JP3103346B2 - Rotary coating apparatus and rotary coating method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for applying a coating solution such as a photoresist solution to a surface of a substrate such as a glass substrate for a liquid crystal display panel, a semiconductor wafer, and a mask substrate for a semiconductor manufacturing apparatus by utilizing centrifugal force. The present invention relates to a rotary coating apparatus for coating a thin film and a rotary coating method .

[0002]

[0003]

2. Description of the Related Art In a rotary coating apparatus of this kind, a rotary table for horizontally supporting and rotating a substrate, a lid for closing the rotary table, a case surrounding the circumference of the rotary table, and a lid for closing the upper surface of the case are provided. And a lid that closes the case is fixedly supported so as not to rotate, and a lid that closes the turntable is rotatably supported by bearings.

[0004]

In the prior art described above, the lid for closing the turntable is supported by a bearing so as to be always rotatable. Therefore, this lid
The turntable can be rotated even when the turntable is not closed, that is, even when the lid is raised. For example, if the operator of the apparatus touches the lid by mistake, the apparatus is undesirably rotated. When the lid is undesirably rotated with respect to the turntable in this manner, the next connection position between the turntable and the lid changes in the circumferential direction, and it becomes difficult to maintain a fixed connection state. In addition, the connection between the turntable and the lid is determined by a positioning mechanism such as a pin, in order to maintain a fixed connection state and prevent slippage between the turntable and the lid during rotation, etc. In some cases. In such a case, if the lid in the raised state rotates undesirably, there is a possibility that the lid may not be able to be coupled even if the lid is then lowered to be coupled to the turntable.

The present invention has been made in view of the above circumstances, and prevents an undesired rotation of an upper plate that is separated from a turntable, and always keeps a fixed state between the turntable and the upper plate. It is intended to provide a rotary coating apparatus and a rotary coating method which can keep the substrate in a stable state and perform stable substrate processing.

[0006]

