三角形状の切込み3、3を設け、隣接する切込み
3、3間で被製造物を支持する三角形状の梁4を形成し
たものである。
The holding plate 1 is a flexible thin plate made of metal having a thickness of about 100 μm, for example, stainless steel having excellent corrosion resistance, and has a small diameter portion 6b of the object 6 to be manufactured.
Holes 2 that can be inserted into the holes 2 are formed by etching, punching, or the like, and a pair of triangular cuts 3 and 3 are provided at opposing portions of the inner peripheral surface of each hole 2, and adjacent cuts 3 and 3 are formed. A triangular beam 4 for supporting the product to be manufactured is formed.

【0016】上記のような保持板1に複数個の被製造物
6を保持するには、各穴2に被製造物6の小径部6bを
挿入して各穴2の梁4と各被製造物6の大径部6aとの
間をシリーズ溶接等により一体に固着する。この場合の
溶接強度は、各工程処理中に外れることなく、各工程終
了後に容易に取り外せる程度の強さとする。
In order to hold a plurality of workpieces 6 on the holding plate 1 as described above, the small diameter portion 6b of the workpiece 6 is inserted into each hole 2 and the beam 4 of each hole 2 and each workpiece. The large-diameter portion 6a of the object 6 is integrally fixed by series welding or the like. The welding strength in this case is such that it does not come off during the processing of each step and can be easily removed after the completion of each step.

【0017】そして、保持板1に保持した複数個の被製
造物6を一単位として、研磨、成膜等の各工程に送り込
んで処理することにより、複数個のセンサ素子5が同時
に製造されるものである。
Then, a plurality of workpieces 6 held on the holding plate 1 are used as one unit and sent to each process such as polishing, film formation, etc. to be processed, whereby a plurality of sensor elements 5 are simultaneously manufactured. It is a thing.

【0018】例えば、「表面研磨工程」について説明す
ると、保持板1に保持した複数個の被製造物6を保持板
1と共に研磨盤7上に位置し、その上部に錘8を載置し
て各被製造物6を研磨盤7の方向に押圧する(図5参
照)。
For example, the "surface polishing step" will be described. A plurality of workpieces 6 held by the holding plate 1 are located on the polishing plate 7 together with the holding plate 1, and a weight 8 is placed on the polishing plate 7. Each product 6 is pressed toward the polishing plate 7 (see FIG. 5).

【0019】この場合、各被製造物6の高さ方向の寸法
のばらつきは、可撓性を有する保持板1の高さ方向への
変位によって吸収されるとともに、各被製造物6は各穴
2の梁4によって保持板1に完全に固定されるものであ
る。
In this case, the variation in the dimension of each of the workpieces 6 in the height direction is absorbed by the displacement of the flexible holding plate 1 in the height direction, and each of the workpieces 6 has a corresponding hole. It is completely fixed to the holding plate 1 by two beams 4.

【0020】したがって、研磨盤7を作動させても各被
製造物6が各穴2内で動くようなことはなく、高さ方向
のばらつきが大きいために研磨盤7の方向への押圧力が
部分的に不足しても研磨面にだれが生じるような虞はな
く、被製造物6は高いものから順に研磨されて徐々に全
体の高さが揃って行き、最後に全体の高さが均一の寸法
に仕上げられることになる。
Therefore, even if the polishing plate 7 is operated, the respective workpieces 6 do not move in the holes 2, and the pressing force in the direction of the polishing plate 7 is large because the variation in the height direction is large. Even if it is partially insufficient, there is no risk of sagging on the polishing surface, and the workpiece 6 is polished in order from the highest one, and the entire height gradually becomes uniform, and finally the entire height becomes uniform. Will be finished to the dimensions.

【0021】また、複数個の被製造物6を保持板1に保
持して一単位とし、それを各工程に送り込んで処理する
ようにしたことにより、被製造物6を1個づつ各工程に
送り込んで処理していた従来に比べて、研磨工程におけ
る処理時間、成膜工程におけるスピンコート、露光等の
処理時間、洗浄工程の処理時間等を大幅に短縮すること
ができ、生産性を大幅に高めることができることにな
る。なお、被製造物6はフランジが付いているものに限
らず、図3(b)、図4(b)に示す円筒状のものであ
っても同様に固着できるものであり、この場合のセンサ
素子5は図6(b)のようになるものである。
Further, a plurality of products 6 to be manufactured are held on the holding plate 1 to form one unit, and the products are sent to each process for processing, so that one product 6 is processed in each process. Compared with the conventional method of sending in, processing time in the polishing process, spin coating in the film forming process, processing time such as exposure, processing time in the cleaning process, etc. can be greatly shortened, and productivity is greatly improved. It can be increased. The product 6 is not limited to the one with a flange, and the cylindrical product shown in FIGS. 3 (b) and 4 (b) can be similarly fixed. The element 5 is as shown in FIG.

【0022】図7〜図9(a)には、この発明によるセ
ンサ素子の製造方法の第2の実施の形態が示されてい
て、図7は被製造物を保持する保持板を示す平面図、図
8は図7に示すものに被製造物を保持した状態を示す部
分拡大図、図9(a)は図8に示すものの側面図であ
る。
7 to 9 (a) show a second embodiment of the method for manufacturing a sensor element according to the present invention, and FIG. 7 is a plan view showing a holding plate for holding an object to be manufactured. 8 is a partially enlarged view showing a state in which the object to be manufactured is held on the one shown in FIG. 7, and FIG. 9A is a side view of the one shown in FIG.

【0023】すなわち、この実施の形態に示すセンサ素
子の製造方法も前記第1の実施の形態に示すものと同様
に、一端が閉塞された筒状をなすとともに、周面が大径
部5aと小径部5bの2段に形成されているセンサ素子
5(図6(a)参照)の製造方法であって、一端が閉塞
された筒状をなすものの周面を大径部6aと小径部6b
の2段に加工した被製造物6(図8および図9(a)参
照)を複数個保持板11に保持し、これを一単位として
各工程に送り込んで処理することにより複数個のセンサ
素子5を同時に製造するようにしたものである。
That is, also in the method of manufacturing the sensor element shown in this embodiment, as in the case of the first embodiment, one end is closed to form a tubular shape and the peripheral surface is formed with the large diameter portion 5a. A method of manufacturing a sensor element 5 (see FIG. 6 (a)) formed in two stages of a small diameter portion 5b, in which a peripheral surface of a cylindrical body having one end closed is provided with a large diameter portion 6a and a small diameter portion 6b.
A plurality of workpieces 6 processed in two stages (see FIGS. 8 and 9 (a)) are held on a holding plate 11, and a plurality of the processed products are sent to each process as one unit to process the plurality of sensor elements. 5 is manufactured at the same time.

