JP3357479B2 - Microwave dielectric porcelain composition and method for producing the same - Google Patents

Microwave dielectric porcelain composition and method for producing the same

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Publication number
JP3357479B2
JP3357479B2 JP25891594A JP25891594A JP3357479B2 JP 3357479 B2 JP3357479 B2 JP 3357479B2 JP 25891594 A JP25891594 A JP 25891594A JP 25891594 A JP25891594 A JP 25891594A JP 3357479 B2 JP3357479 B2 JP 3357479B2
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Japan
Prior art keywords
weight
powder
tio
composition
microwave dielectric
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Expired - Fee Related
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JP25891594A
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Japanese (ja)
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JPH0891930A (en
Inventor
弘至 片桐
博文 尾関
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NGK Spark Plug Co Ltd
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NGK Spark Plug Co Ltd
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Priority to JP25891594A priority Critical patent/JP3357479B2/en
Priority to EP94120445A priority patent/EP0659706B1/en
Priority to DE69409477T priority patent/DE69409477T2/en
Priority to US08/363,333 priority patent/US5489559A/en
Publication of JPH0891930A publication Critical patent/JPH0891930A/en
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Publication of JP3357479B2 publication Critical patent/JP3357479B2/en
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、マイクロ波誘電体磁器
組成物に関し、更に詳しく言えば、比誘電率(以下、単
にεr という。)、無負荷Q(以下、単にQuとい
う。)及び共振周波数の温度係数(以下、単にτf とい
う。)を実用的な特性範囲内で広く制御し、これらの各
特性をバランスよく維持するマイクロ波誘電体磁器組成
物及びその製造方法に関する。本発明は、マイクロ波領
域において誘電体共振器、マイクロ波集積回路基板、各
種マイクロ波回路のインピーダンス整合等に利用され、
特にLCフィルタ材として好適である。
The present invention relates to relates to a microwave dielectric ceramic composition and, more particularly, the dielectric constant (hereinafter, simply. As epsilon r), unloaded Q (hereinafter, simply referred to as Qu.) And The present invention relates to a microwave dielectric ceramic composition that controls a temperature coefficient of resonance frequency (hereinafter simply referred to as τ f ) widely within a practical characteristic range and maintains these characteristics in a well-balanced manner, and a method of manufacturing the same. INDUSTRIAL APPLICABILITY The present invention is used for a dielectric resonator, a microwave integrated circuit board, impedance matching of various microwave circuits, etc. in a microwave region,
Particularly, it is suitable as an LC filter material.

【0002】[0002]

【従来の技術】一般にマイクロ波やミリ波等の高周波領
域に使用されるLCフィルタ材や誘電体共振器、誘電体
基板等には、高いεr 及び高いQuを有し、しかもτf
の絶対値が小さいものが望まれている。つまり、マイク
ロ波誘電体磁器組成物(以下、単に誘電体磁器組成物と
いう。)は、使用周波数が高周波となるに従って誘電損
失が大きくなる傾向にあるので、マイクロ波領域で高い
εr 及びQu等優れた特性を有する誘電体磁器組成物が
望まれている。近年、このような誘電体磁器組成物とし
て、Ba(Zn1/3 Ta2/3 )O3 やBa(Mg1/3
2/3 )O3 等の複合ペロブスカイト型構造に属する組
成物或いはBaO−TiO2 系組成物等が使用されてい
るが、いずれも焼成温度が1300℃以上と高いもので
ある。
2. Description of the Related Art Generally, an LC filter material, a dielectric resonator, a dielectric substrate and the like used in a high frequency region such as a microwave and a millimeter wave have a high ε r and a high Qu, and have a high τ f
It is desired that the absolute value of is small. In other words, the microwave dielectric porcelain composition (hereinafter simply referred to as dielectric porcelain composition) tends to have a higher dielectric loss as the operating frequency becomes higher, so that ε r and Qu etc. in the microwave region are high. A dielectric porcelain composition having excellent properties has been desired. In recent years, Ba (Zn 1/3 Ta 2/3 ) O 3 and Ba (Mg 1/3 T) have been used as such dielectric ceramic compositions.
a 2/3 ) A composition belonging to a complex perovskite structure such as O 3 or a BaO—TiO 2 composition is used, but the firing temperature is as high as 1300 ° C. or more.

