JP3223290B2 - Micro rotating body and manufacturing method thereof - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a micro rotating body driven to rotate by light pressure and a method of manufacturing the same.

[0002]

2. Description of the Related Art Micro-object manipulation using light pressure has been performed in the air or in liquid for latex spheres, cells, microorganisms, and the like. The minute object receives light pressure by being irradiated with the laser light. In other words, when the refraction and reflection of the irradiated laser beam occur due to the difference in the refractive index between the micro object and the medium in which the micro object exists, the change in the momentum of the light field where the refraction and reflection occurs is caused by the dynamics of the micro object. The momentum is transmitted as a large amount of momentum, and a force (light pressure) generated by the laser light on the minute object is generated. FIG. 16 is a cross-sectional view showing light pressure applied to a spherical minute object irradiated with laser light, where 1 i is a spherical minute object, 8 is a laser beam, 9 is a lens for condensing the laser beam 8, and 9 a is a lens. Laser light 8 focused by lens 9
Is the focus.

As shown in FIG. 16, a spherical minute object 1i placed in a light field, that is, a spherical minute object 1i placed in an area irradiated with a laser beam 8 is turned into a spherical minute object 1i. Is larger than the refractive index of the surrounding medium, it is drawn to the place where the light intensity is maximum, that is, near the focal point. Lights 8a and 8b of the laser light 8 are focused at 9a.
And enters the spherical minute object 1i, refracts and passes, and generates light pressure. When all of these light pressures are summed, the force (light trapping force) due to the sum of the light pressures acts to bring the spherical minute object 1i closer to the focal point 9a. Conversely, if the refractive index is small,
It receives the force to be pushed away from where the light intensity is maximum.

[0004] Among such small object manipulations by light pressure, there are the following documents in reports on rotational driving. Reference 1 “Sugiura, Kawata, Minami: Rotational operation of particles under a microscope using a circularly polarized laser beam, spectroscopic research, 39, pp.
342-346 (1990). Reference 2 "S. Sato, M. Ishigure and
H. Inaba: "Optical trapping
and rotation manipulatio
n of microscopic particles
s and biological cells
ing high-order mode Nd: Y
AG laser beams ”, Electrton
Lett. , 27, pp. 1831-1832 (199
1). Reference 3 "Sasaki, Koshioka, Misawa, Kitamura, Masuhara: Laser Manipulation Micromanipulation III. Assembly and Driving of Small Structures, Proceedings of Autumn Society of Applied Physics, 9P-zP-7, 8
41 (1991). Reference 4 “Sato, Ishizuka, Inaba: Proposal and Basic Experiment of Optical Micromotor, Proceedings of the Fall Meeting of Japan Society of Applied Physics, 16a-N-
10,774 (1992). "

Document 1 describes that the latex particles dispersed in water are continuously rotated with the angular momentum of circularly polarized light with the equipment configuration shown in FIG. In FIG. 17, reference numeral 171 denotes a slide glass on which a sample (a minute object) is placed; 172, an Ar laser that oscillates laser light; 173, a mirror that reflects the laser light emitted from the Ar laser 172; A lens for condensing the reflected laser light, 175 is a filter for cutting off the laser light, 176 is a camera, 177 is a VTR for recording the video captured by the camera 176, 178 is a monitor for checking the captured video, and 179 is a video monitor. The relay lens forms an image on the camera 176. According to the document 1, the laser light emitted from the Ar laser 172 is transmitted to the slide glass 171.
By irradiating the above minute object (sample), the minute object composed of latex particles can be driven to rotate by remote control without contact. However, as a result of photographing and observing this state with the camera 176, the time required for one rotation of the minute object is extremely slow, from several tens of seconds to several tens of minutes.