【0024】ここで保持板11は、100μm程度の厚
みの金属製、例えば耐蝕性に優れるステンレス等からな
る可撓性を有する薄板であって、被製造物6の小径部6
bが挿入し得る穴12をエッチング、打抜き等により複
数箇所に穿設したものである。
Here, the holding plate 11 is a flexible thin plate made of metal having a thickness of about 100 μm, for example, stainless steel having excellent corrosion resistance, and has a small diameter portion 6 of the workpiece 6.
The holes 12 into which b can be inserted are formed at a plurality of locations by etching, punching or the like.

【0025】上記のような保持板11に複数個の被製造
物6を保持するには、各穴12に被製造物6の小径部6
bを挿入するとともに、被製造物6の大径部6aを各穴
12の周縁部にシリーズ溶接等により一体に固着する。
この場合の溶接強度は、各工程処理中に外れることな
く、各工程終了後に容易に取り外せる程度の強さとす
る。
In order to hold a plurality of workpieces 6 on the holding plate 11 as described above, the small diameter portions 6 of the workpieces 6 are placed in the holes 12.
While inserting b, the large diameter portion 6a of the workpiece 6 is integrally fixed to the peripheral edge portion of each hole 12 by series welding or the like.
The welding strength in this case is such that it does not come off during the processing of each step and can be easily removed after the completion of each step.

【0026】そして、保持板11に保持した複数個の被
製造物6を保持板11と共に研磨、成膜等の工程に送り
込んで処理することにより、複数個のセンサ素子5が同
時に製造されることになる。
A plurality of sensor elements 5 are simultaneously manufactured by sending the plurality of workpieces 6 held by the holding plate 11 together with the holding plate 11 to a process such as polishing, film formation and the like for processing. become.

【0027】したがって、被製造物6を1個づつ各工程
に送り込んで処理していた従来に比べて、一度に複数個
の被製造物6を各工程に送り込んで処理できるので、研
磨工程における処理時間、成膜工程におけるスピンコー
ト、露光等の処理時間、洗浄工程の処理時間等を大幅に
短縮することができ、生産性を大幅に高めることができ
ることになる。
Therefore, a plurality of products 6 to be processed can be sent to each process at a time as compared with the conventional case where the products 6 are sent to each process one by one and processed. The time, the processing time such as spin coating and exposure in the film forming step, the processing time in the cleaning step, and the like can be significantly shortened, and the productivity can be significantly increased.

【0028】また、研磨工程における各被製造物6の高
さ方向の寸法のばらつきは、可撓性を有する保持板11
の高さ方向への変位によって吸収されるとともに、各被
製造物6は各穴12に完全に固定されるので、研磨盤7
(図5参照)を作動させても各被製造物6が各穴12内
で動くようなことはなく、高さ方向のばらつきが大きい
ために研磨盤7の方向への押圧力が部分的に不足しても
研磨面にだれが生じるような虞はなく、被製造物6は高
いものから順に研磨されて徐々に全体の高さが揃って行
き、最後に全体の高さが均一の寸法に仕上げられること
になる。なお、被製造物6はフランジが付いているもの
に限らず、図9(a)に示すように、円筒状のものであ
っても同様に固着できるものであり、この場合のセンサ
素子5は図6(b)のようになるものである。
In addition, the variation in the dimension of each product 6 in the height direction during the polishing process is caused by the flexible holding plate 11.
Is absorbed by the displacement in the height direction of each of the workpieces 6 and each of the workpieces 6 is completely fixed in each of the holes 12.
Even if (see FIG. 5) is operated, each workpiece 6 does not move in each hole 12, and since the variation in the height direction is large, the pressing force in the direction of the polishing plate 7 is partially Even if it is insufficient, there is no risk of sagging on the polished surface, and the workpiece 6 is polished in order from the highest one, and the overall height gradually becomes uniform, and finally the overall height becomes a uniform dimension. It will be finished. The product 6 is not limited to the one with a flange, but as shown in FIG. 9 (a), the product 6 can be similarly fixed even if it has a cylindrical shape. It is as shown in FIG.

【0029】図10〜図12には、この発明によるセン
サ素子の製造方法の第3の実施の形態が示されていて、
図10は被製造物を保持する保持板を示す平面図、図1
1は図10に示すものに被製造物を保持した状態を示す
部分拡大図、図12は図11に示すものの側面図であ
る。
FIGS. 10 to 12 show a third embodiment of the method for manufacturing a sensor element according to the present invention.
FIG. 10 is a plan view showing a holding plate for holding a product, FIG.
FIG. 1 is a partially enlarged view showing a state in which the article to be manufactured is held by the one shown in FIG. 10, and FIG. 12 is a side view of the one shown in FIG.

【0030】すなわち、この実施の形態に示すセンサ素
子の製造方法も前記第1の実施の形態に示すものと同様
に、一端が閉塞された筒状をなすとともに、周面が大径
部5aと小径部5bの2段に形成されているセンサ素子
5(図6(a)参照)の製造方法であって、一端が閉塞
された筒状をなすものの周面を大径部6aと小径部6b
の2段に加工した被製造物6(図11および図12参
照)を複数個保持板21に保持し、これを一単位として
各工程に送り込んで処理することにより複数個のセンサ
素子5を同時に製造するようにしたものである。
That is, also in the method of manufacturing the sensor element shown in this embodiment, as in the case of the first embodiment, one end is closed and the peripheral surface is the large diameter portion 5a. A method of manufacturing a sensor element 5 (see FIG. 6 (a)) formed in two stages of a small diameter portion 5b, in which a peripheral surface of a cylindrical body having one end closed is provided with a large diameter portion 6a and a small diameter portion 6b.
A plurality of workpieces 6 processed in two stages (see FIGS. 11 and 12) are held on a holding plate 21, and the plurality of sensor elements 5 are simultaneously processed by feeding them to each process as a unit. It is designed to be manufactured.

【0031】ここで、保持板21は可撓性を有する金属
製(耐蝕性に優れるステンレス等)の薄板又は金属を表
面にコーティングした可撓性を有する樹脂製の薄板であ
って、被製造物6の大径部6a又は小径部6b(この実
施の形態では大径部6a)が嵌合し得る穴をエッチン
グ、打抜き等により複数箇所に穿設したものである。
Here, the holding plate 21 is a flexible metal thin plate (stainless steel or the like having excellent corrosion resistance) or a flexible resin thin plate coated with a metal on the surface thereof. The holes 6 into which the large diameter portion 6a or the small diameter portion 6b (the large diameter portion 6a in this embodiment) can be fitted are formed at a plurality of locations by etching, punching or the like.

