JP3097001B2 - Polishing composition for texturing of magnetic disk substrate - Google Patents

Polishing composition for texturing of magnetic disk substrate

Info

Publication number
JP3097001B2
JP3097001B2 JP20860992A JP20860992A JP3097001B2 JP 3097001 B2 JP3097001 B2 JP 3097001B2 JP 20860992 A JP20860992 A JP 20860992A JP 20860992 A JP20860992 A JP 20860992A JP 3097001 B2 JP3097001 B2 JP 3097001B2
Authority
JP
Japan
Prior art keywords
texturing
magnetic disk
abrasive grains
substrate
polishing composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP20860992A
Other languages
Japanese (ja)
Other versions
JPH0633042A (en
Inventor
一志 児玉
卓生 若山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujimi Inc
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by Fujimi Inc filed Critical Fujimi Inc
Priority to JP20860992A priority Critical patent/JP3097001B2/en
Publication of JPH0633042A publication Critical patent/JPH0633042A/en
Application granted granted Critical
Publication of JP3097001B2 publication Critical patent/JP3097001B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、磁気ディスク装置の磁
気ディスク用基板(メモリーハードディスク)特にNi
−Pメッキ面のテクスチャリング用研磨組成物に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic disk substrate (memory
The present invention relates to a polishing composition for texturing a P-plated surface.

【0002】[0002]

【従来の技術】磁気ディスク装置に使用されているメモ
リーハードディスクは、近年、大容量化、高密度化の趨
勢にあり、磁性媒体は、従来の塗布型媒体からスパッタ
リングやメッキ法による薄膜媒体へと移行している。そ
して、高密度化に伴ないメモリーハードディスクと磁気
ベッドとの間隔、即ち、ヘッド浮上量は、ますます小さ
くなってきており、最近では、0.1μm以下になって
いる。このように、ヘッド浮上量が著しく小さいため
に、ディスク面に突起があるとヘッドクラッシュを招き
ディスク表面の磁性媒体や磁気ヘッドを損傷させること
があり、又、ヘッドクラッシュに至らないような微小な
突起でも突起部の磁気特性の乱れによって情報の読み書
きの際の種々のエラーの原因になりやすい。従って、磁
性媒体を形成する前のメモリーハードディスク用基板の
研磨工程等で突起の発生を防ぐことが重要である。
2. Description of the Related Art In recent years, memory hard disks used in magnetic disk devices have been increasing in capacity and density, and magnetic media have been changed from conventional coating type media to thin film media by sputtering or plating. Migrating. As the density increases, the distance between the memory hard disk and the magnetic bed, that is, the flying height of the head, has become smaller and smaller than 0.1 μm recently. As described above, since the flying height of the head is extremely small, if there is a projection on the disk surface, a head crash may be caused, which may damage the magnetic medium or the magnetic head on the disk surface, or a minute amount that does not lead to a head crash. Even protrusions tend to cause various errors in reading and writing information due to disturbance of magnetic properties of the protrusions. Therefore, it is important to prevent the occurrence of projections in the step of polishing the memory hard disk substrate before forming the magnetic medium.

【0003】一方、磁気ディスク装置は大容量化、高密
度化と並行して小型化も進められており、スピンドル回
転用のモーター等も小さくなってきて、そのためモータ
ーのトルクが不足し、ヘッドがディスク面に固着したま
ま浮上しないという現象が生じやすい。このヘッドの固
着をヘッドと基板表面の接触面積を小さくすることによ
り防止する手段として、いわゆる「テクスチャリング
法」が採用されている。この方法は、磁気ディスクの基
板表面に微細な溝を形成するものである。一般に、テク
スチャリングの加工方法としては、回転中の磁気ディス
ク基板表面に平均砥粒径が1〜15μmの研磨砥粒を固
着せしめたラッピングテ−プを加圧ローラー等で押し付
ける方法いわゆる「テープラッピング」が主として用い
られている。
On the other hand, the magnetic disk drive has been downsized in parallel with the increase in capacity and density, and the motor for rotating the spindle has also become smaller. The phenomenon of not floating while sticking to the disk surface is likely to occur. As a means for preventing the sticking of the head by reducing the contact area between the head and the substrate surface, a so-called "texturing method" is employed. In this method, fine grooves are formed on the substrate surface of a magnetic disk. Generally, as a texturing method, a method of pressing a lapping tape having abrasive grains having an average grain size of 1 to 15 μm fixed on the surface of a rotating magnetic disk substrate with a pressure roller or the like, so-called “tape wrapping” is used. Is mainly used.

