JP3108350U - Heating device using electrothermal film as heating source - Google Patents
Heating device using electrothermal film as heating source Download PDFInfo
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- JP3108350U JP3108350U JP2004006186U JP2004006186U JP3108350U JP 3108350 U JP3108350 U JP 3108350U JP 2004006186 U JP2004006186 U JP 2004006186U JP 2004006186 U JP2004006186 U JP 2004006186U JP 3108350 U JP3108350 U JP 3108350U
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Abstract
【課題】 本考案は電熱膜を加熱源とした加熱装置を提供する。
【解決手段】本考案は、電熱膜を加熱源とした加熱装置であって、前記加熱装置は遠赤外線放射材を基板材料に混入添加して成型された基板１と、前記基板１の１つの面に加熱用の電熱膜層２を設置し、前記電熱膜層２の両端に電極３が設置され、前記電極３からの通電により前記電熱膜層２が前記基板１の遠赤外線放射材に作用し、該遠赤外線放射材から発生する遠赤外線により被加熱物を加熱することができるようにした。また前記電熱膜層２上に耐熱絶縁層４を設置することにより、加熱装置の加熱面における断熱及び安全性を確保することができるようにした。
【選択図】 図１PROBLEM TO BE SOLVED: To provide a heating device using an electrothermal film as a heating source.
The present invention is a heating device using an electrothermal film as a heating source, and the heating device includes a substrate 1 formed by mixing and adding a far-infrared radiation material to a substrate material, and one of the substrates 1. An electrothermal film layer 2 for heating is installed on the surface, electrodes 3 are installed on both ends of the electrothermal film layer 2, and the electrothermal film layer 2 acts on the far-infrared radiation material of the substrate 1 by energization from the electrode 3 The object to be heated can be heated by far infrared rays generated from the far infrared ray emitting material. In addition, by installing the heat-resistant insulating layer 4 on the electrothermal film layer 2, heat insulation and safety on the heating surface of the heating device can be secured.
[Selection] Figure 1
Description
本考案は、電熱膜を加熱源とする加熱装置の構造を提供するもので、構造の簡略化及び加熱効率を高めることができるようにした電熱膜を加熱源とする加熱装置に関する。 The present invention provides a structure of a heating apparatus using an electrothermal film as a heating source, and relates to a heating apparatus using an electrothermal film as a heating source that can simplify the structure and increase the heating efficiency.
従来の加熱装置は、主にニクロムコイル或いは石英管により空気の熱伝導により加熱する必要がある。しかるに、空気による熱伝導は効率が悪く、均等に加熱できないという問題点があると共に、装置が大型となり、加熱温度のコントロールが容易ではないという問題点がある。したがって、現在使用に供されている加熱装置は、電熱膜加熱方式が採用されている。
前記加熱装置における加熱源としての電熱膜と従来の電熱コイルとを比較すると、前記電熱膜は二次加熱伝導の必要がない為、被加熱物を迅速にしかも均等に加熱でき、かつ安全性、効率性がよいというメリットがある。
Conventional heating devices need to be heated mainly by nichrome coils or quartz tubes by heat conduction of air. However, there is a problem that heat conduction by air is inefficient and cannot be uniformly heated, and there is a problem that the apparatus becomes large and the control of the heating temperature is not easy. Therefore, the heating apparatus currently in use employs an electrothermal film heating method.
Comparing the electrothermal film as a heating source in the heating device with a conventional electrothermal coil, the electrothermal film does not need secondary heating conduction, so the object to be heated can be heated quickly and evenly, and safety, There is a merit that efficiency is good.
