JP3035672B2 - Fluorine-containing aromatic ester - Google Patents

Fluorine-containing aromatic ester

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Publication number
JP3035672B2
JP3035672B2 JP13761391A JP13761391A JP3035672B2 JP 3035672 B2 JP3035672 B2 JP 3035672B2 JP 13761391 A JP13761391 A JP 13761391A JP 13761391 A JP13761391 A JP 13761391A JP 3035672 B2 JP3035672 B2 JP 3035672B2
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JP
Japan
Prior art keywords
represented
acid
compound
general formula
mol
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JP13761391A
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Japanese (ja)
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JPH04360852A (en
Inventor
興二 矢野
英幸 友田
弘明 清水
信彦 立入
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Neos Co Ltd
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Neos Co Ltd
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、撥水撥油剤、離型剤、
防汚剤、可塑剤、及び樹脂・金属・木材等の表面改質剤
等として有用であり、又分子内に反応性残基を有するこ
とにより、別のエステル、アミド、塩類等に誘導可能な
合成中間体として有用な新規な含フッ素芳香族エステル
に関する。
The present invention relates to a water and oil repellent, a release agent,
Useful as antifouling agents, plasticizers, and surface modifiers for resins, metals, wood, etc., and can be derived into other esters, amides, salts, etc. by having a reactive residue in the molecule. The present invention relates to a novel fluorine-containing aromatic ester useful as a synthetic intermediate.

【0002】[0002]

【従来の技術及びその課題】従来から、ペルフルオロア
ルキル基、またはペルフルオロアルケニル基を有するア
ルコールから誘導されるエステルは、優れた撥水撥油
性、耐候性、低摩擦性、摺動性、離型性等の特性を有す
ることが知られている(特開平1−265061,特開
平2−282347)。しかしながら、これら含フッ素
エステルはペルフルオロカーボン鎖を分子内に1鎖しか
有さず、撥水撥油性、低摩擦性、摺動性、離型性等の特
性が不十分であり、また、樹脂等を表面処理する場合、
樹脂等に対しての密着性が不十分であるという問題点が
あった。
2. Description of the Related Art Esters derived from alcohols having a perfluoroalkyl group or a perfluoroalkenyl group have been known to have excellent water and oil repellency, weather resistance, low friction, slidability and releasability. It is known to have such characteristics (Japanese Patent Application Laid-Open Nos. 1-265061 and 2-282347). However, these fluorinated esters have only one perfluorocarbon chain in the molecule, and have insufficient properties such as water and oil repellency, low friction properties, slidability, and mold release properties. When surface treating
There has been a problem that adhesion to a resin or the like is insufficient.

【0003】[0003]

【課題を解決するための手段】本発明者は、上記した如
き従来技術の課題を解決すべく鋭意研究を重ねてきた。
その結果、芳香環を有するカルボン酸を原料として用い
る場合に、フルオロカーボン鎖の数を自由に変えること
ができ、従来の含フッ素エステルに比べて、安定で高度
に分岐したフルオロカーボン鎖の導入率が高く、優れた
撥水撥油性、低摩擦性、摺動性、離型性等の特性を示す
とともに、耐久性、密着性等の特性をも有する新規な含
フッ素芳香族エステルが得られることを見出した。更
に、該含フッ素芳香族エステルは、分子内の反応性残基
(例えばカルボキシル基)を、別のエステル、アミド、
塩類等に誘導することができ、基材への対応性が高く、
各種の要求性能を満足でき、更に合成中間体としても有
用であることも見出した。
Means for Solving the Problems The present inventor has made intensive studies to solve the problems of the prior art as described above.
As a result, when a carboxylic acid having an aromatic ring is used as a raw material, the number of fluorocarbon chains can be freely changed, and the introduction rate of stable and highly branched fluorocarbon chains is higher than that of a conventional fluorinated ester. Found that a novel fluorinated aromatic ester having excellent water and oil repellency, low friction properties, sliding properties, releasability, etc., and also having properties such as durability and adhesion can be obtained. Was. Further, the fluorinated aromatic ester can be used to convert a reactive residue (eg, a carboxyl group) in the molecule into another ester, amide,
It can be guided to salts, etc., and is highly compatible with base materials.
It has also been found that various required performances can be satisfied, and that they are also useful as synthetic intermediates.

