JP3325942B2 - Electroluminescent phosphor and EL panel using the same - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a relates to EL panel using the Re electroluminescent phosphor States of organic dispersion type.

[0002]

2. Description of the Related Art An organic dispersion type electroluminescent phosphor (hereinafter referred to as EL)
A phosphor) is dispersed in a dielectric material to form a light-emitting layer, electrodes are arranged on both sides of the light-emitting layer, and at least one electrode is formed of a transparent electrode;
Light is emitted by applying an AC voltage between the electrodes. As such an EL phosphor, zinc sulfide (ZnS) is used as a base, and copper, manganese,
What contains chlorine, bromine, iodine, aluminum and the like as a coactivator is generally used.

[0003] Since this type of EL phosphor is strongly affected by a small amount of moisture, if the EL phosphor is excited without exposing it to an environment that is not sufficiently isolated from moisture, the luminance will deteriorate significantly with time.
It has the drawback that it is not practical. Therefore, in an organic dispersion type EL panel using an EL phosphor as described above (hereinafter, referred to as an EL panel), the luminous body layer is usually formed of a water-supplying layer made of a nylon film or the like and an ethylene trifluoride ethylene film or the like. Covered by moisture barrier. However, due to the light absorbing effect of these films, E
There is a problem that the efficiency of L emission is considerably reduced, and there is a problem that the manufacturing process is complicated, and the cost is very disadvantageous.

In order to solve such a problem, for example, it is necessary to drastically modify the EL phosphor itself. However, in the current EL phosphor, the phosphor particles are extremely unstable to moisture. CuS must be deposited, and no effective alternative has been found. Therefore, it has been studied to provide a moisture-proof property by performing a surface treatment on the EL phosphor itself.

For example, the surface of EL phosphor particles is coated with coarse aqueous silica fine particles (see JP-A-63-23987).
Moisture proofing measures have been proposed, such as coating the surface of EL phosphor particles with calcium fluoride, strontium fluoride, magnesium fluoride, zinc fluoride, barium fluoride or the like (see Japanese Patent Application Laid-Open No. 2-173086). However, with these methods, the phosphor surface cannot be completely isolated from moisture, and thus the EL panel from which the water repellent film and the moisture-proof film have been removed has not yet achieved practically sufficient life characteristics. Also, a method of treating an EL phosphor particle with ozone gas to deposit an oxide film on the surface (Japanese Patent Laid-Open No.
However, ozone used in this method is a carcinogenic substance, and has a drawback that it requires a large amount of cost to be applied to the manufacturing process for safety. .

Further, it has been proposed to coat a non-granular film of alumina on a phosphor surface by a chemical vapor deposition method (see Japanese Patent Application Laid-Open No. 2-38482).
The EL phosphor must be exposed to a high temperature of 00 ° C. or more, which has a serious adverse effect on the above-described various characteristics of the EL phosphor, including the emission color tone. Further, the non-granular film made of alumina also has a problem in luminance characteristics that emission luminance of the EL phosphor is greatly reduced.

[0007]

As described above, any of the conventional moisture-proof treatments for EL phosphors do not provide practically sufficient moisture-proof properties, increase the manufacturing cost, or increase the phosphor itself during the manufacturing process. Have various problems, such as deterioration of the LED and adversely affecting the emission luminance of the EL phosphor.
For this reason, when an EL panel is manufactured, practically sufficient life characteristics (moisture proof) can be obtained without providing a water refill film or a moisture-proof film, and adversely affect phosphor characteristics such as emission luminance. There is a strong demand for easy and safe development of a moisture-proof treatment for an EL phosphor without any problem.

SUMMARY OF THE INVENTION The present invention has been made to address such a problem, and has a sufficient moisture-proof property for practical use and an electroluminescent fluorescent material capable of sufficiently exhibiting the luminous luminance inherently possessed by a phosphor. Body and EL device using the same
The purpose is to provide a tunnel .

[0009]

The electroluminescent phosphor of the present invention comprises zinc sulfide as a host, at least one selected from copper and manganese as an activator, and chlorine and bromine as coactivators. , An electroluminescent phosphor containing at least one selected from iodine and aluminum, the surface of which is mainly composed of silicon oxide , and
And coated with a moisture-proof non-granular film containing a silicate containing an alkaline earth metal oxide .