【0003】このように焼成温度が高いと焼成時の電力
消費量が多くなり、生産コストや生産効率の面で不利益
を生じる等の欠点がある。また、LCフィルタ、ストリ
ップ線路フィルタ等のように、電極として銅(融点;1
083℃)、銀(融点;961℃)などの導体と同時焼
結する場合には、特に焼成温度が導体の融点より低い方
が有利である。
[0003] As described above, when the firing temperature is high, there is a drawback that the power consumption during firing is increased, and disadvantages are caused in terms of production cost and production efficiency. Further, as in an LC filter, a strip line filter, etc., copper (melting point: 1) is used as an electrode.
083 ° C.) and silver (melting point: 961 ° C.), it is particularly advantageous that the firing temperature is lower than the melting point of the conductor.

【0004】[0004]

【発明が解決しようとする課題】本発明は、上記欠点を
克服するものであり、Bi(NbTa)O4 系主成分
に、所定量のV2 5 及びTiO2 が添加含有された組
成物により、εr 、Qu及びτf を実用的な特性範囲内
で広く制御し、これらの各特性をバランスよく維持する
マイクロ波誘電体磁器組成物、及びそれを比較的低温で
焼成して製造する方法を提供することを目的とする。
DISCLOSURE OF THE INVENTION The present invention overcomes the above-mentioned disadvantages and is directed to a composition comprising Bi (NbTa) O 4 as a main component and predetermined amounts of V 2 O 5 and TiO 2 added thereto. Thereby, ε r , Qu and τ f are controlled in a wide range within a practical characteristic range, a microwave dielectric porcelain composition that maintains these characteristics in a well-balanced manner, and is manufactured by firing at a relatively low temperature. The aim is to provide a method.

【0005】[0005]

【課題を解決するための手段】本発明者らは、Bi(N
bTa)O4 系組成物において、εr 、Qu及びτf
実用的な特性範囲内で広く制御し、また、低温で焼成し
て製造できる組成について種々検討した結果、上記組成
物においてNb2 5 とTa2 5 の比率を変化させ、
それに更に所定量のV2 5 及びTiO2 を添加した組
成物とすることにより上記の目的が達成されることを見
出し、特に、TiO2 の添加によりτfの制御ができる
ことを見出して、本発明を完成するに至った。
Means for Solving the Problems The present inventors have proposed Bi (N
In bTa) O 4 system compositions, widely controlled within a practical characteristic range epsilon r, Qu and tau f, As a result of various investigations on the composition which can be produced by firing at a low temperature, Nb 2 in the composition Changing the ratio of O 5 and Ta 2 O 5 ,
It has been found that the above object can be achieved by adding a predetermined amount of V 2 O 5 and TiO 2 to the composition, and particularly, it has been found that τf can be controlled by adding TiO 2. Was completed.

【0006】即ち、本第1発明の誘電体磁器組成物は、
Bi(Nbx Ta1-x )O4 (但し、0<x≦0.9
6)で示される組成を主成分とし、これに上記Bi(N
x Ta1-x )O4 100重量%に対して2重量%以下
(0重量%を含まない。)のV2 5 及び1重量%以下
(0重量%を含まない。)のTiO2 が添加含有された
ことを特徴とする。
That is, the dielectric porcelain composition of the first invention is:
Bi (Nb x Ta 1-x ) O 4 (where 0 <x ≦ 0.9
6) as a main component, and the composition represented by Bi (N
b x Ta 1-x ) 2% by weight or less (excluding 0% by weight) of V 2 O 5 and 1% by weight or less (excluding 0% by weight) of TiO 2 based on 100% by weight of O 4 . Is added and contained.

【0007】上記組成物において、xを0<x≦0.9
6とした理由は、xが0.96を超えた場合は、Ta2
5 成分が実質的に存在しないに等しい状態となり、ε
r 及びτf の制御が困難となるためである。また、Ta
2 5 の添加量を変えることにより、εr 、τf の制御
を容易とし、特にTa2 5 の添加量を増やすことによ
り、高εr 化及び高Qu化を図ることができる。
In the above composition, x is 0 <x ≦ 0.9.
The reason is that when x exceeds 0.96, Ta 2
O 5 component is substantially absent, and ε
control of r and τ f is because it becomes difficult. Also, Ta
By changing the added amount of 2 O 5 , control of ε r and τ f is facilitated. In particular, by increasing the added amount of Ta 2 O 5 , higher ε r and higher Qu can be achieved.

