JP3330637B2 - Method for manufacturing fluorescent film substrate - Google Patents

Method for manufacturing fluorescent film substrate

Info

Publication number
JP3330637B2
JP3330637B2 JP16225392A JP16225392A JP3330637B2 JP 3330637 B2 JP3330637 B2 JP 3330637B2 JP 16225392 A JP16225392 A JP 16225392A JP 16225392 A JP16225392 A JP 16225392A JP 3330637 B2 JP3330637 B2 JP 3330637B2
Authority
JP
Japan
Prior art keywords
fluorescent film
conductor layer
layer
glass substrate
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP16225392A
Other languages
Japanese (ja)
Other versions
JPH05325786A (en
Inventor
忠壮 谷口
憲太郎 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissha Printing Co Ltd
Original Assignee
Nissha Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissha Printing Co Ltd filed Critical Nissha Printing Co Ltd
Priority to JP16225392A priority Critical patent/JP3330637B2/en
Publication of JPH05325786A publication Critical patent/JPH05325786A/en
Application granted granted Critical
Publication of JP3330637B2 publication Critical patent/JP3330637B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、蛍光表示管やブラウ
ン管などにもちいられる導電体層を有する蛍光膜基板の
製造方法に関するもので、とくに導電体層が火膨れした
りガラス基板と剥離しないようにしたものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a fluorescent film substrate having a conductive layer used for a fluorescent display tube, a cathode ray tube, and the like. It was made.

【0002】[0002]

【従来の技術】従来の蛍光膜基板の製造方法は、まずガ
ラス基板上にスクリーン印刷により蛍光膜を部分的に形
成する。つぎに蛍光膜表面の凹凸をなくして平滑表面と
するためにフィルミング液層をコートする。つぎに蒸着
法により、蛍光膜を覆うように導電体層を形成する。最
後に加熱して、蛍光膜中の蛍光体以外の有機成分やフィ
ルミング液層の有機成分を熱分解ガスとし、ガラス基板
と導電膜層との間を端部まで通り抜けさせて除去し、蛍
光体と導電体層との積層膜をガラス基板に形成する。
2. Description of the Related Art In a conventional method of manufacturing a fluorescent film substrate, first, a fluorescent film is partially formed on a glass substrate by screen printing. Next, a filming liquid layer is coated in order to eliminate unevenness on the surface of the fluorescent film and obtain a smooth surface. Next, a conductor layer is formed by an evaporation method so as to cover the fluorescent film. Finally, heating is performed, and the organic components other than the phosphor in the fluorescent film and the organic components of the filming liquid layer are converted into a pyrolysis gas. A laminated film of a body and a conductor layer is formed on a glass substrate.

【0003】導電体層の端部は外部リード線に接続され
る。このため、導電体層は蛍光膜の部分をすべて覆いし
かもガラス基板の端部近くにまでとどく大きさの面積で
形成される。
[0003] An end of the conductor layer is connected to an external lead wire. For this reason, the conductor layer is formed so as to cover the entire fluorescent film portion and have an area as large as near the end of the glass substrate.

【0004】[0004]

【発明が解決しようとする課題】従来の製造方法では、
導電体層の面積が大きいため、加熱による発生する有機
成分の熱分解ガスの通り抜けが困難となる。このため、
残留した熱分解ガスが導電体層を部分的に押し上げる現
象いわゆる火膨れが発生するとともに、蛍光体とガラス
基板との間や蛍光体と導電体層との間で剥離が発生す
る。
SUMMARY OF THE INVENTION In the conventional manufacturing method,
Since the area of the conductor layer is large, it is difficult to pass through a pyrolysis gas of an organic component generated by heating. For this reason,
A phenomenon in which the residual pyrolysis gas partially pushes up the conductor layer, so-called blistering, occurs, and peeling occurs between the phosphor and the glass substrate or between the phosphor and the conductor layer.

【0005】また、蛍光膜に直接重なって形成された導
電体層にクラックやピンホールが発生するので、蛍光膜
の発光が十分に反射されない。このため蛍光膜の輝度が
落ちる。
[0005] Further, cracks and pinholes occur in the conductor layer formed directly on the fluorescent film, so that light emitted from the fluorescent film is not sufficiently reflected. For this reason, the brightness of the fluorescent film is reduced.