Document 2 describes that red blood cells are trapped with a steep light intensity distribution of higher-order transverse mode light, and the red blood cells are rotated following the rotation of the laser light. It is about 10 seconds. Literature 3 describes that one of two laser beams fixes (traps) a rod-shaped object, and the other laser beam is rotated to rotate the object . In Literature 4, LiNbO ₃ and KTiO
There is a report that among relatively small flat objects composed of PO ₄ , a relatively flat object rotates at high speed only by irradiating a laser beam. However, what shape is effective against light pressure is not described, including its manufacturing method.

[0007]

As described above, conventionally, the rotation of a minute object by light pressure has a problem that the rotation speed is extremely slow. In addition, the shape of the minute object suitable for rotation and the shape of the minute object are very small. The manufacturing method was unknown.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and has as its object to obtain a micro rotator capable of rotating at a higher speed when irradiated with a laser beam or the like. .

[0009]

According to the present invention, there is provided a micro rotating body having a paddle mounted on a side surface of a column so that there is no plane of symmetry parallel to the axis of the micro rotating body , and an axis of the column.
The cross-section of the struts and paddles cut perpendicular to the
It is characterized in that it is constant regardless of the location . Further, the method of manufacturing a micro rotating body according to the present invention is characterized in that the film formed on the substrate is processed into the shape of the micro rotating body, the substrate is selectively etched, and the processed micro rotating body is peeled off from the substrate. The body is removed by filtration. In this method of manufacturing a micro rotating body, two or more kinds of films having different properties are alternately formed on a substrate, processed into a shape of a micro rotating body, isotropically etched, and a substrate is selected. The micro-rotator processed by the selective etching is peeled from the substrate, and the micro-rotator is taken out by filtration .

[0010]

When the micro rotator of the present invention is irradiated with light, it is trapped near the focal point of the light. On the other hand, the sum of the light pressures generated by light irradiation does not become zero, and the paddles are rotated by the rotational force (rotational force) generated in the paddles. In the method for manufacturing a micro rotating body according to the present invention,
Form a micro-rotary body as small as μm. And
According to the method of manufacturing a micro rotator of the present invention, a micro rotator having a conical shape is formed, and a groove is formed on a peripheral surface thereof.

[0011]

(Embodiment 1) An embodiment of the present invention will be described below with reference to the drawings. FIGS. 1A and 1B are views showing the shape of a micro rotating body according to an embodiment of the present invention, wherein FIG. 1A is a perspective view, FIG. 1B is a front view, and FIG. 1C is a plan view. 1 is a micro rotating body, 2 is a paddle of the micro rotating body 1 having a semicircular cross section, and 3 is a column of the micro rotating body 1 having a columnar shape. 1 (d), (e), (f), and (g) show the rotation state of the micro-rotator 1 due to light pressure, and reference numeral 8 denotes a laser beam focused by a lens (not shown). , 9a is the focus. FIGS. 1D and 1E show the case where two paddles 2 are provided, and FIGS. 1F and 1G show the case where the paddles 2 are provided.
Are four.

When the micro rotator 1 is configured as described above, the column 3 irradiated with the laser beam 8 has a cylindrical shape having a rotationally symmetric axis, and is trapped so that the upper portion is located at the focal point 9a of the laser beam 8. The rotation axis (center axis) of the micro-rotator 1 is parallel to the optical axis of the laser beam 8. on the other hand,
Since the paddle 2 formed on the side surface of the column 3 is asymmetric with respect to the rotation axis direction, when the column 3 is trapped at the focal point of the laser beam, the light pressure applied to the paddle 2 irradiated with the laser beam expanding from the focal point. Do not add up to zero. That is, since the area of the arcuate curved surface of the paddle 2 is larger than the area of the opposing plane, the sum of the light pressures applied to the arcuate curved surface of the paddle 2 is larger than the sum of the light pressures applied to the opposing planes. , A rotating force is generated in the direction of the arcuate curved surface of the micro-rotating body 1.

