JP3213025B2 - Helium liquefaction equipment - Google Patents
Helium liquefaction equipmentInfo
- Publication number
- JP3213025B2 JP3213025B2 JP26011091A JP26011091A JP3213025B2 JP 3213025 B2 JP3213025 B2 JP 3213025B2 JP 26011091 A JP26011091 A JP 26011091A JP 26011091 A JP26011091 A JP 26011091A JP 3213025 B2 JP3213025 B2 JP 3213025B2
- Authority
- JP
- Japan
- Prior art keywords
- helium
- gas
- adsorbent
- heat exchanger
- helium liquefaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000001307 helium Substances 0.000 title claims description 51
- 229910052734 helium Inorganic materials 0.000 title claims description 51
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 title claims description 51
- 239000007789 gas Substances 0.000 claims description 53
- 239000003463 adsorbent Substances 0.000 claims description 29
- 239000012535 impurity Substances 0.000 claims description 23
- 239000000126 substance Substances 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 33
- 239000007788 liquid Substances 0.000 description 16
- 229910052757 nitrogen Inorganic materials 0.000 description 16
- 238000000746 purification Methods 0.000 description 15
- 238000007670 refining Methods 0.000 description 11
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- 238000001179 sorption measurement Methods 0.000 description 8
- 238000001816 cooling Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 229910001868 water Inorganic materials 0.000 description 5
- 239000001569 carbon dioxide Substances 0.000 description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 241000238366 Cephalopoda Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011491 glass wool Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/02—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process
- F25J1/0225—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process using other external refrigeration means not provided before, e.g. heat driven absorption chillers
- F25J1/0227—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process using other external refrigeration means not provided before, e.g. heat driven absorption chillers within a refrigeration cascade
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/0002—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the fluid to be liquefied
- F25J1/0005—Light or noble gases
- F25J1/0007—Helium
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/003—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production
- F25J1/0032—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production using the feed stream itself or separated fractions from it, i.e. "internal refrigeration"
- F25J1/0035—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production using the feed stream itself or separated fractions from it, i.e. "internal refrigeration" by gas expansion with extraction of work
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/003—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production
- F25J1/0032—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production using the feed stream itself or separated fractions from it, i.e. "internal refrigeration"
- F25J1/004—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures characterised by the kind of cold generation within the liquefaction unit for compensating heat leaks and liquid production using the feed stream itself or separated fractions from it, i.e. "internal refrigeration" by flash gas recovery
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
- F25J1/02—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process
- F25J1/0201—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process using only internal refrigeration means, i.e. without external refrigeration
- F25J1/0202—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures requiring the use of refrigeration, e.g. of helium or hydrogen ; Details and kind of the refrigeration system used; Integration with other units or processes; Controlling aspects of the process using only internal refrigeration means, i.e. without external refrigeration in a quasi-closed internal refrigeration loop
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
- F25J2205/60—Processes or apparatus using other separation and/or other processing means using adsorption on solid adsorbents, e.g. by temperature-swing adsorption [TSA] at the hot or cold end
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2220/00—Processes or apparatus involving steps for the removal of impurities
- F25J2220/02—Separating impurities in general from the feed stream
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2270/00—Refrigeration techniques used
- F25J2270/04—Internal refrigeration with work-producing gas expansion loop
- F25J2270/06—Internal refrigeration with work-producing gas expansion loop with multiple gas expansion loops
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2270/00—Refrigeration techniques used
- F25J2270/90—External refrigeration, e.g. conventional closed-loop mechanical refrigeration unit using Freon or NH3, unspecified external refrigeration
- F25J2270/908—External refrigeration, e.g. conventional closed-loop mechanical refrigeration unit using Freon or NH3, unspecified external refrigeration by regenerative chillers, i.e. oscillating or dynamic systems, e.g. Stirling refrigerator, thermoelectric ("Peltier") or magnetic refrigeration
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Separation Of Gases By Adsorption (AREA)
- Separation By Low-Temperature Treatments (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明はヘリウム液化装置に関す
るものであり、このようなヘリウム液化装置が採用され
る技術分野としては、エネルギー分野（超電導発電機、
電力貯蔵システム、ＭＨＤ発電、核融合炉、超電導送
電）、交通分野（リニヤモーターカー、超電導電磁推進
船）、医療分野（ＭＲＩ、超電導心磁図装置、超電導脳
磁図装置）、コンピュータ分野（超電導デバイス、小型
シンクロトロン放射光源、ジョセフソンコンピュータ）
あるいは宇宙開発分野（観測機器）等がある。さて、こ
のようなヘリウム液化装置は、ヘリウム循環系に、ガス
圧縮機、熱交換器、ジュール・トムソン弁、および寒冷
発生手段を備えて構成されている。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a helium liquefaction apparatus.