【0004】即ち本発明は、一般式(I):That is, the present invention provides a compound represented by the general formula (I):

【0005】[0005]

【化2】 Embedded image

【0006】(式中、Rfは各々同一又は異なってC6
11またはC9 17で表わされるペルフルオロアルケニ
ル基を示し、Rは各々同一又は異なって水素原子または
炭素数1〜3のアルキル基を示し、Arは、置換基を有
してもよいベンゼン環または置換基を有してもよいナフ
タリン環を示す。nは1〜8の整数を示し、mは0〜7
の整数を示し、n+m≦8である。)で表される含フッ
素芳香族エステルに係わる。
[0006] (wherein, Rf is each the same or different C 6
R 11 represents a perfluoroalkenyl group represented by F 11 or C 9 F 17 , R represents the same or different and represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and Ar represents a benzene ring which may have a substituent. Or a naphthalene ring which may have a substituent. n represents an integer of 1 to 8;
And n + m ≦ 8. )).

【0007】一般式(I)においてRfはC6 11また
はC9 17で表わされるペルフルオロアルケニル基を示
し、2個以上存在する場合には、同一又は異なるもので
ある。この基は一般的にはヘキサフルオロプロペンの二
量体もしくは三量体から誘導される。このようなペルフ
ルオロアルケニル基としては次の構造で表されるものが
例示される。
In the general formula (I), Rf represents a perfluoroalkenyl group represented by C 6 F 11 or C 9 F 17 , and when two or more are present, they are the same or different. This group is generally derived from a dimer or trimer of hexafluoropropene. Examples of such a perfluoroalkenyl group include those represented by the following structure.

【0008】[0008]

【化3】 Embedded image

【0009】一般式(I)において、Rは水素原子また
は炭素数1〜3のアルキル基を示し、2個以上存在する
場合には同一又は異なるものである。このようなアルキ
ル基としては、メチル基、エチル基、プロピル基等が挙
げられる。
In the general formula (I), R represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and when two or more are present, they are the same or different. Examples of such an alkyl group include a methyl group, an ethyl group, and a propyl group.

【0010】Arは、置換基を有してもよいベンゼン環
または置換基を有してもよいナフタリン環を示す。置換
基としては、メチル基、エチル基、ハロゲン原子(F,
Cl,Br,I)、ニトリル基、ニトロ基、水酸基等が
挙げられ、これらの置換基の数としては、1又は2が好
ましい。
Ar represents a benzene ring which may have a substituent or a naphthalene ring which may have a substituent. Examples of the substituent include a methyl group, an ethyl group, a halogen atom (F,
Cl, Br, I), a nitrile group, a nitro group, a hydroxyl group and the like. The number of these substituents is preferably 1 or 2.

【0011】nは1〜8の整数を示し、好ましくは1〜
6の整数を示す。mは0〜7の整数を示し、好ましくは
0〜6の整数を示す。また、n及びmはn+m≦8を満
たすものである。
N is an integer of 1 to 8, preferably 1 to
Indicates an integer of 6. m represents an integer of 0 to 7, preferably 0 to 6. Further, n and m satisfy n + m ≦ 8.

【0012】一般式(I)で表される含フッ素芳香族エ
ステルの製造方法は特に限定的ではないが、簡便な方法
としては以下のような製法例が挙げられる。
The method for producing the fluorine-containing aromatic ester represented by the general formula (I) is not particularly limited, but examples of the simple method include the following production methods.

【0013】第一の製法は、一般式(II):The first production method has the general formula (II):

【0014】[0014]

【化4】 Embedded image

【0015】(式中、Rfは前記に同じ。)で表される
含フッ素アルコールを酸触媒の存在下で、一般式(II
I): Ar(CO2 R)l (III) (式中、RとArは、前記に同じ。lは1〜8の整数を
示す。)で表される芳香族カルボン酸またはエステルと
反応させる方法である。
(In the formula, Rf is the same as described above.) A fluorinated alcohol represented by the general formula (II) in the presence of an acid catalyst:
I): reacting with an aromatic carboxylic acid or ester represented by Ar (CO 2 R) l (III) (wherein R and Ar are the same as above, and l represents an integer of 1 to 8) Is the way.

