JP3200588B2 - Laser distortion processing method and apparatus - Google Patents

Laser distortion processing method and apparatus

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Publication number
JP3200588B2
JP3200588B2 JP10392098A JP10392098A JP3200588B2 JP 3200588 B2 JP3200588 B2 JP 3200588B2 JP 10392098 A JP10392098 A JP 10392098A JP 10392098 A JP10392098 A JP 10392098A JP 3200588 B2 JP3200588 B2 JP 3200588B2
Authority
JP
Japan
Prior art keywords
laser
main surface
workpiece
distortion
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10392098A
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Japanese (ja)
Other versions
JPH11285869A (en
Inventor
達也 山崎
滋 田口
定彦 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
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Sumitomo Heavy Industries Ltd
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Priority to JP10392098A priority Critical patent/JP3200588B2/en
Publication of JPH11285869A publication Critical patent/JPH11285869A/en
Application granted granted Critical
Publication of JP3200588B2 publication Critical patent/JP3200588B2/en
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術の分野】本発明は、板状被加工部材
に加工を施して該被加工部材を歪ませる(反らせる)歪
加工方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for processing a plate-shaped workpiece to deform (warp) the workpiece.

【0002】[0002]

【従来の技術】アルチックと呼ばれる板状スライダの一
方の主面にダイヤモンドで傷をつけて、該スライダの主
面(表面)が凸状になるように板状スライダを歪ませる
(反らせる)ことは知られている。
2. Description of the Related Art It is not possible to distort (warp) a plate-like slider called an "Altic" by scratching one main surface of the plate-like slider with diamond, so that the main surface (surface) of the slider becomes convex. Are known.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、ダイヤ
モンドによる加工では、多数の板状部材に対して同じ傷
をつけることは容易でなく、また、加工に時間がかかっ
て生産性も高くなかった。
However, in the processing using diamond, it is not easy to make the same scratch on a large number of plate-like members, and it takes a long time to perform the processing, and the productivity is not high.

【0004】本発明は、前記諸点に鑑みなされたもので
あり、その目的とするところは、板状被加工部材に所定
の歪み(反り)を短時間で付与し得る歪加工方法及び装
置を提供することにある。
The present invention has been made in view of the above points, and an object of the present invention is to provide a strain processing method and apparatus which can apply a predetermined strain (warp) to a plate-shaped workpiece in a short time. Is to do.

【0005】[0005]

【課題を解決するための手段】本発明のレーザ加工方法
は、前記目的を達成すべく、スライダ用の板状の被加工
部材の一方の主面にレーザ光を照射して該主面の側が凹
状になるように板状被加工部材を歪ませることからな
り、より詳しくは、特に、板状の被加工部材の一方の主
面の所定形状の被照射領域に該領域の面積及び形状に対
応する広い照射面積のレーザ光を照射して該主面の側が
直交する二方向の夫々に関して凹状になるように板状被
加工部材を歪ませてスライダを形成することからなる。
明細書における以下の記載において、この段落に記載の
条件を満たさない部分については、文言上、特許請求の
範囲に記載の発明の範囲外である。
In order to achieve the above object, a laser processing method according to the present invention irradiates a laser beam to one principal surface of a plate- like workpiece to be processed for a slider so that a side of the principal surface is irradiated. The method comprises distorting a plate-shaped workpiece so as to be concave, and more specifically, corresponds to an area and shape of a predetermined shape of an irradiation area of one main surface of the plate-shaped workpiece. distort the plate workpiece to be concave by irradiating a laser beam with respect to s bidirectional husband side of the main surface is perpendicular to a wide irradiation area which consists Rukoto form a slider.
In the following description of the specification, portions that do not satisfy the conditions described in this paragraph are literally outside the scope of the invention described in the claims.

【0006】すなわち、本発明のレーザ歪加工方法は、
板状被加工部材の一方の主面にレーザ光を照射すること
によって被照射部を局所加熱すると共に該局所加熱後の
急冷に伴う引張(収縮)応力を被照射部に残留させ、被
照射部を含む側の主面が凹状になるように被加工部材を
変形させるものである。このように、本発明は、レーザ
光によって被加工部材に幾何学的形状の変化(歪み)を
生じさせるもので、このような加工を、この明細書で
は、「レーザ歪加工」という。
That is, the laser distortion processing method of the present invention comprises:
By irradiating one main surface of the plate-shaped workpiece with laser light, the irradiated portion is locally heated, and tensile (shrinkage) stress accompanying rapid cooling after the local heating is left in the irradiated portion. The workpiece is deformed so that the main surface on the side including the shape becomes concave. As described above, in the present invention, a workpiece is caused to change in geometrical shape (distortion) by laser light, and such processing is referred to as “laser distortion processing” in this specification.