【0032】上記のような保持板21に複数個の被製造
物6を保持するには、各穴22に被製造物6の大径部6
aを嵌合する。
In order to hold a plurality of workpieces 6 on the holding plate 21 as described above, the large-diameter portion 6 of the workpiece 6 is placed in each hole 22.
Fit a.

【0033】そして、保持板21に保持した複数個の被
製造物6を保持板21と共に各工程に送り込んで処理す
ることにより、同時に複数個のセンサ素子5が製造され
ることになる。
Then, the plurality of workpieces 6 held on the holding plate 21 are sent to each process together with the holding plate 21 for processing, so that a plurality of sensor elements 5 are manufactured at the same time.

【0034】したがって、研磨工程における処理時間、
成膜工程におけるスピンコート、露光等の処理時間、洗
浄工程の処理時間等を大幅に短縮することができ、生産
性を大幅に高めることができることになる。
Therefore, the processing time in the polishing step,
The processing time such as spin coating and exposure in the film forming step, the processing time in the cleaning step, etc. can be greatly reduced, and the productivity can be greatly increased.

【0035】また、研磨工程における各被製造物6の高
さ方向の寸法のばらつきは、可撓性を有する保持板21
の高さ方向への変位によって吸収されるとともに、各被
製造物6は各穴22に完全に固定されるので、研磨盤7
(図5参照)を作動させても各被製造物6が各穴22内
で動くようなことはなく、高さ方向のばらつきが大きい
ために研磨盤7の方向への押圧力が部分的に不足しても
研磨面にだれが生じるような虞はなく、被製造物6は高
いものから順に研磨されて徐々に全体の高さが揃って行
き、最後に全体の高さが均一の寸法に仕上げられること
になる。
In addition, the variation of the dimension of each of the products 6 in the height direction in the polishing step is caused by the flexible holding plate 21.
Is absorbed by the displacement in the height direction, and each workpiece 6 is completely fixed in each hole 22.
Even if (see FIG. 5) is operated, each workpiece 6 does not move in each hole 22, and since the variation in the height direction is large, the pressing force in the direction of the polishing plate 7 is partially. Even if it is insufficient, there is no risk of sagging on the polished surface, and the workpiece 6 is polished in order from the highest one, and the overall height gradually becomes uniform, and finally the overall height becomes a uniform dimension. It will be finished.

【0036】なお、前記第1、第2および第3の実施の
形態においては、被製造物6を溶接又は嵌合によって保
持板1、11、21に固着したが、接着剤によって固着
しても同様の効果が得られるものである。
In the first, second and third embodiments, the product 6 is fixed to the holding plates 1, 11, 21 by welding or fitting, but it may be fixed by an adhesive. The same effect can be obtained.

【0037】図13〜図15(a)には、この発明によ
るセンサ素子の製造方法の第4の実施の形態が示されて
いて、図13は被製造物を保持する保持板を示す平面
図、図14は図13に示すものに被製造物を保持した状
態を示す部分拡大平面図、図15(a)は図14に示す
もののA−A線に沿って見た一部断面図である。
13 to 15 (a) show a fourth embodiment of the method for manufacturing a sensor element according to the present invention, and FIG. 13 is a plan view showing a holding plate for holding an object to be manufactured. FIG. 14 is a partially enlarged plan view showing a state in which the object to be manufactured is held by the one shown in FIG. 13, and FIG. 15 (a) is a partial cross-sectional view taken along the line AA of the one shown in FIG. .

【0038】すなわち、この実施の形態に示すセンサ素
子の製造方法も前記第1の実施の形態に示すものと同様
に、一端が閉塞された筒状をなすとともに、周面が大径
部5aと小径部5bの2段に形成されているセンサ素子
5(図6(a)参照)の製造方法であって、一端が閉塞
された筒状をなすものの周面を大径部6aと小径部6b
の2段に加工した被製造物6(図15(a)参照)を複
数個保持板31に保持し、これを一単位として各工程に
送り込んで処理することにより複数個のセンサ素子5を
同時に製造するようにしたものである。
That is, also in the method of manufacturing the sensor element shown in this embodiment, as in the case of the first embodiment, one end is closed and the peripheral surface is the large diameter portion 5a. A method of manufacturing a sensor element 5 (see FIG. 6 (a)) formed in two stages of a small diameter portion 5b, in which a peripheral surface of a cylindrical body having one end closed is provided with a large diameter portion 6a and a small diameter portion 6b.
By holding a plurality of workpieces 6 (see FIG. 15 (a)) processed in two stages on the holding plate 31 and sending them to each process as one unit, a plurality of sensor elements 5 are simultaneously processed. It is designed to be manufactured.

【0039】ここで、保持板31は、100μm程度の
厚みの金属製、例えば耐蝕性に優れるステンレス等から
なる可撓性を有する薄板であって、被製造物6の大径部
6aよりも小径の穴32をエッチング、打抜き等により
複数箇所に穿設するとともに、各穴32の内周面の対向
する部位に一対の梁34、34を形成したものである。
なお、梁34、34は、各穴32の内周面の対向する部
位に一対以上設けてもよいものである。
Here, the holding plate 31 is a flexible thin plate made of metal having a thickness of about 100 μm, for example, stainless steel having excellent corrosion resistance, and has a diameter smaller than that of the large diameter portion 6a of the workpiece 6. The holes 32 are formed at a plurality of locations by etching, punching or the like, and a pair of beams 34, 34 are formed at the opposing portions of the inner peripheral surface of each hole 32.
It should be noted that the beams 34, 34 may be provided in a pair or more at opposite portions of the inner peripheral surface of each hole 32.

【0040】上記のように構成した保持板31に複数個
の被製造物6、6、……を保持するには、各穴32を閉
塞するように保持板31上に複数個の被製造物6、6、
……を載置するとともに、各穴32の梁34、34と各
被製造物6の大径部6aの端面との間をシリーズ溶接等
により一体に固着する。この場合の溶接強度は、各工程
処理中に外れることなく、各工程終了後に容易に取り外
せる程度の強さとする。
In order to hold a plurality of products 6 to be held on the holding plate 31 constructed as described above, a plurality of products to be manufactured are placed on the holding plate 31 so as to close each hole 32. 6, 6,
, And the beams 34 of each hole 32 and the end surface of the large diameter portion 6a of each workpiece 6 are integrally fixed by series welding or the like. The welding strength in this case is such that it does not come off during the processing of each step and can be easily removed after the completion of each step.