【0016】一般式(II)の含フッ素アルコールの例
としては、p−(ペルフルオロノネニルオキシ)フェニ
ルエチルアルコール、p−(ペルフルオロヘキセニルオ
キシ)フェニルエチルアルコール等が挙げられる。含フ
ッ素アルコールは、例えばp−(ペルフルオロノネニル
オキシ)フェニルエチルアルコールについて例をあげる
と、p−ヒドロキシフェニルエチルアルコールにヘキサ
フルオロプルペンの三量体を塩基性条件下で反応させる
ことより高収量で得られる。
Examples of the fluorinated alcohol of the general formula (II) include p- (perfluorononenyloxy) phenylethyl alcohol, p- (perfluorohexenyloxy) phenylethyl alcohol and the like. The fluorinated alcohol, for example, in the case of p- (perfluorononenyloxy) phenylethyl alcohol, can be obtained in a higher yield than the reaction of p-hydroxyphenylethyl alcohol with a trimer of hexafluoropulpene under basic conditions. can get.

【0017】一般式(III)で表される芳香族カルボ
ン酸またはそのエステルの例としては、安息香酸、安息
香酸メチル、安息香酸エチル、安息香酸プロピル、フタ
ル酸、イソフタル酸ジメチル、テレフタル酸ジエチル、
トリメリト酸トリエチル、トリメシン酸、ピロメリット
酸、メリット酸ヘキサメチル、ベンゼンテトラカルボン
酸、トルエンヘキサカルボン酸、ナフタル酸、ナフタリ
ン−1,4,5,8−テトラカルボン酸等が挙げられ、
これらのうちカルボン酸については、そのC1-3 アルキ
ルエステルも用いることができる。
Examples of the aromatic carboxylic acid or its ester represented by the general formula (III) include benzoic acid, methyl benzoate, ethyl benzoate, propyl benzoate, phthalic acid, dimethyl isophthalate, diethyl terephthalate,
Triethyl trimellitate, trimesic acid, pyromellitic acid, hexamethyl melitate, benzenetetracarboxylic acid, toluenehexacarboxylic acid, naphthalic acid, naphthalene-1,4,5,8-tetracarboxylic acid, and the like,
Among these, the carboxylic acid can also be used in the form of a C 1-3 alkyl ester.

【0018】上記した製法によれば、本発明化合物は、
一般式(III)で表される芳香族カルボン酸またはエ
ステル1モルに対して、0.1〜20モル、好ましくは
0.1〜10モルの一般式(II)で表される含フッ素
アルコールを酸触媒、例えば塩化水素、濃硫酸、p−ト
ルエンスルホン酸、強酸性イオン交換樹脂等の存在下、
50〜200℃、好ましくは60〜150℃の温度で1
〜48時間程度反応させることにより得られる。この際
所望により、不活性溶媒、例えばベンゼン、トルエン等
を使用してもよい。
According to the above-mentioned production method, the compound of the present invention is
0.1 to 20 mol, preferably 0.1 to 10 mol, of the fluorinated alcohol represented by the general formula (II) is added to 1 mol of the aromatic carboxylic acid or ester represented by the general formula (III). In the presence of an acid catalyst such as hydrogen chloride, concentrated sulfuric acid, p-toluenesulfonic acid, a strongly acidic ion exchange resin,
1 at a temperature of 50-200 ° C, preferably 60-150 ° C.
It is obtained by reacting for about 48 hours. At this time, if desired, an inert solvent such as benzene or toluene may be used.

【0019】上記製法により得られる化合物についてよ
り具体的に示すと、p−(ペルフルオロノネニルオキ
シ)フェニルエチルアルコールと安息香酸(またはその
エステル)とから、
More specifically, the compound obtained by the above-mentioned process is represented by p- (perfluorononenyloxy) phenylethyl alcohol and benzoic acid (or an ester thereof).

【0020】[0020]

【化5】 Embedded image

【0021】が合成される。Are synthesized.

【0022】トリメリット酸(またはそのエステル)か
らは、例えば下記の化合物が合成される。
From trimellitic acid (or its ester), for example, the following compounds are synthesized.

【0023】[0023]

【化6】 Embedded image

【0024】トルエンペンタカルボン酸(またはそのエ
ステル)からは、次式のnが5までの化合物を得ること
ができる。
From toluenepentacarboxylic acid (or an ester thereof), a compound of the following formula wherein n is up to 5 can be obtained.

【0025】[0025]

【化7】 Embedded image

【0026】ナフタル酸(またはそのエステル)から
は、次のようなものが合成される。
From naphthalic acid (or its ester), the following are synthesized.

【0027】[0027]

【化8】 Embedded image

【0028】(以上、Rf及びRは、前記に同じ)本発
明化合物の第二の製法は、一般式(II):
(Where Rf and R are the same as described above) A second process for preparing the compound of the present invention is represented by the general formula (II):

【0029】[0029]

【化9】 Embedded image

【0030】(式中、Rfは前記と同意義である)で表
される含フッ素アルコールを塩基の存在下で、一般式
(IV): Ar(COX)p (IV) (式中、Xはハロゲン原子であり、pは1〜8の整数を
示す。Arは、前記に同じ。)で表されるカルボン酸ハ
ロゲン化物、または一般式(V): (ROCO)r−Ar−((CO)2 O)q (V) (式中、Rは前記に同じ。rは0〜6の整数を示し、q
は1〜4の整数を示し、r+p≦8である。Arは、前
記に同じ。)で表されるカルボン酸無水物と反応させる
方法である。
(Wherein, Rf is as defined above) is reacted with a fluorinated alcohol represented by the general formula (IV): Ar (COX) p (IV) (where X is A halogen atom, and p represents an integer of 1 to 8. Ar is the same as defined above, or a carboxylic acid halide represented by the general formula (V): (ROCO) r-Ar-((CO) 2 O) q (V) (wherein, R is the same as above. R represents an integer of 0 to 6;
Represents an integer of 1 to 4, and r + p ≦ 8. Ar is the same as above. )).

【0031】一般式(IV)で表される芳香族カルボン
酸ハロゲン化物の例としては、塩化ベンゾイル、テレフ
タル酸二臭化物、トリメシン酸三塩化物等が挙げられ、
また、一般式(V)で表されるカルボン酸無水物の例と
しては、無水フタル酸、無水トリメリット酸、ピロメリ
ット酸二無水物等が挙げられる。
Examples of the aromatic carboxylic acid halide represented by the general formula (IV) include benzoyl chloride, terephthalic acid dibromide, trimesic acid trichloride and the like.
Examples of the carboxylic anhydride represented by the general formula (V) include phthalic anhydride, trimellitic anhydride, pyromellitic dianhydride and the like.

【0032】上記第二の製法は、一般式(IV)または
一般式(V)で表される芳香族カルボン酸ハロゲン化物
またはカルボン酸無水物1モルに対して、0.1〜20
モル、好ましくは0.1〜10モルの一般式(II)で
表される含フッ素アルコールを塩基性化合物、例えばピ
リジン、トリエチルアミン、炭酸カリウム、塩基性イオ
ン交換樹脂等の存在下、−20〜100℃、好ましくは
−10〜80℃の温度で30〜180分間程度反応させ
ることにより実施できる。この際所望により、不活性溶
媒、例えばベンゼン、トルエン、アセトン、ヘキサン、
ジエチルエーテル等を使用してもよい。
[0032] The second production method is carried out in the range of 0.1 to 20 mol per mol of the aromatic carboxylic acid halide or carboxylic anhydride represented by the general formula (IV) or (V).
Mol, preferably 0.1 to 10 mol, of the fluorinated alcohol represented by the general formula (II) in the presence of a basic compound such as pyridine, triethylamine, potassium carbonate, or a basic ion exchange resin. C., preferably at a temperature of -10 to 80C for about 30 to 180 minutes. At this time, if desired, an inert solvent such as benzene, toluene, acetone, hexane,
Diethyl ether or the like may be used.

【0033】上記等の製造法により得られた生成物は、
所望により蒸留、再結晶、、カラムクロマトグラフィー
等によって精製してもよい。
The product obtained by the above production method is
If desired, it may be purified by distillation, recrystallization, column chromatography or the like.

【0034】[0034]

【実施例】以下、本発明を実施例によって説明する。The present invention will be described below with reference to examples.

【0035】[0035]

【実施例1】温度計、攪拌機および還流冷却管を備えた
反応容器内に、p−ペルフルオロノネニルオキシフェニ
ルエチルアルコール57.0g(0.1モル)、安息香
酸メチル13.9g(0.1モル)およびp−トルエン
スルホン酸0.8gを入れ、105−110℃で9時間
加熱攪拌した。
Example 1 In a reaction vessel equipped with a thermometer, a stirrer and a reflux condenser, 57.0 g (0.1 mol) of p-perfluorononenyloxyphenylethyl alcohol and 13.9 g (0.1 mol) of methyl benzoate were added. Mol) and 0.8 g of p-toluenesulfonic acid, and the mixture was heated and stirred at 105-110 ° C for 9 hours.

【0036】反応生成物をベンゼン300mlに溶か
し、溶液を炭酸水素ナトリウム水溶液、次いで飽和食塩
水で洗浄し、有機層を分取し溶媒を減圧下で加温除去し
た。
The reaction product was dissolved in 300 ml of benzene, and the solution was washed with an aqueous sodium hydrogen carbonate solution and then with a saturated saline solution. The organic layer was separated, and the solvent was removed by heating under reduced pressure.

【0037】得られた粗生成物を減圧蒸留に付して、下
記式で示す化合物Iを34.6g得た(収率51%)。
The obtained crude product was subjected to distillation under reduced pressure to obtain 34.6 g of a compound I represented by the following formula (yield: 51%).

【0038】化合物Iの物性を以下の表−1に示す。The physical properties of Compound I are shown in Table 1 below.

【0039】化合物I:Compound I:

【0040】[0040]

【化10】 Embedded image

【0041】[0041]

【実施例2】温度計、攪拌機、還流冷却管および滴下漏
斗を備えた反応容器内に、p−ペルフルオロノネニルオ
キシフェニルエチルアルコール56.8g(0.1モ
ル)、テレフタル酸ジクロライド10.1g(0.05
モル)、アセトン30mlおよびベンゼン100mlを
入れ、該混合物中へ、トリエチルアミン13.5gをベ
ンゼン30mlに溶かした溶液を、10℃以下に冷却し
つつ滴下した。滴下終了後、室温にて12時間攪拌を行
った。
Example 2 56.8 g (0.1 mol) of p-perfluorononenyloxyphenylethyl alcohol and 10.1 g of terephthalic acid dichloride were placed in a reaction vessel equipped with a thermometer, a stirrer, a reflux condenser and a dropping funnel. 0.05
Mol), acetone (30 ml) and benzene (100 ml), and a solution of 13.5 g of triethylamine dissolved in 30 ml of benzene was added dropwise to the mixture while cooling to 10 ° C. or lower. After completion of the dropwise addition, the mixture was stirred at room temperature for 12 hours.

【0042】反応生成物をベンゼン300mlに溶か
し、溶液を5%希塩酸、炭酸水素ナトリウム水溶液、次
いで飽和食塩水で洗浄し、有機層を分取し溶媒を減圧下
で加温除去した。
The reaction product was dissolved in 300 ml of benzene, and the solution was washed with 5% diluted hydrochloric acid, an aqueous solution of sodium hydrogencarbonate, and then with a saturated saline solution. The organic layer was separated, and the solvent was removed by heating under reduced pressure.

【0043】得られた粗生成物をシリカゲルカラムクロ
マトに付して、下記式で示す化合物IIを36.7g得
た(収率58%)。化合物IIの物性を以下の表−1に
示す。
The obtained crude product was subjected to silica gel column chromatography to obtain 36.7 g of a compound II represented by the following formula (yield: 58%). The physical properties of Compound II are shown in Table 1 below.