Power storage system, MHD power generation, fusion reactor, superconducting power transmission), transportation field (linear motor car, superconducting magnetic propulsion ship), medical field (MRI, superconducting magnetocardiograph, superconducting magnetoencephalograph), computer field (superconducting device, Small synchrotron radiation source, Josephson computer)
Or there is a space development field (observation equipment). Now, such a helium liquefaction apparatus is configured to include a gas compressor, a heat exchanger, a Joule-Thomson valve, and cold generation means in a helium circulation system.
【０００２】[0002]
【従来の技術】上記のようなヘリウム液化装置に対し
て、今日、その長時間運転に対応できるものの開発が求
められている。即ち、ヘリウム液化装置を例えば一年間
といった非常な長時間に渡って、運転することが求めら
れている。ここで、こういった要請を満足するものとヘ
リウム液化装置をするためには、液化装置におけるヘリ
ウム循環系内のヘリウムガスが、高純度に常時維持さ
れ、系内でガスの閉塞が起こらず、連続して系内を良好
に循環することが要求される。さらに詳細にこの閉塞現
象について説明すると、この系内において、ヘリウムガ
スは、多段の熱交換器において冷却作用を受けるととも
に、ジュールトムソン弁において膨張されて液化する。
ここで、ヘリウムガス中に不純物（主に水或いは不純ガ
ス）を含んでいると、ヘリウムの冷却液化過程で不純物
が冷却され、固化する。結果、こういった固化物が系内
で詰まり循環系の閉塞現象を起こすのである。不純物と
しては、酸素、一酸化炭素、二酸化炭素、水、水素、窒
素、メタンガス等を挙げることができ、こういった不純
物の侵入経路は、ガス圧縮機部位等である。2. Description of the Related Art Today, there is a demand for the development of a helium liquefaction apparatus capable of coping with its long-term operation. That is, it is required to operate the helium liquefaction apparatus for a very long time, for example, one year. Here, in order to satisfy these demands and to make the helium liquefaction apparatus, the helium gas in the helium circulation system in the liquefaction apparatus is always maintained at a high purity, and the gas is not blocked in the system, Continuous good circulation in the system is required. To explain this blocking phenomenon in more detail, in this system, helium gas undergoes a cooling action in a multi-stage heat exchanger and expands and liquefies in a Joule-Thomson valve.
Here, if the helium gas contains impurities (mainly water or an impure gas), the impurities are cooled and solidified during the cooling and liquefaction process of helium. As a result, such solidified substances are clogged in the system, causing a clogging phenomenon of the circulation system. Examples of impurities include oxygen, carbon monoxide, carbon dioxide, water, hydrogen, nitrogen, methane gas, and the like. The route of entry of such impurities is at a gas compressor or the like.
【０００３】さて上記のような不純物による系の閉塞の
問題を解決するため、従来、系内に液体窒素トラップ部
を備えて、ヘリウム液化装置を構成していた。この構成
のヘリウム液化装置１を図３に示す。即ち、ガス圧縮機
２の吐出側に連なるガス路３に液体窒素トラップ部４を
備えることにより、これらの部位において、前述の不純
物を除去していた。ここで、この液体窒素トラップ部４
は、液体窒素の冷熱により一端この部位に流入するガス
を冷却し、不純物を液体状態で除去するものである。[0003] In order to solve the above-mentioned problem of blockage of the system due to impurities, a helium liquefaction apparatus has conventionally been provided with a liquid nitrogen trap in the system. FIG. 3 shows a helium liquefaction apparatus 1 having this configuration. That is, by providing the liquid nitrogen trap portion 4 in the gas passage 3 connected to the discharge side of the gas compressor 2, the above-described impurities are removed in these portions. Here, the liquid nitrogen trap unit 4
Is to cool gas once flowing into this portion by the cold heat of liquid nitrogen and remove impurities in a liquid state.
