JP3204734B2 - Epoxy resin composition for sealing electronic parts - Google Patents

Epoxy resin composition for sealing electronic parts

Info

Publication number
JP3204734B2
JP3204734B2 JP12659492A JP12659492A JP3204734B2 JP 3204734 B2 JP3204734 B2 JP 3204734B2 JP 12659492 A JP12659492 A JP 12659492A JP 12659492 A JP12659492 A JP 12659492A JP 3204734 B2 JP3204734 B2 JP 3204734B2
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
fused silica
parts
molecule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP12659492A
Other languages
Japanese (ja)
Other versions
JPH05279553A (en
Inventor
紳一 原井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Risho Kogyo Co Ltd
Original Assignee
Risho Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Risho Kogyo Co Ltd filed Critical Risho Kogyo Co Ltd
Priority to JP12659492A priority Critical patent/JP3204734B2/en
Publication of JPH05279553A publication Critical patent/JPH05279553A/en
Application granted granted Critical
Publication of JP3204734B2 publication Critical patent/JP3204734B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は電子部品封止用エポキ
シ樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for sealing electronic parts.

【0002】[0002]

【従来技術およびその問題点】エポキシ樹脂は一般に成
形性・接着性・力学的強度・電気特性・耐熱性などに優
れるが、電子部品封止用として用いる場合、加熱成形時
や成形後の取り扱い時の温度変化に伴う内部応力により
クラックが発生し易いという問題点があり、電子部品の
大スケール化に際して或いはパッケージの小型化、薄型
化に際して更に大きな問題点になる。係る問題点の改善
を計る方法の一つとして、無機充填材の添加量を増加す
る事により低熱膨張化し内部応力を低減しようとする試
みがなされたが、流れ性が低下するという問題が生じ、
球状充填材を破砕状充填材と併用することによりその問
題を解決しようとする試みがなされた(特開昭58−1
38740号公報)。しかしながら、球状充填材の添加
量を増加させると、力学的強度が低下したり成形時にバ
リが発生し易く作業性を著しく低下させるという問題点
がある。
[Prior art and its problems] Epoxy resins are generally excellent in moldability, adhesiveness, mechanical strength, electrical properties, heat resistance, etc., but when used for sealing electronic parts, they are used during heat molding and handling after molding. There is a problem that cracks easily occur due to the internal stress caused by the temperature change, which is a further problem when the electronic components are scaled up or when the package is reduced in size and thickness. As one of the methods of measuring the improvement of such a problem, an attempt was made to reduce the internal stress with a low thermal expansion by increasing the amount of the inorganic filler to be added.
Attempts have been made to solve the problem by using a spherical filler together with a crushed filler (Japanese Patent Laid-Open No. 58-1).
38740). However, when the amount of the spherical filler added is increased, there is a problem that the mechanical strength is reduced and burrs are easily generated at the time of molding, so that workability is significantly reduced.

【0003】[0003]