Further, the EL panel of the present invention comprises
Provided with a phosphor layer formed using the electroluminescent phosphor of the invention
It is characterized in that.

The electroluminescent phosphor of the present invention has a non-granular film containing silicon oxide as a main component as a moisture-proof coating on its surface. The constituent material of the moisture-proof non-granular film may be a material containing silicon oxide as a main component, for example, silicon oxide alone or a silicate containing silicon oxide as a main component and an alkaline earth metal oxide as a subcomponent. Examples thereof include a mixture containing a salt. Even a non-granular film composed only of silicon oxide,
Although sufficient moisture-proofing properties can be obtained, by adding a silicate containing an alkaline earth metal oxide as a sub-component, the moisture-proofing effect is further improved, and for example, the thickness of the non-granular film can be reduced. Although the addition ratio of this subcomponent is set to 50% or less, it is preferably set to 40% or less in consideration of a decrease in initial luminance. In addition, the effect of improving the moisture resistance is remarkable from about 10%, so the additive ratio of the auxiliary component is 10% to 40%.
It is preferable to set the degree.

The thickness of the moisture-proof non-granular film is not particularly limited, but if it is too thin, it is difficult to obtain sufficient moisture-proof properties. If it is too thick, it is difficult to apply an excitation electric field to the electroluminescent phosphor. Become . Moisture-proof non-granular film containing silicate containing alkaline earth metal oxide as a sub- component, 0.01μm ~
The thickness is preferably in the range of 2.0 μm.

The electroluminescent phosphor having the moisture-proof non-particulate silicon oxide film of the present invention is manufactured, for example, as follows. First, zinc sulfide is used as a base material, and at least one selected from copper and manganese as an activator and at least one selected from chlorine, bromine, iodine, and aluminum as a co-activator are mixed. To prepare a raw material. Next, after baking this raw material, an appropriate cleaning treatment is performed to obtain an electroluminescent phosphor.

Next, a film of the organometallic compound is formed by adding at least an organometallic compound containing silicon to the electroluminescent phosphor and sufficiently mixing the same. As the organometallic compound containing silicon, ethyl silicate (Si (C
₂ H _{5) 4),} butyl silicate _{(Si (C 3 H 7)} 4) a relatively heat treatment at low temperature such as, preferably readily those oxidized film of silicon is obtained. Silicates containing oxidizing alkaline earth metals as subcomponent, an oxide of an alkaline earth metal may be added into a solution of an organic metal compound containing the silicon. It is preferable that the film formation is performed while applying a slight temperature. After forming a film mainly containing an organometallic compound containing silicon on the electroluminescent phosphor in this manner, by performing a heat treatment at a temperature of 150 ° C. or less, the electroluminescent phosphor is covered with a non-granular film containing silicon oxide as a main component. The obtained electroluminescent phosphor is obtained.

Here, in the present invention, it is important that the temperature during the surface treatment be 150 ° C. or less. Processing temperature
When the temperature exceeds 150 ° C., the emission color tone of the electroluminescent phosphor becomes greenish, and the initial luminance decreases as the temperature increases, so that characteristics inherent to the electroluminescent phosphor cannot be obtained. In other words, it is important to use an organometallic compound capable of forming a non-granular film containing silicon oxide as a main component by heat treatment at a temperature of 150 ° C. or lower.

[0016]

In the electroluminescent phosphor of the present invention, the moisture-proof non-granular film containing silicon oxide as a main component is formed at a surface treatment temperature of 150 ° C. or less by using an organometallic compound containing silicon. Therefore, sufficient moisture-proof properties can be imparted without adversely affecting the phosphor characteristics. The non-granular film containing silicon oxide as a main component is
Since the influence on the light emission luminance is smaller than that of the alumina film, the light emission luminance originally possessed by the phosphor can be sufficiently maintained by forming the phosphor in an appropriate range. Furthermore, since the non-particulate film contains silicate containing an oxidizing alkaline earth metal as a subcomponent, and further improves the moisture resistance,
The thickness of the non-granular film can be further reduced. As a result, it is possible to improve the emission luminance and the like of the electroluminescent phosphor while suppressing the deterioration with time of the emission characteristics.

