JP3034864B1 - Surface irradiation method and apparatus for granular material - Google Patents
Surface irradiation method and apparatus for granular materialInfo
- Publication number
- JP3034864B1 JP3034864B1 JP6247499A JP6247499A JP3034864B1 JP 3034864 B1 JP3034864 B1 JP 3034864B1 JP 6247499 A JP6247499 A JP 6247499A JP 6247499 A JP6247499 A JP 6247499A JP 3034864 B1 JP3034864 B1 JP 3034864B1
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- Prior art keywords
- granular material
- irradiation
- rotation
- irradiating
- section
- Prior art date
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- Air Transport Of Granular Materials (AREA)
- Storage Of Fruits Or Vegetables (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
Abstract
【要約】
【課題】 多量の粒状物の表面を連続的に全面照射す
る。
【解決手段】 横方向へ展開された平滑斜面12上に沿
って粒状物を落下させ、斜面末端近傍に設けられた凹凸
面18を有する回転付加部16により粒状物に回転を付
加した後、横方向に細長い照射用窓を有する鉛直落下部
26に導入し、この鉛直落下部で照射用窓から水平方向
に電子線、紫外線及びX線のいずれかを照射する。Kind Code: A1 Abstract: The entire surface of a large amount of granular material is continuously irradiated. SOLUTION: The granular material is dropped along a smooth inclined surface 12 developed in a lateral direction, and after a rotation is added to the granular material by a rotation applying unit 16 having an uneven surface 18 provided near the end of the inclined surface, the granular material is rotated. It is introduced into a vertical drop section 26 having an irradiation window elongated in the direction, and the vertical drop section irradiates an electron beam, ultraviolet light, or X-ray in the horizontal direction from the irradiation window.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、小麦、蕎麦、その
他の穀類等の粒状物への表面照射方法及び装置、詳しく
は、粒状体を薄層流にした後、確実に回転させて供給す
ることにより、多量の穀類を連続的に全面照射する方法
及び装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for irradiating a granular material such as wheat, buckwheat, and other cereals with a surface. Accordingly, the present invention relates to a method and an apparatus for continuously irradiating a large amount of cereals over the entire surface.
【0002】[0002]
【従来の技術】電子線、紫外線やX線は、その強度を調
整することにより透過能力を低くし、中心部分の変質を
伴わない表面に限定した改質処理や殺菌処理ができる。
しかし、粒状物への適用にあたっては、粒子表面全面を
電子線発生側に向けなくてはならない。2. Description of the Related Art The transmission ability of electron beams, ultraviolet rays and X-rays is reduced by adjusting the intensity thereof, so that a modification treatment or a sterilization treatment limited to a surface without deterioration of the central portion can be performed.
However, when applied to granular materials, the entire surface of the particles must be directed to the electron beam generation side.
【0003】従来、表面改質(重合)を目的とした照射
としては、シート状のプラスチック、フィルム状のプラ
スチックへの電子線や紫外線の照射が行われてきた。し
かし、粒状の物質に対しては、下記のような方法及び装
置が試されてきたが、個々の粒子の全表面を照射するこ
とが難しく、かつ、処理量、処理速度が小さく、商業規
模の処理に至っていなかった。 (1) 粒状物をシート間に挟み、電子線や紫外線を照
射後、反転させ、再照射により全面照射する方法及び装
置、(2) 特開平8−52201号公報に記載されて
いるように、エアスライドコンベア上に粉体(粒状物)
を薄く展開し電子線を照射する方法及び装置、(3)
特開平8−308508号公報に記載されているよう
に、エアスライドコンベアや振動式輸送機のような細か
い振動を行う平面に飼料原料(粒状物)を散布し、電子
線照射を行う方法及び装置、Conventionally, as irradiation for the purpose of surface modification (polymerization), irradiation of an electron beam or ultraviolet rays on a sheet-like plastic or a film-like plastic has been performed. However, the following methods and apparatuses have been tried for granular materials, but it is difficult to irradiate the entire surface of each particle, and the throughput and the processing speed are small. Processing has not been completed. (1) A method and an apparatus in which a granular material is sandwiched between sheets, irradiated with an electron beam or ultraviolet light, then inverted and re-irradiated to irradiate the entire surface. (2) As described in JP-A-8-52201, Powder (granular material) on air slide conveyor
And apparatus for irradiating an electron beam by developing a thin film, (3)
As described in Japanese Patent Application Laid-Open No. 8-308508, a method and an apparatus for spraying feed material (granules) on a flat surface such as an air slide conveyor or a vibrating transporter that performs fine vibration and irradiating with an electron beam. ,
【0004】[0004]
【発明が解決しようとする課題】上記(1)の方式は、
粒状物をシート間に挟むパッキング作業に労力を要する
ことと、シートが消耗材として必要になることから商業
化ができないという問題を有している。また、上記
(2)の方式は、粒状物に回転が付加されないため、照
射されない面が生じるという問題を有している。また、
上記(3)の方式は、エアスライドコンベアや振動輸送
機、とくに振動輸送機は移動速度が小さく、粒状物の大
量処理を行うと処理層が厚くなり照射されない部分がで
きるという問題を有している。The method of the above (1) is as follows.
