JP3200063U - Apparatus configured for vibration isolation of vacuum chamber and system having the apparatus - Google Patents

Abstract

An apparatus configured for vibration isolation of a vacuum chamber is provided. The apparatus includes a base device, one or more first flexible vacuum lines, a connecting device, and one or more second flexible vacuum lines. The base device 110 has a first surface 112 and a second surface 114, and the first surface 112 and the second surface 114 are surfaces facing the base device 110. The first flexible vacuum line 120 has a first end connected to the first surface 112 of the base device 110 and a second end connectable to the vacuum chamber 10. The connection device 130 can be connected to the vacuum chamber 10, and the connection device 130 is configured to be movable with respect to the base device 110. The second flexible vacuum line 140 has a first end connected to the second surface of the base device 110 and a second end connected to the connection device 130. [Selection] Figure 1

Description

  Embodiments of the present disclosure relate to an apparatus configured for vacuum chamber vibration isolation and a system having the apparatus.

  Anti-vibration (vibration isolation) can be used in different fields including, but not limited to, electron microscopy, magnetic resonance imaging, semiconductor processing and optical instruments. As an example, the processing environment (eg, a vacuum chamber or in a vacuum processing chamber) should be maintained at a low vibration level for an extended period of time. A vacuum pump can be used to provide a vacuum in a vacuum chamber or vacuum processing chamber. However, the vibration levels associated with vacuum pumps can limit their use within some vacuum applications (eg, within semiconductor processing). Therefore, the vacuum chamber should be vibration isolated from a vibration source (eg, a vacuum pump).

  In view of the above, a new apparatus configured for vibration isolation between a vacuum chamber and a system having an apparatus that overcomes at least some of the problems within the art is beneficial. The present disclosure is particularly aimed at providing an apparatus that allows improved vibration isolation of the vacuum chamber and / or improved vibration damping for the vacuum chamber.

  In light of the above, an apparatus configured for vibration isolation between a vacuum chamber and a system having the apparatus is provided. Further aspects, advantages, and configurations of the present disclosure will be apparent from the utility model registration claims, the specification, and the accompanying drawings.

  According to one aspect of the present disclosure, an apparatus configured for vibration isolation of a vacuum chamber is provided. The device is a base device having a first surface and a second surface, wherein the first surface and the second surface are connected to a base device that is a surface facing the base device and a first surface of the base device. One or more first flexible vacuum lines having a first end and a second end connectable to the vacuum chamber, and a connection device configured to be connectable to the vacuum chamber and movable relative to the base device And one or more second flexible vacuum lines having a first end connected to the second surface of the base device and a second end connected to the connecting device.

  According to another aspect of the present disclosure, a system is provided. The system includes a vacuum chamber, a device configured for vibration isolation of the vacuum chamber, connected to the vacuum chamber, and one or more vacuum pumps connected to the base device of the device. The apparatus is a base apparatus having a first surface and a second surface, wherein the first surface and the second surface are a base device that is an opposing surface of the base device and a first device connected to the first surface of the base device. One or more first flexible vacuum lines having one end and a second end connectable to the vacuum chamber; a connection device connectable to the vacuum chamber and configured to be movable relative to the base device; A first end connected to the second surface of the base device and one or more second flexible vacuum lines having a second end connected to the connecting device.

In order that the above-described structure of the present invention may be understood in detail, a more specific description of the present disclosure, briefly summarized above, is provided with reference to embodiments. The accompanying drawings are described below in connection with embodiments of the present disclosure.
FIG. 2 shows a schematic diagram of an apparatus configured for vibration isolation of a vacuum chamber, according to embodiments described herein. FIG. 6 shows a schematic diagram of an apparatus configured for vibration isolation of a vacuum chamber, according to another embodiment described herein. FIG. 6 shows a schematic diagram of an apparatus configured for vibration isolation of a vacuum chamber, according to yet another embodiment described herein. FIG. 6 shows a schematic diagram of an apparatus configured for vibration isolation of a vacuum chamber, according to yet another embodiment described herein.