【０００４】[0004]
【発明が解決しようとする課題】さて上記従来技術は、
液体窒素トラップ部が液体窒素の寒冷を利用するもので
あるため、ヘリウム液化装置の他の装置群とともに液体
窒素の寒冷条件を満足する冷凍装置系、断熱系を別途備
える必要があり、装置構成が大掛かりになるとともに、
その維持・管理も難しいという問題があった。即ち、こ
のような点からも従来のヘリウム液化装置は長期運転に
は不向きなものであった。従って、本発明の目的は、ヘ
リウムガス循環式のヘリウム液化装置において循環ガス
の精製を、液体窒素を使わず、簡単な精製装置構成でお
こなうことができ、結果、例えばリニアモータカーなど
への搭載が可能な、構造簡単で、長期間に渡って安定し
た運転ができるヘリウム液化装置を得ることである。The prior art described above is
Since the liquid nitrogen trap unit uses the cooling of liquid nitrogen, it is necessary to separately provide a refrigeration system and an adiabatic system that satisfy the cooling conditions of liquid nitrogen, together with other units of the helium liquefaction device. As it becomes large scale,
There was a problem that maintenance and management were difficult. That is, from this point, the conventional helium liquefaction apparatus is not suitable for long-term operation. Therefore, an object of the present invention is to purify a circulating gas in a helium gas circulation type helium liquefaction apparatus without using liquid nitrogen and with a simple purification apparatus configuration, and as a result, for example, it can be mounted on a linear motor car or the like. It is an object of the present invention to provide a helium liquefier which has a simple structure and can be operated stably for a long period of time.
【０００５】[0005]
【課題を解決するための手段】この目的を達成するため
の本発明によるヘリウム液化装置の特徴構成は、ガス圧
縮機と熱交換器の間の循環系部位に、ヘリウムガス中の
不純物を除去する常温稼動の不純物吸着手段を介装し、
前記常温稼動の不純物吸着手段に、化学吸着剤としての
ニッケル触媒および物理吸着剤を収納したことにあり、
その作用・効果は次の通りである。The helium liquefaction apparatus according to the present invention for achieving this object is characterized in that a circulating system section between a gas compressor and a heat exchanger is provided with helium gas in a helium gas.
Intermediate-temperature operation impurity adsorption means for removing impurities is interposed,
The impurity adsorbing means operating at room temperature has a chemical adsorbent
In storing nickel catalyst and physical adsorbent ,
The operation and effect are as follows.
【０００６】[0006]
【作用】つまり本願のヘリウム液化装置においては、従
来の液体窒素トラップ部の代わりに、不純物吸着手段が
介装される。この不純物吸着手段には、化学吸着剤とし
てのニッケル触媒及び物理吸着剤が収納されており、こ
れらの吸着剤により系内の不純物が吸着除去される。そ
して、この吸着剤による吸着は、その特性により常温で
おこなわれる。またこの場合、吸着剤が系内のガスに直
接接触する必要があるため、吸着剤は系を構成する管路
内にインラインで配設される。In other words, in the helium liquefaction apparatus of the present application, an impurity adsorbing means is interposed instead of the conventional liquid nitrogen trap section. This impurity adsorption means includes a chemical adsorbent.
All nickel catalysts and physical adsorbents are stored, and these adsorbents adsorb and remove impurities in the system. Then, the adsorption by the adsorbent is performed at normal temperature due to its characteristics. Also, in this case, since the adsorbent needs to directly contact the gas in the system, the adsorbent is disposed in-line in a pipeline constituting the system.