【0041】そして、保持板31に保持した複数個の被
製造物6、6、……を保持板31と共に研磨、成膜等の
工程に送り込んで処理することにより、複数個のセンサ
素子5、5、……が同時に製造されることになる。
.. held by the holding plate 31 are sent together with the holding plate 31 to a process such as polishing, film formation and the like to process the plurality of sensor elements 5. 5, ... will be manufactured at the same time.

【0042】この場合、各被製造物6は各穴32の梁3
4、34によって保持板31に固定されているので、表
面研磨工程等において各穴32内で動くようなことはな
い。したがって、表面研磨工程等において、高さ方向の
寸法のばらつきが大きいために研磨盤の方向への押圧力
が部分的に不足しても、研磨面にだれが生じるようなこ
とはなく、複数個の被製造物6は高いものから順に研磨
されて徐々に全体の高さが揃って行き、最後に全体の高
さが均一の寸法に仕上げられることになる。
In this case, each workpiece 6 is formed by the beam 3 of each hole 32.
Since it is fixed to the holding plate 31 by 4, 34, it does not move in each hole 32 in the surface polishing process or the like. Therefore, in the surface polishing process, etc., even if the pressing force in the direction of the polishing plate is partially insufficient due to the large variation in the dimension in the height direction, no sagging occurs on the polishing surface. The workpiece 6 is polished in order from the tallest one, and the entire height gradually becomes uniform, and finally the entire height is finished to a uniform size.

【0043】したがって、被製造物6を1個づつ各工程
に送り込んで処理していた従来に比べて、一度に複数個
の被製造物6を各工程に送り込んで処理できるので、研
磨工程における処理時間、成膜工程におけるスピンコー
ト、露光等の処理時間、洗浄工程の処理時間等を大幅に
短縮することができ、生産性を大幅に高めることができ
ることになる。
Therefore, a plurality of products 6 to be processed can be sent to each process at a time as compared with the conventional case where the products 6 are sent to each process one by one and processed. The time, the processing time such as spin coating and exposure in the film forming step, the processing time in the cleaning step, and the like can be significantly shortened, and the productivity can be significantly increased.

【0044】また、保持板31上に複数個の被製造物
6、6、……を載置して、各穴32の内周面に設けた梁
34、34に各被製造物6の大径部6aの端面を溶接に
より固着するようにしたので、前記第1の実施の形態に
示したものよりも被製造物6を多く保持することができ
ることになる。
A plurality of products 6 to be manufactured are placed on the holding plate 31, and beams 34 and 34 provided on the inner peripheral surface of each hole 32 are used to mount the products 6 to be manufactured. Since the end surface of the diameter portion 6a is fixed by welding, the product 6 can be held in a larger amount than that shown in the first embodiment.

【0045】すなわち、一般に、被製造物6の全高の寸
法公差は加工上厳しくできるものの、大径部6aの高さ
方向の寸法公差は厳しくすることができない。前記第1
の実施の形態に示すものは、大径部6aの高さ方向の寸
法のばらつきがそのまま被製造物6の全高の寸法のばら
つきとして現れる。このため、各穴2の梁4、4を長く
してばね定数を小さくし、研磨工程等において保持板1
を高さ方向に変位しやすくし、被製造物6の高さ方向の
寸法のばらつきを保持板1の変位によって吸収するよう
にしている。
That is, in general, the dimensional tolerance of the entire height of the workpiece 6 can be made strict in processing, but the dimensional tolerance in the height direction of the large diameter portion 6a cannot be made strict. The first
In the embodiment described above, the dimensional variation in the height direction of the large diameter portion 6a appears as it is as the dimensional variation in the total height of the workpiece 6. Therefore, the beams 4 and 4 of each hole 2 are lengthened to reduce the spring constant, and the holding plate 1 is used in the polishing process or the like.
Is easily displaced in the height direction, and variations in the dimension of the workpiece 6 in the height direction are absorbed by the displacement of the holding plate 1.

【0046】これに対して、この実施の形態に示すもの
は、被製造物6の大径部6aの端面を梁34、34に固
着しているため、大径部6aの高さ方向の寸法のばらつ
きが被製造物6の全高のばらつきとなることはなく、各
穴32の梁34、34の長さを短くしてばね定数を高く
しても、だれ等が生じることなく複数個の被製造物6を
所定の高さに形成することができるものである。したが
って、前記第1の実施の形態に示すものに比べて、穴3
2と穴32との間隔をより狭くすることができ、保持で
きる被製造物6の数を前記第1の実施例の形態に示すも
のよりも多くすることができ、より生産性をより高める
ことができるものである。なお、被製造物6はフランジ
が付いているものに限らず、図15(b)に示すよう
に、円筒状のものであっても同様に固着できるものであ
り、この場合のセンサ素子5は図6(b)のようになる
ものである。
On the other hand, in the structure shown in this embodiment, since the end surface of the large diameter portion 6a of the workpiece 6 is fixed to the beams 34, 34, the dimension of the large diameter portion 6a in the height direction is high. Does not cause a variation in the total height of the workpiece 6, and even if the length of the beams 34, 34 of each hole 32 is shortened to increase the spring constant, a plurality of workpieces are not generated without sagging. The product 6 can be formed to have a predetermined height. Therefore, as compared with the first embodiment, the holes 3
The distance between the holes 2 and the holes 32 can be made narrower, the number of workpieces 6 that can be held can be made larger than that shown in the form of the first embodiment, and the productivity can be further improved. Is something that can be done. The workpiece 6 is not limited to the one with a flange, and as shown in FIG. 15 (b), the workpiece 6 can be similarly fixed even if it has a cylindrical shape. It is as shown in FIG.

【0047】図16および図17には、この発明による
センサ素子の製造方法の第5の実施の形態が示されてい
て、図16は被製造物を保持する保持板を示す平面図、
図17は図16に示すものの部分拡大図である。
FIGS. 16 and 17 show a fifth embodiment of the method for manufacturing a sensor element according to the present invention, and FIG. 16 is a plan view showing a holding plate for holding an object to be manufactured,
FIG. 17 is a partially enlarged view of what is shown in FIG.

