JP3099584B2 - Manufacturing method of surface pressure type semiconductor pressure sensor - Google Patents

Manufacturing method of surface pressure type semiconductor pressure sensor

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Publication number
JP3099584B2
JP3099584B2 JP05117492A JP11749293A JP3099584B2 JP 3099584 B2 JP3099584 B2 JP 3099584B2 JP 05117492 A JP05117492 A JP 05117492A JP 11749293 A JP11749293 A JP 11749293A JP 3099584 B2 JP3099584 B2 JP 3099584B2
Authority
JP
Japan
Prior art keywords
pressure
silicone gel
sensitive diaphragm
case
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP05117492A
Other languages
Japanese (ja)
Other versions
JPH0674847A (en
Inventor
高弘 山崎
建司 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP05117492A priority Critical patent/JP3099584B2/en
Publication of JPH0674847A publication Critical patent/JPH0674847A/en
Application granted granted Critical
Publication of JP3099584B2 publication Critical patent/JP3099584B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Pressure Sensors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】この発明は、大気圧センサなどに
適用する表面加圧形半導体圧力センサの製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a surface pressure type semiconductor pressure sensor applied to an atmospheric pressure sensor and the like.

【0002】[0002]

【従来の技術】前記表面加圧形半導体圧力センサとし
て、シリコンウェーハのダイアフラム部に歪ゲージ抵抗
を拡散形成して製作した感圧ダイアフラムチップをステ
ム兼用の印刷基板に搭載し、かつチップの表面電極と印
刷基板との間をワイヤ接続した上で、チップをケースで
包囲して組立てた構成のものが知られている。
2. Description of the Related Art As a surface pressure type semiconductor pressure sensor, a pressure-sensitive diaphragm chip manufactured by diffusing a strain gauge resistance in a diaphragm portion of a silicon wafer is mounted on a printed circuit board also serving as a stem, and a surface electrode of the chip is provided. A configuration is known in which a chip is surrounded by a case after being connected to a printed circuit board by wire and assembled.

【0003】また、かかる表面加圧形の圧力センサを大
気圧センサとして使用する場合には、感圧ダイアフラム
チップを湿気などによる腐蝕から保護するために高い耐
環境性が要求されることから、感圧ダイアフラムチップ
の表面に耐湿,耐蝕性の高いシリコーンゲルを塗布して
封止するようにしている。図6は前記表面加圧形半導体
圧力センサの組立構造、および従来のシリコーンゲルの
塗布方法を示すものであり、図において、ガラス台座2
に固定された感圧ダイアフラムチップ1がガラス台座2
を支持する金属ベース4を介してステムを兼ねた厚膜印
刷基板3に搭載されており、感圧ダイアフラムチップ1
の表面電極と印刷基板3との間をアルミワイヤ5(ボン
ディングワイヤ)で接続されている。さらに感圧ダイア
フラムチップ1とアルミワイヤ5を包囲して印刷基板3
の上面にケース6が組み立てられている。このケース6
には図示されていないが導圧孔付きの保護キャップが取
り付けられる。
When such a surface pressure type pressure sensor is used as an atmospheric pressure sensor, a high environmental resistance is required to protect the pressure-sensitive diaphragm chip from corrosion due to moisture or the like. The surface of the pressure diaphragm chip is sealed by applying a silicone gel having high moisture resistance and corrosion resistance. FIG. 6 shows an assembly structure of the surface pressure type semiconductor pressure sensor and a conventional silicone gel coating method.
Pressure-sensitive diaphragm chip 1 fixed to glass pedestal 2
Is mounted on the thick-film printed board 3 serving also as a stem via a metal base 4 supporting the pressure-sensitive diaphragm chip 1.
And the printed circuit board 3 are connected by an aluminum wire 5 (bonding wire). Further, the printed circuit board 3 is surrounded by the pressure-sensitive diaphragm chip 1 and the aluminum wire 5.
The case 6 is assembled on the upper surface of. This case 6
Although not shown in the figure, a protective cap with a pressure guiding hole is attached.

