JP3386167B2 - Single crystal growth equipment - Google Patents
Single crystal growth equipmentInfo
- Publication number
- JP3386167B2 JP3386167B2 JP02563093A JP2563093A JP3386167B2 JP 3386167 B2 JP3386167 B2 JP 3386167B2 JP 02563093 A JP02563093 A JP 02563093A JP 2563093 A JP2563093 A JP 2563093A JP 3386167 B2 JP3386167 B2 JP 3386167B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- crystal growth
- vibration
- solid
- liquid interface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Vibration Prevention Devices (AREA)
Description
【発明の詳細な説明】
【0001】
【産業上の利用分野】本発明は、ブリッジマン法等を用
いる単結晶成長装置に関する。
【0002】
【従来の技術】ブリッジマン法を用いる単結晶成長装置
は、るつぼ内に溶融原料を収納し、これを適当な温度分
布を有する炉内で高温側から低温側へ移動させ、溶融原
料を徐々に固化させて単結晶を成長させる装置である。
従来、このような単結晶成長装置は、例えば図3に示す
ように、床面8上に耐震装置10を設け、この耐震装置
10の上に単結晶成長装置20全体を載置し、地盤の振
動による影響を除去するようにしている。
【0003】
【発明が解決しようとする課題】ところが単結晶成長装
置は上下に長いためその下端部に耐震装置を設けても、
肝要な結晶成長部では、振動の影響を免れないという問
題があった。本発明者らの調査によれば、研究室の床上
に設置された結晶成長装置では、加速度レベル40〜5
0dBの振動が測定され、周囲の機械装置等が稼動する
とさらに振動が増加することが判明した。さらに、この
結晶成長装置の下端より2m上方の位置では50〜55
dBの加速度レベルが検出された。この下端より2m上
方の位置はブリッジマン法単結晶成長装置では、単結晶
成長の固液界面レベルにほぼ相当する。
【0004】本発明は、このような溶融原料から単結晶
を成長させる上下に長い装置の、最も重要な固液界面の
振動を防止し、振動の影響を受けずに均一な単結晶を製
造する単結晶成長装置を提供することを目的とする。
【0005】
【課題を解決するための手段】本発明は、上記問題点を
解決するために提案されたもので、その技術手段は、溶
融原料から単結晶を成長させる装置において、固液界面
レベルの上下1m以内の高さ位置にこの装置の支持部を
設ける支持構造とし、この支持部を耐震装置の上面に載
置したことを特徴とする単結晶成長装置である。この装
置において、さらに好ましい支持部の位置としては、固
液界面レベルの上下0.5m以内の高さであり、さらに
高さの差を少なくすると一層好適であり、理想的には両
者の高さを一致させるとよい。
【0006】
【作用】本発明装置は、単結晶を育成する固液界面に近
接する位置に支持部を設け、この支持部を耐震装置を介
して支持したので、免振レベルが固液界面レベル又はそ
の近傍となる。従って、最も重要な結晶成長界面におい
て振動の加速度が最小となる。
【0007】支持部の高さと固液界面との高さはできる
だけ近接させることが好ましく、完全に一致することが
理想であるが、実技上それほど厳密に設定する必要はな
く、固液界面レベルに対して支持部との高さ位置を上下
1m以内とすれば、所期の効果を達成することができ、
さらに好ましくは上下0.5m以内とするとよい。耐震
装置としては、空気ばね、オイルダンパ、磁気浮上装置
その他を用いる。水平動に対する2次元耐震装置とすれ
ばよいが、3次元耐震装置としてもよい。また、免振対
象レベルは、25〜100Hzの微振動に対しては、通
常対策が簡単であり、本発明装置では、一般に対策が難
しいとされている0〜10Hzの弱地震動に対応する耐
震装置を用い、震度5(80〜250ガル)に対応する
ものとする。
【0008】
【実施例】図1は本発明の実施例の単結晶成長装置の側
面図、図2はその平面図である。この装置は、るつぼ1
内に溶融原料2を収納し、ヒータ3で温度勾配を付して
ある炉4内を下方に移動させ、るつぼ1の下端に種結晶
を配置して単結晶5を成長させる装置である。
【0009】実施例装置は、4個の支持部6を固液界面
7とほぼ一致させた高さ位置に設け、これを、床面8か
ら立設したフレーム9に耐震装置10を介して支持し
た。単結晶成長装置で有害な振動は主として水平振動で
あることから、耐震装置10として二次元耐震装置を用
いた。本発明の実施例の固液界面レベルにおける振動加
速度を従来例と比較して図4に示した。図4中におい
て、Aは単結晶装置の下端に耐震装置を設けた従来例の
床上、Bは従来例の装置の下端から約2m上、Cは実施
例の固液界面レベル、Dは約1m離れた位置の振動ミル
が稼動したときの実施例の固液界面レベルにおけるそれ
ぞれの振動加速度の測定値である。実施例では、振動加
速度は28〜32dBとなり、人工的振動が1m以内で
発生しても影響を受けなかった。また、図4中のEは偶
々震度3の地震が発生した時の実施例装置の固液界面レ
ベルの振動加速度のデータである。実施例装置では震度
3程度の地震があっても、結晶成長を異常なく続行する
ことができる。
【0010】
【発明の効果】本発明の単結晶成長装置は以上のように
構成されているので、固液界面の振動を著しく減少させ
ることができ、人工的振動が装置の1m以内で発生して
も影響を受けないこととなり、優れた結晶成長を達成す
ることができた。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a single crystal growing apparatus using the Bridgman method or the like. A single crystal growth apparatus using the Bridgman method stores a molten material in a crucible, moves it from a high temperature side to a low temperature side in a furnace having an appropriate temperature distribution, and melts the raw material. Is a device for growing a single crystal by gradually solidifying.
Conventionally, such a single crystal growth apparatus is provided with a seismic device 10 on a floor 8 as shown in FIG. 3, for example, and the entire single crystal growth device 20 is placed on the seismic device 10 to remove the ground. The effect of vibration is removed. [0003] However, since the single crystal growth apparatus is long vertically, even if a seismic device is provided at the lower end thereof,
In an important crystal growth part, there is a problem that the influence of vibration cannot be avoided. According to the investigation by the present inventors, in a crystal growth apparatus installed on a laboratory floor, an acceleration level of 40 to 5 was obtained.