【問題点を解決するための手段】この発明の電子部品封
止用エポキシ樹脂組成物は、上記の問題点を解決するた
めに、エポキシ樹脂、硬化剤、硬化促進剤、無機充填材
から成るエポキシ樹脂組成物において、無機充填材が破
砕状および球状の無機充填材からなり、球状無機充填材
が無機充填材中に5〜90重量%含まれ、破砕状無機充
填材を分子内にエポキシ基を有するシランカップリング
剤で表面処理し、球状無機充填材を分子内にアミノ基お
よび/またはイミノ基を有するシランカップリング剤で
表面処理するように構成したのである。この発明に用い
るエポキシ樹脂は例えばビスフェノールA型、ノボラッ
ク型、脂環系、線状脂肪酸系、ハロゲン化系の各エポキ
シ樹脂の1種もしくは2種以上を併用して用いることが
できるが、これらのものに限定するものではない。この
発明に用いる硬化剤は上記エポキシ樹脂に使用される硬
化剤の何れであっても良く、例えば、無水フタル酸など
の酸無水物、ジアミノジフェニルスルフォンなどのアミ
ン類、フェノールノボラック樹脂、クレゾールノボラッ
ク樹脂などを用いる事ができるが、これらのものに限定
するものではない。この発明に用いる硬化促進剤は上記
エポキシ樹脂とその硬化剤との反応を促進させるもので
あれば何れであっても良く、例えば、2,4,6−トリ
ス(ジメチルアミノメチル)フェノール、ベンジルジメ
チルアミンなどの第三アミン、2−メチルイミダゾール
などのイミダゾール類、トリフェニルホスフィンなどの
有機ホスフィン類や1,8−ジアザビシクロ(5,4,
0)ウンデセン−7とその誘導体等を用いる事ができる
がこれらのものに限定するものではない。この発明に用
いる無機充填材は例えば溶融シリカ、アルミナ、マグネ
シア、炭酸カルシウム等を例示できる。この発明に用い
る分子内にエポキシ基を有するシランカップリング剤は
β−(3,4エポキシシクロヘキシル)エチルトリメト
キシシランやγ−グリシドキシプロピルトリメトキシシ
ランなどを用いる事ができるがこれらのものに限定する
ものではなく、分子内にアミノ基および/またはイミノ
基を有するシランカップリング剤はN−β(アミノエチ
ル)γ−アミノプロピルメチルジメトキシシランやN−
フェニル−γ−アミノプロピルトリメトキシシランなど
を用いる事ができるがこれらのものに限定するものでは
ない。本発明に係るエポキシ樹脂組成物は必要に応じて
離型剤、着色剤、難燃剤などを適宜添加しても差し支え
ない。
SUMMARY OF THE INVENTION An epoxy resin composition for encapsulating electronic parts according to the present invention is an epoxy resin comprising an epoxy resin, a curing agent, a curing accelerator, and an inorganic filler to solve the above-mentioned problems. In the resin composition, the inorganic filler comprises crushed and spherical inorganic fillers, the spherical inorganic filler is contained in the inorganic filler in an amount of 5 to 90% by weight, and the crushed inorganic filler has an epoxy group in a molecule. The surface treatment is carried out with a silane coupling agent having the same, and the spherical inorganic filler is treated with a silane coupling agent having an amino group and / or an imino group in the molecule. The epoxy resin used in the present invention may be, for example, one or two or more of bisphenol A type, novolak type, alicyclic, linear fatty acid, and halogenated epoxy resins. It is not limited to those. The curing agent used in the present invention may be any of the curing agents used in the epoxy resin, for example, acid anhydrides such as phthalic anhydride, amines such as diaminodiphenylsulfone, phenol novolak resin, and cresol novolak resin. Etc. can be used, but it is not limited to these. The curing accelerator used in the present invention may be any as long as it promotes the reaction between the epoxy resin and the curing agent. Examples thereof include 2,4,6-tris (dimethylaminomethyl) phenol and benzyldimethyl. Tertiary amines such as amines, imidazoles such as 2-methylimidazole, organic phosphines such as triphenylphosphine, and 1,8-diazabicyclo (5,4,
0) Undecene-7 and its derivatives can be used, but it is not limited to these. Examples of the inorganic filler used in the present invention include fused silica, alumina, magnesia, and calcium carbonate. As the silane coupling agent having an epoxy group in the molecule used in the present invention, β- (3,4 epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane and the like can be used. Without limitation, silane coupling agents having an amino group and / or imino group in the molecule include N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane and N-β
Phenyl-γ-aminopropyltrimethoxysilane or the like can be used, but is not limited thereto. The epoxy resin composition according to the present invention may optionally contain a release agent, a coloring agent, a flame retardant, and the like as needed.

【0004】[0004]

【実施例1】破砕状充填材(溶融シリカFS−74 電
気化学工業(株)製)240部を分子内にエポキシ基を
有するシランカップリング剤KBM303(信越化学工
業(株)製)2.4部で表面処理したもの、及び球状充
填材(溶融シリカFB−74電気化学工業(株)製)3
60部をアミノ基及びイミノ基を有するシランカップリ
ング剤KBM602(信越化学工業(株)製)3.6部
で表面処理したものに、o−クレゾールノボラック型エ
ポキシ樹脂(ESCN−195XL 住友化学工業
(株)製)100部、フェノールノボラック樹脂(タマ
ノル758 荒川化学工業(株)製)50部、トリフェ
ニルホスフィン1.5部、離型剤(WAXOP ヘキス
ト製)5部をミキサーにて充分混合した後、加熱ロール
(100℃)にて混練し、冷却後粉砕しエポキシ樹脂組
成物を得た。
Example 1 240 parts of a crushed filler (fused silica FS-74 manufactured by Denki Kagaku Kogyo Co., Ltd.) was used as a silane coupling agent having an epoxy group in a molecule KBM303 (manufactured by Shin-Etsu Chemical Co., Ltd.) 2.4 Surface-treated at the part, and spherical filler (fused silica FB-74 manufactured by Denki Kagaku Kogyo Co., Ltd.) 3
An o-cresol novolak type epoxy resin (ESCN-195XL Sumitomo Chemical Co., Ltd.) 100 parts), 50 parts of phenol novolak resin (Tamanol 758, manufactured by Arakawa Chemical Industries, Ltd.), 1.5 parts of triphenylphosphine, and 5 parts of a release agent (manufactured by WAXOP Hoechst). The mixture was kneaded with a heating roll (100 ° C.), cooled and pulverized to obtain an epoxy resin composition.