【0004】また、かかる構成の表面加圧形半導体圧力
センサに対して感圧ダイアフラムチップ1に表面保護用
のシリコーンゲル8を塗布する方法として、従来ではノ
ズル7を通じてケース6の上方から感圧ダイアフラムチ
ップ1の上に適量のシリコーンゲル8を滴下して塗布す
る方法を一般的に採用している。
As a method for applying a silicone gel 8 for protecting the surface of the pressure-sensitive diaphragm chip 1 to the surface-pressure-type semiconductor pressure sensor having such a configuration, a conventional method uses a pressure-sensitive diaphragm from above the case 6 through a nozzle 7. In general, a method in which an appropriate amount of silicone gel 8 is applied dropwise onto the chip 1 is applied.

【0005】[0005]

【発明が解決しようとする課題】前述の方法によれば、
シリコーンゲルを上方から感圧ダイアフラムチップの上
に滴下する従来の塗布方法では次記のような問題点があ
る。すなわち図6に示すように感圧ダイアフラムチップ
の上にシリコーンゲルを滴下すると、シリコーンゲルは
感圧ダイアフラムチップの表面に凸面状に盛り上がる。
つまり、シリコーンゲルの厚さは感圧ダイアフラムチッ
プの中央部で厚く、周辺部分では薄くなる。このため
に、温度変化に伴って生じる応力が均一分布にならず、
このことが圧力検出の感度に悪影響を与える。
According to the method described above,
The conventional coating method in which the silicone gel is dropped onto the pressure-sensitive diaphragm chip from above has the following problems. That is, when the silicone gel is dropped on the pressure-sensitive diaphragm chip as shown in FIG. 6, the silicone gel rises in a convex shape on the surface of the pressure-sensitive diaphragm chip.
That is, the thickness of the silicone gel is thicker at the center of the pressure-sensitive diaphragm chip and thinner at the periphery. For this reason, the stress generated by the temperature change does not become uniform distribution,
This adversely affects the sensitivity of pressure detection.

【0006】さらにはワイヤボンディング法により感圧
ダイアフラムチップと印刷基板との間を接続したアルミ
ワイヤは感圧ダイアフラムチップの上方にループ状に配
線されているために、前記した滴下方法ではアルミワイ
ヤの表面全体にシリコーンゲルが塗布されず、未塗布部
分が生じて腐蝕による断線の原因となる。なお、シリコ
ーンゲルの滴下量を増して感圧ダイアフラムチップおよ
びアルミワイヤの全体がシリコーンゲル内に埋没させる
ようにすることも考えられるが、シリコーンゲルの層厚
さが大であると、圧力測定時に外部からの圧力がシリコ
ーンゲルの層内を伝播する過程で大きく減衰して圧力セ
ンサの感度低下に及ぼす影響が大きくなる。
Further, since the aluminum wire connected between the pressure-sensitive diaphragm chip and the printed board by the wire bonding method is wired in a loop above the pressure-sensitive diaphragm chip, the aluminum wire is not used in the above-described dropping method. The silicone gel is not applied to the entire surface, and an uncoated portion is generated, which causes disconnection due to corrosion. In addition, it is conceivable that the pressure-sensitive diaphragm tip and the entire aluminum wire are buried in the silicone gel by increasing the drop amount of the silicone gel. The external pressure is greatly attenuated in the process of propagating in the silicone gel layer, and the influence on the sensitivity reduction of the pressure sensor is increased.

【0007】この発明は前記の問題点に鑑みてなされた
ものであり、その目的はシリコーンゲルの塗布工程でシ
リコーンゲルの塗布厚さを最小限に抑えて感圧ダイアフ
ラムチップおよびワイヤの表面全体に、シリコーンゲル
を均一かつ短時間で塗布できるようにする表面加圧形半
導体圧力センサの製造方法を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to minimize the thickness of the silicone gel applied in the silicone gel application step so as to cover the entire surface of the pressure-sensitive diaphragm chip and wire. It is another object of the present invention to provide a method for manufacturing a surface pressure type semiconductor pressure sensor which enables uniform application of a silicone gel in a short time.