SUMMARY OF THE INVENTION The structure and effect of the present invention
With reference to the reference numerals in the drawings based on the embodiments described in detail below.
Will be explained. [Non-contact structure] As described in the embodiment, the electric motor
Activating the motor 7 to turn the turntable 2, upper support plate 4, and upper turn plate
3 and the rectangular substrate 1 are horizontally rotated integrally. This and
As is clear from the drawings of FIGS.
2, upper support plate 4, upper rotating plate 3, mounting member 30, annular
The plate 31 is in a non-contact state with the fixed support member 16.
The turntable 2, the upper support plate 4, and the upper turn plate 3 are fixed.
It can rotate freely regardless of the fixed support member 16. [Effect of Non-Contact Structure] The upper support plate 4 and the upper rotating plate 3 which are larger than the rectangular substrate 1
As compared to a case where the bearings are rotatably supported using bearings
In addition, the number of sliding parts is reduced, so the life and
It is advantageous in the amount of
This eliminates the need for lining, which is advantageous in cost. Ma
Also, when the bearing is supported rotatably by bearings,
Bearings for supporting the upper support plate 4 and the upper rotary plate 3
Exactly coincides with the rotation axis P of the turntable 2
Without it, smooth rotation could not be obtained.
Does not require such strictness, and the turntable 2 etc.
Spin coating by rotation can be realized at low cost. [Relative lifting structure] The lower support plate 16b of the fixed support member 16 is attached.
Upper support plate 4 joined together by member 30
And at the height between the annular plate 31 and the mounting portion
It is in a state of not contacting the material 30. And
Cylindrical cover 1 mounted on top of waste liquid recovery case 5
5 Fixed support member 1 for closing the upper substrate opening
6 and the upper support plate 4 move in the vertical direction without contact
Combined where possible. This allows the fixed support
The upper support plate 4 and the upper rotating plate 3 are suspended by the material 16 and
When removing the fixed support member 16
The lower support plate 16b of the fixed support member 16 is
Until the lower surface of the annular plate 31 of the holding plate 4 is lifted,
State Part supporting plate 4 and the upper rotation plate 3 is coupled with the turntable 2
It is. And the lower support plate 16b supports the upper part.
Abutting against the lower surface of the annular plate 31 of the plate 4
Then, the upper support plate 4 and the upper rotating plate 3 are taken from the turntable 2.
Removed. Conversely, the cylindrical cover 15 is fixed by the fixed support member 16.
Is closed, and the upper support plate 4 and the upper rotating plate 3 are connected to the turntable 2.
When lowering them to perform
And the fixed support member 16 in a state where the upper rotating plate 3 is suspended
By descending, first, the upper supporting plate 4 and the upper rotating plate 3
Is coupled to the turntable 2 by its own weight. And then
The fixed support member 16 continues to descend, and finally the lower support
Before the rate 16b hits the upper support plate 4, it is shown in FIG.
And the fixed support member 16 is placed on the cylindrical cover 15.
The opening is closed on the surface, and the fixed support member 16 stops.
You. At this time, the upper support plate 4, the mounting member 30, and the ring
Plate 31 is not in contact with the lower support plate 16b.
It becomes rotatable in the contact state. [Effect of Relative Lifting Structure] The fixed support member 16, the upper support plate 4, and the upper rotary plate 3
Can be relatively moved up and down, so that
In the above embodiment, the upper support plate 4 and the upper rotating plate 3) are
Also reaches the lower position (that is, the state where it is connected to the turntable 2).
(The fixed support member 16 in the above embodiment)
Can continue to descend, the upper support plate 4 and the upper
The rolling plate 3 is fixed to the turntable 2, and the fixed support member 16 is
The bars 15 are securely connected to each other. public
Fixed with upper support plate 4 and upper rotating plate 3 as in the knowledge technology
If the vertical position with respect to the support member 16 is fixed
The upper support plate 4 and the upper rotary plate 3 and the fixed support portion
Distance of material 16, turntable 2, waste liquid recovery case 5, cylindrical cover
Extremely high dimensional accuracy and assembly accuracy
Need to be expensive and the cost is very high.
And due to various factors such as temperature change and aging.
If the method deviates even slightly, turn table 2 and waste liquid
Either the closed state of the collection case 5 with the cylindrical cover 15
Is incomplete, play due to incomplete connection, etc.
Airtightness, vibration and particles