There is a problem that the packing operation for sandwiching the granular material between the sheets requires labor and the sheets are required as a consumable material, so that commercialization cannot be performed. In addition, the method of the above (2) has a problem that a surface that is not irradiated is generated because rotation is not added to the granular material. Also,
The method (3) has a problem that an air slide conveyor or a vibration transporter, particularly a vibration transporter, has a low moving speed, and when a large amount of granular material is processed, a processing layer becomes thick and a portion not irradiated is formed. I have.
【0005】本発明は上記の諸点に鑑みなされたもの
で、本発明の目的は、粒状物を平滑斜面上に落下させる
ことにより、流れを横方向に細長い電子線照射領域と同
じ幅に均一に広げ、斜面末端近傍に金網等の凹凸を有す
る面を設けて、粒状物に回転を付加することにより、多
量の粒状物を連続的に全面照射することができる粒状物
の表面照射方法及び装置を提供することにある。The present invention has been made in view of the above-mentioned points, and an object of the present invention is to make a flow uniformly by dropping a granular material on a smooth slope so as to have the same width as an electron beam irradiation region which is elongated in a lateral direction. A method and an apparatus for irradiating a surface of a granular material capable of continuously irradiating a large amount of the granular material over the entire surface by providing a surface having irregularities such as a wire net near the end of the slope and providing rotation to the granular material. To provide.
【0006】[0006]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明の粒状物の表面照射方法は、横方向へ展開
された平滑斜面上に沿って粒状物を薄層流に広げて落下
させ、斜面末端近傍に設けられた凹凸面を有する回転付
加部により粒状物に回転を付加した後、横方向に細長い
照射用窓を有する鉛直落下部に導入し、この鉛直落下部
で回転して落下する粒状物に照射用窓から水平方向に電
子線、紫外線及びX線のいずれかを照射するように構成
されている(図1〜図4参照)。In order to achieve the above object, a method for irradiating a surface of a granular material according to the present invention is to spread the granular material into a laminar flow along a smooth inclined surface developed in a lateral direction. After dropping and adding rotation to the granular material by a rotation applying portion having an uneven surface provided near the end of the slope, the granular material is introduced into a vertical falling portion having a horizontally elongated irradiation window, and rotated at this vertical falling portion. It is configured to irradiate any one of an electron beam, an ultraviolet ray, and an X-ray from a radiation window horizontally to the falling granular material (see FIGS. 1 to 4).
【0007】上記の方法において、回転付加部の直前の
流路幅を絞って粒状物の跳ね上がりを抑えた後、回転付
加部に導入することが好ましい(図1〜図3参照)。ま
た、鉛直落下部の空気を吸引するか、又は鉛直落下部に
空気を供給することにより、粒状物落下速度及び粒状物
回転数の少なくともいずれかを調整することが好ましい
(図1〜図3参照)。また、平滑斜面を振動させる場合
もあり、この場合は、粒状物の横方向への広がり及び落
下を均一に、かつ高速度で行うことができる(図5参
照)。[0007] In the above method, it is preferable to restrict the width of the flow path immediately before the rotation applying section to suppress the jumping-up of the particulate matter, and then to introduce the particulate matter into the rotation applying section (see Figs. 1 to 3). In addition, by sucking air from the vertical drop section or supplying air to the vertical drop section, the granular material falling speed and granular material
It is preferable to adjust at least one of the rotation speeds (see FIGS. 1 to 3). Further, Ri mower when vibrating the smooth slope, the breadth and declines in this case, the lateral direction of the granulate
Uniformly lower, and Ru can be performed at high speed (see Fig. 5).
【0008】本発明の粒状物の表面照射装置は、投入さ
れた粒状物を横方向に広げて薄層流にして落下させるた
めの横方向へ展開された平滑斜面を有する展開部と、平
滑斜面の末端近傍に設けられた粒状物に回転を付加する
ための凹凸面を備えた回転付加部と、回転付加部に連結
された横方向に細長い照射用窓を有する鉛直落下部の該
照射用窓に電子線加速器、紫外線ランプ及びX線照射器
のいずれかを配置させてなる照射部とを備えたことを特
徴としている(図1〜図4参照)。[0008] The surface irradiation apparatus for a granular material according to the present invention comprises: a developing section having a laterally developed smooth slope for spreading the input granular material in the lateral direction to fall into a laminar flow; Rotation to the granular material provided near the end of the
A rotating addition unit having an uneven surface for projection and a vertically falling irradiation window having a horizontally elongated irradiation window connected to the rotation adding unit. The irradiation window includes any one of an electron beam accelerator, an ultraviolet lamp, and an X-ray irradiator. And an irradiating unit having the above arrangement (see FIGS. 1 to 4).
