JP3074053B2 - Embroidery data creation device for edge-mounted embroidery patterns - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a main pattern formed by stitches formed on a continuous folded linear main stitch path having a portion along a predetermined reference direction, and an outer side of the main pattern. The present invention relates to an embroidery data creating apparatus for creating an embroidery data for forming an embroidery pattern including an edge pattern formed by a seam formed on a circling edge seam path.

[0002]

2. Description of the Related Art As shown in FIG. 30A, for example, a main pattern 10 formed zigzag along a reference line dir100.
An edge-embedded embroidery pattern is known, which comprises an edge pattern 1 and a border pattern 103 formed by a chain stitch seam that goes around the outside.

In this embroidery pattern attached to the edge, FIG.
As shown in (B), the main seam path 105 for the main pattern 101
And the embroidery seam path 107 for the embroidery pattern 103 circling the outside thereof must be provided as data to the embroidery sewing machine. Therefore, it is not enough to just create the design of the outer shape 111 of “E”, and the outer shape 113 of the main pattern forming area inside the design has to be determined. Further, when there are a plurality of circling edge seam paths, a large number of coordinate points for specifying those paths have to be determined. External shape 1 of this main pattern formation range
Thirteen or a plurality of border stitch paths are not simply similar to the outer shape 111. As a result, since the processing cannot be performed by the concept of enlargement / reduction, the operator draws the drawings one by one and reads and determines the coordinates.

[0004]

For this reason, conventionally, when the contour shape of an embroidery pattern becomes complicated, how to define a main pattern forming range for a border pattern (or conversely, a position for forming a border pattern relative to the outer shape of the main pattern) is determined. There is a problem that craftsman's experience is required to determine what to do, and it is not possible for a skilled person to quickly create a embroidery data of an edge-attached pattern of a complicated shape with a rich taste.

[0005] In addition, even a skilled person must accurately determine the outer shape (or the border pattern forming position) of such a main pattern forming range by hand, which requires a lot of time and labor, and requires a high work efficiency. Was extremely low. As a result, when creating a new embroidery pattern or improving or changing a conventional embroidery pattern, embroidery data cannot be obtained quickly, and an embroidery pattern that matches the changing fashion every day is created. There was a problem that disadvantages and inconveniences were forced.

[0006] Therefore, once the contour shape of the embroidery pattern is determined, the data can be automatically created thereafter, and even an unskilled person can easily create embroidery data for the edge-mounted embroidery pattern. The present invention has been completed for the purpose of providing an embroidery data creation device for an edge-mounted embroidery pattern.

[0007]

SUMMARY OF THE INVENTION An embroidery data creating apparatus for an edge-embedded embroidery pattern according to the present invention, which has been completed to achieve the above object, has a structure as shown in FIG. A main pattern formed by stitches formed on a continuous folded linear main stitch path having a portion, and a border formed by stitches formed on a border stitch path surrounding the outside of the main pattern An embroidery data creation device for an embroidery pattern for creating an embroidery pattern for forming an embroidery pattern with an edge, comprising: a plurality of point groups for specifying an outline of the main pattern or the edging pattern. Identifying means M1, pattern positional relationship providing means M2 for providing a positional relationship between the outer edge of the main pattern and the border pattern, and calculating information on each line segment formed between a plurality of points on the given contour. A line segment information calculating means M3; An offset point group calculating unit M4 that calculates an offset point group obtained by offsetting a plurality of point groups on the contour to the inside or outside of the contour based on the output line segment information and the given pattern positional relationship; A border seam path determining means M5 for connecting the point groups outside the plurality of point groups on the offset point group or the contour and determining the border seam path; a reference direction specifying means M6 for specifying the reference direction; Main stitch path determining means for determining the main stitch path from the external shape of the closed area formed by connecting the point groups inside the plurality of point groups on the offset point group or the contour and the reference direction M7.

According to the embroidery data creating apparatus of the present invention, the outline of the main pattern or the border pattern is specified by using the plurality of point groups by the outline specifying means M1, and the outer edge of the main pattern is specified by the pattern positional relation applying means M2. Given the positional relationship with the border pattern,
The line segment information calculating means M3 calculates information of each line segment formed between a plurality of points on the given contour. And
The offset point group calculating means M4 calculates an offset point group obtained by offsetting a plurality of point groups on the contour to the inside or outside of the contour based on the line segment information and the given pattern positional relationship.

The offset point group calculating means M4 can be configured to calculate the offset point group based on, for example, a relationship between adjacent line segments. For example,
This concept includes a method of calculating an intersection point after translating a line segment in parallel. Further, the offset point group calculating means M
4 calculates the offset direction of the intersection between the adjacent line segments when the fixed amount line segment is offset based on the respective directions of the adjacent line segments, and calculates the positional relationship between the given border pattern and the main pattern. The offset amount of the intersection in the offset direction may be calculated based on the offset amount, and the position of the offset point group may be calculated from the offset amount and the offset direction.

When the offset point group is calculated in this way,
The edging seam path determination means M5 determines an edging seam path by connecting point groups outside the offset point group or a plurality of point groups on the contour. Regarding the main stitch path, the main stitch path determining means M7 connects the reference direction provided by the reference direction specifying means M6 with the offset point group or the point group inside the plurality of point groups on the contour. This is determined from the group of line segments constituting the closed region by.

Here, the main seam path determining means M 7
As an example, based on a feature point extracting unit M11 that extracts a predetermined feature point from the contour of the contour specified by the inside point group, based on the extracted feature point and the specified reference direction, A closed region dividing means M12 for dividing a closed region surrounded by the inner point group into a plurality of divided regions, and based on the divided region, the inner point group, and the reference direction, the entire main pattern is formed. It is preferable to determine the main seam path to be crossed.

According to the embroidery data creating apparatus, the closed area dividing means M12 divides the closed area surrounded by the inside of the offset point group or the first contour point group into a plurality of divided areas. At this time, the closed area dividing means M12 divides the closed area in consideration of a predetermined feature point on the contour extracted by the feature point extracting means M11 and the reference direction specified by the reference direction providing means M6. The main seam path determining means M7 determines the main pattern based on the divided area obtained in this manner, the calculated offset point group, or the closed area specified by the inner point group in the given point group and the reference direction. Determine the entire main seam path.