【0008】更に、V2 5 の添加量を0を超え2重量
%以下とするのは、V2 5 は焼結助剤として働くた
め、添加することにより焼成温度を低くでき、性能の安
定化を図ることができるが、2重量%を超えて添加する
とQu及びτf の低下を招き、また、V2 5 を添加し
ない場合は焼結不十分となり各特性が低下するからであ
る。V2 5 の添加量は、特に0.3〜0.5重量%
(特に0.4重量%前後)で各特性のバランスがとれた
実用的な誘電体磁器組成物が得られ、より好ましい。
Furthermore, the addition amount of V 2 O 5 and 2% by weight or less than 0, since V 2 O 5 is acting as a sintering aid, can lower the sintering temperature by adding, performance Stabilization can be achieved, but adding more than 2% by weight causes a decrease in Qu and τ f , and when V 2 O 5 is not added, sintering becomes insufficient and various properties are deteriorated. . The addition amount of V 2 O 5 is particularly 0.3 to 0.5% by weight.
(Especially around 0.4% by weight), a practical dielectric porcelain composition in which the properties are balanced is obtained, which is more preferable.

【0009】また、TiO2 の添加量を1重量%以下と
するのは、添加量が1重量%を超える辺りから、各特性
が著しく低下するからである。TiO2 は、添加するこ
とによりτf を負から正に移行する働きをもち、0.1
〜0.3重量%(特に0.2重量%)で各特性のバラン
スがとれた実用的な誘電体磁器組成物が得られ、より好
ましい。
The reason why the addition amount of TiO 2 is set to 1% by weight or less is that each characteristic is remarkably deteriorated when the addition amount exceeds 1% by weight. TiO 2 has the function of shifting τ f from negative to positive by adding TiO 2.
A practical dielectric porcelain composition in which the respective properties are balanced is obtained at a content of 0.3 to 0.3% by weight (particularly 0.2% by weight), which is more preferable.

【0010】更に、上記V2 5 の添加量は0.2〜
1.0重量%であり、上記TiO2 の添加量は0.1〜
0.6重量%であるものとすることができる。これらの
添加範囲の場合は、εr 、Qu及びτf の性能のバラン
スに優れるからである。更に、上記組成によれば、τf
が−15〜+12ppm/℃、Quが500〜900、
εrが42〜50という実用的な性能バランスを得るこ
とができる。
[0010] Further, the addition amount of V 2 O 5 is 0.2 to
1.0 wt%, amount of the TiO 2 is 0.1
It can be 0.6% by weight. This is because in the case of these addition ranges, the performance balance of ε r , Qu and τ f is excellent. Further, according to the above composition, τf
Is −15 to +12 ppm / ° C., Qu is 500 to 900,
A practical performance balance of 42 to 50 can be obtained.

【0011】また、本第4発明の誘電体磁器組成物の製
造方法は、Bi(Nbx Ta1-x )O4 (但し、0<x
≦0.96)で示される組成を主成分とし、これに上記
Bi(Nbx Ta1-x )O4 100重量%に対して2重
量%以下(0重量%を含まない。)のV2 5 及び1重
量%以下(0重量%を含まない。)のTiO2 が添加含
有された組成になるように、酸化ビスマス (III)粉末、
酸化ニオブ (V)粉末、酸化タンタル (V)粉末、酸化バナ
ジウム (V)粉末及び酸化チタン (II) 粉末を混合し、そ
の後、600〜800℃にて仮焼して仮焼粉末を製造
し、該仮焼粉末を粉砕し、所定形状に成形し、次いで、
875〜950℃にて焼成することを特徴とする。尚、
本発明では、大気雰囲気、還元雰囲気いずれであっても
焼成できる。この焼成温度を875〜950℃の範囲と
するのは、875℃未満では十分に焼結しない場合があ
り、この範囲の場合は十分な焼結密度を確保でき、しか
も安定した性能を示すからである。尚、LCフィルタの
ように導体と同時焼結するような場合は、特に低温焼成
が好ましい。
The method for producing a dielectric ceramic composition according to the fourth aspect of the present invention is characterized in that Bi (Nb x Ta 1-x ) O 4 (where 0 <x
≦ 0.96) as a main component, and 2% by weight or less (not including 0% by weight) of V 2 with respect to 100% by weight of Bi (Nb x Ta 1-x ) O 4 . Bismuth (III) oxide powder is added so as to have a composition containing O 5 and 1% by weight or less (not including 0% by weight) of TiO 2 .
Niobium oxide (V) powder, tantalum oxide (V) powder, vanadium oxide (V) powder and titanium oxide (II) powder are mixed, and then calcined at 600 to 800 ° C. to produce a calcined powder. The calcined powder is pulverized and formed into a predetermined shape,
It is characterized by firing at 875 to 950 ° C. still,
In the present invention, firing can be performed in either an air atmosphere or a reducing atmosphere. The reason for setting the firing temperature in the range of 875 to 950 ° C. is that if the temperature is lower than 875 ° C., the sintering may not be performed sufficiently. In this range, a sufficient sintering density can be ensured and stable performance is exhibited. is there. In addition, when co-sintering with a conductor like an LC filter, low-temperature baking is particularly preferable.

