JP3037974B2 - Polyamide composition having excellent nitrogen oxide resistance - Google Patents

Polyamide composition having excellent nitrogen oxide resistance

Info

Publication number
JP3037974B2
JP3037974B2 JP2187902A JP18790290A JP3037974B2 JP 3037974 B2 JP3037974 B2 JP 3037974B2 JP 2187902 A JP2187902 A JP 2187902A JP 18790290 A JP18790290 A JP 18790290A JP 3037974 B2 JP3037974 B2 JP 3037974B2
Authority
JP
Japan
Prior art keywords
group
salt
sulfonic acid
substituted
acid group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2187902A
Other languages
Japanese (ja)
Other versions
JPH0476054A (en
Inventor
靖 古田
善貞 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Works Co Ltd
Original Assignee
Nippon Chemical Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Works Co Ltd filed Critical Nippon Chemical Works Co Ltd
Priority to JP2187902A priority Critical patent/JP3037974B2/en
Publication of JPH0476054A publication Critical patent/JPH0476054A/en
Application granted granted Critical
Publication of JP3037974B2 publication Critical patent/JP3037974B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は繊維や樹脂として汎用されている合成ポリア
ミドに高い窒素酸化物耐性(NOx耐性)を付与した合成
ポリアミド白色組成物に関する。
Description: TECHNICAL FIELD The present invention relates to a synthetic polyamide white composition obtained by imparting high nitrogen oxide resistance (NOx resistance) to a synthetic polyamide widely used as a fiber or a resin.

〔従来技術〕(Prior art)

一般に合成高分子、特に合成ポリアミド繊維ないし樹
脂は黄褐色系の不純物を基質的に含有するために可視短
波長領域(紫青色)の吸収が大きく、よって紫青色の反
射が不足し、素地は黄ばんで見える。より白く見せるた
めに不足した紫青色の補給手法の一つとして紫青色の染
料で青味付け(いわゆるブルーイング)を行なう方法が
あるが、これは一見白いように見えるが実際には明度の
低下した(反射率の減少した)青白味を見ているにすぎ
ない。
In general, synthetic polymers, particularly synthetic polyamide fibers or resins, contain a yellow-brown impurity as a substrate and therefore have a large absorption in the visible short-wavelength region (purple-blue), and therefore have insufficient violet-blue reflection. Visible in One of the ways to replenish the purple-blue color that was lacking to make it look whiter is to use a blue-blue dye to add a blue tint (so-called bluing). This appears to be white at first glance, but the brightness has actually decreased. You're just looking at a bluish tint (with reduced reflectivity).

そこで純白の製品を得るために、不足した可視短波長
領域を補充するための別の手法として蛍光増白剤の使用
が不可欠である。蛍光増白剤は目に見えない紫外領域の
光を吸収し、そのエネルギーを長波長シフトして可視短
波長領域に蛍光放射するものであり、本来の反射率に蛍
光反射が加算されより白く見えるものである。
Therefore, in order to obtain a pure white product, it is essential to use a fluorescent whitening agent as another method for replenishing the insufficient visible short wavelength region. The fluorescent brightener absorbs invisible ultraviolet light, shifts its energy to longer wavelengths and emits fluorescent light in the visible short wavelength region. Things.

従来使用されているポリアミド用蛍光増白剤としては
ビス−トリアジニルアミノ−スチルベン系、ビス−トリ
アゾリル−スチルベン系およびビス−スチリル−ジフェ
ニル系のものが使用されている。
Bis-triazinylamino-stilbene-based, bis-triazolyl-stilbene-based and bis-styryl-diphenyl-based fluorescent whitening agents have been used in the past.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

従来市販されている合成ポリアミド組成物に適用し得
る蛍光増白剤はすべて、窒素酸化物による合成ポリアミ
ドの劣化、変色を抑制ないし防止する作用、すなわち窒
素酸化物耐性(いわゆるNOx耐性)が著しく低く、NOxの
影響により、単に変質や白度の消失だけでなく汚い着色
すなわち黄変汚染の原因となっている。
All of the optical brighteners that can be applied to the synthetic polyamide compositions that have been conventionally commercially available have the effect of suppressing or preventing the deterioration and discoloration of the synthetic polyamide due to nitrogen oxides, that is, the nitrogen oxide resistance (so-called NOx resistance) is extremely low. In addition, the influence of NOx causes not only deterioration and loss of whiteness but also dirty coloring, that is, yellowing contamination.

自動車および工場等から主として排出されるNOxにつ
いては、法律で排出基準が設けられているものの、全国
的にますます増加の一途をたどり続け、大きな社会問題
にまで発展している。
Regarding NOx mainly emitted from automobiles and factories, etc., although emission standards are set by law, it continues to increase nationwide, and has developed into a major social problem.

ところで、繊維や成形品として汎用されている合成ポ
リアミドはNOxによる劣化を受けやすいため、他の特性
面で優れた諸性質を有するにもかかわらず、屋外やNOx
にさらされる機会の多い分野での合成ポリアミド、特に
その白色製品組成物の使用は極めて制限を受けていた。
By the way, synthetic polyamides, which are widely used as fibers and molded products, are susceptible to deterioration by NOx.
The use of synthetic polyamides, particularly their white product compositions, in areas where they are frequently exposed to extremes has been extremely limited.

合成ポリアミドのNOx耐性が改善されれば、その用途
は飛躍的に拡大するものとして、NOxに対して優れた耐
性を有する合成ポリアミド白色組成物の出現が業界より
強く要望されていた。
If the synthetic polyamide has improved NOx resistance, its use will be greatly expanded, and there has been a strong demand from the industry for a synthetic polyamide white composition having excellent NOx resistance.

〔問題を解決するための手段〕[Means for solving the problem]

本発明者らはこの問題を解決するため鋭意研究を重ね
た結果、一般式 (式中、R1は水素原子、炭素数1〜4のアルキル基、ハ
ロゲン原子またはスルホン酸基もしくはその塩を示し、
R2、R3は同一または異なって、水素原子、ハロゲン原子
またはスルホン酸基もしくはその塩を示し、Xはスルホ
ン酸基もしくはその塩、アルキルスルホニウム塩、アリ
ールスルホニル基、カルボキシル基、アルコキシカルボ
ニル基、アリーロキシカルボニル基、シアノ基 (ここでYはスルホン酸基またはその塩を示す)を示
す)で表わされる2−(置換スチリル)−メチル基置換
ベンゾオキサゾール誘導体を合成ポリアミドに配合し
て、合成ポリアミドの可視短波長領域へ蛍光放射補強を
行なうときは、極めて高いNOx耐性を有する白色組成物
が得られることを見いだした。ここで、上記式中におい
て、スルホン酸基の塩としては、ナトリウム、カリウム
などのアルカリ金属塩、アミン塩、第四級アンモニウム
塩などを挙げることができる。
The present inventors have conducted intensive studies to solve this problem, and as a result, the general formula (Wherein, R 1 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a halogen atom or a sulfonic acid group or a salt thereof,
R 2 and R 3 are the same or different and each represent a hydrogen atom, a halogen atom or a sulfonic acid group or a salt thereof, and X represents a sulfonic acid group or a salt thereof, an alkylsulfonium salt, an arylsulfonyl group, a carboxyl group, an alkoxycarbonyl group, Aryloxycarbonyl group, cyano group (Where Y represents a sulfonic acid group or a salt thereof), a 2- (substituted styryl) -methyl group-substituted benzoxazole derivative represented by the following formula is added to the synthetic polyamide, and fluorescence is emitted to the visible short-wavelength region of the synthetic polyamide. When performing radiant reinforcement, it has been found that a white composition with very high NOx resistance is obtained. Here, in the above formula, examples of the salt of the sulfonic acid group include alkali metal salts such as sodium and potassium, amine salts, and quaternary ammonium salts.

本発明にかかる前記一般式で表わされる2−(置換ス
チリル)−メチル基置換ベンゾオキサゾール誘導体の化
学構造の特徴は、可視短波長領域への蛍光放射補強のた
めの発色団としてベンゾオキサゾリル−スチレン骨格を
用い、そしてこの発色団を窒素酸化物の攻撃から守るた
めにベンゾオキサゾール部のベンゼン核に置換基として
メチル基を配したもので、このメチル基が発色団保護の
重要な役割を果たすことにある。
The chemical structure of the 2- (substituted styryl) -methyl group-substituted benzoxazole derivative represented by the above general formula according to the present invention is characterized by the fact that benzoxazolyl- is used as a chromophore for enhancing the fluorescence emission to the visible short wavelength region. Using a styrene skeleton and a methyl group as a substituent on the benzene nucleus of the benzoxazole moiety to protect this chromophore from nitrogen oxide attack, this methyl group plays an important role in protecting the chromophore It is in.

このメチル基による発色団のNOxからの保護作用は前
記ベンゾオキサゾール−スチレン骨格にのみ卓効を有
し、他の構造ではほとんど保護効果が発現しない特異な
現象である。
The protective action of the chromophore from NOx by the methyl group is a unique phenomenon that has a prominent effect only on the benzoxazole-styrene skeleton and hardly exhibits a protective effect in other structures.

たとえば、一般にポリアミド用として市販され多用さ
れているスチルベン骨格やエチレン基等を発色団とした
ものは、たとえメチル基を配してもNOx耐性にはほとん
ど効果がない。
For example, a chromophore using a stilbene skeleton or an ethylene group, which is generally used and widely used for polyamide, has almost no effect on NOx resistance even if a methyl group is provided.

従って、ベンゾオキサゾリル−スチレン骨格とベンゾ
オキサゾール部のベンゼン核に配したメチル基のみに起
こる相互作用によって優れたNOx耐性を発揮するものと
考えられ、この二つの条件が満たされて始めて得られる
特性と言うことができる。
Therefore, it is considered that the interaction between the benzoxazolyl-styrene skeleton and the methyl group located only in the benzene nucleus of the benzoxazole moiety exerts excellent NOx resistance, and is obtained only when these two conditions are satisfied. It can be called a characteristic.

本発明にかかる前記一般式で表わされる2−(置換ス
チリル)−メチル基置換ベンゾオキサゾール誘導体は相
当するp−置換桂皮酸類とアミノ基と水酸基とがo−位
の関係にある相当するアミノクレゾール類とを一般公知
の方法で脱水縮合することによって容易に製造すること
ができ、また、スルホン酸基置換ベンゾオキサゾール誘
導体は相当するベンゾオキサゾール誘導体を発煙硫酸と
反応せしめる一般公知のスルホン化法によるか、あるい
はスルホン酸基置換の中間体を用いることによりこれま
た簡単に製造することができる。そしてこれら2−(置
換スチリル)−メチル基置換ベンゾオキサゾール誘導体
については特公昭40−6100号、同40−26870号、同42−5
259号および特開昭62−25174号等多くの特許公報に記載
されており公知であるが、1例についてその製法を以下
に示す。
The 2- (substituted styryl) -methyl-substituted benzoxazole derivatives represented by the above general formula according to the present invention are the corresponding p-substituted cinnamic acids and the corresponding aminocresols in which the amino group and the hydroxyl group are in the o-position. And a sulfonic acid group-substituted benzoxazole derivative can be easily produced by dehydration-condensation by a generally known method, and a sulfonic acid group-substituted benzoxazole derivative can be produced by a generally known sulfonation method of reacting the corresponding benzoxazole derivative with fuming sulfuric acid, Alternatively, it can be easily produced by using an intermediate substituted with a sulfonic acid group. These 2- (substituted styryl) -methyl group-substituted benzoxazole derivatives are described in JP-B-40-6100, JP-B-40-26870, and JP-B-40-5870.
It is described in many patent publications such as Japanese Patent No. 259 and Japanese Patent Application Laid-Open No. 62-25174, and is well known.

例えば、2,5−ジクロロ−4−メチルスルホニル桂皮
酸29.5gとクレサミン12.9gとをほう酸4g、エチレングリ
コール15gと共に窒素気流中190〜200℃で2.5時間縮合反
応を行ない、これをジメチルホルムアミド(DMF)より
再結晶法にて精製して得た2−(2,5−ジクロロ−4−
メチルスルホニル−スチリル)−5−メチル−ベンゾオ
キサゾール26.8gを20%発煙硫酸100g中に加え45℃で撹
拌し、反応の終点はTLCにて追跡し、反応は1時間で完
結する。反応物を食塩を含有した氷水に排出し、過、
食塩水にて洗浄、乾燥し、13.2gの食塩を含有した2−
(2,5−ジクロロ−4−メチルスルホニル−スチリル)
−5−メチル−ベンゾオキサゾールのスルホン酸ナトリ
ウム塩47.1gが得られる。
For example, a condensation reaction of 29.5 g of 2,5-dichloro-4-methylsulfonylcinnamic acid and 12.9 g of cresamine together with 4 g of boric acid and 15 g of ethylene glycol in a nitrogen stream at 190 to 200 ° C. for 2.5 hours is carried out, and this is treated with dimethylformamide (DMF ) To give 2- (2,5-dichloro-4-) obtained by recrystallization.
26.8 g of methylsulfonyl-styryl) -5-methyl-benzoxazole was added to 100 g of 20% fuming sulfuric acid and stirred at 45 ° C. The end point of the reaction was monitored by TLC, and the reaction was completed in 1 hour. The reaction was drained into ice water containing salt,
Washed with saline and dried, containing 23.2 g of sodium chloride.
(2,5-dichloro-4-methylsulfonyl-styryl)
47.1 g of sodium sulfonate of -5-methyl-benzoxazole are obtained.

本発明にかかる前記一般式で表わされる2−(置換ス
チリル)−メチル基置換ベンゾオキサゾール誘導体を用
いて合成ポリアミドを処理する場合、一般公知の処理方
法すべてが適用でき、たとえばフィルム体や繊維体への
通常染色、樹脂体への混練による練り込みおよび原液着
色する方法等その何れへも簡単に適用する事ができる。
その使用量としては通常染色の場合は0.01%〜2%、好
ましくは0.05%〜1%の範囲であり、樹脂混練および原
着においては0.005PHR〜1PHR、好ましくは0.01PHR〜0.4
PHRの範囲である。
When a synthetic polyamide is treated using the 2- (substituted styryl) -methyl group-substituted benzoxazole derivative represented by the above general formula according to the present invention, all generally known treatment methods can be applied. It can be easily applied to any of ordinary dyeing, kneading into a resin body by kneading, and a method of coloring a stock solution.
The amount used is usually from 0.01% to 2% for dyeing, preferably from 0.05% to 1%, and from 0.005 PHR to 1 PHR, preferably from 0.01 PHR to 0.4 in resin kneading and soaking.
PHR range.

以下に実施例、参考例をあげて本発明を更に詳細に説
明する。
Hereinafter, the present invention will be described in more detail with reference to Examples and Reference Examples.

なお、NOx耐性の試験はJIS L0855に基づき酸化窒素
ガス暴露試験を行ない、判定は暴露処理前と処理後の試
験片を蛍光分光光度計(島津製作所製RF−540)を用い
て蛍光反射を測定し、暴露処理前を100としてその比較
値(相対値)と目視判定(視感)で行なった。
In addition, NOx resistance test is performed by nitric oxide gas exposure test based on JIS L0855, and judgment is made by measuring the fluorescence reflection of the test specimen before and after exposure treatment using a fluorescence spectrophotometer (RF-540 manufactured by Shimadzu Corporation) Then, a comparison value (relative value) and visual judgment (visual sensation) were performed with the value before exposure treatment as 100.

実施例 1 本発明の化合物(1)を0.1%owf、浴比1:20、酢酸に
てpH3.5に調節した染浴中、ナイロン布を用いて90℃で6
0分間染色した後、水洗、ソーピング、水洗、乾燥した
ものを暴露試験に供した。
Example 1 Compound (1) of the present invention in a dye bath adjusted to pH 3.5 with 0.1% owf, bath ratio 1:20 and acetic acid at 90 ° C. using a nylon cloth at 6 ° C.
After dyeing for 0 minutes, the product was washed with water, soaped, washed with water and dried, and subjected to an exposure test.

なお、比較のために参考として本発明の化合物の代わ
りに下記の化合物a、bを用いて同様に染色、暴露試験
を行なった。
For comparison, the same dyeing and exposure tests were carried out using the following compounds a and b instead of the compounds of the present invention for reference.

実施例 2 本発明の化合物(2)0.02PHRと二酸化チタン0.4PHR
をナイロン−6のペレットと共にラボ・プラストミル
(Labo Plastomill:東洋精機製)にて220℃で混練し、
得られた溶融物を取り出し熱プレス、冷却プレスを行な
って得られた白色ポリアミド樹脂板を暴露試験にかけ
た。
Example 2 0.02 PHR of compound (2) of the present invention and 0.4 PHR of titanium dioxide
Is kneaded with nylon-6 pellets at 220 ° C in a Labo Plastomill (Labo Plastomill: manufactured by Toyo Seiki).
The obtained melt was taken out, subjected to a hot press and a cooling press, and a white polyamide resin plate obtained was subjected to an exposure test.

比較のために参考例として本発明の化合物の代わりに
下記の化合物c、dを用いて同様に混練、暴露試験を行
なった。
For comparison, the following compounds c and d were used as reference examples instead of the compound of the present invention, and kneading and exposure tests were similarly performed.

実施例 3 本発明の化合物(3)を用い、参考例として下記の化
合物e、fを用いて実施例2と同様に処理した。
Example 3 The compound (3) of the present invention was treated in the same manner as in Example 2 using the following compounds e and f as reference examples.

実施例4 本発明の化合物(4)を実施例1と同様にして染色処
理し、参考例として下記の化合物gも同様に処理した。
Example 4 The compound (4) of the present invention was stained in the same manner as in Example 1, and the following compound g was similarly treated as a reference example.

実施例5 本発明の化合物(5)を用いて実施例1と同様に染色
処理し、その暴露試験の結果を示す。
Example 5 The dyeing treatment was carried out using the compound (5) of the present invention in the same manner as in Example 1, and the results of the exposure test are shown.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C08L 77/00 C08K 5/00 - 5/59 CA(STN) REGISTRY(STN)────────────────────────────────────────────────── ─── Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) C08L 77/00 C08K 5/00-5/59 CA (STN) REGISTRY (STN)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】一般式 (式中、R1は水素原子、炭素数1〜4のアルキル基、ハ
ロゲン原子またはスルホン酸基もしくはその塩を示し、
R2、R3は同一または異なって、水素原子、ハロゲン原子
またはスルホン酸基もしくはその塩を示し、Xはスルホ
ン酸基もしくはその塩、アルキルスルホニウム塩、アリ
ールスルホニル基、カルボキシル基、アルコキシカルボ
ニル基、アリーロキシカルボニル基、シアノ基、 または (ここで、Yはスルホン酸基またはその塩を示す)で表
わされる2−(置換スチリル)−メチル基置換ベンゾオ
キサゾール誘導体を合成ポリアミドに配合することを特
徴とする窒素酸化物耐性を有する白色ポリアミド組成
物。
(1) General formula (Wherein, R 1 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a halogen atom or a sulfonic acid group or a salt thereof,
R 2 and R 3 are the same or different and each represent a hydrogen atom, a halogen atom or a sulfonic acid group or a salt thereof, and X represents a sulfonic acid group or a salt thereof, an alkylsulfonium salt, an arylsulfonyl group, a carboxyl group, an alkoxycarbonyl group, Aryloxycarbonyl group, cyano group, Or Wherein a 2- (substituted styryl) -methyl group-substituted benzoxazole derivative represented by (where Y represents a sulfonic acid group or a salt thereof) is blended with a synthetic polyamide; Composition.
JP2187902A 1990-07-18 1990-07-18 Polyamide composition having excellent nitrogen oxide resistance Expired - Fee Related JP3037974B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2187902A JP3037974B2 (en) 1990-07-18 1990-07-18 Polyamide composition having excellent nitrogen oxide resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2187902A JP3037974B2 (en) 1990-07-18 1990-07-18 Polyamide composition having excellent nitrogen oxide resistance

Publications (2)

Publication Number Publication Date
JPH0476054A JPH0476054A (en) 1992-03-10
JP3037974B2 true JP3037974B2 (en) 2000-05-08

Family

ID=16214201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2187902A Expired - Fee Related JP3037974B2 (en) 1990-07-18 1990-07-18 Polyamide composition having excellent nitrogen oxide resistance

Country Status (1)

Country Link
JP (1) JP3037974B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10308226A1 (en) * 2003-02-25 2004-09-23 Degussa Ag Transparent molding compound for optical applications

Also Published As

Publication number Publication date
JPH0476054A (en) 1992-03-10

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