【0007】この明細書において、被加工部材について
「板状」とは、レーザ光の照射を行った部分(被照射
部)の収縮に伴って被加工部材の形状が変えられ得るよ
うな形状のものであることをいい、例えば、その厚さが
一定でなくてもよいだけでなく、幅や長さが一定でなく
てもよい。すなわち、「板状」とは、例えば、レーザ光
の被照射部が収縮しても形状変化が実際上生じ難い球体
のようなものを排除する趣旨であり、レーザ光の照射に
伴い被照射部が収縮して被加工部材の幾何学的形状に有
意な変化が生じ得る限り、「球」に近いような形状であ
ってもよい。
[0007] In this specification, the term "plate-like" refers to a workpiece having a shape such that the shape of the workpiece can be changed in accordance with shrinkage of a portion (irradiated portion) irradiated with the laser beam. This means that, for example, not only the thickness does not need to be constant, but also the width and length need not be constant. That is, the term “plate-shaped” is intended to exclude, for example, spheres that hardly change in shape even when the part to be irradiated with laser light contracts, and the part to be irradiated with the laser light is excluded. May be a shape close to a “sphere” as long as the shape of the workpiece can be significantly changed due to contraction.

【0008】従って、「一方の主面」とは、被加工部材
が典型的な「板」からなる場合、「板」の対向する二つ
の広い面(すなわち主面)のうちの一方をいうが、被加
工部材が典型的な「板」からずれた三次元形状を有する
場合、レーザ光の照射される領域(被照射部を規定する
表面領域)を含む比較的広い面をいう。この広い面は、
典型的には、実際上「平面」的であることが好ましいけ
れども、レーザ光の照射前の段階で元々、凸面又は凹面
になっていても鞍点部のような凸状部と凹状部とが組合
わさった部分を含んでいてもよい。
[0008] Therefore, when the member to be processed is a typical "plate", "one main surface" refers to one of two opposing wide surfaces (that is, main surfaces) of the "plate". In the case where the member to be processed has a three-dimensional shape deviated from a typical “plate”, it refers to a relatively large surface including a region irradiated with laser light (a surface region that defines a portion to be irradiated). This broad side
Typically, although it is actually preferable to be "planar", a convex portion or a concave portion such as a saddle portion is formed as a set even if it is originally convex or concave at the stage before laser light irradiation. It may include a mating portion.

【0009】レーザ光が照射される領域は、一方の主面
の一部であることが好ましいけれども、場合によって
は、該一方の主面の全体であってもよい。その場合、該
主面の中央部と周縁部とでレーザ照射条件(例えば照射
エネルギ密度)を変えても、被加工部材の厚さが場所
(部位)によって異なるようにしておいて同程度の引張
り応力に対して変形のし易さが場所(部位)によって異
なるようにしておいてもよい。勿論、所望ならば、被加
工部材の「一方の主面」以外の部分にもレーザ光の照射
などによって歪加工を施してもよい。
The region irradiated with the laser beam is preferably a part of one main surface, but may be the whole of the one main surface in some cases. In that case, even if the laser irradiation conditions (for example, irradiation energy density) are changed between the central part and the peripheral part of the main surface, the thickness of the workpiece is made different depending on the place (part), and the same tension is applied. The ease of deformation with respect to stress may be different depending on the location (site). Of course, if desired, a portion other than the “one main surface” of the member to be processed may be subjected to distortion processing by laser light irradiation or the like.

【0010】一方の主面の一部にレーザ光を照射して歪
加工を行う場合、一方の主面の中央部にレーザ光を照射
することが好ましいが、場合によっては、中央部から周
縁部に至る部分に線状若しくは帯状又は円形状など任意
の形状でレーザ光を照射してもよく、また例えば円形状
など任意の形状のレーザ光を照射してもよい。なお、主
面の中央部にレーザ光を照射する場合、被照射領域とし
ては任意の所望の平面形状を選び得る。例えば、被加工
部材が長方形の平板からなるような場合であっても、一
方の主面の中央部の円形又は(長方形状よりもむしろ)
正方形状の領域にレーザ照射を行って該平板の他方の主
面の中央部が凸状になるような歪みを被加工部材に付与
し得る。なお、板状の被加工部材について、他方の主面
の中央部が該主面上の直交する二方向の夫々に関して凸
状になるようにするかわりに、該他方の主面の中央部が
該主面上の単一の線に沿って凸状に湾曲されるように被
加工部材を変形させてもよい。なお、所望ならば、板状
被加工部材の前記一方の主面のレーザ光被照射部の少な
くとも一部において該レーザ光の照射によって被加工部
材の形成材料を飛散させて該飛散痕部が凹所になるよう
にしてもよい。また、被照射部又はその周辺領域のうち
の少なくとも一部に凸部が出来てもよい。
When a part of one main surface is irradiated with laser light to perform distortion processing, it is preferable to irradiate the laser light to the central part of one main surface. May be irradiated with laser light in an arbitrary shape such as a linear shape, a band shape, or a circular shape, or may be irradiated with a laser light having an arbitrary shape such as a circular shape. When the central portion of the main surface is irradiated with the laser light, any desired planar shape can be selected as the region to be irradiated. For example, even when the member to be processed is a rectangular flat plate, a circle or (rather than a rectangular shape) at the center of one main surface is used.
By irradiating a laser beam to the square area, a distortion can be imparted to the workpiece so that the central portion of the other main surface of the flat plate becomes convex. Note that, instead of making the central portion of the other main surface of the plate-shaped workpiece to be convex in each of the two orthogonal directions on the main surface, the central portion of the other main surface is formed by the central portion of the other main surface. The workpiece may be deformed so as to be convexly curved along a single line on the main surface. In addition, if desired, at least a part of the laser beam irradiated portion of the one main surface of the plate-shaped workpiece is irradiated with the laser light to scatter the forming material of the processed member so that the scattered mark portion is concave. Location. Further, a projection may be formed on at least a part of the irradiated portion or a peripheral region thereof.