【0006】[0006]

【課題を解決するための手段】この発明の蛍光膜基板の
製造方法は、以上の課題を解決するためにつぎのように
構成した。すなわち、基材フィルム上に剥離層を形成
し、その上に印刷法により水溶性樹脂層を部分的に形成
し、その上に導電体層を全面に形成し、つぎに、水洗に
よって水溶性樹脂とともにその上の導電体層を除去して
導電体層にガス逃げ用孔を形成し、その上に接着層を形
成して転写材を得、つぎに、蛍光膜が部分的に形成され
たガラス基板上に、導電体層のガス逃げ用孔と蛍光膜と
が重ならないように転写材を重ね合わせ、加熱加圧した
後基材フィルムを剥離し、つぎにガラス基板を加熱する
ことによって蛍光体以外の有機成分を熱分解されたガス
として除去するようにした。
Means for Solving the Problems A method of manufacturing a fluorescent film substrate according to the present invention is configured as follows in order to solve the above problems. That is, a release layer is formed on a base film, a water-soluble resin layer is partially formed thereon by a printing method, a conductor layer is formed on the entire surface, and then a water-soluble resin is formed by washing with water. At the same time, the conductor layer on top is removed to form a gas escape hole in the conductor layer, an adhesive layer is formed thereon to obtain a transfer material, and then the glass on which the fluorescent film is partially formed. The transfer material is overlapped on the substrate so that the gas escape hole of the conductor layer and the fluorescent film do not overlap, and the substrate film is peeled off after heating and pressurizing, and then the glass substrate is heated to thereby release the phosphor. Other organic components were removed as thermally decomposed gas.

【0007】[0007]

【実施例】以下、この発明の実施例を図面を参照しなが
ら説明する。図1、図7、図8は、この発明によって製
造される蛍光膜基板を示す正面図である。図2〜図6
は、この発明の実施例の一工程を示す断面図である。
Embodiments of the present invention will be described below with reference to the drawings. FIGS. 1, 7, and 8 are front views showing a phosphor film substrate manufactured by the present invention. 2 to 6
FIG. 2 is a sectional view showing one step of the embodiment of the present invention.

【0008】まず、ガラス基板8上に、ガス逃げ用孔4
0を有する導電体層4を形成するための転写材1を得る
(図2〜図4参照)。
First, a gas escape hole 4 is formed on a glass substrate 8.
The transfer material 1 for forming the conductor layer 4 having 0 is obtained (see FIGS. 2 to 4).

【0009】最初に、水溶性樹脂を用いてガス逃げ用孔
40を形成する方法を説明する(図2、図4参照)。
First, a method of forming the gas escape hole 40 using a water-soluble resin will be described (see FIGS. 2 and 4).

【0010】まず、基材フィルム2上に剥離層3を形成
する。基材フィルム2は、ポリエステル、ポリプロピレ
ンなど通常の転写材1の基材フィルム2として用いられ
ているものでよい。
First, a release layer 3 is formed on a base film 2. The base film 2 may be one used as the base film 2 of the ordinary transfer material 1 such as polyester or polypropylene.

【0011】剥離層3は、熱可塑性樹脂や天然ゴムや合
成ゴムなどからなるインキを用いてグラビア印刷法やス
クリーン印刷法など通常の形成手段で形成する。
The release layer 3 is formed by an ordinary method such as a gravure printing method or a screen printing method using an ink composed of a thermoplastic resin, natural rubber, synthetic rubber, or the like.

【0012】つぎに、剥離層3上に、ガス逃げ用孔40
を導電体層4に形成するための水溶性樹脂層6を印刷法
により部分的に形成する(図2(a)参照)。水溶性樹
脂の印刷部分が、剥離層3上の導電体層4のガス逃げ用
孔40を設けたい部分に相当する。
Next, a gas escape hole 40 is formed on the release layer 3.
Is formed partially on the conductor layer 4 by a printing method (see FIG. 2A). The printed portion of the water-soluble resin corresponds to a portion where the gas escape hole 40 of the conductor layer 4 on the release layer 3 is to be provided.

