JP3048287B2 - Manufacturing equipment for magnetic recording media - Google Patents

Manufacturing equipment for magnetic recording media

Info

Publication number
JP3048287B2
JP3048287B2 JP5061585A JP6158593A JP3048287B2 JP 3048287 B2 JP3048287 B2 JP 3048287B2 JP 5061585 A JP5061585 A JP 5061585A JP 6158593 A JP6158593 A JP 6158593A JP 3048287 B2 JP3048287 B2 JP 3048287B2
Authority
JP
Japan
Prior art keywords
shielding plate
magnetic recording
recording medium
film substrate
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5061585A
Other languages
Japanese (ja)
Other versions
JPH06274877A (en
Inventor
清和 東間
龍二 杉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP5061585A priority Critical patent/JP3048287B2/en
Priority to DE69419054T priority patent/DE69419054T2/en
Priority to EP94104380A priority patent/EP0617414B1/en
Priority to KR1019940005589A priority patent/KR100223454B1/en
Publication of JPH06274877A publication Critical patent/JPH06274877A/en
Priority to US08/367,998 priority patent/US5472506A/en
Priority to US08/367,996 priority patent/US5458914A/en
Application granted granted Critical
Publication of JP3048287B2 publication Critical patent/JP3048287B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、高密度記録再生特性に
優れた磁気記録媒体を製造する磁気記録媒体の製造装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium manufacturing apparatus for manufacturing a magnetic recording medium having excellent high-density recording / reproducing characteristics.

【0002】[0002]

【従来の技術】現在、磁気記録再生装置は小型化、高密
度化の傾向にあり、従来の塗布型媒体の高密度化の限界
を越えるものとして金属薄膜型媒体が注目されている。
これに関しては、Co−Ni−Oから成る金属薄膜型媒
体がVTR用の磁気テープとして実用化されている。薄
膜型磁性層の製造方法としては斜方蒸着法が知られてい
る。
2. Description of the Related Art At present, magnetic recording / reproducing apparatuses tend to be miniaturized and densified, and metal thin-film type media have been attracting attention as exceeding the limit of high density of conventional coating type media.
In this regard, a metal thin film type medium made of Co—Ni—O has been put to practical use as a magnetic tape for a VTR. As a method for manufacturing a thin film type magnetic layer, an oblique deposition method is known.

【0003】以下、図面を参照しながら従来の斜方蒸着
法の一例について説明する。図5に従来の斜方蒸着を行
なう連続真空蒸着装置の蒸着部の概略図を示す。図5に
おいて、10は高分子フィルム基板、11は円筒状キャン、
12は初期入射角を規定する遮蔽板、13は終期入射角を規
定する遮蔽板、14はガスを導入するノズル、15は蒸発
源、16はフリーローラである。蒸発源15からの蒸発原子
は遮蔽板12及び遮蔽板13の間の開口部を通過して、円筒
状キャンに沿って走行しつつある高分子フィルム基板10
上に堆積される。入射角は、蒸発原子と基板の法線との
成す角度で定義され、遮蔽板12によって初期入射角φi
が、また遮蔽板13によって終期入射角φfが制御され規
定される。磁性層の磁気特性は、入射角の範囲やガスの
導入により制御される。
An example of a conventional oblique deposition method will be described below with reference to the drawings. FIG. 5 shows a schematic view of a vapor deposition section of a conventional continuous vacuum vapor deposition apparatus for performing oblique vapor deposition. In FIG. 5, 10 is a polymer film substrate, 11 is a cylindrical can,
Reference numeral 12 denotes a shielding plate that defines an initial incident angle, 13 denotes a shielding plate that defines a final incident angle, 14 denotes a nozzle for introducing a gas, 15 denotes an evaporation source, and 16 denotes a free roller. Evaporated atoms from the evaporation source 15 pass through the opening between the shielding plate 12 and the shielding plate 13 and travel along the cylindrical can.
Deposited on top. The incident angle is defined by the angle formed between the evaporated atoms and the normal to the substrate.
However, the final incident angle φf is controlled and defined by the shielding plate 13. The magnetic properties of the magnetic layer are controlled by the range of the incident angle and the introduction of gas.

