JP3166021B2 - Repair method of insulation coating defect - Google Patents
Repair method of insulation coating defectInfo
- Publication number
- JP3166021B2 JP3166021B2 JP31533593A JP31533593A JP3166021B2 JP 3166021 B2 JP3166021 B2 JP 3166021B2 JP 31533593 A JP31533593 A JP 31533593A JP 31533593 A JP31533593 A JP 31533593A JP 3166021 B2 JP3166021 B2 JP 3166021B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating material
- insulating
- repair
- insulating coating
- defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Application Of Or Painting With Fluid Materials (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、導体、半導体等の基材
表面に形成された絶縁被覆に発生した欠陥の修復方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for repairing a defect generated on an insulating coating formed on the surface of a base material such as a conductor and a semiconductor.
【０００２】[0002]
【従来の技術】従来より導体、半導体等の基材表面にガ
ラス材料等の絶縁被覆を形成することが、電子回路部品
の製造等の分野において広く行われており、その絶縁被
覆形成手段としていわゆる電着が広く採用されている。
基材表面に絶縁被覆を形成した後、その絶縁被覆にポ
ア、クラック等、被覆絶縁性を劣化させる欠陥が生じる
ことがあり、そのような欠陥が生じた場合、絶縁被覆が
形成された基材にガラス材料等の絶縁材料を再度電着
し、これによりその欠陥の修復が行われる。この修復の
際は、もともと絶縁被覆を構成する絶縁材料と同一の絶
縁材料が使用されている。2. Description of the Related Art Conventionally, forming an insulating coating of a glass material or the like on the surface of a base material such as a conductor or a semiconductor has been widely performed in the field of manufacturing electronic circuit components and the like. Electrodeposition is widely used.
After the insulating coating is formed on the surface of the base material, defects such as pores and cracks may occur in the insulating coating, which may degrade the coating insulating property. If such defects occur, the base material on which the insulating coating is formed Then, an insulating material such as a glass material is electrodeposited again, whereby the defect is repaired. At the time of this repair, the same insulating material as the insulating material constituting the insulating coating is originally used.
【０００３】[0003]
【発明が解決しようとする課題】上述の修復方法では、
以下のような問題点があった。 （１）修復時に用いる絶縁材料が絶縁被覆を構成する絶
縁材料と同一であるため、修復のための絶縁材料と絶縁
被覆を構成している絶縁材料は同一の軟化温度を有し、
このため、その修復のための絶縁材料を電着した後に焼
成することで欠陥部を修復する場合、焼成時に、修復の
ための絶縁材料のみでなく絶縁被覆自体も軟化してしま
い、ダレ等の変形が生じる。 （２）溶融時の粘性が高い絶縁材料を用いて修復する
と、欠陥部を十分に覆うことが困難となり修復が不完全
になる。 （３）修復時に用いる絶縁材料が絶縁被覆を構成する絶
縁材料と同一であるため、修復後に修復個所の位置、個
数の確認することが困難である。In the above-mentioned restoration method,
There were the following problems. (1) Since the insulating material used at the time of repair is the same as the insulating material forming the insulating coating, the insulating material for repair and the insulating material forming the insulating coating have the same softening temperature,
For this reason, when the defective portion is repaired by firing after electrodeposition of the insulating material for the repair, not only the insulating material for the repair but also the insulating coating itself is softened at the time of firing, so Deformation occurs. (2) When repairing is performed using an insulating material having high viscosity at the time of melting, it is difficult to sufficiently cover the defective portion, and the repair is incomplete. (3) Since the insulating material used at the time of repair is the same as the insulating material constituting the insulating coating, it is difficult to confirm the position and the number of repaired portions after the repair.
【０００４】本発明は、上記の従来法が有する問題点を
克服した絶縁被覆欠陥の修復方法を提供するものであ
る。[0004] The present invention provides a method for repairing an insulating coating defect which overcomes the problems of the above-mentioned conventional method.