【0008】[0008]

【課題を解決するための手段】この発明によれば前述の
目的は、感圧ダイアフラムチップを印刷基板に搭載し、
感圧ダイアフラムチップの表面電極と印刷基板との間を
ワイヤで接続し、かつ感圧ダイアフラムチップおよびワ
イヤを包囲して印刷基板上にケースを組立てた状態のも
のに、ケース内で感圧ダイアフラムチップおよびワイヤ
がシリコーンゲル層に埋没するレベルまでシリコーンゲ
ルを注入し、しかる後にケースからシリコーンゲルを吸
出して感圧ダイアフラムチップおよびワイヤの表面全体
にシリコーンゲルを塗布することにより達成される。
According to the present invention, an object of the present invention is to mount a pressure-sensitive diaphragm chip on a printed board,
The surface electrode of the pressure-sensitive diaphragm chip is connected to the printed board with a wire, and the pressure-sensitive diaphragm chip is mounted in a state where the case is assembled on the printed board surrounding the pressure-sensitive diaphragm chip and the wire. And by injecting the silicone gel to a level where the wire is buried in the silicone gel layer, and then sucking the silicone gel out of the case to apply the silicone gel to the entire surface of the pressure-sensitive diaphragm chip and wire.

【0009】またかかる構成において、ケースの開口部
に、壁面に空気孔を有するゲル排出用コレットを接続
し、ケースの開口部を下方に向けて、真空引き法により
ケースからシリコーンゲルを吸出し、さらには感圧ダイ
アフラムチップおよびワイヤの表面に付着したシリコー
ンゲルの塗布厚さが30〜80μmとなるようにシリコ
ーンゲルを吸出すこととする。
In this configuration, a gel discharge collet having an air hole on a wall surface is connected to the opening of the case, and the silicone gel is sucked out of the case by a vacuuming method with the opening of the case facing downward. Means that the silicone gel is sucked out so that the coating thickness of the silicone gel attached to the surface of the pressure-sensitive diaphragm chip and the wire becomes 30 to 80 μm.

【0010】[0010]

【作用】前述のように最初にケース内で感圧ダイアフラ
ムチップおよびワイヤの全体がシリコーンゲル層内に埋
没するようなレベルまでシリコーンゲルを過剰に注入し
た後、真空引き法によりシリコーンゲルをケース外に吸
出すと、感圧ダイアフラムチップおよびワイヤの表面に
付着した分を残して余剰のシリコーンゲルがケースから
排除される。ここで、ケースの開口部に、壁面に空気孔
を有するゲル排出用コレットを接続し、ケースの開口部
を下方に向けて、真空引き法によりケースからシリコー
ンゲルを吸出すこととしたため余剰のシリコーンゲルが
ケースの開口部の下方に流動し、さらに空気孔より外気
を巻き込むことにより短時間でシリコーンゲルをケース
外に吸出すことができる。
As described above, first, an excessive amount of silicone gel is injected into the case so that the entire pressure-sensitive diaphragm chip and wire are buried in the silicone gel layer, and then the silicone gel is removed from the case by a vacuuming method. , Excess silicone gel is removed from the case, leaving the amount attached to the surface of the pressure-sensitive diaphragm tip and wire. Here, a gel discharging collet having an air hole on the wall surface was connected to the opening of the case, and the silicone gel was sucked out of the case by vacuuming with the opening of the case facing downward. The gel flows below the opening of the case, and the outside air is drawn in from the air holes, so that the silicone gel can be sucked out of the case in a short time.

【0011】また真空引き圧を適正に設定して真空引き
を行えば、感圧ダイアフラムチップおよびワイヤの表面
全体に塗布厚さ30〜80μm程度(好ましくは50μ
m)にシリコーンゲルが均一に塗布されるようになる。
この塗布厚さ(30〜80μm)は、シリコーンゲル材
料自身の粘性、表面張力で決まる最小限の厚さであり、
後述する表面加圧形半導体圧力センサの特性試験の結果
からも、感圧ダイアフラムチップ特性の零点傾き,出力
変動誤差におよぼす影響が最小となることが確認されて
いる。
If the evacuation is performed by setting the evacuation pressure appropriately, the coating thickness is about 30 to 80 μm (preferably 50 μm) over the entire surface of the pressure-sensitive diaphragm chip and wire.
m), the silicone gel is uniformly applied.
This coating thickness (30 to 80 μm) is the minimum thickness determined by the viscosity and surface tension of the silicone gel material itself,
It is also confirmed from the result of the characteristic test of the surface pressure type semiconductor pressure sensor described later that the influence of the pressure-sensitive diaphragm chip characteristic on the zero slope and the output fluctuation error is minimized.

