JP3253429B2 - Electron beam equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam apparatus provided with an electron gun and electron beam guide means for guiding an electron beam toward a sample.

[0002]

2. Description of the Related Art In the semiconductor industry, an electron beam test is carried out to detect the state of a test sample by irradiating the test sample with an electron beam and detecting secondary electrons and reflected electrons reflected from the test sample. ing. The electron beam is generated by an electron gun. It is necessary to reduce the probe diameter of the electron beam to a small diameter in order to inspect minute parts of the sample, and the electron beam generated by the electron gun is guided to the sample through electron beam guide means such as a condenser lens and an objective lens. It is supposed to be.

In an electron beam test of a semiconductor, it is necessary to use an electron beam having a low acceleration voltage and a large current in order to suppress damage to a sample and improve an inspection speed. As an electron gun that satisfies such demands, a cold cathode field emission electron gun has been put to practical use. However, such electron guns need to be used at vacuum levels on the order of 10 ^-9 Torr or better.

Conventionally, a case of an electron gun, an outer cylinder accommodating an electron beam guiding means, and a sealed container accommodating a sample holder are separately formed and exposed to the atmosphere. Therefore, the case of the electron gun was connected to the outer cylinder of the electron beam guide means via a gasket, and this outer cylinder was connected to the sealed container of the sample holder via the gasket. The electron gun communicates with the electron beam guide means through a small orifice through which the electron beam passes, and communicates with the electron beam guide means through a hole through which the electron beam can pass.

In order to bring the electron gun to a vacuum level of about 10 ^-9 Torr, first, the inside of the outer cylinder of the electron beam guiding means is vacuum-sucked to about 10 ^-7 to 10 ^-8 Torr by a vacuum pump, and the orifice is used. The inside of the case of the communicating electron gun is set to the same vacuum level. However, since the diameter of the orifice is as small as several hundred μm to several tens μm, it takes a considerable time for the inside of the case of the electron gun to reach the same vacuum level as the inside of the outer cylinder of the electron beam guiding means.
Next, the inside of the case of the electron gun is evacuated to about 10 ^-9 to 10 ^-10 Torr by an ion pump arranged inside the case of the electron gun. Therefore, it is difficult to reach a high vacuum inside the case of the electron gun in a short time.

Japanese Utility Model Application Laid-Open No. 63-22062 proposes that an annular passage is formed between the electron beam guide means and its outer cylinder and used as a duct for vacuum suction. However, since the diameter of the orifice is very small, it still takes a considerable time for the inside of the case of the electron gun to reach the same vacuum level as the inside of the outer cylinder of the electron beam guiding means.

[0007]

As described above, conventionally, there has been a problem that it takes time to bring the inside of the case of the electron gun to a high vacuum level. Further, in the case where the case of the electron gun is connected to the outer cylinder of the electron beam guide means via a gasket, and this outer cylinder is connected to the sealed container of the sample holder via the gasket, these parts are exposed to the atmosphere. If exposed, there is a problem that there is a leak from a connection portion of these components, and the vacuum level is reduced. Further, the electron gun, the electron beam guiding means, and the sample holder must be aligned in a straight line. In the case of the above structure, each time the sample is exchanged, the sealed container of the sample holder is moved to the electron beam guiding means. Had to be removed from the outer cylinder. Then, when introducing a new sample, it was necessary to perform vacuum suction again.

[0008] An object of the present invention is to provide an electron beam apparatus capable of easily exchanging a sample. Another object of the present invention is to provide an electron beam apparatus which can be easily assembled and can shorten the vacuum suction time of the electron gun.

[0009]