【0009】この装置において、回転付加部の直前に、
回転付加部の流路幅を絞って粒状物の跳ね上がりを抑え
るための整流部を設けた構成とすることが好ましい(図
1〜図3参照)。また、鉛直落下部での粒状物落下速度
及び粒状物回転数の少なくともいずれかが調整できるよ
うに、鉛直落下部の下部に接続された空気を吸引又は空
気を供給するための空気ダクトを備えた構成とすること
が好ましい(図1〜図3参照)。なお、空気ダクトを図
1、2、5、6における展開部の下端近傍の開口に設置
する場合もある。回転付加部の凹凸面としては、斜面末
端近傍の底面に格子状もしくは横縞状の凹凸を設けた構
造、金網又はワイヤ等が用いられる(図1、図3参
照)。また、平滑斜面を振動させて粒状物の横方向への
広がり及び落下が均一に、かつ高速度で行えるように、
平滑斜面を有する展開部に振動機を連結した構成とする
場合もある(図5参照)。In this device, immediately before the rotation applying section,
It is preferable to provide a configuration in which a flow straightening unit is provided to reduce the width of the flow passage of the rotation applying unit and suppress the jumping of the granular material (see FIGS. 1 to 3). Also, the falling speed of granular material in the vertical drop section
And at least one of the particle rotation speed can be adjusted.
As described above, it is preferable to provide a configuration provided with an air duct connected to the lower part of the vertical drop portion for sucking air or supplying air (see FIGS. 1 to 3). In some cases, the air duct is installed at an opening near the lower end of the deployed portion in FIGS. As the uneven surface of the rotation applying portion, a structure in which lattice-like or horizontal stripe-like unevenness is provided on the bottom surface near the end of the slope, a wire mesh, a wire, or the like is used (see FIGS. 1 and 3). In addition, by vibrating the smooth slope, the granular
To spread and drop uniformly and at high speed,
In some cases, a vibrator is connected to a deployment section having a smooth slope (see FIG. 5).
【0010】[0010]
【発明の実施の形態】以下、本発明の実施の形態につい
て説明するが、本発明は下記の実施の形態に何ら限定さ
れるものではなく、適宜変更して実施することができる
ものである。図1は本発明の実施の第1形態による粒状
物の表面照射装置、特に電子線を用いた照射装置の概略
構成図を示し、図2は装置要部(ハンドリング部)の斜
視図を示し、図3は照射部まわりの縦断面説明図を示
し、図4は照射装置を組み込んだ状態を示す斜視図を示
している。電子線、紫外線又はX線の浸透深さを小さく
して、粒状物を表面照射処理するには、粒状物同士の重
なりをなくした上で、照射領域内で1回転以上させる必
要がある。また、照射部の形状は、線源となる装置の一
般的形状から、横方向に細長いスリット状となる。した
がって、処理速度を大きくするには、粒状物を薄く広
げ、大きな流速で通過させる必要がある。この課題に対
し、以下のような構造を持たせて解決している。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below, but the present invention is not limited to the following embodiments and can be implemented with appropriate modifications. FIG. 1 shows a schematic configuration diagram of a particle surface irradiation apparatus according to a first embodiment of the present invention, particularly an irradiation apparatus using an electron beam. FIG. 2 shows a perspective view of a main part (handling section) of the apparatus. FIG. 3 is a vertical cross-sectional explanatory view around the irradiation unit, and FIG. 4 is a perspective view showing a state in which the irradiation device is incorporated. In order to reduce the penetration depth of electron beams, ultraviolet rays, or X-rays and to perform surface irradiation treatment of the granular material, it is necessary to eliminate the overlap between the granular materials and make one or more rotations in the irradiation area. In addition, the shape of the irradiating portion is a slit shape elongated in the horizontal direction from the general shape of the device serving as the radiation source. Therefore, in order to increase the processing speed, it is necessary to spread the granular material thinly and pass it at a high flow rate. This problem has been solved by providing the following structure.
【0011】10は扁平なダクト状の展開部で、投入さ
れた粒状物を横方向に電子線照射領域とほぼ同じ幅に均
一に広げて落下させるための横方向へ展開された平滑斜
面12を有している。この平滑斜面の傾斜角は20〜8
0度、例えば30度である。粒状物の一例として小麦1
5t /hrを処理する場合、供給ラインを事前に2本に分
割した上で、例えば、傾斜角30度程度、幅100cm程
度の平滑面に下端から55cm程度の所へ落下するような
形状とする。14は粒状物入口で、供給ラインが接続さ
れている。16は回転付加部で、平滑斜面12の末端近
傍に設けられた凹凸面18を備えている。この回転付加
部16は、傾斜角30〜80度、例えば60度の平板上
に、格子状又は横縞状の凹凸を設けた構造としたり、底
面の凹凸を金網やワイヤ等で形成する。要は突起を設け
て凹凸面を形成するものであればよい。Reference numeral 10 denotes a flat duct-like developing section, which is a flat duct-like developing section which spreads the supplied granular material uniformly in the same width as the electron beam irradiation area and drops it. Have. The angle of inclination of this smooth slope is 20-8.
