JP3212321B2 - Method for manufacturing plasma display element - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates relates to a method for manufacturing a plasma display element, more particularly to a method of manufacturing a plasma display element having a cathode structurally sound low line resistance and high strength.

[0002]

2. Description of the Related Art As shown in FIG. 3, a general plasma display element has a front panel 1 which is maintained at a constant interval by a partition wall B.
An anode A and a cathode K are arranged and formed in an XY matrix on each inner surface of the back plate 20 and the back plate 20. Here, the anode A is generally made of a transparent ITO thin film because it is located on the traveling path of visible light generated between the cathode K and the anode A.

[0003]

In such a conventional plasma display device, the material of the above-mentioned cathode K must be selected from those having an ion bombardment resistance, and a complicated and complicated film formation is required. If it is necessary to go through the process, there is a problem that the defective rate becomes very high. Moreover, in order to realize a high-definition image, it is necessary to arrange the cathodes at a very high density. However, there is a certain limit in increasing the density of the cathodes due to a limitation in film forming technology.
In this case, the line resistance of the cathode becomes extremely high, the power consumption becomes high, and the image quality is deteriorated, and the life is shortened.

[0004]

[0005] The present invention provides a structurally sound, low wire resistance and high
And to provide a method for producing a most matched plasma display device for producing a plasma display device having a cathode have strength.

In order to achieve the above-mentioned object, a method of manufacturing a plasma display device according to the present invention comprises a front plate and a back plate.
And two substrates arranged in an XY matrix.
Partition walls to prevent crosstalk between poles and cathodes and pixels
The cathode is formed of a thin metal wire,
In the method of manufacturing a plasma display device fixed to a plate
To arrange a number of metal wires in parallel,
Parallel multiple thermoplastic yarns in the direction perpendicular to the metal wire
The composite fibers arranged in a matrix are fixed to the back plate,
Firing the conjugate fiber to remove the thermoplastic yarn.
It is further characterized in that the cathode is formed .

[0007]

[0008]

The method for manufacturing the plasma display element of the present invention comprises:
Very suitable for arranging linear cathodes on the back plate
It is suitable for mass production of products.

[0009]

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to embodiments shown in the drawings.

FIG. 1 shows a semiconductor device manufactured by the manufacturing method of the present invention.
A plasma display device is shown. In this plasma display element, a cathode K and an anode A are arranged in an XY matrix on each inner surface of a front plate 10 and a back plate 20 which maintain a constant interval. Is configured such that partition walls B having a fixed height are arranged and formed at fixed intervals.

On the other hand, the cathode K indicates a characteristic element of the present invention. The cathode K is made of a thin metal wire, and the metal wire is fixed to the insulating adhesive layer 21 on the surface of the back plate 20 at high density with a constant interval.

The cathode of the plasma display device of this embodiment is characterized in that it has a very strong structure and is resistant not only to electric shock but also has a very small line resistance due to its wide cross-sectional area. In addition, since the size of the cathode depends on the diameter of the metal wire, the interval between the cathodes can be easily adjusted. In particular, since the interval between the cathodes can be extremely narrow, a screen with a high pixel density can be formed. is there.

The plasma display element of this embodiment having such a structure is preferably manufactured by the following manufacturing method.

The material of the cathode used in the present invention includes:
There is a composite fiber 1 as shown in FIG. This composite fiber 1
Is composed of a weft composed of a large number of metal wires 3 maintaining a predetermined interval and a warp composed of a thermoplastic synthetic resin wire 2, and the interval between a pair of adjacent metal wires 3 is 3 Are formed at intervals corresponding to the design interval between the adjacent pair of cathodes K, K. A metal such as stainless steel is applied as a material of the metal wire 3, but the type thereof can be changed according to design standards. As the thermoplastic synthetic resin wire 2, for example, polyester is used.

A method for manufacturing a cathode of a plasma display device using such a composite fiber 1 is as follows.

First, the composite fiber 1 described above is attached and fixed to the back plate 20 with an insulating adhesive layer. The adhesive layer used at this time must be a heat-resistant material having a higher firing temperature than the synthetic resin wire 2 of the composite fiber 1.

After the composite fiber 1 is fixed in this way, the entire back plate 20 is put into a firing furnace to incinerate and remove the warp. In this way, the metal wire 3 which is the weft of the composite fiber 1 is left on the back plate 20 as the cathode K.

Next, an anode A and a partition B are formed on the front plate 10 through a normal process, and these are combined to complete one plasma display device.

The plasma display element of this embodiment has a structurally solid, low line resistance and a high strength cathode K.

Further, according to the method of manufacturing a plasma display device of the present embodiment, the plasma display device of FIG. 1 can be formed.

The present invention is not limited to the embodiment described above, and various modifications can be made as needed.

[0023]

As described above, the method of manufacturing a plasma display device according to the present invention uses a composite fiber to form a back surface.
The whole cathode can be formed simultaneously on the plate
You. . In addition, the interval between the cathodes can be extremely narrow.
Is extremely narrow compared to the conventional minimum width of 200 μm.
Cathodes at an interval of 55 μm can be obtained.

[0024]

[Brief description of the drawings]

FIG. 1 is a schematic perspective view showing an embodiment of a plasma display element manufactured by a manufacturing method of the present invention.

FIG. 2 is a perspective view of the composite fiber of FIG. 1;

FIG. 3 is a schematic perspective view of a conventional plasma display element.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Composite fiber 2 Synthetic resin wire 3 Metal wire 10 Front plate 20 Back plate 21 Insulating adhesive layer A Anode K Cathode

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. ⁷ , DB name) H01J 9/02 H01J 11/00 H01J 17/06 H01J 17/49

Claims (1)

(57) [Claims] 1. An image display apparatus comprising: two substrates including a front plate and a back plate; an anode and a cathode arranged in an XY matrix; and a partition for preventing crosstalk between pixels. In a method of manufacturing a plasma display element formed by wires and fixed to the back plate, a large number of metal wires are arranged in parallel, and a large number of thermoplastic yarns in a direction perpendicular to these metal wires are arranged in parallel. Fixing said composite fiber to said back plate, and baking said composite fiber to remove said thermoplastic yarn, thereby forming said cathode.