SUMMARY OF THE INVENTION An electron beam apparatus according to the present invention comprises a sealed housing 10 having vacuum suction means 12.
An electron generating means 14; an electron beam guiding means 13 for guiding an electron beam generated by the electron generating means toward a sample; an outer cylinder 22 accommodating the electron generating means and the electron beam guiding means; It is characterized by comprising movable support means 24 for movably supporting the outer cylinder in the housing, and a sample holder 26 arranged in the housing. This
And the movable support means in two orthogonal directions.
A movable XY stage 24;
A stage 24 is attached to the ceiling wall of the housing,
And the movable support means is further mounted on the XY stage.
The stay 36 attached and the outer cylinder fixed to the stay
And an outer cylinder holder 38 for holding the sample holder.
It is attached to the bottom wall of the housing. further,
In addition to the above features, the outer cylinder 22 is connected to the electron generating means 1.
First cylindrical portion 22 that houses vacuum chamber 4 and forms vacuum chamber 42
a containing the electron beam guiding means 13 and
A first orifice communicating with the first tubular portion through an orifice 44a;
And a vacuum level in the vacuum chamber.
Is provided. And in the above configuration
In this case, the orifice 44a is less than 10 ^-2 l / sec.
It is characterized by having a conductance C. Or
In the above configuration, the first cylindrical portion 22a includes
A hole 63 capable of opening an orifice;
A sealing member 65 capable of closing the fist 44a;
A sealing means 62 provided with
A first position in which a hole is aligned with the orifice;
Moveable to and from a second position where the material seals the orifice
It is characterized by being able to. Alternatively, the above configuration
, The first cylindrical portion 22a and the second cylindrical portion
And 22b are hermetically connected via a seal member.
The other end of the second cylindrical portion is sealed by the sealing means 73.
It is characterized in that it is possible.

[0010]

In the above construction, since the electron generating means, the electron beam guiding means, and the sample holder are all disposed in the sealed housing, there is no problem of leakage in the outer cylinder, and the electron beam guiding means and The inside of the electron generating means can be more reliably maintained at a high vacuum level, the structure of the outer cylinder is simplified, and the assembling work is also simplified. Further, since the outer cylinder accommodating the electron generating means and the electron beam guiding means is movably supported by the movable supporting means, after the sample is mounted on the sample holder in the housing, the electron generating means and the electron beam guiding means are provided. And the sample can be aligned, and the sample can be easily exchanged.

A sealing means may be provided at a desired position of the outer cylinder accommodating the electron generating means and the electron beam guiding means, preferably outside the orifice of the electron generating means. The sealing means is actuated by the movable support means for supporting the outer cylinder so as to close the orifice of the electron generating means before the exchange of the sample and to open the orifice of the electron generating means after the exchange of the sample. Then, even if the sealed housing is opened when exchanging the sample, at least the inside of the electron generating means is maintained at the previous high vacuum level.
Therefore, it is possible to save the vacuum suction of the inside of the electron generating means to a high vacuum level after the exchange of the sample.

[0012]

1 to 6 show an electron beam apparatus according to a first embodiment of the present invention. Referring to FIG. 1, the electron beam device includes a sealed housing 10. The sealed housing 10 has a ceiling wall 10a, side walls 10b, 10c, and a bottom wall 10d. A turbo pump 12 is mounted on the side wall 10b of the sealed housing 10, and the inside of the sealed housing 10 can be evacuated. The turbo pump 12 is connected to a rotary pump (not shown) outside the sealed housing 10.

Inside the sealed housing 10, an electron gun 1 is provided.
4. The electron beam guiding means 13 is provided. The electron beam guiding means 13 includes a first condenser lens 16, a deflector 18, and a second condenser lens (objective lens) 20.
Consists of The electron gun 14 and the electron beam guiding means 13
It is accommodated in the outer cylinder 22.

An XY stage 24 movable in two orthogonal directions is mounted on the ceiling wall 10a of the sealed housing 10. Also, a sample holder 26 is attached to the bottom wall 10d of the sealed housing 10. For this reason, the bottom wall 10
A portion 10e of d is detachable from other portions of the bottom wall 10d. The sample holder 26 is capable of holding a sample S made of a semiconductor, and a part 1 of the bottom wall 10d.
At 0e, a lead wire 28 for connecting a lead of the sample S held by the sample holder 26 to the outside is attached.

Referring to FIGS. 1 to 3, the XY stage 24 includes an X stage plate 30 and a Y stage plate 32, and the X stage plate 30
The Y stage plate 32 is movable along the X stage guide 30a mounted on the X stage plate 30. The Y stage plate 32 is movable along the X stage guide 30a mounted on the X stage plate 30a. X stage actuator 30
b is mounted on the X stage plate 30 by a shaft-shaped mounting member 30c, and the Y stage actuator 32b is mounted on the Y stage plate 32 by a shaft-shaped mounting member 32c. The X and Y stage actuators 30b and 32b are linear motors, and the respective secondary conductors 30d and 32d are
a and attached to the X stage plate 30.