With this configuration, the main stitch path can be easily determined when a complicated main pattern is formed. In the embroidery data creating device for an edge-embroidered embroidery pattern, the main stitch path includes a stitch path filling each divided area and a connecting path connecting the stitch paths. Eye path determination means M12
As illustrated in FIG. 3, a connection path determination unit M1 that determines the connection path in accordance with a predetermined condition regarding the stitch formation order.
3 can also be provided. With such a configuration, a single continuous seam path of the entire main pattern can be determined by being decomposed into a seam path and a connection path in each divided area.

Further, in the embroidery data creating apparatus for an edge-attached embroidery pattern, the closed area dividing means M12
Recognizing a state related to irregularities of the main pattern based on the continuous state of the point group, finding a predetermined intersection point between a straight line passing through a concave point parallel to the reference direction and a contour line of the main pattern, The end point of the eye path is considered as a starting point, and the intersection point, the convex point, and the concave point continue on the contour line of the main pattern in the order of the intersecting point, the convex point, and the concave point. It is possible to adopt a configuration in which the divided area is determined by extracting a portion not to be processed. After determining one divided area, the closed area dividing means M12 ignores intersections, convex points, and concave points in the already determined divided areas when determining the next divided area. It is good to According to these configurations, the stitch formation order can be automatically determined.

In the above-described embroidery data creating apparatus for an edge-mounted embroidery pattern, as shown in FIG.
Stitch path connecting means M14 for connecting the end point or start point of the border seam path determined by the border seam path determining means M12 and the start point or end point of the main seam path determined by the main seam path determining means. Can also be provided. According to this configuration, for example, when a border pattern is first formed during embroidery, the seam path connecting means M14 connects the end point of the border seam path and the start point of the main seam path. Conversely, when the main pattern is formed first, the seam path connecting means M14
Connects the end point of the main stitch path and the start point of the border stitch path.

As described above, according to the embroidery data creating apparatus for an edge-mounted embroidery pattern of the present invention, at first, any one of the information for specifying the outer shape of the main pattern forming area or the outer shape including the border pattern is specified. Can be generated, information that specifies a shape that is offset by a predetermined amount inward or outward can be generated, and the border stitch path and the main stitch path can be easily converted into embroidery data.

[0017]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. The embroidery data creating apparatus 1 according to the embodiment includes a main pattern formed by stitches formed on a continuous folded linear main stitch path having a portion along a predetermined reference direction, and circulates outside the main pattern. An apparatus for creating embroidery data for forming an edge-attached embroidery pattern including a border pattern formed by stitches formed on a border stitch path to be formed. As shown in FIG. A digitizer 3 for inputting the external shape of the computer, a keyboard 5 for inputting numerical values and the like, an arithmetic processing unit 7 connected to the digitizer 3 and the keyboard 5, and connected to the arithmetic processing unit 7. A floppy disk driver 11 for reading the stored information and writing the result of the arithmetic processing by the arithmetic processing device 7, and a data display for displaying based on the arithmetic processing result by the arithmetic processing device 7. And a spray 13. The arithmetic processing unit 7 includes a CPU 1
5, a computer including a ROM 17, a RAM 19, and the like, and an I / O port 21. The ROM 17 stores a control processing program described later.

When the digitizer 3 creates the outer shape of the embroidery pattern, the arithmetic processing unit 7 places the drawing 25 on which the design image 23 is drawn on the board 27, and places the corners 23a, 23b,. By designating the input point 29 clockwise from the start point 23a to the end point 23z, each coordinate data specifying the shape shown in the design image 23 and the connection order of these coordinate data are stored as data in the RAM.
19 is stored. In addition to simply storing the coordinate points, information on the continuity of the outline is also stored in accordance with the input order of the coordinate points. In addition, information is input from the digitizer 3 or the keyboard 5 as to which direction the seam along which the figure shown in the design image 23 is to be filled to form the main pattern. The direction along which the seam should follow is the reference direction d.
Called ir. Further, for the border pattern, the distance (offset distance) ost indicating how far from the outer shape of the main pattern the border seam path should be formed is set to the keyboard 5.
Input from. In addition to the above, there is an interval (stitch interval) ssp between parallel stitches of the main pattern. Based on the information specifying the contour line, the reference direction dir, the offset distance s, and the stitch interval ssp, the following arithmetic processing is executed to create embroidery data for the embroidery pattern attached to the edge.

An embroidery pattern DSGN having a complex shape shown in FIG. 6 and having a border pattern DSGNedge separated by an offset distance ost around the main pattern DSGNmain will be described below. First, digitizer 3 first
As shown in FIG. 6, it is assumed that the contour shape of the main pattern DSGNmain is specified in the order of points m1, m2,..., M26 (hereinafter, points m1, m2,. These dot strings are displayed on the display 13 for image confirmation.

Next, by referring to the input point sequence m displayed on the display 13 and using the digitizer 3, the meaning of the twentieth input point m20 as the starting point of the embroidery path from the point sequence m is described. And the ninth input point m9 has the meaning “Om point” as the end point of the embroidery path.
Point ". Further, for the reference direction dir,
The numerical values of the x-direction increment xdir and the y-direction increment ydir are specified by inputting from the keyboard 5, and the offset distance ost and the stitch interval ssp are also specified on the keyboard 5 respectively.
Enter a number from.

First, the arithmetic processing unit 7 sets the main pattern DS.
A process (FIG. 7) for specifying the outer shape of the GNmain is executed. In this process, first, a point of interest (point Q) from each of the points m1 to m26 of the input point sequence m and a point immediately before the point sequence m when the point sequence m is viewed clockwise with respect to the Q point. (P point) and the next point (N point) are selected (step SA).
For example, as shown in FIG. 8, when the point m1 is the Q point, the point m26 is the P point and the point m2 is the N point.

Next, the direction vector VQ from point Q to point P
P and a direction vector VQN from the Q point to the N point are obtained,
Based on the equations (1) and (2), the first and second unit vectors V perpendicular to the respective direction vectors VQP and VQN
U and VV are obtained (steps SB to SE).

[0023]

(Equation 1)

Next, it is confirmed that the first unit vector VU is not equal to the second unit vector VV (step SF). This is a process for confirming, for example, whether the input of the first digitizer includes ma, mb, mc, md and an erroneous input point mc as shown in FIG. As shown in the figure, an input that returns on the same straight line is an erroneous input, so that processing is performed for a correct input point, so that the next point after the current N points is set as the N point and the process returns to the step SD (step SG).