[0017]

Next, an embodiment of the present invention will be described.

Example 1 ZnS, which is a phosphor matrix, was mixed with CuSO as a raw material for an activator.
₄ and NaBr and KBr as raw materials for the co-activator were added and mixed in a wet manner, and after drying this slurry, it was baked in an H ₂ S atmosphere at a temperature of 900 ° C. for 120 minutes to obtain ZnS: Cu, A Br-type EL phosphor was obtained. 20 kg of this ZnS: Cu, Br type EL phosphor
Then, 5 kg of ethanol was added thereto for washing, the supernatant was removed, and the mixture was filtered to obtain a phosphor filter cake. The filter cake was transferred to a commercially available rotary conical dryer and kept at 80 ° C and 3 ° C.
In a rotary reaction tank maintained at a low pressure of mmHg, the substrate was rotated at a speed of 30 rpm for 120 minutes to sufficiently dry.

Next, 10 kg of an 8% ethanol dispersion of ethyl silicate was stirred, and this was stirred at a flow rate of about 1 kg / min while rotating through a leak nozzle of the above-mentioned rotary reaction tank using a resin pipe of 3 mmφ. For 1 minute into the reactor.
Rotate for 9 minutes after injection, and add this injection and rotation
Repeated 10 times. After spraying all the dispersion, 30 more
Rotated for minutes. Thereafter, the phosphor was taken out of the rotating reaction tank and baked at 140 ° C. for 8 hours. Thus, an EL phosphor having a surface on which a non-granular silicon oxide film having a thickness of about 0.40 μm was formed was obtained.

Using the thus obtained EL phosphor having a non-granular silicon oxide film, an EL panel was produced without providing a water-repellent film and a moisture-proof film. %), An AC voltage of 100 V and 400 Hz was applied, and the initial luminance and the luminance half-life at this time were measured. Note that the life of an EL panel is generally indicated by the time until the initial luminance is reduced to half.

The results are shown in Table 1 together with the results of an EL panel using a normal EL phosphor (without a non-granular silicon oxide film). As a comparative example, similarly to a normal EL panel, one covered with a water-retaining film and a moisture-proof film (Comparative Example 1) and one without a water-retaining film and a moisture-proof film (Comparative Example 2) were shown. As is clear from Table 1, both the initial luminance and the luminance half-life are equal to or higher than that of a normal EL panel having a water replenishing and moisture-proof film,
It can be seen that the moisture-proof non-particulate silicon oxide film has a great effect.

Further, the EL panel according to the above embodiment, the one provided with a water replenishing film and a moisture-proof film (Reference Example), and the EL panels of Comparative Examples 1 and 2 were used. It was measured under the conditions.
The result is shown in FIG. FIG. 1 shows a change in relative luminance with time when the initial luminance is set to 100. As is apparent from FIG. 1, the EL panel manufactured using the EL phosphor having the non-granular silicon oxide film is different from the ordinary EL panel having the water refilling film and the moisture-proof film regardless of the presence or absence of the water-repellent film and the moisture-proof film. A similar change over time in luminance is shown, indicating that the EL phosphor itself has practical moisture-proof properties.

Example 2 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 1 was treated in the same manner as in Example 1 with a 2% ethanol dispersion of ethyl silicate. Thus about 0.10 on the surface
An EL phosphor having a non-granular silicon oxide film of μm was obtained. Table 1 shows the thickness of the non-particulate silicon oxide film of the EL phosphor, and the results of measurement of the initial luminance and luminance half-life by the EL panel (the measurement conditions are the same as in Example 1). Both the luminance and the luminance half-life are the same as those of a normal EL panel having a water replenishment and moisture-proof film, and it can be seen that the moisture-proof effect of the non-granular silicon oxide film is large.

Example 3 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 1 was treated in the same manner as in Example 1 with a 4% ethanol dispersion of ethylsilicate. Thus about 0.25 on the surface
An EL phosphor having a non-granular silicon oxide film of μm was obtained. Table 1 shows the thickness of the non-particulate silicon oxide film of the EL phosphor, and the results of measurement of the initial luminance and luminance half-life by the EL panel (the measurement conditions are the same as in Example 1). Both the luminance and the luminance half-life are the same as those of a normal EL panel having a water replenishment and moisture-proof film, and it can be seen that the moisture-proof effect of the non-granular silicon oxide film is large.