【0044】化合物II:Compound II:

【0045】[0045]

【化11】 Embedded image

【0046】[0046]

【実施例3】温度計、攪拌機、還流冷却管および滴下漏
斗を備えた反応容器内に、p−ペルフルオロノネニルオ
キシフェニルエチルアルコール22.7g(0.04モ
ル)、無水ピロメリト酸4.4g(0.02モル)を入
れ、該混合物中へ、ピリジン10.5gを室温にて滴下
した。滴下終了後、50−55℃で4.5時間攪拌を行
った。
Example 3 In a reaction vessel equipped with a thermometer, a stirrer, a reflux condenser, and a dropping funnel, 22.7 g (0.04 mol) of p-perfluorononenyloxyphenylethyl alcohol and 4.4 g of pyromellitic anhydride ( 0.02 mol), and 10.5 g of pyridine was added dropwise to the mixture at room temperature. After completion of the dropwise addition, the mixture was stirred at 50 to 55 ° C. for 4.5 hours.

【0047】反応生成物をジエチルエーテル300ml
に溶かし、溶液を5%希塩酸、炭酸水素ナトリウム水溶
液、次いで飽和食塩水で洗浄し、有機層を分取し溶媒を
減圧下で加温除去した。
The reaction product was dissolved in diethyl ether (300 ml).
, And the solution was washed with 5% diluted hydrochloric acid, an aqueous solution of sodium hydrogen carbonate and then with a saturated saline solution. The organic layer was separated, and the solvent was removed by heating under reduced pressure.

【0048】得られた粗生成物をシリカゲルカラムクロ
マトに付して、下記式で示す化合物III−aと化合物
III−bの混合物12.4gを得た(収率45%)。
化合物III−aと化合物III−bの物性を表−1に
示す。
The obtained crude product was subjected to silica gel column chromatography to obtain 12.4 g of a mixture of a compound III-a and a compound III-b represented by the following formula (yield: 45%).
Table 1 shows the physical properties of Compound III-a and Compound III-b.

【0049】化合物III−aCompound III-a

【0050】[0050]

【化12】 Embedded image

【0051】化合物III−bCompound III-b

【0052】[0052]

【化13】 Embedded image

【0053】[0053]

【実施例4】温度計、攪拌機および還流冷却管を備えた
反応容器内に、p−ペルフルオロノネニルオキシフェニ
ルエチルアルコール14.8g(0.03モル)、メリ
ット酸ヘキサメチル10.6g(0.02モル)、トル
エン20ml、および濃硫酸1mlを入れ、110−1
15℃で5時間加熱攪拌した。
Example 4 14.8 g (0.03 mol) of p-perfluorononenyloxyphenylethyl alcohol and 10.6 g (0.02 mol) of hexamethyl melitate were placed in a reaction vessel equipped with a thermometer, a stirrer and a reflux condenser. Mol), 20 ml of toluene and 1 ml of concentrated sulfuric acid.
The mixture was heated and stirred at 15 ° C for 5 hours.

【0054】反応生成物をベンゼン300mlに溶か
し、溶液を炭酸水素ナトリウム水溶液、次いで飽和食塩
水で洗浄し、有機層を分取し溶媒を減圧下で加温除去し
た。
The reaction product was dissolved in 300 ml of benzene, the solution was washed with an aqueous solution of sodium hydrogencarbonate and then with a saturated saline solution, the organic layer was separated, and the solvent was removed by heating under reduced pressure.

【0055】得られた粗生成物をヘキサン−ベンゼン
(9:1)で抽出し、次いでメタノールで洗浄して、下
記式で示す化合物IVを5.2g得た。化合物IVの物
性を以下の表−1に示す。
The obtained crude product was extracted with hexane-benzene (9: 1) and then washed with methanol to obtain 5.2 g of a compound IV represented by the following formula. The physical properties of Compound IV are shown in Table 1 below.

【0056】化合物IV:Compound IV:

【0057】[0057]

【化14】 Embedded image

【0058】[0058]

【表1】 [Table 1]

【0059】[0059]