If it is confirmed in step SF that the Q point is not caused by an erroneous input, then the second unit vector VV
, A direction vector (input point offset direction vector) VVU heading toward the first unit vector VU is obtained (step SH). Then, using the equation (3), the offset distance ost is converted into a value (converted value) r in the direction of the input point offset direction vector VVU obtained in step SH (step SI).

[0026]

(Equation 2)

Next, the converted value r is applied to the following equation (4) to calculate a position vector Vp of the offset point (point p) and store it in the RAM 19 (step SJ). At this time, when the Q point is the Im point or the Om point,
Information about the main pattern sewing start point Ip and the main pattern sewing end point Op is added to the offset point p and stored.

[0028]

(Equation 3)

By performing the above processing for all the input points m1 to m26, as shown in the upper part of FIG.
Points p1, p2,..., P26 (hereinafter, points p1, p2,..., P26) representing the outer shape of the main pattern DSGNmain which is inserted into the embroidery pattern DSGN having a complicated outer shape by the offset distance ost.
p26 is referred to as a point sequence p).

When the shape of the main pattern DSGNmain is specified in this way, the arithmetic processing unit 7 executes a coordinate conversion process shown in FIG. In this process, first, the reference directions dir and x
The angle θ formed with the axis is obtained from the following equation (5) (step S5).
1) A vector Voc from the origin o to the center of gravity c of the point sequence p is obtained from the following equation (6) (step S2). Note that m in the following equation is calculated as “m = 26” in the example of FIG.

[0031]

(Equation 4)

Next, the equation (7) is changed from n = 1 to n = m (= 2
The point sn constituting the point sequence s obtained by rotating the point sequence p by the angle “−θ” is calculated as a vector Vosn from the origin o (step S3).

[0033]

(Equation 5)

Next, x of each vector Vosn of n = 1 to m
A point smaxx having a maximum value and a point sminx having a minimum value when the components are compared, and each vector V of n = 1 to m
Point sm having the maximum value when comparing the y components of osn
axy and a point sminy having the minimum value are obtained (step S4). When the processing up to this point is represented by a diagram, it is exactly as shown in the lower part of FIG. In the illustrated example, x
The component maximum point smaxx and the y component minimum point sminy are the same point.

When the state shown in the lower part of FIG. 10 is reached, the y component minimum point sminy is defined as Q point, the preceding point s12 is defined as P point, and the subsequent point s14 is defined as N point. It is determined whether or not the input of the first point sequence p has been correctly performed clockwise based on whether or not the value of the expression is positive (step S5).

[0036]

(Equation 6)

If "NO" in step S5, that is, if equation (4) is negative, it is determined that the first input has been made counterclockwise, and the first input point sequence m =
The order of m1, m2,..., m26 is reversed, and the processes from step SA onward in FIG. 7 are executed again (step S6).

When the processing shown in FIG. 11 is completed and the point sequence s after "-.theta." Conversion is obtained,
The processing shifts to the processing routine. The processing of this routine is a point immediately before the y component maximum point smaxy of the point sequence s (see FIG. 10).
In the example of the above, based on the continuous state when viewed in the clockwise direction up to s2), each of the points smaxy, s4,..., S2 corresponds to a singular point viewed from the relationship with the reference direction dir. Is determined, and what the attribute of the singular point is is determined. The singular point referred to here is the reference direction dir
Is taken on the x-axis, the y-increment of the line segment connected from the point to the next point clockwise is “from positive to negative” or “from negative to positive”.
Is a point defined as a point that changes to Therefore, the singular point referred to here can be further divided into singular points having two different attributes. A singular point at which the y increment changes from "negative to positive" is defined as a singular point of attribute B (hereinafter also referred to as point B), and a singular point at which the y increment changes from "positive to negative" is a singular point of attribute C. (Hereinafter also referred to as point C). That is,
Point sequence s among singular points determined from the relationship with reference direction dir
When looking at the closed figure constituted by, the vertex that intrudes inward is defined as point B, and the vertex that protrudes outward is defined as point C.

The specific processing will be described. First, the y component maximum point smaxy is selected as a point to be considered (hereinafter, referred to as a point sn or a Q point) (step S11), and a point immediately before the Q point (hereinafter, a point sn-1 or a P point) is selected. ) And a point after the Q point (hereinafter, referred to as point sn + 1 or N point) are specified (step S12). Subsequently, the y component of the direction vector VPQ from point P to point Q is calculated, and this is set as a first evaluation value k1 (step S13). If the first evaluation value K1 is the value "0", the point P specified in step S12 is changed to a point sn-2 immediately before the point sn-1 (step S1).
4, S15), and returns to the processing of step S13.

On the other hand, if step S14 results in "NO", the y component of the direction vector VQN from point Q to point N is calculated, and this is set as the second evaluation value k2 (step S14).
16). If the second evaluation value K2 is the value “0”, the currently selected Q point cannot be the B point or the C point, so that the process passes the following process and proceeds to step S24 (step S24).
17).

On the other hand, the determination in step S17 is "N
O ”, the first evaluation value K1 and the second evaluation value K
The two signs are compared (step S18). If the signs are the same, the currently selected Q point cannot be the B point or the C point, so the process passes the following process and proceeds to step S24.

On the other hand, if the sign of the first evaluation value K1 is different from the sign of the second evaluation value K2, the value obtained by dividing the x component of the direction vector VQP by the magnitude of the direction vector VQP, that is, x of the unit direction vector △ VQP The component △ VQPx and the value obtained by dividing the x component of the direction vector VQN by the magnitude of the direction vector VQN, that is, the x component of the unit direction vector △ VQN △ VQ
Nx is obtained, and the third evaluation value u is calculated by subtracting the latter △ VQNx from the former △ VQPx (step S19). When the third evaluation value u is a value “0”, the selected Q point cannot be the B point or the C point, so that the process passes the following process and proceeds to step S24 (step S20).

On the other hand, the determination in step S20 is "N
O ”, the third evaluation value u and the first evaluation value K1
Are compared (step S21). If the sign of the third evaluation value u and the sign of the first evaluation value K1 are the same, the RAM indicates that the selected Q point is a singular point and its attribute is B point.
19 (step S22). On the other hand, when the signs of the third evaluation value u and the first evaluation value K1 are different, the fact that the selected Q point is a singular point and its attribute is the C point is stored in the RAM 19 (step S23). And
After the processing of step S22 or S23, it is determined whether or not each of all the points in the point sequence s has been selected as the Q point (step S24). If there is any point that has not been selected yet, The process from step S12 is repeated with the N point as the Q point (step S25).