It is 0 degrees, for example, 30 degrees. Wheat 1 as an example of a granular material
In the case of processing at 5 t / hr, the supply line is divided into two lines in advance, and then, for example, the shape is such that it falls on a smooth surface having an inclination angle of about 30 degrees and a width of about 100 cm from a lower end to about 55 cm from the lower end. . Reference numeral 14 denotes a granular material inlet to which a supply line is connected. Reference numeral 16 denotes a rotation applying portion, which has an uneven surface 18 provided near the end of the smooth slope 12. The rotation applying section 16 has a structure in which lattice-like or horizontal stripe-like irregularities are provided on a flat plate having an inclination angle of 30 to 80 degrees, for example, 60 degrees, or irregularities on the bottom surface are formed by a wire net or a wire. The point is that any projections may be provided to form the uneven surface.
【0012】回転付加部16の直前(上側)に、流路幅
を小さくし(処理対象粒子の長さの1.2〜3倍)、粒
子の跳ね上がりを抑えることができる整流部20を設け
ることが好ましい。22は照射部で、回転付加部16に
連結された横方向に細長い照射用窓(スリット)24
(図2参照)を有する鉛直落下部26の該照射用窓24
に電子線加速器28を配置させて構成されている。鉛直
落下部26の流路幅は、電子線の有効照射距離以下と
し、回転付加部16の末端から0〜30cmの範囲に照射
用窓24が設けられている。この照射用窓24は、電子
線放出部(照射領域)と合致する形状とする。Immediately before (upper side) the rotation applying section 16, a rectifying section 20 capable of reducing the width of the flow path (1.2 to 3 times the length of the particles to be treated) and suppressing the particles from jumping up is provided. Is preferred. Reference numeral 22 denotes an irradiation unit, which is a horizontally elongated irradiation window (slit) 24 connected to the rotation applying unit 16.
The irradiation window 24 of the vertical drop portion 26 having the structure (see FIG. 2)
An electron beam accelerator 28 is arranged in the configuration. The flow path width of the vertical falling section 26 is set to be equal to or less than the effective irradiation distance of the electron beam, and the irradiation window 24 is provided in a range of 0 to 30 cm from the end of the rotation applying section 16. The irradiation window 24 has a shape that matches the electron beam emitting portion (irradiation region).
【0013】鉛直落下部26の下部に、空気を吸引する
ための空気ダクト30を接続することが好ましい。この
空気ダクト30には、図示していないがブロワが接続さ
れている。なお、空気を吸引するための空気ダクト30
の代りに、空気を供給するための空気ダクトを接続する
ことも可能である。空気を吸引する場合は、例えば、展
開部10の下端近傍に設けられた開口32から空気が吸
い込まれる。なお、空気取入用の開口は、鉛直落下部2
6の上流側であれば、何れの位置に設けてもよい。空気
吸引量は、所要照射時間により決定される。なお、空気
ダクトを開口32に設置する場合もある。照射済み粒状
物は、鉛直落下部と空気ダクトとの接続部で空気流れか
ら分離され、回収ダクト34を経て排出される。なお、
空気ダクト30を回収ダクト34に接続してもよい。回
収ダクト34には、後工程への移送配管(図示略)が接
続される。36は粒状物出口である。なお、図3におい
ては、凹凸面18として金網を用いる場合を示してい
る。上記の各部を適切に組み合わせ、各部の条件及び運
転条件を適切に調節することにより、多量の粒状物を連
続的に全面電子線照射するように構成する。なお、図4
における37は支持板である。An air duct 30 for sucking air is preferably connected to a lower portion of the vertical drop section 26. Although not shown, a blower is connected to the air duct 30. The air duct 30 for sucking air is used.
Alternatively, it is also possible to connect an air duct for supplying air. When sucking air, for example, the air is sucked from an opening 32 provided near the lower end of the developing unit 10. In addition, the opening for air intake is the vertical drop part 2
6 may be provided at any position on the upstream side. The amount of air suction is determined by the required irradiation time. In addition, an air duct may be installed in the opening 32 in some cases. The irradiated granular material is separated from the air flow at the connection between the vertical drop section and the air duct, and is discharged through the collection duct 34. In addition,
The air duct 30 may be connected to the collection duct 34. A transfer pipe (not shown) to a subsequent process is connected to the collection duct 34. 36 is a granular material outlet. FIG. 3 shows a case where a wire mesh is used as the uneven surface 18. By appropriately combining the above components and appropriately adjusting the conditions and operating conditions of each component, a large amount of granular material is continuously irradiated with an electron beam over the entire surface. FIG.