The vibration of 0 dB was measured, and it was found that the vibration increased further when the peripheral machinery and the like operated. Further, at a position 2 m above the lower end of the crystal growth apparatus, 50 to 55
A dB acceleration level has been detected. The position 2 m above the lower end substantially corresponds to the solid-liquid interface level of single crystal growth in the Bridgman single crystal growth apparatus. The present invention prevents the most important vibration of the solid-liquid interface of a vertically long apparatus for growing a single crystal from such a molten raw material, and produces a uniform single crystal without being affected by the vibration. It is an object to provide a single crystal growth apparatus. SUMMARY OF THE INVENTION The present invention has been proposed to solve the above-mentioned problems, and its technical means is to provide an apparatus for growing a single crystal from a molten raw material at a solid-liquid interface level. A single crystal growth apparatus characterized by having a support structure in which a support portion of the apparatus is provided at a height of 1 m or less from above and below, and the support section is mounted on an upper surface of the seismic device. In this apparatus, the position of the supporting portion is more preferably at a height within 0.5 m above and below the solid-liquid interface level, and it is more preferable to further reduce the difference in height. Should be matched. In the apparatus of the present invention, a support is provided at a position close to the solid-liquid interface for growing a single crystal, and the support is supported via an earthquake-resistant device. Or it becomes the vicinity thereof. Therefore, the acceleration of vibration is minimized at the most important crystal growth interface. It is preferable that the height of the support portion and the height of the solid-liquid interface be as close as possible, and ideally, they should be completely coincident. However, in practice, it is not necessary to set the height so strictly. On the other hand, if the height position with respect to the support portion is within 1 m vertically, the desired effect can be achieved,
More preferably, it is good to be within 0.5 m above and below. As the seismic device, an air spring, an oil damper, a magnetic levitation device, or the like is used. A two-dimensional seismic device for horizontal movement may be used, but a three-dimensional seismic device may be used. In addition, as for the vibration isolation level, a countermeasure against microvibrations of 25 to 100 Hz is usually easy, and the apparatus of the present invention is a seismic device corresponding to a weak ground motion of 0 to 10 Hz, which is generally considered to be difficult. And corresponds to seismic intensity 5 (80 to 250 gal). FIG. 1 is a side view of a single crystal growth apparatus according to an embodiment of the present invention, and FIG. 2 is a plan view thereof. This device is a crucible 1
This is a device in which a molten raw material 2 is housed in a furnace, and is moved downward in a furnace 4 having a temperature gradient by a heater 3, and a seed crystal is arranged at a lower end of the crucible 1 to grow a single crystal 5. In the apparatus of the present invention, four support portions 6 are provided at heights substantially coincident with the solid-liquid interface 7, and are supported on a frame 9 erected from a floor 8 via an earthquake-resistant device 10. did. Since the harmful vibration in the single crystal growth apparatus is mainly horizontal