The conditions for determining the attribute of a singular point in the above processing are shown in the following table.

[0045]

[Table 1]

As described above, all the points in the point sequence s are singular points or not, and if they are singular points, the attribute is B point or C point.
After checking whether the attribute is a point or not, as shown in FIG. 13, the information of the attribute (points B and C) is converted into a point sequence p before “−θ conversion”.
Is stored as the attribute of each corresponding point (step S31).
That is, as shown in FIG. 14, the points p5, p7, p10, p10, and p5 of the points before the "-.theta. Conversion" of the points s5, s7, s10, s15, s19, and s23 on the point sequence s whose attributes are the B points. p15, p19,
It is stored that each of p23 is a point B (B1, B2,..., B6), and points s3, s6, s9, s12, s13, s16, s21, and s3 whose attributes are C points on the point sequence s. s
24 points p3, p6, p9, p12, p1 before "-θ conversion"
3, p16, p21, and p24 are at point C (C1, C2,
.., C8) are stored.

Subsequently, as shown in FIG.
From the intersections between the parallel line and the closed figure when a line parallel to the reference direction dir is drawn, the intersection (from point B, in which the length of each line segment in the same direction as the reference direction and the opposite direction is the shortest) Each point of “△” shown in the figure; hereinafter, referred to as T point) is calculated (step S32). As a result, each B point B1, B2,.
, Two T points (T1r and T1l) and (T2r
And T2l), ... are required. The point T is different from the points B and C, and is a point that is not specified by the first digitizer input and is a point generated by the present processing. Note that, similarly to the point B and the point C, the point is determined from the relationship with the reference direction dir. Therefore, in the following description, a singular point includes the point T.

Next, on the contour of the closed figure determined by the point sequence p, the numbers are renumbered together with the respective attributes including the newly generated T point in the clockwise direction from the first input point p1 (step S1). S33). That is, as shown in FIG.
n1, pn2, pc3, pn4, pb5, pc6, pt
.., Pn38 are stored in a predetermined area in the RAM 19 for the next processing. Where p
n indicates a non-attribute point, pb indicates a singular point of attribute B, pc indicates a singular point of attribute C, and pt indicates a singular point of attribute T. T
As is clear from the specific method, the number of points is twice as many as the number of points B, and the number of points C is two more than the number of points B as properties of the geometrical figure.

Thus, 3 including the newly generated T point
When the number assignment including attributes is completed for eight points,
This time, processing for specifying a unit area for embroidery is executed. This is a process for automatically executing the conventional block division. In this processing, as shown in FIG. 16, first, in the first input, the Op point (the point pc10 after the number reassignment), which is the end point of the embroidery path, is selected as the study start point sp (step S41), and the clockwise direction is selected. When viewed from the CW, a point immediately before the examination start point sp (pn9 for pc10) is set as the examination end point ep (step S42). next,
It is determined whether or not there is one or more points T in the point sequence from the point sp to the point ep (step S43). If there is one or more, it is viewed clockwise (forward) CW from the examination start point sp. In this case, the first point T found is set as the area specifying end point w (step S44). This area specifying end point w is a reference point for specifying a unit area in the following area examination, and is a point (L point) that is the left end of the bottom when the finally specified unit area is viewed as a bell shape. Becomes

When the area specifying end point w (the T point found first in the forward direction) can be specified in this manner, the area specifying end point w
Then, it is determined whether or not the singular point continues in the order of the point C and the point B in the forward direction CW until reaching the examination end point ep (step S45). That is, point T → C in the forward direction
It is determined whether or not the singular points are consecutive in the order of point → point B. Here, “a singular point is continuous in the order of T point → C point → B point” means “T point → (T point) → C point → B point” or “T point → (B point)”. This means that only points “T → C → B” are connected without interposing a point of another attribute (point enclosed by ()) such as “→ C point → B point”.

If "NO" is determined in the step S45, the counterclockwise direction (reverse direction) from the area specifying end point w.
The singular point is further increased to the C point before reaching the Op point in the CCW,
It is determined whether or not points B are consecutive in order (step S46). That is, if the forward CW is not successful, it is determined whether or not the singular points are continuous in the reverse CCW in the order of point T → point C → point B.

If both the forward direction CW and the backward direction CCW are determined to be "NO", the process from step S44 is repeated with the current area specifying end point w as a new study start point sp (step S47). Note that as long as there is at least one T point, the nature of the graphic necessarily means that sometime in step S45 or S4
6 is "YES".

If step S45 or S46 is "YES", a closed figure surrounded by the T point, the C point, the B point, and the non-attribute point therebetween is specified as a unit area, and the T point is determined. Point L, point C is point M (point corresponding to the vertex when the unit area is viewed as bell-shaped), and point B is point R (point corresponding to the right end of the base when the unit area is viewed as bell-shaped). Name and the point number are stored at the head of the free area of the unit area storage area in the RAM 19 (step S48). And the T found in these processes
The attributes of the four singular points of the point, the point C, the point B, and the T point (for example, T1l with respect to T1r in FIG. 14) paired with the T point found this time are made non-attribute (step S49), and the steps from step S41 onward again Is repeated. Note that, in the processing after step S41, the outline from the closed figure specified by the initial point sequence p to the point R from the point L to the point R via the point M of the block specified this time is deleted. Do a review.

As the processing is repeated, the attribute T
Are all attributeless, step S43 is [YE
S ". At this time, all the points of the attribute B are also automatically set to the non-attribute, but two points of the attribute C still remain.
When “YES” is determined in the step S43 in this manner, the closed figure including the two remaining C points is specified as the last area and stored in the unit area storage area (step S5).
0). In the present embodiment, when specifying the end point of the embroidery path in the first input, any one of the C points is set to Op.
It is specified as a point. The Op point is designated from the sharp points of the designed closed figure. Therefore, one of the remaining two C points is always the Op point. Therefore, in the process of step S50,
Using the Op point as the L and R points of the block, another C
The points are stored as M points.