Is a support plate.
【0014】図5は本発明の実施の第2形態による粒状
物の表面照射装置の概略構成図である。本実施形態は、
平滑斜面12を有する展開部10に振動機38を連結し
て、投入された粒状物の横方向への広がり及び落下をよ
り均一に、かつ高速度化できるように構成したものであ
る。他の構成及び作用は、実施の第1形態の場合と同様
である。FIG. 5 is a schematic configuration diagram of a granular surface irradiation apparatus according to a second embodiment of the present invention. In this embodiment,
The vibrator 38 is connected to the developing unit 10 having the smooth slope 12 so that the input granular material can be spread and dropped in the lateral direction more uniformly and at a higher speed. Other configurations and operations are the same as those in the first embodiment.
【0015】[0015]
【実施例】以下に実施例及び比較例を示し、本発明の特
徴とするところをより一層明確にする。 実施例1 図6に示す本発明の装置を試験装置として用いて、試験
を行った。主要構成機器は、つぎの通りである。 (1) ホッパー40: 小麦40kgを貯留し、絞り付
きバルブ42を用いて0.1〜5t /hrの定量供給を行
う構造。供給時間は0.5〜3分間、 (2) 展開部10: 幅50cm、長さ70cm程度のダ
クト状の平滑斜面12を有し、小麦の流れを横方向に広
げる構造、 (3) 整流部20: スリット幅を10mmに絞った構
造、 (4) 回転付加部16: 平滑斜面12の末端面近傍
で整流部20の下端に設けられ、下面上に金網を設けて
凹凸面18を形成し、小麦の回転を促す構造、 (5) 照射部22: 垂直落下部26に電子線を幅5
0cm、高さ8cmで照射する構造、 (6) 回収ダクト34: 照射済みの小麦を回収する
ためのもの、 (7) サイクロン44: 小麦加速のために吸引した
空気から微粉(ダスト)を回収するためのもの、 (8) ブロワ46、回収用受け槽48、ダスト受け槽
50、制御盤52、EXAMPLES Examples and comparative examples are shown below to further clarify the features of the present invention. Example 1 A test was performed using the apparatus of the present invention shown in FIG. 6 as a test apparatus. The main components are as follows. (1) Hopper 40: A structure in which 40 kg of wheat is stored and a fixed amount of 0.1 to 5 t / hr is supplied using a valve 42 with a throttle. The supply time is 0.5 to 3 minutes. (2) Development unit 10: A structure having a duct-like smooth slope 12 with a width of about 50 cm and a length of about 70 cm to spread the flow of wheat in the horizontal direction. 20: a structure in which the slit width is reduced to 10 mm; (4) a rotation applying portion 16: provided at the lower end of the rectifying portion 20 near the end surface of the smooth inclined surface 12, provided with a wire mesh on the lower surface to form an uneven surface 18, (5) Irradiation unit 22: Electron beam of width 5 is applied to vertical drop unit 26.
(6) Collection duct 34: for collecting irradiated wheat, (7) Cyclone 44: Collecting fine dust (dust) from air sucked for acceleration of wheat (8) blower 46, collecting tank 48, dust receiving tank 50, control panel 52,
【0016】上記のように構成された試験装置を用い
て、小麦5t /hrを照射幅50cm、高さ8cmの電子線加
速器(電子線照射装置)により照射処理した。小麦供給
部中心が展開部10末端から53cmの所に来るように
し、整流部20のスリット幅は10mm(最も小さい部
分)であり、鉛直落下部の幅は20mmであり、照射用窓
の幅(高さ)(スリット幅(高さ))は80mmであり、
照射装置の電子線照射幅と同じであった。また、金網幅
は100mm、金網の網目は1mmであった。また、空気吸
引速度は20m /sec であった。Using the test apparatus constructed as described above, wheat was irradiated at 5 t / hr with an electron beam accelerator (electron beam irradiation device) having an irradiation width of 50 cm and a height of 8 cm. The center of the wheat supply unit is located 53 cm from the end of the developing unit 10, the slit width of the rectifying unit 20 is 10 mm (smallest part), the width of the vertical drop unit is 20 mm, and the width of the irradiation window ( Height) (slit width (height)) is 80mm,
It was the same as the electron beam irradiation width of the irradiation device. The wire mesh width was 100 mm, and the wire mesh was 1 mm. The air suction speed was 20 m / sec.