【0012】[0012]

【実施例】以下、実施例及び比較例により本発明を具体
的に説明する。 Bi粉末(純度;98.9%)、Nb粉末
(純度;99.9%)、Ta粉末(純度;99.
9%)、V粉末(純度;99.5%)及びTiO
粉末(純度;99.9%)を出発原料として、表1に
示すように、Bi(NbTa1−x)Oのxを0〜
1.0、Vの添加量(α重量%)を0〜3.0、
TiOの添加量(β重量%)が0〜2.0の範囲で変
化した組成になるように、所定量(いずれも全量として
約600g)を秤量、混合した。尚、表1中、No.
1、7、8、12、16、17及び22は比較例であ
る。
The present invention will be specifically described below with reference to examples and comparative examples . Bi 2 O 3 powder (purity: 98.9%), Nb 2 O 5 powder (purity: 99.9%), Ta 2 O 5 powder (purity: 99.9%)
9%), V 2 O 5 powder (purity; 99.5%) and TiO
2 powder (purity; 99.9%) as a starting material, as shown in Table 1, x of Bi (Nb x Ta 1-x ) O 4 is 0 to
1.0, the addition amount (α% by weight) of V 2 O 5 is 0 to 3.0,
A predetermined amount (about 600 g in total) was weighed and mixed so that the composition in which the amount of TiO 2 added (β wt%) varied in the range of 0 to 2.0. In Table 1, No.
1, 7, 8, 12, 16, 17, and 22 are comparative examples.
You.

【0013】[0013]

【表1】 [Table 1]

【0014】その後、上記秤量、混合した原料粉末を振
動ミル中に投入し一次粉砕(3時間)を施した後、大気
雰囲気中にて700℃で2時間仮焼した。次いで、この
仮焼粉末に適量の有機バインダー(約15g)と水(3
30g)を加え、ボールミル中で20mmφのアルミナ
ボールにより、90rpmで、23時間二次粉砕した。
その後、真空凍結乾燥(圧力;約0.4Torr、凍結
温度;−20〜−40℃、乾燥温度;40〜50℃、時
間;20時間)により造粒し、この造粒された原料を用
いて1トン/cm2 のプレス圧で19mmφ×10mm
t(高さ)の円柱状の成形体を得た。
Thereafter, the weighed and mixed raw material powder was put into a vibrating mill, subjected to primary pulverization (3 hours), and then calcined at 700 ° C. for 2 hours in an air atmosphere. Next, an appropriate amount of an organic binder (about 15 g) and water (3 g) were added to the calcined powder.
30 g), and the resulting mixture was subjected to secondary pulverization with a 20 mmφ alumina ball in a ball mill at 90 rpm for 23 hours.
Thereafter, granulation is performed by vacuum freeze-drying (pressure: about 0.4 Torr, freezing temperature: -20 to -40 ° C, drying temperature: 40 to 50 ° C, time: 20 hours), and the granulated raw material is used. 19mmφ × 10mm at a press pressure of 1 ton / cm 2
A columnar molded body of t (height) was obtained.