【0004】特開昭62−236664号公報には、
「磁気ディスク用基盤を回転させながらラッピングテ−
プを加圧ローラーで基盤面に押し付ける第一工程と、該
第一工程で使用したラッピングテープの平均砥粒より小
さな砥粒を用いて研磨する第二工程とからなることを特
徴とする磁気ディスク用基盤のテクスチャリング方
法。」が開示されている。また、特開平2−31326
号公報には、「Ni−Pメッキヘッドを施したアルミニ
ウム合金板の面に、突起がなく、均一性の良い同心円状
の軽い条痕を研磨砥粒を水溶性粘結剤により予め保持せ
しめた研磨布製のテープを用い研磨加工する際に、研磨
液中に研磨砥粒を遊離させる事によって形成せしめる磁
気ディスク用基板の製造方法。」が開示されている。
Japanese Patent Application Laid-Open No. Sho 62-236664 discloses that
"Wrapping tape while rotating the magnetic disk base
A magnetic disk characterized by comprising a first step of pressing a lap against a base surface with a pressure roller, and a second step of polishing using abrasive grains smaller than the average abrasive grains of the wrapping tape used in the first step. Texturing method for the base. Is disclosed. Also, JP-A-2-31326
Japanese Patent Application Laid-Open Publication No. H11-163873 states that “a concentric circular light streak having no projections and good uniformity was previously held on a surface of an aluminum alloy plate provided with a Ni-P plating head with a water-soluble binder. A method for manufacturing a magnetic disk substrate, which is formed by releasing abrasive grains in a polishing liquid during polishing using a polishing cloth tape. "

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
ラッピングテープによるテクスチャリングを施した場合
には、基板表面にバリといわれるささくれ状の突起が発
生し、ヘッド浮上性能を低下させ、又、突起部に起因す
る磁気特性の乱れによって情報の読み書きの際の種々の
エラーの原因になりやすい。例えば、図5は、砥粒とし
て酸化アルミニウム(平均粒子径3μm)を用いラッピ
ングテープテクスチャーリングによる場合の基板上の加
工面の微分干渉顕微鏡写真(倍率720倍)であるが、
この図5に示すように基板表面に突起が発生し、均一な
加工面が得られない。本発明は、これらの要求に応える
ため、テープラッピング方式からスラリーテクスチャリ
ング方式への転換を行い、この方式に適合した磁気デイ
スク用基板のテクスチャリング用研磨組成物を得ること
が目的である。
However, when texturing with a conventional wrapping tape is performed, bulging-like projections called burrs are generated on the substrate surface, which lowers the head flying performance and reduces the projection. Disturbances in magnetic characteristics caused by various factors tend to cause various errors in reading and writing information. For example, FIG. 5 is a differential interference micrograph (720-fold magnification) of a processed surface on a substrate in the case of lapping tape texturing using aluminum oxide (average particle diameter 3 μm) as abrasive grains.
As shown in FIG. 5, projections occur on the substrate surface, and a uniform processed surface cannot be obtained. An object of the present invention is to convert from a tape wrapping method to a slurry texturing method in order to meet these demands, and to obtain a polishing composition for texturing a magnetic disk substrate conforming to this method.

【0006】[0006]

【課題を解決するための手段】本発明は、分散媒とし
て、エチレングリコール、プロピレングリコールまたは
それらを混合して用い、ダイヤモンド、炭化珪素、酸化
アルミニウムの砥粒を分散させて得られる磁気ディスク
用基板のテクスチャリング用研磨組成物である。
According to the present invention, ethylene glycol, propylene glycol or
It is a polishing composition for texturing a magnetic disk substrate obtained by mixing and using them to disperse abrasive grains of diamond, silicon carbide, and aluminum oxide.