【0011】被加工部材がレーザ光により局所加熱され
た後急冷される際に被加熱部に収縮性(引張)応力が残
留する限り、被加工部材の材質はどのようなものでもよ
く、金属(合金を含む)材料でも、セラミック材料(単
一組成又は複合組成(混合物))でも、プラスチックの
ような有機又は無機の高分子材料でもよい。混合物の場
合、均一でも不均一で場所によって組成が異なっていて
もよい。また、被照射部が、加熱の際少なくとも部分的
に溶融しても一切溶融しなくてもいずれでもよい。更
に、加熱によって焼結が進行するようなものでもそうで
なくてもよい。また、固体状態において複数の結晶構造
の相があるような材料でも単一の結晶相があるようなも
のでもよい。更に、急冷によって非晶質性が高くなり易
いものでもそうでなくてもよく、また急冷によって結晶
粒が小さくなり易いものでもそうでなくてもよい。これ
らの特性は、個々の材料及び加熱速度や温度に影響を与
えるレーザ照射条件によって大幅に異なり得るから、夫
々の材料に応じて、レーザ光による局所加熱の後急冷さ
れる際、結果的に、被加熱部に収縮性(引張)応力が残
留するような条件を選択して、レーザ光を照射すればよ
い。
As long as the material to be processed is locally heated by the laser beam and then rapidly cooled, any material of the material to be processed may be used as long as a contractive (tensile) stress remains in the heated portion. It may be a material (including alloys), a ceramic material (single or composite composition (mixture)), or an organic or inorganic polymer material such as plastic. In the case of a mixture, the composition may be uniform or non-uniform, and the composition may vary depending on the location. The irradiated portion may be at least partially melted or not melted at all during heating. Furthermore, it does not matter whether or not sintering proceeds by heating. Further, a material having a plurality of phases having a crystal structure in a solid state or a material having a single crystal phase may be used. Further, the material may or may not easily increase the amorphous property by quenching, and may or may not easily reduce the crystal grains by quenching. These properties can vary significantly depending on the individual materials and the laser irradiation conditions that affect the heating rate and temperature, so depending on each material, when quenched after local heating with laser light, Laser light irradiation may be performed by selecting a condition under which contractive (tensile) stress remains in the heated portion.

【0012】照射されるべきレーザ光の種類、例えば波
長、平均エネルギ、エネルギ密度、ピーク出力、パルス
幅、パルス繰返し周波数などは、被加工部材の材質や大
きさなどに応じて、レーザ光による局所加熱の後急冷さ
れる際に被加熱部に収縮性(引張)応力を残留させ易い
ものを選択すればよい。但し、レーザ光としては、ピー
ク出力が高く且つ照射エネルギ密度を制御し易い点で、
連続光よりもパルスの方が好ましい。パルスレーザの場
合、照射エネルギ(密度)などの制御は、照射パルス数
の制御によって行えばよく、例えば、被照射領域全体又
は被照射領域内の複数箇所に単一ショット又は複数ショ
ットのレーザパルスを照射するようにすればよい。レー
ザパルスの好ましいパルス幅は、被加工部材によって大
きく異なり得るが、局所的に(材料に依存する)所望温
度までの急速な加熱及びその後の(パルス間隔によって
規定されるパルス非照射期間における)急冷を行い得る
ように、0.03−20ms程度であることが好まし
い。
The type of laser light to be irradiated, for example, wavelength, average energy, energy density, peak output, pulse width, pulse repetition frequency, etc., depends on the material and size of the workpiece to be processed. What is necessary is just to select what has a contractive (tensile) stress easily remaining in the heated portion when it is rapidly cooled after heating. However, as a laser beam, the peak output is high and the irradiation energy density is easy to control.
Pulses are preferred over continuous light. In the case of a pulse laser, the control of the irradiation energy (density) and the like may be performed by controlling the number of irradiation pulses. For example, a single shot or a plurality of shots of laser pulses may be applied to the entire irradiation region or a plurality of locations in the irradiation region. Irradiation may be performed. The preferred pulse width of the laser pulse can vary greatly depending on the workpiece, but is rapidly heated locally (material dependent) to the desired temperature and then quenched (in the non-pulsed period defined by the pulse interval). Is preferably about 0.03 to 20 ms so that

【0013】レーザビームによる加熱は局所的に且つ急
速に行われ得るから、加熱による温度変化が大きいのみ
でなく、局所加熱により加熱された被照射部は、加熱手
段による加熱を停止させることによって、すなわちレー
ザビーム照射を停止させることによって又は1ショット
のレーザパルスの照射後次ショットのレーザパルスの照
射までの間に、急速に冷却され、その状態で凍結される
から、引張応力が残留するような内部歪みが生じること
になる。その結果、被照射部の属する主面が凹状になる
ような歪み(反り)が生じる。
Since heating by the laser beam can be performed locally and rapidly, not only the temperature change due to heating is large, but also the irradiated part heated by local heating, by stopping the heating by the heating means, That is, by stopping the laser beam irradiation or between the irradiation of the laser pulse of one shot and the irradiation of the laser pulse of the next shot, it is rapidly cooled and frozen in that state, so that the tensile stress remains. Internal distortion will occur. As a result, distortion (warpage) occurs such that the main surface to which the irradiated portion belongs is concave.