【0017】試験の結果、表1に示すように、照射部2
2での小麦の落下速度3.3m /sec 、小麦の回転数6
500rpm 、重複率0.14となった。この結果、照射
部通過時に平均2.6回回転するとともに、重複がほと
んどなくなったため、全面照射が可能となった。As a result of the test, as shown in Table 1, the irradiation unit 2
The falling speed of wheat at 3.3 m / sec and the number of rotations of wheat 6
500 rpm and an overlap rate of 0.14. As a result, it rotated on average 2.6 times when passing through the irradiation section, and almost no overlap was made.
【0018】[0018]
【表1】 [Table 1]
【0019】照射域内平均回転数が1.0〜2.0未満
では、1.0回転未満の粒子も含まれるため、全面照射
できないものも含まれるが、2.0以上では最小回転数
は1.0以上となり、全粒子の全面照射ができる。ま
た、重複がある場合は、電子線が遮ぎられ、照射されな
い部分が増加する。しかし、照射領域内を移動する間に
粒子は回転や移動方向のずれ等により若干の重複解消を
行うため、重複率が低い程、全面照射が可能になり、重
複率が0.2以下の場合は全面照射を完全に行うことが
できる。なお、重複率はある時点での粒状物の重なりの
計測値、すなわち、照射部22を写真撮影し、その像内
で一部分以上重なっている粒状物の個数の割合を示す値
である。When the average rotation number in the irradiation area is less than 1.0 to 2.0, particles having less than 1.0 rotation are also included, and those that cannot be irradiated entirely are included. 0.0 or more, and the entire surface of all particles can be irradiated. If there is an overlap, the electron beam is blocked, and the portion not irradiated increases. However, during the movement in the irradiation area, the particles slightly eliminate overlap due to rotation or displacement of the movement direction, etc., so that the lower the overlap ratio, the more the entire surface can be irradiated, and the case where the overlap ratio is 0.2 or less. Can completely irradiate the entire surface. The overlap ratio is a measured value of the overlap of the granular materials at a certain point in time, that is, a value indicating the ratio of the number of the granular materials overlapping at least partially in the image of the illuminated unit 22.
【0020】実施例2 実施例1において、空気吸引を行わずに小麦を自然に落
下させた。結果を表1に示す。重複率は0.38であ
り、後述の比較例1における重複率0.54より小さく
なっており、照射効果が向上していることがわかる。Example 2 In Example 1, wheat was dropped naturally without suctioning air. Table 1 shows the results. The overlap ratio is 0.38, which is smaller than the overlap ratio of 0.54 in Comparative Example 1 described later, and it can be seen that the irradiation effect is improved.
【0021】実施例3 実施例1において、整流部を設けず、かつ空気吸引を行
わずに小麦を自然に落下させた。結果を表1に示す。重
複率は0.48であり、後述の比較例1における重複率
0.54より小さくなっており、照射効果が向上してい
ることがわかる。Example 3 In Example 1, wheat was allowed to fall naturally without a rectifying section and without air suction. Table 1 shows the results. The overlap ratio is 0.48, which is smaller than the overlap ratio of 0.54 in Comparative Example 1 described later, and it can be seen that the irradiation effect is improved.
【0022】比較例1 実施例1において、金網及び整流部を設けず、かつ、空
気吸引を行わずに小麦を自然に落下させた。結果を表1
に示す。重複率は0.54であった。Comparative Example 1 Wheat was allowed to fall naturally in Example 1 without the provision of a wire netting and a rectifying section and without air suction. Table 1 shows the results
Shown in The overlap rate was 0.54.