【0015】次に、この成形体を大気中、500℃で、
3時間脱脂し、その後、850〜950℃で2時間焼成
して焼結体を得た。最後にこの焼結体の両端面を約16
mmφ×8mmt(高さ)の円柱状に研磨し、更にエタ
ノールで洗浄し、誘電体試料(表1のNo.1〜22)
とした。尚、上記仮焼工程における昇温速度は200℃
/h及び降温速度は−200℃/h、脱脂工程における
昇温速度は50℃/h、並びに焼成工程における昇温速
度は100℃/h及び降温速度は−100℃/hであっ
た。
Next, this molded body is heated at 500 ° C. in the air.
It was degreased for 3 hours, and then fired at 850 to 950 ° C. for 2 hours to obtain a sintered body. Finally, the both end faces of this sintered body were
Polished into a cylindrical shape of mmφ × 8 mmt (height), further washed with ethanol, and a dielectric sample (Nos. 1 to 22 in Table 1)
And The heating rate in the calcining step was 200 ° C.
/ H and the cooling rate were -200 ° C / h, the heating rate in the degreasing step was 50 ° C / h, and the heating rate in the firing step was 100 ° C / h and the cooling rate was -100 ° C / h.

【0016】上記各試料につき、平行導体板型誘電体円
柱共振器法(TE011 MODE)等により、τf
εr 、Qu及び焼結密度を測定した。尚、τf は25〜
80℃の温度領域で測定し、τf =(f80−f25)/
(f25×ΔT)、ΔT=80−25=55℃にて算出し
た。また、測定時の共振周波数は表1の通り(f0 )で
ある。これらの結果を表1に併記するとともに図1〜1
6のグラフに示す。
For each of the above samples, τ f , τ f , and t were determined by a parallel conductor plate type dielectric cylinder resonator method (TE 011 MODE) or the like.
ε r , Qu and sintered density were measured. Note that τ f is 25 to
Measured in a temperature range of 80 ° C., τ f = (f 80 −f 25 ) /
(F 25 × ΔT), ΔT = 80−25 = 55 ° C. The resonance frequency at the time of measurement is as shown in Table 1 (f 0 ). These results are shown in Table 1 and FIGS.
6 is shown in the graph.

【0017】これらの結果によれば、TiO2 の添加に
よりτfが大きく向上し、τfの制御が容易にできるこ
とを示している(図3)。しかし、このTiO2 の添加
によりεr 及びQuが低下するので(図1及び図2)、
TiO2 の多量の添加は好ましくない。また、V2 5
を添加しない場合(No.12)は焼結不十分となり、
各特性の測定は不可能になる。そして、この添加により
εr は増大し(図5)、τfは減少するので(図7)、
τfの調整ができる。しかし、Quはその添加により低
下するので(図6)、V2 5 の多量の添加は好ましく
ない。
These results show that the addition of TiO 2 greatly improves τf and makes it easier to control τf (FIG. 3). However, since the addition of TiO 2 lowers ε r and Qu (FIGS. 1 and 2),
Large amounts of TiO 2 are not preferred. V 2 O 5
When no is added (No. 12), sintering becomes insufficient,
Measurement of each characteristic becomes impossible. By this addition epsilon r increases (Fig. 5), since τf is decreased (Fig. 7),
τf can be adjusted. However, since Qu decreases with its addition (FIG. 6), it is not preferable to add a large amount of V 2 O 5 .

【0018】更に、Bi(Nbx Ta1-x )O4 のx値
の増大に従って、τfが増加するので(図11)、この
x値の変化によりτfの調整ができる。また、この増大
に伴って、εr 及びQuも増大するので(図9及び1
0)、この物性の点においては好ましいが、焼結密度は
低下する(図12)。尚、焼結密度はxが1.0の場合
でも7.0kg/m3 以上は確保できる(図12)。ま
た、焼成温度が850℃の場合(No.8)は、焼結不
十分となり、各特性の測定は不可能になる。一方、87
5〜950℃(x=0.8、V2 5 =0.4重量%、
TiO2 =0.2重量%)では、焼結密度は7.36〜
7.52kg/m3 と大きく(図16)、物性も安定し
ている(図13〜15)。
Further, τf increases as the x value of Bi (Nb x Ta 1-x ) O 4 increases (FIG. 11), so that τf can be adjusted by changing this x value. Further, with this increase, ε r and Qu also increase (FIGS. 9 and 1).
0), although preferable in terms of these physical properties, the sintering density is reduced (FIG. 12). In addition, even if x is 1.0, a sintered density of 7.0 kg / m 3 or more can be secured (FIG. 12). On the other hand, when the firing temperature is 850 ° C. (No. 8), the sintering becomes insufficient and the measurement of each characteristic becomes impossible. On the other hand, 87
5 to 950 ° C. (x = 0.8, V 2 O 5 = 0.4% by weight,
TiO 2 = 0.2% by weight), the sintered density is 7.36 to
It is as large as 7.52 kg / m 3 (FIG. 16), and the physical properties are stable (FIGS. 13 to 15).