Example 4 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 1 was treated in the same manner as in Example 1 with a 10% ethanol dispersion of ethyl silicate. About 0.75 on the surface
An EL phosphor having a non-granular silicon oxide film of μm was obtained. Table 1 shows the thickness of the non-particulate silicon oxide film of the EL phosphor, and the results of measurement of the initial luminance and luminance half-life by the EL panel (the measurement conditions are the same as in Example 1). Both the luminance and the luminance half-life are the same as those of a normal EL panel having a water replenishment and moisture-proof film, and it can be seen that the moisture-proof effect of the non-granular silicon oxide film is large.

Example 5 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 1 was used in the same manner as in Example 1 using 15 kg of a 10% ethanol dispersion of ethyl silicate. 15 injections, rotations
Repeated and processed. Approximately 1.25 μm on the surface
An EL phosphor having a non-particulate silicon oxide film was obtained. This E
Table 1 shows the thickness of the non-particulate silicon oxide film of the L phosphor, and the measurement results of the initial luminance and the luminance half-life by the EL panel (the measurement conditions are the same as in Example 1). Both luminance and luminance half-life are the same as ordinary EL panels with water replenishment and moisture-proof films,
It can be seen that the moisture-proof effect of the non-granular silicon oxide film is great.

Example 6 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 1 was used in the same manner as in Example 1 by using 15 kg of a 10% ethanol dispersion of ethyl silicate. Injection and rotation were repeated 27 times in total for processing. Thus, an EL phosphor having a non-granular silicon oxide film of about 2.0 μm on the surface was obtained. This EL
Table 1 shows the thickness of the non-particulate silicon oxide film of the phosphor and the measurement results of the initial luminance and the luminance half-life by the EL panel (the measurement conditions are the same as in Example 1). Both luminance and luminance half-life are the same as ordinary EL panels with water replenishment and moisture-proof films,
It can be seen that the moisture-proof effect of the non-granular silicon oxide film is great.

Example 7 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 1 was treated in the same manner as in Example 1 with a 1% ethanol dispersion of ethyl silicate. Thus about 0.05
An EL phosphor having a non-granular silicon oxide film of μm was obtained. Table 1 shows the thickness of the non-particulate silicon oxide film of the EL phosphor, and the results of measurement of the initial luminance and luminance half-life by the EL panel (the measurement conditions are the same as in Example 1). It can be seen that the luminance half-life is inferior to that of a normal EL panel having a water replenishment and moisture-proof film, but the deterioration of luminance over time is suppressed as compared with an EL panel having a similar configuration.

Example 8 A ZnS: Cu, Br type EL phosphor obtained by the same method as in Example 1 was used in the same manner as in Example 1 by using 15 kg of a 10% ethanol dispersion of ethylsilicate. 32 injections, rotations
Repeated and processed. About 2.20μm on the surface
An EL phosphor having a non-particulate silicon oxide film was obtained. Table 1 shows the thickness of the non-particulate silicon oxide film of the EL phosphor, and the results of measurement of the initial luminance and luminance half-life by the EL panel (the measurement conditions are the same as in Example 1). Although the initial luminance is greatly reduced and has some practical problems, the luminance half-life shows a sufficient value.

[0030]

[Table 1] Example 9 A filter cake of a ZnS: Cu, Br type EL phosphor prepared in the same manner as in Example 1 was dried using a rotary conical dryer in the same manner as in Example 1. Next, 20 g of calcium oxide was added to 10 kg of a 1% ethanol dispersion of ethyl silicate,
After stirring for 2 hours, using a resin pipe of 3 mmφ, while rotating through the leak nozzle of the rotating reaction tank,
It was sprayed at a flow rate of about 1 kg / min into a rotary reaction tank containing a ZnS: Cu, Br type EL phosphor for 1 minute. After spraying, it was rotated for 9 minutes, and this spraying and rotation was repeated 10 times in total. After spraying all dispersions, they were rotated for an additional 30 minutes. After this, take out the phosphor from the rotating reaction tank,
Was baked for 8 hours. Thus, a non-granular film (non-granular silicon oxide film containing silicate: added amount of calcium oxide = 20%) containing silicon oxide as a main component and calcium oxide silicate as an auxiliary component on the surface has a thickness of about 0.05 μm. An EL phosphor having a thickness was obtained.