【0004】[0004]

【発明が解決しようとする課題】しかし、上記のような
従来の装置では、蒸発レートを高くしたり、長時間蒸着
を行なうと、初期入射側の遮蔽板12においては円筒状キ
ャン11との隙間に結晶粒が形成され、高分子フィルム基
板10に傷が入ることがあった。そのため、遮蔽板12を円
筒状キャン11から離して、傷が入らないように対策を取
っているが、保磁力や角形比が低くなり、磁気記録媒体
として充分な特性が得られないという問題があった。
However, in the conventional apparatus as described above, if the evaporation rate is increased or deposition is performed for a long time, the gap between the cylindrical can 11 and the shielding plate 12 on the initial incidence side is increased. In some cases, crystal grains were formed, and the polymer film substrate 10 was sometimes damaged. For this reason, the shielding plate 12 is separated from the cylindrical can 11 to prevent scratches.However, the coercive force and the squareness ratio are reduced, and sufficient characteristics as a magnetic recording medium cannot be obtained. there were.

【0005】本発明は前記問題を解決し、充分な磁気特
性を確保しながら、大量生産に耐え得る磁気記録媒体の
製造装置を提供することを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to solve the above problems and to provide an apparatus for manufacturing a magnetic recording medium capable of withstanding mass production while securing sufficient magnetic characteristics.

【0006】[0006]

【課題を解決するための手段】本発明は上記目的達成の
ために、第1発明として、円筒状キャンの周面に沿って
走行する高分子フィルム基板上に、連続真空蒸着装置を
用いて斜方蒸着法により磁性層を設ける磁気記録媒体の
製造装置において、前記高分子フィルム基板に対する蒸
発原子の初期入射角を規定する第1遮蔽板と、前記高分
子フィルム基板の走行上流側に位置し、前記第1遮蔽板
により規定される初期入射角を変更することなく前記円
筒状キャンの周面の初期入射部に近接させた第2遮蔽板
とを配設した磁気記録媒体の製造装置とした。
In order to achieve the above object, the present invention provides, as a first invention, an oblique method using a continuous vacuum vapor deposition apparatus on a polymer film substrate running along the peripheral surface of a cylindrical can. In a manufacturing apparatus of a magnetic recording medium provided with a magnetic layer by a vapor deposition method, a first shielding plate that defines an initial incident angle of evaporated atoms with respect to the polymer film substrate, and is located on a traveling upstream side of the polymer film substrate, An apparatus for manufacturing a magnetic recording medium, comprising: a second shielding plate disposed close to an initial incidence portion on a peripheral surface of the cylindrical can without changing an initial angle of incidence defined by the first shielding plate.

【0007】また、第2発明として、第2遮蔽板を複数
配設した磁気記録媒体の製造装置とした。さらに、第3
発明として、第1遮蔽板と蒸発源との間に位置し、前記
第1遮蔽板により規定される初期入射角を変更すること
なく前記第1遮蔽板への蒸発原子の付着を抑制する第3
遮蔽板を配設した磁気記録媒体の製造装置とした。
According to a second aspect of the present invention, there is provided an apparatus for manufacturing a magnetic recording medium having a plurality of second shielding plates. In addition, the third
As a third aspect of the present invention, a third element is located between the first shielding plate and the evaporation source, and suppresses the attachment of evaporated atoms to the first shielding plate without changing the initial angle of incidence defined by the first shielding plate.
A magnetic recording medium manufacturing apparatus provided with a shielding plate.

【0008】[0008]

【作用】第1発明では、第1遮蔽板に規定されている蒸
発原子の初期入射角を変更することなく、初期入射部に
近接して設けた第2遮蔽板により、蒸発原子のうち散乱
された原子が高分子フィルム基板へ付着するのを抑制す
ることができる。また、第2発明では、複数の第2遮蔽
板を設けることにより、高分子フィルム基板への散乱蒸
発原子の付着を充分に抑制できる。
According to the first aspect of the present invention, the evaporated atoms are scattered by the second shield plate provided close to the initial incidence portion without changing the initial incident angle of the evaporated atoms defined in the first shield plate. Atoms can be suppressed from adhering to the polymer film substrate. Further, in the second invention, by providing the plurality of second shielding plates, the adhesion of the scattered evaporated atoms to the polymer film substrate can be sufficiently suppressed.