【0019】このように各特性はV2 5 及びTiO2
の添加量及び焼成温度とともに種々変化するが、本発明
の範囲内であれば各特性ともに実用上問題のない範囲で
ある。例えば、このうち、x=0.8〜0.96、V2
5 =0.4〜1.0重量%、TiO2 =0.2〜1.
0重量%の場合は、εr =43.3〜47.7、Qu=
370〜910、τf=−13〜+11ppm/℃であ
る。また、特に、x=0.8、V2 5 =0.4重量
%、TiO2 =0.2〜0.4重量%の場合は、εr
45.4〜47.7、Qu=680〜910、τf=−
13〜−9ppm/℃であり、優れた性能バランスを有
する。尚、No.17〜20の結果から分かるように、
本発明ではxが0.2〜0.6と小さい場合に、τf
負側に大きくなる傾向(−55〜−30ppm/℃)に
はあるが、εr が42.0〜47.2、Quが510〜
730と実用上十分な特性を有する。尚、本発明におい
ては、前記具体的実施例に示すものに限られず、目的、
用途に応じて本発明の範囲内で種々変更した実施例とす
ることができる。
As described above, the characteristics are V 2 O 5 and TiO 2
Varies with the addition amount and the sintering temperature, but within the range of the present invention, each characteristic is within a range in which there is no practical problem. For example, of these, x = 0.8 to 0.96, V 2
O 5 = 0.4 to 1.0 wt%, TiO 2 = 0.2~1.
In the case of 0% by weight, ε r = 43.3-47.7, Qu =
370 to 910, τf = −13 to +11 ppm / ° C. In particular, when x = 0.8, V 2 O 5 = 0.4 wt%, and TiO 2 = 0.2 to 0.4 wt%, ε r =
45.4-47.7, Qu = 680-910, τf = −
13 to -9 ppm / ° C, and has an excellent performance balance. In addition, No. As can be seen from the results of 17 to 20,
In the present invention, when x is as small as 0.2 to 0.6, τ f tends to increase on the negative side (−55 to −30 ppm / ° C.), but ε r is 42.0 to 47.2. , Qu is 510
730, which is a practically sufficient characteristic. In the present invention, the present invention is not limited to the specific examples described above,
Various embodiments can be made within the scope of the present invention depending on the application.

【0020】[0020]

【発明の効果】本発明の誘電体磁器組成物では、εr
Qu及びτf を実用的な特性範囲内であるとともに、こ
れらの各特性をバランスよく維持するものである。従っ
て、LCフィルタ材として好適なものである。また、本
製造方法によれば、上記に示すような有用な誘電体磁器
組成物を、850〜950℃という比較的低温で焼成す
ることにより製造できる。そして、この低温焼成は導体
と同時焼結するLCフィルタの場合には、特に好都合で
ある。
According to the dielectric ceramic composition of the present invention, ε r ,
Qu and τ f are within a practical characteristic range, and these characteristics are maintained in a well-balanced manner. Therefore, it is suitable as an LC filter material. Further, according to the present manufacturing method, the useful dielectric ceramic composition as described above can be manufactured by firing at a relatively low temperature of 850 to 950 ° C. This low-temperature sintering is particularly advantageous in the case of an LC filter co-sintered with a conductor.

【図面の簡単な説明】[Brief description of the drawings]

【図1】Bi(Nb0.8 Ta0.2 )O4 で表される主成
分にV2 5 を0.4重量%添加し、且つ焼成温度が9
00℃の場合の、TiO2 の添加量βとεr との関係を
示すグラフである。
FIG. 1 shows that a main component represented by Bi (Nb 0.8 Ta 0.2 ) O 4 is added with 0.4% by weight of V 2 O 5 and a sintering temperature is 9%.
In the case of 00 ° C., which is a graph showing the relationship between the added amount β and epsilon r of TiO 2.