【0012】[0012]

【実施例】以下この発明の実施例を図1ないし図5に基
づいて説明する。図6と同一部材には同じ符号を付して
ある。なおこの発明は表面加圧形半導体圧力センサに限
定されるものでなく、半導体チップを印刷基板に搭載し
チップの表面電極と印刷基板との間をワイヤで接続して
構成される半導体素子内部の表面保護のために、全面に
コーテング剤を均一に塗布する場合にも有効である。 〔実施例1〕まず、図6で述べたと同様な組立方法で圧
力センサを組立てた後に、感圧ダイアフラムチップ1お
よびアルミワイヤ5の表面にシリコーンゲル8を塗布す
る場合は図1に示すように感圧ダイアフラムチップ1お
よびアルミワイヤ5がゲル層内に埋没するようなレベル
までケース6の中にシリコーンゲル8を過剰に注入す
る。なお、この実施例ではワイヤにアルミを使用してい
るが、ボンデングワイヤとして市販されているものなら
何でもよい。またシリコーンゲル8としては、キュア後
の針入度が80〜120程度になるものを使用するのが
よい。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. The same members as those in FIG. 6 are denoted by the same reference numerals. The present invention is not limited to the surface pressure type semiconductor pressure sensor, but includes a semiconductor chip mounted on a printed circuit board and a semiconductor element formed by connecting a surface electrode of the chip and the printed circuit board with a wire. It is also effective when a coating agent is applied uniformly over the entire surface for surface protection. [First Embodiment] First, after assembling a pressure sensor by the same assembling method as described with reference to FIG. 6, when applying a silicone gel 8 to the surface of the pressure-sensitive diaphragm chip 1 and the aluminum wire 5, as shown in FIG. Excessive silicone gel 8 is injected into case 6 to such a level that pressure-sensitive diaphragm chip 1 and aluminum wire 5 are buried in the gel layer. In this embodiment, aluminum is used for the wire, but any wire that is commercially available as a bonding wire may be used. As the silicone gel 8, it is preferable to use a silicone gel having a penetration of about 80 to 120 after curing.

【0013】次に図2に示す構成によるシリコーンゲル
吸出装置を用いケース6の開口部6aに、壁面に空気孔
10を有するゲル排出用コレット9を接続し、ケース6
の開口部6aを下方に向けて、真空引き法によりケース
6からシリコーンゲル8を吸出する。なお空気孔10の
直径は1mm前後のごく小さいもので充分である。これ
により、図3で表すように感圧ダイアフラムチップ1お
よびアルミワイヤ5の表面に付着残留した分を残して余
剰のシリコーンゲルが全てケース外に排出され、最終的
に感圧ダイアフラムチップ1およびアルミワイヤ5の表
面全体に均一な厚さのシリコーンゲル8が塗布される。
シリコーンゲルの塗布作業が終了するとケース6からゲ
ル排出用コレット9を取り外し、次の組立工程でケース
6に導圧孔付きの保護キャップを被着して表面加圧形半
導体圧力センサを製作する。
Next, a gel discharge collet 9 having an air hole 10 on the wall surface is connected to the opening 6a of the case 6 using the silicone gel suction device having the structure shown in FIG.
The silicone gel 8 is sucked out of the case 6 by the evacuation method with the opening 6a facing downward. It is sufficient that the diameter of the air hole 10 is as small as about 1 mm. As a result, as shown in FIG. 3, all the excess silicone gel is discharged out of the case except for the portion remaining on the surfaces of the pressure-sensitive diaphragm chip 1 and the aluminum wire 5, and finally the pressure-sensitive diaphragm chip 1 and the aluminum wire A silicone gel 8 having a uniform thickness is applied to the entire surface of the wire 5.
When the application operation of the silicone gel is completed, the gel discharging collet 9 is removed from the case 6, and a protective cap having a pressure guide hole is attached to the case 6 in the next assembling step to manufacture a surface pressure type semiconductor pressure sensor.

