JP3346646B2 - Exposure equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus, and more particularly, to an exposure apparatus for exposing a photosensitive material by relatively moving at least one of a slit beam and a photosensitive material irradiated with the slit beam. About.

[0002]

2. Description of the Related Art Conventionally, as a device for exposing a photosensitive material to form an image, a linear light source which is housed in an elliptical cylindrical mirror and irradiates linear light, and which receives linear light and only parallel light A light regulating member that transmits light, a liquid crystal optical shutter array using liquid crystal that changes from a light blocking state to a light transmitting state by applying a voltage to an electrode corresponding to one line of pixels of the photosensitive material, and a transparent cylinder. A filter cylinder having a blue filter, a green filter, a red filter, and a mask attached to the peripheral surface, a stepping motor that rotates the filter cylinder via a belt by rotating a pulley, and a self-focusing fixed in the filter cylinder And a stepping motor that intermittently feeds the color photosensitive material by rotating a transport roller. Are (JP-A-61-2949
No. 66). In this device, the filter cylinder is rotated by a stepping motor to produce linear light (parallel light).
Are sequentially transmitted through a blue filter, a green filter, and a red filter to become blue light, green light, and red light, and are sequentially incident on the self-focusing optical fiber. And
The light of each color sequentially incident on the self-focusing optical fiber exposes the color photosensitive material as spot light. After the exposure of one line is completed, the photosensitive material is partially transferred for one line,
The above processing is repeated.

Further, a light source such as a halogen lamp and a photosensitive material which is closed when a voltage arranged in a line is applied and shuts off light from the light source and opens when no voltage is applied and transmits light from the light source. A liquid crystal light shutter array composed of a plurality of liquid crystal cells corresponding to each pixel in one line, red, green, and blue filters rotated by a stepping motor; an ND filter for controlling an exposure amount corresponding to each of the color filters; There has been proposed an apparatus provided with a color separation filter comprising a mask and a selfoc lens array fixed in the color separation filter (Japanese Patent Application Laid-Open No. Sho.
3-92161 gazette). In this apparatus, a color separation filter is rotated by a stepping motor, and light from a light source is transmitted through red, green, and blue filters, a selfoc lens array, and an ND filter corresponding to each color filter. The photosensitive material is exposed to light, G light and B light for one line. After the exposure of one line is completed, the photosensitive material is partially transferred for one line, and the above-described processing is repeated.

[0004]

However, since both of the above-described devices use a white light source as a light source, a white image is formed by R, G, B light in order to form a color image.
It needs to be separated into light. For this reason, the apparatus rotates the filter cylinder to which the red, green, and blue filters are attached by a stepping motor, and transmits white light through the red, green, and blue filters, and outputs R, G, and B light.
It is color-separated into light. Therefore, in such a device, since the filter cylinder is rotated by the stepping motor, the size is increased and the cost is increased.

The present invention has been made in view of the above-mentioned circumstances, and has as its object to provide a low-cost and small-sized exposure apparatus.

[0006]

According to the first aspect of the present invention, at least three light emitting elements each emitting light of a different color are arranged and each of the light emitting elements is arranged.
Light emission phases in the direction in which
And these light emitting elements
One light emitting element group is arranged at a fixed pitch.
In a row, a light source system for irradiating light emitted from each light emitting element as a slit light beam, and at least one of the light slit light beam and the photosensitive material relatively moves in a direction intersecting the longitudinal direction of the slit light beam. Moving means for moving, and an optical shutter element disposed between the light source system and the photosensitive material and opened and closed to transmit and block a slit light beam incident from the light source system corresponding to a longitudinal direction of the slit light beam. A plurality of light shutter arrays arranged in a direction corresponding to pixels constituting one line of a pixel line of the photosensitive material, and an exposure amount of a portion corresponding to the pixels of the photosensitive material by the slit light beam transmitted through the optical shutter element is a color image. A control means for controlling at least one of the light emitting element and the optical shutter element so as to be substantially equal to an exposure amount of a pixel corresponding to data; It has a, and.

[0007]

[0008]

[0009]

According to the second aspect of the present invention,
In the invention, the light source of the photosensitive material is provided with an exposure amount correction plate in which at least three light emitting elements each emitting light of a different color are arranged, and having an opening having a shape corresponding to an arrangement pitch of the arranged light emitting elements. It is arranged near the side.

[0011]

[0012]

According to the first aspect of the present invention, the light source system having at least three light emitting elements has a light source array arranged at a constant pitch.
At least three light emitting elements of the optical element group have different colors, respectively.
To emit light. The emitted light is distributed by each of the light emitting elements.
The light emission phase becomes almost the same in the row direction and the light emitting element
The longitudinal direction corresponds to the direction in which the groups are arranged.
Irradiate as lit rays. The moving means relatively moves at least one of the light slit light beam and the photosensitive material in a direction intersecting the longitudinal direction of the slit light beam.

Here, an optical shutter array is arranged between the light source system and the photosensitive material. In the optical shutter array, an optical shutter element that transmits and blocks a slit beam incident from a light source system by being opened and closed is provided for a pixel constituting a line of pixels of a photosensitive material in a direction corresponding to a longitudinal direction of the slit beam. A plurality are arranged correspondingly.

The control means controls the light emitting element and the optical shutter element such that the amount of exposure of a portion of the photosensitive material corresponding to the pixel by the slit light beam transmitted through the optical shutter element is substantially equal to the amount of exposure of the corresponding pixel of the color image data. At least one is controlled.

[0015] In this manner, comprises at least three light emitting elements for emitting each light of different colors in the light source system, less the
The light emitted from the three light-emitting elements is
The emission phase becomes almost the same in the direction in which
The longitudinal direction corresponds to the direction in which the element groups are arranged.
Illuminating the light emitting element
Arrangement that occurs when simply irradiating linearly
By controlling at least one of the light emitting element and the optical shutter element without causing color unevenness according to the pitch, the exposure amount of the portion corresponding to the pixel of the photosensitive material is equal to the exposure amount of the corresponding pixel of the color image data. Since they are made substantially equal, there is no need to provide a movable part such as a filter cylinder for converting white light into R light, G light and B light, so that a small-sized and low-test exposure apparatus can be provided.

[0016]

[0017]

The photosensitive material according to claim 1 may be closely attached to the optical shutter array. When the photosensitive material is brought into close contact with the optical shutter array in this manner, the slit light beam transmitted through the optical shutter array can be accurately matched with one line of the photosensitive material.