【０００７】[0007]
【発明の効果】従って、従来のヘリウム液化装置と本願
の場合を比較すると、液体窒素を使用する必要がないた
め、装置構成が簡単で、維持・管理が容易となる。結
果、ヘリウム液化装置の軽量小型化が可能となるととも
に、ヘリウム循環系内のヘリウムの純度が確実に長期間
に渡って維持されるため、例えばリニアモータカー等へ
の搭載が可能となった。Therefore, when comparing the conventional helium liquefaction apparatus with the case of the present invention, it is not necessary to use liquid nitrogen, so that the apparatus configuration is simple and maintenance / management is easy. As a result, the helium liquefaction apparatus can be reduced in weight and size, and the purity of helium in the helium circulation system can be reliably maintained for a long period of time, so that it can be mounted on, for example, a linear motor car.
【０００８】[0008]
【実施例】本願の実施例を図面に基づいて説明する。図
１には本願のヘリウム液化装置１の構成を示す線図が示
されている。このヘリウム液化装置１は、ヘリウム循環
系１００に、ガス圧縮機２、このガス圧縮機２の吐出側
に接続され、以下の装置を備え、ガス圧縮機２に帰還す
るガス路３、常温精製装置４、熱交換器５、低温精製装
置６、ジュールトムソン弁７、液体ヘリウムタンク８を
備えて構成されている。ここで、ガス圧縮機２は液化に
必要な状態にヘリウムガスを加圧するものである。また
熱交換器５は、ガス圧縮機２から液体ヘリウムタンク８
に到る往路側ガスｇ１を、液体ヘリウムタンク８からガ
ス圧縮機２に到る復路側ガスｇ２と熱交換させてこれを
冷却するためのものであり、本願においては四段設けら
れている。さらに、前述の熱交換器５間の中間段階にお
いて、ガスは冷凍機９によってそれぞれ冷却され、所定
の温度（第一段熱交換器５１と第二段熱交換器５２との
間の段では７０Ｋ程度、第三段熱交換器５３と第四段熱
交換器５４との間の段では２０Ｋ程度）とされる。ま
た、第一段熱交換器５１と第二段熱交換器５２との間、
及び第三段熱交換器５３と第四段熱交換器５４との間に
は、前述の低温精製装置６が配設されており、各装置６
において液化した不純物成分が除去される。一方、この
循環系１００に対して、ヘリウムガスを供給もしくは補
給するヘリウムガス供給系（ヘリウムボンベ１０、及び
供給ガス用精製器１１を備える。）１０１が設けられて
いる。An embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a diagram showing a configuration of a helium liquefaction apparatus 1 of the present application. The helium liquefaction apparatus 1 is connected to a helium circulation system 100, a gas compressor 2, a discharge side of the gas compressor 2, and includes the following devices, a gas path 3 returning to the gas compressor 2, a room temperature purification device, 4, a heat exchanger 5, a low-temperature purification device 6, a Joule-Thomson valve 7, and a liquid helium tank 8. Here, the gas compressor 2 pressurizes helium gas to a state necessary for liquefaction. The heat exchanger 5 is provided between the gas compressor 2 and the liquid helium tank 8.
Is exchanged with the return-side gas g2 from the liquid helium tank 8 to the gas compressor 2 to cool it, and is provided in four stages in the present application. Further, in the intermediate stage between the heat exchangers 5 described above, the gas is cooled by the refrigerator 9 and is cooled to a predetermined temperature (70 K in the stage between the first stage heat exchanger 51 and the second stage heat exchanger 52). (About 20K in the stage between the third-stage heat exchanger 53 and the fourth-stage heat exchanger 54). Further, between the first-stage heat exchanger 51 and the second-stage heat exchanger 52,
In addition, between the third-stage heat exchanger 53 and the fourth-stage heat exchanger 54, the above-described low-temperature purification device 6 is provided.
The liquefied impurity component is removed in the step. On the other hand, a helium gas supply system (including a helium cylinder 10 and a supply gas purifier 11) 101 for supplying or replenishing helium gas is provided for the circulation system 100.