A support plate 34 is attached to the bottom surface of the Y stage plate 32, and a stay 36 is attached to the support plate 34 almost vertically. Two arm-shaped outer cylinder holders 38 are fixed to the stay 36 and extend from the stay 36 in the horizontal direction, and support the outer cylinder 22 containing the electron gun 14 and the electron beam guide 13. In the embodiment, the outer cylinder 2
2 is fixed to the outer cylinder holder 38 by screwing.

As shown in FIG. 1, the outer cylinder 22 comprises a first cylinder part 22a for accommodating the electron gun 14 and a second cylinder part 22b for accommodating the electron beam guiding means 13.
FIG. 4 shows the electron gun 14 and the first cylindrical portion 22a.
FIG. 4 is a diagram showing the electron beam guide means 13 and the second cylindrical portion 22b in detail.

As shown in FIG. 4, the electron gun 14 comprises a needle-like cathode 14a and a plate-like anode 14c having a hole 14b.
4c is located close to the hole 14b. Such an electron gun 14 is known as a cold cathode field emission electron gun.
Further, a second flat anode 14d is provided. Second
Of the first anode 14c.
It has a hole (14b) similar to 4b.

The first cylindrical portion 22a has a partition wall 39 forming the bottom of the cup, and a cover 40 is attached to the upper end of the first cylindrical portion 22a. Therefore, a sealed vacuum chamber 42 is formed inside the first cylindrical portion 22a. A sublimation pump 43 made of a titanium (Ti) filament is arranged in the vacuum chamber 42. The titanium sublimation pump 43 has a property of catching air when energized, and can increase the vacuum level in the vacuum chamber 42. Needle-shaped cathode 14
a, the first and second anodes 14 c and 14 d, and the electrode of the sublimation pump 43 are attached to the cover 40.

As shown in FIG. 1, these electrodes are connected to a terminal plate 45a hermetically mounted on the outer cylinder 22b. The other terminal plates 45b and 45c are hermetically attached to the outer cylinder 22b, and the XY stage 24
The X, Y stage actuators 30b, 32b are connected to a terminal plate 45b, and the first and second condenser lenses 16, 20 and the deflector 18 are connected to a terminal plate 45c. These terminal plates 45a, 45b, 45c are connected to a control device (not shown) by connectors.

As shown in FIG. 4, the partition wall 39 has a hole 39a, and an orifice plate 44 is attached to the partition wall 39 so as to cover the hole 39a. The orifice plate 44 has an orifice a, the diameter of which is small enough to be expressed in microns, and whose conductance C is preferably less than 10 ^-2 l / sec. It is 8 × 10 ⁻³ l / sec. Vacuum chamber 42
Is equal to or greater than 1000 × Cl, the pressure difference between the inside and the outside of the vacuum chamber 42 can be reduced to about three.

As shown in FIGS. 4 and 6, the first cylindrical portion 22a has an internal thread 22p and the second cylindrical portion 22b
Has an external thread 22q, and the first cylindrical portion 22a has an internal thread 2q.
2p and the external screw 22q are screwed into the second cylindrical portion 22b.
Linked to The first condenser lens 16 is fixed to the lower side of the orifice plate 44 of the first cylindrical portion 22a, and when the first cylindrical portion 22a is connected to the second cylindrical portion 22b, the second cylindrical portion 22a is closed. 22b.

As shown in FIG. 6, the deflector 18 and the second condenser lens 20 are disposed inside the second cylindrical portion 22b. First and second condenser lenses 16,
20 can use an electromagnetic lens using a coil or an electrostatic lens using a cylindrical electrode. It is well known that these electronic lenses can focus an electron beam as if they were optical lenses. FIG. 6 shows the second condenser lens 2.
Reference numeral 0 denotes an example in which an electrostatic lens is formed by stacking three cylindrical electrodes 20a via an insulating plate 20b. An electrode 20c extends through the second tubular portion 22b.

The deflector 18 comprises an octpole deflector of the type divided into eight, as can be seen from the sectional view of FIG. The deflector 18 is connected to the second cylindrical portion 22b by a screw 46.
Fixed to A sleeve 48 is disposed around the deflector 18 between the flange of the deflector 18 and the second condenser lens 20, and the second condenser lens 20 is
0 presses and holds toward the sleeve 48. The fixing plate 50 is fixed to the second cylindrical portion 22b with screws or the like.