【0009】さらに、第3発明では、第3遮蔽板を第1
遮蔽板と蒸発源との間に設けたので、第1遮蔽板への蒸
発原子の付着を防止すると共に散乱蒸発原子が高分子フ
ィルム基板へ付着するのを抑制できる。
Further, in the third invention, the third shielding plate is provided with the first shielding plate.
Since it is provided between the shielding plate and the evaporation source, it is possible to prevent the evaporation atoms from attaching to the first shielding plate and to suppress the scattering evaporation atoms from attaching to the polymer film substrate.

【0010】[0010]

【実施例】以下、図面に示した実施例に基づいて説明す
る。図1は第1発明の磁気記録媒体の製造装置の要部を
示すもので、斜方蒸着法によって磁性層を高分子フィル
ム基板上に形成する。図1において、1は高分子フィル
ム基板、2は円筒状キャン、3は蒸発源で、蒸発原子を
発する。4は第1遮蔽板で、蒸発源3から発した蒸発原
子の初期入射角を規定して高分子フィルム基板1上への
蒸発原子の付着を制御する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. FIG. 1 shows a main part of an apparatus for manufacturing a magnetic recording medium according to the first invention, in which a magnetic layer is formed on a polymer film substrate by oblique evaporation. In FIG. 1, 1 is a polymer film substrate, 2 is a cylindrical can, and 3 is an evaporation source which emits evaporated atoms. Reference numeral 4 denotes a first shielding plate that regulates the initial incident angle of the evaporated atoms emitted from the evaporation source 3 and controls the attachment of the evaporated atoms onto the polymer film substrate 1.

【0011】5は第2遮蔽板で、第1遮蔽板4に対し前
記高分子フィルム基板1の走行上流側に位置し、第1遮
蔽板4により規定される初期入射角を変更することなく
円筒状キャン2の周面の初期入射部に近接した位置に設
けた。6は遮蔽板で、蒸発源3から発した蒸発原子の終
期入射角を規定する。7はノズルで、ガスを導入する。
8はフリーローラで、高分子フィルム基板1を円筒状キ
ャン2に案内する役割をもつ。
Reference numeral 5 denotes a second shielding plate, which is located on the upstream side of the polymer film substrate 1 with respect to the first shielding plate 4 and has a cylindrical shape without changing the initial incident angle defined by the first shielding plate 4. It was provided at a position close to the initial incidence portion on the peripheral surface of the can 2. Reference numeral 6 denotes a shielding plate that defines the final incident angle of the evaporated atoms emitted from the evaporation source 3. Reference numeral 7 denotes a nozzle for introducing gas.
Reference numeral 8 denotes a free roller, which has a role of guiding the polymer film substrate 1 to the cylindrical can 2.

【0012】この第1遮蔽板4を用いて、従来技術の問
題点について検討した。すなわち、遮蔽板と円筒状キャ
ンとの距離と膜の磁気特性との関連を調べた。第1遮蔽
板4及び第2遮蔽板5の役割について図2に示した初期
入射部の拡大図で説明する。第1遮蔽板4と円筒状キャ
ン2との距離を図2に示すようにdで定義した。初期入
射角φiが一定となるように第1遮蔽板4を平行移動さ
せて距離dを変化させた。保磁力および角形比の距離d
に対する依存性の一例を図3に示す。
Using this first shielding plate 4, the problems of the prior art were examined. That is, the relationship between the distance between the shielding plate and the cylindrical can and the magnetic properties of the film was examined. The role of the first shielding plate 4 and the second shielding plate 5 will be described with reference to an enlarged view of the initial incidence part shown in FIG. The distance between the first shielding plate 4 and the cylindrical can 2 was defined as d as shown in FIG. The distance d was changed by moving the first shielding plate 4 in parallel so that the initial incident angle φi was constant. Coercivity and squareness ratio distance d
FIG. 3 shows an example of the dependency on.