【０００９】以下に本願の特徴であるヘリウムガスの精
製構成について説明する。この部位は、前述の常温精製
装置４、低温精製装置６である。ここで、これらの作動
温度は、常温精製装置４が所謂常温であり、低温精製装
置６のそれは７０Ｋ及び２０Ｋ程度である。さて、この
常温精製装置４は、化学及び物理吸着剤４１、４２をこ
の順に収納して構成される。化学吸着剤４１としては、
重量％が６０（許容範囲５０〜７５％）の酸化ニッケル
（ＮｉＯ）及び４０（許容範囲２５〜５０％）の酸化ア
ルミニウム（Ａｌ2Ｏ3）を主成分とする吸着剤が採用さ
れており、物理吸着剤４２としては、重量％が４０（許
容範囲２５〜４５％）の酸化アルミニウム（Ａｌ
2Ｏ3）、４０（許容範囲３５〜５５％）の酸化シリコン
（ＳｉＯ2 ）及び２０（許容範囲１０〜３０％）の酸化
ナトリウム（Ｎａ2Ｏ）を主成分とするモレキュラーシ
ーブスが採用されている。モレキュラーシーブスの細孔
径としては、吸着除去に適切な径（４Ａ〜５Ａ程度）が
選択されている。The helium gas refining structure which is a feature of the present invention will be described below. This part is the above-mentioned ordinary temperature purification device 4 and low temperature purification device 6. Here, as for these operating temperatures, the ordinary temperature refining device 4 is at a so-called ordinary temperature, and that of the low temperature refining device 6 is about 70K and 20K. The room-temperature refining apparatus 4 is configured by storing the chemical and physical adsorbents 41 and 42 in this order. As the chemical adsorbent 41,
Adsorbents whose main components are 60% (allowable range 50 to 75%) nickel oxide (NiO) and 40% (allowable range 25% to 50%) aluminum oxide (Al 2 O 3 ) are employed. As the physical adsorbent 42, aluminum oxide (Al) having a weight percentage of 40 (permissible range: 25 to 45%) is used.
Molecular sieves containing, as main components, 2 O 3 ), 40 (permissible range 35 to 55%) silicon oxide (SiO 2 ) and 20 (permissible range 10 to 30%) sodium oxide (Na 2 O). I have. As the pore diameter of the molecular sieve, a diameter (approximately 4A to 5A) suitable for adsorption and removal is selected.
【００１０】各精製装置４、６の除去対象不純物につい
て説明すると、常温精製装置４では酸素、一酸化炭素、
二酸化炭素、水、水素、等が除去対象とされ、低温精製
装置６では窒素、メタンガス、水、二酸化炭素が除去対
象となる。また、化学・物理吸着材の配分構成は、被吸
着物である不純物ガスの構成に応じて適切に決定され
る。この構成において、低温精製装置６は冷凍機近くに
設置することとなるため、低温精製装置６に許容される
容積は少ない。従って、この精製装置６に割り当てるこ
とができる吸着能力（基本的には吸着剤の容積量が限定
されるために能力限界）に限りがあるため、常温精製装
置４で窒素、メタンガス以外の不純物はできる限り多く
除去する必要がある。ここで、常温精製装置４を不純物
吸着手段と称する。The impurities to be removed by each of the refining devices 4 and 6 will be described. In the ordinary temperature refining device 4, oxygen, carbon monoxide,
Carbon dioxide, water, hydrogen, and the like are to be removed, and the low-temperature purification device 6 is to remove nitrogen, methane gas, water, and carbon dioxide. Further, the distribution configuration of the chemical / physical adsorbent is appropriately determined according to the configuration of the impurity gas that is the substance to be adsorbed. In this configuration, since the low-temperature purification device 6 is installed near the refrigerator, the volume allowed for the low-temperature purification device 6 is small. Accordingly, since there is a limit in the adsorption capacity (basically, the capacity limit of the adsorbent is limited due to the limited amount of the adsorbent) which can be assigned to the purification device 6, impurities other than nitrogen and methane gas are removed by the room temperature purification device 4. It needs to be removed as much as possible. Here, the room temperature purification device 4 is referred to as an impurity adsorption unit.