【0013】この発明では、蛍光膜9が形成されたガラ
ス基板8上に、転写材1によって導電体層4を形成する
とともに、導電体層4のガス逃げ用孔40を蛍光膜9が
形成されていない部分上にのみ形成することを目的とし
ている(図1、図7、図8参照)。したがって、水溶性
樹脂層6は、蛍光膜9が形成されたガラス基板8上に転
写材1を重ね合わせたときに、蛍光膜9上にガス逃げ用
孔40が配置されないように、剥離層3上に形成する。
たとえば、ガラス基板8上に重ね合わせたときに蛍光膜
9を取り囲むように配置されるようにするなど、ガラス
基板8上に形成された蛍光膜9のパターンの設計に応じ
て適宜設計するとよい。水溶性樹脂層のパターンは、円
形や楕円形など任意の形状がある(図7参照)。
In the present invention, the conductive layer 4 is formed by the transfer material 1 on the glass substrate 8 on which the fluorescent film 9 is formed, and the gas escape hole 40 of the conductive layer 4 is formed with the fluorescent film 9. It is intended to be formed only on a portion that is not provided (see FIGS. 1, 7, and 8). Therefore, the water-soluble resin layer 6 is formed on the release layer 3 so that the gas escape hole 40 is not arranged on the fluorescent film 9 when the transfer material 1 is superimposed on the glass substrate 8 on which the fluorescent film 9 is formed. Form on top.
For example, it may be appropriately designed according to the design of the pattern of the fluorescent film 9 formed on the glass substrate 8 such that the fluorescent film 9 is arranged so as to surround the fluorescent film 9 when superposed on the glass substrate 8. The pattern of the water-soluble resin layer has an arbitrary shape such as a circle or an ellipse (see FIG. 7).

【0014】水溶性樹脂層6を形成する印刷法として
は、グラビア印刷法やスクリーン印刷法などがある。水
溶性樹脂層6は、印刷法によって形成されるので約150
μm以上の幅のパターンとなる。水溶性樹脂層6は、ア
クリル酸ソーダやポリビニルアルコール、ポリビニルピ
ロリドン、ヒドロキシプロピルセルロースなどを用いる
とよい。
The printing method for forming the water-soluble resin layer 6 includes a gravure printing method and a screen printing method. Since the water-soluble resin layer 6 is formed by a printing method,
A pattern having a width of μm or more is obtained. The water-soluble resin layer 6 is preferably made of sodium acrylate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxypropyl cellulose, or the like.

【0015】つぎに、その上に導電体層4を全面に形成
する(図2(b)参照)。導電体層4の形成方法には、
真空蒸着法やスパッタリング法、イオンプレーティング
法などがあり、導電体層4の材質にはアルミニウムなど
がある。
Next, a conductor layer 4 is formed on the entire surface (see FIG. 2B). The method for forming the conductor layer 4 includes:
There are a vacuum deposition method, a sputtering method, an ion plating method and the like, and a material of the conductor layer 4 is aluminum or the like.

【0016】つぎに、水洗によって水溶性樹脂とともに
その上の導電体層4を除去して導電体層4にガス逃げ用
孔40を形成する(図2(c)参照)。水洗することに
よって、導電体層4下の水溶性樹脂層6が溶融し、水溶
性樹脂層6上に重なって形成されている導電体層4を一
緒に除去する。導電体層4には、水溶性樹脂層6のパタ
ーンと同じパターンのガス逃げ用孔40が形成される。
Next, the water-soluble resin and the conductor layer 4 thereon are removed by washing with water to form gas escape holes 40 in the conductor layer 4 (see FIG. 2C). By washing with water, the water-soluble resin layer 6 below the conductor layer 4 is melted, and the conductor layer 4 formed on the water-soluble resin layer 6 is removed together. Gas escape holes 40 having the same pattern as the pattern of the water-soluble resin layer 6 are formed in the conductor layer 4.

【0017】最後に、ガス逃げ用孔40が形成された導
電体層4上に接着層5を形成して転写材1を得る。接着
層5は、ビニル系樹脂やアクリル系樹脂、ポリオレフィ
ン系樹脂、スチロール系樹脂などからなるインキを用い
てグラビア印刷法やスクリーン印刷法など通常の形成手
段で形成する。以上のようにしてこの発明に用いる転写
材1を得る(図3参照)。
Finally, the transfer material 1 is obtained by forming the adhesive layer 5 on the conductor layer 4 in which the gas escape holes 40 are formed. The adhesive layer 5 is formed by a usual forming method such as a gravure printing method or a screen printing method using an ink composed of a vinyl resin, an acrylic resin, a polyolefin resin, a styrene resin, or the like. The transfer material 1 used in the present invention is obtained as described above (see FIG. 3).

【0018】以上のようにして得た転写材1を用いて、
蛍光膜9が部分的に形成されたガラス基板8上に導電体
層4を形成する(図4〜図5参照)。
Using the transfer material 1 obtained as described above,
The conductor layer 4 is formed on the glass substrate 8 on which the fluorescent film 9 is partially formed (see FIGS. 4 and 5).