Further, the invention according to claim 1 may further include a self-focusing fiber array for forming an image of the slit light beam transmitted through the optical shutter element on the photosensitive material. By forming the slit light beam transmitted through the optical shutter element on the photosensitive material by the self-focusing optical fiber array in this manner, the slit light beam transmitted through the optical shutter array can be accurately matched with one line of the photosensitive material.

Furthermore, the invention of claim 1, wherein the diffusion means for diffusing the slit light irradiated from the light source system may be provided on the light source side near the optical shutter array.
By diffusing the slit light beam by the diffusing means and irradiating the light shutter array, the slit light beam can be effectively used.

[0021]

[0022]

[0023]

[0024]

According to a second aspect of the present invention, in the first aspect of the present invention, an exposure correction plate having an opening having a shape corresponding to an arrangement pitch of light emitting elements in which slit light beams transmitted through the optical shutter element are arranged. To irradiate the photosensitive material.

As described above, since the exposure amount correction plate has the opening having a shape corresponding to the arrangement pitch of the light emitting elements, when the photosensitive material is irradiated through the optical shutter array according to the arrangement pitch of the light emitting elements. The unevenness in the amount of light can be removed by the opening.

[0027]

[0028]

The moving means according to claim 1 or 2 may move at least one of the slit light beam and the photosensitive material relative to each line of the photosensitive material. In this way, by moving at least one of the slit light beam and the photosensitive material for each line of the photosensitive material, the slit light beam transmitted through the optical shutter array can be accurately matched with one line of the photosensitive material.

Further, at least one of the slit light beam and the photosensitive material may be relatively continuously moved by the moving means according to the first or second aspect . Thus, the photosensitive material can be exposed at a high speed by relatively continuously moving at least one of the slit light beam and the photosensitive material. Here, when at least one of the slit light beam and the photosensitive material is relatively continuously moved, at least one of the slit light beam and the photosensitive material transmitted through the optical shutter element is relatively moved. A slit beam moving means for moving the photosensitive material line by line in substantially the same direction as the direction of continuous movement and at substantially the same speed as the moving speed may be provided. As described above, at least one of the slit light beam and the photosensitive material transmitted through the optical shutter element is moved in substantially the same direction as the direction in which the slit light beam and the photosensitive material are relatively continuously moved and at substantially the same speed as the moving speed. By moving the photosensitive material one line at a time, the photosensitive material can be exposed at a high speed, and the slit light beam transmitted through the optical shutter array can be accurately matched with one line of the photosensitive material.

[0031]

Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 shows a schematic overall configuration diagram of the image recording apparatus 10. Note that the image recording apparatus 10 includes an exposure apparatus 25 according to the present embodiment, which is an apparatus that exposes an image to a photothermographic material and thermally develops and transfers it to an image receiving material to form an image.
This is an example in which is applied.

The image recording apparatus 10 has a box shape as a whole, and a front door and side doors (not shown) are attached to the machine base 12. By opening each door, the inside of the machine base 12 can be exposed. In addition, machine base 12
An operation panel is provided on the upper surface of the device.

As shown in FIG. 1, a photosensitive material magazine 14 is disposed in a machine base 12 of an image recording apparatus 10, and a photosensitive material 16 is wound and stored in a roll shape. The photosensitive material 16 is wound with the photosensitive (exposure) surface directed downward of the apparatus.

A nip roller 18 and a cutter 20 are arranged near the photosensitive material outlet of the photosensitive material magazine 14, so that the photosensitive material 16 can be cut out after a predetermined length of the photosensitive material 16 is drawn from the photosensitive material magazine 14.

On the side of the cutter 20, a plurality of transport rollers 19, 21, 23A, 23 as a moving means of the present invention are provided.
B, 24A, 24B and 26, and a guide plate 27 are arranged, and the photosensitive material 16 cut to a predetermined length is exposed to the exposure unit 2.
2 can be transported.

The exposing section 22 is located between the conveying rollers 23A and 23B and the conveying rollers 24A and 24B. The exposing section (exposure point) is defined between these conveying rollers so that the photosensitive material 16 passes therethrough. Has become.

An exposure device 25 is provided in a space above the exposure unit 22. The exposure device 25 includes a light source system 27A as shown in FIG. A pair of members 32 are arranged in the light source system 27A so as to be opposed to each other in the horizontal direction (XY directions). The upper end of the cavity formed by the pair of members 32 is closed by a support member 31 sandwiched between the pair of members 32. The longitudinal direction of the support member 31 (a direction intersecting with the XY directions, for example, a direction substantially orthogonal to the XY directions (may be a direction orthogonal to the XY directions) may be one line direction of the photosensitive material 16. Yes, it is.

On the lower surface of the support member 31, a plurality of light emitting diodes (hereinafter, referred to as LEDs) as light emitting elements of the present invention are provided. That is, as shown in FIG. 3, an LED 30R that emits red light (R light) and a blue light (B light)
An LED 30B emitting green light and an LED 30G emitting green light (G light) are provided close to each other in a direction orthogonal to the one-line direction of the photosensitive material 16, and these constitute a light emitting element group 33. ing. Further, the light emitting element groups 33 are arranged at a predetermined pitch P ₁ (generally about 3 mm) along one line direction of the photosensitive material 16. Therefore, LED30R, LED30
B and the LED 30G have the same light emission phase (the same phase) in the arrangement direction of the light emitting element groups 33 (one line direction of the photosensitive material 16).

A cylindrical lens 34 is attached to the lower end of the above-mentioned cavity (see FIG. 2). The axial direction of the cylindrical lens 34 is parallel to the longitudinal direction of the support member 31 (one line direction of the photosensitive material 16).
Each of the light emitted from the LEDs 30R, 30G, and 30B is defined as a slit light beam in a direction corresponding to one line direction of the photosensitive material 16.

Here, for example, a normal LED array 200 constituted by simply arranging LEDs as shown in FIG.
6A and 6B when the light is irradiated by
As shown in the figure, the illuminance (light amount) according to the arrangement pitch of the LEDs
In addition to unevenness, color unevenness occurs according to the arrangement pitch of each LED. On the other hand, in the light source system 27A, the LEDs of the BGR in each light emitting element group 33 are provided close to each other and emit each color in substantially the same phase.
As shown in (B), color unevenness does not occur.