【0013】図3において、○印は保磁力、□印は角形
比をあらわす。初期入射角φiを70゜、終期入射角φ
fを50゜として作製したCo−O膜についての例であ
る。図3からわかるように、距離dが大きいほど保磁力
および角形比が低下する。この原因として、蒸発原子の
散乱が考えられる。すなわち、第1遮蔽板4によって規
制された蒸発原子のうち散乱されている原子は、初期入
射角φiが定義される円筒状キャン2の位置よりも更に
高入射角側に侵入し、高分子フィルム基板1に付着する
ものと考えられる。散乱で高分子フィルム基板1に付着
する原子は、入射角によって制御しようとする結晶の成
長を阻害するものであり、磁気異方性分散の増大につな
がるものと考えられるからである。
In FIG. 3, ○ represents coercive force, and □ represents squareness ratio. Initial incidence angle φi is 70 °, final incidence angle φ
This is an example of a Co—O film manufactured by setting f to 50 °. As can be seen from FIG. 3, the coercive force and the squareness ratio decrease as the distance d increases. This may be due to scattering of evaporated atoms. That is, the scattered atoms out of the evaporated atoms regulated by the first shielding plate 4 enter the higher incident angle side than the position of the cylindrical can 2 where the initial incident angle φi is defined, and the polymer film It is considered that it adheres to the substrate 1. This is because atoms adhering to the polymer film substrate 1 due to scattering hinder the growth of crystals to be controlled by the incident angle, and are considered to lead to an increase in magnetic anisotropic dispersion.

【0014】次に、第2遮蔽板5の役割について説明す
る。第2遮蔽板5は、上述の散乱原子の高分子フィルム
基板1への付着を抑制するものである。図4は初期入射
部の拡大図である。図4において、第2遮蔽板5は、初
期入射角φiが定義される位置よりも基板走行上流側に
配設されており、かつ円筒状キャン2に近接している。
この様な位置に第2遮蔽板5を固定して、保磁力および
角形比の距離dに対する依存性を図3と同様に調べる
と、保磁力および角形比はほぼ一定となった。そして、
その値は、図3において確認された最小距離で得られた
値にほぼ等しくなった。この結果は、散乱原子の磁気特
性への影響を裏付けるものである。しかし、距離dが大
きくなると、第2遮蔽板5に付着する原子が急激に増加
し、高分子フィルム基板1に傷をつける結果となる。そ
こで、第2発明として、図4における第1遮蔽板4と第
2遮蔽板5との間に更に遮蔽板を配設することとした。
ここで増配設される遮蔽板も、散乱蒸発原子流を遮蔽す
ると言う意味で、第2遮蔽板に分類される。
Next, the role of the second shielding plate 5 will be described. The second shielding plate 5 suppresses the adhesion of the scattered atoms to the polymer film substrate 1 described above. FIG. 4 is an enlarged view of the initial incidence part. In FIG. 4, the second shield plate 5 is disposed on the upstream side of the substrate traveling from the position where the initial incident angle φi is defined, and is close to the cylindrical can 2.
When the dependence of the coercive force and the squareness ratio on the distance d was examined in the same manner as in FIG. 3 with the second shielding plate 5 fixed at such a position, the coercive force and the squareness ratio were almost constant. And
That value was almost equal to the value obtained at the minimum distance identified in FIG. This result supports the effect of the scattered atoms on the magnetic properties. However, when the distance d increases, the number of atoms adhering to the second shielding plate 5 increases rapidly, resulting in damage to the polymer film substrate 1. Therefore, as a second invention, a shielding plate is further provided between the first shielding plate 4 and the second shielding plate 5 in FIG.
The additional shield plate is also classified as a second shield plate in the sense that it shields the scattered vapor flow.

【0015】次に、第3発明を説明する。図1中の9は
第3遮蔽板で、第1遮蔽板4と蒸発源3との間に位置
し、第1遮蔽板4により規定される初期入射角を変更す
ることなく第1遮蔽板4への蒸発原子の付着を抑制する
役割をもつ。第3遮蔽板9は、蒸発原子が第1遮蔽板4
に付着するのを抑制するものである。第3遮蔽板9は、
蒸発源に最も近いので、輻射熱の影響が大きくかつ堆積
量も多量となる。従って、強固な部材で構成し、水冷等
の対策が必要である。さらに、蒸着中に、堆積量の増加
により初期入射角が変化しないように、後退機構を付加
することが望ましい。
Next, the third invention will be described. In FIG. 1, reference numeral 9 denotes a third shielding plate, which is located between the first shielding plate 4 and the evaporation source 3 and does not change the initial incident angle defined by the first shielding plate 4. It has the role of suppressing the attachment of evaporated atoms to the surface. The third shielding plate 9 is configured such that the evaporated atoms are
It is intended to suppress the adhesion to the surface. The third shielding plate 9
Since it is closest to the evaporation source, the effect of radiant heat is large and the amount of deposition is large. Therefore, it is necessary to provide a strong member and take measures such as water cooling. Further, it is desirable to add a retreat mechanism so that the initial incident angle does not change due to an increase in the deposition amount during the vapor deposition.