【0019】すなわち、まず、上記転写材1の接着層5
側を、蛍光膜9が形成されたガラス基板8上に重ね合わ
せる。このとき導電体層4のガス逃げ用孔40と蛍光膜
9とが重ならないようにする(図4参照)。
That is, first, the adhesive layer 5 of the transfer material 1
The side is overlaid on the glass substrate 8 on which the fluorescent film 9 is formed. At this time, the gas escape hole 40 of the conductor layer 4 and the fluorescent film 9 are prevented from overlapping (see FIG. 4).

【0020】ガス逃げ用孔40は、蛍光膜9を取り囲む
ように数箇所に配置される。ガス逃げ用孔40と蛍光膜
9との距離は短いほうがよい。
The gas escape holes 40 are arranged at several places so as to surround the fluorescent film 9. The shorter the distance between the gas escape hole 40 and the fluorescent film 9 is, the better.

【0021】ガラス基板8は、ガラスなどの耐熱性の透
明材料からなる。ガラス基板8の形状としては、平板状
のものや端部が立ち上がっている皿形状のものなどがあ
る。
The glass substrate 8 is made of a heat-resistant transparent material such as glass. Examples of the shape of the glass substrate 8 include a flat plate shape and a dish shape with an end rising.

【0022】蛍光膜9は、蛍光体と樹脂バインダーおよ
び溶剤とから構成されたものである。蛍光体としては、
ZnO:Zn、ZnS:Cl+InO、ZnS:Cu,Al、ZnS:Ag,A
l、YOS:Eu、YOS:Tb等の硫化物系あるいは酸
化物系の蛍光体の粉末を用いるとよい。樹脂バインダー
は、アクリル系やエチルセルロース系のものがある。
The fluorescent film 9 is composed of a phosphor, a resin binder and a solvent. As a phosphor,
ZnO: Zn, ZnS: Cl + In 2 O 3 , ZnS: Cu, Al, ZnS: Ag, A
l, Y 2 O 3 S: Eu, Y 2 O 3 S: may be used a powder of the sulfide or oxide-based fluorescent material of Tb or the like. As the resin binder, there are acrylic and ethylcellulose binders.

【0023】ガラス基板8表面に蛍光膜9を形成する方
法は、スクリーン印刷やグラビア印刷、コーターブレー
ド印刷などの印刷法やスラリー法やコーティング法など
がある。あるいは、蛍光膜9を有する転写材をシリコン
パッドによってガラス基板8の表面に押しつけて加熱
し、転写材1の蛍光膜9をガラス基板8表面に転写形成
する方法でもよい。
The method of forming the fluorescent film 9 on the surface of the glass substrate 8 includes a printing method such as screen printing, gravure printing, coater blade printing, a slurry method and a coating method. Alternatively, a method in which the transfer material having the fluorescent film 9 is pressed against the surface of the glass substrate 8 with a silicon pad and heated to transfer and form the fluorescent film 9 of the transfer material 1 on the surface of the glass substrate 8 may be used.

【0024】つぎに、転写材1の基材フィルム2側か
ら、130〜230℃に加熱されたシリコンロールを押しつけ
る。押しつける圧力は3〜200Kg/cmである。この熱に
より接着層5が溶融しガラス基板8に接着する。
Next, a silicon roll heated to 130 to 230 ° C. is pressed from the base film 2 side of the transfer material 1. The pressing pressure is 3 to 200 kg / cm 2 . This heat causes the adhesive layer 5 to melt and adhere to the glass substrate 8.

【0025】つぎに、基材フィルム2を剥離し、ガラス
基板8上に接着層5、導電体層4、剥離層3が積層され
る(図4参照)。
Next, the base film 2 is peeled off, and the adhesive layer 5, the conductor layer 4, and the peeling layer 3 are laminated on the glass substrate 8 (see FIG. 4).

【0026】つぎに、ガラス基板8を加熱することによ
って蛍光体以外の有機成分を熱分解ガスとして除去する
(図5参照)。なお、図5は、剥離層3が除去され、次
に接着層5が除去されようとしている状態の図である。
加熱は200〜500℃の温度で約30分間行うとよい。
Next, by heating the glass substrate 8, organic components other than the phosphor are removed as pyrolysis gas (see FIG. 5). FIG. 5 is a view showing a state in which the peeling layer 3 is removed and then the adhesive layer 5 is about to be removed.
Heating is preferably performed at a temperature of 200 to 500 ° C. for about 30 minutes.