  Reference will now be made in detail to various embodiments of the disclosure, one or more examples of which are illustrated in the drawings. Within the following description of the drawings, the same reference numbers refer to the same components. Generally, only the differences with respect to the individual embodiments are described. Each example is provided by way of explanation of the disclosure, and is not intended as a limitation of the disclosure. Also, configurations illustrated or described as part of one embodiment may be used in or in conjunction with other embodiments, thereby yielding still other embodiments. The description is intended to include such modifications and variations.

  Although embodiments of the present disclosure are described with reference to a vacuum pump as a vibration source, it should be understood that the present disclosure is not limited thereto. The apparatus of the present disclosure can be used to reduce or damp vibrations of other sources, including but not limited to electrical equipment (eg, a power source).

  Vacuum pumps can be used in manufacturing and research pumping applications. However, the vibration levels associated with vacuum pumps (eg, cryopumps, turbo pumps) can limit their use in some vacuum applications (eg, semiconductor processing). As one example, pressure tube vibrations can cause out-of-phase push-pull counteracting between tubes that result in X, Y, and Z vibrations (eg, in the range of 30-100 micrometers). There is an increasing demand for high resolution features and high sensitivity that imply that they are susceptible to mechanical disturbances. As an example, even low levels of excitation vibration can be problematic in some vacuum applications.

  The present disclosure provides an apparatus configured for vibration isolation of a vacuum chamber that reduces or compensates for vibrations transmitted to the vacuum chamber. The device is a base device having a first surface and a second surface, wherein the first surface and the second surface are connected to a base device that is a surface facing the base device and a first surface of the base device. One or more first flexible vacuum lines having a first end and a second end connectable to the vacuum chamber, and a connection device configured to be connectable to the vacuum chamber and movable relative to the base device And one or more second flexible vacuum lines having a first end connected to the second surface of the base device and a second end connected to the connecting device. One or more vacuum pumps can be provided connectable to the base device.

  The vacuum pump can be separated from the vacuum chamber and secured on a base device connected to the vacuum chamber via one or more first flexible vacuum lines. When the vacuum pump is active, the vacuum suction generates a first force that pulls the vacuum pump fixed on the base device and attempts to contract one or more first flexible vacuum lines. In order to avoid contraction of the one or more first flexible vacuum lines, the one or more second flexible vacuum lines are attached to the opposite side of the base device. A vacuum suction within the one or more second flexible vacuum lines generates a second force that acts on the one or more second flexible vacuum lines. The first force and the second force are substantially equal and point in opposite directions. A connecting device equipped with one or more second flexible vacuum lines takes over the second force and pushes it into the vacuum chamber. As a result, the vibration level of the vacuum chamber can be reduced.

  According to some embodiments that can be combined with other embodiments described herein, an apparatus configured for vibration isolation of a vacuum chamber is 100 nm or less, specifically 50 nm or less, more specifically Specifically, a vibration level of 10 nm or less can be provided. As an example, the apparatus of this embodiment can provide a vibration level of 2 nm or less. According to some embodiments that can be combined with other embodiments described herein, the device is a vibration having a frequency of 500 Hz or less, specifically 300 Hz or less, more specifically 200 Hz or less. Configured to reduce or attenuate. As an example, the apparatus of the present embodiment can reduce or attenuate vibrations having a frequency in the range of 0.5 Hz to 180 Hz. As used throughout this application, anti-vibration can also be referred to as damping, vibration cancellation, vibration stabilization, vibration damping or vibration fixation.

  When designing vibration-sensitive technologies, a so-called “global” vibration criterion can be used. Several comprehensive vibration criteria have been used since the early 1980s, especially by the microelectronics and optoelectronics industry and the research community. The introduction and measurement of pneumatic vibration isolation and the need for nanotechnology has led to the revision of “comprehensive” vibration isolation standards. The VC standard was originally developed for use in the semiconductor industry, but has been applied to a wide range of technical applications. Although the NIST-A standard was developed for metrology, it is gaining popularity within the nanotechnology community.

  FIG. 1 shows a schematic diagram of an apparatus 100 configured for vibration isolation of a vacuum chamber 10 according to an embodiment described herein. The apparatus can be located below the vacuum chamber 10.