First condenser lens 16, deflector 18
And the second condenser lens 20 has a hole in the center,
The electron beam generated by the electron gun 14 can reach the sample S on the sample holder 26 through these holes. First
The condenser lens 16 narrows down the electron beam as if the electron beam generated by the electron gun 14 is focused at the position of the deflector 18, and the second condenser lens 20 focuses the electron beam at the position of the sample S. Squeeze the electron beam as if. The deflector 18 scans the electron beam impinging on the sample S in the XY directions. The XY stage 24 is used to adjust the initial position between the electron gun 14 and the electron beam guide means 13 and the sample S on the sample holder 26.

A detector 52 is mounted on the bottom surface of the fixed plate 50. The detector 52 detects that the electron beam is
6 for detecting secondary electrons and reflected electrons generated from the sample S by irradiating the sample S thereon. Detector 5
2 can use a multi-channel plate (MCP) semiconductor or can use a combination of a scintillator and a photomultiplier.

In the above configuration, after the sample S is mounted, first, the housing 10 is
Is evacuated to about 10 ^-6 to 10 ^-7 Torr. Then, the inside of the outer cylinder 22 of the electron beam guide means 13 and the inside of the vacuum chamber 42 accommodating the electron gun 14 have the same vacuum level. The outer cylinder 22 may be provided with a suitable hole 22r in order to make it easier for the vacuum to spread inside the outer cylinder 22 (that is, in the present invention, the outer cylinder may not have a sealed structure). However, since the vacuum chamber 42 is evacuated from the inside of the outer cylinder 22 through the orifice 44a, it takes time to reach such a vacuum level. When the vacuum chamber 42 reaches a certain vacuum level, the sublimation pump 43 is energized to increase the vacuum level in the vacuum chamber 42 to a vacuum level of about 10 ^-9 to 10 ^-10 Torr.
The orifice 44a maintains a pressure difference between the vacuum chamber 42 and the inside of the outer cylinder 22. The electron gun 14 operates at such a high vacuum level.

Thus, in the present invention, the electron gun 14
And the electron beam guide means 13 and the sample holder 26
Since all of them are arranged in the sealed housing 10, there is no problem of leakage in the outer cylinder 22, the structure of the outer cylinder 22 is simplified, and the inside of the electron beam guide means 13 and the electron gun 14 is more reliably maintained at a high vacuum level. Can be Further, since the outer cylinder 22 accommodating the electron gun 14 and the electron beam guide means 13 is movably supported by the XY stage 24 which is a movable support means, the sample S is mounted on the sample holder 26 in the housing 10. After the electron gun 14
In addition, the alignment of the electron beam guide means 13 and the sample S can be performed, and the sample S can be easily exchanged. That is, since each component of the electron beam guide means 13 is made with a minute precision of a micron unit, it is assumed that the sample S is mounted on the sample holder 26 as accurately as possible, and that the sample holder 26 is mounted on the housing 10 as accurately as possible. Also, it is inevitable that a minute error occurs between the sample S and each component of the electron beam guiding means 13, and the XY stage 24 can correct such an error.

FIGS. 7 to 9 show a second embodiment of the present invention. FIG. 7 shows an outer cylinder 22 corresponding to FIG. 4 of the first embodiment.
Shows the first cylindrical portion 22a of the first embodiment.
Portions other than the cylindrical portion 22a are substantially the same as those of the first embodiment shown in FIG. However, since the first cylindrical portion 22a does not correspond to the inner screw 22p in FIG. 4, the second cylindrical portion 22b does not have the outer screw 22q, and the first cylindrical portion 22a is the second cylindrical portion. 22b is connected by any suitable means other than screwing.

As shown in FIG. 7, the electron gun 14 includes a needle-like cathode 14a, a first anode 14c, and a second anode 14c.
14d. The first cylindrical portion 22a forms a sealed vacuum chamber 42 together with the partition wall 39 and the cover 40.
In FIG. 7, a cage 60 is provided inside the vacuum chamber 42, and the cage 60 has a communication port 60a. Cage 60
The electron gun 14 is arranged inside the. A sublimation pump 43 made of a filament of titanium (Ti) is arranged outside the cage 60 in the vacuum chamber 42.

The partition wall 39 has a hole 39a, and the orifice plate 44 covers the hole 39a and is mounted on the upper surface of the partition wall 39. The orifice plate 44 has an orifice 44a
Having. A sealing rod 62 is attached to the lower surface of the partition wall 39. As shown in FIGS. 8 and 9, the seal rod 62 includes a central flat plate part 62 a and support rod parts 62 b on both sides.
In the flat plate portion 62a, a through hole 63 and an annular seal holding groove 64 are formed.