Which problem arises. In this configuration, the upper support plate 4 and the upper
The distance between the rotating plate 3 and the fixed support member 16, the rotating table 2,
The dimensional accuracy of the storage case 5, the cylindrical cover 15, etc. is very high.
The cylindrical cover of the turntable 2 and the waste liquid collecting case 5 can be
-15 can be securely closed, and with a simple structure
Cost is low because there is, and temperature changes and changes over time
Even if some dimensional changes occur due to various factors, turntable 2 and waste
The closed state of the liquid recovery case 5 with the cylindrical cover 15 is completely
No adverse effects occur. This means that, as mentioned above,
When the support plate 4 is coupled to the turntable 2, the upper support plate 4,
Upper rotating plate 3, mounting member 30, and annular plate 31 are fixed.
In combination with the non-contact state with the support member 16, the device
Smooth and reliable operation at low cost. [Rotation direction positioning structure] Further , the rectangular substrate 1 is placed on a turntable 2 which is a substrate support member.
When performing the above, the upper rotating plate
Remove 3 upward. It is clear from the drawings such as FIGS.
The upper support plate 4 to which the upper rotary plate 3 is connected
Are connected so as to extend upward from the upper support plate 4.
Annular play extending horizontally through the mounting member 30
Connected to the port 31. The annular plate 31 has a cylindrical body 3
2 are provided. On the other hand, by going up and down,
The fixed support member 16, which is an advancing / retreating member that advances and retreats,
The lower support plate is positioned below the annular plate 31.
A rate 16b is provided, and the lower support plate 16b is
An engagement protrusion 29 is provided on the upper surface of the inner peripheral surface side portion 16c.
ing. The engagement protrusion 29 is configured to be able to engage with the cylindrical body 32.
You. These mounting member 30, annular plate 31, cylindrical body 3
2, lower side support plate 16b, inner peripheral surface side 16c,
An engagement portion is formed by the engagement protrusion 29, and the engagement protrusion is
The positioning mechanism is formed by the protrusion 29 by the uneven coupling.
You. When removing the upper rotating plate 3 upward, the fixed support member 1
6 rises and the lower support plate 16b
The annular plate 31 is supported from below by the peripheral surface side portion 16c.
Be held. Also, at this time, the
The lower support plate 1 of the fixed support member 16 is
The engagement protrusion 29 provided on the inner peripheral surface side portion 16c of the inner ring 6b is fitted.
By inserting the two, the two are combined and the annular plate 31 is lowered.
Supported by people. Thereby, the upper rotating plate 3 and the upper
The part support plate 4 does not rotate with respect to the fixed support member 16.
Is positioned at a predetermined position in the circumferential direction and is
It is supported and lowered from the turntable 2 and rises. rotation
When joining the upper rotating plate 3 and the upper supporting plate 4 to the base 2,
The fixed support member 16 is lowered, and the upper rotating plate 3 is
The upper support plate 4 is placed and connected by its own weight. And further
As the fixed support member 16 descends, the lower support
The support of the annular plate 31 by the seat 16b is released,
In addition, the engaging projection 29 is disengaged from the cylindrical body 32 and the concave
The convex connection is released, and the support from below the annular plate 31 is supported.
Is released. Thus, the upper rotating plate 3, the upper supporting plate
4 is rotatable integrally with the turntable 2. [Effects of Rotational Direction Positioning Structure] Coating for forming a coating processing space as in the known art
Rotationally supports processing space forming members using bearings
Just put the square substrate 1 in and out of the turntable 2
To raise the coating processing space forming member,
When the connection with the
Rotate as desired, then rotate the coating processing space forming member
When trying to connect to the platform 2, it is connected to a certain position
Cannot be connected, and cannot be securely connected.
There is it. However, in this configuration, the upper rotating plate 3 and the upper support
The coating processing space forming member including the holding plate 4 is raised and
Positioning in the circumferential direction when the connection with the turntable 2 is released
And is supported so that it cannot rotate.
Can maintain a constant positional relationship with the
Can be combined and surely combined.
Accordingly, in the present configuration, the ring plate 10 of the turntable 2 is
Detachable attachment between the upper support plate 4 and the upper support plate 4 always at a fixed position
It can be done reliably in a relationship.