FIG. 2 is a block diagram showing a device for irradiating a laser beam 8 to rotate the micro-rotator 1. In FIG. 2, reference numeral 4 denotes a liquid, 5 denotes a slide glass, 6 denotes a cover glass, and 7 denotes a cover glass. Is a stage, 8c is a wavelength of 1.064μ.
m, a YAG laser that oscillates a laser of m, 9 is an objective lens,
Reference numeral 10 denotes a dichroic mirror that reflects light having a wavelength of 1.064 μm, 11 denotes a filter that blocks light having a wavelength of 1.064 μm, and 12 denotes illumination necessary for observing the operation of the microrotator 1. 13 is a CCD camera, 14
VT for recording video captured by the CCD camera 1 3
R and 15 are monitors for confirming images recorded by the VTR 14, 16 is an objective lens 9, and a dichroic mirror 1
0, a relay lens for forming an image on the CCD camera 13 of an image in which the micro rotator 1 that has passed through the filter 11 is operating.

The micro rotary body 1 in the liquid 4 is irradiated with the laser beam 8 by the apparatus as shown in FIG. 2, and the state of the micro rotary body 1 is confirmed by the monitor 15. The micro rotary body 1 is rotated at about several hundred rpm. Was. By irradiating the laser beam 8 from below the micro rotator 1 so that the focal point 9a of the laser beam 8 is located above the micro rotator 1, the macro rotator 1 can be lifted by light pressure. As described above, it is also possible to rotate the micro rotator 1 in the air or in a vacuum, not in a liquid. However, in this case, since the buoyancy existing in the liquid is lost, it is necessary to increase the output of the laser beam 8 by a corresponding amount.

Next, a method for manufacturing the micro rotator 1 will be described. FIG. 3 is an explanatory diagram for explaining a method of manufacturing the micro-rotator 1 according to the first embodiment. Reference numeral 31 denotes a substrate made of GaAs, and 32 denotes SiO which is a material of the micro-rotator 1.
_Two films. First, as shown in FIG.
SiO ₂ is deposited thereon by the CVD method to form a SiO ₂ film 32.
To form Next, a resist mask having a cross-sectional hole of the micro-rotator 1 (FIG. 1) is formed thereon by photolithography, and a chromium film having a thickness of about 0.1 μm is formed thereon by ion beam sputtering. This is immersed in acetone and lifted off to form a chromium pattern 33 as shown in FIG. In this manufacturing, since accuracy on the order of μm is required, dimensional accuracy can be maintained by using the metal chromium pattern 33 as a mask.

Next, using the chromium pattern 33 as a mask, the SiO ₂ film 32 is etched by reactive ion beam etching using a fluorine-based gas as a reactive gas until the surface of the substrate 31 appears. After this, chrome pattern 3
3 is removed to obtain an SiO ₂ pattern 32a as shown in FIG. Next, the substrate 31 on which the SiO ₂ pattern 32a is formed is immersed in an etching solution 35 in a beaker 34 made of an aqueous solution of sulfuric acid and hydrogen peroxide, and GaAs is formed.
By dissolving the substrate 1 made of, the SiO ₂ pattern 32a is separated from the substrate 31. At this time, SiO ₂
The pattern 32a does not dissolve in the etching solution 35 composed of sulfuric acid and an aqueous solution of hydrogen peroxide. Then, the etching solution in which the SiO ₂ pattern 32a is freely diffused is added to the SiO ₂ pattern.
Filter with a filter paper 36 having finer eyes than the pattern 32a,
SiO ₂ pattern 32a remaining after being filtered on filter paper 36
The SiO ₂ pattern 32a can be recovered as shown in FIG.
The micro rotator 1 shown in FIG.

(Embodiment 2) FIG. 4 is a view showing the shape of a micro rotating body according to a second embodiment of the present invention.
(A) is a perspective view, (b) is a front view, (c) is a plan view, 1a is a micro rotating body, 2a is a micro rotating body 1a.
Is a prism-shaped paddle, and 3a is a prism-shaped support of the micro-rotating body 1a. In the second embodiment, unlike the first embodiment, a rectangular chromium mask pattern is used.
The connection between the paddle 2 and the paddle 2 also has high strength.