【0048】すなわち、この実施の形態に示すセンサ素
子の製造方法も前記第1の実施の形態に示すものと同様
に、一端が閉塞された筒状をなすとともに、周面が大径
部5aと小径部5bの2段に形成されているセンサ素子
5(図6(a)参照)の製造方法であって、一端が閉塞
された筒状をなすものの周面を大径部6aと小径部6b
の2段に加工した被製造物6を複数個保持板41に保持
して一単位とし、これを各工程に送り込んで処理するこ
とにより複数個のセンサ素子5を同時に製造するように
したものである。
That is, similarly to the method of manufacturing the sensor element according to the first embodiment, the method of manufacturing the sensor element according to this embodiment has a cylindrical shape with one end closed and the peripheral surface of the large diameter portion 5a. A method of manufacturing a sensor element 5 (see FIG. 6 (a)) formed in two stages of a small diameter portion 5b, in which a peripheral surface of a cylindrical body having one end closed is provided with a large diameter portion 6a and a small diameter portion 6b.
A plurality of workpieces 6 processed in two stages are held by a holding plate 41 to form one unit, and a plurality of sensor elements 5 are simultaneously manufactured by sending the processed units to each process and processing. is there.

【0049】ここで、保持板41は、100μm程度の
厚みを有する金属製、例えば耐蝕性に優れるステンレス
等からなる可撓性を有する薄板、又はそれ以上の厚みを
有する金属製、例えば耐蝕性に優れるステンレス等から
なる厚板であって、被製造物6の小径部6bが挿入し得
る穴42を、エッチング、打抜き等により複数箇所に穿
設するとともに、各穴42の周囲に複数の切込み43を
設けて、これら複数の切込み43によって各穴42の周
囲にばね構造を形成したものである。
Here, the holding plate 41 is made of metal having a thickness of about 100 μm, for example, a flexible thin plate made of stainless steel or the like having excellent corrosion resistance, or made of metal having a thickness of more than that, for example, corrosion resistance. Holes 42, which are excellent thick plates made of stainless steel or the like, into which the small-diameter portion 6b of the workpiece 6 can be inserted are formed at a plurality of locations by etching, punching, or the like, and a plurality of notches 43 are formed around each hole 42. And a spring structure is formed around each hole 42 by the plurality of notches 43.

【0050】切込み43は、穴42を囲んで対向するよ
うに一対の円弧状のものを同一同心円上に設けるととも
に、このようなものを複数の同心円上に内から外に向か
って互い違いになるようにそれぞれ設けたものであっ
て、これらの複数の切込み43によって穴42の周囲に
ばね構造を形成したものである。
The cuts 43 are provided on the same concentric circle so as to be opposed to each other so as to surround the hole 42, and such cuts are staggered from the inside to the outside on the plurality of concentric circles. And a spring structure is formed around the hole 42 by the plurality of notches 43.

【0051】そして、上記のような保持板41に複数個
の被製造物6を保持するには、各穴42に被製造物6の
小径部6bを挿入して、各穴42の周囲の切込み43以
外の部分に各被製造物6の大径部6aをシリーズ溶接等
により一体に固着する。この場合の溶接強度は、各工程
処理中に外れることなく、各工程終了後に容易に取り外
せる程度の強さとする。
In order to hold a plurality of workpieces 6 on the holding plate 41 as described above, the small-diameter portion 6b of the workpiece 6 is inserted into each hole 42, and a notch around each hole 42 is formed. The large-diameter portion 6a of each workpiece 6 is integrally fixed to a portion other than 43 by series welding or the like. The welding strength in this case is such that it does not come off during the processing of each step and can be easily removed after the completion of each step.

【0052】そして、保持板41に保持した複数個の被
製造物6を一単位として、研磨、成膜等の各工程に送り
込んで処理することにより、複数個のセンサ素子5が同
時に製造されるものである。
Then, a plurality of workpieces 6 held on the holding plate 41 are used as one unit and sent to each process such as polishing, film formation, etc. to be processed, whereby a plurality of sensor elements 5 are simultaneously manufactured. It is a thing.

【0053】この場合、各被製造物6は、各穴42の周
囲に固定されているので、例えば、表面研磨工程等にお
いて各穴42内で動くようなことはなく、したがって、
高さ方向の寸法のばらつきが大きいために研磨盤の方向
への押圧力が部分的に不足しても、研磨面にだれが生じ
るようなことはなく、複数個の被製造物6は高いものか
ら順に研磨されて徐々に全体の高さが揃って行き、最後
に全体の高さが均一の寸法に仕上げられることになる。
In this case, since each workpiece 6 is fixed around each hole 42, it does not move in each hole 42 during the surface polishing process, and therefore,
Even if the pressing force in the direction of the polishing plate is partially insufficient due to the large variation in size in the height direction, no sagging occurs on the polishing surface, and the plurality of workpieces 6 are high. Then, the entire height is gradually polished until it becomes uniform, and finally the entire height is finished to a uniform size.

【0054】したがって、被製造物6を1個づつ各工程
に送り込んで処理していた従来に比べて、一度に複数個
の被製造物6を各工程に送り込んで処理できるので、研
磨工程における処理時間、成膜工程におけるスピンコー
ト、露光等の処理時間、洗浄工程の処理時間等を大幅に
短縮することができ、生産性を大幅に高めることができ
ることになる。
Therefore, a plurality of products 6 can be sent to each process at one time as compared with the conventional method in which the products 6 are sent to each process one by one. The time, the processing time such as spin coating and exposure in the film forming step, the processing time in the cleaning step, and the like can be significantly shortened, and the productivity can be significantly increased.

【0055】また、各穴42の周囲に複数の切込み43
を設けて、それら複数の切込み43によって各穴42の
周囲にばね構造を形成したことにより、保持板41が可
撓性が劣る厚板であっても、各被製造物6を各穴42に
おいて高さ方向に十分に変位させることができるので、
複数個の被製造物6の高さ方向の寸法のばらつきを十分
に吸収することができることになる。
A plurality of cuts 43 are formed around each hole 42.
And the spring structure is formed around each hole 42 by the plurality of notches 43, even if the holding plate 41 is a thick plate having inferior flexibility, each workpiece 6 is formed in each hole 42. Since it can be fully displaced in the height direction,
It is possible to sufficiently absorb the variation in the dimension of the plurality of products 6 in the height direction.

【0056】なお、前記の説明においては、保持板41
に複数個の被製造物6の小径部6bが挿入し得る穴42
を設け、この穴42の周囲に複数の切込み43を設けた
が、保持板41に複数の穴42を設けずに、複数個の被
製造物6を保持板41上に載置し、各被製造物6の一部
を保持板41にシリーズ溶接等により固着し、各被製造
物6の周囲の保持板41に複数の切込み43を設け、こ
れらの複数の切込み43によって各被製造物6の周囲に
ばね構造を形成してもよいものである。
In the above description, the holding plate 41
42 into which the small diameter portions 6b of the plurality of workpieces 6 can be inserted
Although a plurality of cuts 43 are provided around the hole 42, a plurality of workpieces 6 are placed on the holding plate 41 without forming the plurality of holes 42 in the holding plate 41, and A part of the product 6 is fixed to the holding plate 41 by series welding or the like, a plurality of cuts 43 are provided in the holding plate 41 around each product 6, and the plurality of cuts 43 allow the product 6 to be cut. A spring structure may be formed around it.