Below the cylindrical lens 34 (see FIG. 2), a liquid crystal light shutter array 36 as an optical shutter array of the present invention is provided. The liquid crystal light shutter array 36 includes liquid crystal cells 36S1, 36S2,... 36Sn (see also FIG. 7) as optical shutter elements corresponding to the pixels constituting one line of the pixel row of the photosensitive material 16 (see FIG. 7). It is arranged and formed in a direction corresponding to the direction. Liquid crystal cells 36S1, 36S2,
... 36Sn opens and transmits slit light when voltage is applied, and closes and blocks slit light when voltage is no longer applied. The liquid crystal cell may be one that opens when voltage is no longer applied and blocks slit light, and closes when voltage is applied and transmits slit light.

Below the liquid crystal light shutter array 36,
Self-focusing fiber array (SLA) 3
8 are provided. The SLA 38 is a liquid crystal cell 36S
1, 36S2,..., 36Sn are formed on the photosensitive material 16 by the slit light beams.

A switchback section 40 is provided beside the exposure section 22 (see FIG. 1), and a water application section 62 is provided below the exposure section 22. The photosensitive material 16 that has risen to the side of the photosensitive material magazine 14 and has been exposed in the exposure unit 22 is once sent to the switchback unit 40 and is provided below the exposure unit 22 by the reverse rotation of the transport roller 26. In this configuration, the water is supplied to the water application section 62 via the transport path.

A plurality of pipes are connected to the water application section 62 so that water can be supplied.

The heat development transfer unit 10 is located beside the water application unit 62.
The photosensitive material 16 coated with water is fed in.

On the other hand, the machine 12 on the side of the photosensitive material magazine 14
Is provided with a receiving material magazine 106, and the image receiving material 1
08 is stored in a roll shape. A dye fixing material having a mordant is applied to the image forming surface of the image receiving material 108, and the image forming surface is wound up toward the upper side of the apparatus.

The receiving material magazine 106 is a photosensitive material magazine 14.
In the same manner as described above, the main body 12 is composed of a body and a pair of side frames fixed to both ends of the body, and the front side of the machine base 12 (the front side in FIG. 1, that is, the width of the wound image receiving material 108). direction)
Can be withdrawn to

A nip roller 110 is disposed in the vicinity of the image receiving material outlet of the material receiving magazine 106 so that the image receiving material 108 can be pulled out from the material receiving magazine 106 and the nip can be released. A cutter 112 is arranged beside the nip roller 110.

At the side of the cutter 112, a photosensitive material magazine 1 is provided.
4, an image receiving material transport unit 180 is provided. The image receiving material conveying section 180 includes conveying rollers 186,
190 and 114 and a guide plate 182 are arranged, and the image receiving material 108 cut to a predetermined length can be transported to the thermal development transfer unit 104.

The photosensitive material 16 conveyed to the thermal development transfer section 104 is sent between the bonding roller 120 and the heating drum 116, and the image receiving material 108 is the photosensitive material 1
The photosensitive material 16 is fed between the laminating roller 120 and the heating drum 116 in a state in which the photosensitive material 16 advances by a predetermined length in synchronization with the conveyance of No. 6 and is superposed.

A pair of halogen lamps 132A and 132B are arranged inside the heating drum 116 so that the surface of the heating drum 116 can be heated.

The endless pressure contact belt 118 is wound around five winding rollers 134, 135, 136, 138, and 140, and an endless outer side between the winding rollers 134 and 140 is a heating drum. 116 is pressed against the outer periphery.

A bending guide roller 142 is provided below the heating drum 116 on the downstream side of the endless pressure contact belt 118 in the material supply direction.
Is arranged. At the lower portion of the heating drum 116 on the downstream side of the bending guide roller 142 in the material supply direction, a peeling claw 154 is rotatably supported by a shaft.

The photosensitive material 16 peeled by the peeling claw 154 is wound around the bending guide roller 142 and is accumulated in the waste photosensitive material storage box 178.

In the vicinity of the heating drum 116 on the side of the bending guide roller 142, a peeling roller 174 and a peeling claw 176 are arranged. Peeling roller 174 and peeling claw 176
The receiving material guide 170 is arranged below the receiving material, and receiving material discharge rollers 172, 173, and 175 are arranged.
The image receiving material 108 separated from the heating drum 116 by the separation roller 174 and the separation claw 176 can be guided and conveyed.

The image receiving material 108 peeled off from the outer periphery of the heating drum 116 by the peeling claw 176
The sheet is conveyed by receiving material discharge rollers 172, 173, and 175 and discharged to the tray 177.

Next, a control system of the exposure apparatus 25 will be described with reference to FIG. As shown in FIG. 7, the control system of the exposure apparatus 25 includes a control circuit 50 as control means of the present invention. The control circuit 50 receives a signal L via a driver 52R.
ED30R, LED30G via driver 52G,
The LEDs 30B are connected via the drivers 52B. Further, the control circuit 50 controls the liquid crystal cell 36S
, 36S2,..., 36Sn
Is connected. Further, the control circuit includes transport rollers 19, 21, 23A and 23 via a driver 56D.
Motors 58 for driving B, 24A, 24B and 26 are respectively connected.

Next, the operation of this embodiment will be described. The magnification, the number of sheets to be processed, and the like are designated by operating the operation panel 44.
When there is a start instruction, image processing is started. That is, with the photosensitive material magazine 14 set, the nip roller 18 is operated, and the photosensitive material 16 is moved to the nip roller 1.
Withdrawn by 8. When the photosensitive material 16 is pulled out by a predetermined length, the cutter 20 operates and the photosensitive material 16 is cut into a predetermined length.

After the operation of the cutter 20, the photosensitive material 16 is
The sheet is conveyed to the exposure section 22 with the photosensitive (exposure) surface turned upside down.

The control circuit in the exposure device 25 calculates the amount of exposure of a portion corresponding to a pixel of the photosensitive material 16 by the slit light beam transmitted through the liquid crystal cells 36S1, 36S2,. The liquid crystal cells 36S1, 36S2,... 36Sn are controlled as follows so as to be substantially equal to the exposure amount of the pixel corresponding to the data.

That is, as shown in FIG. 8, at a predetermined time interval t0, the pulse voltage is applied to the LED 30 for a predetermined time tR.
R for a predetermined time tG to the LED 30G for a predetermined time tB
Only input to LEDB respectively, LED30R, LE
D30G, LEDB is caused to emit light. By this, LED
At predetermined time intervals t0, the R light, the G light for the time tG, and the B light for the time tB are sequentially emitted from the 30R, the LEDs 30G, and the LEDB, respectively.