  The device 100 includes a base device 110, one or more first flexible vacuum lines 120, a connection device 130, and one or more second flexible vacuum lines 140. The base device 110 has a first surface 112 and a second surface 114, and the first surface 112 and the second surface 114 are surfaces facing the base device 110. The one or more first flexible vacuum lines 120 have a first end connected to the first surface 112 of the base device 110 and a second end connectable to the vacuum chamber 10. The connection device 130 can be connected to the vacuum chamber 10, and the connection device 130 is configured to be movable with respect to the base device 110. The movement of the connecting device 130 is indicated by a double arrow in FIG. The one or more second flexible vacuum lines 140 have a first end connected to the second surface of the base device 110 and a second end connected to the connection device 130.

  The shrinkage of the one or more first flexible vacuum lines 120 can be reduced or even avoided using one or more second flexible vacuum lines 140 attached to the opposite surface of the base device 110. In particular, the first force 126 acting on the one or more first flexible vacuum lines 120 and the second force 146 acting on the one or more second flexible vacuum lines 140 are substantially equal and in opposite directions. Facing. The connection device 130 that is movable relative to the base device 110 can return a vacuum-derived force to the vacuum chamber 10 and, as a result, reduce the vibration level of the vacuum chamber 10.

  The vacuum chamber 10 can also be referred to as a “vacuum processing chamber”. As an example, the vacuum chamber 10 can provide a vacuum environment or processing environment for processing and / or inspection of electronic devices such as, for example, semiconductor elements. In some embodiments, one or more electron beam columns are provided in the vacuum chamber 10. One or more electron beam columns can be used, for example, in electron beam inspection, critical dimension (CD) measurement, and defect review. As an example, the electron beam column includes an electron source 14 that generates a primary electron beam 1 that is directed to a sample 11 through an objective lens 12. The electron beam column includes a beam splitter 13 for separating the primary electron beam 1 and the signal charged particle beam 2 formed when colliding with the sample 11, a beam bender 15 for deflecting the signal charged particle beam 2, A condensing lens 16 for condensing the signal charged particle beam 2 and at least one detection element 17 for detecting the signal charged particle beam 2 can be included.

  The flexible vacuum lines (eg, the first flexible vacuum line 120 and the second flexible vacuum line 140) can be sized up by compression or expansion (eg, along the central axis of the flexible vacuum line). It can be understood as a line or tube that can be changed. The flexible vacuum line can be cylindrical and the central axis can be the cylindrical axis of the flexible vacuum line. Inside the flexible vacuum line, a vacuum can be generated or a vacuum can exist. As an example, the flexible vacuum line can be connected to at least one of one or more vacuum pumps and vacuum chambers to provide a vacuum inside the flexible vacuum line.

  The connecting device 130 is configured to be movable relative to the base device 110 (eg, in the direction of the first force 126 and / or the second force 146). In some embodiments, the one or more first flexible vacuum lines 120 have a first central axis 122 and the one or more second flexible vacuum lines 140 have a second central axis 142. The connecting device 130 can be configured to be movable in a direction substantially parallel to the first central axis 122 and / or the second central axis 142. The first central axis 122 and the second central axis 142 are substantially parallel to the longitudinal extension of the one or more first flexible vacuum lines 120 and the one or more second flexible vacuum lines 140, respectively. Can do. The term “substantially parallel” refers to a substantially parallel orientation (eg, in the direction of movement of the central axis and the connecting device 130), and several degrees (eg, up to 10 ° or even up to 15 °) from the exact parallel orientation. ) Deviation is still considered “substantially parallel”. In some embodiments, the one or more first flexible vacuum lines 120 and / or the one or more second flexible vacuum lines 140 can be cylindrical. The first central axis 122 may be the cylindrical axis of one or more first flexible vacuum lines 120 and / or the second central axis 142 may be the cylinder of one or more second flexible vacuum lines 140. It can be an axis.

  According to some embodiments that can be combined with other embodiments described herein, the base device 110 is stationary or fixed in position (eg, relative to an inertial system such as a room or laboratory). Can be made. As an example, the base device 110 can be stationary. In other words, the connecting device 130 can move while the base device 110 remains stationary. As an example, the base device 110 can be attached to one or more vacuum pumps, and the one or more vacuum pumps can be located on the ground.