台湾特許公告第４７２９９７号の「加熱装置」を例にとれば、加熱装置は主に少なくとも１つの電熱膜を有し、前記電熱膜は、１つの基板と、１つのＡｇ−エポキシ樹脂と、１つの電極とからなり、前記基板の１つの面に遠赤外線放射層を有し、前記基板のもう１つの面には電熱膜層を有し、且つ、前記電熱膜層は導電保護層を有し、前記保護層は酸化表面を有し、前記Ａｇ−エポキシ樹脂は前記保護層上に予め設置され、且つ、保護層内部と電気的に接続され、前記電極は保護層とＡｇ−エポキシ樹脂と電熱膜層とに電気的に接続される構造で、電熱膜と遠赤外線放射層との作用により遠赤外線による被加熱物への加熱において高効率の加熱を達成することができるというものである「中華民国九十一年一月十一日（西暦２００２年１月１１日）専利参照」。
前記従来公知の加熱装置は、高温焼結により基板上に遠赤外線放射層を形成するが、その加工工程は多少複雑であり、又、電熱膜層と遠赤外線放射層との間に基板があって間隔があるため、そのエネルギー転換効率が悪いという問題点があり、如何にして前記問題点を改良した構造の電熱膜を加熱源とする加熱装置を開発するかが、関係業界では開発目標となっている。
本考案人は前記課題に取り組み、長年セラミック産業設計製造に従事し、研究改良を積み重ね、ついに実用性のある本考案を完成した。
The above-mentioned conventionally known heating device forms a far-infrared radiation layer on a substrate by high-temperature sintering, but the processing process is somewhat complicated, and there is a substrate between the electrothermal film layer and the far-infrared radiation layer. Therefore, there is a problem in that the energy conversion efficiency is poor, and how to develop a heating device using an electrothermal film with a structure that improves the above problem as a heating source It has become.
The inventor tackled the above-mentioned problems, engaged in ceramic industrial design and manufacture for many years, accumulated research and improvement, and finally completed the practical invention.
本考案の主な目的は電熱膜を加熱源とする加熱装置であり、遠赤外線放射材を基板材料に混入添加して成型された基板１と、前記基板１の１つの面に加熱用の電熱膜層２が設置され、前記電熱膜層２の両端に電極３が設置され、前記電極３の導電により前記電熱膜層２が前記基板１の遠赤外線放射材に作用し、発生する遠赤外線により被加熱物を加熱することができ、かつ構造の簡略化及び加熱効率を高めるようにすることにある。
本考案のもう１つの目的は、前記電熱膜層２上に耐熱絶縁層４を設置することにより、前記電熱膜を加熱源とする加熱装置の加熱面における断熱及び安全性を確保することができるようにすることにある。
The main object of the present invention is a heating device using an electrothermal film as a heating source, and a substrate 1 formed by mixing and adding a far-infrared radiation material to a substrate material, and heating on one surface of the substrate 1 A film layer 2 is installed, electrodes 3 are installed at both ends of the electrothermal film layer 2, the electrothermal film layer 2 acts on the far-infrared radiation material of the substrate 1 due to the conduction of the electrode 3, and the generated far infrared radiation An object is to heat an object to be heated, and to simplify the structure and increase the heating efficiency.
Another object of the present invention is to install a heat-resistant insulating layer 4 on the electrothermal film layer 2 to ensure heat insulation and safety on the heating surface of a heating device using the electrothermal film as a heating source. There is in doing so.
請求項１の考案は、電熱膜を加熱源とした加熱装置であって、前記加熱装置は遠赤外線放射材を基板材料に混入添加して成型された基板１と、前記基板１の１つの面に加熱用の電熱膜層２を設置し、前記電熱膜層２の両端に電極３が設置され、前記電極３からの通電により前記電熱膜層２が前記基板１の遠赤外線放射材に作用し、該遠赤外線放射材から発生する遠赤外線により被加熱物を加熱することができるようにしたことを特徴とする。
請求項２の考案は、請求項１記載の電熱膜を加熱源とした加熱装置において、
前記電熱膜層２上に耐熱絶縁層４を設置することにより、加熱装置の加熱面における断熱及び安全性を確保することができるようにしたことを特徴とする。
The invention of claim 1 is a heating device using an electrothermal film as a heating source, and the heating device includes a substrate 1 formed by mixing and adding a far infrared radiation material to a substrate material, and one surface of the substrate 1. An electrothermal film layer 2 for heating is installed, electrodes 3 are installed at both ends of the electrothermal film layer 2, and the electrothermal film layer 2 acts on the far-infrared radiation material of the substrate 1 by energization from the electrode 3. The object to be heated can be heated by far infrared rays generated from the far infrared ray emitting material.
The invention of claim 2 is a heating apparatus using the electrothermal film of claim 1 as a heating source.
By installing the heat-resistant insulating layer 4 on the electrothermal film layer 2, heat insulation and safety on the heating surface of the heating device can be secured.
本考案に係る電熱膜を加熱源とした加熱装置は、遠赤外線放射材を基板材料に混入添加して成型された基板１からなり、前記基板１の１つの面に加熱用の電熱膜層２が設置され、前記電熱膜層２の両端に電極３が設置され、前記電極３の導電により前記電熱膜層２が前記基板１の遠赤外線放射材に作用するように構成したので、構造の簡略化に加え、発生する遠赤外線により被加熱物を加熱することができ、被加熱物を迅速にしかも均等に加熱でき、かつ安全性及び加熱効率性がよいという効果がある。
さらに、本考案においては、前記電熱膜層２上に耐熱絶縁層４を設置する構成とすることにより、前記電熱膜を加熱源とする加熱装置の加熱面における断熱及び安全性を確保することができる効果を奏する。
A heating apparatus using an electrothermal film as a heating source according to the present invention comprises a substrate 1 formed by mixing and adding a far-infrared radiation material to a substrate material, and an electrothermal film layer 2 for heating is formed on one surface of the substrate 1. Since the electrode 3 is installed at both ends of the electrothermal film layer 2 and the electrothermal film layer 2 acts on the far-infrared radiation material of the substrate 1 by the conduction of the electrode 3, the structure is simplified. In addition to the above, the object to be heated can be heated by generated far infrared rays, and the object to be heated can be heated quickly and evenly, and safety and heating efficiency are good.
Furthermore, in the present invention, by setting the heat-resistant insulating layer 4 on the electrothermal film layer 2, it is possible to ensure heat insulation and safety on the heating surface of the heating device using the electrothermal film as a heating source. There is an effect that can be done.
以下、添付図面を参照して本考案の好適な実施の形態を詳細に説明する。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
図１は本考案の電熱膜を加熱源とした加熱装置の第１実施例を示す平面図である。
本考案の電熱膜を加熱源とした加熱装置は、基板１と、該基板１の上面に設けられた加熱用の電熱膜層２と、電熱膜層２の両端に配設された電極３と、から構成されている。
前記基板１は、セラミック粉末等からなる遠赤外線放射材を基板材料に混入して成型されたものである。そして、前記基板１の上面には、例えば：スズ、ニクロム合金、銅−ニッケル合金コンスタンタン（constantan）、銅−ニッケル−マンガン合金等からなる加熱用の電熱膜層２が、熱化学反応高温霧化成長方法など周知の技術によって形成設置されている。
また、前記電熱膜層２の両端には電極３が配設されており、該電極３への通電により前記電熱膜層２に導電されることで、前記基板１の遠赤外線放射材に作用し、遠赤外線放射材から発生する遠赤外線により被加熱物を加熱することができるようになっている。
本考案における前記第１実施例による電熱膜を加熱源とした加熱装置は、従来に比較して格段に構造が簡略化されると共に、加熱装置としての加熱効率を高めることができる。
FIG. 1 is a plan view showing a first embodiment of a heating apparatus using an electrothermal film of the present invention as a heating source.
The heating device using the electrothermal film of the present invention as a heating source includes a substrate 1, an electrothermal film layer 2 for heating provided on the upper surface of the substrate 1, and electrodes 3 disposed at both ends of the electrothermal film layer 2. , Is composed of.
The substrate 1 is formed by mixing a far-infrared radiation material made of ceramic powder or the like into a substrate material. On the upper surface of the substrate 1, a heating electrothermal film layer 2 made of, for example, tin, nichrome alloy, copper-nickel alloy constantan, copper-nickel-manganese alloy, or the like is formed by thermochemical reaction high temperature atomization. It is formed and installed by a well-known technique such as a growth method.
In addition, electrodes 3 are disposed at both ends of the electrothermal film layer 2, and the electrothermal film layer 2 is electrically conducted to the electrode 3 so that it acts on the far-infrared radiation material of the substrate 1. The object to be heated can be heated by far infrared rays generated from the far infrared ray emitting material.
The heating apparatus using the electrothermal film according to the first embodiment of the present invention as a heating source can be remarkably simplified in structure as compared with the conventional one and can increase the heating efficiency as the heating apparatus.
図２は本考案の電熱膜を加熱源とした加熱装置の第２実施例を示す断面図である。
この考案における第２実施例は、前述の第１実施例における前記電熱膜層２の上面に耐熱絶縁層４を設置した点が異なるもので、その他の構成は同一であるので、同一部分には同一符号を付してその説明を省略してある。
第２実施例によれば、前記加熱部となる電熱膜層２の上面に耐熱絶縁層４を設置したので、加熱装置における断熱及び安全性を確保することができる。
FIG. 2 is a cross-sectional view showing a second embodiment of a heating apparatus using the electrothermal film of the present invention as a heating source.
The second embodiment of the present invention is different in that the heat-resistant insulating layer 4 is provided on the upper surface of the electrothermal film layer 2 in the first embodiment described above, and other configurations are the same. The same reference numerals are given and the description thereof is omitted.
According to the second embodiment, since the heat-resistant insulating layer 4 is provided on the upper surface of the electrothermal film layer 2 serving as the heating unit, heat insulation and safety in the heating apparatus can be ensured.
前記のように本考案は、電熱膜を加熱源とする加熱装置の構造を提供するものであって、その構造が簡略化されると共に、加熱装置としての加熱効率を高めることができるものである。 As described above, the present invention provides a structure of a heating device using an electrothermal film as a heating source, which simplifies the structure and increases the heating efficiency as the heating device. .
以上のように、本考案の実施例について、その技術及び特徴を具体的に説明したが、本考案は前述の実施例に限定されることなく、本考案の実用新案登録請求の範囲内における種々の変更・改良は当然本考案の権利範囲に属するものである。 As described above, the technology and features of the embodiments of the present invention have been specifically described. However, the present invention is not limited to the above-described embodiments, and various modifications within the scope of the claims of the utility model registration of the present invention. Of course, any change or improvement belongs to the scope of the present invention.
１ 基板
２ 電熱膜層
３ 電極
４ 耐熱絶縁層
1 Substrate 2 Electrothermal film layer 3 Electrode 4 Heat-resistant insulating layer
Claims (2)
The heating film according to claim 1, wherein the heat-insulating layer 4 is provided on the heating film layer 2 so as to ensure heat insulation and safety on the heating surface of the heating device. Heating device as a source.
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| JP2004006186U JP3108350U (en) | 2004-10-21 | 2004-10-21 | Heating device using electrothermal film as heating source |
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| JP2004006186U JP3108350U (en) | 2004-10-21 | 2004-10-21 | Heating device using electrothermal film as heating source |
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| JP3108350U true JP3108350U (en) | 2005-04-14 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0615453U (en) * | 1992-08-06 | 1994-03-01 | 一馬 金栗 | Drilling bucket for planting |
| WO2016024610A1 (en) * | 2014-08-12 | 2016-02-18 | 積水ナノコートテクノロジー株式会社 | Planar heating element and method for manufacturing same |
| CN113453387A (en) * | 2021-03-23 | 2021-09-28 | 苏州汉纳材料科技有限公司 | Far infrared electrothermal film based on carbon nano tube and preparation method thereof |
-
2004
- 2004-10-21 JP JP2004006186U patent/JP3108350U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0615453U (en) * | 1992-08-06 | 1994-03-01 | 一馬 金栗 | Drilling bucket for planting |
| WO2016024610A1 (en) * | 2014-08-12 | 2016-02-18 | 積水ナノコートテクノロジー株式会社 | Planar heating element and method for manufacturing same |
| CN113453387A (en) * | 2021-03-23 | 2021-09-28 | 苏州汉纳材料科技有限公司 | Far infrared electrothermal film based on carbon nano tube and preparation method thereof |
| WO2022199512A1 (en) * | 2021-03-23 | 2022-09-29 | 苏州汉纳材料科技有限公司 | Far infrared electric heating film based on carbon nanotube and preparation method therefor |
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