【0005】[0005]

【実施例2】実施例2は実施例1に於ける無機充填材を
破砕状充填材(溶融シリカFS−74)120部をエポ
キシ基を分子内に有するシランカップリング剤(KBM
303)1.2部で表面処理したもの及び球状充填材
(溶融シリカFB−74)480部を分子内にイミノ基
を有するシランカップリング剤(KBM573 信越化
学工業(株)製)で表面処理したものを用いる外はすべ
て実施例1と同一にしてエポキシ樹脂組成物を得た。
Embodiment 2 In the embodiment 2, a silane coupling agent (KBM) having 120 parts of a crushed inorganic filler (fused silica FS-74) and an epoxy group in a molecule is used.
303) Surface-treated with 1.2 parts and 480 parts of a spherical filler (fused silica FB-74) were surface-treated with a silane coupling agent having an imino group in a molecule (KBM573, manufactured by Shin-Etsu Chemical Co., Ltd.). An epoxy resin composition was obtained in the same manner as in Example 1 except that the epoxy resin composition was used.

【0006】[0006]

【比較例1】比較例1は実施例1に於ける無機充填材を
破砕状充填材(溶融シリカFS−74)450部をエポ
キシ基を分子内に有するシランカップリング剤(KBM
303)4.5部で表面処理したものを用いる外はすべ
て実施例1と同一にしてエポキシ樹脂組成物を得た。
Comparative Example 1 In Comparative Example 1, 450 parts of the crushed inorganic filler (fused silica FS-74) in Example 1 was replaced with a silane coupling agent (KBM) having an epoxy group in the molecule.
303) An epoxy resin composition was obtained in the same manner as in Example 1 except that the surface-treated one in 4.5 parts was used.

【0007】[0007]

【比較例2】比較例2は実施例1に於ける無機充填材と
して破砕状充填材(溶融シリカFS−74)600部を
分子内にエポキシ基を有するシランカップリング剤(K
BM303)6部で表面処理したものを用いる外はすべ
て実施例1と同一にしてエポキシ樹脂組成物を得た。
Comparative Example 2 In Comparative Example 2, 600 parts of a crushed filler (fused silica FS-74) was used as the inorganic filler in Example 1, and a silane coupling agent (K) having an epoxy group in the molecule was used.
BM303) An epoxy resin composition was obtained in the same manner as in Example 1 except that the surface-treated epoxy resin composition was used in 6 parts.

【0008】[0008]

【比較例3】比較例3は実施例1に於ける無機充填材に
換えて破砕状充填材(溶融シリカFS−74)240部
と球状充填材(溶融シリカFB−74)360部を分子
内にエポキシ基を有するシランカップリング剤(KBM
303)6部で表面処理したものを用いる外はすべて実
施例1と同一にしてエポキシ樹脂組成物を得た。
Comparative Example 3 In Comparative Example 3, 240 parts of a crushed filler (fused silica FS-74) and 360 parts of a spherical filler (fused silica FB-74) were substituted for the inorganic filler in Example 1 in the molecule. Coupling Agent with Epoxy Group (KBM)
303) An epoxy resin composition was obtained in the same manner as in Example 1 except that the surface-treated epoxy resin was used in 6 parts.