【発明の効果】本発明によって提供される含フッ素芳香
族エステルは1分子当たりのフルオロカーボン鎖を自由
に変えることができ、反応性残基(例えばカルボキシル
基)を有するので、高性能の潤滑剤、摺動剤、離型剤、
およびプラスチック、金属、木材等の表面改質剤等とし
て有用なばかりでなく、他の含フッ素エステルやアミド
等に容易に誘導可能であるので合成中間体としても有用
である。
The fluorine-containing aromatic ester provided by the present invention can freely change the fluorocarbon chain per molecule and has a reactive residue (for example, a carboxyl group). Sliding agent, release agent,
It is useful not only as a surface modifier for plastics, metals, woods and the like, but also as a synthetic intermediate because it can be easily derived into other fluorine-containing esters and amides.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI C09K 3/00 112 C09K 3/00 112D 3/18 102 3/18 102 C10M 105/54 C10M 105/54 C10N 40:36 (72)発明者 立入 信彦 滋賀県甲賀郡甲西町大池町1番1 株式 会社ネオス内 (56)参考文献 特開 平1−131137(JP,A) 特開 平1−9958(JP,A) 特表 平2−501311(JP,A) (58)調査した分野(Int.Cl.7,DB名) C07C 69/767 C07C 69/78 C07C 69/83 CA(STN) REGISTRY(STN)──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification code FI C09K 3/00 112 C09K 3/00 112D 3/18 102 3/18 102 C10M 105/54 C10M 105/54 C10N 40:36 (72 ) Inventor Nobuhiko Ritsuiri 1-1, Oike-cho, Kosai-cho, Koka-gun, Shiga Prefecture Neos Corporation (56) References JP-A-1-131137 (JP, A) JP-A-1-9958 (JP, A) 2-501311 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) C07C 69/767 C07C 69/78 C07C 69/83 CA (STN) REGISTRY (STN)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一般式(I): 【化1】 (式中、Rfは各々同一又は異なってC6 11またはC
9 17で表わされるペルフルオロアルケニル基を示し、
Rは各々同一又は異なって水素原子または炭素数1〜3
のアルキル基を示し、Arは置換基を有してもよいベン
ゼン環または置換基を有してもよいナフタリン環を示
す。nは1〜8の整数を示し、mは0〜7の整数を示
し、n+m≦8である。)で表される含フッ素芳香族エ
ステル。
1. A compound of the general formula (I): (Wherein, Rf is the same or different and each is C 6 F 11 or C
It indicates perfluoroalkenyl group represented by 9 F 17,
R is the same or different and each represents a hydrogen atom or 1 to 3 carbon atoms;
And Ar represents a benzene ring which may have a substituent or a naphthalene ring which may have a substituent. n shows the integer of 1-8, m shows the integer of 0-7, and n + m <= 8. ) A fluorine-containing aromatic ester represented by the formula:
JP13761391A 1991-06-10 1991-06-10 Fluorine-containing aromatic ester Expired - Fee Related JP3035672B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13761391A JP3035672B2 (en) 1991-06-10 1991-06-10 Fluorine-containing aromatic ester

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13761391A JP3035672B2 (en) 1991-06-10 1991-06-10 Fluorine-containing aromatic ester

Publications (2)

Publication Number Publication Date
JPH04360852A JPH04360852A (en) 1992-12-14
JP3035672B2 true JP3035672B2 (en) 2000-04-24

Family

ID=15202775

Family Applications (1)

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Country Status (1)

Country Link
JP (1) JP3035672B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018016554A (en) * 2016-07-25 2018-02-01 信越化学工業株式会社 Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing the same, negative photosensitive resin composition, pattern forming method, and cured coat forming method

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2230599A (en) * 1998-01-27 1999-08-09 Minnesota Mining And Manufacturing Company Fluorochemical benzotriazoles
ATE407175T1 (en) * 2004-08-25 2008-09-15 Ciba Holding Inc SURFACE MODIFIERS
MY145424A (en) * 2005-02-07 2012-02-15 Ciba Holding Inc Functionalized esters, amides or urethanes of perfluorinated alcohols or amines as surface modifiers

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018016554A (en) * 2016-07-25 2018-02-01 信越化学工業株式会社 Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing the same, negative photosensitive resin composition, pattern forming method, and cured coat forming method
KR20180011729A (en) * 2016-07-25 2018-02-02 신에쓰 가가꾸 고교 가부시끼가이샤 Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film
US10216085B2 (en) * 2016-07-25 2019-02-26 Shin-Etsu Chemical Co., Ltd. Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film
KR101980436B1 (en) * 2016-07-25 2019-05-20 신에쓰 가가꾸 고교 가부시끼가이샤 Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film

Also Published As

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