Incidentally, also in the second embodiment, the principle of rotation of the micro rotator 1a is the same as that of the micro rotator 1 of the first embodiment. As shown in FIG. 4A, a laser beam incident from point P on the upper surface of the micro rotator 1a is refracted at point P and enters the inside of the micro rotator 1a, and Q on the side surface.
The light is refracted at the point and goes outside. At this time, light pressure F is generated at the points P and Q. For example, light pressure F at point Q
Is directed on the plane determined by the two line segments of the light coming to the point Q and the light coming from the point Q, and facing the outside of the plane where the point Q of the microrotator 1a is located.

FIG. 4D shows the light pressure generated by the passage of the laser beam 8 as viewed from the upper surface of the micro-rotator 1a. In FIG. 4D, the direction of the light pressure F is described in a simplified manner, but as is clear from FIG. 4D, there is no light pressure F that cancels out the light pressure F in the region 41, that is, the micro rotator The sum of the light pressures F applied to the side surfaces of 1a does not become 0, whereby the micro rotator 1a rotates counterclockwise about the center 42.

(Embodiment 3) FIG. 5 is a view showing a shape of a micro rotating body according to a third embodiment of the present invention.
(A) is a perspective view, (b) is a front view, and (c) is a plan view. 1b is a micro-rotating body having a triangular prism attached to the side surface of a square prism, and 2b is a triangular prism-shaped micro-rotating body 1b. The paddles 3b are prism-shaped pillars of the micro rotating body 1b. The micro rotator 1b of this embodiment is also the same as the above embodiment, and the sum of the light pressures generated on the side surfaces of the micro rotator 1b by irradiating the laser beam does not become zero. As shown in the plan view of FIG. 5D, the sum of the light pressures applied to the side surfaces 51a and 51b having a large area of the paddle 2b is represented by a straight line 5 passing through the center of the upper surface of the micro rotator 1b.
2, and the sum of the light pressure applied to the side surface 51a and the sum of the light pressure applied to the side surface 51b do not cancel each other, and therefore, a force that rotates counterclockwise is applied to the micro rotator 1b. Will be.

(Embodiment 4) In the above embodiment, the column and the paddle of the micro rotary body have the same length, but the present invention is not limited to this. FIGS. 6A and 6B are views showing the shape of a micro rotating body according to a fourth embodiment of the present invention, wherein FIG. 6A is a perspective view, FIG. 6B is a front view, and FIG. In the figure, reference numeral 1c denotes a micro rotator of the fourth embodiment, 2c denotes a paddle of the micro rotator 1c, and 3c denotes a column of the micro rotator 1c. The micro rotator 1c of the fourth embodiment is similar to the micro rotator 1c shown in FIG.
As shown in (1), the paddle 2c is shorter than the support 3c, and is mounted deeper than the tip of the support. With this configuration, the distance between the generation region of the rotational force contributing to the rotation by the light pressure generated by the irradiation of the laser beam and the trap point is longer than in the first to third embodiments.

The force with which the laser beam traps the microrotating body increases as the position is closer to the focal point of the laser beam to be irradiated. On the other hand, the rotational force generated in the paddle becomes larger when it is separated to some extent from this focal position. The micro rotator 1c of the fourth embodiment is different from the micro rotator 1 of the first to third embodiments.
1b, the paddle 2c can be disposed in a region where the rotational force is large, away from the focal point of the laser beam in the optical axis direction. Also in this embodiment, the shape of the paddle 2c is not limited to semi-cylindrical, as shown in FIG. 7,
It may be a prism or a triangular prism. Further, the shape of the support 3c is not limited to a cylinder, but may be a prism as shown in FIG.