【0027】以上のようにして、ガラス基板8上に蛍光
膜9と導電体層4とが積層された蛍光膜基板11が得ら
れる。
As described above, the fluorescent film substrate 11 in which the fluorescent film 9 and the conductor layer 4 are laminated on the glass substrate 8 is obtained.

【0028】導電体層4は、ブラウン管などの陰極線管
に組み込まれ、電子線や熱電子をキャッチする電極とし
ての機能や、蛍光体の発光が後方に漏れるのを防ぎ、蛍
光を効率よく前面に出すようにする反射面として機能を
発揮する。また、導電体層4の端部は、外部リード線1
0に接続され導電体層4に溜まる電子を外部に除去する
機能もする。
The conductor layer 4 is incorporated in a cathode ray tube such as a cathode ray tube, functions as an electrode for catching electron beams and thermoelectrons, prevents light emission of the phosphor from leaking backward, and efficiently emits fluorescence to the front. It functions as a reflective surface to make it come out. The end of the conductor layer 4 is connected to the external lead wire 1.
It also has a function of removing electrons that are connected to 0 and accumulated in the conductor layer 4 to the outside.

【0029】実例 まず、ポリエチレンテレフタレートからなる基材フィル
ム2上に、熱可塑性樹脂からなる剥離層3を形成し、そ
の上にポリビニルアルコールからなる水溶性樹脂層6を
グラビア印刷により部分的に形成し(図2(a)参
照)、その上にアルミニウムからなる導電体層4を真空
蒸着法により全面に形成し(図2(b)参照)、つぎ
に、水洗によって水溶性樹脂とともにその上の導電体層
4を除去して導電体層4にガス逃げ用孔40を形成し
(図2(c)参照)、その上にアクリル樹脂からなる接
着層5をグラビア印刷で形成して転写材1を得た(図3
参照)。つぎに、蛍光膜9が部分的に形成されたガラス
基板8上の蛍光膜9が形成されていない部分に、導電体
層4のガス逃げ用孔40が配置されるように転写材1を
重ね合わせ、加熱加圧した後基材フィルム2を剥離し
(図4参照)、つぎにガラス基板8を加熱することによ
って蛍光体以外の有機成分を熱分解ガスとして除去した
(図5参照)。
First, a release layer 3 made of a thermoplastic resin is formed on a base film 2 made of polyethylene terephthalate, and a water-soluble resin layer 6 made of polyvinyl alcohol is partially formed thereon by gravure printing. (See FIG. 2 (a)), and a conductive layer 4 made of aluminum is formed on the entire surface by vacuum evaporation (see FIG. 2 (b)). The body layer 4 is removed to form a gas escape hole 40 in the conductor layer 4 (see FIG. 2C), and an adhesive layer 5 made of an acrylic resin is formed thereon by gravure printing to form the transfer material 1. (Figure 3
reference). Next, the transfer material 1 is stacked on the glass substrate 8 on which the fluorescent film 9 is partially formed, on the portion where the fluorescent film 9 is not formed, so that the gas escape hole 40 of the conductor layer 4 is arranged. After being combined and heated and pressurized, the substrate film 2 was peeled off (see FIG. 4), and then the glass substrate 8 was heated to remove organic components other than the phosphor as pyrolysis gas (see FIG. 5).

【0030】この蛍光膜基板11の端部近くに形成され
た導電体層4に外部リード線10を取り付け、電気を除
去するようにした(図6参照)。
An external lead wire 10 was attached to the conductor layer 4 formed near the end of the fluorescent film substrate 11 to remove electricity (see FIG. 6).

【0031】[0031]

【発明の効果】この発明の製造方法では、蛍光膜のない
部分に形成された導電体層に、印刷法によってガス逃げ
用孔を形成する。
According to the manufacturing method of the present invention, a gas escape hole is formed by a printing method in a conductor layer formed in a portion where no fluorescent film is formed.

【0032】したがって、加熱により発生する有機成分
の熱分解ガスがその孔からスムーズに除去され、導電体
層には火膨れが生じたり、蛍光体とガラス基板との間や
蛍光体と導電体層との間で剥離が生じたりしない。
Accordingly, the pyrolysis gas of the organic component generated by the heating is smoothly removed from the pores, causing blisters to occur in the conductor layer, or between the phosphor and the glass substrate or between the phosphor and the conductor layer. No peeling occurs between them.