  In some embodiments, the connection device 130 is suspended from the second surface 114 of the base device 110 using one or more second flexible vacuum lines 140. As an example, the only connection between the connection device 130 and the base device 110 is provided by one or more second flexible vacuum lines 140. The flexibility of the one or more second flexible vacuum lines 140 can allow the connection device 130 to be movable relative to (or relative to) the base device 110. According to some embodiments, the connection device 130 is connected only to the base device 110 and the vacuum chamber 10. By using only these two connection points, it is possible to return the vacuum-derived force to the vacuum chamber 10, and as a result, the vibration level of the vacuum chamber 10 can be further reduced.

  According to some embodiments that can be combined with other embodiments described herein, the base device 110 is at least one material selected from the group consisting of aluminum, stainless steel, carbon fiber, and graphite. Or can be made from at least one material. According to some embodiments that can be combined with other embodiments described herein, the connection device 130 is at least one material selected from the group consisting of aluminum, stainless steel, carbon fiber, and graphite. Or can be made from at least one material. The base device 110 and the connection device 130 can be made of the same material or can be made of different materials.

  According to some embodiments that can be combined with other embodiments described herein, the one or more first flexible vacuum lines 120 are bellows. Additionally or alternatively, the one or more second flexible vacuum lines 140 are bellows. As an example, the one or more first flexible vacuum lines 120 can be referred to as “upper bellows”. One or more second flexible vacuum lines 140 may be referred to as “lower bellows”. The term “bellows” as used throughout this disclosure can be understood as a flexible line or tube whose volume can be changed by compression or expansion (eg, along the central axis of the flexible line). The flexible line or tube can be cylindrical and the central axis can be the cylindrical axis of the flexible line or tube.

  In some embodiments, the one or more first flexible vacuum lines 120 and the one or more second flexible vacuum lines 140 can be substantially the same. As an example, the number of one or more first flexible vacuum lines 120 may be equal to the number of one or more second flexible vacuum lines 140. The present disclosure is not limited thereto, and preferably the one or more first flexible vacuum lines 120 and one or more are suitable for reducing the vacuum-derived force back to the vacuum chamber 10, thereby reducing the vibration level of the vacuum chamber 10. It should be understood that any number and shape of the second flexible vacuum lines 140 can be provided. The diameter of the one or more first flexible vacuum lines 120 can be equal to the diameter of the one or more second flexible vacuum lines 140. Additionally or alternatively, the flexibility of the one or more first flexible vacuum lines 120 can be equal to the flexibility of the one or more second flexible vacuum lines 140.

  In applications with passive and active vibration isolation systems, vacuum pump suction forces can introduce overweight problems and additional functions and controls may be required to compensate for these forces. is there. In particular, the force acting on the active / passive vibration isolation system can be caused by the weight of the vacuum chamber and / or the vacuum force, for example when the pump is fixed on the base frame or on the ground. As an example, the greater the vacuum force, the larger the vibration isolation system should be. With the micro vibration isolation platform of the present disclosure, passive and active vibration isolation systems can have reduced load performance, and variations in vacuum pressure do not affect vibration isolation. As an example, an active / passive vibration isolation system used in a vacuum chamber in the transition between vacuum and atmospheric conditions is substantially free of fluctuations in vacuum pressure (eg, weight + vacuum force = 0). This can be particularly beneficial for material or probe load lock systems. In particular, the vibration performance of the vacuum chamber can be affected when the loadlock is returned to exhaust or vacuum (eg, for continuous adjustment of an active / passive vibration isolation system).

  FIG. 2 shows a schematic diagram of an apparatus 200 configured for vibration isolation of a vacuum chamber, according to embodiments described herein.

  The present disclosure provides a system having an apparatus configured for vibration isolation of a vacuum chamber (not shown) according to embodiments described herein. The system includes a vacuum chamber, the device is connected to the vacuum chamber, and one or more vacuum pumps 250 are connected to the base device 210 of the device.

  According to some embodiments that can be combined with other embodiments described herein, the base device 210 is a plate, and the first side and the second side of the base device 210 are both sides of the plate. It is. The term “plate” as used herein can be understood as a flat device having two expansion surfaces and a side surface connecting the two expansion surfaces. The first and second surfaces of the base device can be provided by two extended surfaces (eg, an upper surface and a lower surface) of the plate. As an example, the first surface can be the upper surface of the base device 210 and the second surface can be the lower surface of the base device 210.