【0014】ここで図2に示す構成によるシリコーンゲ
ル吸出装置について説明する。この装置はゲル排出用コ
レット9、真空圧力計14および三方バルブ15を有す
る複数の配管系と真空ポンプ11およびバルブ12を有
する配管系が吸出されたシリコーンゲル8を溜めるトラ
ップ13を介して連結されたものである。シリコーンゲ
ル8を吸出する時はバルブ12を開き、真空ポンプ11
を作動させる。なお三方バルブ15はゲル排出用コレッ
ト9部を真空または大気圧に切り換える機能を持ってい
るため、三方バルブ15の開閉により個々のゲル排出用
コレット9部を容易に真空または大気圧に切り換えるこ
とが可能なため、ランダムに連続で稼働することができ
ると同時に型式の異なる半製品のシリコーンゲル8を吸
出できる特徴を有している。 〔実施例2〕この実施例は実施例1に基づいて製作した
表面加圧形半導体圧力センサの特性試験をしたものであ
る。
Here, the silicone gel suction device having the structure shown in FIG. 2 will be described. In this apparatus, a plurality of piping systems having a gel discharge collet 9, a vacuum pressure gauge 14 and a three-way valve 15 and a piping system having a vacuum pump 11 and a valve 12 are connected via a trap 13 for storing the sucked silicone gel 8. It is a thing. When sucking the silicone gel 8, the valve 12 is opened and the vacuum pump 11 is opened.
Activate Since the three-way valve 15 has a function of switching the gel discharging collet 9 to vacuum or atmospheric pressure, the individual gel discharging collet 9 can be easily switched to vacuum or atmospheric pressure by opening and closing the three-way valve 15. Since it is possible, it has a feature that it can be operated continuously at random and at the same time can suck out silicone gels 8 of semi-finished products of different types. [Embodiment 2] In this embodiment, a characteristic test of a surface pressure type semiconductor pressure sensor manufactured based on Embodiment 1 is performed.

【0015】図4は感圧ダイアフラムチップの零点傾き
とチップ表面に塗布したシリコーンゲルの厚さとの関係
を表す特性図、また図5は圧力センサの高温高湿試験
(温度85℃,湿度85%RH)結果から求めた出力変
動誤差とゲルの厚さとの関係を表す特性図であり、図
4、図5から判るように、シリコーンゲルの塗布厚さが
30〜80μmの範囲に収まるように感圧ダイアフラム
チップの表面にシリコーンゲルを塗布することにより、
感圧ダイアフラムチップの零点傾きは僅小であり(図4
参照)、また出力変動誤差も最小(図5参照)であっ
て、これにより高い測定精度が得られる。
FIG. 4 is a characteristic diagram showing the relationship between the zero-point inclination of the pressure-sensitive diaphragm chip and the thickness of the silicone gel applied to the chip surface. FIG. 5 is a high-temperature and high-humidity test (85 ° C., 85% humidity) of the pressure sensor. RH) FIG. 4 is a characteristic diagram showing the relationship between the output fluctuation error obtained from the result and the gel thickness. As can be seen from FIGS. By applying silicone gel to the surface of the pressure diaphragm chip,
The zero-point tilt of the pressure-sensitive diaphragm chip is very small (Fig. 4
), And the output fluctuation error is also minimum (see FIG. 5), thereby obtaining high measurement accuracy.

【0016】このことにより、シリコーンゲル8の塗布
厚さが30〜80μm、好ましくは50μmとなるよう
に真空圧を設定すれば良いことが確認された。 〔比較例1〕ケース6の開口部6aを下方に向けたもの
と上方に向けたものとにつき比較実験をしたところ、ケ
ース6の開口部6aを下方に向けたものが30sec前
後でシリコーンゲル8を吸出することができ量産に耐え
うる時間であったが、上方に向けたものは時間が長く量
産向きではなかった。
From this, it was confirmed that the vacuum pressure should be set so that the coating thickness of the silicone gel 8 is 30 to 80 μm, preferably 50 μm. [Comparative Example 1] A comparative experiment was performed on the case 6 with the opening 6a facing downward and on the case 6 with the opening 6a facing upward. It was a time that could withstand mass production, but it was not suitable for mass production when it was directed upward.