【0016】さらに、第1発明、第2発明及び第3発明
において述べた3種の遮蔽板を併用することで優れた磁
気特性を有する磁気記録媒体を量産することが可能とな
る。図1に示した本発明の一実施例としての磁気記録媒
体の製造装置を用いて、入射角の範囲を70゜〜50゜
とし、Co−O膜を磁性層として成膜した。円筒状キャ
ン2の直径は1mであり、蒸発源3にCoを仕込み70
kWの電子ビームによって溶解した。ガス導入ノズル7
から毎分1.2リットルの酸素を導入した。高分子フィ
ルム基板1の走行速度は60m/分である。第1遮蔽板
4を、図2における距離dが10mmとなる位置に設
け、第2遮蔽板5を2枚用いた。1枚は図5における第
2遮蔽板5の位置で円筒状キャン2との隙間は1.5m
mとした。もう1枚の第2遮蔽板は、図2における距離
dが4mmとした。第3遮蔽板9は、第1遮蔽板4の下
方約2cmに配置した。この状態で約3時間の蒸着を行
なった。その結果、長尺にわたってほぼ均一な磁気特性
の膜が傷無しに得られた。
Further, by using the three types of shielding plates described in the first, second and third inventions in combination, it becomes possible to mass-produce a magnetic recording medium having excellent magnetic properties. Using the apparatus for manufacturing a magnetic recording medium according to one embodiment of the present invention shown in FIG. 1, the Co-O film was formed as a magnetic layer with an incident angle range of 70 ° to 50 °. The diameter of the cylindrical can 2 is 1 m.
Melted by kW electron beam. Gas introduction nozzle 7
From which 1.2 liters of oxygen per minute were introduced. The running speed of the polymer film substrate 1 is 60 m / min. The first shielding plate 4 was provided at a position where the distance d in FIG. 2 was 10 mm, and two second shielding plates 5 were used. One is at the position of the second shielding plate 5 in FIG. 5 and the gap with the cylindrical can 2 is 1.5 m.
m. The other second shield plate had a distance d in FIG. 2 of 4 mm. The third shielding plate 9 was arranged about 2 cm below the first shielding plate 4. In this state, vapor deposition was performed for about 3 hours. As a result, a film having substantially uniform magnetic properties over a long length was obtained without damage.

【0017】上記においてはCo−O膜について述べた
が、その他の磁性層についても斜方蒸着を行なう場合に
は、本発明が有効である。また、初期入射角が大きいほ
ど本発明が有効に働く。
Although the Co-O film has been described above, the present invention is effective when oblique deposition is performed on other magnetic layers. The present invention works more effectively as the initial angle of incidence is larger.

【0018】[0018]

【発明の効果】本発明によれば、上記のように斜方蒸着
法において、初期入射角が確実に保持され、蒸発原子の
散乱を防止して、高密度記録再生に適した優れた磁気特
性を有する磁性層が得られ長尺の磁気記録テープ媒体の
量産を容易にすることが可能となった。
According to the present invention, as described above, in the oblique evaporation method, the initial incident angle is securely maintained, the scattering of the evaporated atoms is prevented, and the excellent magnetic characteristics suitable for high-density recording / reproducing. Thus, it was possible to easily mass-produce a long magnetic recording tape medium.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例として示した磁気記録媒体の製
造装置の要部説明図
FIG. 1 is an explanatory view of a main part of an apparatus for manufacturing a magnetic recording medium shown as an embodiment of the present invention.

【図2】本発明の初期入射部分の拡大説明図FIG. 2 is an enlarged explanatory view of an initial incident portion according to the present invention.

【図3】距離dと保磁力および角形比との関係を示す図FIG. 3 is a diagram showing a relationship between a distance d and a coercive force and a squareness ratio.

【図4】本発明の磁気記録媒体の製造装置の初期入射部
分の拡大図
FIG. 4 is an enlarged view of an initial incident portion of the magnetic recording medium manufacturing apparatus of the present invention.