【0014】なお、被照射領域に照射されるレーザ光の
エネルギ密度などのレーザ照射条件を制御して、被加工
部材に生じさせる歪み量(歪みの大きさ)を制御するよ
うにしてもよい。
The amount of distortion (magnitude of distortion) generated in the workpiece may be controlled by controlling laser irradiation conditions such as the energy density of the laser beam applied to the irradiation area.

【0015】本発明のレーザ加工装置は、上記で説明し
たレーザ加工方法を実施するためのレーザ加工装置であ
って、好ましくは、レーザ発振器からのレーザ光を導く
光ファイバと、光ファイバから射出されたレーザ光を被
加工部材の前記主面上に集光するフォーカスレンズとを
有するレーザ歪加工装置、又はレーザ発振器からのレー
ザ光を通過させる開口を備えたマスクと、マスクの開口
の像を被加工部材の前記主面上に結像させる結像光学系
とを有するレーザ歪加工装置からなる。
A laser processing apparatus according to the present invention is a laser processing apparatus for performing the above-described laser processing method, and is preferably an optical fiber for guiding a laser beam from a laser oscillator and an optical fiber emitted from the optical fiber. A laser distortion processing apparatus having a focus lens that focuses the laser light on the main surface of the workpiece, or a mask having an opening through which laser light from a laser oscillator passes, and an image of the opening of the mask. And an imaging optical system for forming an image on the main surface of the processing member.

【0016】前者の場合、レーザ発振器に対する被加工
部材の配設位置の自由度が高い。なお、この場合、好ま
しくは、前記光ファイバから射出されるレーザ光をコリ
メートして前記フォーカスレンズに入射させるコリメー
トレンズを有する。被加工部材に照射されるレーザ光の
径(スポット径)を変えるには、光ファイバの(射出部
の)径を変えたり、コリメートレンズ及びフォーカスレ
ンズのうちの少なくともいずれか一方を焦点距離の異な
るものと代えればよい。
In the former case, there is a high degree of freedom in the arrangement position of the workpiece with respect to the laser oscillator. In this case, preferably, a collimating lens for collimating the laser light emitted from the optical fiber and making the collimated laser light incident on the focus lens is provided. In order to change the diameter (spot diameter) of the laser beam applied to the workpiece, the diameter of the optical fiber (at the emission section) is changed, or at least one of the collimator lens and the focus lens is different in focal length. What is necessary is just to replace it.

【0017】後者の場合、マスクの開口によって規定さ
れる形状の領域に該開口の像を縮小して又は等倍で形成
し得るから、所定形状の被照射領域に対する加工が容易
に行われ得る。なお、この場合、結像光学系は、比較的
大きいマスク開口の形を高エネルギ密度で縮小して結像
させ得るように、好ましくは、マスクの開口からのレー
ザ光をコリメートするコリメートレンズと、コリメート
レンズでコリメートされたレーザ光を被加工部材の前記
主面の手前で該主面の近傍に集光するフォーカスレンズ
とを有する。更に、マスクの開口が調整可能であること
が好ましい。これによって、レーザ光の被照射領域の形
や大きさを容易に制御し得、被加工部材に生じさせるべ
き歪み(反り)の制御がより容易になる。
In the latter case, since an image of the opening can be reduced or made at the same magnification in a region having a shape defined by the opening of the mask, processing can be easily performed on an irradiation region having a predetermined shape. In this case, the imaging optical system preferably includes a collimating lens that collimates the laser light from the opening of the mask so that the shape of the relatively large mask opening can be reduced at a high energy density to form an image. A focus lens that focuses the laser beam collimated by the collimating lens in front of the main surface of the workpiece and in the vicinity of the main surface. Further, it is preferable that the opening of the mask is adjustable. Thus, the shape and size of the region to be irradiated with the laser beam can be easily controlled, and the control of the distortion (warpage) to be caused in the member to be processed becomes easier.

【0018】[0018]

【発明の実施の形態】次に、本発明による好ましい実施
の形態を添付図面に基づいて説明する。
Next, a preferred embodiment of the present invention will be described with reference to the accompanying drawings.

【0019】図1は、本発明による好ましい一実施の形
態のレーザ歪加工装置1によって、被加工部材2にレー
ザ歪加工を行なっているところを模式的に示したもので
ある。
FIG. 1 schematically shows laser distortion processing of a workpiece 2 by a laser distortion processing apparatus 1 according to a preferred embodiment of the present invention.