An EL having a non-granular film thus obtained
Using a phosphor, an EL panel was prepared without providing a water refill film and a moisture-proof film, as in Example 1.
The initial luminance and the luminance half-life were measured under the same conditions as in Example 1.

The results were obtained by comparing an EL panel using an EL phosphor having a non-granular silicon oxide film of the same thickness (Example 7) and a normal EL panel covered with a water replenishing film and a moisture-proof film (Comparative Example 1). ) Are shown in Table 2. As is clear from Table 2, the thickness of the moisture-proof non-granular film was
Despite thinning to 0.05μm, both the initial luminance and luminance half-life are normal EL with water replenishment and moisture-proof film
It is understood that the non-particulate silicon oxide film containing silicate has a great effect, which is equivalent to that of the panel.

Example 10 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 9 was treated with a treatment liquid obtained by adding 10 g of calcium oxide to a 1% ethanol dispersion of ethylsilicate and mixing. Treated in the same manner as in Example 9. Thus, the non-granular silicon oxide film containing silicate on the surface (the amount of added calcium oxide = 10%) is about 0.1%.
An EL phosphor formed with a thickness of 05 μm was obtained. This EL
Table 2 shows the addition amount of calcium oxide in the non-granular silicon oxide film of the phosphor and the measurement results of the initial luminance and the luminance half-life by the EL panel (the measurement conditions are the same as in Example 9). Although the luminance half-life is slightly inferior to that of a normal EL panel having a water-retaining and moisture-proof film, the luminance degradation is suppressed more than that of an EL panel using an EL phosphor having a non-granular film made of silicon oxide having the same thickness. It can be seen that the non-particulate silicon oxide film containing silicate of this example has a good moisture-proof effect.

Example 11 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 9 was treated with a treatment liquid obtained by adding and mixing 15 g of calcium oxide to a 1% ethanol dispersion of ethyl silicate. Treated in the same manner as in Example 9. Thus, the non-granular silicon oxide film containing silicate on the surface (addition amount of calcium oxide = 15%) is about 0.5%.
An EL phosphor formed with a thickness of 05 μm was obtained. This EL
Table 2 shows the amount of calcium oxide added to the non-particulate silicon oxide film of the phosphor and the results of measurement of the initial luminance and luminance half-life by the EL panel (measurement conditions are the same as in Example 9). It can be seen that the non-particulate silicon oxide film containing silicate has a large moisture-proof effect, both in luminance and luminance half-life, equivalent to a normal EL panel having a water-rehydration and moisture-proof film.

Example 12 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 9 was treated with a treatment liquid obtained by adding 30 g of calcium oxide to a 1% ethanol dispersion of ethyl silicate and mixing. Treated in the same manner as in Example 9. Thus, the non-granular silicon oxide film containing silicate on the surface (addition amount of calcium oxide = 30%) is about 0.1%.
An EL phosphor formed with a thickness of 05 μm was obtained. This EL
Table 2 shows the addition amount of calcium oxide in the non-granular silicon oxide film of the phosphor and the measurement results of the initial luminance and the luminance half-life by the EL panel (the measurement conditions are the same as in Example 9). It can be seen that the non-particulate silicon oxide film containing silicate has a large moisture-proofing effect, with luminance and luminance half-life both equal to or greater than those of a normal EL panel having a water replenishment and moisture-proof film.

Example 13 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 9 was treated with a treatment liquid obtained by adding 40 g of calcium oxide to a 1% ethanol dispersion of ethyl silicate and mixing. Treated in the same manner as in Example 9. Thus, the non-granular silicon oxide film containing silicate on the surface (addition amount of calcium oxide = 40%) is about 0.5%.
An EL phosphor formed with a thickness of 05 μm was obtained. This EL
Table 2 shows the addition amount of calcium oxide in the non-granular silicon oxide film of the phosphor and the measurement results of the initial luminance and the luminance half-life by the EL panel (the measurement conditions are the same as in Example 9). Although the initial luminance is slightly inferior to a normal EL panel having a water replenishment and moisture-proof film, the luminance half-life is longer,
It can be seen that the non-granular silicon oxide film containing silicate has a sufficient moisture-proof effect.