The progress of the above processing is shown in FIGS. In the figure, "●" indicates non-attribute points, and "▼" indicates B
A point, a “▲” mark indicates a point C, and a “■” mark indicates a T point. First, as shown in FIG. 17A, an Op point (= pc10) is selected as a study start point sp, and a point pn9 is set as a study end point e.
Set as p. Next, as shown in FIG.
A point T (pt1) that is first found in the forward direction CW from p
1) is defined as an area specific end point w, and the forward direction CW
It is determined whether or not “point T → point C → point B” is satisfied.
In the state shown in the figure, "T point (point w) → T point (pt1
2) ”, we will consider reverse CCW. However, the Op point is found immediately.

Then, as shown in FIG. 17C,
The point w (pt11) is set as a new point sp, and the T point (pt12) first found when viewed in the forward direction CW is set as the area specific end point w. It is determined whether the “point B” is satisfied. In the state shown in the figure, "T
Point (point w) → point B (pb13) ". Therefore, the backward CCW is also examined, but this is also immediately found as “point T (point w) → point T (pt11)”. For this reason, the unit area cannot be specified yet.

Subsequently, the current area specifying end point w (pt12)
Is set as a new point sp, a point pt14 is specified as a new area specifying end point w, and the study is continued in the forward direction CW and the backward direction CCW. However, since the condition is not yet satisfied, FIG.
As shown in FIG. 8A, the process proceeds to the examination using the point pt14 as the examination start point sp. In this state, from the point sp to the forward direction C
The point T (pt17) that is found first when viewed from W is defined as the area specific end point w, and when this is used as the starting point, when further viewed in the forward direction CW,
Finally, "T point (point w = pt17) → C point (pc18) → B
The relationship of "point (pb20)" is found. Therefore, the first unit area (area 1) coming here can be specified.

When area 1 is specified in this way, FIG.
As shown in (B), points T (pt17), point C (pc18), and point B (pb20) in area 1 are points pn17, pn having no attribute.
18 and pn20, and the T point (pt14) paired with the T point (pt17) in the area 1 is also rewritten to a non-attribute point pn14. And pn17 → pn18 →
The part that continues from pn19 to pn20 is excluded from the next and subsequent studies (FIG. 18C).

After specifying the area 1, the examination is repeated with the Op point again as the study start point sp. Then, FIG.
As shown in (A), when the point pt12 is advanced to the point where the examination start point sp is set, the point pt21 is set to the area specific end point w.
"Point T (point w = pt21) → point C (pc16) → point B (pb13)" is satisfied in the reverse CCW, and the next unit area (area 2) can be specified.

When the area 2 is specified, as shown in FIG. 19B, a point T (pt21), a point C (pc16), and a point B (p
b13) and the points pn21 and pn1 where the point T (pt24) has no attribute
6, pn13 and pn24 are rewritten, and the portion excluding area 2 is examined. And this time the point p
When t11 is the examination start point sp and the point pt12 is the area specific end point w, "T point (pt12) → C point (pc22) → B point (pb26)" is satisfied in the forward direction CW, and the next unit area ( Area 3) can be specified.

When the area 3 is specified, as shown in FIG. 19C, a point T (pt12), a point C (pc22), and a point B (p
b26) and the points pn12 and pn2 where the point T (pt34) has no attribute
2, pn26 and pn34, and the portion excluding area 3 is examined. Then, when the point pt11 is the examination start point sp and the point pt27 is the area specific end point w, in the forward direction CW, "point (pt27) → point C (pc2
9) → Point B ”(pb31)” specifies area 4.

Hereinafter, as shown in FIGS. 20A and 20B,
Area 5 (pt36 → pc3 → pb5), Area 6 (pt3
5 → pc6 → pb8), and finally, as shown in FIG. 3C, a contour line specified by two C points (pc10, pc32) remains. These two C points (pc10, pc
The area specified in 32) is the final area (area 7).

As a result of the above processing, the information having the contents shown in FIG. 21 is stored in the unit area storage area in the RAM 19. As described above, the areas 1 to 7 are specified. However, the above-described processing is not limited to simply dividing the area, and forming embroidery stitches in each area in the specified order. In this case, the processing also determines the stitch formation order such that the sewing thread does not cross the previously sewn area. This was confirmed by attempting to divide an area into various figures by the above method.

When the unit areas and the stitch formation order are determined in this way, the L points, M points specifying each unit area are determined.
A specific outline structure of an arbitrary area is determined based on the point and the R point (hereinafter, also referred to as a structural element). The contour structure obtained here has the structural element M of the area at the bottom, and R
A horn-like shape with the point and the point L on the upper side is basically considered.
Hereinafter, the point from the point M to the point R is called an R contour, and the point from the point M to the point L is called an L contour. In the contour structure determination processing, as shown in FIG. 22, first, the examination direction is set to the forward direction (clockwise).
It is set to CW (step S61). Subsequently, the M point of the unit area to be considered is set as a Q point (point of interest) (step S62). Then, a point Q is moved in the forward direction CW in the contour of the point sequence p input first, and a tracking check is executed to temporarily store information on each moving position (step S63). When the point Q reaches the point L (step S64) as a result of this tracking investigation, it is determined whether or not the point L belongs to the unit area currently under consideration (step S65). If the current area belongs to the unit area under consideration, the information about each moving position temporarily stored by the tracking investigation is written as L contour information in a predetermined portion of the area storage area in the RAM 19 (step S66). on the other hand,
If it is the L point of another area, the L of the other area
A point on the line connecting the point R of the other area is traced, and the point sequence p is traced again along the contour in the examination direction set (step S67).

If the point R is reached before reaching the point L (step S68), it is determined whether or not the point R belongs to the unit area currently under consideration (step S69).
If the current area belongs to the unit area under consideration, the information about each moving position temporarily stored by the follow-up survey is written into a predetermined portion of the area storage area in the RAM 19 as R contour information (step S70). On the other hand, if the point is an R point in another area, a point connecting the point R in the other area to a point L in the other area is traced, and then the point sequence p is set again along the contour line. Follow-up investigation is performed in the examination direction (step S71).

When step S66 or S70 is executed, the tracking direction under consideration is changed to the reverse direction CC.
It is determined whether it is W (step S72), and "NO"
If so, the examination direction is set to the backward CCW, and then the processing from step S62 is repeated (step S73). On the other hand, if “YES”, the contour structure determination processing for the area is ended.