【００１１】次に、図２に基づいて常温精製装置４、低
温精製装置６の構成について説明する。常温、及び低温
精製装置ではそのディメンジョンが異なるのみである。
精製装置においては、図において左側のガス入口４３か
ら処理対象のガスが流入し、吸着処理を受けた後、右端
のガス出口４４からガスが流出する。この装置は、円筒
形の精製器容器４５内に前記の吸着剤４１、４２を収納
して構成されるのであるが、容器４５内において吸着剤
４１、４２をその両端より流入側挟持部材４６と流出側
挟持部材４７で挟持する構成とされている。これらの挟
持部材４６、４７は、吸着剤４１、４２に近接する側か
ら、グラスウール層４６ａ、４７ａ、メタルフィルター
４６ｂ、４７ｂ、フィルター固定板４６ｃ、４７ｃを備
えている。ここで、メタルフィルター４６ｂ、４７ｂと
フィルター固定板４６ｃ、４７ｃとはそのフィルター４
６ｂ、４７ｂの周端部が溶接固定されている。さらに、
流入側挟持部材４６のフィルター固定板４６ｃは、これ
に固定されたメタルフィルター４６ｂとともにガスの流
路方向に摺動可能な構成とされ、そのガス流入側（非吸
着剤側）を弾性部材としてのスプリング４８で弾性保持
されている。一方、流出側挟持部材４７においては、そ
のフィルター固定板４７ａの流出側周縁部が精製器容器
４５に溶接固定されている。この構造を採用することに
より、装置に加えられる振動等により収納される吸着剤
４１、４２の微粉末が発生した場合にも、循環系１００
内にこの微粉末が混入することはない。Next, the configurations of the room temperature refining device 4 and the low temperature refining device 6 will be described with reference to FIG. Room temperature and low temperature refining apparatuses differ only in their dimensions.
In the refining device, the gas to be treated flows in from the gas inlet 43 on the left side in the figure, and after being subjected to the adsorption treatment, the gas flows out from the gas outlet 44 on the right end. In this apparatus, the adsorbents 41 and 42 are housed in a cylindrical purifier container 45. The adsorbents 41 and 42 are placed in the container 45 from both ends of the adsorbents 41 and 42 at the inflow side holding members 46. It is configured to be held by the outflow side holding member 47. These sandwiching members 46, 47 include glass wool layers 46a, 47a, metal filters 46b, 47b, and filter fixing plates 46c, 47c from the side close to the adsorbents 41, 42. Here, the metal filters 46b and 47b and the filter fixing plates 46c and 47c are
The peripheral ends of 6b and 47b are fixed by welding. further,
The filter fixing plate 46c of the inflow-side holding member 46 is configured to be slidable in the gas flow direction together with the metal filter 46b fixed thereto, and its gas inflow side (non-adsorbent side) is used as an elastic member. It is elastically held by a spring 48. On the other hand, in the outflow-side holding member 47, the outflow-side peripheral portion of the filter fixing plate 47a is fixed by welding to the purifier container 45. By employing this structure, even when fine powder of the adsorbents 41 and 42 to be stored is generated due to vibration or the like applied to the apparatus, the circulation system 100 can be used.
This fine powder does not mix into the inside.
【００１２】以下、本願のヘリウム液化装置１に於ける
常温精製装置４の入口ガス濃度と出口ガス濃度との関係
を、実験結果に基づいて説明する。表１には、この結果
が示されている。吸着対象のガスは、窒素、酸素、一酸
化炭素、二酸化炭素、メタン、水素である。Hereinafter, the relationship between the inlet gas concentration and the outlet gas concentration of the room temperature purifier 4 in the helium liquefaction apparatus 1 of the present invention will be described based on experimental results. Table 1 shows the results. The gases to be adsorbed are nitrogen, oxygen, carbon monoxide, carbon dioxide, methane, and hydrogen.