【図2】図1に示す組成及び焼成温度においてTiO2
の添加量βとQuとの関係を示すグラフである。
FIG. 2 shows TiO 2 at the composition and firing temperature shown in FIG.
Is a graph showing the relationship between the added amount β and Qu.

【図3】図1に示す組成及び焼成温度においてTiO2
の添加量βとτf との関係を示すグラフである。
FIG. 3 shows TiO 2 at the composition and firing temperature shown in FIG.
It is a graph showing the relationship between the added amount β and tau f.

【図4】図1に示す組成及び焼成温度においてTiO2
の添加量βと焼結密度との関係を示すグラフである。
FIG. 4 shows TiO 2 at the composition and firing temperature shown in FIG.
3 is a graph showing the relationship between the amount β of sintering and the sintering density.

【図5】Bi(Nb0.8 Ta0.2 )O4 で表される主成
分にTiO2 を0.2重量%添加し、且つ焼成温度が9
00℃の場合の、V2 5 の添加量αとεr との関係を
示すグラフである。
FIG. 5: TiO 2 is added to a main component represented by Bi (Nb 0.8 Ta 0.2 ) O 4 by 0.2% by weight, and the sintering temperature is 9
In the case of 00 ° C., which is a graph showing the relationship between the mixing amount α and epsilon r of V 2 O 5.

【図6】図5に示す組成及び焼成温度においてV2 5
の添加量αとQuとの関係を示すグラフである。
FIG. 6 shows V 2 O 5 at the composition and firing temperature shown in FIG.
Is a graph showing the relationship between the amount of addition α and Qu.

【図7】図5に示す組成及び焼成温度においてV2 5
の添加量αとτf との関係を示すグラフである。
FIG. 7 shows V 2 O 5 at the composition and firing temperature shown in FIG.
4 is a graph showing the relationship between the added amount α and τ f .

【図8】図5に示す組成及び焼成温度においてV2 5
の添加量αと焼結密度との関係を示すグラフである。
FIG. 8 shows V 2 O 5 at the composition and firing temperature shown in FIG.
3 is a graph showing the relationship between the amount α of sintering and the sintering density.

【図9】Bi(Nbx Ta1-x )O4 で表される主成分
にV2 5 を0.4重量%、TiO2 を0.2重量%添
加し、且つ焼成温度が900℃の場合の、xとεr との
関係を示すグラフである。
FIG. 9: 0.4% by weight of V 2 O 5 and 0.2% by weight of TiO 2 are added to the main component represented by Bi (Nb x Ta 1-x ) O 4 , and the sintering temperature is 900 ° C. in the case of a graph showing the relationship between x and epsilon r.

【図10】図9に示す組成及び焼成温度においてxとQ
uとの関係を示すグラフである。
10 shows x and Q at the composition and firing temperature shown in FIG.
6 is a graph showing a relationship with u.

【図11】図9に示す組成及び焼成温度においてxとτ
f との関係を示すグラフである。
11 shows x and τ at the composition and firing temperature shown in FIG.
It is a graph which shows the relationship with f .

【図12】図9に示す組成及び焼成温度においてxと焼
結密度との関係を示すグラフである。
12 is a graph showing the relationship between x and the sintering density at the composition and firing temperature shown in FIG.

【図13】Bi(Nb0.8 Ta0.2 )O4 で表される主
成分にV2 5 を0.4重量%、TiO2 を0.2重量
%添加した場合の、焼成温度とεr との関係を示すグラ
フである。
FIG. 13 shows the sintering temperature, ε r, and the temperature when 0.4% by weight of V 2 O 5 and 0.2% by weight of TiO 2 are added to the main component represented by Bi (Nb 0.8 Ta 0.2 ) O 4. 6 is a graph showing the relationship of.

【図14】図13に示す組成において焼成温度とQuと
の関係を示すグラフである。
FIG. 14 is a graph showing the relationship between the firing temperature and Qu in the composition shown in FIG.

【図15】図13に示す組成において焼成温度とτf
の関係を示すグラフである。
FIG. 15 is a graph showing the relationship between the firing temperature and τ f in the composition shown in FIG.