【0020】図1のレーザ歪加工装置1は、近赤外、可
視または紫外域のレーザ発振器3と、このレーザ発振器
3からのレーザ光を被加工部材2の近くまで導く光ファ
イバ4と、光ファイバ4の射出端5から拡がるレーザ光
B1を平行なビームB2にコリメートするコリメートレ
ンズ6と、コリメートされたレーザ光B2を被加工部材
2の一方の主面である被加工面7上に集光するフォーカ
スレンズ8とからなる。
A laser distortion processing apparatus 1 shown in FIG. 1 comprises a laser oscillator 3 in the near-infrared, visible or ultraviolet region, an optical fiber 4 for guiding a laser beam from the laser oscillator 3 to a position near a workpiece 2, A collimating lens 6 for collimating the laser beam B1 diverging from the emission end 5 of the fiber 4 into a parallel beam B2, and the collimated laser beam B2 is focused on a processing surface 7 which is one main surface of the processing member 2. Focusing lens 8.

【0021】ここで、光ファイバ4の射出端5における
レーザビームB1の径をφ0とし、コリメートレンズ6
及びフォーカスレンズ8の焦点距離を夫々f1,f2と
すると、被加工面7上におけるレーザビームB3の照射
スポット径φは、次式F1で与えられる。
Here, the diameter of the laser beam B1 at the emission end 5 of the optical fiber 4 is φ0,
Assuming that the focal length of the focus lens 8 is f1 and f2, respectively, the irradiation spot diameter φ of the laser beam B3 on the processing surface 7 is given by the following equation F1.

【0022】 φ=(f2/f1)・φ0 (F1)Φ = (f2 / f1) · φ0 (F1)

【0023】従って、照射スポット径φの大きさを変え
て、照射領域の大きさを変えたり、照射エネルギ密度等
を変えるためには、光ファイバ4、及びレンズ6,8の
うちのいずれかを変えてφ0,f1,f2のうちのいず
れかを変えればよい。
Therefore, in order to change the size of the irradiation area by changing the size of the irradiation spot diameter φ, or to change the irradiation energy density, etc., one of the optical fiber 4 and the lenses 6 and 8 must be used. Any of φ0, f1, and f2 may be changed.

【0024】被加工面7上の被照射領域ないし被加工領
域が照射スポット径φよりも大きくて、被照射領域の全
体にわたってビームB3を走査させる必要があるような
場合には、被加工部材2が載置されているX−Yテーブ
ル9を並進駆動して被加工部材2をビームB3に対して
並進移動させても、射出光学系10(光ファイバ4の射
出端部5の支持体(図示せず)と、コリメートレンズ6
及びその支持体(図示せず)と、フォーカスレンズ8及
びその支持体(図示せず)とからなる)を被加工部材2
に対して並進移動させてもよい。ビームB3によって被
加工面7の被照射領域11上に所望の強度のレーザ光を
照射し得る限り、射出光学系10は、所望に応じて変更
すればよい。
If the irradiation area or the processing area on the processing surface 7 is larger than the irradiation spot diameter φ, and it is necessary to scan the beam B3 over the entire irradiation area, the processing target 2 When the workpiece 2 is translated with respect to the beam B3 by driving the XY table 9 on which the X-Y table 9 is mounted in translation, the emission optical system 10 (the support of the emission end 5 of the optical fiber 4 (see FIG. Not shown) and the collimating lens 6
And the support (not shown), the focus lens 8 and the support (not shown))
May be translated. The emission optical system 10 may be changed as desired as long as the laser beam having a desired intensity can be irradiated on the irradiation area 11 of the processing surface 7 by the beam B3.

【0025】レーザ歪加工装置1では、被加工部材2の
被加工面7のうちの所定の被照射領域11にレーザ発振
器3からのレーザ光B3を短時間に高エネルギ密度で照
射することによって、被照射領域11に収縮応力が残る
ように該領域11を加工し得る。
The laser distortion processing apparatus 1 irradiates a laser beam B3 from the laser oscillator 3 with a high energy density to a predetermined irradiation area 11 of the processing surface 7 of the processing member 2 in a short time. The irradiated region 11 can be processed so that contraction stress remains in the region 11.

【0026】図2は、本発明による好ましい別の一実施
の形態のレーザ歪加工装置12によって、被加工部材2
にレーザ歪加工を行なっているところを模式的に示した
ものである。
FIG. 2 shows another preferred embodiment of the laser distortion processing apparatus 12 according to the present invention,
1 schematically shows laser distortion processing.

【0027】図2のレーザ歪加工装置1は、図1の場合
と同様な又は遠赤外域のレーザ発振器3と、被照射領域
11に応じた形状の開口(アパーチャ)A(図3)を有
しレーザ発振器3からのレーザ光B0が照明されるマス
ク13と、マスク13の開口Aから拡がるレーザ光B4
をほぼ平行なビームB5にコリメートするコリメートレ
ンズ6と、コリメートされたレーザ光B5を被加工部材
2の被加工面7上に集光するフォーカスレンズ8とを有
し、マスク13の開口Aの像をフォーカスレンズ8の焦
点より少し遠い位置に設けた被加工面7の被照射領域1
1上に縮小して結像させる。なお、レーザ歪加工装置1
2では、コリメートレンズ6とフォーカスレンズ8との
間に折返しミラー14が設けられている。従って、X−
Yテーブル9を並進駆動させるか、又は折返しミラー1
4とフォーカスレンズ8とからなる射出光学系15をビ
ームB5に平行な方向に移動させることによって、該方
向の照射位置を変え得る。
The laser distortion processing apparatus 1 of FIG. 2 has a laser oscillator 3 in the same or far-infrared region as in FIG. 1, and an aperture (aperture) A (FIG. 3) having a shape corresponding to the irradiation area 11. A mask 13 illuminated by a laser beam B0 from a laser oscillator 3, and a laser beam B4 extending from an opening A of the mask 13.
A collimating lens 6 for collimating the laser beam B5 into a substantially parallel beam B5, and a focus lens 8 for converging the collimated laser beam B5 on the surface 7 to be processed of the member 2 to be processed. To be illuminated 1 on the surface 7 to be processed in which
1 to form an image. The laser distortion processing device 1
In No. 2, a folding mirror 14 is provided between the collimating lens 6 and the focus lens 8. Therefore, X-
The Y table 9 is driven in translation or the mirror 1
By moving the emission optical system 15 composed of the focusing lens 8 and the focusing lens 8 in a direction parallel to the beam B5, the irradiation position in that direction can be changed.