【００１３】[0013]
【表１】 [Table 1]
【００１４】結果、窒素以外のガスが良好に除去されて
いることがわかる。またここで、ガス内に含まれる水の
除去もおこなわれる。次に、低温精製装置６の除去性能
の試験結果について説明する。この結果が表２に示され
ている。As a result, it can be seen that gases other than nitrogen have been successfully removed. Here, the water contained in the gas is also removed. Next, test results of the removal performance of the low-temperature purification device 6 will be described. The results are shown in Table 2.
【００１５】[0015]
【表２】 [Table 2]
【００１６】これらの結果から低温精製装置においては
窒素ガスをよく除去出来ていることがわかる。以上に説
明したように、本願のヘリウム液化装置１は液体窒素ト
ラップ部を備える必要がないために、装置構成が簡単・
小型となり、その維持・管理も容易となる。従って長期
間に渡って安定して使用できるため、例えばリニアモー
ターカーに搭載可能なヘリウム液化装置となっており、
こういった例に採用する他、ＳＱＵＩＤ回路用の液体ヘ
リウム供給用回路に接続して、使用することも可能であ
る。 〔別実施例〕 以下に、その他の実施例について箇条書きする。 （イ）上記の実施例においては、熱交換器間においてガ
スを冷却するものとしては、冷凍機９を採用する例を示
したが、冷凍機９の代わりに膨張エンジンを採用しても
よい。従って、このようにガスを冷却する手段を寒冷発
生手段と称する。 （ロ）さらに本願の構成を採用する場合は、吸着剤４
１、４２として任意のものを選択することが可能である
ため、不純物が混入する可能性のある機器の方式、型
（例えばガス圧縮機１の型式等）に応じて精製装置内の
吸着剤の組成等は任意に変更することができる。From these results, it can be seen that nitrogen gas was successfully removed in the low-temperature purification apparatus. As described above, since the helium liquefaction apparatus 1 of the present application does not need to include a liquid nitrogen trap unit, the apparatus configuration is simple.
It becomes small and easy to maintain and manage. Therefore, since it can be used stably over a long period of time, it is a helium liquefier that can be mounted on a linear motor car, for example.
In addition to such an example, it is also possible to connect and use a liquid helium supply circuit for a SQUID circuit. [Another Embodiment] Hereinafter, other embodiments will be described in a bulleted manner. (A) In the above embodiment, an example in which the refrigerator 9 is employed as a device for cooling the gas between the heat exchangers is described. However, an expansion engine may be employed instead of the refrigerator 9. Therefore, such means for cooling the gas is referred to as cold generation means. (B) When the configuration of the present application is further employed, the adsorbent 4
Since it is possible to select arbitrary ones as 1 and 42, the adsorbent in the refining apparatus can be selected according to the type and type of equipment (for example, the type of the gas compressor 1) into which impurities may be mixed. The composition and the like can be arbitrarily changed.
【００１７】尚、特許請求の範囲の項に図面との対照を
便利にするために符号を記すが、該記入により本発明は
添付図面の構成に限定されるものではない。In the claims, reference numerals are provided for convenience of comparison with the drawings, but the present invention is not limited to the configuration shown in the attached drawings.
【００１８】[0018]
【図１】本願のヘリウム液化装置の構成図FIG. 1 is a configuration diagram of a helium liquefaction apparatus of the present application.
【図２】ガス精製装置の断面図FIG. 2 is a cross-sectional view of a gas purification device.
【図３】従来のヘリウム液化装置の構成図FIG. 3 is a configuration diagram of a conventional helium liquefaction apparatus.