Next, the micro rotator 1c of the fourth embodiment
Will be described. FIG. 8 is an explanatory diagram for explaining a method of manufacturing the micro rotator 1c according to the fourth embodiment.
1 is a substrate made of quartz, 72 is a silicon nitride film made of silicon nitride which is a material of a micro-rotator, and 73 is a first chromium pattern made of chromium. Hereinafter, a method for manufacturing the micro rotator 1c will be described. First, as shown in FIG. 8A, a 10 μm-thick silicon nitride film 72 is formed on a substrate 71 by ion beam sputtering. Next, a chromium film is formed thereon by sputtering or the like, and the chromium film is processed by photolithography and lift-off to form a first chromium pattern 73 as shown in FIG. 8B. The planar shape of the first Kuromupatan 73, shown in FIG. 6 (c), the a cross-sectional shape of the strut 3c, i.e. circular.

Using the first chromium pattern 73 as a mask, the silicon nitride film 72 is etched by about 5 μm by reactive ion beam etching using a fluorine-based gas as a reaction gas. Next, a chromium film is again formed thereon, and photolithography and lift-off
As shown in (c), a second chromium pattern 74 is formed. The plan shape of the second chrome pattern 74 is shown in FIG.
The cross-sectional shape of the paddle 2c as shown in ( c ), that is, a semicircular shape. Next, using the second chromium pattern 74 and the first chromium pattern 73 as masks, the silicon nitride film 72 is etched by reactive ion beam etching using a fluorine-based gas as a reaction gas.
This etching is performed until the substrate 71 is exposed, and a silicon nitride rotating body 75 is formed.

After that, as shown in FIG. 8D, the first chromium pattern 73 and the second chromium pattern 74 are removed, and thereafter, the substrate 71 is replaced with hydrofluoric acid (HF) in a beaker 76.
Then, the substrate 71 is dissolved in an etching solution 77 which is an aqueous solution of hydrogen fluoride and ammonium fluoride (FNH ₃ ) to separate the silicon nitride rotating body 75 from the substrate 71. Then, as shown in FIG. 8F, the etching solution 7 in the beaker 76 is formed.
7 is replaced with a filter paper 78 smaller than the silicon nitride rotor 75.
Then, the silicon nitride rotator 75 is separated and taken out, and the silicon nitride rotator 75 is recovered. The silicon nitride rotating body 75 manufactured as described above is
It becomes the micro rotator 1c.

[0026] (Example 5) Incidentally, in the fourth embodiment, in the manufacturing, is not performed twice in the formation of Kuromupatan used as a mask in the etching for forming the shape of the micro rotary body Narazu, step Has the disadvantage of being slightly longer.
Here, if the shape of the micro rotator is as shown in FIG. 9, the process can be shortened. FIG. 9 is a view showing the shape of a micro rotating body according to a fifth embodiment of the present invention, and FIG.
Is a perspective view, (b) is a front view, (c) is a plan view,
e is a micro rotating body, 2e is a paddle of the micro rotating body 1e, and 3e is a column of the micro rotating body 1e. Also, 8
Reference numeral 1 denotes a hole formed in the side surface of the paddle 2e.
As shown in FIG. 9C, which is a cross section taken along the line BB ′ in the front view of FIG. 9B, the hole 81 does not penetrate the paddle 2e.

Since the hole 81 formed in the paddle 2e does not penetrate, the micro rotator 1e has no plane of symmetry which is plane symmetric similarly to the above-described embodiment, and the micro rotator 1e is not illuminated by laser light. The sum of the generated light pressures does not become zero. Therefore, similarly to the above-described embodiment, a rotational force is generated in the paddle 2e to rotate the micro rotator 1e counterclockwise about the axis AA '.