As shown in FIG. 7, the seal ring 65
Is inserted into the seal holding groove 64. The through hole 63 of the seal rod 62 can open the hole 39a (that is, the orifice 44a) of the partition wall 39. Seal ring 65
Can seal the hole 39a (that is, the orifice 44a) of the partition wall 39 when the sealing rod 62 moves to the left in FIG.

The support rod portion 62b of the seal rod 62 is movably inserted into a hole diametrically provided in the first cylindrical portion 22a, while the housing 10 is connected to the end of the support rod portion 62b of the seal rod 62 by a predetermined distance. Engaging portion 10x that abuts at the position of
10y, and the sealing rod 62 has these engaging portions 10x,
Two positions can be taken in contact with 10y. In FIG. 7, the through hole 63 of the seal rod 62 is the hole 39 of the partition wall 39.
a (i.e., the orifice 44a) is open.

From this state, the first cylindrical portion 22a is
When the support rod portion 62b is moved rightward in FIG. 7 by the Y stage 24, the right end of the support rod portion 62b comes into contact with the right engagement portion 10y,
When the first cylindrical portion 22a is further moved, the sealing rod 6
2 moves leftward with respect to the first cylindrical portion 22a, and the seal ring 65 closes the hole 39a (that is, the orifice 44a) of the partition wall 39.

Conversely, when the first cylindrical portion 22a is moved leftward in FIG. 7 by the XY stage 24 from the position where the seal ring 65 closes the hole 39a (ie, the orifice 44a) of the partition wall 39, The left end of the support rod portion 62b abuts on the left engaging portion 10y, and the first cylindrical portion 22a
Is further moved, the sealing rod 62 is moved to the first cylindrical portion 2.
2a to the right with respect to the seal rod 62a.
The through hole 63 opens the hole 39a (that is, the orifice 44a) of the partition wall 39.

As described above, when the housing 10 is opened for exchanging the sample S or at the end of the operation, the seal ring 65 is set in a state of closing the hole 39a (that is, the orifice 44a) of the partition wall 39. . Thus, the vacuum chamber 42 containing the electron gun 14 is maintained at a high vacuum level. Therefore, next, the electron gun 1
When using 4, there is no need to perform vacuum suction over a long time.

FIGS. 10 to 12 show a third embodiment of the present invention. This embodiment shows a lower portion of the second cylinder portion 22b of the outer cylinder 22 corresponding to FIG. 7 of the second embodiment, and in this case, the outer cylinder 22 has a totally sealed structure. As shown in FIG. 10, a first seal plate 71 is attached to the lower end of the second cylindrical portion 22b.
The first seal plate 71 has a hole for an electron beam traveling toward the sample S, and the surface around the hole is a flat surface. A guide groove 71a is provided on a side surface of the first seal plate 71.

As shown in FIG.
A second seal plate 72 is attached to the bottom of the second seal plate 72, and a guide groove 72a is provided on the surface of the second seal plate 72. A third seal plate 73 having a guide 73a engaged with the guide groove 72a is engaged with the second seal plate 72. The third seal plate 73 has a guide 73b extending in a direction perpendicular to the guide 73a on the upper surface side.
b can be engaged with the guide groove 71a of the first seal plate 71. Further, the third seal plate 73 has a seal ring 74 mounted on a surface slightly recessed from the guide 73b.

When the electron beam device is used, as shown in FIG. 10, the first seal plate 71 is
3 is opened from the second cylindrical portion 22.
b guides the electron beam toward the sample S. The housing 10 is used for exchanging the sample S or at the end of the work.
Is opened, the second cylindrical portion 22b is moved by the XY stage 24 and the guide groove 7 of the first seal plate 71 is opened.
1a is engaged with the guide 73b of the third seal plate 73,
The first seal plate 71 is brought into close contact with the third seal plate 73. As a result, the seal ring 74 is
One of the holes is closed, thus indirectly closing the orifice 44a. In this state, the housing 10 can be opened.

In this embodiment, the XY stage 24 is further moved in a direction perpendicular to the above,
The third seal plate 73 can be removed from the second seal plate 72 in a state where the third seal plate 73 is in close contact with the first seal plate 71. This state is shown in FIG.
2 is shown. Therefore, the second cylindrical portion 22b can be freely moved while the orifice 44a is sealed. When using the electron gun 14 after exchanging the sample S, the third seal plate 7 is used in the reverse procedure to the above.
3 is removed from the first seal plate 70.