【0057】図18には、この発明によるセンサ素子の
製造方法の第6の実施の形態が示されていて、この実施
の形態に示すセンサ素子の製造方法も前記第1の実施の
形態に示すものと同様に、一端が閉塞された筒状をなす
とともに、周面が大径部5aと小径部5bの2段に形成
されているセンサ素子5(図6(a)参照)の製造方法
であって、一端が閉塞された筒状をなすものの周面を大
径部6aと小径部6bの2段に加工した被製造物6を複
数個保持板51に保持して一単位とし、これを各工程に
送り込んで処理することにより、複数個のセンサ素子5
を同時に製造するようにしたものである。
FIG. 18 shows a sixth embodiment of the method of manufacturing a sensor element according to the present invention, and the method of manufacturing the sensor element shown in this embodiment is also the same as that of the first embodiment. Similarly to the one described above, a method of manufacturing a sensor element 5 (see FIG. 6 (a)) having a cylindrical shape with one end closed and a peripheral surface formed in two stages of a large diameter portion 5a and a small diameter portion 5b is used. Then, a plurality of workpieces 6, each of which has a cylindrical shape with one end closed and whose peripheral surface is processed into two stages of a large diameter portion 6a and a small diameter portion 6b, are held on a holding plate 51 to form one unit. A plurality of sensor elements 5 can be processed by sending them to each process.
Are manufactured at the same time.

【0058】ここで、保持板51は、100μm程度の
厚みを有する金属製、例えば耐蝕性に優れるステンレス
等からなる可撓性を有する薄板、又はそれ以上の厚みを
有する金属製、例えば耐蝕性に優れるステンレス等から
なる厚板であって、被製造物6の小径部6bが挿入し得
る穴52を板51の中心部にエッチング、打抜き等によ
り設けるとともに、この穴52の外側に穴52を中心と
して、複数の被製造物6の小径部6bが挿入し得る2つ
の環状の穴53、54をエッチング、打抜き等によって
設けたものであって、これらの穴52、53、54によ
って保持板51上にばね構造を形成したものである。
Here, the holding plate 51 is made of a metal having a thickness of about 100 μm, for example, a flexible thin plate made of stainless steel or the like having excellent corrosion resistance, or a metal having a thickness of more than that, for example, corrosion resistance. A thick plate made of an excellent material such as stainless steel, which has a hole 52 into which the small-diameter portion 6b of the workpiece 6 can be inserted by etching, punching, or the like in the center of the plate 51, and the hole 52 is centered outside the hole 52. As a result, two annular holes 53, 54 into which the small-diameter portions 6b of the plurality of workpieces 6 can be inserted are provided by etching, punching or the like, and the holes 52, 53, 54 are provided on the holding plate 51. It has a spring structure formed on it.

【0059】そして、上記のような保持板51に複数個
の被製造物6を保持するには、各穴52、53、54に
被製造物6の小径部6bを挿入して、各穴52、53、
54の周囲に各被製造物6の大径部6aの一部をシリー
ズ溶接等により一体に固着する。この場合の溶接強度
は、各工程処理中に外れることなく、各工程終了後に容
易に取り外せる程度の強さとする。
In order to hold a plurality of workpieces 6 on the holding plate 51 as described above, the small-diameter portion 6b of the workpiece 6 is inserted into each of the holes 52, 53, 54, and each hole 52 is , 53,
A part of the large-diameter portion 6a of each workpiece 6 is integrally fixed around 54 by series welding or the like. The welding strength in this case is such that it does not come off during the processing of each step and can be easily removed after the completion of each step.

【0060】そして、保持板51に保持した複数個の被
製造物6を一単位として、研磨、成膜等の各工程に送り
込んで処理することにより、複数個のセンサ素子5が同
時に製造されるものである。
Then, the plurality of workpieces 6 held by the holding plate 51 are sent as one unit to each process such as polishing, film formation and the like, and a plurality of sensor elements 5 are simultaneously manufactured. It is a thing.

【0061】この場合、各被製造物6は、各穴52、5
3、54の周囲に固定されているので、例えば、表面研
磨工程等において各穴52、53、54内で動くような
ことはなく、したがって、高さ方向の寸法のばらつきが
大きいために研磨盤の方向への押圧力が部分的に不足し
ても、研磨面にだれが生じるようなことはなく、複数個
の被製造物6は高いものから順に研磨されて徐々に全体
の高さが揃って行き、最後に全体の高さが均一の寸法に
仕上げられることになる。
In this case, the respective workpieces 6 have holes 52, 5
Since it is fixed around 3, 54, it does not move in each hole 52, 53, 54 in the surface polishing process, etc., and therefore, the polishing plate has a large variation in the dimension in the height direction. Even if the pressing force in the direction of is partially insufficient, no sagging occurs on the polishing surface, and the plurality of workpieces 6 are polished in order from the highest one, and the entire height gradually becomes uniform. Finally, the overall height will be finished to a uniform size.

【0062】したがって、被製造物6を1個づつ各工程
に送り込んで処理していた従来に比べて、一度に複数個
の被製造物6を各工程に送り込んで処理できるので、研
磨工程における処理時間、成膜工程におけるスピンコー
ト、露光等の処理時間、洗浄工程の処理時間等を大幅に
短縮することができ、生産性を大幅に高めることができ
ることになる。
Therefore, as compared with the conventional method in which the products 6 are sent to each process one by one, a plurality of products 6 can be sent to each process at a time and processed. The time, the processing time such as spin coating and exposure in the film forming step, the processing time in the cleaning step, and the like can be significantly shortened, and the productivity can be significantly increased.

【0063】また、穴52の周囲に穴52を中心として
2つの環状の穴53、54を設けて、それらの穴52、
53、54により保持板51上にばね構造を形成したこ
とにより、保持板51が可撓性の劣る厚板であっても、
各穴52、53、54において各被製造物6を高さ方向
に十分に変位させることができるので、複数個の被製造
物6の高さ方向の寸法のばらつきを十分に吸収すること
ができ、生産性を大幅に高めることができることにな
る。
Two annular holes 53 and 54 are provided around the hole 52 with the hole 52 as the center, and the holes 52 and
By forming the spring structure on the holding plate 51 by 53 and 54, even if the holding plate 51 is a thick plate having poor flexibility,
Since each of the workpieces 6 can be sufficiently displaced in the height direction in each of the holes 52, 53, 54, it is possible to sufficiently absorb the variation in the dimension of the plurality of workpieces 6 in the height direction. , Will be able to significantly increase productivity.