Next, a method of manufacturing the micro rotator 1e will be described. FIG. 10 shows the micro rotator 1 of the fifth embodiment.
4A and 4B are explanatory views showing a method for manufacturing the semiconductor device e, wherein 101 is a substrate made of quartz, and 102 is a silicon nitride film made of silicon nitride. First, as shown in FIG.
A 5 μm-thick silicon nitride film 102 is formed thereon by ion beam sputtering. Next, a chromium pattern 103 is formed by photolithography and lift-off. The plan shape of the chrome pattern 103 is the same as the front shape of the micro rotator 1e shown in the front view of FIG. 9B. Next, as shown in FIG. 10C, the silicon nitride film 102 is etched by 2.5 μm using the chromium pattern 103 as a mask. Here, as shown in FIGS. 10D and 10E, holes are formed at predetermined positions of the chrome pattern 103 by photolithography and etching. Note that FIG.
(E) is a perspective view of FIG. 10 (d).

Then, the chrome pattern 103a having a hole is formed.
The silicon nitride film 102 is etched until the surface of the substrate 101 is exposed, using the mask as a mask.
After removing 03a, a silicon nitride rotator 104 is formed as shown in FIG. Next, the substrate 101 is dissolved in an etching solution composed of an aqueous solution of hydrofluoric acid (HF) and ammonium fluoride (FNH3) by dissolving the substrate 101 in the same manner as in the manufacturing method of the above-described embodiment. Is removed, and the silicon nitride rotator 104 is recovered by filtering the etchant in which the separated silicon nitride rotator 104 is present. This silicon nitride rotator 104 is a micro rotator 1e shown in FIG.
Becomes As described above, the micro rotator 1e of the fifth embodiment is different from the micro rotators 1c and 1d of the fourth embodiment.
In comparison with the method described above, there is an advantage in that the chromium film used as a mask can be formed only once, while exhibiting the same effect.

(Embodiment 6) FIG. 11 is a view showing a shape of a micro rotating body according to a sixth embodiment of the present invention.
(A) is a perspective view, (b) is a plan view. As shown in FIG. 11, in this embodiment, the micro-rotator 1 f has an integrated conical shape without a boundary between the support and the paddle shown in the above-described embodiment, and a part of the bottom of the micro-rotator 1 f is cut off. It is characterized by having a resection part 111. With such a shape, the micro-rotator 1f does not have a plane that is plane-symmetric, and the sum of the light pressures generated by the irradiation of the laser beam does not become zero, and FIG. As shown in FIG. 7, a rotational force F that rotates counterclockwise about a central axis passing through the vertex of the cone is generated on the surface 112.

Hereinafter, the micro rotator 1f of the sixth embodiment will be described.
Will be described. FIG. 12 shows a micro rotator 1f.
4A and 4B are explanatory diagrams for explaining the manufacturing method of the present invention, in which 121 is a substrate made of GaAs, 122 is a resist film, and 123 is a titanium film made of titanium. First, as shown in FIG.
Is formed by spin coating, and titanium is deposited thereon by ion beam sputtering to form a titanium film 123 having a thickness of 0.2 μm.

Next, as shown in FIG. 12B, a hole 124 having a diameter of 4 μm is formed in the titanium film 123 by photolithography and dry etching using a chlorine-based gas as a reaction gas. Next, the resist film 122 is etched using reactive ion beam etching in which oxygen is desired to be used as a reactive gas, using the titanium film 123 with the hole 124 as a mask. This etching is performed anisotropically, and holes are made until the surface of the substrate 121 is exposed. Next, as shown in FIG. 12B, the resist film 122 is laterally etched to form a cavity 125 by isotropic plasma etching using oxygen as a reaction gas, and the eaves 123 a of the titanium film 123 are formed. Form.

Next, by ion beam sputtering, Si
O ₂ is deposited to a thickness of 10 μm to form a SiO ₂ film 126. At this time, as shown in FIG.
A conical SiO ₂ pattern 127 is formed directly below the hole 124 on the inner substrate 121. The SiO ₂ pattern 127 is formed by sputtered particles by ion beam sputtering entering the cavity 125 through the holes 124, and has a conical shape because the sputtered particles have directionality.