Example 14 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 9 was treated with a treatment liquid obtained by adding 5 g of calcium oxide to a 1% ethanol dispersion of ethylsilicate and mixing. Treated in the same manner as in Example 9. Thus, the non-granular silicon oxide film containing silicate on the surface (addition amount of calcium oxide = 5%) is about 0.05%.
An EL phosphor formed with a thickness of μm was obtained. Table 2 shows the amount of calcium oxide added to the non-particulate silicon oxide film of the EL phosphor and the results of measurement of the initial luminance and luminance half-life by the EL panel (the measurement conditions are the same as in Example 9). Although the luminance half-life is inferior to that of a normal EL panel having a water replenishment and moisture-proof film, the luminance deterioration is suppressed more than that of an EL panel using an EL phosphor having a non-granular film made of silicon oxide having the same thickness. I understand.

Example 15 A ZnS: Cu, Br type EL phosphor obtained in the same manner as in Example 9 was treated with a treatment liquid obtained by adding 50 g of calcium oxide to a 1% ethanol dispersion of ethyl silicate and mixing. Treated in the same manner as in Example 9. Thus, the non-granular silicon oxide film containing silicate on the surface (addition amount of calcium oxide = 50%) is about 0.
An EL phosphor formed with a thickness of 05 μm was obtained. This EL
Table 2 shows the amount of calcium oxide added to the non-particulate silicon oxide film of the phosphor and the results of measurement of the initial luminance and luminance half-life by the EL panel (measurement conditions are the same as in Example 9). Although the initial luminance is inferior to that of a normal EL panel having a water-retaining and moisture-proof film and has some practical problems, the luminance half-life shows a sufficient value.

[0039]

[Table 2]

[0040]

As described above, according to the present invention, a moisture-proof non-granular film containing silicon oxide excellent in moisture-proof properties can be formed safely and easily without adversely affecting the characteristics of the phosphor. Therefore, it is possible to provide an electroluminescent phosphor which has practically sufficient moisture-proof properties and can sufficiently exhibit characteristics inherent to the phosphor. Therefore, it is possible to manufacture an inexpensive and simple EL panel that does not include a water-retaining film or a moisture-proof film in the structure, which greatly contributes to practical use.

[Brief description of the drawings]

FIG. 1 shows an EL panel having a water-repellent and moisture-proof film and an EL panel without a water-repellent and moisture-proof film produced using an EL phosphor having a non-granular silicon oxide film according to the present invention and a conventional EL phosphor. FIG. 6 is a diagram illustrating a change over time in relative luminance.

──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Mitsuhiro Oikawa 72 Horikawa-cho, Saisaki-ku, Kawasaki-shi, Kanagawa Prefecture Inside the Toshiba Horikawa-cho Plant (56) References JP-A-1-2848453 (JP, A) JP-A-2 −242880 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) C09K 11/08 C09K 11/56

Claims (4)

(57) [Claims] Claims: 1. A zinc sulfide as a base material, comprising at least one selected from copper and manganese as an activator and at least one selected from chlorine, bromine, iodine and aluminum as a coactivator. An electroluminescent phosphor containing Si, the surface of which is mainly composed of silicon oxide , and
Contains silicates containing alkaline earth oxides as components
An electroluminescent phosphor, which is coated with a moisture-proof non-granular film. 2. The electroluminescent phosphor according to claim 1, wherein the moisture-proof non-particulate film contains the subcomponent in a proportion of 50% or less.
An electroluminescent phosphor, comprising: 3. An electroluminescent phosphor according to claim 1, wherein
Thus, the moisture-proof non-granular film contains the subcomponent in a ratio of 10 to 40%.
An electroluminescent phosphor, comprising: 4. An EL panel comprising a light-emitting layer formed using the electroluminescent phosphor according to claim 1. Description: