JP3107796U - Rubber cap structure of hat - Google Patents

Rubber cap structure of hat Download PDF

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Publication number
JP3107796U
JP3107796U JP2004005560U JP2004005560U JP3107796U JP 3107796 U JP3107796 U JP 3107796U JP 2004005560 U JP2004005560 U JP 2004005560U JP 2004005560 U JP2004005560 U JP 2004005560U JP 3107796 U JP3107796 U JP 3107796U
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Japan
Prior art keywords
hat
rubber pad
elastic
peripheral edge
rubber
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JP2004005560U
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Japanese (ja)
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松岳 廖
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全成製帽廠股▲ふん▼有限公司
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Abstract

【課題】良好な汗の吸収性及び通気性を具え、且つ頭部にフィットする伸縮効果も具える帽子のゴム当て構造を提供する。
【解決手段】帽子体20の内側下周辺縁に頭部にフィットさせるために設ける伸縮性のゴム当て21構造において、帽子体の内側下周辺縁に本布210と弾性伸縮ゴム体211を適宜の間隔で交互に設けることによって、弾性伸縮ゴム体の十分な伸縮性を確保すると共に本布により良好な吸収率及び通気性を具える。
【選択図】図4
The present invention provides a rubber pad structure for a hat that has good sweat absorption and breathability and also has an expansion / contraction effect that fits the head.
In a stretchable rubber pad 21 structure provided to fit a head on the inner lower peripheral edge of a hat body 20, a main cloth 210 and an elastic elastic rubber body 211 are appropriately attached to the inner lower peripheral edge of the hat body. By providing them alternately at intervals, sufficient elasticity of the elastic elastic rubber body is ensured, and the fabric has a good absorption rate and air permeability.
[Selection] Figure 4

Description

本考案は、帽子内側周辺縁に設けられて被った帽子を密着させるためのゴム当て構造に関するもので、良好な汗の吸収性及び通気性を具え、且つ伸縮効果も具える。   The present invention relates to a rubber pad structure that is provided on the inner peripheral edge of the hat to closely contact the hat, and has good sweat absorption and breathability, and also has an expansion / contraction effect.

公知の帽子は、種類も多いが、構造上どの帽子体の内側周辺縁にもゴム当てが設置される。図1に示すとおり、通常見られる帽子は、帽子体10内側周辺縁に設置されるゴム当て11は、一本の同質材で帽子体10内側周辺縁に縫いつけられる。この種の帽子は、かぶった時ゴム当てが伸びるため、伸縮効果を具えるが、通気性及び汗の吸収率は劣る。
図2に示すものは、別の公知例で、その帽子体10内側周辺縁にゴム当て12が縫い付けられ、上方の本布上には孔13を開けて伸縮効果と共に通気性を得る。
また、図3に示すのは、更に別の公知で、一部にゴム当て14を設置するが、この種の方法は、伸縮効果が良好ではない。
特開2004−124285号公報
Although there are many types of known hats, a rubber pad is installed on the inner peripheral edge of any hat body. As shown in FIG. 1, in a normally seen hat, a rubber pad 11 installed on the inner peripheral edge of the hat body 10 is sewn to the inner peripheral edge of the hat body 10 with a single homogeneous material. This type of hat has a stretch effect because the rubber pad stretches when worn, but it has poor breathability and sweat absorption.
FIG. 2 shows another known example, in which a rubber pad 12 is sewn on the inner peripheral edge of the cap body 10, and a hole 13 is formed on the upper main cloth to obtain a breathability as well as an expansion / contraction effect.
Further, FIG. 3 shows another known method, in which a rubber pad 14 is partially installed, but this type of method does not have a good stretch effect.
JP 2004-124285 A

解決しようとする問題点は、帽子を被ったときに頭部にフィットさせるための帽子体の内側周辺縁のゴム当ての伸縮性と共に、通気性及び汗の吸収性を向上することにある。   The problem to be solved is to improve the breathability and the absorbability of sweat as well as the elasticity of the rubber pad on the inner peripheral edge of the hat body to fit the head when wearing the hat.

本考案は、帽子体の内側下周辺縁に本布と弾性伸縮ゴムを適する間隔で設置することによって、良好な汗の吸収性及び通気性を具え、且つ伸縮効果も具えることを最も主要な特徴とする。     The most important feature of the present invention is that it has good sweat absorption and breathability and also has a stretching effect by installing this cloth and elastic elastic rubber at appropriate intervals on the inner lower peripheral edge of the hat body. Features.

本考案の帽子のゴム当て構造は、良好な汗の吸収性及び通気性を具え、且つ伸縮効果も具えるという利点がある。     The rubber pad structure of the hat of the present invention has an advantage that it has good sweat absorption and breathability and also has a stretching effect.

(実施例1)
図4、5,6に示すとおり、本考案は、帽子体20の内側下周辺縁のゴム当て21が本布210上で適する間隔で設置される。何本ものゴム当て211が適する間隔で配列したゴム当て21構造となり、これにより、良好な汗の吸収性及び通気性を具え、且つ伸縮効果も具える。
Example 1
As shown in FIGS. 4, 5, and 6, in the present invention, the rubber pads 21 at the inner lower peripheral edge of the hat body 20 are installed on the cloth 210 at suitable intervals. A rubber pad 21 structure in which a number of rubber pads 211 are arranged at suitable intervals is provided, thereby providing good sweat absorption and breathability, and also having a stretching effect.

本考案のゴム当て構造の幅は、必要に応じて変更・調整し、本布210は木綿素材、ナイロン、弾性繊維等と適宜のものでよい。   The width of the rubber pad structure of the present invention may be changed / adjusted as necessary, and the cloth 210 may be appropriately made of cotton material, nylon, elastic fiber, or the like.

公知の立体図である。It is a well-known three-dimensional figure. 公知の立体図である。It is a well-known three-dimensional figure. 公知の立体図である。It is a well-known three-dimensional figure. 本考案の立体図である。It is a three-dimensional view of the present invention. 本考案のゴム当てが伸縮していない状態平面図である。It is a state top view in which the rubber pad of the present invention is not expanded and contracted. 本考案のゴム当てが伸縮した状態平面図である。It is a state top view in which the rubber pad of the present invention was expanded and contracted.

符号の説明Explanation of symbols

10 帽子体
11 ゴム当て
12 伸縮帯
13 孔
14 伸縮帯
20 帽子体
21 ゴム当て
210 本布
211 伸縮帯
DESCRIPTION OF SYMBOLS 10 Hat body 11 Rubber pad 12 Elastic band 13 Hole 14 Elastic band 20 Hat body 21 Rubber pad 210 This cloth 211 Elastic band

Claims (1)

帽子の内側下周辺縁に設置するゴム当てにおいて、本布上に適宜の間隔で弾性伸縮ゴム体を設け、交互に設けられた複数箇所のゴム当てによって伸縮性を保持すると共にゴム当ての設けられていない本布によって通気性、汗の吸収性を持たせたことを特徴とする帽子のゴム当て構造。





In the rubber pads installed on the inner lower peripheral edge of the hat, elastic elastic rubber bodies are provided on the cloth at appropriate intervals, and the elastic pads are provided with rubber pads provided alternately, and the rubber pads are provided. A rubber padding structure for hats, which is made of breathable fabric and absorbs sweat.





JP2004005560U 2004-09-17 2004-09-17 Rubber cap structure of hat Expired - Lifetime JP3107796U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004005560U JP3107796U (en) 2004-09-17 2004-09-17 Rubber cap structure of hat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004005560U JP3107796U (en) 2004-09-17 2004-09-17 Rubber cap structure of hat

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