Thereafter, by removing the resist film 122, the titanium film 123 and the SiO ₂ film 126 are removed.
As shown in FIG. 12D, a mask 128 is formed by photolithography or the like. The mask 128 is shown in FIG.
The portion corresponding to the cutout 111 shown in FIG. Then, using the mask 128 as a mask, the mask 128 is removed by reactive ion beam etching using a fluorine gas as a reactive gas until the surface of the substrate 121 under the region to be etched by the SiO ₂ pattern 127 is exposed. As a result, FIG.
As shown in (e), a conical rotating body 127a is obtained.

Finally, as in the previous embodiment, the conical rotating body 127 is peeled off by immersing the substrate 121 in an etching solution composed of an aqueous solution of sulfuric acid and hydrogen peroxide.
Since this etching solution dissolves GaAs but does not dissolve SiO ₂ , the conical rotating body is separated from the substrate 121 and separated into the etching solution. Then, the etching liquid is filtered with filter paper to form a conical rotating body 127.
Collect. This conical rotator becomes the micro rotator 1f shown in FIG.

(Embodiment 7) FIG. 13 is a perspective view showing a shape of a micro rotating body according to a seventh embodiment of the present invention. As shown in FIG. 13, the micro rotator 1g in this embodiment is formed by forming a plurality of circumferential grooves 131 on the peripheral surface of the micro rotator 1f of the sixth embodiment, and the other is the micro rotator shown in FIG. It is the same as the rotating body 1f.

Next, a method of manufacturing the microrotator 1g of the seventh embodiment will be described. First, as shown in FIGS. 12A and 12B, a resist film 122 having a cavity 125 formed thereon and a titanium film 123 having a hole 124 formed thereon are formed on the substrate 121, similarly to the micro rotator 1f of the sixth embodiment. Form. Next, FIG.
As shown in FIG. 4A, SiO ₂ and silicon nitride are alternately deposited to form a silicon nitride layer 141 and a SiO ₂ layer 142.
And are alternately formed. Subsequently, etching with an aqueous solution of hydrofluoric acid and ammonium fluoride is performed for a short time, and only the SiO ₂ layer 142 is slightly etched. As a result, a depression is formed as shown in FIG. Thereafter, in the same manner as described in Embodiment 6,
1 g of a micro rotating body is produced.

(Eighth Embodiment) FIG. 15 is a perspective view showing the shape of a micro rotator according to an eighth embodiment of the present invention.
Reference numeral 151 denotes a spiral groove which is spirally cut on the inclined peripheral surface of the micro rotator 1h, and the other components are the same as those in FIG.
In the eighth embodiment, since the spiral groove 151 is formed on the peripheral surface of the micro rotator 1h, the micro rotator 1h is driven to rotate by irradiating a laser beam, so that the micro rotator can be remotely operated in a non-contact manner. Can be used as a small drill.

[0039]

As described above, according to the present invention, several tens of .mu.m
There is an effect that the following micro rotator can be rotated at a higher speed. This micro rotating body can be rotated at high speed and can be operated in a non-contact and remote manner.
It can also be used as a tool for producing a microstructure.

[Brief description of the drawings]

FIG. 1 is a perspective view, a front view, and a plan view showing the shape of a micro rotating body according to an embodiment of the present invention.

FIG. 2 is a configuration diagram showing a configuration of an apparatus for observing a rotating state of a micro rotator according to an embodiment of the present invention.

FIG. 3 is an explanatory view showing a method of manufacturing the micro rotator shown in FIG.

Figure 4 is a perspective view showing another shape of the micro rotary member is a real施例of the present invention, a front view, a plan view.

FIG. 5 is a perspective view, a front view, and a plan view showing the shape of a micro rotating body according to another embodiment of the present invention.

FIG. 6 is a perspective view, a front view, and a plan view showing a shape of a micro rotator according to another embodiment of the present invention.

FIG. 7 is a perspective view, a front view, and a plan view showing the shape of a micro rotator according to another embodiment of the present invention.