【図16】図13に示す組成において焼成温度と焼結密
度との関係を示すグラフである。
FIG. 16 is a graph showing the relationship between the sintering temperature and the sintering density in the composition shown in FIG.

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 Bi(Nbx Ta1-x )O4 (但し、0
<x≦0.96)で示される組成を主成分とし、これに
上記Bi(Nbx Ta1-x )O4 100重量%に対して
2重量%以下(0重量%を含まない。)のV2 5 及び
1重量%以下(0重量%を含まない。)のTiO2 が添
加含有されたことを特徴とするマイクロ波誘電体磁器組
成物。
1. Bi (Nb x Ta 1-x ) O 4 (where 0
<X ≦ 0.96) as a main component, and 2% by weight or less (not including 0% by weight) based on 100% by weight of Bi (Nb x Ta 1-x ) O 4 . A microwave dielectric ceramic composition comprising V 2 O 5 and 1% by weight or less (not including 0% by weight) of TiO 2 .
【請求項2】 上記V2 5 の添加量は0.2〜1.0
重量%であり、上記TiO2 の添加量は0.1〜0.6
重量%である請求項1記載のマイクロ波誘電体磁器組成
物。
2. The addition amount of V 2 O 5 is 0.2 to 1.0.
Weight%, and the amount of the TiO 2 is 0.1 to 0.6
2. The microwave dielectric porcelain composition according to claim 1, wherein the composition is by weight.
【請求項3】 共振周波数の温度係数が−15〜+12
であり、無負荷Qが500〜900であり、比誘電率が
42〜50である請求項1又は2記載のマイクロ波誘電
体磁器組成物。
3. The temperature coefficient of the resonance frequency is -15 to +12.
The microwave dielectric ceramic composition according to claim 1, wherein the unloaded Q is 500 to 900, and the relative dielectric constant is 42 to 50. 4.
【請求項4】 Bi(Nbx Ta1-x )O4 (但し、0
<x≦0.96)で示される組成を主成分とし、これに
上記Bi(Nbx Ta1-x )O4 100重量%に対して
2重量%以下(0重量%を含まない。)のV2 5 及び
1重量%以下(0重量%を含まない。)のTiO2 が添
加含有された組成になるように、酸化ビスマス (III)粉
末、酸化ニオブ (V)粉末、酸化タンタル (V)粉末、酸化
バナジウム (V)粉末及び酸化チタン (II) 粉末を混合
し、その後、600〜800℃にて仮焼して仮焼粉末を
製造し、該仮焼粉末を粉砕し、所定形状に成形し、次い
で、875〜950℃にて焼成することを特徴とするマ
イクロ波誘電体磁器組成物の製造方法。
4. Bi (Nb x Ta 1-x ) O 4 (where 0
<X ≦ 0.96) as a main component, and 2% by weight or less (not including 0% by weight) based on 100% by weight of Bi (Nb x Ta 1-x ) O 4 . Bismuth (III) oxide powder, niobium oxide (V) powder, tantalum oxide (V) so that V 2 O 5 and 1% by weight or less (excluding 0% by weight) of TiO 2 are added and contained. ) Powder, vanadium oxide (V) powder and titanium oxide (II) powder are mixed, then calcined at 600 to 800 ° C. to produce a calcined powder, and the calcined powder is pulverized into a predetermined shape. A method for producing a microwave dielectric porcelain composition, comprising forming and then firing at 875 to 950 ° C.
JP25891594A 1993-12-27 1994-09-27 Microwave dielectric porcelain composition and method for producing the same Expired - Fee Related JP3357479B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP25891594A JP3357479B2 (en) 1994-09-27 1994-09-27 Microwave dielectric porcelain composition and method for producing the same
EP94120445A EP0659706B1 (en) 1993-12-27 1994-12-22 Microwave dielectric ceramic composition
DE69409477T DE69409477T2 (en) 1993-12-27 1994-12-22 Microwave dielectric ceramic composition
US08/363,333 US5489559A (en) 1993-12-27 1994-12-23 Microwave dielectric ceramic composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25891594A JP3357479B2 (en) 1994-09-27 1994-09-27 Microwave dielectric porcelain composition and method for producing the same

Publications (2)

Publication Number Publication Date
JPH0891930A JPH0891930A (en) 1996-04-09
JP3357479B2 true JP3357479B2 (en) 2002-12-16

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Country Link
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