【0017】またケース6の開口部6aを外側に向け複
数個セットし回転させ遠心力を用いてシリコーンゲルを
分離させたところ袋部にあたるところに、液溜まりがで
き手直しが必要となった。
Further, when a plurality of openings 6a of the case 6 were set outward and rotated to separate the silicone gel using centrifugal force, a liquid pool was formed at the place corresponding to the bag, and it was necessary to rework.

【0018】[0018]

【発明の効果】この発明によれば、従来のゲル滴下法に
よる問題点を解消して、感圧ダイアフラムチップおよび
ワイヤの表面全体にシリコーンゲルを適正な厚さで均一
に塗布することができ、これにより高い測定精度を確保
しつつ、湿度,腐蝕などに対して耐環境性の高い表面加
圧形半導体圧力センサを提供することができる。
According to the present invention, the problem caused by the conventional gel dropping method can be solved, and the silicone gel can be uniformly applied to the entire surface of the pressure-sensitive diaphragm chip and the wire with an appropriate thickness. As a result, it is possible to provide a surface pressure type semiconductor pressure sensor having high environmental resistance against humidity, corrosion, etc., while ensuring high measurement accuracy.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の実施例によるシリコーンゲル塗布工
程の途中状態を表す表面加圧形半導体圧力センサの構成
断面図
FIG. 1 is a sectional view showing the configuration of a surface pressure type semiconductor pressure sensor showing a state in the middle of a silicone gel coating process according to an embodiment of the present invention.

【図2】この発明の実施例によるシリコーンゲル吸出装
置の構成図
FIG. 2 is a configuration diagram of a silicone gel suction device according to an embodiment of the present invention.

【図3】図1の状態からシリコーンゲルを吸出した後の
塗布状態を示す図
FIG. 3 is a diagram showing a coating state after the silicone gel has been sucked out from the state of FIG. 1;

【図4】感圧ダイアフラムチップの零点傾きとチップに
塗布したシリコーンゲル厚との関係を表す特性図
FIG. 4 is a characteristic diagram showing a relationship between a zero-point inclination of a pressure-sensitive diaphragm chip and a thickness of a silicone gel applied to the chip.

【図5】圧力センサの出力変動誤差とチップに塗布した
シリコーンゲル厚との関係を表す特性図
FIG. 5 is a characteristic diagram showing a relationship between an output fluctuation error of a pressure sensor and a thickness of a silicone gel applied to a chip.

【図6】従来におけるシリコーンゲルの塗布方法を表す
表面加圧形半導体圧力センサの構成断面図
FIG. 6 is a cross-sectional view of a configuration of a surface pressure type semiconductor pressure sensor showing a conventional silicone gel coating method.

【符号の説明】[Explanation of symbols]

1 感圧ダイアフラムチップ 2 ガラス台座 3 印刷基板 4 金属スペーサ 5 アルミワイヤ 6 ケース 6a 開口部 7 ノズル 8 シリコーンゲル 9 ゲル排出用コレット 10 空気孔 11 真空ポンプ 12 バルブ 13 トラップ 14 真空圧力計 15 三方バルブ Reference Signs List 1 pressure-sensitive diaphragm chip 2 glass pedestal 3 printed board 4 metal spacer 5 aluminum wire 6 case 6a opening 7 nozzle 8 silicone gel 9 gel discharging collet 10 air hole 11 vacuum pump 12 valve 13 trap 14 vacuum pressure gauge 15 three-way valve

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平1−260337(JP,A) 特開 昭57−82731(JP,A) 特開 平5−291590(JP,A) 特開 平5−126662(JP,A) 実開 昭61−22369(JP,U) (58)調査した分野(Int.Cl.7,DB名) G01L 9/04 101 H01L 29/84 ────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-1-260337 (JP, A) JP-A-57-82731 (JP, A) JP-A-5-291590 (JP, A) JP-A-5-291590 126662 (JP, A) Japanese Utility Model Showa 61-22369 (JP, U) (58) Field surveyed (Int. Cl. 7 , DB name) G01L 9/04 101 H01L 29/84