[Turning Table Cleaning Structure] In each embodiment, the substrate is rotated while being horizontally supported.
Coating on top of turntable and substrate supported on this turntable
Rotary coating apparatus having a coating liquid supply means for supplying a liquid
In the rotation, the cleaning liquid is sprayed toward the upper surface of the turntable.
The system was provided with a stage cleaning means. [Effect of the rotating table cleaning structure] After performing predetermined spin coating on the substrate, there is no substrate.
And then spray the cleaning liquid onto the top of the turntable to
Wash and remove the coating liquid that has scattered and adhered to the upper surface of the turntable.
A predetermined rotation with respect to the substrate.
Wash and remove coating liquid adhering to the upper surface of the turntable due to coating
From the surface of the turntable.
Particles and re-scattered mist
Substrate contamination and avoid degradation of substrate processing quality
it can.

[0008]

Next, embodiments of the present invention will be described in detail with reference to the drawings.

FIG. 1 shows a first embodiment of a rotary coating apparatus according to the present invention.
FIG. 1 is a longitudinal sectional front view showing a schematic configuration of the entire embodiment, in which a turntable 2 on which a rectangular substrate 1 is mounted is provided so as to be horizontally rotatable around a vertical axis P, and above the turntable 2, An upper rotating plate 3 is provided in parallel with the rotating table 2, and the upper rotating plate 3 is integrally rotatably attached to the rotating table 2 via an upper supporting plate 4, and a lower portion and a peripheral portion of these rotating members are rotated. A waste liquid recovery case 5 is provided so as to surround it from the outside, and an electric motor 7 as a drive source is connected to the turntable 2 via an output shaft 6 as a vertical rotation shaft.

The turntable 2 is configured as a disk having an outer shape sufficiently larger than the outer shape of the rectangular substrate 1, and the rectangular substrate 1 is horizontally mounted on a large number of substrate support pins 8. To be mounted and supported. Although not shown, a pair of positioning pins are provided on each of the four corners of the rectangular substrate 1 on the turntable 2, and the rectangular substrate 1 is horizontally rotated integrally with the turntable 2 by these positioning pins. It is supposed to be.

[0011] Further, on the outer peripheral upper surface of the turntable 2,
Spacer ring 9 and ring plate 10 having the same outer diameter as
Are connected at multiple locations to concentric circles,
The upper support plate 4 is provided on the ring plate 10 with the knob bolt 1.
The substrate 1 is detachably attached via the base plate 1, and the substrate 1 can be taken in and out from the central opening of the ring plate 10 by removing the upper support plate 4.

The upper rotating plate 3 is formed as a disk having a larger diameter than the outer shape of the substrate 1, and a collar 1 is provided on the lower surface of the upper supporting plate 4.
2 are connected by bolts. The bottom of the waste liquid recovery case 5 is narrowed down, and a waste liquid discharge port 13 is formed at the lower end thereof, and an exhaust port 14 for discharging a solvent gas or a coating liquid mist evaporated from the coating liquid is formed at a plurality of locations in the circumferential direction. ing.

A cylindrical cover 15 is attached to the upper part of the waste liquid collecting case 5, and a fixed support member 16 is detachably attached to the cylindrical cover 15.

As shown in a partially cut-away enlarged front view of the main part of FIG. 2, a plan view of the main part of FIGS. 3 and 4, and a side view of the main part of FIG. A first air cylinder 20 as a drive opening / closing mechanism is attached to an upper support plate 16a of the fixed support member 16 at a position vertically above the opening 19, and a cylinder rod of the first air cylinder 20 is formed. A block 21 is attached to the tip of 20a, and a bottomed cylindrical lid 17 is suspended and held on the block 21 so as to be able to move up and down and relatively rotate.

The first magnet 2 is provided on the lower surface of the block 21.
On the other hand, a second magnet 23 having the same polarity as the first magnet 22 is provided on the bottom surface of the lid 17, and the block 21 is disengaged from the lid 17 while the lid 17 is displaced to the closed position. When in the contact state, the lid 17 can be maintained in the closed position by the repulsive force.

Therefore, the shortening of the first air cylinder 20 causes the lid 17 to be displaced upward to the open position above the opening 19, while the extension of the first air cylinder 20 causes
The lid 17 is displaced to a closed position in which the lid 17 is lowered to fit into the opening 19, and only the lid 17 can rotate integrally with the upper rotating plate 3 while closing the opening 19.

A second air cylinder 24 that is rotatable in a range of 90 ° around a vertical axis around the first air cylinder 20 of the upper support plate 16 a is provided on the side of the first air cylinder 20. A spline shaft 25 is connected to a cylinder rod 24a of the air cylinder 24. A spline cylinder 26 is attached to the spline shaft 25 so that it can only move up and down, and a rotating cylinder 27 is attached to the spline cylinder 26 so that it can rotate only. Spline cylinder 26
The washing nozzle 18 is integrally attached to the
The rotary cylinder 27 is connected to a cylinder rod 28a of a third air cylinder 28 provided on the upper side support plate 16a on the lateral side and below the second air cylinder 24. Although not shown, the cleaning nozzle 18 is connected to a pipe connected to the cleaning liquid pumping mechanism. With the above-described configuration, a turntable cleaning unit that jets the cleaning liquid toward the upper surface of the turntable 2 is configured.