【０００５】[0005]
【課題を解決するための手段】上記目的を達成する本発
明の絶縁被覆欠陥の第１の修復方法は、例えば導体や半
導体等からなる基材表面に形成された絶縁被覆に発生し
た欠陥を電着により修復する絶縁被覆欠陥の修復方法に
おいて、上記絶縁被覆を構成する第１の絶縁材料の軟化
温度よりも低い軟化温度を有する第２の絶縁材料を用い
て、上記欠陥の修復を行なうことを特徴とするものであ
る。In order to achieve the above object, a first method for repairing an insulating coating defect according to the present invention is to repair defects generated in an insulating coating formed on the surface of a base material made of, for example, a conductor or a semiconductor. In the method of repairing an insulating coating defect repaired by adhesion, the repair of the defect is performed using a second insulating material having a softening temperature lower than the softening temperature of the first insulating material forming the insulating coating. It is a feature.
【０００６】ここで、上記第２の絶縁材料が、上記第１
の絶縁材料の軟化温度よりも低い軟化温度を有するとと
もに、溶融時に、前記第１の絶縁材料の溶融時の粘度よ
りも低い粘度を有するものであることが好ましい。また
本発明の絶縁被覆欠陥の第２の修復方法は、基材表面に
形成された絶縁被覆に発生した欠陥を電着により修復す
る絶縁被覆欠陥の修復方法において、上記絶縁被膜を構
成する第１の絶縁材料の光学的性質（例えば可視光下で
の色、特定波長の吸収率等）とは異なる光学的性質を有
する第２の絶縁材料を用いて、上記欠陥の修復を行うこ
とを特徴とするものである。Here, the second insulating material is made of the first insulating material.
It is preferable that the first insulating material has a softening temperature lower than the softening temperature of the insulating material, and has a lower viscosity than the first insulating material at the time of melting. A second method for repairing an insulating coating defect according to the present invention is a method for repairing a defect occurring in an insulating coating formed on the surface of a base material by electrodeposition. Repairing the defect by using a second insulating material having optical properties different from the optical properties of the insulating material (for example, color under visible light, absorptance at a specific wavelength, etc.) Is what you do.
【０００７】[0007]
【作用】上記本発明の絶縁被覆の第１の修復方法におい
ては、修復用の第２の絶縁材料として、絶縁被覆を構成
する第１の絶縁材料より軟化温度が低いものを使用する
ため、修復時の第２の絶縁材料の焼成は絶縁被覆を構成
する第１の絶縁材料の軟化点以下で行うことができ、被
覆の軟化による変形を回避できる。In the first method of repairing an insulating coating according to the present invention, a material having a lower softening temperature than the first insulating material constituting the insulating coating is used as the second insulating material for repair. The firing of the second insulating material at this time can be performed at a temperature lower than the softening point of the first insulating material constituting the insulating coating, and deformation due to softening of the coating can be avoided.
【０００８】また溶融時の粘性がより低い絶縁材料にて
修復を行うことで、欠陥が容易に行われ、修復の確実性
が向上する。また、上記本発明の絶縁被覆の第２の修復
方法においては、修復用の第２の絶縁材料として、絶縁
被覆を構成する第１の絶縁材料とは光学的性質が異なる
ものを使用するため、修復個所をその光学的性質の差異
により容易に識別できる。Further, by performing repair using an insulating material having a lower viscosity at the time of melting, defects are easily performed, and the reliability of repair is improved. In the second method of repairing the insulating coating according to the present invention, the second insulating material for repairing uses a material having optical properties different from those of the first insulating material forming the insulating coating. Restoration sites can be easily identified by differences in their optical properties.
【０００９】[0009]
【実施例】以下本発明は実施例について説明する。図１
は、本発明の実施に使用される電着装置の模式図、図２
は基材の平面形状を示した図である。 （実施例１）１００×１００ｍｍ（厚み０．２ｍｍ）の
インバー基材１上に日本電気硝子製ＳＴ−１１Ｗ／Ｋガ
ラスにて形成した厚み約５０μｍの絶縁被覆１ａに発生
した欠陥を修復した。Embodiments of the present invention will be described below. FIG.