【0028】なお、マスク13は、例えば、図3に示し
たように、周縁部に補強取付枠16を備え中央に孔(開
口部)17を有するマスク本体18と、マスク本体18
に対して水平方向Yに移動可能な横方向サイズ調整板1
9,20と、マスク本体18に対して上下方向Zに移動
可能な縦方向サイズ調整板21,22と、各調整板1
9,20,21,22を調整位置で固定する固定具23
とを有する。従って、マスク13の開口(アパーチャ)
Aは、調整板19,20,21,22の内縁部19a,
20a,21a,22aによって規定される。このマス
ク13では、四角な被加工面に対して広い照射面積でレ
ーザビームB6を照射し得、且つ開口Aの縦及び横方向
のサイズを変えることによって、一つのマスク13を用
いるだけでも被照射領域11の面積及び形状を変え得
る。
As shown in FIG. 3, for example, the mask 13 includes a mask body 18 having a reinforcing mounting frame 16 at the periphery and a hole (opening) 17 at the center, and a mask body 18.
Horizontal size adjustment plate 1 movable in the horizontal direction Y with respect to
9, 20; vertical size adjusting plates 21 and 22 movable in the vertical direction Z with respect to the mask body 18;
Fixture 23 for fixing 9, 20, 21, 22 at the adjustment position
And Therefore, the opening (aperture) of the mask 13
A is an inner edge 19a of the adjusting plates 19, 20, 21, 22;
20a, 21a and 22a. The mask 13 can irradiate the laser beam B6 with a large irradiation area on a square work surface and change the size of the opening A in the vertical and horizontal directions so that the irradiation can be performed by using only one mask 13. The area and shape of the region 11 can be changed.

【0029】なお、この例では、各調整板の内縁部は直
線状であり、開口Aが長方形(又は正方形)であるけれ
ども、内縁部を直線状の代わりに曲線状にして、開口が
長円形から円形に変わるようにしてもよい。また、調整
板のマスク本体に対する可動方向が直線状の代わりに曲
線状になるようにしてよい。更に、開口を調整板の内縁
によって規定する代わりに電気光学的手段など他の任意
の手段で開口を調整可能に規定するようにしてもよい。
加えて、開口の全体を一様な透過率にする代わりに、開
口のうちのある部分のレーザ光透過率を他の部分の透過
率より高くするようにしてもよい。更に、開口を一つな
がりの開口にする代わりに、複数の非連続的な開口部の
パターンの形で形成してもよい。
In this example, the inner edge of each adjustment plate is straight, and the opening A is rectangular (or square), but the inner edge is curved instead of straight, and the opening is oblong. May be changed to a circle. Further, the movable direction of the adjustment plate with respect to the mask body may be curved instead of straight. Further, instead of defining the opening by the inner edge of the adjusting plate, the opening may be defined so as to be adjustable by any other means such as electro-optical means.
In addition, instead of making the entire opening have a uniform transmittance, the laser light transmittance of a portion of the opening may be higher than the transmittance of another portion. Further, instead of a series of openings, the openings may be formed in a pattern of a plurality of discontinuous openings.

【0030】[0030]