Next, a process for determining a stitch formation path for forming a stitch in the area is executed based on the obtained outline structure. In this process, as shown in FIGS. 23 and 24, first, a point on the point sequence p corresponding to the y component minimum point sminy obtained for the point sequence s is set as one end point (lower end point) g, and the point sequence s
Point sequence p corresponding to the y component maximum point smaxny obtained for
The upper point is set as another end point (upper end point) k (step S81). Next, an intersection point h between a straight line L1 passing through the lower end point g and perpendicular to the reference direction dir and a straight line L2 passing through the upper end point k and parallel to the reference direction dir is determined (step S82), and the lower end point g and the intersection point h are connected. Find the line segment gh (step S8)
3). Next, the line segment gh is divided from the lower end point g to the intersection point h based on the stitch interval spp (the interval between parallel stitches in the embroidery pattern, which is initially input from the keyboard 5). Hn is obtained (step S84). As a result, a state as shown in FIG. 25 is obtained.

Further, a difference dis is obtained by subtracting the vertical distance from the point R of the unit area to the line L2 from the vertical distance from the point M of the unit area under consideration to the line L2 (step S85). Since the line segment LR is parallel to the straight line L2, the difference dis may be obtained from the straight line distance from the point L.

Next, the intersection j between the straight line passing through the point M in the examination area and parallel to the reference direction dir and the line segment gh is obtained (step S86). Next, it is checked whether the difference dis obtained in step S85 is positive or negative (step S85).
87) If it is positive, the subscript n of the division point Hn closest to the intersection j among the points on the line segment jh is set as the evaluation value z (step S8).
8) If it is negative, the subscript n of the division point Hn closest to the intersection j among the points on the line segment gj is set as the evaluation value z (step S89).

Subsequently, it is checked whether the evaluation value z is odd or even (step S90). If it is odd, the point of interest (Q
The R contour direction is selected as the sewing direction from the point (step S91), and if it is even, the L contour direction is selected (step S92). It should be noted that the point of interest is the M point at first, and is a point that is sequentially updated according to the processing.

Then, the point at which the outline structure corresponding to the selected sewing direction and the straight line parallel to the reference direction dir passing through the division point Hz specifying the evaluation value z intersects the point at which the stitch direction is changed (direction (Change point) tmp (step S9)
3). Therefore, if the evaluation value z is determined to be odd in step S90, the point on the R contour is the direction change point tmp if the evaluation value z is determined to be even. In addition,
This process is repeated many times as described later, and there may be cases where no intersection is formed with either the R contour or the L contour. In this case, however, the M point of the contour which should have the direction change point tmp is not used. An end point (L point or R point) is set as a direction change point tmp.
Note that the first Q point (M point) and the direction change point tmp are on the same contour. In addition, even when returning to the present processing step again through the following processing steps, the Q point and the direction change point tmp have a relationship on the same contour at that time.

Subsequently, while confirming that the Q point has not reached the L point or the R point (step S94), the Q point is moved to the direction change point tmp along the contour determined by the point sequence p. The information about each position in the inside is stored (steps S95 and S96). And the Q point is the direction change point tm
When it reaches p, the Q point is changed to the direction change point tmp.
, While moving along a straight line parallel to the reference direction dir until reaching the contour on the opposite side, information on each position during the movement is stored (steps S97 and S98).

When the point Q reaches the contour on the opposite side,
Depending on whether the difference dis obtained earlier is positive or negative, the evaluation value z is updated by adding "+1" or "-1" (steps S99 to S101), and the process returns to step S93. When the above processing is repeated, step S94 eventually becomes “NO”. Then, the stitch forming path in the area unit (the stitch forming path in the area) to which the position information stored so far is connected is stored, and the process is terminated (step S102). At this time, the M point of the area is set as the start point tp, and the L point or the R point determined to be “NO” in the process of step S94 is stored as the end point fp.

An example of the calculation for area 3 is shown in FIG.
Shown in As shown, the R contour selected based on the division point H _9, by sequentially processing thereafter proceeds, starting point tp3
A stitch forming path from (M point) to the end point fp3 (L point) is obtained. After the completion of the stitch formation paths in the unit of area in this way, processing (FIGS. 27 and 28) for obtaining a connection path connecting these areas with each other is executed. Here, the order of connecting the areas is determined together with the unit area determination processing.

Therefore, in the following processing, the main purpose is to minimize the connection route. In the embodiment,
The connection route is required to pass only on the contour line of the unit area, and a precondition that the connection route does not cross the area is given. In this process, first, the study direction is set to the forward direction (clockwise) CW (step S111), and the area end point f of the unit area to be connected, which is the younger one, is selected.
Let pn be a point of interest (point Q) (step S112). Further, the minimum route evaluation value d is reset to “0” (Step S113).

Then, it is confirmed whether or not the point Q coincides with the start point tpn + 1 of the other unit area (step S114). In the case of a mismatch, while including the younger part of the unit area currently under consideration, it is confirmed that the whole area does not ride on the L contour or the R contour of the younger area (there is no overlapping) (step S115). A point Q on the contour determined by the point sequence n along the examination direction is a small distance △ d
Then, information on each moving position is stored (step S116), and the minimum route evaluation value d is updated (step S117).

During this time, if "YES" is determined in the process of step S115, the contour on the opposite side on the line connecting the L point and the R point of the area having the L contour or the R contour from the position is determined. The same processing as steps S116 and S117 is performed while the Q point is slightly moved to the structure (steps S118 to S120). Then, when it reaches the contour structure on the opposite side, it continues to slightly move on the contour again in the examination direction.

In this way, step S
The determination at 114 is "YES". Then, it is determined whether the examination direction is the backward CCW (step S12).
1) If "NO", the current minimum route evaluation value d is stored as the first evaluation value d1 (step S122), and the route connecting the corresponding position information is stored as the forward connection route (step S123). ). Then, after setting the examination direction to the backward CCW, the processing from step S112 is repeated (step S124).

On the other hand, if the determination in step S121 is “YE
If "S" has been reached, the current minimum route evaluation value d is stored as the second evaluation value d2 (step S125), and the route connecting the corresponding position information is stored as the reverse connection route (step S126). . Then, the connection path corresponding to the smaller one of the first and second evaluation values d1 and d2 is stored as the minimum connection path, and the process ends (steps S127 to S127).
S129).