【0009】[0009]

【比較例4】比較例4は実施例1に於ける無機充填材に
換えて破砕状充填材(溶融シリカFS−74)240部
と球状充填材(溶融シリカFB−74)360部を分子
内にアミノ基及びイミノ基を有するシランカップリング
剤(KBM602)6部で表面処理したものを用いる外
はすべて実施例1と同一にしてエポキシ樹脂組成物を得
た。この様にして得られた6種の電子部品封止用エポキ
シ樹脂組成物の流れ性(スパイラルフロー)、線膨張係
数、曲げ強さ、バリの測定を行い、その結果を次の表1
に示す。
Comparative Example 4 In Comparative Example 4, 240 parts of a crushed filler (fused silica FS-74) and 360 parts of a spherical filler (fused silica FB-74) were used in place of the inorganic filler in Example 1 in the molecule. An epoxy resin composition was obtained in the same manner as in Example 1 except that a surface-treated silane coupling agent (KBM602) having an amino group and an imino group was used. The flowability (spiral flow), coefficient of linear expansion, bending strength, and burr of the six types of epoxy resin compositions for encapsulating electronic components thus obtained were measured, and the results were shown in Table 1 below.
Shown in

【0010】[0010]

【表1】 (1) 流れ性(スパイラルフロー)の測定条件:EM
MI−1−66に準拠し、成形温度175℃、成形圧力
70kgf/cmで測定した。 (2) 線膨張係数の測定条件:成形温度175℃、成
形圧力70kgf/cm、成形時間90秒により試験
片を作成し、175℃×5時間の加熱硬化後にTMA法
により測定した。 (3) 曲げ強さの測定条件:成形温度175℃、成形
圧力70kgf−cm、成形時間90秒により試験片
を作成し、175℃×5時間の加熱硬化後にJIS K
6911に準拠して測定した。 (4) バリの測定条件:16pinのDIP金型を用
いて成形温度175℃、成形圧力70kgf−cm
成形時間90秒で成形し、エアーベントのバリ長さが
0.5mm未満は◎印、0.5mm以上1.5mm未満
は○印、1.5mm以上は×印で判定した。
[Table 1] (1) Flow condition (spiral flow) measurement conditions: EM
It was measured at a molding temperature of 175 ° C. and a molding pressure of 70 kgf / cm 2 according to MI-1-66. (2) Measurement conditions of linear expansion coefficient: A test piece was prepared at a molding temperature of 175 ° C., a molding pressure of 70 kgf / cm 2 , and a molding time of 90 seconds, and measured by a TMA method after heat curing at 175 ° C. × 5 hours. (3) Measuring conditions of bending strength: A test piece was prepared at a molding temperature of 175 ° C., a molding pressure of 70 kgf-cm 2 , and a molding time of 90 seconds, and JIS K after heat curing at 175 ° C. × 5 hours.
It was measured according to 6911. (4) Burr measurement conditions: using a 16-pin DIP mold, a molding temperature of 175 ° C., a molding pressure of 70 kgf-cm 2 ,
Molding was performed for a molding time of 90 seconds, and the burrs of the air vents were judged as ◎ when the length was less than 0.5 mm, as は when 0.5 mm or more and less than 1.5 mm, and as X when 1.5 mm or more.

【0011】[0011]

【発明の効果】無機充填材として分子内にエポキシ基を
有するシランカップリング剤で表面処理した破砕状充填
材と、分子内にアミノ基および/またはイミノ基を有す
るシランカップリング剤で表面処理した球状充填剤とを
併用したエポキシ樹脂組成物を使用することにより、流
れ性、力学的強度、成形作業性などの低下なしに、無機
充填材の高充填が可能となり、低熱膨張化を達成するこ
とができる。
EFFECTS OF THE INVENTION A crushed filler surface-treated with a silane coupling agent having an epoxy group in the molecule as an inorganic filler and a surface treatment with a silane coupling agent having an amino group and / or an imino group in the molecule. By using an epoxy resin composition that is used in combination with a spherical filler, it becomes possible to highly fill an inorganic filler without lowering flowability, mechanical strength, molding workability, etc., and achieve low thermal expansion. Can be.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平4−18445(JP,A) 特開 平2−124925(JP,A) 特開 平2−124923(JP,A) 特開 昭64−38451(JP,A) 特開 平3−134051(JP,A) 特開 平2−228354(JP,A) 特開 平4−50222(JP,A) 特開 平3−201470(JP,A) 特開 平1−165655(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08L 63/00 - 63/10 C08K 3/36 C08K 9/06 H01L 23/29 ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-4-18445 (JP, A) JP-A-2-124925 (JP, A) JP-A-2-124923 (JP, A) JP-A 64-64 38451 (JP, A) JP-A-3-134405 (JP, A) JP-A-2-228354 (JP, A) JP-A-4-50222 (JP, A) JP-A-3-201470 (JP, A) JP-A-1-165655 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C08L 63/00-63/10 C08K 3/36 C08K 9/06 H01L 23/29