【実施例】図2に示したレーザ歪加工装置12を用いて
アルチック(Al23+TiC)と呼ばれるセラミック
製の板(縦1.25mm、横1.0mm、厚さ0.6m
m)の一方の主面7の中央部の縦0.8mm、横0.8
mmの被加工領域11にパルス幅0.5msのYAGレ
ーザパルスを1ショット照射した。照射条件として、被
加工領域11に対するレーザ光B6の照射エネルギ密度
(J/mm2)を、0.17(例1)、例1の約2倍の
0.36(例2)、例2の約2倍の0.72(例3)に
変えたところ、図4に誇張して想像線で示したような歪
みが歪加工処理を施した被加工部材2に生じた。図4の
Dで示したような端部における変位量(nm)で歪みの
大きさを表すと、この歪み量D(nm)は、夫々、2.
03(例1)、6.68(例2)、及び11.63(例
3)であった。以上の実験結果を、被加工領域11への
照射エネルギ密度(J/mm2)に対する歪み量(n
m)の関係としてグラフで示すと、図5に示したよう
に、ほぼ直線的に(より厳密にはややサブリニアに)変
化していることがわかる。従って、この実施例のような
セラミック板の場合、レーザ照射条件を変えることによ
って、10nm程度までの歪み量は制御し得ると考えら
れる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A laser plate (altitude: 1.25 mm, width: 1.0 mm, thickness: 0.6 m) called Altic (Al 2 O 3 + TiC) using a laser distortion processing apparatus 12 shown in FIG.
m), the central part of one main surface 7 is 0.8 mm long and 0.8 mm wide.
One shot of a YAG laser pulse having a pulse width of 0.5 ms was applied to the workpiece 11 having a width of 0.5 mm. As the irradiation conditions, the irradiation energy density (J / mm 2 ) of the laser beam B6 to the region to be processed 11 was 0.17 (Example 1), which was about twice that of Example 1 and 0.36 (Example 2). When the value was changed to about 0.72 (Example 3), the distortion was exaggerated in FIG. 4 and indicated by an imaginary line in the workpiece 2 subjected to the distortion processing. When the magnitude of strain is expressed by the amount of displacement (nm) at the end as shown by D in FIG. 4, the amount of distortion D (nm) is 2.
03 (Example 1), 6.68 (Example 2), and 11.63 (Example 3). Based on the above experimental results, the distortion amount (n) with respect to the irradiation energy density (J / mm 2 )
As shown in FIG. 5, it can be seen that the relationship changes almost linearly (more strictly, slightly sub-linear) as shown in FIG. Therefore, in the case of the ceramic plate as in this embodiment, it is considered that the amount of distortion up to about 10 nm can be controlled by changing the laser irradiation conditions.

【0031】以上のことから比較的硬いセラミックのよ
うな被加工部材2であっても、レーザ照射によって一方
の主面にレーザ歪加工を施すことによって、極めて短時
間に被加工部材2に歪み(反り)を付与することが可能
であること、及び照射エネルギ密度のようなレーザ照射
条件を変えることによって歪み量を変え得ること(設定
制御したい歪み量に応じて照射エネルギ密度のようなレ
ーザ照射条件を制御すればよいこと)がわかる。
As described above, even if the workpiece 2 is made of a relatively hard ceramic, by subjecting one main surface to laser distortion processing by laser irradiation, the workpiece 2 is distorted in a very short time. (Warping) can be imparted, and the amount of distortion can be changed by changing laser irradiation conditions such as irradiation energy density (laser irradiation conditions such as irradiation energy density depending on the amount of distortion desired to be set and controlled). Can be controlled).

【0032】なお、歪み量を制御するために他のレーザ
照射条件を変えてもよいことは当業者には明白であろ
う。但し、この実施例の場合に限っていえば、パルス繰
返し周波数が比較的低い場合、該繰返し周波数の影響は
実際上ないことを確認した。このことは、各レーザパル
スによって被照射部が急速に加熱され、パルスの照射が
終わった後急速に冷却されるような条件下で実施例の実
験が行われたことを示している。
It will be apparent to those skilled in the art that other laser irradiation conditions may be changed to control the amount of distortion. However, only in the case of this embodiment, it was confirmed that when the pulse repetition frequency was relatively low, there was practically no effect of the repetition frequency. This indicates that the experiment of the example was performed under such a condition that the irradiated portion was rapidly heated by each laser pulse, and was rapidly cooled after the completion of the pulse irradiation.

【0033】本発明のレーザ歪加工は、小さな反りを利
用して他の部材との摩擦を低減させるスライダのような
部材の製造のみでなく、微細な形状又は微少サイズ調整
が求められるいかなる部材の製造にも用いられ得る。
The laser distortion processing of the present invention is applicable not only to manufacturing of a member such as a slider that uses a small warpage to reduce friction with other members, but also to any member requiring a fine shape or minute size adjustment. It can also be used for manufacturing.

【0034】なお、場合によっては、マクロにみて被加
工部材にほとんど変形が生じないような種類の表面処理
としてこの歪加工を用いてもよい。
In some cases, this distortion processing may be used as a type of surface treatment that hardly causes deformation of the member to be processed when viewed macroscopically.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による好ましい一実施の形態のレーザ歪
加工装置による歪加工の模式的説明図。
FIG. 1 is a schematic explanatory view of strain processing by a laser strain processing apparatus according to a preferred embodiment of the present invention.

【図2】本発明による好ましい別の一実施の形態のレー
ザ歪加工装置による歪加工の模式的説明図。
FIG. 2 is a schematic explanatory view of distortion processing by a laser distortion processing apparatus according to another preferred embodiment of the present invention.

【図3】図2の装置のマスクの両面の模式的平面図で、
(a)は一方の面、(b)は他方の面からみたものであ
る。
3 is a schematic plan view of both sides of the mask of the apparatus of FIG. 2,
(A) is viewed from one surface, and (b) is viewed from the other surface.

【図4】実施例の場合における被加工部材の歪み(反り
変形)を示す側面説明図。
FIG. 4 is an explanatory side view showing distortion (warpage deformation) of a workpiece in the case of an embodiment.

【図5】実施例の結果を示すグラフ。FIG. 5 is a graph showing the results of Examples.