【0033】また、蛍光膜上にガス抜け用孔がないので
蛍光膜の輝度が良好である。
Further, since there is no gas escape hole on the fluorescent film, the brightness of the fluorescent film is good.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明によって製造される蛍光膜基板の一例
を示す上面図である。
FIG. 1 is a top view showing an example of a fluorescent film substrate manufactured according to the present invention.

【図2】この発明の実施例の一工程を示す断面図であ
る。
FIG. 2 is a sectional view showing one step of the embodiment of the present invention.

【図3】この発明の実施例の一工程を示す断面図であ
る。
FIG. 3 is a sectional view showing one step of the embodiment of the present invention.

【図4】この発明の実施例の一工程を示す断面図であ
る。
FIG. 4 is a sectional view showing one step of the embodiment of the present invention.

【図5】この発明の実施例の一工程を示す断面図であ
る。
FIG. 5 is a sectional view showing one step of the embodiment of the present invention.

【図6】この発明によって製造される蛍光膜基板の一例
を示す断面図である。
FIG. 6 is a sectional view showing an example of a fluorescent film substrate manufactured according to the present invention.

【図7】この発明によって製造される蛍光膜基板の一例
を示す正面図である。
FIG. 7 is a front view showing an example of a fluorescent film substrate manufactured according to the present invention.

【図8】この発明によって製造される蛍光膜基板の一例
を示す正面図である。
FIG. 8 is a front view showing an example of a fluorescent film substrate manufactured according to the present invention.

【符号の説明】[Explanation of symbols]

1 転写材 2 基材フィルム 3 剥離層 4 導電体層 40 ガス逃げ用孔 5 接着層 6 水溶性樹脂層 7 レジスト樹脂層 8 ガラス基板 9 蛍光膜 10 外部リード線 11 蛍光膜基板 REFERENCE SIGNS LIST 1 transfer material 2 base film 3 release layer 4 conductor layer 40 gas escape hole 5 adhesive layer 6 water-soluble resin layer 7 resist resin layer 8 glass substrate 9 fluorescent film 10 external lead wire 11 fluorescent film substrate

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01J 9/22 Continuation of front page (58) Field surveyed (Int.Cl. 7 , DB name) H01J 9/22

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基材フィルム上に剥離層を形成し、その
上に印刷法により水溶性樹脂層を部分的に形成し、その
上に導電体層を全面に形成し、つぎに、水洗によって水
溶性樹脂とともにその上の導電体層を除去して導電体層
にガス逃げ用孔を形成し、その上に接着層を形成して転
写材を得、つぎに、蛍光膜が部分的に形成されたガラス
基板上に、導電体層のガス逃げ用孔と蛍光膜とが重なら
ないように転写材を重ね合わせ、加熱加圧した後基材フ
ィルムを剥離し、つぎにガラス基板を加熱することによ
って蛍光体以外の有機成分を熱分解されたガスとして除
去することを特徴とする蛍光膜基板の製造方法。
1. A release layer is formed on a base film, a water-soluble resin layer is partially formed thereon by a printing method, and a conductor layer is formed on the entire surface thereof. The conductor layer on top of the water-soluble resin is removed to form a gas escape hole in the conductor layer, an adhesive layer is formed on the hole, and a transfer material is obtained. Then, a fluorescent film is partially formed. The transfer material is superimposed on the glass substrate so that the gas escape hole of the conductor layer does not overlap with the fluorescent film, the base film is peeled off after heating and pressing, and then the glass substrate is heated. And removing an organic component other than the phosphor as a thermally decomposed gas.
JP16225392A 1992-05-27 1992-05-27 Method for manufacturing fluorescent film substrate Expired - Fee Related JP3330637B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16225392A JP3330637B2 (en) 1992-05-27 1992-05-27 Method for manufacturing fluorescent film substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16225392A JP3330637B2 (en) 1992-05-27 1992-05-27 Method for manufacturing fluorescent film substrate

Publications (2)

Publication Number Publication Date
JPH05325786A JPH05325786A (en) 1993-12-10
JP3330637B2 true JP3330637B2 (en) 2002-09-30

Family

ID=15750921

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16225392A Expired - Fee Related JP3330637B2 (en) 1992-05-27 1992-05-27 Method for manufacturing fluorescent film substrate

Country Status (1)

Country Link
JP (1) JP3330637B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2891690B1 (en) 1998-02-04 1999-05-17 松下電子工業株式会社 Lamp and its manufacturing method

Also Published As

Publication number Publication date
JPH05325786A (en) 1993-12-10

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