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 エポキシ樹脂、硬化剤、硬化促進剤、溶
融シリカからなるエポキシ樹脂組成物において、溶融シ
リカが破砕状および球状の溶融シリカからなり溶融シリ
カ中に球状溶融シリカが5〜90重量%含まれ、破砕状
溶融シリカを分子内にエポキシ基を有するシランカップ
リング剤で表面処理し、球状溶融シリカを分子内にアミ
ノ基および/またはイミノ基を有するシランカップリン
グ剤で表面処理したことを特徴とする電子部品封止用エ
ポキシ樹脂組成物。
1. A epoxy resin, curing agent, curing accelerator, in an epoxy resin composition comprising fused silica, spherical fused silica is 5-90 wt% to the molten silica made of fused silica is crushed or spherical fused silica And that the surface of the crushed fused silica was treated with a silane coupling agent having an epoxy group in the molecule, and the surface of the spherical fused silica was treated with a silane coupling agent having an amino group and / or an imino group in the molecule. An epoxy resin composition for sealing electronic components.
JP12659492A 1992-04-02 1992-04-02 Epoxy resin composition for sealing electronic parts Expired - Fee Related JP3204734B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12659492A JP3204734B2 (en) 1992-04-02 1992-04-02 Epoxy resin composition for sealing electronic parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12659492A JP3204734B2 (en) 1992-04-02 1992-04-02 Epoxy resin composition for sealing electronic parts

Publications (2)

Publication Number Publication Date
JPH05279553A JPH05279553A (en) 1993-10-26
JP3204734B2 true JP3204734B2 (en) 2001-09-04

Family

ID=14939053

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12659492A Expired - Fee Related JP3204734B2 (en) 1992-04-02 1992-04-02 Epoxy resin composition for sealing electronic parts

Country Status (1)

Country Link
JP (1) JP3204734B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5507477B2 (en) * 2011-01-20 2014-05-28 パナソニック株式会社 Epoxy resin composition for semiconductor encapsulation and semiconductor device
CN115260837B (en) * 2022-08-03 2023-06-06 福建泰新泉科技有限公司 Pigment treatment method and water-based high-temperature-resistant ink composition

Also Published As

Publication number Publication date
JPH05279553A (en) 1993-10-26

Similar Documents

Publication Publication Date Title
US6297306B1 (en) Semiconductor encapsulating epoxy resin composition and semiconductor device
JP3204734B2 (en) Epoxy resin composition for sealing electronic parts
JP3267144B2 (en) Epoxy resin composition for sealing material and semiconductor device using the same
JP3317115B2 (en) Epoxy resin composition for sealing material, method for producing the same, and inorganic filler
JP3418875B2 (en) Epoxy resin composition for semiconductor encapsulation
JP2867471B2 (en) Resin composition
JPH0977958A (en) Epoxy resin composition and semiconductor device
JPH07242799A (en) Epoxy resin composition for semiconductor sealing
JP2001114994A (en) Epoxy resin composition and semiconductor device
JPH08337634A (en) Epoxy resin composition and semiconductor device sealed therewith
JPH10182941A (en) Epoxy resin composition
JPH02235918A (en) Epoxy resin composition for semiconductor sealing
JPS6375025A (en) Epoxy resin composition for sealing semiconductor
JPH1112442A (en) Sealing resin composition and sealed semiconductor device
JP2002284961A (en) Epoxy-based resin composition and semiconductor device using the same
JPS63189421A (en) Epoxy resin composition for sealing semiconductor
JPH0676539B2 (en) Epoxy-containing composition for semiconductor encapsulation
JP3262918B2 (en) Sealing material, sealing method, and semiconductor device using sealing material
JP2001031842A (en) Epoxy resin composition and semiconductor device
JP2002284965A (en) Epoxy-based resin composition and semiconductor device using the same
JP2003105066A (en) Epoxy resin composition and semiconductor device
JP3863150B2 (en) Epoxy resin composition and semiconductor device
JPH06271647A (en) Epoxy resin molding material for sealing electronic component
JPH04209621A (en) Epoxy resin composition
JPS6377930A (en) Epoxy resin composition for sealing semiconductor

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080629

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090629

Year of fee payment: 8

LAPS Cancellation because of no payment of annual fees