  In some embodiments, the apparatus 200 includes two or more first flexible vacuum lines 120 and two or more second flexible vacuum lines 140. As an example, the two first flexible vacuum lines 120 are connected to the first surface of the base device 210, and the two second flexible vacuum lines 140 are connected to the second surface of the base device 210.

  According to some embodiments, one or more vacuum pumps 250 can be connected to the base device 210. As an example, one or more vacuum pumps 250 can be connected to the second surface of the base device 210. The one or more vacuum pumps 250 can be selected from the group consisting of a cryopump and a turbo pump, but are not limited thereto. A cryopump (or “cryogenic pump”) is a vacuum pump that traps gas by condensing the gas on a cold surface. The turbo pump is a propulsion pump. In some embodiments, one or more vacuum pumps 250 can be configured to support base device 110.

  According to some embodiments that can be combined with other embodiments described herein, the one or more vacuum pumps 250 can include one or more first flexible vacuum lines 120 and / or one or more Connected directly or indirectly to at least one of the second flexible vacuum lines 140, thereby evacuating the at least one flexible vacuum line. As an example, the one or more vacuum pumps 250 can be connected to the second surface of the base device 210, and the one or more first vacuum lines are connected to the first surface of the base device 210. The position of the vacuum pump on the second surface of the base device 210 may correspond to the position of the first flexible vacuum line on the first surface of the base device 210, respectively. In one example, the base device 210 can include an opening that connects a vacuum pump to each first flexible vacuum line, thereby creating a vacuum within the first flexible vacuum line. The first flexible vacuum line can be evacuated. One or more first flexible vacuum lines 120 may be further connected to the vacuum chamber.

  In some embodiments, the apparatus 200 includes one or more gates on at least one flexible vacuum line of the one or more first flexible vacuum lines 120 and the one or more second flexible vacuum lines 140. A valve 260 is included. One or more gate valves 260 may be mounted on the base device 210. As an example, one or more gate valves 260 are provided to close a connection between one or more first flexible vacuum lines 120 and one or more vacuum pumps 250. Each first flexible vacuum line 120 can have a respective gate valve connected thereto to isolate the first flexible vacuum line from the vacuum pump. According to some embodiments, one or more first flexible vacuum lines 120 are connected to a first surface of base device 210 and one or more gate valves 260 are connected to a second surface of base device 210. Each of the one or more vacuum pumps 250 is connected to a respective one of the one or more gate valves 260. In other words, the one or more vacuum pumps 250 are connected to the second surface of the base device 210 via the one or more gate valves 260.

  According to some embodiments, the apparatus 200 can be configured to provide a vacuum connection between the vacuum chamber and one or more vacuum pumps 250 that can be connected to the base apparatus 210. As an example, the vacuum connection can be provided by the base device 210 and one or more first flexible vacuum lines 120. In some embodiments, the vacuum chamber can be evacuated via the (open) gate valve, the opening of the base device 210, and one or more first flexible vacuum lines 120. The vacuum connection between the vacuum chamber and one or more vacuum pumps 250 can be closed by closing one or more gate valves 260.

  In a further example, the one or more first flexible vacuum lines 120 can be connected to one or more vacuum pumps 250 or another vacuum source (a vacuum chamber via a vacuum line).

  According to some embodiments that can be combined with other embodiments described herein, the device 200 includes one or more pedestals 270 configured to support the base device 210. One or more pedestals 270 can be placed on the ground (eg, on a test facility or laboratory floor). In some embodiments, one or more vacuum pumps 250 can be located on one or more pedestals 270. According to some embodiments, the device 200 can be vibration isolated from the floor. As an example, the one or more pedestals 270 can be disposed on an attenuation device 280 (eg, a ground base plate or a rubber mat).

  The apparatus 200 of the present disclosure allows for the placement of one or more vacuum pumps 250 on the ground (eg, using one or more pedestals 270). By placing one or more vacuum pumps 250 on the ground, vacuum pumps with increased mass and / or volume can be used. The increased mass can result in a reduction in the natural frequency of the system that can be beneficial in production and research pumping applications.