vibration, a two-dimensional seismic apparatus was used as the seismic apparatus 10. FIG. 4 shows the vibration acceleration at the solid-liquid interface level in the example of the present invention in comparison with the conventional example. In FIG. 4, A is on the floor of the conventional example in which a seismic device is provided at the lower end of the single crystal apparatus, B is about 2 m above the lower end of the apparatus of the conventional example, C is the solid-liquid interface level of the example, and D is about 1 m. It is a measured value of each vibration acceleration at the solid-liquid interface level of the example when the vibration mill at a remote position is operated. In the example, the vibration acceleration was 28 to 32 dB, and was not affected even if artificial vibration occurred within 1 m. E in FIG. 4 is the data of the vibration acceleration at the solid-liquid interface level of the embodiment device when an earthquake of seismic intensity 3 accidentally occurred. In the apparatus of the embodiment, even if there is an earthquake with a seismic intensity of about 3, the crystal growth can be continued without abnormality. Since the single crystal growth apparatus of the present invention is constructed as described above, vibration at the solid-liquid interface can be significantly reduced, and artificial vibration is generated within 1 m of the apparatus. However, it was not affected, and excellent crystal growth could be achieved.
【図面の簡単な説明】
【図1】本発明の実施例の単結晶成長装置を示す側面図
である。
【図2】本発明の実施例の単結晶成長装置を示す平面図
である。
【図3】従来の単結晶成長装置を示す図である。
【図4】発明の効果を示すグラフである。
【符号の説明】
1 るつぼ 2 溶融原料
3 ヒータ 4 炉
5 単結晶 6 支持部
7 固液界面 8 床面
9 フレーム 10 耐震装置BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a side view showing a single crystal growth apparatus according to an embodiment of the present invention. FIG. 2 is a plan view showing a single crystal growth apparatus according to an embodiment of the present invention. FIG. 3 is a diagram showing a conventional single crystal growth apparatus. FIG. 4 is a graph showing the effect of the present invention. [Description of Signs] 1 crucible 2 molten material 3 heater 4 furnace 5 single crystal 6 support 7 solid-liquid interface 8 floor 9 frame 10 seismic device
Claims (1)
おいて、固液界面レベルの上下1m以内の高さ位置に該
装置の支持部を設け、該支持部を耐震装置上面に載置し
たことを特徴とする単結晶成長装置。(57) [Claim 1] In a device for growing a single crystal from a molten raw material, a support portion of the device is provided at a height within 1 m above and below the solid-liquid interface level, and the support portion is provided. A single crystal growth apparatus mounted on an upper surface of a seismic device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02563093A JP3386167B2 (en) | 1993-02-15 | 1993-02-15 | Single crystal growth equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP02563093A JP3386167B2 (en) | 1993-02-15 | 1993-02-15 | Single crystal growth equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06239685A JPH06239685A (en) | 1994-08-30 |
JP3386167B2 true JP3386167B2 (en) | 2003-03-17 |
Family
ID=12171191
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP02563093A Expired - Fee Related JP3386167B2 (en) | 1993-02-15 | 1993-02-15 | Single crystal growth equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3386167B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2741633B1 (en) * | 1995-11-23 | 1997-12-19 | Commissariat Energie Atomique | CRYSTALLIZATION OVEN FOR MATERIAL WITH LOW THERMAL CONDUCTIVITY AND / OR LOW HARDNESS |
-
1993
- 1993-02-15 JP JP02563093A patent/JP3386167B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH06239685A (en) | 1994-08-30 |
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