With the above configuration, in the non-cleaning state in which the lid 17 is in the closed position, the cleaning nozzle 18 is positioned at the non-cleaning position which is displaced from above the opening 19.
Is in the open position, the second air cylinder 2
After rotating by 4 to position the cleaning nozzle 18 above the opening 19, the third air cylinder 28 is extended to lower the cleaning nozzle 18, and from the outlet 18 a toward the upper surface of the turntable 2. The cleaning liquid can be displaced to a cleaning position where the cleaning liquid is ejected. A structure including second and third air cylinders 24 and 28 for drivingly displacing the cleaning nozzle 18 between a cleaning position and a non-cleaning position is referred to as a driving mechanism.

Lower support plate 1 of fixed support member 16
6b is formed in an annular shape, and at each of four predetermined circumferential positions on the upper surface close to the inner peripheral surface side, a mountain-shaped engaging projection 29 is provided, while it is located above the lower support plate 18b. As shown in FIG.
The annular plate 31 is attached via
At each of four predetermined positions in the circumferential direction of the annular plate 31, there are provided cylindrical bodies 32 into which the engaging projections 29 are fitted. When the upper rotary plate 3 is attached or detached, the engaging projections 29. Are fixed to the fixed support member 16.
It is configured to be able to hang.

With the above structure, first, at the time of the coating process, the fixed support member 16 is removed from the cylindrical cover 15 and the upper support plate 4 is removed from the turntable 2, and the upper support plate 4 is suspended by the fixed support member 16. Is removed upward, and the rectangular substrate 1 is mounted on the substrate support pins 8... Of the turntable 2 in a predetermined posture.

Next, a coating liquid supply nozzle (not shown) as coating liquid supply means is moved to the upper center of the rectangular substrate 1, and
A predetermined amount of the coating liquid is supplied dropwise. Then, the upper support plate 4 is carried in by being hung by the fixed support member 16 and
On the ring plate 10 and the fixed support member 16
Are respectively mounted on the cylindrical cover 15, and as shown in the front view of the main part in FIG. 6, the first air cylinder 20 is extended to drive and displace the lid 17, and the opening 19 of the upper rotary plate a is closed. At the same time, the cleaning nozzle 18 is displaced to the non-cleaning position.

Thereafter, the electric motor 7 is started to rotate the turntable 2, the upper support plate 4, the upper turn plate 3 and the rectangular substrate 1 horizontally horizontally. Due to this rotation, the coating liquid on the square substrate 1 diffuses and flows outward due to centrifugal force, and the square substrate 1
Thinly applied on top. In this case, the air layer of the flat coating processing space S formed between the turntable 2 and the upper rotary plate 3 also rotates integrally, and the diffusion flow of the coating liquid does not occur on the square substrate 1. Is performed.

The excess coating liquid flowing on the rectangular substrate 1 and reaching the outer periphery flows out from the peripheral edge of the rectangular substrate 1 and scatters from the entire outer peripheral region of the coating processing space S. The scattered application liquid flows into the waste liquid recovery case 5 through gaps formed above and below the spacer ring 9 and is collected.

After the spin coating process has been performed a predetermined number of times, the fixed support member 16 is removed from the cylindrical cover 15 and the upper support plate 4 is removed from the turntable 2.
6, the upper rotating plate 3 is removed upward, and the rectangular substrate 1 is removed.
After taking out, the upper support plate 4 is attached to the ring plate 10.
And the fixed support member 16 is mounted on the cylindrical cover 15, respectively.
And the cover 17 is driven and displaced to the open position.