【符号の説明】[Explanation of symbols]

1,12 レーザ歪加工装置 2 被加工部材 3 レーザ発振器 4 光ファイバ 5 射出端 6 コリメータレンズ 7 被加工面(一方の主面) 8 フォーカスレンズ 9 X−Yテーブル 10 射出光学系 11 被加工領域(被照射領域) 12 投影光学系 13 マスク 19,20,21,22 (開口Aの)調整板 A 開口 B0,B1,B2,B3,B4,B5,B6 レーザ光 D 歪み量 Y,Z 可動方向 φ 照射ビームスポット径 φ0 ビーム径 DESCRIPTION OF SYMBOLS 1, 12 Laser distortion processing apparatus 2 Workpiece 3 Laser oscillator 4 Optical fiber 5 Exit end 6 Collimator lens 7 Workpiece surface (one main surface) 8 Focus lens 9 XY table 10 Injection optical system 11 Workpiece area ( (Irradiation area) 12 Projection optical system 13 Mask 19, 20, 21, 22 Adjusting plate (of opening A) A Opening B0, B1, B2, B3, B4, B5, B6 Laser beam D Distortion amount Y, Z Moving direction φ Irradiation beam spot diameter φ0 Beam diameter

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭63−220991(JP,A) 特開 昭62−93028(JP,A) 特開 平5−245543(JP,A) 特開 平4−33792(JP,A) 特開 昭63−303237(JP,A) (58)調査した分野(Int.Cl.7,DB名) B23K 26/00 B23K 26/06 B23K 26/08 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-63-220991 (JP, A) JP-A-62-93028 (JP, A) JP-A-5-245543 (JP, A) JP-A-4- 33792 (JP, A) JP-A-63-303237 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) B23K 26/00 B23K 26/06 B23K 26/08

Claims (7)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 スライダ用の板状の被加工部材の一方の
主面の所定形状の被照射領域に該領域の面積及び形状に
対応する広い照射面積のレーザ光を照射して該主面の側
が直交する二方向の夫々に関して凹状になるように板状
被加工部材を歪ませてスライダを形成することからなる
レーザ歪加工方法。
An irradiation area of a predetermined shape on one main surface of a plate-shaped workpiece for a slider is irradiated with a laser beam having a wide irradiation area corresponding to the area and shape of the area. laser distortion processing method consisting Rukoto form a slider distort the plate workpiece to be concave with respect to s bidirectional husband side are orthogonal.
【請求項2】 被加工部材のうちレーザ光の照射を受け
る被照射領域が、前記主面の中央部である請求項1に記
載のレーザ歪加工方法。
2. The laser distortion processing method according to claim 1, wherein an irradiation area of the workpiece to be irradiated with the laser beam is a central portion of the main surface.
【請求項3】 被照射領域に照射されるレーザのエネル
ギ密度を制御して、被加工部材に生じさせる歪みの大き
さを制御する請求項1又は2に記載のレーザ歪加工方
法。
3. The laser distortion machining method according to claim 1, wherein the energy density of the laser radiated to the irradiation area is controlled to control the magnitude of the distortion generated in the workpiece.
【請求項4】 被加工部材がセラミック材である請求項
1から3までのいずれか一つの項に記載のレーザ歪加工
方法。
4. The laser strain processing method according to claim 1, wherein the member to be processed is a ceramic material.
【請求項5】 請求項1からまでのいずれか一つの項
に記載のレーザ加工方法を実施するためのレーザ加工装
置であって、レーザ発振器からのレーザ光を通過させる
開口を備えたマスクと、マスクの開口の像を被加工部材
の前記主面上に結像させる結像光学系とを有するレーザ
歪加工装置。
5. A laser processing apparatus for carrying out the laser processing method according to any one of claims 1 to 4, a mask having an opening for passing the laser beam from the laser oscillator An optical system for forming an image of the opening of the mask on the main surface of the member to be processed.
【請求項6】 結像光学系が、マスクの開口からのレー
ザ光をコリメートするコリメートレンズと、コリメート
レンズでコリメートされたレーザ光を被加工部材の前記
主面の手前で該主面の近傍に集光するフォーカスレンズ
とを有する請求項に記載のレーザ歪加工装置。
6. An imaging optical system, comprising: a collimating lens for collimating a laser beam from an opening in a mask; and a laser beam collimated by the collimating lens, in front of the main surface of the member to be processed and in the vicinity of the main surface. The laser distortion processing apparatus according to claim 5 , further comprising a focusing lens for focusing.
【請求項7】 マスクの開口が調整可能である請求項
又は6に記載のレーザ歪加工装置。
7. openings of the mask is adjustable according to claim 5
Or the laser distortion processing apparatus according to 6 .
JP10392098A 1998-03-31 1998-03-31 Laser distortion processing method and apparatus Expired - Fee Related JP3200588B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10392098A JP3200588B2 (en) 1998-03-31 1998-03-31 Laser distortion processing method and apparatus

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Publication Number Publication Date
JPH11285869A JPH11285869A (en) 1999-10-19
JP3200588B2 true JP3200588B2 (en) 2001-08-20

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JP4490032B2 (en) * 2002-09-30 2010-06-23 リコーマイクロエレクトロニクス株式会社 Optical processing equipment
WO2009066571A1 (en) * 2007-11-19 2009-05-28 Miyachi Corporation Laser light application device
CN106644068B (en) * 2016-12-30 2018-05-11 聚光科技(杭州)股份有限公司 A kind of long light path optical system

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