  According to some embodiments that can be combined with other embodiments described herein, the connecting device 230 is a frame (eg, a vertically oriented frame). The frame can be a rectangular frame. The frame can have an opening, and the base device 210 can be at least partially disposed within the opening. The frame can be ring-shaped, for example, a rectangular ring. In some embodiments, the frame may include a first frame portion 232 and a second frame portion 234. The first frame portion 232 may be disposed adjacent to (eg, above or below) the first surface of the base device 210. The second frame portion 234 can be disposed adjacent to (eg, below or above) the second surface of the base device 210. The first frame part 232 and the second frame part 234 can be parallel frame parts. As an example, the first frame portion 232 and the second frame portion 234 can be horizontal frame portions. According to some embodiments, the first frame portion 232 and the second frame portion 234 can be connected by two or more side or lateral frame portions 236. Two or more side or horizontal frame portions 236 can be vertical frame portions. A frame part (for example, a horizontal frame part and a vertical frame part) can be made into a rod shape.

  It is understood that the term “horizontal” is distinguished from “vertical”. That is, “horizontal” refers to a substantially horizontal orientation (eg, of the first frame portion 232 and the second frame portion 234) that is a deviation of several degrees (eg, up to 10 ° or even up to 15 °) from the exact horizontal orientation. Is still considered “horizontal”. The vertical orientation or direction can be substantially parallel to gravity.

  In some embodiments, the one or more second flexible vacuum lines 140 are connected to a first end connected to the second surface of the base device 210 and to a connection device 230 (eg, a second frame portion). Having a second end. The connection device 230 can be connected to a vacuum chamber. As an example, the first frame part 232 may be connectable to a vacuum chamber. The frame can be removably connected to the vacuum chamber (eg, using screws). The frame can also be connected to the vacuum chamber by welding. The connecting device 230 or frame can be suspended from the base device 210 using one or more second flexible vacuum lines 140, thereby allowing the connecting device 230 or frame to move relative to the base device 210. .

  In the example of FIG. 2, the one or more vacuum pumps 250 are rigid frames having openings connected to the vacuum chamber via an “upper” bellows (one or more first flexible vacuum lines 120). It can be separated from the vacuum chamber fixed on the connecting device 230. When one or more vacuum pumps 250 are active, the vacuum suction generates one or more vacuum pumps 250 secured on the connection device 230 and generates a force that causes the upper bellows to contract. In order to avoid contraction of the upper bellows, a “lower” bellows (one or more second flexible vacuum lines 140) is attached to the opposite side of the connection device 230. The lower bellows can be connected via a vacuum line to a vacuum chamber or another vacuum source, and can be firmly fixed on the connection device 230 (eg, an “O” frame). The vacuum suction of the lower bellows, for example, generates an equal force in a substantially opposite direction to the suction force generated by the vacuum pump when the upper and lower bellows are of equal size. The connection device 230 takes over the lower vacuum suction and pushes it into the vacuum chamber. As a result, the suction force associated with the connection device 230 and the vacuum pump 250 can be substantially zero.

  In order to maintain an optimal spacing between the vacuum chamber and a portion of the connection device 230 having a vacuum pump, the device (also referred to as a “microvibration isolation platform”) includes one or more pedestals 270 (eg, floor feet ) Can be supported. The device 200 is not exposed to vacuum suction and is vibration isolated through the upper and lower bellows, along with an optional additional vibration isolation device that can minimize the transmission of vibration to the floor of the vacuum pump 250. It is placed under its own weight on top.

  FIG. 3 shows a schematic diagram of an apparatus 300 configured for vibration isolation of a vacuum chamber, according to embodiments described herein.

  According to some embodiments that can be combined with other embodiments described herein, the apparatus includes one or more vacuum lines connecting one or more second flexible vacuum lines 140 and a vacuum source. 310 is included. One or more vacuum lines 310 can be used to evacuate one or more second flexible vacuum lines 140. As an example, the vacuum source is provided by at least one of one or more vacuum pumps 250 that can be connected to a base device 210, a vacuum chamber, or other vacuum pump. As an example, one or more vacuum lines 310 are connected to a vacuum chamber.

  FIG. 4 shows a schematic diagram of an apparatus 400 configured for vibration isolation of a vacuum chamber, according to embodiments described herein.