FIG. 2 is a schematic view of an electrodeposition apparatus used for carrying out the present invention, FIG.
FIG. 3 is a diagram showing a planar shape of a base material. (Example 1) A defect generated in an insulating coating 1a having a thickness of about 50 µm and formed of ST-11W / K glass manufactured by NEC Corporation on an Invar base material 1 having a size of 100 x 100 mm (0.2 mm in thickness) was repaired.
【００１０】修復にはＧＡ−１２（日本電気硝子製、以
下「修復用ガラス」と称する）を使用した。超音波分散
層１０を用いて、イソプロパノール、１０００ＣＣにイ
オン交換水３０ＣＣを混合した分散媒体中に修復用ガラ
ス０．２５ｇを分散させて懸濁液を調整し、その懸濁液
を容器３０に移し、一方、ガラス被覆インバー基材１
（試料）とこの試料１を挟むように１５ｍｍの間隔をも
って設置された２枚のアルミニウム電極板２を試料ホル
ダ３に固定し、試料ホルダ３に固定された試料１とアル
ミニウム電極板２を容器３０内の懸濁液に浸し、直流電
源２０を用いて、試料１とアルミニウム電極板２との間
に試料１が負極となるように６００Ｖ（直流）を１分間
印加し、欠陥部に修復用ガラスを電着した。電着終了
後、試料１を容器３０から取り出し、大気中６９０℃で
５分間焼成し、欠陥部の修復を完了した。For repair, GA-12 (manufactured by Nippon Electric Glass Co., Ltd., hereinafter referred to as "repair glass") was used. Using the ultrasonic dispersion layer 10, 0.25 g of glass for repair is dispersed in a dispersion medium in which 30 CC of ion-exchanged water is mixed with 1000 CC of isopropanol to prepare a suspension, and the suspension is transferred to the container 30. On the other hand, the glass-coated invar base material 1
(Sample) and two aluminum electrode plates 2 placed at an interval of 15 mm so as to sandwich the sample 1 are fixed to a sample holder 3, and the sample 1 and the aluminum electrode plate 2 fixed to the sample holder 3 are placed in a container 30. And 600 V (DC) was applied between the sample 1 and the aluminum electrode plate 2 for 1 minute between the sample 1 and the aluminum electrode plate 2 using the DC power source 20 to repair the defective portion with the repair glass. Was electrodeposited. After the completion of the electrodeposition, the sample 1 was taken out of the container 30 and baked at 690 ° C. for 5 minutes in the atmosphere to complete the repair of the defective portion.
【００１１】修復用ガラスＧＡ−１２（軟化点５６０
℃）の焼成は、絶縁被覆を形成しているＳＴ−１１Ｗ／
Ｋガラスの軟化点７１０℃以下にて可能なため、絶縁被
覆の変形を回避できた。また修復用ガラス焼成温度であ
る６９０℃では、ＧＡ−１２は流動性が向上するため、
欠陥部を容易に覆うことができた。 （実施例２）１００×１００ｍｍ（厚み０．２ｍｍ）の
インバー基材１上に日本電気硝子製ＧＡ−４４ガラスに
て形成した厚み約５０μｍの絶縁被覆１ａに発生した欠
陥を修復した。Repair glass GA-12 (softening point 560)
℃), the ST-11W /
Since the softening point of K glass is possible at 710 ° C. or lower, deformation of the insulating coating can be avoided. At 690 ° C., which is the glass firing temperature for repair, GA-12 has improved fluidity,
The defect could be easily covered. (Example 2) A defect generated in an insulating coating 1a having a thickness of about 50 µm and formed of Nippon Electric Glass GA-44 glass on an Invar base material 1 having a size of 100 x 100 mm (0.2 mm in thickness) was repaired.