【図5】従来の磁気記録媒体の製造装置の一例を示す要
部説明図
FIG. 5 is an explanatory view of a main part showing an example of a conventional magnetic recording medium manufacturing apparatus.

【符号の説明】[Explanation of symbols]

1 高分子フィルム基板 2 円筒状キャン 3 蒸発源 4 第1遮蔽板 5 第2遮蔽板 6 遮蔽板 9 第3遮蔽板 REFERENCE SIGNS LIST 1 polymer film substrate 2 cylindrical can 3 evaporation source 4 first shielding plate 5 second shielding plate 6 shielding plate 9 third shielding plate

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) G11B 5/85 C23C 14/24 Continuation of the front page (58) Field surveyed (Int.Cl. 7 , DB name) G11B 5/85 C23C 14/24

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 円筒状キャンの周面に沿って走行する高
分子フィルム基板上に、連続真空蒸着装置を用いて斜方
蒸着法により磁性層を設ける磁気記録媒体の製造装置に
おいて、前記高分子フィルム基板に対する蒸発原子の初
期入射角を規定する第1遮蔽板と、前記高分子フィルム
基板の走行上流側に位置し、前記第1遮蔽板により規定
される初期入射角を変更することなく前記円筒状キャン
の周面の初期入射部に近接させた第2遮蔽板とを配設し
たことを特徴とする磁気記録媒体の製造装置。
An apparatus for manufacturing a magnetic recording medium, wherein a magnetic layer is provided on a polymer film substrate running along the peripheral surface of a cylindrical can by oblique evaporation using a continuous vacuum evaporation apparatus. A first shielding plate for defining an initial incident angle of vaporized atoms with respect to a film substrate; and a cylindrical plate positioned upstream of the polymer film substrate in a running direction, without changing an initial incident angle defined by the first shielding plate. An apparatus for manufacturing a magnetic recording medium, comprising: a second shielding plate disposed near an initial incidence portion on a peripheral surface of a can.
【請求項2】 第2遮蔽板を複数配設したことを特徴と
する請求項1記載の磁気記録媒体の製造装置。
2. The apparatus for manufacturing a magnetic recording medium according to claim 1, wherein a plurality of second shielding plates are provided.
【請求項3】 第1遮蔽板と蒸発源との間に位置し、前
記第1遮蔽板により規定される初期入射角を変更するこ
となく前記第1遮蔽板への蒸発原子の付着を抑制する第
3遮蔽板を配設したことを特徴とする磁気記録媒体の製
造装置。
3. The method according to claim 1, wherein the first shielding plate and the evaporation source are located between the first shielding plate and the first shielding plate. An apparatus for manufacturing a magnetic recording medium, comprising a third shielding plate.
JP5061585A 1993-03-22 1993-03-22 Manufacturing equipment for magnetic recording media Expired - Fee Related JP3048287B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP5061585A JP3048287B2 (en) 1993-03-22 1993-03-22 Manufacturing equipment for magnetic recording media
DE69419054T DE69419054T2 (en) 1993-03-22 1994-03-19 Method and device for producing a magnetic recording medium
EP94104380A EP0617414B1 (en) 1993-03-22 1994-03-19 Method and apparatus for producing magnetic recording medium
KR1019940005589A KR100223454B1 (en) 1993-03-22 1994-03-21 Method and apparatus for producing magnetic recording medium
US08/367,998 US5472506A (en) 1993-03-22 1995-01-03 Method and apparatus for producing magnetic recording medium
US08/367,996 US5458914A (en) 1993-03-22 1995-01-03 Method for producing magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5061585A JP3048287B2 (en) 1993-03-22 1993-03-22 Manufacturing equipment for magnetic recording media

Publications (2)

Publication Number Publication Date
JPH06274877A JPH06274877A (en) 1994-09-30
JP3048287B2 true JP3048287B2 (en) 2000-06-05

Family

ID=13175373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5061585A Expired - Fee Related JP3048287B2 (en) 1993-03-22 1993-03-22 Manufacturing equipment for magnetic recording media

Country Status (1)

Country Link
JP (1) JP3048287B2 (en)

Also Published As

Publication number Publication date
JPH06274877A (en) 1994-09-30

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