【0064】なお、前記の説明においては、穴52の外
側に、穴52を中心として2つの環状の穴53、54を
設けたが、環状の穴を1つ又は3つ以上設けてもよいの
は勿論のことである。
In the above description, the two annular holes 53 and 54 centering on the hole 52 are provided outside the hole 52, but one or three or more annular holes may be provided. Of course.

【0065】[0065]

【発明の効果】この発明は、前記のように構成したこと
により、保持板に複数の被製造物を固着したものを一単
位として最初に研磨工程に送り込み、複数の被製造物を
直接に、又は保持板を介して研磨盤の方向に押圧しなが
ら、複数の被製造物の処理面が同時に研磨されることに
なる。従って、複数の被製造物の高さ方向の寸法にばら
つきがあっても、そのばらつきを保持板が厚み方向に変
位することにより、又は片持梁が変位することにより吸
収できるので、複数の被製造物を一定の研磨精度で仕上
げることができることになる。また、複数の被製造物を
同時に研磨することができるので、研磨作業の効率を高
めることができる。そして、研磨工程が終了した後に、
この一単位を成膜等の工程に送り込み、各工程を順次経
ることにより複数のセンサ素子を同時に製造することが
できる。従って、センサ素子の生産効率を高めることが
できることになる。
The present invention is configured as described above.
The holding plate holds multiple products to be manufactured.
First, it is sent to the polishing process first,
Do not press in the direction of the polishing plate directly or through the holding plate.
That the processed surfaces of multiple workpieces are polished simultaneously.
Become. Therefore, there are variations in the height direction of multiple workpieces.
Even if there is sticking, the variation in the holding plate changes in the thickness direction.
Position, or the cantilever is displaced
Since it can be stored, it finishes multiple products with a certain polishing accuracy.
You will be able to take advantage of it. In addition, multiple products
Since polishing can be done at the same time, the efficiency of polishing work is
Can be turned on. And after the polishing process is completed,
This one unit is sent to processes such as film formation, and each process is sequentially processed.
This allows multiple sensor elements to be manufactured simultaneously.
it can. Therefore, it is possible to improve the production efficiency of the sensor element.
You can do it.

【0066】[0066]

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明によるセンサ素子の製造方法の第1の
実施の形態の保持板を示した平面図である。
FIG. 1 is a plan view showing a holding plate according to a first embodiment of a method for manufacturing a sensor element according to the present invention.

【図2】図1に示すものの部分拡大図である。FIG. 2 is a partially enlarged view of what is shown in FIG.

【図3】(a)は図1に示すものに被製造物を保持した
状態を示した部分拡大図、(b)は他の例の被製造物を
保持した状態を示した部分拡大図である。
3A is a partially enlarged view showing a state in which a product to be manufactured is held on the one shown in FIG. 1, and FIG. 3B is a partially enlarged view showing a state in which a product to be manufactured in another example is held. is there.

【図4】(a)は図3(a)に示すものの側面図、
(b)は図3(b)に示すものの側面図である。
4 (a) is a side view of what is shown in FIG. 3 (a),
FIG. 3B is a side view of what is shown in FIG.

【図5】図1に示す保持板に複数個の被製造物を保持
し、それを一単位として表面研磨工程に送り込んだ状態
を示した説明図である。
FIG. 5 is an explanatory view showing a state in which a plurality of products to be manufactured are held on the holding plate shown in FIG. 1 and sent as a unit to the surface polishing step.

【図6】(a)はこの発明によるセンサ素子および従来
のセンサ素子の一例を示した平面図、(b)は他の例の
センサ素子を示した平面図である。
FIG. 6A is a plan view showing an example of a sensor element according to the present invention and a conventional sensor element, and FIG. 6B is a plan view showing a sensor element of another example.

【図7】この発明によるセンサ素子の製造方法の第2の
実施の形態の保持板を示した平面図である。
FIG. 7 is a plan view showing a holding plate of a second embodiment of the method for manufacturing a sensor element according to the present invention.

【図8】図7に示すものに被製造物を保持した状態を示
した部分拡大図である。
FIG. 8 is a partially enlarged view showing a state in which the object to be manufactured is held by the one shown in FIG.

【図9】(a)は図8に示すものの側面図、(b)は他
の被製造物を保持した場合の側面図である。
9 (a) is a side view of what is shown in FIG. 8, and FIG. 9 (b) is a side view in the case of holding another workpiece.

【図10】この発明によるセンサ素子の製造方法の第3
の実施の形態の保持板を示した平面図である。
FIG. 10 is a third method of manufacturing a sensor element according to the present invention.
FIG. 4 is a plan view showing a holding plate of the embodiment.

【図11】図10に示すものに被製造物を保持した状態
を示した部分拡大図である。
FIG. 11 is a partially enlarged view showing a state in which the object to be manufactured is held by the one shown in FIG.

【図12】図11に示すものの側面図である。FIG. 12 is a side view of what is shown in FIG. 11.

【図13】この発明によるセンサ素子の製造方法の第4
の実施の形態の保持板を示した平面図である。
FIG. 13 is a fourth method of manufacturing the sensor element according to the present invention.
FIG. 4 is a plan view showing a holding plate of the embodiment.

【図14】図13に示すものに被製造物を保持した状態
を示した部分拡大平面図である。
FIG. 14 is a partially enlarged plan view showing a state in which the article to be manufactured is held by the one shown in FIG.

【図15】(a)は図14に示すもののA−A線に沿っ
て見た一部断面図、(b)は他の被製造物を保持した状
態を示した一部断面図である。
15A is a partial cross-sectional view taken along line AA of FIG. 14, and FIG. 15B is a partial cross-sectional view showing a state in which another workpiece is held.

【図16】この発明によるセンサ素子の製造方法の第5
の実施の形態の保持板を示した平面図である。
FIG. 16 is a fifth method of manufacturing a sensor element according to the present invention.
FIG. 4 is a plan view showing a holding plate of the embodiment.

【図17】図16に示すものの部分拡大図である。FIG. 17 is a partially enlarged view of what is shown in FIG.

【図18】この発明によるセンサ素子の製造方法の第6
の実施の形態の保持板を示した平面図である。
FIG. 18 is a sixth method of manufacturing a sensor element according to the present invention.
FIG. 4 is a plan view showing a holding plate of the embodiment.