【0023】[0023]
【発明の効果】本発明は上記のように構成されているの
で、つぎのような効果を奏する。 (1) 粒状物の流れを平滑斜面を用いて粒子1個程度
の薄層流にすることにより、個々の粒子に電子線を確実
に照射できるようにし、さらに、流路面に突起を有する
凹凸部分を設けることにより回転を付加し、照射範囲内
で1回以上、好ましくは複数回回転させることにより、
電子線の全面照射が可能になり、処理量、処理速度を大
きくすることができ、多量の粒状物を連続的に全面電子
線照射することができる。 (2) 照射部を横方向に細長い照射用窓(スリット)
を有する鉛直落下部の構造とすることにより、電子線照
射装置を容易に組み込むことができる。 (3) 鉛直落下部の空気を粒状物落下方向又はこの逆
方向に吸引する場合は、照射範囲内での粒状物落下速
度、又は粒状物落下速度及び粒状物回転数を調整するこ
とができる。 (4) 整流部を設ける場合は、粒状物の跳ね上がりを
抑えることができ、後流の回転付加部において粒状物を
効率よく回転させることができる。 (5) 展開部を振動させる場合は、投入された粒状物
の横方向への広がり及び落下をより均一に、かつ高速度
で行うことができる。 (6) 粒状物として小麦、蕎麦等の穀類を用いる場合
は、処理量、処理速度が大きく、製粉ラインに直接、容
易に組み込むことができ、商業規模の穀類の電子線照射
装置(穀類殺菌装置)を構成することができる。As described above, the present invention has the following effects. (1) By making the flow of the granular material into a thin laminar flow of about one particle by using a smooth slope, it is possible to reliably irradiate each particle with an electron beam, and furthermore, to have an uneven portion having a projection on the flow channel surface. Is added to provide rotation, and by rotating once or more, preferably a plurality of times within the irradiation range,
The entire surface can be irradiated with an electron beam, the amount of treatment and the processing speed can be increased, and a large amount of granular material can be continuously irradiated with the entire surface with the electron beam. (2) The irradiation window (slit), which extends the irradiation unit in the horizontal direction
The electron beam irradiation device can be easily incorporated by adopting the structure of the vertical falling portion having the following. (3) When sucking the air in the vertically falling portion in the direction of falling of the granular material or in the opposite direction, the falling speed of the granular material within the irradiation range, or the falling speed of the granular material and the rotating speed of the granular material can be adjusted. (4) In the case where the rectifying section is provided, it is possible to prevent the particulate matter from jumping up, and to efficiently rotate the particulate matter in the downstream rotation addition section. (5) When the developing unit is vibrated, the input granular material can be spread and dropped in the lateral direction more uniformly and at a high speed. (6) When grains such as wheat and buckwheat are used as the granular material, the processing amount and the processing speed are large, the grains can be easily directly incorporated into a milling line, and an electron beam irradiation apparatus for grain on a commercial scale (cereal sterilizer) ) Can be configured.
【図1】本発明の実施の第1形態による粒状物の表面照
射装置の概略構成図である。FIG. 1 is a schematic configuration diagram of a granular material surface irradiation apparatus according to a first embodiment of the present invention.
【図2】図1に示す装置における要部の斜視図である。FIG. 2 is a perspective view of a main part of the apparatus shown in FIG.
【図3】図1に示す装置における照射部まわりの縦断面
説明図である。FIG. 3 is an explanatory longitudinal sectional view around an irradiation unit in the apparatus shown in FIG. 1;
【図4】図1に示す装置において、照射装置を組み込ん
だ状態を示す斜視図である。FIG. 4 is a perspective view showing a state where an irradiation device is incorporated in the device shown in FIG. 1;
【図5】本発明の実施の第2形態による粒状物の表面照
射装置の概略構成図である。FIG. 5 is a schematic configuration diagram of a granular material surface irradiation apparatus according to a second embodiment of the present invention.
【図6】試験装置として用いた本発明の装置の概略構成
図である。FIG. 6 is a schematic configuration diagram of an apparatus of the present invention used as a test apparatus.
10 展開部 12 平滑斜面 14 粒状物入口 16 回転付加部 18 凹凸面 20 整流部 22 照射部 24 照射用窓 26 鉛直落下部 28 電子線加速器、紫外線ランプ又はX線照射器 30 空気ダクト 32 開口 34 回収ダクト 36 粒状物出口 37 支持板 38 振動機 40 ホッパー 42 絞り付きバルブ 44 サイクロン 46 ブロワ 48 回収用受け槽 50 ダスト受け槽 52 制御盤 DESCRIPTION OF SYMBOLS 10 Unfolding part 12 Smooth slope 14 Granular material entrance 16 Rotation addition part 18 Uneven surface 20 Rectification part 22 Irradiation part 24 Irradiation window 26 Vertical falling part 28 Electron beam accelerator, ultraviolet lamp or X-ray irradiator 30 Air duct 32 Opening 34 Recovery Duct 36 Granular material outlet 37 Support plate 38 Vibrator 40 Hopper 42 Valve with throttle 44 Cyclone 46 Blower 48 Receiving tank 50 Dust receiving tank 52 Control panel
フロントページの続き (72)発明者 佐竹 弘匡 千葉県野田市二ツ塚118番地 川崎重工 業株式会社 野田工場内 (56)参考文献 特開 平10−268100(JP,A) 特開 平1−8969(JP,A) 特開 昭62−47361(JP,A) 特開 平1−192362(JP,A) 特開 平8−317964(JP,A) 特開 平10−228(JP,A) 特公 昭57−3374(JP,B2) 特表 平7−506744(JP,A) (58)調査した分野(Int.Cl.7,DB名) A61L 2/08 - 2/12 A23B 9/00 B65G 53/24 B65G 47/00 - 47/20 Continuation of the front page (72) Inventor Hiromasa Satake 118 Notsuka, Noda-shi, Chiba Kawasaki Heavy Industries, Ltd. Noda Plant (56) References JP-A-10-268100 (JP, A) JP-A-1-8969 ( JP, A) JP-A-62-47361 (JP, A) JP-A-1-192362 (JP, A) JP-A-8-317964 (JP, A) JP-A-10-228 (JP, A) 57-3374 (JP, B2) Table 7-506744 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) A61L 2/08-2/12 A23B 9/00 B65G 53 / 24 B65G 47/00-47/20
Claims (9)
粒状物を薄層流に広げて落下させ、斜面末端近傍に設け
られた凹凸面を有する回転付加部により粒状物に回転を
付加した後、横方向に細長い照射用窓を有する鉛直落下
部に導入し、この鉛直落下部で回転して落下する粒状物
に照射用窓から水平方向に電子線、紫外線及びX線のい
ずれかを照射することを特徴とする粒状物の表面照射方
法。1. A granular material is spread in a thin laminar flow on a smooth inclined surface developed in the lateral direction and dropped, and rotation is added to the granular material by a rotation applying portion having an uneven surface provided near the end of the slope. After that, it is introduced into the vertical drop section with the irradiation window elongated in the horizontal direction, and the granular material that rotates and falls in this vertical drop section
Surface irradiation method of the particle, which comprises irradiating either the horizontal direction of the electron beam, ultraviolet ray and X-ray from the irradiation window.