【００１２】修復にはＧＡ−４４の１００重量部に対
し、ＣｏＯを０．１重量部添加した組成のガラスを調整
し、平均粒径２μｍの粉末としたもの（以下「修復用ガ
ラス」と称する）を使用した。超音波分散層１０を用い
て、イソプロパノール、１０００ＣＣにイオン交換水３
０ＣＣを混合した分散媒体中に修復用ガラス０．２５ｇ
を分散させて懸濁液を調整し、その懸濁液を容器３０に
移し、一方、ガラス被覆インバー基材１（試料）とこの
試料１を挟むように１５ｍｍの間隔をもって設置された
２枚のアルミニウム電極板２を試料ホルダ３に固定し、
試料ホルダ３に固定された試料１とアルミニウム電極板
２を、容器３０内の懸濁液に浸し、直流電源２０を用い
て試料１とアルミニウム電極板２との間に試料１が負極
となるように６００Ｖ（直流）を１分間印加し、欠陥部
に修復用ガラスを電着した。電着終了後、試料１を容器
３０から取り出し、大気中８５０℃で５分間焼成し、欠
陥部の修復を完了した。For repair, a glass having a composition in which 0.1 part by weight of CoO is added to 100 parts by weight of GA-44 to prepare a powder having an average particle size of 2 μm (hereinafter referred to as “repair glass”) )It was used. Using the ultrasonic dispersion layer 10, ion-exchanged water 3 in isopropanol and 1000 CC
0.25g glass for repair in dispersion medium mixed with 0CC
Is dispersed to prepare a suspension, and the suspension is transferred to a container 30. On the other hand, a glass-coated invar substrate 1 (sample) and two sheets of the glass-covered invar substrate 1 placed at a distance of 15 mm so as to sandwich the sample 1 Fixing the aluminum electrode plate 2 to the sample holder 3,
The sample 1 and the aluminum electrode plate 2 fixed to the sample holder 3 are immersed in the suspension in the container 30, and the direct current power source 20 is used so that the sample 1 becomes a negative electrode between the sample 1 and the aluminum electrode plate 2. 600 V (direct current) was applied for 1 minute, and a glass for repair was electrodeposited on the defective portion. After the completion of the electrodeposition, the sample 1 was taken out of the container 30 and baked at 850 ° C. for 5 minutes in the atmosphere to complete the repair of the defective portion.
【００１３】ＧＡ−４４ガラス被覆が灰褐色であるのに
対し、焼成後の修復用ガラスは青色を帯びるため修復個
所の位置、個数を容易に確認できた。While the GA-44 glass coating was gray-brown, the glass for repair after firing had a blue tint, so that the position and number of repaired portions could be easily confirmed.
【００１４】[0014]
【発明の効果】以上説明したように、本発明の絶縁被覆
の第１の修復方法によれば、修復時の第２の絶縁材料の
焼成は絶縁被覆を構成する第１の絶縁材料の軟化点以下
で行うことができ、被覆の軟化による変形を回避でき
る。また溶融時の粘性がより低い絶縁材料で修復を行な
った場合、欠陥部がより容易に覆われ、より確実な修復
が行なわれる。As described above, according to the first method of repairing the insulating coating of the present invention, the baking of the second insulating material at the time of repairing is performed by softening the first insulating material constituting the insulating coating. This can be performed as follows, and deformation due to softening of the coating can be avoided. When the repair is performed with an insulating material having a lower viscosity at the time of melting, the defective portion is more easily covered, and the repair is more reliably performed.
【００１５】また本発明の絶縁被覆の第２の修復方法に
よれば、修復個所をその光学的性質の差異により容易に
識別できる。According to the second method of repairing the insulating coating of the present invention, the repaired portion can be easily identified by the difference in the optical properties.
【図１】本発明の実施に使用される電着装置の模式図で
ある。FIG. 1 is a schematic view of an electrodeposition apparatus used for carrying out the present invention.