１ ヘリウム液化装置 ２ ガス圧縮器 ４ 不純物吸着手段 ５ 熱交換器 ７ ジュールトムソン弁 ９ 寒冷発生手段 ４１ 化学吸着剤 ４２ 物理吸着剤 １００ ヘリウム循環系 DESCRIPTION OF SYMBOLS 1 Helium liquefaction apparatus 2 Gas compressor 4 Impurity adsorption means 5 Heat exchanger 7 Joule Thomson valve 9 Cold generation means 41 Chemical adsorbent 42 Physical adsorbent 100 Helium circulation system
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭51−59200（ＪＰ，Ａ) 実開 昭56−27590（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) F25J 1/00 B01D 53/02 B01D 53/04 B01J 20/08 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-51-59200 (JP, A) JP-A-56-27590 (JP, U) (58) Fields investigated (Int. Cl. 7 , DB name) F25J 1/00 B01D 53/02 B01D 53/04 B01J 20/08
Claims (2)
機（２）、熱交換器（５）、ジュール・トムソン弁
（７）、および寒冷発生手段（９）を備えて構成される
ヘリウム液化装置において、 前記ガス圧縮機（２）と前記熱交換器（５）の間の前記
循環系（１００）部位に、ヘリウムガス中の不純物を除
去する常温稼動の不純物吸着手段（４）を介装し、 前記常温稼動の不純物吸着手段（４）に、化学吸着剤
（４１）としてのニッケル触媒および物理吸着剤（４
２）を収納したヘリウム液化装置。 1. A helium liquefaction system comprising a helium circulation system (100) equipped with a gas compressor (2), a heat exchanger (5), a Joule-Thomson valve (7), and a cold generation means (9). In the apparatus, impurities in helium gas are removed to a portion of the circulation system (100) between the gas compressor (2) and the heat exchanger (5).
The room temperature operating impurity adsorbing means (4) is interposed, and the room temperature operating impurity adsorbing means (4) is provided with a chemical adsorbent.
Nickel catalyst and physical adsorbent (4) (4)
A helium liquefaction device containing 2).
ル触媒が、重量％が５０〜７５％の酸化ニッケル（Ｎｉ
Ｏ）及び２５〜５０％の酸化アルミニウム（Ａｌ
2 Ｏ3 ）を主成分とするものであり、 前記物理吸着剤（４２）が、重量％が２５〜４５％の酸
化アルミニウム（Ａｌ2 Ｏ3 ）、３５〜５５％の酸化シ
リコン（ＳｉＯ2 ）及び１０〜３０％の酸化ナトリウム
（Ｎａ2 Ｏ）を主成分とするものである請求項１記載の
ヘリウム液化装置。2. Nickel as said chemical adsorbent (41)
Catalyst is composed of 50-75% by weight of nickel oxide (Ni
O) and 25-50% aluminum oxide (Al
2 O 3 ) as a main component, wherein the physical adsorbent (42) is composed of aluminum oxide (Al 2 O 3 ) having a weight percentage of 25 to 45% and silicon oxide (SiO 2 ) having a weight percentage of 35 to 55%. and 10-30% sodium oxide (Na 2 O) helium liquefying apparatus according to claim 1, wherein as a main component.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26011091A JP3213025B2 (en) | 1991-10-08 | 1991-10-08 | Helium liquefaction equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26011091A JP3213025B2 (en) | 1991-10-08 | 1991-10-08 | Helium liquefaction equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0599565A JPH0599565A (en) | 1993-04-20 |
| JP3213025B2 true JP3213025B2 (en) | 2001-09-25 |
Family
ID=17343427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26011091A Expired - Fee Related JP3213025B2 (en) | 1991-10-08 | 1991-10-08 | Helium liquefaction equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3213025B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3305508B2 (en) * | 1994-08-24 | 2002-07-22 | アイシン精機株式会社 | Cooling system |
| US7314506B2 (en) * | 2004-10-25 | 2008-01-01 | Matheson Tri-Gas, Inc. | Fluid purification system with low temperature purifier |
| JP6402430B2 (en) * | 2015-03-31 | 2018-10-10 | 大陽日酸株式会社 | Liquid helium filter and liquid helium filter unit |
| CN113532020A (en) * | 2021-07-28 | 2021-10-22 | 重庆天原化工有限公司 | Chloromethane compression system |
-
1991
- 1991-10-08 JP JP26011091A patent/JP3213025B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0599565A (en) | 1993-04-20 |
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| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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| LAPS | Cancellation because of no payment of annual fees |