物の跳ね上がりを抑えた後、回転付加部に導入する請求
項1記載の粒状物の表面照射方法。2. The method for irradiating the surface of a granular material according to claim 1, wherein the flow passage immediately before the rotation applying portion is narrowed to suppress the rise of the granular material, and then introduced into the rotation applying portion.
直落下部に空気を供給することにより、粒状物落下速度
及び粒状物回転数の少なくともいずれかを調整する請求
項1又は2記載の粒状物の表面照射方法。3. The granular material falling speed by sucking air from the vertical drop portion or supplying air to the vertical drop portion.
The method for irradiating the surface of a granular material according to claim 1 or 2 , wherein at least one of the rotational speed of the granular material and the rotational speed of the granular material are adjusted.
への広がり及び落下を均一に、かつ高速度で行う請求項
1、2又は3記載の粒状物の表面照射方法。4. A method for vibrating a smooth slope to move a granular material in a lateral direction.
4. The method for irradiating the surface of a granular material according to claim 1 , wherein the spread and fall to the surface are performed uniformly at a high speed .
流にして落下させるための横方向へ展開された平滑斜面
を有する展開部と、 平滑斜面の末端近傍に設けられた粒状物に回転を付加す
るための凹凸面を備えた回転付加部と、 回転付加部に連結された横方向に細長い照射用窓を有す
る鉛直落下部の該照射用窓に電子線加速器、紫外線ラン
プ及びX線照射器のいずれかを配置させてなる照射部
と、 を備えたことを特徴とする粒状物の表面照射装置。5. A thin layer formed by spreading the input granular material in the lateral direction.
Rotation is applied to a developing part having a smooth slope that is developed in the horizontal direction for dropping as a flow, and a granular material provided near the end of the smooth slope .
A rotation applying portion having an uneven surface for projection, and a vertically falling irradiation window connected to the rotation adding portion, the irradiation window of an electron beam accelerator, an ultraviolet lamp, and an X-ray irradiator. An irradiation unit having any one of them, and a surface irradiation apparatus for a granular material, comprising:
幅を絞って粒状物の跳ね上がりを抑えるための整流部を
設けた請求項5記載の粒状物の表面照射装置。6. The apparatus for irradiating a surface of a granular material according to claim 5, further comprising a rectifying section provided immediately before the rotation applying section to narrow the flow path width of the rotation applying section to suppress the jumping of the granular substance.
物回転数の少なくともいずれかが調整できるように、鉛
直落下部の下部に接続された空気を吸引又は空気を供給
するための空気ダクトを備えた請求項5又は6記載の粒
状物の表面照射装置。7. The falling speed and granularity of a granular material at a vertical falling portion.
7. The apparatus for irradiating a surface of a granular material according to claim 5, further comprising an air duct connected to a lower portion of the vertical drop portion for sucking or supplying air so that at least one of the number of rotations of the object can be adjusted. .
底面に格子状もしくは横縞状の凹凸を設けた構造、金網
又はワイヤである請求項5、6又は7記載の粒状物の表
面照射装置。8. The surface irradiation of a granular material according to claim 5, 6 or 7, wherein the uneven surface of the rotation applying portion is a structure, a wire mesh or a wire having a lattice-like or horizontal stripe-like unevenness on the bottom surface near the end of the slope. apparatus.
の広がり及び落下が均一に、かつ高速度で行えるよう
に、平滑斜面を有する展開部に振動機を連結した請求項
5〜8のいずれかに記載の粒状物の表面照射装置。9. A method for vibrating a smooth inclined surface in a lateral direction of a granular material.
Spread and drop uniformly and at high speed
9. The apparatus for irradiating a surface of a granular material according to claim 5, wherein a vibrator is connected to a developing section having a smooth slope.
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