Thereafter, the second air cylinder 24 is operated to rotationally displace the cleaning nozzle 18 to a position above the opening 19, and from this state the third air cylinder 28 is extended to lower the cleaning nozzle 18. Through opening 19, as shown in FIG. 5, it is displaced to a washing position below upper rotating plate 3. In this state, while the electric motor 7 is started and the turntable 2, the upper support plate 4, and the upper turntable 3 are horizontally rotated integrally, a cleaning liquid is spouted out from the cleaning nozzle 18 to the upper surface of the turntable 2 to supply centrifugal force. The mist of the coating liquid adhering to the upper surface of the turntable 2 is removed by washing.

FIG. 7 is an overall schematic front view showing a second embodiment of the rotary coating apparatus according to the present invention. The difference from the first embodiment is as follows.

The lower end of the rotary shaft 2a of the turntable 2 and the upper end of the drive shaft 33a of the electric motor 33 are linked and connected via a belt-type transmission mechanism 34.
A through-hole 35 is formed through the axis of the rotary shaft, a cleaning liquid pipe 37 having a cleaning nozzle 36 attached to the upper end thereof is inserted into the through-hole 35, and the cleaning nozzle 36 is positioned above the turntable 2. The turntable cleaning means is provided in a fixed state, and ejects a cleaning liquid toward the upper surface of the turntable 2. Other configurations are the same as those of the first embodiment, and the description thereof will be omitted by retaining the same reference numerals.

FIG. 8 is an overall schematic front view showing a third embodiment of the rotary coating apparatus according to the present invention. The difference from the first embodiment is as follows.

At a predetermined position on the fixed frame 15 a around the turntable 2, the cleaning nozzle 3 is
The turntable cleaning means 9 is attached so that the cleaning liquid is jetted toward the upper surface of the turntable 2 with the upper turntable 3 removed. Other configurations are the same as those of the first embodiment, and the description thereof will be omitted by retaining the same reference numerals.

The present invention can be applied not only to the rectangular substrate 1 but also to a rotary coating device for a circular substrate.

[0031]

[0032]

[0033]

[0034]

[0035]

[0036]

[0037]

[0038]

[0039]

[0040]

[0041]

[0042]

[0043]

[0044]

[0045]

[0046]

As apparent from the foregoing description, according to the engagement Ru rotating coater and spin coating method to the present invention,
It is possible to prevent undesired rotation of the upper plate that is separated from the turntable, and to keep the coupling state between the turntable and the upper plate constant, thereby enabling stable substrate processing.

[Brief description of the drawings]

FIG. 1 is a vertical sectional front view showing a schematic configuration of a whole of a first embodiment of a rotary coating apparatus according to the present invention.

FIG. 2 is an enlarged front view of a main part.

FIG. 3 is a plan view of a main part.

FIG. 4 is a plan view of a main part.

FIG. 5 is a side view of a main part.

FIG. 6 is a front view of a main part showing a spin coating state.

FIG. 7 is an overall schematic front view showing a second embodiment of the rotary coating apparatus according to the present invention.

FIG. 8 is an overall schematic front view showing a third embodiment of the rotary coating apparatus according to the present invention.

[Tax of sign]

 DESCRIPTION OF SYMBOLS 1 ... Square substrate 2 ... Rotating table 3 ... Upper rotating plate 4 ... Upper supporting plate 5 ... Waste liquid recovery case 15 ... Cylindrical cover 16 ... Fixed supporting member

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. ⁷ , DB name) H01L 21/027 B05C 11/08 B05D 1/40 G03F 7/16

Claims (6)