【0007】[0007]

【作用】本発明の研磨組成物を用いてメモリーハードデ
ィスクの被研磨面を研磨すると、後述する実施例の表3
に示すような分散媒が使用でき、従来の方法に比べて突
起の発生のない高品質な加工面が得られる。図6は砥粒
としてダイヤモンド(平均粒子径3μm)を用い、分散
媒として水を用いた場合の基板上の加工面の微分干渉顕
微鏡写真(倍率720倍)である。一般的な水を分散媒
として使用した時は、この図6に示すように不均一で、
突起が発生し加工面品質が低下する。本発明の研磨組成
物において、砥粒濃度0.002重量%未満では加工性
不充分であり、50.0重量%を超えるとスラリー状態
の維持が困難となるので、砥粒濃度を0.002〜5
0.0重量%が好ましい。
When the surface to be polished of a memory hard disk is polished using the polishing composition of the present invention, Table 3 in Examples described later is used.
Dispersion media can be used as shown in, Ru quality machining surface without generation of projections as compared to the conventional methods are obtained. FIG. 6 is a differential interference micrograph (720-fold magnification) of a processed surface on a substrate when diamond (average particle diameter: 3 μm) is used as abrasive grains and water is used as a dispersion medium. When general water is used as a dispersion medium, it is non-uniform as shown in FIG.
Protrusions occur and the quality of the machined surface decreases. In the polishing composition of the present invention, if the abrasive grain concentration is less than 0.002% by weight, workability is insufficient, and if it exceeds 50.0% by weight, it becomes difficult to maintain a slurry state. ~ 5
0.0% by weight is preferred.

【0008】[0008]

【実施例】(実施例1) 次に述べる研磨機並びに下記に示す研磨条件で、プロピ
レングリコールを分散媒として、平均粒径3μmのダイ
ヤモンド砥粒を0.002〜50.0重量%の種々の割
合に配合し、砥粒濃度を変えた研磨組成物を用い研磨試
験を行ない加工量を測定した。その結果を表1に示す。
又、図1に、本実施例においてダイヤモンド(平均粒子
径3μm)砥粒濃度0.5重量%を用いた場合における
基板上の加工面の微分干渉顕微鏡による観察写真(倍率
720倍)を示す。
EXAMPLES (Example 1) Under the following polishing machine and polishing conditions shown below, propylene glycol was used as a dispersion medium, and diamond abrasive grains having an average particle diameter of 3 μm were prepared in various amounts of 0.002 to 50.0% by weight. A polishing test was carried out using a polishing composition having a different abrasive grain concentration, and the processing amount was measured. Table 1 shows the results.
FIG. 1 shows a photograph (720-fold magnification) of a processed surface on a substrate observed by a differential interference microscope when a diamond (average particle diameter: 3 μm) abrasive particle concentration of 0.5 % by weight is used in this example.

【0009】 [研磨機] YACテクスチャーマシン [研磨パッド(テープ)] テ−プ状植毛布(CYD−
2501 EG) [ディスク] Ni−Pメッキディスク,
3.5″φ,(鏡面加工品) [回転数] 250rpm(ディスク回
転数) [加工圧力] 0.8kg/cm2 [スラリー供給量] 6ml/分 [テープ送り速度] 6cm/分 [加工量] 20秒間の研磨加工量を示
す。
[Polishing machine] YAC texture machine [Polishing pad (tape)] Tape-shaped flocking cloth (CYD-
2501 EG) [Disk] Ni-P plated disk,
3.5 ″ φ, (mirror finished product) [Rotation speed] 250 rpm (disk rotation speed) [Processing pressure] 0.8 kg / cm 2 [Slurry supply amount] 6 ml / min [Tape feed speed] 6 cm / min [Processing amount ] Indicates the polishing amount for 20 seconds.