FIGS. 13 and 14 show a fourth embodiment of the present invention. In this embodiment, an example is shown in which the outer cylinder 22 includes three cylinder portions 22k, 22l, and 22m.
In this case, the three tubular portions 22k, 22l, 22m are not rigidly connected to each other, but are movable with each other.
Three outer cylinder holders 38a, 38b, 38c are mounted on a stay 36 which is mounted almost vertically on the XY stage 24, and the respective outer cylinder holders 38a, 38b, 38
c is adapted to hold each of the tubular portions 22k, 22l, 22m. Each outer cylinder holder 38a, 38b,
Reference numeral 38c has alignment means for aligning each of the cylindrical portions 22k, 22l, 22m. Each outer cylinder holder 38a, 38
b, 38c are loosely fitted into the respective tube portions 22k, 22l, 22m, and the alignment means is provided in the respective tube portions 22k, 22l,
It consists of a plurality of adjusting screws 80 arranged around 22 m. By adjusting the adjusting screw 80, it can be adjusted so that all the cylindrical portions 22k, 221 and 22m are located on a straight line.

[0042]

As described above, according to the present invention,
Since the electron generating means, the electron beam guiding means, and the sample holder are all disposed in the sealed housing, there is no problem of leakage in the outer cylinder, and the inside of the electron beam guiding means and the electron generating means can be more reliably formed. A high vacuum level can be achieved, the structure of the outer cylinder is simplified, and the assembling work is also simple. Further, since the outer cylinder accommodating the electron generating means and the electron beam guiding means is movably supported by the movable supporting means, after the sample is mounted on the sample holder in the housing, the electron generating means and the electron beam guiding means are provided. And the sample can be aligned, and the sample can be easily exchanged.

[Brief description of the drawings]

FIG. 1 is a diagram showing a first embodiment of the present invention.

FIG. 2 is a detailed front view of the XY stage in FIG. 1;

FIG. 3 is a front view of the XY stage of FIG. 2 as viewed from an arrow III of FIG. 2;

FIG. 4 is a sectional view showing a first cylindrical portion of the outer cylinder of FIG. 1;

FIG. 5 is a sectional view taken along line VV in FIG. 6;

FIG. 6 is a cross-sectional view showing a second cylindrical portion of the outer cylinder of FIG.

FIG. 7 is a sectional view of a first cylindrical portion of an outer cylinder according to a second embodiment of the present invention.

FIG. 8 is a plan view of the seal rod of FIG. 7;

FIG. 9 is a sectional view of the seal rod of FIG. 7;

FIG. 10 is a perspective view showing a second cylindrical portion of the outer cylinder according to the third embodiment of the present invention.

FIG. 11 is a perspective view showing a seal engaged with the second tubular portion of FIG. 10;

FIG. 12 is a perspective view showing a state where the second cylindrical portion of FIG. 10 and the seal of FIG. 11 are engaged.

FIG. 13 is a front view of an outer cylinder according to a fourth embodiment of the present invention.

FIG. 14 is a sectional view taken along lines XIV─XIV in FIG. 13;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 ... Housing 12 ... Turbo pump 13 ... Electron beam guide means 14 ... Electron gun 14a ... Needle-like cathode 14c ... Anode 16, 20 ... Condenser lens 18 ... Deflector 24 ... XY stage 36 ... Stay 38 ... Outer cylinder holder 42 ... vacuum chamber 43 ... sublimation pump 44 ... orifice plate 52 ... detector 62 ... seal rod 65 ... seal ring 71,72,73 ... seal plate

──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Takayuki Abe 1015 Uedanaka, Nakahara-ku, Kawasaki-shi, Kanagawa Prefecture Inside Fujitsu Limited (72) Inventor Kazuhiro Nakazawa 1015 Kamiodanaka, Nakahara-ku, Kawasaki-shi, Kanagawa Fujitsu Limited ( 72) Inventor Akio Ito 1015 Uedanaka, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Inside Fujitsu Limited (56) References JP-A-62-240661 (JP, A) JP-A-61-168853 (JP, A) (58) Field surveyed (Int. Cl. ⁷ , DB name) H01L 21/66 H01J 37/16 H01J 37/18

Claims (7)