  According to some embodiments that can be combined with other embodiments described herein, the base device includes or is an auxiliary vacuum chamber 410, the first side of the base device. And the second surface is an opposing surface of the auxiliary vacuum chamber 410, and the one or more second flexible vacuum lines 140 are connected to the auxiliary vacuum chamber 410. As an example, one or more vacuum pumps 250 can be connected to the second surface of the auxiliary vacuum chamber 410 to provide a vacuum inside the auxiliary vacuum chamber 410. In some embodiments, the vacuum chamber and auxiliary vacuum chamber 410 are interconnected via one or more first flexible vacuum lines 120.

  The present disclosure provides an apparatus configured for vibration isolation of a vacuum chamber that reduces or compensates for vibrations transmitted to the vacuum chamber. The vacuum pump can be separated from the vacuum chamber and can be secured on a base device connected to the vacuum chamber via one or more first flexible vacuum lines. When the vacuum pump is active, the vacuum suction generates a first force that pulls the vacuum pump fixed on the base device and attempts to contract one or more first flexible vacuum lines. In order to avoid contraction of the one or more first flexible vacuum lines, the one or more second flexible vacuum lines are attached to the opposite side of the base device. A vacuum suction within the one or more second flexible vacuum lines generates a second force that acts on the one or more second flexible vacuum lines. The first force and the second force are substantially equal and point in opposite directions. A connecting device equipped with one or more second flexible vacuum lines takes over the second force and pushes it into the vacuum chamber. As a result, the vibration level of the vacuum chamber can be reduced.

  While the above is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be created without departing from the basic scope of the present disclosure, the scope of which is as follows: It is determined based on the range.

Claims (16)

An apparatus configured for vibration isolation of a vacuum chamber,
A base device having a first surface and a second surface, wherein the first surface and the second surface are opposite surfaces of the base device;
One or more first flexible vacuum lines having a first end connected to the first surface of the base device and a second end connectable to the vacuum chamber;
A connecting device connectable to the vacuum chamber and configured to be movable relative to the base device;
An apparatus comprising a first end connected to the second surface of the base device and one or more second flexible vacuum lines having a second end connected to the connection device.   The apparatus of claim 1, wherein the connecting device is suspended from the second surface of the base device using one or more second flexible vacuum lines.   3. The device according to claim 1 or 2, wherein one or more vacuum pumps are connectable to the base device.   One or more vacuum pumps are connected directly or indirectly to at least one flexible vacuum line of the one or more first flexible vacuum lines and the one or more second flexible vacuum lines, 4. The apparatus of claim 3, wherein the at least one flexible vacuum line is evacuated by.   The apparatus of any one of claims 1-4, comprising one or more vacuum lines connecting one or more second flexible vacuum lines and a vacuum source.   6. The apparatus of claim 5, wherein the vacuum source is provided by one or more vacuum pumps connectable to a base device, a vacuum chamber, or another vacuum pump.   The apparatus according to claim 1, wherein the base device is a plate, and the first surface and the second surface of the base device are both surfaces of the plate.   The base device includes an auxiliary vacuum chamber, wherein the first surface and the second surface of the base device are opposite surfaces of the auxiliary vacuum chamber, and the one or more second flexible vacuum lines are connected to the auxiliary vacuum chamber. The device according to claim 1.   9. The apparatus of claim 8, wherein the one or more first flexible vacuum lines are connected to an auxiliary vacuum chamber.   10. One or more gate valves in at least one flexible vacuum line of the one or more first flexible vacuum lines and the one or more second flexible vacuum lines. The device according to item.   The apparatus of claim 10, wherein the one or more gate valves are mounted on the base apparatus.   The apparatus according to claim 1, wherein the one or more first flexible vacuum lines and the one or more second flexible vacuum lines are bellows.   The device according to claim 1, wherein the connecting device is a frame.   14. A device according to any one of the preceding claims, comprising one or more pedestals configured to support the base device. A vacuum chamber;
The apparatus of any one of claims 1-14 connected to a vacuum chamber;
A system comprising one or more vacuum pumps connected to the base device of the device.   The system of claim 15, comprising one or more electron beam columns in the vacuum chamber.