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】感圧ダイアフラムチップを印刷基板に搭載
し、感圧ダイアフラムチップの表面電極と印刷基板との
間をワイヤで接続し、かつ感圧ダイアフラムチップおよ
びワイヤを包囲して印刷基板上にケースを組立てた状態
のものに、ケース内で感圧ダイアフラムチップおよびワ
イヤがシリコーンゲル層に埋没するレベルまでシリコー
ンゲルを注入し、しかる後にケースからシリコーンゲル
を吸出して感圧ダイアフラムチップおよびワイヤの表面
全体にシリコーンゲルを塗布することを特徴とする表面
加圧形半導体圧力センサの製造方法。
A pressure-sensitive diaphragm chip is mounted on a printed board, a surface electrode of the pressure-sensitive diaphragm chip is connected to the printed board with a wire, and the pressure-sensitive diaphragm chip and the wire are surrounded on the printed board. Into the assembled state of the case, the silicone gel is injected until the pressure-sensitive diaphragm chip and the wire are buried in the silicone gel layer in the case, and then the silicone gel is sucked out of the case to remove the surface of the pressure-sensitive diaphragm chip and the wire. A method of manufacturing a surface pressure type semiconductor pressure sensor, characterized by applying a silicone gel to the entire surface.
【請求項2】請求項1記載の製造方法において、ケース
の開口部に、壁面に空気孔を有するゲル排出用コレット
を接続し、ケースの開口部を下方に向けて、真空引き法
によりケースからシリコーンゲルを吸出すことを特徴と
する表面加圧形半導体圧力センサの製造方法。
2. The manufacturing method according to claim 1, wherein a gel discharging collet having an air hole on a wall surface is connected to the opening of the case, and the opening of the case is directed downward from the case by a vacuuming method. A method for manufacturing a surface pressure type semiconductor pressure sensor, wherein a silicone gel is sucked out.
【請求項3】請求項1ないし2記載の製造方法におい
て、感圧ダイアフラムチップおよびワイヤの表面に付着
したシリコーンゲルの塗布厚さが30〜80μmとなる
ようにシリコーンゲルを吸出すことを特徴とする表面加
圧形半導体圧力センサの製造方法。
3. The method according to claim 1, wherein the silicone gel is sucked out so that the coating thickness of the silicone gel attached to the surface of the pressure-sensitive diaphragm chip and the wire is 30 to 80 μm. Of manufacturing surface pressure type semiconductor pressure sensor.
JP05117492A 1992-06-26 1993-05-20 Manufacturing method of surface pressure type semiconductor pressure sensor Expired - Fee Related JP3099584B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05117492A JP3099584B2 (en) 1992-06-26 1993-05-20 Manufacturing method of surface pressure type semiconductor pressure sensor

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4-168039 1992-06-26
JP16803992 1992-06-26
JP05117492A JP3099584B2 (en) 1992-06-26 1993-05-20 Manufacturing method of surface pressure type semiconductor pressure sensor

Publications (2)

Publication Number Publication Date
JPH0674847A JPH0674847A (en) 1994-03-18
JP3099584B2 true JP3099584B2 (en) 2000-10-16

Family

ID=26455588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05117492A Expired - Fee Related JP3099584B2 (en) 1992-06-26 1993-05-20 Manufacturing method of surface pressure type semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JP3099584B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3255402A1 (en) 2016-06-09 2017-12-13 Nagano Keiki Co., Ltd. Strain detector and manufacturing method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005056760A1 (en) * 2005-11-29 2007-06-06 Robert Bosch Gmbh Method for mounting semiconductor chips and corresponding semiconductor chip arrangement

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3255402A1 (en) 2016-06-09 2017-12-13 Nagano Keiki Co., Ltd. Strain detector and manufacturing method thereof
US10067010B2 (en) 2016-06-09 2018-09-04 Nagano Keiki Co., Ltd. Strain detector and manufacturing method thereof

Also Published As

Publication number Publication date
JPH0674847A (en) 1994-03-18

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