The R sequentially irradiated at a predetermined time interval t0
The light, the G light, and the B light pass through the cylindrical lens 34 to become slit light beams, and irradiate the liquid crystal light shutter array 36.

The control circuit 50 controls the driving circuit 54 so that the R, G, and B light-sensitive materials 16 sequentially transmitted through the liquid crystal cells 36S1, 36S2,.
Liquid crystal cell 3 so that the exposure amount of the portion corresponding to the pixel of the color image data is substantially equal to the exposure amount of the corresponding pixel of the color image data.
Opening / closing of 6S1, 36S2,... 36Sn is controlled by applying a predetermined pulse voltage. This is applied to the photosensitive material 16
The liquid crystal cell 36Si corresponding to a certain pixel will be described as an example. As shown in FIG. 8, the R light is opened by the time tS1 of the irradiation time tR (the liquid crystal cell 36Si).
Of the G light is opened by the time tS2 of the irradiation time tG (the final opening is 50%).
With respect to the B light, the liquid crystal cell 36Si is opened such that it is opened by the time tS3 of the irradiation time tB (the final opening is 20%).
Drive.

Here, as shown in FIG.
In Si, a transient phenomenon occurs in which it is not completely opened but gradually opens in response to a predetermined applied pulse voltage. Therefore,
The exposure amounts of the R light, the G light, and the B light in the portions corresponding to the pixels of the photosensitive material 16 gradually increase. Similarly, in the liquid crystal cell 36Si, when a predetermined pulse voltage is not applied, a transient phenomenon occurs in which the liquid crystal cell 36Si is not completely closed but gradually closed. Therefore, even after the pulse voltage is no longer applied to the liquid crystal cell 36Si (when the times tS2 and tS3 have elapsed), the portions of the photosensitive material 16 corresponding to the pixels are exposed to the G light and the B light. In consideration of such a transient phenomenon, the exposure amount of the sequentially irradiated R, G, and B light corresponding to the pixels of the photosensitive material 16 is not substantially equal to the exposure amount of the corresponding pixel of the color image data. Thus, the times tS1, tS2,
tS3 is set.

After one line of the photosensitive material 16 is thus exposed, the control circuit 50 controls the driver 26D
By driving the motor 58 through the transport rollers 19, 21, 23A, 23B, 24A, 24B, 26
Is driven to transport the photosensitive material 16 one line, and the next line is exposed. In this embodiment, when exposing the next line,
As shown in FIG. 8, the liquid crystal cell 36Si is opened so that the degree of opening increases continuously until the emission of R light, G light and G light ends. In this case, in order that the exposure amounts of the sequentially irradiated R light, G light, and B light portions of the photosensitive material 16 corresponding to the pixels are not substantially equal to the exposure amounts of the corresponding pixels of the color image data. Times tS1, tS2 ',
tS3 'is set. That is, here, the timing for opening the liquid crystal cell 36Si with respect to the G light and the B light is set to be later than when the G light and the B light are emitted. Thus, the photosensitive material 16 located at the exposure section 22 is scanned and exposed.

After the exposure is started, after the exposed photosensitive material 16 is once sent to the switchback section 40,
It is fed into the water application section 62 by the reverse rotation of the transport roller 26.

In the water application section 62, water is applied to the photosensitive material 16, and further passes through the water application section 62 while excess water is removed by the squeeze roller 68.

The photosensitive material 16 to which water as an image forming solvent has been applied in the water application section 62 is applied to the squeeze roller 6.
8, the toner is sent to the thermal development transfer unit 104.

On the other hand, as the scanning exposure of the photosensitive material 16 is started, the image receiving material 108 is also pulled out of the material receiving magazine 106 by the nip roller 110 and transported. When the image receiving material 108 is pulled out by a predetermined length, the cutter 112 operates to cut the image receiving material 108 into a predetermined length.

After the operation of the cutter 112, the guide plate 182
Rollers 190, 186, 1 while being guided by
It is conveyed by 14 and enters a standby state immediately before the thermal development transfer unit 104.

In the thermal development transfer unit 104, when it is detected that the photosensitive material 16 has been sent between the outer periphery of the heating drum 116 and the bonding roller 120 by the squeeze roller 68, the conveyance of the image receiving material 108 is restarted. While being sent to the bonding roller 120, the heating drum 11
6 is activated.

In this case, a guide plate 122 is disposed between the laminating roller 120 and the squeeze roller 68 of the water application section 62, and the photosensitive material 16 sent from the squeeze roller 68 is surely adhered to the laminating roller 120. Guided to.

The photosensitive material 16 and the image receiving material 108 superimposed by the laminating roller 120 remain in the superimposed state while the heating drum 116 and the endless pressure contact belt 11
8 and about 2/3 of the circumference of the heating drum 116 (between the winding roller 134 and the winding roller 140).
Conveyed over. As a result, the photosensitive material 16 and the image receiving material 108 are heated to release a movable dye, and at the same time, the dye is transferred to the dye fixing layer of the image receiving material 108 to obtain an image.

Thereafter, when the photosensitive material 16 and the image receiving material 108 are nipped and conveyed and reach the lower portion of the heating drum 116, the peeling claw 154 is moved by the cam 130 and the image receiving material 1 is moved.
The peeling claw 154 engages the leading end of the photosensitive material 16 that is transported a predetermined length earlier than the length of the photosensitive material 16 to peel the leading end of the photosensitive material 16 from the outer periphery of the heating drum 116. Further, the pinch roller 157 presses the photosensitive material 16 by the return movement of the peeling claw 154, whereby the photosensitive material 16 is wound around the bending guide roller 142 while being pressed by the pinch roller 157, and is moved downward to discard the photosensitive material. It is accumulated in the storage box 178.

On the other hand, the heating drum 1 is separated from the photosensitive material 16.
Image receiving material 108 moving while being in close contact with 16
Is sent to the peeling roller 174 and peeled.

The image receiving material 108 peeled off from the outer periphery of the heating drum 116 by the peeling claw 176 is further moved downward while being wound around the peeling roller 174, and is guided by the material receiving guide 170 while receiving the material receiving rollers 172, 1.
The sheet is conveyed by 73 and 175 and discharged to the tray 177.

As described above, a light emitting diode for irradiating red, green and blue light is used as a light source to control a liquid crystal cell so that an exposure amount of a portion corresponding to a pixel of a photosensitive material corresponds to a pixel corresponding to color image data. It is not necessary to provide a movable part such as a filter cylinder for converting white light into R light, G light and B light because the exposure amount is substantially equal to
A small-sized and low-test exposure apparatus can be provided.