【0010】[0010]

【表1】 [Table 1]

【0011】表1に示すごとく、砥粒濃度0.002重
量%未満では加工性不充分であり、50.0重量%を超
えるとスラリ−状態の維持が困難となることから砥粒濃
度は0.002〜50.0重量%が好ましい。又、加工
面品質も従来のテープラッピングや水を分散媒とするス
ラリーテクスチャー方法と比較して突起もなく、高い加
工面品質が得られる。
As shown in Table 1, if the abrasive grain concentration is less than 0.002% by weight, the workability is insufficient, and if it exceeds 50.0% by weight, it becomes difficult to maintain the slurry state. 0.002 to 50.0% by weight. Also, compared with the conventional tape wrapping or the slurry texturing method using water as a dispersion medium, the processed surface quality has no protrusions, and a high processed surface quality can be obtained.

【0012】(実施例2)プロピレングリコールを分散
媒として、平均粒子径1μm、砥粒濃度0.4重量%で
研磨砥粒の種類をダイヤモンド、炭化珪素、酸化アルミ
ニウムの3種類の夫々に変えて実施例1と同様の研磨条
件にて研磨試験を行った。その結果を表2及び図2,図
3,図4に示す。図2,図3,図4は本実施例において
研磨砥粒を夫々平均粒子径1μmのダイヤモンド,炭化
珪素、酸化アルミニウムの3種を用いた場合における基
板上の加工面の微分干渉顕微鏡による観察写真(倍率7
20倍)である。
(Example 2) Using propylene glycol as a dispersion medium, the type of abrasive grains was changed to three types of diamond, silicon carbide and aluminum oxide at an average particle diameter of 1 μm and an abrasive grain concentration of 0.4% by weight. A polishing test was performed under the same polishing conditions as in Example 1. The results are shown in Table 2 and FIGS. 2, 3, and 4. FIGS. 2, 3 and 4 are photographs of a processed surface on a substrate observed by a differential interference microscope in the case of using three types of abrasive grains, diamond, silicon carbide and aluminum oxide, each having an average particle diameter of 1 μm in this embodiment. (Magnification 7
20 times).

【0013】[0013]

【表2】 [Table 2]

【0014】なお、表中Rmsは自乗平均平方根粗さを、
Raは平均粗さを、P−Vは最大粗さを示す。表2、図
2,図3,図4に示すごとく、プロピレングリコールを
分散媒として研磨砥粒の種類を変えた場合も砥粒の硬度
差による加工量の差はあるものの、いずれも加工面に
は、突起もなく、均一で加工面品質が高い。特にダイヤ
モンド砥粒を使用した研磨スラリーは加工量が多くて、
加工面粗さ等の品質が優れている。なお、本発明におい
て用いられる分散媒を次の表3に示す。
In the table, Rms represents the root mean square roughness,
Ra indicates average roughness, and PV indicates maximum roughness. As shown in Table 2, FIG. 2, FIG. 3, and FIG. 4, even when the type of the abrasive grains was changed using propylene glycol as the dispersion medium, there was a difference in the processing amount due to the difference in the hardness of the abrasive grains, but all of them were on the processed surface. Has no projections and is uniform and has high processed surface quality. In particular, polishing slurries using diamond abrasive grains have a large amount of processing,
Excellent quality such as machined surface roughness. The dispersion medium used in the present invention is shown in Table 3 below.

【0015】[0015]

【表3】 [Table 3]

【0016】[0016]

【発明の効果】本発明は、分散媒として、エチレングリ
コール、プロピレングリコールまたはそれらを混合して
用い、ダイヤモンド、炭化珪素、酸化アルミニウムの砥
粒を分散させて得られる磁気ディスク用基板のテクスチ
ャリング用研磨組成物で従来の分散媒に水を使用した場
合、又、テープテクスチャーに比較して均一で突起のな
い格段の加工面品質が得られる。
According to the present invention, ethylene glycol is used as a dispersion medium.
When water is used as a conventional dispersion medium in a polishing composition for texturing a magnetic disk substrate obtained by dispersing abrasive grains of diamond, silicon carbide, and aluminum oxide using coal, propylene glycol or a mixture thereof. In addition, a remarkably processed surface quality which is uniform and has no protrusion as compared with the tape texture can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例1(砥粒:ダイヤモンド)にて
得られた基板上の加工面の微分干渉写真の説明図であ
る。
FIG. 1 is an explanatory view of a differential interference photograph of a processed surface on a substrate obtained in Example 1 (abrasive grains: diamond) of the present invention.