(57) [Claims] 1. A sealed housing (10) provided with a vacuum suction means (12), an electron generation means (14), and an electron beam guide means for guiding an electron beam generated by the electron generation means toward a sample. 13), an outer cylinder (22) for accommodating the electron generating means and the electron beam guiding means, a movable supporting means (24) for movably supporting the outer cylinder in the housing, and disposed in the housing. been Ri Do from the sample holder (26), 2-way to the movable support means perpendicular
XY stage (24) movable in the
An XY stage (24) is mounted on the ceiling wall of the housing.
And the movable support means is further provided with the XY slide.
The stay (36) attached to the stage and the stay
And an outer cylinder holder (38) for holding the outer cylinder.
The sample holder is attached to the bottom wall of the housing
Electron beam device characterized by being. 2. An outer cylinder (22) comprising a plurality of cylinder portions (22).
22k, 22l, 22m), and the outer cylinder holder comprises a plurality of outer cylinder holders (38a, 38b, 38c) respectively holding the respective cylinder portions of the outer cylinder, and each of the outer cylinder holders is The electron beam apparatus according to claim 1 , further comprising an alignment means (80) for aligning the tube portions of the tube. 3. A sealing housing provided with a vacuum suction means (12).
Jing (10), electron generating means (14),
Guide the electron beam generated by the raw means toward the sample
Electron beam guiding means (13), said electron generating means and
An outer cylinder (22) for accommodating the electron beam guide means, and the outer cylinder
Movable support means for movably supporting the inside of the housing
(24) and a sample holder arranged in the housing
(26), wherein the outer cylinder (22) accommodates the electron generating means (14) and forms a vacuum chamber (42) with a first cylindrical portion (22a); and the electron beam guiding means (1).
And 3) a second tube portion (22b) for receiving said 3) and communicating with said first tube portion through a fine orifice (44a), and comprising means (43) for increasing the vacuum level in said vacuum chamber. The orifice (44a) is 10 ^-2 l
It characterized in that it has a / sec conductance C
Electron beam device. 4. Sealing housing with vacuum suction means (12)
Jing (10), electron generating means (14),
Guide the electron beam generated by the raw means toward the sample
Electron beam guiding means (13), said electron generating means and
An outer cylinder (22) for accommodating the electron beam guide means, and the outer cylinder
Movable support means for movably supporting the inside of the housing
(24) and a sample holder arranged in the housing
(26), wherein the outer cylinder (22) is used for generating the electrons.
A second housing housing means (14) and forming a vacuum chamber (42);
1 and the electron beam guide means (1).
3) to accommodate and through a small orifice (44a)
A second cylinder portion (22b) communicating with the first cylinder portion;
Means for increasing the vacuum level in the vacuum chamber
(43) provided with, on the first cylindrical portion (22a) includes a hole (63) capable of opening the orifice, and a sealing member (65) capable of blocking the orifice (44a) A sealing means (62) is provided, the sealing means comprising a first means for aligning the hole with the orifice.
And a second position where the seal member seals the orifice.
It said that it is movable between a position of
Electron beam device. Wherein said housing has a contact with the engaging portion at a predetermined position with said sealing means, thus the sealing means when said barrel is moved by said movable support means and該該engagement portion 5. The electron beam device according to claim 4 , wherein the electron beam device is brought into contact with the first cylindrical portion and moved to one of the first and second positions. 6. A sealing housing provided with a vacuum suction means (12).
Jing (10), electron generating means (14),
Guide the electron beam generated by the raw means toward the sample
Electron beam guiding means (13), said electron generating means and
An outer cylinder (22) for accommodating the electron beam guide means, and the outer cylinder
Movable support means for movably supporting the inside of the housing
(24) and a sample holder arranged in the housing
(26), wherein the outer cylinder (22) is used for generating the electrons.
A second housing housing means (14) and forming a vacuum chamber (42);
1 and the electron beam guide means (1).
3) to accommodate and through a small orifice (44a)
A second cylinder portion (22b) communicating with the first cylinder portion;
Means for increasing the vacuum level in the vacuum chamber
(43), wherein the first tubular portion (22a) and the second tubular portion (22b) are hermetically connected via a sealing member, and the other end of the second tubular portion is Sealing means (7
It characterized in that it is made possible sealed by 3)
Electron beam device. 7. The housing has an engaging portion which abuts on the sealing means at a predetermined position, so that when the outer cylinder is moved by the movable supporting means, the housing is brought to one of a sealing position and an opening position. The electron beam device according to claim 6 , wherein the electron beam device is used.