In the embodiment described above, the light source system 27A
Is an LED for B light as a light emitting element and an LE for G light
LEDs for D and R light are provided close to each other in a direction orthogonal to the direction of one line of the photosensitive material 16 to form a light emitting element group 33.
Configure, a configuration which is arranged at a predetermined pitch P ₁ along the light-emitting element groups 33 in the direction of one line of the photosensitive material 16, the arrangement direction and the number of each LED of the BGR is not limited thereto .

For example, as shown in FIG. 9, an LED for B light, an LED for G light, and an LE for R light
D along the direction of one line of the photosensitive material 16 at a pitch P ₂
There constitute a light-emitting element group 35 is provided close at about 0.5 mm, may be configured to arranged at a predetermined pitch P ₁ along the light-emitting element groups 35 in the direction of one line of the photosensitive material 16, or, As shown in FIG. 10, the light emitting element group 37 may be configured by providing more LEDs (for example, LEDs for B light) of a color having a smaller light amount than other LEDs than other LEDs. In this case, the light emission phases of the LEDs of the light emitting element group 37 are substantially the same as in the above-described embodiment, and color unevenness can be greatly reduced as compared with the related art.

For example, as shown in FIG. 11, two or more rows of LEDs as light emitting elements are arranged in a direction perpendicular to the direction of one line of the photosensitive material 16 and in the direction of one line of the photosensitive material 16. To form the light-emitting element group 37. In this case, the other LED
LED of a light amount smaller than that of LED (for example, L for B light
ED) is provided more than the other LEDs, or the number is set in accordance with the sensitivity of the photosensitive material 16, and more LEDs are provided so as to be dispersed in one light emitting element group 37. It is preferable to set. Also in this case, each LE of the light emitting element group 37 is substantially similar to the above-described embodiment.
The light emission phases of D become substantially the same, and color unevenness can be greatly reduced as compared with the related art.

In the above-described embodiment, the light source system 27A is configured to use the BGR LED as the light emitting element. However, the light emitting element is not limited to this, and may be, for example, an R, R, G false system. Alternatively, a light source combining wavelengths of four or more colors may be used.

Further, in the embodiment described above, the slit light beam transmitted through the liquid crystal light shutter array is imaged on the photosensitive material by using the SLA. However, the present invention is not limited to this, and is shown in FIG. As described above, the photosensitive material may be brought into close contact with the liquid crystal optical shutter array. Thus, the imaging lens system such as the SLA can be eliminated, and the size of the exposure apparatus can be further reduced.

As shown in FIG. 13, near the light source side of the liquid crystal light shutter array 36 in the above embodiment,
A diffusing plate 42 may be used as a diffusing means for diffusing light that has passed through the cylindrical lens and has become a slit light beam. As a result, the slit light beam is diffused, and uneven irradiation on the liquid crystal cell can be eliminated.
Light use efficiency can be improved.

Further, in the above-described embodiment, a light source system for directly irradiating three colors of light downward from the LED is used. However, the present invention is not limited to this. As shown in FIGS. Alternatively, a light source system 27B having an optical waveguide may be used.

Here, FIG. 14 is a longitudinal sectional view showing the structure of the light source system 27B. FIG. 15 is a sectional view of the light source system 27B along the line 2-2 in FIG. 14, and FIG. 16 is a light source system 27B along the line 3-3 in FIG.
Is shown in cross section.

[0086] The light source system 27B includes a reflection plate 41 constituting an optical waveguide. The reflecting plate 41 is formed in a gutter shape with an open bottom, and its reflecting surface is a parabolic reflecting plate formed in a parabolic curve in vertical and horizontal cross-sectional shapes. An LED 42 is attached to one end of the reflecting plate 41 in the longitudinal direction. The LED 42 is configured such that an LED as a light emitting element that emits B light, an LED as a light emitting element that emits G light, and an LED as a light emitting element that emits R light are arranged adjacently. It is preferable that the LEDs are arranged as concentrated as possible. Thereby, the light from the LED 42 is irradiated toward the inside of the reflection plate 41 and is uniformly reflected toward the bottom opening by the inner peripheral reflection surface of the reflection plate 41. A substrate 43 is attached to the bottom opening of the reflection plate 41, and a scattering plate 44 as a light emitting unit is attached to the center of the substrate 43. As shown in FIG. 16, the scattering plate 44 is formed in a narrow (for example, 1 mm to 20 mm) slit shape. The scattering plate 44 (light emitting portion) can transmit light while scattering the light. Therefore, light emitted from the LED 42 and transmitted to each portion in the longitudinal direction by the reflecting plate 41 is transmitted through the scattering plate 44. The light is scattered and emitted uniformly from the LED 42 along the longitudinal direction of the scattering plate 44 as a slit light beam.

The LED 42 of the light source system 27B
The light emission time and light emission luminance of the ED can be controlled independently. For this reason, there is no need to provide a color filter or an aperture mechanism for controlling the amount of light and light quality on the optical axis,
The light quantity and light quality can be controlled by controlling the current of the LED.

FIG. 17 is a longitudinal sectional view showing the structure of another light source system 27C. The light source system 27C includes a reflection plate 51 forming an optical waveguide. The reflection plate 51 is formed in a parabolic curve shape on the left and right, respectively, with the center in the longitudinal direction as the center. Both ends of the reflecting plate 51 in the longitudinal direction have L
EDs 42 are respectively attached. This allows
The light from each LED 42 is irradiated toward the inside of the reflecting plate 51 and is reflected toward the scattering plate 44 by the inner peripheral reflecting surface of the reflecting plate 51. Further, in this case, since the reflection plate 51 has the shape as described above, even at a position distant from each LED 42 (the middle portion in the longitudinal direction of the reflection plate 51).
Light is uniformly reflected similarly to the position near each LED 42. For this reason, the light emitted from the LED 42 and transmitted to each portion in the longitudinal direction by the reflecting plate 51 is scattered by transmitting through the scattering plate 44, and the LED is emitted along the longitudinal direction of the scattering plate 44.
In this configuration, light emitted from the light source 42 is uniformly irradiated as a slit light beam. FIG. 18 shows a configuration of still another light source system 27D in a longitudinal sectional view. In the light source system 27D,
Instead of the reflector 31 of the light source system 27B and the reflector 51 of the light source system 27C, a light guide 56 forming an optical waveguide is used.
It has.