【図19】この発明および従来のセンサ素子の製造工程
を示した説明図である。
FIG. 19 is an explanatory view showing the manufacturing process of the present invention and the conventional sensor element.

【図20】従来のセンサ素子の製造方法の一例を示した
説明図である。
FIG. 20 is an explanatory diagram showing an example of a conventional method for manufacturing a sensor element.

【符号の説明】[Explanation of symbols]

1、11、21、31、41、51……保持板 2、12、22、32、42、52、53、54、61
……穴 3、43……切込み 4、34……梁 5……センサ素子 5a、6a……大径部 5b、6b……小径部 6……被製造物 7、65……研磨盤 8、67……錘 60……ホルダ 64……ガイド 66……弾性材
1, 11, 21, 31, 41, 51 ... Retaining plates 2, 12, 22, 32, 42, 52, 53, 54, 61
...... Hole 3,43 ...... Notch 4,34 ...... Beam 5 ...... Sensor elements 5a, 6a ...... Large-diameter parts 5b, 6b ...... Small-diameter part 6 ...... Products 7, 65 ...... Grinding plate 8, 67 ... Weight 60 ... Holder 64 ... Guide 66 ... Elastic material

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−98927(JP,A) 特開 平6−126604(JP,A) 特開 平6−63862(JP,A) 特開 昭62−176757(JP,A) 実開 昭54−42473(JP,U) 実開 平2−126754(JP,U) (58)調査した分野(Int.Cl.7,DB名) B24B 37/04 B24B 41/06 B24B 7/16 G01L 1/22 ─────────────────────────────────────────────────── ─── Continuation of front page (56) Reference JP-A-2-98927 (JP, A) JP-A-6-126604 (JP, A) JP-A-6-63862 (JP, A) JP-A-62- 176757 (JP, A) Actual development Sho 54-42473 (JP, U) Actual development 2-126754 (JP, U) (58) Fields investigated (Int.Cl. 7 , DB name) B24B 37/04 B24B 41 / 06 B24B 7/16 G01L 1/22

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一端が閉塞された略筒状のセンサ素子の
製造方法であって、厚み方向に可撓性を有する一枚の保
持板に複数の被製造物を、その処理面前記保持板の撓
む方向を向くように固着し、この保持板と複数の被製造
物とを一体としたものを一単位として、最初に研磨工程
に送り込んで、複数の被製造物の処理面が研磨盤の方向
を向くように研磨盤上に位置し、複数の被製造物を直接
に、又は保持板を介して研磨盤の方向に押圧しながら複
数の被製造物の処理面の研磨を同時に行い、研磨終了後
に前記一単位を成膜等の工程に送り込んで、各工程を経
ることにより複数個のセンサ素子を同時に製造すること
を特徴とするセンサ素子の製造方法。
1. A method of manufacturing a substantially cylindrical sensor element having one end closed , which comprises a single protective sheet having flexibility in a thickness direction.
A plurality of the product to the holding plates, fixed to face a direction deflected the treated surface of the holding plate, a plurality of the manufacturing and the retaining plate
The polishing process is performed first as a unit of the product and the product.
And the treated surfaces of multiple workpieces are in the direction of the polishing machine.
It is located on the polishing machine so that
Or pressing the holding plate in the direction of the polishing plate
After polishing the processed surface of several products at the same time,
Then, send the above unit to the process such as film formation,
A method of manufacturing a sensor element, which comprises simultaneously manufacturing a plurality of sensor elements by the above .
【請求項2】 一端が閉塞された略筒状のセンサ素子の
製造方法であって、厚み方向に可撓性を有する一枚の保
持板に複数の穴を設け、該穴の内面に径方向内方に突出
する少なくとも二つの片持梁を設け、各穴の位置に被製
造物を各々の処理面が前記保持板の撓む方向を向くよう
に位置して、各被製造物と各穴の片持梁とを固着し、こ
の保持板と複数の被製造物とを一体としたものを一単位
として、最初に研磨工程に送り込んで、複数の被製造物
の処理面が研磨盤の方向を向くように研磨盤上に位置
し、複数の被製造物を直接に、又は保持板を介して研磨
盤の方向に押圧しながら複数の被製造物の処理面の研磨
を同時に行い、研磨終了後に前記一単位を成膜等の工程
に送り込んで、各工程を経ることにより複数個のセンサ
素子を同時に製造することを特徴とするセンサ素子の製
造方法。
2. A method for manufacturing a sensor element having a substantially cylindrical shape with one end closed, wherein a single protective sheet having flexibility in a thickness direction is used.
A plurality of holes are provided in the holding plate, at least two cantilever beams that project inward in the radial direction are provided on the inner surface of the holes, and the holes are manufactured at the positions of the holes.
Make sure that each processed surface faces the bending direction of the holding plate.
Position, fix each workpiece and the cantilever of each hole,
The holding plate and the plurality of products to be manufactured are integrated into one unit and first sent to the polishing process to
Positioned on the polishing board so that the treated surface of the
And polish multiple workpieces directly or through the holding plate.
Polishing the processed surfaces of multiple workpieces while pressing in the direction of the board
And the step of film-forming one unit after the polishing is completed.
Multiple sensors by sending them to each process
A method for manufacturing a sensor element, which comprises simultaneously manufacturing the elements.
JP23551195A 1994-09-13 1995-09-13 Manufacturing method of sensor element Expired - Lifetime JP3462315B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP23551195A JP3462315B2 (en) 1994-09-13 1995-09-13 Manufacturing method of sensor element
US08/713,425 US5791035A (en) 1995-09-13 1996-09-13 Method for making a sensor element

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP21881094 1994-09-13
JP6-218810 1994-09-13
JP23551195A JP3462315B2 (en) 1994-09-13 1995-09-13 Manufacturing method of sensor element

Publications (2)

Publication Number Publication Date
JPH08132344A JPH08132344A (en) 1996-05-28
JP3462315B2 true JP3462315B2 (en) 2003-11-05

Family

ID=26522764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23551195A Expired - Lifetime JP3462315B2 (en) 1994-09-13 1995-09-13 Manufacturing method of sensor element

Country Status (1)

Country Link
JP (1) JP3462315B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5076723B2 (en) * 2007-08-09 2012-11-21 富士通株式会社 Polishing apparatus, substrate and method for manufacturing electronic apparatus
CN114752740B (en) * 2022-04-12 2023-05-23 北京航空航天大学 Pneumatic rolling tool for nanocrystallization of metal surface

Also Published As

Publication number Publication date
JPH08132344A (en) 1996-05-28

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