FIG. 8 is an explanatory view showing a method for manufacturing a micro rotator according to a second embodiment of the present invention.

FIG. 9 is a perspective view, a front view, and a plan view showing the shape of a micro rotator according to another embodiment of the present invention.

FIG. 10 is an explanatory view showing a method of manufacturing the micro rotator shown in FIG. 9, which is a third embodiment of the present invention.

FIG. 11 is a perspective view and a plan view showing a shape of a micro rotator according to another embodiment of the present invention.

FIG. 12 is an explanatory view showing a method of manufacturing the micro rotator of FIG.

FIG. 13 is a perspective view showing a shape of a micro rotator according to another embodiment of the present invention.

FIG. 14 is an explanatory view showing a method of manufacturing the micro rotator of FIG.

FIG. 15 is a perspective view showing the shape of a micro rotator according to another embodiment of the present invention.

FIG. 16 is a cross-sectional view illustrating the operation principle of the micro rotator.

FIG. 17 is a configuration diagram showing a device configuration for continuously rotating latex particles dispersed in water described in Document 1 at the angular momentum of circularly polarized light.

[Explanation of symbols]

 1 Micro rotating body 2 Paddle 3 Prop

──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Osamu Oguchi 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo Nippon Telegraph and Telephone Corporation (56) References JP-A-6-78572 (JP, A) JP-A-Hei 5-168265 (JP, A) JP-A-6-82703 (JP, A) JP-A-3-110510 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) B81B 5/00 B81C 5/00 C23F 1/00 G02B 27/00 H02N 11/00

Claims (8)

(57) [Claims] 1. A strut provided rotatably, and a paddle mounted on a side surface of the strut in a positional relationship parallel to an axis of the strut and configured to generate a rotational force by optical pressure, the strut comprising: Have no plane of symmetry parallel to the axis of
The cross section of the dollar is constant regardless of where it is cut
Micro rotary body, characterized in that. 2. The micro rotator according to claim 1, wherein the paddle is shorter than the support and is mounted deeper than a tip of the support. 3. A column provided rotatably and mounted on a side surface of the column in a positional relationship parallel to an axis of the column.
It is either a paddle for generating a rotational force by light pressure
And do not have a plane of symmetry parallel to the axis of the strut.
And a concave hole on a side surface of the paddle. 4. A micro-rotator having a cutout for generating a rotational force by light pressure on a part of the bottom surface of the cone, and having no plane of symmetry on a plane passing through the axis of the cone. . 5. The micro rotator according to claim 4, wherein a groove is formed on a peripheral surface of the micro rotator in a circumferential direction. 6. A first step of forming a film made of a substance constituting a micro rotator on a substrate; a second step of processing the film to form a shape of the micro rotator; A third step of releasing the micro-rotating body from the substrate into the etching solution for the etching by selective etching, and filtering the etching solution containing the micro-rotating body released from the substrate. And a fourth step of recovering the micro rotator. 7. A first step of forming a spacer on a substrate, a second step of forming a perforated eaves on the spacer, and using the eaves as a mask to form a region under the holes of the spacer. A third step of removing, and a fourth step of depositing a material constituting a micro-rotator on the substrate after the third step, and forming a shape of the micro-rotator by deposition passing through the hole of the eaves. A fifth step of removing the eaves and the substance deposited thereon while removing the spacer after the second step, and a fifth step of removing a part of the shape of the micro rotator. Step 6 and a seventh step of releasing the micro rotator from the substrate into an etching solution for the etching by selective etching in which the substrate is etched; and Method for producing a micro rotary body characterized by comprising an eighth step of recovering the micro rotary body by filtering the etching solution standing. 8. The method of manufacturing a micro rotating body according to claim 7, wherein in the third step, two or more kinds of substances are alternately deposited to form the film, and after the fifth step, A method of manufacturing a micro rotator, wherein a circumferential groove is formed on the peripheral surface of the micro rotator by isotropic etching.