Note that this processing is also performed between the Ip point designated as the point to start sewing in the first input and the area 1 to obtain the shortest connection path. When the above processes are completed, as shown in FIG. 29, this time, the connection path from the Ip point to the area 1 and the start point tp of the stitch formation path of the area 1
1 are connected (step S141), and each stitch forming path up to the end point fp7 of the stitch forming path in the final area and a connecting path between the areas are connected (steps S142 and S1).
43), complete the main stitch path up to the Op point which is the end point fp7 of the stitch formation path in the final area. Next, with respect to the first input point sequence m, an edge stitching route that goes around the point m20 → m21 →... → m26 → m1 → m19 → m20 in the clockwise direction from m20 designated as the Im point is determined (step S144), An inside / outside connection path is generated to connect the point m20 (point I), which is the end point of the border seam path, and the point pn28 (point Ip), which is the start point of the main seam path (step S145). Then, a completed path including the border stitch path, the inside / outside connection path, and the main stitch path is written to the floppy disk 9 (step S146).

After all the stitch paths are obtained as the completed paths in this way, a process of dividing the completed path from the Im point to the Op point is further performed to create stitch needle drop point information. . When writing the completed path in step S146, it goes without saying that the processing may be advanced to this needle drop point information.

When the sewing method or the sewing machine is changed between the border pattern and the main pattern, the connection between the border stitch path and the main stitch path is not necessary, so that the inside / outside connection path need not be obtained. As described above, the operator can simply input the input point sequence m for specifying one shape contour, the reference direction dir,
By simply inputting the stitch interval ssp and the offset distance ost, the outer shape of the main pattern is automatically calculated, the main pattern is further divided into unit areas, and the stitch formation order between the unit areas is determined. A final single stitch path is completed. Therefore, the work of creating embroidery data for the edge-attached embroidery pattern, which could only be performed manually by a skilled person, can be greatly simplified.

As a result, even an unskilled person can convert embroidery data of a complicatedly shaped pattern with a rich taste. In addition, when creating a new embroidery pattern or improving or changing a conventional embroidery pattern, it is possible to obtain embroidery data quickly, and it is extremely important to create an embroidery pattern that matches the changing fashion every day. It is convenient.

Although the embodiment of the present invention has been described above, the present invention is not limited to this embodiment at all, and can be carried out in various modes without departing from the gist thereof. For example, in the embodiment, a dedicated embroidery data creating apparatus has been described as an example, but it may be completed as an embroidery sewing machine incorporating the embroidery data creating apparatus. In this case, the completed embroidery data need not be written on the floppy disk.

Although the input of the shape by the digitizer has been described as an example, the configuration may be such that the shape is read by an image scanner and converted into outer shape data. Further, the processing may be performed while the progress of the work is displayed on the display. On the other hand, instead of specifying these by inputting each time, a configuration is also possible in which a floppy disk in which these are input is created in advance at another location, and information is supplied to the embroidery data creating apparatus by reading the contents. Good.

In addition, it is of course possible to provide a function of enlarging or reducing the input graphic, or to perform a curve processing. Further, the zigzag shape of the stitch formation path is not limited to the embodiment,
Various countermeasures such as a saw-tooth zigzag path can be taken. Further, changing to an IC card or NC tape instead of a floppy disk has no effect on the gist of the present invention.

Further, in the embodiment, the outer shape of the main pattern is obtained from the outer shape of the border pattern. However, if the offset distance ost is input as a negative value, the first input point sequence m is changed to the outer shape of the main pattern. In this case, a sequence of points constituting the border seam path can be obtained. Also, the offset distance os
By inputting a plurality of t, the border stitch path may be applied to a pattern formed in a double, triple,. In the case of these modified examples, at the beginning of the processing of FIG. 11, a processing of selecting a point sequence constituting the innermost shape from a plurality of sets of point sequences including the first input point sequence m is added. Good to keep. In this case, it is more preferable to add a process of connecting the end point of the outer edge seam path and the start point of the inner edge seam path between the double, triple, ... edge seam paths.

[0088]

As described above in detail, according to the embroidery data creating apparatus of the present invention, once one contour shape of the embroidery pattern can be determined, the stitch path of the border pattern and the contour of the main pattern are automatically set. And embroidery data for a new embroidery pattern can be easily created even by a non-expert. As a result, even an unskilled person can quickly and easily create correct embroidery data for an edge-attached embroidery pattern, which is extremely convenient for creating an embroidery pattern that matches the trend.

Further, with the configuration as described in claim 3, it is possible to calculate the offset point group on a one-to-one basis, and it is easy to obtain consistency with other processing. Further, according to the apparatus of the fourth aspect, it is possible to easily find the main stitch path for forming the stitches of the main pattern without leaving any stitches. Suitable for.

According to the embroidery data creating apparatus of the present invention, one continuous main stitch path of the entire main pattern is decomposed into a stitch forming path and a connecting path in each divided area. It is simple because it can be determined. Further, according to the embroidery data creating device of the sixth and seventh aspects, the stitch formation order can be automatically determined.

In addition, according to the embroidery data creating apparatus of the eighth aspect, the relationship between the border stitch path and the main stitch path can be joined.

[Brief description of the drawings]

FIG. 1 is a configuration diagram illustrating a basic configuration of the present invention.

FIG. 2 is a configuration diagram illustrating another basic configuration of the present invention.

FIG. 3 is a configuration diagram illustrating another basic configuration of the present invention.

FIG. 4 is a configuration diagram illustrating another basic configuration of the present invention.

FIG. 5 is a schematic configuration diagram of an embroidery data creation device according to an embodiment.

FIG. 6 is an explanatory diagram showing input information in the embodiment.

FIG. 7 is a flowchart of a main pattern outer shape specification process executed in the embodiment.

FIG. 8 is an explanatory diagram showing a procedure of a main pattern outer shape specifying process in the embodiment.

FIG. 9 is an explanatory diagram showing an example of an erroneous input.

FIG. 10 is an explanatory diagram showing a shape of a main pattern specified in the embodiment and an initial processing result thereof.

FIG. 11 is a flowchart of a coordinate conversion process executed in the embodiment.

FIG. 12 is a flowchart of a singular point extraction process executed in the embodiment.

FIG. 13 is a flowchart of a reallocation process based on a singular point extraction result executed in the embodiment.

FIG. 14 is an explanatory diagram illustrating a state of a singular point extraction process executed in the embodiment.