【図２】基材の平面形状を示した図である。FIG. 2 is a diagram showing a planar shape of a base material.
１ 基材（試料） ２ アルミニウム電極 ３ 試料ホルダ １０ 超音波分散層 ２０ 直流電源 ３０ 容器 DESCRIPTION OF SYMBOLS 1 Base material (sample) 2 Aluminum electrode 3 Sample holder 10 Ultrasonic dispersion layer 20 DC power supply 30 Container
───────────────────────────────────────────────────── フロントページの続き (72)発明者 中村 雅彦 埼玉県秩父郡横瀬町大字横瀬2270番地 三菱マテリアル株式会社 セラミックス 研究所内 (56)参考文献 特開 平６−204524（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) C25D 13/00,13/22 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Masahiko Nakamura 2270 Yokoze, Yokoze-cho, Chichibu-gun, Saitama Prefecture Mitsubishi Materials Corporation Ceramics Research Laboratory (56) References JP-A-6-204524 (JP, A) (58) Field surveyed (Int. Cl. 7 , DB name) C25D 13/00, 13/22
Claims (3)
た欠陥を電着により修復する絶縁被覆欠陥の修復方法に
おいて、 前記絶縁被覆を構成する第１の絶縁材料の軟化温度より
も低い軟化温度を有する第２の絶縁材料を用いて、前記
欠陥の修復を行なうことを特徴とする絶縁被覆欠陥の修
復方法。1. A method for repairing a defect in an insulating coating formed on an insulating coating formed on a surface of a base material by electrodeposition, wherein the softening temperature is lower than a softening temperature of a first insulating material forming the insulating coating. A method for repairing an insulating coating defect, wherein the defect is repaired using a second insulating material having a temperature.
い軟化温度を有するとともに、溶融時に、前記第１の絶
縁材料の溶融時の粘度よりも低い粘度を有する第２の絶
縁材料を用いて、前記欠陥の修復を行なうことを特徴と
する請求項１記載の絶縁被覆欠陥の修復方法。2. A method according to claim 1, wherein the second insulating material has a softening temperature lower than a softening temperature of the first insulating material, and has a lower viscosity at the time of melting than at the time of melting of the first insulating material. 2. The method according to claim 1, wherein the defect is repaired.
た欠陥を電着により修復する絶縁被覆欠陥の修復方法に
おいて、 前記絶縁被膜を構成する第１の絶縁材料の光学的性質と
は異なる光学的性質を有する第２の絶縁材料を用いて、
前記欠陥の修復を行うことを特徴とする絶縁被覆欠陥の
修復方法。3. A method for repairing a defect of an insulating coating formed on an insulating coating formed on a surface of a base material by electrodeposition, wherein the defect is different from an optical property of a first insulating material forming the insulating coating. Using a second insulating material having optical properties,
A method for repairing an insulating coating defect, the method comprising repairing the defect.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31533593A JP3166021B2 (en) | 1993-12-15 | 1993-12-15 | Repair method of insulation coating defect |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31533593A JP3166021B2 (en) | 1993-12-15 | 1993-12-15 | Repair method of insulation coating defect |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07166399A JPH07166399A (en) | 1995-06-27 |
| JP3166021B2 true JP3166021B2 (en) | 2001-05-14 |
Family
ID=18064176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31533593A Expired - Fee Related JP3166021B2 (en) | 1993-12-15 | 1993-12-15 | Repair method of insulation coating defect |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3166021B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6069775B1 (en) * | 2016-03-25 | 2017-02-01 | 伊藤 幸男 | Wire mesh grinding wheel with coolant guide base metal |
-
1993
- 1993-12-15 JP JP31533593A patent/JP3166021B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6069775B1 (en) * | 2016-03-25 | 2017-02-01 | 伊藤 幸男 | Wire mesh grinding wheel with coolant guide base metal |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07166399A (en) | 1995-06-27 |
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