【図2】本発明の実施例2(砥粒:ダイヤモンド)にて
得られた基板上の加工面の微分干渉写真の説明図であ
る。
FIG. 2 is an explanatory view of a differential interference photograph of a processed surface on a substrate obtained in Example 2 (abrasive grains: diamond) of the present invention.

【図3】本発明の実施例2(砥粒:炭化珪素)にて得ら
れた基板上の加工面の微分干渉写真の説明図である。
FIG. 3 is an explanatory view of a differential interference photograph of a processed surface on a substrate obtained in Example 2 of the present invention (abrasive grains: silicon carbide).

【図4】本発明の実施例2(砥粒:酸化アルミニウム)
にて得られた基板上の加工面の微分干渉写真の説明図で
ある。
FIG. 4 Example 2 of the present invention (abrasive grains: aluminum oxide)
FIG. 4 is an explanatory diagram of a differential interference photograph of a processed surface on a substrate obtained in FIG.

【図5】従来のラッピングテープテクスチャーリングに
よる場合の基板上の加工面の微分干渉顕微鏡写真であ
る。
FIG. 5 is a differential interference micrograph of a processed surface on a substrate in the case of conventional wrapping tape texturing.

【図6】分散媒として水を用いた場合の基板上の加工面
の微分干渉写真の説明図である。
FIG. 6 is an explanatory diagram of a differential interference photograph of a processed surface on a substrate when water is used as a dispersion medium.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−267931(JP,A) 特開 昭64−87673(JP,A) 特開 昭61−207479(JP,A) (58)調査した分野(Int.Cl.7,DB名) C09K 3/14 550 B24B 37/00 G11B 5/84 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-61-267931 (JP, A) JP-A-64-87673 (JP, A) JP-A-61-207479 (JP, A) (58) Field (Int. Cl. 7 , DB name) C09K 3/14 550 B24B 37/00 G11B 5/84

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 分散媒として、エチレングリコール、プ
ロピレングリコールまたはそれらを混合して用い、ダイ
ヤモンド、炭化珪素、酸化アルミニウムの砥粒を分散さ
せて得られることを特徴とする磁気ディスク用基板のテ
クスチャリング用研磨組成物。
1. A dispersion medium comprising ethylene glycol,
A polishing composition for texturing a magnetic disk substrate, which is obtained by dispersing abrasive grains of diamond, silicon carbide, and aluminum oxide using propylene glycol or a mixture thereof.
【請求項2】 前記砥粒が組成物中に占める割合が0.
002〜50重量%であることを特徴とする請求項1記
載の磁気ディスク用基板のテクスチャリング用研磨組成
物。
2. The composition according to claim 1, wherein said abrasive grains occupy a ratio of 0.
2. The polishing composition for texturing a substrate for a magnetic disk according to claim 1, wherein the amount is from 002 to 50% by weight.
JP20860992A 1992-07-14 1992-07-14 Polishing composition for texturing of magnetic disk substrate Expired - Fee Related JP3097001B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20860992A JP3097001B2 (en) 1992-07-14 1992-07-14 Polishing composition for texturing of magnetic disk substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20860992A JP3097001B2 (en) 1992-07-14 1992-07-14 Polishing composition for texturing of magnetic disk substrate

Publications (2)

Publication Number Publication Date
JPH0633042A JPH0633042A (en) 1994-02-08
JP3097001B2 true JP3097001B2 (en) 2000-10-10

Family

ID=16559048

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3097001B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100466422B1 (en) * 2000-04-18 2005-01-13 제일모직주식회사 Composition for chemical mechanical polishing

Also Published As

Publication number Publication date
JPH0633042A (en) 1994-02-08

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