The light guide 56 has an upper periphery formed in a parabolic curve in vertical and horizontal cross sections, and can transmit light while refracting or reflecting light. Also,
On the bottom surface of the light guide 56, a light emitting portion 58 is provided with an uneven surface. This light emitting portion 58
Can scatter transmitted light while transmitting it. Therefore, the light from the LED 32 is irradiated toward the inside of the light guide 56, reflected by the light emitting unit 58 after being transmitted by the light guide 56, and scattered by transmitting through the light emitting unit 58, The configuration is such that the slit light beam is uniformly irradiated along the longitudinal direction of the light emitting portion 58.

In the light source system 27D, if there is shading of the light guide 56, as shown in FIG.
0 can be provided. Thereby, the illuminance unevenness of the irradiated light is further reduced.

In the above-described embodiment, the LED 30R
And a light source system in which the LED 30B and the LED 30G are provided close to each other to form the light emitting element group 33, but the present invention is not limited to this.
B and an LED array in which a plurality of LEDs 30G are sequentially arranged as one unit, and an LED array in which a large number of the LED units are arrayed (the LED array has a multiple of 3 LEDs), and corresponds to this LED array Alternatively, a light source system including a rod lens may be used. In this case, an exposure correcting plate (aperture) 61 as an exposure adjusting means is disposed between the SLA 38 and the photosensitive material 16 and near the light source side of the photosensitive material 16. The exposure amount correction plate 61 has a slit-shaped opening 62 as shown in detail in FIG. One side of the opening 62 corresponds to each LE of the LED array described above.
A correction section 63 having a shape (waveform) corresponding to the array pitch of each lens of the D and rod lens arrays is formed. That is, as shown in FIG.
The illuminance (light amount) varies according to the arrangement pitch of the EDs. Also, as shown in FIG. 21B, the illuminance of the rod lens array similarly varies according to the arrangement pitch of each lens. When the unevenness of both is integrated, FIG.
As shown in (C), the light irradiated on the photosensitive material 16 has unevenness. The shape of the correction section 63 of the opening 62 is set according to the waveform of the integrated unevenness. Thereby, LE
When the reflected light from the document 42 due to the light of the D array is irradiated on the photosensitive material 16 through the rod lens array, the amount of exposure to the photosensitive material 16 is reduced by passing through the opening 62 of the exposure correction plate 61. It is designed to be uniform.

When the photosensitive material 16 is irradiated, it passes through the opening 62 of the exposure correction plate 61. Here, the light emitted from the LED array and passing through the rod lens array has uneven light quantity along the arrangement direction of each element as shown in FIG. However, the opening 6 of the exposure correction plate 61
2, each L of the LED array as shown in FIG.
Since the waveform correcting section 63 is formed in accordance with the illuminance unevenness caused by the arrangement pitch of each lens of the ED and the rod lens array, the illuminance unevenness is corrected by passing through the opening 62 of the exposure correction plate 61. The exposure amount of the photosensitive material 16 is made uniform without unevenness as shown in FIG.

In other words, since the correcting section 63 is formed in the opening 62, the time integral of the illuminance of the light irradiated on the photosensitive surface of the photosensitive material 16 by scanning becomes constant in each portion in the longitudinal direction of the opening 62. In addition, the exposure amount of the photosensitive material 16 is made uniform without causing unevenness.

As described above, even if illumination unevenness occurs for each arrangement pitch of each element of the LED array or rod lens array in the light source system, the waveform correction unit 63 according to the illuminance unevenness caused by the arrangement pitch of each element is used. Since the exposure amount correction plate 61 having the formed opening 62 is provided in the optical path, the exposure amount of the photosensitive material 16 exposed through the opening 62 of the exposure amount correction plate 61 is constant without causing unevenness. Becomes
Therefore, a high-quality image without image unevenness can be obtained.

The correcting section 63 provided in the opening 62 of the exposure correcting plate 61 adjusts the illuminance (light amount) unevenness caused by the arrangement pitch of each LED of the LED array and the arrangement pitch of each lens of the rod lens array. The configuration is such that the shape is set in accordance with the waveform of the illuminance unevenness resulting from the illuminance unevenness caused by the illumination. However, the configuration is not limited to this. A configuration may be provided in which a correction unit corresponding to illuminance unevenness caused by the arrangement pitch of each lens of the lens array is separately provided. That is, as shown in FIG.
2 is provided with a correction unit 64 corresponding to the illuminance unevenness caused by the arrangement pitch of each LED of the LED array and a correction unit 65 corresponding to the illuminance unevenness caused by the arrangement pitch of each lens of the rod lens array. Is also good. Even in this case, the illuminance unevenness described above is corrected, and the photosensitive material 16 exposed through the opening 62 of the exposure amount correction plate 61 is exposed.
Is constant without unevenness. Therefore, a high-quality image without image unevenness can be obtained.

In the above-described embodiment, the control circuit 50 has described the first control method for controlling only the opening and closing of the liquid crystal cell.
The control method for making the exposure amount of the portion corresponding to the pixel No. 6 substantially equal to the exposure amount of the pixel corresponding to the color image data is not limited to this, and various control methods shown in FIGS. be able to.

FIG. 24 is a timing chart showing a liquid crystal cell using the LED 30R as an example and a second control method for controlling the LED 30R. In addition, LED3
0G and the LED 30B are similarly controlled, but are not limited to the second control method, and may be any of the first control method described above and any one of the third to fifth control methods described later. Good. As shown in FIG. 24, the second control method is to make the control time of the LED 30R coincide with the opening time of the liquid crystal cell, and to cause the LED 30R to emit pulses.

That is, in the second control method, the pulse voltage is continuously applied at the time interval t90 for a predetermined time t91 to the LED 3.
Applying to 0R, the amount of emitted R light is digitally changed. The pulse voltage is applied to the liquid crystal cell 36Si during a time tS9 that coincides with the pulse voltage application time, and the liquid crystal cell 36Si is driven to open.

As described above, since the amount of light emitted from the LED is reduced and the opening time of the liquid crystal cell is controlled, the exposure amount of the portion of the photosensitive material 16 corresponding to the pixel is changed to the corresponding pixel of the color image data. Can be accurately matched to the exposure amount of

FIG. 25 is a timing chart showing a liquid crystal cell using the LED 30R as an example and a third control method for controlling the LED 30R. In addition, LED3
0G and the LED 30B are similarly controlled, but are not limited to the third control method, and may be any one of the first or second control method described above and the fourth or fourth control method described later. The control method may be used. As shown in FIG. 25, in the third control method, the control time of the LED 30R and the opening time of the liquid crystal cell are made to match, and the application time of the pulse voltage applied to the LED 30R is varied. That is, LED
During the control time t10R of 30R, the liquid crystal cell 36i is opened, and the application time of the pulse voltage to the LED 30R is set to t.
101, t102, t103, t104, and t105.