FIG. 15 is an explanatory diagram of a re-allocation result executed in the embodiment.

FIG. 16 is a flowchart of a unit area specifying process executed in the embodiment.

FIG. 17 is an explanatory diagram illustrating a state of a unit area specifying process executed in the embodiment.

FIG. 18 is an explanatory diagram showing a state of a unit area specifying process executed in the embodiment.

FIG. 19 is an explanatory diagram showing a state of a unit area specifying process executed in the embodiment.

FIG. 20 is an explanatory diagram illustrating a state of a unit area specifying process executed in the embodiment.

FIG. 21 is an explanatory diagram showing a state in a unit area storage amount area in a RAM according to the embodiment.

FIG. 22 is a flowchart of a contour structure determination process executed in the embodiment.

FIG. 23 is a flowchart showing a part of an in-area stitch formation path determination process executed in the embodiment.

FIG. 24 is a flowchart illustrating the remaining part of the in-area stitch formation path determination process executed in the embodiment.

FIG. 25 is an explanatory diagram illustrating an initial processing state of the in-area stitch formation path determination processing in the embodiment.

FIG. 26 is an explanatory diagram showing an example of an in-area stitch formation path determined in the embodiment.

FIG. 27 is a flowchart illustrating a part of a connection route determination process executed in the embodiment.

FIG. 28 is a flowchart illustrating the remaining part of the connection route determination process executed in the embodiment.

FIG. 29 is a flowchart illustrating the remaining part of the completion path writing process executed in the embodiment.

FIG. 30 is an explanatory diagram showing a conventional problem.

[Explanation of symbols]

1 ... embroidery data creation device, 3 ... digitizer, 5
... Area, 7 ... Processor, 9 ... Floppy disk, 11 ... Floppy disk driver, 1
3 ... display, 15 ... CPU, 17 ...
ROM, 19 ... RAM, 21 ... I / O port,
23: design picture, 25: drawing, 27: board, 29: input pen.

──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-4-197289 (JP, A) JP-A-3-128084 (JP, A) JP-A-1-218489 (JP, A) Patent 2704409 (JP, A) B2) Patent 2739088 (JP, B2) Patent 2935760 (JP, B2) JP 8-24774 (JP, B2) JP 8-24775 (JP, B2) JP 3 67435 (JP, B2) ( 58) Fields surveyed (Int. Cl. ⁷ , DB name) F05B 19/00-21/00

Claims (8)

(57) [Claims] 1. A main pattern formed by stitches formed on a continuous folded line main stitch path having a portion along a predetermined reference direction, and an edge stitch path surrounding the outside of the main pattern. An embroidery data creation device for an embroidery pattern for creating an embroidery data for forming an embroidery pattern including an outline pattern formed by stitches formed on the embroidery pattern. Contour specifying means for specifying the contour of the main pattern or the border pattern; pattern positional relationship providing means for providing a positional relationship between the outer edge of the main pattern and the border pattern; and between a plurality of points on the given contour. Line segment information calculating means for calculating information of each line segment to be formed; and, based on the calculated line segment information and the given pattern positional relationship, a plurality of point groups on the contour are set inside or outside the contour. Point cloud offset to Offset point group calculating means to be calculated; Edge seam path determining means for connecting the offset point groups or point groups outside a plurality of point groups on the contour to determine the edge seam path; A reference direction specifying means for specifying the main stitch path from the contour of the closed area formed by connecting the point groups inside the plurality of point groups on the offset point group or the outline and the reference direction. An embroidery data creation device for an edge-attached embroidery pattern, comprising: a main stitch path determining means for determining. 2. The embroidery data creating device for an edge-attached embroidery pattern according to claim 1, wherein the offset point group calculating means calculates the offset point group based on a relationship between adjacent line segments. An embroidery data creation device for rim-mounted embroidery patterns. 3. The embroidery data creating device for an edge-attached embroidery pattern according to claim 1, wherein the offset point group calculating means is configured to determine a fixed amount of line segments based on respective directions of adjacent line segments. Calculate the offset direction of the intersection between the adjacent line segments when offsetting, based on the positional relationship between the given border pattern and the main pattern, calculate the offset amount of the intersection in the offset direction, An embroidery data creating apparatus for an edge-embroidered embroidery pattern, wherein the position of the offset point group is calculated from the offset amount and the offset direction. 4. The embroidery data creating device for an edge-embroidered embroidery pattern according to claim 1, wherein said main stitch path determining means is configured to determine an outline of the contour specified by said inner point group. A feature point extracting means for extracting a predetermined feature point from the contour line; and dividing the closed region surrounded by the inner point group into a plurality of divided regions based on the extracted feature points and the specified reference direction. Closed region dividing means,
An embroidery data creation device, wherein a main stitch path extending over the entire main pattern is determined based on the inner point group and the reference direction. 5. The embroidery data creating device for an edge-embroidered embroidery pattern according to claim 4, wherein the main stitch path includes a stitch path that fills each divided area;
The main stitch path determining means includes a connecting path determining unit that determines the connecting path according to a predetermined condition regarding a stitch forming order. An embroidery data creation device for edge-mounted embroidery patterns. 6. The embroidery data creating device for an edge-embedded embroidery pattern according to claim 4 or 5, wherein the closed area dividing unit is configured to perform a state related to the unevenness of the main pattern based on a continuous state of the point group. To determine a predetermined intersection of a straight line passing through the concave point parallel to the reference direction and the contour of the main pattern,
The end point of the main seam path is considered as a starting point, and the intersection point, the convex point, and the concave point are successively arranged on the contour line of the main pattern,
An embroidery data creating apparatus for an edge-embroidered embroidery pattern, wherein the divided area is determined by extracting a portion having no other intersection, convex point, or concave point in between. 7. The embroidery data creating apparatus for an edge-embroidered embroidery pattern according to claim 6, wherein the closed area dividing means further determines one divided area and then determines the next divided area. An embroidery data creating apparatus for an edge-attached embroidery pattern, ignoring intersection points, convex points, and concave points in the determined divided area. 8. The embroidery data creating device for an edge-embroidered embroidery pattern according to claim 1, further comprising: an end point or a start point of a border seam path determined by the border seam path determination means. An embroidery data creating device for an edge-mounted embroidery pattern, further comprising stitch path connecting means for connecting the start point or the end point of the main stitch path determined by the main stitch path determining means.