(57) [Claims] 1. A rotary coating apparatus for coating a coating liquid on a surface of a substrate by rotating the substrate , wherein the substrate supporting member rotatably supports the substrate, an upper portion is opened, and a periphery of the substrate supporting member is provided. Surround the case
And detachably provided on the case, and mounted on the case.
Sometimes a member that closes the opening of the case, a coating processing space forming member that can be coupled with the substrate support member to form a coating processing space and that can rotate with the substrate supporting member when coupled with the substrate supporting member, An advancing / retreating member that supports the coating processing space forming member and advances and retreats with respect to the substrate support member; and when the coating processing space forming member is separated from the substrate supporting member, the coating processing space forming member moves relative to the advancing / retreating member. And a positioning mechanism for positioning in the circumferential direction, and a mounting member is provided at an upper central portion of the coating processing space forming member.
A first member that is erected and extends horizontally in the mounting member;
Is provided, and the advancing / retreating member includes the coating processing space forming member.
A second member is provided below the first member, and is coupled to the coating processing space forming member and the substrate supporting member.
Sometimes, the mounting member and the front member with respect to the second member
The first member is provided so as to be relatively rotatable.
Rotary coating apparatus characterized by that. 2. The method according to claim 1, wherein the substrate is rotated to rotate the substrate.
In a rotary coating apparatus that applies a coating liquid to a surface, a substrate supporting member that rotatably supports a substrate and can be combined with the substrate supporting member to form a coating processing space.
And at the time of coupling with the substrate supporting member,
A coating space forming member rotatable with a material, and the substrate supporting member supporting the coating space forming member
An advancing / retreating member for advancing / retreating the coating processing space forming member from the substrate supporting member
Then, the coating processing space forming member is opposed to the advance / retreat member.
And a positioning mechanism for positioning the coating processing space forming member and the advancing / retreating member when the coating processing space forming member and the substrate supporting member are coupled to each other. A rotary coating apparatus, wherein the coating processing space forming member and the advancing / retreating member are released from each other by an engagement portion for releasing the support of the member and bringing the member into a non-contact state. 3. The rotary coating apparatus according to claim 1, wherein the positioning mechanism moves the coating space forming member and the advancing / retreating member when the coating space forming member and the substrate supporting member are separated from each other. A rotary coating device comprising a concave / convex connection that is connected so as not to rotate relatively. 4. A rotary table for supporting a substrate, a driving source for rotating the rotary table, an upper plate for forming a coating space therein by coupling with the rotary table, and lifting and lowering the upper plate. A supporting member to be interposed between the upper plate and the supporting member, and coupling the upper plate and the supporting member in a state where the upper plate is raised,
In a state where the upper plate is connected to the turntable, the connection state between the upper plate and the support member is released, and the upper plate and the support member are mutually connected.
In a Rukakarigo portion such as non-contact state is provided, the engaging portion, characterized in that it has a shape such as a circumferential direction of the positioning of the upper plate in a state in which the upper plate is raised is carried out Rotary coating device. 5. A substrate is horizontally placed on a rotatable substrate support member.
Support, supply and rotate the coating liquid on the upper surface of the substrate
In the rotary coating method, A step of supporting the substrate on a substrate support member, A step of supplying a coating liquid to the substrate supported by the substrate support member
When, The coating support space forming member was supported in a non-rotatable state.
The retreating member is lowered to move the coating processing space forming member to the substrate support.
While forming the coating processing space by combining with the holding member,
The coating space forming member and the advancing / retreating member are brought into non-contact and
A step of enabling rotation, By rotating the substrate support member and the coating space forming member,
A step of diffusing and flowing the coating liquid on the plate, By raising the advance / retreat member, the coating process space shape
Remove the component from the substrate support and support it in a non-rotatable state.
Rotating application method characterized by comprising a step of holding
Law. 6. The rotary coating apparatus according to claim 1, wherein
hand, Attached to the case detachably provided on the case
Sometimes a member that closes the opening of the case, The substrate supporting member supports the coating processing space forming member.
The reciprocating member for reciprocating with respect to Attached to the case detachably provided on the case
Sometimes closing the opening of the case and applying the
Supporting the processing space forming member and supporting the substrate supporting member
Rotation characterized by being constituted by a member for moving forward and backward
Type coating device.