As described above, the application time of the pulse voltage applied to the LED 30R is changed to reduce the amount of light emitted from the LED, and the control time of the LED 30R matches the open time of the liquid crystal cell. , Photosensitive material 16
It is possible to accurately match the exposure amount of the portion corresponding to the pixel with the exposure amount of the corresponding pixel of the color image data.

FIG. 26 shows a liquid crystal cell and an LED 30R,
A timing chart showing a fourth control method for controlling 30G and 30B is shown. As shown in FIG. 26, the fourth control method does not digitally change the amount of light emitted by applying a pulse voltage to the LED, but emits light from the LED by gradually increasing the applied voltage. The amount of light is gradually increased in an analog manner, and the open time of the liquid crystal cell 36Si is made to match the control time of the LED. Thereby, control of the liquid crystal cell can be simplified.

FIG. 27 shows a liquid crystal cell and LED 30R,
A timing chart showing a fifth control method for controlling 30G and 30B is shown. As shown in FIG. 27, the fifth control method exclusively uses a transient phenomenon of a liquid crystal cell. That is, when the pulse voltage is applied to the LED 30R, the application time of the pulse voltage to the liquid crystal cell 36Si ends. As a result, the amount of R light transmitted through the liquid crystal cell 36Si is reduced by utilizing only the transient phenomenon in which the liquid crystal cell 36Si closes when the application of the pulse voltage is stopped. The same control is performed for the LED 30G. Note that the opening degree of the liquid crystal cell 36Si changes according to the time of the pulse voltage applied to the liquid crystal cell 36Si.
By changing the application time of the pulse voltage to the ED 30R and the LED 30G, the R passing through the liquid crystal cell 36Si is changed.
The light amounts of light and G light can be changed. Also, LE
The pulse voltage is applied to the liquid crystal cell 36Si when a predetermined time has elapsed since the application of the pulse voltage to D30B, and the application of the pulse voltage to the liquid crystal cell 36Si is completed when the application time of the pulse voltage to the LED 30B ends. As a result, the amount of transmitted B light is gradually increased using only the transient phenomenon in which the liquid crystal cell 36Si gradually opens.

As described above, since only the transient phenomenon of the liquid crystal cell is used, the opening degree of the liquid crystal cell during the transient phenomenon and the LED are used.
Since only the relationship with the amount of light emitted from the liquid crystal needs to be calculated, control of the liquid crystal cell can be simplified.

In the various embodiments described above, an example has been described in which, after one line of the photosensitive material 16 is exposed, the photosensitive material 16 is intermittently conveyed by one line to expose the next line. However, the present invention is not limited to this. Instead, the photosensitive material 16 may be transported continuously. In this case, the R light on the photosensitive material 16;
Instead of irradiating G light and B light once, as shown in FIG. 28A, a plurality of times (for example, 2, 3, 4, 5,...)
..), and in this embodiment, irradiation is performed twice. As a result, as shown in FIG. 28B, the pixels constituting one line of the photosensitive material are applied to the R light and the G light by two irradiations, respectively.
The amounts of light and B light are in the form of multiple exposure.
In this case, when the photosensitive material 16 is continuously transported, the photosensitive material 1
There is a case where the exposure line to No. 6 is shifted from the line corresponding to one line of the color image data, so that there is a possibility that an appropriate image cannot be formed. Therefore,
As shown in FIG. 29, the liquid crystal light shutter array 36 is moved via a bar 72 by using a piezo element 70 as a slit light moving means. Piezo element 70
As shown in FIG. 30, the movement of the liquid crystal light shutter array 36 in the direction in which the photosensitive material 16 is continuously conveyed (FIG.
(Y direction in 0) and at substantially the same speed as the transport speed. This is repeated for each line of the photosensitive material 16 to be exposed. That is, the movement of the liquid crystal light shutter array 36 is started when exposure of one line of the photosensitive material 16 is started, and when the exposure of the line is completed, the liquid crystal light shutter array 36 is returned to the initial position, and the exposure of the next line is performed again. The movement of the liquid crystal light shutter array 36 is started from the start of the operation. Thus, the slit light beam transmitted through the liquid crystal light shutter array 36 can be irradiated so as to substantially coincide with the exposure line of the photosensitive material 16 corresponding to one line of the color image data.

As described above, the slit light beam is moved line by line in the photosensitive material 16 in substantially the same direction as the continuous conveyance direction of the photosensitive material and at substantially the same speed as the conveying speed. The exposure line can be made substantially coincident with the line corresponding to one line of the color image data. The liquid crystal light shutter array 36 is moved by using the piezo element 70 in order to always make the exposure line of the photosensitive material 16 by the slit light beam coincide with the line corresponding to one line of the color image data.
The invention is not limited to this, and the liquid crystal light shutter array 36 may be moved using an eccentric cam.

In the above-described embodiment, an optical shutter array is used as an optical shutter array in which liquid crystal cells are arranged as optical shutter elements. However, the present invention is not limited to this. An optical shutter array constituted by an analyzer arranged so as to form an angle of 90 ° with the plane of polarization and a PLZT substrate arranged between the polarizer and the analyzer may be used. A plurality of electrodes are arranged at equal intervals on the PLZT substrate. This electrode is A
It can be made of an alloy of u and Cr or In ₂ O ₃ , and is connected to the control circuit 50 so that a voltage can be applied independently. When a light beam enters from the polarizer side, it passes through the polarizer to become linearly polarized light, and then enters the PLZT substrate. At this time, when a voltage is applied to the adjacent electrodes of the PLZT substrate, the light beam undergoes a phase change proportional to the square of the electric field, passes between the electrodes of the PLZT substrate, and becomes elliptically polarized light. This elliptically polarized light is incident on the analyzer, and only components that match the plane of polarization of the analyzer pass through the analyzer. As a result,
The gap between the electrodes acts as an optical shutter element, and the optical shutter element to which no electric field is applied remains closed, but the optical shutter element to which an electric field is applied transmits a linear light beam. become.

As described above, since the electrodes between the electrodes of the PLZT substrate in which the plurality of electrodes are arranged at equal intervals act as optical shutter elements, the liquid crystal light in which a plurality of the above-described liquid crystal cells are arranged as a whole is provided. The same operation as that of the shutter array is achieved, and the above-described effect can be achieved.

In the above-described embodiment, the photosensitive material is conveyed. However, the present invention is not limited to this. A light source system, a liquid crystal light shutter array, or the like may be moved with respect to the photosensitive material. The material, the light source system, the liquid crystal light shutter array, and the like may be moved. Even in this case, the various effects described above can be obtained.

[0110]

According to the first aspect of the present invention, the light source system includes at least three light emitting elements that emit light of different colors, and the light emitted from the at least three light emitting elements emits light.
The light emission phases are almost the same in the direction in which the optical elements are arranged.
And the direction corresponding to the direction in which the light emitting element groups are arranged.
Whether to irradiate in the form of longitudinal slit light
If the light-emitting elements are simply arranged in a linear
Cause color unevenness in accordance with the arrangement pitch
And at least one of a light emitting element and an optical shutter element
Are controlled so that the exposure amount of the portion corresponding to the pixel of the photosensitive material is substantially equal to the exposure amount of the corresponding pixel of the color image data, so that white light is converted into R light, G light and B light. There is no need to provide a movable part such as a filter cylinder,
It is possible to provide a small and low test exposure apparatus,
It has the effect of.

[0111]

[0112]

[0113]

According to the second aspect of the present invention, since the exposure correction plate has an opening having a shape corresponding to the arrangement pitch of the light emitting elements, when the photosensitive material is irradiated through the optical shutter array, This has the effect that unevenness in the amount of light corresponding to the arrangement pitch can be removed by this opening.

[0115]

[Brief description of the drawings]

FIG. 1 is a schematic overall configuration diagram of an image recording apparatus.

FIG. 2 is a schematic overall configuration diagram of an exposure apparatus.

FIG. 3 is a layout diagram of LEDs.

FIG. 4A is a diagram illustrating light amount unevenness, and FIG. 4B is a diagram illustrating color unevenness.

FIG. 5 is a plan view showing an element arrangement state of a conventional LED array.

FIG. 6 shows an illumination state of a conventional LED array, and (A)
FIG. 3 is a diagram illustrating light amount unevenness, and FIG. 2B is a diagram illustrating color unevenness.

FIG. 7 is a circuit diagram of a control system of the exposure apparatus.

FIG. 8 is a timing chart showing a first control method by a control circuit of a control system of the exposure apparatus.

FIG. 9 is a plan view showing another example of the arrangement state of the LEDs.

FIG. 10 is a plan view showing another example of the arrangement state of the LEDs.

FIG. 11 is a plan view showing another example of the arrangement state of the LEDs.

FIG. 12 is a schematic overall configuration diagram of another embodiment of the exposure apparatus.

FIG. 13 is a schematic overall configuration diagram of another embodiment of the exposure apparatus.

FIG. 14 is a longitudinal sectional view showing a configuration of a light source system.

15 is a cross-sectional view of the configuration of the light source system, taken along line 2-2 of FIG.

FIG. 16 is a cross-sectional view of the configuration of the light source system, taken along line 3-3 in FIG.

FIG. 17 is a longitudinal sectional view showing a configuration of a light source system.

FIG. 18 is a longitudinal sectional view showing a configuration of a light source system.

FIG. 19 is a cross-sectional view showing a modification of the light source system.

FIG. 20 is a plan view showing an exposure amount correction plate.

FIG. 21 is a diagram showing a state of illuminance unevenness of the LED array and the rod lens array.

FIG. 22 is a diagram showing a relationship among illuminance unevenness of a LED array and a rod lens array, a shape of a correction unit, and an exposure amount.

FIG. 23 is a plan view corresponding to FIG. 20, showing another example of the exposure correction plate.

FIG. 24 is a timing chart showing a second control method by a control circuit of a control system of the exposure apparatus.

FIG. 25 is a timing chart showing a third control method by a control circuit of a control system of the exposure apparatus.

FIG. 26 is a timing chart showing a fourth control method by a control circuit of a control system of the exposure apparatus.

FIG. 27 is a timing chart showing a fifth control method by a control circuit of a control system of the exposure apparatus.

FIG. 28 is a diagram showing a timing chart of pulse signals to an LED, a liquid crystal cell, and a motor when a photosensitive material is continuously fed, and an average value of an exposure amount.

FIG. 29 is a view showing an apparatus for moving an optical shutter array for continuously feeding a photosensitive material.

FIG. 30 is a timing chart of a pulse signal to the LED that continuously feeds the photosensitive material, and a diagram showing a time change of the position of the optical shutter array.

[Explanation of symbols]

 Reference Signs List 10 Image recording device 25 Exposure device 30R, 30G, 30B LED 34 Cylindrical lens 36 Liquid crystal light shutter array 38 SLA

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. ⁷ , DB name) G03B 27/00-27/80 G02B 27/00 G02F 1/01 H04N 1/23 103

Claims (2)

(57) [Claims] At least three light emitting elements each emitting light of a different color are arranged, and each of the light emitting elements is arranged.
The emission phases in the arranged direction will be almost the same as each other
These light-emitting elements
The light emitting element group is arranged at a fixed pitch.
And a light source system for irradiating the light emitted from each light emitting element as a slit light beam, and relatively moving at least one of the light slit light beam and the photosensitive material in a direction intersecting the longitudinal direction of the slit light beam. Moving means, an optical shutter element disposed between the light source system and the photosensitive material and opened and closed to transmit and block slit light incident from the light source system in a direction corresponding to the longitudinal direction of the slit light; A plurality of optical shutter arrays arranged corresponding to the pixels constituting one line of the pixel row of the photosensitive material, and the amount of exposure of a portion of the photosensitive material corresponding to the pixels by the slit light beam transmitted through the optical shutter element is color image data. A control means for controlling at least one of the light-emitting element and the optical shutter element so as to be substantially equal to the exposure amount of the corresponding pixel. And, exposure apparatus equipped with. 2. A light source for emitting light of different colors.
In each case, three light emitting elements are arranged, and an opening having a shape corresponding to the arrangement pitch of the arranged light emitting elements is provided.
An exposure correction plate having an opening is connected to the light source side of the photosensitive material.
2. The exposure apparatus according to claim 1, wherein the exposure apparatus is disposed in the vicinity.
Place.